WO2022164123A1 - Device and method for aligning multiple photomasks for manufacturing fine metal mask for large-area display - Google Patents

Device and method for aligning multiple photomasks for manufacturing fine metal mask for large-area display Download PDF

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Publication number
WO2022164123A1
WO2022164123A1 PCT/KR2022/001003 KR2022001003W WO2022164123A1 WO 2022164123 A1 WO2022164123 A1 WO 2022164123A1 KR 2022001003 W KR2022001003 W KR 2022001003W WO 2022164123 A1 WO2022164123 A1 WO 2022164123A1
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WIPO (PCT)
Prior art keywords
photomask
alignment
photomasks
fine metal
metal mask
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PCT/KR2022/001003
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French (fr)
Korean (ko)
Inventor
유명훈
김재범
한덕기
Original Assignee
풍원정밀㈜
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Priority to CN202280009076.3A priority Critical patent/CN116710848A/en
Publication of WO2022164123A1 publication Critical patent/WO2022164123A1/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7096—Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Definitions

  • the present invention relates to a plurality of photomask alignment apparatus for manufacturing a fine metal mask for a large area display, and more particularly, to easily manufacture a fine metal mask for manufacturing an 8th generation large area display, a plurality of By connecting and using photomask raw materials or a plurality of photomasks, it is possible to manufacture a fine metal mask having an extended effective portion of the 8th generation. Accordingly, it is possible to increase production efficiency in manufacturing a fine metal mask having an effective portion extended in length compared to a fine metal mask for manufacturing a 6.5 generation display, and to utilize the existing exposure equipment for manufacturing a fine metal mask for the 6.5 generation as it is. can
  • a key component for depositing OLED devices on a display panel is a fine metal mask, and it is difficult to keep up with the trend of large-area display panels with the existing 6.5G OLED pixel deposition fine metal mask. is laid Therefore, there is a need to develop a fine metal mask for deposition of 8th generation OLED pixels (hereinafter abbreviated as “8th generation mask”).
  • the fine metal mask is composed of an effective portion, which is an area in which a pattern is formed so that pixels are deposited, and grip portions formed at both ends of the effective portion to perform a mask fixing role in order to seat the fine metal mask on the panel in the process of depositing the pixels.
  • the length of the effective part of the 6.5th generation mask is 1100mm, whereas the length of the effective part of the 8th generation mask is 2200mm.
  • the length of the grip part it is 2600mm, which is a conventional exposure machine that can expose up to a length of 2400mm. There is a problem in that it is difficult to produce a generation mask.
  • the photomask used to manufacture the 8th generation mask is a type of laminating two or more numbers, so the continuity or consistency of alignment between the two photomasks in the process of laminating two pre-processed photomasks, respectively. There is a high possibility that this cannot be ensured, and when continuity or consistency of alignment is not ensured in this way, pixel defects may occur in the process of forming pixels, and the resolution of the display may deteriorate due to the defective pixels. Therefore, the development of a new process technology for manufacturing the 8th generation mask is desired.
  • the present invention has been devised to solve the problems of the prior art, and the present invention aims to manufacture a fine metal mask for manufacturing an 8th generation large-area display having a high degree of alignment by aligning a plurality of photo masks with high accuracy. do it with
  • the present invention provides a new photomask alignment device and alignment method so that the existing exposure machine can be used as it is, thereby eliminating the need for developing a new exposure machine when manufacturing a fine metal mask for manufacturing an 8th generation large-area display, and eliminating the need for a conventional exposure machine It serves another purpose to maximize utilization.
  • Another object of the present invention is to manufacture a separate aligner for aligning a plurality of photomasks and to precisely align the plurality of photomasks in a simple manner.
  • a second photomask adsorption hole is reinforced in the photomask bonding frame, and transferred to the exposure machine in the adsorption state for exposure.
  • a photo mask mounting frame a photomask adsorption unit formed on an edge of the photomask mounting frame; At least two alignment reference points are formed, the alignment reference point is an alignment reference portion positioned to overlap the alignment mark; and a photographing device mounted at a position capable of photographing the overlapping state of the alignment reference unit and the alignment mark, wherein at least one of the alignment reference points overlaps the alignment mark formed on the first photomask among the plurality of photomasks,
  • a plurality of photomask alignment apparatuses for manufacturing a fine metal mask for a large area display, wherein the remainder overlaps the alignment marks formed on the second photomask aligned adjacent to the first photomask.
  • the photomask alignment device may include: a photomask lifting bar provided to be liftable under the photomask mounting frame; and a support glass for supporting the photomasks at the interface when the plurality of photomasks are laminated.
  • the photographing device is provided as many as the number of the alignment reference points.
  • the photomask may further include a bonding frame for supporting the photomask from an upper portion of the photomask, and a second photomask adsorption unit may be formed on at least a portion of a surface of the bonding frame in contact with the photomask.
  • the present invention is performed by the alignment device, the first step of generating at least one alignment mark on the photo mask; a second step of first aligning and mounting the at least two photomasks on which the alignment marks are generated on a photomask mounting frame of an exposure machine; a third step of confirming the positions of the alignment marks between the mounted photomasks; and a fourth step of determining whether the alignment state is completed according to the position of the identified alignment mark, wherein the completion of the alignment state is recognized from whether the alignment mark formed on each photomask matches the alignment reference unit, and the alignment Provided is a method for aligning a plurality of photomasks for manufacturing a fine metal mask for a large area display, wherein the third step is performed again after secondary alignment of the photomasks when the state is not completed.
  • the present invention provides a new photomask alignment device and alignment method so that the existing exposure machine can be used as it is, thereby eliminating the need for developing a new exposure machine when manufacturing a fine metal mask for manufacturing an 8th generation large-area display, and eliminating the need for a conventional exposure machine The effect is expected to maximize the usability.
  • the present invention is expected to have the effect of precisely aligning the plurality of photomasks in a simple way before performing the exposure process.
  • a second photomask adsorption hole is reinforced in the photomask bonding frame, and transferred to the exposure machine in the adsorption state for exposure.
  • FIG. 1 is a flowchart illustrating a process of laminating two individual photomasks and securing an alignment degree according to an embodiment of the present invention, and shows a case in which a separate alignment device is used.
  • FIG. 2 shows the alignment device of FIG. 1 from the side, and at the same time shows a process for laminating a photomask and confirming an alignment state.
  • FIG. 3 is a view showing a second photomask adsorption unit formed on a photomask bonding frame according to an embodiment of the present invention together with an exposure machine mounting frame.
  • ... unit and “... group” described in the specification mean a unit for processing at least one function or operation.
  • the present invention is to fabricate an 8th generation fine metal mask, and the 8th generation fine metal mask is characterized in that the effective portion is twice as long as that of the existing 6.5 generation fine metal mask.
  • the overall length of the 8th generation fine metal mask is 2600 mm, which is 1100 mm longer than the total length of the 6.5 generation fine metal mask of 1500 mm.
  • the exposure machine for performing the exposure process which is a process for manufacturing a fine metal mask, can expose a target object with a length of up to 2500 mm, one full exposure of the 6.5 generation fine metal mask is possible, but the 8th generation fine metal mask One full exposure of the mask is not possible.
  • FIG. 1 is a flowchart illustrating a process of laminating two individual photomasks and securing an alignment degree according to an embodiment of the present invention, illustrating a case in which a separate alignment device is used
  • FIG. 2 is the alignment device of FIG. is shown from the side and at the same time shows a process for confirming the lamination and alignment of the photomask
  • FIG. 3 is a second photomask adsorption unit formed on the photomask bonding frame according to an embodiment of the present invention together with the exposure machine mounting frame. the drawing shown.
  • FIG. 1 shows the planar shape of the adsorption unit 171 formed on the photomask mounting frame 170 on which the photomasks 130-1 and 130-2 are mounted
  • FIGS. 2 and 3 the bonding frame ( 230 ) and the second photomask adsorption unit 231 are shown in plan view.
  • FIG. 1 and 2 show a photomask alignment apparatus 200 in which a photomask mounting frame 170 is configured separately from an exposure machine, and a lifting bar 173, supporting glass, and the like are provided.
  • the photomask alignment apparatus 200 includes an alignment reference unit 181 and a photographing apparatus, and includes a fixed photomask alignment system 180 , and a photomask It consists of an independent frame structure including a photomask mounting frame 170 that can be mounted thereon.
  • the photomask alignment apparatus 200 includes a photomask mounting frame 170 ; a photomask adsorption unit 171 formed on an edge of the photomask mounting frame 170;
  • the alignment reference point 182 is formed at least two, the alignment reference point 182 is an alignment reference portion 181 positioned to overlap the alignment mark 145; and a photographing device 183 mounted at a position capable of photographing the overlapping state of the alignment reference unit 181 and the alignment mark 145, wherein at least one of the alignment reference points 182 is one of a plurality of photomasks. It overlaps the alignment marks 145 formed on the first photomask, and the remainder overlaps the alignment marks 145 formed on the second photomask aligned adjacent to the first photomask.
  • the photomask mounting frame 170 and the photomask adsorption unit 171 of the present embodiment are 1) configured independently from those configured in the exposure machine, and 2) a photomask including the alignment reference unit 181 and the photographing device 183 .
  • the alignment system 180 is fixed to the frame, 3) a leg portion is formed in the lower portion of the frame, 4) a photo mask lifting bar 173 provided to be lifted in the lower portion of the photo mask mounting frame 170; It is provided and ascends and descends to the central portion surrounded by the frame, and serves to support the photomask to be seated on the frame.
  • the supporter 220 supports the photomasks on the boundary surface of the photomask, and serves to maintain the alignment state when the photomask is moved; further includes.
  • the material of the support 220 is not limited, but it is preferable to use a glass material.
  • the photomask mounting frame 170 shown in FIG. 1 is an area on which the photomask is mounted (mounted), the central portion surrounded by the frame is penetrated, and the transparent mounting plate 172 on which the photomask is mounted is positioned. do.
  • the mounting plate 172 mainly adopts a glass plate. This is because the glass plate is suitable for performing the exposure process because it has heat resistance and is transparent. However, an appropriate material other than the glass plate may be adopted as an alternative material.
  • a slit 171 to which a negative pressure is applied is provided on the edge of the frame 170 , so that when the photomask is mounted, the photomask 130 can be seated on the frame by the negative pressure, and thus the photomask 130 is stable. fixation is possible.
  • the upper slit 171 may be replaced by a single hole, and the interstitial space that can use the sound pressure may have any shape.
  • the photomask mounting frame 170 has a size in which two manufactured unit photomasks 130-1 and 130-2 can be mounted.
  • the number of photomasks that can be mounted is not limited to two, and more photomasks may be mounted according to the size of the frame or the length of the mask.
  • the photomask mounting frame 170 may be used in a process of fixing a single photomask and exposing the metal plate 190 using this, and laminating and mounting a plurality of photomasks 130-1 and 130-2. And you can check the alignment status between them. In the case of laminating a plurality of photomasks, since the pattern must be closely aligned, the plurality of photomasks must be precisely aligned, and a means for checking the alignment state must be separately devised.
  • an alignment device equipped with a photomask alignment system 180 is devised, whereby the alignment state of the laminated photomask can be precisely checked, and the laminated photo has an alignment suitable for performing the exposure process.
  • the realization of the mask became possible.
  • the process of manufacturing the photomask may include: a first step of generating at least one alignment mark 145 on the photomask; a second step of first aligning and mounting at least two photomasks on which the alignment marks 145 are generated on a photomask mounting frame 170 of an exposure machine; a third step of confirming the positions of the alignment marks 145 between the mounted photomasks; and a fourth step of determining whether the alignment state is complete according to the confirmed position of the alignment mark 145; if the alignment state is not completed, the photomasks are secondarily aligned and then performed again from the third step will do
  • the alignment marks 145 generated on the photomask are preferably marked outside the region where the pattern is formed. Therefore, it is preferable that the photomask be installed in the area near the vertex of the rectangular photomask as the most comfortable position.
  • the alignment marks 145 may be formed at all four vertices, or at least at both ends of the long side. That is, it is most preferable that the alignment mark 145 is marked at an appropriate position so that the alignment state of the unit photomask and the adjacent unit photomask can be checked.
  • the alignment marks 145 are formed at the same coordinates of an alignment target photomask having the same standard, so that the alignment state can be checked regularly.
  • the alignment state is confirmed as it is so that it can be connected to the exposure process, which is the next process.
  • Checking the alignment status may be continuously performed until the alignment status is confirmed.
  • the completion of the alignment state may be recognized from whether the alignment mark formed on each photomask matches the alignment reference unit.
  • the alignment reference points 182 include an alignment reference unit 181 positioned to overlap the alignment mark 145; and a photographing device 183 mounted at a position capable of photographing the overlapping state of the alignment reference unit 181 and the alignment mark 145 .
  • the alignment reference points 182 overlaps the alignment mark 145 formed on the first photomask among the plurality of photomasks, and the rest are aligned on the second photomask aligned adjacent to the first photomask. superimposed on mark 145 .
  • the illustrated shape shows a shape in which one alignment mark 145 is formed in the vertex regions adjacent to each other of the first photomask and the second photomask.
  • the number of alignment marks 145 is not particularly limited as long as the alignment check can be precisely performed as described above.
  • the alignment reference unit 181 may be formed of a transparent material. For example, by making the transparent reference unit semi-transparent, the effect of light reflection during photographing can be reduced. Accordingly, the overlapping state of the alignment reference point 182 and the alignment mark 145 can be confirmed with the naked eye.
  • the alignment mark 145 is formed on the upper surface or the lower surface of the photomask, and the formation surface of the alignment mark 145 is not limited to any one surface.
  • the photomask alignment apparatus 180 may be located above or below the photomask. That is, since the mounting portion on which the photomask is mounted is made of transparent glass, it is possible to check the alignment state even under the photomask.
  • the photomask is preferably mounted at a reference position on the frame 170 , and the alignment system 180 can check the alignment state of the photomask.
  • the reference point for the mounting position of the photomask and the alignment measurement position of the alignment system 180 must be set so that the alignment state of the photomask 130 can be easily and precisely confirmed and confirmed in a short time.
  • the alignment state is checked by the photographing device 183, and the alignment state photographed by the photographing apparatus 183 is transmitted to a control unit (not shown) by wired/wireless communication means, and after checking the alignment state in the control unit, the alignment state decides whether to confirm or not. As a result of checking the alignment state, if there is a need for realignment, this is transmitted to the alignment device again to perform the corresponding process.
  • the photographing device 183 is preferably provided as many as the number of the alignment reference points 182 , but of course, one movable photographing device 183 may be configured to check the alignment state while moving.
  • FIG. 2 is a view showing the alignment device of FIG. 1 from the side and at the same time showing a process for confirming the lamination and alignment state of the photomask
  • FIG. 3 is a second photo formed in the photomask bonding frame according to an embodiment of the present invention. It is a figure which shows the mask adsorption part together with the exposure machine mounting frame.
  • two photomasks 130-1 and 130-2 are fixed to the bonding frame 230, and the second photomask adsorption unit 231 is configured in the bonding frame 230 to form the photomasks 130-1 and 130-2.
  • 130-2) is strongly adsorbed and fixed while moving to the exposure machine, and the bonding frame 230 is mounted on the exposure machine mounting frame 240 to perform the exposure process. That is, as shown in FIG. 3 , a fine metal mask is manufactured by exposing the photomask 130 , the bonding frame 230 , and the exposure machine mounting frame 240 to a metal plate as a set. Since the manufacturing process of the fine metal mask is a known technique, a detailed description thereof will be omitted.
  • One feature of the present invention is that the plurality of photomasks 130 can maintain a determined alignment state due to the second photomask adsorption unit 231 configured in the bonding frame 230 .

Abstract

The present invention relates to a device and a method for aligning multiple photomasks for manufacturing a fine metal mask for a large-area display and, more specifically, to a device for aligning multiple photomasks for manufacturing a fine metal mask for a large-area display which comprises: a photomask mounting frame; a photomask adsorption part formed on an edge of the photomask mounting frame; an alignment reference part which has at least two alignment reference points formed therein, the alignment reference points being positioned to overlap an alignment mark; and an imaging device mounted at a position where the overlapped state of the alignment reference part and the alignment mark can be captured, wherein at least one of the alignment reference points overlaps the alignment mark formed on the first photomask among the multiple photomasks, and the others overlap the alignment marks formed on the second photomask aligned adjacent to the first photomask.

Description

대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치 및 정렬방법A plurality of photomask alignment apparatus and alignment method for manufacturing fine metal mask for large area display
본 발명은 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치에 관한 것으로서, 보다 상세하게는 8세대 대면적 디스플레이 제작용 미세 금속 마스크(fine metal mask)를 용이하게 제작하기 위하여, 복수의 포토 마스크 원자재 또는 복수의 포토 마스크를 연결하여 사용함으로써 8세대의 확장된 유효부를 갖는 미세 금속 마스크를 제작할 수 있도록 한 것이다. 이로써, 6.5세대 디스플레이 제작용 미세 금속 마스크에 비하여 길이가 연장된 유효부를 갖는 미세 금속 마스크를 제작함에 있어서 생산의 효율성을 기할 수 있을 뿐 아니라, 기존의 6.5세대용 미세 금속 마스크 제조용 노광장비를 그대로 활용할 수 있다. The present invention relates to a plurality of photomask alignment apparatus for manufacturing a fine metal mask for a large area display, and more particularly, to easily manufacture a fine metal mask for manufacturing an 8th generation large area display, a plurality of By connecting and using photomask raw materials or a plurality of photomasks, it is possible to manufacture a fine metal mask having an extended effective portion of the 8th generation. Accordingly, it is possible to increase production efficiency in manufacturing a fine metal mask having an effective portion extended in length compared to a fine metal mask for manufacturing a 6.5 generation display, and to utilize the existing exposure equipment for manufacturing a fine metal mask for the 6.5 generation as it is. can
디스플레이 산업발전 과정에서 '대형화'는 새로운 시장을 창출하고 규모를 확대해 지속 성장하는 토대가 되어왔다. 대형화는 대면적 디스플레이 패널 생산라인 구축 및 생산 패널 인치의 확대를 의미한다. 디스플레이 업체들은 대면적 라인을 구축, 생산성을 높이고 더 저렴한 원가로 대형 패널을 생산하는데 많은 노력을 기울이고 있다. In the process of development of the display industry, 'large size' has become the foundation for sustainable growth by creating a new market and expanding its scale. Enlargement means the establishment of a large-area display panel production line and the expansion of the production panel inch. Display makers are putting much effort into building large-area lines to increase productivity and produce large-sized panels at lower cost.
디스플레이 패널에 OLED 소자를 증착하기 위한 핵심 부품이 미세 금속 마스크(Fine metal mask)인데, 기존의 6.5세대 OLED 화소 증착용 미세 금속 마스크로는 더 이상 대면적화되는 디스플레이 패널의 트렌드를 따라잡기 어려운 상황에 놓여 있다. 따라서, 8세대 OLED 화소 증착용 미세 금속 마스크(이하에서는 "8세대 마스크"로 약칭함)의 개발이 필요한 실정이다.A key component for depositing OLED devices on a display panel is a fine metal mask, and it is difficult to keep up with the trend of large-area display panels with the existing 6.5G OLED pixel deposition fine metal mask. is laid Therefore, there is a need to develop a fine metal mask for deposition of 8th generation OLED pixels (hereinafter abbreviated as “8th generation mask”).
미세 금속 마스크는 화소가 증착되도록 패턴이 형성된 영역인 유효부와 화소를 증착하는 과정에서 미세 금속 마스크를 패널 위에 안착시키도록 하기 위하여 마스크 고정 역할을 하도록 상기 유효부의 양단에 형성된 그립부로 구성된다.The fine metal mask is composed of an effective portion, which is an area in which a pattern is formed so that pixels are deposited, and grip portions formed at both ends of the effective portion to perform a mask fixing role in order to seat the fine metal mask on the panel in the process of depositing the pixels.
다만, 6.5세대 마스크는 유효부의 길이가 1100mm인 반면, 8세대 마스크는 유효부의 길이가 2200mm이며, 여기에 그립부의 길이까지 고려하면 2600mm에 달하여, 최장 2400mm의 길이까지 노광이 가능한 기존의 노광기로써 8세대 마스크를 제작하기 어려운 문제점이 있다. However, the length of the effective part of the 6.5th generation mask is 1100mm, whereas the length of the effective part of the 8th generation mask is 2200mm. Considering the length of the grip part, it is 2600mm, which is a conventional exposure machine that can expose up to a length of 2400mm. There is a problem in that it is difficult to produce a generation mask.
또한, 8세대 마스크의 생산에 적합한 노광기를 제작하기 위해서는 많은 자본이 소요되는 만큼 높은 시장 가격의 형성이 예상되며, 따라서 새로운 노광기의 도입에 따른 부담이 가중되는 문제점도 존재한다.In addition, as much capital is required to manufacture an exposure machine suitable for production of an 8th generation mask, a high market price is expected, and thus there is a problem in that the burden due to the introduction of a new exposure machine is increased.
아울러, 8세대 마스크를 제작하기 위하여 사용되는 포토 마스크는 2개 또는 그 이상의 갯수를 합지하는 형태인 바, 각각 선가공된 포토 마스크 2개를 합지하는 과정에서 2개의 포토 마스크간 정렬의 연속성이나 정합성이 확보되지 못할 가능성이 높으며, 이와 같이 정렬의 연속성이나 정합성이 확보되지 못한 경우에는 화소 형성과정에서 화소 불량이 발생되고, 불량화소로 인하여 디스플레이의 해상도가 나빠지는 문제점이 발생될 수 있다. 따라서, 8세대 마스크를 제작하기 위한 새로운 공정기술 개발이 요망된다. In addition, the photomask used to manufacture the 8th generation mask is a type of laminating two or more numbers, so the continuity or consistency of alignment between the two photomasks in the process of laminating two pre-processed photomasks, respectively There is a high possibility that this cannot be ensured, and when continuity or consistency of alignment is not ensured in this way, pixel defects may occur in the process of forming pixels, and the resolution of the display may deteriorate due to the defective pixels. Therefore, the development of a new process technology for manufacturing the 8th generation mask is desired.
본 발명은 전술한 종래기술의 문제점을 해결하기 위하여 안출된 것으로서, 본 발명은 복수의 포토 마스크를 높은 정확도로 정렬함으로써, 높은 정렬도를 갖는 8세대 대면적 디스플레이 제조용 미세 금속 마스크를 제조하는 것을 목적으로 한다.The present invention has been devised to solve the problems of the prior art, and the present invention aims to manufacture a fine metal mask for manufacturing an 8th generation large-area display having a high degree of alignment by aligning a plurality of photo masks with high accuracy. do it with
또한, 본 발명은 기존의 노광기를 그대로 활용할 수 있도록 포토 마스크 정렬장치와 정렬방법을 새로이 제시함으로써, 8세대 대면적 디스플레이 제조용 미세 금속 마스크를 제조할 때, 새로운 노광기의 개발 필요성을 해소하고 통상의 노광기 활용도를 극대화할 수 있도록 하는 것을 다른 목적으로 한다.In addition, the present invention provides a new photomask alignment device and alignment method so that the existing exposure machine can be used as it is, thereby eliminating the need for developing a new exposure machine when manufacturing a fine metal mask for manufacturing an 8th generation large-area display, and eliminating the need for a conventional exposure machine It serves another purpose to maximize utilization.
또한, 본 발명은 복수의 포토 마스크를 정렬하기 위한 별도의 얼라이너를 제작하고 복수의 포토 마스크를 간편한 방법으로 정밀하게 정렬할 수 있도록 하는 것을 또 다른 목적으로 한다.Another object of the present invention is to manufacture a separate aligner for aligning a plurality of photomasks and to precisely align the plurality of photomasks in a simple manner.
또한, 본 발명은 정렬이 완성된 복수의 포토 마스크를 노광기로 이송할 때, 정렬상태를 유지하기 위하여 포토 마스크 접합틀에 제2 포토 마스크 흡착구를 보강 설치하여, 흡착상태에서 노광기로 이송하여 노광함으로써, 정밀한 8세대 미세 금속 마스크를 제작할 수 있도록 하는 것을 또 다른 목적으로 한다.In addition, in the present invention, when transferring a plurality of photomasks that have been aligned to the exposure machine, in order to maintain the alignment state, a second photomask adsorption hole is reinforced in the photomask bonding frame, and transferred to the exposure machine in the adsorption state for exposure. By doing so, it is another object to make it possible to manufacture a precise 8th generation fine metal mask.
본 발명은 전술한 목적을 달성하기 위하여, 포토 마스크 장착 프레임; 상기 포토 마스크 장착 프레임의 테두리에 형성되는 포토 마스크 흡착부; 정렬 기준점이 적어도 두 개 형성되며, 상기 정렬 기준점은 정렬 마크와 중첩되도록 위치되는 정렬 기준부; 및 상기 정렬 기준부와 정렬 마크의 중첩 상태를 촬영할 수 있는 위치에 장착되는 촬영 장치;를 포함하되, 상기 정렬 기준점 중 적어도 하나는 복수의 포토 마스크 중 제1포토 마스크에 형성된 정렬 마크에 중첩되고, 나머지는 제1포토 마스크에 인접하여 정렬된 제2포토 마스크에 형성된 정렬 마크에 중첩되는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치를 제공한다.The present invention, in order to achieve the above object, a photo mask mounting frame; a photomask adsorption unit formed on an edge of the photomask mounting frame; At least two alignment reference points are formed, the alignment reference point is an alignment reference portion positioned to overlap the alignment mark; and a photographing device mounted at a position capable of photographing the overlapping state of the alignment reference unit and the alignment mark, wherein at least one of the alignment reference points overlaps the alignment mark formed on the first photomask among the plurality of photomasks, Provided is a plurality of photomask alignment apparatuses for manufacturing a fine metal mask for a large area display, wherein the remainder overlaps the alignment marks formed on the second photomask aligned adjacent to the first photomask.
상기 포토 마스크 정렬 장치는, 상기 포토 마스크 장착 프레임의 하부에 승강 가능하도록 마련되는 포토 마스크 승강바; 및 상기 복수의 포토 마스크 합지시 경계면에서 포토 마스크들을 지지하는 지지 글라스;를 포함하는 것이 바람직하다. The photomask alignment device may include: a photomask lifting bar provided to be liftable under the photomask mounting frame; and a support glass for supporting the photomasks at the interface when the plurality of photomasks are laminated.
상기 촬영 장치는 상기 정렬 기준점의 갯수만큼 구비되는 것이 바람직하다.It is preferable that the photographing device is provided as many as the number of the alignment reference points.
상기 포토 마스크의 상부로부터 상기 포토 마스크를 지지하기 위한 접합틀을 더 포함하며, 상기 접합틀 중 상기 포토 마스크와 접하는 면의 적어도 일부에는 제2 포토 마스크 흡착부가 형성되는 것이 바람직하다.The photomask may further include a bonding frame for supporting the photomask from an upper portion of the photomask, and a second photomask adsorption unit may be formed on at least a portion of a surface of the bonding frame in contact with the photomask.
또한 본 발명은 상기 정렬장치에 의하여 수행되며, 포토 마스크 상에 적어도 1개의 정렬 마크를 생성하는 제1단계; 상기 정렬 마크가 생성된 적어도 두 개의 포토 마스크들을 노광기의 포토 마스크 장착 프레임에 1차 정렬하여 장착하는 제2단계; 상기 장착된 포토 마스크간 정렬 마크의 위치를 확인하는 제3단계; 및 확인된 정렬 마크의 위치에 따라서 정렬 상태의 완성 여부를 확정하는 제4단계;를 포함하고, 상기 정렬상태의 완성여부는 각 포토 마스크에 형성된 정렬 마크와 정렬 기준부의 일치여부로부터 인정되며, 정렬상태가 미완성된 경우 상기 포토 마스크들을 2차 정렬한 후 상기 제3단계부터 다시 수행하는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬방법을 제공한다.In addition, the present invention is performed by the alignment device, the first step of generating at least one alignment mark on the photo mask; a second step of first aligning and mounting the at least two photomasks on which the alignment marks are generated on a photomask mounting frame of an exposure machine; a third step of confirming the positions of the alignment marks between the mounted photomasks; and a fourth step of determining whether the alignment state is completed according to the position of the identified alignment mark, wherein the completion of the alignment state is recognized from whether the alignment mark formed on each photomask matches the alignment reference unit, and the alignment Provided is a method for aligning a plurality of photomasks for manufacturing a fine metal mask for a large area display, wherein the third step is performed again after secondary alignment of the photomasks when the state is not completed.
이상과 같은 본 발명에 따르면, 복수의 포토 마스크를 높은 정확도로 정렬함으로써, 높은 정렬도를 갖는 효과가 기대된다.According to the present invention as described above, by aligning a plurality of photomasks with high accuracy, an effect of having a high degree of alignment is expected.
또한, 본 발명은 기존의 노광기를 그대로 활용할 수 있도록 포토 마스크 정렬장치와 정렬방법을 새로이 제시함으로써, 8세대 대면적 디스플레이 제조용 미세 금속 마스크를 제조할 때, 새로운 노광기의 개발 필요성을 해소하고 통상의 노광기 활용도를 극대화할 수 있도록 하는 효과가 기대된다.In addition, the present invention provides a new photomask alignment device and alignment method so that the existing exposure machine can be used as it is, thereby eliminating the need for developing a new exposure machine when manufacturing a fine metal mask for manufacturing an 8th generation large-area display, and eliminating the need for a conventional exposure machine The effect is expected to maximize the usability.
또한, 본 발명은 복수의 포토 마스크를 정렬하기 위한 별도의 얼라이너를 제작함으로써, 노광 공정 수행 전에 복수의 포토 마스크를 간편한 방법으로 정밀하게 정렬할 수 있도록 하는 효과가 기대된다.In addition, by manufacturing a separate aligner for aligning the plurality of photomasks, the present invention is expected to have the effect of precisely aligning the plurality of photomasks in a simple way before performing the exposure process.
또한, 본 발명은 정렬이 완성된 복수의 포토 마스크를 노광기로 이송할 때, 정렬상태를 유지하기 위하여 포토 마스크 접합틀에 제2 포토 마스크 흡착구를 보강 설치하여, 흡착상태에서 노광기로 이송하여 노광함으로써, 정밀한 8세대 미세 금속 마스크를 제작할 수 있는 효과가 기대된다.In addition, in the present invention, when transferring a plurality of photomasks that have been aligned to the exposure machine, in order to maintain the alignment state, a second photomask adsorption hole is reinforced in the photomask bonding frame, and transferred to the exposure machine in the adsorption state for exposure. By doing so, the effect of producing a precise 8th generation fine metal mask is expected.
도 1은 본 발명의 일 실시예에 의한 두개의 개별적 포토 마스크를 합지하고 정렬도를 확보하는 과정을 나타내는 순서도로서, 별도의 정렬 장치를 사용하는 경우를 나타낸 것이다. 1 is a flowchart illustrating a process of laminating two individual photomasks and securing an alignment degree according to an embodiment of the present invention, and shows a case in which a separate alignment device is used.
도 2는 도 1의 정렬 장치를 측면에서 나타냄과 동시에 포토 마스크의 합지 및 정렬상태 확인을 위한 과정을 나타낸 것이다.FIG. 2 shows the alignment device of FIG. 1 from the side, and at the same time shows a process for laminating a photomask and confirming an alignment state.
도 3은 본 발명의 일 실시예에 의한 포토 마스크 접합틀에 형성되는 제2 포토 마스크 흡착부를 노광기 장착 프레임과 함께 나타낸 도면이다. 3 is a view showing a second photomask adsorption unit formed on a photomask bonding frame according to an embodiment of the present invention together with an exposure machine mounting frame.
이하, 첨부한 도면을 참고로 하여 본 발명의 실시예에 대하여 본 발명이 속하는 기술 분야에서 통상의 지식을 가진 자가 용이하게 실시할 수 있도록 상세히 설명한다. 그러나 본 발명은 여러 가지 상이한 형태로 구현될 수 있으며 여기에서 설명하는 실시예에 한정되지 않는다. 그리고 도면에서 본 발명을 명확하게 설명하기 위해서 설명과 관계없는 부분은 생략하였으며, 명세서 전체를 통하여 유사한 부분에 대해서는 유사한 도면 부호를 붙였다.Hereinafter, with reference to the accompanying drawings, embodiments of the present invention will be described in detail so that those of ordinary skill in the art to which the present invention pertains can easily implement them. However, the present invention may be embodied in several different forms and is not limited to the embodiments described herein. And in order to clearly explain the present invention in the drawings, parts irrelevant to the description are omitted, and similar reference numerals are attached to similar parts throughout the specification.
명세서 전체에서, 어떤 부분이 어떤 구성요소를 "포함"한다고 할 때, 이는 특별히 반대되는 기재가 없는 한 다른 구성요소를 제외하는 것이 아니라 다른 구성요소를 더 포함할 수 있는 것을 의미한다.Throughout the specification, when a part "includes" a certain component, it means that other components may be further included, rather than excluding other components, unless otherwise stated.
또한, 명세서에 기재된 "…부", "…기" 등의 용어는 적어도 하나의 기능이나 동작을 처리하는 단위를 의미한다.In addition, terms such as "... unit" and "... group" described in the specification mean a unit for processing at least one function or operation.
본 발명은 8세대 미세 금속 마스크를 제작하는 것으로서, 8세대 미세 금속 마스크는 기존의 6.5세대 미세 금속 마스크보다 유효부의 길이가 2배 길게 형성된 것이 특징이다. 8세대 미세 금속 마스크의 전체 길이는 2600mm로서, 1500mm의 6.5세대 미세 금속 마스크 전체 길이 대비 1100mm 더 길다. 한편, 미세 금속 마스크 제조를 위한 일 과정인 노광 공정을 수행하기 위한 노광기는 최대 2500mm 길이의 피처리체를 노광할 수 있기 때문에, 6.5세대 미세 금속 마스크의 1회 전체 노광은 가능하나, 8세대 미세 금속 마스크의 1회 전체 노광은 불가능하다. The present invention is to fabricate an 8th generation fine metal mask, and the 8th generation fine metal mask is characterized in that the effective portion is twice as long as that of the existing 6.5 generation fine metal mask. The overall length of the 8th generation fine metal mask is 2600 mm, which is 1100 mm longer than the total length of the 6.5 generation fine metal mask of 1500 mm. On the other hand, since the exposure machine for performing the exposure process, which is a process for manufacturing a fine metal mask, can expose a target object with a length of up to 2500 mm, one full exposure of the 6.5 generation fine metal mask is possible, but the 8th generation fine metal mask One full exposure of the mask is not possible.
도 1은 본 발명의 일 실시예에 의한 두개의 개별적 포토 마스크를 합지하고 정렬도를 확보하는 과정을 나타내는 순서도로서, 별도의 정렬 장치를 사용하는 경우를 나타낸 것이고, 도 2는 도 1의 정렬 장치를 측면에서 나타냄과 동시에 포토 마스크의 합지 및 정렬상태 확인을 위한 과정을 나타낸 것이며, 도 3은 본 발명의 일 실시예에 의한 포토 마스크 접합틀에 형성되는 제2 포토 마스크 흡착부를 노광기 장착 프레임과 함께 나타낸 도면이다.1 is a flowchart illustrating a process of laminating two individual photomasks and securing an alignment degree according to an embodiment of the present invention, illustrating a case in which a separate alignment device is used, and FIG. 2 is the alignment device of FIG. is shown from the side and at the same time shows a process for confirming the lamination and alignment of the photomask, and FIG. 3 is a second photomask adsorption unit formed on the photomask bonding frame according to an embodiment of the present invention together with the exposure machine mounting frame. the drawing shown.
도 1에서는 포토 마스크(130-1, 130-2)가 장착되는 포토 마스크 장착 프레임(170)에 형성된 흡착부(171)에 관한 평면형상을 나타낸 것인 반면, 도 2와 도 3에서는 접합틀(230)과 제2 포토 마스크 흡착부(231)에 관한 평면 형상을 나타낸 것임을 유념하여야 한다.While FIG. 1 shows the planar shape of the adsorption unit 171 formed on the photomask mounting frame 170 on which the photomasks 130-1 and 130-2 are mounted, in FIGS. 2 and 3, the bonding frame ( 230 ) and the second photomask adsorption unit 231 are shown in plan view.
도 1 및 도 2는 노광기와는 별도로 포토 마스크 장착 프레임(170)을 구성하고, 여기에 승강바(173), 지지 글라스 등을 마련한 포토 마스크 정렬 장치(200)를 나타낸 것이다. 1 and 2 show a photomask alignment apparatus 200 in which a photomask mounting frame 170 is configured separately from an exposure machine, and a lifting bar 173, supporting glass, and the like are provided.
도 1과 2에서 도시된 바와 같이, 본 실시예에 의한 포토 마스크 정렬 장치(200)는 정렬 기준부(181) 및 촬영장치로 구성되며 고정된 포토 마스크 정렬 시스템(180)을 구비하고, 포토 마스크를 거치할 수 있는 포토 마스크 장착 프레임(170)을 포함하는 독립적인 프레임 구조로 이루어져 있다. As shown in FIGS. 1 and 2 , the photomask alignment apparatus 200 according to the present embodiment includes an alignment reference unit 181 and a photographing apparatus, and includes a fixed photomask alignment system 180 , and a photomask It consists of an independent frame structure including a photomask mounting frame 170 that can be mounted thereon.
즉, 상기 포토 마스크 정렬 장치(200)는, 포토 마스크 장착 프레임(170); 상기 포토 마스크 장착 프레임(170)의 테두리에 형성되는 포토 마스크 흡착부(171); 정렬 기준점(182)이 적어도 두 개 형성되며, 상기 정렬 기준점(182)은 정렬 마크(145)와 중첩되도록 위치되는 정렬 기준부(181); 및 상기 정렬 기준부(181)와 정렬 마크(145)의 중첩 상태를 촬영할 수 있는 위치에 장착되는 촬영 장치(183);를 포함하되, 상기 정렬 기준점(182) 중 적어도 하나는 복수의 포토 마스크 중 제1포토 마스크에 형성된 정렬 마크(145)에 중첩되고, 나머지는 제1포토 마스크에 인접하여 정렬된 제2포토 마스크에 형성된 정렬 마크(145)에 중첩된다.That is, the photomask alignment apparatus 200 includes a photomask mounting frame 170 ; a photomask adsorption unit 171 formed on an edge of the photomask mounting frame 170; The alignment reference point 182 is formed at least two, the alignment reference point 182 is an alignment reference portion 181 positioned to overlap the alignment mark 145; and a photographing device 183 mounted at a position capable of photographing the overlapping state of the alignment reference unit 181 and the alignment mark 145, wherein at least one of the alignment reference points 182 is one of a plurality of photomasks. It overlaps the alignment marks 145 formed on the first photomask, and the remainder overlaps the alignment marks 145 formed on the second photomask aligned adjacent to the first photomask.
본 실시예의 포토 마스크 장착 프레임(170), 포토 마스크 흡착부(171)는 1) 노광기에 구성된 것과 별도로 독립적으로 구성되었고, 2) 정렬 기준부(181)와 촬영 장치(183)를 포함하는 포토 마스크 정렬 시스템(180)이 프레임에 고정되었으며, 3) 상기 프레임의 하부에 다리부가 형성되어 있고, 4) 포토 마스크 장착 프레임(170)의 하부에 승강 가능하도록 마련되는 포토 마스크 승강바(173);가 구비되어 프레임으로 둘러싸인 중앙부로 승하강하며, 포토 마스크를 지지하여 상기 프레임에 안착하는 역할을 수행한다. The photomask mounting frame 170 and the photomask adsorption unit 171 of the present embodiment are 1) configured independently from those configured in the exposure machine, and 2) a photomask including the alignment reference unit 181 and the photographing device 183 . The alignment system 180 is fixed to the frame, 3) a leg portion is formed in the lower portion of the frame, 4) a photo mask lifting bar 173 provided to be lifted in the lower portion of the photo mask mounting frame 170; It is provided and ascends and descends to the central portion surrounded by the frame, and serves to support the photomask to be seated on the frame.
상기 복수의 포토 마스크 합지 후 정렬 상태가 확정되면, 포토 파스크의 경계면에 포토 마스크들을 지지하며, 포토 마스크 이동시 이동시 그 정렬 상태를 유지할 수 있도록 작용하는 지지체(220);가 더 포함된다. 상기 지지체(220)는 그 재질이 제한되는 것은 아니나, 바람직하게는 글라스 재질을 사용하는 것이 좋다.When the alignment state is confirmed after laminating the plurality of photomasks, the supporter 220 supports the photomasks on the boundary surface of the photomask, and serves to maintain the alignment state when the photomask is moved; further includes. The material of the support 220 is not limited, but it is preferable to use a glass material.
도 1에 도시된 포토 마스크 장착 프레임(170)은 포토 마스크가 거치(장착)되는 영역으로서, 상기 프레임에 의하여 둘러싸인 중앙부분은 관통되어 있으며, 포토 마스크가 안착된 투명한 거치판(172)이 위치하게 된다. The photomask mounting frame 170 shown in FIG. 1 is an area on which the photomask is mounted (mounted), the central portion surrounded by the frame is penetrated, and the transparent mounting plate 172 on which the photomask is mounted is positioned. do.
상기 거치판(172)은 유리판을 주로 채택한다. 유리판은 내열성을 가지고 있으면서도 투명하기 때문에 노광 과정을 수행하는데 적합하기 때문이다. 다만, 유리판이 아닌 적절한 재질이 대체재로 채택될 수도 있다. The mounting plate 172 mainly adopts a glass plate. This is because the glass plate is suitable for performing the exposure process because it has heat resistance and is transparent. However, an appropriate material other than the glass plate may be adopted as an alternative material.
아울러, 프레임(170)의 테두리에는 음압이 걸리는 슬릿(slit, 171)이 마련되어 있어 포토 마스크를 거치하면 음압에 의하여 포토 마스크(130)를 프레임에 안착시킬 수 있으며, 따라서 포토 마스크(130)의 안정적인 고정이 가능하다. 위 슬릿(171)은 홀로 대체될 수도 있으며, 음압을 이용할 수 있는 틈새 공간은 어떠한 형태이어도 무방하다.In addition, a slit 171 to which a negative pressure is applied is provided on the edge of the frame 170 , so that when the photomask is mounted, the photomask 130 can be seated on the frame by the negative pressure, and thus the photomask 130 is stable. fixation is possible. The upper slit 171 may be replaced by a single hole, and the interstitial space that can use the sound pressure may have any shape.
포토 마스크 장착 프레임(170)은 제작된 단위 포토 마스크(130-1, 130-2) 두개가 거치될 수 있는 크기를 갖는다. 그러나, 거치될 수 있는 포토 마스크의 수량은 두 개로 제한되는 것이 아니며, 프레임의 크기나 마스크의 길이에 따라서 더 많은 포토 마스크가 거치될 수도 있다. The photomask mounting frame 170 has a size in which two manufactured unit photomasks 130-1 and 130-2 can be mounted. However, the number of photomasks that can be mounted is not limited to two, and more photomasks may be mounted according to the size of the frame or the length of the mask.
포토 마스크 장착 프레임(170)은 단일의 포토 마스크를 고정하고, 이를 이용하여 금속 판재(190)를 노광하는 공정에 사용될 수 있으며, 복수의 포토 마스크(130-1, 130-2)를 합지 및 거치하고 이들간의 정렬 상태를 확인할 수도 있다. 복수의 포토 마스크를 합지하는 경우 패턴의 정렬이 면밀하게 이루어져야 하기 때문에, 복수의 포토 마스크를 정밀하게 정렬하여야 하며, 정렬 상태를 확인할 수 있는 수단이 별도로 강구되어야 한다. The photomask mounting frame 170 may be used in a process of fixing a single photomask and exposing the metal plate 190 using this, and laminating and mounting a plurality of photomasks 130-1 and 130-2. And you can check the alignment status between them. In the case of laminating a plurality of photomasks, since the pattern must be closely aligned, the plurality of photomasks must be precisely aligned, and a means for checking the alignment state must be separately devised.
이에, 본 발명에서는 포토 마스크 정렬 시스템(180)이 탑재된 정렬 장치를 고안하였으며, 이로써, 합지된 포토 마스크의 정렬상태를 정밀하게 확인할 수 있고, 노광 과정의 수행에 적합한 정렬 상태를 갖는 합지된 포토 마스크의 구현이 가능하게 되었다. Accordingly, in the present invention, an alignment device equipped with a photomask alignment system 180 is devised, whereby the alignment state of the laminated photomask can be precisely checked, and the laminated photo has an alignment suitable for performing the exposure process. The realization of the mask became possible.
보다 구체적으로, 상기 포토 마스크를 제작하는 과정은, 포토 마스크 상에 적어도 1개의 정렬 마크(145)를 생성하는 제1단계; 상기 정렬 마크(145)가 생성된 적어도 두 개의 포토 마스크들을 노광기의 포토 마스크 장착 프레임(170)에 1차 정렬하여 장착하는 제2단계; 상기 장착된 포토 마스크간 정렬 마크(145)의 위치를 확인하는 제3단계; 및 확인된 정렬 마크(145)의 위치에 따라서 정렬 상태의 완성 여부를 확정하는 제4단계;를 포함하며, 정렬상태가 미완성된 경우 상기 포토 마스크들을 2차 정렬한 후 상기 제3단계부터 다시 수행하게 된다.More specifically, the process of manufacturing the photomask may include: a first step of generating at least one alignment mark 145 on the photomask; a second step of first aligning and mounting at least two photomasks on which the alignment marks 145 are generated on a photomask mounting frame 170 of an exposure machine; a third step of confirming the positions of the alignment marks 145 between the mounted photomasks; and a fourth step of determining whether the alignment state is complete according to the confirmed position of the alignment mark 145; if the alignment state is not completed, the photomasks are secondarily aligned and then performed again from the third step will do
포토 마스크상에 생성되는 정렬 마크(145)는 바람직하게는 패턴이 형성된 영역을 벗어나서 표기되는 것이 좋다. 따라서 가장 무난한 위치로서는 사각의 포토 마스크 꼭지점 인근의 영역에 설치되는 것이 좋다.The alignment marks 145 generated on the photomask are preferably marked outside the region where the pattern is formed. Therefore, it is preferable that the photomask be installed in the area near the vertex of the rectangular photomask as the most comfortable position.
상기 정렬 마크(145)는 네개의 꼭지점에 모두 생성되어도 좋고, 최소한 장변의 양 단부에 생성되는 것도 바람직하다. 즉, 정렬 마크(145)는 단위 포토 마스크와 인접하는 단위 포토 마스크의 정렬 상태를 확인할 수 있도록 적합한 위치에 표기되는 것이 가장 바람직하다.The alignment marks 145 may be formed at all four vertices, or at least at both ends of the long side. That is, it is most preferable that the alignment mark 145 is marked at an appropriate position so that the alignment state of the unit photomask and the adjacent unit photomask can be checked.
정렬 마크(145)는 동일한 규격을 갖는 정렬 대상 포토 마스크의 동일한 좌표에 형성됨으로써, 정렬 상태의 확인을 규칙화할 수 있다. 포토 마스크간 정렬 상태의 확인이 완료되면 그대로 정렬 상태를 확정하여 다음 과정인 노광 과정으로 연결될 수 있도록 하며, 만일 정렬 상태가 미진하다고 판단되면 다시 정렬하여 재차 정렬 상태를 확인하도록 할 수 있다. 정렬 상태의 확인은 정렬 상태가 확정될 때까지 계속하여 수행될 수 있다. 상기 정렬상태의 완성여부는 각 포토 마스크에 형성된 정렬 마크와 정렬 기준부의 일치여부로부터 인정될 수 있다.The alignment marks 145 are formed at the same coordinates of an alignment target photomask having the same standard, so that the alignment state can be checked regularly. When the check of the alignment state between the photomasks is completed, the alignment state is confirmed as it is so that it can be connected to the exposure process, which is the next process. Checking the alignment status may be continuously performed until the alignment status is confirmed. The completion of the alignment state may be recognized from whether the alignment mark formed on each photomask matches the alignment reference unit.
정렬 상태의 확인은 포토 마스크 정렬 시스템(l80)에 의하여 수행된다. 본 시스템은 정렬 기준점(182)이 적어도 두 개 형성되며, 상기 정렬 기준점(182)은 정렬 마크(145)와 중첩되도록 위치되는 정렬 기준부(181); 및 상기 정렬 기준부(181)와 정렬 마크(145)의 중첩 상태를 촬영할 수 있는 위치에 장착되는 촬영 장치(183);를 포함한다. 다만, 상기 정렬 기준점(182) 중 적어도 하나는 복수의 포토 마스크 중 제1포토 마스크에 형성된 정렬 마크(145)에 중첩되고, 나머지는 제1포토 마스크에 인접하여 정렬된 제2포토 마스크에 형성된 정렬 마크(145)에 중첩된다. Confirmation of the alignment state is performed by the photo mask alignment system 180 . In the present system, at least two alignment reference points 182 are formed, and the alignment reference points 182 include an alignment reference unit 181 positioned to overlap the alignment mark 145; and a photographing device 183 mounted at a position capable of photographing the overlapping state of the alignment reference unit 181 and the alignment mark 145 . However, at least one of the alignment reference points 182 overlaps the alignment mark 145 formed on the first photomask among the plurality of photomasks, and the rest are aligned on the second photomask aligned adjacent to the first photomask. superimposed on mark 145 .
도시된 형태는 제1포토 마스크와 제2포토 마스크의 서로 인접되는 꼭지점 영역에 하나씩의 정렬 마크(145)가 형성된 형태를 나타낸다. 다만, 전술한 바와 같이 정렬 확인을 정밀하게 수행할 수 있다면 정렬 마크(145)의 갯수는 특별히 한정되는 것은 아니다. The illustrated shape shows a shape in which one alignment mark 145 is formed in the vertex regions adjacent to each other of the first photomask and the second photomask. However, the number of alignment marks 145 is not particularly limited as long as the alignment check can be precisely performed as described above.
정렬 기준부(181)는 투명체로 형성될 수 있다. 예를 들어 투명 기준부는 반투명을 이루도록 함으로써, 촬영시 빛의 반사에 의한 영향을 경감할 수 있다. 따라서, 정렬 기준점(182)과 정렬 마크(145)의 중첩상태는 육안으로도 확인할 수 있다. 아울러, 정렬 마크(145)는 포토 마스크의 윗면 또는 아랫면에 형성되며 정렬 마크(145)의 형성면은 어느 하나의 면으로 제한되는 것이 아님은 자명하다.The alignment reference unit 181 may be formed of a transparent material. For example, by making the transparent reference unit semi-transparent, the effect of light reflection during photographing can be reduced. Accordingly, the overlapping state of the alignment reference point 182 and the alignment mark 145 can be confirmed with the naked eye. In addition, it is obvious that the alignment mark 145 is formed on the upper surface or the lower surface of the photomask, and the formation surface of the alignment mark 145 is not limited to any one surface.
상기 포토 마스크 정렬 장치(180)는 포토 마스크의 상부에 위치하거나 하부에 위치할 수 있다. 즉, 포토 마스크가 거치된 거치부가 투명한 유리이기 때문에 포토 마스크의 하부에서도 정렬 상태를 확인할 수도 있다. The photomask alignment apparatus 180 may be located above or below the photomask. That is, since the mounting portion on which the photomask is mounted is made of transparent glass, it is possible to check the alignment state even under the photomask.
포토 마스크는 프레임(170) 상의 기준위치에 거치되는 것이 바람직하며, 정렬 시스템(180)은 이로써 포토 마스크의 정렬 상태를 확인할 수 있다. 이와 같이 포토 마스크의 거치 위치와 정렬 시스템(180)의 정렬 측정 위치에 대한 기준점이 설정되어야 빠른 시간에 포토 마스크(130) 정렬 상태를 용이하고 정밀하게 확인 및 확정할 수 있게 된다. The photomask is preferably mounted at a reference position on the frame 170 , and the alignment system 180 can check the alignment state of the photomask. In this way, the reference point for the mounting position of the photomask and the alignment measurement position of the alignment system 180 must be set so that the alignment state of the photomask 130 can be easily and precisely confirmed and confirmed in a short time.
정렬 상태의 확인은 촬영장치(183)가 수행하며, 촬영장치(183)에 의하여 촬영된 정렬 상태는 유무선 통신 수단에 의하여 제어부(미도시)로 전달되어 상기 제어부에서 정렬 상태를 확인한 후, 정렬 상태의 확정 여부를 결정하게 된다. 정렬 상태의 확인 결과 재정렬의 필요성이 있으면, 이는 다시 정렬 장치에 전달되어 해당 과정을 수행하도록 한다. The alignment state is checked by the photographing device 183, and the alignment state photographed by the photographing apparatus 183 is transmitted to a control unit (not shown) by wired/wireless communication means, and after checking the alignment state in the control unit, the alignment state decides whether to confirm or not. As a result of checking the alignment state, if there is a need for realignment, this is transmitted to the alignment device again to perform the corresponding process.
아울러, 상기 촬영 장치(183)는 상기 정렬 기준점(182)의 갯수만큼 구비되는 것이 바람직하나, 하나의 이동 가능한 촬영 장치(183)가 이동하면서 정렬 상태를 확인하도록 구성될 수도 있음은 물론이다.In addition, the photographing device 183 is preferably provided as many as the number of the alignment reference points 182 , but of course, one movable photographing device 183 may be configured to check the alignment state while moving.
도 2는 도 1의 정렬 장치를 측면에서 나타냄과 동시에 포토 마스크의 합지 및 정렬상태 확인을 위한 과정을 나타낸 것이며, 도 3은 본 발명의 일 실시예에 의한 포토 마스크 접합틀에 형성되는 제2 포토 마스크 흡착부를 노광기 장착 프레임과 함께 나타낸 도면이다. 2 is a view showing the alignment device of FIG. 1 from the side and at the same time showing a process for confirming the lamination and alignment state of the photomask, and FIG. 3 is a second photo formed in the photomask bonding frame according to an embodiment of the present invention. It is a figure which shows the mask adsorption part together with the exposure machine mounting frame.
본 발명에서는 두 개의 포토 마스크(130-1, 130-2)가 접합틀(230)에 고정되고 접합틀(230)에는 제2 포토 마스크 흡착부(231)가 구성되어 포토 마스크(130-1, 130-2)를 노광기로 이동하는 중에도 강하게 흡착 고정시켜주는 역할을 수행하며, 접합틀(230)은 노광기 장착 프레임(240)에 장착하여 노광과정을 수행하게 된다. 즉, 도 3과 같이 포토 마스크(130), 접합틀(230), 노광기 장착 프레임(240)을 세트로 하여 금속 판재에 노광을 함으로써 미세 금속 마스크를 제작하게 된다. 미세 금속 마스크의 제작과정은 공지의 기술이므로 구체적인 설명을 생략한다.In the present invention, two photomasks 130-1 and 130-2 are fixed to the bonding frame 230, and the second photomask adsorption unit 231 is configured in the bonding frame 230 to form the photomasks 130-1 and 130-2. 130-2) is strongly adsorbed and fixed while moving to the exposure machine, and the bonding frame 230 is mounted on the exposure machine mounting frame 240 to perform the exposure process. That is, as shown in FIG. 3 , a fine metal mask is manufactured by exposing the photomask 130 , the bonding frame 230 , and the exposure machine mounting frame 240 to a metal plate as a set. Since the manufacturing process of the fine metal mask is a known technique, a detailed description thereof will be omitted.
본 발명은 접합틀(230)에 구성된 제2 포토 마스크 흡착부(231)로 인하여 복수의 포토 마스크(130)는 확정된 정렬상태를 그대로 유지할 수 있다는 점을 하나의 특징으로 한다.One feature of the present invention is that the plurality of photomasks 130 can maintain a determined alignment state due to the second photomask adsorption unit 231 configured in the bonding frame 230 .
상기한 실시예는 그 설명을 위한 것이며, 그 제한을 위한 것이 아님을 주의하여야 한다. 또한, 본 발명의 기술분야의 통상의 전문가라면 본 발명의 기술사상의 범위에서 다양한 실시예가 가능함을 이해할 수 있을 것이다.It should be noted that the above-described embodiment is for illustrative purposes only, and not for its limitation. In addition, those skilled in the art will understand that various embodiments are possible within the scope of the technical idea of the present invention.

Claims (5)

  1. 포토 마스크 장착 프레임; photomask mounting frame;
    상기 포토 마스크 장착 프레임의 테두리에 형성되는 포토 마스크 흡착부;a photomask adsorption unit formed on an edge of the photomask mounting frame;
    정렬 기준점이 적어도 두 개 형성되며, 상기 정렬 기준점은 정렬 마크와 중첩되도록 위치되는 정렬 기준부; 및At least two alignment reference points are formed, the alignment reference point is an alignment reference portion positioned to overlap the alignment mark; and
    상기 정렬 기준부와 정렬 마크의 중첩 상태를 촬영할 수 있는 위치에 장착되는 촬영 장치;a photographing device mounted at a position capable of photographing the overlapping state of the alignment reference unit and the alignment mark;
    를 포함하되, 상기 정렬 기준점 중 적어도 하나는 복수의 포토 마스크 중 제1포토 마스크에 형성된 정렬 마크에 중첩되고, 나머지는 제1포토 마스크에 인접하여 정렬된 제2포토 마스크에 형성된 정렬 마크에 중첩되는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치.wherein at least one of the alignment reference points overlaps the alignment marks formed on the first photomask among the plurality of photomasks, and the rest overlaps the alignment marks formed on the second photomask aligned adjacent to the first photomask. A plurality of photomask alignment apparatus for manufacturing a fine metal mask for a large area display, characterized in that.
  2. 제1항에 있어서,According to claim 1,
    상기 포토 마스크 장착 프레임의 하부에 승강 가능하도록 마련되는 포토 마스크 승강바; 및a photomask lifting bar provided to be liftable at a lower portion of the photomask mounting frame; and
    상기 복수의 포토 마스크 합지시 경계면에서 포토 마스크들을 지지하는 지지 글라스;a support glass for supporting the photomasks at the interface when the plurality of photomasks are laminated;
    를 포함하는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치.A plurality of photomask alignment apparatus for manufacturing a fine metal mask for a large-area display, comprising:
  3. 제1항에 있어서,According to claim 1,
    상기 촬영 장치는 상기 정렬 기준점의 갯수만큼 구비되는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치.A plurality of photomask alignment apparatus for manufacturing a fine metal mask for a large-area display, characterized in that the photographing apparatus is provided as much as the number of alignment reference points.
  4. 포토 마스크 장착 프레임; photomask mounting frame;
    상기 포토 마스크 장착 프레임의 테두리에 형성되는 포토 마스크 흡착부;a photomask adsorption unit formed on an edge of the photomask mounting frame;
    정렬 기준점이 적어도 두 개 형성되며, 상기 정렬 기준점은 정렬 마크와 중첩되도록 위치되는 정렬 기준부; 및At least two alignment reference points are formed, the alignment reference point is an alignment reference portion positioned to overlap the alignment mark; and
    상기 정렬 기준부와 정렬 마크의 중첩 상태를 촬영할 수 있는 위치에 장착되는 촬영 장치;a photographing device mounted at a position capable of photographing the overlapping state of the alignment reference unit and the alignment mark;
    를 포함하되, 상기 정렬 기준점 중 적어도 하나는 복수의 포토 마스크 중 제1포토 마스크에 형성된 정렬 마크에 중첩되고, 나머지는 제1포토 마스크에 인접하여 정렬된 제2포토 마스크에 형성된 정렬 마크에 중첩되며,wherein at least one of the alignment reference points overlaps an alignment mark formed on the first photomask among the plurality of photomasks, and the remainder overlaps an alignment mark formed on a second photomask aligned adjacent to the first photomask, ,
    상기 포토 마스크의 상부로부터 상기 포토 마스크를 지지하기 위한 접합틀을 더 포함하고, 상기 접합틀 중 상기 포토 마스크와 접하는 면의 적어도 일부에는 제2 포토 마스크 흡착부가 형성되는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치.and a bonding frame for supporting the photomask from an upper portion of the photomask, wherein a second photomask adsorption unit is formed on at least a portion of a surface of the bonding frame in contact with the photomask. A plurality of photomask alignment devices for manufacturing fine metal masks.
  5. 제1항의 정렬장치에 의하여 수행되며,It is performed by the alignment device of claim 1,
    포토 마스크 상에 적어도 1개의 정렬 마크를 생성하는 제1단계;a first step of creating at least one alignment mark on the photo mask;
    상기 정렬 마크가 생성된 적어도 두 개의 포토 마스크들을 노광기의 포토 마스크 장착 프레임에 1차 정렬하여 장착하는 제2단계;a second step of first aligning and mounting the at least two photomasks on which the alignment marks are generated on a photomask mounting frame of an exposure machine;
    상기 장착된 포토 마스크간 정렬 마크의 위치를 확인하는 제3단계; 및a third step of confirming the positions of the alignment marks between the mounted photomasks; and
    확인된 정렬 마크의 위치에 따라서 정렬 상태의 완성 여부를 확정하는 제4단계;A fourth step of determining whether the alignment state is completed according to the confirmed position of the alignment mark;
    를 포함하고,including,
    상기 정렬상태의 완성여부는 각 포토 마스크에 형성된 정렬 마크와 정렬 기준부의 일치여부로부터 인정되며, 정렬상태가 미완성된 경우 상기 포토 마스크들을 2차 정렬한 후 상기 제3단계부터 다시 수행하는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬방법.Completion of the alignment state is recognized from whether the alignment mark formed on each photomask matches the alignment reference unit, and if the alignment state is not completed, the photomasks are secondarily aligned and then performed again from the third step. A method of aligning a plurality of photomasks for manufacturing a fine metal mask for a large-area display.
PCT/KR2022/001003 2021-02-01 2022-01-19 Device and method for aligning multiple photomasks for manufacturing fine metal mask for large-area display WO2022164123A1 (en)

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