CN101900933A - Base plate based on mask plate exposure process and aligning method thereof - Google Patents
Base plate based on mask plate exposure process and aligning method thereof Download PDFInfo
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- CN101900933A CN101900933A CN2009100858435A CN200910085843A CN101900933A CN 101900933 A CN101900933 A CN 101900933A CN 2009100858435 A CN2009100858435 A CN 2009100858435A CN 200910085843 A CN200910085843 A CN 200910085843A CN 101900933 A CN101900933 A CN 101900933A
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Abstract
The invention relates to a base plate based on a mask plate exposure process and an aligning method thereof, wherein the mask plate comprises three exposure regions, i.e. a right exposure region, a middle exposure region and a left exposure region, and the middle exposure region of the mask plate is provided with mask plate aligning marks which are symmetrical with respect to the midline of the middle exposure region of the mask plate; the base plate comprises a right exposure region positioned in the right side of the base plate, a plurality of middle exposure regions and a left exposure region positioned in the left side of the base plate, the left and right sides of the upper and lower edges of each middle exposure region of the base plate are respectively provided with base plate aligning marks to be aligned with the mask plate, and the base plate aligning marks are aligning sub-marks which are arranged side by side, are equal in spacing and are same in shape. The invention can effectively solve the problem of imprecise edge alignment of the base plate based on the mask plate exposure process in the prior art, and enables each part to have the same alignment precision during the alignment and exposure of the base plate based on the mask plate exposure process.
Description
Technical field
The present invention relates to a kind of LCD manufacture method, especially a kind ofly use the substrate of mask plate exposure technology and, belong to mask plate exposure technique field method for position.
Background technology
Fast development along with Thin Film Transistor-LCD (being called for short TFT-LCD) technology, the size of liquid crystal panel is also in continuous increase, in order to produce larger sized liquid crystal panel, need set up new production line, the production line of advanced lines more particularly, so not only invest hugely, and risk is also very big.Therefore, on present production line, come the substrate of Development and Production large-size LCD to become an effective solution.
Fig. 1 is the existing mask plate structure synoptic diagram that uses the mask plate exposure technology to make substrate.As shown in Figure 1, generally this mask plate can be divided into three different part A 1, B1 and C1, various piece is used to block this mask plate by two and wants the shield bars 11 at edge, exposure area to separate; In the both sides of the center line of this mask plate, promptly " ☆ " location of B1 part is provided with the alignment mark 12 that is used for contraposition.Fig. 2 is the existing structural representation that uses the substrate of mask plate exposure technology.As shown in Figure 2, the alignment mark 21 that the alignment mark that is provided with on the B2 of this substrate partly is provided with mask plate with Fig. 1 12 is corresponding, be used for mask plate and substrate are carried out contraposition, the center section B1 of use mask plate partly exposes to the B2 of substrate, the A1 that use is positioned at the edge of mask plate partly partly exposes to the edge A2 of substrate, uses the C1 part at the edge that is positioned at mask plate that edge C 2 parts of substrate are exposed.The method that different piece by using mask plate is carried out the contraposition exposure to the different piece of this substrate is spliced to form the substrate of large-sized LCD.
In the ordinary course of things, because the restriction of mask plate and equipment self condition, on mask plate shown in Figure 1, can only form a pair of alignment mark 12 in the both sides and the close center that with the center are symmetry, promptly in the B1 part, so, in technique scheme, when the different piece of substrate shown in Figure 2 being carried out the contraposition exposure, the B2 that only is positioned in the middle of the panel partly carries out accurate contraposition, partly is not by contraposition and be positioned at the A2 at panel two ends and C2.A2 and C2 partly just rely on the precision of hardware device itself to carry out the control of position.Therefore, also just make far short of what is expected than B2 part of the alignment precision (Overlay) of A2 and C2 part.Process data from reality, the alignment precision of B2 part on X and the Y both direction all in ± 0.6 μ m, the alignment precision of A2 and C2 part then through be everlasting ± 4.0 μ m about, and numerical value is very unstable, mask plate shown in Figure 1 is used in carries out contraposition when exposure on the different substrates, A2 and C2 part to different substrates more can obtain diverse result, and promptly the alignment precision of the A2 of substrate and C2 part may be suddenly big or suddenly small, and is unexpected fully.
Summary of the invention
The purpose of this invention is to provide and a kind ofly use the substrate of mask plate exposure technology and method for position, effectively solve in the prior art using the mask plate coarse problem of edge contraposition of the substrate of exposure technology step by step, when feasible substrate to use mask plate exposure technology carried out substep contraposition exposure, the alignment precision of each part was identical.
To achieve these goals, the invention provides a kind of substrate that uses the mask plate exposure technology, described mask plate comprises three exposure areas, be respectively the exposure area, right side, exposure area, middle part and exposure area, left side, the exposure area, middle part of described mask plate is provided with the mask plate alignment mark about exposure area, the middle part center line symmetry of mask plate, described substrate comprises the exposure area, right side that is positioned at the substrate right side, exposure area, a plurality of middle part and the exposure area, left side that is positioned at the substrate left side, the left and right sides of lower limb is respectively arranged with the substrate alignment mark that carries out contraposition with mask plate on each exposure area, middle part of described substrate, described substrate alignment mark be three placed side by side, spacing equates, shape identical to the seat mark, wherein
First pair of seat mark is used for carrying out contraposition with described mask plate alignment mark and exposes with the exposure area, right side to described substrate;
Second pair of seat mark is used for carrying out contraposition with described mask plate alignment mark and carries out the substep exposure with each exposure area, middle part to described substrate, described second pair of seat mark is adjacent with described first pair of seat mark, is positioned at the right side of described first pair of seat mark;
The 3rd pair of seat mark is used for carrying out contraposition with described mask plate alignment mark and exposes with the exposure area, left side to described substrate, and described the 3rd pair of seat mark is adjacent with described second pair of seat mark, is positioned at the right side of described second pair of seat mark.
Described second pair of seat mark is about the center line symmetry of each exposure area, middle part of described substrate.
The adjacent exposure area of described mask plate is isolated by shield bars, the adjacent described width that distance between the mark of seat is equaled described shield bars.Perhaps, the adjacent exposure area of described mask plate is isolated by shield bars, and the shield bars both sides of each adjacent exposure area also comprise the repeated exposure zone, adjacent described be the width of described shield bars and the width sum in one-sided described repeated exposure zone to the distance between the mark of seat.
Three described draws together thick alignment mark and accurate alignment mark to the seat marks packets, respectively with described mask plate on alignment mark carry out contraposition.Described accurate alignment mark comprises one or more horizontal line and one or more vertical line.
The present invention also provide a kind of substrate that uses the mask plate exposure technology to method for position, described mask plate comprises three exposure areas, be respectively exposure area, right side, exposure area, middle part and exposure area, left side, the exposure area, middle part of described mask plate is provided with the mask plate alignment mark about exposure area, the middle part center line symmetry of mask plate, described substrate comprises exposure area, right side, the exposure area, a plurality of middle part that is positioned at the substrate right side and is positioned at the exposure area, left side in substrate left side, comprising:
Adopt described mask plate alignment mark to carry out contraposition with the substrate alignment mark that the left and right sides of the last lower limb of each exposure area, middle part of described substrate is provided with respectively, described substrate alignment mark be three placed side by side, spacing equal, shape is identical to the seat mark;
The substep exposure is carried out in exposure area, left side, each exposure area, middle part and exposure area, right side to the described substrate after the contraposition.
The adjacent exposure area of described mask plate is isolated by shield bars, or the adjacent exposure area of described mask plate is isolated by shield bars and the shield bars both sides of each adjacent exposure area also comprise the repeated exposure zone, and the described mask plate alignment mark of then described employing carries out contraposition with the substrate alignment mark of the left and right sides setting of the last lower limb of each exposure area, middle part of described substrate respectively and specifically comprises:
Adopt first pair of seat mark on described mask plate alignment mark and the described substrate to carry out the contraposition of the exposure area, right side of the exposure area, right side of described mask plate and described substrate;
Adopt second pair of seat mark on described mask plate alignment mark and the described substrate to carry out the contraposition of each exposure area, middle part of the exposure area, middle part of described mask plate and described substrate, described second pair of seat mark is adjacent with described first pair of seat mark, is positioned at the right side of described first pair of seat mark;
Adopt the 3rd pair of seat mark on described mask plate alignment mark and the described substrate to carry out the contraposition of the exposure area, left side of the exposure area, left side of described mask plate and described substrate, described the 3rd pair of seat mark is adjacent with described second pair of seat mark, is positioned at the right side of described second pair of seat mark.
Described second pair of seat mark is about the center line symmetry of each exposure area, middle part of described substrate.
Three of formation are described to the seat mark on described substrate, adjacently described distance between the mark of seat is equaled the width of described shield bars, perhaps adjacent described be the width sum in the one-sided repeated exposure zone of the width of described shield bars and described shield bars to the distance between the mark of seat.
The invention provides and a kind ofly use the substrate of mask plate exposure technology and method for position, by each alignment mark on substrate go out to form three placed side by side, spacing equates, shape is identical to the seat mark, can effectively solve in the prior art the coarse problem of edge contraposition to the substrate that uses the mask plate exposure technology, when feasible substrate to use mask plate exposure technology carried out the contraposition exposure, the alignment precision of each part was identical.
Description of drawings
Fig. 1 is the existing mask plate structure synoptic diagram that uses the mask plate exposure technology to make substrate;
Fig. 2 is the existing structural representation that uses the substrate of mask plate exposure technology;
Fig. 3 uses the structural representation of the substrate embodiment of mask plate exposure technology for the present invention;
Fig. 4 is the structural representation of mask plate of the present invention;
Fig. 5 A is the structural representation of the substrate alignment mark on the substrate of use mask plate exposure technology shown in Figure 3;
Fig. 5 B is another structural representation of the substrate alignment mark on the substrate of use mask plate exposure technology shown in Figure 3;
Fig. 6 A is the structural representation of mask plate alignment mark shown in Figure 4;
Fig. 6 B is another structural representation of mask plate alignment mark shown in Figure 4;
Fig. 7 carries out the synoptic diagram of contraposition exposure for the present invention adopts mask plate to substrate;
Fig. 8 uses the schematic flow sheet to method for position embodiment of the substrate of mask plate exposure technology for the present invention.
Embodiment
Below by drawings and Examples, technical scheme of the present invention is described in further detail.
Fig. 3 uses the structural representation of the substrate embodiment of mask plate exposure technology for the present invention, and Fig. 4 is the structural representation of mask plate of the present invention.As shown in Figure 3, comprise a plurality of exposure areas on this substrate, each exposure area, middle part that is positioned at the substrate middle part is labeled as B3, the exposure area, left side and the exposure area, right side that are positioned at the substrate both sides are labeled as A3 and C3 respectively, the repeated exposure zone that produces when wherein diagonal line hatches is partly exposed to each exposure area for the diagonal line hatches zone on the employing mask plate as shown in Figure 4, and partly the expose figure of back formation of the figure that twice the repeated exposure zone of exposing forms and the B3 in the middle of the substrate is identical, diagonal line hatches zone on the mask plate as shown in Figure 4 is also referred to as the repeated exposure zone corresponding to the repeated exposure zone on the substrate.Be respectively arranged with the substrate alignment mark 31 that is used for carrying out with mask plate alignment mark shown in Figure 4 41 contraposition at the coboundary of exposure area B3 shown in Figure 3 and the left and right sides of lower limb, substrate alignment mark 31 positions are shown in " ☆ " mark among Fig. 3.As shown in Figure 4, mask plate has three exposure areas, and adjacent exposure area is isolated by shield bars, three exposure areas are respectively A4, B4 and C4, also shown in " ☆ " mark, wherein the diagonal line hatches zone is for repeating the exposure area in mask plate alignment mark 41 positions, and black lines is a shield bars 42.Wherein the setting of the shield bars among Fig. 4 42 be because: to the exposure of substrate also is to adopt the various piece of mask plate to expose respectively, therefore for example when the B4 that adopts mask plate partly exposes, the A4 and the C4 of mask plate partly need be blocked, can slightly exceed substrate owing to be used to block the baffle plate of A4 and C4, therefore the edge that is exposed the zone at substrate can form unclear zone owing to reflection of light, this is located unclear zone can be by forming unclear zone with the meeting on the substrate and block in that shield bars 42 being set on the mask plate, thereby avoid reflection of light, answer exposed areas to form figure clearly at substrate.
Fig. 5 A is the structural representation of the substrate alignment mark on the substrate of use mask plate exposure technology shown in Figure 3, and Fig. 6 A is the structural representation of mask plate alignment mark shown in Figure 4.Shown in Fig. 5 A, substrate alignment mark 31 (as shown in Figure 3) be three placed side by side, spacing equates, shape is identical to the seat mark, is respectively M1, M2 and M3.As shown in Figure 6A, mask plate alignment mark 41 is arranged on the mask plate, and identical with the coordinate position on the substrate to seat mark M2, promptly mask plate alignment mark 41 (as shown in Figure 4) apart from the distance of the center line of B4 part with seat mark M2 is equated apart from the distance of the center line of B3 part.First couple of seat mark M1 is used for carrying out contraposition with mask plate alignment mark 41 and partly exposes with exposure area, the left side A3 to substrate; Second couple of seat mark M2 is used for carrying out contraposition with mask plate alignment mark 41 and partly carries out the substep exposure with each middle part exposure area B3 to substrate, this second couple of seat mark M2 is adjacent with first couple of seat mark M1, is positioned at the right side of first couple of seat mark M1; The 3rd couple of seat mark M3 is used for carrying out contraposition with mask plate alignment mark 41 and partly exposes with exposure area, the right side C3 to substrate, and the 3rd couple of seat mark M3 is adjacent with second couple of seat mark M2, is positioned at the right side of second couple of seat mark M2.
Wherein, the second couple of seat mark M2 is about the center line symmetry of each middle part exposure area B3 of substrate.
The alignment procedures of substrate alignment mark shown in Fig. 5 A and Fig. 6 A and mask plate alignment mark promptly is, the base station of mobile mask plate or bearing substrate, make on mask plate alignment mark 41 align substrates to seat mark M1, M2 or M3.Wherein, if adopt the alignment mark shape shown in Fig. 5 A and Fig. 6 A, then concrete alignment procedures is: at first each the sphere of movements for the elephants shape figure to mark right side, seat shown in Fig. 5 A is placed among " mouth " font figure on the mask plate alignment mark right side shown in Fig. 6 A, carry out thick contraposition; And then fine setting, when on the substrate to the horizontal line contraposition in the left side among seat mark M1, M2 or the M3 centre to two horizontal lines in the left side of mask plate alignment mark 41, during to two vertical lines in the left side of mask plate alignment mark 41 middle, promptly can obtain contraposition comparatively accurately to the vertical line contraposition in the left side among seat mark M1, M2 or the M3 on the substrate.Shown in Fig. 5 A, wherein to being the width d2 sum in one-sided repeated exposure zone on the width d1 of the shield bars on the mask plate 42 and the mask plate apart from d between seat mark M1, M2 and the M3; Perhaps when there not being repeated exposure when zone, to equaling the width d1 of the shield bars 42 on the mask plate apart from d between seat mark M1, M2 and the M3.
Fig. 5 B is another structural representation of the substrate alignment mark on the substrate of use mask plate exposure technology shown in Figure 3, and Fig. 6 B is another structural representation of mask plate alignment mark shown in Figure 4.Its difference with Fig. 5 A and Fig. 6 A is: linear " ten " font for intersecting of the left side mark of the substrate alignment mark shown in Fig. 5 B, the left side mark of the mask plate alignment mark shown in Fig. 6 B is linear to be " # " font, remain with horizontal line shown in Fig. 5 B and vertical line respectively contraposition between two horizontal lines shown in Fig. 6 B and two vertical lines.Need to prove, shape shown in being used for the shape that substrate and mask plate carry out the alignment mark of contraposition is not limited to illustrate, the arbitrary shape that substrate and mask plate can be carried out the alignment mark of contraposition all belong to the structure of alignment mark involved in the present invention.
Fig. 7 carries out the synoptic diagram of contraposition exposure for the present invention adopts mask plate to substrate.As shown in Figure 7, how now specify the substrate that uses the mask plate exposure technology is exposed.As shown in Figure 7, with mask plate the A3 on the substrate is partly carried out the contraposition exposure earlier, it is the #1 place, position as the mask plate contraposition place of top among Fig. 7, adopt on mask plate alignment mark 41 align substrates to seat mark M3, the shield bars of mask plate upper left side is positioned at the right side of repeated exposure zone A3B3 at this moment, and to the A3 part of substrate, promptly the #1 place carries out the contraposition exposure then; Afterwards, mask plate is moved to the left apart from d or with the base station of bearing substrate moves right apart from d, position as the mask plate contraposition place of below among Fig. 7, adopt on mask plate alignment mark 41 align substrates to seat mark M2, shield bars 42 is positioned at the outside in repeated exposure zone, B3 part both sides, thereby to the B3 part, promptly the #2 place carries out the contraposition exposure.So by that analogy, adopt mask plate alignment mark 41 aim on the substrate shown in Figure 3 the B3 of #3/#4/#5/#6 place partly to seat mark M2, B3 is partly carried out the contraposition exposure, the mask plate that to partly aim at the B3 of #6 place substrate moves right and is moved to the left apart from d apart from d or with the base station of bearing substrate at last, adopt on mask plate alignment mark 41 align substrates to seat mark M1, to the C3 part of substrate, promptly the #7 place carries out the contraposition exposure then.Thereby finish contraposition exposure to whole base plate.Need to prove, exposure to each exposure area of the substrate of this use mask plate exposure technology can change in proper order, for example, the exposure order can be #2-#1-#3-#4-#5-#6-#7, as long as adopt the alignment mark contraposition accurately with reference to aforesaid way.
The scheme that the embodiment of the invention provides, the alignment precision of the exposure area of the alignment precision of the exposure area of both sides and center section relatively on the substrate, positional precision when difference is to form alignment mark on glass substrate, and form on the glass substrate three have only d to the distance between the mark of seat, d is generally 10mm, and with forming in an exposure process, so for the exposure process of whole base plate, this error can be ignored.That is to say that the alignment precision of the exposure area of both sides can reach the alignment precision of the exposure area of center section on the substrate.
Fig. 8 uses the schematic flow sheet to method for position embodiment of the substrate of mask plate exposure technology for the present invention.Mask plate comprises three exposure areas, be respectively exposure area, right side, exposure area, middle part and exposure area, left side, the exposure area, middle part of mask plate is provided with the mask plate alignment mark about exposure area, the middle part center line symmetry of mask plate, substrate comprises exposure area, right side, the exposure area, a plurality of middle part that is positioned at the substrate right side and is positioned at the exposure area, left side in substrate left side, as shown in Figure 8, comprise the steps:
The substep exposure is carried out in step 802, the exposure area, left side to the substrate after the contraposition, each exposure area, middle part and exposure area, right side.
Wherein, the adjacent exposure area of described mask plate is isolated by shield bars, or the adjacent exposure area of mask plate is isolated by shield bars and the shield bars both sides of each adjacent exposure area also comprise the repeated exposure zone, and then the described mask plate alignment mark of the employing in the step 801 carries out contraposition with the substrate alignment mark of the left and right sides setting of the last lower limb of each exposure area, middle part of described substrate respectively and specifically can comprise:
Step 801a, adopt first pair of seat mark on mask plate alignment mark and the substrate to carry out the contraposition of the exposure area, right side of the exposure area, right side of mask plate and substrate;
Step 801b, adopt mask plate alignment mark and second pair of seat mark on the substrate to carry out the contraposition of exposure area in the middle part of each of the exposure area, middle part of mask plate and substrate, this second pair of seat mark is adjacent with first pair of seat mark, is positioned at the right side of first pair of seat mark;
Step 801c, adopt the 3rd pair of seat mark on mask plate alignment mark and the substrate to carry out the contraposition of the exposure area, left side of the exposure area, left side of mask plate and substrate, the 3rd pair of seat mark is adjacent with second pair of seat mark, is positioned at the right side of second pair of seat mark.
Need to prove that the order of step 801a, step 801b and step 801c is not limit; And the second pair of seat mark is about the center line symmetry of each exposure area, middle part of substrate.
Before step 801, can also comprise: step 803, on substrate, form three the seat mark, adjacent distance between the mark of seat is equaled the width of shield bars, perhaps adjacent is the width sum in the one-sided repeated exposure zone of the width of shield bars and shield bars to the distance between the mark of seat.
The substrate of the described use mask plate of present embodiment exposure technology to the description among the substrate embodiment of the structure of the alignment mark on the substrate in the method for position, mask plate and substrate and the mask plate such as above-mentioned use mask plate exposure technology, do not repeat them here.
The invention provides a kind of substrate that uses the mask plate exposure technology to method for position, by each alignment mark on substrate go out to form three placed side by side, spacing equates, shape is identical to the seat mark, can effectively solve in the prior art the coarse problem of edge contraposition to the substrate that uses the mask plate exposure technology, when feasible substrate to use mask plate exposure technology carried out the contraposition exposure, the alignment precision of each part was identical.
It should be noted that at last: above embodiment is only unrestricted in order to technical scheme of the present invention to be described, although the present invention is had been described in detail with reference to preferred embodiment, those of ordinary skill in the art is to be understood that, can make amendment or be equal to replacement technical scheme of the present invention, and not break away from the spirit and scope of technical solution of the present invention.
Claims (10)
1. substrate that uses the mask plate exposure technology, described mask plate comprises three exposure areas, be respectively the exposure area, right side, exposure area, middle part and exposure area, left side, the exposure area, middle part of described mask plate is provided with the mask plate alignment mark about exposure area, the middle part center line symmetry of mask plate, described substrate comprises the exposure area, right side that is positioned at the substrate right side, exposure area, a plurality of middle part and the exposure area, left side that is positioned at the substrate left side, it is characterized in that, the left and right sides of lower limb is respectively arranged with the substrate alignment mark that carries out contraposition with mask plate on each exposure area, middle part of described substrate, described substrate alignment mark be three placed side by side, spacing equates, shape identical to the seat mark, wherein
First pair of seat mark is used for carrying out contraposition with described mask plate alignment mark and exposes with the exposure area, right side to described substrate;
Second pair of seat mark is used for carrying out contraposition with described mask plate alignment mark and carries out the substep exposure with each exposure area, middle part to described substrate, described second pair of seat mark is adjacent with described first pair of seat mark, is positioned at the right side of described first pair of seat mark;
The 3rd pair of seat mark is used for carrying out contraposition with described mask plate alignment mark and exposes with the exposure area, left side to described substrate, and described the 3rd pair of seat mark is adjacent with described second pair of seat mark, is positioned at the right side of described second pair of seat mark.
2. the substrate of use mask plate exposure technology according to claim 1 is characterized in that, described second pair of seat mark is about the center line symmetry of each exposure area, middle part of described substrate.
3. the substrate of use mask plate exposure technology according to claim 1 and 2 is characterized in that, the adjacent exposure area of described mask plate is isolated by shield bars, the adjacent described width that distance between the mark of seat is equaled described shield bars.
4. the substrate of use mask plate exposure technology according to claim 1 and 2, it is characterized in that, the adjacent exposure area of described mask plate is isolated by shield bars, and the shield bars both sides of each adjacent exposure area also comprise the repeated exposure zone, adjacent described be the width of described shield bars and the width sum in one-sided described repeated exposure zone to the distance between the mark of seat.
5. the substrate of use mask plate exposure technology according to claim 1 and 2 is characterized in that, three described draws together thick alignment mark and accurate alignment mark to the seat marks packets, respectively with described mask plate on alignment mark carry out contraposition.
6. the substrate of use mask plate exposure technology according to claim 5 is characterized in that, described accurate alignment mark comprises one or more horizontal line and one or more vertical line.
7. a substrate that uses the mask plate exposure technology to method for position, described mask plate comprises three exposure areas, be respectively exposure area, right side, exposure area, middle part and exposure area, left side, the exposure area, middle part of described mask plate is provided with the mask plate alignment mark about exposure area, the middle part center line symmetry of mask plate, described substrate comprises exposure area, right side, the exposure area, a plurality of middle part that is positioned at the substrate right side and is positioned at the exposure area, left side in substrate left side, it is characterized in that, comprising:
Adopt described mask plate alignment mark to carry out contraposition with the substrate alignment mark that the left and right sides of the last lower limb of each exposure area, middle part of described substrate is provided with respectively, described substrate alignment mark be three placed side by side, spacing equal, shape is identical to the seat mark;
The substep exposure is carried out in exposure area, left side, each exposure area, middle part and exposure area, right side to the described substrate after the contraposition.
8. the substrate of use mask plate exposure technology according to claim 7 to method for position, it is characterized in that, the adjacent exposure area of described mask plate is isolated by shield bars, or the adjacent exposure area of described mask plate is isolated by shield bars and the shield bars both sides of each adjacent exposure area also comprise the repeated exposure zone, and the described mask plate alignment mark of then described employing carries out contraposition with the substrate alignment mark of the left and right sides setting of the last lower limb of each exposure area, middle part of described substrate respectively and specifically comprises:
Adopt first pair of seat mark on described mask plate alignment mark and the described substrate to carry out the contraposition of the exposure area, right side of the exposure area, right side of described mask plate and described substrate;
Adopt second pair of seat mark on described mask plate alignment mark and the described substrate to carry out the contraposition of each exposure area, middle part of the exposure area, middle part of described mask plate and described substrate, described second pair of seat mark is adjacent with described first pair of seat mark, is positioned at the right side of described first pair of seat mark;
Adopt the 3rd pair of seat mark on described mask plate alignment mark and the described substrate to carry out the contraposition of the exposure area, left side of the exposure area, left side of described mask plate and described substrate, described the 3rd pair of seat mark is adjacent with described second pair of seat mark, is positioned at the right side of described second pair of seat mark.
9. the substrate of use mask plate exposure technology according to claim 8 to method for position, it is characterized in that, described second pair of seat mark about described substrate each the middle part exposure area the center line symmetry.
According to Claim 8 or the substrate of 9 described use mask plate exposure technologys to method for position, it is characterized in that, also comprise: three of formation are described to the seat mark on described substrate, adjacently described distance between the mark of seat is equaled the width of described shield bars, perhaps adjacent described be the width sum in the one-sided repeated exposure zone of the width of described shield bars and described shield bars to the distance between the mark of seat.
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| CN2009100858435A CN101900933A (en) | 2009-06-01 | 2009-06-01 | Base plate based on mask plate exposure process and aligning method thereof |
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| CN2009100858435A CN101900933A (en) | 2009-06-01 | 2009-06-01 | Base plate based on mask plate exposure process and aligning method thereof |
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