CN101661220B - Liquid crystal display panel and mask plate - Google Patents
Liquid crystal display panel and mask plate Download PDFInfo
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- CN101661220B CN101661220B CN2008101191369A CN200810119136A CN101661220B CN 101661220 B CN101661220 B CN 101661220B CN 2008101191369 A CN2008101191369 A CN 2008101191369A CN 200810119136 A CN200810119136 A CN 200810119136A CN 101661220 B CN101661220 B CN 101661220B
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN2008101191369A CN101661220B (en) | 2008-08-27 | 2008-08-27 | Liquid crystal display panel and mask plate |
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CN2008101191369A CN101661220B (en) | 2008-08-27 | 2008-08-27 | Liquid crystal display panel and mask plate |
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CN101661220A CN101661220A (en) | 2010-03-03 |
CN101661220B true CN101661220B (en) | 2013-03-13 |
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CN2008101191369A Active CN101661220B (en) | 2008-08-27 | 2008-08-27 | Liquid crystal display panel and mask plate |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103176306A (en) * | 2013-03-22 | 2013-06-26 | 京东方科技集团股份有限公司 | Colorized film substrate, manufacturing method thereof, liquid crystal panel and display device |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5306391B2 (en) * | 2011-03-02 | 2013-10-02 | 株式会社東芝 | Photo mask |
CN102832109A (en) * | 2011-06-15 | 2012-12-19 | 广东中显科技有限公司 | Method for strengthening thin film in flexible thin film transistor manufacturing process |
CN102650819B (en) * | 2011-08-03 | 2014-07-02 | 京东方科技集团股份有限公司 | Photo mask and positioning method of photo mask |
CN102867823B (en) * | 2012-09-27 | 2015-05-27 | 合肥京东方光电科技有限公司 | Array substrate and manufacturing method and display device thereof |
CN103366648B (en) * | 2013-07-24 | 2015-06-17 | 京东方科技集团股份有限公司 | Substrate, display screen, spliced screen and alignment method for spliced screen |
CN103499902B (en) * | 2013-08-15 | 2015-12-23 | 京东方科技集团股份有限公司 | A kind of range regulate and control method of substrate and device |
CN104570611B (en) * | 2013-10-21 | 2016-06-08 | 合肥京东方光电科技有限公司 | Mask plate and improvement splicing exposure nurse thereof draw the method for phenomenon |
CN103744214B (en) * | 2013-12-31 | 2016-08-17 | 深圳市华星光电技术有限公司 | A kind of exposure method of the glass substrate of liquid crystal display |
CN104317158B (en) * | 2014-11-14 | 2018-05-22 | 京东方科技集团股份有限公司 | A kind of mask plate, mask plate group, color membrane substrates and display device |
CN105759564B (en) * | 2016-03-17 | 2020-04-17 | 京东方科技集团股份有限公司 | Mask plate and manufacturing method thereof |
KR20180078409A (en) * | 2016-12-29 | 2018-07-10 | 엘지디스플레이 주식회사 | Display Device and Method for Manufacturing thereof |
CN106502060B (en) * | 2017-01-03 | 2018-09-18 | 京东方科技集团股份有限公司 | A kind of display base plate, display panel and display device |
CN107195639B (en) | 2017-06-27 | 2020-04-03 | 京东方科技集团股份有限公司 | Preparation method of array substrate mother board, array substrate mother board and detection method |
CN107505754A (en) * | 2017-09-20 | 2017-12-22 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and liquid crystal display |
CN110716359A (en) * | 2019-10-14 | 2020-01-21 | 深圳市华星光电技术有限公司 | Array substrate, manufacturing method thereof and alignment precision detection method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1524202A (en) * | 2001-08-27 | 2004-08-25 | 三星电子株式会社 | Exposure mask for fabricating liquid crystal display and method for exposing substrate in fabricating liquid crystal display using the mask |
CN1658073A (en) * | 2004-02-18 | 2005-08-24 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method with feed-forward focus control |
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2008
- 2008-08-27 CN CN2008101191369A patent/CN101661220B/en active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1524202A (en) * | 2001-08-27 | 2004-08-25 | 三星电子株式会社 | Exposure mask for fabricating liquid crystal display and method for exposing substrate in fabricating liquid crystal display using the mask |
CN1658073A (en) * | 2004-02-18 | 2005-08-24 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method with feed-forward focus control |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103176306A (en) * | 2013-03-22 | 2013-06-26 | 京东方科技集团股份有限公司 | Colorized film substrate, manufacturing method thereof, liquid crystal panel and display device |
WO2014146369A1 (en) * | 2013-03-22 | 2014-09-25 | 京东方科技集团股份有限公司 | Color film substrate, manufacturing method therefor, and display panel and display device thereof |
Also Published As
Publication number | Publication date |
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CN101661220A (en) | 2010-03-03 |
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Legal Events
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ASS | Succession or assignment of patent right |
Owner name: BEIJING BOE PHOTOELECTRICITY SCIENCE + TECHNOLOGY Effective date: 20150623 Owner name: JINGDONGFANG SCIENCE AND TECHNOLOGY GROUP CO., LTD Free format text: FORMER OWNER: BEIJING BOE PHOTOELECTRICITY SCIENCE + TECHNOLOGY CO., LTD. Effective date: 20150623 |
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C41 | Transfer of patent application or patent right or utility model | ||
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Effective date of registration: 20150623 Address after: 100015 Jiuxianqiao Road, Beijing, No. 10, No. Patentee after: BOE Technology Group Co., Ltd. Patentee after: Beijing BOE Photoelectricity Science & Technology Co., Ltd. Address before: 100176 Beijing economic and Technological Development Zone, West Central Road, No. 8 Patentee before: Beijing BOE Photoelectricity Science & Technology Co., Ltd. |
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Effective date of registration: 20201201 Address after: 215200 No. 1700, Wujiang economic and Technological Development Zone, Suzhou, Jiangsu, Zhongshan North Road Patentee after: Gaochuang (Suzhou) Electronics Co.,Ltd. Patentee after: BOE TECHNOLOGY GROUP Co.,Ltd. Address before: 100015 Jiuxianqiao Road, Beijing, No. 10, No. Patentee before: BOE TECHNOLOGY GROUP Co.,Ltd. Patentee before: BEIJING BOE OPTOELECTRONICS TECHNOLOGY Co.,Ltd. |