CN104317158B - A kind of mask plate, mask plate group, color membrane substrates and display device - Google Patents
A kind of mask plate, mask plate group, color membrane substrates and display device Download PDFInfo
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- CN104317158B CN104317158B CN201410645950.XA CN201410645950A CN104317158B CN 104317158 B CN104317158 B CN 104317158B CN 201410645950 A CN201410645950 A CN 201410645950A CN 104317158 B CN104317158 B CN 104317158B
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- 239000000758 substrate Substances 0.000 title claims abstract description 37
- 239000012528 membrane Substances 0.000 title abstract 2
- 239000011159 matrix material Substances 0.000 claims abstract description 125
- 239000003086 colorant Substances 0.000 claims description 30
- 230000001788 irregular Effects 0.000 abstract description 6
- 230000000903 blocking effect Effects 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 description 11
- 238000000034 method Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000003550 marker Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
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- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
Abstract
The present invention provides a kind of mask plate, mask plate group, color membrane substrates and display devices, it is related to display technology field, it is in irregular shape caused by with contracted position precision mark size to solve the problems, such as that color film layer positional precision mark overlaps, ensures the accuracy of obtained color blocking and black matrix relative position deviation degree.Wherein mask plate is used to form color film layer, four groups of coloured silk film layer positional precisions including being located at mask plate four corners respectively identify figure, every group of coloured silk film layer positional precision mark figure includes being mutually parallel, the horizontal arranged and color film layer positional precision mark figure of two bar shapeds that extends longitudinally, the lateral dimension of color film layer positional precision mark figure is a, and a is less than the width of a sub-pixel.
Description
Technical Field
The invention relates to the technical field of display, in particular to a mask plate, a mask plate group, a color film substrate and a display device.
Background
A color filter substrate in a display generally includes: the glass substrate, and the black matrix layer and the color film layer formed on the glass substrate, wherein the black matrix layer comprises a black matrix with a grid structure formed by interlacing a plurality of rows of black matrix strips and a plurality of columns of black matrix strips, the color film layer comprises a plurality of color resistors arranged in a matrix manner, and the arrangement of each row of color resistors takes the arrangement sequence of red, green and blue as a repeating unit. Normally, the color block edge is overlapped with the black matrix strip by a certain width to prevent the color block edge from leaking light.
At present, four groups of black matrix position accuracy marks are formed on the same layer at four corners of a substrate when a black matrix layer is formed, each group comprises three square black matrix position accuracy marks with the interval of one sub-pixel width, four groups of color film layer position accuracy marks are formed at four corners of the substrate when a color film layer is formed, each group comprises three square or frame-shaped color film layer position accuracy marks with the interval of one sub-pixel width, the color film layer position accuracy marks are larger than the black matrix position accuracy marks in size, and the black matrix position accuracy marks are covered or framed by the color film layer position accuracy marks. And detecting the deviation degree of the relative positions of the black matrix and the color resistor by detecting the deviation degree of the midpoint of the position precision identifier of the black matrix and the position precision identifier of the color film layer so as to detect whether the edge of the color resistor is overlapped with the black matrix strip.
In the prior art, the color resistors with different colors in the color film layer are formed by the processes of coating, exposure, development, baking and the like, and the same mask plate can be used when the color resistors with different colors are formed because the arrangement conditions of the color resistors with different colors in the color film layer are the same.
However, as the requirement of people on the resolution of the display is higher and higher, the widths of the sub-pixels are smaller and smaller, and the distance between the position accuracy marks of the black matrixes in the same group is smaller and smaller, so that the position accuracy marks of the red, green and blue color film layers with larger sizes in the same group which are finally formed are overlapped, and the deviation degree of the relative positions of the color resistance and the black matrixes cannot be accurately obtained.
If the sizes of the black matrix and the color film layer position precision marks are reduced along with the pixel size, although the problem of overlapping of the color film layer position precision marks can be avoided, the shapes of the color film layer position precision marks and the black matrix position precision marks which are too small in size are not easy to control during manufacturing, and can become irregular, so that the position coordinates of the color film layer position precision marks and the black matrix position precision marks are not accurately read, and the deviation degree of the relative positions of the color resistors and the black matrix cannot be accurately obtained.
Disclosure of Invention
Based on the current situation in the prior art, the technical problem to be solved by the invention is as follows: the mask plate, the mask plate group, the color film substrate and the display device are provided, so that the problem that the shape of the position precision mark is irregular due to the fact that the position precision mark of the color film layer is overlapped and the size of the position precision mark is reduced is solved, and the accuracy of the relative position deviation degree of the obtained color resistor and the black matrix is guaranteed.
In order to achieve the purpose, the invention adopts the following technical scheme:
the invention provides a mask plate which is used for forming a color film layer in a display device, wherein the color film layer corresponds to a plurality of pixel units, color resistors with n colors are transversely arranged on the color film layer corresponding to each pixel unit, the mask plate comprises four groups of color film layer position precision identification graphs which are respectively positioned at four corners of the mask plate, each group of color film layer position precision identification graphs comprises two strip-shaped color film layer position precision identification graphs which are mutually parallel, transversely arranged and longitudinally extended, the transverse dimension of each color film layer position precision identification graph is a, and a is smaller than the width of one sub-pixel.
Preferably, the distance between the middle lines of the position precision identification patterns of the two color film layers at one corner of the mask plate along the longitudinal direction is e, and the ratio of e to the width of one sub-pixel is greater than n.
Preferably, the mask further includes: and the color resistance patterns are arranged in a matrix form in the middle area of the mask plate.
Preferably, a is greater than or equal to 35 μm and the width of one sub-pixel is less than or equal to 65 μm.
A second aspect of the present invention provides a mask set, including: the first mask plate is used for forming a color film layer in the display device; the second mask plate is used for forming a black matrix layer in a display device and comprises four groups of black matrix position precision identification graphs which are respectively positioned at four corners of the second mask plate, each group of black matrix position precision identification graphs comprises n black matrix position precision identification graphs which are transversely arranged, the distance between the longitudinal central lines of two adjacent black matrix position precision identification graphs is the width of one sub-pixel, the transverse size of each black matrix position precision identification graph is d, and d is smaller than the width of one sub-pixel; when the parts of the first mask plate and the second mask plate corresponding to the display area are overlapped, the central line of the two color film layer position precision identification graphs of the first mask plate at the same angle position is overlapped with the central line of the first black matrix position precision identification graph in the n black matrix position precision identification graphs of the second mask plate along the longitudinal direction, and if the distance between the central lines of the two color film layer position precision identification graphs at one angle position of the first mask plate along the longitudinal direction is e, the ratio of the e to the width of one sub-pixel is larger than 2 n.
Preferably, the second mask further includes: and the black matrix pattern is positioned in the middle area of the second mask plate and has a grid structure.
Preferably, d is greater than or equal to 20 μm and the width of one sub-pixel is less than or equal to 65 μm.
Preferably, n is equal to 3 or 4.
A third aspect of the present invention provides a color filter substrate, including: a substrate; the black matrix layer is formed by utilizing a second mask plate in the mask plate set, and comprises four groups of black matrix position precision marks which are respectively positioned at four corners of the black matrix layer; the color film layer is formed by utilizing the first mask plate in the mask plate group and comprises four groups of color film layer position precision marks which are respectively positioned at four corners of the color film layer; the color film layer position accuracy identification and the black matrix position accuracy identification at the same corner are arranged in the following manner: the n color film layer position accuracy marks with different colors, the n black matrix position accuracy marks and the n color film layer position accuracy marks with different colors are sequentially arranged along the transverse direction, and the distance between every two adjacent color film layer position accuracy marks along the longitudinal central line and the distance between every two adjacent black matrix position accuracy marks along the longitudinal central line are the width of one sub-pixel.
Preferably, the shortest distance between the color film layer position accuracy marks and the black matrix position accuracy marks at the same corner is greater than zero, a gap is formed between every two adjacent color film layer position accuracy marks at the same corner, and a gap is formed between every two adjacent black matrix position accuracy marks at the same corner.
Preferably, the n color film layer position accuracy marks with different colors are a red color film layer position accuracy mark, a green color film layer position accuracy mark and a blue color film layer position accuracy mark respectively; or the n color film layer position accuracy marks with different colors are respectively a red color film layer position accuracy mark, a green color film layer position accuracy mark, a blue color film layer position accuracy mark and a yellow color film layer position accuracy mark; or the n color film layer position accuracy marks with different colors are respectively a red color film layer position accuracy mark, a green color film layer position accuracy mark, a blue color film layer position accuracy mark and a white color film layer position accuracy mark.
Preferably, the black matrix layer further comprises a black matrix with a grid structure in the middle area of the black matrix layer; the color film layer further comprises color resistors arranged in a matrix mode in the middle area of the color film layer.
A fourth aspect of the present invention provides a display device, including the color film substrate described above.
According to the mask plate, the mask plate group, the color film substrate and the display device, each color film layer position precision identification graph on the mask plate for forming the color film layers is set to comprise two strip-shaped color film layer position precision identification graphs which are parallel to each other and extend along the column direction, and the shapes of the strip-shaped graphs are easy to control, so that the color film layer position precision identifications can be narrower and more regular, the problem of irregular shapes caused by overlapping and shrinking position precision identification sizes of the color film layer position precision identifications is avoided, the coordinates of the color film layer position precision identifications can be read accurately finally, and the accurate deviation degree of the relative positions of the black matrix and the color resistor is obtained.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
Fig. 1 is a plan view of a mask for forming a color film layer according to an embodiment of the present invention;
fig. 2 is a plan view of a mask for forming a black matrix layer according to an embodiment of the present invention;
fig. 3 is a plan structure diagram of a mask set according to an embodiment of the present invention when portions of display regions corresponding to a first mask and a second mask overlap;
fig. 4a to 4d are step diagrams of a formation process of a black matrix position accuracy indicator and a color film layer position accuracy indicator in a process of manufacturing a color film substrate by using the mask set according to the embodiment of the present invention.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below. It is to be understood that the described embodiments are merely exemplary of the invention, and not restrictive of the full scope of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The embodiment of the invention provides a mask plate, the structure of which is shown in figure 1, the mask plate is used for forming a color film layer in a display device, the color film layer corresponds to a plurality of pixel units, the color film layer is provided with color resistors of n colors which are transversely arranged corresponding to each pixel unit, the mask plate comprises four groups of color film layer position precision identification graphs which are respectively positioned at four corners of the mask plate, each group of color film layer position precision identification graphs comprises two strip-shaped color film layer position precision identification graphs 1 which are mutually parallel, transversely arranged and longitudinally extended, and if the transverse dimension of the color film layer position precision identification graph 1 is a, the a is smaller than the width of one sub-pixel.
Because the color film layer position precision identification graph is in a strip shape, the shape of the strip-shaped graph is easier to control relative to the original square shape and the original frame shape, even if the transverse dimension a of the color film layer position precision identification graph is reduced to be very small, the shape of the finally obtained color film layer position precision identification is more regular, namely, the formed color film layer position precision identification can be narrower and more regular in shape, so that the problem that the color film layer position precision identification is overlapped and the position precision identification is irregular in shape due to the fact that the width of a sub-pixel is reduced is avoided, the coordinate of the color film layer position precision identification formed by the mask plate can be accurately read, and the deviation degree of the relative position of a black matrix and a color resistor, which can be accurately obtained, is ensured.
In this embodiment, if the distance between the longitudinal center lines of the two color film layer position accuracy identification patterns 1 at one corner of the mask is e, the ratio of the e to the width of one sub-pixel is greater than n, so as to ensure that no overlapping occurs between the color film layer position accuracy identifications formed by using the mask.
This mask plate still includes: and the color resistance patterns 2 are arranged in a matrix manner in the middle area of the mask plate. Specifically, the area AA where the color resistance graph 2 is located corresponds to a display area of the display device; because the color resistor edge can be overlapped with the black matrix strip to avoid the color resistor edge light leakage, the width of each color resistor graph 2 can be slightly larger than the width of one sub-pixel; if the mask plate is used for manufacturing the color resistors of n colors in the same color film layer, the distance between adjacent color resistor graphs 2 is n-1 times of the width of one sub-pixel.
In this embodiment, for a display device with a sub-pixel width less than or equal to 65 μm, the lateral dimension a of the color film position accuracy indicator pattern 1 is preferably greater than or equal to 35 μm, so as to ensure that the formed color film position accuracy indicator is not too thin, and to achieve good control over the color film position accuracy indicator shape.
It should be noted that the width of the sub-pixel described in this embodiment refers to the lateral dimension of the sub-pixel.
The embodiment of the invention also provides a mask group, which comprises: a first mask plate, which is the above mask plate for forming a color film layer in a display device and has a structure as shown in fig. 1; a second mask plate, configured to form a black matrix layer in a display device, as shown in fig. 2, the second mask plate includes four groups of black matrix position accuracy identification patterns located at four corners of the second mask plate, each group of black matrix position accuracy identification patterns includes n black matrix position accuracy identification patterns 3 arranged in a horizontal direction, a distance p between longitudinal center lines of two adjacent black matrix position accuracy identification patterns 3 is a width of one sub-pixel, a horizontal size of each black matrix position accuracy identification pattern 3 is d, and d is smaller than a width of one sub-pixel; as shown in fig. 3, when the portion AA of the first mask corresponding to the display area and the portion AA of the second mask corresponding to the display area coincide, a central line of a central connection line of two color film layer position accuracy identification patterns 1 of the first mask at the same corner coincides with a central line of a first black matrix position accuracy identification pattern in n black matrix position accuracy identification patterns 3 of the second mask along the longitudinal direction, and if a distance between the central lines of the two color film layer position accuracy identification patterns 1 at one corner of the first mask along the longitudinal direction is e, a ratio of e to a subpixel width p is greater than 2n, more specifically: e/p > 2 n.
Taking n is equal to 3 (i.e. each pixel unit includes 3 sub-pixels), and the color of the color resistor to be formed includes three colors of red (R), green (G) and blue (B), the process of fabricating the black matrix layer and the color film layer by using the mask set may specifically be: firstly, covering a second mask plate on a substrate to form a black matrix layer, wherein a group of black matrix position accuracy marks 5 shown in fig. 4a are arranged at four corners of the formed black matrix layer, and the distance between every two adjacent black matrix position accuracy marks 5 is p; then covering a first mask plate on a substrate to form a red color resistance layer, wherein four corners of the formed red color resistance layer are respectively provided with two red color film layer position precision marks 6 shown in fig. 4b, and the distance between the two red color film layer position precision marks is the distance e between two color film layer position precision marks 1 in the same group on the first mask plate; then, the first mask plate is moved rightwards along the transverse direction by a distance of one pixel width p, a green color resistance layer is formed on the substrate, two green color film layer position accuracy marks 7 shown in the figure 4c are arranged at four corners of the formed green color resistance layer, and the distance between the two green color film layer position accuracy marks is e; and then, moving the first mask plate transversely by a distance of one pixel width p to the right, and forming a blue color resistance layer on the substrate, wherein the four corners of the formed blue color resistance layer are provided with two blue color film layer position accuracy marks 8 shown in fig. 4d, and the distance between the two blue color film layer position accuracy marks is e. In this embodiment, the formation order of the red resist layer, the green resist layer, and the blue resist layer is merely described as an example, and the color film layer may be formed in another order.
After the black matrix layer and the color film layer are manufactured, the deviation degree of the relative positions of the black matrix in the black matrix layer and the color resistors in the color film layer needs to be detected, and the overlapping condition of the edge of each color resistor and the black matrix strip is obtained so as to judge whether light leaks around the color resistors. The detection is realized by detecting the deviation degree of the relative positions of the black matrix position accuracy markers 5 and the color film layer position accuracy markers 6, 7 and 8. Specifically, the coordinates of two red color film layer position accuracy marks 6 are read to obtain the midpoint of the central connecting line of the two red color film layer position accuracy marks, the deviation degree of the midpoint of the central connecting line of the two red color film layer position accuracy marks and the midpoint of the first black matrix position accuracy mark is detected, the deviation degree of the midpoint of the central connecting line of the two green color film layer position accuracy marks 7 and the midpoint of the second black matrix position accuracy mark and the deviation degree of the midpoint of the central connecting line of the two blue color film layer position accuracy marks 8 and the midpoint of the third black matrix position accuracy mark 5 are detected in the same way, so that the deviation degree of the relative positions of the color film layer position accuracy mark and the black matrix position accuracy mark at one corner is obtained, and the deviation degree of the relative positions of the color film layer position accuracy mark and the black matrix.
In the prior art, although the distance between three black matrix position accuracy marks in the same group is set to be twice the width of a sub-pixel, the problem of overlapping of color film layer position accuracy marks can be solved, and the size of the position accuracy marks does not need to be reduced, if the same mask plate is still used for forming the color film layer, the distance between two sub-pixels needs to be moved when color resistors with different colors are manufactured, so that the color resistors at the edge of a display area are vacant, therefore, the method needs two mask plates, one mask plate is used for forming red and blue color resistors, and the other mask plate is used for forming a green color resistor, so that the cost is increased, the manufacturing steps of the color film substrate are complicated, and in addition, once the mask plate used for forming the green color resistor is damaged, the production cannot be carried out. From the process of utilizing the mask set provided by the embodiment to manufacture the black matrix layer and the color film layer, it is not difficult to find that the mask for forming the color film layer provided by the embodiment can not only avoid the problems of overlapping of color film layer position accuracy marks caused by the reduction of the width of sub-pixels and irregular shape of the color film layer position accuracy marks caused by the reduction of the size of color film layer position accuracy mark figures, but also achieve the purpose of forming color resistors of three colors of the color film layer by utilizing the same mask, avoid the use of two masks to manufacture the color film layer, thereby saving the cost, simplifying the manufacturing steps of the color film substrate, and eliminating the problem that the production cannot be carried out due to the damage of the mask for forming the green color resistors in the prior art.
In this embodiment, the second mask further includes: and the black matrix pattern 4 of the grid structure is positioned in the middle area of the second mask plate and is used for forming the black matrix of the grid structure.
In this embodiment, because the width of the color film layer position accuracy identification pattern 1 on the first mask plate can be set to be narrower, the mask plate set provided in this embodiment is more suitable for manufacturing a color film substrate with high resolution (i.e., a sub-pixel with a narrower width) than a mask plate in the prior art, and specifically, for a display device with a sub-pixel width of less than or equal to 65 μm, the lateral dimension d of the black matrix position accuracy identification pattern in this embodiment may be greater than or equal to 20 μm, so that the dimension of the black matrix position accuracy identification pattern is not too small, and the shape rule of the formed black matrix position accuracy identification is ensured.
The colors of the sub-pixels in the display device commonly include three or four, and n is preferably equal to 3 or 4 based on this embodiment, so that the number of the black matrix position precision identification patterns 3 included in one corner of the second mask plate is also 3 or 4.
In addition, the width a of the color film layer position accuracy identification pattern 1 included in the first mask plate may be equal to or different from the width d of the black matrix position accuracy identification pattern 3, and the first mask plate may be designed according to actual conditions.
It should be noted that the patterns included in the mask plate and the mask plate set provided in this embodiment may be light-shielding regions or light-leakage regions, where if a negative photoresist is used during exposure, the patterns included in the mask plate and the mask plate set are light-leakage regions, and if a positive photoresist is used during exposure, the patterns included in the mask plate and the mask plate set are light-shielding regions.
The present embodiment also provides a color filter substrate, including: a substrate; the black matrix layer is formed by utilizing a second mask plate in the mask plate set provided by the embodiment and comprises four groups of black matrix position precision marks which are respectively positioned at four corners of the black matrix layer; a color film layer formed on the substrate, the color film layer being formed by using the first mask plate in the mask set provided by the embodiment, and including four sets of color film layer position accuracy marks respectively located at four corners of the color film layer; as shown in fig. 4d, the arrangement of the color film position accuracy markers and the black matrix position accuracy markers at the same corner is as follows: n color film layer position accuracy marks (6, 7 and 8) with different colors, n black matrix position accuracy marks (5) with different colors and n color film layer position accuracy marks (6, 7 and 8) with different colors are sequentially arranged along the transverse direction, and the distance between the longitudinal central lines of the two adjacent color film layer position accuracy marks and the distance between the longitudinal central lines of the two adjacent black matrix position accuracy marks are the width p of one sub-pixel.
The color film substrate provided by the embodiment is manufactured by using the mask set provided by the embodiment, so that the deviation degree of the relative positions of the color resistor in the color film layer and the black matrix in the black matrix layer can be accurately obtained by detecting the relative positions of the position precision identifier of the color film layer and the position precision identifier of the black matrix, the alignment accuracy of the color resistor and the black matrix is ensured, and the yield of the color film substrate is improved.
In fig. 4d, a represents the lateral dimension of the color film layer position accuracy indicator (i.e., the width of the color film layer position accuracy indicator pattern), b represents the distance between two adjacent color film layer position accuracy indicators, c represents the shortest distance between the color film layer position accuracy indicator and the black matrix position accuracy indicator, and f represents the distance between two adjacent black matrix position accuracy indicators, so that the width p of one sub-pixel is a + b + d + f, thereby ensuring that the manufacturing of all color resists of the color film layer can be completed by using the distance that the same mask plate moves by one sub-pixel width at a time. The distance between the longitudinal centerlines of the two color film layer position accuracy markers of the same color at one corner of the color film layer (i.e., the distance between the longitudinal centerlines of the two color film layer position accuracy marker patterns included in the same group of color film layer position accuracy marker patterns on the first mask plate) e is 3a +2b +2c +3d +2f, so as to ensure that the finally formed position accuracy markers are arranged as shown in fig. 3 d.
The shortest distance c between the color film layer position accuracy marks and the black matrix position accuracy marks at the same corner along the longitudinal central line can be larger than zero, a gap (namely b is larger than 0) can be formed between two adjacent color film layer position accuracy marks at the same corner, and a gap (namely f is larger than 0) is formed between two adjacent black matrix position accuracy marks at the same corner, so that the position accuracy marks can be accurately read. Further, b and f may be equal or different, and the values of b and f may be set to be greater than or equal to 7 μm, so as to ensure that no overlap occurs between the position accuracy marks of the formed color film layers.
According to the difference of the colors of the sub-pixels included in the display device (for example, including R, G, B three colors, or including R, G, B, Y (yellow) four colors, or including R, G, B, W (white) four colors), in this embodiment, the n color film layer position accuracy marks, which are located at the same corner of the black matrix position accuracy mark and have different colors, at the same end of the black matrix position accuracy mark may be a red color film layer position accuracy mark, a green color film layer position accuracy mark, and a blue color film layer position accuracy mark, respectively; or a red color film layer position precision mark, a green color film layer position precision mark, a blue color film layer position precision mark and a yellow color film layer position precision mark; or a red color film layer position precision mark, a green color film layer position precision mark, a blue color film layer position precision mark and a white color film layer position precision mark; or the color resistance position of each sub-pixel is correspondingly changed according to the color difference of the sub-pixels so as to ensure the detection of the color resistance positions of all colors.
In this embodiment, the black matrix layer further includes a black matrix of a grid structure located in a middle region of the black matrix layer; the color film layer also comprises color resistors arranged in a matrix mode in the middle area of the color film layer.
The embodiment also provides a display device, which comprises the color film substrate. The yield of the mask plate is improved compared with the prior art, so that the display device comprising the color film substrate also has high yield.
It should be noted that the display device provided in this embodiment may be a liquid crystal panel, an electronic paper, or an OLED (Organic Light-Emitting Diode) panel, and is suitable for any product or component with a display function, such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, and a navigator.
The above description is only for the specific embodiments of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention are included in the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the appended claims.
Claims (12)
1. A mask plate is used for forming a color film layer in a display device, wherein the color film layer corresponds to a plurality of pixel units, and color resistors with n colors are transversely arranged on the color film layer corresponding to each pixel unit; wherein n is equal to 3 or 4.
2. A mask according to claim 1, wherein the distance between the middle lines of the two color film layer position accuracy identification patterns at one corner of the mask along the longitudinal direction is e, and the ratio of e to the width of one sub-pixel is greater than n.
3. A mask according to claim 1, further comprising: and the color resistance patterns are arranged in a matrix form in the middle area of the mask plate.
4. A mask according to any one of claims 1 to 3, wherein a is greater than or equal to 35 μm, and the width of one sub-pixel is less than or equal to 65 μm.
5. A mask set, comprising:
a first mask plate, wherein the first mask plate is used for forming a color film layer in a display device according to any one of claims 1 to 4;
the second mask plate is used for forming a black matrix layer in a display device and comprises four groups of black matrix position precision identification graphs which are respectively positioned at four corners of the second mask plate, each group of black matrix position precision identification graphs comprises n black matrix position precision identification graphs which are transversely arranged, the distance between the longitudinal central lines of two adjacent black matrix position precision identification graphs is the width of one sub-pixel, the transverse size of each black matrix position precision identification graph is d, and d is smaller than the width of one sub-pixel;
when the parts of the first mask plate and the second mask plate corresponding to the display area are overlapped, the central line of the two color film layer position precision identification graphs of the first mask plate at the same angle position is overlapped with the central line of the first black matrix position precision identification graph in the n black matrix position precision identification graphs of the second mask plate along the longitudinal direction, and if the distance between the central lines of the two color film layer position precision identification graphs at one angle position of the first mask plate along the longitudinal direction is e, the ratio of the e to the width of one sub-pixel is larger than 2 n.
6. A mask set according to claim 5, wherein the second mask further comprises: and the black matrix pattern is positioned in the middle area of the second mask plate and has a grid structure.
7. A mask set according to claim 5 or 6, wherein d is greater than or equal to 20 μm and the width of one sub-pixel is less than or equal to 65 μm.
8. A color film substrate is characterized by comprising:
a substrate;
a black matrix layer formed on the substrate, the black matrix layer being formed using the second mask plate of the mask plate set defined in any one of claims 5 to 7, the black matrix layer including four sets of black matrix position accuracy marks respectively located at four corners of the black matrix layer;
a color film layer formed on the substrate, the color film layer being formed using the first mask plate of the mask set according to any one of claims 5 to 7, the color film layer including four sets of color film layer position accuracy marks respectively located at four corners of the color film layer;
the color film layer position accuracy identification and the black matrix position accuracy identification at the same corner are arranged in the following manner: the n color film layer position accuracy marks with different colors, the n black matrix position accuracy marks and the n color film layer position accuracy marks with different colors are sequentially arranged along the transverse direction, and the distance between every two adjacent color film layer position accuracy marks along the longitudinal central line and the distance between every two adjacent black matrix position accuracy marks along the longitudinal central line are the width of one sub-pixel.
9. The color filter substrate of claim 8, wherein a shortest distance between the color filter position accuracy indicator and the black matrix position accuracy indicator at a same corner is greater than zero, a gap is formed between two adjacent color filter position accuracy indicators at the same corner, and a gap is formed between two adjacent black matrix position accuracy indicators at the same corner.
10. The color filter substrate according to claim 8, wherein the n color filter layer position accuracy marks with different colors are a red color filter layer position accuracy mark, a green color filter layer position accuracy mark, and a blue color filter layer position accuracy mark, respectively, wherein n is equal to 3; or,
the n color film layer position precision marks with different colors are respectively a red color film layer position precision mark, a green color film layer position precision mark, a blue color film layer position precision mark and a yellow color film layer position precision mark, wherein n is equal to 4; or,
the n color film layer position accuracy marks with different colors are respectively a red color film layer position accuracy mark, a green color film layer position accuracy mark, a blue color film layer position accuracy mark and a white color film layer position accuracy mark, wherein n is equal to 4.
11. The color filter substrate according to claim 8, wherein the black matrix layer further comprises a black matrix of a grid structure in a middle region of the black matrix layer;
the color film layer further comprises color resistors arranged in a matrix mode in the middle area of the color film layer.
12. A display device comprising the color filter substrate according to any one of claims 8 to 11.
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| CN201410645950.XA CN104317158B (en) | 2014-11-14 | 2014-11-14 | A kind of mask plate, mask plate group, color membrane substrates and display device |
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| CN201410645950.XA CN104317158B (en) | 2014-11-14 | 2014-11-14 | A kind of mask plate, mask plate group, color membrane substrates and display device |
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| CN104808434B (en) * | 2015-05-21 | 2019-08-02 | 合肥京东方光电科技有限公司 | Substrate, mask plate and display device, alignment method |
| CN105182680B (en) * | 2015-10-22 | 2019-12-17 | 深圳市华星光电技术有限公司 | Color resistance mask plate and using method thereof |
| CN106646997A (en) * | 2016-12-27 | 2017-05-10 | 深圳市华星光电技术有限公司 | Baffle identifier of color resistance layer manufactured through Canon photomask and use method of baffle identifier |
| CN106773526B (en) * | 2016-12-30 | 2020-09-01 | 武汉华星光电技术有限公司 | Mask, color film substrate and manufacturing method thereof |
| CN108572477B (en) * | 2017-03-08 | 2021-12-07 | 福州京东方光电科技有限公司 | Color film substrate, display panel and detection method thereof |
| CN106918948B (en) * | 2017-04-12 | 2020-07-24 | 深圳市华星光电技术有限公司 | Method for manufacturing color resistor |
| CN107065281B (en) * | 2017-04-12 | 2020-07-03 | 深圳市华星光电技术有限公司 | Method for manufacturing color resistor |
| CN109182964B (en) | 2018-08-31 | 2019-11-15 | 云谷（固安）科技有限公司 | Mask plate composition method |
| CN110246989B (en) * | 2019-05-07 | 2021-04-30 | 信利半导体有限公司 | Manufacturing method of full-color OLED display |
| CN112415792B (en) * | 2020-12-09 | 2023-03-14 | 深圳市华星光电半导体显示技术有限公司 | Display panel, electronic device and method for detecting color resistance alignment accuracy |
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