WO2022158687A1 - Fine metal mask for large-area display and method for manufacturing same - Google Patents

Fine metal mask for large-area display and method for manufacturing same Download PDF

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Publication number
WO2022158687A1
WO2022158687A1 PCT/KR2021/016072 KR2021016072W WO2022158687A1 WO 2022158687 A1 WO2022158687 A1 WO 2022158687A1 KR 2021016072 W KR2021016072 W KR 2021016072W WO 2022158687 A1 WO2022158687 A1 WO 2022158687A1
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WO
WIPO (PCT)
Prior art keywords
photomask
alignment
fine metal
metal mask
manufacturing
Prior art date
Application number
PCT/KR2021/016072
Other languages
French (fr)
Korean (ko)
Inventor
유명훈
김재범
한덕기
Original Assignee
풍원정밀(주)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 풍원정밀(주) filed Critical 풍원정밀(주)
Priority to CN202180089361.6A priority Critical patent/CN116724683A/en
Publication of WO2022158687A1 publication Critical patent/WO2022158687A1/en

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Definitions

  • the present invention relates to a method of manufacturing a fine metal mask for a large area display, and more particularly, to easily manufacture a fine metal mask for manufacturing an 8th generation large area display, a plurality of photomask raw materials or a plurality of materials An extended effective part is manufactured by connecting and using a photomask of Accordingly, it is possible to increase production efficiency in manufacturing a fine metal mask having an effective portion extended in length compared to a fine metal mask for manufacturing a 6.5 generation display, and to utilize the existing exposure equipment for manufacturing a fine metal mask for the 6.5 generation as it is. can
  • a key component for depositing OLED devices on a display panel is a fine metal mask, and it is difficult to keep up with the trend of large-area display panels with the existing 6.5G OLED pixel deposition fine metal mask. is laid Therefore, there is a need to develop a fine metal mask for deposition of 8th generation OLED pixels (hereinafter abbreviated as “8th generation mask”).
  • the fine metal mask is composed of an effective portion, which is an area in which a pattern is formed so that pixels are deposited, and grip portions formed at both ends of the effective portion to perform a mask fixing role in order to seat the fine metal mask on the panel in the process of depositing the pixels.
  • the length of the effective part of the 6.5th generation mask is 1100mm, whereas the length of the effective part of the 8th generation mask is 2200mm.
  • the length of the grip part it is 2600mm, which is a conventional exposure machine that can expose up to a length of 2400mm. There is a problem in that it is difficult to produce a generation mask.
  • the photomask used to manufacture the 8th generation mask is a type of laminating two or more numbers, so the continuity or consistency of alignment between the two photomasks in the process of laminating two pre-processed photomasks, respectively. There is a high possibility that this cannot be ensured, and when continuity or consistency of alignment is not ensured in this way, pixel defects may occur in the process of forming pixels, and the resolution of the display may deteriorate due to the defective pixels. Therefore, the development of a new process technology for manufacturing the 8th generation mask is desired.
  • the present invention has been devised to solve the problems of the prior art, and the present invention aims to manufacture a fine metal mask for manufacturing an 8th generation large-area display having a high degree of alignment by aligning a plurality of photo masks with high accuracy. do it with
  • the present invention employs most of the existing fine metal mask manufacturing methods, thereby increasing the utility of the existing process, performing a connection exposure or introducing a connection cutting process, so that production efficiency and production speed can be improved. to serve a different purpose.
  • the present invention utilizes a conventional exposure machine to perform a continuous exposure process for the effective part and the grip part, or by separately performing the effective part exposure and the grip part cutting process, when manufacturing a fine metal mask for manufacturing an 8th generation large-area display. Another purpose is to solve the need for the development of a new exposure machine and to maximize the utilization of the conventional exposure machine.
  • Another object of the present invention is to configure a simple alignment inspection apparatus to precisely align photo masks on an existing exposure machine in aligning a plurality of photo masks.
  • Another object of the present invention is to manufacture a separate aligner for aligning a plurality of photomasks and to precisely align the plurality of photomasks in a simple manner.
  • the present invention provides a fine metal including an effective portion having a through-hole pattern for depositing an optical element and a grip portion formed at both ends of the effective portion to serve as a support in the deposition process of the optical element.
  • a method of manufacturing a mask comprising: applying a photoresist to a region of a metal panel for manufacturing a fine metal mask; laminating a photomask having a pattern formed thereon on the photoresist-coated metal panel; exposing a central region of the photoresist region on which the photomask is stacked; and shaping a region extending from the central region to both ends by laser processing, wherein the central region is an effective part of the fine metal mask, and the both ends extending region shaped by laser processing is a grip of the fine metal mask It provides a method of manufacturing a fine metal mask for a large area display, characterized in that the denial.
  • the present invention relates to a method of manufacturing a fine metal mask comprising an effective portion having a through-hole pattern for depositing an optical element and a grip portion formed at both ends of the effective portion to serve as a support in the deposition process of the optical element.
  • applying a photoresist to one area of the metal panel for manufacturing a fine metal mask laminating a photomask having a pattern formed thereon on the photoresist-coated metal panel; a first exposure step of exposing a central region or one end region of the photoresist region on which the photomask is stacked; and a second exposure step of exposing a region other than the exposed region after the first exposure step; wherein the central region is an effective part of the fine metal mask, and the one end region is the grip of the fine metal mask It provides a method of manufacturing a fine metal mask for a large area display, characterized in that the denial.
  • the effective portions are formed by continuous exposure in half and connected.
  • the manufacturing of the photomask may include laminating a plurality of photomask raw materials in a longitudinal direction; and floating a pattern on a plurality of laminated photomask raw materials.
  • the manufacturing of the photomask may include: a first step of generating at least one alignment mark on the photomask; a second step of first aligning and mounting the at least two photomasks on which the alignment marks are generated on a photomask mounting frame of an exposure machine; a third step of confirming the positions of the alignment marks between the mounted photomasks; and a fourth step of determining whether the alignment state is complete according to the confirmed position of the alignment mark; and, if the alignment state is not completed, it is preferable to perform the second step after aligning the photomasks again from the third step do.
  • the third step is performed by a photomask alignment system, comprising: an alignment reference unit having at least two alignment reference points formed thereon, the alignment reference points being positioned to overlap the alignment marks; and a photographing device mounted at a position capable of photographing the overlapping state of the alignment reference unit and the alignment mark, wherein at least one of the alignment reference points overlaps the alignment mark formed on the first photomask among the plurality of photomasks, The remainder preferably overlaps the alignment marks formed on the second photomask aligned adjacent to the first photomask.
  • the alignment system may be positioned above or below the photomask and may be configured to be movable.
  • the photographing device is provided as many as the number of the alignment reference points.
  • the manufacturing of the photomask may include: a first step of generating at least one alignment mark on the photomask; a second step of first aligning and mounting the at least two photomasks on which the alignment marks are generated on a photomask mounting frame of a photomask alignment apparatus; a third step of confirming the positions of the alignment marks between the mounted photomasks; and a fourth step of determining whether the alignment state is complete according to the confirmed position of the alignment mark; and, if the alignment state is not completed, it is preferable to perform the second step after aligning the photomasks again from the third step do.
  • the photomask alignment apparatus may include a photomask mounting frame; a photomask adsorption unit formed on an edge of the photomask mounting frame; At least two alignment reference points are formed, the alignment reference point is an alignment reference portion positioned to overlap the alignment mark; and a photographing device mounted at a position capable of photographing the overlapping state of the alignment reference unit and the alignment mark, wherein at least one of the alignment reference points overlaps the alignment mark formed on the first photomask among the plurality of photomasks, The remainder preferably overlaps the alignment marks formed on the second photomask aligned adjacent to the first photomask.
  • the photomask alignment device may include: a photomask lifting bar provided to be liftable under the photomask mounting frame; It is preferable to include a; support glass for supporting the photomasks at the interface when the plurality of photomasks are laminated.
  • the photographing device is provided as many as the number of the alignment reference points.
  • the present invention provides a fine metal mask for a large area display, which is manufactured by the above-described method, and characterized in that the effective part and the grip part are processed continuously or separately to form a single object.
  • the present invention employs most of the existing fine metal mask manufacturing method, thereby increasing the utilization of the existing process, performing connection exposure or introducing a connection cutting process, thereby promoting efficiency in production and improvement of production speed. is expected
  • the present invention utilizes a conventional exposure machine to perform a continuous exposure process for the effective part and the grip part, or by separately performing the effective part exposure and the grip part cutting process, when manufacturing a fine metal mask for manufacturing an 8th generation large-area display. , it is expected to solve the need for the development of a new exposure machine and to maximize the utilization of the conventional exposure machine.
  • the present invention configures a simple alignment inspection apparatus in aligning a plurality of photomasks and utilizes it on an existing exposure machine, so that the effect of allowing the photomasks to be precisely aligned by a convenient and simple method is expected. do.
  • the present invention is expected to have the effect of precisely aligning the plurality of photomasks in a simple way before performing the exposure process.
  • FIG. 1 is a flowchart for explaining a process of continuous exposure of an effective part and a grip part in a manufacturing process of a fine metal mask according to an embodiment of the present invention.
  • FIG. 2 is a flowchart for explaining a process of continuous exposure of an effective part and a grip part in a manufacturing process of a fine metal mask according to another embodiment of the present invention.
  • FIG. 3 is a flowchart illustrating a grip part cutting process after exposure of an effective part in a manufacturing process of a fine metal mask according to an embodiment of the present invention.
  • FIG. 4 is a manufacturing flowchart of a photomask manufactured to have a high degree of alignment by laminating raw materials for a photomask according to an embodiment of the present invention, and performing a floating process.
  • FIG. 5 is a flowchart illustrating a process of laminating two individual photomasks and securing alignment according to an embodiment of the present invention, and shows a case in which an existing exposure machine is used.
  • FIG. 6 is a flowchart illustrating a process of exposing the surface of a fine metal mask by using the port mask lamination and alignment diagram according to FIG. 5 .
  • FIG. 7 is a flowchart illustrating a process of laminating two individual photomasks and securing an alignment degree according to another embodiment of the present invention, and shows a case in which a separate alignment device is used.
  • FIG. 8 shows the alignment device of FIG. 7 from the side, and at the same time shows a process for laminating a photomask and confirming an alignment state.
  • ... unit and “... group” described in the specification mean a unit for processing at least one function or operation.
  • the present invention is to fabricate an 8th generation fine metal mask, and the 8th generation fine metal mask is characterized in that the effective portion is twice as long as that of the existing 6.5 generation fine metal mask.
  • the overall length of the 8th generation fine metal mask is 2600 mm, which is 1100 mm longer than the total length of the 6.5 generation fine metal mask of 1500 mm.
  • the exposure machine for performing the exposure process which is a process for manufacturing a fine metal mask, can expose a target object with a length of up to 2500 mm, one full exposure of the 6.5 generation fine metal mask is possible, but the 8th generation fine metal mask One full exposure of the mask is not possible.
  • FIG. 1 is a flowchart for explaining a process of continuous exposure of an effective part and a grip part in a manufacturing process of a fine metal mask according to an embodiment of the present invention
  • FIG. 2 is a manufacturing process of a fine metal mask according to another embodiment of the present invention It is a flowchart for explaining the continuous exposure process of the effective part and the grip part
  • FIG. 3 is a flowchart for explaining the grip part cutting process after exposure of the effective part in the manufacturing process of the fine metal mask according to an embodiment of the present invention
  • FIG. 4 is a manufacturing flowchart of a photomask manufactured to have a high degree of alignment through laminating photomask raw materials and a floating process according to an embodiment of the present invention
  • FIG. 5 is two individual photos according to an embodiment of the present invention.
  • FIG. 6 is the port mask lamination and alignment according to FIG. It is a flowchart showing a process of exposing
  • FIG. 7 is a flowchart showing a process of laminating two individual photomasks and securing alignment according to another embodiment of the present invention, showing a case in which a separate alignment device is used
  • FIG. 8 shows the alignment device of FIG. 7 from the side, and at the same time shows a process for laminating a photomask and confirming an alignment state.
  • the metal plate 190 eg, Invar
  • the metal plate 190 is exposed while moving in the same direction as the length direction of the mask. showed the process.
  • the fine metal mask 100 is composed of an effective portion 120 and a grip portion 110 integrally formed on both sides of the effective portion 120 , and a processing hole for OLED pixel deposition for the display is formed in the effective portion 120 . do.
  • photoresist is first applied on the metal plate 190, and the applied photoresist is selectively exposed and developed. For this, a photomask is laminated on the photoresist and then exposed.
  • the length of the 8th generation fine metal mask 100 is longer than that of the mounting frame and the usable exposure area of the exposure machine, it is impossible to simultaneously expose the effective portion 120 and the grip portion 110 . Accordingly, in the present invention, continuous exposure or sequential exposure is performed using the effective portion 120 and the grip portion 110 as basic units, thereby overcoming this impossibility.
  • two fine metal masks 100 to be processed are extracted and displayed.
  • the processed fine metal mask 100 may be further displayed on the left side of the left fine metal mask 100 among the two fine metal masks 100 , but for the purpose of excerpt, the display thereof is omitted.
  • the metal plate 190 of the corresponding part was exposed. However, it is more efficient in the production process to simultaneously expose the adjacent grip part 110 on the left side of the grip part 110 .
  • the adjacent grip part 110 is not shown here, it is assumed that exposure for forming the leftmost grip part 110 is performed first for the purpose of description. Thereafter, the adjacent effective portion 120 is exposed, and then the right grip portion 110 is sequentially exposed, or the right grip portion 110 and the left grip portion 110 of the fine metal mask 100 to be processed adjacent to the right grip portion 110 are simultaneously exposed. can do. Thereafter, the effective portion 120 and the right grip portion 110 were sequentially exposed again.
  • Figure 2 is the same as Figure 1 in that it is a process of performing continuous exposure, but the movement path of the photomask is different. It is different in that it performs
  • the exposure area corresponds to the length of the effective part 120 of the fine metal mask 100 to be processed on the left side, when exposing the grip part 110 of the fine metal mask 100 to be processed on the right side, the effective area adjacent thereto
  • the area of the sub 120 is preferably shielded from light.
  • the metal plate 190 material
  • the photomask is moved.
  • the effective part 120 after exposure to the effective part 120 of 1100 mm that matches the effective part 120 of the 6.5 generation fine metal mask 100, the remaining effective part of 1100 mm through a continuous exposure process By performing connection exposure to 120, the effective portion 120 (2200 mm) of the 8th generation fine metal mask 100 can be formed, otherwise, the effective portion 120 of the 8th generation fine metal mask 100 ( 2200 mm) may be formed by exposure at once.
  • FIG. 3 shows a method of performing the exposure process only on the effective portion 120 of the fine metal mask 100 . Since exposing only the effective part 120 is possible with the current exposure machine, the effective part 120 exposure is performed first, and the grip part 110 at both ends is cut using a cutting means such as a laser.
  • a cutting means such as a laser.
  • the cutting means is indicated by the laser generating unit 130, the cutting means is not particularly limited. That is, cutting using a blade, cutting using a water jet, etc. may be mentioned as examples.
  • the cutting means may be determined in consideration of process continuity with the exposure process, equipment owned by the subject performing the process, and the like.
  • FIG. 4 illustrates a manufacturing process of a photomask used for exposing the fine metal mask 100 .
  • the two photomask raw materials 141 are mounted on the mounting plate 140 and lamination is performed at the same time. Accordingly, an interface is formed between the two photomask raw materials 141 .
  • the mounting plate 140 mainly adopts a glass plate. This is because the glass plate is suitable for performing the exposure process because it has heat resistance and is transparent. However, an appropriate material other than the glass plate may be adopted as an alternative material.
  • the floating is for patterning the fine metal mask 100 , and a photomask having a desired shape is manufactured through floating using the floating means 160 . can do.
  • a photomask having an extended length suitable for manufacturing the 8th generation fine metal mask 100 is manufactured.
  • the most preferred method for floating is a laser floating method, but floating by other means is also possible, and as a method other than floating, if a method for forming a pattern is derived, it is also possible to use it.
  • the boundary surface is difficult to secure continuity when floating, and if the boundary surface is also floated, the pattern formed by the corresponding portion may be inconsistent or an error may occur in the shape surface. .
  • the pattern region of the photomask has a length of 2200 mm, and the length coincides with the effective portion 120 of the 8th generation fine metal mask 100 . Accordingly, it is possible to perform an exposure process for manufacturing the 8th generation fine metal mask 100 .
  • the illustrated photomask mounting frame 170 is a region on which a photomask is mounted (mounted), a central portion surrounded by the frame is penetrated, and a transparent mounting plate 172 on which the photomask is mounted is positioned.
  • a slit to which a negative pressure is applied is provided at the edge of the frame, the photomask can be seated on the frame by the negative pressure when the photomask is mounted, thus stably fixing the photomask.
  • the upper slit may be replaced by a single hole, and the interstitial space that can use the sound pressure may have any shape.
  • the photomask mounting frame 170 has a size on which two manufactured unit photomasks can be mounted.
  • the number of photomasks that can be mounted is not limited to two, and more photomasks may be mounted according to the size of the frame or the length of the mask.
  • the photomask mounting frame 170 is a component of a conventional exposure machine, and is used in a process of fixing a single photomask and exposing the metal plate 190 using the fixed photomask. However, a function for laminating and mounting a plurality of photomasks and checking the alignment state between them is not mounted. As described above, when a plurality of photomasks are laminated, the pattern must be closely aligned, so the plurality of photomasks must be precisely aligned, and a means for checking the alignment state must be separately devised.
  • a movable type photomask alignment system 180 is added to the exposure machine, whereby the alignment state of the laminated photomasks can be precisely checked, and the laminated photomask having an alignment state suitable for performing the exposure process. implementation became possible. That is, by further increasing the utilization of the existing exposure machine, the existing exposure machine can be used for manufacturing the 8th generation fine metal mask 100 .
  • the process of manufacturing the photomask may include: a first step of generating at least one alignment mark 145 on the photomask; a second step of first aligning and mounting at least two photomasks on which the alignment marks 145 are generated on a photomask mounting frame 170 of an exposure machine; a third step of confirming the positions of the alignment marks 145 between the mounted photomasks; and a fourth step of determining whether the alignment state is complete according to the confirmed position of the alignment mark 145; if the alignment state is not completed, the photomasks are secondarily aligned and then performed again from the third step will do
  • the alignment marks 145 generated on the photomask are preferably marked outside the region where the pattern is formed. Therefore, it is preferable that the photomask be installed in the area near the vertex of the rectangular photomask as the most comfortable position.
  • the alignment marks 145 may be formed at all four vertices, or at least at both ends of the long side. That is, it is most preferable that the alignment mark 145 is marked at an appropriate position so that the alignment state of the unit photomask and the adjacent unit photomask can be checked.
  • the alignment marks 145 are formed at the same coordinates of an alignment target photomask having the same standard, so that the alignment state can be checked regularly. When the check of the alignment state between the photomasks is completed, the alignment state is confirmed as it is so that it can be connected to the exposure process, which is the next process. Checking the alignment status may be continuously performed until the alignment status is confirmed.
  • the photomask alignment system 180 configured separately from the exposure machine.
  • the alignment reference points 182 are formed, and the alignment reference points 182 include an alignment reference unit 181 positioned to overlap the alignment mark 145; and a photographing device 183 mounted at a position capable of photographing the overlapping state of the alignment reference unit 181 and the alignment mark 145 .
  • at least one of the alignment reference points 182 overlaps the alignment mark 145 formed on the first photomask among the plurality of photomasks, and the rest are aligned on the second photomask aligned adjacent to the first photomask. superimposed on mark 145 .
  • the illustrated shape shows a shape in which one alignment mark 145 is formed in the vertex regions adjacent to each other of the first photomask and the second photomask.
  • the number of alignment marks 145 is not particularly limited as long as the alignment check can be precisely performed as described above.
  • the alignment reference unit 181 may be formed of a transparent material. For example, by making the transparent reference unit semi-transparent, the effect of light reflection during photographing can be reduced. Accordingly, the overlapping state of the alignment reference point 182 and the alignment mark 145 can be confirmed with the naked eye.
  • the alignment mark 145 is formed on the upper surface or the lower surface of the photomask, and the formation surface of the alignment mark 145 is not limited to any one surface.
  • the photomask alignment system 180 may be located above or below the photomask. That is, since the mounting portion on which the photomask is mounted is made of transparent glass, it is possible to check the alignment state even under the photomask.
  • the photomask is preferably mounted at a reference position on the frame, and the alignment system also moves to the reference position on the frame to check the alignment state of the photomask.
  • the alignment state of the photomask can be easily and precisely confirmed and confirmed in a short time.
  • Confirmation of the alignment state is performed by the photographing device, and the alignment state photographed by the photographing apparatus is transmitted to a control unit (not shown) by wired/wireless communication means to determine whether the alignment state is confirmed or not after the control unit confirms the alignment state do. As a result of checking the alignment status, if there is a need for realignment, it is sent back to the alignment system to perform the corresponding process.
  • the photomask alignment system 180 may be configured to be movable without limitation in direction or by limiting direction.
  • the photographing device 183 is preferably provided as many as the number of the alignment reference points 182 , but of course, one movable photographing device 183 may be configured to check the alignment state while moving.
  • FIG. 6 illustrates a process of exposing the metal plate 190 using the photomask after the alignment state of the laminated photomasks is confirmed.
  • the photomask alignment system 180 moves, and a pair of photomasks symmetrical on both sides of the metal plate 190 are moved to come into contact with the metal plate 190 , and then Exposure is performed with respect to both surfaces. Since processes such as exposure and development are known processes, a detailed description thereof will be omitted.
  • FIGS. 7 and 8 show a photomask alignment device 200 in which a photomask mounting frame 170 is configured separately from an exposure machine, and an elevating bar 173, support glass, etc. are provided here, unlike FIGS. 5 and 6 . will be.
  • a method of manufacturing a photomask using the above photomask aligning apparatus 200 is mostly the same as that of FIG. 5 , except that a separate photomask aligning apparatus 200 is used.
  • the photomask alignment apparatus 200 is composed of an alignment reference unit 181 and a photographing device, and is different from the movable photomask alignment system 180 of FIG. 5 . It has an otherwise fixed photomask alignment system 180 and has an independent frame structure including a photomask mounting frame 170 capable of mounting a photomask.
  • the photomask alignment apparatus 200 includes a photomask mounting frame 170 ; a photomask adsorption unit 171 formed on an edge of the photomask mounting frame 170;
  • the alignment reference point 182 is formed at least two, the alignment reference point 182 is an alignment reference portion 181 positioned to overlap the alignment mark 145; and a photographing device 183 mounted at a position capable of photographing the overlapping state of the alignment reference unit 181 and the alignment mark 145, wherein at least one of the alignment reference points 182 is one of a plurality of photomasks. It overlaps the alignment marks 145 formed on the first photomask, and the remainder overlaps the alignment marks 145 formed on the second photomask aligned adjacent to the first photomask.
  • FIG. 5 descriptions related to the photomask mounting frame 170 , the photomask adsorption unit 171 , the alignment reference unit 181 , the photographing device, the alignment reference point 182 , the alignment mark 145 and the like are shown in FIG. 5 in terms of structure and function. Since it is the same as described in the related description, it will be omitted here.
  • the photomask mounting frame 170 and the photomask adsorption unit 171 of the present embodiment are 1) configured independently from those configured in the exposure machine, and 2) including the alignment reference unit 181 and the photographing device 183 .
  • the photomask alignment system 180 is fixed to the frame, 3) a leg portion is formed on the lower portion of the frame, and 4) a photomask lifting bar 173 provided to be lifted at the lower portion of the photomask mounting frame 170 . ; is provided and ascends and descends to the central portion surrounded by the frame, and serves to support the photomask to be seated on the frame.
  • the supporter 220 supports the photomasks on the boundary surface of the photomask, and serves to maintain the alignment state when the photomask is moved; further includes.
  • the material of the support 220 is not limited, but it is preferable to use a glass material.

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Abstract

The present invention relates to a fine metal mask for a large-area display and a method for manufacturing same and, more particularly, to a method for manufacturing a fine metal mask which comprises: an effective portion in which a through-hole pattern for depositing an optical element is formed; and grip portions formed at both ends of the effective portion to act as a support in the deposition process of the optical element. The method for manufacturing a fine metal mask for a large-area display comprises the steps of: applying a photoresist on a region of a metal panel for manufacturing a fine metal mask; stacking a photomask having a pattern, on the metal panel on which the photoresist is applied; exposing a central region of the photoresist region on which the photomask is stacked; and shaping regions extending from the central region to both ends by laser processing, wherein the central region is the effective portion of the fine metal mask, and the regions extending to both ends, shaped by laser processing, are the grip portions of the fine metal mask.

Description

대면적 디스플레이용 미세 금속 마스크 및 그의 제조방법Fine metal mask for large-area display and method for manufacturing the same
본 발명은 대면적 디스플레이용 미세 금속 마스크의 제조방법에 관한 것으로서, 보다 상세하게는 8세대 대면적 디스플레이 제작용 미세 금속 마스크(fine metal mask)를 용이하게 제작하기 위하여, 복수의 포토 마스크 원자재 또는 복수의 포토 마스크를 연결하여 사용함으로써 확장된 유효부를 제작하고, 연결노광 또는 별도의 절단가공을 통하여 그립부를 제작하도록 한다. 이로써, 6.5세대 디스플레이 제작용 미세 금속 마스크에 비하여 길이가 연장된 유효부를 갖는 미세 금속 마스크를 제작함에 있어서 생산의 효율성을 기할 수 있을 뿐 아니라, 기존의 6.5세대용 미세 금속 마스크 제조용 노광장비를 그대로 활용할 수 있다.The present invention relates to a method of manufacturing a fine metal mask for a large area display, and more particularly, to easily manufacture a fine metal mask for manufacturing an 8th generation large area display, a plurality of photomask raw materials or a plurality of materials An extended effective part is manufactured by connecting and using a photomask of Accordingly, it is possible to increase production efficiency in manufacturing a fine metal mask having an effective portion extended in length compared to a fine metal mask for manufacturing a 6.5 generation display, and to utilize the existing exposure equipment for manufacturing a fine metal mask for the 6.5 generation as it is. can
디스플레이 산업발전 과정에서 '대형화'는 새로운 시장을 창출하고 규모를 확대해 지속 성장하는 토대가 되어왔다. 대형화는 대면적 디스플레이 패널 생산라인 구축 및 생산 패널 인치의 확대를 의미한다. 디스플레이 업체들은 대면적 라인을 구축, 생산성을 높이고 더 저렴한 원가로 대형 패널을 생산하는데 많은 노력을 기울이고 있다. In the process of development of the display industry, 'large size' has become the foundation for sustainable growth by creating a new market and expanding its scale. Enlargement means the establishment of a large-area display panel production line and the expansion of the production panel inch. Display makers are putting much effort into building large-area lines to increase productivity and produce large-sized panels at lower cost.
디스플레이 패널에 OLED 소자를 증착하기 위한 핵심 부품이 미세 금속 마스크(Fine metal mask)인데, 기존의 6.5세대 OLED 화소 증착용 미세 금속 마스크로는 더 이상 대면적화되는 디스플레이 패널의 트렌드를 따라잡기 어려운 상황에 놓여 있다. 따라서, 8세대 OLED 화소 증착용 미세 금속 마스크(이하에서는 "8세대 마스크"로 약칭함)의 개발이 필요한 실정이다.A key component for depositing OLED devices on a display panel is a fine metal mask, and it is difficult to keep up with the trend of large-area display panels with the existing 6.5G OLED pixel deposition fine metal mask. is laid Therefore, there is a need to develop a fine metal mask for deposition of 8th generation OLED pixels (hereinafter abbreviated as “8th generation mask”).
미세 금속 마스크는 화소가 증착되도록 패턴이 형성된 영역인 유효부와 화소를 증착하는 과정에서 미세 금속 마스크를 패널 위에 안착시키도록 하기 위하여 마스크 고정 역할을 하도록 상기 유효부의 양단에 형성된 그립부로 구성된다.The fine metal mask is composed of an effective portion, which is an area in which a pattern is formed so that pixels are deposited, and grip portions formed at both ends of the effective portion to perform a mask fixing role in order to seat the fine metal mask on the panel in the process of depositing the pixels.
다만, 6.5세대 마스크는 유효부의 길이가 1100mm인 반면, 8세대 마스크는 유효부의 길이가 2200mm이며, 여기에 그립부의 길이까지 고려하면 2600mm에 달하여, 최장 2400mm의 길이까지 노광이 가능한 기존의 노광기로써 8세대 마스크를 제작하기 어려운 문제점이 있다. However, the length of the effective part of the 6.5th generation mask is 1100mm, whereas the length of the effective part of the 8th generation mask is 2200mm. Considering the length of the grip part, it is 2600mm, which is a conventional exposure machine that can expose up to a length of 2400mm. There is a problem in that it is difficult to produce a generation mask.
또한, 8세대 마스크의 생산에 적합한 노광기를 제작하기 위해서는 많은 자본이 소요되는 만큼 높은 시장 가격의 형성이 예상되며, 따라서 새로운 노광기의 도입에 따른 부담이 가중되는 문제점도 존재한다.In addition, as much capital is required to manufacture an exposure machine suitable for production of an 8th generation mask, a high market price is expected, and thus there is a problem in that the burden due to the introduction of a new exposure machine is increased.
아울러, 8세대 마스크를 제작하기 위하여 사용되는 포토 마스크는 2개 또는 그 이상의 갯수를 합지하는 형태인 바, 각각 선가공된 포토 마스크 2개를 합지하는 과정에서 2개의 포토 마스크간 정렬의 연속성이나 정합성이 확보되지 못할 가능성이 높으며, 이와 같이 정렬의 연속성이나 정합성이 확보되지 못한 경우에는 화소 형성과정에서 화소 불량이 발생되고, 불량화소로 인하여 디스플레이의 해상도가 나빠지는 문제점이 발생될 수 있다. 따라서, 8세대 마스크를 제작하기 위한 새로운 공정기술 개발이 요망된다. In addition, the photomask used to manufacture the 8th generation mask is a type of laminating two or more numbers, so the continuity or consistency of alignment between the two photomasks in the process of laminating two pre-processed photomasks, respectively There is a high possibility that this cannot be ensured, and when continuity or consistency of alignment is not ensured in this way, pixel defects may occur in the process of forming pixels, and the resolution of the display may deteriorate due to the defective pixels. Therefore, the development of a new process technology for manufacturing the 8th generation mask is desired.
본 발명은 전술한 종래기술의 문제점을 해결하기 위하여 안출된 것으로서, 본 발명은 복수의 포토 마스크를 높은 정확도로 정렬함으로써, 높은 정렬도를 갖는 8세대 대면적 디스플레이 제조용 미세 금속 마스크를 제조하는 것을 목적으로 한다.The present invention has been devised to solve the problems of the prior art, and the present invention aims to manufacture a fine metal mask for manufacturing an 8th generation large-area display having a high degree of alignment by aligning a plurality of photo masks with high accuracy. do it with
또한, 본 발명은 기존의 미세 금속 마스크 제조방법을 대부분 채용함으로써, 기존 공정의 활용도를 높이고, 연결노광을 수행하거나 연결 절단공정을 도입함으로써, 생산의 효율화와 생산 속도의 향상을 도모할 수 있도록 하는 것을 다른 목적으로 한다.In addition, the present invention employs most of the existing fine metal mask manufacturing methods, thereby increasing the utility of the existing process, performing a connection exposure or introducing a connection cutting process, so that production efficiency and production speed can be improved. to serve a different purpose.
또한, 본 발명은 통상의 노광기를 활용하여 유효부와 그립부에 대한 연속노광 공정을 수행하거나, 유효부 노광과 그립부 절단 가공을 구분하여 수행함으로써, 8세대 대면적 디스플레이 제조용 미세 금속 마스크를 제조할 때, 새로운 노광기의 개발 필요성을 해소하고 통상의 노광기 활용도를 극대화할 수 있도록 하는 것을 또 다른 목적으로 한다.In addition, the present invention utilizes a conventional exposure machine to perform a continuous exposure process for the effective part and the grip part, or by separately performing the effective part exposure and the grip part cutting process, when manufacturing a fine metal mask for manufacturing an 8th generation large-area display. Another purpose is to solve the need for the development of a new exposure machine and to maximize the utilization of the conventional exposure machine.
또한, 본 발명은 복수의 포토 마스크를 정렬함에 있어서 기존의 노광기 상에서 포토 마스크들을 정밀하게 정렬할 수 있도록, 간이한 정렬 검사 장치를 구성하는 것을 또 다른 목적으로 한다.Another object of the present invention is to configure a simple alignment inspection apparatus to precisely align photo masks on an existing exposure machine in aligning a plurality of photo masks.
또한, 본 발명은 복수의 포토 마스크를 정렬하기 위한 별도의 얼라이너를 제작하고 복수의 포토 마스크를 간편한 방법으로 정밀하게 정렬할 수 있도록 하는 것을 또 다른 목적으로 한다.Another object of the present invention is to manufacture a separate aligner for aligning a plurality of photomasks and to precisely align the plurality of photomasks in a simple manner.
본 발명은 전술한 목적을 달성하기 위하여, 광학소자를 증착하기 위한 관통홀 패턴이 형성된 유효부와, 상기 유효부 양단에 형성되어 광학소자의 증착과정에서 지지체의 역할을 하는 그립부를 포함하는 미세 금속 마스크를 제조하는 방법에 있어서, 미세 금속 마스크를 제조하기 위한 금속 패널의 일 영역에 포토레지스트를 도포하는 단계; 상기 포토레지스트가 도포된 금속 패널상에 패턴이 형성된 포토 마스크를 적층하는 단계; 상기 포토 마스크가 적층된 포토레지스트 영역 중 중앙부 영역을 노광하는 단계; 및 상기 중앙부 영역으로부터 양단부로 연장되는 영역을 레이저 가공에 의하여 형상화하는 단계;를 포함하며, 상기 중앙부 영역은 미세 금속 마스크의 유효부이고, 레이저 가공에 의하여 형상화된 양단부 연장 영역은 미세 금속 마스크의 그립부인 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크의 제조방법을 제공한다.In order to achieve the above object, the present invention provides a fine metal including an effective portion having a through-hole pattern for depositing an optical element and a grip portion formed at both ends of the effective portion to serve as a support in the deposition process of the optical element. A method of manufacturing a mask, the method comprising: applying a photoresist to a region of a metal panel for manufacturing a fine metal mask; laminating a photomask having a pattern formed thereon on the photoresist-coated metal panel; exposing a central region of the photoresist region on which the photomask is stacked; and shaping a region extending from the central region to both ends by laser processing, wherein the central region is an effective part of the fine metal mask, and the both ends extending region shaped by laser processing is a grip of the fine metal mask It provides a method of manufacturing a fine metal mask for a large area display, characterized in that the denial.
또한, 본 발명은 광학소자를 증착하기 위한 관통홀 패턴이 형성된 유효부와, 상기 유효부 양단에 형성되어 광학소자의 증착과정에서 지지체의 역할을 하는 그립부를 포함하는 미세 금속 마스크를 제조하는 방법에 있어서, 미세 금속 마스크를 제조하기 위한 금속 패널의 일 영역에 포토레지스트를 도포하는 단계; 상기 포토레지스트가 도포된 금속 패널상에 패턴이 형성된 포토 마스크를 적층하는 단계; 상기 포토 마스크가 적층된 포토레지스트 영역의 중앙부 영역 또는 일단부 영역을 노광하는 제1노광 단계; 및 상기 제1노광 단계 이후에, 상기 노광된 영역 이외의 영역을 노광하는 제2노광 단계;를 포함하며, 상기 중앙부 영역은 미세 금속 마스크의 유효부이고, 상기 일단부 영역은 미세 금속 마스크의 그립부인 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크의 제조방법을 제공한다.In addition, the present invention relates to a method of manufacturing a fine metal mask comprising an effective portion having a through-hole pattern for depositing an optical element and a grip portion formed at both ends of the effective portion to serve as a support in the deposition process of the optical element. In the following, applying a photoresist to one area of the metal panel for manufacturing a fine metal mask; laminating a photomask having a pattern formed thereon on the photoresist-coated metal panel; a first exposure step of exposing a central region or one end region of the photoresist region on which the photomask is stacked; and a second exposure step of exposing a region other than the exposed region after the first exposure step; wherein the central region is an effective part of the fine metal mask, and the one end region is the grip of the fine metal mask It provides a method of manufacturing a fine metal mask for a large area display, characterized in that the denial.
상기 제2노광 단계의 수행시, 제1노광 단계에 의하여 노광된 영역에는 차광이 이루어지는 것이 바람직하다.When performing the second exposure step, it is preferable that light is blocked in the area exposed by the first exposure step.
상기 유효부가 절반씩 연속노광에 의하여 형성되어 연결되는 것이 바람직하다.It is preferable that the effective portions are formed by continuous exposure in half and connected.
상기 포토 마스크를 제작하는 과정은, 복수의 포토 마스크 원자재를 길이방향으로 합지하는 단계; 및 합지된 복수의 포토 마스크 원자재 상에 패턴을 플로팅하는 단계;를 포함하는 것를 포함하는 것이 바람직하다.The manufacturing of the photomask may include laminating a plurality of photomask raw materials in a longitudinal direction; and floating a pattern on a plurality of laminated photomask raw materials.
상기 포토 마스크를 제작하는 과정은, 포토 마스크 상에 적어도 1개의 정렬 마크를 생성하는 제1단계; 상기 정렬 마크가 생성된 적어도 두 개의 포토 마스크들을 노광기의 포토 마스크 장착 프레임에 1차 정렬하여 장착하는 제2단계; 상기 장착된 포토 마스크간 정렬 마크의 위치를 확인하는 제3단계; 및 확인된 정렬 마크의 위치에 따라서 정렬 상태의 완성 여부를 확정하는 제4단계;를 포함하며, 정렬상태가 미완성된 경우 상기 포토 마스크들을 2차 정렬한 후 상기 제3단계부터 다시 수행하는 것이 바람직하다.The manufacturing of the photomask may include: a first step of generating at least one alignment mark on the photomask; a second step of first aligning and mounting the at least two photomasks on which the alignment marks are generated on a photomask mounting frame of an exposure machine; a third step of confirming the positions of the alignment marks between the mounted photomasks; and a fourth step of determining whether the alignment state is complete according to the confirmed position of the alignment mark; and, if the alignment state is not completed, it is preferable to perform the second step after aligning the photomasks again from the third step do.
상기 제3단계는 포토 마스크 정렬 시스템에 의하여 수행되며, 상기 시스템은, 정렬 기준점이 적어도 두 개 형성되며, 상기 정렬 기준점은 정렬 마크와 중첩되도록 위치되는 정렬 기준부; 및 상기 정렬 기준부와 정렬 마크의 중첩 상태를 촬영할 수 있는 위치에 장착되는 촬영 장치;를 포함하되, 상기 정렬 기준점 중 적어도 하나는 복수의 포토 마스크 중 제1포토 마스크에 형성된 정렬 마크에 중첩되고, 나머지는 제1포토 마스크에 인접하여 정렬된 제2포토 마스크에 형성된 정렬 마크에 중첩되는 것이 바람직하다.The third step is performed by a photomask alignment system, comprising: an alignment reference unit having at least two alignment reference points formed thereon, the alignment reference points being positioned to overlap the alignment marks; and a photographing device mounted at a position capable of photographing the overlapping state of the alignment reference unit and the alignment mark, wherein at least one of the alignment reference points overlaps the alignment mark formed on the first photomask among the plurality of photomasks, The remainder preferably overlaps the alignment marks formed on the second photomask aligned adjacent to the first photomask.
상기 정렬 시스템은 상기 포토 마스크의 상부 또는 하부에 위치되며, 이동가능하게 구성되는 것이 바람직하다.The alignment system may be positioned above or below the photomask and may be configured to be movable.
상기 촬영 장치는 상기 정렬 기준점의 갯수만큼 구비되는 것이 바람직하다.It is preferable that the photographing device is provided as many as the number of the alignment reference points.
상기 포토 마스크를 제작하는 과정은, 포토 마스크 상에 적어도 1개의 정렬 마크를 생성하는 제1단계; 상기 정렬 마크가 생성된 적어도 두 개의 포토 마스크들을 포토 마스크 정렬 장치의 포토 마스크 장착 프레임에 1차 정렬하여 장착하는 제2단계; 상기 장착된 포토 마스크간 정렬 마크의 위치를 확인하는 제3단계; 및 확인된 정렬 마크의 위치에 따라서 정렬 상태의 완성 여부를 확정하는 제4단계;를 포함하며, 정렬상태가 미완성된 경우 상기 포토 마스크들을 2차 정렬한 후 상기 제3단계부터 다시 수행하는 것이 바람직하다.The manufacturing of the photomask may include: a first step of generating at least one alignment mark on the photomask; a second step of first aligning and mounting the at least two photomasks on which the alignment marks are generated on a photomask mounting frame of a photomask alignment apparatus; a third step of confirming the positions of the alignment marks between the mounted photomasks; and a fourth step of determining whether the alignment state is complete according to the confirmed position of the alignment mark; and, if the alignment state is not completed, it is preferable to perform the second step after aligning the photomasks again from the third step do.
상기 포토 마스크 정렬 장치는, 포토 마스크 장착 프레임; 상기 포토 마스크 장착 프레임의 테두리에 형성되는 포토 마스크 흡착부; 정렬 기준점이 적어도 두 개 형성되며, 상기 정렬 기준점은 정렬 마크와 중첩되도록 위치되는 정렬 기준부; 및 상기 정렬 기준부와 정렬 마크의 중첩 상태를 촬영할 수 있는 위치에 장착되는 촬영 장치;를 포함하되, 상기 정렬 기준점 중 적어도 하나는 복수의 포토 마스크 중 제1포토 마스크에 형성된 정렬 마크에 중첩되고, 나머지는 제1포토 마스크에 인접하여 정렬된 제2포토 마스크에 형성된 정렬 마크에 중첩되는 것이 바람직하다.The photomask alignment apparatus may include a photomask mounting frame; a photomask adsorption unit formed on an edge of the photomask mounting frame; At least two alignment reference points are formed, the alignment reference point is an alignment reference portion positioned to overlap the alignment mark; and a photographing device mounted at a position capable of photographing the overlapping state of the alignment reference unit and the alignment mark, wherein at least one of the alignment reference points overlaps the alignment mark formed on the first photomask among the plurality of photomasks, The remainder preferably overlaps the alignment marks formed on the second photomask aligned adjacent to the first photomask.
상기 포토 마스크 정렬 장치는, 상기 포토 마스크 장착 프레임의 하부에 승강 가능하도록 마련되는 포토 마스크 승강바; 상기 복수의 포토 마스크 합지시 경계면에서 포토 마스크들을 지지하는 지지 글라스;를 포함하는 것이 바람직하다.The photomask alignment device may include: a photomask lifting bar provided to be liftable under the photomask mounting frame; It is preferable to include a; support glass for supporting the photomasks at the interface when the plurality of photomasks are laminated.
상기 촬영 장치는 상기 정렬 기준점의 갯수만큼 구비되는 것이 바람직하다.It is preferable that the photographing device is provided as many as the number of the alignment reference points.
또한, 본 발명은 전술한 방법에 의하여 제조되어, 유효부와 그립부가 연속적으로 또는 구분하여 가공되어 단일의 개체를 이루는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크를 제공한다.In addition, the present invention provides a fine metal mask for a large area display, which is manufactured by the above-described method, and characterized in that the effective part and the grip part are processed continuously or separately to form a single object.
이상과 같은 본 발명에 따르면, 복수의 포토 마스크를 높은 정확도로 정렬함으로써, 높은 정렬도를 갖는 8세대 대면적 디스플레이 제조용 미세 금속 마스크를 용이하게 제조하는 효과가 기대된다.According to the present invention as described above, by aligning a plurality of photomasks with high accuracy, an effect of easily manufacturing a fine metal mask for manufacturing an 8th generation large-area display having a high degree of alignment is expected.
또한, 본 발명은 기존의 미세 금속 마스크 제조방법을 대부분 채용함으로써, 기존 공정의 활용도를 높이고, 연결노광을 수행하거나 연결 절단공정을 도입함으로써, 생산의 효율화와 생산 속도의 향상을 도모할 수 있는 효과가 기대된다.In addition, the present invention employs most of the existing fine metal mask manufacturing method, thereby increasing the utilization of the existing process, performing connection exposure or introducing a connection cutting process, thereby promoting efficiency in production and improvement of production speed. is expected
또한, 본 발명은 통상의 노광기를 활용하여 유효부와 그립부에 대한 연속노광 공정을 수행하거나, 유효부 노광과 그립부 절단 가공을 구분하여 수행함으로써, 8세대 대면적 디스플레이 제조용 미세 금속 마스크를 제조할 때, 새로운 노광기의 개발 필요성을 해소하고 통상의 노광기 활용도를 극대화할 수 있는 효과가 기대된다.In addition, the present invention utilizes a conventional exposure machine to perform a continuous exposure process for the effective part and the grip part, or by separately performing the effective part exposure and the grip part cutting process, when manufacturing a fine metal mask for manufacturing an 8th generation large-area display. , it is expected to solve the need for the development of a new exposure machine and to maximize the utilization of the conventional exposure machine.
또한, 본 발명은 복수의 포토 마스크를 정렬함에 있어서 간이한 정렬 검사 장치를 구성하고, 이를 기존의 노광기 상에서 활용함으로써, 편리하고 간이한 방법에 의하여 포토 마스크들을 정밀하게 정렬할 수 있도록 하는 효과가 기대된다.In addition, the present invention configures a simple alignment inspection apparatus in aligning a plurality of photomasks and utilizes it on an existing exposure machine, so that the effect of allowing the photomasks to be precisely aligned by a convenient and simple method is expected. do.
또한, 본 발명은 복수의 포토 마스크를 정렬하기 위한 별도의 얼라이너를 제작함으로써, 노광 공정 수행 전에 복수의 포토 마스크를 간편한 방법으로 정밀하게 정렬할 수 있도록 하는 효과가 기대된다.In addition, by manufacturing a separate aligner for aligning the plurality of photomasks, the present invention is expected to have the effect of precisely aligning the plurality of photomasks in a simple way before performing the exposure process.
도 1은 본 발명의 일 실시예에 의한 미세 금속 마스크의 제작과정에서 유효부와 그립부의 연속노광 과정을 설명하기 위한 순서도이다.1 is a flowchart for explaining a process of continuous exposure of an effective part and a grip part in a manufacturing process of a fine metal mask according to an embodiment of the present invention.
도 2는 본 발명의 다른 실시예에 의한 미세 금속 마스크의 제작과정에서 유효부와 그립부의 연속노광 과정을 설명하기 위한 순서도이다.2 is a flowchart for explaining a process of continuous exposure of an effective part and a grip part in a manufacturing process of a fine metal mask according to another embodiment of the present invention.
도 3은 본 발명의 일 실시예에 의한 미세 금속 마스크의 제작과정에서 유효부 노광 후 그립부 절단 가공 과정을 설명하기 위한 순서도이다.3 is a flowchart illustrating a grip part cutting process after exposure of an effective part in a manufacturing process of a fine metal mask according to an embodiment of the present invention.
도 4는 본 발명의 일 실시예에 의하여 포토 마스크 원자재를 합지하고, 플로팅 과정을 통하여 높은 정렬도를 갖도록 제작되는 포토 마스크의 제작 순서도이다. 4 is a manufacturing flowchart of a photomask manufactured to have a high degree of alignment by laminating raw materials for a photomask according to an embodiment of the present invention, and performing a floating process.
도 5는 본 발명의 일 실시예에 의한 두개의 개별적 포토 마스크를 합지하고 정렬도를 확보하는 과정을 나타내는 순서도로서, 기존의 노광기를 사용하는 경우를 나타낸 것이다. 5 is a flowchart illustrating a process of laminating two individual photomasks and securing alignment according to an embodiment of the present invention, and shows a case in which an existing exposure machine is used.
도 6은 도 5에 따른 포트 마스크 합지 및 정렬도 확보 후 이를 이용하여 미세 금속 마스크의 표면을 노광하는 과정을 나타내는 순서도이다.FIG. 6 is a flowchart illustrating a process of exposing the surface of a fine metal mask by using the port mask lamination and alignment diagram according to FIG. 5 .
도 7은 본 발명의 다른 실시예에 의한 두개의 개별적 포토 마스크를 합지하고 정렬도를 확보하는 과정을 나타내는 순서도로서, 별도의 정렬 장치를 사용하는 경우를 나타낸 것이다. 7 is a flowchart illustrating a process of laminating two individual photomasks and securing an alignment degree according to another embodiment of the present invention, and shows a case in which a separate alignment device is used.
도 8은 도 7의 정렬 장치를 측면에서 나타냄과 동시에 포토 마스크의 합지 및 정렬상태 확인을 위한 과정을 나타낸 것이다.FIG. 8 shows the alignment device of FIG. 7 from the side, and at the same time shows a process for laminating a photomask and confirming an alignment state.
이하, 첨부한 도면을 참고로 하여 본 발명의 실시예에 대하여 본 발명이 속하는 기술 분야에서 통상의 지식을 가진 자가 용이하게 실시할 수 있도록 상세히 설명한다. 그러나 본 발명은 여러 가지 상이한 형태로 구현될 수 있으며 여기에서 설명하는 실시예에 한정되지 않는다. 그리고 도면에서 본 발명을 명확하게 설명하기 위해서 설명과 관계없는 부분은 생략하였으며, 명세서 전체를 통하여 유사한 부분에 대해서는 유사한 도면 부호를 붙였다.Hereinafter, with reference to the accompanying drawings, embodiments of the present invention will be described in detail so that those of ordinary skill in the art to which the present invention pertains can easily implement them. However, the present invention may be embodied in several different forms and is not limited to the embodiments described herein. And in order to clearly explain the present invention in the drawings, parts irrelevant to the description are omitted, and similar reference numerals are attached to similar parts throughout the specification.
명세서 전체에서, 어떤 부분이 어떤 구성요소를 "포함"한다고 할 때, 이는 특별히 반대되는 기재가 없는 한 다른 구성요소를 제외하는 것이 아니라 다른 구성요소를 더 포함할 수 있는 것을 의미한다.Throughout the specification, when a part "includes" a certain component, it means that other components may be further included, rather than excluding other components, unless otherwise stated.
또한, 명세서에 기재된 "…부", "…기" 등의 용어는 적어도 하나의 기능이나 동작을 처리하는 단위를 의미한다.In addition, terms such as "... unit" and "... group" described in the specification mean a unit for processing at least one function or operation.
본 발명은 8세대 미세 금속 마스크를 제작하는 것으로서, 8세대 미세 금속 마스크는 기존의 6.5세대 미세 금속 마스크보다 유효부의 길이가 2배 길게 형성된 것이 특징이다. 8세대 미세 금속 마스크의 전체 길이는 2600mm로서, 1500mm의 6.5세대 미세 금속 마스크 전체 길이 대비 1100mm 더 길다. 한편, 미세 금속 마스크 제조를 위한 일 과정인 노광 공정을 수행하기 위한 노광기는 최대 2500mm 길이의 피처리체를 노광할 수 있기 때문에, 6.5세대 미세 금속 마스크의 1회 전체 노광은 가능하나, 8세대 미세 금속 마스크의 1회 전체 노광은 불가능하다. The present invention is to fabricate an 8th generation fine metal mask, and the 8th generation fine metal mask is characterized in that the effective portion is twice as long as that of the existing 6.5 generation fine metal mask. The overall length of the 8th generation fine metal mask is 2600 mm, which is 1100 mm longer than the total length of the 6.5 generation fine metal mask of 1500 mm. On the other hand, since the exposure machine for performing the exposure process, which is a process for manufacturing a fine metal mask, can expose a target object with a length of up to 2500 mm, one full exposure of the 6.5 generation fine metal mask is possible, but the 8th generation fine metal mask One full exposure of the mask is not possible.
도 1은 본 발명의 일 실시예에 의한 미세 금속 마스크의 제작과정에서 유효부와 그립부의 연속노광 과정을 설명하기 위한 순서도이며, 도 2는 본 발명의 다른 실시예에 의한 미세 금속 마스크의 제작과정에서 유효부와 그립부의 연속노광 과정을 설명하기 위한 순서도이고, 도 3은 본 발명의 일 실시예에 의한 미세 금속 마스크의 제작과정에서 유효부 노광 후 그립부 절단 가공 과정을 설명하기 위한 순서도이며, 도 4는 본 발명의 일 실시예에 의하여 포토 마스크 원자재를 합지하고, 플로팅 과정을 통하여 높은 정렬도를 갖도록 제작되는 포토 마스크의 제작 순서도이고, 도 5는 본 발명의 일 실시예에 의한 두개의 개별적 포토 마스크를 합지하고 정렬도를 확보하는 과정을 나타내는 순서도로서, 기존의 노광기를 사용하는 경우를 나타낸 것이며, 도 6은 도 5에 따른 포트 마스크 합지 및 정렬도 확보 후 이를 이용하여 미세 금속 마스크의 표면을 노광하는 과정을 나타내는 순서도이고, 도 7은 본 발명의 다른 실시예에 의한 두개의 개별적 포토 마스크를 합지하고 정렬도를 확보하는 과정을 나타내는 순서도로서, 별도의 정렬 장치를 사용하는 경우를 나타낸 것이며, 도 8은 도 7의 정렬 장치를 측면에서 나타냄과 동시에 포토 마스크의 합지 및 정렬상태 확인을 위한 과정을 나타낸 것이다.1 is a flowchart for explaining a process of continuous exposure of an effective part and a grip part in a manufacturing process of a fine metal mask according to an embodiment of the present invention, and FIG. 2 is a manufacturing process of a fine metal mask according to another embodiment of the present invention It is a flowchart for explaining the continuous exposure process of the effective part and the grip part, and FIG. 3 is a flowchart for explaining the grip part cutting process after exposure of the effective part in the manufacturing process of the fine metal mask according to an embodiment of the present invention, FIG. 4 is a manufacturing flowchart of a photomask manufactured to have a high degree of alignment through laminating photomask raw materials and a floating process according to an embodiment of the present invention, and FIG. 5 is two individual photos according to an embodiment of the present invention. As a flow chart showing the process of laminating the mask and securing the alignment, it shows a case of using an existing exposure machine, and FIG. 6 is the port mask lamination and alignment according to FIG. It is a flowchart showing a process of exposing, and FIG. 7 is a flowchart showing a process of laminating two individual photomasks and securing alignment according to another embodiment of the present invention, showing a case in which a separate alignment device is used, FIG. 8 shows the alignment device of FIG. 7 from the side, and at the same time shows a process for laminating a photomask and confirming an alignment state.
도 1에서는 8세대 마스크에 적합한 유효부(120) 길이를 갖는 미세 금속 마스크(100)를 제작하기 위하여 금속 판재(190)(예를 들어, Invar)를 마스크의 길이 방향과 동일한 방향으로 이동시키면서 노광하는 과정을 나타내었다. In FIG. 1, in order to fabricate a fine metal mask 100 having an effective portion 120 length suitable for an 8th generation mask, the metal plate 190 (eg, Invar) is exposed while moving in the same direction as the length direction of the mask. showed the process.
미세 금속 마스크(100)는 유효부(120)와 유효부(120)의 양측에 일체로 구성되는 그립부(110)로 구성되며, 디스플레이에 대한 OLED 화소 증착용 가공홀은 유효부(120)에 형성된다. The fine metal mask 100 is composed of an effective portion 120 and a grip portion 110 integrally formed on both sides of the effective portion 120 , and a processing hole for OLED pixel deposition for the display is formed in the effective portion 120 . do.
공정의 측면에서 보면, 금속 판재(190)상에 상기 가공홀 형성의 기초가 되는 패턴을 형성하기 위하여 먼저 포토레지스트를 금속 판재(190)상에 도포하고, 도포된 포토레지스트의 선별적 노광 및 현상을 위하여 포토 마스크를 포토레지스트 상에 적층한 후 노광을 실시한다.In terms of the process, in order to form a pattern that is the basis for forming the processing hole on the metal plate 190, photoresist is first applied on the metal plate 190, and the applied photoresist is selectively exposed and developed. For this, a photomask is laminated on the photoresist and then exposed.
8세대 미세 금속 마스크(100)는 길이가 노광기의 거치 프레임 및 가용 노광 영역에 비하여 길기 때문에, 유효부(120)와 그립부(110)를 동시에 노광하는 것이 불가능하게 되었다. 따라서, 본 발명에서는 유효부(120)와 그립부(110)를 기본 단위로 하여 연속 노광 또는 순차적 노광을 실시함으로써, 이러한 불가능성을 극복하고자 하였다.Since the length of the 8th generation fine metal mask 100 is longer than that of the mounting frame and the usable exposure area of the exposure machine, it is impossible to simultaneously expose the effective portion 120 and the grip portion 110 . Accordingly, in the present invention, continuous exposure or sequential exposure is performed using the effective portion 120 and the grip portion 110 as basic units, thereby overcoming this impossibility.
여기서는 도시된 바와 같이, 가공대상인 두 개의 미세 금속 마스크(100)를 발췌하여 표시하였다. 실제로는 위 두 개의 미세 금속 마스크(100) 중 좌측 미세 금속 마스크(100)의 좌측에 가공된 미세 금속 마스크(100)가 더 표시될 수 있으나, 발췌의 취지상 이의 표시는 생략하였다. Here, as shown, two fine metal masks 100 to be processed are extracted and displayed. In reality, the processed fine metal mask 100 may be further displayed on the left side of the left fine metal mask 100 among the two fine metal masks 100 , but for the purpose of excerpt, the display thereof is omitted.
먼저, 제일 좌측의 그립부(110)를 형성하기 위하여 해당 부분의 금속 판재(190)를 노광하였다. 다만, 상기 그립부(110) 좌측의 인접하는 그립부(110)를 동시에 노광하는 것이 생산 공정상 더 효율적이다. 그러나, 여기서는 인접 그립부(110)가 도시되지 않았으므로 설명의 취지상 제일 좌측의 그립부(110) 형성을 위한 노광이 가장 먼저 수행되는 것으로 하였다. 이후에는 인접한 유효부(120)를 노광하였고, 이후에 순차적으로 우측 그립부(110)를 노광하거나, 우측 그립부(110)와 인접하는 가공대상 미세 금속 마스크(100)의 좌측 그립부(110)를 동시에 노광할 수 있다. 이후에 다시 유효부(120)와 우측 그립부(110)를 순차적으로 노광하였다. First, in order to form the leftmost grip part 110, the metal plate 190 of the corresponding part was exposed. However, it is more efficient in the production process to simultaneously expose the adjacent grip part 110 on the left side of the grip part 110 . However, since the adjacent grip part 110 is not shown here, it is assumed that exposure for forming the leftmost grip part 110 is performed first for the purpose of description. Thereafter, the adjacent effective portion 120 is exposed, and then the right grip portion 110 is sequentially exposed, or the right grip portion 110 and the left grip portion 110 of the fine metal mask 100 to be processed adjacent to the right grip portion 110 are simultaneously exposed. can do. Thereafter, the effective portion 120 and the right grip portion 110 were sequentially exposed again.
이와 같은 연속 노광 공정을 통하여 기존의 노광기를 그대로 활용하면서도 8세대급의 유효부(120) 길이가 확장된 미세 금속 마스크(100)를 제작할 수 있다. Through such a continuous exposure process, it is possible to manufacture a fine metal mask 100 in which the length of the effective portion 120 of the 8th generation is extended while using the existing exposure machine as it is.
도 2는 연속 노광을 수행하는 공정이라는 점에서는 도 1과 동일하나, 포토 마스크의 이동 경로가 상이하며, 도 1이 길이방향으로 연속하여 노광 공정을 수행하는 것이라면, 도 2는 상하 교번하여 노광을 수행한다는 점에서 상이하다. 도 2에서는 노광의 영역이 좌측의 가공대상 미세 금속 마스크(100) 유효부(120)의 길이에 대응되므로, 우측의 가공대상 미세 금속 마스크(100) 그립부(110)를 노광할 때에는 그와 인접한 유효부(120) 영역은 차광되는 것이 바람직하다. Y축으로는 금속 판재(190)(재료)가 이송되며, X축으로는 포토 마스크가 이동됨을 표시하였다. 여기서, 유효부(120)의 경우, 6.5세대 미세 금속 마스크(100)의 유효부(120)에 부합되는 1100mm의 유효부(120)에 대하여 노광한 후, 연속 노광 과정을 통하여 나머지 1100mm의 유효부(120)에 대하여 연결 노광을 실시함으로써 8세대 미세 금속 마스크(100)의 유효부(120)(2200mm)를 형성할 수 있고, 아니면, 8세대 미세 금속 마스크(100)의 유효부(120)(2200mm)를 한꺼번에 노광에 의하여 형성할 수도 있다.Figure 2 is the same as Figure 1 in that it is a process of performing continuous exposure, but the movement path of the photomask is different. It is different in that it performs In FIG. 2 , since the exposure area corresponds to the length of the effective part 120 of the fine metal mask 100 to be processed on the left side, when exposing the grip part 110 of the fine metal mask 100 to be processed on the right side, the effective area adjacent thereto The area of the sub 120 is preferably shielded from light. In the Y-axis, the metal plate 190 (material) is transferred, and in the X-axis, the photomask is moved. Here, in the case of the effective part 120, after exposure to the effective part 120 of 1100 mm that matches the effective part 120 of the 6.5 generation fine metal mask 100, the remaining effective part of 1100 mm through a continuous exposure process By performing connection exposure to 120, the effective portion 120 (2200 mm) of the 8th generation fine metal mask 100 can be formed, otherwise, the effective portion 120 of the 8th generation fine metal mask 100 ( 2200 mm) may be formed by exposure at once.
도 3은 노광 과정을 미세 금속 마스크(100)의 유효부(120)만 수행하는 방법을 제시한 것이다. 유효부(120)만을 노광하는 것은 현재의 노광기로도 가능하므로, 유효부(120) 노광을 먼저 수행하고, 양단의 그립부(110)는 레이저 등 커팅 수단을 이용하여 커팅 가공하도록 공정을 구성하였다. 여기서, 커팅 수단을 레이저 발생부(130)으로 표시하였으나, 커팅 수단은 특별히 제한되지 않는다. 즉, 칼날을 이용한 커팅, 워터 제트를 이용한 커팅 등을 예시로 들 수 있다. 커팅 수단은 노광 과정과의 공정 연속성, 공정 수행 주체의 보유 설비 등을 고려하여 결정될 수 있다.FIG. 3 shows a method of performing the exposure process only on the effective portion 120 of the fine metal mask 100 . Since exposing only the effective part 120 is possible with the current exposure machine, the effective part 120 exposure is performed first, and the grip part 110 at both ends is cut using a cutting means such as a laser. Here, although the cutting means is indicated by the laser generating unit 130, the cutting means is not particularly limited. That is, cutting using a blade, cutting using a water jet, etc. may be mentioned as examples. The cutting means may be determined in consideration of process continuity with the exposure process, equipment owned by the subject performing the process, and the like.
도 4는 미세 금속 마스크(100)를 노광하는데 사용하는 포토 마스크의 제조과정을 도시한 것이다. 먼저, 두 개의 포토 마스크 원자재(141)를 거치판(140)에 거치함과 동시에 서로 합지를 수행한다. 이로써 두 개의 포토 마스크 원자재(141)간에 경계면이 형성된다. 상기 거치판(140)은 유리판을 주로 채택한다. 유리판은 내열성을 가지고 있으면서도 투명하기 때문에 노광 과정을 수행하는데 적합하기 때문이다. 다만, 유리판이 아닌 적절한 재질이 대체재로 채택될 수도 있다. FIG. 4 illustrates a manufacturing process of a photomask used for exposing the fine metal mask 100 . First, the two photomask raw materials 141 are mounted on the mounting plate 140 and lamination is performed at the same time. Accordingly, an interface is formed between the two photomask raw materials 141 . The mounting plate 140 mainly adopts a glass plate. This is because the glass plate is suitable for performing the exposure process because it has heat resistance and is transparent. However, an appropriate material other than the glass plate may be adopted as an alternative material.
이후에 포토 마스크 원자재(141)상에 플로팅을 수행하는데, 플로팅은 미세 금속 마스크(100)의 패터닝을 위한 것이며, 플로팅 수단(160)을 활용한 플로팅을 통하여 원하는 형태의 패턴을 갖는 포토 마스크를 제조할 수 있다. 여기서는 두개의 포토 마스크 원자재(141)를 합지함으로써, 8세대 미세 금속 마스크(100)를 제조하는데 적합하도록 길이가 확장된 포토 마스크를 제조하게 된다. 이 때, 플로팅은 레이저 플로팅 방법이 가장 바람직하나, 다른 수단에 의한 플로팅도 가능하며, 플로팅 이외의 방법으로서, 패턴을 형성할 수 있는 방안이 도출된다면 이를 이용하는 것도 가능하다.Thereafter, floating is performed on the photomask raw material 141 . The floating is for patterning the fine metal mask 100 , and a photomask having a desired shape is manufactured through floating using the floating means 160 . can do. Here, by laminating two photomask raw materials 141 , a photomask having an extended length suitable for manufacturing the 8th generation fine metal mask 100 is manufactured. In this case, the most preferred method for floating is a laser floating method, but floating by other means is also possible, and as a method other than floating, if a method for forming a pattern is derived, it is also possible to use it.
이 때, 경계면은 플로팅시 연속성을 확보하기 어렵고, 경계면에도 플로팅이 이루어지면 해당 부분에 의하여 형성되는 패턴은 형상면에서 일관성이 없거나 오류가 발생될 수 있기 때문에 해당 부분은 제외하고 플로팅을 수행하게 된다. At this time, the boundary surface is difficult to secure continuity when floating, and if the boundary surface is also floated, the pattern formed by the corresponding portion may be inconsistent or an error may occur in the shape surface. .
이후에는 상기 포토레지스트상에 포토 마스크 패턴이 형성되도록 노광, 현상, 에칭 및 박리 과정을 순차적으로 수행After that, exposure, development, etching, and peeling processes are sequentially performed to form a photomask pattern on the photoresist.
포토 마스크의 패턴 영역은 2200mm의 길이를 가지며, 8세대 미세 금속 마스크(100)의 유효부(120)와 길이가 일치한다. 이로써, 8세대 미세 금속 마스크(100)의 제작을 위한 노광 공정의 수행이 가능하다.The pattern region of the photomask has a length of 2200 mm, and the length coincides with the effective portion 120 of the 8th generation fine metal mask 100 . Accordingly, it is possible to perform an exposure process for manufacturing the 8th generation fine metal mask 100 .
도 5는 제작된 단위 포토 마스크를 합지하는데 있어서 정렬 상태를 확인하기 위한 방법을 제시한 것이다. 도시된 포토 마스크 장착 프레임(170)은 포토 마스크가 거치(장착)되는 영역으로서, 상기 프레임에 의하여 둘러싸인 중앙부분은 관통되어 있으며, 포토 마스크가 안착된 투명한 거치판(172)이 위치하게 된다. 아울러, 프레임의 테두리에는 음압이 걸리는 슬릿(slit)이 마련되어 있어 포토 마스크를 거치하면 음압에 의하여 포토 마스크를 프레임에 안착시킬 수 있으며, 따라서 포토 마스크의 안정적인 고정이 가능하다. 위 슬릿은 홀로 대체될 수도 있으며, 음압을 이용할 수 있는 틈새 공간은 어떠한 형태이어도 무방하다.5 is a view showing a method for confirming the alignment state in laminating the manufactured unit photomask. The illustrated photomask mounting frame 170 is a region on which a photomask is mounted (mounted), a central portion surrounded by the frame is penetrated, and a transparent mounting plate 172 on which the photomask is mounted is positioned. In addition, since a slit to which a negative pressure is applied is provided at the edge of the frame, the photomask can be seated on the frame by the negative pressure when the photomask is mounted, thus stably fixing the photomask. The upper slit may be replaced by a single hole, and the interstitial space that can use the sound pressure may have any shape.
포토 마스크 장착 프레임(170)은 제작된 단위 포토 마스크 두개가 거치될 수 있는 크기를 갖는다. 그러나, 거치될 수 있는 포토 마스크의 수량은 두 개로 제한되는 것이 아니며, 프레임의 크기나 마스크의 길이에 따라서 더 많은 포토 마스크가 거치될 수도 있다. The photomask mounting frame 170 has a size on which two manufactured unit photomasks can be mounted. However, the number of photomasks that can be mounted is not limited to two, and more photomasks may be mounted according to the size of the frame or the length of the mask.
포토 마스크 장착 프레임(170)은 기존의 노광기의 일 구성요소로서, 단일의 포토 마스크를 고정하고, 이를 이용하여 금속 판재(190)를 노광하는 공정에 사용되고 있다. 그러나, 복수의 포토 마스크를 합지 및 거치하고 이들간의 정렬 상태를 확인할 수 있는 기능은 탑재하지 않는다. 전술한 바와 같이, 복수의 포토 마스크를 합지하는 경우 패턴의 정렬이 면밀하게 이루어져야 하기 때문에, 복수의 포토 마스크를 정밀하게 정렬하여야 하며, 정렬 상태를 확인할 수 있는 수단이 별도로 강구되어야 한다. The photomask mounting frame 170 is a component of a conventional exposure machine, and is used in a process of fixing a single photomask and exposing the metal plate 190 using the fixed photomask. However, a function for laminating and mounting a plurality of photomasks and checking the alignment state between them is not mounted. As described above, when a plurality of photomasks are laminated, the pattern must be closely aligned, so the plurality of photomasks must be precisely aligned, and a means for checking the alignment state must be separately devised.
이에, 본 발명에서는 이동형의 포토 마스크 정렬 시스템(180)을 노광기에 부가하였으며, 이로써, 합지된 포토 마스크의 정렬상태를 정밀하게 확인할 수 있고, 노광 과정의 수행에 적합한 정렬 상태를 갖는 합지된 포토 마스크의 구현이 가능하게 되었다. 즉, 기존의 노광기의 활용도를 더 높임으로써, 8세대 미세 금속 마스크(100)의 제조에도 기존의 노광기를 활용할 수 있도록 하였다.Accordingly, in the present invention, a movable type photomask alignment system 180 is added to the exposure machine, whereby the alignment state of the laminated photomasks can be precisely checked, and the laminated photomask having an alignment state suitable for performing the exposure process. implementation became possible. That is, by further increasing the utilization of the existing exposure machine, the existing exposure machine can be used for manufacturing the 8th generation fine metal mask 100 .
보다 구체적으로, 상기 포토 마스크를 제작하는 과정은, 포토 마스크 상에 적어도 1개의 정렬 마크(145)를 생성하는 제1단계; 상기 정렬 마크(145)가 생성된 적어도 두 개의 포토 마스크들을 노광기의 포토 마스크 장착 프레임(170)에 1차 정렬하여 장착하는 제2단계; 상기 장착된 포토 마스크간 정렬 마크(145)의 위치를 확인하는 제3단계; 및 확인된 정렬 마크(145)의 위치에 따라서 정렬 상태의 완성 여부를 확정하는 제4단계;를 포함하며, 정렬상태가 미완성된 경우 상기 포토 마스크들을 2차 정렬한 후 상기 제3단계부터 다시 수행하게 된다.More specifically, the process of manufacturing the photomask may include: a first step of generating at least one alignment mark 145 on the photomask; a second step of first aligning and mounting at least two photomasks on which the alignment marks 145 are generated on a photomask mounting frame 170 of an exposure machine; a third step of confirming the positions of the alignment marks 145 between the mounted photomasks; and a fourth step of determining whether the alignment state is complete according to the confirmed position of the alignment mark 145; if the alignment state is not completed, the photomasks are secondarily aligned and then performed again from the third step will do
포토 마스크상에 생성되는 정렬 마크(145)는 바람직하게는 패턴이 형성된 영역을 벗어나서 표기되는 것이 좋다. 따라서 가장 무난한 위치로서는 사각의 포토 마스크 꼭지점 인근의 영역에 설치되는 것이 좋다.The alignment marks 145 generated on the photomask are preferably marked outside the region where the pattern is formed. Therefore, it is preferable that the photomask be installed in the area near the vertex of the rectangular photomask as the most comfortable position.
상기 정렬 마크(145)는 네개의 꼭지점에 모두 생성되어도 좋고, 최소한 장변의 양 단부에 생성되는 것도 바람직하다. 즉, 정렬 마크(145)는 단위 포토 마스크와 인접하는 단위 포토 마스크의 정렬 상태를 확인할 수 있도록 적합한 위치에 표기되는 것이 가장 바람직하다.The alignment marks 145 may be formed at all four vertices, or at least at both ends of the long side. That is, it is most preferable that the alignment mark 145 is marked at an appropriate position so that the alignment state of the unit photomask and the adjacent unit photomask can be checked.
정렬 마크(145)는 동일한 규격을 갖는 정렬 대상 포토 마스크의 동일한 좌표에 형성됨으로써, 정렬 상태의 확인을 규칙화할 수 있다. 포토 마스크간 정렬 상태의 확인이 완료되면 그대로 정렬 상태를 확정하여 다음 과정인 노광 과정으로 연결될 수 있도록 하며, 만일 정렬 상태가 미진하다고 판단되면 다시 정렬하여 재차 정렬 상태를 확인하도록 할 수 있다. 정렬 상태의 확인은 정렬 상태가 확정될 때까지 계속하여 수행될 수 있다. The alignment marks 145 are formed at the same coordinates of an alignment target photomask having the same standard, so that the alignment state can be checked regularly. When the check of the alignment state between the photomasks is completed, the alignment state is confirmed as it is so that it can be connected to the exposure process, which is the next process. Checking the alignment status may be continuously performed until the alignment status is confirmed.
정렬 상태의 확인은 노광기와는 별도로 구성되는 포토 마스크 정렬 시스템(180)에 의하여 수행된다. 본 시스템은 정렬 기준점(182)이 적어도 두 개 형성되며, 상기 정렬 기준점(182)은 정렬 마크(145)와 중첩되도록 위치되는 정렬 기준부(181); 및 상기 정렬 기준부(181)와 정렬 마크(145)의 중첩 상태를 촬영할 수 있는 위치에 장착되는 촬영 장치(183);를 포함한다. 다만, 상기 정렬 기준점(182) 중 적어도 하나는 복수의 포토 마스크 중 제1포토 마스크에 형성된 정렬 마크(145)에 중첩되고, 나머지는 제1포토 마스크에 인접하여 정렬된 제2포토 마스크에 형성된 정렬 마크(145)에 중첩된다. Confirmation of the alignment state is performed by the photomask alignment system 180 configured separately from the exposure machine. In the present system, at least two alignment reference points 182 are formed, and the alignment reference points 182 include an alignment reference unit 181 positioned to overlap the alignment mark 145; and a photographing device 183 mounted at a position capable of photographing the overlapping state of the alignment reference unit 181 and the alignment mark 145 . However, at least one of the alignment reference points 182 overlaps the alignment mark 145 formed on the first photomask among the plurality of photomasks, and the rest are aligned on the second photomask aligned adjacent to the first photomask. superimposed on mark 145 .
도시된 형태는 제1포토 마스크와 제2포토 마스크의 서로 인접되는 꼭지점 영역에 하나씩의 정렬 마크(145)가 형성된 형태를 나타낸다. 다만, 전술한 바와 같이 정렬 확인을 정밀하게 수행할 수 있다면 정렬 마크(145)의 갯수는 특별히 한정되는 것은 아니다. The illustrated shape shows a shape in which one alignment mark 145 is formed in the vertex regions adjacent to each other of the first photomask and the second photomask. However, the number of alignment marks 145 is not particularly limited as long as the alignment check can be precisely performed as described above.
정렬 기준부(181)는 투명체로 형성될 수 있다. 예를 들어 투명 기준부는 반투명을 이루도록 함으로써, 촬영시 빛의 반사에 의한 영향을 경감할 수 있다. 따라서, 정렬 기준점(182)과 정렬 마크(145)의 중첩상태는 육안으로도 확인할 수 있다. 아울러, 정렬 마크(145)는 포토 마스크의 윗면 또는 아랫면에 형성되며 정렬 마크(145)의 형성면은 어느 하나의 면으로 제한되는 것이 아님은 자명하다.The alignment reference unit 181 may be formed of a transparent material. For example, by making the transparent reference unit semi-transparent, the effect of light reflection during photographing can be reduced. Accordingly, the overlapping state of the alignment reference point 182 and the alignment mark 145 can be confirmed with the naked eye. In addition, it is obvious that the alignment mark 145 is formed on the upper surface or the lower surface of the photomask, and the formation surface of the alignment mark 145 is not limited to any one surface.
상기 포토 마스크 정렬 시스템(180)은 포토 마스크의 상부에 위치하거나 하부에 위치할 수 있다. 즉, 포토 마스크가 거치된 거치부가 투명한 유리이기 때문에 포토 마스크의 하부에서도 정렬 상태를 확인할 수도 있다. The photomask alignment system 180 may be located above or below the photomask. That is, since the mounting portion on which the photomask is mounted is made of transparent glass, it is possible to check the alignment state even under the photomask.
포토 마스크는 프레임 상의 기준위치에 거치되는 것이 바람직하며, 정렬 시스템 또한 프레임 상의 기준위치까지 이동하여 포토 마스크의 정렬 상태를 확인할 수 있다. 이와 같이 포토 마스크의 거치 위치와 정렬 시스템의 이동 위치에 대한 기준점이 설정되어야 빠른 시간에 포토 마스크 정렬 상태를 용이하고 정밀하게 확인 및 확정할 수 있게 된다. The photomask is preferably mounted at a reference position on the frame, and the alignment system also moves to the reference position on the frame to check the alignment state of the photomask. In this way, when a reference point for the mounting position of the photomask and the moving position of the alignment system is set, the alignment state of the photomask can be easily and precisely confirmed and confirmed in a short time.
정렬 상태의 확인은 촬영장치가 수행하며, 촬영장치에 의하여 촬영된 정렬 상태는 유무선 통신 수단에 의하여 제어부(미도시)로 전달되어 상기 제어부에서 정렬 상태를 확인한 후, 정렬 상태의 확정 여부를 결정하게 된다. 정렬 상태의 확인 결과 재정렬의 필요성이 있으면, 이는 다시 정렬 시스템에 전달되어 해당 과정을 수행하도록 한다. Confirmation of the alignment state is performed by the photographing device, and the alignment state photographed by the photographing apparatus is transmitted to a control unit (not shown) by wired/wireless communication means to determine whether the alignment state is confirmed or not after the control unit confirms the alignment state do. As a result of checking the alignment status, if there is a need for realignment, it is sent back to the alignment system to perform the corresponding process.
상기 포토 마스크 정렬 시스템(180)은 방향의 제한없이 또는 방향을 제한하여 이동가능하게 구성될 수 있다.The photomask alignment system 180 may be configured to be movable without limitation in direction or by limiting direction.
아울러, 상기 촬영 장치(183)는 상기 정렬 기준점(182)의 갯수만큼 구비되는 것이 바람직하나, 하나의 이동 가능한 촬영 장치(183)가 이동하면서 정렬 상태를 확인하도록 구성될 수도 있음은 물론이다.In addition, the photographing device 183 is preferably provided as many as the number of the alignment reference points 182 , but of course, one movable photographing device 183 may be configured to check the alignment state while moving.
도 6은 합지된 포토 마스크의 정렬 상태가 확정되고 난 후, 상기 포토 마스크를 이용하여 금속 판재(190)에 노광을 실시하는 과정을 나타낸 것이다. 노광 과정이 시작되면 포토 마스크 정렬 시스템(180)은 이동하고, 금속 판재(190) 양면에서 대칭을 이루는 한 쌍의 포토 마스크가 금속 판재(190)와 접하도록 이동된 후, 금속 판재(190)의 양면에 대하여 노광을 실시한다. 노광 및 현상 등의 과정은 공지의 과정이므로 구체적인 설명은 생략하기로 한다.FIG. 6 illustrates a process of exposing the metal plate 190 using the photomask after the alignment state of the laminated photomasks is confirmed. When the exposure process starts, the photomask alignment system 180 moves, and a pair of photomasks symmetrical on both sides of the metal plate 190 are moved to come into contact with the metal plate 190 , and then Exposure is performed with respect to both surfaces. Since processes such as exposure and development are known processes, a detailed description thereof will be omitted.
도 7과 도 8은 도 5 및 도 6과 달리 노광기와는 별도로 포토 마스크 장착 프레임(170)을 구성하고, 여기에 승강바(173), 지지 글라스 등을 마련한 포토 마스크 정렬 장치(200)를 나타낸 것이다. 7 and 8 show a photomask alignment device 200 in which a photomask mounting frame 170 is configured separately from an exposure machine, and an elevating bar 173, support glass, etc. are provided here, unlike FIGS. 5 and 6 . will be.
위 포토 마스크 정렬 장치(200)를 사용하여 포토 마스크를 제작하는 방법은 도 5에 관한 설명과 대부분 동일하며, 다만, 별도의 포토 마스크 정렬 장치(200)를 사용한다는 점만 상이하다. A method of manufacturing a photomask using the above photomask aligning apparatus 200 is mostly the same as that of FIG. 5 , except that a separate photomask aligning apparatus 200 is used.
도 7과 8에서 도시된 바와 같이, 본 실시예에 의한 포토 마스크 정렬 장치(200)는 정렬 기준부(181) 및 촬영장치로 구성되며 이동이 가능한 도 5의 포토 마스크 정렬 시스템(180)과는 달리 고정된 포토 마스크 정렬 시스템(180)을 구비하고, 포토 마스크를 거치할 수 있는 포토 마스크 장착 프레임(170)을 포함하는 독립적인 프레임 구조로 이루어져 있다. As shown in FIGS. 7 and 8 , the photomask alignment apparatus 200 according to the present embodiment is composed of an alignment reference unit 181 and a photographing device, and is different from the movable photomask alignment system 180 of FIG. 5 . It has an otherwise fixed photomask alignment system 180 and has an independent frame structure including a photomask mounting frame 170 capable of mounting a photomask.
즉, 상기 포토 마스크 정렬 장치(200)는, 포토 마스크 장착 프레임(170); 상기 포토 마스크 장착 프레임(170)의 테두리에 형성되는 포토 마스크 흡착부(171); 정렬 기준점(182)이 적어도 두 개 형성되며, 상기 정렬 기준점(182)은 정렬 마크(145)와 중첩되도록 위치되는 정렬 기준부(181); 및 상기 정렬 기준부(181)와 정렬 마크(145)의 중첩 상태를 촬영할 수 있는 위치에 장착되는 촬영 장치(183);를 포함하되, 상기 정렬 기준점(182) 중 적어도 하나는 복수의 포토 마스크 중 제1포토 마스크에 형성된 정렬 마크(145)에 중첩되고, 나머지는 제1포토 마스크에 인접하여 정렬된 제2포토 마스크에 형성된 정렬 마크(145)에 중첩된다.That is, the photomask alignment apparatus 200 includes a photomask mounting frame 170 ; a photomask adsorption unit 171 formed on an edge of the photomask mounting frame 170; The alignment reference point 182 is formed at least two, the alignment reference point 182 is an alignment reference portion 181 positioned to overlap the alignment mark 145; and a photographing device 183 mounted at a position capable of photographing the overlapping state of the alignment reference unit 181 and the alignment mark 145, wherein at least one of the alignment reference points 182 is one of a plurality of photomasks. It overlaps the alignment marks 145 formed on the first photomask, and the remainder overlaps the alignment marks 145 formed on the second photomask aligned adjacent to the first photomask.
여기서, 포토 마스크 장착 프레임(170), 포토 마스크 흡착부(171), 정렬 기준부(181), 촬영장치, 정렬 기준점(182), 정렬 마크(145) 등과 관련된 설명은 구조 및 기능 면에서 도 5에 관선 설명에서 기술한 바와 같으므로 여기서는 생략하기로 한다. Here, descriptions related to the photomask mounting frame 170 , the photomask adsorption unit 171 , the alignment reference unit 181 , the photographing device, the alignment reference point 182 , the alignment mark 145 and the like are shown in FIG. 5 in terms of structure and function. Since it is the same as described in the related description, it will be omitted here.
다만, 본 실시예의 포토 마스크 장착 프레임(170), 포토 마스크 흡착부(171)는 1) 노광기에 구성된 것과 별도로 독립적으로 구성되었고, 2) 정렬 기준부(181)와 촬영 장치(183)를 포함하는 포토 마스크 정렬 시스템(180)이 프레임에 고정되었으며, 3) 상기 프레임의 하부에 다리부가 형성되어 있고, 4) 포토 마스크 장착 프레임(170)의 하부에 승강 가능하도록 마련되는 포토 마스크 승강바(173);가 구비되어 프레임으로 둘러싸인 중앙부로 승하강하며, 포토 마스크를 지지하여 상기 프레임에 안착하는 역할을 수행한다. However, the photomask mounting frame 170 and the photomask adsorption unit 171 of the present embodiment are 1) configured independently from those configured in the exposure machine, and 2) including the alignment reference unit 181 and the photographing device 183 . The photomask alignment system 180 is fixed to the frame, 3) a leg portion is formed on the lower portion of the frame, and 4) a photomask lifting bar 173 provided to be lifted at the lower portion of the photomask mounting frame 170 . ; is provided and ascends and descends to the central portion surrounded by the frame, and serves to support the photomask to be seated on the frame.
상기 복수의 포토 마스크 합지 후 정렬 상태가 확정되면, 포토 파스크의 경계면에 포토 마스크들을 지지하며, 포토 마스크 이동시 이동시 그 정렬 상태를 유지할 수 있도록 작용하는 지지체(220);가 더 포함된다. 상기 지지체(220)는 그 재질이 제한되는 것은 아니나, 바람직하게는 글라스 재질을 사용하는 것이 좋다.When the alignment state is confirmed after laminating the plurality of photomasks, the supporter 220 supports the photomasks on the boundary surface of the photomask, and serves to maintain the alignment state when the photomask is moved; further includes. The material of the support 220 is not limited, but it is preferable to use a glass material.
상기한 실시예는 그 설명을 위한 것이며, 그 제한을 위한 것이 아님을 주의하여야 한다. 또한, 본 발명의 기술분야의 통상의 전문가라면 본 발명의 기술사상의 범위에서 다양한 실시예가 가능함을 이해할 수 있을 것이다.It should be noted that the above-described embodiment is for illustrative purposes only, and not for its limitation. In addition, those skilled in the art will understand that various embodiments are possible within the scope of the technical idea of the present invention.

Claims (14)

  1. 광학소자를 증착하기 위한 관통홀 패턴이 형성된 유효부와, 상기 유효부 양단에 형성되어 광학소자의 증착과정에서 지지체의 역할을 하는 그립부를 포함하는 미세 금속 마스크를 제조하는 방법에 있어서,A method of manufacturing a fine metal mask comprising: an effective part having a through-hole pattern for depositing an optical element;
    미세 금속 마스크를 제조하기 위한 금속 패널의 일 영역에 포토레지스트를 도포하는 단계;applying a photoresist to an area of a metal panel for manufacturing a fine metal mask;
    상기 포토레지스트가 도포된 금속 패널상에 패턴이 형성된 포토 마스크를 적층하는 단계;laminating a photomask having a pattern formed thereon on the photoresist-coated metal panel;
    상기 포토 마스크가 적층된 포토레지스트 영역 중 중앙부 영역을 노광하는 단계; 및exposing a central region of the photoresist region on which the photomask is stacked; and
    상기 중앙부 영역으로부터 양단부로 연장되는 영역을 레이저 가공에 의하여 형상화하는 단계;shaping a region extending from the central region to both ends by laser processing;
    를 포함하며,includes,
    상기 중앙부 영역은 미세 금속 마스크의 유효부이고, 레이저 가공에 의하여 형상화된 양단부 연장 영역은 미세 금속 마스크의 그립부인 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크의 제조방법.The method of manufacturing a fine metal mask for a large-area display, characterized in that the central region is an effective part of the fine metal mask, and the extended regions of both ends shaped by laser processing are grip parts of the fine metal mask.
  2. 광학소자를 증착하기 위한 관통홀 패턴이 형성된 유효부와, 상기 유효부 양단에 형성되어 광학소자의 증착과정에서 지지체의 역할을 하는 그립부를 포함하는 미세 금속 마스크를 제조하는 방법에 있어서,A method of manufacturing a fine metal mask comprising: an effective portion having a through-hole pattern for depositing an optical element;
    미세 금속 마스크를 제조하기 위한 금속 패널의 일 영역에 포토레지스트를 도포하는 단계;applying a photoresist to an area of a metal panel for manufacturing a fine metal mask;
    상기 포토레지스트가 도포된 금속 패널상에 패턴이 형성된 포토 마스크를 적층하는 단계;laminating a photomask having a pattern formed thereon on the photoresist-coated metal panel;
    상기 포토 마스크가 적층된 포토레지스트 영역의 중앙부 영역 또는 일단부 영역을 노광하는 제1노광 단계; 및a first exposure step of exposing a central region or one end region of the photoresist region on which the photomask is stacked; and
    상기 제1노광 단계 이후에, 상기 노광된 영역 이외의 영역을 노광하는 제2노광 단계;a second exposure step of exposing an area other than the exposed area after the first exposure step;
    를 포함하며,includes,
    상기 중앙부 영역은 미세 금속 마스크의 유효부이고, 상기 일단부 영역은 미세 금속 마스크의 그립부인 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크의 제조방법.The method for manufacturing a fine metal mask for a large area display, wherein the central region is an effective part of the fine metal mask, and the one end region is a grip part of the fine metal mask.
  3. 제2항에 있어서,3. The method of claim 2,
    상기 제2노광 단계의 수행시, 제1노광 단계에 의하여 노광된 영역에는 차광이 이루어지는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크의 제조방법.A method of manufacturing a fine metal mask for a large area display, characterized in that when the second exposure step is performed, light is blocked in the area exposed by the first exposure step.
  4. 제1항 또는 제2항에 있어서,3. The method of claim 1 or 2,
    상기 유효부가 절반씩 연속노광에 의하여 형성되어 연결되는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크의 제조방법.The method of manufacturing a fine metal mask for a large area display, characterized in that the effective portion is formed by continuous exposure in half and connected.
  5. 제1항에 있어서,According to claim 1,
    상기 포토 마스크를 제작하는 과정은,The process of manufacturing the photomask is,
    복수의 포토 마스크 원자재를 길이방향으로 합지하는 단계; 및laminating a plurality of photomask raw materials in a longitudinal direction; and
    합지된 복수의 포토 마스크 원자재 상에 패턴을 플로팅하는 단계;Plotting a pattern on a plurality of laminated photomask raw materials;
    를 포함하는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크의 제조방법.A method of manufacturing a fine metal mask for a large-area display, comprising:
  6. 제1항에 있어서,According to claim 1,
    상기 포토 마스크를 제작하는 과정은,The process of manufacturing the photomask is,
    포토 마스크 상에 적어도 1개의 정렬 마크를 생성하는 제1단계;a first step of creating at least one alignment mark on the photo mask;
    상기 정렬 마크가 생성된 적어도 두 개의 포토 마스크들을 노광기의 포토 마스크 장착 프레임에 1차 정렬하여 장착하는 제2단계;a second step of first aligning and mounting the at least two photomasks on which the alignment marks are generated on a photomask mounting frame of an exposure machine;
    상기 장착된 포토 마스크간 정렬 마크의 위치를 확인하는 제3단계; 및a third step of confirming the positions of the alignment marks between the mounted photomasks; and
    확인된 정렬 마크의 위치에 따라서 정렬 상태의 완성 여부를 확정하는 제4단계;A fourth step of determining whether the alignment state is completed according to the confirmed position of the alignment mark;
    를 포함하며,includes,
    정렬상태가 미완성된 경우 상기 포토 마스크들을 2차 정렬한 후 상기 제3단계부터 다시 수행하는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크의 제조방법.When the alignment state is not complete, the method of manufacturing a fine metal mask for a large area display, characterized in that the second alignment of the photomasks is performed again from the third step.
  7. 제6항에 있어서,7. The method of claim 6,
    상기 제3단계는 포토 마스크 정렬 시스템에 의하여 수행되며,The third step is performed by a photo mask alignment system,
    상기 시스템은,The system is
    정렬 기준점이 적어도 두 개 형성되며, 상기 정렬 기준점은 정렬 마크와 중첩되도록 위치되는 정렬 기준부; 및At least two alignment reference points are formed, the alignment reference point is an alignment reference portion positioned to overlap the alignment mark; and
    상기 정렬 기준부와 정렬 마크의 중첩 상태를 촬영할 수 있는 위치에 장착되는 촬영 장치;a photographing device mounted at a position capable of photographing the overlapping state of the alignment reference unit and the alignment mark;
    를 포함하되, 상기 정렬 기준점 중 적어도 하나는 복수의 포토 마스크 중 제1포토 마스크에 형성된 정렬 마크에 중첩되고, 나머지는 제1포토 마스크에 인접하여 정렬된 제2포토 마스크에 형성된 정렬 마크에 중첩되는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크의 제조방법.wherein at least one of the alignment reference points overlaps the alignment marks formed on the first photomask among the plurality of photomasks, and the rest overlaps the alignment marks formed on the second photomask aligned adjacent to the first photomask. Method of manufacturing a fine metal mask for a large area display, characterized in that.
  8. 제7항에 있어서,8. The method of claim 7,
    상기 정렬 시스템은 상기 포토 마스크의 상부 또는 하부에 위치되며, 이동가능하게 구성되는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크의 제조방법.The alignment system is positioned above or below the photomask, and is configured to be movable.
  9. 제7항에 있어서,8. The method of claim 7,
    상기 촬영 장치는 상기 정렬 기준점의 갯수만큼 구비되는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크의 제조방법.The method of manufacturing a fine metal mask for a large area display, characterized in that the photographing apparatus is provided as much as the number of the alignment reference points.
  10. 제1항에 있어서,According to claim 1,
    상기 포토 마스크를 제작하는 과정은,The process of manufacturing the photomask is,
    포토 마스크 상에 적어도 1개의 정렬 마크를 생성하는 제1단계;a first step of creating at least one alignment mark on the photo mask;
    상기 정렬 마크가 생성된 적어도 두 개의 포토 마스크들을 포토 마스크 정렬 장치의 포토 마스크 장착 프레임에 1차 정렬하여 장착하는 제2단계;a second step of first aligning and mounting the at least two photomasks on which the alignment marks are generated on a photomask mounting frame of a photomask alignment apparatus;
    상기 장착된 포토 마스크간 정렬 마크의 위치를 확인하는 제3단계; 및a third step of confirming the positions of the alignment marks between the mounted photomasks; and
    확인된 정렬 마크의 위치에 따라서 정렬 상태의 완성 여부를 확정하는 제4단계; A fourth step of determining whether the alignment state is completed according to the confirmed position of the alignment mark;
    를 포함하며, includes,
    정렬상태가 미완성된 경우 상기 포토 마스크들을 2차 정렬한 후 상기 제3단계부터 다시 수행하는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크의 제조방법.When the alignment state is not completed, the method of manufacturing a fine metal mask for a large area display, characterized in that the second alignment of the photomasks is performed again from the third step.
  11. 제10항에 있어서,11. The method of claim 10,
    상기 포토 마스크 정렬 장치는,The photo mask alignment device,
    포토 마스크 장착 프레임; photomask mounting frame;
    상기 포토 마스크 장착 프레임의 테두리에 형성되는 포토 마스크 흡착부;a photomask adsorption unit formed on an edge of the photomask mounting frame;
    정렬 기준점이 적어도 두 개 형성되며, 상기 정렬 기준점은 정렬 마크와 중첩되도록 위치되는 정렬 기준부; 및At least two alignment reference points are formed, the alignment reference point is an alignment reference portion positioned to overlap the alignment mark; and
    상기 정렬 기준부와 정렬 마크의 중첩 상태를 촬영할 수 있는 위치에 장착되는 촬영 장치;a photographing device mounted at a position capable of photographing the overlapping state of the alignment reference unit and the alignment mark;
    를 포함하되, 상기 정렬 기준점 중 적어도 하나는 복수의 포토 마스크 중 제1포토 마스크에 형성된 정렬 마크에 중첩되고, 나머지는 제1포토 마스크에 인접하여 정렬된 제2포토 마스크에 형성된 정렬 마크에 중첩되는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크의 제조방법.wherein at least one of the alignment reference points overlaps the alignment marks formed on the first photomask among the plurality of photomasks, and the rest overlaps the alignment marks formed on the second photomask aligned adjacent to the first photomask. Method of manufacturing a fine metal mask for a large area display, characterized in that.
  12. 제11항에 있어서,12. The method of claim 11,
    상기 포토 마스크 정렬 장치는,The photo mask alignment device,
    상기 포토 마스크 장착 프레임의 하부에 승강 가능하도록 마련되는 포토 마스크 승강바; 및a photomask lifting bar provided to be liftable at a lower portion of the photomask mounting frame; and
    상기 복수의 포토 마스크 합지시 경계면에서 포토 마스크들을 지지하는 지지 글라스;a support glass for supporting the photomasks at the interface when the plurality of photomasks are laminated;
    를 포함하는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크의 제조방법.A method of manufacturing a fine metal mask for a large-area display, comprising:
  13. 제10항에 있어서,11. The method of claim 10,
    상기 촬영 장치는 상기 정렬 기준점의 갯수만큼 구비되는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크의 제조방법.The method of manufacturing a fine metal mask for a large area display, characterized in that the photographing apparatus is provided as much as the number of the alignment reference points.
  14. 제1항 또는 제2항의 제조방법에 의하여 제조되어, It is manufactured by the manufacturing method of claim 1 or 2,
    유효부와 그립부가 연속적으로 또는 구분하여 가공되어 단일의 개체를 이루는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크.A fine metal mask for a large area display, characterized in that the effective part and the grip part are processed continuously or separately to form a single object.
PCT/KR2021/016072 2021-01-21 2021-11-05 Fine metal mask for large-area display and method for manufacturing same WO2022158687A1 (en)

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