CN116724683A - Fine metal mask for large area display and method of manufacturing the same - Google Patents
Fine metal mask for large area display and method of manufacturing the same Download PDFInfo
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- CN116724683A CN116724683A CN202180089361.6A CN202180089361A CN116724683A CN 116724683 A CN116724683 A CN 116724683A CN 202180089361 A CN202180089361 A CN 202180089361A CN 116724683 A CN116724683 A CN 116724683A
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- metal mask
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- 229910001111 Fine metal Inorganic materials 0.000 title claims abstract description 92
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 80
- 239000002184 metal Substances 0.000 claims abstract description 20
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 19
- 238000000151 deposition Methods 0.000 claims abstract description 15
- 230000003287 optical effect Effects 0.000 claims abstract description 10
- 238000012545 processing Methods 0.000 claims abstract description 10
- 239000011248 coating agent Substances 0.000 claims abstract description 5
- 238000000576 coating method Methods 0.000 claims abstract description 5
- 230000008021 deposition Effects 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 71
- 239000002994 raw material Substances 0.000 claims description 11
- 239000011521 glass Substances 0.000 claims description 8
- 238000003384 imaging method Methods 0.000 claims description 6
- 238000004378 air conditioning Methods 0.000 claims 8
- 238000005520 cutting process Methods 0.000 description 13
- 239000000463 material Substances 0.000 description 10
- 238000010030 laminating Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 6
- 238000011161 development Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000012790 confirmation Methods 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 229910001374 Invar Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention relates to a fine metal mask for a large-area display and a method of manufacturing the same, and more particularly, the fine metal mask includes an effective portion formed with a via pattern for depositing an optical element and a nip portion formed at both ends of the effective portion to serve as a support during deposition of the optical element, the method of manufacturing the fine metal mask includes: a step of coating a photoresist on one region of a metal panel for manufacturing a fine metal mask; stacking a patterned photomask on the metal panel coated with the photoresist; exposing a center region of the photoresist region on which the photomask is stacked; and forming a region extending from the center region to both end portions by laser processing; the central region is an effective portion of the fine metal mask, and the extended regions of the both end portions formed by laser processing are a clamping portion of the fine metal mask.
Description
Technical Field
The present invention relates to a method for manufacturing a fine metal mask for a large-area display, and more particularly, to easily manufacture a fine metal mask (fine metal mask) for manufacturing an 8 th generation large-area display, manufacturing an expanded effective portion by using a plurality of photomask raw materials or a plurality of photomasks by connection, and manufacturing a nip portion by a connection exposure or a separate cutting process. Thus, when manufacturing a fine metal mask having an effective portion of an extended length as compared with a fine metal mask used for manufacturing a 6.5 th generation display, not only the production efficiency is improved, but also an existing exposure apparatus for manufacturing a fine metal mask for a 6.5 th generation display can be directly used.
Background
In the development process of the display industry, "upsizing" has become the basis for developing markets, expanding scales and increasing. The enlargement means the establishment of a large-area display panel production line and the enlargement of the production panel inches. Display manufacturers are striving to build large area production lines, increase productivity, and produce large size panels at lower cost.
The key component of depositing OLED elements on display panels is the fine metal mask, which is difficult to keep pace with the development trend of large-area display panels for the existing 6.5 th generation OLED pixels. Therefore, it is necessary to develop a fine metal mask (hereinafter referred to as "8 th generation mask") for depositing 8 th generation OLED pixels.
The fine metal mask is composed of an effective portion, which is a region where a pattern is formed for depositing pixels, and a clamping portion, which is formed at both ends of the effective portion to serve as a mask fixing function, so that the fine metal mask is placed on the panel during the process of depositing pixels.
However, the effective part length of the 6.5 th generation mask is 1100mm, and the effective part length of the 8 th generation mask is 2200mm, and considering the length of the nip part, the effective part length reaches 2600mm, so it is difficult to manufacture the 8 th generation mask by the conventional exposure machine having the maximum exposure length of 2400 mm.
In addition, since a lot of money is required for manufacturing an exposure machine suitable for producing the 8 th generation mask, the market price is expected to increase, and there is a problem that a burden is increased due to introduction of a new exposure machine.
In addition, since the photomask used for manufacturing the 8 th generation mask has a form in which two or more photomasks are superimposed, there is a high possibility that alignment continuity or alignment uniformity between the two photomasks cannot be ensured during the lamination of the two photomasks to be processed, and in the case where alignment continuity or alignment uniformity cannot be ensured as described above, pixel defects may occur during the formation of pixels, resulting in a problem of deterioration in resolution of the display due to defective pixels. Therefore, there is a need to develop a new process technology for manufacturing the 8 th generation mask.
Disclosure of Invention
Technical problem
The present invention has been made to solve the above-mentioned problems of the prior art, and an object of the present invention is to manufacture a fine metal mask for manufacturing an 8 th generation large area display having high alignment by aligning a plurality of photomasks with high accuracy.
In addition, another object of the present invention is to increase the utilization rate of the existing process by mostly adopting the existing fine metal mask manufacturing method, to perform the link exposure or to introduce the link cutting process, to improve the production efficiency and the production speed.
Further, it is another object of the present invention to maximize the utilization of the existing exposure machine by solving the need to develop a new exposure machine when manufacturing a fine metal mask for manufacturing an 8 th generation large area display by performing a continuous exposure process of an effective portion and a clip portion using a conventional exposure machine or performing an effective portion exposure and a clip portion cutting process separately.
Further, it is another object of the present invention to construct a simple alignment inspection apparatus so that when a plurality of photomasks are aligned, the photomasks can be precisely aligned on an existing exposure machine.
Furthermore, it is another object of the present invention to manufacture a single alignment machine for aligning a plurality of photomasks to precisely align the plurality of photomasks in a simple manner.
Solution to the problem
In order to achieve the above object, the present invention provides a method of manufacturing a fine metal mask for a large-area display including an effective portion formed with a via pattern for depositing an optical element and a nip portion formed at both ends of the effective portion to serve as a support during deposition of the optical element, the method comprising: a step of coating a photoresist on one region of a metal panel for manufacturing a fine metal mask; stacking a patterned photomask on the metal panel coated with the photoresist; exposing a center region of the photoresist region on which the photomask is stacked; and forming a region extending from the center region to both end portions by laser processing; the central region is an effective portion of the fine metal mask, and the extended regions of the both end portions formed by laser processing are a clamping portion of the fine metal mask.
And, the present invention relates to a method of manufacturing a fine metal mask for a large-area display, more specifically, the fine metal mask including an effective portion formed with a via pattern for depositing an optical element and a nip portion formed at both ends of the effective portion to serve as a support during deposition of the optical element, the method of manufacturing a fine metal mask for a large-area display including: a step of coating a photoresist on one region of a metal panel for manufacturing a fine metal mask; stacking a patterned photomask on the metal panel coated with the photoresist; a first exposure step of exposing a center region or an end region of the photoresist region on which the photomask is stacked; and a second exposure step of exposing an area other than the exposure area after the first exposure step; the center region is an effective portion of the fine metal mask, and the one end region is a clamping portion of the fine metal mask.
Preferably, when the above-described second exposure step is performed, light shielding is performed in the area exposed by the first exposure step.
Preferably, half of the effective portions are formed by successive exposure, respectively, and half of the effective portions are connected.
Preferably, the process of manufacturing the above photomask includes: a step of longitudinally superposing a plurality of photomask raw materials; and a step of drawing a pattern on the superimposed plurality of photomask raw materials.
Preferably, the process of manufacturing the above photomask includes: a first step of generating at least one alignment mark on a photomask; a second step of aligning and mounting at least two photomasks generated with the alignment marks on a photomask mounting frame of an exposure machine once; a third step of confirming the positions of alignment marks between the photomasks; and a fourth step of determining whether the alignment state is completed according to the confirmed position of the alignment mark; when the alignment state is not completed, the photomask is secondarily aligned and then is reworked from the third step.
Preferably, the third step is performed by a photomask alignment system, the system comprising: an alignment reference portion formed with at least two alignment reference points positioned so as to overlap the alignment marks; and an imaging device installed at a position where the overlapping state of the alignment reference portion and the alignment mark can be imaged; at least one of the alignment reference points overlaps an alignment mark formed on a first photomask of the plurality of photomasks, and the remaining alignment reference points overlap an alignment mark formed on a second photomask aligned adjacent to the first photomask.
Preferably, the alignment system is disposed at an upper or lower portion of the photomask and is provided to be movable.
Preferably, the number of the photographing devices corresponds to the number of the alignment reference points.
Preferably, the process of manufacturing the above photomask includes: a first step of generating at least one alignment mark on a photomask; a second step of aligning and mounting at least two photomasks having the alignment marks generated thereon on a photomask mounting frame of a photomask alignment device once; a third step of confirming the positions of alignment marks between the photomasks; and a fourth step of determining whether the alignment state is completed according to the confirmed position of the alignment mark; when the alignment state is not completed, the photomask is secondarily aligned and then is reworked from the third step.
Preferably, the photomask alignment device includes: a photomask mounting frame; a photomask suction part formed at the edge of the photomask mounting frame; an alignment reference portion formed with at least two alignment reference points positioned so as to overlap the alignment marks; and an imaging device installed at a position where the overlapping state of the alignment reference portion and the alignment mark can be imaged; at least one of the alignment reference points overlaps an alignment mark formed on a first photomask of the plurality of photomasks, and the remaining alignment reference points overlap an alignment mark formed on a second photomask aligned adjacent to the first photomask.
Preferably, the photomask alignment device includes: a photomask lifting rod which is arranged at the lower part of the photomask mounting frame in a lifting manner; and a support glass for supporting the photomask at the boundary surface when the plurality of photomasks are stacked.
Preferably, the number of the photographing devices corresponds to the number of the alignment reference points.
In addition, the present invention provides a fine metal mask for a large-area display manufactured by the above method, in which an effective portion and a clip portion are continuously or separately processed and then formed as one body.
ADVANTAGEOUS EFFECTS OF INVENTION
According to the present invention as described above, an effect that a fine metal mask for manufacturing an 8 th generation large area display having a high degree of alignment can be easily manufactured by aligning a plurality of photomasks with high accuracy can be expected.
In addition, the present invention can expect effects that the present invention mostly adopts the existing fine metal mask manufacturing method, thereby increasing the utilization rate of the existing process, performing the connection exposure or introducing the connection cutting process, to improve the production efficiency and the production speed.
In addition, the present invention can expect effects that the present invention performs a continuous exposure process of the effective portion and the clip portion using a conventional exposure machine or performs exposure of the effective portion and cutting processing of the clip portion separately, thereby solving the need for developing a new exposure machine when manufacturing a fine metal mask for manufacturing an 8 th generation large area display, and maximizing the utilization rate of the existing exposure machine.
In addition, the present invention can expect the effect that one simple alignment detecting means is configured when aligning a plurality of photomasks and is utilized on an existing exposure machine, thereby precisely aligning the photomasks by a convenient and simple method.
In addition, the present invention can expect an effect that a plurality of photomasks are precisely aligned in a simple manner before an exposure process is performed by manufacturing a single aligner for aligning the plurality of photomasks.
Drawings
Fig. 1 is a flowchart for explaining a continuous exposure process of an effective portion and a clamping portion in a manufacturing process of a fine metal mask according to an embodiment of the present invention.
Fig. 2 is a flowchart for explaining a continuous exposure process of an effective portion and a clamping portion in a manufacturing process of a fine metal mask according to another embodiment of the present invention.
Fig. 3 is a flowchart for explaining a clamping portion cutting process after exposing an effective portion in a manufacturing process of a fine metal mask according to an embodiment of the present invention.
FIG. 4 is a flow chart of a process for fabricating a photomask with high alignment by laminating photomask raw materials and patterning the photomask raw materials according to one embodiment of the present invention.
Fig. 5 is a flowchart showing a process of superposing two divided photomasks and securing alignment according to an embodiment of the present invention, in which a case of using an existing exposure machine is shown.
Fig. 6 is a flowchart showing a process of exposing a surface of a fine metal mask using a photomask after laminating the photomask and securing alignment according to fig. 5.
Fig. 7 is a flowchart illustrating a process of superposing two divided photomasks and securing alignment according to another embodiment of the present invention, in which a case of using a separate alignment apparatus is illustrated.
Fig. 8 illustrates a process for confirming the superimposed and aligned state of the photomask while showing the alignment apparatus of fig. 7 from the side.
Detailed Description
Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings so as to enable those skilled in the art to which the present invention pertains to easily implement the present invention. However, the invention may be realized by a variety of different embodiments and is not limited to the examples described in this specification. And parts irrelevant to the description are omitted for clarity of explanation of the present invention in the drawings, and the same or similar components are given the same reference numerals throughout the specification.
Throughout the specification, when an element is referred to as being "comprising" an element, it can be meant that the element can further comprise the other element, unless otherwise specified.
In addition, terms such as "… section" and "… device" described in the specification refer to a unit that processes at least one function or operation.
The present invention is used to manufacture an 8 th generation fine metal mask, the 8 th generation fine metal mask being characterized in that the length of the effective portion is twice the length of the existing 6.5 th generation fine metal mask. The total length of the 8 th generation fine metal mask was 2600mm, which was 1100mm longer than the total length of the 1500mm 6.5 th generation fine metal mask. On the other hand, since an exposure machine performing an exposure process as a process for manufacturing a fine metal mask can expose an object to be processed having a length of 2500mm at maximum, it is possible to perform one-time entire exposure on the 6.5 th generation fine metal mask, but it is impossible to perform one-time entire exposure on the 8 th generation fine metal mask.
Fig. 1 is a flowchart for explaining a continuous exposure process of an effective portion and a clamping portion in a manufacturing process of a fine metal mask according to an embodiment of the present invention, fig. 2 is a flowchart for explaining a continuous exposure process of an effective portion and a clamping portion in a manufacturing process of a fine metal mask according to another embodiment of the present invention, fig. 3 is a flowchart for explaining a clamping portion cutting process after exposing an effective portion in a manufacturing process of a fine metal mask according to an embodiment of the present invention, fig. 4 is a flowchart for laminating a photomask raw material according to an embodiment of the present invention, manufacturing a photomask manufactured to have a high degree of alignment through a drawing process, fig. 5 is a flowchart showing a process of laminating two divided photomasks and securing the degree of alignment according to an embodiment of the present invention, wherein a case of using an existing exposure machine is shown, fig. 6 is a flowchart showing a process of exposing a surface of a fine metal with the photomask after laminating the photomask and securing the degree of alignment according to fig. 5, fig. 4 is a flowchart showing a process of separating two photomasks and securing the degree of alignment by a single photomask, and fig. 7 is a flowchart showing a state of a device for confirming alignment from a laminating side of the photomask at the same time as that of a laminating device for confirming alignment state of the photomask 8.
In fig. 1, in order to manufacture a fine metal mask 100 having a length suitable for the effective portion 120 of the 8 th generation mask, a process of exposing while moving a metal plate material 190 (e.g., invar) in the same direction as the length direction of the mask is performed.
The fine metal mask 100 is composed of an effective portion 120 and a clamping portion 110 integrally formed at both sides of the effective portion 120, and a processing hole for depositing OLED pixels for a display is formed at the effective portion 120.
From a process point of view, in order to form a pattern on the metal plate material 190, which is a basis for forming the above-described processing holes, first, a photoresist is coated on the metal plate material 190, and in order to selectively expose and develop the coated photoresist, a photomask is laminated on the photoresist and then exposed.
Since the length of the 8 th generation fine metal mask 100 is longer than the mounting frame and the available exposure area of the exposure machine, the effective portion 120 and the nip portion 110 cannot be simultaneously exposed. Accordingly, in the present invention, continuous exposure or sequential exposure is performed using the effective portion 120 and the nip portion 110 as a basic unit to overcome such impossibility.
Here, as shown in the drawing, two fine metal masks 100 as processing objects are extracted and displayed. In practical use, among the above two fine metal masks 100, the processed fine metal mask 100 may be further displayed on the left side of the left fine metal mask 100, but the display thereof is omitted here by way of extraction.
First, in order to form the leftmost clamping portion 110, the metal plate material 190 of the corresponding portion is exposed. However, it is more efficient to simultaneously expose the clamping portion 110 adjacent to the left side of the clamping portion 110 in the manufacturing process. However, since the adjacent clip portions 110 are not shown here, it is assumed for the purpose of illustration that exposure for forming the leftmost clip portion 110 is performed first. Thereafter, the adjacent effective portions 120 are exposed, and then the right side clamping portions 110 are sequentially exposed, or the right side clamping portions 110 and the left side clamping portions 110 of the fine metal mask to be processed 100 adjacent to the right side clamping portions 110 may be simultaneously exposed. Thereafter, the effective portion 120 and the right grip portion 110 are sequentially exposed again.
Through the continuous exposure process as above, the fine metal mask 100 in which the length of the effective portion 120 is expanded to the 8 th generation mask level can be manufactured while directly using the existing exposure machine.
Fig. 2 is the same as fig. 1 in that a continuous exposure process is performed, but differs in that a moving path of a photomask is different, that is, fig. 1 is a process of continuously performing exposure in a longitudinal direction, and fig. 2 is a process of performing exposure by alternating up and down. In fig. 2, since the exposure region corresponds to the length of the effective portion 120 of the left fine metal mask to be processed 100, when the clamp portion 110 of the right fine metal mask to be processed 100 is exposed, it is preferable to shield the effective portion 120 region adjacent thereto from light. The sheet metal 190 (material) is shown being transported along the Y-axis and the photomask being moved along the X-axis. Here, in the case of the effective portion 120, after the exposure of 1100mm effective portion 120 corresponding to the effective portion 120 of the 6.5 th generation fine metal mask 100, the remaining 1100mm effective portion 120 is continuously exposed by the continuous exposure process, whereby the 8 th generation fine metal mask 100 effective portion 120 (2200 mm) may be formed, or the 8 th generation fine metal mask 100 effective portion 120 (2200 mm) may be formed by one exposure.
Fig. 3 illustrates a method of performing an exposure process only on the effective portion 120 of the fine metal mask 100. Since the conventional exposure machine may perform the exposure process only for the effective portion 120, the following steps are formed: the effective portion 120 is first exposed, and then the clamping portions 110 at both ends are cut by a cutting means such as a laser. Here, the cutting unit is shown as the laser generating part 130, but the cutting unit is not particularly limited. That is, cutting using a blade, cutting using a water jet, and the like can be exemplified. The cutting unit may be determined in consideration of process continuity with the exposure process, facilities owned by a main body performing the process, and the like.
Fig. 4 shows a process of manufacturing a photomask for exposing the fine metal mask 100. First, two photomask raw materials 141 are placed on a placement plate 140, and simultaneously stacked. Thereby, a boundary surface is formed between the two photomask raw materials 141. The mounting plate 140 is mainly a glass plate. This is because the glass plate has heat resistance and transparency, and is therefore suitable for performing an exposure process. However, suitable materials other than glass sheets may be employed as alternative materials.
Thereafter, the photomask blank 141 is drawn. Drawing is used to pattern the fine metal mask 100, and a photomask having a desired pattern may be manufactured by drawing using the drawing unit 160. Here, a photomask having an elongated length suitable for manufacturing the 8 th generation fine metal mask 100 is manufactured by laminating two photomask raw materials 141. In this case, the drawing is most preferably performed by a laser drawing method, but the drawing may be performed by another method, and a method capable of forming a pattern may be used as a method other than the drawing.
At this time, it is difficult to ensure continuity at the boundary surface at the time of drawing, and if drawing is performed on the boundary surface, the pattern formed at the corresponding portion may be non-uniform in shape or may be erroneous, and thus drawing is performed except for the corresponding portion.
Thereafter, exposure, development, etching and stripping processes are sequentially performed to form a photomask pattern on the photoresist.
The length of the pattern region of the photomask is 2200mm, which corresponds to the length of the effective portion 120 of the 8 th generation fine metal mask 100. Accordingly, an exposure process for manufacturing the 8 th generation fine metal mask 100 may be performed.
Fig. 5 is a diagram showing a method of confirming an alignment state when laminating unit photomasks manufactured. The illustrated photomask mounting frame 170 is a region on which a photomask is mounted (mounted), and a central portion surrounded by the frame is penetrated, and a transparent mounting plate 172 on which a photomask is mounted is located in the region. In addition, since the slit (slit) for applying the negative pressure is provided at the edge of the frame, the photomask can be placed on the frame by the negative pressure when the photomask is placed, and thus the photomask can be stably fixed. The slit may be replaced by a hole, and may have any shape as long as it is a gap that can use negative pressure.
The photomask mounting frame 170 has a size to mount two manufactured unit photomasks. However, the number of photomasks that can be placed is not limited to two, and more photomasks may be placed according to the size of the frame or the length of the mask.
Photomask mounting frame 170 is a component of an existing exposure machine that is used to secure a single photomask and use the photomask to expose sheet metal 190. However, it does not have a function of superposing and placing a plurality of photomasks and confirming alignment therebetween. As described above, when a plurality of photomasks are superimposed, the patterns must be precisely aligned, and therefore, it is necessary to precisely align the plurality of photomasks, and it is also necessary to provide a separate device capable of confirming the alignment state.
Therefore, in the present invention, by additionally providing the movable photomask alignment system 180 in the exposure machine, the alignment state of the superimposed photomasks can be accurately confirmed, and the superimposed photomask having the alignment state suitable for performing the exposure process can be implemented. That is, by further improving the utilization ratio of the existing exposure machine, the existing exposure machine can be utilized even in the manufacture of the 8 th generation fine metal mask 100.
More specifically, the process of manufacturing the above photomask includes: a first step of generating at least one alignment mark 145 on the photomask; a second step of aligning and mounting at least two photomasks having the alignment marks 145 formed thereon on a photomask mounting frame 170 of an exposure machine at a time; a third step of confirming the position of the alignment mark 145 between the photomasks; and a fourth step of determining whether the alignment state is completed according to the confirmed position of the alignment mark 145; when the alignment state is not completed, the photomask is secondarily aligned and then is reworked from the third step.
Alignment marks 145 generated on the photomask are preferably marked outside the patterning area. Therefore, as the most suitable position, it is preferable to dispose it in the area near the vertex of the quadrangular photomask.
The alignment marks 145 may be formed on four vertexes, or preferably at least on both ends of the long side. That is, it is most preferable to mark the alignment mark 145 at an appropriate position so that the alignment state of the unit photomask and the adjacent unit photomask can be confirmed.
The alignment marks 145 are formed at the same coordinates of the alignment target photomasks having the same specification, so that the alignment state can be regularly confirmed. When the alignment state between photomasks is confirmed to be completed, the alignment state is determined as it is so that it can be connected to the exposure process as the next process, and if it is judged that the alignment state is insufficient, the alignment is again performed to reconfirm the alignment state. The confirmation of the alignment state may be performed continuously until the alignment state is determined.
The confirmation of the alignment state is performed by the photomask alignment system 180 disposed separately from the exposure machine. At least two alignment fiducials 182 are formed in the present system, the alignment fiducials 182 comprising: an alignment reference portion 181 positioned to overlap the alignment mark 145; and an imaging device 183 mounted at a position where the overlapping state of the alignment reference portion 181 and the alignment mark 145 can be imaged. However, at least one of the alignment reference points 182 overlaps with the alignment mark 145 formed on the first photomask among the plurality of photomasks, and the remaining alignment reference points overlap with the alignment mark 145 formed on the second photomask aligned adjacent to the first photomask.
The illustrated shape shows a shape in which one alignment mark 145 is formed in each of adjacent vertex regions of the first photomask and the second photomask. However, as described above, the number of the alignment marks 145 is not particularly limited as long as the alignment can be accurately confirmed.
The alignment reference portion 181 may be formed of a transparent material. For example, by making the transparent reference portion translucent, the influence due to light reflection at the time of photographing can be reduced. Accordingly, the overlapped state of the alignment reference point 182 and the alignment mark 145 can be confirmed with the naked eye. Further, the alignment mark 145 is formed on the upper surface or the lower surface of the photomask, and it is apparent that the formation surface of the alignment mark 145 is not limited to any one surface.
The photomask alignment system 180 described above may be located above or below the photomask. That is, since the mounting portion on which the photomask is mounted is made of transparent glass, the alignment state can be confirmed also in the lower portion of the photomask.
The photomask is preferably placed at a reference position on the frame, and the alignment system may also be moved to the reference position on the frame to confirm the alignment state of the photomask. As described above, it is necessary to set the reference point for the placement position of the photomask and the moving position of the alignment system so that the alignment state of the photomask can be confirmed and determined conveniently and accurately in a short time.
The alignment state is confirmed by the photographing device, and the alignment state photographed by the photographing device is transmitted to a control part (not shown in the drawing) through a wired/wireless communication unit, which determines whether to determine the alignment state after confirming the alignment state. And confirming the result of the alignment state, and if the alignment state needs to be realigned, transmitting the result to an alignment system again for corresponding process.
The photomask alignment system 180 described above may be configured to be movable without direction limitation or movable by a limited direction.
The number of the photographing devices 183 is preferably the same as the number of the alignment reference points 182, but it is also possible to configure such that one movable photographing device 183 confirms the alignment state while moving.
Fig. 6 shows a process of exposing a metal plate material 190 using the above-described photomask after determining an alignment state of the superimposed photomasks. When the exposure process is started, the photomask alignment system 180 moves, a pair of photomasks symmetrical on both sides of the metal plate 190 move in contact with the metal plate 190, and then the both sides of the metal plate 190 are exposed. Since processes such as exposure and development are known processes, detailed descriptions thereof will be omitted.
Fig. 7 and 8 show a photomask alignment device 200 in which a photomask mounting frame 170 separate from an exposure machine, a lifter 173, a support glass, and the like are also provided, differently from fig. 5 and 6.
The method of manufacturing a photomask using the above-described photomask alignment apparatus 200 is substantially the same as that described in fig. 5, but differs in that a separate photomask alignment apparatus 200 is used.
As shown in fig. 7 and 8, the photomask alignment device 200 according to the present embodiment is constituted by an alignment reference portion 181 and an image pickup device, and unlike the movable photomask alignment system 180 of fig. 5, includes a fixed photomask alignment system 180, and is constituted by a separate frame structure including a photomask mounting frame 170 on which a photomask is placed.
That is, the photomask alignment apparatus 200 includes: photomask mounting frame 170; a photomask suction part 171 formed at an edge of the photomask mounting frame 170; an alignment reference portion 181 having at least two alignment reference points 182 formed thereon, the alignment reference points 182 being positioned so as to overlap the alignment marks 145; and an imaging device 183 installed at a position where the overlapping state of the alignment reference portion 181 and the alignment mark 145 can be imaged; at least one of the alignment fiducial points 182 overlaps with an alignment mark 145 formed on a first photomask of the plurality of photomasks, and the remaining alignment fiducial points overlap with an alignment mark 145 formed on a second photomask aligned adjacent to the first photomask.
Here, the description of the structure and function of the photomask mounting frame 170, the photomask adsorbing portion 171, the alignment reference portion 181, the photographing device, the alignment reference point 182, the alignment mark 145, and the like is the same as that of fig. 5, and thus, a description thereof will not be repeated here.
However, the photomask mounting frame 170 and the photomask adsorbing portion 171 of the present embodiment are not 1) provided to the exposure machine but separately therefrom, 2) a photomask alignment system 180 including an alignment reference portion 181 and a photographing device 183 is fixed to the frame, 3) a leg portion is formed at a lower portion of the frame, 4) a photomask lifting lever 173 is provided at a lower portion of the photomask mounting frame 170 so as to be lifted up and down toward a central portion surrounded by the frame, and thereby support the photomask to be placed on the frame.
The apparatus further includes a support 220, wherein when the alignment state is determined after the plurality of photomasks are superimposed, the support 220 supports the photomasks on a boundary surface of the photomasks and maintains the alignment state while the photomasks are moved. Although the material of the above-described support 220 is not limited, a glass material is preferably used.
It should be noted that the foregoing embodiments are illustrative rather than limiting. Further, those skilled in the art will understand that various embodiments may be implemented within the scope of the technical spirit of the present invention.
Claims (14)
1. A method of manufacturing a fine metal mask for a large-area display including an effective portion formed with a via pattern for depositing an optical element and a nip portion formed at both ends of the effective portion to serve as a support during deposition of the optical element, the method comprising:
a step of coating a photoresist on one region of a metal panel for manufacturing a fine metal mask;
stacking a patterned photomask on the metal panel coated with the photoresist;
exposing a center region of the photoresist region on which the photomask is stacked; a kind of electronic device with high-pressure air-conditioning system
A step of forming a region extending from the center region to both end portions by laser processing,
the central region is an effective portion of the fine metal mask, and the extended regions of the both end portions formed by laser processing are a clamping portion of the fine metal mask.
2. A method of manufacturing a fine metal mask for a large-area display including an effective portion formed with a via pattern for depositing an optical element and a nip portion formed at both ends of the effective portion to serve as a support during deposition of the optical element, the method comprising:
a step of coating a photoresist on one region of a metal panel for manufacturing a fine metal mask;
stacking a patterned photomask on the metal panel coated with the photoresist;
a first exposure step of exposing a center portion area or an end portion area of the photoresist area where the photomask is stacked; a kind of electronic device with high-pressure air-conditioning system
A second exposure step of exposing the region other than the exposure region after the first exposure step,
the center region is an effective portion of the fine metal mask, and the one end region is a clamping portion of the fine metal mask.
3. The method for manufacturing a fine metal mask for a large-area display according to claim 2, wherein when the second exposure step is performed, light shielding is performed in the area exposed by the first exposure step.
4. The method of manufacturing a fine metal mask for a large-area display according to claim 1 or 2, wherein half of the effective portions are formed by successive exposure, respectively, and the half of the effective portions are connected.
5. A method for manufacturing a fine metal mask for a large area display according to claim 1, wherein,
the process of manufacturing the photomask includes:
a step of longitudinally superposing a plurality of photomask raw materials; a kind of electronic device with high-pressure air-conditioning system
And a step of drawing a pattern on the superimposed plurality of photomask raw materials.
6. A method for manufacturing a fine metal mask for a large area display according to claim 1, wherein,
the process of manufacturing the photomask includes:
a first step of generating at least one alignment mark on a photomask;
a second step of aligning and mounting at least two photomasks generated with the alignment marks on a photomask mounting frame of an exposure machine once;
a third step of confirming the positions of alignment marks between the photomasks; a kind of electronic device with high-pressure air-conditioning system
A fourth step of determining whether the alignment state is completed according to the confirmed position of the alignment mark,
when the alignment state is not completed, the photomask is secondarily aligned and then is reworked from the third step.
7. The method for manufacturing a fine metal mask for a large area display according to claim 6, wherein,
the third step is performed by a photomask alignment system,
the system comprises:
an alignment reference portion formed with at least two alignment reference points positioned so as to overlap the alignment marks; a kind of electronic device with high-pressure air-conditioning system
An imaging device installed at a position where the overlapping state of the alignment reference portion and the alignment mark can be imaged,
at least one of the alignment reference points overlaps an alignment mark formed on a first photomask of the plurality of photomasks, and the remaining alignment reference points overlap an alignment mark formed on a second photomask aligned adjacent to the first photomask.
8. The method of manufacturing a fine metal mask for a large area display according to claim 7, wherein the alignment system is provided to be movable at an upper or lower portion of the photomask.
9. The method of manufacturing a fine metal mask for a large-area display according to claim 7, wherein the number of the photographing devices corresponds to the number of the alignment reference points.
10. The method of manufacturing a fine metal mask for a large area display according to claim 1, wherein the process of manufacturing the photomask comprises:
a first step of generating at least one alignment mark on a photomask;
a second step of aligning and mounting at least two photomasks having the alignment marks generated thereon on a photomask mounting frame of a photomask alignment device once;
a third step of confirming the positions of alignment marks between the photomasks; a kind of electronic device with high-pressure air-conditioning system
A fourth step of determining whether the alignment state is completed according to the confirmed position of the alignment mark,
when the alignment state is not completed, the photomask is secondarily aligned and then is reworked from the third step.
11. The method of manufacturing a fine metal mask for a large area display according to claim 10, wherein the photomask alignment device comprises:
a photomask mounting frame;
a photomask suction part formed at the edge of the photomask mounting frame;
an alignment reference portion formed with at least two alignment reference points positioned so as to overlap the alignment marks; a kind of electronic device with high-pressure air-conditioning system
An imaging device installed at a position where the overlapping state of the alignment reference portion and the alignment mark can be imaged,
at least one of the alignment reference points overlaps an alignment mark formed on a first photomask of the plurality of photomasks, and the remaining alignment reference points overlap an alignment mark formed on a second photomask aligned adjacent to the first photomask.
12. The method of manufacturing a fine metal mask for a large area display according to claim 11, wherein the photomask alignment device comprises:
a photomask lifting rod which is arranged at the lower part of the photomask mounting frame in a lifting manner; a kind of electronic device with high-pressure air-conditioning system
And a support glass for supporting the photomask at the boundary surface when the plurality of photomasks are stacked.
13. The method of manufacturing a fine metal mask for a large-area display according to claim 10, wherein the number of the photographing devices corresponds to the number of the alignment reference points.
14. A fine metal mask for a large-area display, characterized in that the effective portion and the holding portion are formed integrally after being continuously or separately processed by the manufacturing method according to claim 1 or 2.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2021-0008807 | 2021-01-21 | ||
| KR1020210008807A KR102289722B1 (en) | 2021-01-21 | 2021-01-21 | Fine metal mask for large scaled display and the manufacturing method of the same |
| PCT/KR2021/016072 WO2022158687A1 (en) | 2021-01-21 | 2021-11-05 | Fine metal mask for large-area display and method for manufacturing same |
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| Publication Number | Publication Date |
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| CN116724683A true CN116724683A (en) | 2023-09-08 |
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| CN202180089361.6A Pending CN116724683A (en) | 2021-01-21 | 2021-11-05 | Fine metal mask for large area display and method of manufacturing the same |
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| Country | Link |
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| KR (1) | KR102289722B1 (en) |
| CN (1) | CN116724683A (en) |
| WO (1) | WO2022158687A1 (en) |
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| KR102289722B1 (en) * | 2021-01-21 | 2021-08-17 | 풍원정밀(주) | Fine metal mask for large scaled display and the manufacturing method of the same |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| KR101156432B1 (en) * | 2009-12-15 | 2012-06-18 | 삼성모바일디스플레이주식회사 | Mask frame assembly for thin layer deposition and organic light emitting display device |
| JP2012030238A (en) * | 2010-07-29 | 2012-02-16 | Fuji Electric Co Ltd | Laser beam machining method and laser beam machining device |
| KR20130124861A (en) * | 2012-05-07 | 2013-11-15 | 삼성전자주식회사 | Method of forming patterns |
| KR101663818B1 (en) * | 2014-04-17 | 2016-10-11 | 주식회사 웨이브일렉트로닉스 | Method for producing shadow mask using photomask including micro pattern for OLED fabrication, the shadow mask thereof and method for producing OLED using the same |
| KR102640221B1 (en) * | 2016-09-22 | 2024-02-23 | 삼성디스플레이 주식회사 | Method for fabricating division mask |
| KR102289722B1 (en) * | 2021-01-21 | 2021-08-17 | 풍원정밀(주) | Fine metal mask for large scaled display and the manufacturing method of the same |
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- 2021-01-21 KR KR1020210008807A patent/KR102289722B1/en active IP Right Grant
- 2021-11-05 WO PCT/KR2021/016072 patent/WO2022158687A1/en active Application Filing
- 2021-11-05 CN CN202180089361.6A patent/CN116724683A/en active Pending
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| KR102289722B1 (en) | 2021-08-17 |
| WO2022158687A1 (en) | 2022-07-28 |
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