CN116710848A - Multiple photomask alignment apparatus and alignment method for manufacturing fine metal mask for large area display - Google Patents
Multiple photomask alignment apparatus and alignment method for manufacturing fine metal mask for large area display Download PDFInfo
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- CN116710848A CN116710848A CN202280009076.3A CN202280009076A CN116710848A CN 116710848 A CN116710848 A CN 116710848A CN 202280009076 A CN202280009076 A CN 202280009076A CN 116710848 A CN116710848 A CN 116710848A
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- Prior art keywords
- photomask
- alignment
- fine metal
- metal mask
- photomasks
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 36
- 229910001111 Fine metal Inorganic materials 0.000 title claims abstract description 35
- 238000000034 method Methods 0.000 title claims abstract description 31
- 238000003384 imaging method Methods 0.000 claims abstract description 10
- 239000011521 glass Substances 0.000 claims description 8
- 238000012790 confirmation Methods 0.000 description 11
- 238000000151 deposition Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000010030 laminating Methods 0.000 description 4
- 238000003475 lamination Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000007547 defect Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7096—Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention relates to a plurality of photomask alignment apparatuses and alignment methods for manufacturing a fine metal mask for a large-area display, and more particularly, to a plurality of photomask alignment apparatuses for manufacturing a fine metal mask for a large-area display, characterized by comprising: a photomask mounting bracket; a photomask suction part formed on an edge of the photomask mounting bracket; an alignment reference part formed with at least two alignment reference points at positions overlapping with the alignment marks; and an imaging device mounted at a position where an overlapping state of the alignment reference portions and the alignment marks can be imaged, at least one of the alignment reference points overlapping with an alignment mark formed on a first photomask among the plurality of photomasks, and the remaining alignment reference points overlapping with an alignment mark formed on a second photomask aligned adjacent to the first photomask.
Description
Technical Field
The present invention relates to a plurality of photomask alignment apparatuses for manufacturing a fine metal mask for a large-area display, and more particularly, to easily manufacture a fine metal mask (finemetalmask) for manufacturing an 8 th generation large-area display, a plurality of photomask raw materials or a plurality of photomasks are used in connection, so that the 8 th generation fine metal mask having an extended effective portion can be manufactured. Thus, the production efficiency can be improved and the exposure apparatus for producing the 6.5 th-substituted fine metal mask can be used as compared with the fine metal mask for producing the 6.5 th-substituted display, in which the effective portion having the extended length is produced.
Background
In the development process of the display industry, the large-scale display is a foundation for developing new markets and expanding the scale for continuous growth. The enlargement means the enlargement of the large-area display panel production line construction and production board inches. Display merchants have made much effort in constructing large-area production lines, improving productivity, and manufacturing large panels at lower cost.
As a core member for depositing OLED elements on a display panel, a fine metal mask (finemetallimask) for depositing an existing 6.5 th generation OLED pixel is in a state of being difficult to follow the trend of a large-area display panel. Therefore, there is a real situation in which it is required to develop a fine metal mask for depositing the 8 th generation OLED pixels (hereinafter referred to as "8 th generation mask").
The fine metal mask includes: an effective portion as a region where a pattern is formed to deposit pixels; and a clamping part formed at both ends of the effective part to function as a mask fixing function for mounting the fine metal mask on the plate during the deposition of the pixels.
However, since the effective portion of the 6.5 th generation mask has a length of 1100 mm, the length of the effective portion of the 8 th generation mask is 2200 mm, and the length of the nip portion is 2600 mm in consideration of the length, there is a problem in that it is difficult to manufacture the 8 th generation mask by the conventional exposure machine that can expose up to 2400 mm at the longest.
In addition, a large amount of capital is required for manufacturing an exposure machine suitable for producing the 8 th generation mask, which is expected to result in a market price correspondingly high, whereby there is also a problem that the introduction of a new exposure machine causes a burden to be increased.
In addition, the photomask used for manufacturing the 8 th generation mask has a configuration in which two or more photomasks are laminated, and in the process of laminating the two photomasks each processed in advance, there is a high possibility that alignment continuity or uniformity between the two photomasks cannot be ensured, and in the case where alignment continuity or uniformity cannot be ensured as described above, pixel defects may occur in the pixel formation process, and a problem of deterioration in resolution of the display may occur due to the pixel defects. Therefore, development of a new engineering technique for manufacturing the 8 th generation mask is expected.
Disclosure of Invention
Technical problem
The present invention has been made to solve the above-mentioned problems of the prior art, and an object of the present invention is to manufacture a fine metal mask for manufacturing an 8 th generation large area display with high alignment by aligning a plurality of photomasks with high accuracy.
In addition, another object of the present invention is to provide a new photomask alignment apparatus and alignment method using an existing exposure machine, thereby eliminating the necessity of developing a new exposure machine and maximizing the usability of a general exposure machine when manufacturing a fine metal mask for manufacturing an 8 th generation large area display.
In addition, it is still another object of the present invention to be able to manufacture a separate aligner for aligning a plurality of photomasks and to be able to precisely align the plurality of photomasks by a simple method.
In addition, another object of the present invention is to manufacture a precise 8 th generation fine metal mask by transferring a plurality of aligned photomasks to an exposure machine in a suction state by providing a second photomask suction port in a photomask bonding frame so as to be reinforced and disposed in the photomask bonding frame, and performing exposure by transferring the photomask bonding frame in the suction state.
Technical solution
To achieve the above object, there is provided a plurality of photomask alignment apparatuses for manufacturing a fine metal mask for a large-area display, comprising: a photomask mounting bracket; a photomask suction part formed on an edge of the photomask mounting bracket; an alignment reference part formed with at least two alignment reference points at positions overlapping with the alignment marks; and an imaging device mounted at a position where an overlapping state of the alignment reference portions and the alignment marks can be imaged, at least one of the alignment reference points overlapping with an alignment mark formed on a first photomask among the plurality of photomasks, and the remaining alignment reference points overlapping with an alignment mark formed on a second photomask aligned adjacent to the first photomask.
The photomask alignment device preferably includes: a photomask lifting rod which is arranged at the lower part of the photomask mounting bracket in a lifting manner; and a support glass which is located on the boundary surface when the plurality of photomasks are laminated and is used for supporting the photomasks.
Preferably, the number of the image pickup devices is the same as the number of the alignment reference points.
Preferably, the mask further comprises a joint frame for supporting the photomask from an upper portion of the photomask, and a second mask adsorbing portion is formed on at least a part of a surface of the joint frame that meets the photomask.
In addition, the present invention provides a plurality of photomask alignment methods for manufacturing a fine metal mask for a large-area display, characterized by being performed by the alignment apparatus, comprising: a first step of forming at least one alignment mark on a photomask; a second step of aligning and mounting at least two photomasks formed with the alignment marks on a photomask mounting bracket of an exposure machine at a time; a third step of confirming positions of alignment marks between the photomasks mounted; and a fourth step of determining whether or not the alignment state is completed according to the confirmed positions of the alignment marks, the completion or non-completion of the alignment state being recognized according to whether or not the alignment marks formed on the respective photomasks are coincident with the alignment reference portions, and if the alignment state is not completed, aligning the photomasks for a second time, and then performing again from the third step.
ADVANTAGEOUS EFFECTS OF INVENTION
The present invention as described above is expected to have an effect of having high alignment by aligning a plurality of photomasks with high accuracy.
In addition, the present invention is expected to provide a new photomask alignment apparatus and alignment method using an existing exposure machine, thereby eliminating the necessity of developing a new exposure machine and maximizing the usability of a general exposure machine when manufacturing a fine metal mask for manufacturing an 8 th generation large area display.
In addition, the present invention is expected to have an effect that a plurality of photomasks can be precisely aligned by a simple method before performing an exposure process by manufacturing a separate aligner for aligning the plurality of photomasks.
In addition, the present invention is expected to have an effect that, in order to maintain an aligned state when transferring a plurality of aligned photomasks to an exposure machine, the second photomask suction port is provided in a photomask bonding frame so as to be reinforced, and the photomask bonding frame is transferred to the exposure machine in a suction state to be exposed, whereby a precise 8 th generation fine metal mask can be manufactured.
Drawings
Fig. 1 is a flowchart showing a process of laminating two separate photomasks and securing alignment according to an embodiment of the present invention, showing a case where a separate alignment apparatus is used.
Fig. 2 is a diagram showing the alignment apparatus of fig. 1 from the side while showing the process for lamination and alignment status confirmation of a photomask.
Fig. 3 is a diagram showing a second photomask adsorbing portion formed on a photomask bonding frame according to an embodiment of the present invention together with an exposure machine mounting frame.
Detailed Description
Hereinafter, in order to make it easier for a person having ordinary skill in the art to which the present invention pertains, an embodiment according to the present invention will be described in more detail with reference to the accompanying drawings. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. In the drawings, portions not related to the description are omitted for the sake of clarity of the description of the present invention, and like reference numerals are given to like portions throughout the specification.
In the entire specification, when a certain component is "included" in a certain portion, this means that other components are not excluded and other components may be included unless specifically stated to the contrary.
The terms "part", machine "and the like described in the specification mean a unit that processes at least one function or action.
The present invention is used to manufacture an 8 th generation fine metal mask, which is characterized in that its effective portion is formed longer than twice the effective portion of the existing 6.5 th generation fine metal mask. The whole length of the 8 th generation fine metal mask is 2600 mm, and the whole length of the 8 th generation fine metal mask is 1100 mm longer than that of the 6.5 th generation fine metal mask of 1500 mm. In addition, since the exposure machine is used to perform an exposure process as a process for manufacturing the fine metal mask, the object to be processed can be exposed up to 2500 mm long, the 6.5 th generation fine metal mask can be integrally exposed at one time, but the 8 th generation fine metal mask cannot be integrally exposed at one time.
Fig. 1 is a flowchart showing a process of laminating two separate photomasks and securing alignment according to an embodiment of the present invention, showing a case where a separate alignment apparatus is used. Fig. 2 is a diagram showing the alignment apparatus of fig. 1 from the side while showing the process for lamination and alignment status confirmation of a photomask. Fig. 3 is a diagram showing a second photomask adsorbing portion formed on a photomask bonding frame according to an embodiment of the present invention together with an exposure machine mounting frame.
Note that the planar shape related to the suction portion 171 formed on the photomask mounting bracket 170 on which the photomasks 130-1, 130-2 are mounted is shown in fig. 1, and on the other hand, the planar shape related to the bonding frame 230 and the second photomask suction portion 231 is shown in fig. 2 and 3.
Fig. 1 and 2 show a photomask alignment device 200 in which a photomask mounting bracket 170 is constructed separately from an exposure machine and in which a lifter 173, a support glass, and the like are provided.
As shown in fig. 1 and 2, the photomask alignment apparatus 200 according to the present embodiment includes an alignment reference portion 181 and an image pickup device, is provided with a fixed photomask alignment system 180, and is configured to include a separate bracket structure capable of supporting a photomask of a photomask mounting bracket 170.
That is, the photomask alignment apparatus 200 includes: photomask mounting bracket 170; a photomask suction part 171 formed on an edge of the photomask mounting bracket 170; an alignment reference portion 181 formed with at least two alignment reference points 182, the alignment reference points 182 being located at positions overlapping the alignment marks 145; and an image pickup device 183 mounted at a position where an overlapping state of the alignment reference portions 181 and the alignment marks 145 can be photographed, at least one of the alignment reference points 182 overlapping the alignment mark 145 formed on a first photomask among the plurality of photomasks, and the remaining alignment reference points overlapping the alignment mark 145 formed on a second photomask, the second photomask being aligned adjacent to the first photomask.
The photomask mounting bracket 170 and the photomask adsorbing portion 171 of the present embodiment have the following structures: 1) Separately from the structure formed on the exposure machine; 2) A photomask alignment system 180 including an alignment reference portion 181 and an imaging device 183 is fixed to the bracket; 3) Legs are formed on the lower part of the bracket; 4) A photomask lifting lever 173 is provided at a lower portion of the photomask mounting bracket 170 to be lifted and lowered at a central portion surrounded by the bracket, and performs a function of supporting the photomask to be mounted on the bracket.
And a support 220, which is positioned on a boundary surface of the photo mask and supports the photo mask when the alignment state is determined after the lamination of the plurality of photo masks, and which can function to maintain the alignment state when the photo mask is moved. The material of the support 220 is not limited, but a glass material is preferably used.
In the photomask mounting bracket 170 illustrated in fig. 1, as a region for supporting (mounting) the photomask, a central portion surrounded by the bracket is penetrated, and a transparent support plate 172 on which the photomask is placed is located at the central portion.
The support plate 172 is mainly a glass plate. This is because the glass plate has heat resistance and is transparent to be suitable for performing an exposure process. However, instead of glass plates, suitable materials may also be used.
Also, a slot (slit) 171 imparting negative pressure is provided on an edge of the holder 170, and the photomask 130 can be seated on the holder by the negative pressure when the photomask is supported, whereby stable fixation of the photomask 130 can be achieved. The slit 171 may be replaced by a hole, and the slit space capable of utilizing negative pressure may be in any form.
Photomask mounting bracket 170 has dimensions that are capable of supporting two unit photomasks 130-1, 130-2 being manufactured. However, the number of photomasks that can be supported is not limited to two, and more photomasks may be supported according to the size of the holder or the length of the mask.
The photomask mounting bracket 170 may fix a single photomask and laminate and support a plurality of photomasks 130-1, 130-2 using the process that may be used to expose the metal plate 190 and also confirm the alignment therebetween. In the case of laminating a plurality of photomasks, alignment of the patterns needs to be accurately achieved, and therefore, a means capable of accurately aligning the plurality of photomasks and additionally finding out the alignment state is required.
In contrast, the alignment device equipped with the photomask alignment system 180 is invented in the present invention, by which the alignment state of the laminated photomask can be accurately confirmed, and the laminated photomask having the alignment state suitable for performing the exposure process can be realized.
More specifically, the process of manufacturing the photomask includes: a first step of forming at least one alignment mark 145 on the photomask; a second step of aligning and mounting at least two photomasks formed with the alignment marks 145 on a photomask mounting bracket 170 of an exposure machine at a time; a third step of confirming the positions of the alignment marks 145 between the photomasks mounted; and a fourth step of determining whether the alignment state is completed or not according to the confirmed position of the alignment mark 145, and performing the third step again after aligning the photomask twice if the alignment state is not completed.
The alignment mark 145 formed on the photomask is preferably marked at a position apart from the area where the pattern is formed. Therefore, the photomask vertex adjacent areas provided at the four corners as the most reliable positions are preferable.
The alignment marks 145 may be provided on all four vertexes, or may be preferably formed at least on both ends of the long side. That is, the alignment mark 145 is most preferably marked at a position suitable for enabling confirmation of the alignment state of the unit photomask and the adjacent unit photomask.
The alignment mark 145 is formed on the same coordinates of the photomask to be aligned having the same specification, thereby enabling the regular confirmation of the alignment state. After completion of confirmation of the alignment state between photomasks, the alignment state is determined as such to be able to connect to the exposure process of the next process, and if it is judged that the alignment state is not completed, the alignment state is confirmed again by performing alignment again. The confirmation of the alignment state may be performed continuously until the alignment state is determined. The completion or absence of the alignment state may be recognized according to whether or not the alignment mark formed on each photomask coincides with the alignment reference portion.
Confirmation of the alignment state may be performed by photomask alignment system 180. The system comprises: an alignment reference portion 181 formed with at least two alignment reference points 182, the alignment reference points 182 being located at positions overlapping the alignment marks 145; and an imaging device 183 mounted at a position where the overlapping state of the alignment reference portion 181 and the alignment mark 145 can be imaged. However, at least one of the alignment reference points 182 overlaps the alignment mark 145 formed on a first photomask among the plurality of photomasks, and the remaining alignment reference points overlap the alignment mark 145 formed on a second photomask, which is aligned adjacent to the first photomask.
The illustrated form shows a form in which one alignment mark 145 is formed on each of the vertex regions where the first photomask and the second photomask are adjacent to each other. However, as described above, the number of the alignment marks 145 is not particularly limited as long as the alignment confirmation can be accurately performed.
The alignment reference portion 181 may be made of a transparent body. For example, the transparent reference portion is translucent, so that the influence of reflection of light can be reduced at the time of image capturing. Thereby, the overlapping state of the alignment reference point 182 and the alignment mark 145 can be confirmed with the naked eye. The alignment mark 145 is formed on the upper surface or the lower surface of the photomask, and it is apparent that the surface on which the alignment mark 145 is formed is not limited to any one surface.
The photomask alignment device 180 may be located at an upper portion or a lower portion of the photomask. That is, since the support portion for supporting the photomask is transparent glass, the alignment state can be confirmed from the lower portion of the photomask.
The photomask is preferably supported in a reference position on the support 170 whereby the alignment system 180 is able to confirm the alignment state of the photomask. As described above, it is necessary to set reference points for the support position of the photomask and the alignment measurement position of the alignment system 180 so that the alignment state of the photomask 130 can be easily and accurately confirmed and determined in a short time.
The confirmation of the alignment state is performed by the imaging device 183, and the alignment state imaged by the imaging device 183 is transmitted to a control unit (not shown) by wireless communication means, and the control unit determines whether the alignment state is determined after confirming the alignment state. As a result of the confirmation of the alignment state, if necessary, it is transferred again to the alignment device to cause it to perform the corresponding procedure.
The imaging device 183 is preferably provided in the same number as the alignment reference points 182, but it is obvious that the alignment state may be checked by moving one imaging device 183 that is movable.
Fig. 2 is a view showing the alignment apparatus of fig. 1 from the side while showing a process for lamination and alignment state confirmation of a photomask, and fig. 3 is a view showing a second photomask adsorbing portion formed on a photomask bonding frame together with an exposure machine mounting frame according to an embodiment of the present invention.
In the present invention, the two photomasks 130-1, 130-2 are fixed to the joint frame 230, and the second photomask adsorbing portion 231 is constructed on the joint frame 230, so that the photomasks 130-1, 130-2 can also be strongly adsorbed and fixed during the movement to the exposure machine, and the joint frame 230 is mounted on the exposure machine mounting bracket 240 to perform the exposure process. That is, as shown in fig. 3, a fine metal mask can be manufactured by exposing a metal plate material with the photomask 130, the bonding frame 230, and the exposure machine mounting bracket 240 as components. Since the manufacturing process of the fine metal mask is a well-known technique, a detailed description is omitted.
One of the features of the present invention is that the plurality of photomasks 130 can maintain their originally determined alignment state according to the second photomask adsorbing portion 231 constructed on the bonding frame 230.
It should be noted that the above-mentioned embodiments illustrate rather than limit the invention. In addition, it should be understood by those skilled in the art of the present invention that various embodiments may be implemented within the scope of the technical idea of the present invention.
Claims (5)
1. A multiple photomask alignment apparatus for manufacturing a fine metal mask for a large area display, comprising:
a photomask mounting bracket;
a photomask suction part formed on an edge of the photomask mounting bracket;
an alignment reference part formed with at least two alignment reference points at positions overlapping with the alignment marks; and
an imaging device mounted at a position where the overlapping state of the alignment reference portion and the alignment mark can be imaged,
at least one of the alignment fiducial points overlaps an alignment mark formed on a first photomask of the plurality of photomasks, and the remaining alignment fiducial points overlap an alignment mark formed on a second photomask that is aligned adjacent to the first photomask.
2. A plurality of photomask alignment apparatuses for manufacturing a fine metal mask for a large-area display according to claim 1, comprising:
a photomask lifting rod which is arranged at the lower part of the photomask mounting bracket in a lifting manner; and
and a support glass for supporting the photomask on the boundary surface when the plurality of photomasks are laminated.
3. A plurality of photomask alignment apparatuses for manufacturing a fine metal mask for a large-area display according to claim 1,
the number of the image pickup devices is the same as the number of the alignment reference points.
4. A multiple photomask alignment apparatus for manufacturing a fine metal mask for a large area display, comprising:
a photomask mounting bracket;
a photomask suction part formed on an edge of the photomask mounting bracket;
an alignment reference part formed with at least two alignment reference points at positions overlapping with the alignment marks; and
an imaging device mounted at a position where the overlapping state of the alignment reference portion and the alignment mark can be imaged,
at least one of the alignment fiducial points overlaps an alignment mark formed on a first photomask of the plurality of photomasks, and the remaining alignment fiducial points overlap an alignment mark formed on a second photomask, the second photomask being aligned adjacent to the first photomask,
and a bonding frame for supporting the photomask from an upper portion of the photomask, wherein a second photomask adsorbing portion is formed on at least a part of a surface of the bonding frame that meets the photomask.
5. A plurality of photomask alignment methods for manufacturing a fine metal mask for a large-area display, performed by the alignment apparatus according to claim 1, comprising:
a first step of forming at least one alignment mark on a photomask;
a second step of aligning and mounting at least two photomasks formed with the alignment marks on a photomask mounting bracket of an exposure machine at a time;
a third step of confirming positions of alignment marks between the photomasks mounted; and
a fourth step of determining whether the alignment state is completed or not according to the confirmed position of the alignment mark,
the completion or non-completion of the alignment state is recognized according to the coincidence or non-coincidence of the alignment mark formed on each photomask and the alignment reference portion, and in the case that the alignment state is not completed, the photomask is secondarily aligned, and then, the third step is performed again.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2021-0014413 | 2021-02-01 | ||
| KR1020210014413A KR102295228B1 (en) | 2021-02-01 | 2021-02-01 | Multiple photomask aligner which can manufacture fine metal mask for large scaled display and the alligning method of the same |
| PCT/KR2022/001003 WO2022164123A1 (en) | 2021-02-01 | 2022-01-19 | Device and method for aligning multiple photomasks for manufacturing fine metal mask for large-area display |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116710848A true CN116710848A (en) | 2023-09-05 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202280009076.3A Pending CN116710848A (en) | 2021-02-01 | 2022-01-19 | Multiple photomask alignment apparatus and alignment method for manufacturing fine metal mask for large area display |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR102295228B1 (en) |
| CN (1) | CN116710848A (en) |
| WO (1) | WO2022164123A1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102295228B1 (en) * | 2021-02-01 | 2021-08-31 | 풍원정밀(주) | Multiple photomask aligner which can manufacture fine metal mask for large scaled display and the alligning method of the same |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR960024644A (en) * | 1994-12-29 | 1996-07-20 | 윤종용 | Mask Aligner for Exposure Machine |
| KR970076093A (en) * | 1996-05-06 | 1997-12-10 | 김광호 | Positioning of registration mark of photomask and exposure method using it |
| US6777143B2 (en) * | 2002-01-28 | 2004-08-17 | Taiwan Semiconductor Manufacturing Company | Multiple mask step and scan aligner |
| CN104503203A (en) * | 2015-01-15 | 2015-04-08 | 京东方科技集团股份有限公司 | Mask plate and production method thereof and display panel frame sealing adhesive curing method |
| CN104808451B (en) * | 2015-05-15 | 2017-07-18 | 合肥京东方光电科技有限公司 | A kind of contraposition exposure method |
| KR102295228B1 (en) * | 2021-02-01 | 2021-08-31 | 풍원정밀(주) | Multiple photomask aligner which can manufacture fine metal mask for large scaled display and the alligning method of the same |
-
2021
- 2021-02-01 KR KR1020210014413A patent/KR102295228B1/en active IP Right Grant
-
2022
- 2022-01-19 CN CN202280009076.3A patent/CN116710848A/en active Pending
- 2022-01-19 WO PCT/KR2022/001003 patent/WO2022164123A1/en active Application Filing
Also Published As
| Publication number | Publication date |
|---|---|
| KR102295228B1 (en) | 2021-08-31 |
| WO2022164123A1 (en) | 2022-08-04 |
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