WO2022164113A1 - Apparatus and method for aligning plurality of photomasks for manufacturing fine metal mask for large display - Google Patents

Apparatus and method for aligning plurality of photomasks for manufacturing fine metal mask for large display Download PDF

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Publication number
WO2022164113A1
WO2022164113A1 PCT/KR2022/000953 KR2022000953W WO2022164113A1 WO 2022164113 A1 WO2022164113 A1 WO 2022164113A1 KR 2022000953 W KR2022000953 W KR 2022000953W WO 2022164113 A1 WO2022164113 A1 WO 2022164113A1
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Prior art keywords
alignment
photomask
photomasks
fine metal
metal mask
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PCT/KR2022/000953
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French (fr)
Korean (ko)
Inventor
유명훈
김재범
한덕기
Original Assignee
풍원정밀㈜
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Priority to CN202280009075.9A priority Critical patent/CN116762492A/en
Publication of WO2022164113A1 publication Critical patent/WO2022164113A1/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Definitions

  • the present invention relates to a plurality of photomask alignment apparatus and alignment method for manufacturing a fine metal mask for a large-area display, and more particularly, to easily manufacture a fine metal mask for manufacturing an 8th generation large-area display.
  • a plurality of photomask raw materials or a plurality of photomasks are connected and used to manufacture a fine metal mask having an extended effective portion of the 8th generation. Accordingly, it is possible to increase production efficiency in manufacturing a fine metal mask having an effective portion extended in length compared to a fine metal mask for manufacturing a 6.5 generation display, and to utilize the existing exposure equipment for manufacturing a fine metal mask for the 6.5 generation as it is. can
  • a key component for depositing OLED devices on a display panel is a fine metal mask, and it is difficult to keep up with the trend of large-area display panels with the existing 6.5G OLED pixel deposition fine metal mask. is laid Therefore, there is a need to develop a fine metal mask for deposition of 8th generation OLED pixels (hereinafter abbreviated as “8th generation mask”).
  • the fine metal mask is composed of an effective portion, which is an area where a pattern is formed so that pixels are deposited, and grip portions formed at both ends of the effective portion to serve as a mask fixing in order to seat the fine metal mask on the panel in the process of depositing the pixels.
  • the length of the effective part of the 6.5th generation mask is 1100mm, whereas the length of the effective part of the 8th generation mask is 2200mm.
  • the length of the grip part it is 2600mm, which is a conventional exposure machine that can expose up to a length of 2400mm. There is a problem in that it is difficult to produce a generation mask.
  • the photomask used to manufacture the 8th generation mask is a type of laminating two or more numbers, so the continuity or consistency of alignment between the two photomasks in the process of laminating two pre-processed photomasks, respectively. There is a high possibility that this cannot be ensured, and when continuity or consistency of alignment is not ensured in this way, pixel defects may occur in the process of forming pixels, and the resolution of the display may deteriorate due to the defective pixels. Therefore, the development of a new process technology for manufacturing the 8th generation mask is desired.
  • the present invention has been devised to solve the problems of the prior art, and the present invention aims to manufacture a fine metal mask for manufacturing an 8th generation large-area display having a high degree of alignment by aligning a plurality of photo masks with high accuracy. do it with
  • the present invention provides a new photomask alignment device and alignment method so that the existing exposure machine can be used as it is, thereby eliminating the need for developing a new exposure machine when manufacturing a fine metal mask for manufacturing an 8th generation large-area display, and eliminating the need for a conventional exposure machine It serves another purpose to maximize utilization.
  • Another object of the present invention is to configure a simple alignment inspection apparatus to precisely align photo masks on an existing exposure machine in aligning a plurality of photo masks.
  • the alignment reference point is an alignment reference portion positioned so as to overlap the alignment mark; and a photographing device mounted at a position capable of photographing the overlapping state of the alignment reference unit and the alignment mark, wherein at least one of the alignment reference points overlaps the alignment mark formed on the first photomask among the plurality of photomasks,
  • a plurality of photomask alignment apparatuses for manufacturing a fine metal mask for a large area display, wherein the remainder overlaps the alignment marks formed on the second photomask aligned adjacent to the first photomask.
  • the alignment system may be positioned above or below the photomask and may be configured to be movable.
  • the photographing device is provided as many as the number of the alignment reference points.
  • the present invention is performed by the above-described alignment device, the first step of generating at least one alignment mark on the photo mask; a second step of first aligning and mounting the at least two photomasks on which the alignment marks are generated on a photomask mounting frame of an exposure machine; a third step of confirming the positions of the alignment marks between the mounted photomasks; and a fourth step of determining whether the alignment state is completed according to the position of the identified alignment mark, wherein the completion of the alignment state is recognized from whether the alignment mark formed on each photomask matches the alignment reference unit, and the alignment Provided is a method for aligning a plurality of photomasks for manufacturing a fine metal mask for a large area display, wherein the third step is performed again after secondary alignment of the photomasks when the state is not completed.
  • the present invention has been devised to solve the problems of the prior art, and the present invention is expected to have a high degree of alignment by aligning a plurality of photomasks with high accuracy.
  • the present invention provides a new photomask alignment device and alignment method so that the existing exposure machine can be used as it is, thereby eliminating the need for developing a new exposure machine when manufacturing a fine metal mask for manufacturing an 8th generation large-area display, and eliminating the need for a conventional exposure machine The effect is expected to maximize the usability.
  • the present invention configures a simple alignment inspection apparatus in aligning a plurality of photomasks and utilizes it on an existing exposure machine, so that the effect of allowing the photomasks to be precisely aligned by a convenient and simple method is expected. do.
  • FIG. 1 is a flowchart illustrating a process of laminating two individual photomasks and securing alignment according to an embodiment of the present invention, and shows a case in which an existing exposure machine is used.
  • FIG. 2 is a flowchart illustrating a process of exposing the surface of a fine metal mask by using the port mask lamination and alignment diagram according to FIG. 1 , and then using the same.
  • ... unit and “... group” described in the specification mean a unit for processing at least one function or operation.
  • a photomask must be pre-fabricated in order to manufacture an 8th generation fine metal mask, and the currently produced photomask is suitable for manufacturing a 6.5th generation fine metal mask considering the size of an exposure machine currently operating worldwide. It can be manufactured, but two or more photomasks must be connected in order to manufacture a fine metal mask of the 8th generation size. For this purpose, for example, two photomasks must be precisely aligned, and if the alignment is not done properly, it is impossible to manufacture a fine metal mask of good quality. On the other hand, a single photomask capable of manufacturing an 8th generation fine metal mask has not been produced at all, and the fact that it cannot be procured anywhere is a motivation for implementing the present invention.
  • the 8th generation fine metal mask is characterized in that the effective portion is twice as long as that of the existing 6.5 generation fine metal mask.
  • the overall length of the 8th generation fine metal mask is 2600 mm, which is 1100 mm longer than the total length of the 6.5 generation fine metal mask of 1500 mm.
  • the exposure machine for performing the exposure process which is a process for manufacturing a fine metal mask, can expose a target object with a length of up to 2500 mm, one full exposure of the 6.5 generation fine metal mask is possible, but the 8th generation fine metal mask One full exposure of the mask is not possible.
  • manufacturing the 8th generation fine metal mask when using an existing exposure machine, exposure of only the effective portion is possible, but exposure of the length including the ineffective portion is impossible.
  • FIG. 1 is a flowchart illustrating a process of laminating two individual photomasks and securing alignment according to an embodiment of the present invention, illustrating a case in which an existing exposure machine is used
  • FIG. 2 is a port mask according to FIG. It is a flowchart showing the process of exposing the surface of the fine metal mask using the lamination and alignment degree secured.
  • the illustrated photomask mounting frame 170 is a region on which a photomask is mounted (mounted), a central portion surrounded by the frame is penetrated, and a transparent mounting plate 172 on which the photomask is mounted is positioned.
  • the mounting plate 172 mainly adopts a glass plate. This is because the glass plate has heat resistance and is transparent, so it is suitable for performing the exposure process. However, an appropriate material other than the glass plate may be adopted as an alternative material.
  • a slit 171 to which a negative pressure is applied is provided at the edge of the frame, so that when the photomask is mounted, the photomask 130 can be seated on the frame by the negative pressure, and thus the photomask 130 can be stably fixed do.
  • the upper slit 171 may be replaced by a single hole, and the interstitial space that can use the sound pressure may have any shape.
  • the photomask mounting frame 170 has a size in which two manufactured unit photomasks 130-1 and 130-2 can be mounted.
  • the number of photomasks that can be mounted is not limited to two, and more photomasks may be mounted according to the size of the frame or the length of the mask.
  • the photomask mounting frame 170 is a component of a conventional exposure machine, and is used in a process of fixing a single photomask and exposing the metal plate 190 using the fixed photomask. However, a function for laminating and mounting a plurality of photomasks and checking the alignment state between them is not mounted. As described above, when a plurality of photomasks are laminated, the pattern must be closely aligned, so the plurality of photomasks must be precisely aligned, and a means for checking the alignment state must be separately devised.
  • a movable type photomask alignment device 180 is added to the exposure machine, whereby the alignment state of the laminated photomasks can be precisely checked, and the laminated photomask having an alignment state suitable for performing the exposure process. implementation became possible. That is, by further increasing the utilization of the existing exposure machine, it was possible to utilize the existing exposure machine for the manufacture of the 8th generation fine metal mask.
  • the process of manufacturing the photomask may include: a first step of generating at least one alignment mark 145 on the photomask; a second step of first aligning and mounting at least two photomasks on which the alignment marks 145 are generated on a photomask mounting frame 170 of an exposure machine; a third step of confirming the positions of the alignment marks 145 between the mounted photomasks; and a fourth step of determining whether the alignment state is complete according to the confirmed position of the alignment mark 145; if the alignment state is not completed, the photomasks are secondarily aligned and then performed again from the third step will do
  • the alignment marks 145 generated on the photomask are preferably marked outside the region where the pattern is formed. Therefore, it is preferable that the photomask be installed in the area near the vertex of the rectangular photomask as the most comfortable position.
  • the alignment marks 145 may be formed at all four vertices, or at least at both ends of the long side. That is, it is most preferable that the alignment mark 145 is marked at a suitable position so that the alignment state of the unit photomask and the adjacent unit photomask can be checked.
  • the alignment marks 145 are formed at the same coordinates of an alignment target photomask having the same standard, so that the alignment state can be checked regularly.
  • the alignment state is confirmed as it is so that it can be connected to the exposure process, which is the next process.
  • Checking the alignment status may be continuously performed until the alignment status is confirmed.
  • the completion of the alignment state may be recognized from whether the alignment mark formed on each photomask matches the alignment reference unit.
  • the alignment reference points 182 include an alignment reference unit 181 positioned to overlap the alignment mark 145; and a photographing device 183 mounted at a position capable of photographing the overlapping state of the alignment reference unit 181 and the alignment mark 145 .
  • the alignment reference points 182 overlaps the alignment mark 145 formed on the first photomask among the plurality of photomasks, and the rest are aligned on the second photomask aligned adjacent to the first photomask. superimposed on mark 145 .
  • the illustrated shape shows a shape in which one alignment mark 145 is formed in the vertex regions adjacent to each other of the first photomask and the second photomask.
  • the number of alignment marks 145 is not particularly limited as long as the alignment check can be precisely performed as described above.
  • the alignment reference unit 181 may be formed of a transparent material. For example, by making the transparent reference unit semi-transparent, the effect of light reflection during photographing can be reduced. Accordingly, the overlapping state of the alignment reference point 182 and the alignment mark 145 can be confirmed with the naked eye.
  • the alignment mark 145 is formed on the upper or lower surface of the photomask, and the formation surface of the alignment mark 145 is not limited to any one surface.
  • the photomask alignment apparatus 180 may be located above or below the photomask. That is, since the mounting portion on which the photomask is mounted is made of transparent glass, it is possible to check the alignment state even under the photomask.
  • the photomask is preferably mounted at a reference position on the frame 170 , and the alignment device 180 also moves to the reference position on the frame 170 to check the alignment state of the photomask. In this way, when the reference point for the mounting position of the photomask and the moving position of the alignment device 180 is set, the alignment state of the photomask 130 can be easily and precisely confirmed and confirmed in a short time.
  • the alignment state is checked by the photographing device 183, and the alignment state photographed by the photographing apparatus 183 is transmitted to a control unit (not shown) by wired/wireless communication means, and after checking the alignment state in the control unit, the alignment state decides whether to confirm or not. As a result of checking the alignment state, if there is a need for realignment, this is transmitted to the alignment device again to perform the corresponding process.
  • the photomask aligning apparatus 180 may be configured to be movable without or limiting the direction.
  • the photographing device 183 is preferably provided as many as the number of the alignment reference points 182 , but of course, one movable photographing device 183 may be configured to check the alignment state while moving.
  • FIG. 2 illustrates a process of exposing the metal plate 190 using the photomask 130 after the alignment state of the laminated photomask 130 is confirmed.
  • the alignment state between the unit photomasks 130 - 1 and 130 - 2 may be maintained by continuously operating the adsorption force of the adsorption unit 171 .
  • the photomask alignment system 180 moves, and a pair of photomasks 130 symmetrical on both sides of the metal plate 190 are moved to come into contact with the metal plate 190, and then the metal plate ( 190) is exposed on both sides. Since processes such as exposure and development are known processes, a detailed description thereof will be omitted.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The present invention relates to an apparatus and method for aligning a plurality of photomasks for manufacturing a fine metal mask for a large display. More specifically, provided is an apparatus for aligning a plurality of photomasks for manufacturing a fine metal mask for a large display, the apparatus being characterized by comprising: an alignment reference part having at least two alignment reference points that are positioned overlapping alignment marks; and an image capturing device mounted at a position at which the image capturing device can capture an image of the overlapping state of the alignment reference part and the alignment marks. One or more of the alignment reference points overlap(s) the alignment marks formed on a first photomask among the plurality of photomasks, and the remainder overlap(s) the alignment marks formed on a second photomask aligned adjacent to the first photomask.

Description

대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치 및 정렬방법A plurality of photomask alignment apparatus and alignment method for manufacturing fine metal mask for large area display
본 발명은 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치 및 정렬방법에 관한 것으로서, 보다 상세하게는 8세대 대면적 디스플레이 제작용 미세 금속 마스크(fine metal mask)를 용이하게 제작하기 위하여, 복수의 포토 마스크 원자재 또는 복수의 포토 마스크를 연결하여 사용함으로써 8세대의 확장된 유효부를 갖는 미세 금속 마스크를 제작할 수 있도록 한 것이다. 이로써, 6.5세대 디스플레이 제작용 미세 금속 마스크에 비하여 길이가 연장된 유효부를 갖는 미세 금속 마스크를 제작함에 있어서 생산의 효율성을 기할 수 있을 뿐 아니라, 기존의 6.5세대용 미세 금속 마스크 제조용 노광장비를 그대로 활용할 수 있다. The present invention relates to a plurality of photomask alignment apparatus and alignment method for manufacturing a fine metal mask for a large-area display, and more particularly, to easily manufacture a fine metal mask for manufacturing an 8th generation large-area display. For this purpose, a plurality of photomask raw materials or a plurality of photomasks are connected and used to manufacture a fine metal mask having an extended effective portion of the 8th generation. Accordingly, it is possible to increase production efficiency in manufacturing a fine metal mask having an effective portion extended in length compared to a fine metal mask for manufacturing a 6.5 generation display, and to utilize the existing exposure equipment for manufacturing a fine metal mask for the 6.5 generation as it is. can
디스플레이 산업발전 과정에서 '대형화'는 새로운 시장을 창출하고 규모를 확대해 지속 성장하는 토대가 되어왔다. 대형화는 대면적 디스플레이 패널 생산라인 구축 및 생산 패널 인치의 확대를 의미한다. 디스플레이 업체들은 대면적 라인을 구축, 생산성을 높이고 더 저렴한 원가로 대형 패널을 생산하는데 많은 노력을 기울이고 있다. In the process of development of the display industry, 'large size' has become the foundation for sustainable growth by creating a new market and expanding its scale. Enlargement means the establishment of a large-area display panel production line and the expansion of the production panel inch. Display makers are putting much effort into building large-area lines to increase productivity and produce large-sized panels at lower cost.
디스플레이 패널에 OLED 소자를 증착하기 위한 핵심 부품이 미세 금속 마스크(Fine metal mask)인데, 기존의 6.5세대 OLED 화소 증착용 미세 금속 마스크로는 더 이상 대면적화되는 디스플레이 패널의 트렌드를 따라잡기 어려운 상황에 놓여 있다. 따라서, 8세대 OLED 화소 증착용 미세 금속 마스크(이하에서는 "8세대 마스크"로 약칭함)의 개발이 필요한 실정이다.A key component for depositing OLED devices on a display panel is a fine metal mask, and it is difficult to keep up with the trend of large-area display panels with the existing 6.5G OLED pixel deposition fine metal mask. is laid Therefore, there is a need to develop a fine metal mask for deposition of 8th generation OLED pixels (hereinafter abbreviated as “8th generation mask”).
미세 금속 마스크는 화소가 증착되도록 패턴이 형성된 영역인 유효부와 화소를 증착하는 과정에서 미세 금속 마스크를 패널 위에 안착시키도록 하기 위하여 마스크 고정 역할을 하도록 상기 유효부의 양단에 형성된 그립부로 구성된다.The fine metal mask is composed of an effective portion, which is an area where a pattern is formed so that pixels are deposited, and grip portions formed at both ends of the effective portion to serve as a mask fixing in order to seat the fine metal mask on the panel in the process of depositing the pixels.
다만, 6.5세대 마스크는 유효부의 길이가 1100mm인 반면, 8세대 마스크는 유효부의 길이가 2200mm이며, 여기에 그립부의 길이까지 고려하면 2600mm에 달하여, 최장 2400mm의 길이까지 노광이 가능한 기존의 노광기로써 8세대 마스크를 제작하기 어려운 문제점이 있다. However, the length of the effective part of the 6.5th generation mask is 1100mm, whereas the length of the effective part of the 8th generation mask is 2200mm. Considering the length of the grip part, it is 2600mm, which is a conventional exposure machine that can expose up to a length of 2400mm. There is a problem in that it is difficult to produce a generation mask.
또한, 8세대 마스크의 생산에 적합한 노광기를 제작하기 위해서는 많은 자본이 소요되는 만큼 높은 시장 가격의 형성이 예상되며, 따라서 새로운 노광기의 도입에 따른 부담이 가중되는 문제점도 존재한다.In addition, as much capital is required to manufacture an exposure machine suitable for production of an 8th generation mask, a high market price is expected, and thus there is a problem in that the burden due to the introduction of a new exposure machine is increased.
아울러, 8세대 마스크를 제작하기 위하여 사용되는 포토 마스크는 2개 또는 그 이상의 갯수를 합지하는 형태인 바, 각각 선가공된 포토 마스크 2개를 합지하는 과정에서 2개의 포토 마스크간 정렬의 연속성이나 정합성이 확보되지 못할 가능성이 높으며, 이와 같이 정렬의 연속성이나 정합성이 확보되지 못한 경우에는 화소 형성과정에서 화소 불량이 발생되고, 불량화소로 인하여 디스플레이의 해상도가 나빠지는 문제점이 발생될 수 있다. 따라서, 8세대 마스크를 제작하기 위한 새로운 공정기술 개발이 요망된다. In addition, the photomask used to manufacture the 8th generation mask is a type of laminating two or more numbers, so the continuity or consistency of alignment between the two photomasks in the process of laminating two pre-processed photomasks, respectively There is a high possibility that this cannot be ensured, and when continuity or consistency of alignment is not ensured in this way, pixel defects may occur in the process of forming pixels, and the resolution of the display may deteriorate due to the defective pixels. Therefore, the development of a new process technology for manufacturing the 8th generation mask is desired.
본 발명은 전술한 종래기술의 문제점을 해결하기 위하여 안출된 것으로서, 본 발명은 복수의 포토 마스크를 높은 정확도로 정렬함으로써, 높은 정렬도를 갖는 8세대 대면적 디스플레이 제조용 미세 금속 마스크를 제조하는 것을 목적으로 한다.The present invention has been devised to solve the problems of the prior art, and the present invention aims to manufacture a fine metal mask for manufacturing an 8th generation large-area display having a high degree of alignment by aligning a plurality of photo masks with high accuracy. do it with
또한, 본 발명은 기존의 노광기를 그대로 활용할 수 있도록 포토 마스크 정렬장치와 정렬방법을 새로이 제시함으로써, 8세대 대면적 디스플레이 제조용 미세 금속 마스크를 제조할 때, 새로운 노광기의 개발 필요성을 해소하고 통상의 노광기 활용도를 극대화할 수 있도록 하는 것을 다른 목적으로 한다.In addition, the present invention provides a new photomask alignment device and alignment method so that the existing exposure machine can be used as it is, thereby eliminating the need for developing a new exposure machine when manufacturing a fine metal mask for manufacturing an 8th generation large-area display, and eliminating the need for a conventional exposure machine It serves another purpose to maximize utilization.
또한, 본 발명은 복수의 포토 마스크를 정렬함에 있어서 기존의 노광기 상에서 포토 마스크들을 정밀하게 정렬할 수 있도록, 간이한 정렬 검사 장치를 구성하는 것을 또 다른 목적으로 한다.Another object of the present invention is to configure a simple alignment inspection apparatus to precisely align photo masks on an existing exposure machine in aligning a plurality of photo masks.
본 발명은 전술한 목적을 달성하기 위하여, 정렬 기준점이 적어도 두 개 형성되며, 상기 정렬 기준점은 정렬 마크와 중첩되도록 위치되는 정렬 기준부; 및 상기 정렬 기준부와 정렬 마크의 중첩 상태를 촬영할 수 있는 위치에 장착되는 촬영 장치;를 포함하되, 상기 정렬 기준점 중 적어도 하나는 복수의 포토 마스크 중 제1포토 마스크에 형성된 정렬 마크에 중첩되고, 나머지는 제1포토 마스크에 인접하여 정렬된 제2포토 마스크에 형성된 정렬 마크에 중첩되는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치를 제공한다.The present invention, in order to achieve the above object, at least two alignment reference points are formed, the alignment reference point is an alignment reference portion positioned so as to overlap the alignment mark; and a photographing device mounted at a position capable of photographing the overlapping state of the alignment reference unit and the alignment mark, wherein at least one of the alignment reference points overlaps the alignment mark formed on the first photomask among the plurality of photomasks, Provided is a plurality of photomask alignment apparatuses for manufacturing a fine metal mask for a large area display, wherein the remainder overlaps the alignment marks formed on the second photomask aligned adjacent to the first photomask.
상기 정렬 시스템은 상기 포토 마스크의 상부 또는 하부에 위치되며, 이동가능하게 구성되는 것이 바람직하다.The alignment system may be positioned above or below the photomask and may be configured to be movable.
상기 촬영 장치는 상기 정렬 기준점의 갯수만큼 구비되는 것이 바람직하다.It is preferable that the photographing device is provided as many as the number of the alignment reference points.
또한, 본 발명은 전술한 정렬장치에 의하여 수행되며, 포토 마스크 상에 적어도 1개의 정렬 마크를 생성하는 제1단계; 상기 정렬 마크가 생성된 적어도 두 개의 포토 마스크들을 노광기의 포토 마스크 장착 프레임에 1차 정렬하여 장착하는 제2단계; 상기 장착된 포토 마스크간 정렬 마크의 위치를 확인하는 제3단계; 및 확인된 정렬 마크의 위치에 따라서 정렬 상태의 완성 여부를 확정하는 제4단계;를 포함하고, 상기 정렬상태의 완성여부는 각 포토 마스크에 형성된 정렬 마크와 정렬 기준부의 일치여부로부터 인정되며, 정렬상태가 미완성된 경우 상기 포토 마스크들을 2차 정렬한 후 상기 제3단계부터 다시 수행하는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬방법을 제공한다.In addition, the present invention is performed by the above-described alignment device, the first step of generating at least one alignment mark on the photo mask; a second step of first aligning and mounting the at least two photomasks on which the alignment marks are generated on a photomask mounting frame of an exposure machine; a third step of confirming the positions of the alignment marks between the mounted photomasks; and a fourth step of determining whether the alignment state is completed according to the position of the identified alignment mark, wherein the completion of the alignment state is recognized from whether the alignment mark formed on each photomask matches the alignment reference unit, and the alignment Provided is a method for aligning a plurality of photomasks for manufacturing a fine metal mask for a large area display, wherein the third step is performed again after secondary alignment of the photomasks when the state is not completed.
이상과 같은 본 발명에 따르면, 본 발명은 전술한 종래기술의 문제점을 해결하기 위하여 안출된 것으로서, 본 발명은 복수의 포토 마스크를 높은 정확도로 정렬함으로써, 높은 정렬도를 갖는 효과가 기대된다.According to the present invention as described above, the present invention has been devised to solve the problems of the prior art, and the present invention is expected to have a high degree of alignment by aligning a plurality of photomasks with high accuracy.
또한, 본 발명은 기존의 노광기를 그대로 활용할 수 있도록 포토 마스크 정렬장치와 정렬방법을 새로이 제시함으로써, 8세대 대면적 디스플레이 제조용 미세 금속 마스크를 제조할 때, 새로운 노광기의 개발 필요성을 해소하고 통상의 노광기 활용도를 극대화할 수 있도록 하는 효과가 기대된다.In addition, the present invention provides a new photomask alignment device and alignment method so that the existing exposure machine can be used as it is, thereby eliminating the need for developing a new exposure machine when manufacturing a fine metal mask for manufacturing an 8th generation large-area display, and eliminating the need for a conventional exposure machine The effect is expected to maximize the usability.
또한, 본 발명은 복수의 포토 마스크를 정렬함에 있어서 간이한 정렬 검사 장치를 구성하고, 이를 기존의 노광기 상에서 활용함으로써, 편리하고 간이한 방법에 의하여 포토 마스크들을 정밀하게 정렬할 수 있도록 하는 효과가 기대된다.In addition, the present invention configures a simple alignment inspection apparatus in aligning a plurality of photomasks and utilizes it on an existing exposure machine, so that the effect of allowing the photomasks to be precisely aligned by a convenient and simple method is expected. do.
도 1은 본 발명의 일 실시예에 의한 두개의 개별적 포토 마스크를 합지하고 정렬도를 확보하는 과정을 나타내는 순서도로서, 기존의 노광기를 사용하는 경우를 나타낸 것이다. 1 is a flowchart illustrating a process of laminating two individual photomasks and securing alignment according to an embodiment of the present invention, and shows a case in which an existing exposure machine is used.
도 2는 도 1에 따른 포트 마스크 합지 및 정렬도 확보 후 이를 이용하여 미세 금속 마스크의 표면을 노광하는 과정을 나타내는 순서도이다.FIG. 2 is a flowchart illustrating a process of exposing the surface of a fine metal mask by using the port mask lamination and alignment diagram according to FIG. 1 , and then using the same.
이하, 첨부한 도면을 참고로 하여 본 발명의 실시예에 대하여 본 발명이 속하는 기술 분야에서 통상의 지식을 가진 자가 용이하게 실시할 수 있도록 상세히 설명한다. 그러나 본 발명은 여러 가지 상이한 형태로 구현될 수 있으며 여기에서 설명하는 실시예에 한정되지 않는다. 그리고 도면에서 본 발명을 명확하게 설명하기 위해서 설명과 관계없는 부분은 생략하였으며, 명세서 전체를 통하여 유사한 부분에 대해서는 유사한 도면 부호를 붙였다.Hereinafter, with reference to the accompanying drawings, embodiments of the present invention will be described in detail so that those of ordinary skill in the art to which the present invention pertains can easily implement them. However, the present invention may be embodied in several different forms and is not limited to the embodiments described herein. And in order to clearly explain the present invention in the drawings, parts irrelevant to the description are omitted, and similar reference numerals are attached to similar parts throughout the specification.
명세서 전체에서, 어떤 부분이 어떤 구성요소를 "포함"한다고 할 때, 이는 특별히 반대되는 기재가 없는 한 다른 구성요소를 제외하는 것이 아니라 다른 구성요소를 더 포함할 수 있는 것을 의미한다.Throughout the specification, when a part "includes" a certain component, it means that other components may be further included, rather than excluding other components, unless otherwise stated.
또한, 명세서에 기재된 "…부", "…기" 등의 용어는 적어도 하나의 기능이나 동작을 처리하는 단위를 의미한다.In addition, terms such as "... unit" and "... group" described in the specification mean a unit for processing at least one function or operation.
본 발명은 8세대 미세 금속 마스크를 제작하기 위하여 포토 마스크가 선행 제작되어야 하는데, 현재 생산되는 포토 마스크는 현재 전 세계적으로 가동되는 노광기의 크기를 고려하면 6.5세대 크기의 미세 금속 마스크를 제작하는데 적합하게 제조될 수 있을 뿐, 8세대 크기의 미세 금속 마스크를 제조하기 위해서는 2개 또는 그 이상의 포토 마스크를 연결하여야 한다. 이를 위해서는 예를 들어 2개의 포토 마스크를 정밀하게 정렬하여야 하며, 정렬이 제대로 되지 않는 경우, 양품의 미세 금속 마스크를 제작할 수 없다. 한편, 8세대 미세 금속 마스크를 제작할 수 있는 단일의 포토 마스크도 전혀 생산되지 않고 있어, 이를 어디에서도 조달할 수 없다는 점이 본 발명을 구현하게 된 동기가 되기도 한다.In the present invention, a photomask must be pre-fabricated in order to manufacture an 8th generation fine metal mask, and the currently produced photomask is suitable for manufacturing a 6.5th generation fine metal mask considering the size of an exposure machine currently operating worldwide. It can be manufactured, but two or more photomasks must be connected in order to manufacture a fine metal mask of the 8th generation size. For this purpose, for example, two photomasks must be precisely aligned, and if the alignment is not done properly, it is impossible to manufacture a fine metal mask of good quality. On the other hand, a single photomask capable of manufacturing an 8th generation fine metal mask has not been produced at all, and the fact that it cannot be procured anywhere is a motivation for implementing the present invention.
8세대 미세 금속 마스크는 기존의 6.5세대 미세 금속 마스크보다 유효부의 길이가 2배 길게 형성된 것이 특징이다. 8세대 미세 금속 마스크의 전체 길이는 2600mm로서, 1500mm의 6.5세대 미세 금속 마스크 전체 길이 대비 1100mm 더 길다. 한편, 미세 금속 마스크 제조를 위한 일 과정인 노광 공정을 수행하기 위한 노광기는 최대 2500mm 길이의 피처리체를 노광할 수 있기 때문에, 6.5세대 미세 금속 마스크의 1회 전체 노광은 가능하나, 8세대 미세 금속 마스크의 1회 전체 노광은 불가능하다. 8세대 미세 금속 마스크를 제작하는데 있어서, 기존의 노광기를 사용할 때, 유효부만의 노광은 가능하나 비유효부를 포함하는 길이에 대해서의 노광은 불가능하다. The 8th generation fine metal mask is characterized in that the effective portion is twice as long as that of the existing 6.5 generation fine metal mask. The overall length of the 8th generation fine metal mask is 2600 mm, which is 1100 mm longer than the total length of the 6.5 generation fine metal mask of 1500 mm. On the other hand, since the exposure machine for performing the exposure process, which is a process for manufacturing a fine metal mask, can expose a target object with a length of up to 2500 mm, one full exposure of the 6.5 generation fine metal mask is possible, but the 8th generation fine metal mask One full exposure of the mask is not possible. In manufacturing the 8th generation fine metal mask, when using an existing exposure machine, exposure of only the effective portion is possible, but exposure of the length including the ineffective portion is impossible.
도 1은 본 발명의 일 실시예에 의한 두개의 개별적 포토 마스크를 합지하고 정렬도를 확보하는 과정을 나타내는 순서도로서, 기존의 노광기를 사용하는 경우를 나타낸 것이며, 도 2는 도 1에 따른 포트 마스크 합지 및 정렬도 확보 후 이를 이용하여 미세 금속 마스크의 표면을 노광하는 과정을 나타내는 순서도이다.1 is a flowchart illustrating a process of laminating two individual photomasks and securing alignment according to an embodiment of the present invention, illustrating a case in which an existing exposure machine is used, and FIG. 2 is a port mask according to FIG. It is a flowchart showing the process of exposing the surface of the fine metal mask using the lamination and alignment degree secured.
도 1은 제작된 복수의 단위 포토 마스크를 합지하는데 있어서 정렬 상태를 확인하기 위한 방법을 제시한 것이다. 도시된 포토 마스크 장착 프레임(170)은 포토 마스크가 거치(장착)되는 영역으로서, 상기 프레임에 의하여 둘러싸인 중앙부분은 관통되어 있으며, 포토 마스크가 안착된 투명한 거치판(172)이 위치하게 된다. 1 shows a method for confirming an alignment state in laminating a plurality of manufactured unit photomasks. The illustrated photomask mounting frame 170 is a region on which a photomask is mounted (mounted), a central portion surrounded by the frame is penetrated, and a transparent mounting plate 172 on which the photomask is mounted is positioned.
상기 거치판(172)은 유리판을 주로 채택한다. 유리판은 내열성을 가지고 있으면서도 투명하기 때문에 노광 과정을 수행하는데 적합하기 때문이다. 다만, 유리판이 아닌 적절한 재질이 대체재로 채택될 수도 있다. The mounting plate 172 mainly adopts a glass plate. This is because the glass plate has heat resistance and is transparent, so it is suitable for performing the exposure process. However, an appropriate material other than the glass plate may be adopted as an alternative material.
아울러, 프레임의 테두리에는 음압이 걸리는 슬릿(slit, 171)이 마련되어 있어 포토 마스크를 거치하면 음압에 의하여 포토 마스크(130)를 프레임에 안착시킬 수 있으며, 따라서 포토 마스크(130)의 안정적인 고정이 가능하다. 위 슬릿(171)은 홀로 대체될 수도 있으며, 음압을 이용할 수 있는 틈새 공간은 어떠한 형태이어도 무방하다.In addition, a slit 171 to which a negative pressure is applied is provided at the edge of the frame, so that when the photomask is mounted, the photomask 130 can be seated on the frame by the negative pressure, and thus the photomask 130 can be stably fixed do. The upper slit 171 may be replaced by a single hole, and the interstitial space that can use the sound pressure may have any shape.
포토 마스크 장착 프레임(170)은 제작된 단위 포토 마스크(130-1, 130-2) 두개가 거치될 수 있는 크기를 갖는다. 그러나, 거치될 수 있는 포토 마스크의 수량은 두 개로 제한되는 것이 아니며, 프레임의 크기나 마스크의 길이에 따라서 더 많은 포토 마스크가 거치될 수도 있다. The photomask mounting frame 170 has a size in which two manufactured unit photomasks 130-1 and 130-2 can be mounted. However, the number of photomasks that can be mounted is not limited to two, and more photomasks may be mounted according to the size of the frame or the length of the mask.
포토 마스크 장착 프레임(170)은 기존의 노광기의 일 구성요소로서, 단일의 포토 마스크를 고정하고, 이를 이용하여 금속 판재(190)를 노광하는 공정에 사용되고 있다. 그러나, 복수의 포토 마스크를 합지 및 거치하고 이들간의 정렬 상태를 확인할 수 있는 기능은 탑재하지 않는다. 전술한 바와 같이, 복수의 포토 마스크를 합지하는 경우 패턴의 정렬이 면밀하게 이루어져야 하기 때문에, 복수의 포토 마스크를 정밀하게 정렬하여야 하며, 정렬 상태를 확인할 수 있는 수단이 별도로 강구되어야 한다. The photomask mounting frame 170 is a component of a conventional exposure machine, and is used in a process of fixing a single photomask and exposing the metal plate 190 using the fixed photomask. However, a function for laminating and mounting a plurality of photomasks and checking the alignment state between them is not mounted. As described above, when a plurality of photomasks are laminated, the pattern must be closely aligned, so the plurality of photomasks must be precisely aligned, and a means for checking the alignment state must be separately devised.
이에, 본 발명에서는 이동형의 포토 마스크 정렬 장치(180)를 노광기에 부가하였으며, 이로써, 합지된 포토 마스크의 정렬상태를 정밀하게 확인할 수 있고, 노광 과정의 수행에 적합한 정렬 상태를 갖는 합지된 포토 마스크의 구현이 가능하게 되었다. 즉, 기존의 노광기의 활용도를 더 높임으로써, 8세대 미세 금속 마스크의 제조에도 기존의 노광기를 활용할 수 있도록 하였다.Accordingly, in the present invention, a movable type photomask alignment device 180 is added to the exposure machine, whereby the alignment state of the laminated photomasks can be precisely checked, and the laminated photomask having an alignment state suitable for performing the exposure process. implementation became possible. That is, by further increasing the utilization of the existing exposure machine, it was possible to utilize the existing exposure machine for the manufacture of the 8th generation fine metal mask.
보다 구체적으로, 상기 포토 마스크를 제작하는 과정은, 포토 마스크 상에 적어도 1개의 정렬 마크(145)를 생성하는 제1단계; 상기 정렬 마크(145)가 생성된 적어도 두 개의 포토 마스크들을 노광기의 포토 마스크 장착 프레임(170)에 1차 정렬하여 장착하는 제2단계; 상기 장착된 포토 마스크간 정렬 마크(145)의 위치를 확인하는 제3단계; 및 확인된 정렬 마크(145)의 위치에 따라서 정렬 상태의 완성 여부를 확정하는 제4단계;를 포함하며, 정렬상태가 미완성된 경우 상기 포토 마스크들을 2차 정렬한 후 상기 제3단계부터 다시 수행하게 된다.More specifically, the process of manufacturing the photomask may include: a first step of generating at least one alignment mark 145 on the photomask; a second step of first aligning and mounting at least two photomasks on which the alignment marks 145 are generated on a photomask mounting frame 170 of an exposure machine; a third step of confirming the positions of the alignment marks 145 between the mounted photomasks; and a fourth step of determining whether the alignment state is complete according to the confirmed position of the alignment mark 145; if the alignment state is not completed, the photomasks are secondarily aligned and then performed again from the third step will do
포토 마스크상에 생성되는 정렬 마크(145)는 바람직하게는 패턴이 형성된 영역을 벗어나서 표기되는 것이 좋다. 따라서 가장 무난한 위치로서는 사각의 포토 마스크 꼭지점 인근의 영역에 설치되는 것이 좋다.The alignment marks 145 generated on the photomask are preferably marked outside the region where the pattern is formed. Therefore, it is preferable that the photomask be installed in the area near the vertex of the rectangular photomask as the most comfortable position.
상기 정렬 마크(145)는 네개의 꼭지점에 모두 생성되어도 좋고, 최소한 장변의 양 단부에 생성되는 것도 바람직하다. 즉, 정렬 마크(145)는 단위 포토 마스크와 인접하는 단위 포토 마스크의 정렬 상태를 확인할 수 있도록 적합한 위치에 표기되는 것이 가장 바람직하다.The alignment marks 145 may be formed at all four vertices, or at least at both ends of the long side. That is, it is most preferable that the alignment mark 145 is marked at a suitable position so that the alignment state of the unit photomask and the adjacent unit photomask can be checked.
정렬 마크(145)는 동일한 규격을 갖는 정렬 대상 포토 마스크의 동일한 좌표에 형성됨으로써, 정렬 상태의 확인을 규칙화할 수 있다. 포토 마스크간 정렬 상태의 확인이 완료되면 그대로 정렬 상태를 확정하여 다음 과정인 노광 과정으로 연결될 수 있도록 하며, 만일 정렬 상태가 미진하다고 판단되면 다시 정렬하여 재차 정렬 상태를 확인하도록 할 수 있다. 정렬 상태의 확인은 정렬 상태가 확정될 때까지 계속하여 수행될 수 있다. 상기 정렬상태의 완성여부는 각 포토 마스크에 형성된 정렬 마크와 정렬 기준부의 일치여부로부터 인정될 수 있다.The alignment marks 145 are formed at the same coordinates of an alignment target photomask having the same standard, so that the alignment state can be checked regularly. When the check of the alignment state between the photomasks is completed, the alignment state is confirmed as it is so that it can be connected to the exposure process, which is the next process. Checking the alignment status may be continuously performed until the alignment status is confirmed. The completion of the alignment state may be recognized from whether the alignment mark formed on each photomask matches the alignment reference unit.
정렬 상태의 확인은 노광기와는 별도로 구성되는 포토 마스크 정렬 장치(l80)에 의하여 수행된다. 본 시스템은 정렬 기준점(182)이 적어도 두 개 형성되며, 상기 정렬 기준점(182)은 정렬 마크(145)와 중첩되도록 위치되는 정렬 기준부(181); 및 상기 정렬 기준부(181)와 정렬 마크(145)의 중첩 상태를 촬영할 수 있는 위치에 장착되는 촬영 장치(183);를 포함한다. 다만, 상기 정렬 기준점(182) 중 적어도 하나는 복수의 포토 마스크 중 제1포토 마스크에 형성된 정렬 마크(145)에 중첩되고, 나머지는 제1포토 마스크에 인접하여 정렬된 제2포토 마스크에 형성된 정렬 마크(145)에 중첩된다. Confirmation of the alignment state is performed by the photomask alignment device 80 configured separately from the exposure machine. In the present system, at least two alignment reference points 182 are formed, and the alignment reference points 182 include an alignment reference unit 181 positioned to overlap the alignment mark 145; and a photographing device 183 mounted at a position capable of photographing the overlapping state of the alignment reference unit 181 and the alignment mark 145 . However, at least one of the alignment reference points 182 overlaps the alignment mark 145 formed on the first photomask among the plurality of photomasks, and the rest are aligned on the second photomask aligned adjacent to the first photomask. superimposed on mark 145 .
도시된 형태는 제1포토 마스크와 제2포토 마스크의 서로 인접되는 꼭지점 영역에 하나씩의 정렬 마크(145)가 형성된 형태를 나타낸다. 다만, 전술한 바와 같이 정렬 확인을 정밀하게 수행할 수 있다면 정렬 마크(145)의 갯수는 특별히 한정되는 것은 아니다. The illustrated shape shows a shape in which one alignment mark 145 is formed in the vertex regions adjacent to each other of the first photomask and the second photomask. However, the number of alignment marks 145 is not particularly limited as long as the alignment check can be precisely performed as described above.
정렬 기준부(181)는 투명체로 형성될 수 있다. 예를 들어 투명 기준부는 반투명을 이루도록 함으로써, 촬영시 빛의 반사에 의한 영향을 경감할 수 있다. 따라서, 정렬 기준점(182)과 정렬 마크(145)의 중첩상태는 육안으로도 확인할 수 있다. 아울러, 정렬 마크(145)는 포토 마스크의 윗면 또는 아랫면에 형성되며 정렬 마크(145)의 형성면은 어느 하나의 면으로 제한되는 것이 아님은 자명하다.The alignment reference unit 181 may be formed of a transparent material. For example, by making the transparent reference unit semi-transparent, the effect of light reflection during photographing can be reduced. Accordingly, the overlapping state of the alignment reference point 182 and the alignment mark 145 can be confirmed with the naked eye. In addition, it is obvious that the alignment mark 145 is formed on the upper or lower surface of the photomask, and the formation surface of the alignment mark 145 is not limited to any one surface.
상기 포토 마스크 정렬 장치(180)는 포토 마스크의 상부에 위치하거나 하부에 위치할 수 있다. 즉, 포토 마스크가 거치된 거치부가 투명한 유리이기 때문에 포토 마스크의 하부에서도 정렬 상태를 확인할 수도 있다. The photomask alignment apparatus 180 may be located above or below the photomask. That is, since the mounting portion on which the photomask is mounted is made of transparent glass, it is possible to check the alignment state even under the photomask.
포토 마스크는 프레임(170) 상의 기준위치에 거치되는 것이 바람직하며, 정렬 장치(180) 또한 프레임(170) 상의 기준위치까지 이동하여 포토 마스크의 정렬 상태를 확인할 수 있다. 이와 같이 포토 마스크의 거치 위치와 정렬 장치(180)의 이동 위치에 대한 기준점이 설정되어야 빠른 시간에 포토 마스크(130) 정렬 상태를 용이하고 정밀하게 확인 및 확정할 수 있게 된다. The photomask is preferably mounted at a reference position on the frame 170 , and the alignment device 180 also moves to the reference position on the frame 170 to check the alignment state of the photomask. In this way, when the reference point for the mounting position of the photomask and the moving position of the alignment device 180 is set, the alignment state of the photomask 130 can be easily and precisely confirmed and confirmed in a short time.
정렬 상태의 확인은 촬영장치(183)가 수행하며, 촬영장치(183)에 의하여 촬영된 정렬 상태는 유무선 통신 수단에 의하여 제어부(미도시)로 전달되어 상기 제어부에서 정렬 상태를 확인한 후, 정렬 상태의 확정 여부를 결정하게 된다. 정렬 상태의 확인 결과 재정렬의 필요성이 있으면, 이는 다시 정렬 장치에 전달되어 해당 과정을 수행하도록 한다. The alignment state is checked by the photographing device 183, and the alignment state photographed by the photographing apparatus 183 is transmitted to a control unit (not shown) by wired/wireless communication means, and after checking the alignment state in the control unit, the alignment state decides whether to confirm or not. As a result of checking the alignment state, if there is a need for realignment, this is transmitted to the alignment device again to perform the corresponding process.
상기 포토 마스크 정렬 장치(180)는 방향의 제한없이 또는 방향을 제한하여 이동가능하게 구성될 수 있다.The photomask aligning apparatus 180 may be configured to be movable without or limiting the direction.
아울러, 상기 촬영 장치(183)는 상기 정렬 기준점(182)의 갯수만큼 구비되는 것이 바람직하나, 하나의 이동 가능한 촬영 장치(183)가 이동하면서 정렬 상태를 확인하도록 구성될 수도 있음은 물론이다.In addition, the photographing device 183 is preferably provided as many as the number of the alignment reference points 182 , but of course, one movable photographing device 183 may be configured to check the alignment state while moving.
도 2는 합지된 포토 마스크(130)의 정렬 상태가 확정되고 난 후, 상기 포토 마스크(130)를 이용하여 금속 판재(190)에 노광을 실시하는 과정을 나타낸 것이다. 여기서, 각 단위 포토 마스크(130-1, 130-2)간의 정렬상태는 흡착부(171)의 흡착력이 지속적으로 가동됨으로써 유지될 수 있다. 다만, 다른 방법 즉, 접합, 접착 등의 방법을 사용함으로써도 가능할 것이다.FIG. 2 illustrates a process of exposing the metal plate 190 using the photomask 130 after the alignment state of the laminated photomask 130 is confirmed. Here, the alignment state between the unit photomasks 130 - 1 and 130 - 2 may be maintained by continuously operating the adsorption force of the adsorption unit 171 . However, it may be possible by using other methods, such as bonding, bonding, and the like.
노광 과정이 시작되면 포토 마스크 정렬 시스템(180)은 이동하고, 금속 판재(190) 양면에서 대칭을 이루는 한 쌍의 포토 마스크(130)가 금속 판재(190)와 접하도록 이동된 후, 금속 판재(190)의 양면에 대하여 노광을 실시한다. 노광 및 현상 등의 과정은 공지의 과정이므로 구체적인 설명은 생략하기로 한다. When the exposure process starts, the photomask alignment system 180 moves, and a pair of photomasks 130 symmetrical on both sides of the metal plate 190 are moved to come into contact with the metal plate 190, and then the metal plate ( 190) is exposed on both sides. Since processes such as exposure and development are known processes, a detailed description thereof will be omitted.
상기한 실시예는 그 설명을 위한 것이며, 그 제한을 위한 것이 아님을 주의하여야 한다. 또한, 본 발명의 기술분야의 통상의 전문가라면 본 발명의 기술사상의 범위에서 다양한 실시예가 가능함을 이해할 수 있을 것이다.It should be noted that the above-described embodiment is for illustrative purposes only, and not for its limitation. In addition, those skilled in the art will understand that various embodiments are possible within the scope of the technical idea of the present invention.

Claims (4)

  1. 정렬 기준점이 적어도 두 개 형성되며, 상기 정렬 기준점은 정렬 마크와 중첩되도록 위치되는 정렬 기준부; 및 At least two alignment reference points are formed, the alignment reference point is an alignment reference portion positioned to overlap the alignment mark; and
    상기 정렬 기준부와 정렬 마크의 중첩 상태를 촬영할 수 있는 위치에 장착되는 촬영 장치;를 포함하되, A photographing device mounted at a position capable of photographing the overlapping state of the alignment reference unit and the alignment mark;
    상기 정렬 기준점 중 적어도 하나는 복수의 포토 마스크 중 제1포토 마스크에 형성된 정렬 마크에 중첩되고, 나머지는 제1포토 마스크에 인접하여 정렬된 제2포토 마스크에 형성된 정렬 마크에 중첩되는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치.At least one of the alignment reference points overlaps the alignment mark formed on the first photomask among the plurality of photomasks, and the rest overlaps the alignment mark formed on the second photomask aligned adjacent to the first photomask. A plurality of photomask alignment devices for manufacturing fine metal masks for large-area displays.
  2. 제1항에 있어서,According to claim 1,
    상기 정렬 시스템은 상기 포토 마스크의 상부 또는 하부에 위치되며, 이동가능하게 구성되는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치.The alignment system is positioned above or below the photomask, and is configured to be movable.
  3. 제1항에 있어서,According to claim 1,
    상기 촬영 장치는 상기 정렬 기준점의 갯수만큼 구비되는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치.A plurality of photomask alignment apparatus for manufacturing a fine metal mask for a large-area display, characterized in that the photographing apparatus is provided as much as the number of alignment reference points.
  4. 제1항의 정렬장치에 의하여 수행되며, It is performed by the alignment device of claim 1,
    포토 마스크 상에 적어도 1개의 정렬 마크를 생성하는 제1단계; a first step of creating at least one alignment mark on the photo mask;
    상기 정렬 마크가 생성된 적어도 두 개의 포토 마스크들을 노광기의 포토 마스크 장착 프레임에 1차 정렬하여 장착하는 제2단계; a second step of first aligning and mounting the at least two photomasks on which the alignment marks are generated on a photomask mounting frame of an exposure machine;
    상기 장착된 포토 마스크간 정렬 마크의 위치를 확인하는 제3단계; 및 a third step of confirming the positions of the alignment marks between the mounted photomasks; and
    확인된 정렬 마크의 위치에 따라서 정렬 상태의 완성 여부를 확정하는 제4단계;를 포함하고, A fourth step of determining whether the alignment state is completed according to the confirmed position of the alignment mark;
    상기 정렬상태의 완성여부는 각 포토 마스크에 형성된 정렬 마크와 정렬 기준부의 일치여부로부터 인정되며, 정렬상태가 미완성된 경우 상기 포토 마스크들을 2차 정렬한 후 상기 제3단계부터 다시 수행하는 것을 특징으로 하는 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬방법.Completion of the alignment state is recognized from whether the alignment mark formed on each photomask matches the alignment reference unit, and if the alignment state is not completed, the photomasks are secondarily aligned and then performed again from the third step. A method of aligning a plurality of photomasks for manufacturing a fine metal mask for a large-area display.
PCT/KR2022/000953 2021-02-01 2022-01-19 Apparatus and method for aligning plurality of photomasks for manufacturing fine metal mask for large display WO2022164113A1 (en)

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KR970076093A (en) * 1996-05-06 1997-12-10 김광호 Positioning of registration mark of photomask and exposure method using it
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