WO2022164113A1 - Appareil et procédé pour aligner une pluralité de photomasques pour fabriquer un masque métallique fin pour un grand écran - Google Patents

Appareil et procédé pour aligner une pluralité de photomasques pour fabriquer un masque métallique fin pour un grand écran Download PDF

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Publication number
WO2022164113A1
WO2022164113A1 PCT/KR2022/000953 KR2022000953W WO2022164113A1 WO 2022164113 A1 WO2022164113 A1 WO 2022164113A1 KR 2022000953 W KR2022000953 W KR 2022000953W WO 2022164113 A1 WO2022164113 A1 WO 2022164113A1
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WO
WIPO (PCT)
Prior art keywords
alignment
photomask
photomasks
fine metal
metal mask
Prior art date
Application number
PCT/KR2022/000953
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English (en)
Korean (ko)
Inventor
유명훈
김재범
한덕기
Original Assignee
풍원정밀㈜
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 풍원정밀㈜ filed Critical 풍원정밀㈜
Priority to CN202280009075.9A priority Critical patent/CN116762492A/zh
Publication of WO2022164113A1 publication Critical patent/WO2022164113A1/fr

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Definitions

  • the present invention relates to a plurality of photomask alignment apparatus and alignment method for manufacturing a fine metal mask for a large-area display, and more particularly, to easily manufacture a fine metal mask for manufacturing an 8th generation large-area display.
  • a plurality of photomask raw materials or a plurality of photomasks are connected and used to manufacture a fine metal mask having an extended effective portion of the 8th generation. Accordingly, it is possible to increase production efficiency in manufacturing a fine metal mask having an effective portion extended in length compared to a fine metal mask for manufacturing a 6.5 generation display, and to utilize the existing exposure equipment for manufacturing a fine metal mask for the 6.5 generation as it is. can
  • a key component for depositing OLED devices on a display panel is a fine metal mask, and it is difficult to keep up with the trend of large-area display panels with the existing 6.5G OLED pixel deposition fine metal mask. is laid Therefore, there is a need to develop a fine metal mask for deposition of 8th generation OLED pixels (hereinafter abbreviated as “8th generation mask”).
  • the fine metal mask is composed of an effective portion, which is an area where a pattern is formed so that pixels are deposited, and grip portions formed at both ends of the effective portion to serve as a mask fixing in order to seat the fine metal mask on the panel in the process of depositing the pixels.
  • the length of the effective part of the 6.5th generation mask is 1100mm, whereas the length of the effective part of the 8th generation mask is 2200mm.
  • the length of the grip part it is 2600mm, which is a conventional exposure machine that can expose up to a length of 2400mm. There is a problem in that it is difficult to produce a generation mask.
  • the photomask used to manufacture the 8th generation mask is a type of laminating two or more numbers, so the continuity or consistency of alignment between the two photomasks in the process of laminating two pre-processed photomasks, respectively. There is a high possibility that this cannot be ensured, and when continuity or consistency of alignment is not ensured in this way, pixel defects may occur in the process of forming pixels, and the resolution of the display may deteriorate due to the defective pixels. Therefore, the development of a new process technology for manufacturing the 8th generation mask is desired.
  • the present invention has been devised to solve the problems of the prior art, and the present invention aims to manufacture a fine metal mask for manufacturing an 8th generation large-area display having a high degree of alignment by aligning a plurality of photo masks with high accuracy. do it with
  • the present invention provides a new photomask alignment device and alignment method so that the existing exposure machine can be used as it is, thereby eliminating the need for developing a new exposure machine when manufacturing a fine metal mask for manufacturing an 8th generation large-area display, and eliminating the need for a conventional exposure machine It serves another purpose to maximize utilization.
  • Another object of the present invention is to configure a simple alignment inspection apparatus to precisely align photo masks on an existing exposure machine in aligning a plurality of photo masks.
  • the alignment reference point is an alignment reference portion positioned so as to overlap the alignment mark; and a photographing device mounted at a position capable of photographing the overlapping state of the alignment reference unit and the alignment mark, wherein at least one of the alignment reference points overlaps the alignment mark formed on the first photomask among the plurality of photomasks,
  • a plurality of photomask alignment apparatuses for manufacturing a fine metal mask for a large area display, wherein the remainder overlaps the alignment marks formed on the second photomask aligned adjacent to the first photomask.
  • the alignment system may be positioned above or below the photomask and may be configured to be movable.
  • the photographing device is provided as many as the number of the alignment reference points.
  • the present invention is performed by the above-described alignment device, the first step of generating at least one alignment mark on the photo mask; a second step of first aligning and mounting the at least two photomasks on which the alignment marks are generated on a photomask mounting frame of an exposure machine; a third step of confirming the positions of the alignment marks between the mounted photomasks; and a fourth step of determining whether the alignment state is completed according to the position of the identified alignment mark, wherein the completion of the alignment state is recognized from whether the alignment mark formed on each photomask matches the alignment reference unit, and the alignment Provided is a method for aligning a plurality of photomasks for manufacturing a fine metal mask for a large area display, wherein the third step is performed again after secondary alignment of the photomasks when the state is not completed.
  • the present invention has been devised to solve the problems of the prior art, and the present invention is expected to have a high degree of alignment by aligning a plurality of photomasks with high accuracy.
  • the present invention provides a new photomask alignment device and alignment method so that the existing exposure machine can be used as it is, thereby eliminating the need for developing a new exposure machine when manufacturing a fine metal mask for manufacturing an 8th generation large-area display, and eliminating the need for a conventional exposure machine The effect is expected to maximize the usability.
  • the present invention configures a simple alignment inspection apparatus in aligning a plurality of photomasks and utilizes it on an existing exposure machine, so that the effect of allowing the photomasks to be precisely aligned by a convenient and simple method is expected. do.
  • FIG. 1 is a flowchart illustrating a process of laminating two individual photomasks and securing alignment according to an embodiment of the present invention, and shows a case in which an existing exposure machine is used.
  • FIG. 2 is a flowchart illustrating a process of exposing the surface of a fine metal mask by using the port mask lamination and alignment diagram according to FIG. 1 , and then using the same.
  • ... unit and “... group” described in the specification mean a unit for processing at least one function or operation.
  • a photomask must be pre-fabricated in order to manufacture an 8th generation fine metal mask, and the currently produced photomask is suitable for manufacturing a 6.5th generation fine metal mask considering the size of an exposure machine currently operating worldwide. It can be manufactured, but two or more photomasks must be connected in order to manufacture a fine metal mask of the 8th generation size. For this purpose, for example, two photomasks must be precisely aligned, and if the alignment is not done properly, it is impossible to manufacture a fine metal mask of good quality. On the other hand, a single photomask capable of manufacturing an 8th generation fine metal mask has not been produced at all, and the fact that it cannot be procured anywhere is a motivation for implementing the present invention.
  • the 8th generation fine metal mask is characterized in that the effective portion is twice as long as that of the existing 6.5 generation fine metal mask.
  • the overall length of the 8th generation fine metal mask is 2600 mm, which is 1100 mm longer than the total length of the 6.5 generation fine metal mask of 1500 mm.
  • the exposure machine for performing the exposure process which is a process for manufacturing a fine metal mask, can expose a target object with a length of up to 2500 mm, one full exposure of the 6.5 generation fine metal mask is possible, but the 8th generation fine metal mask One full exposure of the mask is not possible.
  • manufacturing the 8th generation fine metal mask when using an existing exposure machine, exposure of only the effective portion is possible, but exposure of the length including the ineffective portion is impossible.
  • FIG. 1 is a flowchart illustrating a process of laminating two individual photomasks and securing alignment according to an embodiment of the present invention, illustrating a case in which an existing exposure machine is used
  • FIG. 2 is a port mask according to FIG. It is a flowchart showing the process of exposing the surface of the fine metal mask using the lamination and alignment degree secured.
  • the illustrated photomask mounting frame 170 is a region on which a photomask is mounted (mounted), a central portion surrounded by the frame is penetrated, and a transparent mounting plate 172 on which the photomask is mounted is positioned.
  • the mounting plate 172 mainly adopts a glass plate. This is because the glass plate has heat resistance and is transparent, so it is suitable for performing the exposure process. However, an appropriate material other than the glass plate may be adopted as an alternative material.
  • a slit 171 to which a negative pressure is applied is provided at the edge of the frame, so that when the photomask is mounted, the photomask 130 can be seated on the frame by the negative pressure, and thus the photomask 130 can be stably fixed do.
  • the upper slit 171 may be replaced by a single hole, and the interstitial space that can use the sound pressure may have any shape.
  • the photomask mounting frame 170 has a size in which two manufactured unit photomasks 130-1 and 130-2 can be mounted.
  • the number of photomasks that can be mounted is not limited to two, and more photomasks may be mounted according to the size of the frame or the length of the mask.
  • the photomask mounting frame 170 is a component of a conventional exposure machine, and is used in a process of fixing a single photomask and exposing the metal plate 190 using the fixed photomask. However, a function for laminating and mounting a plurality of photomasks and checking the alignment state between them is not mounted. As described above, when a plurality of photomasks are laminated, the pattern must be closely aligned, so the plurality of photomasks must be precisely aligned, and a means for checking the alignment state must be separately devised.
  • a movable type photomask alignment device 180 is added to the exposure machine, whereby the alignment state of the laminated photomasks can be precisely checked, and the laminated photomask having an alignment state suitable for performing the exposure process. implementation became possible. That is, by further increasing the utilization of the existing exposure machine, it was possible to utilize the existing exposure machine for the manufacture of the 8th generation fine metal mask.
  • the process of manufacturing the photomask may include: a first step of generating at least one alignment mark 145 on the photomask; a second step of first aligning and mounting at least two photomasks on which the alignment marks 145 are generated on a photomask mounting frame 170 of an exposure machine; a third step of confirming the positions of the alignment marks 145 between the mounted photomasks; and a fourth step of determining whether the alignment state is complete according to the confirmed position of the alignment mark 145; if the alignment state is not completed, the photomasks are secondarily aligned and then performed again from the third step will do
  • the alignment marks 145 generated on the photomask are preferably marked outside the region where the pattern is formed. Therefore, it is preferable that the photomask be installed in the area near the vertex of the rectangular photomask as the most comfortable position.
  • the alignment marks 145 may be formed at all four vertices, or at least at both ends of the long side. That is, it is most preferable that the alignment mark 145 is marked at a suitable position so that the alignment state of the unit photomask and the adjacent unit photomask can be checked.
  • the alignment marks 145 are formed at the same coordinates of an alignment target photomask having the same standard, so that the alignment state can be checked regularly.
  • the alignment state is confirmed as it is so that it can be connected to the exposure process, which is the next process.
  • Checking the alignment status may be continuously performed until the alignment status is confirmed.
  • the completion of the alignment state may be recognized from whether the alignment mark formed on each photomask matches the alignment reference unit.
  • the alignment reference points 182 include an alignment reference unit 181 positioned to overlap the alignment mark 145; and a photographing device 183 mounted at a position capable of photographing the overlapping state of the alignment reference unit 181 and the alignment mark 145 .
  • the alignment reference points 182 overlaps the alignment mark 145 formed on the first photomask among the plurality of photomasks, and the rest are aligned on the second photomask aligned adjacent to the first photomask. superimposed on mark 145 .
  • the illustrated shape shows a shape in which one alignment mark 145 is formed in the vertex regions adjacent to each other of the first photomask and the second photomask.
  • the number of alignment marks 145 is not particularly limited as long as the alignment check can be precisely performed as described above.
  • the alignment reference unit 181 may be formed of a transparent material. For example, by making the transparent reference unit semi-transparent, the effect of light reflection during photographing can be reduced. Accordingly, the overlapping state of the alignment reference point 182 and the alignment mark 145 can be confirmed with the naked eye.
  • the alignment mark 145 is formed on the upper or lower surface of the photomask, and the formation surface of the alignment mark 145 is not limited to any one surface.
  • the photomask alignment apparatus 180 may be located above or below the photomask. That is, since the mounting portion on which the photomask is mounted is made of transparent glass, it is possible to check the alignment state even under the photomask.
  • the photomask is preferably mounted at a reference position on the frame 170 , and the alignment device 180 also moves to the reference position on the frame 170 to check the alignment state of the photomask. In this way, when the reference point for the mounting position of the photomask and the moving position of the alignment device 180 is set, the alignment state of the photomask 130 can be easily and precisely confirmed and confirmed in a short time.
  • the alignment state is checked by the photographing device 183, and the alignment state photographed by the photographing apparatus 183 is transmitted to a control unit (not shown) by wired/wireless communication means, and after checking the alignment state in the control unit, the alignment state decides whether to confirm or not. As a result of checking the alignment state, if there is a need for realignment, this is transmitted to the alignment device again to perform the corresponding process.
  • the photomask aligning apparatus 180 may be configured to be movable without or limiting the direction.
  • the photographing device 183 is preferably provided as many as the number of the alignment reference points 182 , but of course, one movable photographing device 183 may be configured to check the alignment state while moving.
  • FIG. 2 illustrates a process of exposing the metal plate 190 using the photomask 130 after the alignment state of the laminated photomask 130 is confirmed.
  • the alignment state between the unit photomasks 130 - 1 and 130 - 2 may be maintained by continuously operating the adsorption force of the adsorption unit 171 .
  • the photomask alignment system 180 moves, and a pair of photomasks 130 symmetrical on both sides of the metal plate 190 are moved to come into contact with the metal plate 190, and then the metal plate ( 190) is exposed on both sides. Since processes such as exposure and development are known processes, a detailed description thereof will be omitted.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

La présente invention concerne un appareil et un procédé permettant d'aligner une pluralité de photomasques pour fabriquer un masque métallique fin pour un grand écran. Plus spécifiquement, l'invention concerne un appareil permettant d'aligner une pluralité de photomasques pour fabriquer un masque métallique fin pour un grand écran, l'appareil étant caractérisé en ce qu'il comprend : une partie de référence d'alignement comportant au moins deux points de référence d'alignement qui sont positionnés de façon à chevaucher des repères d'alignement ; et un dispositif de capture d'image monté au niveau d'une position à laquelle le dispositif de capture d'image peut capturer une image de l'état de chevauchement de la partie de référence d'alignement et des repères d'alignement. Un ou plusieurs des points de référence d'alignement chevauchent les repères d'alignement formés sur un premier photomasque parmi la pluralité de photomasques, et les points de référence d'alignement restants chevauchent les repères d'alignement formés sur un second photomasque aligné de manière à être adjacent au premier photomasque.
PCT/KR2022/000953 2021-02-01 2022-01-19 Appareil et procédé pour aligner une pluralité de photomasques pour fabriquer un masque métallique fin pour un grand écran WO2022164113A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202280009075.9A CN116762492A (zh) 2021-02-01 2022-01-19 用于制造大面积显示器用精细金属掩模的多个光掩模对准装置及对准方法

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KR10-2021-0014412 2021-02-01
KR1020210014412A KR102289723B1 (ko) 2021-02-01 2021-02-01 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치 및 정렬방법

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Publication number Priority date Publication date Assignee Title
KR102289723B1 (ko) * 2021-02-01 2021-08-17 풍원정밀(주) 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치 및 정렬방법

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR960024644A (ko) * 1994-12-29 1996-07-20 윤종용 노광기용 마스크 정렬장치
KR970076093A (ko) * 1996-05-06 1997-12-10 김광호 포토 마스크의 정합 마크 배치 및 이를 이용한 노광 방법
US20050012914A1 (en) * 2002-01-28 2005-01-20 Lin Burn J. Multiple mask step and scan aligner
WO2016112636A1 (fr) * 2015-01-15 2016-07-21 京东方科技集团股份有限公司 Plaque de masque et son procédé de préparation, et procédé de durcissement de produit d'étanchéité dans un panneau d'affichage
US20160334674A1 (en) * 2015-05-15 2016-11-17 Boe Technology Group Co., Ltd. Alignment Exposure Method and Method of Fabricating Display Substrate
KR102289723B1 (ko) * 2021-02-01 2021-08-17 풍원정밀(주) 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치 및 정렬방법

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR960024644A (ko) * 1994-12-29 1996-07-20 윤종용 노광기용 마스크 정렬장치
KR970076093A (ko) * 1996-05-06 1997-12-10 김광호 포토 마스크의 정합 마크 배치 및 이를 이용한 노광 방법
US20050012914A1 (en) * 2002-01-28 2005-01-20 Lin Burn J. Multiple mask step and scan aligner
WO2016112636A1 (fr) * 2015-01-15 2016-07-21 京东方科技集团股份有限公司 Plaque de masque et son procédé de préparation, et procédé de durcissement de produit d'étanchéité dans un panneau d'affichage
US20160334674A1 (en) * 2015-05-15 2016-11-17 Boe Technology Group Co., Ltd. Alignment Exposure Method and Method of Fabricating Display Substrate
KR102289723B1 (ko) * 2021-02-01 2021-08-17 풍원정밀(주) 대면적 디스플레이용 미세 금속 마스크 제작을 위한 복수의 포토 마스크 정렬장치 및 정렬방법

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KR102289723B1 (ko) 2021-08-17
CN116762492A (zh) 2023-09-15

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