WO2021181511A1 - 波長変換レーザ装置および波長変換レーザ加工機 - Google Patents

波長変換レーザ装置および波長変換レーザ加工機 Download PDF

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Publication number
WO2021181511A1
WO2021181511A1 PCT/JP2020/010211 JP2020010211W WO2021181511A1 WO 2021181511 A1 WO2021181511 A1 WO 2021181511A1 JP 2020010211 W JP2020010211 W JP 2020010211W WO 2021181511 A1 WO2021181511 A1 WO 2021181511A1
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Prior art keywords
laser beam
laser
harmonic
wavelength conversion
pulse frequency
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PCT/JP2020/010211
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English (en)
French (fr)
Japanese (ja)
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望 平山
秀則 深堀
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三菱電機株式会社
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Priority to PCT/JP2020/010211 priority Critical patent/WO2021181511A1/ja
Priority to CN202080098088.9A priority patent/CN115210973B/zh
Priority to JP2020552927A priority patent/JP6808114B1/ja
Priority to KR1020227030085A priority patent/KR102528248B1/ko
Priority to TW110105904A priority patent/TWI761081B/zh
Publication of WO2021181511A1 publication Critical patent/WO2021181511A1/ja

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/1307—Stabilisation of the phase
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude

Definitions

  • This disclosure relates to a wavelength conversion laser device and a wavelength conversion laser processing machine that convert laser light into different wavelengths using a non-linear medium.
  • a wavelength conversion laser device that emits a laser beam having a wavelength different from the wavelength of the incident laser beam by incidenting the laser beam into a non-linear medium.
  • This wavelength conversion laser device generates a second harmonic having half the wavelength of the fundamental wave by incidenting the laser beam, which is the fundamental wave, into the first nonlinear medium, and further generates the fundamental wave and the second harmonic.
  • a third harmonic having a wavelength of one-third of the fundamental wave is generated.
  • a solid nonlinear medium for wavelength conversion is called a wavelength conversion crystal.
  • strong wavelength conversion occurs when the sum of the wave vector of the laser light before wavelength conversion and the wave vector of the laser light after wavelength conversion match. In the generation of the third harmonic, the strongest third harmonic is obtained when the following equation is satisfied.
  • the direction of the wave vector is the direction perpendicular to the equiphase plane of the laser beam, and is usually the traveling direction of the laser beam.
  • the magnitude of the wave vector is expressed by the following equation.
  • K is the magnitude of the wave vector
  • n is the refractive index of the non-linear medium
  • ⁇ is the wavelength of the laser beam. Since the refractive index n of the nonlinear medium depends on the temperature of the nonlinear medium, the wave vector changes depending on the temperature of the nonlinear medium. Therefore, it is necessary to control the temperature of the nonlinear medium in order to satisfy the phase matching condition.
  • the wavelength conversion laser device is used as a light source for microfabrication.
  • the pulse frequency of the laser beam may be changed during processing, and if the pulse frequency of the fundamental wave is changed, the pulse frequency of the third harmonic also changes.
  • the conversion efficiency of wavelength conversion depends on the pulse energy of the laser beam incident on the nonlinear medium. When the average output of the fundamental wave is constant, increasing the pulse frequency lowers the pulse energy contained in one pulse, so that the average output of the laser beam after wavelength conversion becomes lower.
  • the optical components that make up the laser device and the holder that fixes the optical components absorb the laser light and generate heat, and this heat generation may change the optical axis of the laser light.
  • a laser device using an angle-adjustable holder equipped with an actuator is disclosed in order to suppress a change in the optical axis of the laser beam.
  • the non-linear medium absorbs laser light
  • changing the pulse frequency of the laser light changes the average output after wavelength conversion, and the amount of heat absorbed by the non-linear medium changes, so the temperature of the non-linear medium changes.
  • the temperature of the nonlinear medium changes
  • the refractive index of the nonlinear medium changes with the temperature change, and the wave vector changes.
  • the traveling direction of the laser beam satisfying the phase matching condition changes, and the emission angle of the laser beam emitted from the non-linear medium changes. Since the change in the emission angle of the laser beam emitted from the non-linear medium depends on the temperature change of the non-linear medium, it takes several seconds to several tens of seconds instead of an instantaneous change.
  • one angle-adjustable holder cannot be used.
  • one or more angle-adjustable holders are required, which leads to an increase in size and cost of the laser device.
  • This disclosure was made in order to solve the above-mentioned problems, and it is possible to respond to a change in the output of the laser light after wavelength conversion by changing the pulse frequency of the laser light, and to adjust the optical axis of one axis. It is an object of the present invention to obtain a wavelength conversion laser apparatus capable of suppressing a change in the optical axis of laser light only by a mechanism.
  • the wavelength conversion laser apparatus includes a pulse laser light source that generates the first laser light, a pulse frequency control means that controls the pulse frequency of the first laser light that the pulse laser light source oscillates, and a first laser light.
  • a non-linear medium that partially converts the wavelength to the second laser light, a condensing lens that condenses the first laser light, a collimating lens that adjusts the spread angle of the second laser light, and a second that has passed through the collimating lens. It is provided with a parallel flat plate that is transmitted and emitted when the two laser lights are incident, and an angle adjusting mechanism that controls the incident angle of the second laser light that is incident on the parallel flat plate.
  • This disclosure converts the change in the emission angle of the laser beam emitted from the non-linear medium generated by the temperature change of the non-linear medium into the translation of the optical axis by the collimating lens. Further, the optical axis of the laser beam that has moved in parallel is corrected by the optical axis movement of the parallel flat plate whose angle is adjusted by the angle adjusting mechanism. As a result, even if the pulse frequency of the pulse laser light source is changed by the pulse frequency control means, the amount of movement of the optical axis of the laser light emitted from the non-linear medium can be suppressed.
  • FIG. 1 is a configuration diagram of a wavelength conversion laser apparatus showing the first embodiment of this disclosure.
  • the wavelength conversion laser device 50 shown in FIG. 1 includes a pulse laser light source 1, a pulse frequency control means 2, a condensing lens 4, a second harmonic generation crystal 5 which is a non-linear medium, a condensing lens 7, and non-linearity. It includes a third harmonic generation crystal 8 which is a medium, a collimating lens 10, a parallel flat plate 13, and an angle adjusting mechanism 14 for the parallel flat plate.
  • the pulse laser light source 1 outputs a laser beam 3 which is a fundamental wave which is a first laser beam.
  • the pulse frequency of the pulse laser light source 1 that oscillates in a pulse can be changed by the pulse frequency control means 2.
  • the laser beam 3 output from the pulsed laser light source 1 is in a single mode.
  • FIG. 2 is a configuration diagram of a pulsed laser light source showing the first embodiment of this disclosure.
  • the pulse laser light source 1 shown in FIG. 2 is a Q-switched laser.
  • the pulse laser light source 1 includes a high reflection mirror 101 that totally reflects the laser light 110, and a partial reflection mirror 102 that reflects a part of the laser light 110 and transmits the rest.
  • a laser medium 103, an excitation light coupling mirror 104, and an acoustic optical element 105 are arranged between the high reflection mirror 101 and the partial reflection mirror 102.
  • the excitation light 108 generated by the light source 106 which is a semiconductor laser, and output through the optical fiber 107 irradiates the laser medium 103 through the excitation optical system 109 and the excitation light coupling mirror 104.
  • the laser medium 103 absorbs the excitation light 108 and generates naturally emitted light which is the wavelength of the fundamental wave.
  • the naturally emitted light reciprocates between the high-reflection mirror 101 and the partial-reflection mirror 102, and oscillates by amplifying the light as it passes through the laser medium 103.
  • the laser beam 110 having a wavelength is generated.
  • the wavelength of the light source 106 is 808 nm, 879 nm, or 888 nm, and the wavelength of the laser beam 3 is 1064 nm.
  • the laser medium 103 is a solid laser medium in which rare earth elements and titanium are added to crystals, glass, or ceramics.
  • the laser crystals constituting the laser medium 103 are YAG (Yttrium aluminum Garnet), YVO4 (Yttrium Vanadate), GdVO4 (Gadolinium Vanadate), sapphire (Al2O3), KGW (potassium gadolinium tungsten), or KYW (potassium gadolinium tungsten).
  • Rare earth elements are Nd (neodymium), Yb (ytterbium), Er (erbium), Ho (holmium), Tm (thulium), or Pr (praseodymium).
  • the acoustic optical element 105 receives the RF signal output by the RF driver 112, and changes the optical axis of the laser beam 110 when the RF signal is input and when the RF signal is not input. Since the laser beam 110 whose optical axis has changed by turning on the RF signal input to the acoustic optical element 105 cannot reciprocate between the high reflection mirror 101 and the partial reflection mirror 102, the oscillation stops. Even while the oscillation is stopped, the laser medium 103 absorbs the excitation light 108 and stores energy by absorbing the excitation light 108.
  • the RF signal input to the acoustic optical element 105 is turned off and re-oscillated between the high reflection mirror 101 and the partial reflection mirror 102 to store the energy.
  • the energy is released at once, and the high-intensity laser beam 3 is output.
  • the pulse generator 113 controls the pulse frequency of the laser beam 3 by controlling the on / off timing of the RF signal output by the RF driver 112.
  • the pulse frequency of the laser beam 3 is several tens of kHz to several hundreds of kHz, and the pulse width is several ns to several hundred ns.
  • the pulse interval time represented by the inverse of the pulse frequency is shorter than the upper level lifetime of the laser medium 103, the average output of the laser beam 3 is determined by the output of the excitation light 108, so that the laser light is excited.
  • the output of the light 108 is substantially constant, the change in the average output of the laser light 3 is small even if the pulse frequency of the laser light 3 changes. That is, the pulsed laser light source 1 which is a Q-switched laser can take out the laser beam 3 having a substantially constant average output even if the pulse frequency is changed.
  • FIG. 3 is a configuration diagram of another form of the pulsed laser light source showing the first embodiment of this disclosure.
  • the pulse laser light source 200 includes a semiconductor laser 201, a light source 205, an optical fiber amplifier 206, and a solid-state amplifier 220.
  • the semiconductor laser 201 is an InGaAs semiconductor laser.
  • the semiconductor laser 201 is pulse-driven by the drive power supply 202 to generate a seed light La, which is a weak laser beam.
  • the drive power supply 202 can control the pulse frequency of the seed light La by passing a current through the semiconductor laser 201 and changing the pulse frequency of the flowing current.
  • the pulse width of the seed light La is about 10 ps to 100 ns, and the average output is about 100 nW to 10 mW, which is substantially proportional to the pulse frequency.
  • the semiconductor laser 201 is coupled to the optical fiber 203, and the seed light La propagates inside the optical fiber 203.
  • the coupler 204 coaxially couples the excitation light Le emitted from the light source 205 and the seed light La and guides them to the optical fiber amplifier 206.
  • the optical fiber amplifier 206 absorbs the excitation light Le emitted from the light source 205, amplifies the seed light La 10 to 1000 times, and emits the seed light La as the amplified light Lb from the end face 207.
  • the optical fiber amplifier 206 is an optical fiber to which rare earth elements such as Yb (ytterbium), Er (erbium), Ho (holmium), Tm (thulium), or Pr (praseodymium) are added.
  • the average output of the amplified light Lb is about 1 ⁇ W to 10 W.
  • the amplified light Lb is amplified by the solid-state amplifier 220 having a solid-state laser medium, and is emitted from the solid-state amplifier 220 as amplified light Lc.
  • the amplified light Lc becomes the laser beam 3 of the fundamental wave.
  • the solid-state amplifier 220 has a laser medium 803, an excitation light coupling mirror 804, a light source 806, and an optical fiber 807.
  • the excitation light 808 generated by the light source 806 and emitted through the optical fiber 807 is excited by the excitation optical system 809. It passes through the optical coupling mirror 804 and is absorbed by the laser medium 803.
  • the saturated and amplified amplified light Lb is reflected by the excitation light coupling mirror 804 and emitted as amplified light Lc. Since the solid-state amplifier 220 saturates and amplifies the amplified light Lb, the average output of the amplified light Lc is substantially constant even if the average output of the amplified light Lb fluctuates.
  • the average output of the amplified light Lc is about 1 W to several hundred W, which is higher than the average output of the seed light La. Therefore, even if the pulse frequency of the seed light La is changed by the drive power supply 202 and the average output of the seed light La changes, the average output of the amplified light Lc does not substantially change. Amplified light Lc can be taken out.
  • the laser beam 3 of the fundamental wave emitted from the pulse laser light source 1 is focused on the second harmonic generation crystal 5 by the condenser lens 4.
  • the second harmonic generation crystal 5 converts a part of the laser beam 3 into a second harmonic 6 having a wavelength half that of the laser beam 3.
  • the second harmonic 6 and the laser beam 3 remaining without being converted into the second harmonic 6 are focused by the condenser lens 7 inside the crystal 8 including the surface of the third harmonic generation crystal 8.
  • the third harmonic generation crystal 8 generates a third harmonic 9 having a wavelength one-third of the laser light 3 which is the second laser light by the second harmonic 6 and the laser light 3.
  • the second harmonic generation crystal 5 and the third harmonic generation crystal 8 are LBO crystal (LiB3O5), KTP crystal (KTiPO4), BBO crystal ( ⁇ -BaB2O4), CBO crystal (CsB3O5), CLBO crystal (CsLiB6O10), etc. It is a non-linear medium.
  • a method of generating a laser beam having a wavelength different from that of the laser beam 3 which is a fundamental wave by using a non-linear medium is called wavelength conversion, and the non-linear medium used at this time is called a wavelength conversion crystal.
  • the process of generating a laser beam having a wavelength one-third of that of the laser beam 3 which is the fundamental wave is called the third harmonic generation.
  • Wave vector k omega, k 2 [omega, the magnitude of k 3 [omega], using the wavelength of the laser beam 3 lambda is fundamental wave, are expressed by the following equation.
  • n 1 , n 2 , and n 3 are the refractive indexes of the third harmonic generation crystal 8 in the laser beam 3, the second harmonic 6, and the third harmonic 9, respectively.
  • the refractive index of the second harmonic generation crystal 5 and the third harmonic generation crystal 8 also depends on the temperature of the crystal.
  • the temperature controller 16 and the temperature controller 17 usually have a second harmonic generation crystal 5 and a third harmonic generation crystal so that the phase mismatch ⁇ k is reduced and the average output of the third harmonic 9 is the highest. Control the temperature of 8.
  • the conversion efficiency of wavelength conversion depends on the peak intensity of the converted laser light, and the higher the peak intensity of the converted laser light, the higher the conversion efficiency.
  • the laser light 3 and the second harmonic 6 which are the fundamental waves are condensed by the condenser lens 4 and the condenser lens 7, so that the second harmonic generation crystal 5 and the third harmonic generation crystal 8 have high intensity.
  • highly efficient wavelength conversion becomes possible.
  • the laser light 3 oscillates in pulses it has a higher peak intensity than the laser light of continuous wave oscillation having the same average output, so that highly efficient wavelength conversion becomes possible.
  • FIG. 4 is an optical path diagram in which each laser beam travels inside the third harmonic generation crystal showing the first embodiment of the disclosure.
  • the laser beam 3 and the second harmonic 6 the traveling direction of the third harmonic 9, wave vector k omega respectively, k 2 [omega, which is the direction of k 3 [omega]. As shown in FIG.
  • the laser light 3 and the second harmonic 6 are coaxially incident on the third harmonic generation crystal 8, but the laser light 3 and the second harmonic 6 have different wavelengths and polarization states.
  • the process proceeds at different refractive indexes.
  • the inside of the third harmonic generation crystal 8 the direction of the wave vector k omega and k 2 [omega differ.
  • Equation 3 Phase mismatch ⁇ k becomes minimum, i.e., when it comes to zero, Equation 3 is expressed by the following equation, the wave vector k 3 [omega] of the third harmonic. 9, the wave vector k omega and the second harmonic wave of the laser light 3 The direction is between the wave vector k 2 ⁇ of 6.
  • the collimating lens 10 is a lens for making the spreading angles of the diverged third harmonic 9 parallel, and is arranged so that the focal position thereof is located inside including the surface of the third harmonic generating crystal 8.
  • the collimating lens 10 is a plano-convex spherical or aspherical lens having rotational symmetry around the optical axis.
  • the collimating lens 10 is two plano-convex cylindrical lenses whose curvature directions are orthogonal to each other.
  • the focal lengths of the two cylindrical lenses are different from each other, and the third harmonic is generated at the focal position of the two cylindrical lenses so that the spread angles of the third harmonic 9 are parallel in the direction of the curvature of each of the cylindrical lenses.
  • It may be arranged so as to be located inside including the surface of the crystal 8. In this case, even if the divergence angle of the third harmonic 9 emitted from the third harmonic generation crystal 8 differs depending on the direction of the curvature of each of the cylindrical lenses, by selecting a cylindrical lens having an appropriate focal length, 2
  • the third harmonic 9 emitted from the cylindrical lens can be formed into a parallel and highly rounded beam shape.
  • the third harmonic 9 and the laser beam 3 and the second harmonic 6 remaining without wavelength conversion in the third harmonic generation crystal 8 are separated by the wavelength separation mirror 11. As shown in FIG. 1, the third harmonic 9 passes through the wavelength separation mirror 11, and the laser beam 3 and the second harmonic 6 remaining without wavelength conversion are reflected by the wavelength separation mirror 11. Further, although not shown, the third harmonic 9 may be reflected by the wavelength separation mirror 11, and the laser beam 3 and the second harmonic 6 remaining without wavelength conversion may pass through the wavelength separation mirror 11.
  • the laser beam 3 and the second harmonic 6 separated from the third harmonic 9 by the wavelength separation mirror 11 without being wavelength-converted are received by the damper 12 and absorbed by the damper 12.
  • the wavelength separation mirror 11 is arranged after the laser light 3 and the second harmonic 6 remaining without wavelength conversion pass through the collimating lens 10, but the third harmonic generating crystal 8 and the collimating It may be arranged between the lenses 10.
  • the wavelength separation mirror 11 is a dielectric multilayer mirror designed to have a transmission characteristic at the wavelength of the third harmonic 9 and a reflection characteristic at the wavelengths of the laser beam 3 and the second harmonic 6.
  • the wavelength separation mirror 11 is not limited to the optical element of the mirror, and may be any one capable of separating laser light according to the wavelength, and may have an optical axis that changes depending on the wavelength, such as a prism or a diffraction grating.
  • the third harmonic 9 passes through the parallel flat plate 13 and is emitted from the wavelength conversion laser device 50.
  • the surface on which the third harmonic 9 is incident and the surface on which the third harmonic 9 is emitted are parallel to each other, and are substantially transparent at the wavelength of the third harmonic 9.
  • the parallel flat plate 13 is an optical glass such as synthetic quartz or BK7 provided with an antireflection film that prevents reflection at the wavelength of the third harmonic 9.
  • the angle of the parallel flat plate 13 can be controlled in the direction of the rotation direction 15 by the angle adjusting mechanism 14, and the angle of incidence of the third harmonic 9 on the parallel flat plate 13 can be controlled.
  • the angle adjusting mechanism 14 is composed of a rotary stage and a servomotor.
  • the third harmonic 9 is incident on the parallel plane plate 13 at an oblique incidence angle excluding the vertical incident, when the third harmonic 9 passes through the parallel plane plate 13, the third harmonic 9 is the parallel plane plate 13. Since refraction occurs between the surface incident on the surface and the surface emitting the light, the optical axis of the third harmonic 9 moves in parallel before and after the light enters the parallel flat plate 13.
  • FIG. 5 is an explanatory diagram showing the optical axis movement of the third harmonic accompanying the transmission through the parallel plane plate showing the first embodiment of the present disclosure.
  • the third harmonic 9 is incident on the surface S1 incident on the parallel plane plate 13 at an incident angle ⁇ 1 , and is refracted on the incident surface S1 of the parallel plane plate 13.
  • the refractive index of the parallel flat plate 13 is n and the refraction angle is ⁇ 2
  • the refraction angle ⁇ 2 satisfies the following equation.
  • the optical axis of the third harmonic 9 changed by refraction on the incident surface S1 is ⁇ 2 with respect to the exiting surface S2. It is incident at an angle. Assuming that the emission angle of the third harmonic 9 emitted from the emitting surface S2 is ⁇ 3 , the emission angle ⁇ 3 satisfies the following equation.
  • ⁇ 1 ⁇ 3
  • the optical axis 18 of the third harmonic 9 incident on the parallel flat plate 13 and the optical axis 19 of the third harmonic 9 emitted from the parallel flat plate 13 are parallel to each other.
  • the optical axis 18 and the optical axis 19 are deviated by the amount that the third harmonic 9 is refracted inside the parallel flat plate 13.
  • the amount of translation of the optical axis 18 and the optical axis 19 of the third harmonic 9 is d, and the distance between the surface S1 incident on the parallel plane plate 13 and the surface S2 emitting out is t, the following equation holds.
  • the pulse laser light source 1 changes the pulse frequency by the pulse frequency control means 2, when the laser light 3 is emitted with a substantially constant average output, if the pulse frequency of the pulse laser light source 1 is changed, it is included in one pulse.
  • the pulse energy changes.
  • the peak intensity of the laser beam 3 changes, so that the conversion efficiency of the wavelength conversion changes.
  • the pulse frequency is increased, the efficiency of wavelength conversion decreases, so that the average output of the third harmonic 9 decreases.
  • the pulse frequency is reduced, the efficiency of wavelength conversion becomes high, so that the average output of the third harmonic 9 becomes high.
  • the third harmonic generating crystal 8 has absorption at the wavelength of the third harmonic 9
  • the amount of heat absorbed by the third harmonic generating crystal 8 changes, and the amount of heat absorbed by the third harmonic generating crystal 8 changes.
  • the temperature of the third harmonic generation crystal 8 changes.
  • the non-linear medium used for wavelength conversion has absorption of several ppm to several thousand ppm, and the absorption ratio often increases as the wavelength becomes shorter. Therefore, the third harmonic 9 having a shorter wavelength tends to be absorbed by the non-linear medium at a higher rate than the laser beam 3 of the fundamental wave and the second harmonic 6.
  • the refractive index of the third harmonic generation crystal 8 changes, so that the phase mismatch ⁇ k changes.
  • the laser beam 3 and the second harmonic 6 are incident on the third harmonic generating crystal 8 at an oblique incidence angle excluding the vertical incidence, the laser beam 3 and the second harmonic 6 are incident. even for changing the direction of the wave vector k omega and k 2 [omega vary refraction angles. In this case, the direction of the wave number vector k 3 ⁇ of the third harmonic 9 is the direction in which the phase mismatch ⁇ k is the smallest.
  • the direction of the optical axis of the third harmonic 9 changes with the change of the pulse frequency.
  • the surface on which the direction of the optical axis of the third harmonic 9 changes is determined by the incident direction of the laser beam 3 and the second harmonic 6 with respect to the third harmonic generation crystal 8, the characteristics of the third harmonic generation crystal 8, and the like. .. Since the change in the direction of the optical axis of the third harmonic 9 occurs from the third harmonic generation crystal 8, the focal position of the collimating lens 10 is set to be inside including the surface of the third harmonic generation crystal 8. By arranging in, the direction of the optical axis of the third harmonic 9 returns to the same direction as before the pulse frequency was changed.
  • the change in the direction of the optical axis of the third harmonic 9 after passing through the third harmonic generation crystal 8 generated by changing the pulse frequency is caused by the collimating lens 10 of the optical axis of the third harmonic 9. Converted to parallel movement.
  • the collimating lens 10 is composed of one optical element, and when the pulse frequency is changed in parallel with the action of the lens for parallelizing the diverged third harmonic 9. The change in the direction of the optical axis of the third harmonic 9 is converted into parallel movement.
  • FIG. 6 is an explanatory diagram showing the movement of the optical axis of the third harmonic after passing through the third harmonic generation crystal by the collimating lens showing the first embodiment of the disclosure.
  • the optical axis 9a is the optical axis of the third harmonic 9 before the pulse frequency is changed
  • the optical axis 9b is the optical axis of the third harmonic 9 after the pulse frequency is changed.
  • the directions of the optical axis 9a and the optical axis 9b are different after passing through the third harmonic generation crystal, the optical axis 9a and the optical axis 9b move in parallel after passing through the collimating lens 10.
  • FIG. 7 is a measurement result of the time change of the optical axis of the third harmonic when the pulse frequency shown in the first embodiment of this disclosure is changed.
  • the pulse frequency of the pulse laser light source 1 by the pulse frequency control means 2 can be switched instantaneously, but the amount of translation of the third harmonic 9 depends on the temperature of the third harmonic generating crystal 8.
  • the temperature change of the third harmonic generating crystal 8 depends on the thermal conductivity, heat capacity, etc. of the third harmonic generating crystal 8, and the time constant of the temperature change is longer than the time required to change the pulse frequency. It takes a certain amount of time after changing the pulse frequency for the amount of parallel movement of the harmonic 9 to stabilize. As shown in FIG. 7, it takes about 30 seconds from changing the pulse frequency until the amount of translation of the third harmonic 9 stabilizes.
  • the angle adjusting mechanism 14 moves the optical axis in the direction opposite to the movement of the optical axis of the third harmonic 9 after passing through the collimating lens 10 by changing the pulse frequency.
  • the optical axis change of the third harmonic 9 after passing through the parallel flat plate 13 is corrected. Only one axis is required for adjusting the angle of the angle adjusting mechanism 14.
  • FIG. 8 is an explanatory diagram showing the correction of the optical axis change of the third harmonic by adjusting the angle of the parallel plane plate showing the first embodiment of the disclosure.
  • the parallel flat plate 13 Before changing the pulse frequency, the parallel flat plate 13 is placed at the position 13a, but after changing the pulse frequency, the parallel flat plate 13 is moved to the position 13b by the angle adjusting mechanism 14. Adjust the angle. In this way, the angle adjusting mechanism 14 controls so that the optical axis of the third harmonic 9 that has passed through the parallel flat plate 13 does not change before and after the change of the pulse frequency.
  • the parallel flat plate 13 By controlling the angle of the parallel flat plate 13 by the angle adjusting mechanism 14 in conjunction with the time change of the optical axis movement of the third harmonic 9 after passing through the collimating lens 10 due to the change of the pulse frequency, the parallel flat plate It is also possible to prevent the optical axis of the third harmonic 9 that has passed through the face plate 13 from changing over time.
  • the amount of optical axis movement of the third harmonic 9 after passing through the collimated lens 10 is measured in advance so that the optical axis moves in the opposite direction with the same amount of optical axis movement as after the pulse frequency is changed.
  • the angle adjustment mechanism 14 may be controlled by determining the amount of angle adjustment of the parallel flat plate 13.
  • the position of the third harmonic 9 after passing through the parallel flat plate 13 does not change.
  • the angle adjustment of the parallel flat plate 13 may be feedback-controlled to the angle adjustment mechanism 14.
  • FIG. 9 is a diagram showing a change over time in the amount of adjustment of the angle of the optical axis by the parallel flat plate after changing the pulse frequency showing the first embodiment of the disclosure.
  • FIG. 10 is a calculation result of a correction amount when the optical axis movement of the third harmonic generated after passing through the collimating lens shown in the first embodiment of the present disclosure is corrected by adjusting the angle of the parallel flat plate. As shown in FIGS. 9 and 10, by adjusting the angle of the parallel flat plate 13 by the angle adjusting mechanism 14, it is possible to suppress the amount of optical axis movement of the third harmonic 9.
  • the optical axis of the third harmonic 9 is made constant only by the angle adjustment mechanism 14 of one axis. It is possible to keep.
  • Example 1 of this disclosure the generation of the third harmonic has been described as an example, but the generation is not limited to the generation of the third harmonic.
  • the parallel plane plate 13 and the angle adjusting mechanism 14 shown in the first embodiment of the disclosure are installed in the packaged housing of the wavelength conversion laser device 50 has been described, the outside of the wavelength conversion laser device 50 has been described. It may be installed in.
  • the change in the emission angle of the third harmonic 9 due to the temperature change of the third harmonic generation crystal 8 is such that the third harmonic 9 is the third harmonic generation crystal 8.
  • the collimating lens 10 converts the optical axis into parallel movement. Since the optical axis of the third harmonic 9 that has moved in parallel is corrected by the optical axis movement by the parallel flat plate 13 whose angle is adjusted by the angle adjusting mechanism 14, the pulse frequency of the pulsed laser light source 1 is adjusted by the pulse frequency control means 2. Even if it is changed, the amount of optical axis movement of the third harmonic 9 can be suppressed.
  • FIG. 11 is a configuration diagram of a wavelength conversion laser apparatus showing the second embodiment of this disclosure.
  • the reflection type wavelength separation mirror 301 which is a reflection type mirror
  • the parallel movement mechanism which is the first parallel movement mechanism
  • a moving mechanism 302 is provided.
  • the reflection type wavelength separation mirror 301 reflects the third harmonic 9 which is the second laser light by changing the direction of the optical axis by 90 °, and passes through the third harmonic generation crystal 8.
  • the laser light 3 and the second harmonic 6 of the fundamental wave, which is the first laser light, that remains without being wavelength-converted are transmitted.
  • the laser beam 3 and the second harmonic 6 transmitted through the reflection type wavelength separation mirror 301 are received by the damper 12 and absorbed by the damper 12.
  • the reflection type wavelength separation mirror 301 the light of the third harmonic 9 after the optical axis of the third harmonic wave reflected by the reflection type wavelength separation mirror 301 passes through the collimating lens 10 before and after the change of the pulse frequency. Arrange so that it exists in the plane including the axis.
  • the optical axis of the third harmonic 9 moves in parallel.
  • the parallel movement mechanism 302 moves the reflective wavelength separation mirror 301 in parallel in the direction of movement 303, and the amount and direction of the parallel movement is the pulse frequency.
  • the incident position of the third harmonic 9 is controlled so that the optical axis of the third harmonic 9 after passing through the collimating lens 10 caused by the change has the same movement amount and direction as the movement amount translated in parallel. Since the direction in which the optical axis of the third harmonic 9 moves in parallel after passing through the collimating lens 10 is fixed, the parallel movement mechanism 302 may be any movement mechanism capable of parallel movement in one axis.
  • FIG. 12 is an explanatory diagram showing the correction of the optical axis change of the third harmonic due to the translation of the translation mechanism according to the second embodiment of the disclosure.
  • the reflection type wavelength separation mirror 301 before changing the pulse frequency, the reflection type wavelength separation mirror 301 is placed at the position 301a.
  • the position of the reflection type wavelength separation mirror 301 is moved to the position 301b by the parallel movement mechanism 302, and the third harmonic 9 reflected by the reflection type wavelength separation mirror 301 before and after the change of the pulse frequency.
  • the amount of movement of the optical axis of the third harmonic 9 after passing through the collimating lens 10 due to the change in pulse frequency is measured in advance, and the same amount of movement is linked to the change in pulse frequency.
  • a measuring instrument is installed to measure the position of the optical axis of the third harmonic 9 reflected by the reflective wavelength separation mirror 301, and the third harmonic reflected by the reflection wavelength separation mirror 301 even if the pulse frequency is changed.
  • the position of the reflection type wavelength separation mirror 301 may be feedback-controlled via the parallel movement mechanism 302 so that the position of the optical axis of 9 does not change.
  • the position of the optical axis of the third harmonic 9 to be emitted can be kept constant only by the one-axis translation mechanism 302 even if the pulse frequency is changed. .. Further, the wavelength separation of the laser beam 3, the second harmonic 6 and the third harmonic 9, and the correction of the optical axis movement of the third harmonic 9 emitted can be corrected by one reflection type wavelength separation mirror 301.
  • FIG. 13 is a configuration diagram of a wavelength conversion laser apparatus showing the third embodiment of this disclosure.
  • the prism 401 which is the first prism
  • the prism 402 which is the second prism
  • the parallel which is the second translation mechanism.
  • a moving mechanism 403 is provided.
  • the fundamental wave laser light 3 and the second harmonic 6 which are the first laser light are circular laser light in the third harmonic generation crystal 8, when the wavelength is converted by the third harmonic generation crystal 8.
  • the permissible angle formed by the wave number vectors of the laser beam 3, the second harmonic 6 and the third harmonic 9 differs depending on the direction.
  • the third harmonic 9 which is the second laser beam generated from the third harmonic generation crystal 8 has a different divergence angle depending on the traveling direction, and becomes an elliptical laser beam. Since the laser light 3 and the second harmonic 6 are focused on the third harmonic generation crystal 8 by the condenser lens 7, in each traveling direction of the third harmonic 9 generated from the third harmonic generation crystal 8.
  • the position of the beam waist of the third harmonic 9 is at the position of the third harmonic generating crystal 8, and the collimating lens 10 makes the third harmonic 9 parallel in each traveling direction while maintaining an elliptical shape.
  • the third harmonic 9 parallelized by the collimating lens 10 passes through the prism 401 and the prism 402 having a triangular prism shape.
  • the prism 401 and the prism 402 are adjusted so that only the beam diameter in one direction of the third harmonic 9 is changed to be the same as the beam diameter in the other direction of the third harmonic 9, and the prism 401 and the prism 402 are adjusted.
  • the prism 402 converts the third harmonic 9 incident in the shape of an ellipse into a circular shape.
  • the prism 401 and the prism 402 increase the beam diameter in the changing direction.
  • FIG. 14 is an explanatory view showing how the beam diameter is expanded by the prism showing the third embodiment of this disclosure.
  • the laser beam 405 incident on the prism 401 is refracted when passing through the prism 401 and the prism 402 to expand the beam diameter, and is emitted as the expanded laser beam 406.
  • the magnification of the beam diameter depends on the refractive index and the angle of incidence of the prism 401 and the prism 402, and does not depend on the distance between the prism 401 and the prism 402 being arranged.
  • the translation mechanism 403 moves the prism 402 in parallel in the movement direction 404.
  • the moving direction 404 is a direction parallel to the optical axis of the third harmonic 9 emitted from the prism 402.
  • the translation mechanism 403 controls the amount of movement of the prism 402 so that the optical axis of the third harmonic 9 moves in parallel after passing through the collimating lens 10 to correct the amount of movement of the third harmonic 9. Control the position. Since the direction in which the optical axis of the third harmonic 9 moves in parallel after passing through the collimating lens 10 is fixed, the parallel movement mechanism 403 may be any movement mechanism capable of parallel movement in one direction.
  • FIG. 15 is an explanatory diagram showing the correction of the optical axis change of the third harmonic due to the translation of the translation mechanism according to the third embodiment of the disclosure.
  • the prism 402 Prior to changing the pulse frequency, the prism 402 is located at position 402a.
  • the optical axis of the third harmonic 9 passing through the prism 402 is moved before and after the change of the pulse frequency. Do not change.
  • the amount of movement of the optical axis of the third harmonic 9 after passing through the collimating lens 10 due to the change in the pulse frequency is measured in advance, and the position of the optical axis of the third harmonic 9 after passing through the prism 402 changes.
  • the position of the non-prism 402 may be calculated.
  • a measuring instrument for measuring the position of the optical axis of the third harmonic 9 after passing through the prism 402 is installed, and the optical axis of the third harmonic 9 after passing through the prism 402 even if the pulse frequency is changed.
  • the position of the prism 402 may be feedback-controlled via the parallel movement mechanism 403 so that the position of the prism 402 does not change.
  • the position of the optical axis of the third harmonic 9 to be emitted can be kept constant only by the translation mechanism 403 in one direction even if the pulse frequency is changed. .. Further, it is possible to separate the wavelengths of the laser beam 3, the second harmonic 6 and the third harmonic 9, and to convert the beam shape of the emitted third harmonic 9 from an ellipse to a circle.
  • FIG. 16 is a configuration diagram of a wavelength conversion laser machine showing Example 4 of this disclosure.
  • the wavelength conversion laser machine 500 supports the wavelength conversion laser device 501, which is one of the wavelength conversion laser devices according to the first to third embodiments of the disclosure, and the object to be machined 509.
  • the object to be machined support portion 508 to be processed is provided.
  • the wavelength conversion laser processing machine 500 includes a mask 504, a processing head 505 that irradiates the object to be processed 509 with laser light 502, which is the second laser light emitted from the wavelength conversion laser device 501, and the processing head 505 and the object to be processed. It includes a relative moving unit 512 that relatively moves the object support unit 508, and a control device 513 that controls the operation of the relative moving unit 512 and the wavelength conversion laser device 501.
  • the object to be processed 509 is placed and supports the object to be processed 509.
  • the object to be processed 509 is a multilayer substrate in which a flexible printed circuit board (FPC: Flexible Printed Circuits) and a printed wiring board (PCB: Printed Circuit Board) are multilayered.
  • Flexible printed circuit boards and printed wiring boards are made of resin and copper.
  • the wavelength of the laser beam 502 emitted from the wavelength conversion laser device 501 shown in Example 4 of this disclosure is preferably an ultraviolet region that is absorbed by both the resin and copper.
  • the processing head 505 includes a light guide mirror 506 and a condenser lens 507.
  • the beam diameter and divergence angle of the laser beam 502 emitted from the wavelength conversion laser device 501 are adjusted by the beam adjusting optical system 503, and the laser beam 502 is incident on the mask 504.
  • the mask 504 has a circular or rectangular opening, and the shape of the laser beam 502 after passing through the mask 504 is the same as the shape of the opening of the mask 504.
  • the laser beam 502 that has passed through the mask 504 passes through the light guide mirror 506 and the condenser lens 507, and irradiates the object to be processed 509.
  • the condenser lens 507 transfers the shape of the laser beam 502 at the position after passing through the mask 504 to the object to be processed 509.
  • the relative moving unit 512 relatively moves the laser beam 502 emitted from the processing head 505 and the object support unit 508 to be processed along at least one of the X direction and the Y direction shown in FIG.
  • the relative moving portion 512 moves the workpiece support portion 508 along at least one of the X and Y directions, while the machining head 505 moves along both the X and Y directions. It may be moved, and both the processing head 505 and the object support portion 508 to be processed may be moved along at least one of the X direction and the Y direction.
  • the relative moving portion 512 is composed of a motor, a lead screw that moves the workpiece supporting portion 508 by the rotational driving force of the motor, and a linear guide that guides the moving direction of the workpiece supporting portion 508.
  • the configuration of the relative moving unit 512 is not limited to the configuration of the motor, the lead screw, and the linear guide.
  • the relative moving unit 512 is controlled by the control device 513. Further, the relative moving unit 512 includes a galvano mirror and a polygon mirror, and the laser beam 502 may be scanned by the galvano mirror and the polygon mirror. In this case, it is desirable that the condenser lens 507 is composed of an F ⁇ lens.
  • the wavelength conversion laser machining machine 500 shown in Example 4 of this disclosure irradiates the laser beam 502 that has passed through the machining head 505 while moving the object support section 508 to be machined by the relative moving section 512, and the laser beam 502. Is scanned on the surface of the object to be machined 509.
  • the wavelength conversion laser machining machine 500 forms a fine machined hole 510 at a desired position set in advance in the object to be machined 509.
  • the machined hole 510 is a blind hole or a through hole.
  • the diameter of the machined hole 510 can be appropriately set according to the diameter of the opening of the mask 504.
  • the pulse energy of the laser beam 502 required for processing has a different value depending on the depth and shape of the processing hole 510 formed in the object to be processed 509 and the difference in the constituent materials of the object to be processed 509.
  • the pulse energy of the laser beam 502 becomes low, and when it is driven at a low pulse frequency, the pulse energy becomes high.
  • the pulse frequency the higher the pulse frequency, the higher the processing speed becomes possible. Therefore, when performing high-speed machining while securing the pulse energy required for machining, it is desirable to adjust the pulse frequency for each type of machining.
  • the wavelength conversion laser processing machine 500 shown in Example 4 of this disclosure includes any of the wavelength conversion laser devices according to Examples 1 to 3 of this disclosure, the wavelength conversion laser device 501 is matched to the type of processing.
  • the optical axis of the laser beam 502 does not change even if the pulse wavelength for driving the laser beam is changed. Therefore, even if the pulse frequency of the wavelength conversion laser device 501 changes, the shape of the laser beam 502 after passing through the mask 504 does not change, and the shape of the laser beam 502 at the position of the object to be processed 509 does not change either.
  • FIG. 17 is an intensity distribution of the laser beam immediately before passing through the mask showing the fourth embodiment of this disclosure.
  • FIG. 18 is an intensity distribution of the laser light after passing through the mask before changing the pulse frequency for driving the wavelength conversion laser apparatus according to the fourth embodiment of the disclosure.
  • the center position of the mask 504 is adjusted so that the center position of the opening of the mask 504 and the optical axis of the laser beam 502 coincide with each other.
  • FIG. 19 is an intensity distribution of the laser beam when the optical axis of the laser beam after passing through the mask showing the fourth embodiment of the disclosure deviates from the center position of the mask.
  • the optical axis of the laser beam 502 shifts as shown in FIG. 19 by changing the pulse frequency for driving the wavelength conversion laser device 501.
  • the intensity distribution of the laser beam 502 after passing through 504 changes. Since this changed intensity distribution is transferred to the object to be processed 509, the processing assumed at this time cannot be performed, and processing defects occur.
  • FIG. 20 is an intensity distribution of the laser beam of the laser beam 502 after passing through the mask after changing the pulse frequency for driving the wavelength conversion laser apparatus shown in the fourth embodiment of the disclosure.
  • the optical axis of the laser light 502 does not shift, so that the intensity distribution of the laser light 502 after passing through the mask 504 is
  • the shape is the same as the intensity distribution of the laser light 502 after passing through the mask 504 before changing the pulse frequency for driving the wavelength conversion laser device 501, and the processing as assumed at this time can be performed. Therefore, the wavelength conversion laser machine 500 according to the fourth embodiment of the present disclosure enables high-speed and high-quality processing of the object to be processed 509.
  • 1,200 pulse laser light source 2 pulse frequency control means, 3,110,405,406,502 laser light, 4,7,507 condensing lens, 5 second harmonic generation crystal, 6 second harmonic, 8th 3rd harmonic generation crystal, 9th 3rd harmonic, 10 collimating lens, 11 wavelength separation mirror, 12 damper, 13 parallel flat plate, 13a, 13b, 301a, 301b, 402a, 402b position, 14 angle adjustment mechanism, 15 rotation Direction, 16,17 temperature controller, 9a, 9b, 18,19 optical axis, 50,300,400,501 wavelength conversion laser device, 101 high reflection mirror, 102 partial reflection mirror, 103,803 laser medium, 104,804 Excitation light coupling mirror, 105 acoustic optical element, 106,205,806 light source, 107,203,807 optical fiber, 108,808 excitation light, 109,809 excitation optical system, 112 RF driver, 113 pulse generator, 201 semiconductor laser , 202 drive power supply, 204 coupler, 206 optical
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CN202080098088.9A CN115210973B (zh) 2020-03-10 2020-03-10 波长变换激光装置及波长变换激光加工机
JP2020552927A JP6808114B1 (ja) 2020-03-10 2020-03-10 波長変換レーザ装置および波長変換レーザ加工機
KR1020227030085A KR102528248B1 (ko) 2020-03-10 2020-03-10 파장 변환 레이저 장치 및 파장 변환 레이저 가공기
TW110105904A TWI761081B (zh) 2020-03-10 2021-02-20 波長變換雷射裝置及波長變換雷射加工機

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