WO2021114367A1 - 彩色光刻胶、彩色滤光片及其制备方法 - Google Patents

彩色光刻胶、彩色滤光片及其制备方法 Download PDF

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Publication number
WO2021114367A1
WO2021114367A1 PCT/CN2019/126878 CN2019126878W WO2021114367A1 WO 2021114367 A1 WO2021114367 A1 WO 2021114367A1 CN 2019126878 W CN2019126878 W CN 2019126878W WO 2021114367 A1 WO2021114367 A1 WO 2021114367A1
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Prior art keywords
color
photoresist
carbon
color photoresist
color filter
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English (en)
French (fr)
Inventor
艾琳
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TCL China Star Optoelectronics Technology Co Ltd
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TCL China Star Optoelectronics Technology Co Ltd
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Priority to US16/627,356 priority Critical patent/US20210325724A1/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
    • C09K2323/03—Viewing layer characterised by chemical composition
    • C09K2323/031—Polarizer or dye
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix

Definitions

  • This application relates to the field of display technology, in particular to a color photoresist, a color filter and a preparation method thereof.
  • Liquid crystal display is currently the most widely used realistic product in the market. It mainly includes three components: color film substrate, liquid crystal, and array substrate.
  • the RGB color photoresist on the color film substrate respectively corresponds to three sub-pixels on the array substrate, and the three sub-pixels form one pixel.
  • the color display of the liquid crystal display is mainly realized by the RGB three-color pixels on the color film substrate. RGB three-color pixels are formed through three different systems of RGB photoresist to form a pattern structure required by the design to assist in color development.
  • the carrier substrate made of silicon nitride used for the preparation of color filters undergoes extreme ultraviolet irradiation and pre-cleaning processes such as water washing.
  • extreme ultraviolet irradiation and pre-cleaning processes such as water washing.
  • hydroxyl groups will increase on the surface of the carrier substrate, resulting in increased hydrophilicity of the carrier substrate.
  • the color photoresist on the carrier substrate has poor adhesion, causing peeling. If the pre-cleaning process such as extreme ultraviolet radiation and water washing is turned off, the color photoresist residue problem is likely to occur in the subsequent process.
  • the existing optimization method is to adjust the acid value of the polymer or the monomer functionality of the outer coating of the color-resistance dye crystal particle component on the one hand to improve, but it will affect other related characteristic values in the process and need to be re-evaluated and optimized.
  • Composition and ratio; on the other hand, the adhesion can be adjusted by changing the dosage of the strong compound such as the additive siloxane and the silicon nitride carrier substrate, but these organic-inorganic hybrid small molecules are resistant to heat when the process is heated. Poor thermal properties can easily lead to problems of sublimation during the pre-baking process, and bring post-process processing and instrument maintenance problems to commercial production.
  • the existing color photoresist, color filter and preparation method thereof because the carrier substrate is exposed to extreme ultraviolet rays and washed with water, the surface will increase the hydroxyl groups, resulting in increased hydrophilicity of the carrier substrate, making the carrier substrate more hydrophilic.
  • the color photoresist on the carrier substrate has poor adhesion, and peeling occurs.
  • the embodiments of the present application provide a color photoresist, the color photoresist including a cured resin, a multifunctional monomer, an initiator, a solvent, a colorant, and an additive;
  • the additive is a non-metal catalyst
  • the non-metal catalyst can catalyze the cross-coupling photoreaction of carbon-carbon single bond compounds, carbon-oxygen single bond compounds, and carbon-nitrogen single bond compounds under ultraviolet light.
  • the non-metallic catalyst accounts for 0.1% to 0.2% by mass of the colored photoresist, and the non-metallic catalyst is trifluoroacetic acid.
  • the cured resin accounts for 5% to 8% by mass of the color photoresist
  • the multifunctional monomer accounts for 5% by mass of the color photoresist.
  • the initiator accounts for 0.2% to 0.6% of the mass percentage of the color photoresist
  • the solvent accounts for 70% to 80% of the mass percentage of the color photoresist
  • the coloring The mass percentage of the agent in the color photoresist is 10%-16%.
  • the curing resin is an acrylic resin
  • the multifunctional monomer is a polyhydric alcohol acrylate
  • the initiator is an acetophenone derivative
  • the solvent is propylene glycol methyl ester.
  • Ether acetate the colorant is selected from the group consisting of red benzimidazolone derivatives color particles, green phthalocyanine green derivatives color particles, blue phthalocyanine blue derivatives color particles and yellow benzidine derivatives color particles At least one of them.
  • the embodiments of the present application also provide a color filter, the color filter comprising: a carrier substrate, a black matrix arranged on the carrier substrate, and a black matrix arranged on the carrier substrate and covered by the carrier substrate.
  • the color filter layer in the area separated by the black matrix;
  • the color filter layer is formed by a color photoresist
  • the color photoresist includes a cured resin, a multifunctional monomer, an initiator, a solvent, a colorant, and an additive
  • the additive is a non-metallic catalyst
  • the non-metal catalyst can catalyze the cross-coupling photoreaction of carbon-carbon single-bond compounds, carbon-oxygen single-bond compounds, and carbon-nitrogen single-bond compounds under ultraviolet light.
  • the non-metallic catalyst accounts for 0.1% to 0.2% of the mass percentage of the color photoresist, and the non-metallic catalyst is trifluoroacetic acid.
  • an embodiment of the present application further provides a method for manufacturing the above-mentioned color filter, and the method includes:
  • the S20 further includes:
  • the additive is a non-metal catalyst
  • the additive is a non-metal catalyst
  • the non-metal catalyst can catalyze the interaction between carbon-carbon single bond compounds, carbon-oxygen single bond compounds, and carbon-nitrogen single bond compounds. Cross-coupling light reaction occurs under light;
  • S204 Perform a hard baking process on the patterned color film to cure the patterned color film to form a color filter layer, and finally obtain a color filter.
  • the non-metallic catalyst accounts for 0.1% to 0.2% of the color photoresist by mass, and the non-metallic catalyst is trifluoroacetic acid.
  • the color filter layer includes a red filter layer, a blue filter layer, and a green filter layer.
  • the color photoresist, color filter and preparation method thereof provided in the present application add a small amount of non-metal catalysis during the configuration of the color photoresist, which can catalyze color lithography under ultraviolet light.
  • the individual spots of the glue react with the carrier substrate made of silicon nitride to further improve the adhesion of the color photoresist on the carrier substrate on the carrier substrate.
  • FIG. 1 is a schematic diagram of the structure of a color filter provided by an embodiment of the application.
  • FIG. 2 is a schematic flowchart of a method for manufacturing a color filter provided by an embodiment of the application.
  • FIG. 3 is a schematic diagram of the structure of the color photoresist and the carrier substrate under ultraviolet light according to an embodiment of the application.
  • FIG. 4 is a schematic diagram of the improvement of the adhesion of the color photoresist on the carrier substrate according to the embodiment of the application.
  • the embodiments of the present application provide a color photoresist
  • the color photoresist includes a cured resin, a multifunctional monomer, an initiator, a solvent, a colorant, and an additive;
  • the additive is a non-metal catalyst
  • the non-metal catalyst can catalyze the cross-coupling photoreaction of carbon-carbon single-bond compounds, carbon-oxygen single-bond compounds, and carbon-nitrogen single-bond compounds under ultraviolet light.
  • the non-metallic catalyst accounts for 0.1% to 0.2% by mass of the color photoresist
  • the non-metal catalyst is trifluoroacetic acid
  • the non-metal catalyst mainly functions to catalyze the color photoresist Under ultraviolet light, the polymer forms bonds with the hydroxyl groups on the carrier substrate to improve the adhesion of the colored photoresist on the carrier substrate on the carrier substrate.
  • the curing resin accounts for 5% to 8% of the mass percentage of the color photoresist
  • the resin matrix has a double bond structure
  • the curing resin is selected from acrylic resins, epoxy acrylic resins, and polyesters. At least one of acrylic resin, unsaturated polyester, urethane acrylic resin, polyether acrylic resin, and acrylated polyphosphate, and the curing resin is preferably acrylic resin.
  • the curing resin controls the mechanical strength of the color photoresist through the molecular weight of the high polymer.
  • the mass percentage of the multifunctional monomer in the color photoresist is 5% to 8%
  • the multifunctional monomer is a polyhydric alcohol acrylate
  • the multifunctional monomer is preferably At least one of dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, aliphatic hexafunctional urethane acrylate polymer, and ethoxylated pentaerythritol tetraacrylate.
  • the multifunctional monomer is used to form a cross-linked network under ultraviolet light to block the corrosion of the color photoresist by the developer in the subsequent manufacturing process.
  • the mass percentage of the initiator in the color photoresist is 0.2% to 0.6%
  • the initiator is an acetophenone derivative
  • the initiator is used to make the color photoresist Glue generates active free radicals by ultraviolet light.
  • the solvent accounts for 70% to 80% of the mass percentage of the color photoresist, and the solvent may be propylene glycol methyl ether acetate, ethyl 3-ethoxypropionate, or propylene glycol methyl ether (PM).
  • the solvent is preferably propylene glycol methyl ether acetate in the embodiment of the present application.
  • the colorant accounts for 10% to 16% of the mass percentage of the color photoresist; the colorant is selected from red benzimidazolone derivatives color particles, green phthalocyanine green derivatives color particles , At least one of blue phthalocyanine blue derivative color particles and yellow benzidine derivative color particles.
  • the non-metal catalyst can catalyze the reaction between the color photoresist and the hydroxyl groups on the carrier substrate in the subsequent process. , The adhesion of the color photoresist on the carrier substrate is improved.
  • an embodiment of the present application also provides a color filter prepared by using the above-mentioned color photoresist.
  • the color filter 10 includes: a carrier substrate 11, a black matrix 12 arranged on the carrier substrate 11, and a color filter in an area that is arranged on the carrier substrate 11 and separated by the black matrix 13 Filter layer 13;
  • the color filter layer 13 is formed by a color photoresist
  • the color photoresist includes a cured resin, a multifunctional monomer, an initiator, a solvent, a colorant, and an additive
  • the additive is a non-metallic catalyst
  • the non-metal catalyst can catalyze the cross-coupling photoreaction of carbon-carbon single-bond compounds, carbon-oxygen single-bond compounds, and carbon-nitrogen single-bond compounds under ultraviolet light.
  • the non-metallic catalyst accounts for 0.1% to 0.2% by mass of the color photoresist
  • the non-metal catalyst is trifluoroacetic acid
  • the non-metal catalyst mainly functions to catalyze the color photoresist Under ultraviolet light, the polymer forms bonds with the hydroxyl groups on the carrier substrate to improve the adhesion of the colored photoresist on the carrier substrate on the carrier substrate.
  • the curing resin accounts for 5% to 8% of the mass percentage of the color photoresist
  • the resin matrix has a double bond structure
  • the curing resin is selected from acrylic resins, epoxy acrylic resins, and polyesters. At least one of acrylic resin, unsaturated polyester, urethane acrylic resin, polyether acrylic resin, and acrylated polyphosphate, and the curing resin is preferably acrylic resin.
  • the curing resin controls the mechanical strength of the color photoresist through the molecular weight of the high polymer.
  • the mass percentage of the multifunctional monomer in the color photoresist is 5% to 8%
  • the multifunctional monomer is a polyhydric alcohol acrylate
  • the multifunctional monomer is preferably At least one of dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, aliphatic hexafunctional urethane acrylate polymer, and ethoxylated pentaerythritol tetraacrylate.
  • the multifunctional monomer is used to form a cross-linked network under ultraviolet light to block the corrosion of the color photoresist by the developer in the subsequent manufacturing process.
  • the mass percentage of the initiator in the color photoresist is 0.2% to 0.6%
  • the initiator is an acetophenone derivative
  • the initiator is used to make the color photoresist Glue generates active free radicals when exposed to ultraviolet light.
  • the solvent accounts for 70% to 80% of the mass percentage of the color photoresist, and the solvent may be propylene glycol methyl ether acetate, ethyl 3-ethoxypropionate, or propylene glycol methyl ether (PM).
  • the solvent is preferably propylene glycol methyl ether acetate in the embodiment of the present application.
  • the colorant accounts for 10% to 16% of the mass percentage of the color photoresist; the colorant is selected from red benzimidazolone derivatives color particles, green phthalocyanine green derivatives color particles , At least one of blue phthalocyanine blue derivative color particles and yellow benzidine derivative color particles.
  • the color filter layer 13 includes a red filter layer 131, a blue filter layer 132 and a green filter layer 133.
  • the color filter layer 13 provided in the embodiment of the present application adopts a color photoresist with a small amount of a non-metallic catalyst formula, and the non-metal catalyst can catalyze individual groups on the color photoresist and the The hydroxyl groups on the carrier substrate 11 react, which further improves the adhesion of the color photoresist on the carrier substrate 11.
  • an embodiment of the present application further provides a method for manufacturing the color filter 10, and the method includes:
  • the S10 further includes:
  • a carrier substrate is provided, and the material of the carrier substrate is preferably a silicon nitride glass substrate. Afterwards, the carrier substrate is subjected to extreme ultraviolet irradiation and washing with water. At this time, a plurality of hydroxyl groups will be added to the surface of the carrier substrate, resulting in increased hydrophilicity. If the carrier substrate is not subjected to cleaning steps such as extreme ultraviolet irradiation and water washing, the subsequent manufacturing process is likely to cause the problem of color photoresist residue. Then, a black photoresist is coated on the carrier substrate to form a black matrix.
  • the S20 further includes:
  • the color photoresist includes a cured resin, a multifunctional monomer, an initiator, a solvent, a colorant, and an additive.
  • the additive is a non-metallic catalyst.
  • the additive is a non-metal catalyst, and the non-metal catalyst can catalyze the cross-coupling photoreaction of carbon-carbon single bond compounds, carbon-oxygen single bond compounds, and carbon-nitrogen single bond compounds under ultraviolet light.
  • the color photoresist is pre-baked.
  • the temperature of the pre-baking treatment is 20° C. to 50° C.
  • the pre-baking treatment time is 30 s to 120 s.
  • the patterned color film is hard-baked to cure the patterned color film to form a color filter layer, and finally a color filter is obtained.
  • the temperature of the hard bake treatment is 20° C. to 100° C.
  • the hard bake treatment time is 5 min to 30 min.
  • the non-metallic catalyst accounts for 0.1% to 0.2% of the mass percentage of the color photoresist
  • the non-metallic catalyst is trifluoroacetic acid
  • the function of the non-metallic catalyst is mainly to catalyze the formation of bonds between the polymer in the color photoresist and the hydroxyl groups on the carrier substrate under ultraviolet light, thereby elevating the carrier substrate The adhesion of the colored photoresist on the carrier substrate.
  • the curing resin accounts for 5% to 8% of the mass percentage of the color photoresist
  • the resin matrix has a double bond structure
  • the curing resin is selected from acrylic resins, epoxy acrylic resins, and polyesters. At least one of acrylic resin, unsaturated polyester, urethane acrylic resin, polyether acrylic resin, and acrylated polyphosphate, and the curing resin is preferably acrylic resin.
  • the curing resin controls the mechanical strength of the color photoresist through the molecular weight of the high polymer.
  • the mass percentage of the multifunctional monomer in the color photoresist is 5% to 8%
  • the multifunctional monomer is a polyhydric alcohol acrylate
  • the multifunctional monomer is preferably At least one of dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, aliphatic hexafunctional urethane acrylate polymer, and ethoxylated pentaerythritol tetraacrylate.
  • the multifunctional monomer is used to form a cross-linked network under ultraviolet light to block the corrosion of the color photoresist by the developer in the subsequent manufacturing process.
  • the mass percentage of the initiator in the color photoresist is 0.2% to 0.6%
  • the initiator is an acetophenone derivative
  • the initiator is used to make the color photoresist Glue generates active free radicals when exposed to ultraviolet light.
  • the solvent accounts for 70% to 80% of the mass percentage of the color photoresist, and the solvent may be propylene glycol methyl ether acetate, ethyl 3-ethoxypropionate, or propylene glycol methyl ether (PM).
  • the solvent is preferably propylene glycol methyl ether acetate in the embodiment of the present application.
  • the colorant accounts for 10% to 16% of the mass percentage of the color photoresist; the colorant is selected from red benzimidazolone derivatives color particles, green phthalocyanine green derivatives color particles , At least one of blue phthalocyanine blue derivative color particles and yellow benzidine derivative color particles.
  • the color filter layer includes a red filter layer, a blue filter layer, and a green filter layer.
  • FIG. 3 it is a schematic diagram of the structure of the color photoresist and the carrier substrate under ultraviolet light according to the embodiment of the present application.
  • the color photoresist 32 is coated on the carrier substrate 31 for ultraviolet light, and a patterned color film is formed.
  • the carrier substrate 31 is a silicon nitride glass substrate, the carrier substrate 31 undergoes an initial cleaning stage, and undergoes extreme ultraviolet irradiation to remove organic pollutants, and water washes to remove the fine particles on the surface of the carrier substrate 31.
  • the hydroxyl groups on the surface of the carrier substrate 31 increase.
  • the right side of FIG. 3 is an enlarged schematic diagram of the left side A of FIG. 3.
  • the portion of the color photoresist 32 that is exposed to ultraviolet light contains a trace non-metallic catalyst (preferably trifluoroacetic acid, the The non-metallic catalyst accounts for 0.1% to 0.2% of the color photoresist by mass), which acts as a catalyst to catalyze the oxygen-containing groups of part of the organic polymer molecules 321 in the color photoresist 32 and the carrier substrate
  • the hydroxyl groups on 31 react to form a bond to form a polymer ether compound; then, the color photoresist 32 is pre-baked, exposed and developed to obtain a patterned color film, the patterned color film After hard baking, the color filter is finally obtained.
  • part of the organic polymer molecules 321 in the color photoresist 32 and the hydroxyl group-containing organics on the carrier substrate 31 are in the non-metallic catalyst (preferably trifluoroacetic acid, the non-metallic catalyst
  • the mass percentage of the color photoresist is 0.1% to 0.2%)
  • the chemical reaction equation under the condition of 15°C and ultraviolet light is as follows:
  • the side chain portion of the polymer substituent in the color photoresist 32 is a trifluoromethanesulfonyl group (-Tf).
  • ROH refers to an organic substance containing a hydroxyl group on the surface of the supporting substrate 31 (silicon nitride glass substrate), and the R group is a free substituent bonded to the hydroxyl group on the surface of the supporting substrate 31.
  • non-metal catalyst Since the non-metal catalyst has low catalytic efficiency compared with the transition metal catalyst, only individual sites with strong reaction activity (part of the organic polymer molecules 321) are reacted, which not only strengthens the adhesion, but also does not excessively cause the color Residual photoresist problem. Transition metal catalysts are sensitive to water and oxygen, and metal residues are prone to occur, and are not suitable for commercial production applications. The non-metal catalysts solve all the above metal-related problems and are suitable for commercial applications of color resistance.
  • FIG. 4 it is a schematic diagram of the improvement of the adhesion of the color photoresist 42 on the carrier substrate 41 according to the embodiment of the application. It can be seen from the figure that the addition of a small amount of non-metallic catalyst in the formula of the color photoresist 42 can effectively improve the poor adhesion of the color photoresist 42 on the carrier substrate 41.
  • a small amount of non-metal catalysis is added during the configuration of the color photoresist, which can catalyze color lithography under ultraviolet light.
  • the individual spots of the glue react with the carrier substrate made of silicon nitride to further improve the adhesion of the color photoresist on the carrier substrate to the carrier substrate.

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Abstract

一种彩色光刻胶、使用彩色光刻胶制备的彩色滤光片(10)及制备方法，彩色光刻胶包括固化树脂、多官能基单体、起始剂、溶剂、着色剂以及添加剂；其中，添加剂为非金属催化剂，非金属催化剂能催化碳碳单键类化合物、碳氧单键类化合物以及碳氮单键类化合物相互之间在紫外光照下发生交叉偶联光反应。

Description

彩色光刻胶、彩色滤光片及其制备方法 技术领域
本申请涉及显示技术领域，尤其涉及一种彩色光刻胶、彩色滤光片及其制备方法。
背景技术
液晶显示器(LCD)是目前市场中应用最广泛的现实产品，它主要包括彩膜基板、液晶、阵列基板三个组成部分。彩膜基板上的RGB彩色光刻胶分别对应阵列基板上的三个子像素，三个子像素合成一个像素。液晶显示器的色彩显示主要是依靠彩膜基板上RGB三色像素点实现的。RGB三色像素点则是通过RGB三种不同体系的光阻成膜，形成设计需求的图案结构，以协助显色的。
目前，彩色滤光片制备用的氮化硅材质的承载基板会经过极紫外线照射以及水洗等前清洗过程，此时承载基板表面会增多羟基基团，导致承载基板的亲水性增强，使位于承载基板上的彩色光刻胶附着力不佳，产生剥落现象。若关闭极紫外线照射以及水洗等前清洗过程，则后制程容易出现彩色光刻胶残留问题。现有的优化方法为一方面调节色阻显色染料晶体颗粒成分外围包覆的聚合物的酸值或者单体的官能度进行改善，但是会影响制程上的其他关联特性值，需重新评估优化组成成分及比例；另一方面可以通过改变添加剂硅氧烷等与氮化硅材质的承载基板作用力强的化合物剂量等调节附着力，但是这些有机无机杂化的小分子在制程加热时由于耐热性不良容易导致在预烘烤制程中产生升华物问题，给商业化生产带来制程后处理及仪器维护问题。
综上所述，现有的彩色光刻胶、彩色滤光片及其制备方法，由于承载基板经过极紫外线照射以及水洗后表面会增多羟基基团，导致承载基板的亲水性增强，使位于承载基板上的彩色光刻胶附着力不佳，进而产生剥落现象。
技术问题
现有的彩色光刻胶、彩色滤光片及其制备方法，由于承载基板经过极紫外线照射以及水洗后表面会增多羟基基团，导致承载基板的亲水性增强，使位于承载基板上的彩色光刻胶附着力不佳，进而产生剥落现象。
技术解决方案
第一方面，本申请实施例提供一种彩色光刻胶，所述彩色光刻胶包括固化树脂、多官能基单体、起始剂、溶剂、着色剂以及添加剂；
其中，所述添加剂为非金属催化剂，所述非金属催化剂能催化碳碳单键类化合物、碳氧单键类化合物以及碳氮单键类化合物相互之间在紫外光照下发生交叉偶联光反应。
在所述的彩色光刻胶中，所述非金属催化剂占所述彩色光刻胶的质量百分比为0.1％～0.2％，所述非金属催化剂为三氟乙酸。
在所述的彩色光刻胶中，所述固化树脂占所述彩色光刻胶的质量百分比为5％～8％，所述多官能基单体占所述彩色光刻胶的质量百分比为5％～8％，所述起始剂占所述彩色光刻胶的质量百分比为0.2％～0.6％，所述溶剂占所述彩色光刻胶的质量百分比为70％～80％，所述着色剂占所述彩色光刻胶的质量百分比为10％～16％。
在所述的彩色光刻胶中，所述固化树脂为丙烯酸树脂，所述多官能基单体为多羟基醇丙烯酸酯，所述起始剂为苯乙酮衍生物，所述溶剂为丙二醇甲醚醋酸酯，所述着色剂选自红色苯并咪唑酮类衍生物颜色颗粒、绿色酞菁绿类衍生物颜色颗粒、蓝色酞菁蓝类衍生物颜色颗粒以及黄色联苯胺类衍生物颜色颗粒中的至少一种。
第二方面，本申请实施例还提供一种彩色滤光片，所述彩色滤光片包括：承载基板、设置在所述承载基板上的黑色矩阵以及设置在所述承载基板上并被所述黑色矩阵隔开的区域内的彩色滤光层；
其中，所述彩色滤光层经由彩色光刻胶形成，所述彩色光刻胶包括固化树脂、多官能基单体、起始剂、溶剂、着色剂以及添加剂，所述添加剂为非金属催化剂，所述非金属催化剂能催化碳碳单键类化合物、碳氧单键类化合物以及 碳氮单键类化合物相互之间在紫外光照下发生交叉偶联光反应。
在所述的彩色滤光片中，所述非金属催化剂占所述彩色光刻胶的质量百分比为0.1％～0.2％，所述非金属催化剂为三氟乙酸。
第三方面，本申请实施例又提供一种上述彩色滤光片的制备方法，所述方法包括：
S10，将黑色光阻剂涂布于一承载基板上，形成黑色矩阵；
S20，在所述承载基板上被所述黑色矩阵隔开的区域内形成彩色滤光层，得到彩色滤光片。
在所述的彩色滤光片的制备方法中，所述S20还包括：
S201，在所述承载基板上被所述黑色矩阵隔开的区域内涂布彩色光刻胶，所述彩色光刻胶包括固化树脂、多官能基单体、起始剂、溶剂、着色剂以及添加剂，所述添加剂为非金属催化剂，所述添加剂为非金属催化剂，所述非金属催化剂能催化碳碳单键类化合物、碳氧单键类化合物以及碳氮单键类化合物相互之间在紫外光照下发生交叉偶联光反应；
S202，对所述彩色光刻胶进行预烘烤处理；
S203，使用一光罩对所述彩色光刻胶进行曝光并显影，得到图案化的彩膜；
S204，对所述图案化的彩膜进行硬烘烤处理，使所述图案化的彩膜固化，形成彩色滤光层，最后得到彩色滤光片。
在所述的彩色滤光片的制备方法中，所述S201中，所述非金属催化剂占所述彩色光刻胶的质量百分比为0.1％～0.2％，所述非金属催化剂为三氟乙酸。
在所述的彩色滤光片的制备方法中，所述彩色滤光层包括红色滤光层、蓝色滤光层以及绿色滤光层。
有益效果
相较于现有技术，本申请提供的彩色光刻胶、彩色滤光片及其制备方法，在彩色光刻胶配置过程中加入小剂量的非金属催化，能在紫外光照下催化彩色光刻胶的个别点位与氮化硅材质的承载基板反应，进一步提升承载基板上的彩色光刻胶在承载基板上的附着力。
附图说明
图1为本申请实施例提供的彩色滤光片的结构示意图。
图2为本申请实施例提供的彩色滤光片的制备方法的流程示意图。
图3为本申请实施例的彩色光刻胶在紫外光照下与承载基板的结构示意图。
图4为本申请实施例的彩色光刻胶在承载基板上附着力改善状况示意图。
本发明的实施方式
本申请提供一种彩色光刻胶、彩色滤光片及其制备方法，为使本申请的目的、技术方案及效果更加清楚、明确，以下参照附图并举实施例对本申请进一步详细说明。应当理解，此处所描述的具体实施例仅用以解释本申请，并不用于限定本申请。
具体的，本申请实施例提供一种彩色光刻胶，所述彩色光刻胶包括固化树脂、多官能基单体、起始剂、溶剂、着色剂以及添加剂；
其中，所述添加剂为非金属催化剂，所述非金属催化剂能催化碳碳单键类化合物、碳氧单键类化合物以及碳氮单键类化合物相互之间在紫外光照下发生交叉偶联光反应。
优选地，所述非金属催化剂占所述彩色光刻胶的质量百分比为0.1％～0.2％，所述非金属催化剂为三氟乙酸，所述非金属催化剂的作用主要是催化彩色光刻胶中的聚合物在紫外光照下与承载基板上的羟基基团成键，提升承载基板上的彩色光刻胶在承载基板上的附着力。
优选地，所述固化树脂占所述彩色光刻胶的质量百分比为5％～8％，所述树脂基体带有双键结构，所述固化树脂选自丙烯酸树脂，环氧丙烯酸树脂，聚酯丙烯酸树脂，不饱和聚酯，聚氨酯丙烯酸树脂，聚醚丙烯酸树脂，丙烯酸化聚磷酸酯中的至少一种，所述固化树脂优选为丙烯酸树脂。其中，所述固化树脂通过高聚物分子量控制彩色光刻胶的机械强度。
优选地，所述多官能基单体占所述彩色光刻胶的质量百分比为5％～8％，所述多官能基单体为多羟基醇丙烯酸酯，所述多官能基单体优选为二季戊四醇 五丙烯酸酯、二季戊四醇六丙烯酸酯、脂肪族六官能聚氨酯丙烯酸酯聚合物、乙氧化季戊四醇四丙烯酸酯中的至少一种。所述多官能基单体用于在紫外光照下形成交联网络，阻挡后续制程中显影液对所述彩色光刻胶的侵蚀。
优选地，所述起始剂占所述彩色光刻胶的质量百分比为0.2％～0.6％，所述起始剂为苯乙酮衍生物，所述起始剂用于使所述彩色光刻胶经紫外光照生成活性自由基。
优选地，所述溶剂占所述彩色光刻胶的质量百分比为70％～80％，所述溶剂可以为丙二醇甲醚醋酸酯、3-乙氧基丙酸乙酯、丙二醇甲醚(PM)、乙酸乙二醇乙醚中一种或几种混合溶剂，所述溶剂在本申请实施例中优选为丙二醇甲醚醋酸酯。
优选地，所述着色剂占所述彩色光刻胶的质量百分比为10％～16％；所述着色剂选自红色苯并咪唑酮类衍生物颜色颗粒、绿色酞菁绿类衍生物颜色颗粒、蓝色酞菁蓝类衍生物颜色颗粒以及黄色联苯胺类衍生物颜色颗粒中的至少一种。
本申请实施例提供的彩色光刻胶的配方中，添加了一种微量的非金属催化剂，所述非金属催化剂能催化后续制程中所述彩色光刻胶与承载基板上的羟基基团发生反应，提高了所述彩色光刻胶在所述承载基板上的附着力。
如图1所示，本申请实施例还提供一种使用上述彩色光刻胶制备的彩色滤光片。其中，所述彩色滤光片10包括：承载基板11、设置在所述承载基板11上的黑色矩阵12以及设置在所述承载基板11上并被所述黑色矩阵13隔开的区域内的彩色滤光层13；
其中，所述彩色滤光层13经由彩色光刻胶形成，所述彩色光刻胶包括固化树脂、多官能基单体、起始剂、溶剂、着色剂以及添加剂，所述添加剂为非金属催化剂，所述非金属催化剂能催化碳碳单键类化合物、碳氧单键类化合物以及碳氮单键类化合物相互之间在紫外光照下发生交叉偶联光反应。
优选地，所述非金属催化剂占所述彩色光刻胶的质量百分比为0.1％～0.2％，所述非金属催化剂为三氟乙酸，所述非金属催化剂的作用主要是催化彩色光刻胶中的聚合物在紫外光照下与承载基板上的羟基基团成键，提升承载基板上的彩色光刻胶在承载基板上的附着力。
优选地，所述固化树脂占所述彩色光刻胶的质量百分比为5％～8％，所述树脂基体带有双键结构，所述固化树脂选自丙烯酸树脂，环氧丙烯酸树脂，聚酯丙烯酸树脂，不饱和聚酯，聚氨酯丙烯酸树脂，聚醚丙烯酸树脂，丙烯酸化聚磷酸酯中的至少一种，所述固化树脂优选为丙烯酸树脂。其中，所述固化树脂通过高聚物分子量控制彩色光刻胶的机械强度。
优选地，所述多官能基单体占所述彩色光刻胶的质量百分比为5％～8％，所述多官能基单体为多羟基醇丙烯酸酯，所述多官能基单体优选为二季戊四醇五丙烯酸酯、二季戊四醇六丙烯酸酯、脂肪族六官能聚氨酯丙烯酸酯聚合物、乙氧化季戊四醇四丙烯酸酯中的至少一种。所述多官能基单体用于在紫外光照下形成交联网络，阻挡后续制程中显影液对所述彩色光刻胶的侵蚀。
优选地，所述起始剂占所述彩色光刻胶的质量百分比为0.2％～0.6％，所述起始剂为苯乙酮衍生物，所述起始剂用于使所述彩色光刻胶经紫外光照生成活性自由基。
优选地，所述溶剂占所述彩色光刻胶的质量百分比为70％～80％，所述溶剂可以为丙二醇甲醚醋酸酯、3-乙氧基丙酸乙酯、丙二醇甲醚(PM)、乙酸乙二醇乙醚中一种或几种混合溶剂，所述溶剂在本申请实施例中优选为丙二醇甲醚醋酸酯。
优选地，所述着色剂占所述彩色光刻胶的质量百分比为10％～16％；所述着色剂选自红色苯并咪唑酮类衍生物颜色颗粒、绿色酞菁绿类衍生物颜色颗粒、蓝色酞菁蓝类衍生物颜色颗粒以及黄色联苯胺类衍生物颜色颗粒中的至少一种。
优选地，所述彩色滤光层13包括红色滤光层131、蓝色滤光层132以及绿色滤光层133。
本申请实施例所提供的所述彩色滤光层13，由于采用含有微量的非金属催化剂配方的彩色光刻胶，所述非金属催化剂能催化所述彩色光刻胶上个别基团与所述承载基板11上的羟基基团发生反应，进一步提高了所述彩色光刻胶在所述承载基板11上的附着力。
如图2所示，本申请实施例又提供了一种如所述彩色滤光片10的制备方法，所述方法包括：
S10，将黑色光阻剂涂布于一承载基板上，形成黑色矩阵。
具体地，所述S10还包括：
首先，提供一承载基板，所述承载基板的材质优选为氮化硅玻璃基板。之后将所述承载基板经过极紫外线照射并水洗等清洗过程，此时所述承载基板表面会增加多个羟基基团，导致亲水性增强。若不对所述承载基板进行极紫外线照射并水洗等清洗步骤，则后续制程容易出现彩色光刻胶残留问题。然后，将黑色光阻剂涂布于所述承载基板上，形成黑色矩阵。
S20，在所述承载基板上被所述黑色矩阵隔开的区域内形成彩色滤光层，得到彩色滤光片。
具体地，所述S20还包括：
首先，配置形成彩色光刻胶的彩色光阻液，所述彩色光刻胶包括固化树脂、多官能基单体、起始剂、溶剂、着色剂以及添加剂，所述添加剂为非金属催化剂，所述添加剂为非金属催化剂，所述非金属催化剂能催化碳碳单键类化合物、碳氧单键类化合物以及碳氮单键类化合物相互之间在紫外光照下发生交叉偶联光反应。
之后，对所述彩色光刻胶进行预烘烤处理。其中，所述预烘烤处理的温度为20℃～50℃，预烘烤处理时间为30s～120s。
然后，使用一光罩对所述彩色光刻胶进行曝光并显影，得到图案化的彩膜；
之后，对所述图案化的彩膜进行硬烘烤处理，使所述图案化的彩膜固化，形成彩色滤光层，最后得到彩色滤光片。其中，所述硬烘烤处理的温度为20℃～100℃，硬烘烤处理时间为5min～30min。
优选地，所述非金属催化剂占所述彩色光刻胶的质量百分比为0.1％～0.2％，所述非金属催化剂为三氟乙酸，微量三氟乙酸溶于水/丙酮＝9/2的溶剂中，溶解好后加入待配置的光阻液中，所述非金属催化剂的作用主要是催化彩色光刻胶中的聚合物在紫外光照下与承载基板上的羟基基团成键，提升承载基板上的彩色光刻胶在承载基板上的附着力。
优选地，所述固化树脂占所述彩色光刻胶的质量百分比为5％～8％，所述树脂基体带有双键结构，所述固化树脂选自丙烯酸树脂，环氧丙烯酸树脂，聚酯丙烯酸树脂，不饱和聚酯，聚氨酯丙烯酸树脂，聚醚丙烯酸树脂，丙烯酸化 聚磷酸酯中的至少一种，所述固化树脂优选为丙烯酸树脂。其中，所述固化树脂通过高聚物分子量控制彩色光刻胶的机械强度。
优选地，所述多官能基单体占所述彩色光刻胶的质量百分比为5％～8％，所述多官能基单体为多羟基醇丙烯酸酯，所述多官能基单体优选为二季戊四醇五丙烯酸酯、二季戊四醇六丙烯酸酯、脂肪族六官能聚氨酯丙烯酸酯聚合物、乙氧化季戊四醇四丙烯酸酯中的至少一种。所述多官能基单体用于在紫外光照下形成交联网络，阻挡后续制程中显影液对所述彩色光刻胶的侵蚀。
优选地，所述起始剂占所述彩色光刻胶的质量百分比为0.2％～0.6％，所述起始剂为苯乙酮衍生物，所述起始剂用于使所述彩色光刻胶经紫外光照生成活性自由基。
优选地，所述溶剂占所述彩色光刻胶的质量百分比为70％～80％，所述溶剂可以为丙二醇甲醚醋酸酯、3-乙氧基丙酸乙酯、丙二醇甲醚(PM)、乙酸乙二醇乙醚中一种或几种混合溶剂，所述溶剂在本申请实施例中优选为丙二醇甲醚醋酸酯。
优选地，所述着色剂占所述彩色光刻胶的质量百分比为10％～16％；所述着色剂选自红色苯并咪唑酮类衍生物颜色颗粒、绿色酞菁绿类衍生物颜色颗粒、蓝色酞菁蓝类衍生物颜色颗粒以及黄色联苯胺类衍生物颜色颗粒中的至少一种。
优选地，所述彩色滤光层包括红色滤光层、蓝色滤光层以及绿色滤光层。
如图3所示，为本申请实施例的彩色光刻胶在紫外光照下与承载基板的结构示意图。此刻彩色光刻胶32涂布于承载基板31上进行紫外光照，并形成图案化的彩膜。其中，由于所述承载基板31为氮化硅玻璃基板，所述承载基板31会经历初始清洗阶段，经过极紫外线照射去除有机污染物，以及水洗去掉所述承载基板31表面的微小颗粒，此时所述承载基板31表面的羟基基团增多。
其中，图3右侧为图3左侧A处的放大示意图。具体地，在所述彩色光刻胶32经过紫外曝光形成图案化彩膜阶段时，被紫外光照到的部分所述彩色光刻胶32中的微量非金属催化剂(优选为三氟乙酸，所述非金属催化剂占所述彩色光刻胶的质量百分比为0.1％～0.2％)起催化作用，催化所述彩色光刻胶32内的部分有机聚合物分子321的含氧基团与所述承载基板31上的羟基基团 反应成键，生成聚合物醚类化合物；之后对所述彩色光刻胶32进行预烘烤处理、曝光并显影，得到图案化的彩膜，所述图案化的彩膜经过硬烘烤处理，最后得到所述彩色滤光片。
具体地，所述彩色光刻胶32内的部分有机聚合物分子321与所述承载基板31上的含羟基基团的有机物在所述非金属催化剂(优选为三氟乙酸，所述非金属催化剂占所述彩色光刻胶的质量百分比为0.1％～0.2％)在15℃并且紫外光照的条件下的化学反应方程式如下：
Figure PCTCN2019126878-appb-000001
具体地，所述彩色光刻胶32内聚合物取代基侧链部分为三氟甲磺酰基(trifluoromethanesulfonyl group，-Tf)。ROH指所述承载基板31表面(氮化硅玻璃基板)含有羟基基团的有机物，R基团为所述承载基板31表面与羟基基团结合的自由取代基。
由于所述非金属催化剂与过渡金属催化剂相比催化效率低，所以只是个别反应活性强的点位(部分有机聚合物分子321)进行反应，既加强了附着力，又不会过度造成所述彩色光刻胶的残留问题。过渡金属催化剂对水氧敏感，且易出现金属残留，不适宜商业化生产应用，所述非金属催化剂则解决了以上所有金属相关问题，适宜色阻商业应用。
如图4所示，为本申请实施例的彩色光刻胶42在承载基板41上附着力改善状况示意图。由图可知，在所述彩色光刻胶42的配方中添加的微量非金属催化剂，能有效改善所述彩色光刻胶42在所述承载基板41上附着力不佳的情况。
综上所述，本申请实施例提供的彩色光刻胶、彩色滤光片及其制备方法，在彩色光刻胶配置过程中加入小剂量的非金属催化，能在紫外光照下催化彩色光刻胶的个别点位与氮化硅材质的承载基板反应，进一步提升承载基板上的彩色光刻胶在承载基板上的附着力。
可以理解的是，对本领域普通技术人员来说，可以根据本申请的技术方案及其发明构思加以等同替换或改变，而所有这些改变或替换都应属于本申请所附的权利要求的保护范围。

Claims (10)

  1. 一种彩色光刻胶，其中，所述彩色光刻胶包括固化树脂、多官能基单体、起始剂、溶剂、着色剂以及添加剂；
    其中，所述添加剂为非金属催化剂，所述非金属催化剂能催化碳碳单键类化合物、碳氧单键类化合物以及碳氮单键类化合物相互之间在紫外光照下发生交叉偶联光反应。
  2. 如权利要求1所述的彩色光刻胶，其中，所述非金属催化剂占所述彩色光刻胶的质量百分比为0.1％～0.2％，所述非金属催化剂为三氟乙酸。
  3. 如权利要求2所述的彩色光刻胶，其中，所述固化树脂占所述彩色光刻胶的质量百分比为5％～8％，所述多官能基单体占所述彩色光刻胶的质量百分比为5％～8％，所述起始剂占所述彩色光刻胶的质量百分比为0.2％～0.6％，所述溶剂占所述彩色光刻胶的质量百分比为70％～80％，所述着色剂占所述彩色光刻胶的质量百分比为10％～16％。
  4. 如权利要求3所述的彩色光刻胶，其中，所述固化树脂为丙烯酸树脂，所述多官能基单体为多羟基醇丙烯酸酯，所述起始剂为苯乙酮衍生物，所述溶剂为丙二醇甲醚醋酸酯，所述着色剂选自红色苯并咪唑酮类衍生物颜色颗粒、绿色酞菁绿类衍生物颜色颗粒、蓝色酞菁蓝类衍生物颜色颗粒以及黄色联苯胺类衍生物颜色颗粒中的至少一种。
  5. 一种彩色滤光片，其中，所述彩色滤光片包括：承载基板、设置在所述承载基板上的黑色矩阵以及设置在所述承载基板上并被所述黑色矩阵隔开的区域内的彩色滤光层；
    其中，所述彩色滤光层经由彩色光刻胶形成，所述彩色光刻胶包括固化树脂、多官能基单体、起始剂、溶剂、着色剂以及添加剂，所述添加剂为非金属催化剂，所述非金属催化剂能催化碳碳单键类化合物、碳氧单键类化合物以及碳氮单键类化合物相互之间在紫外光照下发生交叉偶联光反应。
  6. 如权利要求5所述的彩色滤光片，其中，所述非金属催化剂占所述彩色光刻胶的质量百分比为0.1％～0.2％，所述非金属催化剂为三氟乙酸。
  7. 一种如权利要求5所述彩色滤光片的制备方法，其中，所述方法包括：
    S10，将黑色光阻剂涂布于一承载基板上，形成黑色矩阵；
    S20，在所述承载基板上被所述黑色矩阵隔开的区域内形成彩色滤光层，得到彩色滤光片。
  8. 如权利要求7所述彩色滤光片的制备方法，其中，所述S20还包括：
    S201，在所述承载基板上被所述黑色矩阵隔开的区域内涂布彩色光刻胶，所述彩色光刻胶包括固化树脂、多官能基单体、起始剂、溶剂、着色剂以及添加剂，所述添加剂为非金属催化剂，所述添加剂为非金属催化剂，所述非金属催化剂能催化碳碳单键类化合物、碳氧单键类化合物以及碳氮单键类化合物相互之间在紫外光照下发生交叉偶联光反应；
    S202，对所述彩色光刻胶进行预烘烤处理；
    S203，使用一光罩对所述彩色光刻胶进行曝光并显影，得到图案化的彩膜；
    S204，对所述图案化的彩膜进行硬烘烤处理，使所述图案化的彩膜固化，形成彩色滤光层，最后得到彩色滤光片。
  9. 如权利要求8所述彩色滤光片的制备方法，其中，所述S201中，所述非金属催化剂占所述彩色光刻胶的质量百分比为0.1％～0.2％，所述非金属催化剂为三氟乙酸。
  10. 如权利要求8所述彩色滤光片的制备方法，其中，所述彩色滤光层包括红色滤光层、蓝色滤光层以及绿色滤光层。
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