WO2021027102A1 - 柔性显示面板和柔性显示面板的制备方法 - Google Patents

柔性显示面板和柔性显示面板的制备方法 Download PDF

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Publication number
WO2021027102A1
WO2021027102A1 PCT/CN2019/115907 CN2019115907W WO2021027102A1 WO 2021027102 A1 WO2021027102 A1 WO 2021027102A1 CN 2019115907 W CN2019115907 W CN 2019115907W WO 2021027102 A1 WO2021027102 A1 WO 2021027102A1
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Prior art keywords
metal
flexible
metal oxide
layer
display panel
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PCT/CN2019/115907
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English (en)
French (fr)
Inventor
柯霖波
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Wuhan China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Wuhan China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Priority to US16/625,807 priority Critical patent/US11196014B2/en
Publication of WO2021027102A1 publication Critical patent/WO2021027102A1/zh
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • G09F9/301—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements flexible foldable or roll-able electronic displays, e.g. thin LCD, OLED
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/80—Manufacture or treatment specially adapted for the organic devices covered by this subclass using temporary substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/1201—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10—Substrates, e.g. flexible substrates
    • H10K77/111—Flexible substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/311—Flexible OLED
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Definitions

  • This application relates to the field of display technology, and in particular to a flexible display panel and a method for manufacturing the flexible display panel.
  • polyimide has a weak water and oxygen blocking ability, it is usually deposited on its surface with a uniform thickness of a single-layer or multi-layer stacked structure of inorganic film, or a multi-layer polyimide/inorganic film alternately stacked structure to block Water and oxygen, but the inorganic film has the problems of stress concentration and easy breakage when bending, which weakens the flexibility of the flexible display panel.
  • the existing flexible display panel has the technical problem that the inorganic thin film weakens the flexibility of the flexible substrate, which needs to be improved.
  • the present application provides a flexible display panel and a manufacturing method of the flexible display panel, so as to alleviate the technical problem that the inorganic film weakens the flexibility of the flexible substrate in the existing flexible display panel.
  • the present application provides a flexible display panel including a display area and a bending area, and the flexible display panel further includes:
  • the driving circuit layer is formed on one side of the flexible substrate
  • a light-emitting function layer formed on the side of the driving circuit layer away from the flexible substrate;
  • the flexible substrate includes a first flexible layer, a first barrier layer and a second flexible layer
  • the first barrier layer includes a first metal oxide located in a display area and a first metal located in a bending area. And the first metal oxide layer.
  • the material of the first metal is aluminum.
  • the area of the first metal oxide and the bending area are equal.
  • a plurality of rows of the first metal oxide arranged in a first direction are formed in the bending area.
  • a plurality of the first metal oxides distributed in an array are formed in the bending area.
  • the thickness of the first metal oxide is less than a quarter of the thickness of the first barrier layer.
  • the flexible substrate further includes a second barrier layer formed on a side of the second flexible layer away from the first barrier layer, and the second barrier layer
  • the barrier layer includes a stack of a second metal and a second metal oxide.
  • the second metal oxide is formed in at least one of the bending area and the display area.
  • the thickness of the second metal oxide is equal to the thickness of the first metal oxide in the bending zone.
  • the application also provides a method for manufacturing a flexible display panel, including:
  • a flexible substrate is prepared on one side of the substrate, the flexible substrate includes a first flexible layer, a first barrier layer, and a second flexible layer, and the first barrier layer includes a first metal oxide located in the display area , And the first metal and the first metal oxide stack located in the bending zone;
  • the flexible substrate is prepared on one side of the substrate, and the flexible substrate includes a first flexible layer, a first barrier layer, and a second flexible layer.
  • the step of a barrier layer including a first metal oxide in the display area and a stack of the first metal and the first metal oxide in the bending area includes:.
  • the step of depositing the first metal on the first flexible layer, the first metal being located in the display area and the bending area includes: forming the second metal by physical vapor deposition.
  • One metal is
  • the step of depositing the first metal on the first flexible layer, the first metal being located in the display area and the bending area includes: in the first flexible layer Deposit aluminum on it.
  • the patterned oxidation of the first metal is performed to oxidize the first metal in the display area to form a first metal oxide, and in the bending area Oxidize to form a first metal and a first metal oxide stack, and the step of preparing the first barrier layer includes: patterning and oxidizing the first metal, and forming all the areas in the bending area equal to the area of the bending area.
  • the first metal oxide is
  • the patterned oxidation of the first metal is performed to oxidize the first metal in the display area to form a first metal oxide, and in the bending area Oxidation forms a first metal and a first metal oxide stack, and the step of preparing the first barrier layer includes: patterning and oxidizing the first metal, forming a plurality of rows in the bending area and arranging in the first direction The first metal oxide.
  • the patterned oxidation of the first metal is performed to oxidize the first metal in the display area to form a first metal oxide, and in the bending area Oxidize to form a first metal and a first metal oxide stack, and the step of preparing a first barrier layer includes: patterning and oxidizing the first metal to form a plurality of arrays of the The first metal oxide.
  • the patterned oxidation of the first metal is performed to oxidize the first metal in the display area to form a first metal oxide, and in the bending area Oxidize to form a first metal and a first metal oxide stack, and the step of preparing a first barrier layer includes: patterning and oxidizing the first metal to make the thickness of the first metal oxide formed in the bending zone It is less than a quarter of the thickness of the first barrier layer.
  • the flexible substrate is prepared on one side of the substrate, and the flexible substrate includes a first flexible layer, a first barrier layer, and a second flexible layer.
  • the method further includes: preparing a second barrier on the second flexible layer
  • the second barrier layer includes a stack of a second metal and a second metal oxide.
  • the step of preparing a second barrier layer on the second flexible layer, the second barrier layer including a stack of a second metal and a second metal oxide includes : In at least one of the bending area and the display area, the second metal is oxidized to form a stack of the second metal and the second metal oxide.
  • the step of preparing a second barrier layer on the second flexible layer, the second barrier layer including a stack of a second metal and a second metal oxide includes : Use natural oxidation or heating oxidation to form the second metal oxide.
  • the present application provides a flexible display panel and a method for manufacturing a flexible display panel.
  • the flexible display panel includes a display area and a bending area.
  • the flexible display panel further includes a flexible substrate, a driving circuit layer, and a light-emitting function layer.
  • the driving circuit layer is formed on One side of the flexible substrate; the light-emitting function layer is formed on the side of the driving circuit layer away from the flexible substrate; wherein, the flexible substrate includes a first flexible layer, a first barrier layer, and a second
  • the flexible layer, the first barrier layer includes a metal oxide located in the display area, and a stack of metal and metal oxide located in the bending area.
  • the metal parts in the bending area are oxidized to form metal oxides.
  • the metal oxides can play a role in isolating water and oxygen. Improve the bending performance of the display panel.
  • the metal oxide can improve the adhesion with the second flexible layer, thereby enhancing the stability in the bending state.
  • the metal oxide in the display area and the bending area work together to make the flexible display panel At the same time, it has good water and oxygen insulation ability and bending performance, which improves the technical problem of the inorganic film weakening the flexibility of the flexible substrate.
  • FIG. 1 is a schematic diagram of the first structure of a flexible display panel provided by an embodiment of the application
  • FIG. 2 is a schematic diagram of a curved structure of a flexible display panel provided by an embodiment of the application
  • FIG. 3 is a schematic diagram of a second structure of a flexible display panel provided by an embodiment of the application.
  • FIG. 4 is a schematic flowchart of a method for manufacturing a flexible display panel provided by an embodiment of the application
  • FIG. 5 is a schematic diagram of the first stage of a method for manufacturing a flexible display panel provided by an embodiment of the application;
  • FIG. 6 is a schematic diagram of the second stage of the manufacturing method of the flexible display panel provided by the embodiment of the application.
  • FIG. 7 is a schematic diagram of the third stage of the manufacturing method of the flexible display panel provided by the embodiment of the application.
  • FIG. 8 is a schematic diagram of the fourth stage of the manufacturing method of the flexible display panel provided by the embodiment of the application.
  • FIG. 9 is a schematic diagram of the fifth stage of the manufacturing method of the flexible display panel provided by the embodiment of the application.
  • FIG. 10 is a schematic diagram of the sixth stage of the manufacturing method of the flexible display panel provided by the embodiment of the application.
  • FIG. 11 is a schematic diagram of the seventh stage of the manufacturing method of the flexible display panel provided by the embodiment of the application.
  • FIG. 12 is a schematic diagram of the eighth stage of the manufacturing method of the flexible display panel provided by the embodiment of the application.
  • FIG. 13 is a schematic diagram of the ninth stage of the manufacturing method of the flexible display panel provided by the embodiment of the application.
  • the present application provides a flexible display panel and a manufacturing method of the flexible display panel, so as to alleviate the technical problem that the inorganic film weakens the flexibility of the flexible substrate in the existing flexible display panel.
  • the present application provides a flexible display panel including a display area 100 and a bending area 200.
  • the flexible display panel further includes a flexible substrate 10, a driving circuit layer 20 and a light-emitting function layer 30.
  • the flexible substrate 10 includes a first flexible layer 12, a first barrier layer 13 and a second flexible layer 14.
  • the first barrier layer 13 includes a first metal oxide 131 located in the display area 100, and a first metal oxide 131 located in the bending area 100.
  • a metal 132 and a first metal oxide 131 are stacked.
  • the driving circuit layer 20 is formed on the side of the flexible substrate 10.
  • the light-emitting function layer 30 is formed on the side of the driving circuit layer 20 away from the flexible substrate 10.
  • first flexible substrate 12 and the second flexible substrate 14 may be polyimide or flexible glass.
  • the material of the first metal 132 is metallic aluminum, and the formed first metal oxide 131 is alumina.
  • the first metal 132 is formed on the first flexible layer 12 by means of physical vapor deposition.
  • the first barrier layer 13 includes a first metal oxide 131, that is, metal aluminum is completely oxidized to form aluminum oxide.
  • the area of the first metal oxide 131 is equal to the area of the display area 100, and the thickness is the same as that of the first metal oxide.
  • the barrier layer 13 has the same thickness, the formed first metal oxide 131 is a dense aluminum oxide layer, and the aluminum oxide layer has a good ability to isolate water and oxygen.
  • the first barrier layer 13 includes a stack of the first metal 132 and the first metal oxide 131, that is, the metal aluminum is oxidized to aluminum oxide only on the side away from the first flexible layer 12.
  • the thickness of the oxide 131 is smaller than the thickness of the first barrier layer 13.
  • the thickness of the first metal oxide 131 in the first barrier layer 13 is less than a quarter of the thickness of the first barrier layer 13 in the bending region 200.
  • the first barrier layer 13 only forms a thin layer of the first metal oxide 131 in the bending area 200, most of which is the first metal 132.
  • the first metal 132 has excellent ductility and can achieve more excellent bending of the flexible display panel. performance.
  • the second flexible layer 14 is formed on the first barrier layer 13 and is in contact with the first metal oxide 131.
  • the first metal oxide 131 has a better surface roughness, and is directly connected to the first metal oxide.
  • the two flexible layers 14 are in contact, the first metal oxide 131 can improve the adhesion between the second flexible layer 14, and has excellent stability in high temperature and high humidity environments or under bending conditions, and can avoid bending caused by Problems such as increased internal stress and fracture of the inorganic layer.
  • the driving circuit layer 20 includes a driving circuit, and the light emitting function layer 30 is formed on the driving circuit layer 30, and the light emitting function layer 30 emits light under the driving of the driving circuit.
  • the shape of the first metal oxide 131 can be in various situations.
  • the area of the first metal oxide 131 and the bending zone 200 are equal.
  • the bending area 200 is first shielded, and the first metal 132 in the display area 100 is heated and oxidized, so that all the first metal 132 in the display area 100 oxidizes the first metal oxide 131
  • the oxidation method used is heating oxidation; then the first metal 132 in the bending zone 200 is oxidized to form a thin layer of the first metal oxide 131 on the surface of the first metal 132.
  • the oxidation method used is natural oxidation or heating
  • the first barrier layer 13 still has unoxidized aluminum in the bending region 200, that is, the remaining first metal 132. After the above steps, the first barrier layer 13 is obtained.
  • polyimide is usually used as the substrate of the flexible display panel.
  • Polyimide has excellent heat resistance, radiation resistance, chemical resistance, electrical insulation, mechanical properties, etc., but its own The water and oxygen resistance is weak.
  • a single-layer or multi-layer stacked inorganic film with uniform thickness is deposited on the surface of the polyimide, or a multi-layer polyimide/inorganic film alternately stacked structure is used.
  • These structures all have problems such as stress concentration of inorganic films, easy fracture in the bending zone, and easy separation at high temperature and high humidity.
  • This application does not use an inorganic film, but uses a flexible layer plus a metal barrier layer structure.
  • Metal aluminum has excellent ductility, difficult to react with water and oxygen at high temperatures, and is a good conductor of heat.
  • Aluminum oxide has stable chemical properties and is extremely excellent The water and oxygen resistance performance.
  • metal aluminum is completely oxidized into a dense aluminum oxide layer in the display area 100.
  • the aluminum oxide is chemically stable and has extremely excellent water and oxygen barrier properties.
  • the metal aluminum is partially oxidized into a thin aluminum oxide layer in the bending zone 200.
  • the unoxidized metal aluminum has better ductility than the inorganic film layer in the prior art, and can provide the flexibility of the flexible display panel.
  • the aluminum oxide layer has better surface roughness and can improve the adhesion with the second flexible layer 14.
  • the first metal 132 and the second The laminated structure of a metal oxide 131 makes the flexible display panel have excellent stability in a high temperature and high humidity environment or in a bent state.
  • a certain thickness of metal aluminum is deposited on the surface of the polyimide, so that the metal aluminum in the display area 100 is completely oxidized into a dense aluminum oxide layer, while the metal aluminum in the curved area only needs to be oxidized into a thin aluminum oxide layer, thereby Prepare the polyimide-alumina (PI-Al 2 O 3 ) composite film substrate, while maintaining the excellent performance of polyimide, the dense first metal oxide 131 is used to improve the water and oxygen resistance.
  • the metal 132 and the thin layer of the first metal oxide 131 improve the bending performance, and avoid problems such as increased internal stress, easy breakage during bending, and easy separation at high temperature and high humidity caused by the use of a multilayer polyimide/inorganic film alternate structure.
  • the flexibility of the flexible display panel is increased, which facilitates the formation of a hyperboloid folded flexible display panel.
  • the hyperboloid flexible display panel structure is shown in FIG. 2.
  • the flexible substrate 10 further includes a second barrier layer 15, and the second barrier layer 15 includes a stack of a second metal 152 and a second metal oxide 151.
  • the first metal 152 is also metallic aluminum
  • the second metal oxide 151 is also alumina.
  • the thickness of the second metal oxide 151 is equal to the thickness of the first metal oxide 131 in the bending region 200. Since the metal oxide 131 in the first barrier layer 13 has achieved water and oxygen barrier and excellent bending performance, the second barrier layer 15 only needs to be oxidized into a thin layer of the second metal oxide 151 to maintain the excellent water barrier. Oxygen performance and bending performance are optimized at the same time.
  • the second metal oxide 151 may be formed in at least one of the bending area 200 and the display area 100, that is, the second metal oxide 151 may be formed only in the display area 100. It may also be formed only in the bending area 200, or may be formed in the display area 100 and the bending area 200 at the same time. In this embodiment, the second metal oxide 151 is formed in the display area 100 and the bending area 200 at the same time, that is, the entire layer is arranged, and it can be formed by natural oxidation or heating oxidation.
  • the first metal oxide 131 in the bending zone 200 is mainly used to improve the adhesion with the second flexible layer 14. Therefore, except for FIG. 1, the first metal oxide 131 is formed in the entire bending zone 200. In addition to the oxide 131, there can be other arrangements in the bending area 200.
  • a plurality of rows of first metal oxides 131 arranged along the first direction X are formed in the bending area 200, that is, in the bending area 200, the metal aluminum is away from the first flexible layer Not all the surface of one side of 12 is oxidized to alumina, but only the oxidized part.
  • Alumina is a strip structure in the bending area 200, and a plurality of aluminas are arranged along the first direction X, where the first direction X is a flexible display When the panel is not bent, one display area 200 points in the direction of another display area 200 adjacent to it.
  • first metal oxides 131 There are gaps between adjacent first metal oxides 131.
  • a plurality of first metal oxides 131 are arranged at equal intervals.
  • the plurality of first metal oxides 131 may also be arranged at unequal intervals.
  • the first metal oxide 131 may be arranged to have a higher density in the middle area of the bending area 200 and a lower density in the edge area of the bending area 200.
  • the middle area of the bending area 200 is subjected to greater stress.
  • the adhesion with the second flexible layer 14 can be improved.
  • the bending performance of the flexible display panel is improved.
  • a plurality of first metal oxides 131 arranged in an array are formed in the bending area 200, that is, in the bending area 200, the surface of the metal aluminum away from the first flexible layer 12 is not all oxidized to Alumina is only partly oxidized.
  • Alumina has a block structure in the bending area 200.
  • the first metal oxides 131 of the block structure are distributed in an array in the bending area 200. It can be set with equal spacing or unequal spacing.
  • first metal oxide 131 in the bending area 200 is not limited to this, and other arrangements are also possible, such as grid-like distribution in the bending area 200, etc. Those skilled in the art can according to needs.
  • the shape of the first metal oxide 131 is designed to increase the adhesion with the second flexible layer 14 so as to reduce the internal stress during bending and improve the bending performance.
  • the present application also provides a method for manufacturing a flexible display panel, the specific steps include:
  • the flexible substrate includes a first flexible layer, a first barrier layer and a second flexible layer.
  • the first barrier layer includes metal oxide in the display area and in the bending area. Metal and metal oxide stacks;
  • a substrate 11 is provided. As shown in FIG. 5, the substrate 11 is a rigid substrate, usually glass. Since the substrate of the flexible display panel is a flexible substrate, the flexible substrate cannot be used directly, and must be prepared on the rigid substrate 11 first.
  • a flexible substrate 10 is prepared on one side of the substrate 11.
  • the flexible substrate 10 includes a first flexible layer 12, a first barrier layer 13, and a second flexible layer 14.
  • the first barrier layer 13 includes a display area 100 The first metal oxide 131, and the stack of the first metal 132 and the first metal oxide 131 in the bending region 200.
  • a first flexible layer 12 is prepared on a substrate 11.
  • the first flexible substrate 12 may be polyimide or flexible glass, which is formed on the substrate 11 by coating.
  • the first flexible substrate 12 is polyimide.
  • a first barrier layer 13 is formed on the first flexible layer 12.
  • the first metal 132 is located in the display area 100 and the bending area Within 200.
  • the first metal 132 is patterned and oxidized to oxidize the first metal 132 in the display area 100 to form a first metal oxide 131, and oxidize in the bending area 200 to form a stack of the first metal 132 and the first metal oxide 131 , Fabrication of the first barrier layer 13.
  • the bending area 200 is covered by the shielding member 40 first, and the first metal 132 in the display area 100 is oxidized.
  • the oxidation is performed by heating and oxidizing until all the areas in the display area 100 are oxidized.
  • the first metal 132 is oxidized into the first metal oxide 131, and the structure after oxidation is shown in FIG. 7.
  • the first metal 132 in the bending zone 200 is oxidized to form a thin layer of the first metal oxide 131 on the surface of the first metal 132.
  • the oxidation method used is natural oxidation or heating oxidation.
  • a barrier layer 13 still has unoxidized aluminum in the bending region 200, that is, the remaining first metal 132. After the above steps, the first barrier layer 13 is obtained, and the structure is shown in FIG. 8.
  • the first barrier layer 13 includes a stack of the first metal 132 and the first metal oxide 131, that is, the metal aluminum is oxidized to aluminum oxide only on the side away from the first flexible layer 12.
  • the thickness of the oxide 131 is smaller than the thickness of the first barrier layer 13.
  • the thickness of the first metal oxide 131 in the first barrier layer 13 is less than a quarter of the thickness of the first barrier layer 13 in the bending region 200.
  • the first barrier layer 13 only forms a thin layer of the first metal oxide 131 in the bending area 200, most of which is the first metal 132.
  • the first metal 132 has excellent ductility and can achieve more excellent bending of the flexible display panel. performance.
  • the shape of the first metal oxide 131 can be in various situations.
  • the area of the first metal oxide 131 and the bending zone 200 are equal.
  • a second flexible layer 14 is formed on the first barrier layer 13, and the material of the second flexible layer 14 is also polyimide.
  • the second flexible layer 14 is formed on the first barrier layer 13 and is in contact with the first metal oxide 131.
  • the first metal oxide 131 has a better surface roughness, and is directly connected to the first metal oxide.
  • the two flexible layers 14 are in contact, the first metal oxide 131 can improve the adhesion between the second flexible layer 14, and has excellent stability in high temperature and high humidity environments or under bending conditions, and can avoid bending caused by Problems such as increased internal stress and fracture of the inorganic layer.
  • polyimide is usually used as the substrate of the flexible display panel.
  • Polyimide has excellent heat resistance, radiation resistance, chemical resistance, electrical insulation, mechanical properties, etc., but its own The water and oxygen resistance is weak.
  • a single-layer or multi-layer stacked inorganic film with uniform thickness is deposited on the surface of the polyimide, or a multi-layer polyimide/inorganic film alternately stacked structure is used.
  • These structures all have problems such as stress concentration of inorganic films, easy fracture in the bending zone, and easy separation at high temperature and high humidity.
  • This application does not use an inorganic film, but uses a flexible layer plus a metal barrier layer structure.
  • Metal aluminum has excellent ductility, difficult to react with water and oxygen at high temperatures, and is a good conductor of heat.
  • Aluminum oxide has stable chemical properties and is extremely excellent The water and oxygen resistance performance.
  • metal aluminum is completely oxidized into a dense aluminum oxide layer in the display area 100.
  • the aluminum oxide is chemically stable and has extremely excellent water and oxygen barrier properties.
  • the metal aluminum is partially oxidized into a thin aluminum oxide layer in the bending zone 200.
  • the unoxidized metal aluminum has better ductility than the inorganic film layer in the prior art, and can provide the flexibility of the flexible display panel.
  • the aluminum oxide layer has better surface roughness and can improve the adhesion with the second flexible layer 14.
  • the first metal 132 and the second The laminated structure of a metal oxide 131 makes the flexible display panel have excellent stability in a high temperature and high humidity environment or in a bent state.
  • the first metal oxide 131 in the bending zone 200 is mainly used to improve the adhesion with the second flexible layer 14. Therefore, except for FIG. 1, the first metal oxide 131 is formed in the entire bending zone 200. In addition to the oxide 131, there can be other arrangements in the bending area 200.
  • a plurality of rows of first metal oxides 131 arranged along the first direction X are formed in the bending area 200, that is, in the bending area 200, the metal aluminum is away from the first flexible layer Not all the surface of one side of 12 is oxidized to alumina, but only the oxidized part.
  • Alumina is a strip structure in the bending area 200, and a plurality of aluminas are arranged along the first direction X, where the first direction X is a flexible display When the panel is not bent, one display area 200 points in the direction of another display area 200 adjacent to it.
  • first metal oxides 131 There are gaps between adjacent first metal oxides 131.
  • a plurality of first metal oxides 131 are arranged at equal intervals.
  • the plurality of first metal oxides 131 may also be arranged at unequal intervals.
  • the first metal oxide 131 may be arranged to have a higher density in the middle area of the bending area 200 and a lower density in the edge area of the bending area 200.
  • the middle area of the bending area 200 is subjected to greater stress.
  • the adhesion with the second flexible layer 14 can be improved.
  • the bending performance of the flexible display panel is improved.
  • a plurality of first metal oxides 131 arranged in an array are formed in the bending area 200, that is, in the bending area 200, the surface of the metal aluminum away from the first flexible layer 12 is not all oxidized to Alumina is only partly oxidized.
  • Alumina has a block structure in the bending area 200.
  • the first metal oxides 131 of the block structure are distributed in an array in the bending area 200. It can be set with equal spacing or unequal spacing.
  • first metal oxide 131 in the bending area 200 is not limited to this, and other arrangements are also possible, such as grid-like distribution in the bending area 200, etc. Those skilled in the art can according to needs.
  • the shape of the first metal oxide 131 is designed to increase the adhesion with the second flexible layer 14 so as to reduce the internal stress during bending and improve the bending performance.
  • a second barrier layer 15 is further formed, and the second barrier layer 15 is a stack of the second metal 152 and the second metal oxide 151.
  • the second metal 152 is first formed on the second flexible layer 14.
  • the second metal 152 is also metal aluminum, and the second metal layer 152 is arranged in a whole layer, that is, formed in the display area 100 and the bending area 200 in.
  • the entire surface of the second metal 152 is oxidized, and the entire surface oxidation may be natural oxidation or heating oxidation.
  • the entire surface of the second metal 152 away from the second flexible layer 14 is oxidized to a second oxide 151, and the second oxide 151 is aluminum oxide.
  • the thickness of the second metal oxide 151 is equal to the thickness of the first metal oxide 131 in the bending region 200. Since the metal oxide 131 in the first barrier layer 13 has achieved water and oxygen barrier and excellent bending performance, the second barrier layer 15 only needs to be oxidized into a thin layer of the second metal oxide 151 to maintain the excellent water barrier. Oxygen performance and bending performance simultaneously achieve process optimization.
  • the second metal oxide 151 may be formed in at least one of the bending area 200 and the display area 100, that is, the second metal oxide 151 may be formed only in the display area 100 or only in the bending area 200. It may be formed in the display area 100 and the bending area 200 at the same time. In this embodiment, the second metal oxide 151 is formed in the display area 100 and the bending area 200 at the same time, that is, the entire layer is arranged, and it can be formed by natural oxidation or heating oxidation.
  • the flexible substrate 10 is prepared.
  • the driving circuit layer 20 and the light-emitting function layer 30 are prepared on the side of the flexible substrate 10 away from the substrate 11.
  • the driving circuit layer 20 is formed on the side of the flexible substrate 10, and the light-emitting function layer 30 is formed on the side of the driving circuit layer 20 away from the flexible substrate 10.
  • the driving circuit layer 20 includes the driving circuit, and the light-emitting function layer 30 It emits light under the driving of the driving circuit.
  • the substrate 11 is peeled off. As shown in FIG. 12, after the preparation of the flexible display panel is completed, the substrate 11 under the flexible substrate 10 needs to be peeled off.
  • the peeling uses laser peeling technology or mechanical glass technology.
  • a laser 18 is used to irradiate the substrate 11 to peel the substrate 11 from the flexible substrate 10, and the final flexible display panel is shown in FIG. 13.
  • This method deposits a certain thickness of metal aluminum on the surface of the polyimide, so that the metal aluminum in the display area 100 is completely oxidized into a dense aluminum oxide layer, while the metal aluminum in the curved area only needs to be oxidized into a thin aluminum oxide layer, thereby Prepare the polyimide-alumina (PI-Al 2 O 3 ) composite film substrate, while maintaining the excellent performance of polyimide, the dense first metal oxide 131 is used to improve the water and oxygen resistance.
  • the metal 132 and the thin layer of the first metal oxide 131 improve the bending performance, and avoid problems such as increased internal stress, easy breakage during bending, and easy separation at high temperature and high humidity caused by the use of a multilayer polyimide/inorganic film alternate structure.
  • the flexibility of the flexible display panel prepared by the method is increased, which is beneficial to form a hyperboloid folded flexible display panel.
  • the hyperboloid flexible display panel structure is shown in FIG. 2.
  • the present application provides a flexible display panel and a method for manufacturing a flexible display panel.
  • the flexible display panel includes a display area and a bending area.
  • the flexible display panel further includes a flexible substrate, a driving circuit layer, and a light-emitting function layer.
  • the driving circuit layer is formed on the flexible substrate.
  • the bottom side; the light-emitting function layer is formed on the side of the drive circuit layer away from the flexible substrate; wherein the flexible substrate includes a first flexible layer, a first barrier layer, and a second flexible layer, and the first barrier layer includes Metal oxides, and metal and metal oxide stacks in the bending zone.
  • the metal oxides can play a role in isolating water and oxygen. Improve the bending performance of the display panel.
  • the metal oxide can improve the adhesion with the second flexible layer, thereby enhancing the stability in the bending state.
  • the metal oxide in the display area and the bending area work together to make the flexible display panel At the same time, it has good water and oxygen insulation capacity and bending performance, which improves the technical problem of the inorganic thin film weakening the flexibility of the flexible substrate.

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Abstract

本申请提供一种柔性显示面板和柔性显示面板的制备方法，柔性显示面板包括显示区和弯曲区，柔性显示面板还包括柔性衬底、驱动电路层和发光功能层；其中，柔性衬底包括第一柔性层、第一阻隔层和第二柔性层，第一阻隔层包括位于显示区内的金属氧化物、以及位于弯曲区内的金属和金属氧化物叠层。本申请改善了柔性基板的柔性。

Description

柔性显示面板和柔性显示面板的制备方法 技术领域
本申请涉及显示技术领域，尤其涉及一种柔性显示面板和柔性显示面板的制备方法。
 背景技术
目前，用作柔性基板最具发展前景的高分子材料是聚酰亚胺。由于聚酰亚胺阻水阻氧的能力较弱，通常在其表面沉积厚度均匀的单层或多层堆叠结构的无机薄膜，或采用多层聚酰亚胺/无机薄膜交替堆叠的结构来阻隔水氧，但无机薄膜存在应力集中、弯折时易断裂的问题，减弱了柔性显示面板的柔性。
因此，现有的柔性显示面板存在无机薄膜减弱柔性基板柔性的技术问题，需要改进。
 技术问题
本申请提供一种柔性显示面板和柔性显示面板的制备方法，以缓解现有的柔性显示面板中无机薄膜减弱柔性基板柔性的技术问题。
 技术解决方案
为解决上述问题，本申请提供的技术方案如下：
本申请提供一种柔性显示面板，包括显示区和弯曲区，所述柔性显示面板还包括：
柔性衬底；
驱动电路层，形成在所述柔性衬底一侧；
发光功能层，形成在所述驱动电路层远离所述柔性衬底的一侧；
其中，所述柔性衬底包括第一柔性层、第一阻隔层和第二柔性层，所述第一阻隔层包括位于显示区内的第一金属氧化物、以及位于弯曲区内的第一金属和第一金属氧化物叠层。
在本申请的柔性显示面板中，所述第一金属的材料为铝。
在本申请的柔性显示面板中，在所述弯曲区内，所述第一金属氧化物与所述弯曲区的面积相等。
在本申请的柔性显示面板中，所述弯曲区内形成有多列沿第一方向排布的所述第一金属氧化物。
在本申请的柔性显示面板中，所述弯曲区内形成有多个呈陈列分布的所述第一金属氧化物。
在本申请的柔性显示面板中，在所述弯曲区内，所述第一金属氧化物的厚度小于所述第一阻隔层厚度的四分之一。
在本申请的柔性显示面板中，所述柔性衬底还包括第二阻隔层，所述第二阻隔层形成在所述第二柔性层远离所述第一阻隔层的一侧，所述第二阻隔层包括第二金属和第二金属氧化物的叠层。
在本申请的柔性显示面板中，所述第二金属氧化物形成在所述弯曲区和所述显示区中的至少一个区域内。
在本申请的柔性显示面板中，所述第二金属氧化物的厚度，与所述弯曲区内的所述第一金属氧化物的厚度相等。
本申请还提供一种柔性显示面板的制备方法，包括：
提供基板；
在所述基板的一侧制备柔性衬底，所述柔性衬底包括第一柔性层、第一阻隔层和第二柔性层，所述第一阻隔层包括位于显示区内的第一金属氧化物、以及位于弯曲区内的第一金属和第一金属氧化物叠层；
在所述柔性衬底远离所述基板的一侧制备驱动电路层和发光功能层；
剥离所述基板。
在本申请的柔性显示面板的制备方法中，所述在所述基板的一侧制备柔性衬底，所述柔性衬底包括第一柔性层、第一阻隔层和第二柔性层，所述第一阻隔层包括位于显示区内的第一金属氧化物、以及位于弯曲区内的第一金属和第一金属氧化物叠层的步骤包括：。
在所述第一柔性层上沉积第一金属，所述第一金属位于显示区和弯曲区内；
对所述第一金属进行图案化氧化，使所述第一金属在所述显示区氧化形成第一金属氧化物，在所述弯曲区内氧化形成第一金属和第一金属氧化物叠层，制得第一阻隔层。
在本申请的柔性显示面板的制备方法中，所述在所述第一柔性层上沉积第一金属，所述第一金属位于显示区和弯曲区内的步骤包括：使用物理气相沉积方式形成第一金属。
在本申请的柔性显示面板的制备方法中，所述在所述第一柔性层上沉积第一金属，所述第一金属位于显示区和弯曲区内的步骤包括：在所述第一柔性层上沉积铝。
在本申请的柔性显示面板的制备方法中，所述对所述第一金属进行图案化氧化，使所述第一金属在所述显示区氧化形成第一金属氧化物，在所述弯曲区内氧化形成第一金属和第一金属氧化物叠层，制得第一阻隔层的步骤包括：对所述第一金属进行图案化氧化，在所述弯曲区形成与所述弯曲区面积相等的所述第一金属氧化物。
在本申请的柔性显示面板的制备方法中，所述对所述第一金属进行图案化氧化，使所述第一金属在所述显示区氧化形成第一金属氧化物，在所述弯曲区内氧化形成第一金属和第一金属氧化物叠层，制得第一阻隔层的步骤包括：对所述第一金属进行图案化氧化，在所述弯曲区内形成多列沿第一方向排布的第一金属氧化物。
在本申请的柔性显示面板的制备方法中，所述对所述第一金属进行图案化氧化，使所述第一金属在所述显示区氧化形成第一金属氧化物，在所述弯曲区内氧化形成第一金属和第一金属氧化物叠层，制得第一阻隔层的步骤包括：对所述第一金属进行图案化氧化，在所述弯曲区内形成多个呈陈列分布的所述第一金属氧化物。
在本申请的柔性显示面板的制备方法中，所述对所述第一金属进行图案化氧化，使所述第一金属在所述显示区氧化形成第一金属氧化物，在所述弯曲区内氧化形成第一金属和第一金属氧化物叠层，制得第一阻隔层的步骤包括：对所述第一金属进行图案化氧化，使所述弯曲区形成的所述第一金属氧化物厚度小于所述第一阻隔层厚度的四分之一。
在本申请的柔性显示面板的制备方法中，所述在所述基板的一侧制备柔性衬底，所述柔性衬底包括第一柔性层、第一阻隔层和第二柔性层，所述第一阻隔层包括位于显示区内的第一金属氧化物、以及位于弯曲区内的第一金属和第一金属氧化物叠层的步骤后还包括：在所述第二柔性层上制备第二阻隔层，所述第二阻隔层包括第二金属和第二金属氧化物的叠层。
在本申请的柔性显示面板的制备方法中，所述在所述第二柔性层上制备第二阻隔层，所述第二阻隔层包括第二金属和第二金属氧化物的叠层的步骤包括：在所述弯曲区和所述显示区中的至少一个区域内，将所述第二金属氧化，形成第二金属和第二金属氧化物的叠层。
在本申请的柔性显示面板的制备方法中，所述在所述第二柔性层上制备第二阻隔层，所述第二阻隔层包括第二金属和第二金属氧化物的叠层的步骤包括：使用自然氧化或加热氧化方式形成所述第二金属氧化物。
 有益效果
本申请提供一种柔性显示面板和柔性显示面板的制备方法，柔性显示面板包括显示区和弯曲区，柔性显示面板还包括柔性衬底、驱动电路层和发光功能层，所述驱动电路层形成在所述柔性衬底一侧；所述发光功能层形成在所述驱动电路层远离所述柔性衬底的一侧；其中，所述柔性衬底包括第一柔性层、第一阻隔层和第二柔性层，所述第一阻隔层包括位于显示区内的金属氧化物、以及位于弯曲区内的金属和金属氧化物叠层。通过将显示区内所有金属均氧化形成金属氧化物，在弯曲区内金属部分氧化形成金属氧化物，在显示区内，金属氧化物可以起到隔绝水氧的作用，在弯曲区内，金属可提高显示面板的弯折性能，金属氧化物可以提高与第二柔性层的粘附力，从而增强弯折状态下的稳定性，显示区和弯曲区内的金属氧化物共同作用，使柔性显示面板同时具备良好的水氧隔绝能力和弯折性能，改善了无机薄膜减弱柔性基板柔性的技术问题。
 附图说明
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本申请实施例提供的柔性显示面板的第一种结构示意图；
图2为本申请实施例提供的柔性显示面板的弯曲结构示意图；
图3为本申请实施例提供的柔性显示面板的第二种结构示意图；
图4为本申请实施例提供的柔性显示面板的制备方法的流程示意图；
图5为本申请实施例提供的柔性显示面板的制备方法的第一阶段示意图；
图6为本申请实施例提供的柔性显示面板的制备方法的第二阶段示意图；
图7为本申请实施例提供的柔性显示面板的制备方法的第三阶段示意图；
图8为本申请实施例提供的柔性显示面板的制备方法的第四阶段示意图；
图9为本申请实施例提供的柔性显示面板的制备方法的第五阶段示意图；
图10为本申请实施例提供的柔性显示面板的制备方法的第六阶段示意图；
图11为本申请实施例提供的柔性显示面板的制备方法的第七阶段示意图；
图12为本申请实施例提供的柔性显示面板的制备方法的第八阶段示意图；
图13为本申请实施例提供的柔性显示面板的制备方法的第九阶段示意图。
 本发明的实施方式
以下各实施例的说明是参考附加的图示，用以例示本申请可用以实施的特定实施例。本申请所提到的方向用语，例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本申请，而非用以限制本申请。在图中，结构相似的单元是用以相同标号表示。
本申请提供一种柔性显示面板和柔性显示面板的制备方法，以缓解现有的柔性显示面板中无机薄膜减弱柔性基板柔性的技术问题。
如图1所示，本申请提供一种柔性显示面板，包括显示区100和弯曲区200，柔性显示面板还包括柔性衬底10、驱动电路层20以及发光功能层30。
柔性衬底10包括第一柔性层12、第一阻隔层13和第二柔性层14，第一阻隔层13包括位于显示区100内的第一金属氧化物131、以及位于弯曲区100内的第一金属132和第一金属氧化物131叠层。
驱动电路层20形成在柔性衬底10一侧。
发光功能层30形成在驱动电路层20远离柔性衬底10的一侧。
在本实施例中，第一柔性衬底12和第二柔性衬底14可以是聚酰亚胺，也可以是柔性玻璃。
第一金属132的材料为金属铝，形成的第一金属氧化物131为氧化铝。第一金属132通过物理气相沉积的方式形成在第一柔性层12上。
在显示区1000内，第一阻隔层13包括第一金属氧化物131，即金属铝完全被氧化形成氧化铝，第一金属氧化物131的面积与显示区100的面积相等，且厚度与第一阻隔层13的厚度相同，形成的第一金属氧化物131为致密的氧化铝层，氧化铝层具有良好的隔绝水氧的能力。
在弯曲区200内，第一阻隔层13包括第一金属132和第一金属氧化物131叠层，即金属铝仅在远离第一柔性层12的一侧表面被氧化成氧化铝，第一金属氧化物131的厚度小于第一阻隔层13的厚度。
在一种实施例中，在弯曲区200内，第一阻隔层13中的第一金属氧化物131的厚度小于第一阻隔层13厚度的四分之一。第一阻隔层13在弯曲区200内只形成薄层的第一金属氧化物131，大部分还是第一金属132，第一金属132具有优异的延展性，可以实现柔性显示面板更优异的弯折性能。
第二柔性层14形成在第一阻隔层13上，与第一金属氧化物131接触，在弯曲区200内，第一金属氧化物131具有较好的表面粗糙度，相对于金属铝直接与第二柔性层14接触，第一金属氧化物131可以提高与第二柔性层14之间的粘附力，在高温高湿环境或弯折状态下具有优异的稳定性，可避免因弯折导致的内应力增加及无机层断裂等问题。
驱动电路层20包括驱动电路，发光功能层30形成在驱动电路层30上，发光功能层30在驱动电路的驱动下发光。
在弯曲区200内，第一金属氧化物131的形状有多种情况，在本实施例中，在弯曲区200内，第一金属氧化物131与弯曲区200的面积相等。
在制备好第一金属132后，先将弯曲区200遮挡住，对显示区100内的第一金属132进行加热氧化，使显示区100内的第一金属132全部氧化层第一金属氧化物131，采用的氧化方法为加热氧化；再对弯曲区200内的第一金属132进行氧化，使第一金属132的表面形成薄层的第一金属氧化物131，采用的氧化方法为自然氧化或加热氧化，氧化完成后，第一阻隔层13在弯曲区200内还有未被氧化的铝，即剩余的第一金属132。经过上述步骤，制得第一阻隔层13。
在现有技术中，通常采用聚酰亚胺作为柔性显示面板的衬底，聚酰亚胺具有优异的耐热性、耐辐射性能、耐化学性、电绝缘性、机械性能等，但其自身的阻水阻氧能力较弱。为提高衬底的阻水阻氧能力，通常在聚酰亚胺表面沉积厚度均匀的单层或多层堆叠结构的无机薄膜，或采用多层聚酰亚胺/无机薄膜交替堆叠的结构，但这些结构均存在无机薄膜应力集中、弯曲区易断裂、高温高湿易分离等问题。
本申请不采用无机薄膜，而是采用柔性层加金属阻隔层的结构，金属铝的延展性能优异，高温下难与水氧反应，且是热的良导体，氧化铝化学性质稳定，具有极其优异的阻水阻氧性能。
本申请通过在显示区100内将金属铝完全氧化成致密的氧化铝层，氧化铝化学性质稳定，具有极其优异的阻水阻氧性能。在弯曲区200内将金属铝部分氧化成薄层的氧化铝层，未氧化的金属铝相对于现有技术中的无机膜层具有更好的延展性，可以提供柔性显示面板的柔性，薄层的氧化铝层与现有技术中沉积的无机膜层相比，具有更好的表面粗糙度，可以提高与第二柔性层14之间的粘附力，弯曲区200内第一金属132和第一金属氧化物131的叠层结构使得柔性显示面板在高温高湿环境或弯折状态下具有优异的稳定性。
本申请在聚酰亚胺表面沉积一定厚度的金属铝，使显示区100的金属铝完全氧化成致密的氧化铝层，而弯曲区域的金属铝仅需氧化成一层薄薄的氧化铝层，从而制备聚酰亚胺-氧化铝（PI-Al 2O 3）复合薄膜基板，在保持聚酰亚胺优异性能的同时，利用致密的第一金属氧化物131改善阻水阻氧能力，用第一金属132和薄层的第一金属氧化物131改善弯折性能，避免采用多层聚酰亚胺/无机薄膜交替结构而产生的内应力增加、弯折易断裂、高温高湿易分离等问题。采用本申请的结构，柔性显示面板的柔性增加，有利于形成双曲面的折叠柔性显示面板，双曲面的柔性显示面板结构如图2所示。
在一种实施例中，柔性衬底10还包括第二阻隔层15，第二阻隔层15包括第二金属152和第二金属氧化物151的叠层。其中第一金属152也为金属铝，第二金属氧化物151也为氧化铝。
在一种实施例中，第二金属氧化物151的厚度，与弯曲区200内的第一金属氧化物131的厚度相等。由于第一阻隔层13中的金属氧化物131已实现水氧阻隔及优异的弯折性能，第二阻隔层15只需表面氧化成一层薄薄的第二金属氧化物151，在保持优异阻水氧性能和弯折性能同时实现工艺优化，第二金属氧化物151可以形成在弯曲区200和显示区100中的至少一个区域内，即第二金属氧化物151可以仅形成在显示区100内，也可以仅形成在弯曲区200内，还可以同时形成在显示区100和弯曲区200内。在本实施例中，第二金属氧化物151同时形成在显示区100和弯曲区200内，即整层设置，可采用自然氧化或加热氧化的方式形成。
在第一阻隔层13中，弯曲区200内的第一金属氧化物131主要为了提高与第二柔性层14之间的黏附里，因此除了图1中在整个弯曲区200内均形成第一金属氧化物131外，在弯曲区200内还可以有其他设置方式。
在一种实施例中，如图3所示，弯曲区200内形成有多列沿第一方向X排布的第一金属氧化物131，即在弯曲区200内，金属铝远离第一柔性层12的一侧表面不是全部都氧化成氧化铝，而只是氧化了部分，氧化铝在弯曲区200内为条状结构，多条氧化铝沿第一方向X排列，其中第一方向X为柔性显示面板未弯折时，由一个显示区200指向与其相邻的另一个显示区200的方向。
相邻的第一金属氧化物131之间存在间隙。在一种实施例中，多条第一金属氧化物131等间距设置。
多个第一金属氧化物131也可以不等间距设置，可以将第一金属氧化物131设置为在弯曲区200的中间区域密度较大，在弯曲区200的边缘区域密度较小，由于在形成双曲面的柔性显示面板时，弯曲区200的中间区域所受应力较大，将该区域内设置尽可能多的第一金属氧化物131，可提高与第二柔性层14间的粘附力，进而提高柔性显示面板的弯折性能。
在一种实施例中，弯曲区200内形成有多个呈陈列分布的第一金属氧化物131，即在弯曲区200内，金属铝远离第一柔性层12的一侧表面不是全部都氧化成氧化铝，而只是氧化了部分，氧化铝在弯曲区200内为块状结构，块状结构的第一金属氧化物131在弯曲区200内呈阵列分布，各第一金属氧化物131之间可以等间距设置，也可以不等间距设置。
需要说明的是，弯曲区200内第一金属氧化物131的设置方式不限于此，还可以有其他设置方法，如在弯曲区200内呈网格状分布等，本领域的技术人员可根据需要设计第一金属氧化物131的形状，只要能起到增大与第二柔性层14间的粘附力，从而减小弯折时的内应力，提高弯折性能的作用即可。
如图4所示，本申请还提供一种柔性显示面板的制备方法，具体步骤包括：
S1：提供基板；
S2：在基板的一侧制备柔性衬底，柔性衬底包括第一柔性层、第一阻隔层和第二柔性层，第一阻隔层包括位于显示区内的金属氧化物、以及位于弯曲区内的金属和金属氧化物叠层；
S3：在柔性衬底远离基板的一侧制备驱动电路层和发光功能层；
S4：剥离基板。
下面结合图1至图13对该方法进行具体说明。
在S1中，提供基板11。如图5所示，基板11为刚性基板，通常为玻璃，由于柔性显示面板的衬底为柔性衬底，柔性衬底不能直接使用，需先制备在刚性的基板11上。
在S2中，在基板11的一侧制备柔性衬底10，柔性衬底10包括第一柔性层12、第一阻隔层13和第二柔性层14，第一阻隔层13包括位于显示区100内的第一金属氧化物131、以及位于弯曲区200内的第一金属132和第一金属氧化物131的叠层。
如图5所示，首先，在基板11上制备第一柔性层12，第一柔性衬底12可以是聚酰亚胺，也可以是柔性玻璃，采用涂布的方式形成在基板11上。在本实施例中，第一柔性衬底12为聚酰亚胺。
然后，在第一柔性层12上形成第一阻隔层13。
制备第一阻隔层13时，先在第一柔性层12上用物理气相沉积或其他方式形成整层的铝，形成第一金属132，如图5，第一金属132位于显示区100和弯曲区200内。
接着，对第一金属132进行图案化氧化，使第一金属132在显示区100氧化形成第一金属氧化物131，在弯曲区200内氧化形成第一金属132和第一金属氧化物131叠层，制得第一阻隔层13。
如图6所示，图案化氧化时，先使用遮挡构件40将弯曲区200遮挡住，对显示区100内的第一金属132进行氧化，氧化采用加热氧化的方式，直至显示区100内所有的第一金属132均被氧化成第一金属氧化物131，氧化后的结构如图7所示。
然后，再对弯曲区200内的第一金属132进行氧化，使第一金属132的表面形成薄层的第一金属氧化物131，采用的氧化方法为自然氧化或加热氧化，氧化完成后，第一阻隔层13在弯曲区200内还有未被氧化的铝，即剩余的第一金属132。经过上述步骤，制得第一阻隔层13，结构如图8所示。
在弯曲区200内，第一阻隔层13包括第一金属132和第一金属氧化物131叠层，即金属铝仅在远离第一柔性层12的一侧表面被氧化成氧化铝，第一金属氧化物131的厚度小于第一阻隔层13的厚度。
在一种实施例中，在弯曲区200内，第一阻隔层13中的第一金属氧化物131的厚度小于第一阻隔层13厚度的四分之一。第一阻隔层13在弯曲区200内只形成薄层的第一金属氧化物131，大部分还是第一金属132，第一金属132具有优异的延展性，可以实现柔性显示面板更优异的弯折性能。
在弯曲区200内，第一金属氧化物131的形状有多种情况，在本实施例中，在弯曲区200内，第一金属氧化物131与弯曲区200的面积相等。
接下来，如图9所示，在第一阻隔层13上形成第二柔性层14，第二柔性层14的材料也为聚酰亚胺。
第二柔性层14形成在第一阻隔层13上，与第一金属氧化物131接触，在弯曲区200内，第一金属氧化物131具有较好的表面粗糙度，相对于金属铝直接与第二柔性层14接触，第一金属氧化物131可以提高与第二柔性层14之间的粘附力，在高温高湿环境或弯折状态下具有优异的稳定性，可避免因弯折导致的内应力增加及无机层断裂等问题。
在现有技术中，通常采用聚酰亚胺作为柔性显示面板的衬底，聚酰亚胺具有优异的耐热性、耐辐射性能、耐化学性、电绝缘性、机械性能等，但其自身的阻水阻氧能力较弱。为提高衬底的阻水阻氧能力，通常在聚酰亚胺表面沉积厚度均匀的单层或多层堆叠结构的无机薄膜，或采用多层聚酰亚胺/无机薄膜交替堆叠的结构，但这些结构均存在无机薄膜应力集中、弯曲区易断裂、高温高湿易分离等问题。
本申请不采用无机薄膜，而是采用柔性层加金属阻隔层的结构，金属铝的延展性能优异，高温下难与水氧反应，且是热的良导体，氧化铝化学性质稳定，具有极其优异的阻水阻氧性能。
本申请通过在显示区100内将金属铝完全氧化成致密的氧化铝层，氧化铝化学性质稳定，具有极其优异的阻水阻氧性能。在弯曲区200内将金属铝部分氧化成薄层的氧化铝层，未氧化的金属铝相对于现有技术中的无机膜层具有更好的延展性，可以提供柔性显示面板的柔性，薄层的氧化铝层与现有技术中沉积的无机膜层相比，具有更好的表面粗糙度，可以提高与第二柔性层14之间的粘附力，弯曲区200内第一金属132和第一金属氧化物131的叠层结构使得柔性显示面板在高温高湿环境或弯折状态下具有优异的稳定性。
在第一阻隔层13中，弯曲区200内的第一金属氧化物131主要为了提高与第二柔性层14之间的黏附里，因此除了图1中在整个弯曲区200内均形成第一金属氧化物131外，在弯曲区200内还可以有其他设置方式。
在一种实施例中，如图3所示，弯曲区200内形成有多列沿第一方向X排布的第一金属氧化物131，即在弯曲区200内，金属铝远离第一柔性层12的一侧表面不是全部都氧化成氧化铝，而只是氧化了部分，氧化铝在弯曲区200内为条状结构，多条氧化铝沿第一方向X排列，其中第一方向X为柔性显示面板未弯折时，由一个显示区200指向与其相邻的另一个显示区200的方向。
相邻的第一金属氧化物131之间存在间隙。在一种实施例中，多条第一金属氧化物131等间距设置。
多个第一金属氧化物131也可以不等间距设置，可以将第一金属氧化物131设置为在弯曲区200的中间区域密度较大，在弯曲区200的边缘区域密度较小，由于在形成双曲面的柔性显示面板时，弯曲区200的中间区域所受应力较大，将该区域内设置尽可能多的第一金属氧化物131，可提高与第二柔性层14间的粘附力，进而提高柔性显示面板的弯折性能。
在一种实施例中，弯曲区200内形成有多个呈陈列分布的第一金属氧化物131，即在弯曲区200内，金属铝远离第一柔性层12的一侧表面不是全部都氧化成氧化铝，而只是氧化了部分，氧化铝在弯曲区200内为块状结构，块状结构的第一金属氧化物131在弯曲区200内呈阵列分布，各第一金属氧化物131之间可以等间距设置，也可以不等间距设置。
需要说明的是，弯曲区200内第一金属氧化物131的设置方式不限于此，还可以有其他设置方法，如在弯曲区200内呈网格状分布等，本领域的技术人员可根据需要设计第一金属氧化物131的形状，只要能起到增大与第二柔性层14间的粘附力，从而减小弯折时的内应力，提高弯折性能的作用即可。
在一种实施例中，第二柔性层14制备完成后，还形成有第二阻隔层15，第二阻隔层15为第二金属152和第二金属氧化物151的叠层。
如图9中所示，先在第二柔性层14上形成第二金属152，第二金属152也为金属铝，第二金属层152为整层设置，即形成在显示区100和弯曲区200中。
然后，如图10中所示，对第二金属152进行整面氧化，整面氧化可以采用自然氧化或加热氧化。将第二金属152远离第二柔性层14的一侧表面全部氧化成第二氧化物151，第二氧化物151为氧化铝。
在一种实施例中，第二金属氧化物151的厚度，与弯曲区200内的第一金属氧化物131的厚度相等。由于第一阻隔层13中的金属氧化物131已实现水氧阻隔及优异的弯折性能，第二阻隔层15只需表面氧化成一层薄薄的第二金属氧化物151，在保持优异阻水氧性能和弯折性能同时实现工艺优化。
第二金属氧化物151可以形成在弯曲区200和显示区100中的至少一个区域内，即第二金属氧化物151可以仅形成在显示区100内，也可以仅形成在弯曲区200内，还可以同时形成在显示区100和弯曲区200内。在本实施例中，第二金属氧化物151同时形成在显示区100和弯曲区200内，即整层设置，可采用自然氧化或加热氧化的方式形成。
至此，柔性衬底10制备完成。
在S3中，在柔性衬底10远离基板11的一侧制备驱动电路层20和发光功能层30。
如图11所示，驱动电路层20形成在柔性衬底10一侧，发光功能层30形成在驱动电路层20远离柔性衬底10的一侧，驱动电路层20包括驱动电路，发光功能层30在驱动电路的驱动下发光。
在S4中，剥离基板11。如图12所示，柔性显示面板制备完成后，需要将柔性衬底10下的基板11剥离，剥离采用激光剥离技术或机械玻璃技术。在本实施例中，采用激光18照射基板11，将基板11与柔性衬底10剥离，最终形成的柔性显示面板如图13所示。
本方法在聚酰亚胺表面沉积一定厚度的金属铝，使显示区100的金属铝完全氧化成致密的氧化铝层，而弯曲区域的金属铝仅需氧化成一层薄薄的氧化铝层，从而制备聚酰亚胺-氧化铝（PI-Al 2O 3）复合薄膜基板，在保持聚酰亚胺优异性能的同时，利用致密的第一金属氧化物131改善阻水阻氧能力，用第一金属132和薄层的第一金属氧化物131改善弯折性能，避免采用多层聚酰亚胺/无机薄膜交替结构而产生的内应力增加、弯折易断裂、高温高湿易分离等问题。采用本方法制备的柔性显示面板的柔性增加，有利于形成双曲面的折叠柔性显示面板，双曲面的柔性显示面板结构如图2所示。
根据上述实施例可知：
本申请提供一种柔性显示面板和柔性显示面板的制备方法，柔性显示面板包括显示区和弯曲区，柔性显示面板还包括柔性衬底、驱动电路层和发光功能层，驱动电路层形成在柔性衬底一侧；发光功能层形成在驱动电路层远离柔性衬底的一侧；其中，柔性衬底包括第一柔性层、第一阻隔层和第二柔性层，第一阻隔层包括位于显示区内的金属氧化物、以及位于弯曲区内的金属和金属氧化物叠层。通过将显示区内所有金属均氧化形成金属氧化物，在弯曲区内金属部分氧化形成金属氧化物，在显示区内，金属氧化物可以起到隔绝水氧的作用，在弯曲区内，金属可提高显示面板的弯折性能，金属氧化物可以提高与第二柔性层的粘附力，从而增强弯折状态下的稳定性，显示区和弯曲区内的金属氧化物共同作用，使柔性显示面板同时具备良好的水氧隔绝能力和弯折性能，改善了无机薄膜减弱柔性基板柔性的技术问题。
综上所述，虽然本申请已以优选实施例揭露如上，但上述优选实施例并非用以限制本申请，本领域的普通技术人员，在不脱离本申请的精神和范围内，均可作各种更动与润饰，因此本申请的保护范围以权利要求界定的范围为准。

Claims (20)

  1. 一种柔性显示面板，包括显示区和弯曲区，其包括：
    柔性衬底；
    驱动电路层，形成在所述柔性衬底一侧；
    发光功能层，形成在所述驱动电路层远离所述柔性衬底的一侧；
    其中，所述柔性衬底包括第一柔性层、第一阻隔层和第二柔性层，所述第一阻隔层包括位于显示区内的第一金属氧化物、以及位于弯曲区内的第一金属和第一金属氧化物叠层。
  2. 如权利要求1所述的柔性显示面板，其中，所述第一金属的材料为铝。
  3. 如权利要求2所述的柔性显示面板，其中，在所述弯曲区内，所述第一金属氧化物与所述弯曲区的面积相等。
  4. 如权利要求2所述的柔性显示面板，其中，所述弯曲区内形成有多列沿第一方向排布的所述第一金属氧化物。
  5. 如权利要求2所述的柔性显示面板，其中，所述弯曲区内形成有多个呈陈列分布的所述第一金属氧化物。
  6. 如权利要求2所述的柔性显示面板，其中，在所述弯曲区内，所述第一金属氧化物的厚度小于所述第一阻隔层厚度的四分之一。
  7. 如权利要求1所述的柔性显示面板，其中，所述柔性衬底还包括第二阻隔层，所述第二阻隔层形成在所述第二柔性层远离所述第一阻隔层的一侧，所述第二阻隔层包括第二金属和第二金属氧化物的叠层。
  8. 如权利要求7所述的柔性显示面板，其中，所述第二金属氧化物形成在所述弯曲区和所述显示区中的至少一个区域内。
  9. 如权利要求7所述的柔性显示面板，其中，所述第二金属氧化物的厚度，与所述弯曲区内的所述第一金属氧化物的厚度相等。
  10. 一种柔性显示面板的制备方法，其包括：
    提供基板；
    在所述基板的一侧制备柔性衬底，所述柔性衬底包括第一柔性层、第一阻隔层和第二柔性层，所述第一阻隔层包括位于显示区内的第一金属氧化物、以及位于弯曲区内的第一金属和第一金属氧化物叠层；
    在所述柔性衬底远离所述基板的一侧制备驱动电路层和发光功能层；
    剥离所述基板。
  11. 如权利要求10所述的柔性显示面板的制备方法，其中，所述在所述基板的一侧制备柔性衬底，所述柔性衬底包括第一柔性层、第一阻隔层和第二柔性层，所述第一阻隔层包括位于显示区内的第一金属氧化物、以及位于弯曲区内的第一金属和第一金属氧化物叠层的步骤包括：。
    在所述第一柔性层上沉积第一金属，所述第一金属位于显示区和弯曲区内；
    对所述第一金属进行图案化氧化，使所述第一金属在所述显示区氧化形成第一金属氧化物，在所述弯曲区内氧化形成第一金属和第一金属氧化物叠层，制得第一阻隔层。
  12. 如权利要求11所述的柔性显示面板的制备方法，其中，所述在所述第一柔性层上沉积第一金属，所述第一金属位于显示区和弯曲区内的步骤包括：使用物理气相沉积方式形成第一金属。
  13. 如权利要求11所述的柔性显示面板的制备方法，其中，所述在所述第一柔性层上沉积第一金属，所述第一金属位于显示区和弯曲区内的步骤包括：在所述第一柔性层上沉积铝。
  14. 如权利要求11所述的柔性显示面板的制备方法，其中，所述对所述第一金属进行图案化氧化，使所述第一金属在所述显示区氧化形成第一金属氧化物，在所述弯曲区内氧化形成第一金属和第一金属氧化物叠层，制得第一阻隔层的步骤包括：对所述第一金属进行图案化氧化，在所述弯曲区形成与所述弯曲区面积相等的所述第一金属氧化物。
  15. 如权利要求11所述的柔性显示面板的制备方法，其中，所述对所述第一金属进行图案化氧化，使所述第一金属在所述显示区氧化形成第一金属氧化物，在所述弯曲区内氧化形成第一金属和第一金属氧化物叠层，制得第一阻隔层的步骤包括：对所述第一金属进行图案化氧化，在所述弯曲区内形成多列沿第一方向排布的第一金属氧化物。
  16. 如权利要求11所述的柔性显示面板的制备方法，其中，所述对所述第一金属进行图案化氧化，使所述第一金属在所述显示区氧化形成第一金属氧化物，在所述弯曲区内氧化形成第一金属和第一金属氧化物叠层，制得第一阻隔层的步骤包括：对所述第一金属进行图案化氧化，在所述弯曲区内形成多个呈陈列分布的所述第一金属氧化物。
  17. 如权利要求11所述的柔性显示面板的制备方法，其中，所述对所述第一金属进行图案化氧化，使所述第一金属在所述显示区氧化形成第一金属氧化物，在所述弯曲区内氧化形成第一金属和第一金属氧化物叠层，制得第一阻隔层的步骤包括：对所述第一金属进行图案化氧化，使所述弯曲区形成的所述第一金属氧化物厚度小于所述第一阻隔层厚度的四分之一。
  18. 如权利要求10所述的柔性显示面板的制备方法，其中，所述在所述基板的一侧制备柔性衬底，所述柔性衬底包括第一柔性层、第一阻隔层和第二柔性层，所述第一阻隔层包括位于显示区内的第一金属氧化物、以及位于弯曲区内的第一金属和第一金属氧化物叠层的步骤后还包括：在所述第二柔性层上制备第二阻隔层，所述第二阻隔层包括第二金属和第二金属氧化物的叠层。
  19. 如权利要求18所述的柔性显示面板的制备方法，其中，所述在所述第二柔性层上制备第二阻隔层，所述第二阻隔层包括第二金属和第二金属氧化物的叠层的步骤包括：在所述弯曲区和所述显示区中的至少一个区域内，将所述第二金属氧化，形成第二金属和第二金属氧化物的叠层。
  20. 如权利要求18所述的柔性显示面板的制备方法，其中，所述在所述第二柔性层上制备第二阻隔层，所述第二阻隔层包括第二金属和第二金属氧化物的叠层的步骤包括：使用自然氧化或加热氧化方式形成所述第二金属氧化物。
PCT/CN2019/115907 2019-08-13 2019-11-06 柔性显示面板和柔性显示面板的制备方法 Ceased WO2021027102A1 (zh)

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