Classifications

• • C—CHEMISTRY; METALLURGY
  • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
  • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
  • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
  • C09D183/10—Block or graft copolymers containing polysiloxane sequences
  • C09D183/12—Block or graft copolymers containing polysiloxane sequences containing polyether sequences
• • C—CHEMISTRY; METALLURGY
  • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
  • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
  • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
  • C09D5/16—Antifouling paints; Underwater paints
  • C09D5/1693—Antifouling paints; Underwater paints as part of a multilayer system
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
• • C—CHEMISTRY; METALLURGY
  • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
  • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
  • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
  • C09D183/04—Polysiloxanes
  • C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
• • C—CHEMISTRY; METALLURGY
  • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
  • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
  • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
  • C09D5/002—Priming paints
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/70—Properties of coatings
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2218/00—Methods for coating glass
  • C03C2218/10—Deposition methods
  • C03C2218/15—Deposition methods from the vapour phase
  • C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2218/00—Methods for coating glass
  • C03C2218/10—Deposition methods
  • C03C2218/15—Deposition methods from the vapour phase
  • C03C2218/154—Deposition methods from the vapour phase by sputtering
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
  • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
  • C08G77/04—Polysiloxanes
  • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
  • C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups

Definitions

• the present disclosure relates to fluoropolyether group-containing compounds.
• the layer obtained from the surface treatment agent containing a fluorine-containing silane compound (hereinafter, also referred to as "surface treatment layer") is a so-called functional thin film, for example, various base materials such as glass, plastic, fiber, sanitary goods, and building materials. (Patent Documents 1 and 2).
• the fluorine-containing silane compound described in Patent Document 1 or Patent Document 2 can provide a surface treatment layer having excellent functions, but a surface treatment layer having higher friction durability and chemical resistance is required. ..
• An object of the present disclosure is to provide an article having a surface treatment layer having higher friction durability and chemical resistance.
• Base material and An intermediate layer located on the substrate and It is composed of a surface treatment layer formed from a surface treatment agent containing a fluorine-containing silane compound, which is located directly above the intermediate layer.
• the intermediate layer is an article containing a composite oxide containing Si.
• the composite oxide is a composite oxide of Si and another metal, and the other metal is composed of a transition metal of groups 3 to 11 of the periodic table and a typical metal element of groups 12 to 15.
• the composite oxide is a composite oxide of Si and another metal, and the other metal is selected from Ta, Nb, Zr, Mo, W, Cr, Hf, Al, Ti, and V.
• the fluorine-containing silane compound has the following formula (1) or (2): [During the ceremony: R F1 is independently at each occurrence, Rf 1 -R F -O q - a and; R F2 is -R f 2 p -RF -O q- ; Rf 1 is a C 1-16 alkyl group that may be independently substituted with one or more fluorine atoms at each appearance; Rf 2 is a C 1-6 alkylene group that may be substituted with one or more fluorine atoms; RF is a divalent fluoropolyether group independently at each appearance; p is 0 or 1; q is 0 or 1 independently at each occurrence; R Si is a monovalent group containing a Si atom to which a hydroxyl group, a hydrolyzable group,
• RF is independent of each appearance, and the formula: - (OC 6 F 12) a - (OC 5 F 10) b - (OC 4 F 8) c - (OC 3 R Fa 6) d - (OC 2 F 4) e - (OCF 2) f - [In the formula, R Fa is a hydrogen atom, a fluorine atom or a chlorine atom independently at each appearance.
• a, b, c, d, e and f are independently integers from 0 to 200, and the sum of a, b, c, d, e and f is 1 or more, and a, b,
• the order of existence of each repeating unit in parentheses with c, d, e or f is arbitrary in the equation.
• RF is independently expressed in the following equations (f1), (f2) or (f3): -(OC 3 F 6 ) d- (f1) [In the formula, d is an integer from 1 to 200. ] - (OC 4 F 8) c - (OC 3 F 6) d - (OC 2 F 4) e - (OCF 2) f - (f2) [In the equation, c and d are independently integers from 0 to 30; e and f are independently integers from 1 to 200; The sum of c, d, e and f is an integer from 10 to 200; The order of existence of each repeating unit with the subscripts c, d, e or f in parentheses is arbitrary in the equation.
• R 6 is OCF 2 or OC 2 F 4 ;
• R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or two or three selected from these groups.
• a combination of groups; g is an integer from 2 to 100.
• RSi is the following formula (S1), (S2), (S3), or (S4): [During the ceremony: R 11 is an independent hydroxyl group or hydrolyzable group at each appearance; R 12 is an independent hydrogen atom or monovalent organic group at each appearance; n1 is an integer of 0 to 3 independently for each unit (SiR 11 n1 R 12 3-n1 ); X 11 is an independent, single-bonded or divalent organic group at each appearance; R 13 is an independent hydrogen atom or monovalent organic group at each appearance; t is an integer from 2 to 10 independently for each occurrence; R 14 is an independent hydrogen or halogen atom at each appearance; R a1 is -Z 1- SiR 21 p1 R 22 q1 R 23 r1 independently in each appearance; Z 1 is an oxygen atom or a divalent organic group, independently of each appearance; R 21 is independently at each occurrence, be a -Z 1 '-SiR 21' p1 ' R 22' q1 'R 23'
• a method comprising simultaneously depositing Si and another metal on the base material to form an intermediate layer containing a composite oxide containing Si, and forming a surface treatment layer directly above the intermediate layer. .. [18] A surface treatment agent used for producing the article according to any one of the above [1] to [16].
• the articles disclosed in this disclosure include a base material and An intermediate layer located on the substrate and It is composed of a surface treatment layer formed from a surface treatment agent containing a fluorine-containing silane compound, which is located directly above the intermediate layer.
• the intermediate layer contains a composite oxide containing Si.
• the substrates that can be used in the present disclosure are, for example, glass, resin (natural or synthetic resin, for example, general plastic material), metal, ceramics, semiconductor (silicon, germanium, etc.), fiber (woven fabric, non-woven fabric, etc.). Etc.), fur, leather, wood, ceramics, stones, etc., building materials, sanitary goods, and any suitable material.
• the material constituting the surface of the base material may be a material for the optical member, for example, glass or transparent plastic.
• some layer (or film), such as a hard coat layer or an antireflection layer may be formed on the surface (outermost layer) of the base material.
• the antireflection layer either a single-layer antireflection layer or a multi-layer antireflection layer may be used.
• the article to be manufactured is an optical glass component for a touch panel
• a thin film using a transparent electrode such as indium tin oxide (ITO) or zinc oxide is provided as a part of the surface of the base material (glass).
• the base material may be an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), an atomized film layer, a hard coating film layer, a polarizing film, a phase difference film, etc., depending on the specific specifications thereof.
• the base material may be an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), an atomized film layer, a hard coating film layer, a polarizing film, a phase difference film, etc., depending on the specific specifications thereof.
• I-CON decorative frame layer
• an atomized film layer atomized film layer
• a hard coating film layer a polarizing film
• a phase difference film etc.
• the shape of the base material is not particularly limited, and may be, for example, a plate shape, a film, or other form. Further, the surface region of the base material on which the surface treatment layer should be formed may be at least a part of the surface of the base material, and may be appropriately determined according to the use of the article to be manufactured, specific specifications and the like.
• the base material may be such that at least its surface portion is made of a material originally having a hydroxyl group.
• a material originally having a hydroxyl group examples include glass, and examples thereof include metals (particularly base metals) in which a natural oxide film or a thermal oxide film is formed on the surface, ceramics, semiconductors, and the like.
• the hydroxyl group is introduced to the surface of the base material by applying some pretreatment to the base material. Can be increased or increased. Examples of such pretreatment include plasma treatment (for example, corona discharge) and ion beam irradiation.
• the plasma treatment can introduce or increase hydroxyl groups on the surface of the base material, and can also be suitably used for cleaning the surface of the base material (removing foreign substances and the like).
• an interfacial adsorbent having a carbon-carbon unsaturated bond group is previously subjected to a monomolecular film on the surface of the substrate by the LB method (Langmuir-Brojet method), a chemisorption method or the like. Examples thereof include a method of forming the morphology and then cleaving the unsaturated bond in an atmosphere containing oxygen, nitrogen and the like.
• the substrate may be such that at least its surface portion is made of a silicone compound having one or more reactive groups, for example Si—H groups, or a material containing an alkoxysilane. ..
• the base material is glass.
• glass sapphire glass, soda lime glass, alkali aluminosilicate glass, borosilicate glass, non-alkali glass, crystal glass and quartz glass are preferable, and chemically strengthened soda lime glass, chemically strengthened alkali aluminosilicate glass, etc. And chemically bonded borosilicate glass are particularly preferred.
• the intermediate layer is located on the base material.
• the intermediate layer may be formed so as to be in contact with the base material, or may be formed on the base material via another layer. In a preferred embodiment, the intermediate layer is formed so as to be in contact with the base material.
• the intermediate layer contains a composite oxide containing Si, that is, a composite oxide of Si and another metal.
• the composite oxides are those in which oxides of a plurality of elements including Si form a homogeneous phase, that is, in addition to a so-called solid solution, oxides of a plurality of elements form a heterogeneous phase, and a plurality of oxides. Including those in which oxides of the above elements are mixed.
• the concentration of other metals changes along the thickness direction of the intermediate layer, for example, a concentration gradient is provided along the thickness direction of the intermediate layer, or the concentration changes stepwise.
• the composite oxide is composed of a solid solution that constitutes a homogeneous phase.
• the metal also includes semimetals such as B, Si, Ge, Sb, As, and Te.
• the other metal may be one or more atoms selected from the transition metals of groups 3 to 11 of the periodic table and the main group metal elements of groups 12 to 15.
• the other metal is preferably a transition metal element of groups 3 to 11, more preferably a transition metal element of groups 3 to 7, and even more preferably a transition metal element of groups 4 to 6.
• the other metal is one or more atoms selected from Ta, Nb, Zr, Mo, W, Cr, Hf, Al, Ti and V.
• the other metal is Ta, Nb, W, Mo, Cr or V.
• the other metal is Ta.
• the molar ratio of Si to the other metal is 10:90 to 99.9: 0.1 (Si: other metal), preferably 10:90 to 99: 1, more. It is preferably 10:90 to 95: 5, even more preferably 13:87 to 93: 7, particularly preferably 40:60 to 80:20, for example 50:50 to 99: 1, 50:50 to 90 :. It can be 10 or 75: 25-99: 1.
• the molar ratio of Si to other metals in such a range the durability of the surface treatment layer is improved.
• the molar ratio of Si to other metals in the intermediate layer can be an average value thereof.
• the composition of the intermediate layer is 0.1 nm to 10 nm, preferably 0.1 nm to 5 nm, more preferably 0.1 to 3 nm, still more preferably 0.1 from the outermost surface close to the surface treatment layer.
• the composition of the intermediate layer at ⁇ 3 nm and 0.1 nm ⁇ 2 nm satisfies the above molar ratio.
• the composition from the outermost surface to the predetermined depth can be the average value of the concentrations from the outermost surface to the predetermined depth.
• the average value of the composition from the outermost surface to 2 nm, 3 nm or 5 nm may be the average value of the composition measured at a predetermined time by sputtering at a constant speed.
• the composition of such an intermediate layer can be an average value of concentrations of 0.1 nm, 1 nm, 2 nm, 3 nm, 5 nm, 6 nm, 9 nm and 10 nm from the outermost surface.
• the composition of the intermediate layer from 0.1 nm to 10 nm from the outermost surface may be an average value of concentrations of 0.1 nm, 1 nm, 2 nm, 3 nm, 5 nm, 6 nm, 9 nm and 10 nm from the outermost surface, and may be the average value.
• the composition of the intermediate layer from 0.1 nm to 5 nm may be an average value of concentrations of 0.1 nm, 1 nm, 2 nm, 3 nm and 5 nm from the outermost surface.
• the thickness of the intermediate layer is not particularly limited, but may be, for example, 1.0 nm or more and 100 nm or less, preferably 2 nm or more and 50 nm or less, and more preferably 2 nm or more and 20 nm or less.
• the thickness of the intermediate layer is not particularly limited, but may be, for example, 1.0 nm or more and 100 nm or less, preferably 2 nm or more and 50 nm or less, and more preferably 2 nm or more and 20 nm or less.
• the method for forming the intermediate layer is not particularly limited, but a method capable of simultaneously depositing Si and other metals is preferable, for example, sputtering, ion beam assist, vacuum vapor deposition (preferably electron beam heating method), and CVD (chemical vapor phase vapor deposition). ), Atomic layer deposition and the like can be used, and sputtering is preferably used.
• sputtering method a sputtering method using a DC (DC) sputtering method, an AC (alternating current) sputtering method, an RF (radio frequency) sputtering method, a RAS (radical assist) sputtering method, or the like can be used.
• DC DC
• AC alternating current
• RF radio frequency
• RAS radio assist
• the silicon target in sputtering one containing silicon (Si) or silicon oxide as a main component is used. It is desirable that the target containing silicon (Si) as a main component has a certain degree of conductivity so that DC sputtering can be performed. Therefore, as a target containing silicon (Si) as a main component, a target made of polycrystalline silicon, or a known dopant of phosphorus (P) and boron (B) in single crystal silicon is used within a range that does not impair the characteristics of the present invention. It is preferable to use the one doped with.
• Such a target made of polycrystalline silicon and a target obtained by doping single crystal silicon with phosphorus (P), boron (B) or the like can be used in any of DC sputtering, AC sputtering, RF sputtering and RAS sputtering. can do.
• a glass substrate is placed in a chamber having a mixed gas atmosphere of an inert gas and an oxygen gas, and a target is selected as a material for forming an adhesion layer so as to have a desired composition.
• a target is selected as a material for forming an adhesion layer so as to have a desired composition.
• Membrane the type of the inert gas in the chamber is not particularly limited, and various inert gases such as argon and helium can be used.
• the pressure in the chamber due to the mixed gas of the inert gas and the oxygen gas is not particularly limited, but by setting it in the range of 0.5 Pa or less, the surface roughness of the formed film is set in a preferable range. Is easy. This is thought to be due to the reason shown. That is, when the pressure in the chamber due to the mixed gas of the inert gas and the oxygen gas is 0.5 Pa or less, the mean free path of the film-forming molecules is secured, and the film-forming molecules reach the substrate with more energy. .. Therefore, it is considered that the rearrangement of the film-forming molecules is promoted and a film having a relatively dense and smooth surface is formed.
• the lower limit of the pressure in the chamber due to the mixed gas of the inert gas and the oxygen gas is not particularly limited, but is preferably 0.1 Pa or more, for example.
• the layer thickness and composition of each layer can be adjusted, for example, by adjusting the discharge power, adjusting the film forming time, or mixing an inert gas and an oxygen gas. It is possible by adjusting the ratio of.
• the durability of the surface treatment layer can be improved.
• Durability is alkali resistance, hydrolysis resistance, and abrasion resistance.
• the molar ratio of Si to other metals is 10: 90 to 99.9: 0.1 (Si: other metals), preferably 10: 90 to 99: 1, and more. It is preferably 10:90 to 95: 5, even more preferably 13:87 to 93: 7, particularly preferably 40:60 to 80:20, such as 50:50 to 99: 1, 50:50 to 90 :. It can be 10 or 75: 25-99: 1.
• the alkali resistance of the surface treatment layer is improved.
• the molar ratio of Si to other metals is 10: 90 to 99.9: 0.1 (Si: other metals), preferably 10: 90 to 99: 1. Yes, more preferably 10:90 to 95: 5, even more preferably 13:87 to 93: 7, particularly preferably 40:60 to 80:20, for example 50:50 to 99: 1, 50:50. It can be from 90:10 or 75:25 to 99: 1.
• composition and ratio of the intermediate layer can be determined by the following surface analysis.
• a surface analysis method X-ray photoelectron spectroscopy, time-of-flight secondary ion mass spectrometry, or the like can be used.
• XPS X-ray photoelectron spectroscopy
• the measurement conditions for XPS analysis are astrophysical AlK ⁇ rays of 25 W, photoelectron detection area of 1400 ⁇ m ⁇ 300 ⁇ m, and photoelectron detection angle in the range of 20 to 90 degrees (for example, 20 degrees, 45 degrees, 90 degrees).
• the path energy is 23.5 eV, and Ar ion can be used as the sputter ion.
• Suitable orbitals of other metals include, for example, atomic number 5 (B) is 1s orbital, atomic numbers 13-14, 21-31 (Al-Si, Sc-Ga) are 2p orbitals, atomic numbers 32-33, etc. 39 to 52 (Ge to As, Y to Te) have 3d orbitals, and atomic numbers 72 to 83 (Hf to Bi) have 4f orbitals.
• the photoelectron detection area is 1400 ⁇ m ⁇ 300 ⁇ m
• the photoelectron detection angle is in the range of 20 to 90 degrees (for example, 20 degrees, 45 degrees, 90 degrees).
• the path energy is 23.5 eV
• Ar ion can be used as the sputter ion.
• the surface layer of the laminate is etched by 1 to 100 nm in terms of SiO 2 by sputtering with Ar ions, and the peak areas of O1s, Si2p orbitals, and appropriate orbitals of other metals are observed at the depth after each etching, and oxygen,
• the composition inside the laminate can be determined by calculating the atomic ratios of silicon and other metals.
• Suitable orbitals of other metals include, for example, atomic number 5 (B) is 1s orbital, atomic numbers 13-14, 21-31 (Al-Si, Sc-Ga) are 2p orbitals, atomic numbers 32-33, etc. 39 to 52 (Ge to As, Y to Te) have 3d orbitals, and atomic numbers 72 to 83 (Hf to Bi) have 4f orbitals.
• the detection depth can be adjusted as appropriate by adjusting the photoelectron detection angle of the XPS analysis described above. For example, by setting a shallow angle close to 20 degrees, the detection depth can be set to about 3 nm, while by setting a deep angle close to 90 degrees, the detection depth can be set to about 10 and several nm. it can.
• composition of the intermediate layer can be calculated by calculating the Si amount of the base material detected from the detected amount of K, B, Ca, Mg, Sn, etc. and subtracting it from the measurement result.
• the surface treatment layer is located directly above the intermediate layer. That is, the surface treatment layer is formed so as to be in contact with the intermediate layer.
• the surface treatment layer can be formed from a surface treatment agent containing a fluorine-containing silane compound.
• the fluorine-containing silane compound has the following formula (1) or (2): [During the ceremony: R F1 is independently at each occurrence, Rf 1 -R F -O q - a and; R F2 is -R f 2 p -RF -O q- ; Rf 1 is a C 1-16 alkyl group that may be independently substituted with one or more fluorine atoms at each appearance; Rf 2 is a C 1-6 alkylene group that may be substituted with one or more fluorine atoms; RF is a divalent fluoropolyether group independently at each appearance; p is 0 or 1; q is 0 or 1 independently at each occurrence; R Si is a monovalent group containing a Si atom to which a hydroxyl group, a hydrolyzable group, a hydrogen atom or a monovalent organic group is bonded independently at each appearance; At least one R Si is a monovalent group containing a Si atom with a hydroxyl group or
• monovalent organic group means a carbon-containing monovalent group.
• the monovalent organic group is not particularly limited, but may be a hydrocarbon group or a derivative thereof.
• a hydrocarbon group derivative is a group having one or more N, O, S, Si, amide, sulfonyl, siloxane, carbonyl, carbonyloxy, etc. in the terminal or molecular chain of the hydrocarbon group. Means.
• the "divalent organic group” is not particularly limited, and examples thereof include a divalent group in which one hydrogen atom is eliminated from the hydrocarbon group.
• the "hydrocarbon group” means a group containing carbon and hydrogen, from which one hydrogen atom has been desorbed from the molecule.
• the hydrocarbon group is not particularly limited, but may be substituted with one or more substituents, such as a hydrocarbon group having 1 to 20 carbon atoms, for example, an aliphatic hydrocarbon group. Examples include aromatic hydrocarbon groups.
• the "aliphatic hydrocarbon group” may be linear, branched or cyclic, and may be saturated or unsaturated.
• the hydrocarbon group may contain one or more ring structures.
• the hydrocarbon group may have one or more N, O, S, Si, amide, sulfonyl, siloxane, carbonyl, carbonyloxy and the like at its terminal or molecular chain.
• the substituent of the "hydrocarbon group” is not particularly limited, but may be, for example, a halogen atom; substituted with one or more halogen atoms, C 1-6 alkyl.
• Group, C 2-6 alkenyl group, C 2-6 alkynyl group, C 3-10 cycloalkyl group, C 3-10 unsaturated cycloalkyl group, 5-10 member heterocyclyl group, 5-10 member unsaturated heterocyclyl Groups include one or more groups selected from C 6-10 aryl groups and 5-10 membered heteroaryl groups.
• alkyl and phenyl groups may be unsubstituted or substituted unless otherwise specified.
• the substituent of such a group is not particularly limited, and for example, one or more groups selected from a halogen atom, a C 1-6 alkyl group, a C 2-6 alkenyl group and a C 2-6 alkynyl group can be used. Can be mentioned.
• R F1 is Rf 1 ⁇ R F ⁇ O q ⁇ independently at each appearance.
• R F2 is, -Rf 2 p -R F -O q - is.
• Rf 1 is a C 1-16 alkyl group that may be independently substituted with one or more fluorine atoms at each appearance.
• the "C 1-16 alkyl group" in the C 1-16 alkyl group which may be substituted with one or more fluorine atoms may be a straight chain or a branched chain, and is preferable. Is a linear or branched C 1-6 alkyl group, particularly a C 1-3 alkyl group, more preferably a linear C 1-6 alkyl group, particularly a C 1-3 alkyl group.
• the Rf 1 is preferably a one or more C 1-16 alkyl group substituted by fluorine atoms, more preferably CF 2 H-C 1-15 perfluoroalkylene group, more preferably Is a C 1-16 perfluoroalkyl group.
• the C 1-16 perfluoroalkyl group may be linear or branched, preferably a linear or branched C 1-6 perfluoroalkyl group, particularly C 1-. It is a 3 perfluoroalkyl group, more preferably a linear C 1-6 perfluoroalkyl group, particularly a C 1-3 perfluoroalkyl group, specifically -CF 3 , -CF 2 CF 3 , or -CF. 2 CF 2 CF 3 .
• Rf 2 is a C 1-6 alkylene group that may be substituted with one or more fluorine atoms.
• C 1-6 alkylene group in the C 1-6 alkylene group which may be substituted with one or more fluorine atoms may be a straight chain or a branched chain, and is preferable. Is a straight or branched C 1-3 alkylene group, more preferably a straight C 1-3 alkylene group.
• the Rf 2 is preferably a one or more C 1-6 alkylene group substituted with a fluorine atom, more preferably a C 1-6 perfluoroalkylene group, more preferably C 1- 3 Perfluoroalkylene group.
• the C 1-6 perfluoroalkylene group may be a straight chain or a branched chain, and is preferably a straight chain or a branched C 1-3 perfluoroalkylene group, more preferably. is -CF 2 C 1-3 perfluoroalkylene group linear, specifically -, - CF 2 CF 2 - , or -CF 2 CF 2 CF 2 - it is.
• p is 0 or 1. In one embodiment, p is 0. In another embodiment p is 1.
• q is 0 or 1 independently at each appearance. In one embodiment, q is 0. In another embodiment q is 1.
• RF is a divalent fluoropolyether group independently at each appearance.
• RF is preferably the formula: - (OC 6 F 12) a - (OC 5 F 10) b - (OC 4 F 8) c - (OC 3 R Fa 6) d - (OC 2 F 4) e - (OCF 2) f -
• R Fa is a hydrogen atom, a fluorine atom or a chlorine atom independently at each appearance.
• a, b, c, d, e and f are each independently an integer of 0 to 200, and the sum of a, b, c, d, e and f is 1 or more.
• the order of existence of each repeating unit in parentheses with a, b, c, d, e or f is arbitrary in the equation. ] It is a group represented by.
• R Fa is preferably a hydrogen atom or a fluorine atom, and more preferably a fluorine atom.
• A, b, c, d, e and f are preferably independent integers from 0 to 100.
• the sum of a, b, c, d, e and f is preferably 5 or more, more preferably 10 or more, and may be, for example, 15 or more or 20 or more.
• the sum of a, b, c, d, e and f is preferably 200 or less, more preferably 100 or less, still more preferably 60 or less, and may be, for example, 50 or less or 30 or less.
• the repeating unit with a, b, c, d, e and f and enclosed in parentheses may be linear or branched.
• -(OC 3 F 6 )-(that is, R Fa is a fluorine atom in the above formula) is-(OCF 2 CF 2 CF 2 )-,-(OCF (CF 3 ) CF 2 )-or-( OCF 2 CF (CF 3 ))-can be.
• the repeating unit is linear. That is,-(OC 6 F 12 )-is-(OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2 )-and-(OC 5 F 10 )-is-(OCF 2 CF 2 CF 2 CF. 2 CF 2 )-,-(OC 4 F 8 )-is-(OCF 2 CF 2 CF 2 CF 2 )-and-(OC 3 F 6 )-is-(OCF 2 CF 2 CF) 2 )-and-(OC 2 F 4 )-is-(OCF 2 CF 2 )-.
• the repeating unit is branched chain. By forming the repeating unit into a branched chain shape, the coefficient of dynamic friction of the surface treatment layer can be increased.
• R F is independently at each occurrence, the following formula (f1) ⁇ (f4): -(OC 3 F 6 ) d- (f1) [In the formula, d is an integer from 1 to 200. ] - (OC 4 F 8) c - (OC 3 F 6) d - (OC 2 F 4) e - (OCF 2) f - (f2) [In the formula, c and d are independently integers of 0 or more and 30 or less, and e and f are independently integers of 1 or more and 200 or less.
• e is an integer of 1 or more and 200 or less, and a, b, c, d and f are independently integers of 0 or more and 200 or less, and a, b, c, d and e.
• the sum of and f is at least 1, and the order of existence of each repeating unit in parentheses with a, b, c, d, e or f is arbitrary in the equation.
• f is an integer of 1 or more and 200 or less, and a, b, c, d and e are independently integers of 0 or more and 200 or less, and a, b, c, d and e.
• the sum of and f is at least 1, and the order of existence of each repeating unit in parentheses with a, b, c, d, e or f is arbitrary in the equation.
• d is preferably an integer of 5 to 200, more preferably 10 to 100, still more preferably 15 to 50, for example 25 to 35.
• the above formula (f1) is preferably a group represented by ⁇ (OCF 2 CF 2 CF 2 ) d ⁇ or ⁇ (OCF (CF 3 ) CF 2 ) d ⁇ , and more preferably ⁇ (OCF 2).
• e and f are independently integers of preferably 5 or more and 200 or less, and more preferably 10 to 200.
• the sum of c, d, e and f is preferably 5 or more, more preferably 10 or more, and may be, for example, 15 or more or 20 or more.
• the above formula (f2) is preferably ⁇ (OCF 2 CF 2 CF 2 CF 2 ) c ⁇ (OCF 2 CF 2 CF 2 ) d ⁇ (OCF 2 CF 2 ) e ⁇ (OCF 2 ). It is a group represented by f ⁇ .
• the formula (f2) may be a group represented by ⁇ (OC 2 F 4 ) e ⁇ (OCF 2 ) f ⁇ .
• R 6 is preferably OC 2 F 4 .
• R 7 is preferably a group selected from OC 2 F 4 , OC 3 F 6 and OC 4 F 8 , or 2 or independently selected from these groups. It is a combination of three groups, more preferably a group selected from OC 3 F 6 and OC 4 F 8 .
• the combination of two or three groups independently selected from OC 2 F 4 , OC 3 F 6 and OC 4 F 8 is not particularly limited, but is, for example, -OC 2 F 4 OC 3 F 6- , -OC.
• g is preferably an integer of 3 or more, more preferably 5 or more.
• the above g is preferably an integer of 50 or less.
• OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10, and OC 6 F 12 may be either linear or branched, preferably straight. It is a chain.
• the above formula (f3) is preferably ⁇ (OC 2 F 4 ⁇ OC 3 F 6 ) g ⁇ or ⁇ (OC 2 F 4 ⁇ OC 4 F 8 ) g ⁇ .
• e is preferably an integer of 1 or more and 100 or less, more preferably 5 or more and 100 or less.
• the sum of a, b, c, d, e and f is preferably 5 or more, more preferably 10 or more, for example 10 or more and 100 or less.
• f is preferably an integer of 1 or more and 100 or less, and more preferably 5 or more and 100 or less.
• the sum of a, b, c, d, e and f is preferably 5 or more, more preferably 10 or more, for example 10 or more and 100 or less.
• the R F is a group represented by the formula (f1).
• the R F is a group represented by the formula (f2).
• the R F is a group represented by the formula (f3).
• the R F is a group represented by the above formula (f4).
• the R F is a group represented by the above formula (f5).
• the ratio of e for f (hereinafter, referred to as "e / f ratio”) is 0.1 to 10, preferably from 0.2 to 5, more preferably 0.2 to 2 Yes, more preferably 0.2 to 1.5, and even more preferably 0.2 to 0.85.
• e / f ratio the slipperiness, friction durability and chemical resistance (for example, durability against artificial sweat) of the surface treatment layer obtained from this compound are further improved.
• the smaller the e / f ratio the better the slipperiness and friction durability of the surface treatment layer.
• the stability of the compound can be further enhanced. The larger the e / f ratio, the better the stability of the compound.
• the e / f ratio is preferably 0.2 to 0.95, more preferably 0.2 to 0.9.
• the e / f ratio is preferably 1.0 or more, and more preferably 1.0 to 2.0.
• a number average molecular weight of R F1 and R F2 portion is not particularly limited, for example, 500 to 30,000, preferably 1,500 to 30,000, more preferably It is 2,000 to 10,000.
• the number average molecular weight of R F1 and R F2 is a value measured by 19 F-NMR.
• the number average molecular weight of R F1 and R F2 portion 500 to 30,000, preferably more preferably 1,000 to 20,000, more preferably 2,000 to 15,000, further 2, It can be between 000 and 10,000, for example 3,000 and 6,000.
• the number average molecular weight of R F1 and R F2 portion 4,000 to 30,000, preferably be 5,000 to 10,000, more preferably 6,000 to 10,000.
• R Si is a monovalent group containing a hydroxyl group, a hydrolyzable group, a hydrogen atom or a Si atom to which a monovalent organic group is bonded independently at each appearance. At least one R Si is a monovalent group containing a Si atom to which a hydroxyl group or a hydrolyzable group is attached.
• RSi is a monovalent group containing a Si atom to which a hydroxyl group or a hydrolyzable group is attached.
• RSi is represented by the following formula (S1), (S2), (S3), or (S4): It is a group represented by.
• R 11 is a hydroxyl group or a hydrolyzable group independently at each appearance.
• R 11 is preferably an independently hydrolyzable group at each appearance.
• R h include an unsubstituted alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group and an isobutyl group; and a substituted alkyl group such as a chloromethyl group.
• an alkyl group particularly an unsubstituted alkyl group is preferable, and a methyl group or an ethyl group is more preferable.
• R h is a methyl group and in another embodiment, R h is an ethyl group.
• R 12 is a hydrogen atom or a monovalent organic group independently at each appearance.
• a monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
• the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.
• n1 is an integer of 0 to 3 independently for each unit (SiR 11 n1 R 12 3-n1 ).
• R Si is a group represented by the formula (S1) or (S2)
• the R Si ⁇ and R Si ⁇ portions at the ends of the formulas (1) and (2) (hereinafter, simply the formula (1)).
• terminal portion of the formula (2)
• at the terminal portions of formulas (1) and (2) there is at least one Si atom to which a hydroxyl group or a hydrolyzable group is attached.
• n1 is an integer of preferably 1 to 3, more preferably 2 to 3, and even more preferably 3 independently for each unit (SiR 11 n1 R 12 3-n1 ).
• X 11 is a single bond or divalent organic group independently at each appearance.
• the divalent organic group is preferably a C 1-20 alkylene group.
• the C 1-20 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain.
• X 11 is an independently single-bonded or linear C 1-6 alkylene group at each appearance, preferably a single-bonded or linear C 1-3 alkylene group, more preferably a single. It is a bonded or straight chain C 1-2 alkylene group, more preferably a straight chain C 1-2 alkylene group.
• R 13 is a hydrogen atom or a monovalent organic group independently at each appearance.
• a monovalent organic group is preferably a C 1-20 alkyl group.
• the C 1-20 alkyl group may be a straight chain or a branched chain, but is preferably a straight chain.
• R 13 is independently a hydrogen atom or a linear C 1-6 alkyl group at each appearance, preferably a hydrogen atom or a linear C 1-3 alkyl group, preferably a hydrogen atom. Or it is a methyl group.
• t is an integer of 2 to 10 independently at each occurrence.
• t is an integer of 2 to 6 independently for each appearance.
• R 14 is a hydrogen atom or a halogen atom independently at each appearance.
• a halogen atom is preferably an iodine atom, a chlorine atom or a fluorine atom, and more preferably a fluorine atom.
• R 14 is a hydrogen atom.
• R a1 is -Z 1- SiR 21 p1 R 22 q1 R 23 r1 independently at each appearance.
• Z 1 is an oxygen atom or a divalent organic group independently at each appearance.
• the right side is coupled to (SiR 21 p1 R 22 q1 R 23 r1 ).
• Z 1 is a divalent organic group.
• Z 1 does not include those that form a siloxane bond with the Si atom to which Z 1 is attached.
• Si-Z 1 -Si does not contain a siloxane bond.
• Z 1 is preferably a C 1-6 alkylene group,-(CH 2 ) z1 -O- (CH 2 ) z2- (in the formula, z1 is an integer of 0 to 6, for example, an integer of 1 to 6).
• z2 is an integer of 0 to 6, for example, an integer of 1 to 6) or- (CH 2 ) z3 -phenylene- (CH 2 ) z4- (in the formula, z3 is an integer of 0 to 6,
• z4 is an integer of 0 to 6, for example, an integer of 1 to 6).
• the C 1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain.
• These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group. However, it is preferably unsubstituted.
• Z 1 is a C 1-6 alkylene group or- (CH 2 ) z3 -phenylene- (CH 2 ) z4- , preferably -phenylene- (CH 2 ) z4- .
• Z 1 is such a group, light resistance, especially UV resistance, can be higher.
• Z 1 is a C 1-3 alkylene group. In one embodiment, Z 1 can be -CH 2 CH 2 CH 2- . In another embodiment, Z 1 can be -CH 2 CH 2- .
• the R 21 is ⁇ Z 1 ′ ⁇ SiR 21 ′ p1 ′ R 22 ′ q1 ′ R 23 ′ r1 ′ independently at each appearance.
• the Z 1 ' are each independently at each occurrence, is an oxygen atom or a divalent organic group.
• SiR 21' binds to p1 'R 22' q1 'R 23' r1 ').
• Z 1 ' is a divalent organic group.
• Z 1 ' is, Z 1' do not include those that form a siloxane bond and Si atoms are bonded.
• Si-Z 1 '-Si do not include siloxane bond.
• the Z 1 ' are preferably, C 1-6 alkylene group, - (CH 2) z1' -O- (CH 2) z2 '- ( wherein, z1' is an integer of 0 to 6, such as 1 to It is an integer of 6, and z2'is an integer of 0 to 6, for example, an integer of 1 to 6) or- (CH 2 ) z3'- phenylene- (CH 2 ) z4' -(in the formula, z3' Is an integer of 0 to 6, for example, an integer of 1 to 6, and z4'is an integer of 0 to 6, for example, an integer of 1 to 6).
• the C 1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain. These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group. However, it is preferably unsubstituted.
• Z 1 ' is, C 1-6 alkylene group or - (CH 2) z3' - phenylene - (CH 2) z4 '- , preferably - phenylene - (CH 2) z4' - a.
• Z 1' is a such group, light resistance, especially UV resistance, can be higher.
• the Z 1 ' is a C 1-3 alkylene group. In one embodiment, Z 1 'is, -CH 2 CH 2 CH 2 - may be. In another embodiment, Z 1 'is, -CH 2 CH 2 - may be.
• the R 21 ' are each independently at each occurrence, is -Z 1 "-SiR 22" q1 " R 23" r1 ".
• Z 1 " is an oxygen atom or a divalent organic group independently at each appearance.
• the right side is (SiR 22 “ q1" R 23 " r1”. ).
• Z 1 " is a divalent organic group.
• Z 1 " does not include those forming a siloxane bond with the Si atom to which Z 1" is attached.
• Z 1 does not include those forming a siloxane bond with the Si atom to which Z 1" is attached.
• (Si—Z1 ′′ -Si) does not contain a siloxane bond.
• Z 1 " is preferably a C 1-6 alkylene group,-(CH 2 ) z1" -O- (CH 2 ) z2 " -(in the formula, z1" is an integer of 0 to 6, for example, 1 to 1. It is an integer of 6, and z2 "is an integer of 0 to 6, for example, an integer of 1 to 6) or- (CH 2 ) z3" -phenylene- (CH 2 ) z4 " -(in the formula, z3". Is an integer of 0 to 6, for example an integer of 1 to 6, and z4 "is an integer of 0 to 6, for example, an integer of 1 to 6).
• Such a C 1-6 alkylene group is a straight chain.
• These groups are, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-. It may be substituted with one or more substituents selected from the 6 alkynyl groups, but is preferably unsubstituted.
• Z 1 " is a C 1-6 alkylene group or- (CH 2 ) z 3" -phenylene- (CH 2 ) z 4 " -, preferably -phenylene- (CH 2 ) z 4" -.
• light resistance especially ultraviolet resistance, can be higher.
• the Z 1 " is a C 1-3 alkylene group. In one embodiment, the Z 1" can be -CH 2 CH 2 CH 2- . In another embodiment, Z 1 " can be -CH 2 CH 2- .
• the R 22 ′′ is a hydroxyl group or a hydrolyzable group independently at each appearance.
• R 22 " is preferably an independently hydrolyzable group at each appearance.
• h is a substituted or unsubstituted C 1-4 alkyl group), more preferably ⁇ OR h (that is, an alkoxy group).
• R h is a methyl group, an ethyl group, a propyl group, or an isopropyl.
• Substituent alkyl groups such as groups, n-butyl groups and isobutyl groups; substituted alkyl groups such as chloromethyl groups are mentioned.
• alkyl groups particularly unsubstituted alkyl groups are preferable, and methyl groups or ethyl groups are more preferable.
• R h is a methyl group and in another embodiment, R h is an ethyl group.
• the R 23 ′′ is a hydrogen atom or a monovalent organic group independently at each appearance.
• the monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
• the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.
• the q1 " is an integer of 0 to 3 independently at each appearance, and the r1" is an integer of 0 to 3 independently at each appearance.
• the total of q1 "and r1" is 3 in the unit of (SiR 22 " q1" R 23 " r1” ).
• q1 is an integer of preferably 1 to 3, more preferably 2 to 3, and further preferably 3 independently for each unit (SiR 22 " q1" R 23 " r1" ).
• the R 22 ' are each independently at each occurrence, it is a hydroxyl group or a hydrolyzable group.
• R 22' is preferably an independently hydrolyzable group at each appearance.
• R h include an unsubstituted alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group and an isobutyl group; and a substituted alkyl group such as a chloromethyl group.
• an alkyl group particularly an unsubstituted alkyl group is preferable, and a methyl group or an ethyl group is more preferable.
• R h is a methyl group and in another embodiment, R h is an ethyl group.
• the R 23' is a hydrogen atom or a monovalent organic group independently at each appearance.
• a monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
• the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.
• p1' is an integer of 0 to 3 independently at each appearance
• q1' is an integer of 0 to 3 independently at each appearance
• r1' is an integer of 0 to 3 independently at each appearance. Then, it is an integer of 0 to 3.
• p ', q1'' is the sum of, (SiR 21' and r1 at p1 'R 22' q1 'R 23' r1 ') units, it is 3.
• p1' is 0.
• p1 ' is, (SiR 21' p1 'R 22' q1 'R 23' r1 ') independently for each unit, the integer of 1 to 3, 2-3 integer or 3, met You may. In a preferred embodiment, p1'is 3.
• q1 ' is, (SiR 21' p1 'R 22' q1 'R 23' r1 ') independently for each unit in an integer of 1 to 3, preferably an integer of 2 to 3, More preferably, it is 3.
• p1 ' is 0, q1' is, (SiR 21 'p1' R 22 'q1' R 23 'r1') independently for each unit, an integer of 1 to 3, preferably Is an integer of 2 to 3, more preferably 3.
• the R 22 is a hydroxyl group or a hydrolyzable group independently at each appearance.
• R 22 is preferably an independently hydrolyzable group at each appearance.
• R h include an unsubstituted alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group and an isobutyl group; and a substituted alkyl group such as a chloromethyl group.
• an alkyl group particularly an unsubstituted alkyl group is preferable, and a methyl group or an ethyl group is more preferable.
• R h is a methyl group and in another embodiment, R h is an ethyl group.
• the R 23 is a hydrogen atom or a monovalent organic group independently at each appearance.
• a monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
• the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.
• p1 is an integer of 0 to 3 independently in each appearance
• q1 is an integer of 0 to 3 independently in each appearance
• r1 is an integer of 0 to 3 independently in each appearance. It is an integer from 0 to 3.
• the total of p, q1 and r1 is 3 in the unit of (SiR 21 p1 R 22 q1 R 23 r1 ).
• p1 is 0.
• p1 may be an integer of 1 to 3, an integer of 2 to 3, or 3 independently for each unit (SiR 21 p1 R 22 q1 R 23 r1 ). In a preferred embodiment, p1 is 3.
• q1 is an integer of 1 to 3, preferably an integer of 2 to 3, more preferably 3, independently of each unit (SiR 21 p1 R 22 q1 R 23 r1 ).
• p1 is 0 and q1 is an integer of 1 to 3, preferably an integer of 2 to 3, independently of each unit (SiR 21 p1 R 22 q1 R 23 r1 ). It is preferably 3.
• R b1 is a hydroxyl group or a hydrolyzable group independently at each appearance.
• R b1 is preferably an independently hydrolyzable group at each appearance.
• R h include an unsubstituted alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group and an isobutyl group; and a substituted alkyl group such as a chloromethyl group.
• an alkyl group particularly an unsubstituted alkyl group is preferable, and a methyl group or an ethyl group is more preferable.
• R h is a methyl group and in another embodiment, R h is an ethyl group.
• R c1 is a hydrogen atom or a monovalent organic group independently at each appearance.
• a monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
• the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.
• k1 is an integer of 0 to 3 independently in each appearance
• l1 is an integer of 0 to 3 independently in each appearance
• m1 is an independent integer in each appearance. It is an integer from 0 to 3.
• the total of p, l1 and m1 is 3 in the unit of (SiR a1 k1 R b1 l1 R c1 m1 ).
• k1 is an integer of 1 to 3 independently for each unit (SiR a1 k1 R b1 l1 R c1 m1 ), preferably 2 or 3, and more preferably 3. In a preferred embodiment, k1 is 3.
• R Si is a group represented by the formula (S3)
• a hydroxyl group or a hydrolyzable group is preferably formed at the terminal portions of the formulas (1) and (2).
• the group represented by the formula (S3) during -Z 1 -SiR 22 q1 R 23 r1 (wherein, q1 is an integer of 1 to 3, preferably 2 or 3, more preferably 3 in it, r1 is an integer of 0 ⁇ 2), -.
• R 21 is present in formula (S3)
• p1' is 0 and q1'is an integer of 1-3, preferably in at least one, preferably all R 21 ,. Is 2 or 3, more preferably 3.
• Ra1 when Ra1 is present, in at least one, preferably all Ra1 , p1 is 0 and q1 is an integer of 1-3, preferably 2. Or 3, more preferably 3.
• k1 is 2 or 3, preferably 3, p1 is 0, and q1 is 2 or 3, preferably 3.
• R d1 is -Z 2- CR 31 p2 R 32 q2 R 33 r2 independently at each appearance.
• Z 2 is an independent, single bond, oxygen atom or divalent organic group at each appearance.
• the structure described below as Z 2 is coupled to (CR 31 p2 R 32 q2 R 33 r2 ) on the right side.
• Z 2 is a divalent organic group.
• Z 2 is preferably a C 1-6 alkylene group,-(CH 2 ) z5- O- (CH 2 ) z6- (in the formula, z5 is an integer of 0 to 6, for example, an integer of 1 to 6).
• z6 is an integer of 0 to 6, for example, an integer of 1 to 6) or- (CH 2 ) z7 -phenylene- (CH 2 ) z8- (in the formula, z7 is an integer of 0 to 6,
• z8 is an integer of 0 to 6, for example, an integer of 1 to 6).
• the C 1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain.
• These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group. However, it is preferably unsubstituted.
• Z 2 is a C 1-6 alkylene group or- (CH 2 ) z7 -phenylene- (CH 2 ) z8- , preferably -phenylene- (CH 2 ) z8- .
• Z 2 is such a group, light resistance, especially UV resistance, can be higher.
• Z 2 is a C 1-3 alkylene group. In one embodiment, Z 2 can be -CH 2 CH 2 CH 2- . In another embodiment, Z 2 can be -CH 2 CH 2- .
• R 31 is independently at each occurrence, is -Z 2 '-CR 32' q2 ' R 33' r2 '.
• Z 2 ' are each independently at each occurrence, a single bond, an oxygen atom or a divalent organic group.
• Z 2 'structure described as the right side CR 32' binds to q2 'R 33' r2 ') .
• Said Z 2 ' are preferably, C 1-6 alkylene group, - (CH 2) z5' -O- (CH 2) z6 '- ( wherein, z5' is an integer of 0 to 6, such as 1 to It is an integer of 6, and z6'is an integer of 0 to 6, for example, an integer of 1 to 6) or- (CH 2 ) z7'- phenylene- (CH 2 ) z8' -(in the formula, z7' Is an integer of 0 to 6, for example, an integer of 1 to 6, and z8'is an integer of 0 to 6, for example, an integer of 1 to 6).
• the C 1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain. These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group. However, it is preferably unsubstituted.
• Z 2 ' is, C 1-6 alkylene group or - (CH 2) z7' - phenylene - (CH 2) z8 '- , preferably - phenylene - (CH 2) z8' - a.
• Z 2' is such a group, light resistance, especially UV resistance, can be higher.
• the Z 2 ' is a C 1-3 alkylene group. In one embodiment, Z 2 'is, -CH 2 CH 2 CH 2 - may be. In another embodiment, Z 2 'is, -CH 2 CH 2 - may be.
• the R 32 ' are each independently at each occurrence, is -Z 3 -SiR 34 n2 R 35 3 -n2.
• the Z 3 is a single bond, an oxygen atom or a divalent organic group independently at each appearance.
• the right side is coupled to (SiR 34 n2 R 35 3-n2 ).
• Z 3 is an oxygen atom.
• Z 3 is a divalent organic group.
• Z 3 is preferably a C 1-6 alkylene group,-(CH 2 ) z5 " -O- (CH 2 ) z6" -(in the formula, z5 "is an integer of 0 to 6, for example, 1 to 6. an integer, z6 "is an integer of 0 to 6, for example an integer of 1 to 6) or, - (CH 2) z7" - phenylene - (CH 2) z8 "- ( wherein, z7” is , An integer of 0 to 6, for example, an integer of 1 to 6, and z8 "is an integer of 0 to 6, for example, an integer of 1 to 6).
• the C 1-6 alkylene group may be a straight chain or a branched chain, but is preferably a straight chain. These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group. However, it is preferably unsubstituted.
• Z 3 is, C 1-6 alkylene group or - (CH 2) z7 "- phenylene - (CH 2) z8" - , preferably - phenylene - (CH 2) z8 "- a .Z
• 3 is a such group, light resistance, especially UV resistance, can be higher.
• Z 3 is a C 1-3 alkylene group. In one embodiment, Z 3 can be -CH 2 CH 2 CH 2- . In another embodiment, Z 3 can be -CH 2 CH 2- .
• the R 34 is a hydroxyl group or a hydrolyzable group independently at each appearance.
• R 34 is preferably an independently hydrolyzable group at each appearance.
• R h include an unsubstituted alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group and an isobutyl group; and a substituted alkyl group such as a chloromethyl group.
• an alkyl group particularly an unsubstituted alkyl group is preferable, and a methyl group or an ethyl group is more preferable.
• R h is a methyl group and in another embodiment, R h is an ethyl group.
• the R 35 is a hydrogen atom or a monovalent organic group independently at each appearance.
• a monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
• the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.
• n2 is an integer of 0 to 3 independently for each unit (SiR 34 n2 R 35 3-n2 ).
• R Si is a group represented by the formula (S4)
• n2 is 1 to 3 in the terminal portions of the formulas (1) and (2) (SiR 34 n2 R 35 3-n2 ).
• there is at the terminal portions of formulas (1) and (2) there is at least one Si atom to which a hydroxyl group or a hydrolyzable group is attached.
• n2 is an integer of preferably 1 to 3, more preferably 2 to 3, and even more preferably 3 independently for each unit (SiR 34 n2 R 35 3-n2 ).
• the R 33' is a hydrogen atom, a hydroxyl group or a monovalent organic group independently at each appearance.
• a monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
• the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.
• R 33' is a hydroxyl group.
• R 33 represents a monovalent organic group, preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group.
• the q2' is an integer of 0 to 3 independently at each appearance
• the r2' is an integer of 0 to 3 independently at each appearance.
• the sum of q2 'and r2' are the units (SiR 32 'q2' R 33 'r2'), 3.
• R 32 is -Z 3- SiR 34 n2 R 35 3-n2 independently in each appearance.
• Such -Z 3 -SiR 34 n2 R 35 3 -n2 are as defined herein in the R 32 '.
• the R 33 is a hydrogen atom, a hydroxyl group or a monovalent organic group independently at each appearance.
• a monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
• the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.
• R 33 is a hydroxyl group.
• the monovalent organic group of R 33 is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group.
• p2 is an integer of 0 to 3 independently in each appearance
• q2 is an integer of 0 to 3 independently in each appearance
• r2 is an integer of 0 to 3 independently in each appearance. It is an integer from 0 to 3.
• the total of p2, q2 and r2 is 3 in the unit of (CR 31 p2 R 32 q2 R 33 r2 ).
• p2 is 0.
• p2 may be an integer of 1 to 3, an integer of 2 to 3, or 3 independently for each unit (CR 31 p2 R 32 q2 R 33 r2 ). In a preferred embodiment, p2 is 3.
• q2 is an integer of 1 to 3, preferably an integer of 2 to 3, and more preferably 3 independently for each unit (CR 31 p2 R 32 q2 R 33 r2 ).
• p2 is 0 and q2 is an integer of 1-3, preferably an integer of 2-3, independently for each unit (CR 31 p2 R 32 q2 R 33 r2 ). It is preferably 3.
• R e1 is -Z 3- SiR 34 n2 R 35 3-n2 independently at each appearance.
• Such -Z 3 -SiR 34 n2 R 35 3 -n2 are as defined herein in the R 32 '.
• R f1 is a hydrogen atom, a hydroxyl group or a monovalent organic group independently at each appearance.
• a monovalent organic group is a monovalent organic group excluding the hydrolyzable group.
• the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and even more preferably a methyl group.
• R f1 is a hydroxyl group.
• the monovalent organic group of R f1 is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group.
• k2 is an integer of 0 to 3 independently at each appearance
• l2 is an integer of 0 to 3 independently at each appearance
• m2 is an integer of 0 to 3 independently at each appearance. It is an integer from 0 to 3.
• the total of k2, l2 and m2 is 3 in the unit of (CR d1 k2 Re1 l2 R f1 m2 ).
• n2 is 1 to 3, preferably 2 or 3, more preferably 3 (SiR 34 n2 R 35 3-n2 ) units.
• n2 is 1 to 3, preferably 2 or 3, more preferably 3 (SiR 34 n2 R 35 3-n2 ) units.
• two or more for example, 2 to 27 pieces, preferably 2 to 9, more preferably 2 to 6, still more preferably 2 to 3 pieces.
• n2 is an integer of 1-3, preferably 2 or 3, more preferably Is 3.
• n2 is an integer of 1-3, preferably 2 or 3, more preferably 3. Is.
• n2 is an integer of 1-3, preferably 2 or 3, more preferably 3. Is.
• k2 is 0, l2 is 2 or 3, preferably 3, and n2 is 2 or 3, preferably 3.
• R Si is a group represented by the formula (S2), (S3) or (S4).
• R Si is a group represented by the formula (S1), (S3) or (S4).
• R Si is a group represented by the formula (S3) or (S4).
• R Si is a group represented by the formula (S1).
• R Si is a group represented by the formula (S2).
• R Si is a group represented by the formula (S3).
• R Si is a group represented by the formula (S4).
• X A is mainly to provide the binding ability of the fluoropolyether part for providing water repellency and surface sliding property, etc. and (R F1 and R F2) and base section ( It is understood as a linker that connects R Si ).
• the X A may be any one compound of the formula (1) and (2) can exist stably, may be a single bond, may be any group.
• ⁇ is an integer of 1 to 9
• ⁇ is an integer of 1 to 9.
• ⁇ and ⁇ can vary depending on the valence of X A.
• the sum of ⁇ and ⁇ is the same as the valence of X A.
• X A is a 10-valent organic group
• the sum of ⁇ and ⁇ is 10, for example, ⁇ is 9 and ⁇ is 1, ⁇ is 5 and ⁇ is 5, or ⁇ is 1 and ⁇ is 9. obtain.
• ⁇ and ⁇ are 1.
• ⁇ is an integer of 1 to 9. ⁇ can vary depending on the valence of X A. That is, ⁇ is a value obtained by subtracting 1 from the valence of X A.
• X A is a single bond or a 2- to 10-valent organic group, respectively.
• 2-10 divalent organic groups represented by X A is preferably 2-8 monovalent organic group.
• the divalent to 10 valent organic group is preferably a 2 to 4 valent organic group, more preferably a divalent organic group.
• the divalent to 10 valent organic group is preferably a 3 to 8 valent organic group, more preferably a 3 to 6 valent organic group.
• X A is a single bond or divalent organic group, ⁇ is 1 and ⁇ is 1.
• X A is a single bond or divalent organic group and ⁇ is 1.
• X A is 3 to hexavalent organic group, alpha is 1, beta is 2-5.
• X A is 3 to hexavalent organic group, gamma is 2-5.
• X A is a trivalent organic group, ⁇ is 1 and ⁇ is 2.
• X A is a trivalent organic radical, gamma is 2.
• X A is a single bond.
• X A is a divalent organic group.
• the X A for example, a single bond or the following formula: -(R 51 ) p5- (X 51 ) q5- [During the ceremony: R 51 represents a single bond,-(CH 2 ) s5- or o-, m- or p-phenylene group, preferably-(CH 2 ) s5- .
• s5 is an integer of 1 to 20, preferably an integer of 1 to 6, more preferably an integer of 1 to 3, and even more preferably 1 or 2.
• X 51 represents ⁇ (X 52 ) l5-
• X 52 is an independent -O-, -S-, o-, m- or p-phenylene group, -C (O) O-, -Si (R 53 ) 2 -,-( Si (R 53) 2 O) m5 -Si (R 53) 2 -, - CONR 54 -, - O-CONR 54 -, - NR 54 - and - (CH 2)
• R 54 independently represents a hydrogen atom, a phenyl group or a C 1-6 alkyl group (preferably a methyl group) at each appearance.
• m5 is an integer of 1 to 100, preferably an integer of 1 to 20, independently of each occurrence.
• n5 is an integer of 1 to 20, preferably an integer of 1 to 6, and more preferably an integer of 1 to 3, independently of each occurrence.
• l5 is an integer of 1 to 10, preferably an integer of 1 to 5, more preferably an integer of 1 to 3.
• p5 is 0 or 1 and q5 is 0 or 1 and
• at least one of p5 and q5 is 1, and the order of existence of each repeating unit in parentheses with p5 or q5 is arbitrary].
• RA typically the hydrogen atom of RA
• RA is substituted with one or more substituents selected from fluorine atoms, C 1-3 alkyl groups and C 1-3 fluoroalkyl groups. May be.
• RA is not substituted with these groups.
• the X A are each independently, - (R 51) p5 - (X 51) q5 -R 56 - it is.
• R 56 represents a single bond,-(CH 2 ) t5- or o-, m- or p-phenylene group, preferably ⁇ (CH 2 ) t5- .
• t5 is an integer of 1 to 20, preferably an integer of 2 to 6, and more preferably an integer of 2 to 3.
• R 56 (typically the hydrogen atom of R 56 ) is substituted with one or more substituents selected from fluorine atoms, C 1-3 alkyl groups and C 1-3 fluoroalkyl groups. May be. In a preferred embodiment, R 56 is not substituted with these groups.
• the X A are each, independently, Single bond, -X f5- C 1-20 alkylene group, -X f5- R 51- X 53 -R 52- or-X f5- X 54 -R 5- [In the formula, R 51 and R 52 have the same meaning as above.
• X 53 is -O-, -S-, -C (O) O-, -CONR 54 -, -O-CONR 54 -, -Si (R 53 ) 2- , - (Si (R 53) 2 O) m5 -Si (R 53) 2 -, -O- (CH 2) u5 - ( Si (R 53) 2 O) m5 -Si (R 53) 2 -, -O- (CH 2) u5 -Si ( R 53) 2 -O-Si (R 53) 2 -CH 2 CH 2 -Si (R 53) 2 -O-Si (R 53) 2 -, -O- (CH 2 ) u5-Si (OCH 3 ) 2 OSI (OCH 3 ) 2- , -CONR 54 - (CH 2) u5 - (Si (R 53) 2 O) m5 -Si (R 53) 2 -, -CONR 54
• u5 is an integer of 1 to 20, preferably an integer of 2 to 6, and more preferably an integer of 2 to 3.
• X 54 is -S-, -C (O) O-, -CONR 54 -, -O-CONR 54 -, -CONR 54 - (CH 2) u5 - (Si (R 54) 2 O) m5 -Si (R 54) 2 -, -CONR 54 - (CH 2) u5 -N (R 54) -, or -CONR 54 - (o-, m- or p- phenylene) -Si (R 54) 2 - (In the formula, each symbol has the same meaning as above.)
• X f5 is a single bond or a perfluoroalkylene group having 1 to 6 carbon atoms, preferably 1 to 4 carbon atoms, more preferably 1 to 2 carbon atoms, for example, a difluoromethylene group. ] Can be.
• the X A are each, independently, Single bond, -X f5- C 1-20 alkylene group, -X f5 - (CH 2) s5 -X 53 -, -X f5 - (CH 2) s5 -X 53 - (CH 2) t5 - -X f5 -X 54 -, or -X f5 -X 54 - (CH 2 ) t5 - [In the formula, X f5 , X 53 , X 54 , s5 and t5 have the same meaning as above. ] Is.
• the X A are each, independently, Single bond, -X f5- C 1-20 alkylene group, -X f5 - (CH 2) s5 -X 53 - (CH 2) t5 - or -X f5 -X 54, - (CH 2) t5 - [In the formula, each symbol has the same meaning as above. ] Can be.
• the X A are each, independently, Single bond-X f5- C 1-20 alkylene group, -X f5 - (CH 2) s5 -X 53 -, or -X f5 - (CH 2) s5 -X 53 - (CH 2) t5 -
• X 53 is, -O -, - CONR 54 - , or -O-CONR 54 - a and, R 54 independently represents a hydrogen atom, a phenyl group or a C 1-6 alkyl group at each appearance.
• s5 is an integer from 1 to 20 and t5 is an integer from 1 to 20.
• the X A are each, independently, Single bond, -X f5- C 1-20 alkylene group, -X f5- (CH 2 ) s5- O- (CH 2 ) t5- , -X f5 - (CH 2) s5 - (Si (R 53) 2 O) m5 -Si (R 53) 2 - (CH 2) t5 -, -X f5 - (CH 2) s5 -O- (CH 2) u5 - (Si (R 53) 2 O) m5 -Si (R 53) 2 - (CH 2) t5 -, or -X f5 - (CH 2) s5 -O- (CH 2) t5 -Si (R 53) 2 - (CH 2) u5 -Si (R 53) 2 - (C v H 2v) - [In the formula, X f5 , R 53 , m5, s5, t
• - (C v H 2v) - can be linear, may be branched, for example, -CH 2 CH 2 -, - CH 2 CH 2 CH 2 -, - CH It can be (CH 3 )-,-CH (CH 3 ) CH 2- .
• Said X A are each independently a fluorine atom, C 1-3 (preferably, C 1-3 perfluoroalkyl group) alkyl and C 1-3 fluoroalkyl group one or more selected from It may be substituted with a substituent. In one embodiment, X A is unsubstituted.
• X A is the left side of each formula is bound to R F1 or R F2, the right side is attached to the R Si.
• X A are each independently be other than -O-C 1-6 alkylene group.
• R 41 is independently a hydrogen atom, a phenyl group, an alkyl group having 1 to 6 carbon atoms, or a C 1-6 alkoxy group, preferably a methyl group;
• D is -CH 2 O (CH 2 ) 2- , -CH 2 O (CH 2 ) 3- , -CF 2 O (CH 2 ) 3- , -(CH 2 ) 2- , -(CH 2 ) 3- , - (CH 2) 4 -, -CONH- (CH 2 ) 3- , -CON (CH 3 )-(CH 2 ) 3- , -CON (Ph)-(CH 2 ) 3- (In the formula, Ph means phenyl), and (Wherein, R 42 are each independently a hydrogen atom, an alkyl group or an alkoxy group C 1-6 of C 1-6, preferably methyl group or a methoxy group, more preferably a
• X A is a group independently represented by the formula:-(R 16 ) x1- (CFR 17 ) y1- (CH 2 ) z1- .
• x1, y1 and z1 are independently integers of 0 to 10
• the sum of x1, y1 and z1 is 1 or more
• the existence order of each repeating unit enclosed in parentheses is in the formula. Is optional.
• R 16 are each independently at each occurrence, an oxygen atom, a phenylene, carbazolylene, -NR 18 - (wherein, R 18 represents a hydrogen atom or an organic group) or a divalent organic group is there.
• R 18 is an oxygen atom or a divalent polar group.
• the "lower alkyl group” is, for example, an alkyl group having 1 to 6 carbon atoms, for example, methyl, ethyl, n-propyl, which may be substituted with one or more fluorine atoms.
• R 17 is independently a hydrogen atom, a fluorine atom or a lower fluoroalkyl group at each appearance, and is preferably a fluorine atom.
• the "lower fluoroalkyl group” is, for example, a fluoroalkyl group having 1 to 6 carbon atoms, preferably 1 to 3 carbon atoms, preferably a perfluoroalkyl group having 1 to 3 carbon atoms, and more preferably a trifluoromethyl group. It is a pentafluoroethyl group, more preferably a trifluoromethyl group.
• each R 41 is independently a hydrogen atom, a phenyl group, an alkyl group having 1 to 6 carbon atoms, or a C 1-6 alkoxy group, preferably a methyl group;
• R F1 or R F2 molecular backbone -CH 2 O (CH 2 ) 2- , -CH 2 O (CH 2 ) 3- , -CF 2 O (CH 2 ) 3- , -(CH 2 ) 2- , -(CH 2 ) 3- , - (CH 2) 4 -, -CONH- (CH 2 ) 3- , -CON (CH 3 )-(CH 2 ) 3- , -CON (Ph)-(CH 2 ) 3- (In the formula, Ph means phenyl), or Wherein, R 42 are each independently a hydrogen atom, an alkyl group or an alk
• the radical trapping group is not particularly limited as long as it can trap radicals generated by light irradiation, but for example, benzophenones, benzotriazoles, benzoic acid esters, phenyl salicylates, crotonic acids, malonic acid esters, organoacrylates, etc. , Hindered amines, hindered phenols, or triazine residues.
• the ultraviolet absorbing group is not particularly limited as long as it can absorb ultraviolet rays, and for example, benzotriazoles, hydroxybenzophenones, esters of substituted and unsubstituted benzoic acid or salicylic acid compounds, acrylates or alkoxycinnamates, oxamides, etc. Included are residues of oxanilides, benzoxadinones and benzoxazoles.
• the preferred radical scavenging group or UV absorbing group is Can be mentioned.
• X A are each independently be 3-10 monovalent organic group.
• X A include the following groups: [In the formula, R 25 , R 26 and R 27 are independently divalent to hexavalent organic groups, respectively. R 25 binds to at least one R F1 , and R 26 and R 27 each bind to at least one R Si . ]
• the R 25 is a single bond, C 1-20 alkylene group, C 3-20 cycloalkylene groups, C 5-20 arylene group, -R 57 -X 58 -R 59 - , - X 58 - R 59 -, or -R 57 -X 58 - it is.
• the R 57 and R 59 described above are independently single-bonded, C 1-20 alkylene groups, C 3-20 cycloalkylene groups, or C 5-20 arylene groups, respectively.
• the X 58 is -O-, -S-, -CO-, -O-CO- or -COO-.
• R 26 and R 27 are hydrocarbons, or groups having at least one atom selected from N, O, and S in the end or main chain of the hydrocarbon. preferably, C 1-6 alkyl group, -R 36 -R 37 -R 36 - , - R 36 -CHR 38 2 - and the like.
• R 36 is independently a single bond or an alkyl group having 1 to 6 carbon atoms, preferably an alkyl group having 1 to 6 carbon atoms.
• R 37 is N, O or S, preferably N or O.
• R 38 are, -R 45 -R 46 -R 45 - , - R 46 -R 45 - or -R 45 -R 46 - is.
• R 45 is an alkyl group having 1 to 6 carbon atoms independently.
• R 46 is N, O or S, preferably O.
• X A are each independently be 3-10 monovalent organic group.
• the fluoropolyether group-containing compound represented by the above formula (1) or formula (2) is not particularly limited, but may have an average molecular weight of 5 ⁇ 10 2 to 1 ⁇ 10 5 . Within such a range, it is preferable to have an average molecular weight of 2,000 to 32,000, more preferably 2,500 to 12,000, from the viewpoint of friction durability.
• the "average molecular weight” refers to a number average molecular weight, and the "average molecular weight” is a value measured by 19 F-NMR.
• the fluorine-containing silane compound in the surface treatment agent used in the present disclosure is a compound represented by the formula (1).
• the fluorine-containing silane compound in the surface treatment agent used in the present disclosure is a compound represented by the formula (2).
• the fluorine-containing silane compound is a compound represented by the formula (1) and a compound represented by the formula (2).
• the compound represented by the formula (2) is preferably 0 with respect to the total of the compound represented by the formula (1) and the compound represented by the formula (2). . 1 mol% or more and 35 mol% or less.
• the lower limit of the content of the compound represented by the formula (2) with respect to the total of the compound represented by the formula (1) and the compound represented by the formula (2) is preferably 0.1 mol%, more preferably 0.1 mol%. It can be 0.2 mol%, even more preferably 0.5 mol%, even more preferably 1 mol%, particularly preferably 2 mol%, and particularly 5 mol%.
• the upper limit of the content of the compound represented by the formula (2) with respect to the total of the compound represented by the formula (1) and the compound represented by the formula (2) is preferably 35 mol%, more preferably 30 mol%. %, More preferably 20 mol%, even more preferably 15 mol% or 10 mol%.
• the compound represented by the formula (2) is preferably 0.1 mol% or more and 30 mol% or less, more preferably 0.1 mol% or more and 30 mol% or less, based on the total of the compound represented by the formula (1) and the compound represented by the formula (2).
• 0.1 mol% or more and 20 mol% or less more preferably 0.2 mol% or more and 10 mol% or less, still more preferably 0.5 mol% or more and 10 mol% or less, particularly preferably 1 mol% or more and 10 mol% or less.
• it is 2 mol% or more and 10 mol% or less or 5 mol% or more and 10 mol% or less.
• the compound represented by the above formula (1) or (2) can be obtained, for example, by the method described in the above Patent Document 1, Patent Document 2, and the like.
• the surface treatment agent used in the present disclosure is a solvent, a (non-reactive) fluoropolyether compound that can be understood as a fluorine-containing oil, preferably a perfluoro (poly) ether compound (hereinafter collectively referred to as "fluorine-containing oil”). It may contain a (non-reactive) silicone compound (hereinafter referred to as "silicone oil”), which can be understood as a silicone oil, a catalyst, a surfactant, a polymerization inhibitor, a sensitizer, and the like.
• silicone oil silicone oil
• solvent examples include aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane and mineral spirit; aromatic hydrocarbons such as benzene, toluene, xylene, naphthalene and solventnaphtha.
• aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane and mineral spirit
• aromatic hydrocarbons such as benzene, toluene, xylene, naphthalene and solventnaphtha.
• the fluorine-containing oil is not particularly limited, and examples thereof include a compound represented by the following general formula (3) (perfluoro (poly) ether compound).
• Rf 5 represents an alkyl group having 1 to 16 carbon atoms (preferably a perfluoroalkyl group having C 1-16 ) which may be substituted with one or more fluorine atoms
• Rf 6 is Represents an alkyl group having 1 to 16 carbon atoms (preferably a C 1-16 perfluoroalkyl group), a fluorine atom or a hydrogen atom which may be substituted with one or more fluorine atoms, where Rf 5 and Rf 6 are.
• each independently is a C 1-3 perfluoroalkyl group.
• a', b', c'and d' represent each of the four types of repeating units of perfluoro (poly) ether constituting the main skeleton of the polymer, and are integers of 0 or more and 300 or less independently of each other.
• A', b', c'and d' are at least 1, preferably 1 to 300, more preferably 20 to 300.
• the order of existence of each repeating unit in parentheses with the subscripts a', b', c'or d' is arbitrary in the equation.
• -(OC 4 F 8 )- is- (OCF 2 CF 2 CF 2 CF 2 )-,-(OCF (CF 3 ) CF 2 CF 2 )-,-(OCF 2 CF (CF) 3 ) CF 2 )-,-(OCF 2 CF 2 CF (CF 3 ))-,-(OCF 2 C (CF 3 ) 2 )-,-(OCF) (CF 3 ) CF (CF 3 ))-,-(OCF (C 2 F 5 ) CF 2 )-and (OCF 2 CF (C 2 F 5 ))-may be any of-, but preferably- (OCF 2 CF 2 CF 2 CF 2 )-.
• -(OC 3 F 6 )- may be any of-(OCF 2 CF 2 CF 2 )-,-(OCF (CF 3 ) CF 2 )-and (OCF 2 CF (CF 3 ))-.
• -(OC 2 F 4 )- may be any of-(OCF 2 CF 2 )-and (OCF (CF 3 ))-, but is preferably-(OCF 2 CF 2 )-.
• the compound (one or a mixture of two or more) represented by any of the following general formulas (3a) and (3b) is used. It may be).
• Rf 5 and Rf 6 are as described above; in equation (3a), b "is an integer between 1 and 100; in equation (3b), a" and b “are independent of each other. Is an integer of 0 or more and 30 or less, and c "and d" are independently integers of 1 or more and 300 or less.
• the subscripts a ", b", c ", d" are added and enclosed in parentheses. The order of existence of each repeating unit is arbitrary in the equation.
• the fluorine-containing oil may be a compound represented by the general formula Rf 3- F (in the formula, Rf 3 is a C 5-16 perfluoroalkyl group). Further, it may be a chlorotrifluoroethylene oligomer.
• the fluorine-containing oil may have an average molecular weight of 500 to 10000.
• the molecular weight of the fluorine-containing oil can be measured using GPC.
• the fluorine-containing oil may be contained, for example, 0 to 50% by mass, preferably 0 to 30% by mass, and more preferably 0 to 5% by mass with respect to the surface treatment agent.
• the surface treatment agent is substantially free of fluorinated oil.
• substantially free of fluorinated oil means that it may contain no fluorinated oil or may contain a very small amount of fluorinated oil.
• the average molecular weight of the fluorine-containing oil may be larger than the average molecular weight of the fluorine-containing silane compound.
• the average molecular weight of the fluorine-containing oil may be smaller than the average molecular weight of the fluorine-containing silane compound.
• Fluorine-containing oil contributes to improving the surface slipperiness of the layer formed by the surface treatment agent.
• the silicone oil for example, a linear or cyclic silicone oil having a siloxane bond of 2,000 or less can be used.
• the linear silicone oil may be a so-called straight silicone oil or a modified silicone oil.
• the straight silicone oil include dimethyl silicone oil, methyl phenyl silicone oil, and methyl hydrogen silicone oil.
• the modified silicone oil include those obtained by modifying straight silicone oil with alkyl, aralkyl, polyether, higher fatty acid ester, fluoroalkyl, amino, epoxy, carboxyl, alcohol and the like.
• Examples of the cyclic silicone oil include cyclic dimethylsiloxane oil.
• the silicone oil is, for example, 0 to 300 parts by mass, preferably 0 to 300 parts by mass, based on a total of 100 parts by mass of the fluorine-containing silane compound (in the case of two or more kinds, the total of these, the same applies hereinafter). It may be contained in an amount of 50 to 200 parts by mass.
• Silicone oil contributes to improving the surface slipperiness of the surface treatment layer.
• the catalyst examples include acids (for example, acetic acid, trifluoroacetic acid, etc.), bases (for example, ammonia, triethylamine, diethylamine, etc.), transition metals (for example, Ti, Ni, Sn, etc.) and the like.
• acids for example, acetic acid, trifluoroacetic acid, etc.
• bases for example, ammonia, triethylamine, diethylamine, etc.
• transition metals for example, Ti, Ni, Sn, etc.
• the catalyst promotes the hydrolysis and dehydration condensation of the fluorine-containing silane compound, and promotes the formation of the layer formed by the surface treatment agent.
• examples of other components include tetraethoxysilane, methyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, methyltriacetoxysilane, and the like.
• the surface treatment agent used in the present disclosure can be made into pellets by impregnating a porous substance such as a porous ceramic material or a metal fiber, for example, steel wool into a cotton-like material.
• the pellet can be used, for example, for vacuum deposition.
• the thickness of the surface treatment layer is not particularly limited.
• the thickness of the layer is preferably in the range of 1 to 50 nm, 1 to 30 nm, preferably 1 to 15 nm from the viewpoint of optical performance, surface slipperiness, friction durability and antifouling property. ..
• the surface treatment layer can be formed, for example, by forming a layer of the surface treatment agent on the intermediate layer and post-treating this layer as necessary.
• the layer formation of the above-mentioned surface treatment agent can be carried out by applying the above-mentioned surface treatment agent to the surface of the intermediate layer so as to cover the surface.
• the coating method is not particularly limited. For example, a wet coating method and a dry coating method can be used.
• wet coating methods include dip coating, spin coating, flow coating, spray coating, roll coating, gravure coating and similar methods.
• dry coating methods include vapor deposition (usually vacuum vapor deposition), sputtering, CVD and similar methods.
• vapor deposition method usually, vacuum vapor deposition method
• CVD method include plasma-CVD, optical CVD, thermal CVD and similar methods.
• the surface treatment agent can be diluted with a solvent before being applied to the intermediate layer.
• the following solvents are preferably used: perfluoroaliphatic hydrocarbons having 5 to 12 carbon atoms (for example, perfluorohexane, perfluoromethylcyclohexane and per).
• fluoro-1,3-dimethylcyclohexane polyfluoro aromatic hydrocarbons (e.g., bis (trifluoromethyl) benzene); polyfluoro aliphatic hydrocarbons (e.g., C 6 F 13 CH 2 CH 3 ( e.g., Asahi Glass stock Asahiclin® (registered trademark) AC-6000) manufactured by the company, 1,1,2,2,3,3,4-heptafluorocyclopentane (for example, Zeorora® H manufactured by Nippon Zeon Co., Ltd.); Hydro Fluoroether (HFE) (for example, perfluoropropylmethyl ether (C 3 F 7 OCH 3 ) (for example, Novec 7000 manufactured by Sumitomo 3M Co., Ltd.), perfluorobutyl methyl ether (C 4 F 9 OCH 3 ) (For example, Novec TM 7100 manufactured by Sumitomo 3M Co., Ltd.), perfluorobutyl
• Alkyl perfluoroalkyl ethers such as methyl ether (C 2 F 5 CF (OCH 3 ) C 3 F 7 ) (for example, Novec TM 7300 manufactured by Sumitomo 3M Co., Ltd.) (Or may be branched), or CF 3 CH 2 OCF 2 CHF 2 (eg, Asahiclean® AE-3000 manufactured by Asahi Glass Co., Ltd.), etc.
• methyl ether C 2 F 5 CF (OCH 3 ) C 3 F 7
• Novec TM 7300 manufactured by Sumitomo 3M Co., Ltd.
• CF 3 CH 2 OCF 2 CHF 2 eg, Asahiclean® AE-3000 manufactured by Asahi Glass Co., Ltd.
• solvents may be used alone or It can be used as a mixture of two or more kinds.
• hydrocarbon ether is preferable, and perfluorobutyl methyl ether (C 4 F 9 OCH 3 ) and / or perfluoro butyl ethyl ether (C 4 F 9 OC 2 H 5 ) is preferable. ) Is particularly preferable.
• the surface treatment agent may be subjected to the dry coating method as it is, or may be diluted with the above solvent and then applied to the dry coating method.
• the layer formation of the surface treatment agent is preferably carried out so that the surface treatment agent is present in the layer together with the catalyst for hydrolysis and dehydration condensation.
• the catalyst may be added to the diluted solution of the surface treatment agent immediately after diluting the surface treatment agent with a solvent and immediately before applying to the surface of the intermediate layer.
• the catalyst-added surface treatment agent is vapor-deposited as it is (usually, vacuum-film deposition), or a metal porous body such as iron or copper is impregnated with the catalyst-added surface treatment agent.
• a vapor deposition (usually vacuum vapor deposition) treatment may be performed using a pellet-like substance.
• any suitable acid or base can be used as the catalyst.
• the acid catalyst for example, acetic acid, formic acid, trifluoroacetic acid and the like can be used.
• the base catalyst for example, ammonia, organic amines and the like can be used.
• a layer derived from the surface treatment agent is formed on the surface of the intermediate layer, and the article of the present disclosure is manufactured.
• the surface-treated layer thus obtained has high friction durability.
• the above layer has water repellency, oil repellency, stain resistance (for example, prevents adhesion of stains such as fingerprints), and waterproof property, depending on the composition of the surface treatment agent used. It can have (preventing water from entering electronic parts, etc.), surface slipperiness (or lubricity, for example, wiping off stains such as fingerprints, and excellent tactile sensation to fingers), and is suitable as a functional thin film. Can be used.
• the article of the present disclosure may be an optical material having the above-mentioned surface treatment layer as the outermost layer.
• the article of the present disclosure is not particularly limited, but may be an optical member.
• optical components include: lenses such as eyeglasses; front protective plates for displays such as DVDs and LCDs, antireflection plates, polarizing plates, anti-glare plates; for devices such as mobile phones and mobile information terminals. Touch panel sheet; Blu-ray (registered trademark) disc, DVD disc, CD-R, MO or other optical disc surface; Optical fiber; Clock display surface, etc.
• the article of the present disclosure may be a medical device or a medical material.
• the article of the present disclosure has high chemical resistance by having an intermediate layer containing a composite oxide containing Si and a surface treatment layer formed from a surface treatment agent containing a fluorine-containing silane compound on the substrate. , Has high friction durability.
• the article of the present disclosure can be obtained by forming an intermediate layer containing a composite oxide containing Si on a base material and forming a surface treatment layer from a surface treatment agent containing a fluorine-containing silane compound on the intermediate layer. ..
• the article of the present disclosure can be produced by simultaneously depositing Si and other atoms on a substrate.
• the present disclosure further A method for producing an article comprising a base material and a surface treatment layer formed from a surface treatment agent containing a fluorine-containing silane compound formed on the base material. Si and other metals are simultaneously vapor-deposited on the base material to form an intermediate layer containing a composite oxide containing Si. Provided is a method including forming a surface treatment layer directly above the intermediate layer.
• the article of the present disclosure may be produced by sequentially depositing Si and other atoms on a substrate.
• gorilla glass 3 manufactured by Corning Inc.
• a thickness of 0.5 mm, 71.5 mm ⁇ 149.0 mm was used to form an intermediate layer, and then the intermediate layer was formed.
• a surface-treated layer was formed on the layer to obtain a glass substrate with a surface-treated layer. The details are as follows.
• a silicon target and a tantalum target or niobium target are installed in a RAS or DC sputtering device, and sputtering conditions are set for each embodiment while introducing a mixed gas of argon and oxygen into the chamber. Then, an intermediate layer composed of a composite oxide of silicon and tantalum or niobium having a thickness of 10 to 40 nm having various film forming rate ratios (Si / Ta) was formed.
• the surface treatment layer was formed using a device capable of performing resistance heating vapor deposition. Specifically, a composition containing a fluorine-containing organosilicon compound is introduced into a heating container, then exhausted by a vacuum pump, the solvent is distilled off, and then the heating container is heated to be placed on the intermediate layer. A surface treatment layer was formed.
• a fluorine-containing organosilicon compound a compound having the following structure was used.
• Alkaline immersion test A 1 cm diameter PTFE O-ring was placed on the surface of the substrate surface-treated in Examples 3, 4, 7, 10 to 13 and 17 and Comparative Examples 1, 4 to 6 and 10 to obtain an 8N NaOH solution. (Alkaline aqueous solution) was dropped into the O-ring, and the surface of the surface treatment layer was brought into contact with the alkaline aqueous solution and subjected to an alkali immersion test. After 20 to 360 minutes of the alkaline immersion test, the alkaline aqueous solution was wiped off, washed with pure water and ethanol, and then the contact angle with water was measured.
• the static contact angle of water is determined by dripping 2 ⁇ L of pure water droplets on the surface of the glass substrate after the above alkaline immersion test, and using a contact angle meter (manufactured by Kyowa Surface Chemical Co., Ltd .: automatic contact angle meter). The contact angle with water was measured using DropMaster701). The static contact angle of water after the alkaline immersion test was measured at five points. If the measured static contact angle of water decreased within 360 minutes, the alkaline immersion test was stopped halfway. The relationship between the immersion time and the average value of the contact angles at the five locations is shown in Table 2 below.
• a material obtained by covering the surface (diameter 1 cm) of the silicone rubber processed product shown below with cotton immersed in artificial sweat having the composition shown below was used as a friction element.
• Composition of artificial sweat Anhydrous disodium hydrogen phosphate: 2 g Sodium chloride: 20g 85% lactic acid: 2g Histidine hydrochloride: 5 g
• Distilled water 1 kg
• Silicone rubber processed product A silicone rubber stopper SR-51 made by Tigers Polymer, processed into a cylinder with a diameter of 1 cm and a thickness of 1 cm.
• the composition (depth direction analysis) of the treated surface of the treated glass substrate was performed using an X-ray photoelectron spectroscopy analyzer (XPS, PHI5000 VersaProbe II manufactured by ULVAC-PHI, Inc.).
• XPS X-ray photoelectron spectroscopy analyzer
• the measurement conditions for XPS analysis were as follows.
• X-ray source Monochromatic AlK ⁇ ray (25W)
• Photoelectron detection area 1400 ⁇ m ⁇ 300 ⁇ m
• Photoelectron detection angle 20 degrees, 45 degrees, 90 degrees
• Pass energy 23.5 eV
• the peak areas of the C1s, O1s, F1s, Si2p, and Ta4f orbitals were observed by the XPS, and the atomic ratios and areas of carbon, oxygen, fluorine, silicon, and tantalum were observed.
• the composition of the treated surface including the surface-treated antifouling layer was determined. The results are shown in Table 6 below for Examples 1 and 2 using RAS.
• the composition (depth direction analysis) of the treated surface of the treated glass substrate was performed using an X-ray photoelectron spectroscopy analyzer (XPS, PHI5000 VersaProbe II manufactured by ULVAC-PHI, Inc.).
• XPS X-ray photoelectron spectroscopy analyzer
• the measurement conditions for XPS analysis were as follows.
• X-ray source Monochromatic AlK ⁇ ray (25W)
• Photoelectron detection area 1400 ⁇ m ⁇ 300 ⁇ m
• Photoelectron detection angle 45 degrees
• Path energy 23.5 eV
• Spatter ion Ar ion
• the layers (surface treatment layer and intermediate layer) on the substrate are gradually etched in the depth direction by sputtering with Ar ions for a predetermined time, and after each predetermined time.
• the peak areas of O1s, Si2p, and Ta4f orbitals were observed by the above XPS, and the atomic ratios and area ratios of oxygen and silicon were calculated to determine the composition of the layer on the surface of the base material.
• the etching rate by sputtering was 3 nm / min.
• Table 7 The results for Examples 1 to 7 are shown in Table 7 below.
• Examples 1 to 17 in which an intermediate layer composed of Si, Ta and O or an intermediate layer composed of Si, Nb and O is formed between the base material and the surface treatment layer It was confirmed that the decrease in the contact angle in the alkali immersion test was suppressed and the alkali durability was excellent as compared with Comparative Examples 1 to 10 having no such intermediate layer. Further, it was confirmed that in Examples 1 to 4, the decrease in the contact angle in the abrasion durability test was suppressed, and the abrasion durability using artificial sweat was excellent.
• the article of the present disclosure can be suitably used for various purposes, for example, as an optical member.

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