WO2020224401A1 - 清洗腔室及清洗设备 - Google Patents

清洗腔室及清洗设备 Download PDF

Info

Publication number
WO2020224401A1
WO2020224401A1 PCT/CN2020/084927 CN2020084927W WO2020224401A1 WO 2020224401 A1 WO2020224401 A1 WO 2020224401A1 CN 2020084927 W CN2020084927 W CN 2020084927W WO 2020224401 A1 WO2020224401 A1 WO 2020224401A1
Authority
WO
WIPO (PCT)
Prior art keywords
cleaning
spray head
fluid
cleaned
spray
Prior art date
Application number
PCT/CN2020/084927
Other languages
English (en)
French (fr)
Inventor
张洪蛟
李爱兵
Original Assignee
北京北方华创微电子装备有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 北京北方华创微电子装备有限公司 filed Critical 北京北方华创微电子装备有限公司
Priority to US17/609,711 priority Critical patent/US20220250122A1/en
Priority to KR1020217031335A priority patent/KR20210131418A/ko
Priority to JP2021565970A priority patent/JP7312854B2/ja
Publication of WO2020224401A1 publication Critical patent/WO2020224401A1/zh

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/08—Cleaning containers, e.g. tanks
    • B08B9/093—Cleaning containers, e.g. tanks by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/02—Cleaning pipes or tubes or systems of pipes or tubes
    • B08B9/027—Cleaning the internal surfaces; Removal of blockages
    • B08B9/032—Cleaning the internal surfaces; Removal of blockages by the mechanical action of a moving fluid, e.g. by flushing
    • B08B9/0321—Cleaning the internal surfaces; Removal of blockages by the mechanical action of a moving fluid, e.g. by flushing using pressurised, pulsating or purging fluid
    • B08B9/0325—Control mechanisms therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B08B3/022—Cleaning travelling work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/08—Cleaning containers, e.g. tanks
    • B08B9/0804—Cleaning containers having tubular shape, e.g. casks, barrels, drums
    • B08B9/0813—Cleaning containers having tubular shape, e.g. casks, barrels, drums by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/08—Cleaning containers, e.g. tanks
    • B08B9/0821—Handling or manipulating containers, e.g. moving or rotating containers in cleaning devices, conveying to or from cleaning devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
    • F26B21/004—Nozzle assemblies; Air knives; Air distributors; Blow boxes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/02—Details of machines or methods for cleaning by the force of jets or sprays
    • B08B2203/0217—Use of a detergent in high pressure cleaners; arrangements for supplying the same
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2209/00—Details of machines or methods for cleaning hollow articles
    • B08B2209/02—Details of apparatuses or methods for cleaning pipes or tubes
    • B08B2209/027—Details of apparatuses or methods for cleaning pipes or tubes for cleaning the internal surfaces
    • B08B2209/032—Details of apparatuses or methods for cleaning pipes or tubes for cleaning the internal surfaces by the mechanical action of a moving fluid
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the invention relates to the field of semiconductor manufacturing, in particular to a cleaning chamber and cleaning equipment.
  • the silicon wafer is first placed in a quartz boat, and then the quartz boat containing the silicon wafer is put into the quartz tube.
  • the diffusion source is introduced from the tail of the quartz tube
  • the gas containing the diffusion source reacts with the silicon wafer to complete the diffusion process.
  • the surface of the quartz boat and quartz tube will retain the particles after the corresponding diffusion process. If the quartz boat and quartz tube are reused without cleaning, it will cause poor cleanliness and yield of the silicon wafer. influences.
  • a horizontal cleaning device is used to clean the quartz boat and the quartz tube.
  • the cleaning device includes a process tank and a water tank.
  • the process tank contains a cleaning solution and the water tank contains water.
  • Place the used quartz boat and quartz tube in the process tank soak the quartz boat and quartz tube in the cleaning solution to remove the particles remaining on the quartz boat and quartz tube, and then place the quartz boat and quartz tube Into the water tank, soak the quartz boat and quartz tube in water to remove the cleaning solution remaining on the quartz boat and quartz tube.
  • the quartz boat and quartz tube are taken out of the horizontal cleaning equipment, and the quartz boat and quartz tube are manually adjusted.
  • the quartz tube is manually blown dry to remove the quartz boat and the quartz tube, thereby completing the cleaning of the quartz boat and the quartz tube.
  • the present invention aims to solve at least one of the technical problems existing in the prior art, and proposes a cleaning chamber and cleaning equipment, which can reduce the consumption of cleaning fluid and reduce cleaning costs.
  • a cleaning chamber which includes a chamber body and a carrying device and a spray device arranged in the chamber body, wherein:
  • the carrying device is used to carry the parts to be cleaned
  • the spray device is arranged around the carrying device and is used for spraying cleaning fluid to the part to be cleaned.
  • the spray device includes a fluid pipeline and at least one spray head connected to it, wherein:
  • the fluid pipeline is used to provide the cleaning fluid to the spray head
  • the spray head is used to spray the cleaning fluid to the object to be cleaned.
  • the upper spray head is arranged on the top of the chamber body for spraying the cleaning fluid downward;
  • the lower spray head is arranged at the bottom of the chamber body for spraying the cleaning fluid upward;
  • the side spray head is arranged around the carrying device and used for spraying the cleaning fluid toward the object to be cleaned.
  • the side spray heads are divided into a group of spray head groups or multiple groups of spray head groups surrounding the carrying device, and a plurality of the side spray heads in each group of the spray head groups are arranged at intervals in a vertical direction.
  • it further includes an angle adjustment structure for adjusting the spray angle of the side spray head.
  • the cleaning fluid includes chemical liquid, pure water or dry gas.
  • the first pipeline is connected with at least one spray head; the second pipeline is connected with at least one spray head.
  • liquid storage device comprising a liquid storage tank provided at the bottom of the chamber body and an infusion pipeline respectively connected to the liquid storage tank and the fluid pipeline, wherein:
  • the liquid storage tank is used to recover the liquid cleaning fluid
  • the liquid infusion pipeline is used to deliver the liquid cleaning fluid in the liquid storage tank to the fluid pipeline.
  • the carrying device includes a carrying platform, a rotating platform and a plurality of connecting columns, wherein:
  • the carrying platform is arranged at the bottom of the chamber body and is used to carry the part to be cleaned in a vertical direction;
  • the rotating platform is arranged on the top of the chamber body relative to the bearing platform, and is connected to the bearing platform through a plurality of the connecting columns, so as to drive the bearing platform to rotate through the plurality of connecting columns.
  • it further includes a rotating drive mechanism, which is arranged on the top of the chamber body and connected to the rotating platform for driving the rotating platform to rotate.
  • a rotating drive mechanism which is arranged on the top of the chamber body and connected to the rotating platform for driving the rotating platform to rotate.
  • the present invention also provides a cleaning equipment, including an equipment body, an instrument area, a control module and a plurality of the above-mentioned cleaning chambers provided in the equipment body, each of the cleaning chambers is used for The parts to be cleaned are cleaned, the instrument area is electrically connected to a plurality of the cleaning chambers for monitoring and displaying the parameters of the cleaning process, and the control module is electrically connected to the plurality of cleaning chambers for respectively The cleaning work of each of the cleaning chambers is automatically controlled, and the staff performs human-computer interaction with each of the cleaning chambers.
  • the cleaning chamber provided by the present invention includes a chamber body and a bearing device and a spray device arranged in the chamber body, wherein the bearing device is used to bear the parts to be cleaned; the spray device is arranged around the bearing device and is used to Compared with the prior art, the cleaning chamber provided by the present invention does not completely immerse the parts to be cleaned in the cleaning fluid, but sprays the parts to be cleaned by the spray device. Pour the cleaning fluid, which reduces the amount of cleaning fluid used to clean the parts to be cleaned, thereby reducing the cost of cleaning the parts to be cleaned.
  • the cleaning equipment provided by the present invention with the help of a plurality of cleaning chambers provided by the present invention provided in the device body, can reduce the usage of cleaning fluid and reduce cleaning costs.
  • Figure 1 is a schematic diagram of the structure of the cleaning chamber provided by the present invention.
  • Figure 2 is a schematic structural diagram of the cleaning equipment provided by the present invention.
  • first and second features are in direct contact with each other; and may also include
  • additional components are formed between the above-mentioned first and second features, so that the first and second features may not be in direct contact.
  • present disclosure may reuse component symbols and/or labels in multiple embodiments. Such repeated use is based on the purpose of brevity and clarity, and does not in itself represent the relationship between the different embodiments and/or configurations discussed.
  • spatially relative terms here such as “below”, “below”, “below”, “above”, “above” and similar, may be used to facilitate the description of the drawing
  • the relationship between one component or feature relative to another component or feature is shown.
  • these spatially relative terms also cover a variety of different orientations in which the device is in use or operation.
  • the device may be placed in other orientations (for example, rotated by 90 degrees or in other orientations), and these spatially-relative description words should be explained accordingly.
  • this embodiment provides a cleaning chamber, which includes a chamber body 11 and a carrier device and a spray device arranged in the chamber body 11, wherein the carrier device is used to carry the parts to be cleaned;
  • the device is arranged around the carrying device and is used for spraying cleaning fluid to the parts to be cleaned.
  • the cleaning chamber provided by this embodiment does not completely immerse the cleaning fluid in the cleaning fluid when cleaning the object to be cleaned, but sprays the cleaning fluid on the object to be cleaned by means of a spray device. This reduces the amount of cleaning fluid used for cleaning the parts to be cleaned, thereby reducing the cost of cleaning the parts to be cleaned.
  • the object to be cleaned may be a wafer boat used for holding wafers or a quartz tube used for holding wafer boats.
  • the spray device includes a fluid pipeline 12 and at least one spray head connected to it, wherein the fluid pipeline 12 is used to provide cleaning fluid to the spray head; the spray head is used to spray cleaning fluid to the parts to be cleaned.
  • the fluid pipeline 12 is arranged in the chamber body 11 and is connected to a cleaning fluid source containing cleaning fluid to transport the cleaning fluid in the cleaning fluid source to the spray head, and the cleaning fluid is sprayed to the cleaning fluid through the spray head.
  • the fluid pipe 12 can be connected to one nozzle or multiple nozzles.
  • the fluid pipe 12 is connected to multiple nozzles, which can increase the spray area of the cleaning fluid and the spray per unit time. Volume, thereby improving cleaning efficiency.
  • the upper spray head 131 is arranged on the top of the chamber body 11 for The cleaning fluid is sprayed downward; the lower spray head 132 is arranged at the bottom of the chamber body 11 and is used to spray the cleaning fluid upward; the side spray head 133 is arranged around the carrying device and is used to spray the cleaning fluid toward the object to be cleaned.
  • the upper spray head 131, the side spray head 133, and the lower spray head 132 are used to spray the cleaning fluid on the part to be cleaned, so that when the part to be cleaned is cleaned, the cleaning fluid is sprayed toward the part to be cleaned from multiple different directions.
  • the cleaning can be carried out in different positions to reduce the cleaning dead angle on the parts to be cleaned, thereby improving the cleaning effect.
  • the upper spray head 131 can spray the cleaning fluid from above the object to be cleaned to clean the top of the object
  • the lower spray head 132 can spray the cleaning fluid upward from below the object to be cleaned.
  • the cleaning fluid can be sprayed from the outside of the part to be cleaned to the side of the part to be cleaned to clean the peripheral side of the part to be cleaned.
  • the reaction chamber is a reaction tube
  • the cleaning fluid can be sprayed into the reaction tube from the top nozzle and the bottom nozzle of the reaction tube respectively to clean the inside of the reaction tube.
  • the upper nozzle 131, the side nozzle 133 and the lower nozzle 132 can all be one, or all can be multiple, or one part can be one, and the other part can be multiple.
  • the number of 133 and lower nozzles 132 can increase the spray area of the cleaning fluid and the spray volume per unit time, thereby improving the cleaning efficiency.
  • an excessive number of upper nozzles 131, side nozzles 133 and lower nozzles 132 will also increase its cavity The difficulty of layout in the chamber body 11, therefore, also needs to be determined according to actual conditions.
  • the side spray heads 133 are divided into a group of spray head groups or multiple groups of spray head groups surrounding the carrying device, and a plurality of side spray heads 133 in each group of spray head groups are arranged at intervals in the vertical direction.
  • multiple sets of spray head groups are arranged around the carrying device.
  • the film boat or reaction chamber is placed on the carrying device, and the multiple sets of spray head groups surround the object to be cleaned.
  • the cleaning fluid is sprayed around the parts to be cleaned.
  • the multiple side spray heads 133 in each spray head group are connected to a fluid pipeline 12, and each side of the fluid pipeline 12 through a fluid pipeline 12
  • the spray head 133 provides cleaning fluid.
  • Each fluid pipeline 12 is placed vertically, and a plurality of side spray heads 133 on each fluid pipeline 12 are arranged at intervals along the vertical direction of the fluid pipeline 12 to align the film boat in the vertical direction.
  • the cleaning equipment further includes an angle adjustment structure for adjusting the spray angle of the side spray head 133.
  • the adjustment structure With the adjustment structure, the angle of the side spray head 133 relative to the object to be cleaned is adjusted to correct the spray from the side spray head 133.
  • the direction of the cleaning fluid is used to change the position where the cleaning fluid sprayed from the side nozzle 133 falls on the object to be cleaned, so as to further reduce the occurrence of cleaning dead spots on the object to be cleaned, thereby improving the cleaning effect.
  • the cleaning fluid includes a chemical liquid, pure water, or dry gas.
  • the chemical liquid can clean the contaminants on the cleaned part, and the pure water can pre-clean the cleaned part or/and clean the remaining
  • the chemical liquid and dry gas on the parts to be cleaned can remove the moisture remaining on the parts to be cleaned.
  • the drying gas is sprayed on the parts to be cleaned through the spray device to make the parts to be cleaned It is dried in the cleaning equipment, avoiding manual drying, reducing the workload of the staff and improving the cleaning efficiency.
  • the chemical liquid can be an acid liquid
  • the dry gas can be nitrogen
  • the chemical liquid is transported through the first pipeline, and the pure water or dry gas is transported through the second pipeline to prevent the chemical liquid and pure water from reacting in the fluid pipeline 12 and improve the cleaning effect.
  • the first The first pipeline and the second pipeline can be connected with the same spray head, so that one spray head can spray chemical liquid, pure water or dry gas to the parts to be cleaned.
  • the cleaning equipment further includes a liquid storage device.
  • the liquid storage device includes a liquid storage tank 14 provided at the bottom of the chamber body 11 and an infusion pipeline respectively connected to the liquid storage tank 14 and the fluid pipeline 12, wherein, The liquid storage tank 14 is used to recover liquid cleaning fluid; the liquid infusion pipeline is used to transport the liquid cleaning fluid in the liquid storage tank 14 to the fluid pipeline 12, the cleaning fluid is recovered by the liquid storage tank 14, and the liquid infusion tube
  • the path reuses the cleaning fluid in the liquid storage tank 14, further reducing the amount of cleaning fluid used and reducing cleaning costs.
  • the liquid storage tank 14 is a separate area provided at the bottom of the chamber body 11, and a circulation hole communicating with the liquid storage tank 14 is provided at the bottom of the chamber body 11.
  • the cleaning fluid sprayed on the parts to be cleaned is gravitational Under the action, it flows to the bottom of the chamber body 11 and flows into the liquid storage tank 14 through the circulation hole.
  • a pressure pump is provided on the infusion pipeline to pump the cleaning fluid in the liquid storage tank 14 into the fluid pipeline 12 .
  • the cleaning fluid of the liquid includes chemical liquid and pure water, it is necessary to set a three-way valve in the circulation hole. When the spray device sprays the chemical liquid, the three-way valve makes the chemical liquid It flows into the liquid storage tank 14.
  • the pure water is discharged from the cleaning equipment through the three-way valve to prevent the pure water from flowing into the liquid storage tank 14 to react with the chemical liquid and affect the cleaning effect of the chemical liquid. It is also possible to separately provide a discharge hole communicating with the outside of the cleaning device at the bottom of the chamber body 11, and set an on-off valve in the discharge hole and the circulation hole.
  • a discharge hole communicating with the outside of the cleaning device at the bottom of the chamber body 11, and set an on-off valve in the discharge hole and the circulation hole.
  • spraying chemical liquid use the on-off valve to open the circulation hole , Close the discharge hole to allow the chemical solution to flow into the liquid storage tank 14.
  • spraying pure water use the on-off valve to close the flow hole and open the discharge hole to allow the pure water to drain out of the cleaning equipment.
  • the carrying device includes a carrying platform 152, a rotating platform 151 and a plurality of connecting columns 153, wherein the carrying platform 152 is arranged at the bottom of the chamber body 11 for carrying the object to be cleaned in the vertical direction;
  • the platform 151 is disposed on the top of the chamber body 11 relative to the bearing platform 152 and is connected to the bearing platform 152 through a plurality of connecting pillars 153 to drive the bearing platform 152 to rotate through the plurality of connecting pillars 153.
  • the structure of the carrying device satisfies the ability to keep the object to be cleaned carried by the carrying device upright.
  • the boat or quartz tube is not horizontal. Lying in the washing tank, but standing upright in the chamber body 11, so that the chamber body 11 has a shorter length in the horizontal direction relative to the ground and a longer length in the vertical direction relative to the ground , Thereby reducing the footprint of the chamber body 11 to facilitate the placement of the chamber body 11.
  • the bearing platform 152 is arranged at the bottom of the chamber body 11, the lower spray head 132 is arranged on the upward side of the bearing platform 152, the rotating platform 151 is located on the top of the chamber body 11, and the upper spray head 131 is arranged on the rotating platform 151 facing downward.
  • a plurality of connecting columns 153 are vertically arranged between the rotating platform 151 and the carrying platform 152, wherein the carrying platform 152 is used to carry the bottom of the object to be cleaned, so that the object to be cleaned is located upright in the chamber body 11 The object to be cleaned is located between the rotating platform 151 and the carrying platform 152.
  • each connecting column 153 there are three connecting columns 153, and both ends of each connecting column 153 are respectively connected to the rotating platform 151 and the bearing platform 152, so that the rotating platform 151 passes through the three connecting columns 153.
  • the bearing platform 152 is driven to rotate, but the number of connecting posts 153 is not limited to this.
  • the cleaning equipment also includes a rotary drive mechanism 16, which is arranged on the top of the chamber body 11 and connected to the rotary platform 151 for driving the rotary platform 151 to rotate.
  • a rotary drive mechanism 16 the In the process of cleaning the parts to be cleaned, the rotating platform 151 is driven to rotate, and the carrying platform 152 is driven to rotate by the rotating platform 151, so that the parts to be cleaned on the carrying platform 152 rotate with the carrying platform 152, so as to further reduce the parts to be cleaned There is a situation of cleaning dead corners, so that the cleaning fluid can be sprayed to more positions on the parts to be cleaned, thereby improving the cleaning effect.
  • an area where the rotary drive mechanism 16 is separately placed is provided on the top of the chamber body 11.
  • the rotary drive mechanism 16 is provided in this area and is connected to the rotary platform 151 to prevent the rotary drive mechanism 16 from being chemically treated. Liquid corrosion.
  • this embodiment also provides a cleaning device, including a device body, an instrument area 171, a control module 172, and a plurality of cleaning chambers provided in this embodiment.
  • a cleaning device including a device body, an instrument area 171, a control module 172, and a plurality of cleaning chambers provided in this embodiment.
  • Each cleaning chamber All are used to clean the parts to be cleaned.
  • the instrument area 171 is electrically connected to multiple cleaning chambers to monitor and display the parameters of the cleaning process.
  • the control module 172 is electrically connected to multiple cleaning chambers to separately clean each The cleaning of the chamber is automatically controlled, and the staff interacts with each cleaning chamber separately.
  • the cleaning device provided in this embodiment with the help of a plurality of cleaning chambers provided in this embodiment provided in the device body, can reduce the amount of cleaning fluid used and the cleaning cost.
  • the spray head 131 on the chamber body 11 is connected to the first pipeline for transporting chemical liquids, and is connected to the pure water pipeline at the factory service end.
  • the lower spray head 132 is connected with the first pipeline for transporting chemical liquid, and is connected with the second pipeline for transporting pure water or dry gas, for spraying chemical Liquid medicine, pure water or dry gas
  • the side spray head 133 is divided into two groups, one group is connected with the first pipeline for transporting chemical liquid, and the other group is used for transporting pure water.
  • the second pipeline of dry gas is connected for spraying pure water or dry gas.
  • the cleaning process first place the parts to be cleaned on the carrying device, and use the rotary drive mechanism 16 to drive the carrying device to rotate.
  • the upper spray head 131, the side spray head 133 and the lower spray head 132 that can spray pure water are simultaneously purified.
  • each chamber body 11 is provided with a carrying device and a spray device, and each chamber body 11 is used to clean the parts to be cleaned individually. That is, when the cleaning equipment is provided with a plurality of chamber bodies 11, the cleaning equipment can simultaneously clean multiple items to be cleaned, thereby improving the cleaning efficiency of the cleaning equipment.
  • the cleaning device has two chamber bodies 11, which are respectively arranged on the left and right sides of the tilting device.
  • the liquid storage tank 14 is arranged under the two chamber bodies 11, and the rotating drive mechanism 16 also has two.
  • the two rotary drive mechanisms 16 are both arranged in separate areas above the two chamber bodies 11, respectively driving the bearing devices in the two chamber bodies 11 to rotate, and the cleaning equipment is also provided with an instrument Area 171 and a control module 172, where the instrument area 171 is used to monitor compressed dry gas, nitrogen and discharge pressure of the factory, and the control module 172 is used to perform human-computer interaction and automatic control by the staff.
  • the cleaning chamber and cleaning equipment provided in this embodiment can not only reduce the usage of cleaning fluid and reduce cleaning costs, but also reduce the footprint of the chamber body 11 to facilitate the placement of the chamber body 11 And, it can also automatically dry the parts to be cleaned, reducing the workload of the staff and improving the cleaning efficiency.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

一种清洗腔室及清洗设备，包括腔室本体（11）和设置在腔室本体（11）中的承载装置和喷淋装置，其中，承载装置用于承载待清洗件；喷淋装置设置在承载装置的上方以及周侧，用于向待清洗件喷淋清洗流体。该清洗腔室及清洗设备能够减少清洗剂的使用量，从而降低清洗成本。

Description

清洗腔室及清洗设备 技术领域
本发明涉及半导体制造领域，具体地，涉及一种清洗腔室及清洗设备。
背景技术
目前，在硅片扩散工艺中，首先将硅片放置在石英舟中，然后将装有硅片的石英舟放入至石英管内，在高温扩散炉中，从石英管的尾部通入含有扩散源的气体，在高温条件下，通过含有扩散源的气体与硅片发生化学反应，完成扩散工艺。但是，每次扩散工艺后，石英舟和石英管的表面都会残存相应扩散工艺后的微粒，若石英舟与石英管未经清洗便再次使用，则会对硅片的清洁度及良率造成不良影响。
在现有技术中，采用卧式清洗设备对石英舟和石英管进行清洗，该种清洗设备包括工艺槽和水槽，其中，工艺槽中盛放有清洗药液，水槽中盛放有水，通过将使用后的石英舟和石英管放置在工艺槽中，使石英舟和石英管浸泡在清洗药液中，以去除残存在石英舟和石英管上的微粒，之后再将石英舟和石英管放入水槽中，使石英舟和石英管浸泡在水中，以去除残留在石英舟和石英管上的清洗药液，最后将石英舟和石英管从卧式清洗设备中取出，通过人工对石英舟和石英管进行手动吹干，以去除石英舟和石英管上，从而完成对石英舟和石英管的清洗。
但是，在现有技术中，由于石英舟和石英管是浸泡在清洗药液中，这就使得清洗药液必须完全浸没石英舟和石英管，才能去除石英舟和石英管上残留的微粒，这就导致在清洗过程中，清洗药液的使用量较多，造成清洗的成本较高。
发明内容
本发明旨在至少解决现有技术中存在的技术问题之一，提出了一种清洗腔室及清洗设备，其能够减少清洗流体的使用量，降低清洗成本。
为实现本发明的目的而提供一种清洗腔室，包括腔室本体和设置在所述腔室本体中的承载装置和喷淋装置，其中，
所述承载装置用于承载待清洗件；
所述喷淋装置围绕所述承载装置设置，用于向所述待清洗件喷淋清洗流体。
优选的，所述喷淋装置包括流体管路和与之连接的至少一个喷头，其中，
所述流体管路用于向所述喷头提供所述清洗流体；
所述喷头用于向所述待清洗件喷淋所述清洗流体。
优选的，所述喷头为多个，且按位置分为至少一个上喷头、至少一个侧喷头和至少一个下喷头，其中，
所述上喷头设置在所述腔室本体的顶部，用于朝下喷淋所述清洗流体；
所述下喷头设置在所述腔室本体的底部，用于朝上喷淋所述清洗流体；
所述侧喷头环绕设置在所述承载装置的周围，用于朝所述待清洗件喷淋所述清洗流体。
优选的，所述侧喷头分为一组喷头组或者环绕在所述承载装置周围的多组喷头组，每组所述喷头组中的多个所述侧喷头沿竖直方向间隔设置。
优选的，还包括角度调节结构，用于调节所述侧喷头的喷淋角度。
优选的，所述清洗流体包括化学药液、纯水或者干燥气体。
优选的，所述流体管路为多条，且多条所述流体管路中有至少一条用于输送所述化学药液的第一管路，和至少一条用于输送所述纯水或者干燥气体的第二管路，其中，
所述第一管路与至少一个所述喷头连接；所述第二管路与至少一个所述喷头连接。
优选的，还包括储液装置，所述储液装置包括设置在所述腔室本体底部的储液槽和分别与所述储液槽和所述流体管路连接的输液管路，其中，
所述储液槽用于回收液态的所述清洗流体；
所述输液管路用于将所述储液槽中的液态的所述清洗流体输送至所述流体管路中。
优选的，所述承载装置包括承载平台、旋转平台和多个连接柱，其中，
所述承载平台设置在所述腔室本体的底部，用于在竖直方向上承载所述待清洗件；
所述旋转平台相对所述承载平台设置在所述腔室本体的顶部，并通过多个所述连接柱与所述承载平台连接，以通过多个所述连接柱驱动所述承载平台旋转。
优选的，还包括旋转驱动机构，所述旋转驱动机构设置在所述腔室本体的顶部，并与所述旋转平台连接，用于驱动所述旋转平台旋转。
本发明还提供一种清洗设备，包括设备本体和设置在所述设备本体中的仪表区、控制模块和多个上述的所述清洗腔室，每个所述清洗腔室均用于对所述待清洗件进行清洗，所述仪表区与多个所述清洗腔室电连接，用于监测并显示清洗工艺的参数，所述控制模块与多个所述清洗腔室电连接，用于分别对每个所述清洗腔室的清洗工作进行自动控制，以及工作人员分别与每个所述清洗腔室进行人机交互。
本发明具有以下有益效果：
本发明提供的清洗腔室包括腔室本体和设置在腔室本体中的承载装置和喷淋装置，其中，承载装置用于承载待清洗件；喷淋装置围绕承载装置设置，用于向待清洗件喷淋清洗流体，与现有技术相比，本发明提供的清洗腔室在清洗待清洗件时，不是将待清洗件完全浸泡在清洗流体中，而是借助喷淋装置向待清洗件喷淋清洗流体，这就使得清洗待清洗件所使用的清洗流体的使用量减少，从而降低清洗待清洗件的成本。
本发明提供的清洗设备，借助设置在设备本体中的多个本发明提供的清洗腔室，能够减少清洗流体的使用量，降低清洗成本。
附图说明
图1为本发明提供的清洗腔室的结构示意图；
图2为本发明提供的清洗设备的结构示意图；
附图标记说明：
11-腔室本体；12-流体管路；131-上喷头；132-下喷头；133-侧喷头；14-储液槽；151-旋转平台；152-承载平台；153-连接柱；16-旋转驱动机构；171-仪表区；172-控制模块
具体实施方式
以下揭示内容提供了多种实施方式或例示，其能用以实现本揭示内容的不同特征。下文所述之组件与配置的具体例子系用以简化本揭示内容。当可想见，这些叙述仅为例示，其本意并非用于限制本揭示内容。举例来说，在下文的描述中，将一第一特征形成于一第二特征上或之上，可能包括某些实施例其中所述的第一与第二特征彼此直接接触；且也可能包括某些实施例其中还有额外的组件形成于上述第一与第二特征之间，而使得第一与第二特征可能没有直接接触。此外，本揭示内容可能会在多个实施例中重复使用组件符号和/或标号。此种重复使用乃是基于简洁与清楚的目的，且其本身不代表所讨论的不同实施例和/或组态之间的关系。
再者，在此处使用空间上相对的词汇，譬如「之下」、「下方」、「低于」、「之上」、「上方」及与其相似者，可能是为了方便说明图中所绘示的一组件或特征相对于另一或多个组件或特征之间的关系。这些空间上相对的词汇其本意除了图中所绘示的方位之外，还涵盖了装置在使用或操作中所处的多种不同方位。可能将所述设备放置于其他方位(如，旋转90度或处于其他方位)，而这些空间上相对的描述词汇就应该做相应的解释。
虽然用以界定本申请较广范围的数值范围与参数皆是约略的数值，此处已尽可能精确地呈现具体实施例中的相关数值。然而，任何数值本质上不可避免地含有因个别测试方法所致的标准偏差。在此处，「约」通常系指实际数值在 一特定数值或范围的正负10％、5％、1％或0.5％之内。或者是，「约」一词代表实际数值落在平均值的可接受标准误差之内，视本申请所属技术领域中具有通常知识者的考虑而定。当可理解，除了实验例之外，或除非另有明确的说明，此处所用的所有范围、数量、数值与百分比(例如用以描述材料用量、时间长短、温度、操作条件、数量比例及其他相似者)均经过「约」的修饰。因此，除非另有相反的说明，本说明书与附随申请专利范围所揭示的数值参数皆为约略的数值，且可视需求而更动。至少应将这些数值参数理解为所指出的有效位数与套用一般进位法所得到的数值。在此处，将数值范围表示成由一端点至另一端点或介于二端点之间；除非另有说明，此处所述的数值范围皆包括端点。
如图1所示，本实施例提供一种清洗腔室，包括腔室本体11和设置在腔室本体11中的承载装置和喷淋装置，其中，承载装置用于承载待清洗件；喷淋装置围绕承载装置设置，用于向待清洗件喷淋清洗流体。
本实施例提供的清洗腔室与现有技术相比，在清洗待清洗件时，不是将待清洗件完全浸泡在清洗流体中，而是借助喷淋装置向待清洗件喷淋清洗流体，这就使得清洗待清洗件所使用的清洗流体的使用量减少，从而降低清洗待清洗件的成本。
在本实施例中，待清洗件可以是盛放晶片所用的片舟或者是盛放片舟所用的石英管。
在本实施例中，喷淋装置包括流体管路12和与之连接的至少一个喷头，其中，流体管路12用于向喷头提供清洗流体；喷头用于向待清洗件喷淋清洗流体。
具体的，流体管路12设置在腔室本体11中，并与盛放有清洗流体的清洗流体源连接，以将清洗流体源中的清洗流体输送至喷头，清洗流体通过喷头被喷向待清洗件，从而对待清洗件进行清洗，流体管路12可以与一个喷头连接，也可以与多个喷头连接，流体管路12与多个喷头连接，可以提高清洗流体的喷射面积以及单位时间内的喷射量，从而提高清洗效率。
在本实施例中，喷头为多个，且按位置分为至少一个上喷头131、至少一个侧喷头133和至少一个下喷头132，其中，上喷头131设置在腔室本体11的顶部，用于朝下喷淋清洗流体；下喷头132设置在腔室本体11的底部，用于朝上喷淋清洗流体；侧喷头133环绕设置在承载装置的周围，用于朝待清洗件喷淋清洗流体。
具体的，借助上喷头131、侧喷头133和下喷头132向待清洗件喷淋清洗流体，以在清洗待清洗件时，从多个不同的方向朝待清洗件喷淋清洗流体，对待清洗件的不同的位置进行清洗，降低待清洗件上出现清洗死角的情况，从而提高清洗效果。
在本实施例中，借助上喷头131能够从待清洗件的上方朝下喷淋清洗流体，以清洗待清洗件的顶部，借助下喷头132能够从待清洗件的下方朝上喷淋清洗流体，以清洗待清洗件的底部，借助侧喷头133能够从待清洗件的外侧朝待清洗件的侧面喷淋清洗流体，以清洗待清洗件的的周侧，另外，当反应腔体为反应管时，借助上喷头131和下喷头132能够分别从反应管的顶部管口和底部管口朝反应管内喷淋清洗流体，以清洗反应管的内部。
在实际应用中，根据实际清洗情况，上喷头131、侧喷头133和下喷头132可以均是一个，也可以均是多个，也可以一部分是一个，一部分多个，增加上喷头131、侧喷头133和下喷头132的数量可以提高清洗流体的喷射面积以及单位时间内的喷射量，从而提高清洗效率，但是，数量过多的上喷头131、侧喷头133和下喷头132也会提高其在腔室本体11中布置的难度，因此，还需要根据实际情况而定。
可选的，侧喷头133分为一组喷头组或者环绕在承载装置周围的多组喷头组，每组喷头组中的多个侧喷头133沿竖直方向间隔设置。
在本实施例中，环绕在承载装置周围设置多组喷头组，在清洗过程中，片舟或反应腔室放置在承载装置上，多组喷头组环绕在待清洗件的周围，以从待 清洗件的四周向待清洗件喷淋清洗流体，每组喷头组中的多个侧喷头133都与一个流体管路12连接，每通过一个流体管路12向该流体管路12上的每个侧喷头133提供清洗流体，每个流体管路12竖直放置，每个流体管路12上的多个侧喷头133沿流体管路12的竖直方向间隔设置，以在竖直方向上对片舟或反应腔室的侧面喷淋清洗流体，借助环绕在承载装置周围，且沿竖直方向设置的多组喷头组，以在待清洗件的周向或者轴线方向上对其进行清洗，降低待清洗件上出现清洗死角的情况，从而提高清洗效果，并且，能够提高清洗流体的喷射面积以及单位时间内的喷射量，从而提高清洗效率。
在本实施例中，清洗设备还包括角度调节结构，用于调节侧喷头133的喷淋角度，借助调节结构调节侧喷头133相对于待清洗件的角度，以对自侧喷头133中喷出的清洗流体的方向，以改变侧喷头133喷出的清洗流体落在待清洗件上的位置，进一步降低待清洗件上出现清洗死角的情况，从而提高清洗效果。
在本实施例中，清洗流体包括化学药液、纯水或者干燥气体，其中，化学药液可以对待清洗件上的污染物进行清洗，纯水可以对待清洗件进行预清洗或/和清洗残留在待清洗件上的化学药液，干燥气体可以去除残留在待清洗件上的水分，借助本实施例提供的清洗设备，通过喷淋装置向待清洗件上喷淋干燥气体，可以使待清洗件在清洗设备中被干燥，避免手动进行干燥，降低工作人员的工作量，提高清洗效率。
在本实施例中，化学药液可以采用酸性药液，干燥气体可以采用氮气。
在本实施例中，流体管路12为多条，且多条流体管路12中有至少一条用于输送化学药液的第一管路，和至少一条用于输送纯水或者干燥气体的第二管路，其中，第一管路与至少一个喷头连接；第二管路与至少一个喷头连接。
具体的，将化学药液通过第一管路输送，将纯水或者干燥气体通过第二管路输送，以避免化学药液和纯水在流体管路12中反应，提高清洗效果，但是，第一管路和第二管路可以与相同的喷头连接，以使一个喷头可以向待清洗件喷 淋化学药液、纯水或者干燥气体。
在本实施例中，清洗设备还包括储液装置，储液装置包括设置在腔室本体11底部的储液槽14和分别与储液槽14和流体管路12连接的输液管路，其中，储液槽14用于回收液态的清洗流体；输液管路用于将储液槽14中的液态的清洗流体输送至流体管路12中，借助储液槽14对清洗流体回收，并借助输液管路将储液槽14中的清洗流体再利用，进一步减少清洗流体的使用量，降低清洗成本。
具体的，储液槽14为设置在腔室本体11底部的单独区域，并在腔室本体11的底部设置与储液槽14连通的流通孔，喷淋在待清洗件上的清洗流体在重力作用下，流至腔室本体11的底部，并经过流通孔流至储液槽14中，输液管路上设置有压力泵，用于将储液槽14中的清洗流体抽至流体管路12中。在本实施例中，由于液体的清洗流体包括化学药液和纯水，因此，需要在流通孔中设置三通阀，当喷淋装置喷淋化学药液时，通过三通阀使化学药液流入储液槽14，当喷淋装置喷淋出水时，通过三通阀将纯水排出清洗设备，避免纯水流入储液槽14中与化学药液反应，影响化学药液的清洗效果，另外，也可以在腔室本体11的底部单独设置与清洗设备外部连通的排放孔，并在排放孔和流通孔中设置通断阀，当喷淋化学药液时，使用通断阀将流通孔打开，将排放孔关闭，以使化学药液流入储液槽14中，当喷淋纯水时，使用通断阀将流通孔关闭，将排放孔打开，以使纯水排出清洗设备。
在本实施例中，承载装置包括承载平台152、旋转平台151和多个连接柱153，其中，承载平台152设置在腔室本体11的底部，用于在竖直方向上承载待清洗件；旋转平台151相对承载平台152设置在腔室本体11的顶部，并通过多个连接柱153与承载平台152连接，以通过多个连接柱153驱动承载平台152旋转。
在本实施例中，承载装置的结构满足能够使由承载装置承载的待清洗件保持直立，这与现有技术相比，当对片舟或石英管进行清洗时，片舟或石英管不是横向躺在清洗槽中，而是竖向直立在腔室本体11中，这样可以使腔室本体11 在相对于地面水平方向上的长度较短，而在相对于地面竖直方向上的长度较长的结构，从而降低腔室本体11的占地面积，以便于腔室本体11的放置。
具体的，承载平台152设置在腔室本体11的底部，下喷头132设置在承载平台152朝上的一面上，旋转平台151位于腔室本体11的顶部，上喷头131设置在旋转平台151朝下的一面上，多个连接柱153竖直的设置在旋转平台151和承载平台152之间，其中，承载平台152用于承载待清洗件的底部，以使待清洗件直立的位于腔室本体11中，且待清洗件位于旋转平台151与承载平台152之间。
如图1所示，在本实施例中，连接柱153设置有三个，每个连接柱153的两端均分别与旋转平台151和承载平台152连接，从而使旋转平台151通过三个连接柱153带动承载平台152旋转，但是，连接柱153的数量并不限于此。
在本实施例中，清洗设备还包括旋转驱动机构16，旋转驱动机构16设置在腔室本体11的顶部，并与旋转平台151连接，用于驱动旋转平台151旋转，借助旋转驱动机构16，在对待清洗件进行清洗的过程中，驱动旋转平台151旋转，并通过旋转平台151带动承载平台152旋转，以使位于承载平台152上的待清洗件随承载平台152旋转，以能够进一步降低待清洗件上出现清洗死角的情况，使清洗流体能够喷淋到待清洗件上更多的位置，从而提高清洗效果。
在本实施例中，在腔室本体11的顶部设置有单独放置旋转驱动机构16的区域，旋转驱动机构16设置在该区域中，并与旋转平台151连接，从而避免旋转驱动机构16被化学药液腐蚀。
如图2所示，本实施例还提供一种清洗设备，包括设备本体和设置在设备本体中的仪表区171、控制模块172和多个本实施例提供的清洗腔室，每个清洗腔室均用于对待清洗件进行清洗，仪表区171与多个清洗腔室电连接，用于监测并显示清洗工艺的参数，控制模块172与多个清洗腔室电连接，用于分别对每个清洗腔室的清洗工作进行自动控制，以及工作人员分别与每个清洗腔室进 行人机交互。
本实施例提供的清洗设备，借助设置在设备本体中的多个本本实施例提供清洗腔室，能够减少清洗流体的使用量，降低清洗成本。
下面具体介绍一下本实施例中的清洗过程，在本实施例中，腔室本体11上喷头131与用于输送化学药液的第一管路连接，并与厂务端的纯水管路连接，用于喷淋化学药液或纯水，下喷头132与用于输送化学药液的第一管路连接，并与用于输送纯水或者干燥气体的第二管路连接，用于喷淋化学药液、纯水或干燥气体，侧喷头133分为两组，一组与用于输送化学药液的第一管路连接，用于喷淋化学药液，另一组与用于输送纯水或者干燥气体的第二管路连接，用于喷淋纯水或干燥气体。
在清洗过程中，首先将待清洗件放置在承载装置上，使用旋转驱动机构16驱动承载装置旋转，与此同时，能够喷淋纯水的上喷头131、侧喷头133和下喷头132同时进行纯水喷淋，以对片舟或反应腔进行预清洗；在完成预清洗后，能够喷淋化学药液的上喷头131、侧喷头133和下喷头132同时进行化学药液喷淋，旋转驱动机构16继续保持驱动承载装置旋转，以待清洗件上的污染物进行清洗；在完成化学药液喷淋后，能够喷淋纯水的上喷头131、侧喷头133和下喷头132同时进行纯水喷淋，旋转驱动机构16继续保持驱动承载装置旋转，以对待清洗件上残留的化学药液进行清洗；在完成化学药液的清洗后，能够喷淋干燥气体的侧喷头133和下喷头132同时进行干燥气体喷淋，以去除待清洗件上残留的水分，完成干燥工艺，以上就是一个基本的完整清洗过程。
在本实施例中，腔室本体11为一个或多个，且在每个腔室本体11中均设置有承载装置和喷淋装置，每个腔室本体11用于单独对待清洗件进行清洗，即，当清洗设备设置多个腔室本体11时，清洗设备能够同时对多个待清洗件进行清洗，从而提高清洗设备的清洗效率。
如图2所示，在本实施例中，清洗设备具有两个腔室本体11，分别设置在 倾斜设备的左右两侧，储液槽14设置在两个腔室本体11的下方，旋转驱动机构16也具有两个，两个旋转驱动机构16都设置在两个腔室本体11上方的单独区域中，分别驱动两个腔室本体11中的承载装置旋转，并在清洗设备上还设置有仪表区171和控制模块172，其中，仪表区171用于监测厂务的压缩干燥气体、氮气及排放压力，控制模块172用于工作人员进行人机交互与自动化控制。
综上所述，本实施例提供的清洗腔室及清洗设备，不仅能够减少清洗流体的使用量，降低清洗成本，还能够降低腔室本体11的占地面积，以便于腔室本体11的放置，并且，还能够自动对待清洗件进行干燥，降低工作人员的工作量，提高清洗效率。

Claims (11)

  1. 一种清洗腔室，其特征在于，包括腔室本体和设置在所述腔室本体中的承载装置和喷淋装置，其中，
    所述承载装置用于承载待清洗件；
    所述喷淋装置围绕所述承载装置设置，用于向所述待清洗件喷淋清洗流体。
  2. 根据权利要求1所述的清洗腔室，其特征在于，所述喷淋装置包括流体管路和与之连接的至少一个喷头，其中，
    所述流体管路用于向所述喷头提供所述清洗流体；
    所述喷头用于向所述待清洗件喷淋所述清洗流体。
  3. 根据权利要求2所述的清洗腔室，其特征在于，所述喷头为多个，且按位置分为至少一个上喷头、至少一个侧喷头和至少一个下喷头，其中，
    所述上喷头设置在所述腔室本体的顶部，用于朝下喷淋所述清洗流体；
    所述下喷头设置在所述腔室本体的底部，用于朝上喷淋所述清洗流体；
    所述侧喷头环绕设置在所述承载装置的周围，用于朝所述待清洗件喷淋所述清洗流体。
  4. 根据权利要求3所述的清洗腔室，其特征在于，所述侧喷头分为一组喷头组或者环绕在所述承载装置周围的多组喷头组，每组所述喷头组中的多个所述侧喷头沿竖直方向间隔设置。
  5. 根据权利要求3所述的清洗腔室，其特征在于，还包括角度调节结构，用于调节所述侧喷头的喷淋角度。
  6. 根据权利要求2所述的清洗腔室，其特征在于，所述清洗流体包括化学药液、纯水或者干燥气体。
  7. 根据权利要求6所述的清洗腔室，其特征在于，所述流体管路为多条，且多条所述流体管路中有至少一条用于输送所述化学药液的第一管路，和至 少一条用于输送所述纯水或者干燥气体的第二管路，其中，
    所述第一管路与至少一个所述喷头连接；所述第二管路与至少一个所述喷头连接。
  8. 根据权利要求2所述的清洗腔室，其特征在于，还包括储液装置，所述储液装置包括设置在所述腔室本体底部的储液槽和分别与所述储液槽和所述流体管路连接的输液管路，其中，
    所述储液槽用于回收液态的所述清洗流体；
    所述输液管路用于将所述储液槽中的液态的所述清洗流体输送至所述流体管路中。
  9. 根据权利要求1-8任意一项所述的清洗腔室，其特征在于，所述承载装置包括承载平台、旋转平台和多个连接柱，其中，
    所述承载平台设置在所述腔室本体的底部，用于在竖直方向上承载所述待清洗件；
    所述旋转平台相对所述承载平台设置在所述腔室本体的顶部，并通过多个所述连接柱与所述承载平台连接，以通过多个所述连接柱驱动所述承载平台旋转。
  10. 根据权利要求9所述的清洗腔室，其特征在于，还包括旋转驱动机构，所述旋转驱动机构设置在所述腔室本体的顶部，并与所述旋转平台连接，用于驱动所述旋转平台旋转。
  11. 一种清洗设备，其特征在于，包括设备本体和设置在所述设备本体中的仪表区、控制模块和多个如权利要求1-10任意一项的所述清洗腔室，每个所述清洗腔室均用于对所述待清洗件进行清洗，所述仪表区与多个所述清洗腔室电连接，用于监测并显示清洗工艺的参数，所述控制模块与多个所述清洗腔室电连接，用于分别对每个所述清洗腔室的清洗工作进行自动控制，以及工作人员分别与每个所述清洗腔室进行人机交互。
PCT/CN2020/084927 2019-05-08 2020-04-15 清洗腔室及清洗设备 WO2020224401A1 (zh)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US17/609,711 US20220250122A1 (en) 2019-05-08 2020-04-15 Cleaning chamber and cleaning apparatus
KR1020217031335A KR20210131418A (ko) 2019-05-08 2020-04-15 세정 챔버 및 세정 디바이스
JP2021565970A JP7312854B2 (ja) 2019-05-08 2020-04-15 クリーニング・チャンバおよびクリーニング装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201910381668.8A CN111906102B (zh) 2019-05-08 2019-05-08 清洗腔室及清洗设备
CN201910381668.8 2019-05-08

Publications (1)

Publication Number Publication Date
WO2020224401A1 true WO2020224401A1 (zh) 2020-11-12

Family

ID=73051404

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2020/084927 WO2020224401A1 (zh) 2019-05-08 2020-04-15 清洗腔室及清洗设备

Country Status (6)

Country Link
US (1) US20220250122A1 (zh)
JP (1) JP7312854B2 (zh)
KR (1) KR20210131418A (zh)
CN (1) CN111906102B (zh)
TW (1) TWI720875B (zh)
WO (1) WO2020224401A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114632751A (zh) * 2022-03-17 2022-06-17 北京北方华创微电子装备有限公司 清洗系统

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113182245A (zh) * 2021-03-30 2021-07-30 亚电科技(苏州)有限公司 石英舟清洗机
CN114453369B (zh) * 2021-11-25 2023-10-31 上海天昊达化工包装有限公司 一种钢桶清洗干燥系统

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09181029A (ja) * 1995-12-25 1997-07-11 Nec Corp 半導体洗浄装置
CN1634670A (zh) * 2003-12-30 2005-07-06 中芯国际集成电路制造(上海)有限公司 器壁清洗装置
KR20100046897A (ko) * 2008-10-28 2010-05-07 세메스 주식회사 기판 이송 로봇을 세정하는 기판 처리 장치 및 기판 이송 로봇의 세정 방법
KR20110064578A (ko) * 2009-12-08 2011-06-15 주식회사 동부하이텍 폐가스 처리용 스크러버의 챔버 자동 세척 장치
CN202087548U (zh) * 2011-05-19 2011-12-28 武汉新芯集成电路制造有限公司 晶舟清洗装置
CN202185442U (zh) * 2011-08-03 2012-04-11 无锡龙奕科技有限公司 单晶坩埚自动高压清洗机
CN102513318A (zh) * 2011-12-13 2012-06-27 北京航天凯恩化工科技有限公司 一种全自动密封清洗装置
CN108620394A (zh) * 2018-04-10 2018-10-09 连云港科拓信息科技有限公司 一种石英管清洗装置
CN208261487U (zh) * 2018-04-10 2018-12-21 东海县太阳光新能源有限公司 一种石英坩埚生产用高压喷淋装置
CN109500036A (zh) * 2018-11-27 2019-03-22 席飞 一种生态大棚用反光玻璃的清洗设备

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US635009A (en) * 1898-04-01 1899-10-17 John D Atkinson Dish-washing machine.
US2471506A (en) * 1943-03-22 1949-05-31 Wiswall Harry Bruce Spray type washing machine for solid objects
JPS62127743U (zh) * 1986-02-04 1987-08-13
JPS62198043U (zh) * 1986-06-10 1987-12-16
JP2923733B2 (ja) * 1994-06-15 1999-07-26 鬼頭工業株式会社 洗浄装置
KR100398583B1 (ko) * 1995-10-24 2003-12-11 주식회사 하이닉스반도체 반도체제조장비용석영튜브의세정방법및그장치
JP4426036B2 (ja) * 1999-12-02 2010-03-03 東京エレクトロン株式会社 基板処理装置
JP4707223B2 (ja) * 2000-12-13 2011-06-22 Ｓｕｍｃｏ Ｔｅｃｈｘｉｖ株式会社 石英ベルジャー洗浄乾燥機及び石英ベルジャーの洗浄乾燥方法
KR100607746B1 (ko) * 2001-07-09 2006-08-01 동부일렉트로닉스 주식회사 반도체 제조장비용 석영류 세정장치
US20040000327A1 (en) * 2002-06-26 2004-01-01 Fabio Somboli Apparatus and method for washing quartz parts, particularly for process equipment used in semiconductor industries
JP2004230342A (ja) * 2003-01-31 2004-08-19 Honda Kinzoku Gijutsu Kk ワークの洗浄・脱水方法及びその装置
CN100442448C (zh) * 2003-08-07 2008-12-10 株式会社荏原制作所 基片处理装置
US7520288B2 (en) * 2004-08-18 2009-04-21 Rhodes Laurence M Cleaning machine
JP4629460B2 (ja) * 2005-03-02 2011-02-09 パナソニック株式会社 洗浄方法および洗浄装置
CN102097293B (zh) * 2010-11-19 2014-03-12 嘉盛半导体(苏州)有限公司 半导体封装产品的清洗机台及清洗工艺
US8043437B1 (en) * 2010-12-03 2011-10-25 Whirlpool Corporation Dishwasher with multiple treating chambers
JP3176080U (ja) * 2012-03-26 2012-06-14 株式会社ミヤザワ 洗浄装置
CN104275324A (zh) * 2013-07-08 2015-01-14 上海和辉光电有限公司 一种去除遮罩上有机或脏污的装置
JP6229933B2 (ja) * 2013-09-27 2017-11-15 株式会社Ｓｃｒｅｅｎホールディングス 処理カップ洗浄方法、基板処理方法および基板処理装置
CN103871938B (zh) * 2014-03-31 2016-10-12 上海华力微电子有限公司 用于清洗半导体晶圆的清洗槽
JP2016112529A (ja) * 2014-12-17 2016-06-23 株式会社ニックス 洗浄脱水装置
CN205569360U (zh) * 2016-03-25 2016-09-14 德州学院 一种基于物联网系统的槽式太阳能医疗器械灭菌消毒装置
US20170367557A1 (en) * 2016-06-23 2017-12-28 Illinois Tool Works Inc. Warewasher with air assisted washing and/or rinsing
CN106040683B (zh) * 2016-07-29 2018-06-08 上海旭熠电子技术有限公司 光纤套管的自动清洗装置
CN206474471U (zh) * 2017-01-19 2017-09-08 广州麦吉柯电子材料有限公司 一种大型钢管立式清洗装置
CN106824929B (zh) * 2017-03-10 2020-04-03 北京北方华创微电子装备有限公司 一种立式多工位石英管清洗机及清洗方法
CN206925064U (zh) * 2017-06-02 2018-01-26 广州市花都全球自动变速箱有限公司 一种清洗机
CN207170391U (zh) * 2017-07-13 2018-04-03 浙江峰邦机械科技有限公司 一种机械电子元件清洁处理系统
CN107755323A (zh) * 2017-10-24 2018-03-06 四川弘毅智慧知识产权运营有限公司 一种医疗器械清洗消毒装置
CN108043791A (zh) * 2017-12-11 2018-05-18 李时英 一种医用手术刀清洗装置及清洗方法
CN208195042U (zh) * 2018-01-19 2018-12-07 浙江金乐太阳能科技有限公司 硅片清洗装置
CN108524975A (zh) * 2018-06-01 2018-09-14 芜湖博创新能源科技有限公司 一种具有烘干功能的医疗器械用消毒装置

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09181029A (ja) * 1995-12-25 1997-07-11 Nec Corp 半導体洗浄装置
CN1634670A (zh) * 2003-12-30 2005-07-06 中芯国际集成电路制造(上海)有限公司 器壁清洗装置
KR20100046897A (ko) * 2008-10-28 2010-05-07 세메스 주식회사 기판 이송 로봇을 세정하는 기판 처리 장치 및 기판 이송 로봇의 세정 방법
KR20110064578A (ko) * 2009-12-08 2011-06-15 주식회사 동부하이텍 폐가스 처리용 스크러버의 챔버 자동 세척 장치
CN202087548U (zh) * 2011-05-19 2011-12-28 武汉新芯集成电路制造有限公司 晶舟清洗装置
CN202185442U (zh) * 2011-08-03 2012-04-11 无锡龙奕科技有限公司 单晶坩埚自动高压清洗机
CN102513318A (zh) * 2011-12-13 2012-06-27 北京航天凯恩化工科技有限公司 一种全自动密封清洗装置
CN108620394A (zh) * 2018-04-10 2018-10-09 连云港科拓信息科技有限公司 一种石英管清洗装置
CN208261487U (zh) * 2018-04-10 2018-12-21 东海县太阳光新能源有限公司 一种石英坩埚生产用高压喷淋装置
CN109500036A (zh) * 2018-11-27 2019-03-22 席飞 一种生态大棚用反光玻璃的清洗设备

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114632751A (zh) * 2022-03-17 2022-06-17 北京北方华创微电子装备有限公司 清洗系统
CN114632751B (zh) * 2022-03-17 2023-12-22 北京北方华创微电子装备有限公司 清洗系统

Also Published As

Publication number Publication date
JP7312854B2 (ja) 2023-07-21
TW202041289A (zh) 2020-11-16
JP2022527664A (ja) 2022-06-02
CN111906102B (zh) 2023-02-14
KR20210131418A (ko) 2021-11-02
US20220250122A1 (en) 2022-08-11
CN111906102A (zh) 2020-11-10
TWI720875B (zh) 2021-03-01

Similar Documents

Publication Publication Date Title
WO2020224401A1 (zh) 清洗腔室及清洗设备
US6247479B1 (en) Washing/drying process apparatus and washing/drying process method
US20060237054A1 (en) Apparatus and method for washing quartz parts, particularly for process equipment used in semiconductor industries
KR20020006467A (ko) 세정처리방법 및 세정처리장치
KR100901495B1 (ko) 기판 처리 장치 및 그 세정 방법
WO2005015625A1 (ja) 基板処理方法及び基板処理装置
TW201119761A (en) Method and apparatus for showerhead cleaning
KR100884336B1 (ko) 약액 공급 장치, 그리고 이를 구비하는 기판 처리 설비 및방법
KR20120015662A (ko) 기판 처리 장치
CN101847567B (zh) 清洗基板的装置
KR20110057679A (ko) 아이피에이 공급 장치
KR101395220B1 (ko) 기판 처리 장치
JPH01120828A (ja) 半導体ウエハの自動洗浄装置
KR102288985B1 (ko) 액공급유닛, 기판 처리 장치 및 기판 처리 방법
US20080083427A1 (en) Post etch residue removal from substrates
JPH04336430A (ja) 洗浄方法及び洗浄装置
KR100219414B1 (ko) 반도체 제조장비용 세정장치
US20230212044A1 (en) Unit and method for decomposing ozone, and substrate treating apparatus including the unit
KR102075679B1 (ko) 기판 처리 장치 및 약액 재생 방법
KR102347973B1 (ko) 기판 처리 장치 및 기판 처리 방법
US20230203672A1 (en) Apparatus and method of treating substrate
KR100812096B1 (ko) 글라스 식각장치 및 식각방법
US20220112603A1 (en) Substrate processing method and substrate processing apparatus
KR100280439B1 (ko) 반도체 웨이퍼 세정장비용 로봇암
JPH04334579A (ja) 洗浄装置

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 20802350

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 20217031335

Country of ref document: KR

Kind code of ref document: A

ENP Entry into the national phase

Ref document number: 2021565970

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 20802350

Country of ref document: EP

Kind code of ref document: A1