WO2020098152A1 - 柔性显示面板的制作方法及柔性显示面板 - Google Patents
柔性显示面板的制作方法及柔性显示面板 Download PDFInfo
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- WO2020098152A1 WO2020098152A1 PCT/CN2019/072462 CN2019072462W WO2020098152A1 WO 2020098152 A1 WO2020098152 A1 WO 2020098152A1 CN 2019072462 W CN2019072462 W CN 2019072462W WO 2020098152 A1 WO2020098152 A1 WO 2020098152A1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
- G09F9/301—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements flexible foldable or roll-able electronic displays, e.g. thin LCD, OLED
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/126—Shielding, e.g. light-blocking means over the TFTs
Definitions
- the present invention relates to the field of display technology, and in particular, to a method for manufacturing a flexible display panel and a flexible display panel.
- the polarizer can effectively reduce the reflectivity of the panel under strong light, it will cause a loss of the emitted light and have a greater impact on the life of the flexible display panel, and the thickness of the polarizer is thicker and the material It is brittle and is not conducive to the development of dynamic bending products.
- the use of color films instead of polarizers can not only reduce the thickness of the OLED functional layer, but also improve the light extraction rate, but due to OLED
- the light-emitting device itself is not resistant to high temperature, and the temperature usually withstands less than 100 degrees Celsius, and the baking process temperature of the color film process usually reaches above 220 degrees Celsius, so it is necessary to develop a low-temperature color film color resist.
- the functional layer of the OLED device may cause the risk of failure of the optical layer after contact with the organic solvent, which further limits the preparation of the color film of the conventional solution system on the OLED device.
- the present invention provides a flexible display panel to solve the existing flexible display panel. Due to the solvent, high temperature baking and other processes in the color film preparation process, the OLED light-emitting layer is affected, resulting in the failure of the OLED light-emitting layer, which in turn affects the display. technical problem.
- the invention provides a flexible display panel, comprising: an array substrate, an adhesive layer provided on the array substrate, a color film layer provided on the adhesive layer, and the array substrate and the color film A touch layer between layers, and a cover window provided on the color filter layer; a plurality of pixel units are formed on the array substrate; the color filter layer includes a black matrix and correspondingly arranged pixel units Color resist layer; the cover window is a transparent material.
- the array substrate includes a thin film transistor layer, an OLED light emitting layer, and a thin film encapsulation layer that are sequentially disposed on the flexible substrate.
- a touch layer is provided on the thin-film encapsulation layer, and the touch layer includes touch electrodes.
- the adhesive layer is made of optical glue.
- the color resist layer includes a plurality of red, green, and blue resist blocks, and the color resist blocks are corresponding to pixels on the array substrate.
- the invention also provides a method for manufacturing a flexible display panel, including: S10, providing a cover window, forming a color film layer on the cover window; S20, providing an array substrate formed with a plurality of pixel units; S30, will The color film layer is attached to the array substrate.
- the S10 includes:
- the S30 includes:
- the adhesive material is optical glue.
- the formation of the array substrate includes:
- a thin film encapsulation layer is formed on the OLED light emitting layer.
- the invention also provides a flexible display panel, comprising: an array substrate, an adhesive layer provided on the array substrate, a color film layer provided on the adhesive layer, and a cover provided on the color film layer A window; a plurality of pixel units are formed on the array substrate; the color film layer includes a black matrix and a color resist layer corresponding to the pixel units.
- the array substrate includes a thin film transistor layer, an OLED light emitting layer, and a thin film encapsulation layer that are sequentially disposed on the flexible substrate.
- a touch layer is provided on the thin-film encapsulation layer, and the touch layer includes touch electrodes.
- the adhesive layer is made of optical glue.
- the color resist layer includes a plurality of color resist blocks of three colors of red, green, and blue.
- the color block is corresponding to the pixel unit on the array substrate.
- the black matrix is disposed between adjacent color blocks.
- the manufacturing method of the flexible display panel and the flexible display panel provided by the present invention can effectively avoid the influence of the color film on the OLED device during the preparation process by changing the order of the color film produced in the display panel;
- the preparation of color film on the cover window of the display panel can also simplify the production complexity and improve the yield of the flexible display panel.
- FIG. 1 is a flow chart of the steps of the method for manufacturing a flexible display panel of the present invention
- FIGS. 2 to 3 are schematic structural diagrams of the manufacturing process of the flexible display panel of the present invention.
- FIG. 5 is a schematic structural diagram of a flexible display panel of the present invention.
- the present invention is directed to the existing flexible display panel. Since the color film layer is directly prepared on the array substrate, the solvent, high temperature baking and other processes in the color film preparation process affect the OLED device on the array substrate, resulting in the failure of the OLED functional layer. Further affecting the technical problems of the display, this embodiment can solve this defect.
- the present invention provides a method for manufacturing a flexible display panel, including:
- a cover window 15 is provided, and a color film layer 14 is formed on the cover window 15;
- the cover window 15 is made of a transparent plastic material, the cover window 15 is used to protect the panel from external impact, and the plastic material is beneficial for bending the flexible product.
- a black matrix is prepared on the surface of the cover window 15 first, and a black matrix with a set size is prepared on the surface of the cover window 15 using a photolithography process; 15.
- the color resist layer includes color resist blocks of three colors of red, green, and blue. After three photolithography processes, the color resist blocks of the three colors are formed on the cover window.
- the photolithography process includes coating, pre-baking, exposure, development, re-baking and other processes.
- the color resist blocks of each color on the color resist layer correspond to a plurality of pixel units on the array substrate.
- the black matrix is distributed between adjacent color resistive blocks to block ambient light reflected by the reflective elements between adjacent pixel units.
- the color film layer 14 Since the preparation of the color film layer 14 requires a four-step photolithography process, the color resist dispersion solvent and high-temperature baking used in the photolithography process will affect the OLED device on the display panel.
- the color film layer 14 is prepared at On the cover window 15, compared with the direct preparation on the display panel, this method can avoid damage to the OLED device, thereby improving the yield of the display panel; in addition, the color film layer 14 is prepared on the cover window 15 instead of being prepared on a separate substrate, which can also reduce the thickness of the flexible display panel, making the panel lighter and thinner.
- the color film layer 14 faces away from the cover window 15.
- the surface is coated with an adhesive material, and then the surface of the color film layer 14 coated with the adhesive material is bonded to the array substrate 11 through an alignment process, and the adhesive layer 13 is formed after the adhesive material is cured .
- the adhesive material is optical glue, that is, the color film layer 14 is adhered to the array substrate 11 through the optical glue.
- the formation of the array substrate 11 includes: first forming a thin film transistor layer on a flexible substrate, the thin film transistor layer includes a source drain electrode, an active layer, a gate electrode, a gate insulating layer, and a pixel definition layer; Forming an OLED light emitting layer on the layer, specifically, forming an anode, an OLED functional layer, and a cathode on the thin film transistor layer; then forming a thin film encapsulating layer on the OLED light emitting layer, the thin film encapsulating layer covering the OLED light emitting layer
- the thin-film encapsulation layer can be formed by stacking three thin films of an inorganic layer, an organic layer, and an inorganic layer.
- the OLED light-emitting layer may be a white light OLED or a monochromatic organic electroluminescent device. In this embodiment, a monochromatic light-emitting device is selected.
- the color resist layer on the color film layer 14 The color needs to be the same as the corresponding pixel color on the OLED functional layer, that is, the red, green, and blue blocks on the color film layer 14 and the red, green, and blue sub-pixel units on the array substrate 11, respectively Corresponding settings.
- the manufacturing method of the flexible display panel further includes manufacturing a touch function layer.
- a touch layer 12 is formed on the array substrate 11.
- the touch layer 12 includes touch electrodes. Specifically, Metal is deposited on the thin-film encapsulation layer, and a driving touch electrode and a sensing touch electrode are formed through a patterning process.
- the touch function layer may be separately prepared on the substrate to form the touch layer 12, and then bonded to the array substrate 11 by optical glue.
- the present invention also provides a flexible display panel 10 prepared by the above method, including: an array substrate 11, an adhesive layer 13, a color film layer 14, and a cover window 15.
- the adhesive layer 13 is provided on the array substrate 11
- the color film layer 14 is provided on the adhesive layer
- the cover window 15 is provided on the color film layer.
- the array substrate 11 includes a thin-film transistor layer, an OLED light-emitting layer, and a thin-film encapsulation layer that are sequentially arranged on a flexible substrate.
- the flexible substrate may be made of polyimide material.
- the array substrate 11 includes a plurality of pixel units, and the color film layer 14 includes a plurality of red, green, and blue resist layers, and the color resist layers are respectively connected to the red and green on the array substrate 11 , Corresponds to the blue sub-pixel unit.
- the flexible display panel 10 further includes a touch layer 12 disposed between the color film layer 14 and the array substrate 11, and the touch layer is used to implement a touch function.
- the manufacturing method of the flexible display panel provided by the present invention first prepares the color film on the cover window, and then attaches it to the array substrate together with the cover window. By changing the production order of the color film, the preparation on the OLED device is avoided The color film, thereby avoiding the influence of the color film manufacturing process on the OLED light emitting layer, thereby improving the yield of the flexible display panel.
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Abstract
一种柔性显示面板的制作方法及柔性显示面板，包括提供一覆盖窗，在所述覆盖窗上形成彩膜层；提供一形成有多个像素单元的阵列基板；将所述彩膜层与所述阵列基板贴合。通过改变彩膜在显示面板中生产的次序，能够有效避免彩膜在制备过程中对OLED器件的影响，也能够简化生产复杂度，提高柔性显示面板的良率。
Description
本发明涉及显示技术领域，尤其涉及一种柔性显示面板的制作方法及柔性显示面板。
对于柔性显示面板来说，偏光片虽然能够有效降低强光下面板的反射率，但是会对出射光造成损失，对柔性显示面板的寿命有较大的影响，且偏光片的厚度较厚、材质较脆，不利于动态弯折产品的开发。
使用彩膜替代偏光片，不仅能将OLED功能层的厚度降低，也能够提高出光率，但是由于OLED
发光器件本身不耐高温，通常承受的温度小于100摄氏度，而彩膜制程的烘烤工艺温度通常达到220摄氏度以上，因此需要开发低温彩膜色阻。另外，在OLED器件上制备彩膜色阻时，OLED器件的功能层在接触有机溶剂后，可能引发光层失效的风险，这进一步限制了常规溶液体系的彩膜在OLED器件上的制备。
本发明提供一种柔性显示面板，以解决现有的柔性显示面板，由于彩膜制备过程中的溶剂、高温烘烤等制程，对OLED发光层产生影响，导致OLED发光层失效，进而影响显示的技术问题。
为解决上述问题，本发明提供的技术方案如下：
本发明提供一种柔性显示面板，包括：阵列基板、设置于所述阵列基板上的粘合层、设置于所述粘合层上的彩膜层、设置于所述阵列基板与所述彩膜层之间的触控层、以及设置于所述彩膜层上的覆盖窗；所述阵列基板上形成有多个像素单元；所述彩膜层包括黑矩阵和与所述像素单元对应设置的色阻层；所述覆盖窗为透明材料。
在本发明的至少一种实施例中，所述阵列基板包括依次设置在柔性基板上的薄膜晶体管层、OLED发光层以及薄膜封装层。
在本发明的至少一种实施例中，所述薄膜封装层上设置有触控层，所述触控层包括触控电极。
在本发明的至少一种实施例中，所述粘合层采用光学胶制备。
在本发明的至少一种实施例中，所述色阻层包括多个红、绿、蓝色阻块，所述色阻块与所述阵列基板上的像素对应设置。
本发明还提供一种柔性显示面板的制作方法，包括：S10，提供一覆盖窗，在所述覆盖窗上形成彩膜层；S20，提供一形成有多个像素单元的阵列基板；S30，将所述彩膜层与所述阵列基板贴合。
在本发明的至少一种实施例中，所述S10包括：
S101，提供一覆盖窗，在所述覆盖窗表面制备黑矩阵；
S102，在所述覆盖窗表面制备色阻层，所述色阻层与所述阵列基板上的像素单元对应设置。
在本发明的至少一种实施例中，所述S30包括：
S301，在所述彩膜层表面涂布粘合材料；
S302，将所述彩膜层的涂布有所述粘合材料的一侧表面与所述阵列基板贴合，待所述粘合材料固化后形成粘合层。
在本发明的至少一种实施例中，所述粘合材料为光学胶。
在本发明的至少一种实施例中，所述阵列基板的形成包括：
在柔性基板上形成薄膜晶体管层；
在所述薄膜晶体管层上形成OLED发光层；
在所述OLED发光层上形成薄膜封装层。
在本发明的至少一种实施例中，还包括：在所述薄膜封装层上形成触控层，所述触控层包括触控电极。
本发明还提供一种柔性显示面板，包括：阵列基板、设置于所述阵列基板上的粘合层、设置于所述粘合层上的彩膜层、设置于所述彩膜层上的覆盖窗；所述阵列基板上形成有多个像素单元；所述彩膜层包括黑矩阵和与所述像素单元对应设置的色阻层。
在本发明的至少一种实施例中，所述阵列基板包括依次设置在柔性基板上的薄膜晶体管层、OLED发光层以及薄膜封装层。
在本发明的至少一种实施例中，所述薄膜封装层上设置有触控层，所述触控层包括触控电极。
在本发明的至少一种实施例中，所述粘合层采用光学胶制备。
在本发明的至少一种实施例中，所述色阻层包括多个红、绿、蓝三种颜色的色阻块。
在本发明的至少一种实施例中，所述色阻块与所述阵列基板上的像素单元对应设置。
在本发明的至少一种实施例中，所述黑矩阵设置于相邻的色阻块之间。
本发明的有益效果为：本发明提供的柔性显示面板的制作方法及柔性显示面板，通过改变彩膜在显示面板中生产的次序，能够有效避免彩膜在制备过程中对OLED器件的影响；另外，在显示面板的覆盖窗上制备彩膜也能够简化生产复杂度，提高柔性显示面板的良率。
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本发明的柔性显示面板的制作方法的步骤流程图；
图2~3为本发明的柔性显示面板的制作过程的结构示意图；
图4为本发明的柔性显示面板的结构爆炸图；
图5为本发明的柔性显示面板的结构示意图。
以下各实施例的说明是参考附加的图示，用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语，例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。在图中，结构相似的单元是用以相同标号表示。
本发明针对现有的柔性显示面板，由于在阵列基板上直接制备彩膜层，彩膜制备过程中的溶剂、高温烘烤等制程对阵列基板上的OLED器件造成影响，导致OLED功能层失效，进而影响显示的技术问题，本实施例能够解决该缺陷。
如图1和图4所示，本发明提供一种柔性显示面板的制作方法，包括：
S10，提供一覆盖窗15，在所述覆盖窗15上形成彩膜层14；
S20，提供一形成有多个像素单元的阵列基板11；
S30，将所述彩膜层14与所述阵列基板11贴合。
所述覆盖窗15由透明塑料材料制备，所述覆盖窗15用于保护面板免受外部冲击，塑料材质有利于实现柔性产品的弯折。
如图2所示，在所述S10步骤中，先在所述覆盖窗15表面制备黑矩阵，利用光刻工艺在所述覆盖窗15表面制备设定尺寸的黑矩阵；再在所述覆盖窗15表面制备色阻层，所述色阻层包括红、绿、蓝三种颜色的色阻块，经过三道光刻工艺在所述覆盖窗上形成该三种颜色的色阻块，所述光刻工艺包括涂布、预烘烤、曝光、显影、再烘烤等制程，所述色阻层上的各个颜色的色阻块与所述阵列基板上的多个像素单元一一对应设置，所述黑矩阵分布在相邻的色阻块之间，用以遮挡相邻像素单元之间的反光元件反射过来的环境光。
由于制备所述彩膜层14需要四步光刻工艺，光刻工艺中用到的色阻分散溶剂和高温烘烤对显示面板上的OLED器件会产生影响，将所述彩膜层14制备在所述覆盖窗15上，与直接制备在显示面板上相比，本方法可避免对OLED器件的损伤，进而提高显示面板的良率；另外，将所述彩膜层14制备在所述覆盖窗15上，而不是制备在单独的基板上，这样也能够降低柔性显示面板的厚度，使得面板更轻薄化。
如图3和图4所示，在所述S30中，在将所述彩膜层14与所述阵列基板11贴合之前，先在所述彩膜层14背离所述覆盖窗15一侧的表面涂布粘合材料，然后通过对准工艺，将所述彩膜层14涂布有粘合材料的一侧表面与所述阵列基板11贴合，待粘合材料固化后形成粘合层13。
所述粘合材料为光学胶，即通过光学胶将所述彩膜层14与所述阵列基板11粘合。
所述阵列基板11的形成包括：先在一柔性基板上形成薄膜晶体管层，所述薄膜晶体管层包括源漏极、有源层、栅极、栅极绝缘层、像素定义层；再在薄膜晶体管层上形成OLED发光层，具体的，在所述薄膜晶体管层上形成阳极、OLED功能层、阴极；之后在所述OLED发光层上形成薄膜封装层，所述薄膜封装层覆盖所述OLED发光层，用以保护OLED器件免受水氧的侵蚀，所述薄膜封装层可由无机层、有机层、无机层三层薄膜叠加而成。
所述OLED发光层可采用白光OLED，也可采用单色发光的有机电致发光器件，本实施例中选择单色发光器件，为了减少光损失，所述彩膜层14上的色阻层的颜色需与OLED功能层上的对应的像素颜色相同，即所述彩膜层14上的红、绿、蓝色阻块分别与所述阵列基板11上的红、绿、蓝子像素单元一一对应设置。
如图5所示，所述柔性显示面板的制作方法，还包括触控功能层的制作，在阵列基板11上形成触控层12，所述触控层12包括触控电极，具体的，在所述薄膜封装层上沉积金属，并通过图案化工艺形成驱动触控电极和感应触控电极。除此之外，也可将触控功能层单独制备在基板上形成触控层12，再通过光学胶与阵列基板11贴合。
如图5所示，本发明还提供一种采用上述方法制备的柔性显示面板10，包括：阵列基板11、粘合层13、彩膜层14、以及覆盖窗15。
其中，所述粘合层13设置于所述阵列基板11上，所述彩膜层14设置于所述粘合层上，所述覆盖窗15设置于所述彩膜层上。
所述阵列基板11包括依次设置在柔性基板上的薄膜晶体管层、OLED发光层以及薄膜封装层，所述柔性基板可采用聚酰亚胺材料制备。
所述阵列基板11上包括有多个像素单元，所述彩膜层14上包括有多个红、绿、蓝色阻层，所述色阻层分别与所述阵列基板11上的红、绿、蓝子像素单元对应。
所述柔性显示面板10还包括触控层12，所述触控层设置于所述彩膜层14与所述阵列基板11之间，所述触控层用以实现触控功能。
有益效果：本发明提供的柔性显示面板的制作方法，先将彩膜制备在覆盖窗上，再与覆盖窗一起与阵列基板贴合，通过改变彩膜的生产次序，避免直接在OLED器件上制备彩膜，进而避免彩膜制程对OLED发光层的影响，从而提高柔性显示面板的良率。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。
Claims (18)
- 一种柔性显示面板，其中，包括：阵列基板，所述阵列基板上形成有多个像素单元；粘合层，设置于所述阵列基板上；彩膜层，设置于所述粘合层上，所述彩膜层包括黑矩阵和与所述像素单元对应设置的色阻层；触控层，设置于所述阵列基板与所述彩膜层之间；以及覆盖窗，设置于所述彩膜层上，所述覆盖窗为透明材料。
- 根据权利要求1所述的柔性显示面板，其中，所述阵列基板包括依次设置在柔性基板上的薄膜晶体管层、OLED发光层以及薄膜封装层。
- 根据权利要求2所述的柔性显示面板，其中，所述薄膜封装层上设置有触控层，所述触控层包括触控电极。
- 根据权利要求1所述的柔性显示面板，其中，所述粘合层采用光学胶制备。
- 根据权利要求1所述的柔性显示面板，其中，所述色阻层包括多个红、绿、蓝色阻块，所述色阻块与所述阵列基板上的像素对应设置。
- 一种柔性显示面板的制作方法，其中，包括：S10，提供一覆盖窗，在所述覆盖窗上形成彩膜层；S20，提供一形成有多个像素单元的阵列基板；S30，将所述彩膜层与所述阵列基板贴合。
- 根据权利要求6所述的柔性显示面板的制作方法，其中，所述S10包括：S101，提供一覆盖窗，在所述覆盖窗表面制备黑矩阵；S102，在所述覆盖窗表面制备色阻层，所述色阻层与所述阵列基板上的像素单元对应设置。
- 根据权利要求6所述的柔性显示面板的制作方法，其中，所述S30包括：S301，在所述彩膜层表面涂布粘合材料；S302，将所述彩膜层的涂布有所述粘合材料的一侧表面与所述阵列基板贴合，待所述粘合材料固化后形成粘合层。
- 根据权利要求8所述的柔性显示面板的制作方法，其中，所述粘合材料为光学胶。
- 根据权利要求6所述的柔性显示面板的制作方法，其中，所述阵列基板的形成包括：在柔性基板上形成薄膜晶体管层；在所述薄膜晶体管层上形成OLED发光层；在所述OLED发光层上形成薄膜封装层。
- 根据权利要求10所述的柔性显示面板的制作方法，其中，还包括：在所述薄膜封装层上形成触控层，所述触控层包括触控电极。
- 一种柔性显示面板，其中，包括：阵列基板，所述阵列基板上形成有多个像素单元；粘合层，设置于所述阵列基板上；彩膜层，设置于所述粘合层上，所述彩膜层包括黑矩阵和与所述像素单元对应设置的色阻层；以及覆盖窗，设置于所述彩膜层上。
- 根据权利要求12所述的柔性显示面板，其中，所述阵列基板包括依次设置在柔性基板上的薄膜晶体管层、OLED发光层以及薄膜封装层。
- 根据权利要求13所述的柔性显示面板，其中，所述薄膜封装层上设置有触控层，所述触控层包括触控电极。
- 根据权利要求12所述的柔性显示面板，其中，所述粘合层采用光学胶制备。
- 根据权利要求7所述的柔性显示面板，其中，所述色阻层包括多个红、绿、蓝三种颜色的色阻块。
- 根据权利要求16所述的柔性显示面板，其中，所述色阻块与所述阵列基板上的像素单元对应设置。
- 根据权利要求16所述的柔性显示面板，其中，所述黑矩阵设置于相邻的色阻块之间。
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| CN112117313B (zh) * | 2020-09-10 | 2024-01-19 | 武汉华星光电半导体显示技术有限公司 | 显示屏及电子设备 |
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| CN108845449A (zh) * | 2018-06-27 | 2018-11-20 | 武汉华星光电技术有限公司 | 柔性显示面板及其制造方法 |
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| CN115167020A (zh) * | 2022-07-27 | 2022-10-11 | 京东方科技集团股份有限公司 | 一种显示面板及显示装置 |
| CN115167020B (zh) * | 2022-07-27 | 2023-10-20 | 京东方科技集团股份有限公司 | 一种显示面板及显示装置 |
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