WO2020054897A1 - 빛샘 결함 수리 방법 및 장치 - Google Patents
빛샘 결함 수리 방법 및 장치 Download PDFInfo
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- WO2020054897A1 WO2020054897A1 PCT/KR2018/011052 KR2018011052W WO2020054897A1 WO 2020054897 A1 WO2020054897 A1 WO 2020054897A1 KR 2018011052 W KR2018011052 W KR 2018011052W WO 2020054897 A1 WO2020054897 A1 WO 2020054897A1
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- laser
- glass substrate
- processing
- light leakage
- light
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1306—Details
- G02F1/1309—Repairing; Testing
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2203/00—Function characteristic
- G02F2203/69—Arrangements or methods for testing or calibrating a device
Definitions
- the present invention relates to a light leakage defect repair method and apparatus for repairing light leakage defects in a display device such as a liquid crystal display (LCD) or an organic light emitting display (OLED).
- a display device such as a liquid crystal display (LCD) or an organic light emitting display (OLED).
- LCD liquid crystal display
- OLED organic light emitting display
- defective pixels that degrade image quality may occur.
- a small number of defective pixels, where the user's eyes are not concentrated, can usually be tolerated, but the presence of defective pixels degrades the value of the display device with it and, in some cases, disposes it, which is the most important factor in increasing production cost. It becomes one of the factors.
- the defective pixels can be divided into bright pixels and dark pixels.
- the standard of the allowed bright pixel is stricter than that of the dark pixel, thereby darkening the bright pixel to increase the yield of the display panel.
- Conventional conventional methods for darkening the bright pixels include a method of darkening the bright pixels by irradiating a black matrix with a laser to melt the black matrix, and inducing a melted black matrix material toward a bad pixel, and a region in which light is transmitted. There is a method of darkening the bright pixel by irradiating the color filter or the color filter structure directly to discolor the black of the transmission region.
- the properties of polarization and the focal length of the focusing lens can be used to focus energy on a specific layer for darkening such as a black matrix or color filter layer so as not to damage other layers or parts of the panel. .
- Patent No. 0981306 discloses a 'repair method of a liquid crystal display panel using polarized light'.
- a repair processing method of darkening a defective portion of a pixel using a polarizing plate installed on the liquid crystal display panel itself is disclosed.
- this prior art has a limitation in that most of the defective pixels cannot be repaired in reality because the repair itself is not suitable by the existing repair method.
- the method using black matrix has considerable limitations depending on the presence or absence of specific gravity of oxygen and carbon in the component, and the amount and thickness of the black matrix.
- the application direction varies depending on the presence or absence of constituents such as bromine, and is affected by the liquid crystal generated by energy during carbonization.
- the elastic resilience of adjacent liquid crystals is damaged when irradiated with a laser for repair. Becomes a problem.
- display devices such as OLEDs, dark ignition or conductive foreign material crushing methods are frequently used, but there are many types of defects that cannot be repaired depending on the cause of defects.
- the present invention is to solve the problem of deterioration in production efficiency due to cases where repair is difficult in the dark ignition method for a defective pixel of an existing display device, and also to a pixel defect of a type that cannot be solved by the existing method.
- An object of the present invention is to provide a light leakage defect repair method and apparatus that can be applied to increase repair efficiency.
- a light leakage defect repair method for solving the above technical problem includes: processing a predetermined depth of a glass substrate on which a defective pixel of a display panel is located by a laser; And forming an impermeable layer in the defective area of the defective pixel with the material of the glass substrate produced in the processing step.
- the size of the impermeable film is greater than or equal to the size of the defect area.
- the laser is a femtosecond or nanosecond pulsed laser having a frequency of 1 Hz or more, and the processing of the glass substrate by the laser is performed by controlling the energy output, frequency, and processing time and speed of the laser to control the processing depth. Block, scan or pattern processing including control.
- the wavelength of the laser is selected at 300 nm or less, and the beam focus of the laser is relative to the size of the defect area by configuring an optical system with a numerical aperture (NA) corresponding to the predetermined depth.
- NA numerical aperture
- the diffusion angle is set to be large.
- the beam focus may be determined by an objective lens or a focus lens of the scanner.
- the step of forming the impermeable film includes forming a cover film made of a metal or an impermeable ink on the material of the glass substrate covering the defect area, the cover film being chemical vapor deposition (LCVD), It can be formed through ink application, or printing by an electro-hydraulic jet (EHD jet).
- CVVD chemical vapor deposition
- EHD jet electro-hydraulic jet
- a light leakage defect repair apparatus for solving the above technical problem includes: a laser outputting laser light having a deep ultraviolet (DUV) wavelength of 300 nm or less; An optical system that adjusts the focus of the laser; Falling light that illuminates the processing area where the focus is formed; A camera monitoring the focus; And a control unit that controls a processing depth of the glass substrate in the processing region and laser energy transmitted to the glass substrate based on the image of the camera, and includes a glass substrate processed to remove some thickness by the laser.
- the material covers the light leakage defect area in the processing area.
- DUV deep ultraviolet
- the beam focus of the laser is set to a large diffusion angle relative to the size of the light leakage defect area by configuring an optical system with a numerical aperture (NA) corresponding to the predetermined depth, and the optical system May include a DUV objective lens.
- NA numerical aperture
- the light leakage defect repair apparatus may further include a cover film forming unit for forming a cover film made of an impermeable ink or a metal film on the material of the glass substrate covering the light leakage defect area.
- a light leakage defect repair method for solving the above technical problem is a non-transmissive material film (opaque film) on the outer surface of the glass substrate through which light at the defective pixel position of the display panel having the defective pixel passes. It is characterized by forming.
- the non-translucent material film may remove some thickness of the outer surface of the glass substrate and be installed in the removed position, wherein laser light irradiation may be used to remove some thickness.
- the wavelength of the laser used for laser irradiation is selected in the range of 300 nm to 400 nm, and a laser light in a region having low light transmittance and high absorption for a typical glass substrate, such as a deep ultraviolet (DUV) region Can be
- the optical system configuration on the laser beam path is configured so that the laser light energy can be concentrated on the outer surface of the glass substrate.
- the optical system may be configured such that focus is focused on the outer surface of the glass substrate to be removed, and light is diffused at a wide angle after this focusing position, so that the effect of heating and volatilization can hardly be achieved.
- the thermal effect is limited to the focus area in a short time. It is desirable to be focused so that it can be achieved.
- the impermeable film formed on the outer surface of the glass substrate may be made of a metal film or an impermeable ink having low light transmittance even in a thin film, and such an impermeable film is elaborate direct, such as laser chemical vapor deposition (LCVD), depending on the material. It can be achieved by patterning or by printing techniques with an electro-hydrodynamic jet (EHD jet).
- EHD jet electro-hydrodynamic jet
- the formation of the impermeable film may be complementary to each other along with the existing darkening process for preventing light leakage.
- a display device having a light leakage defect repair unit for solving the above technical problem includes an impermeable film formed in a defect area of a defective pixel having a light leakage defect among glass substrates of a display panel,
- the transparent film is formed of a material of the glass substrate by processing a portion of the glass substrate adjacent to the defective pixel.
- the impermeable film may further include an impermeable ink or metal film formed on the material of the glass substrate.
- the dark ignition repair can be achieved to increase the repair efficiency for the flat panel display device and lower the defect rate of the display device, thereby eventually increasing the yield.
- FIG. 1 is a cross-sectional view showing a state in which an impermeable material film is formed on a defective pixel of the display device of the present invention
- Figure 2 is a schematic configuration diagram showing an example of a repair device suitable for the method of the present invention
- FIG. 3 is a reference diagram for explaining an optical method for preventing thermal shock or deterioration of other components of a display pattern
- FIG. 4 is a graph of transmittance by wavelength of laser light for explaining a wavelength band suitable for laser processing on a glass substrate surface in the method of the present invention.
- FIG. 1 is a cross-sectional view showing a state in which an impermeable material film is formed on a defective pixel of a display device according to an exemplary embodiment of the present invention.
- the display device is a liquid crystal display device to which a-Si TFT is applied, and the overall structure of the pixel portion is shown.
- the panel constituting the display device is largely provided with the upper substrate 200, the liquid crystal layer 300, and the lower substrate 100.
- a gate electrode and a gate line are formed through thin film deposition and patterning on a glass substrate, a gate insulating film is formed thereon, a semiconductor film is formed again, and a data line, a source electrode, and a drain electrode are patterned with the conductive layer lamination process. It is formed through a process to form a thin film transistor for driving each pixel.
- the specific configuration of the thin film transistor may be made in various forms in other ways known in the art.
- a-Si TFT, as well as LTPS TFT, Oxide TFT, and other structures such as thin film transistors can be applied.
- An interlayer insulating film having a via hole is formed in the drain region over the thin film transistor, and a pixel electrode is formed thereon.
- a protective film or an alignment film may be further formed on the pixel electrode.
- the upper substrate 200 is made of a black matrix 221, a color filter layer 231 is formed on the lower surface of the glass substrate 211, the overcoat film 241, and the common electrode 251 are sequentially formed.
- a protective film or an alignment film may be further formed under the common electrode.
- the liquid crystal layer 300 is present between the upper substrate 200 and the lower substrate 100. Here, it is assumed that the liquid crystal layer 300 is initially vertically oriented.
- the black matrix 221 or color filter layer 231 of the upper substrate 200 of this pixel is abnormal, or the thin film transistor or other element of the lower substrate 100 is abnormal, thereby forming a defective pixel.
- a part of the thickness of the glass substrate is removed on the outer surface (surface) of the upper substrate larger than the size of the pixel electrode, preferably covering the pixel region and the black matrix region, and removing this
- the impermeable film 261 is filled with a thickness approximately equal to the thickness.
- the non-transmissive film 261 a material having a very low light transmittance such as an opaque ink or a metal film may be used.
- the ultra-high-definition display has a high pixel density, so the pixel size is very small, so it is necessary to accurately install the opaque film at the corresponding pixel position.
- a precision printing method such as LCVD method or EHD jet, which is a kind of direct patterning method, is required. Can be used.
- an impermeable film 261 is formed on the surface of the glass substrate over the entire defective pixel area where light leakage may occur.
- the main area through which light is transmitted is usually an area where a liquid crystal array is changed when a pixel electrode is formed and a light-transmitting voltage is applied to it, but diffraction or reflection may occur due to the characteristics of light. Light leakage can be achieved. In addition, depending on the viewing angle, even if the light leakage is not easily seen from the front, the light leakage may be remarkably visible when going to the side.
- the non-transmissive film is preferably formed in a larger area than the pixel electrode area of the defective pixel so that light leaking from the defective pixel can be shielded as much as possible.
- a retardation plate or a polarizing plate is further installed on the glass substrate, so the impermeable film itself is hardly scratched and removed by external force, but there is also a risk of being removed in the process. It is desirable to further form a protective film to protect the impermeable film.
- a protective film may be required.
- the liquid crystal layer does not serve as a switch to block light due to a defective pixel, and when the light leaks through the pixel, the impermeable film installed on the outer surface of the glass substrate blocks the leaking light, causing this pixel to fail. Make it look like a dark spot.
- the impermeable film is formed only on the upper substrate, but may also be formed on the outer surface of the lower substrate, or may be formed on both the upper substrate and the lower substrate.
- FIG. 2 is a schematic configuration conceptual diagram showing an example of a laser repair device for forming an opaque film of the display device of the present invention.
- the laser processing laser supply unit 110 is installed at the top.
- the laser light emitted from the laser supply unit is cut into a predetermined shape through a slit 120 or a mask and passes through the objective lens system 160 through the laser tube lens 140 and the beam splitters 191 and 151. In the state, it enters the processing region of the substrate 170.
- Several lens combinations are installed in the objective lens system 160 to select and pass tube lenses 160a, 160b, and 160c of the most suitable lens combination.
- the laser light may include a 10 fs to 100 kHz pulsed laser having a frequency of 1 kHz or more.
- the position where the laser light is irradiated and the position of the substrate are relatively adjusted, and the substrate is moved to the stationary position while the substrate is intermittently moving or to the substrate processing area while the substrate is continuously moving.
- Laser light may be irradiated.
- Such relative movement can be achieved by a transfer device that independently determines the plane position by independently moving the stage 175 on which the substrate is placed on the X and Y axes, but on the contrary, the laser supply unit 110 and the optical system and source gas supply pipe 130 )
- a heater (not shown) for preheating the substrate may be installed on the substrate stage 175 to facilitate laser processing.
- a source gas supply pipe 130 and a discharge pipe 135 are installed around the processing area so that a source gas or precursor gas of a metal or other conductive material that will form a wiring pattern is supplied to the processing area, and by-products generated as the wiring pattern is made The gas is quickly discharged to the outside through the discharge pipe 135 so as not to adversely affect the process.
- the falling light 153 is prepared, and the light of the falling light proceeds with the optical axis of the laser light source through the beam splitter 151 below the laser tube lens 140, and is placed on the substrate 170 processing area through the objective lens system 160. Will illuminate.
- the image of the substrate processing area in which the illumination is illuminated passes through the objective lens system 160 in the reverse direction and is separated from the laser optical axis through the upper beam splitter 191 through the image tube lens 194 and the reflection mirror 192. It is input to an imaging device 193 such as a camera.
- the camera allows the operator to adjust the degree of laser processing while monitoring the image of the substrate processing area, or it is connected to an automatic adjustment device (not shown) to automatically adjust the laser adjustment device connected to this automatic adjustment device again. do.
- the automatic adjustment device can be a computer system that can be combined with the adjustable elements of the embodiments of the present invention to control these elements programmatically or manually.
- the camera image may be processed by an image processing program to obtain a result, and the necessary elements may be moved automatically or by a predetermined program according to the result.
- the illumination illumination 155 that illuminates the substrate from the back side of the substrate, and the slit illumination 157, which is configured to illuminate a slit or a mask through which laser light passes, are further installed as necessary. Become and can be used.
- the laser supply unit 110 includes a plurality of laser lights 111 and 113 and a beam splitter 115 for guiding these laser lights to a common optical path and a common optical axis. It may be made by further comprising a).
- the laser supply unit 110 may have a plurality of laser light sources here, but may use a single laser light source to change the output or irradiation method to remove LCVD and partially remove the thickness of the glass substrate.
- the selection of a specific laser light source in the laser supply unit may be made by a method of operating one laser light source and stopping the operation of another laser light source, but a method of shielding a laser light source that is not required while operating all of the plurality of laser light sources may be used.
- shutters (not shown) may be installed.
- a source gas of a material forming a wiring pattern to be formed on the substrate it is necessary to supply a source gas of a material forming a wiring pattern to be formed on the substrate to a processing region where laser light hits the substrate. It is also conceivable to supply a powder of a material other than a source gas to the processing region and perform laser sintering by irradiating laser light, but in this embodiment, a metal precursor pattern in an alloy form is formed by supplying a precursor material in a gas state.
- a source gas having a tungsten element hexacarbonyl tungsten represented by W (CO) 6 may be used.
- a laser light source used to irradiate laser light to prevent thermal conduction and ambient deterioration to the surroundings, pulsed laser light that lasts for a short period of time with a high output is repeatedly irradiated at relatively long periods, and the thermal effect is only applied to the focus area in a short time. It is preferable to use a laser light source that is limited and intensively heated and vaporized. As such a laser light source, for example, it can be considered to have a femtosecond or nanosecond pulse width and a very small frequency of about 1 Hz.
- the laser light used to partially remove the glass substrate can continuously irradiate the substrate with a fine dot or irradiate the substrate in a block form of a certain area, but in the case of a block type, if the block area is large, the energy is too much to vaporize Heat may be transferred to the surrounding elements and breakage deterioration may occur. Therefore, it is possible to perform a point irradiation, but the glass substrate removal process may be performed until the required thickness of the glass substrate is removed from the region between them while moving a certain region such as a pixel region in a vibration form.
- the configuration of the optical system on the laser light path so that the laser light energy can be concentrated on the outer surface of the glass substrate For example, you can adjust the focal length setting of the objective lens system or the focus lens of the scanner.
- the laser light 117 is focused on the outer surface of the glass substrate 211 to be removed through the objective lens system 160, and when the focal position passes, the light diffuses and heats at a wide angle. And it is possible to configure the optical system so that the effect of volatilization can hardly be achieved.
- the above-described laser, optical system, and camera may be included in the light leakage defect repair apparatus according to the present embodiment, and may be controlled by a control unit of the light leakage defect repair apparatus.
- the control unit is connected to the actuator of the imaging device 193, the laser light generator of the laser supply unit 110 (see 111 of FIG. 2), and the objective lens system 160 to transmit and receive signals (S1, S2, etc.) or data. have.
- Such a control unit may be implemented by at least one selected from a logic circuit, a microcomputer, a program logic controller, a computing device, and the like, and in the case of a computing device, a memory for storing a software module or program for implementing a light leakage defect repair method And a processor connected to the memory to execute a program or a software module.
- the light leakage defect repair apparatus may comprise a control unit for controlling the laser energy transmitted to the glass substrate and the processing depth of the glass substrate in the processing region on the basis of the image of the camera, and the camera to monitor the illumination, focusing.
- a control unit for controlling the laser energy transmitted to the glass substrate and the processing depth of the glass substrate in the processing region on the basis of the image of the camera, and the camera to monitor the illumination, focusing.
- the material of the glass substrate processed to remove some thickness by laser covers the light leakage defect region in the processing region.
- the beam focus of the laser may be set to have a large diffusion angle relative to the size of a defect area, that is, a light leakage defect area, by configuring an optical system with a numerical aperture (NA) corresponding to a predetermined depth.
- NA numerical aperture
- the optical system is preferably a DUV objective lens.
- the light leakage defect repair apparatus further includes a cover film forming unit for forming a cover film made of an impermeable ink or a metal film on the material of the glass substrate covering the light leakage defect area. You can.
- the laser light for removing a portion of the thickness of the glass substrate irradiated on the substrate has a wavelength of 300 nm or less, such as a region having low light transmittance and high absorption for a conventional glass substrate such as soda lime glass substrate, for example DUV. It can be a laser light in the area.
- the high absorption means that the laser light is converted from glass to thermal energy, so that heating and vaporization can be actively performed, and the transmittance of each glass substrate thickness by wavelength of the laser light is well illustrated in FIG. 4. According to FIG. 4, it can be seen that the light transmittance of the glass is very low in a deep ultra violet region having a wavelength of 300 nm to 200 nm.
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Description
Claims (9)
- 디스플레이 패널의 불량 화소가 위치한 유리기판의 일정 깊이를 레이저로 가공하는 단계; 및상기 가공하는 단계에서 생성되는 상기 유리기판의 재료로 상기 불량 화소의 결함 영역에 불투과막을 형성하는 단계;를 포함하는 빛샘 결함 수리 방법.
- 제 1 항에 있어서,상기 불투과막의 크기는 상기 결함 영역의 크기 이상인 빛샘 결함 수리 방법.
- 제 1 항에 있어서,상기 레이저는 1㎐ 이상의 주파수를 갖는 10fs 내지 100㎱ 펄스 레이저이고, 상기 레이저에 의한 상기 유리기판의 가공은 가공 깊이의 제어를 위해 상기 레이저의 에너지 출력, 주파수 및 가공 시간과 속도의 제어를 포함한 블록, 스캔 또는 패턴 가공 방식으로 이루어지는 빛샘 결함 수리 방법.
- 제 3 항에 있어서,상기 레이저의 파장은 300㎚ 이하에서 선택되고,상기 레이저의 빔 초점은 상기 일정 깊이에 대응하는 개수수치(numerical aperture, NA)로 광학계를 구성하여 상기 결함 영역의 크기에 비해 상대적으로 확산각이 크도록 설정되는 빛샘 결함 수리 방법.
- 제 4 항에 있어서,상기 빔 초점은 대물렌즈 또는 스캐너의 초점 렌즈에 의해 결정되는 빛샘 결함 수리 방법.
- 제 1 항에 있어서,상기 불투과막을 형성하는 단계는 상기 결함 영역을 덮는 상기 유리기판의 재료 상에 금속이나 불투과성 잉크로 이루어진 커버막을 형성하는 것을 포함하며,상기 커버막은 화학기상증착(LCVD), 잉크 도포, 혹은 전기수력학 제트(EHD jet)에 의한 프린팅 기법을 통해 형성되는 빛샘 결함 수리 방법.
- 300㎚ 이하의 DUV(deep ultraviolet) 파장의 레이저;상기 레이저의 초점을 조절하는 광학계;상기 초점이 형성되는 가공 영역에 빛을 비추는 낙사조명; 및상기 초점을 감시하는 카메라; 및상기 카메라의 영상에 기초하여 상기 가공 영역 내 유리기판의 가공 깊이와 상기 유리기판에 전달되는 레이저 에너지를 제어하는 제어유닛;을 포함하며,상기 레이저에 의해 일부 두께가 제거되도록 가공되는 유리기판의 재료는 상기 가공 영역 내 빛샘 결함 영역을 덮게 되는 빛샘 결함 수리 장치.
- 제 7 항에 있어서,상기 레이저의 빔 초점은 상기 일정 깊이에 대응하는 개수수치(numerical aperture, NA)로 광학계를 구성하여 상기 빛샘 결함 영역의 크기에 비해 상대적으로 확산각이 크도록 설정되며, 상기 광학계는 DUV 대물렌즈를 포함하는 빛샘 결함 수리 장치.
- 제 7 항 또는 제 8 항에 있어서,상기 빛샘 결함 영역을 덮는 상기 유리기판의 재료 상에 불투과성 잉크나 금속막으로 이루어진 커버막을 형성하는 커버막 형성유닛을 더 포함하는 빛샘 결함 수리 장치.
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KR10-2018-0107948 | 2018-09-10 | ||
KR1020180107948A KR102173976B1 (ko) | 2018-09-10 | 2018-09-10 | 빛샘 결함 수리 방법 및 장치 |
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JP2010115670A (ja) * | 2008-11-11 | 2010-05-27 | Olympus Corp | レーザリペア装置 |
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- 2018-09-10 KR KR1020180107948A patent/KR102173976B1/ko active IP Right Grant
- 2018-09-19 WO PCT/KR2018/011052 patent/WO2020054897A1/ko active Application Filing
- 2018-10-26 TW TW107138026A patent/TWI689766B/zh active
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KR100876502B1 (ko) * | 2007-09-21 | 2008-12-31 | 한국정보통신대학교 산학협력단 | 초단파 레이저 빔을 이용한 기판 절단장치 및 그 절단방법 |
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KR20100069787A (ko) * | 2008-12-17 | 2010-06-25 | 주식회사 코윈디에스티 | 하프톤 마스크의 리페어 방법 및 리페어 시스템 |
KR20180078680A (ko) * | 2016-12-30 | 2018-07-10 | 참엔지니어링(주) | 레이저 처리 장치 및 방법 |
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KR102173976B1 (ko) | 2020-11-04 |
KR20200029288A (ko) | 2020-03-18 |
TWI689766B (zh) | 2020-04-01 |
TW202011089A (zh) | 2020-03-16 |
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