WO2020029612A1 - 显示面板、显示屏及显示终端 - Google Patents

显示面板、显示屏及显示终端 Download PDF

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Publication number
WO2020029612A1
WO2020029612A1 PCT/CN2019/084862 CN2019084862W WO2020029612A1 WO 2020029612 A1 WO2020029612 A1 WO 2020029612A1 CN 2019084862 W CN2019084862 W CN 2019084862W WO 2020029612 A1 WO2020029612 A1 WO 2020029612A1
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WO
WIPO (PCT)
Prior art keywords
display panel
display
layer
isolation
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2019/084862
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English (en)
French (fr)
Inventor
安乐平
楼均辉
李高敏
宋艳芹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kunshan Visionox Technology Co Ltd
Kunshan Govisionox Optoelectronics Co Ltd
Yungu Guan Technology Co Ltd
Original Assignee
Kunshan Visionox Technology Co Ltd
Kunshan Govisionox Optoelectronics Co Ltd
Yungu Guan Technology Co Ltd
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Filing date
Publication date
Application filed by Kunshan Visionox Technology Co Ltd, Kunshan Govisionox Optoelectronics Co Ltd, Yungu Guan Technology Co Ltd filed Critical Kunshan Visionox Technology Co Ltd
Publication of WO2020029612A1 publication Critical patent/WO2020029612A1/zh
Priority to US16/923,089 priority Critical patent/US11296184B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/17—Passive-matrix OLED displays
    • H10K59/173—Passive-matrix OLED displays comprising banks or shadow masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/875—Arrangements for extracting light from the devices
    • H10K59/879—Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/128—Active-matrix OLED [AMOLED] displays comprising two independent displays, e.g. for emitting information from two major sides of the display
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/17—Passive-matrix OLED displays
    • H10K59/176—Passive-matrix OLED displays comprising two independent displays, e.g. for emitting information from two major sides of the display

Definitions

  • the present application relates to the field of display technology, and particularly to a display panel, a display screen, and a display terminal.
  • Display terminals such as mobile phones and tablets, need to be integrated with front-facing cameras, earpieces, and infrared sensing elements, so they can be achieved by notching on the display and setting a transparent display in the slotted area.
  • Full screen display of the display terminal when a light sensing element such as a camera is disposed below the display panel, the image obtained by taking a picture often has a problem of being largely blurred.
  • Various embodiments disclosed in the present application provide a display panel, a display screen, and a display terminal.
  • An aspect of the present application provides a display panel, including:
  • An isolation structure is formed on the pixel definition layer, wherein the isolation structure includes a layered structure of at least two layers sequentially stacked in a direction perpendicular to the surface of the substrate; in an extending direction of the isolation structure, The width of at least one of the at least one layer structure of the at least two layers of the layer structure continuously changes or changes at intervals; the extending direction of the isolation structure is parallel to the surface of the substrate; the width is the width of the isolation structure at A dimension of a projection on a plane on which the surface of the substrate is perpendicular to the extension direction.
  • an isolation structure is formed in a pixel definition layer.
  • the isolation structure includes a layered structure of at least two layers sequentially stacked in a direction perpendicular to the substrate surface.
  • the isolation structure In the extending direction of the isolation structure, at least one of the at least two layers of the layered structure has a width that varies continuously or at intervals, thereby changing the uniformity distribution of the width of the isolation structure in the extending direction. Therefore, when external light passes through the isolation structure, the positions of the diffraction fringes generated at different maximum width positions are different, and the diffraction fringes of different values cancel each other out, so that the diffraction effect can be effectively weakened, the effect of improving diffraction can be achieved, and the camera setting can be ensured.
  • the graphics obtained by taking pictures have a higher definition.
  • the width of each layer structure continuously changes or changes at intervals.
  • the projection of the layer structure on the substrate is wavy.
  • the layer structure is an axisymmetric structure along the extension direction.
  • a pixel opening is formed on the pixel definition layer.
  • the pixel opening is used to define a shape of a sub-pixel.
  • the shape of the sub-pixel is a circle, an oval, or a dumbbell.
  • the projected sides of the isolation structure on the plane on which the substrate surface is located and the projected sides of the pixel openings on the plane on which the substrate surface are located are not parallel to each other.
  • the peaks of the projections of different layer structures on the plane where the substrate surface is located are staggered.
  • the troughs of the projections of different layer structures on the plane where the substrate surface is located are staggered.
  • the display panel is a PMOLED display panel.
  • the isolation structure includes a first isolation layer and a second isolation layer; a bottom surface of the first isolation layer is in contact with the pixel definition layer; and a top surface of the first isolation layer is in contact with the pixel definition layer.
  • the bottom surface of the second isolation layer is in contact; the top surface of the second isolation layer is opposite to its bottom surface; the bottom surface width of the second isolation layer is greater than the top surface width of the first isolation layer.
  • a longitudinal section of the first isolation layer is trapezoidal; a longitudinal section of the second isolation layer is rectangular; a bottom surface and a top surface of the second isolation layer have the same shape; and the first A longitudinal section of an isolation layer and a longitudinal section of the second isolation layer are both perpendicular to the surface of the substrate.
  • the projection of the top surface of the second isolation layer on the plane on which the substrate surface is located and the projection of the bottom surface of the first isolation layer on the plane on which the substrate surface is located are offset from each other.
  • the ratio of the height of the first isolation layer to the height of the second isolation layer is 4: 1.
  • the maximum width of the bottom surface of the first isolation layer or the maximum width of the second isolation layer is 10 micrometers.
  • the minimum distance between two adjacent isolation structures is greater than or equal to 90 microns.
  • a display screen having at least one or more display areas.
  • the at least one or more display areas include a first display area, and a photosensitive device may be disposed below the first display area.
  • the display panel according to any one of the preceding embodiments is provided in the first display area, and each of the at least one or more display areas is used to display a dynamic or static picture.
  • the at least one or more display areas further include a second display area.
  • the display panel provided in the first display area is a PMOLED display panel or an AMOLED display panel
  • the display panel provided in the second display area is an AMOLED display panel.
  • the light transmittance of the first display area is greater than the light transmittance of the second display area.
  • a display terminal including:
  • the display screen according to any one of the preceding embodiments is covered on the device body;
  • the device region is located below the first display region, and a photosensitive device for light collection through the first display region is disposed in the device region.
  • 1 is a sectional view of a display panel
  • FIG. 2 is a top view of the isolation post in FIG. 1;
  • FIG. 3 is a cross-sectional view of a display panel in an embodiment of the present application.
  • FIG. 4 is a schematic diagram of a projection of an isolation structure on a substrate in an embodiment of the present application.
  • FIG. 5 is a schematic diagram of a projection of an isolation structure on a substrate in another embodiment of the present application.
  • FIG. 6 is a schematic diagram of a projection of an isolation structure on a substrate in another embodiment of the present application.
  • FIG. 7 is a schematic diagram of a shape of a sub-pixel in an embodiment of the present application.
  • FIG. 8 is a schematic diagram of a shape of a sub-pixel in another embodiment of the present application.
  • FIG. 9 is a schematic diagram of a shape of a sub-pixel in another embodiment of the present application.
  • FIG. 10 is a schematic structural diagram of a display screen according to an embodiment of the present application.
  • FIG. 11 is a schematic structural diagram of a display terminal according to an embodiment of the present application.
  • FIG. 12 is a schematic structural diagram of a device body according to an embodiment of the present application.
  • an embodiment of the present application provides a display panel including a substrate, a pixel definition layer formed on the substrate, and an isolation structure formed on the pixel definition layer.
  • a pixel opening is formed on the pixel definition layer. The pixel opening is used to define the shape of the sub-pixel.
  • the isolation structure is used to isolate the cathodes of two adjacent rows or columns of sub-pixels and to limit the shape of the cathodes of two adjacent rows or columns of sub-pixels.
  • the isolation structure includes a layered structure of at least two layers sequentially stacked in a direction perpendicular to the substrate surface.
  • the isolation structure may include a first isolation layer and a second isolation layer that are sequentially stacked in a direction perpendicular to the substrate surface.
  • the isolation structure may further include a layered structure with more than three layers.
  • the width of the layer structure of at least one of the at least two layers of the layer structure continuously changes or the interval changes.
  • the extension direction of the isolation structure (that is, the length direction of the isolation structure) is parallel to the substrate surface, and the width direction thereof is perpendicular to the length direction.
  • the aforementioned width is the dimension of the projection of the isolation structure on the plane where the substrate surface is located perpendicular to the extension direction. Because the isolation structure is a three-dimensional structure, it may have different widths at different height positions on its cross-section (ie, vertical cross-section) perpendicular to the substrate. Therefore, the width of the isolation structure referred to in this embodiment corresponds to the maximum width in the longitudinal section.
  • the layer structure of each layer is also a three-dimensional structure. Therefore, in the longitudinal section of the isolation structure (that is, the section perpendicular to the substrate), different widths may be provided at different height positions. Diffraction occurs when external light passes through the layered structure of each layer. Diffraction is a physical phenomenon in which light travels out of a straight line when it encounters an obstacle. Specifically, after passing through an obstacle such as a slit, a small hole, or a disc, the light wave undergoes various degrees of divergent propagation.
  • the isolation structure when external light passes through the isolation structure, diffraction fringes similar to slit diffraction are generated, and the position of the diffraction fringes is determined by the maximum width of each place. Therefore, controlling the continuous or intermittent change in the width of the layer structure in the extension direction of at least one layer of the isolation structure can make the light pass through the isolation structure to generate diffraction fringes with different positions at different width positions, thereby weakening. Diffraction effect, to achieve the effect of improving diffraction.
  • the isolation column is usually a strip. Its top view is shown in FIG. 2, and its sectional view can be seen in FIG. 1.
  • the vertical cross section of the isolation column (that is, the cross section perpendicular to the substrate surface) has an inverted trapezoidal structure.
  • the isolation pillar has a bottom surface in contact with the substrate and a top surface opposite to the bottom surface.
  • the isolation column is tapered from the top surface to the bottom surface, so that the maximum width of the isolation column appears on the top surface.
  • the top surface is rectangular, and the isolation column has a fixed width along the length extension direction (that is, the width is the same everywhere in the length extension direction, and the extension directions are parallel to the substrate).
  • the positions of the diffraction fringes at the positions having the same width on the isolation pillars are the same, so that the diffraction effect is more obvious, and the normal operation of the photosensitive element located under the display panel is eventually affected, for example, the picture taken by the camera is distorted.
  • the positions of the diffraction fringes generated at different maximum width positions are different, so that By changing the complicated diffraction intensity distribution brought by the isolation column, the diffraction is relatively insignificant, and the effect of improving diffraction is achieved.
  • the width of each layer structure continuously changes or the interval changes, so as to ensure that the display panel has a better diffraction improvement effect on a horizontal plane parallel to the substrate, so that The entire display panel has a better diffraction improvement effect.
  • each layer structure in the extending direction of the isolation structure, is wavy, that is, its width in the extending direction continuously changes, so that the width of the isolating structure in the extending direction can be changed. Uniform distribution to reduce diffraction effects.
  • each layer structure has an axisymmetric structure along the extending direction, so that the manufacturing process can be simplified.
  • the projection peaks of different layer structures on the substrate are staggered or the wave troughs of different layer structures on the substrate are staggered from each other, thereby further changing the maximum of the isolation structure in the extending direction.
  • the uniformity of the width distribution Therefore, when external light passes through the isolation structure, the positions of the diffraction fringes generated at different positions are different, so that the diffraction effect can be effectively weakened and the effect of improving diffraction can be achieved.
  • the display panel is a PMOELD display panel.
  • the display panel includes a substrate 110, a pixel definition layer 120 formed on the substrate 110, and an isolation structure 130 formed on the pixel definition layer 120.
  • the isolation structure 130 includes a first isolation layer 132 and a second isolation layer 134 that are sequentially stacked.
  • the bottom surface 132 a of the first isolation layer 132 is connected to the pixel definition layer 120.
  • the top surface 132b of the first isolation layer 132 is connected to the bottom surface 134a of the second isolation layer 134.
  • a width of a top surface 132b of the first isolation layer 132 is smaller than a width of a bottom surface 134a of the second isolation layer 134. Therefore, in the direction perpendicular to the surface of the substrate 110, the positions of the diffraction fringes at different heights are different, and the diffraction fringes at different positions cancel each other, thereby reducing the diffraction effect.
  • a cross section of the first isolation layer 132 is trapezoidal, and a cross section of the second isolation layer 134 is rectangular.
  • the width of the top surface 132b of the first isolation layer 132 is smaller than the width of the bottom surface 132a, thereby forming a trapezoidal structure placed in a forward direction.
  • the second isolation layer 134 is rectangular, that is, the top surface 134b and the bottom surface 134a have the same width.
  • the top surface 134b and the bottom surface 134a of the second isolation layer 134 have the same shape.
  • the top surface 134 b of the second isolation layer 134 has a different shape from the bottom surface 132 a of the first isolation layer 132.
  • the projections of the first isolation layer 132 and the second isolation layer 134 on the substrate in the isolation structure 130 are both wavy, as shown in FIG. 4.
  • the filled area has a shape in which the second isolation layer 134 is projected on the substrate 110.
  • the projection peak T1 of the first isolation layer 132 on the substrate 110 and the projection peak T2 of the second isolation layer 134 on the substrate 110 are staggered, and the projection valley B1 of the first isolation layer 132 on the substrate 110 is staggered. It is staggered from the valley B2 of the projection of the second isolation layer 134 on the substrate 110, thereby further changing the uniformity of the width distribution of the isolation structure 130 in the extending direction, thereby reducing the diffraction effect.
  • the sum of the heights of the first isolation layer 132 and the second isolation layer 134 is equal to the height of the single-layer isolation structure.
  • the ratio of the height H11 of the first isolation layer 132 to the height H22 of the second isolation layer 134 can be controlled to be 4: 1.
  • the height H11 of the first isolation layer 132 and the height H22 of the second isolation layer 134 are not particularly limited, as long as the process preparation capability is satisfied.
  • the maximum width W22 of the isolation structure 130 that is, the maximum width of the bottom surface of the first isolation layer 132 or the maximum width of the second isolation layer 134 is usually about 10 microns.
  • the minimum distance W11 between two adjacent isolation structures 130 is generally defined according to the sub-pixel size. For example, it can be set to be greater than or equal to 90 microns.
  • the projections of the first isolation layer 132 and the second isolation layer 134 on the substrate 110 are wavy. In other embodiments, the first isolation layer 132 and the second isolation layer 134 are on the substrate. The projections on 110 may all be jagged, as shown in FIG. 5. Similarly, the filled area is a projection of the second isolation layer 134 on the substrate 110. In yet another embodiment, the projection of one of the isolation layers may be wavy, and the projection of the other isolation layer may be jagged, as long as the peaks or valleys of the two projections are staggered, As shown in Figure 6.
  • a pixel opening is formed on the pixel definition layer 120.
  • the pixel opening is used to define the shape of the sub-pixel.
  • the sides of the projection shape of the pixel opening on the substrate 110 are all curves, and the sides are not parallel to each other, that is, the sides of the sub-pixel are curved shapes that are not parallel to each other.
  • the shape of the sub-pixel is circular.
  • the shape of the sub-pixel may be oval.
  • the shape of the sub-pixel may also be dumbbell-shaped, as shown in FIG. 9.
  • the shape of the sub-pixels By setting the shape of the sub-pixels to be circular, oval, or dumbbell-shaped, that is, the organic light-emitting layer 150 located in the pixel opening is circular, oval, or dumbbell-shaped, so that when light passes through the organic light-emitting layer 150, Diffraction fringes of different positions and divergence directions are generated at positions of different widths, thereby reducing diffraction effects.
  • the projection of the isolation structure 130 on the substrate 110 and the projection edge of the pixel opening (ie, the organic light emitting layer 150) on the substrate 110 are not parallel to each other, so that the edge distance between the two is not fixed and unique. It is ensured that diffraction fringes at different positions are generated at different pitch positions, and finally the diffraction effect is reduced.
  • the display panel when the display panel is a PMOLED display panel, the display panel further includes an anode layer 140 formed on the substrate 110 and a cathode layer 160 formed on the organic light emitting layer 150.
  • An organic light emitting layer 150 is formed over the anode layer 140, as shown in FIG.
  • the anode layer 140 and the cathode layer 160 may be made of a transparent conductive metal oxide.
  • the anode layer 140 and the cathode layer 160 may be made of ITO (indium tin oxide) or indium zinc oxide (IZO).
  • the anode layer 140 and the cathode layer 160 may also use aluminum-doped zinc oxide, silver-doped ITO, or silver-doped Made of IZO and other materials.
  • each layered structure of the isolation structure 130 has a periodic width change in the extending direction.
  • each sub-pixel may correspond to a side of the same layer structure.
  • the width change may also be an irregular change, which has a better diffraction improvement effect at this time.
  • the display panel may be a transparent or transflective display panel.
  • the transparent characteristics of the display panel can be achieved by using a material with a good light transmittance. For example, except for the light blocking layer, a material having a light transmittance greater than 90% is used, so that the light transmittance of the entire display panel can be more than 70%. Further, each transparent functional layer uses a material having a light transmittance greater than 95%, which further increases the light transmittance of the display panel, and even makes the light transmittance of the entire display panel above 80%.
  • materials for conductive traces such as cathodes and anodes can be selected from ITO, IZO, Ag + ITO, or Ag + IZO, etc.
  • the material of the insulating layer is selected from SiO2, SiNx, and Al2O3, and the pixel definition layer is adopted. Highly transparent material.
  • the substrate 110 may be a rigid substrate or a flexible substrate.
  • a rigid substrate for example, a transparent substrate such as a glass substrate, a quartz substrate, or a plastic substrate can be selected, and for a flexible substrate, a flexible PI substrate can be selected.
  • the transparent characteristics of the display panel can also be achieved by other technical means, and the structures of the above display panels can be applied.
  • the transparent or transflective display panel can display the picture normally when it is in the working state, and when the display panel is in other functional requirements, external light can pass through the display panel to the photosensitive device placed under the display panel Wait.
  • FIG. 10 is a schematic structural diagram of a display screen according to an embodiment.
  • the display screen includes a first display area 910 and a second display area 920. It can be understood that the first display area 910 and the second display area 920 are not only one display area, but only a distinction between two types of display areas.
  • the light transmittance of the first display area 910 is greater than the light transmittance of the second display area 920.
  • a photosensitive device 930 may be disposed below the first display area 910.
  • the first display area 910 is provided with a display panel as mentioned in any of the foregoing embodiments. Both the first display area 910 and the second display area 920 are used to display a static or dynamic picture.
  • the first display area 910 uses the display panel in the foregoing embodiment, when the light passes through the display area, no obvious diffraction effect is generated, so that the photosensitive device 930 located below the first display area 910 can ensure that normal work. It can be understood that the first display area 910 can normally display dynamic or static images when the photosensitive device 930 is not operating, and can be in a non-display state when the photosensitive device 930 is operating, thereby ensuring that the photosensitive device 930 can pass through the display panel Light collection is performed normally. In other embodiments, the light transmittances of the first display area 910 and the second display area 920 may also be the same, so that the entire display panel has better light transmission uniformity, which ensures that the display panel has a better display effect.
  • the display panel provided in the first display area 910 is a PMOLED display panel or an AMOLED display panel
  • the display panel provided in the second display area 920 is an AMOLED display panel, thereby forming a PMOLED display panel and an AMOLED display panel. Full screen.
  • FIG. 11 is a schematic structural diagram of a display terminal according to an embodiment.
  • the display terminal includes a device body 810 and a display screen 820.
  • the display screen 820 is disposed on the device body 810 and is connected to the device body 810.
  • the display screen 820 may use the display screen in any of the foregoing embodiments to display a static or dynamic picture.
  • FIG. 12 is a schematic structural diagram of a device body 810 in an embodiment.
  • the device body 810 may be provided with a slotted area 812 and a non-slotted area 814.
  • Photosensitive devices such as a camera 930 and a light sensor may be disposed in the slotted area 812.
  • the display panel of the first display area of the display screen 820 is bonded to the slotted area 812 so that the above-mentioned photosensitive devices such as the camera 930 and the light sensor can pass external light through the first display area. Acquisition and other operations.
  • the display panel in the first display area can effectively improve the diffraction phenomenon caused by external light transmitted through the first display area, the quality of the image captured by the camera 930 on the display device can be effectively improved, and the image captured by the diffraction can be avoided. Distortion can also improve the accuracy and sensitivity of the light sensor to sense external light.
  • the electronic device may be a digital device such as a mobile phone, a tablet, a palmtop computer, or an iPod.

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Abstract

本申请涉及显示面板、显示屏及显示终端。显示面板包括基板、形成于所述基板上的像素定义层以及形成于所述像素定义层上的隔离结构。所述隔离结构包括沿垂直于所述基板表面的方向上依次层叠的至少两层的层体结构。在所述隔离结构的延伸方向上，所述至少两层的层体结构中至少有一层层体结构的宽度持续变化或间隔性变化。所述隔离结构的延伸方向平行于所述基板表面。所述宽度为所述隔离结构在所述基板表面所在平面上的投影在垂直于所述延伸方向上的尺寸。上述显示面板可以有效减弱衍射效应，达到改善衍射的效果。

Description

显示面板、显示屏及显示终端
援引加入
本申请要求于2018年08月06日提交中国专利局、申请号为201810887040.0、发明名称为“显示面板、显示屏及显示终端”的中国专利申请的优先权，其全部内容通过引用并入在本申请中。
技术领域
本申请涉及显示技术领域，特别是涉及显示面板、显示屏及显示终端。
背景技术
随着显示终端的快速发展，用户对屏占比的要求越来越高，使得显示终端的全面屏显示受到业界越来越多的关注。显示终端如手机、平板电脑等，由于需要集成诸如前置摄像头、听筒以及红外感应元件等，故而可通过在显示屏上开槽(Notch)，并在开槽区域设置透明显示屏的方式来实现显示终端的全面屏显示。但是，将摄像头等感光元件设置在显示面板下方时，拍照得到的图像经常出现很大程度的模糊的问题。
发明内容
本申请公开的各种实施例提供显示面板、显示屏以及显示终端。
本申请的一方面提供一种显示面板，包括：
基板；
像素定义层，形成于所述基板上；以及
隔离结构，形成于所述像素定义层上，其中，所述隔离结构包括沿垂直于所述基板表面的方向上依次层叠的至少两层的层体结构；在所述隔离结构的延伸方向上，所述至少两层的层体结构中至少有一层层体结构的宽度持续变化或间隔性变化；所述隔离结构的所述延伸方向平行于所述基板表面；所述宽度为 所述隔离结构在所述基板表面所在平面上的投影在垂直于所述延伸方向上的尺寸。
上述显示面板在像素定义层形成有隔离结构。该隔离结构包括沿垂直于基板表面的方向上依次层叠的至少两层的层体结构。在隔离结构的延伸方向上，至少两层的层体结构中至少有一层层体结构的宽度连续变化或者间隔性变化，从而可以改变隔离结构在延伸方向上的宽度的均匀性分布。因此，当外部光线经过该隔离结构时，在不同最大宽度位置处产生的衍射条纹的位置不同，不同值的衍射条纹相互抵消，从而可以有效减弱衍射效应，达到改善衍射的效果，进而确保摄像头设置在该显示面板下方时，拍照得到的图形具有较高的清晰度。
在其中一个实施例中，在所述隔离结构的所述延伸方向上，各所述层体结构的宽度均持续变化或者间隔性变化。
在其中一个实施例中，在所述隔离结构的所述延伸方向上，所述层体结构在所述基板上的投影为波浪形。
在其中一个实施例中，所述层体结构沿所述延伸方向为轴对称结构。
在其中一个实施例中，所述像素定义层上形成有像素开口。所述像素开口用于定义子像素的形状。
在其中一个实施例中，所述子像素的形状为圆形、椭圆形或者哑铃形。
在其中一个实施例中，所述隔离结构在所述基板表面所在平面上的投影的边与所述像素开口在所述基板表面所在平面上的投影的边互不平行。
在其中一个实施例中，不同层体结构在所述基板表面所在平面上的投影的波峰错开。
在其中一个实施例中，不同层体结构在所述基板表面所在平面上的投影的波谷错开。
在其中一个实施例中，所述显示面板为PMOLED显示面板。
在其中一个实施例中，所述隔离结构包括第一隔离层和第二隔离层；所述第一隔离层的底面与所述像素定义层接触；所述第一隔离层的顶面与所述第二隔离层的底面接触；所述第二隔离层的顶面与其底面相对设置；所述第二隔离层的底面宽度大于所述第一隔离层的顶面宽度。
在其中一个实施例中，所述第一隔离层的纵截面为梯形；所述第二隔离层的纵截面为矩形；所述第二隔离层的底面和顶面具有相同的形状；所述第一隔离层的纵截面和所述第二隔离层的纵截面均垂直于所述基板表面。
在其中一个实施例中，所述第二隔离层的顶面在所述基板表面所在平面上的投影与所述第一隔离层的底面在所述基板表面所在平面上的投影相互错开。
在其中一个实施例中，所述第一隔离层的高度与所述第二隔离层的高度之比为4：1。
在其中一个实施例中，所述第一隔离层的底面的最大宽度或第二隔离层的最大宽度为10微米。
在其中一个实施例中，相邻两个隔离结构的最小间距大于或等于90微米。
本申请的另一方面提供一种显示屏，具有至少一个或多个显示区。所述至少一个或多个显示区包括第一显示区，所述第一显示区下方可设置感光器件。其中，在所述第一显示区设置有前述任一实施例所述的显示面板，所述至少一个或多个显示区中各显示区均用于显示动态或静态画面。
在其中一个实施例中，所述至少一个或多个显示区还包括第二显示区。在所述第一显示区设置的显示面板为PMOLED显示面板或AMOLED显示面板，在所述第二显示区设置的显示面板为AMOLED显示面板。
在其中一个实施例中，所述第一显示区的透光率大于所述第二显示区的透光率。
本申请的又一方面提供一种显示终端，包括：
设备本体，具有器件区；
如前述任一实施例所述的显示屏，覆盖在所述设备本体上；
其中，所述器件区位于所述第一显示区下方，且所述器件区中设置有透过所述第一显示区进行光线采集的感光器件。
附图说明
图1为显示面板的剖视图；
图2为图1中的隔离柱的俯视图；
图3为本申请一实施例中的显示面板的剖视图；
图4为本申请一实施例中的隔离结构在基板上的投影的示意图；
图5为本申请另一实施例中的隔离结构在基板上的投影的示意图；
图6为本申请又一实施例中的隔离结构在基板上的投影的示意图；
图7为本申请一实施例中的子像素的形状示意图；
图8为本申请另一实施例中的子像素的形状示意图；
图9为本申请又一实施例中的子像素的形状示意图；
图10为本申请一实施例中的显示屏的结构示意图；
图11为本申请一实施例中的显示终端的结构示意图；
图12为本申请一实施例中的设备本体的结构示意图。
具体实施方式
为了使本申请的目的、技术方案及优点更加清楚明白，以下结合附图及实施例，对本申请进行进一步详细说明。应当理解，此处所描述的具体实施例仅仅用以解释本申请，并不用于限定本申请。
在本申请的描述中，需要理解的是，术语“上”、“下”、“垂直”、“水平”、“顶”、“底”、“内”以及“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。此外，需要说明的是，当元件被称为“形成在另一元件上”时，它可以直接连接到另一元件上或者可能同时存在居中元件。当一个元件被认为是“连接”另一个元件，它可以直接连接到另一元件或者同时存在居中元件。相反，当元件被称作“直接”在另一元件上时，则不存在中间元件。
将摄像头等感光器件设置在透明显示面板下方时，拍照得到的照片模糊。申请人研究发现，由于电子设备的显示屏体内存在导电走线，外部光线经过这些导电走线时会造成较为复杂的衍射强度分布，从而出现衍射条纹，进而会影响摄像头等感光器件的正常工作。例如，位于透明显示区域之下的摄像头工作时，外部光线经过显示屏内的导电走线后会发生较为明显的衍射，从而使得摄 像头拍摄到的画面出现失真的问题。
为解决上述问题，本申请一实施例提供了一种显示面板包括基板、形成于基板上的像素定义层以及形成于像素定义层上的隔离结构。其中，像素定义层上形成有像素开口。像素开口用于定义子像素的形状。隔离结构用于将相邻两行或者两列子像素的阴极进行隔离，并对相邻两行或者两列子像素的阴极形状起到限定作用。
在本实施例中，隔离结构包括沿垂直于基板表面的方向上依次层叠的至少两层的层体结构。例如，隔离结构可以包括沿垂直于基板表面的方向上依次层叠的第一隔离层和第二隔离层。在其他的实施例中，隔离结构还可以包括三层以上的层体结构。在隔离结构的延伸方向上，至少两层的层体结构中至少有一层的层体结构的宽度持续变化或者间隔性变化。隔离结构的延伸方向(即隔离结构的长度方向)平行于基板表面，其宽度方向则垂直于长度方向。前面提及的宽度为隔离结构在基板表面所在的平面上的投影在垂直于延伸方向上的尺寸。由于隔离结构为立体结构，在其垂直于基板的截面上(也即纵截面)，不同高度位置处可能具有不同的宽度。因此，本实施例中所指的隔离结构的宽度对应于在纵截面中的最大宽度。
由于隔离结构为立体结构，其各层的层体结构同样为立体结构。因此，在隔离结构的纵截面(也即垂直于基板的截面)，不同高度位置处可能具有不同的宽度。当外部光线经过各层的层体结构时，会发生衍射现象。衍射是指光遇到障碍物时偏离直线传播的物理现象。具体地，光波在经过狭缝、小孔或者圆盘之类的障碍物后发生不同程度的弯散传播。因此，当外部光线经过隔离结构时，会产生类似于狭缝衍射的衍射条纹，其衍射条纹的位置由各处的最大宽度决定。因此，控制隔离结构中至少有一层的层体结构在延伸方向上的宽度连续或者间隔性变化，则可以使得光线经过隔离结构时，能够在不同宽度位置处产生具有不同位置的衍射条纹，进而减弱衍射效应，达到改善衍射的效果。
隔离柱通常为条状，其俯视图如图2所示，其剖视图可以参见图1。隔离柱的纵截面(也即垂直于基板表面的截面)为倒梯形结构。具体地，隔离柱具有与基板相接触的底面以及与该底面相对的顶面。隔离柱从顶面至底面呈渐缩状， 从而使得隔离柱的最大宽度出现在顶面。顶面为长方形，隔离柱沿长度延伸方向具有固定不变的宽度(也即在长度延伸方向上各处的宽度相同，延伸方向均为平行于基板的方向)。因此，隔离柱上具有相同宽度位置处产生的衍射条纹的位置相同，从而使得衍射效果较为明显，最终影响位于显示面板下方的感光元件的正常工作，例如会使得摄像头拍摄到的画面失真。
本申请实施例中的显示面板，通过采用在延伸方向上宽度连续变化或者间断变化的、具有至少两层的层体结构的隔离结构，在不同最大宽度位置处产生的衍射条纹的位置不同，可以改变隔离柱所带来的复杂的衍射强度分布，从而使得衍射相对不明显，达到改善衍射的效果。
在一实施例中，在隔离结构的延伸方向上，各层体结构的宽度均持续变化或者间隔性变化，从而确保显示面板在平行于基板的水平面上均具有较好的衍射改善效果，进而使得整个显示面板具有较好的衍射改善效果。
在一实施例中，在隔离结构的延伸方向上，各层体结构在基板上的投影为波浪形，也即其在延伸方向上的宽度连续变化，从而能够改变隔离结构在延伸方向上的宽度分布的均匀性，以降低衍射效应。在一实施例中，各层层体结构沿延伸方向均具有轴对称结构，从而可以简化制备工艺过程。
在一实施例中，在基板表面所在的平面上，不同层体结构在基板上的投影的波峰错开或者不同层体结构在基板上的波谷相互错开，从而进一步改变隔离结构在延伸方向上的最大宽度的分布的均匀性。因此，当外部光线经过该隔离结构时，在不同位置处产生的衍射条纹的位置不同，从而可以有效减弱衍射效应，达到改善衍射的效果。
图3为一实施例中的显示面板的剖视图。该显示面板为PMOELD显示面板。该显示面板包括基板110、形成于基板110上的像素定义层120以及形成于像素定义层120上的隔离结构130。在本实施例中，隔离结构130包括依次层叠的第一隔离层132和第二隔离层134。第一隔离层132的底面132a与像素定义层120连接。第一隔离层132的顶面132b与第二隔离层134的底面134a连接。
在一实施例中，在隔离结构130的纵截面(也即垂直于基板110的方向上的截面)，第一隔离层132的顶面132b的宽度小于第二隔离层134的底面134a 的宽度，从而在垂直于基板110表面的方向上，不同高度处的衍射条纹的位置不同，不同位置的衍射条纹相互抵消，从而降低衍射效应。
在一实施例中，在隔离结构130的纵截面上，第一隔离层132的截面为梯形，第二隔离层134的截面为矩形。具体地，第一隔离层132的顶面132b的宽度小于底面132a的宽度，从而形成正向放置的梯形结构。第二隔离层134则为矩形，也即其顶面134b与底面134a具有相同的宽度。第二隔离层134的顶面134b与底面134a具有相同的形状。在本实施例中，第二隔离层134的顶面134b具有与第一隔离层132的底面132a不同的形状。具体地，隔离结构130中的第一隔离层132和第二隔离层134在基板上的投影均为波浪形，如图4所示。填充区域为第二隔离层134投影在基板110上的形状。此时，第一隔离层132在基板110上的投影的波峰T1与第二隔离层134在基板110上的投影的波峰T2错开设置，且第一隔离层132在基板110上的投影的波谷B1与第二隔离层134在基板110上的投影的波谷B2错开，从而进一步改变隔离结构130在延伸方向上的宽度的分布的均匀性，从而降低衍射效应。
参见图3，第一隔离层132和第二隔离层134的高度之和等于单层隔离结构的高度。在一实施例中，可以控制第一隔离层132的高度H11与第二隔离层134的高度H22之比为4：1。本申请的实施例对第一隔离层132的高度H11与第二隔离层134的高度H22并不作特别限定，只要满足工艺制备能力即可。在本实施例中，如图4所示，隔离结构130的最大宽度W22，也即第一隔离层132的底面的最大宽度或者第二隔离层134的最大宽度，通常为10微米左右。相邻两个隔离结构130的最小间距W11一般根据子像素大小进行定义，如可以将其设置为大于或等于90微米。
图4所示的实施例中，第一隔离层132和第二隔离层134在基板110的投影均为波浪形，在其他的实施例中，第一隔离层132和第二隔离层134在基板110上的投影可以均为锯齿状，如图5所示。同样地，填充区域为第二隔离层134在基板110上的投影。在又一实施例中，也可以为其中一个隔离层的投影为波浪形，而另外一个隔离层的投影为锯齿状，只需要二者的投影的各峰部错开或者各谷部错开即可，如图6所示。
在一实施例中，像素定义层120上形成有像素开口。像素开口用于定义子像素的形状。像素开口在基板110上的投影形状的边均为曲线，且各边互不平行，也即子像素的各边为互不平行的曲线形状。在一实施例中，如图7所示，子像素的形状为圆形。在另一实施例中，如图8所示，子像素的形状可以为椭圆形。子像素的形状还可以为哑铃形，如图9所示。通过将子像素的形状设置成圆形、椭圆形或者哑铃形，也即位于像素开口内的有机发光层150为圆形、椭圆形或者哑铃形，从而使得光线经过该有机发光层150时，在不同宽度的位置处产生不同位置和发散方向的衍射条纹，从而降低衍射效应。
在一实施例中，隔离结构130在基板110上的投影与像素开口(即有机发光层150)在基板110上的投影的边缘互不平行，从而使得二者的边缘间距并不固定唯一，进而确保在不同间距位置处产生不同位置的衍射条纹，最终降低衍射效应。
在一实施例中，上述显示面板为PMOLED显示面板时，还包括形成于基板110上的阳极层140以及形成于有机发光层150上的阴极层160。有机发光层150形成在阳极层140上方，如图1所示。在一实施例中，为了提高显示面板的透光率，阳极层140和阴极层160可以采用透明导电金属氧化物制备而成。举例来说，阳极层140和阴极层160可以采用ITO(氧化铟锡)或氧化铟锌(IZO)制成。进一步的，为了在保证高透光率的基础上，减小各导电走线的电阻，阳极层140和阴极层160还可以采用掺杂铝的氧化锌、掺杂银的ITO或者掺杂银的IZO等材料制成。
在一实施例中，隔离结构130的各层体结构在延伸方向上做周期性的宽度变化。具体地，可以每个子像素对应相同的层体结构的侧边。通过将宽度设置为周期性变化，可以确保显示面板上各处的像素发光亮度的均匀性，从而不影响显示面板的显示效果。在其他的实施例中，其宽度变化也可以为不规则变化，此时具有较好的衍射改善效果。
在一实施例中，上述显示面板可以为透明或者半透半反式的显示面板。显示面板的透明特性可以通过采用透光率较好的材料来实现。例如，除阻光层外均采用透光率大于90％的材料，从而使得整个显示面板的透光率可以在70％以 上。进一步的，各透明功能层均采用透光率大于95％的材料，进一步提高显示面板的透光率，甚至使得整个显示面板的透光率在80％以上。具体地，可以将导电走线如阴极和阳极等的材料从ITO、IZO、Ag+ITO或者Ag+IZO等中选择，绝缘层材料从SiO2，SiNx以及Al2O3等中选择，以及像素定义层则采用高透明材料。
在一实施例中，基板110可以为刚性基板或柔性基板。刚性基板例如可以选择玻璃基板、石英基板或者塑料基板等透明基板，而柔性基板可以选择柔性PI基板等。
显示面板的透明特性还可以采用其他技术手段实现，上述显示面板的结构均可以适用。透明或者半透半反式的显示面板处于工作状态时能够正常显示画面，而当显示面板处于其他功能需求状态时，外部光线可以透过该显示面板照射到置于该显示面板之下的感光器件等。
图10为一实施例中的显示屏的结构示意图，该显示屏包括第一显示区910和第二显示区920。可以理解，第一显示区910和第二显示区920并不是只有一个显示区，只是两种类型的显示区的区分。其中，第一显示区910的透光率大于第二显示区920的透光率。第一显示区910的下方可设置感光器件930。第一显示区910设置有如前述任一实施例中所提及的显示面板。第一显示区910和第二显示区920均用于显示静态或者动态画面。由于第一显示区910采用了前述实施例中的显示面板，因此当光线经过该显示区域时，不会产生较为明显的衍射效应，从而能够确保位于该第一显示区910下方的感光器件930能够正常工作。可以理解，第一显示区910在感光器件930不工作时，可以正常进行动态或者静态画面显示，而在感光器件930工作时，可以处于不显示状态，从而确保感光器件930能够透过该显示面板正常进行光线采集。在其他的实施例中，第一显示区910和第二显示区920的透光率也可以相同，从而使得整个显示面板具有较好的透光均一性，确保显示面板具有较好的显示效果。
在一实施例中，第一显示区910设置的显示面板为PMOLED显示面板或AMOLED显示面板，在第二显示区920设置的显示面板为AMOLED显示面板，从而形成由PMOLED显示面板和AMOLED显示面板构成的全面屏。
本申请另一实施例还提供一种显示终端。图11为一实施例中的显示终端的结构示意图，该显示终端包括设备本体810和显示屏820。显示屏820设置在设备本体810上，且与该设备本体810相互连接。其中，显示屏820可以采用前述任一实施例中的显示屏，用以显示静态或者动态画面。
图12为一实施例中的设备本体810的结构示意图。在本实施例中，设备本体810上可设有开槽区812和非开槽区814。在开槽区812中可设置有诸如摄像头930以及光传感器等感光器件。此时，显示屏820的第一显示区的显示面板对应于开槽区812贴合在一起，以使得上述的诸如摄像头930及光传感器等感光器件能够透过该第一显示区对外部光线进行采集等操作。由于第一显示区中的显示面板能够有效改善外部光线透射该第一显示区所产生的衍射现象，从而可有效提升显示设备上摄像头930所拍摄图像的质量，避免因衍射而导致所拍摄的图像失真，同时也能提升光传感器感测外部光线的精准度和敏感度。
上述电子设备可以为手机、平板、掌上电脑、ipod等数码设备。
以上所述实施例的各技术特征可以进行任意的组合，为使描述简洁，未对上述实施例中的各个技术特征所有可能的组合都进行描述，然而，只要这些技术特征的组合不存在矛盾，都应当认为是本说明书记载的范围。
以上所述实施例仅表达了本申请的几种实施方式，其描述较为具体和详细，但并不能因此而理解为对申请范围的限制。应当指出的是，对于本领域的普通技术人员来说，在不脱离本发明构思的前提下，还可以做出若干变形和改进，这些都属于本申请的保护范围。因此，本申请的保护范围应以所附权利要求为准。

Claims (20)

  1. 一种显示面板，包括：
    基板；
    像素定义层，形成于所述基板上；以及
    隔离结构，形成于所述像素定义层上，其中，所述隔离结构包括沿垂直于所述基板表面的方向上依次层叠的至少两层的层体结构；在所述隔离结构的延伸方向上，所述至少两层的层体结构中至少有一层层体结构的宽度持续变化或间隔性变化；所述隔离结构的所述延伸方向平行于所述基板表面；所述宽度为所述隔离结构在所述基板表面所在平面上的投影在垂直于所述延伸方向上的尺寸。
  2. 根据权利要求1所述的显示面板，其中，在所述隔离结构的所述延伸方向上，各所述层体结构的宽度均持续变化或者间隔性变化。
  3. 根据权利要求1所述的显示面板，其中，在所述隔离结构的所述延伸方向上，所述层体结构在所述基板上的投影为波浪形。
  4. 根据权利要求1所述的显示面板，其中，所述层体结构沿所述延伸方向为轴对称结构。
  5. 根据权利要求1所述的显示面板，其中，所述像素定义层上形成有像素开口；所述像素开口用于定义子像素的形状。
  6. 根据权利要求5所述的显示面板，其中，所述子像素的形状为圆形、椭圆形或者哑铃形。
  7. 根据权利要求5所述的显示面板，其中，所述隔离结构在所述基板表面所在平面上的投影的边与所述像素开口在所述基板表面所在平面上的投影的边互不平行。
  8. 根据权利要求3所述的显示面板，其中，不同层体结构在所述基板表面所在平面上的投影的波峰错开。
  9. 根据权利要求3所述的显示面板，其中，不同层体结构在所述基板表面所在平面上的投影的波谷错开。
  10. 根据权利要求1所述的显示面板，其中，所述显示面板为PMOLED显示面板。
  11. 根据权利要求10所述的显示面板，其中，所述隔离结构包括第一隔离层和第二隔离层；所述第一隔离层的底面与所述像素定义层接触；所述第一隔离层的顶面与所述第二隔离层的底面接触；所述第二隔离层的顶面与其底面相对设置；所述第二隔离层的底面宽度大于所述第一隔离层的顶面宽度。
  12. 根据权利要求11所述的显示面板，其中，所述第一隔离层的纵截面为梯形；所述第二隔离层的纵截面为矩形；所述第二隔离层的底面和顶面具有相同的形状；所述第一隔离层的纵截面和所述第二隔离层的纵截面均垂直于所述基板表面。
  13. 根据权利要求11所述的显示面板，其中，所述第二隔离层的顶面在所述基板表面所在平面上的投影与所述第一隔离层的底面在所述基板表面所在平面上的投影相互错开。
  14. 根据权利要求11所述的显示面板，其中，所述第一隔离层的高度与所述第二隔离层的高度之比为4：1。
  15. 根据权利要求11所述的显示面板，其中，所述第一隔离层的底面的最大宽度或第二隔离层的最大宽度为10微米。
  16. 根据权利要求11所述的显示面板，其中，相邻两个隔离结构的最小间距大于或等于90微米。
  17. 一种显示屏，具有至少一个或多个显示区；所述至少一个或多个显示区包括第一显示区，所述第一显示区下方可设置感光器件；
    其中，在所述第一显示区设置有如权利要求1所述的显示面板，所述至少一个或多个显示区中各显示区均用于显示动态或静态画面。
  18. 根据权利要求17所述的显示屏，其中，所述至少一个或多个显示区还包括第二显示区；在所述第一显示区设置的显示面板为PMOLED显示面板或AMOLED显示面板，在所述第二显示区设置的显示面板为AMOLED显示面板。
  19. 根据权利要求18所述的显示屏，其中，所述第一显示区的透光率大于所述第二显示区的透光率。
  20. 一种显示终端，包括：
    设备本体，具有器件区；
    如权利要求17所述的显示屏，覆盖在所述设备本体上；
    其中，所述器件区位于所述第一显示区下方，且所述器件区中设置有透过所述第一显示区进行光线采集的感光器件。
PCT/CN2019/084862 2018-08-06 2019-04-28 显示面板、显示屏及显示终端 Ceased WO2020029612A1 (zh)

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