WO2019192529A1 - 显示基板及其制备方法、显示装置 - Google Patents
显示基板及其制备方法、显示装置 Download PDFInfo
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- WO2019192529A1 WO2019192529A1 PCT/CN2019/081300 CN2019081300W WO2019192529A1 WO 2019192529 A1 WO2019192529 A1 WO 2019192529A1 CN 2019081300 W CN2019081300 W CN 2019081300W WO 2019192529 A1 WO2019192529 A1 WO 2019192529A1
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- 239000000758 substrate Substances 0.000 title claims abstract description 131
- 238000004519 manufacturing process Methods 0.000 title description 4
- 239000010410 layer Substances 0.000 claims description 164
- 229920002120 photoresistant polymer Polymers 0.000 claims description 46
- 238000000034 method Methods 0.000 claims description 24
- 239000012044 organic layer Substances 0.000 claims description 16
- 238000007641 inkjet printing Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
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- 230000003247 decreasing effect Effects 0.000 claims description 2
- 239000003960 organic solvent Substances 0.000 description 34
- 238000001035 drying Methods 0.000 description 9
- 238000001704 evaporation Methods 0.000 description 7
- 230000008020 evaporation Effects 0.000 description 7
- 238000007639 printing Methods 0.000 description 7
- 239000002904 solvent Substances 0.000 description 5
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- 229910001300 Mazak (alloy) Inorganic materials 0.000 description 1
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- 230000009286 beneficial effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
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- 238000005516 engineering process Methods 0.000 description 1
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- 239000003292 glue Substances 0.000 description 1
- 230000005525 hole transport Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/88—Dummy elements, i.e. elements having non-functional features
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
- H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/1201—Manufacture or treatment
Definitions
- the present disclosure relates to the field of display technologies, and in particular, to a display substrate, a method for fabricating the same, and a display device.
- the OLED device includes an anode, at least one organic layer, a cathode, and the like.
- the at least one organic layer may be one or more layers of the light-emitting layer, the hole transport layer, the electron transport layer, the hole injection layer, and the electron injection layer.
- a display substrate in a first aspect, includes: a display area and a non-display area, the non-display area includes a dummy pixel area located around the display area; the display substrate further includes: a substrate; is disposed on the substrate and located at the a first pixel defining layer of the display area, the first pixel defining layer is provided with a plurality of first openings; and a second pixel defining layer disposed on the substrate and located in the dummy pixel region, The second pixel defining layer is provided with a plurality of second openings; wherein a volume of each of the second openings is greater than a volume of each of the first openings, and an opening area of each of the second openings is less than or equal to each of the first openings An opening area of the opening; wherein an opening area of each of the second openings is an area of each of the second openings located in a plane of the second pixel defining layer away from a surface of the substrate, each of the The opening area of
- the surface of the second pixel defining layer away from the substrate is in the same plane as the surface of the first pixel defining layer away from the substrate.
- each of the plurality of first openings and the plurality of second openings are arranged in a matrix in a plane defined by the first direction and the second direction, the first direction and the The second direction is perpendicular; wherein, in the first direction, the spacing between any two adjacent openings is the same; in the second direction, the spacing between any two adjacent openings is the same.
- each of the second openings is located in a shape of a plane in which the second pixel defining layer is away from a surface of the substrate, and each of the first openings is located away from the first pixel defining layer
- the plane of the surface of the substrate has the same shape.
- each of the first openings is gradually reduced in a direction toward the substrate; each of the second openings includes a first sub-opening, and is located at the first sub-opening a second sub-opening away from a side of the substrate and in communication with the first sub-opening; wherein a cross-sectional area of the second sub-opening is gradually decreased in a direction close to the substrate, the first The cross-sectional area of one of the sub-openings is gradually increased, and the minimum cross-sectional area of the second sub-opening is the same as the minimum cross-sectional area of the first sub-opening.
- a height of the first sub-opening is the same as a height of the second sub-opening, a volume of the first sub-opening and the second sub-opening The volume is equal.
- the cross-sectional area of each of the first openings gradually decreases in a direction close to the substrate, and the cross-sectional area of the second openings gradually increases.
- the first pixel defining layer and the second pixel defining layer are both photoresist layers.
- a display device in a second aspect, includes the display substrate of the first aspect.
- a method of preparing a display substrate includes: forming a first pixel defining layer on a portion of the substrate located in the display region, forming a plurality of first openings in the first pixel defining layer; and on a portion of the substrate located in the non-display region Forming a second pixel defining layer, forming a plurality of second openings in the second pixel defining layer; a volume of each of the second openings is greater than a volume of each of the first openings, and an opening area of each of the second openings An opening area smaller than or equal to each of the first openings; wherein an opening area of each of the second openings is a surface of each of the second openings that is located away from the substrate The area of the plane, the opening area of each of the first openings is an area of each of the first openings located in a plane of the first pixel defining layer away from the surface of the substrate; using an inkjet printing process, At least one organic layer is formed in
- the forming a first pixel defining layer on a portion of the substrate located in the display region, and forming a plurality of first openings in the first pixel defining layer including: a portion of the substrate located in the display region Coating a photoresist layer; exposing and developing the photoresist layer to form a first pixel defining layer provided with the plurality of first openings.
- the forming a second pixel defining layer on a portion of the substrate that is located on a non-display area, and forming a plurality of second openings in the second pixel defining layer including: on the substrate a portion of the non-display area is coated with a negative photoresist layer; the negative photoresist layer is exposed and developed to form a plurality of first sub- openings; and the negative photoresist layer is away from the Coating a positive photoresist layer on the surface of the substrate and the plurality of first sub-opens; exposing and developing the positive photoresist layer to form a second portion provided with the plurality of second openings
- the material of the first pixel defining layer is the same as the material of the second pixel defining layer, and the first pixel defining layer and the second pixel defining layer are formed in a single fabrication process.
- FIG. 1 is a top plan view of a display substrate in accordance with some embodiments of the present disclosure.
- FIG. 2 is a cross-sectional view showing an AA' direction in the display substrate shown in FIG. 1;
- FIG. 3 is a cross-sectional view showing a BB' direction in the display substrate shown in FIG. 1;
- FIG. 4 is a cross-sectional view showing another BB' direction in the display substrate shown in FIG. 1;
- FIG. 5 is a schematic flow chart of a method for preparing a display substrate according to some embodiments of the present disclosure
- FIG. 6 is a flow diagram of preparing a first pixel defining layer in accordance with some embodiments of the present disclosure
- FIG. 7 is a flow diagram of preparing a second pixel defining layer in accordance with some embodiments of the present disclosure.
- FIGS. 8a-8d are schematic diagrams showing steps of preparing a second pixel defining layer according to some embodiments of the present disclosure.
- FIG. 9 is a schematic structural diagram of a display device according to some embodiments of the present disclosure.
- the display substrate includes: a display area 10 and a non-display area 20, and the non-display area 20 includes a virtual pixel area 22 located around the display area 10 (FIG. 1). a portion between the dotted lines outside the display area 10; the display substrate further includes a substrate 4; a first pixel defining layer 11 disposed on the substrate 4 and located in the display area 10, the first pixel defining layer 11 being provided with a plurality of a first opening 110; and a second pixel disposed on the substrate 4 and located in the dummy pixel region 22 defines a layer 21, and the second pixel defining layer 21 is provided with a plurality of second openings 210.
- the volume of each of the second openings 210 is greater than the volume of each of the first openings 110, and the opening area of the second openings 210 is less than or equal to the opening area of the first openings 110; the opening area of each of the second openings 210 is each The two openings 210 are located in an area of the plane of the second pixel defining layer 21 away from the surface of the substrate 4, and the opening area of each of the first openings 110 is such that each of the first openings 110 is located on the surface of the first pixel defining layer 11 away from the substrate 4. The area of the plane.
- the plurality of first openings 110 in the first pixel defining layer 11 and the plurality of sub-pixels in the display area 10 are in one-to-one correspondence
- the second pixels defining the plurality of second openings 210 and the dummy pixel regions 22 in the layer 21 The plurality of sub-pixels are in one-to-one correspondence, wherein the structure of each sub-pixel in the virtual pixel region 22 is the same as the structure of each sub-pixel in the display region 10, but since the dummy pixel region 22 is in the non-display region 20, the dummy pixel region 22 Each sub-pixel does not participate in the display.
- a display device is generally provided in each of the sub-pixels.
- the display substrate is an OLED substrate, and an OLED device is disposed as a display device in each sub-pixel of the OLED substrate.
- the OLED device includes an anode, at least one organic layer, and a cathode; wherein at least one of the organic layers includes at least a light-emitting layer.
- the anode is generally formed prior to the pixel defining layer, and the organic layer is formed within the plurality of openings of the pixel defining layer (the opening includes the first opening 110 and the second opening 210).
- an anode is formed first, and then a first pixel defining layer 11 is formed, the edge of the anode may extend below the first pixel defining layer 11, and then the first pixel defines the layer 11
- An organic layer is formed in the first openings 110.
- an anode is formed first, and then a second pixel defining layer 21 is formed, and an edge of the anode may extend below the second pixel defining layer 21, and then a plurality of layers defining the layer 21 in the second pixel
- An organic layer is formed in the second opening 210.
- the display substrate is a Quantum Dot Light Emitting Diodes (QLED) substrate, or a substrate such as a color filter substrate that needs to be formed by an inkjet printing process, and is also allowed.
- QLED Quantum Dot Light Emitting Diodes
- some embodiments of the present disclosure may utilize the plurality of sub-pixels located in the edge region of the display substrate in the virtual pixel region 22 after the plurality of sub-pixels for non-display are disposed in the virtual pixel region 22 around the display region.
- the problem that the drying speed of the organic solvent in the edge region of the display region 10 is faster than the drying rate of the organic solvent in the intermediate region is improved to some extent.
- Some embodiments of the present disclosure may utilize each of the second openings 210 in the process of inkjet printing of the organic solvent to form the organic layer by setting the volume of each of the second openings 210 to be larger than the volume of each of the first openings 110.
- An opening 110 holds more organic solvent, thereby enabling the dummy pixel region 22 to provide a sufficient solvent atmosphere for the edge region in the display region 10 to ensure the drying rate of the organic solvent in the edge region of the display region 10 and the organic solvent in the middle region thereof. The drying speed tends to be the same.
- Gs (5.38+4.1u) P v FM 1/2 (Gs is the evaporation amount of the organic solvent; u is the dry ambient air flow rate, and P v is the saturated vapor pressure of the organic solvent) ; F organic solvent exposed area; M is the molecular weight of the organic solvent) It is known that the evaporation amount of the organic solvent is related to the exposed area of the organic solvent. Since the organic solvent is printed in each opening of the pixel defining layer, the evaporation amount of the organic solvent is actually related to the opening area of the corresponding opening.
- Some embodiments of the present disclosure may cause the evaporation rate of the organic solvent contained in each of the second openings 210 to be no more than each by controlling the opening area of each of the second openings 210 to be less than or equal to the opening area of each of the first openings 110.
- the evaporation rate of the organic solvent in the first opening 110 enables the solvent atmosphere in the edge region of the display region 10 to be always provided by the organic solvent in each of the second openings 210 during the drying of the organic solvent in each of the first openings 110. .
- the display substrate provided by some embodiments of the present disclosure, by disposing the first pixel defining layer 11 in the display region 10, disposing the second pixel defining layer 21 in the dummy pixel region 22, and causing each of the second pixel defining layer 21
- the volume of the second openings 210 is greater than the volume of each of the first openings 110 in the first pixel defining layer 11, and each of the second openings 210 may be made relatively opposite each other during the inkjet printing of the organic solvent to form the organic layer.
- An opening 110 holds more organic solvent to provide a sufficient solvent atmosphere for the edge regions in the display region 10, so that the drying speed of the organic solvent in each of the first openings 110 in the edge regions in the display region 10 is lowered. That is, the drying speed of the organic solvent in the edge region in the display region 10 tends to coincide with the drying speed of the organic solvent in the intermediate portion.
- the display substrate provided by some embodiments of the present disclosure can make the organic solvent contained in each of the second openings 210 by making the opening area of each of the second openings 210 smaller than or equal to the opening area of each of the first openings 110.
- the evaporation rate is not greater than the evaporation rate of the organic solvent in each of the first openings 110, thereby ensuring that the organic solvent in each of the second openings 210 in the dummy pixel region 22 is utilized in the process of drying the organic solvent in each of the first openings 110.
- the edge region in the display region 10 always provides a solvent atmosphere, thereby increasing the film thickness uniformity of the organic layer in each of the sub-pixels in the edge region and the intermediate region of the display region 10.
- each sub-pixel in the dummy pixel region 22 is the same as the structure of each sub-pixel in the display region 10, the surface of the second pixel defining layer 21 away from the substrate 4 is away from the first pixel defining layer 11
- the surface of the substrate 4 is in the same plane, that is, the height of the second opening 210 is equal to the height of the first opening 110 when the surface of the substrate 4 is used as a reference surface.
- printing can be simultaneously performed by using a plurality of nozzles that are continuously disposed, which not only improves printing efficiency, but also reduces printing complexity. That is, the problem that multiple special printing is required due to the fact that the second opening 210 and the first opening 110 are not at the same height occurs.
- each of the plurality of first openings 110 of the first pixel defining layer 11 and the plurality of second openings 210 of the second pixel defining layer 21 is in the first direction X and the The plane defined by the two directions Y is arranged in a matrix, and the first direction X and the second direction Y are perpendicular; wherein, in the first direction X, the spacing between any adjacent two openings is the same; in the second direction Y, The spacing between any two adjacent openings is the same.
- the plurality of nozzles that are continuously disposed, whether printing in the first direction X or the second direction Y, can accurately drop the organic solvent ejected from each nozzle into the corresponding plurality of first openings 110 and/or Within the plurality of second openings 210, it is advantageous to improve the printing accuracy of inkjet printing.
- each of the second openings 210 is located in a shape of a plane in which the second pixel defining layer 21 is away from the surface of the substrate 4, and each of the first openings 110 is located on a surface of the first pixel defining layer 11 away from the substrate 4.
- the shape of the plane is the same. This makes the organic solvent falling into the first opening 110 and the second opening 210 more uniform during the ink jet printing, and the uniformity of the film thickness of the organic layer in each opening can be further ensured.
- the shape of each second opening 210 located on a plane of the surface of the second pixel defining layer 21 away from the substrate 4 may be selected according to actual needs, such as a circle, a square, a diamond, or a rectangle, etc. The embodiment does not limit this.
- the cross-sectional area of each of the first openings 110 gradually decreases in a direction close to the substrate 4. That is, the cross-sectional area of each of the first openings 110 parallel to the surface of the substrate 4 is gradually reduced.
- the cross-sectional shape of each of the first openings 110 perpendicular to the surface of the substrate 4 is inverted trapezoidal. As shown in FIG.
- each of the second openings 210 includes a first sub-opening 211, and a second sub-opening 212 located at a side of the first sub-opening 211 away from the substrate 4 and communicating with the first sub-opening 110, wherein In a direction close to the substrate 4, the cross-sectional area of the second sub-opening 212 gradually decreases, the cross-sectional area of the first sub-opening 211 gradually increases, and the minimum cross-sectional area of the second sub-opening 212 and the minimum cross-section of the first sub-opening 211 The area is the same. That is, the cross-sectional area of each of the first sub-openings 211 parallel to the surface of the substrate 4 is gradually increased.
- each of the first sub-openings 211 perpendicular to the surface of the substrate 4 is trapezoidal; each of the second sub-openings 212 is parallel.
- the cross-sectional area of the surface of the substrate 4 is gradually reduced.
- the cross-sectional shape of each of the second sub-openings 212 perpendicular to the surface of the substrate 4 is inverted trapezoidal.
- the display substrate of some embodiments is also disclosed such that the volume of each of the second openings 210 is greater than the volume of each of the first openings 110, thereby ensuring that each of the second openings 210 can hold more of each of the first openings 110.
- the organic solvent facilitates the organic solvent in each of the second openings 210 of the dummy pixel region 22 to provide a sufficient solvent atmosphere for the plurality of first openings 110 in the edge regions of the display region 10.
- each first sub- The volume of the opening 211 is equal to the volume of each of the second sub-openings 212.
- the first sub-opening 211 and the second sub-opening 212 in each of the second openings 210 are symmetrically disposed along the interface of the two, and the second pixel defining layer 21 is more easily fabricated in the process.
- the cross-sectional area of each of the first openings 110 gradually decreases in a direction close to the substrate 4, for example, a cross section of each of the first openings 110 perpendicular to the surface of the substrate 4.
- the shape is inverted trapezoidal.
- the cross-sectional area of the second opening 210 gradually increases in a direction close to the substrate 4.
- the cross-sectional shape of each of the second openings 210 perpendicular to the surface of the substrate 4 is trapezoidal. It is also allowed.
- the cross-sectional area of each of the second openings 210 is larger than the cross-sectional area of each of the first openings 110, and therefore, the volume of each of the second openings 210 is larger than the volume of each of the first openings 110.
- the shape of each of the second openings 210 is exactly the shape in which each of the first openings 110 is inverted, which makes it easy to fabricate the second pixel defining layer 21 in the process.
- the first pixel defining layer 11 and the second pixel defining layer 21 are both photoresist layers.
- the photoresist may comprise a positive photoresist or a negative photoresist.
- Some embodiments of the present disclosure provide a display device, as shown in FIG. 9, which includes the display substrate 7 described above.
- the display device 8 has the same technical effects as the above display substrate, and details are not described herein again.
- Some examples of the present disclosure provide a method of preparing a display substrate.
- the preparation method includes S100 to S300.
- a first pixel defining layer 11 is formed on a portion of the substrate 4 located on the display region 10, and a plurality of first openings 110 are formed in the first pixel defining layer 11.
- a second pixel defining layer 21 is formed on a portion of the non-display area 20 where the substrate 4 is located, and a plurality of second openings 210 are formed in the second pixel defining layer 21.
- the volume of each of the second openings 210 is greater than the volume of each of the first openings 110, and the opening area of each of the second openings 210 is less than or equal to the opening area of each of the first openings 110; wherein, each of the second openings 210
- the opening area is an area of each of the second openings 210 located in a plane of the second pixel defining layer 21 away from the surface of the substrate 4, and the opening area of each of the first openings 110 is located at the first pixel defining layer 11 for each of the first openings 110. The area away from the plane of the surface of the substrate 4.
- the first pixel defining layer 11 and the second pixel defining layer 21 are both photoresists and are formed by exposure and development processes, respectively.
- a first pixel defining layer 11 is formed on a portion of the substrate 4 located on the display region 10, and a plurality of first openings 110 are formed in the first pixel defining layer 11, including S110 ⁇ S120.
- a photoresist layer is coated on a portion of the substrate 4 located on the display region.
- a second pixel defining layer 21 is formed on a portion of the substrate 4 located on the non-display area 20, and a plurality of second portions are formed in the second pixel defining layer 21.
- the opening 210 includes S210 to S240.
- a negative photoresist layer 30 is coated on a portion of the substrate 4 located on the non-display area 20, as shown in FIG. 8a.
- a positive photoresist layer 31 is coated on the surface of the negative photoresist layer 30 away from the substrate 4 and the plurality of first sub- openings 211, as shown in FIG. 8c.
- the negative photoresist can generate an actinic reaction under ultraviolet light irradiation, the polymer compound is crosslinked into a molecular structure insoluble in the alkaline developing solution, and therefore, an optional negative photoresist Layer 30 is exposed to ultraviolet light.
- a mask 5 is disposed on the side of the negative photoresist layer 30 away from the substrate 4 to utilize the mask 5 for the negative photoresist layer 30. Exposure. After exposure by ultraviolet light, the unexposed areas of the negative photoresist layer 30 are dissolved in the developer, and the exposed areas of the negative photoresist layer 30 are insoluble in the developer.
- the positive photoresist layer 31 is coated on the surface of the negative photoresist layer 30 away from the substrate 4 and the plurality of first sub- openings 211. Since the principle of exposure development of the positive photoresist layer 31 is similar to that of the negative photoresist 30, that is, after the positive photoresist layer 31 is exposed through the mask, the exposed region thereof is dissolved in the developer, and The unexposed areas are insoluble in the developer, both of which require exposure by light and development etching. Therefore, by performing the exposure development on the positive photoresist layer 31, a pattern as shown in FIG.
- each of the second openings 210 It is composed of a first sub-opening 211 and a second sub-opening 212.
- the foregoing is only one of the methods for preparing the second pixel defining layer 21, and may be a normal mask or a half according to the material of the second pixel defining layer 21 and the structure of the corresponding second opening 210.
- a tone mask was used for the preparation.
- the same is true for the first pixel defining layer 11, and the material thereof may be a positive photoresist or a negative photoresist.
- the first pixel defining layer 11 and the second pixel defining layer 21 are made of the same material, and the first pixel defining layer 11 and the second pixel defining layer 21 can be simultaneously formed and formed in one preparation process to simplify the display substrate. Production process.
- the materials for forming the first pixel defining layer 11 and the second pixel defining layer 21 are different, the two may be separately prepared.
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Abstract
Description
Claims (13)
- 一种显示基板,包括:显示区和非显示区,所述非显示区包括位于所述显示区周边的虚拟像素区;所述显示基板还包括:衬底;设置于所述衬底上且位于所述显示区的第一像素界定层,所述第一像素界定层设置有多个第一开口;以及,设置于所述衬底上且位于所述虚拟像素区的第二像素界定层,所述第二像素界定层设置有多个第二开口;其中,每个第二开口的容积大于每个第一开口的容积,且所述每个第二开口的开口面积小于或等于所述每个第一开口的开口面积;其中,所述每个第二开口的开口面积为所述每个第二开口位于所述第二像素界定层远离所述衬底的表面所在平面的面积,所述每个第一开口的开口面积为所述每个第一开口位于所述第一像素界定层远离所述衬底的表面所在平面的面积。
- 根据权利要求1所述的显示基板,其中,所述第二像素界定层远离所述衬底的表面与所述第一像素界定层远离所述衬底的表面处于同一平面。
- 根据权利要求2所述的显示基板,其中,所述多个第一开口和所述多个第二开口中的各开口在由第一方向和第二方向限定的平面内呈矩阵排布,所述第一方向和所述第二方向垂直;其中,沿第一方向,任意相邻的两个开口之间的间距相同;沿第二方向,任意相邻的两个开口之间的间距相同。
- 根据权利要求1-3任一项所述的显示基板,其中,所述每个第二开口位于所述第二像素界定层远离所述衬底的表面所在平面的形状,和所述每个第一开口位于所述第一像素界定层远离所述衬底的表面所在平面的形状相同。
- 根据权利要求1-3任一项所述的显示基板,其中,沿靠近所述衬底的方向,所述每个第一开口的截面积逐渐减小;所述每个第二开口包括第一子开口,以及位于所述第一子开口远离所述衬底一侧且与所述第一子开口相连通的第二子开口;其中,沿靠近所述衬底的方向,所述第二子开口的截面积逐渐减小,所述第一子开口的截面积逐渐增大,所述第二子开口的最小截面积与所述第一子开口的最小截面积相同。
- 根据权利要求5所述的显示基板,其中,在所述每个第二开口中,所述第一子开口的高度与所述第二子开口的高度相同,所述第一子开口的容积和所述第二子开口的容积相等。
- 根据权利要求1-3任一项所述的显示基板,其中,沿靠近所述衬底的方向,所述每个第一开口的截面积逐渐减小,所述第二开口的截面积逐渐增大。
- 根据权利要求1所述的显示基板,其中,所述第一像素界定层和所述第二像素界定层均为光刻胶层。
- 一种显示装置,包括权利要求1-7任一项所述的显示基板。
- 一种显示基板的制备方法,包括:在衬底位于显示区的部分上形成第一像素界定层,在所述第一像素界定层中形成多个第一开口;在所述衬底位于非显示区的部分上形成第二像素界定层,在所述第二像素界定层中形成多个第二开口;每个第二开口的容积大于每个第一开口的容积,且所述每个第二开口的开口面积小于或等于所述每个第一开口的开口面积,其中,所述每个第二开口的开口面积为所述每个第二开口位于所述第二像素界定层远离所述衬底的表面所在平面的面积,所述每个第一开口的开口面积为所述每个第一开口位于所述第一像素界定层远离所述衬底的表面所在平面的面积;采用喷墨打印工艺,在所述每个第二开口和所述每个第一开口内形成至少一层有机层。
- 根据权利要求10所述的制备方法,其中,所述在衬底位于显示区的部分上形成第一像素界定层,在所述第一像素界定层中形成多个第一开口,包括:在衬底位于显示区的部分上涂覆光刻胶层;对所述光刻胶层进行曝光和显影,形成设置有所述多个第一开口的第一像素界定层。
- 根据权利要求10所述的制备方法,其中,所述在所述衬底位于非显示区的部分上形成第二像素界定层,在所述第二像素界定层中形成多个第二开口,包括:在所述衬底位于非显示区的部分上涂覆负性光刻胶层;对所述负性光刻胶层进行曝光和显影,形成多个第一子开口;在所述负性光刻胶层远离所述衬底的表面以及所述多个第一子开口内涂覆正性光刻胶层;对所述正性光刻胶层进行曝光和显影,形成设置有所述多个第二开口的第二像素界定层,其中,每个第二开口由一个第一子开口和第一第二子开口连通构成。
- 根据权利要求10所述的制备方法,其中,所述第一像素界定层的材料与所述第二像素界定层的材料相同,所述第一像素界定层和所述第二像素界定层在一次制备工艺中形成。
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CN111028692A (zh) * | 2019-12-26 | 2020-04-17 | 武汉天马微电子有限公司 | 一种显示面板和显示装置 |
CN111509144B (zh) * | 2020-04-24 | 2022-09-30 | 合肥京东方卓印科技有限公司 | Oled器件的制备方法及显示面板的制备方法 |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1943879A (zh) * | 2005-09-08 | 2007-04-11 | 精工爱普生株式会社 | 膜图案的形成方法以及电子设备的制造方法 |
US20100193791A1 (en) * | 2009-02-05 | 2010-08-05 | Byung-Hoon Chun | Organic light emitting diode display device and method of fabricating the same |
US8004187B2 (en) * | 2005-02-03 | 2011-08-23 | Chunghwa Picture Tubes, Ltd. | Organic electro-luminescence display having an inverted trapeziform patterned separator structure |
CN104393192A (zh) * | 2014-12-04 | 2015-03-04 | 京东方科技集团股份有限公司 | 一种像素界定层及其制作方法、显示面板、显示装置 |
CN108336123A (zh) * | 2018-04-04 | 2018-07-27 | 京东方科技集团股份有限公司 | 一种oled基板及其制备方法、显示装置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1905126A (zh) * | 2000-11-27 | 2007-01-31 | 精工爱普生株式会社 | 有机电致发光装置及其电子装置 |
JP4459521B2 (ja) * | 2002-10-17 | 2010-04-28 | 大日本印刷株式会社 | エレクトロルミネッセンス表示装置 |
JP4251329B2 (ja) * | 2005-12-20 | 2009-04-08 | カシオ計算機株式会社 | 表示装置及びその製造方法 |
WO2015083823A1 (ja) * | 2013-12-06 | 2015-06-11 | シャープ株式会社 | 発光体基板、太陽電池、表示装置、照明装置、電子機器、有機el素子、及び発光体基板の製造方法 |
CN104167430B (zh) * | 2014-08-08 | 2017-04-05 | 京东方科技集团股份有限公司 | 一种有机电致发光显示面板、其制作方法及显示装置 |
CN104260554B (zh) * | 2014-09-24 | 2016-03-30 | 京东方科技集团股份有限公司 | 喷墨打印方法及设备、显示基板的制作方法 |
KR102472642B1 (ko) * | 2015-06-16 | 2022-11-30 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 이의 제조 방법 |
CN107331780B (zh) * | 2017-05-24 | 2019-12-13 | 昆山国显光电有限公司 | 喷墨打印方法、显示基板及oled的制备方法 |
JP2019008962A (ja) * | 2017-06-23 | 2019-01-17 | 株式会社Joled | 有機el表示パネル及び有機el表示パネルの製造方法 |
CN207165575U (zh) * | 2017-09-28 | 2018-03-30 | 京东方科技集团股份有限公司 | 像素界定层、显示基板及显示装置 |
CN107799577B (zh) * | 2017-11-06 | 2019-11-05 | 武汉华星光电半导体显示技术有限公司 | Amoled显示面板及amoled显示器 |
KR102484209B1 (ko) * | 2017-12-22 | 2023-01-02 | 엘지디스플레이 주식회사 | 전계발광 표시 장치 |
-
2018
- 2018-04-04 CN CN201810305257.6A patent/CN108336123B/zh active Active
-
2019
- 2019-04-03 US US16/616,025 patent/US11678557B2/en active Active
- 2019-04-03 WO PCT/CN2019/081300 patent/WO2019192529A1/zh active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8004187B2 (en) * | 2005-02-03 | 2011-08-23 | Chunghwa Picture Tubes, Ltd. | Organic electro-luminescence display having an inverted trapeziform patterned separator structure |
CN1943879A (zh) * | 2005-09-08 | 2007-04-11 | 精工爱普生株式会社 | 膜图案的形成方法以及电子设备的制造方法 |
US20100193791A1 (en) * | 2009-02-05 | 2010-08-05 | Byung-Hoon Chun | Organic light emitting diode display device and method of fabricating the same |
CN104393192A (zh) * | 2014-12-04 | 2015-03-04 | 京东方科技集团股份有限公司 | 一种像素界定层及其制作方法、显示面板、显示装置 |
CN108336123A (zh) * | 2018-04-04 | 2018-07-27 | 京东方科技集团股份有限公司 | 一种oled基板及其制备方法、显示装置 |
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