WO2017012309A1 - 有机电致发光显示基板及制备方法、显示面板、显示装置 - Google Patents

有机电致发光显示基板及制备方法、显示面板、显示装置 Download PDF

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Publication number
WO2017012309A1
WO2017012309A1 PCT/CN2016/070987 CN2016070987W WO2017012309A1 WO 2017012309 A1 WO2017012309 A1 WO 2017012309A1 CN 2016070987 W CN2016070987 W CN 2016070987W WO 2017012309 A1 WO2017012309 A1 WO 2017012309A1
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Prior art keywords
shoulder
organic electroluminescence
display substrate
receiving area
layer
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PCT/CN2016/070987
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English (en)
French (fr)
Inventor
侯文军
刘则
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京东方科技集团股份有限公司
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Priority to US15/129,091 priority Critical patent/US10204968B2/en
Publication of WO2017012309A1 publication Critical patent/WO2017012309A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/191—Deposition of organic active material characterised by provisions for the orientation or alignment of the layer to be deposited
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning

Definitions

  • the present invention belongs to the field of display technologies, and in particular, to an organic electroluminescence display substrate, a preparation method thereof, a display panel, and a display device.
  • the Organic Light-Emitting Diode (OLED) display has the advantages of self-luminescence, fast response, wide viewing angle, high brightness, colorful color, thinness and lightness compared with liquid crystal display, and is considered as the next generation display technology.
  • the preparation method of the film of the organic electroluminescence device mainly adopts a vacuum evaporation method or a solution method.
  • Vacuum evaporation is suitable for organic small molecules, the uniformity of the film prepared by vacuum evaporation is good, and the vacuum evaporation technology is relatively mature.
  • equipment investment is large, material utilization is low, and the alignment accuracy of a mask for a large-sized product is low.
  • the solution method is suitable for polymer materials and soluble small molecules, has the characteristics of low equipment cost, and has outstanding advantages in large-scale and large-scale production.
  • the solution process includes spin coating, ink jet printing, nozzle coating, and the like.
  • a process for preparing an OLED display device by inkjet printing includes: ejecting a soluble OLED functional layer material into a corresponding sub-pixel region by a certain volume by an inkjet printer; and then forming an organic electroluminescent layer by drying. Due to the small size of the inkjet printer of the inkjet printer, the inkjet head has different requirements on the viscosity and surface tension of the ink, the characteristics of the ink itself, the requirements of the ink film forming process, and the sub-pixels determined by the design of the display panel. The size and the like make the thickness of the organic film after inkjet printing n drops of ink often exceed the thickness required by the device during inkjet printing. After the inkjet printing n+1 ink drops, the thickness of the organic film is greater than the thickness required by the device. Thus the ink jet volume cannot match the thickness required for the structure of the display device.
  • the object of the present invention is to solve the prior art organic electroluminescent display substrate and display In the display panel and the display device, the problem that the volume of the ink forming the organic electroluminescent layer is matched with the thickness of the actual organic electroluminescent layer cannot be achieved.
  • Embodiments of the present invention provide an organic electroluminescence display substrate including a pixel defining layer disposed on a substrate for defining a sub-pixel region, the pixel defining layer including a receiving region corresponding to the sub-pixel and located in the receiving The groove on the outer side of the area.
  • the volume of the receiving area may be equal to the volume of ink used to form the sub-pixels.
  • the volume of the groove may be smaller than the volume of a drop of ink used to form the inkjet printer of the sub-pixel.
  • the pixel defining layer can also include a first shoulder defining the receiving area and a second shoulder defining the groove together with the first shoulder.
  • the receiving area may be surrounded by the first shoulder.
  • the first shoulder may be disposed on a side of the groove adjacent to the receiving area, and the second shoulder may be disposed on a side of the groove away from the receiving area.
  • the height of the first shoulder may be less than the height of the second shoulder.
  • the second shoulder may comprise a hydrophobic material.
  • the first shoulder may comprise a hydrophobic material or a hydrophilic material.
  • the hydrophobic material may include a fluorinated polyimide resin.
  • the hydrophilic material may include a polyimide resin, SiO 2 or SiN x .
  • the embodiment of the invention further provides an organic electroluminescence display panel comprising the above organic electroluminescence display substrate.
  • An embodiment of the present invention further provides an organic electroluminescence display device comprising the above organic electroluminescence display panel.
  • An embodiment of the present invention further provides a method for preparing an organic electroluminescence display substrate, comprising: forming a pattern of a first shoulder portion on a substrate by a patterning process to form an alternately arranged receiving area and a region to be filled, A shoulder is formed between the receiving area and the area to be filled; and a pattern of grooves is formed on an outer peripheral side of the receiving area on the area to be filled by a patterning process.
  • Each of the receiving areas may be surrounded by the first shoulder, and the receiving area may correspond to a sub-pixel of the organic electroluminescent display substrate.
  • forming the pattern of the groove may include forming a layer of a hydrophobic material on the region to be filled, and forming a pattern of the groove by patterning the layer of the hydrophobic material.
  • the pattern forming the groove may include: forming a layer of a hydrophobic material on the substrate on which the pattern of the first shoulder is formed; and patterning the layer of the hydrophobic material to expose the accommodation And forming a pattern of grooves on the outer peripheral side of the receiving area on the area to be filled.
  • a pattern of a second shoulder may be formed on the area to be filled by patterning a layer of hydrophobic material located in the area to be filled, such that the groove is formed on the first shoulder Between the portion and the second shoulder.
  • the thickness of the layer of hydrophobic material may be greater than the thickness of the first shoulder.
  • the height of the second shoulder may be greater than the height of the first shoulder.
  • the accommodating region corresponding to the sub-pixel and the concave portion on the outer peripheral side of the accommodating region are disposed on the organic electroluminescent display substrate.
  • a groove such that ink for forming an organic electroluminescent layer during inkjet printing is stored in the receiving area, and excess ink enters into a groove on the outer peripheral side of the receiving area, thereby ensuring excess ink and formation
  • the separation of the ink of the organic electroluminescent layer facilitates the matching of the volume of the ink forming the organic electroluminescent layer with the thickness of the actual organic electroluminescent layer.
  • FIG. 1 is a schematic structural view of an organic electroluminescence display substrate including a pattern of a receiving area and a groove according to an embodiment of the present invention.
  • FIG. 2 is a schematic structural view of an organic electroluminescence display substrate after forming a pattern of a receiving area and a area to be filled according to an embodiment of the present invention.
  • FIG 3 is a schematic view showing the structure of an organic electroluminescence display substrate after coating a layer of a hydrophobic material according to an embodiment of the present invention.
  • FIG. 4 is a schematic view showing the structure of an organic electroluminescence display substrate after forming a pattern of grooves according to an embodiment of the present invention.
  • an embodiment of the present invention provides an organic electroluminescence display substrate including a pixel defining layer disposed on a substrate 1 for defining a sub-pixel region, the pixel defining layer including a sub-pixel corresponding to receiving A zone 3 and a recess 6 on the outer peripheral side of the receiving zone 3.
  • the pixel defining layer may further comprise a first shoulder 2 defining the receiving area 3 and a second shoulder 5 defining the groove 6 together with the first shoulder 2.
  • the organic electro-electrode is formed at the time of ink-jet printing.
  • the ink of the luminescent layer is stored in the accommodating area 3, and the excess ink enters the groove 6 on the outer peripheral side of the accommodating area 3, thereby ensuring excess ink and ink for forming the organic electroluminescent layer. Separation is advantageous to achieve that the volume of the ink forming the organic electroluminescent layer matches the thickness of the actual organic electroluminescent layer.
  • the volume or volume of the receiving area 3 may be equal to the volume of the ink used to form the sub-pixel.
  • the volume of ink required to form a sub-pixel of a particular size and thickness can be determined and then formed into a volume by the patterning process.
  • the volume of the ink is equal to the receiving area 3.
  • the ink in the accommodating area 3 can form sub-pixels of a specific size and thickness, thereby realizing that the volume of the ink forming the organic electroluminescent layer matches the thickness of the actual organic electroluminescent layer. .
  • the volume of the groove 6 may be smaller than the volume of a drop of ink used to form the inkjet printer of the sub-pixel.
  • the volume of the ink in the accommodating area 3 can be made larger than the volume of the n drops of ink and smaller than the volume of the (n+1) ink drop.
  • the receiving area 3 can be surrounded by the first shoulder 2. Furthermore, the first shoulder 2 may be disposed on a side of the groove 6 adjacent to the receiving area 3, and the second shoulder 5 may be disposed away from the receiving area 3 of the groove 6. One side.
  • the groove 6 can be defined by a first shoulder 2 adjacent the receiving area 3 and a second shoulder 5 remote from the receiving area 3. The groove 6 may be disposed between the first shoulder 2 and the second shoulder 5.
  • the height of the second shoulder 5 may be greater than the height of the first shoulder 2.
  • the height of the first shoulder 2 of the groove 6 near the receiving area 3 side may be lower than the height of the second shoulder 5 of the groove 6 away from the receiving area 3 side.
  • the ink in the recess 6 is less likely to overflow into the adjacent sub-pixel regions during the fabrication process, thereby avoiding contamination between the inks of adjacent sub-pixels.
  • the second shoulder 5 can be prepared using a hydrophobic material. In this case, it is possible to prevent the ink for forming adjacent sub-pixels from climbing on the second shoulder portion 5 due to the better wettability of the second shoulder portion 5, thereby causing the ink forming the adjacent sub-pixels to cross. Pollution.
  • the first shoulder 2 can be prepared by using a hydrophobic material or a hydrophilic material.
  • the material of the first shoulder 2 may be relaxed, and may be prepared using a hydrophobic material or a hydrophilic material.
  • the hydrophobic material may include a fluorinated polyimide resin
  • the hydrophilic material may include a polyimide resin, SiO 2 or SiN x .
  • the cross-sectional shape of the groove 6 may be an inverted trapezoid with the opening facing upward. It should be understood that the cross-sectional shape of the groove 6 may be other shapes as long as it can accommodate excess ink.
  • the number of the grooves 6 may be set to be plural, in which case a plurality of grooves 6 are provided between the first shoulder 2 and the second shoulder 5.
  • the number of the grooves 6 can be specifically set according to specific application conditions.
  • hydrophobic material and the hydrophilic material are merely illustrative, and other hydrophobic materials or other hydrophilic materials that can be used to form the pixel defining layer in the prior art may also be suitable.
  • organic electroluminescent display substrate may further include other functional layers, which will not be further described herein.
  • Embodiments of the present invention also provide an organic electroluminescence display panel comprising the above-described organic electroluminescence display substrate.
  • Embodiments of the present invention also provide an organic electroluminescence display device including the above-described organic electroluminescence display panel.
  • the organic electroluminescence display device can be applied to any product or component having a display function, such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.
  • a display function such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.
  • the embodiment of the invention further provides a method for preparing an organic electroluminescence display substrate, the method comprising the following steps S1 and S2.
  • step S1 a pattern of the first shoulder 2 is formed on the substrate 1 by a patterning process to form alternately arranged receiving areas 3 and areas to be filled 4, the first shoulders 2 being formed in the receiving area 3 And between the area to be filled 4.
  • a material layer is coated on the substrate 1, and a pattern of the first shoulder portion 2 is formed by patterning the material layer to form the accommodating region 3 and the region 4 to be filled which are alternately arranged.
  • Each receiving area 3 can be surrounded by the first shoulder 2 .
  • the receiving area 3 corresponds to a sub-pixel formed by a subsequent step.
  • the groove 6 is to be formed in the area to be filled 4 in a subsequent step.
  • the first shoulder 2 is formed between the accommodating area 3 and the area to be filled 4 which are alternately repeatedly arranged by the patterning process, and the pattern of the first shoulder 2 is limited.
  • the receiving area 3 and the area to be filled 4 are provided.
  • the accommodating area 3 and the area to be filled 4 are both exposed regions formed on the substrate 1 by etching portions of the material layer.
  • the layer of material may be a layer of hydrophilic material.
  • the material layer may include a polyimide resin.
  • the layer of material may be a layer of hydrophobic material.
  • the material layer may include a fluorinated polyimide resin.
  • the material layer may include other hydrophilic materials such as SiO 2 , SiN x , and accordingly, a deposition method may be used to form the film layer.
  • the thickness of the material layer (for example, the first shoulder 2
  • the height of the receiving area 3 and the area to be filled 4 need to match the volume of the ink forming the sub-pixel, and the parameter can be calculated according to the specific application situation, and will not be described herein. .
  • the figures referred to in the embodiments of the present invention refer to various structures formed by a patterning process.
  • the patterning process referred to in the embodiments of the present invention may include some or all of the processes of photoresist coating, mask placement, exposure, development, etching, photoresist stripping, and the like.
  • step S2 a pattern of grooves 6 is formed on the outer peripheral side of the receiving area 3 on the area to be filled 4 by a patterning process.
  • a layer 7 of hydrophobic material is applied on the substrate 1 which has passed through step S1.
  • the layer of hydrophobic material 7 may cover the receiving area 3, the area to be filled 4 and the second shoulder 2.
  • the thickness of the layer of hydrophobic material 7 may be greater than the height of the first shoulder 2.
  • the hydrophobic material layer 7 may be a fluorinated polyimide resin layer.
  • the accommodating area 3 is exposed by patterning the hydrophobic material layer 7, and a pattern of the grooves 6 is formed on the outer peripheral side of the accommodating area 3.
  • a pattern of the second shoulder 5 may be formed in the area to be filled 4 such that the groove 6 is formed on the first shoulder 2 is between the second shoulder 5.
  • the first shoulder 2 may be disposed on a side of the groove 6 adjacent to the receiving area 3, and the second shoulder 5 may be disposed at a side of the groove 6 away from the receiving area 3. side.
  • Two grooves 6 on the adjacent sides of the adjacent two receiving areas 3 may be formed on the area to be filled 4 between the adjacent two receiving areas 3.
  • the grooves 6 may be formed on both sides of the second shoulder 5 and adjacent to the receiving area 3.
  • the height of the second shoulder 5 may be greater than the height of the first shoulder 2.
  • the height of the first shoulder 2 of the groove 6 on the side close to the receiving area 3 may be lower than the height of the second shoulder 5 of the groove 6 away from the receiving area 3 side.
  • the height of the second shoulder 5 may be equal to the height of the layer 7 of hydrophobic material.
  • the pattern of the accommodating area 3 and the groove 6 may be formed on the substrate 1 by one patterning process.
  • you can pass A patterning process forms a pattern of the receiving area 3, the groove 6, the first shoulder 2 and the second shoulder 5 on the substrate 1.
  • a layer of a hydrophobic material for example, a fluorinated polyimide resin layer 7, is formed on the substrate 1, and then, the accommodating region 3 can be formed by performing a patterning process on the layer of the hydrophobic material and located in the accommodating The pattern of the groove 6 on the outer peripheral side of the zone 3.
  • a pattern of the receiving area 3, the groove 6, the first shoulder 2, and the second shoulder 5 may be formed by performing a patterning process on the layer of hydrophobic material.

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  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

本发明提供有机电致发光显示基板及其制备方法、有机电致发光显示面板及有机电致发光显示装置。所述有机电致发光显示基板包括设置在衬底上的用于限定子像素区域的像素界定层，所述像素界定层包括与子像素对应的容纳区和位于所述容纳区外周侧的凹槽。在喷墨打印形成有机电致发光层时，多余的墨液进入到所述容纳区外周侧的凹槽中，有利于实现形成有机电致发光层的墨液的体积与实际的有机电致发光层的厚度相匹配。

Description

有机电致发光显示基板及制备方法、显示面板、显示装置 技术领域
本发明属于显示技术领域，具体涉及有机电致发光显示基板及制备方法、显示面板、显示装置。
背景技术
有机电致发光二极管(Organic Light-Emitting Diode，简称OLED)显示相对于液晶显示具有自发光、反应快、视角广、亮度高、色彩艳、轻薄等优点，被认为是下一代显示技术。
有机电致发光器件的薄膜的制备方法主要采用真空蒸镀或溶液法。真空蒸镀适用于有机小分子，通过真空蒸镀制备的膜的均匀性好，并且真空蒸镀技术相对成熟。然而，在真空蒸镀技术中，设备的投资大，材料的利用率低，并且用于大尺寸产品的掩膜板的对位精度低。溶液法适用于聚合物材料和可溶性小分子，具有设备成本低的特点，并且在大规模、大尺寸生产上优势突出。溶液法的制程包括旋涂、喷墨打印、喷嘴涂覆法等。
通过喷墨打印来制备OLED显示器件的工艺过程包括：将可溶性的OLED功能层材料通过喷墨打印机按照一定的体积喷墨到对应的子像素区域内；然后通过干燥形成有机电致发光层。由于喷墨打印机的喷墨喷头的规格较少，喷墨头对墨液的粘度和表面张力的要求不同，墨液本身特性、墨液成膜工艺的需求不同，加之显示面板设计决定的子像素大小等等因素，使得在喷墨打印过程中常常出现喷墨打印n滴墨液之后有机薄膜厚度小于器件所需厚度，喷墨打印n+1滴墨液之后有机薄膜厚度大于器件所需厚度，因而喷墨体积无法与显示器件结构所需要的厚度匹配。
发明内容
本发明的目的是解决现有技术中有机电致发光显示基板、显 示面板、显示装置中无法实现形成有机电致发光层的墨液的体积与实际的有机电致发光层的厚度相匹配的问题。
本发明实施例提供一种有机电致发光显示基板，包括设置在衬底上的用于限定子像素区域的像素界定层，所述像素界定层包括与子像素对应的容纳区和位于所述容纳区外周侧的凹槽。
所述容纳区的体积可以等于用于形成所述子像素的墨液的体积。
所述凹槽的体积可以小于用于形成所述子像素的喷墨打印机的一滴墨液的体积。
所述像素界定层还可以包括界定所述容纳区的第一肩部以及与所述第一肩部一起界定所述凹槽的第二肩部。
所述容纳区可以被所述第一肩部包围。
所述第一肩部可以设置在所述凹槽的靠近所述容纳区的一侧，所述第二肩部可以设置在所述凹槽的远离所述容纳区的一侧。
所述第一肩部的高度可以小于所述第二肩部的高度。
所述第二肩部可以包括疏水材料。
所述第一肩部可以包括疏水材料或亲水材料。
所述疏水材料可以包括氟化聚酰亚胺树脂。
所述亲水材料可以包括聚酰亚胺树脂、SiO2或SiNx。
本发明实施例还提供一种有机电致发光显示面板，包括上述的有机电致发光显示基板。
本发明实施例还提供一种有机电致发光显示装置，包括上述的有机电致发光显示面板。
本发明实施例还提供一种制备有机电致发光显示基板的方法，包括：在衬底上通过构图工艺形成第一肩部的图形，以形成交替排列的容纳区和待填充区，所述第一肩部形成在所述容纳区和所述待填充区之间；以及通过构图工艺在所述待填充区上的所述容纳区外周侧形成凹槽的图形。
每个容纳区可以被所述第一肩部包围，所述容纳区可以对应于所述有机电致发光显示基板的子像素。
在所述方法中，形成凹槽的图形可以包括：在所述待填充区上形成疏水性材料层，通过对所述疏水材料层进行构图工艺来形成凹槽的图形。
在所述方法中，形成凹槽的图形可以包括：在形成有所述第一肩部的图形的衬底上形成疏水材料层；以及对所述疏水材料层进行构图工艺，暴露出所述容纳区，并且在所述待填充区上的所述容纳区外周侧形成凹槽的图形。
在所述方法中，可以通过对位于所述待填充区的疏水材料层进行构图工艺，在所述待填充区上形成第二肩部的图形，使得所述凹槽形成在所述第一肩部与所述第二肩部之间。
所述疏水材料层的厚度可以大于所述第一肩部的厚度。
所述第二肩部的高度可以大于所述第一肩部的高度。
本发明实施例的有机电致发光显示基板及其制备方法、显示面板、显示装置中，由于在有机电致发光显示基板设置了与子像素对应的容纳区和位于所述容纳区外周侧的凹槽，这样在喷墨打印时形成有机电致发光层的墨液存放在容纳区，而多余的墨液则进入到所述容纳区外周侧的凹槽中，这样能够保证多余的墨液与形成有机电致发光层的墨液进行分隔，有利于实现形成有机电致发光层的墨液的体积与实际的有机电致发光层的厚度相匹配。
附图说明
图1为根据本发明实施例的包括容纳区和凹槽的图形的有机电致发光显示基板的结构示意图。
图2为根据本发明实施例形成容纳区和待填充区的图形之后的有机电致发光显示基板的结构示意图。
图3为根据本发明实施例涂覆疏水材料层之后的有机电致发光显示基板的结构示意图。
图4为根据本发明实施例形成凹槽的图形之后的有机电致发光显示基板的结构示意图。
具体实施方式
为使本领域技术人员更好地理解本发明的技术方案，下面结合附图和具体实施方式对本发明作进一步详细描述。
参照图1，本发明实施例提供一种有机电致发光显示基板，其包括设置在衬底1上的用于限定子像素区域的像素界定层，所述像素界定层包括与子像素对应的容纳区3和位于所述容纳区3外周侧的凹槽6。所述像素界定层还可以包括界定所述容纳区3的第一肩部2以及与所述第一肩部2一起界定所述凹槽6的第二肩部5。
本实施例提供的有机电致发光显示基板中，由于设置了与子像素对应的容纳区3和位于所述容纳区3外周侧的凹槽6，因此在喷墨打印时用于形成有机电致发光层的墨液存放在容纳区3中，而多余的墨液则进入到所述容纳区3外周侧的凹槽6中，从而能够保证多余的墨液与形成有机电致发光层的墨液进行分隔，有利于实现形成有机电致发光层的墨液的体积与实际的有机电致发光层的厚度相匹配。
本实施例中，所述容纳区3的体积或容积可以等于用于形成所述子像素的墨液的体积。
应当理解的是，对于特定的喷墨打印机、喷头规格、墨液性质及子像素大小，可以确定形成特定大小和厚度的子像素所需要的墨液的体积，然后通过构图工艺形成体积与所述墨液的体积相等的容纳区3。在后续干燥过程中，在容纳区3中的墨液可以形成特定大小和厚度的子像素，从而实现了形成有机电致发光层的墨液的体积与实际的有机电致发光层的厚度相匹配。
本实施例中，所述凹槽6的体积可以小于用于形成所述子像素的喷墨打印机的一滴墨液的体积。在此情况下，能够使容纳区3中的墨液的体积大于n滴墨液的体积而小于(n+1)滴墨液的体积。在墨液被喷墨打印到容纳区3中之后，多余的墨液(其体积小于1滴墨液的体积)流入凹槽6中，从而在调节容纳区3中的墨液的体积的同时，尽量减少凹槽6的体积，降低子像素之间的距离。
本实施例中，所述容纳区3可以被所述第一肩部2包围。此外，所述第一肩部2可以设置在所述凹槽6的靠近所述容纳区3的一侧，所述第二肩部5可以设置在所述凹槽6的远离所述容纳区3的一侧。所述凹槽6可以由靠近所述容纳区3的第一肩部2和远离所述容纳区3的第二肩部5限定。所述凹槽6可以设置在所述第一肩部2与所述第二肩部5之间。
本实施例中，所述第二肩部5的高度可以大于所述第一肩部2的高度。具体地，所述凹槽6的靠近所述容纳区3一侧的第一肩部2的高度可以低于所述凹槽6的远离所述容纳区3一侧的第二肩部5的高度。在此情况下，凹槽6中的墨液不易在制作过程溢流到相邻的子像素区域，从而避免在相邻子像素的墨液之间产生污染。
本实施例中，所述第二肩部5可以采用疏水材料制备。在此情况下，能够防止用于形成相邻子像素的墨液由于第二肩部5的浸润性较好而在第二肩部5上爬升，从而使形成相邻子像素的墨液产生交叉污染。
本实施例中，所述第一肩部2可以采用疏水材料或亲水材料制备。可以对第一肩部2的材料放宽要求，采用疏水材料或亲水材料制备均可。
例如，所述疏水材料可以包括氟化聚酰亚胺树脂，所述亲水材料可以包括聚酰亚胺树脂、SiO2或SiNx。
本实施例中，所述凹槽6的截面形状可以为开口朝上的倒梯形。应当理解的是，所述凹槽6的截面形状也可以是其它形状，只要能容纳多余的墨液即可。
此外，所述凹槽6的数量可以设置为多个，在此情况下，多个凹槽6设置在所述第一肩部2和所述第二肩部5之间。所述凹槽6的数量可以根据具体应用情况进行具体设置。
应当理解的是，所述疏水材料和所述亲水材料只是示例性的说明，现有技术中能用于形成像素界定层的其它疏水性材料或其它亲水性材料也是可以是适用的。
应当理解的是，所述有机电致发光显示基板还可以包括其它功能层，在此不再一一赘述。
本发明实施例还提供一种有机电致发光显示面板，其包括上述的有机电致发光显示基板。
本发明实施例还提供一种有机电致发光显示装置，其包括上述的有机电致发光显示面板。
所述有机电致发光显示装置可以应用于手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。
本发明实施例还提供一种制备有机电致发光显示基板的方法，所述方法包括以下步骤S1和步骤S2。
在步骤S1中，在衬底1上通过构图工艺形成第一肩部2的图形，以形成交替排列的容纳区3和待填充区4，所述第一肩部2形成在所述容纳区3和所述待填充区4之间。
如图2所示，在衬底1上涂覆一材料层，通过对该材料层进行构图工艺来形成第一肩部2的图形，以形成交替排列的容纳区3和待填充区4。每个容纳区3可以被所述第一肩部2包围。所述容纳区3与后续步骤形成的子像素相对应。在后续步骤中凹槽6将要形成在所述待填充区4中。
如图2所示，通过所述构图工艺，所述第一肩部2形成在交替重复排列的所述容纳区3和所述待填充区4之间，所述第一肩部2的图形限定了所述容纳区3和所述待填充区4。所述容纳区3和所述待填充区4均为通过刻蚀所述材料层的各部分而形成在所述衬底1上的裸露区域。
所述材料层可以为亲水材料层。所述材料层可以包括聚酰亚胺树脂。可替代地，所述材料层可以为疏水材料层。例如，所述材料层可以包括氟化聚酰亚胺树脂。此外，所述材料层可以包括其它的亲水性材料，例如，SiO2、SiNx，相应地，可以采用沉积方法形成膜层。
应当理解的是，所述材料层的厚度(例如，所述第一肩部2 的高度)、所述容纳区3和所述待填充区4的尺寸需要与形成子像素的墨液的体积相匹配，可根据具体的应用情况对该参数进行计算，在此不再一一赘述。
需要说明的是，本发明实施例中所称的图形指的是通过构图工艺形成的各种结构。此外，本发明实施例中所称的构图工艺可以包括光刻胶涂布、掩模布置、曝光、显影、刻蚀、光刻胶剥离等中的部分或全部工艺。
在步骤S2中，通过构图工艺在所述待填充区4上的所述容纳区3外周侧形成凹槽6图形。
如图3所示，在经过步骤S1的衬底1上涂覆疏水材料层7。所述疏水材料层7可以覆盖所述容纳区3、所述待填充区4和所述第二肩部2。所述疏水材料层7的厚度可以大于所述第一肩部2的高度。例如，所述疏水材料层7可以为氟化聚酰亚胺树脂层。
如图4所示，通过对所述疏水材料层7进行构图工艺，暴露出所述容纳区3，并且在所述容纳区3的外周侧形成凹槽6的图形。通过对位于所述待填充区4的疏水材料层7进行构图工艺，可以在所述待填充区4中形成第二肩部5的图形，使得所述凹槽6形成在所述第一肩部2与所述第二肩部5之间。所述第一肩部2可以设置在所述凹槽6的靠近所述容纳区3的一侧，所述第二肩部5可以设置在所述凹槽6的远离所述容纳区3的一侧。
相邻两个容纳区3的相邻侧的两个凹槽6可以形成在该相邻两个容纳区3之间的待填充区4上。在所述待填充区4上，所述凹槽6可以形成在所述第二肩部5的两侧，并且与所述容纳区3相邻。
所述第二肩部5的高度可以大于所述第一肩部2的高度。所述凹槽6的靠近所述容纳区3的一侧的第一肩部2的高度可以低于所述凹槽6的远离所述容纳区3一侧的第二肩部5的高度。第二肩部5的高度可以等于所述疏水材料层7的高度。
本发明实施例中，参照图1，也可以通过一次构图工艺在衬底1上形成所述容纳区3和所述凹槽6的图形。例如，可以通过 一次构图工艺在衬底1上形成所述容纳区3、所述凹槽6、所述第一肩部2和所述第二肩部5的图形。
也就是说，在衬底1上形成疏水材料层，例如，氟化聚酰亚胺树脂层7，然后，可以通过对该疏水材料层执行一次构图工艺形成所述容纳区3和位于所述容纳区3外周侧的凹槽6的图形。例如，可以通过对该疏水材料层执行一次构图工艺形成所述容纳区3、所述凹槽6、所述第一肩部2和所述第二肩部5的图形。
应当理解的是，在所述制备有机电致发光显示基板的方法中，在衬底1上还可以继续制备其它功能层，在此不再一一赘述。
可以理解的是，以上实施方式仅仅是为了说明本发明的原理而采用的示例性实施方式，然而本发明并不局限于此。对于本领域内的普通技术人员而言，在不脱离本发明的精神和实质的情况下，可以做出各种变型和改进，这些变型和改进也视为落入本发明的保护范围。

Claims (20)

  1. 一种有机电致发光显示基板，包括设置在衬底上的用于限定子像素区域的像素界定层，其中
    所述像素界定层包括与子像素对应的容纳区和位于所述容纳区外周侧的凹槽。
  2. 如权利要求1所述的有机电致发光显示基板，其中，所述容纳区的体积等于用于形成所述子像素的墨液的体积。
  3. 如权利要求1所述的有机电致发光显示基板，其中，所述凹槽的体积小于用于形成所述子像素的喷墨打印机的一滴墨液的体积。
  4. 如权利要求1所述的有机电致发光显示基板，其中，所述像素界定层还包括界定所述容纳区的第一肩部以及与所述第一肩部一起界定所述凹槽的第二肩部。
  5. 如权利要求4所述的有机电致发光显示基板，其中，所述容纳区被所述第一肩部包围。
  6. 如权利要求4所述的有机电致发光显示基板，其中，所述第一肩部设置在所述凹槽的靠近所述容纳区的一侧，所述第二肩部设置在所述凹槽的远离所述容纳区的一侧。
  7. 如权利要求4所述的有机电致发光显示基板，其中，所述第一肩部的高度小于所述第二肩部的高度。
  8. 如权利要求4所述的有机电致发光显示基板，其中，所述第二肩部包括疏水材料。
  9. 如权利要求4所述的有机电致发光显示基板，其中，所述第一肩部包括疏水材料或亲水材料。
  10. 如权利要求8所述的有机电致发光显示基板，其中，所述疏水材料包括氟化聚酰亚胺树脂。
  11. 如权利要求9所述的有机电致发光显示基板，其中，所述疏水材料包括氟化聚酰亚胺树脂，所述亲水材料包括聚酰亚胺树脂、SiO2或SiNx。
  12. 一种有机电致发光显示面板，包括如权利要求1至11中任一项所述的有机电致发光显示基板。
  13. 一种有机电致发光显示装置，包括如权利要求12所述的有机电致发光显示面板。
  14. 一种制备有机电致发光显示基板的方法，包括：
    在衬底上通过构图工艺形成第一肩部的图形，以形成交替排列的容纳区和待填充区，其中所述第一肩部形成在所述容纳区和所述待填充区之间；以及
    通过构图工艺在所述待填充区上的所述容纳区外周侧形成凹槽的图形。
  15. 如权利要求14所述的方法，其中，每个容纳区被所述第一肩部包围，所述容纳区对应于所述有机电致发光显示基板的子像素。
  16. 如权利要求14所述方法，其中，形成凹槽的图形包括：在所述待填充区上形成疏水材料层，通过对所述疏水材料层进行构图工艺来形成凹槽的图形。
  17. 如权利要求14所述的方法，其中，形成凹槽的图形包括：
    在形成有所述第一肩部的图形的衬底上形成疏水材料层；以及
    对所述疏水材料层进行构图工艺，暴露出所述容纳区，并且在所述待填充区上的所述容纳区外周侧形成凹槽的图形。
  18. 如权利要求17所述的方法，其中，通过对位于所述待填充区的疏水材料层进行构图工艺，在所述待填充区上形成第二肩部的图形，使得所述凹槽形成在所述第一肩部与所述第二肩部之间。
  19. 如权利要求17所述的方法，其中，所述疏水材料层的厚度大于所述第一肩部的厚度。
  20. 如权利要求18所述的方法，其中，所述第二肩部的高度大于所述第一肩部的高度。
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