WO2019117186A1 - Protective equipment for substrate, and method for producing substrate having film - Google Patents

Protective equipment for substrate, and method for producing substrate having film Download PDF

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Publication number
WO2019117186A1
WO2019117186A1 PCT/JP2018/045622 JP2018045622W WO2019117186A1 WO 2019117186 A1 WO2019117186 A1 WO 2019117186A1 JP 2018045622 W JP2018045622 W JP 2018045622W WO 2019117186 A1 WO2019117186 A1 WO 2019117186A1
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WO
WIPO (PCT)
Prior art keywords
substrate
film
adhesive layer
main surface
protector
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PCT/JP2018/045622
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French (fr)
Japanese (ja)
Inventor
悦二 福井
Original Assignee
日本電気硝子株式会社
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Publication date
Application filed by 日本電気硝子株式会社 filed Critical 日本電気硝子株式会社
Priority to CN201880078244.8A priority Critical patent/CN111433388B/en
Priority to JP2019559685A priority patent/JP7222357B2/en
Publication of WO2019117186A1 publication Critical patent/WO2019117186A1/en

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

Definitions

  • the present invention relates to a protective device for a substrate and a method of manufacturing a film-coated substrate.
  • a functional film may be formed on only one of the main surfaces of the substrate.
  • the substrate protector by protecting the other main surface of the substrate with the substrate protector, it is possible to suppress the film formation of the functional film on the other main surface of the substrate.
  • wraparound of the film forming material to the main surface is prevented by using a jig having an attached surface that adheres to the peripheral portion of the main surface on the side other than the film formation target of the substrate.
  • An object of the present invention is to provide a protective device for a substrate capable of suitably forming a functional film only on one main surface of a substrate, and a method of manufacturing a film-coated substrate.
  • a substrate protector that solves the above problems is a substrate protector that protects the first main surface of a substrate having a first main surface and a second main surface opposite to the first main surface, A substrate sheet of a size capable of covering at least the peripheral edge of the substrate, an adhesive layer capable of adhering to the peripheral edge of the substrate, and a gap between the substrate sheet and the adhesive layer And a flexible spacer, and the base sheet has a through hole at a position surrounded by the adhesive layer and the spacer.
  • the substrate can be sucked through the through holes of the substrate sheet before the functional film is formed, and the peripheral portion of the substrate and the peripheral portion of the substrate sheet can be adhered by the adhesive layer. It can be suppressed that the film forming material wraps around at the time of film formation of the film and adheres to the peripheral portion of the first main surface of the substrate.
  • the substrate When the substrate is as thin as 0.05 to 1.5 mm, for example, even if the substrate is bent at the time of suction, the flexible spacer is also bent, so the adhesive layer may be peeled from the peripheral portion of the substrate. Absent.
  • the second main surface of the substrate does not have to be pressed with a jig or the like, so the cleanliness of the second main surface of the substrate can be easily maintained.
  • the method for producing a film-coated substrate that solves the above-mentioned problems is a method for producing a film-coated substrate using the above-mentioned protective device for a substrate, and the method for producing a film-coated substrate Preparing a film-forming substrate by suctioning the substrate and preparing a film-forming substrate in which the substrate protector adheres to the substrate; forming a functional film on the second main surface of the substrate in the film-forming substrate And a film forming process.
  • a functional film can be suitably formed only on one main surface of a substrate.
  • the substrate S protected using the substrate protector 11 has a first major surface S1 and a second major surface S2 opposite to the first major surface S1.
  • the substrate protector 11 protects the first main surface S1 of the substrate S.
  • the second main surface S2 of the substrate S in which the first main surface S1 is protected by the substrate protector 11 is the main surface on which a functional film is formed, and a functional film is formed on the second main surface S2.
  • a film-coated substrate is obtained.
  • a glass substrate is used as the substrate S, but for example, a resin substrate or a ceramic substrate can also be used.
  • the substrate protector 11 comprises a base material sheet 12 configured to be at least a size capable of covering the periphery of the substrate S, an adhesive layer 13 capable of adhering to the periphery of the substrate S, the base material sheet 12 and an adhesive And a flexible spacer 14 disposed between the layer 13.
  • Examples of the material of the base sheet 12 include polymeric materials such as resin materials or rubber materials, and metal materials.
  • resin materials include polyolefin resins, polyester resins, polyamide resins, and polyimide resins.
  • Examples of the rubber material include silicone rubber, urethane rubber, chloroprene rubber, styrene butadiene rubber, and ethylene propylene diene rubber.
  • As a metal material aluminum and stainless steel are mentioned, for example.
  • a heat-resistant substrate sheet that can withstand heat during film formation may be used.
  • the thickness of the base sheet 12 is, for example, in the range of 10 ⁇ m to 500 ⁇ m.
  • the adhesive layer 13 is formed in a continuous ring along the peripheral portion of the first major surface S1 of the substrate S.
  • the adhesive layer 13 can be composed of a known adhesive material. Examples of the adhesive layer 13 include silicone-based adhesive layers, acrylic adhesive layers, and urethane-based adhesive layers. For example, in the case where film formation of a functional film involves heating, a heat-resistant adhesive layer that can withstand heat during film formation may be used.
  • the adhesive layer 13 can be composed of an adhesive layer constituting one surface of the double-sided adhesive tape, or an adhesive layer formed by applying the spacer 14. In the present embodiment, the adhesive layer 13 is provided on the spacer 14 by bonding the double-sided adhesive tape to the spacer 14. That is, the adhesive layer 13 adheres to the spacer 14.
  • the support of the double-sided pressure-sensitive adhesive tape and the pressure-sensitive adhesive layer (pressure-sensitive adhesive layer which adheres the support to the spacer 14) constituting the other surface of the double-sided pressure-sensitive adhesive tape are omitted.
  • the support of the double-sided pressure-sensitive adhesive tape is made of, for example, a resin film such as a polyimide film or a PET film.
  • the adhesion of the adhesive layer 13 to the substrate S is, for example, as weak as 3.0 (N / 25 mm width) or less so that the adhesive layer 13 can be easily peeled off from the substrate S after the functional film is formed. It is preferred to be sticky.
  • the lower limit of the adhesive strength of the adhesive layer 13 to the substrate S is preferably 0.05 (N / 25 mm width) or more in order to easily ensure the adhesion to the substrate S.
  • the adhesive force of the adhesive layer 13 is measured in accordance with the 180 ° peel test defined in JIS Z0237 (2009). JIS Z0237 (2009) corresponds to the international standards ISO 29862: 2007, ISO 29863: 2007 and ISO 29864: 2007.
  • the base sheet 12 has through holes 12 a at positions surrounded by the adhesive layer 13 and the spacers 14. If it explains in full detail, the upper surface surrounded by adhesion layer 13 and spacer 14 in substrate sheet 12 is an exposure side, and has opposed to the 1st principal surface S1 of substrate S.
  • the through hole 12 a of the base sheet 12 is used as an air discharge hole for discharging the air between the substrate S and the base sheet 12 when the substrate protector 11 is attached to the substrate S.
  • the number of through holes 12a may be singular as in the present embodiment or may be changed to a plurality.
  • the shape of the through hole 12a may be rectangular as in the present embodiment, or may be changed to, for example, a circular shape.
  • the area of the through holes 12 a is preferably, for example, in the range of 5% to 50% when the area of the base sheet 12 is 100%. As the area of the through hole 12a is larger, the function as the air discharge hole is more easily exhibited. As the area of the through hole 12a is smaller, the first main surface S1 of the substrate S can be covered wider by the base sheet 12, and thus the cleanliness of the first main surface S1 can be easily maintained.
  • the through hole 12 a is preferably formed at a position closer to the center of the base sheet 12 than the adhesive layer 13 and the spacer 14 in plan view of the base sheet 12. In this case, the air between the substrate S and the base sheet 12 can be discharged in a well-balanced manner.
  • the spacer 14 is formed in a continuous ring along the peripheral edge of the first major surface S1 of the substrate S.
  • a flexible material which comprises the spacer 14 a woven fabric or a nonwoven fabric, a polymeric material, and a rubber material are mentioned, for example.
  • the woven or non-woven fabric include glass cloth.
  • the rubber material include silicone rubber, urethane rubber, chloroprene rubber, styrene butadiene rubber, and ethylene propylene diene rubber.
  • the spacer 14 may have a single layer structure or a multilayer structure made of the same or different materials. For example, in the case where deposition of a functional film involves heating, a spacer that can withstand heat during deposition may be used.
  • the spacer 14 can be fixed to the base sheet 12 with a known adhesive or pressure sensitive adhesive.
  • the spacer 14 may be fixed to the base sheet 12 using, for example, a single-sided adhesive tape (glass cloth tape or the like) having the spacer 14 as a support.
  • the thickness of the spacer 14 is, for example, in the range of 150 ⁇ m to 5 mm. It is preferable that the spacer 14 be thicker than the adhesive layer 13 in a state before the substrate protector 11 is attached to the substrate S, that is, in a state where the substrate protector 11 does not receive a load.
  • the method for manufacturing a film-coated substrate includes the steps of preparing a film-forming substrate SA having the substrate S and the substrate protective device 11 by attaching the substrate protective device 11 to the substrate S; And a film forming step of forming a functional film on the second main surface S2 of the substrate S in the film formation substrate SA.
  • the preparation step the substrate S is sucked through the through holes 12 a of the substrate sheet 12 of the substrate protective member 11 to prepare a film forming substrate in which the substrate protective member 11 and the substrate S adhere.
  • a suction device 15 is used to suction the substrate S.
  • the suction device 15 is opened in the decompression chamber 16, the exhaust unit 17 for exhausting the air in the decompression chamber 16, the placement surface 18 on which the substrate protective member 11 is placed, and the deposition surface 18.
  • a well-known vacuum pump (not shown) is connected to the exhaust unit 17.
  • the substrate protection device 11 is placed on the mounting surface 18 of the suction device 15 so that the adhesive layer 13 of the substrate protection device 11 faces upward.
  • the substrate S is placed on the adhesive layer 13 of the substrate protector 11.
  • the air in the decompression chamber 16 of the suction device 15 is exhausted from the exhaust unit 17.
  • the suction unit 19 of the suction device 15 sucks the air between the substrate sheet 12 of the substrate protector 11 and the substrate S through the through holes 12 a of the substrate sheet 12 of the substrate protector 11.
  • the substrate protection device 11 can be attached to the substrate S by pressing the substrate S against the adhesive layer 13 of the substrate protection device 11.
  • the flat substrate S is curved so as to be convex toward the suction device 15. May.
  • a glass substrate having a thickness of 0.05 to 1.5 mm is used as the flat substrate S, such bending tends to occur easily.
  • the flexible spacer 14 is also bent, so the adhesive layer 13 is not peeled off from the peripheral portion of the substrate S.
  • the functional film is formed on the second main surface S2 of the substrate S attached to the substrate protector 11 to produce a film-coated substrate.
  • a known film forming method such as a PVD (Physical Vapor Deposition) method such as a sputtering method, a CVD (Chemical Vapor Deposition) method, a coating method such as a spray or spin coating is used. be able to.
  • a coating method such as a spray or spin coating.
  • the film forming material for forming the functional film F may be an inorganic material or an organic material.
  • the film forming process may be performed in any posture in which the second main surface S2 of the film formation substrate SA is horizontal, vertical, or inclined neither horizontal nor vertical.
  • the shape of the substrate sheet 12 of the substrate protector 11 is the substrate sheet 12 It may be changed so as to protrude outward from the substrate S, and the film formation substrate SA may be suspended using the protruding portion.
  • the film-coated substrate SF obtained in the film forming step has a functional film F provided on the second main surface S2 of the substrate S, and the adhesive layer of the substrate protective member 11 Removed from 13.
  • the substrate protector 11 after the film forming process can also be used repeatedly for the production of another film-coated substrate SF.
  • the plurality of protection devices 11 for a substrate are stored together in a compact size by overlapping in the thickness direction. be able to.
  • the substrate protector 11 comprises a substrate sheet 12 of a size capable of covering at least the periphery of the substrate S, an adhesive layer 13 capable of adhering to the periphery of the substrate S, and a substrate sheet And a flexible spacer 14 disposed between the adhesive layer 13 and the adhesive layer 13.
  • the base sheet 12 has a through hole 12 a at a position surrounded by the adhesive layer 13 and the spacer 14.
  • the substrate S is sucked through the through holes 12 a of the base sheet 12 before the functional film F is formed, and the adhesive layer 13 adheres the peripheral part of the substrate S and the peripheral part of the base sheet 12 It is possible to suppress adhesion of the film forming material to the peripheral portion of the first main surface S1 of the substrate S during film formation of the functional film F.
  • the flexible spacer 14 is also flexed even if the substrate S is flexed at the time of suction. 13 will not peel off.
  • the substrate protective tool 11 since the second main surface S2 of the substrate S does not have to be pressed by a jig or the like, the cleanliness of the second main surface S2 of the substrate S is maintained. easy.
  • the functional film F can be suitably formed only on the second main surface S2 of the substrate S.
  • the adhesive layer 13 of the substrate protector 11 is annularly formed. In this case, it can be further suppressed that the film forming material wraps around at the time of forming the functional film F and adheres to the peripheral portion of the first main surface S1 of the substrate S. Therefore, the functional film F can be more suitably formed only on the second main surface S2 of the substrate S.
  • the adhesive layer 13 of the substrate protector 11 is formed so as to be adhesive not only on the entire surface of the substrate S but only on the peripheral portion of the substrate S, the substrate protector 11 adheres excessively to the substrate S Therefore, after the formation of the functional film F, the substrate protector 11 can be easily peeled off from the substrate S. Further, since the adhesive layer 13 is formed so as to be adhesive only on the peripheral portion of the substrate S, not on the entire surface of the substrate S, the adhesive is in a range that affects the performance of the substrate S on the first main surface S1 of the substrate S It can be avoided to be transferred.
  • the substrate S is sucked through the through holes 12 a of the substrate sheet 12 of the substrate protective member 11, and the substrate protective member 11 adheres to the substrate S And a film forming process of forming the functional film F on the second major surface S2 of the substrate S in the film forming substrate SA.
  • the spacer 14 of the substrate protector 11 of the above embodiment is fixed to the substrate sheet 12 of the substrate protector 11, but is disposed so as to overlap the substrate sheet 12 without being fixed to the substrate sheet 12.
  • it may be fixed to the mounting surface 18 of the suction device 15.
  • the adhesive layer 13 of the substrate protector 11 may be formed in a shape other than an annular shape.
  • the adhesive layer 13 of the substrate protector 11 can be changed to, for example, a plurality of adhesive layers corresponding to two opposing sides of the substrate S.
  • the shape of the substrate S is not limited to a flat plate, and may be a curved plate.
  • the outer shape of the substrate protector 11 can be appropriately changed according to the outer shape of the substrate S.
  • the suction device 15 may be changed so that the plurality of substrate protectors 11 and the plurality of substrates S can be placed. That is, the number of suction units 19 of the suction device 15 can be changed in accordance with the number of the substrate protectors 11 (substrates S) mounted on the mounting surface 18 of the suction device 15.
  • the same suction device 15 can be used for a substrate smaller than the substrate S shown in FIG. That is, even if the size of the substrate S is changed, the same suction device 15 can be used.
  • the plurality of protection devices 11 for a substrate and the plurality of substrates S can be adhered. That is, since a plurality of film formation substrates SA can be obtained by one suction operation of the suction device 15, the working efficiency of the preparation process of preparing the film formation substrates SA can be enhanced.
  • the plurality of substrate protectors 11 may be configured as a connected body 20 to which the plurality of substrate protectors 11 are coupled.
  • the plurality of substrate protectors 11 are connected using the base sheet 12, but they may be connected using the spacer 14, or by separately providing a connecting material such as a tape material. It may be linked.
  • the plurality of film formation substrates SA can be handled integrally by using the connected body 20, for example, an operation of carrying in the plurality of film formation substrates SA to the film formation apparatus used in the film formation process or It is possible to enhance the efficiency of the unloading operation. Further, by using the connector 20, it becomes easy to suspend and arrange the plurality of film formation substrates SA.

Abstract

Protective equipment (11) for a substrate is provided with a base-material sheet (12) configured in a size that enables covering of at least a peripheral edge part of a substrate (S), an adhesive layer (13) capable of adhering to the peripheral edge part of the substrate (S), and a flexible spacer (14) disposed between the base-material sheet (12) and the adhesive layer (13). The base-material sheet (12) has a through-hole (12a) at a position surrounded by the adhesive layer (13) and the spacer (14). A method for producing a substrate having a film is provided with: a preparation step for suctioning a substrate (S) through a through-hole (12a) in a base-material sheet (12) of protective equipment (11) for a substrate, and preparing a film-formation substrate in which the substrate (S) and the protective equipment (11) for a substrate are bonded together; and a film formation step for forming a functional film on a second main surface (S2) of the substrate (S) in the film-formation substrate.

Description

基板用保護具、及び膜付き基板の製造方法Protective device for substrate, and method of manufacturing substrate with film
 本発明は、基板用保護具、及び膜付き基板の製造方法に関する。 The present invention relates to a protective device for a substrate and a method of manufacturing a film-coated substrate.
 ガラス基板等の基板の両主面のうち、基板の一方の主面のみに機能性膜を成膜する場合がある。この場合、基板の他方の主面を基板用保護具により保護することで、基板の他方の主面における機能性膜の成膜を抑えることができる。例えば、特許文献1では、基板の成膜対象ではない側の主面における周縁部に付着する付着面を有する治具を用いることで、当該主面への成膜材料の回り込みを防いでいる。 Among the main surfaces of a substrate such as a glass substrate, a functional film may be formed on only one of the main surfaces of the substrate. In this case, by protecting the other main surface of the substrate with the substrate protector, it is possible to suppress the film formation of the functional film on the other main surface of the substrate. For example, in Patent Document 1, wraparound of the film forming material to the main surface is prevented by using a jig having an attached surface that adheres to the peripheral portion of the main surface on the side other than the film formation target of the substrate.
特開2016-197623号公報JP, 2016-197623, A
 上記従来技術のように、基板の一方の主面のみに機能性膜を成膜する際に、成膜材料の回り込みによる基板の他方の主面周縁部への成膜材料の付着を抑える技術について未だ改善の余地がある。 As in the prior art, when forming a functional film only on one main surface of a substrate, a technique for suppressing adhesion of the film forming material to the other main surface peripheral portion of the substrate due to wraparound of the film forming material There is still room for improvement.
 本発明の目的は、基板の一方の主面のみに機能性膜を好適に成膜することのできる基板用保護具、及び膜付き基板の製造方法を提供することにある。 An object of the present invention is to provide a protective device for a substrate capable of suitably forming a functional film only on one main surface of a substrate, and a method of manufacturing a film-coated substrate.
 上記課題を解決する基板用保護具は、第1主面と、前記第1主面の反対側の第2主面とを有する基板の前記第1主面を保護する基板用保護具であって、少なくとも前記基板の周縁部を覆うことが可能なサイズに構成された基材シートと、前記基板の周縁部に粘着可能な粘着層と、前記基材シートと前記粘着層との間に配置される可撓性のスペーサーと、を備え、前記基材シートは、前記粘着層及び前記スペーサーにより囲まれる位置に貫通孔を有する。 A substrate protector that solves the above problems is a substrate protector that protects the first main surface of a substrate having a first main surface and a second main surface opposite to the first main surface, A substrate sheet of a size capable of covering at least the peripheral edge of the substrate, an adhesive layer capable of adhering to the peripheral edge of the substrate, and a gap between the substrate sheet and the adhesive layer And a flexible spacer, and the base sheet has a through hole at a position surrounded by the adhesive layer and the spacer.
 この構成によれば、機能性膜の成膜前に基材シートの貫通孔を通じて基板を吸引し、粘着層により基板の周縁部と基材シートの周縁部とを粘着することができ、機能性膜の成膜時に成膜材料が回り込んで基板の第1主面の周縁部に付着することを抑制できる。 According to this configuration, the substrate can be sucked through the through holes of the substrate sheet before the functional film is formed, and the peripheral portion of the substrate and the peripheral portion of the substrate sheet can be adhered by the adhesive layer. It can be suppressed that the film forming material wraps around at the time of film formation of the film and adheres to the peripheral portion of the first main surface of the substrate.
 また、基板が、例えば0.05~1.5mmと薄い場合には、吸引時に基板が撓んだとしても、可撓性のスペーサーも撓むため、基板の周縁部から粘着層が剥がれることがない。また、基板に基板用保護具を取り付ける際に、基板の第2主面を治具等で押圧しなくてもよいため、基板の第2主面の清浄性が保たれ易い。 When the substrate is as thin as 0.05 to 1.5 mm, for example, even if the substrate is bent at the time of suction, the flexible spacer is also bent, so the adhesive layer may be peeled from the peripheral portion of the substrate. Absent. In addition, when attaching the substrate protective tool to the substrate, the second main surface of the substrate does not have to be pressed with a jig or the like, so the cleanliness of the second main surface of the substrate can be easily maintained.
 上記課題を解決する膜付き基板の製造方法は、上記基板用保護具を用いて膜付き基板を製造する膜付き基板の製造方法であって、前記基板用保護具の基材シートの貫通孔を通じて基板を吸引し、前記基板用保護具と前記基板とが粘着した成膜用基板を準備する準備工程と、前記成膜用基板における前記基板の前記第2主面に機能性膜を成膜する成膜工程とを備える。 The method for producing a film-coated substrate that solves the above-mentioned problems is a method for producing a film-coated substrate using the above-mentioned protective device for a substrate, and the method for producing a film-coated substrate Preparing a film-forming substrate by suctioning the substrate and preparing a film-forming substrate in which the substrate protector adheres to the substrate; forming a functional film on the second main surface of the substrate in the film-forming substrate And a film forming process.
 本発明によれば、基板の一方の主面のみに機能性膜を好適に成膜することができる。 According to the present invention, a functional film can be suitably formed only on one main surface of a substrate.
実施形態における基板用保護具を示す分解斜視図である。It is an exploded perspective view showing a substrate protector in an embodiment. 成膜用基板を示す斜視図である。It is a perspective view which shows the film-forming substrate. 成膜用基板の準備工程を説明する斜視図である。It is a perspective view explaining the preparatory process of the film-forming substrate. 成膜用基板の準備工程を説明する端面図である。It is an end elevation explaining the preparation process of the substrate for membrane formation. 成膜用基板の準備工程を説明する端面図である。It is an end elevation explaining the preparation process of the substrate for membrane formation. 基板用保護具及び膜付き基板を示す斜視図である。It is a perspective view which shows the protection tool for board | substrates, and a board | substrate with a film | membrane. 成膜用基板の準備工程の変更例を説明する斜視図である。It is a perspective view explaining the example of a change of the preparation process of the substrate for membrane formation. 成膜用基板の準備工程の変更例を説明する斜視図である。It is a perspective view explaining the example of a change of the preparation process of the substrate for membrane formation.
 以下、本発明の基板用保護具、及び膜付き基板の製造方法の実施形態について図面を参照して説明する。なお、図面では、説明の便宜上、構成の一部(例えば、厚さ)を誇張して示す場合がある。また、各部分の寸法比率についても、実際と異なる場合がある。 BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the protective device for a substrate and the method for producing a film-coated substrate of the present invention will be described below with reference to the drawings. In the drawings, for convenience of explanation, a part (for example, thickness) of the configuration may be exaggerated and shown. Also, the dimensional ratio of each part may be different from the actual one.
 図1に示すように、基板用保護具11を用いて保護する基板Sは、第1主面S1と、第1主面S1の反対側の第2主面S2とを有している。基板用保護具11は、基板Sの第1主面S1を保護する。第1主面S1が基板用保護具11で保護された基板Sの第2主面S2は、機能性膜が成膜される主面であり、この第2主面S2に機能性膜を成膜することで、膜付き基板が得られる。本実施形態では、基板Sとしてガラス基板を用いているが、例えば、樹脂基板やセラミック基板を用いることもできる。 As shown in FIG. 1, the substrate S protected using the substrate protector 11 has a first major surface S1 and a second major surface S2 opposite to the first major surface S1. The substrate protector 11 protects the first main surface S1 of the substrate S. The second main surface S2 of the substrate S in which the first main surface S1 is protected by the substrate protector 11 is the main surface on which a functional film is formed, and a functional film is formed on the second main surface S2. By filming, a film-coated substrate is obtained. In the present embodiment, a glass substrate is used as the substrate S, but for example, a resin substrate or a ceramic substrate can also be used.
 基板用保護具11は、少なくとも基板Sの周縁部を覆うことが可能なサイズに構成された基材シート12と、基板Sの周縁部に粘着可能な粘着層13と、基材シート12と粘着層13との間に配置される可撓性のスペーサー14とを備えている。 The substrate protector 11 comprises a base material sheet 12 configured to be at least a size capable of covering the periphery of the substrate S, an adhesive layer 13 capable of adhering to the periphery of the substrate S, the base material sheet 12 and an adhesive And a flexible spacer 14 disposed between the layer 13.
 基材シート12の材料としては、例えば、樹脂材料又はゴム材料等の高分子材料、及び金属材料が挙げられる。樹脂材料としては、例えば、ポリオレフィン樹脂、ポリエステル樹脂、ポリアミド樹脂、及びポリイミド樹脂が挙げられる。ゴム材料としては、例えば、シリコンゴム、ウレタンゴム、クロロプレンゴム、スチレン・ブタジエンゴム、及びエチレン・プロピレン・ジエンゴムが挙げられる。金属材料としては、例えば、アルミニウム、及びステンレス鋼が挙げられる。例えば、機能性膜の成膜が加熱を伴う場合、成膜時の熱に耐え得る耐熱性の基材シートを用いればよい。基材シート12の厚さは、例えば、10μm以上、500μm以下の範囲である。 Examples of the material of the base sheet 12 include polymeric materials such as resin materials or rubber materials, and metal materials. Examples of resin materials include polyolefin resins, polyester resins, polyamide resins, and polyimide resins. Examples of the rubber material include silicone rubber, urethane rubber, chloroprene rubber, styrene butadiene rubber, and ethylene propylene diene rubber. As a metal material, aluminum and stainless steel are mentioned, for example. For example, in the case where film formation of a functional film involves heating, a heat-resistant substrate sheet that can withstand heat during film formation may be used. The thickness of the base sheet 12 is, for example, in the range of 10 μm to 500 μm.
 粘着層13は、基板Sの第1主面S1における周縁部に沿って連続する環状に形成されている。粘着層13は、周知の粘着材料から構成することができる。粘着層13としては、例えば、シリコーン系粘着層、アクリル系粘着層、及びウレタン系粘着層が挙げられる。例えば、機能性膜の成膜が加熱を伴う場合、成膜時の熱に耐え得る耐熱性の粘着層を用いればよい。粘着層13は、両面粘着テープの一方の面を構成する粘着層や、スペーサー14に塗布することで形成した粘着層から構成することができる。本実施形態では、両面粘着テープをスペーサー14に貼り合わせることでスペーサー14に粘着層13を設けている。すなわち、粘着層13は、スペーサー14に粘着している。 The adhesive layer 13 is formed in a continuous ring along the peripheral portion of the first major surface S1 of the substrate S. The adhesive layer 13 can be composed of a known adhesive material. Examples of the adhesive layer 13 include silicone-based adhesive layers, acrylic adhesive layers, and urethane-based adhesive layers. For example, in the case where film formation of a functional film involves heating, a heat-resistant adhesive layer that can withstand heat during film formation may be used. The adhesive layer 13 can be composed of an adhesive layer constituting one surface of the double-sided adhesive tape, or an adhesive layer formed by applying the spacer 14. In the present embodiment, the adhesive layer 13 is provided on the spacer 14 by bonding the double-sided adhesive tape to the spacer 14. That is, the adhesive layer 13 adheres to the spacer 14.
 なお、図面では、両面粘着テープの支持体、及び両面粘着テープの他方の面を構成する粘着層(支持体をスペーサー14に粘着する粘着層)については省略している。両面粘着テープの支持体は、例えば、ポリイミドフィルムやPETフィルム等の樹脂フィルムから構成されている。 In the drawing, the support of the double-sided pressure-sensitive adhesive tape and the pressure-sensitive adhesive layer (pressure-sensitive adhesive layer which adheres the support to the spacer 14) constituting the other surface of the double-sided pressure-sensitive adhesive tape are omitted. The support of the double-sided pressure-sensitive adhesive tape is made of, for example, a resin film such as a polyimide film or a PET film.
 粘着層13の基板Sに対する粘着力は、機能性膜の成膜後において基板Sから粘着層13を容易に剥離させることができるように、例えば、3.0(N/25mm幅)以下の弱粘着性であることが好ましい。なお、粘着層13の基板Sに対する粘着力の下限は、基板Sに対する密着性を確保し易くするため、0.05(N/25mm幅)以上であることが好ましい。粘着層13の粘着力は、JIS Z0237(2009)に規定される180°剥離試験に準拠して測定される。なお、JIS Z0237(2009)は、国際規格のISO 29862:2007、ISO 29863:2007及びISO 29864:2007に対応している。 The adhesion of the adhesive layer 13 to the substrate S is, for example, as weak as 3.0 (N / 25 mm width) or less so that the adhesive layer 13 can be easily peeled off from the substrate S after the functional film is formed. It is preferred to be sticky. The lower limit of the adhesive strength of the adhesive layer 13 to the substrate S is preferably 0.05 (N / 25 mm width) or more in order to easily ensure the adhesion to the substrate S. The adhesive force of the adhesive layer 13 is measured in accordance with the 180 ° peel test defined in JIS Z0237 (2009). JIS Z0237 (2009) corresponds to the international standards ISO 29862: 2007, ISO 29863: 2007 and ISO 29864: 2007.
 図1、図2及び図4に示すように、基材シート12は、粘着層13及びスペーサー14により囲まれる位置に貫通孔12aを有している。詳述すると、基材シート12において粘着層13及びスペーサー14により囲まれる上面は、露出面であり、基板Sの第1主面S1に対向している。基材シート12の貫通孔12aは、基板用保護具11を基板Sに取り付ける際に、基板Sと基材シート12との間の空気を排出するための空気排出孔として用いられる。貫通孔12aの数は、本実施形態のように単数であってもよいし、複数に変更してもよい。貫通孔12aの形状は、本実施形態のように四角形状であってもよいし、例えば、円形状に変更してもよい。貫通孔12aの面積は、基材シート12の面積を100%としたとき、例えば、5%以上、50%以下の範囲であることが好ましい。貫通孔12aの面積が大きいほど、空気排出孔としての機能がより発揮され易くなる。貫通孔12aの面積が小さいほど、基板Sの第1主面S1を基材シート12でより広く覆うことができるため、第1主面S1の清浄性が保たれ易くなる。貫通孔12aは、基材シート12の平面視で粘着層13及びスペーサー14よりも基材シート12の中央に近い位置に形成されていることが好ましい。この場合、基板Sと基材シート12との間の空気を全体にバランスよく排出することができる。 As shown in FIGS. 1, 2 and 4, the base sheet 12 has through holes 12 a at positions surrounded by the adhesive layer 13 and the spacers 14. If it explains in full detail, the upper surface surrounded by adhesion layer 13 and spacer 14 in substrate sheet 12 is an exposure side, and has opposed to the 1st principal surface S1 of substrate S. The through hole 12 a of the base sheet 12 is used as an air discharge hole for discharging the air between the substrate S and the base sheet 12 when the substrate protector 11 is attached to the substrate S. The number of through holes 12a may be singular as in the present embodiment or may be changed to a plurality. The shape of the through hole 12a may be rectangular as in the present embodiment, or may be changed to, for example, a circular shape. The area of the through holes 12 a is preferably, for example, in the range of 5% to 50% when the area of the base sheet 12 is 100%. As the area of the through hole 12a is larger, the function as the air discharge hole is more easily exhibited. As the area of the through hole 12a is smaller, the first main surface S1 of the substrate S can be covered wider by the base sheet 12, and thus the cleanliness of the first main surface S1 can be easily maintained. The through hole 12 a is preferably formed at a position closer to the center of the base sheet 12 than the adhesive layer 13 and the spacer 14 in plan view of the base sheet 12. In this case, the air between the substrate S and the base sheet 12 can be discharged in a well-balanced manner.
 スペーサー14は、基板Sの第1主面S1における周縁部に沿って連続する環状に形成されている。スペーサー14を構成する可撓性の材料としては、例えば、織布又は不織布、高分子材料、及びゴム材料が挙げられる。織布又は不織布としては、例えば、ガラスクロスが挙げられる。ゴム材料としては、例えば、シリコンゴム、ウレタンゴム、クロロプレンゴム、スチレン・ブタジエンゴム、及びエチレン・プロピレン・ジエンゴムが挙げられる。スペーサー14は、単層構造であってもよいし、同種又は異種の材料から構成した多層構造であってもよい。例えば、機能性膜の成膜が加熱を伴う場合、成膜時の熱に耐え得るスペーサーを用いればよい。スペーサー14は、基材シート12に周知の接着剤又は粘着剤で固定することができる。スペーサー14は、例えば、スペーサー14を支持体として構成された片面粘着テープ(ガラスクロステープ等)を用いて基材シート12に固定されてもよい。スペーサー14の厚さは、例えば、150μm~5mmの範囲である。スペーサー14は、基板Sに基板用保護具11が取り付けられる前の状態、すなわち基板用保護具11が荷重を受けていない状態において、粘着層13よりも厚く構成されることが好ましい。 The spacer 14 is formed in a continuous ring along the peripheral edge of the first major surface S1 of the substrate S. As a flexible material which comprises the spacer 14, a woven fabric or a nonwoven fabric, a polymeric material, and a rubber material are mentioned, for example. Examples of the woven or non-woven fabric include glass cloth. Examples of the rubber material include silicone rubber, urethane rubber, chloroprene rubber, styrene butadiene rubber, and ethylene propylene diene rubber. The spacer 14 may have a single layer structure or a multilayer structure made of the same or different materials. For example, in the case where deposition of a functional film involves heating, a spacer that can withstand heat during deposition may be used. The spacer 14 can be fixed to the base sheet 12 with a known adhesive or pressure sensitive adhesive. The spacer 14 may be fixed to the base sheet 12 using, for example, a single-sided adhesive tape (glass cloth tape or the like) having the spacer 14 as a support. The thickness of the spacer 14 is, for example, in the range of 150 μm to 5 mm. It is preferable that the spacer 14 be thicker than the adhesive layer 13 in a state before the substrate protector 11 is attached to the substrate S, that is, in a state where the substrate protector 11 does not receive a load.
 次に、膜付き基板の製造方法について説明する。
 図2に示すように、膜付き基板の製造方法は、基板Sに基板用保護具11を取り付けることで、基板Sと基板用保護具11とを有する成膜用基板SAを準備する準備工程と、成膜用基板SAにおける基板Sの第2主面S2に機能性膜を成膜する成膜工程とを備えている。準備工程では、基板用保護具11の基材シート12の貫通孔12aを通じて基板Sを吸引し、基板用保護具11と基板Sとが粘着した成膜用基板を準備する。
Next, a method of manufacturing the film-coated substrate will be described.
As shown in FIG. 2, the method for manufacturing a film-coated substrate includes the steps of preparing a film-forming substrate SA having the substrate S and the substrate protective device 11 by attaching the substrate protective device 11 to the substrate S; And a film forming step of forming a functional film on the second main surface S2 of the substrate S in the film formation substrate SA. In the preparation step, the substrate S is sucked through the through holes 12 a of the substrate sheet 12 of the substrate protective member 11 to prepare a film forming substrate in which the substrate protective member 11 and the substrate S adhere.
 図3及び図5に示すように、本実施形態の準備工程では、基板Sを吸引するために吸引装置15が用いられる。吸引装置15は、減圧室16と、減圧室16内の空気を排気する排気部17と、基板用保護具11が載置される載置面18と、載置面18に開口するとともに減圧室16の外部の空気を吸引する吸引部19とを備えている。排気部17には、図示を省略した周知の真空ポンプが接続される。 As shown in FIG. 3 and FIG. 5, in the preparation process of the present embodiment, a suction device 15 is used to suction the substrate S. The suction device 15 is opened in the decompression chamber 16, the exhaust unit 17 for exhausting the air in the decompression chamber 16, the placement surface 18 on which the substrate protective member 11 is placed, and the deposition surface 18. And a suction unit 19 for suctioning 16 external air. A well-known vacuum pump (not shown) is connected to the exhaust unit 17.
 準備工程において成膜用基板SAを得るには、まず基板用保護具11の粘着層13が上向きとなるように、基板用保護具11を吸引装置15の載置面18に載置した後、その基板用保護具11の粘着層13上に基板Sを載置する。 In order to obtain the film formation substrate SA in the preparation step, first, the substrate protection device 11 is placed on the mounting surface 18 of the suction device 15 so that the adhesive layer 13 of the substrate protection device 11 faces upward. The substrate S is placed on the adhesive layer 13 of the substrate protector 11.
 次に、図5に示すように、吸引装置15の減圧室16内の空気を排気部17から排気する。これにより、吸引装置15の吸引部19は、基板用保護具11の基材シート12における貫通孔12aを通じて、基板用保護具11の基材シート12と基板Sとの間の空気を吸引する。これにより、基板Sが基板用保護具11の粘着層13に押し付けられることで、基板Sに基板用保護具11を取り付けることができる。 Next, as shown in FIG. 5, the air in the decompression chamber 16 of the suction device 15 is exhausted from the exhaust unit 17. As a result, the suction unit 19 of the suction device 15 sucks the air between the substrate sheet 12 of the substrate protector 11 and the substrate S through the through holes 12 a of the substrate sheet 12 of the substrate protector 11. Thus, the substrate protection device 11 can be attached to the substrate S by pressing the substrate S against the adhesive layer 13 of the substrate protection device 11.
 ここで、吸引装置15を用いて基板用保護具11の基材シート12と基板Sとの間の空気を吸引した際に、平板状の基板Sが吸引装置15側に凸となるように湾曲する場合がある。例えば、平板状の基板Sとして、厚さが0.05~1.5mmのガラス基板を用いる場合、このような湾曲が起きやすい傾向がある。しかし、吸引装置15による吸引により基板Sが撓んだとしても、可撓性のスペーサー14も撓むため、基板Sの周縁部から粘着層13が剥がれることがない。 Here, when air between the substrate sheet 12 of the substrate protector 11 and the substrate S is sucked using the suction device 15, the flat substrate S is curved so as to be convex toward the suction device 15. May. For example, when a glass substrate having a thickness of 0.05 to 1.5 mm is used as the flat substrate S, such bending tends to occur easily. However, even if the substrate S is bent by suction by the suction device 15, the flexible spacer 14 is also bent, so the adhesive layer 13 is not peeled off from the peripheral portion of the substrate S.
 基板用保護具11に取り付けられた基板Sの第2主面S2に機能性膜を成膜することによって膜付き基板が作製される。膜付き基板SFの製造方法における成膜工程では、スパッタリング法等のPVD(Physical Vapor Deposition)法、CVD(Chemical Vapor Deposition)法、スプレー、スピンコート等のコーティング法等の周知の成膜法を用いることができる。機能性膜F(図6参照)としては、例えば、所定の光学的特性を有する膜(誘電体膜等)、所定の機械的特性を有する膜、所定の化学的特性を有する膜、及び所定の色を有する膜が挙げられる。機能性膜Fを形成するための成膜材料は、無機材料であってもよいし、有機材料であってもよい。 The functional film is formed on the second main surface S2 of the substrate S attached to the substrate protector 11 to produce a film-coated substrate. In the film forming process in the method of manufacturing the film-coated substrate SF, a known film forming method such as a PVD (Physical Vapor Deposition) method such as a sputtering method, a CVD (Chemical Vapor Deposition) method, a coating method such as a spray or spin coating is used. be able to. As the functional film F (see FIG. 6), for example, a film having a predetermined optical property (dielectric film etc.), a film having a predetermined mechanical property, a film having a predetermined chemical property, and a predetermined film The film which has a color is mentioned. The film forming material for forming the functional film F may be an inorganic material or an organic material.
 成膜工程は、成膜用基板SAの第2主面S2が水平となる姿勢、垂直となる姿勢、又は水平でも垂直でもない傾斜した姿勢のいずれの姿勢で行ってもよい。例えば、成膜用基板SAの第2主面S2が垂直となる姿勢に成膜用基板SAを配置する場合であれば、基板用保護具11の基材シート12の形状を基材シート12が基板Sよりも外方に突出するように変更し、その突出部分を利用して成膜用基板SAを吊り下げてもよい。 The film forming process may be performed in any posture in which the second main surface S2 of the film formation substrate SA is horizontal, vertical, or inclined neither horizontal nor vertical. For example, in the case of disposing the film formation substrate SA in a posture in which the second main surface S2 of the film formation substrate SA is vertical, the shape of the substrate sheet 12 of the substrate protector 11 is the substrate sheet 12 It may be changed so as to protrude outward from the substrate S, and the film formation substrate SA may be suspended using the protruding portion.
 図6に示すように、成膜工程で得られた膜付き基板SFは、基板Sの第2主面S2に設けられた機能性膜Fを有しており、基板用保護具11の粘着層13から取り外される。
 成膜工程後の基板用保護具11は、別の膜付き基板SFの製造に繰り返し使用することもできる。また、基板用保護具11が複数ある場合でも、基板用保護具11の厚さが比較的薄いため、複数の基板用保護具11を厚さ方向に重ね合わせることで、コンパクトにまとめて保管することができる。
As shown in FIG. 6, the film-coated substrate SF obtained in the film forming step has a functional film F provided on the second main surface S2 of the substrate S, and the adhesive layer of the substrate protective member 11 Removed from 13.
The substrate protector 11 after the film forming process can also be used repeatedly for the production of another film-coated substrate SF. In addition, even when there are a plurality of protection devices 11 for a substrate, since the thickness of the protection device 11 for a substrate is relatively thin, the plurality of protection devices 11 for a substrate are stored together in a compact size by overlapping in the thickness direction. be able to.
 次に、本実施形態の作用及び効果について説明する。
 (1)基板用保護具11は、少なくとも基板Sの周縁部を覆うことが可能なサイズに構成された基材シート12と、基板Sの周縁部に粘着可能な粘着層13と、基材シート12と粘着層13との間に配置される可撓性のスペーサー14とを備えている。基材シート12は、粘着層13及びスペーサー14により囲まれる位置に貫通孔12aを有している。
Next, the operation and effects of the present embodiment will be described.
(1) The substrate protector 11 comprises a substrate sheet 12 of a size capable of covering at least the periphery of the substrate S, an adhesive layer 13 capable of adhering to the periphery of the substrate S, and a substrate sheet And a flexible spacer 14 disposed between the adhesive layer 13 and the adhesive layer 13. The base sheet 12 has a through hole 12 a at a position surrounded by the adhesive layer 13 and the spacer 14.
 この構成によれば、機能性膜Fの成膜前に基材シート12の貫通孔12aを通じて基板Sを吸引し、粘着層13により基板Sの周縁部と基材シート12の周縁部とを粘着することができ、機能性膜Fの成膜時に成膜材料が回り込んで基板Sの第1主面S1の周縁部に付着することを抑制できる。 According to this configuration, the substrate S is sucked through the through holes 12 a of the base sheet 12 before the functional film F is formed, and the adhesive layer 13 adheres the peripheral part of the substrate S and the peripheral part of the base sheet 12 It is possible to suppress adhesion of the film forming material to the peripheral portion of the first main surface S1 of the substrate S during film formation of the functional film F.
 また、基板Sが、例えば0.05~1.5mmと薄い場合には、吸引時に基板Sが撓んだとしても、可撓性のスペーサー14も撓むため、基板Sの周縁部から粘着層13が剥がれることがない。また、基板Sに基板用保護具11を取り付ける際に、基板Sの第2主面S2を治具等で押圧しなくてもよいため、基板Sの第2主面S2の清浄性が保たれ易い。 When the substrate S is as thin as, for example, 0.05 to 1.5 mm, the flexible spacer 14 is also flexed even if the substrate S is flexed at the time of suction. 13 will not peel off. In addition, when attaching the substrate protective tool 11 to the substrate S, since the second main surface S2 of the substrate S does not have to be pressed by a jig or the like, the cleanliness of the second main surface S2 of the substrate S is maintained. easy.
 従って、基板Sの第2主面S2のみに機能性膜Fを好適に成膜することができる。
 (2)基板用保護具11の粘着層13は、環状に形成されている。この場合、機能性膜Fの成膜時に成膜材料が回り込んで基板Sの第1主面S1の周縁部に付着することをさらに抑制できる。従って、基板Sの第2主面S2のみに機能性膜Fをより好適に成膜することができる。
Therefore, the functional film F can be suitably formed only on the second main surface S2 of the substrate S.
(2) The adhesive layer 13 of the substrate protector 11 is annularly formed. In this case, it can be further suppressed that the film forming material wraps around at the time of forming the functional film F and adheres to the peripheral portion of the first main surface S1 of the substrate S. Therefore, the functional film F can be more suitably formed only on the second main surface S2 of the substrate S.
 また、基板用保護具11の粘着層13が基板Sの全面ではなく基板Sの周縁部のみに粘着可能に形成されているために、基板用保護具11が基板Sに対して過剰に粘着することがなく、機能性膜Fの成膜後に基板用保護具11を基板Sから容易に引き剥がすことができる。また、粘着層13が基板Sの全面ではなく基板Sの周縁部のみに粘着可能に形成されているために、基板Sの第1主面S1において基板Sの性能に影響する範囲に粘着剤が転写されるのを回避することができる。 In addition, since the adhesive layer 13 of the substrate protector 11 is formed so as to be adhesive not only on the entire surface of the substrate S but only on the peripheral portion of the substrate S, the substrate protector 11 adheres excessively to the substrate S Therefore, after the formation of the functional film F, the substrate protector 11 can be easily peeled off from the substrate S. Further, since the adhesive layer 13 is formed so as to be adhesive only on the peripheral portion of the substrate S, not on the entire surface of the substrate S, the adhesive is in a range that affects the performance of the substrate S on the first main surface S1 of the substrate S It can be avoided to be transferred.
 (3)膜付き基板SFの製造方法は、基板用保護具11の基材シート12の貫通孔12aを通じて基板Sを吸引し、基板用保護具11と基板Sとが粘着した成膜用基板SAを準備する準備工程と、成膜用基板SAにおける基板Sの第2主面S2に機能性膜Fを成膜する成膜工程とを備えている。 (3) In the method of manufacturing the film-coated substrate SF, the substrate S is sucked through the through holes 12 a of the substrate sheet 12 of the substrate protective member 11, and the substrate protective member 11 adheres to the substrate S And a film forming process of forming the functional film F on the second major surface S2 of the substrate S in the film forming substrate SA.
 この方法によれば、上記(1)欄で述べた効果と同様の効果が得られる。
 (変更例)
 本実施形態は、以下のように変更して実施することができる。
According to this method, the same effect as the effect described in the above (1) can be obtained.
(Modification example)
The present embodiment can be modified as follows.
 ・上記実施形態の基板用保護具11のスペーサー14は、基板用保護具11の基材シート12に固定されているが、基材シート12に固定せずに基材シート12に重ねるように配置してもよいし、例えば、吸引装置15の載置面18に固定されていてもよい。 The spacer 14 of the substrate protector 11 of the above embodiment is fixed to the substrate sheet 12 of the substrate protector 11, but is disposed so as to overlap the substrate sheet 12 without being fixed to the substrate sheet 12. For example, it may be fixed to the mounting surface 18 of the suction device 15.
 ・基板用保護具11の粘着層13は、環状以外の形状に形成されてもよい。基板用保護具11の粘着層13を、例えば、基板Sの対向する二辺に対応した複数の粘着層に変更することもできる。 The adhesive layer 13 of the substrate protector 11 may be formed in a shape other than an annular shape. The adhesive layer 13 of the substrate protector 11 can be changed to, for example, a plurality of adhesive layers corresponding to two opposing sides of the substrate S.
 ・基板Sの形状は、平板状に限らず、曲板状であってもよい。
 ・基板用保護具11の外形は、基板Sの外形に応じて適宜変更することができる。
 ・図7に示すように、複数の基板用保護具11と複数の基板Sを載置できるように吸引装置15を変更してもよい。すなわち、吸引装置15の吸引部19の数は、吸引装置15の載置面18に載置される基板用保護具11(基板S)の数に対応して変更することができる。この場合、例えば、図7に示す基板Sよりもサイズの小さい基板についても、同じ吸引装置15を用いることができる。すなわち、基板Sのサイズを変更しても同じ吸引装置15を用いることができる。また、吸引装置15の1回の吸引操作によって、複数の基板用保護具11と複数の基板Sとを粘着させることができる。すなわち、吸引装置15の1回の吸引操作によって、複数の成膜用基板SAを得ることができるため、成膜用基板SAを準備する準備工程の作業効率を高めることができる。
The shape of the substrate S is not limited to a flat plate, and may be a curved plate.
The outer shape of the substrate protector 11 can be appropriately changed according to the outer shape of the substrate S.
As shown in FIG. 7, the suction device 15 may be changed so that the plurality of substrate protectors 11 and the plurality of substrates S can be placed. That is, the number of suction units 19 of the suction device 15 can be changed in accordance with the number of the substrate protectors 11 (substrates S) mounted on the mounting surface 18 of the suction device 15. In this case, for example, the same suction device 15 can be used for a substrate smaller than the substrate S shown in FIG. That is, even if the size of the substrate S is changed, the same suction device 15 can be used. In addition, by one suction operation of the suction device 15, the plurality of protection devices 11 for a substrate and the plurality of substrates S can be adhered. That is, since a plurality of film formation substrates SA can be obtained by one suction operation of the suction device 15, the working efficiency of the preparation process of preparing the film formation substrates SA can be enhanced.
 ・図8に示すように、複数の基板用保護具11は、これら複数の基板用保護具11が連結された連結体20として構成されていてもよい。この連結体20では、基材シート12を用いて複数の基板用保護具11を連結しているが、スペーサー14を用いて連結してもよいし、テープ材等の連結材を別途設けることで連結してもよい。このように連結体20を用いることで、複数の成膜用基板SAを一体として取り扱うことができるため、例えば、成膜工程で用いる成膜装置への複数の成膜用基板SAの搬入作業や搬出作業の効率を高めることができる。また、連結体20を用いることで、複数の成膜用基板SAを吊り下げて配置することも容易となる。 As shown in FIG. 8, the plurality of substrate protectors 11 may be configured as a connected body 20 to which the plurality of substrate protectors 11 are coupled. In the connector 20, the plurality of substrate protectors 11 are connected using the base sheet 12, but they may be connected using the spacer 14, or by separately providing a connecting material such as a tape material. It may be linked. As described above, since the plurality of film formation substrates SA can be handled integrally by using the connected body 20, for example, an operation of carrying in the plurality of film formation substrates SA to the film formation apparatus used in the film formation process or It is possible to enhance the efficiency of the unloading operation. Further, by using the connector 20, it becomes easy to suspend and arrange the plurality of film formation substrates SA.
 11…基板用保護具、12…基材シート、12a…貫通孔、13…粘着層、14…スペーサー、F…機能性膜、S…基板、S1…第1主面、S2…第2主面、SA…成膜用基板、SF…膜付き基板。 11: Protective device for substrate, 12: base sheet, 12a: through hole, 13: adhesive layer, 14: spacer, F: functional film, S: substrate, S1: first main surface, S2: second main surface , SA: substrate for film formation, SF: substrate with film.

Claims (2)

  1.  第1主面と、前記第1主面の反対側の第2主面とを有する基板の前記第1主面を保護する基板用保護具であって、
     少なくとも前記基板の周縁部を覆うことが可能なサイズに構成された基材シートと、
     前記基板の周縁部に粘着可能な粘着層と、
     前記基材シートと前記粘着層との間に配置される可撓性のスペーサーと、を備え、
     前記基材シートは、前記粘着層及び前記スペーサーにより囲まれる位置に貫通孔を有することを特徴とする基板用保護具。
    A substrate protector which protects the first main surface of a substrate having a first main surface and a second main surface opposite to the first main surface,
    A base sheet configured to be capable of covering at least a peripheral portion of the substrate;
    An adhesive layer capable of adhering to the peripheral portion of the substrate;
    A flexible spacer disposed between the base sheet and the adhesive layer;
    The substrate protector has a through hole at a position surrounded by the adhesive layer and the spacer.
  2.  請求項1に記載の基板用保護具を用いて膜付き基板を製造する膜付き基板の製造方法であって、
     前記基板用保護具の基材シートの貫通孔を通じて基板を吸引し、前記基板用保護具と前記基板とが粘着した成膜用基板を準備する準備工程と、
     前記成膜用基板における前記基板の前記第2主面に機能性膜を成膜する成膜工程とを備えることを特徴とする膜付き基板の製造方法。
    It is a manufacturing method of a substrate with a film which manufactures a substrate with a film using a protector for a substrate according to claim 1, which is:
    Preparing the film-forming substrate by suctioning the substrate through the through hole of the substrate sheet of the substrate protector, and preparing the film-forming substrate in which the substrate protector and the substrate are adhered;
    Forming a functional film on the second major surface of the substrate in the substrate for film formation.
PCT/JP2018/045622 2017-12-14 2018-12-12 Protective equipment for substrate, and method for producing substrate having film WO2019117186A1 (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09246365A (en) * 1996-03-11 1997-09-19 Dainippon Printing Co Ltd Substrate holding jig
JP2010123598A (en) * 2008-11-17 2010-06-03 Lintec Corp Device, method and tool for supporting plate-like member
WO2016125841A1 (en) * 2015-02-07 2016-08-11 株式会社クリエイティブテクノロジー Workpiece holding device and laser cutting processing method
JP2016197623A (en) * 2015-04-02 2016-11-24 日本電気硝子株式会社 Sucking/holding jig, sucking/holding device equipped with this jig, sucking/holding method, processing method of substrate, and film formation method of substrate

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI423739B (en) * 2011-09-23 2014-01-11 Au Optronics Corp Flexible substrate structure and manufacturing method thereof
KR20150099714A (en) * 2012-12-21 2015-09-01 아사히 가라스 가부시키가이샤 Substrate holder and production method for substrate having film formed over entire surface thereof using same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09246365A (en) * 1996-03-11 1997-09-19 Dainippon Printing Co Ltd Substrate holding jig
JP2010123598A (en) * 2008-11-17 2010-06-03 Lintec Corp Device, method and tool for supporting plate-like member
WO2016125841A1 (en) * 2015-02-07 2016-08-11 株式会社クリエイティブテクノロジー Workpiece holding device and laser cutting processing method
JP2016197623A (en) * 2015-04-02 2016-11-24 日本電気硝子株式会社 Sucking/holding jig, sucking/holding device equipped with this jig, sucking/holding method, processing method of substrate, and film formation method of substrate

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