TWI774894B - Substrate protector and method for producing film-attached substrate - Google Patents

Substrate protector and method for producing film-attached substrate Download PDF

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TWI774894B
TWI774894B TW107144833A TW107144833A TWI774894B TW I774894 B TWI774894 B TW I774894B TW 107144833 A TW107144833 A TW 107144833A TW 107144833 A TW107144833 A TW 107144833A TW I774894 B TWI774894 B TW I774894B
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substrate
film
protector
adhesive layer
main surface
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TW107144833A
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TW201930624A (en
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福井悅二
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日商日本電氣硝子股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

Abstract

基板用保護具(11)具備:基材片(12),構成為至少可覆蓋基板(S)之周緣部的尺寸;黏著層(13),可黏著於基板(S)的周緣部;及可撓性之間隔物(14),配置於基材片(12)與黏著層(13)之間。基材片(12)於由黏著層(13)及間隔物(14)包圍之位置具有貫通孔(12a)。附膜基板的製造方法具備:準備步驟,經由基板用保護具(11)之基材片(12)的貫通孔(12a)吸引基板(S),準備將基板用保護具(11)與基板(S)黏著而成的成膜用基板;及成膜步驟,於成膜用基板的基板(S)之第二主面(S2)形成功能性膜。The substrate protector (11) is provided with: a base material sheet (12) having a size that can cover at least the peripheral portion of the substrate (S); an adhesive layer (13) capable of being adhered to the peripheral portion of the substrate (S); and The flexible spacer (14) is arranged between the base material sheet (12) and the adhesive layer (13). The substrate sheet (12) has a through hole (12a) at a position surrounded by the adhesive layer (13) and the spacer (14). The method for producing a film-attached substrate includes a preparation step of sucking the substrate (S) through the through hole (12a) of the base sheet (12) of the substrate protector (11), and preparing the substrate protector (11) and the substrate ( S) the adhered film-forming substrate; and a film-forming step of forming a functional film on the second main surface ( S2 ) of the substrate (S) of the film-forming substrate.

Description

基板用保護具以及附膜基板的製造方法Substrate protector and method for producing film-attached substrate

本發明係關於基板用保護具以及附膜基板的製造方法。The present invention relates to a substrate protection tool and a method for producing a film-attached substrate.

有於玻璃基板等基板的兩個主面中,僅在基板的一個主面將功能性膜進行成膜的情形。該情形時,藉由基板用保護具保護基板的另一主面,藉此可抑制基板的另一主面形成功能性膜。例如,專利文獻1中,藉由使用具有附著在基板的非成膜對象之側的主面的周緣部之附著面的治具,防止成膜材料向該主面迂繞。In the two main surfaces of substrates such as glass substrates, the functional film may be formed on only one main surface of the substrate. In this case, by protecting the other main surface of the substrate with the substrate protector, it is possible to suppress the formation of a functional film on the other main surface of the substrate. For example, in Patent Document 1, by using a jig having an attachment surface attached to the peripheral edge portion of the main surface on the non-film formation target side of the substrate, the film formation material is prevented from winding around the main surface.

專利文獻1:日本特開2016-197623號公報Patent Document 1: Japanese Patent Laid-Open No. 2016-197623

如上述之先前技術,關於在僅於基板之一個主面將功能性膜進行成膜時, 抑制由成膜材料之迂繞造成的成膜材料對基板的另一主面周緣部之附著的技術,尚有改善的餘地。As in the above-mentioned prior art, when a functional film is formed on only one main surface of a substrate, the adhesion of the film-forming material to the peripheral edge portion of the other main surface of the substrate due to the winding of the film-forming material is suppressed. , there is still room for improvement.

本發明的目的在於提供一種可僅在基板的一個主面適當地將功能性膜進行成膜之基板用保護具以及附膜基板的製造方法。An object of the present invention is to provide a substrate protector and a method for producing a film-attached substrate that can appropriately form a functional film only on one main surface of a substrate.

解決上述課題的基板用保護具,對具有第一主面和位於與該第一主面相反的一側的第二主面之基板的該第一主面進行保護,其具備:基材片,構成為至少可覆蓋該基板之周緣部的尺寸;黏著層,可黏著於該基板的周緣部;與可撓性之間隔物,配置於該基材片與該黏著層之間,該基材片於由該黏著層及該間隔物包圍之位置具有貫通孔。A substrate protector for solving the above-mentioned problems, which protects the first main surface of a substrate having a first main surface and a second main surface located on the opposite side of the first main surface, comprising: a base material sheet, It is configured to at least cover the size of the peripheral portion of the substrate; the adhesive layer can be adhered to the peripheral portion of the substrate; and the flexible spacer is disposed between the substrate sheet and the adhesive layer, the substrate sheet A through hole is provided at the position surrounded by the adhesive layer and the spacer.

根據該構成,可於功能性膜之成膜前,經由基材片的貫通孔吸引基板,藉由黏著層將基板的周緣部與基材片的周緣部進行黏著,於功能性膜之成膜時可抑制成膜材料迂繞而附著於基板的第一主面之周緣部。According to this configuration, before the film formation of the functional film, the substrate can be sucked through the through holes of the base sheet, and the peripheral portion of the substrate and the peripheral portion of the base sheet can be adhered by the adhesive layer to form the functional film. In this case, the film-forming material can be prevented from winding around and adhering to the peripheral portion of the first main surface of the substrate.

又,基板於例如為0.05~1.5mm薄之情形時,在吸引時即使基板撓曲,由於可撓性之間隔物也撓曲,故不會有黏著層自基板之周緣部剝離的情形。又,將基板用保護具安裝於基板時,由於亦可不將基板之第二主面按壓於治具等,故易於保持基板的第二主面之清潔性。When the substrate is thin, for example, 0.05 to 1.5 mm, even if the substrate is deflected during suction, the flexible spacer is also deflected, so that the adhesive layer does not peel off from the peripheral edge of the substrate. Moreover, when attaching the board|substrate protector to a board|substrate, since it is not necessary to press the 2nd main surface of a board|substrate to a jig etc., it becomes easy to maintain the cleanliness of the 2nd main surface of a board|substrate.

解決上述課題之附膜基板的製造方法使用上述基板用保護具製造附膜基板,其具備:準備步驟,經由該基板用保護具之基材片的貫通孔吸引基板,準備將該基板用保護具與該基板黏著而成的成膜用基板;與成膜步驟,於該成膜用基板的該基板之該第二主面將功能性膜進行成膜。A method for producing a film-attached substrate that solves the above-mentioned problems is to produce a film-attached substrate using the above-mentioned substrate protector, comprising a preparation step of sucking a substrate through a through hole of a base sheet of the substrate protector to prepare the substrate protector A film-forming substrate adhered to the substrate; and a film-forming step of forming a functional film on the second main surface of the substrate of the film-forming substrate.

根據本發明,可僅於基板之一個主面適當地將功能性膜進行成膜。According to the present invention, the functional film can be appropriately formed only on one main surface of the substrate.

以下,針對本發明之基板用保護具及附膜基板的製造方法之實施形態,參照圖式進行說明。再者,圖式中,為了便於說明,有誇張地表示構成之一部分(例如厚度)的情形。又,針對各部分之尺寸比例,有與實際不同的情形。Hereinafter, the embodiment of the manufacturing method of the protective tool for substrates and the film-attached board|substrate of this invention is demonstrated with reference to drawings. In addition, in the drawings, for convenience of explanation, a part (for example, thickness) of the structure is shown exaggeratedly. In addition, the dimensional ratio of each part may be different from the actual one.

如圖1所示,使用基板用保護具11保護的基板S,具有第一主面S1與第一主面S1的相反側之第二主面S2。基板用保護具11保護基板S的第一主面S1。第一主面S1被基板用保護具11保護之基板S的第二主面S2,為將功能性膜進行成膜之主面,藉由於該第二主面S2將功能性膜進行成膜,可獲得附膜基板。本實施形態中,雖使用玻璃基板作為基板S,但例如亦可使用樹脂基板或陶瓷基板。As shown in FIG. 1, the board|substrate S protected by the board|substrate protector 11 has the 1st main surface S1 and the 2nd main surface S2 on the opposite side of the 1st main surface S1. The board|substrate protector 11 protects the 1st main surface S1 of the board|substrate S. The second main surface S2 of the substrate S whose first main surface S1 is protected by the substrate protector 11 is the main surface on which the functional film is formed, and the functional film is formed on the second main surface S2. Film-attached substrates are available. In the present embodiment, although a glass substrate is used as the substrate S, for example, a resin substrate or a ceramic substrate may be used.

基板用保護具11具備:基材片12,構成為至少可覆蓋基板S之周緣部的尺寸;黏著層13,可黏著於基板S的周緣部;與可撓性之間隔物14,配置於基材片12與黏著層13之間。The substrate protector 11 includes: a substrate sheet 12 having a size that can cover at least the peripheral edge portion of the substrate S; an adhesive layer 13 capable of being adhered to the peripheral edge portion of the substrate S; and a flexible spacer 14 disposed on the base between the material sheet 12 and the adhesive layer 13 .

作為基材片12之材料,例如可列舉樹脂材料或橡膠材料等高分子材料、以及金屬材料。作為樹脂材料,例如可列舉聚烯烴樹脂、聚酯樹脂、聚醯胺樹脂、及聚醯亞胺樹脂。作為橡膠材料,例如可列舉矽氧橡膠、胺甲酸乙酯橡膠、氯平橡膠、苯乙烯-丁二烯橡膠、及乙烯-丙烯-二烯橡膠。作為金屬材料,例如可列舉鋁及不鏽鋼。例如,功能性膜之成膜伴隨加熱的情形時,使用可耐受成膜時之熱的耐熱性之基材片即可。基材片12的厚度例如為10μm以上500μm以下之範圍。Examples of the material of the base sheet 12 include polymer materials such as resin materials and rubber materials, and metal materials. As a resin material, a polyolefin resin, a polyester resin, a polyimide resin, and a polyimide resin are mentioned, for example. Examples of the rubber material include silicone rubber, urethane rubber, chloropine rubber, styrene-butadiene rubber, and ethylene-propylene-diene rubber. As a metal material, aluminum and stainless steel are mentioned, for example. For example, when the film formation of the functional film is accompanied by heating, it is sufficient to use a heat-resistant substrate sheet that can withstand the heat at the time of film formation. The thickness of the base material sheet 12 is in the range of, for example, 10 μm or more and 500 μm or less.

黏著層13沿著基板S的第一主面S1之周緣部形成連續的環狀。黏著層13可由周知之黏著材料構成。作為黏著層13,例如可列舉聚矽氧系黏著層、丙烯酸系黏著層及胺甲酸乙酯系黏著層。例如,功能性膜之成膜伴隨加熱的情形時,使用可耐受成膜時之熱的耐熱性之黏著層即可。黏著層13可由構成雙面黏著膠帶的一個面之黏著層或藉由塗布於間隔物14而形成之黏著層構成。本實施形態中,藉由將雙面黏著膠帶貼合於間隔物14,將黏著層13設於間隔物14。即,黏著層13黏著於間隔物14。The adhesive layer 13 is formed in a continuous ring shape along the peripheral portion of the first main surface S1 of the substrate S. The adhesive layer 13 can be made of known adhesive materials. As the adhesive layer 13 , for example, a polysiloxane-based adhesive layer, an acrylic-based adhesive layer, and a urethane-based adhesive layer can be mentioned. For example, when the film formation of the functional film is accompanied by heating, a heat-resistant adhesive layer that can withstand the heat during film formation may be used. The adhesive layer 13 may be composed of an adhesive layer constituting one side of the double-sided adhesive tape or an adhesive layer formed by coating the spacer 14 . In this embodiment, the adhesive layer 13 is provided on the spacer 14 by attaching the double-sided adhesive tape to the spacer 14 . That is, the adhesive layer 13 is adhered to the spacer 14 .

再者,圖式中,省略雙面黏著膠帶的支承體及構成雙面黏著膠帶的另一面的黏著層(將支承體黏著於間隔物14之黏著層)。雙面黏著膠帶之支承體例如由聚醯亞胺膜或PET膜等樹脂膜構成。In addition, in the drawings, the support of the double-sided adhesive tape and the adhesive layer constituting the other side of the double-sided adhesive tape (the adhesive layer for adhering the support to the spacer 14 ) are omitted. The support of the double-sided adhesive tape is formed of a resin film such as a polyimide film or a PET film, for example.

黏著層13黏著於基板S的黏著力例如較佳為3.0(N/25mm寬)以下之弱黏著性,以便於功能性膜之成膜後可使黏著層13容易地自基板S剝離。再者,為了易於確保相對於基板S之密接性,黏著層13之相對於基板S的黏著力的下限較佳為0.05(N/25mm寬)以上。黏著層13之黏著力是以JIS Z0237(2009)所規定之180∘剝離試驗為基準而測量。再者,JIS Z0237(2009)對應於國際標準之ISO 29862:2007、ISO 29863:2007及ISO 29864:2007。The adhesive force of the adhesive layer 13 to the substrate S is preferably weaker than 3.0 (N/25mm width), for example, so that the adhesive layer 13 can be easily peeled off from the substrate S after the functional film is formed. Furthermore, in order to easily secure the adhesiveness to the substrate S, the lower limit of the adhesive force of the adhesive layer 13 to the substrate S is preferably 0.05 (N/25 mm width) or more. The adhesive force of the adhesive layer 13 was measured based on the 180∘ peel test specified in JIS Z0237 (2009). Furthermore, JIS Z0237 (2009) corresponds to ISO 29862:2007, ISO 29863:2007 and ISO 29864:2007 of international standards.

如圖1、圖2及圖4所示,基材片12於由黏著層13及間隔物14包圍之位置具有貫通孔12a。若詳細描述,基材片12中由黏著層13及間隔物14包圍之上表面為露出面,與基板S之第一主面S1對向。基材片12之貫通孔12a於將基板用保護具11安裝於基板S時,作為用於排出基板S與基材片12之間的空氣之空氣排出孔使用。貫通孔12a之數量可如本實施形態般為單個,也可變更為複數。貫通孔12a之形狀可如本實施形態般為四角形狀,例如也可變更為圓形狀。於將基板片12之面積設為100%時,貫通孔12a之面積例如較佳可為5%以上50%以下之範圍。貫通孔12a之面積越大,越更易於發揮作為空氣排出孔之功能。貫通孔12a之面積越小,越可藉由基材片12更寬廣地覆蓋基板S的第一主面S1,故易於保持第一主面S1的清潔性。貫通孔12a較佳形成於俯視基材片12時較黏著層13及間隔物14更靠近基材片12之中央的位置。此情形時,可將基板S與基材片12之間的空氣整體平衡良好地排出。As shown in FIGS. 1 , 2 and 4 , the substrate sheet 12 has through holes 12 a at positions surrounded by the adhesive layer 13 and the spacer 14 . If described in detail, the upper surface of the substrate sheet 12 surrounded by the adhesive layer 13 and the spacer 14 is an exposed surface, which is opposite to the first main surface S1 of the substrate S. The through hole 12 a of the base sheet 12 is used as an air discharge hole for discharging the air between the base sheet S and the base sheet 12 when the board protector 11 is attached to the base sheet S. The number of the through holes 12a may be single as in the present embodiment, or may be changed to plural. The shape of the through hole 12a may be a quadrangular shape as in the present embodiment, and may be changed to a circular shape, for example. When the area of the substrate sheet 12 is set to 100%, the area of the through hole 12a is preferably in the range of 5% or more and 50% or less, for example. The larger the area of the through hole 12a, the easier it is to function as an air discharge hole. The smaller the area of the through hole 12a, the wider the first main surface S1 of the substrate S can be covered by the base sheet 12, so that the cleanliness of the first main surface S1 can be easily maintained. The through hole 12 a is preferably formed at a position closer to the center of the substrate sheet 12 than the adhesive layer 13 and the spacer 14 when the substrate sheet 12 is viewed from above. In this case, the entire air between the substrate S and the base sheet 12 can be discharged in a well-balanced manner.

間隔物14沿著基板S的第一主面S1之周緣部形成為連續的環狀。作為構成間隔物14之可撓性的材料,例如可列舉織布或不織布、高分子材料、及橡膠材料。作為織布或不織布,例如可舉玻璃纖維布。作為橡膠材料,例如可列舉聚矽氧橡膠、胺甲酸乙酯橡膠、氯平橡膠、苯乙烯-丁二烯橡膠、及乙烯-丙烯-二烯橡膠。間隔物14可為單層結構,也可為由同種或不同種材料構成之多層結構。例如,功能性膜之成膜伴隨加熱的情形,使用可耐受成膜時之熱的間隔物即可。間隔物14可藉由周知之接著劑或黏著劑固定於基材片12。例如可使用將間隔物14作為支承體而構成之單面黏著膠帶(玻璃纖維膠帶等)將間隔物14固定於基材片12。間隔物14之厚度例如為150μm~5mm之範圍。間隔物14較佳於將基板用保護具11安裝於基板S前之狀態,即基板用保護具11未承受負重之狀態下,較黏著層13更厚地構成。The spacer 14 is formed in a continuous ring shape along the peripheral edge portion of the first main surface S1 of the substrate S. As a flexible material which comprises the spacer 14, a woven fabric or a nonwoven fabric, a polymer material, and a rubber material are mentioned, for example. As a woven fabric or a nonwoven fabric, glass fiber cloth is mentioned, for example. Examples of the rubber material include silicone rubber, urethane rubber, chloropine rubber, styrene-butadiene rubber, and ethylene-propylene-diene rubber. The spacer 14 may be a single-layer structure or a multi-layer structure composed of the same or different materials. For example, when the film formation of the functional film is accompanied by heating, it is sufficient to use a spacer that can withstand the heat at the time of film formation. The spacer 14 can be fixed to the substrate sheet 12 by well-known adhesives or adhesives. For example, the spacer 14 can be fixed to the base material sheet 12 using a single-sided adhesive tape (glass fiber tape or the like) constituted by using the spacer 14 as a support. The thickness of the spacer 14 is, for example, in the range of 150 μm to 5 mm. The spacer 14 is preferably formed thicker than the adhesive layer 13 in a state before the substrate protector 11 is mounted on the substrate S, that is, in a state where the substrate protector 11 is not loaded.

接著,針對附膜基板的製造方法進行說明。Next, the manufacturing method of the film-attached board|substrate is demonstrated.

如圖2所示,附膜基板的製造方法具備:準備步驟,藉由將基板用保護具11安裝於基板S,準備具有基板S與基板用保護具11之成膜用基板SA;與成膜步驟,於成膜用基板SA之基板S的第二主面S2將功能性膜進行成膜。準備步驟中,經由基板用保護具11的基材片12之貫通孔12a吸引基板S,準備將基板用保護具11與基板S黏著而成的成膜用基板。As shown in FIG. 2 , the method for producing a film-attached substrate includes: a preparation step of preparing a film-forming substrate SA including the substrate S and the substrate-protecting tool 11 by attaching the substrate protector 11 to the substrate S; In the step, a functional film is formed on the second main surface S2 of the substrate S of the film-forming substrate SA. In the preparation step, the substrate S is sucked through the through holes 12 a of the base sheet 12 of the substrate protector 11 , and the substrate for film formation in which the substrate protector 11 and the substrate S are adhered is prepared.

如圖3及圖5所示,本實施形態的準備步驟中,為了吸引基板S使用吸引裝置15。吸引裝置15具備減壓室16、將減壓室16內之空氣進行排氣的排氣部17、載置基板用保護具11之載置面18與於載置面18開口並且吸引減壓室16的外部之空氣的吸引部19。於排氣部17連接省略了圖示之周知的真空泵。As shown in FIGS. 3 and 5 , in the preparation steps of the present embodiment, the suction device 15 is used to suck the substrate S. The suction device 15 includes a decompression chamber 16 , an exhaust portion 17 for exhausting the air in the decompression chamber 16 , a placement surface 18 on which the substrate protector 11 is placed, and an opening on the placement surface 18 to suck the decompression chamber. The suction part 19 of the outside air of 16. A well-known vacuum pump, which is not shown in the drawings, is connected to the exhaust portion 17 .

對於在準備步驟中獲得成膜用基板SA,首先以基板用保護具11之黏著層13面向上方的方式,將基板用保護具11載置於吸引裝置15的載置面18後,於該基板用保護具11之黏著層13上載置基板S。For the film-forming substrate SA obtained in the preparation step, first, the substrate protector 11 is placed on the placement surface 18 of the suction device 15 so that the adhesive layer 13 of the substrate protector 11 faces upward, and then placed on the substrate. The substrate S is placed on the adhesive layer 13 of the protector 11 .

接著,如圖5所示,將吸引裝置15之減壓室16內的空氣自排氣部17進行排氣。藉此,吸引裝置15之吸引部19經由基板用保護具11之基材片12的貫通孔12a,吸引基板用保護具11之基材片12與基板S之間的空氣。藉此,藉由基板S被按壓於基板用保護具11之黏著層13,可將基板用保護具11安裝於基板S。Next, as shown in FIG. 5 , the air in the decompression chamber 16 of the suction device 15 is exhausted from the exhaust part 17 . Thereby, the suction part 19 of the suction device 15 sucks the air between the base sheet 12 of the substrate protector 11 and the substrate S through the through holes 12a of the base sheet 12 of the substrate protector 11 . Thereby, the board|substrate protector 11 can be attached to the board|substrate S by pressing the board|substrate S to the adhesive layer 13 of the board|substrate protector 11.

此處,使用吸引裝置15吸引基板用保護具11之基材片12與基板S之間的空氣時,有平板狀之基板S在吸引裝置15側彎曲為凸形之情形。例如,作為平板狀之基板S,使用厚度為0.05~1.5mm之玻璃基板的情形時,有容易造成此種彎曲之傾向。然而,即使因利用吸引裝置15進行之吸引而基板S撓曲,由於可撓性之間隔物14亦撓曲,故黏著層13不會自基板S的周緣部剝離。Here, when the suction device 15 is used to suck the air between the base sheet 12 of the substrate protector 11 and the substrate S, the plate-shaped substrate S may be bent into a convex shape on the suction device 15 side. For example, when a glass substrate having a thickness of 0.05 to 1.5 mm is used as the flat substrate S, such a warp tends to be easily caused. However, even if the substrate S is deflected by suction by the suction device 15 , since the flexible spacer 14 is also deflected, the adhesive layer 13 does not peel off from the peripheral portion of the substrate S.

藉由在安裝於基板用保護具11之基板S的第二主面S2將功能性膜進行成膜而製作附膜基板。附膜基板SF之製造方法的成膜步驟中,可使用濺鍍法等PVD(Physical Vapor Deposition,物理氣相沉積)法、CVD(Chemical Vapor Deposition,化學氣相沈積)法、噴霧、旋轉塗布等塗布法等周知之成膜法。作為功能性膜F(參照圖6),例如可列舉具有既定之光學特性的膜(介電質膜等)、具有既定之機械特性的膜、具有既定之化學特性的膜、以及具有既定之顏色的膜。用於形成功能性膜F之成膜材料,可為無機材料,也可為有機材料。A film-attached board|substrate is produced by film-forming a functional film on the 2nd main surface S2 of the board|substrate S mounted in the board|substrate protector 11. In the film forming step of the manufacturing method of the film-coated substrate SF, PVD (Physical Vapor Deposition) method such as sputtering method, CVD (Chemical Vapor Deposition, chemical vapor deposition) method, spraying, spin coating, etc. can be used. A well-known film-forming method such as a coating method is used. As the functional film F (refer to FIG. 6 ), for example, a film (dielectric film, etc.) having predetermined optical properties, a film having predetermined mechanical properties, a film having predetermined chemical properties, and a film having predetermined color may be mentioned. film. The film-forming material for forming the functional film F may be an inorganic material or an organic material.

成膜步驟能夠以成膜用基板SA的第二主面S2成為水平之姿勢、成為垂直之姿勢、或既非水平亦非垂直之傾斜的姿勢的任一姿勢進行。例如,將成膜用基板SA配置為成膜用基板SA的第二主面S2成為垂直之姿勢的情形時,能夠以基材片12較基板S更向外側突出之方式變更基板用保護具11之基材片12的形狀,利用該突出部分懸吊成膜用基板SA。The film-forming step can be performed in any of a posture in which the second main surface S2 of the film-forming substrate SA is horizontal, a vertical posture, or an inclined posture that is neither horizontal nor vertical. For example, when the film-forming substrate SA is arranged so that the second main surface S2 of the film-forming substrate SA is vertical, the substrate protector 11 can be changed so that the base sheet 12 protrudes outward from the substrate S According to the shape of the base sheet 12, the substrate SA for film formation is suspended by the protruding portion.

如圖6所示,於成膜步驟獲得之附膜基板SF具有設於基板S之第二主面S2的功能性膜F,自基板用保護具11之黏著層13被取下。As shown in FIG. 6 , the film-attached substrate SF obtained in the film forming step has the functional film F provided on the second main surface S2 of the substrate S, and is removed from the adhesive layer 13 of the substrate protector 11 .

成膜步驟後之基板用保護具11可重複使用於其他附膜基板SF之製造。又,即使於基板用保護具11為複數之情形,由於基板用保護具11之厚度比較薄,故藉由在厚度方向將複數個基板用保護具11重合,可緊密地匯總而進行保管。The substrate protection tool 11 after the film forming step can be reused in the manufacture of other film-attached substrates SF. Moreover, even in the case where there are plural substrate protectors 11, since the thickness of the substrate protectors 11 is relatively thin, by overlapping the plural substrate protectors 11 in the thickness direction, it is possible to store them closely together.

接著,針對本實施形態的作用及效果進行說明。Next, the action and effect of this embodiment will be described.

(1)基板用保護具11具有:基材片12,構成為至少可覆蓋基板S之周緣部的尺寸;黏著層13,可黏著於基板S的周緣部;與可撓性之間隔物14,配置於基材片12與黏著層13之間。基材片12於由黏著層13及間隔物14包圍之位置具有貫通孔12a。(1) The substrate protector 11 has: a base material sheet 12 having a size that can cover at least the peripheral portion of the substrate S; an adhesive layer 13 capable of being adhered to the peripheral portion of the substrate S; and a flexible spacer 14, It is arranged between the base material sheet 12 and the adhesive layer 13 . The base sheet 12 has a through hole 12 a at a position surrounded by the adhesive layer 13 and the spacer 14 .

根據該構成,可於功能性膜F之成膜前經由吸引基材片12的貫通孔12a吸引基板S,藉由黏著層13黏著基板S的周緣部與基材片12的周緣部,於功能性膜F之成膜時可抑制成膜材料迂繞而附著於基板S的第一主面S1之周緣部。According to this configuration, the substrate S can be sucked through the through holes 12 a of the suction substrate sheet 12 before the functional film F is formed, and the peripheral edge of the substrate S and the peripheral edge of the substrate sheet 12 can be adhered by the adhesive layer 13 . During the film formation of the flexible film F, the film formation material can be prevented from winding around and adhering to the peripheral portion of the first main surface S1 of the substrate S. As shown in FIG.

又,基板S於例如為0.05~1.5mm薄之情形時,在吸引時即使基板S撓曲,由於可撓性之間隔物14也撓曲,故不會有黏著層13自基板S之周緣部剝離的情形。又,將基板用保護具11安裝於基板S時,由於亦可不將基板S之第二主面S2按壓於治具等,故易於保持基板S的第二主面S2之清潔性。In addition, when the substrate S is thin, for example, 0.05 to 1.5 mm, even if the substrate S is deflected during suction, the flexible spacer 14 is also deflected, so that the adhesive layer 13 does not appear from the peripheral portion of the substrate S. peeling situation. Moreover, when the board|substrate protector 11 is attached to the board|substrate S, since it is not necessary to press the 2nd main surface S2 of the board|substrate S to a jig etc., it is easy to maintain the cleanliness of the 2nd main surface S2 of the board|substrate S.

因此,可僅於基板S的第二主面S2適當地將功能性膜F進行成膜。Therefore, the functional film F can be appropriately formed only on the second main surface S2 of the substrate S.

(2)基板用保護具11之黏著層13形成為環狀。該情形時,可於功能性膜F成膜時進一步抑制成膜材料迂繞而附著於基板S的第一主面S1之周緣部。因此,可僅於基板S的第二主面S2更適當地將功能性膜F進行成膜。(2) The adhesive layer 13 of the substrate protector 11 is formed in a ring shape. In this case, when the functional film F is formed into a film, the film-forming material can be further prevented from winding around and adhering to the peripheral portion of the first main surface S1 of the substrate S. Therefore, the functional film F can be more appropriately formed only on the second main surface S2 of the substrate S.

又,由於基板用保護具11之黏著層13形成為僅可黏著於基板S的周緣部而非基板S的整面,故基板用保護具11不會過度地黏著於基板S,於功能性膜F之成膜後可容易地將基板用保護具11自基板S剝下。又,由於黏著層13形成為僅可黏著於基板S的周緣部而非基板S的整面,故可避免黏著劑轉印至基板S的第一主面S1中影響基板S的功能之範圍。In addition, since the adhesive layer 13 of the substrate protector 11 is formed to be adhered only to the peripheral portion of the substrate S rather than the entire surface of the substrate S, the substrate protector 11 is not excessively adhered to the substrate S, and the functional film The substrate protector 11 can be easily peeled off from the substrate S after the film formation of F. In addition, since the adhesive layer 13 is formed to be adhered only to the peripheral portion of the substrate S rather than the entire surface of the substrate S, the transfer of the adhesive to the first main surface S1 of the substrate S can be prevented from affecting the function of the substrate S.

(3)附膜基板SF的製造方法具備:準備步驟,經由基板用保護具11之基材片12的貫通孔12a吸引基板S,準備將基板用保護具11與基板S黏著而成的成膜用基板SA;與成膜步驟,於成膜用基板SA的基板S之第二主面S2將功能性膜F進行成膜。(3) The method for producing the film-attached substrate SF includes a preparation step of sucking the substrate S through the through holes 12 a of the base sheet 12 of the substrate protector 11 to prepare a film formation in which the substrate protector 11 and the substrate S are adhered Using the substrate SA; and the film-forming step, the functional film F is formed on the second main surface S2 of the substrate S of the film-forming substrate SA.

根據該方法,可獲得與上述(1)欄所述之效果相同的效果。According to this method, the same effects as those described in the above-mentioned column (1) can be obtained.

(變更例) 本實施形態可如下述進行變更而實施。(change example) This embodiment can be implemented with the following modifications.

上述實施形態的基板用保護具11之間隔物14雖固定於基板用保護具11的基材片12,但也可配置成不固定於基材片12而重疊於基材片12,例如,可固定於吸引裝置15的載置面18。Although the spacer 14 between the substrate protector 11 in the above-described embodiment is fixed to the base sheet 12 of the substrate protector 11, it may be arranged not to be fixed to the base sheet 12 but to overlap the base sheet 12, for example, it may be It is fixed to the mounting surface 18 of the suction device 15 .

基板用保護具11的黏著層13也可形成為環狀以外之形狀。可將基板用保護具11的黏著層13例如變更為對應於基板S的對向之兩邊的複數黏著層。The adhesive layer 13 of the substrate protector 11 may be formed in a shape other than a ring shape. The adhesive layer 13 of the substrate protector 11 can be changed to, for example, a plurality of adhesive layers corresponding to the opposite sides of the substrate S.

基板S的形狀不限於平板狀,也可為彎曲板狀。The shape of the substrate S is not limited to a flat plate shape, and may be a curved plate shape.

基板用保護具11的外形可依據基板S的外形適當變更。The external shape of the board protector 11 can be appropriately changed according to the external shape of the board S.

如圖7所示,可將吸引裝置15變更為可載置複數個基板用保護具11與複數個基板S。即,吸引裝置15之吸引部19的數量可對應載置於吸引裝置15的載置面18之基板用保護具11(基板S)的數量而變更。該情形時,例如針對尺寸小於圖7所示的基板S之基板,也可使用相同的吸引裝置15。也就是說,即便變更基板S的尺寸也可使用相同的吸引裝置15。又,藉由吸引裝置15之一次吸引操作,可使複數個基板用保護具11與複數個基板S黏著。即,藉由吸引裝置15之一次吸引操作,可獲得複數個成膜用基板SA,故可提高準備成膜用基板SA之準備步驟的作業效率。As shown in FIG. 7 , the suction device 15 can be changed so that a plurality of substrate protectors 11 and a plurality of substrates S can be placed thereon. That is, the number of the suction parts 19 of the suction device 15 can be changed according to the number of the substrate protectors 11 (substrate S) placed on the mounting surface 18 of the suction device 15 . In this case, for example, the same suction device 15 can be used for a substrate smaller in size than the substrate S shown in FIG. 7 . That is, even if the size of the substrate S is changed, the same suction device 15 can be used. Moreover, by one suction operation of the suction device 15, the plurality of substrate protection tools 11 and the plurality of substrates S can be adhered. That is, since a plurality of substrates SA for film formation can be obtained by one suction operation of the suction device 15, the work efficiency of the preparation step for preparing the substrate SA for film formation can be improved.

‧如圖8所示,複數個基板用保護具11可作為該等複數個基板用保護具11連結而成之連結體20而構成。該連結體20中,雖使用基材片12連結複數個基板用保護具11,但也可使用間隔物14連結,亦可藉由另外設置膠帶材等連結材而連結。藉由如上述使用連結體20,可將複數個成膜用基板SA作為一體而處理,例如,可提高於成膜步驟所使用的對成膜裝置之複數個成膜用基板SA的運入作業、運出作業之效率。又,藉由使用連結體20,也易於懸吊複數個成膜用基板SA而進行配置。• As shown in FIG. 8 , a plurality of substrate protectors 11 can be configured as a connecting body 20 in which the plurality of substrate protectors 11 are connected. In this connection body 20, although the base material sheet 12 is used to connect the plurality of substrate protectors 11, the spacers 14 may be used to connect them, or a connection material such as an adhesive tape may be provided separately. By using the coupling body 20 as described above, the plurality of film-forming substrates SA can be handled as one body, and, for example, the operation of carrying in the plurality of film-forming substrates SA of the film forming apparatus used in the film forming step can be improved. , The efficiency of shipping out operations. Moreover, by using the coupling body 20, it is easy to suspend and arrange|position the several board|substrates SA for film formation.

11‧‧‧基板用保護具 12‧‧‧基材片 12a‧‧‧貫通孔 13‧‧‧黏著層 14‧‧‧間隔物 F‧‧‧功能性膜 S‧‧‧基板 S1‧‧‧第一主面 S2‧‧‧第二主面 SA‧‧‧成膜用基板 SF‧‧‧附膜基板11‧‧‧Protective tools for substrates 12‧‧‧Substrate sheet 12a‧‧‧Through hole 13‧‧‧Adhesive layer 14‧‧‧Spacers F‧‧‧functional film S‧‧‧Substrate S1‧‧‧First main face S2‧‧‧Second main surface SA‧‧‧Substrate for film formation SF‧‧‧Substrate with film

圖1為表示實施形態的基板用保護具之分解立體圖。 圖2為表示成膜用基板的立體圖。 圖3為說明成膜用基板之準備步驟的立體圖。 圖4為說明成膜用基板之準備步驟的端視圖。 圖5為說明成膜用基板之準備步驟的端視圖。 圖6為表示基板用保護具及附膜基板之立體圖。 圖7為說明成膜用基板之準備步驟的變更例之立體圖。 圖8為說明成膜用基板之準備步驟的變更例之立體圖。FIG. 1 is an exploded perspective view showing the protector for substrates according to the embodiment. FIG. 2 is a perspective view showing a substrate for film formation. FIG. 3 is a perspective view illustrating a preparation step of the substrate for film formation. 4 is an end view illustrating a preparation step of the substrate for film formation. 5 is an end view illustrating a preparation step of the substrate for film formation. FIG. 6 is a perspective view showing a substrate protector and a film-attached substrate. FIG. 7 is a perspective view illustrating a modified example of the preparation process of the substrate for film formation. FIG. 8 is a perspective view illustrating a modified example of the preparation process of the substrate for film formation.

11‧‧‧基板用保護具 11‧‧‧Protective tools for substrates

12‧‧‧基材片 12‧‧‧Substrate sheet

12a‧‧‧貫通孔 12a‧‧‧Through hole

13‧‧‧黏著層 13‧‧‧Adhesive layer

14‧‧‧間隔物 14‧‧‧Spacers

S‧‧‧基板 S‧‧‧Substrate

S1‧‧‧第一主面 S1‧‧‧First main face

S2‧‧‧第二主面 S2‧‧‧Second main surface

Claims (3)

一種基板用保護具,對具有第一主面和位於與該第一主面相反的一側的第二主面之基板的該第一主面進行保護,其特徵在於,具備:基材片,構成為至少可覆蓋該基板之周緣部的尺寸;黏著層,可黏著於該基板的周緣部;與可撓性之間隔物,配置於該基材片與該黏著層之間,該基材片於由該黏著層及該間隔物包圍之位置具有貫通孔,該貫通孔可將該基板與該基材片之間的空氣整體地排出。 A substrate protector for protecting the first main surface of a substrate having a first main surface and a second main surface located on the opposite side of the first main surface, comprising: a base material sheet, It is configured to at least cover the size of the peripheral portion of the substrate; the adhesive layer can be adhered to the peripheral portion of the substrate; and the flexible spacer is disposed between the substrate sheet and the adhesive layer, the substrate sheet A through hole is provided at the position surrounded by the adhesive layer and the spacer, and the through hole can exhaust the air between the substrate and the base material sheet as a whole. 如申請專利範圍第1項的基板用保護具,該間隔物於該基板用保護具未承受負重之狀態下,較該黏著層更厚地構成於該基板。 According to the protector for a substrate of claim 1, the spacer is formed on the substrate thicker than the adhesive layer when the protector for a substrate is not loaded. 一種附膜基板的製造方法,使用如申請專利範圍第1項或第2項的基板用保護具製造附膜基板,其特徵在於,具備:準備步驟,經由該基板用保護具之基材片的貫通孔吸引基板,準備將該基板用保護具與該基板黏著而成的成膜用基板;與成膜步驟,於該成膜用基板的該基板之該第二主面將功能性膜進行成膜。 A method for producing a film-attached substrate, wherein a film-attached substrate is produced by using the substrate protector according to claim 1 or 2 of the scope of application, characterized in that it comprises: a preparation step of passing through the substrate sheet of the substrate protector. The through hole sucks the substrate to prepare a film-forming substrate formed by adhering the substrate protector to the substrate; and the film-forming step is to form a functional film on the second main surface of the substrate of the film-forming substrate membrane.
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