TWI774894B - Substrate protector and method for producing film-attached substrate - Google Patents
Substrate protector and method for producing film-attached substrate Download PDFInfo
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- TWI774894B TWI774894B TW107144833A TW107144833A TWI774894B TW I774894 B TWI774894 B TW I774894B TW 107144833 A TW107144833 A TW 107144833A TW 107144833 A TW107144833 A TW 107144833A TW I774894 B TWI774894 B TW I774894B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
Abstract
基板用保護具(11)具備:基材片(12),構成為至少可覆蓋基板(S)之周緣部的尺寸;黏著層(13),可黏著於基板(S)的周緣部;及可撓性之間隔物(14),配置於基材片(12)與黏著層(13)之間。基材片(12)於由黏著層(13)及間隔物(14)包圍之位置具有貫通孔(12a)。附膜基板的製造方法具備:準備步驟,經由基板用保護具(11)之基材片(12)的貫通孔(12a)吸引基板(S),準備將基板用保護具(11)與基板(S)黏著而成的成膜用基板;及成膜步驟,於成膜用基板的基板(S)之第二主面(S2)形成功能性膜。The substrate protector (11) is provided with: a base material sheet (12) having a size that can cover at least the peripheral portion of the substrate (S); an adhesive layer (13) capable of being adhered to the peripheral portion of the substrate (S); and The flexible spacer (14) is arranged between the base material sheet (12) and the adhesive layer (13). The substrate sheet (12) has a through hole (12a) at a position surrounded by the adhesive layer (13) and the spacer (14). The method for producing a film-attached substrate includes a preparation step of sucking the substrate (S) through the through hole (12a) of the base sheet (12) of the substrate protector (11), and preparing the substrate protector (11) and the substrate ( S) the adhered film-forming substrate; and a film-forming step of forming a functional film on the second main surface ( S2 ) of the substrate (S) of the film-forming substrate.
Description
本發明係關於基板用保護具以及附膜基板的製造方法。The present invention relates to a substrate protection tool and a method for producing a film-attached substrate.
有於玻璃基板等基板的兩個主面中,僅在基板的一個主面將功能性膜進行成膜的情形。該情形時,藉由基板用保護具保護基板的另一主面,藉此可抑制基板的另一主面形成功能性膜。例如,專利文獻1中,藉由使用具有附著在基板的非成膜對象之側的主面的周緣部之附著面的治具,防止成膜材料向該主面迂繞。In the two main surfaces of substrates such as glass substrates, the functional film may be formed on only one main surface of the substrate. In this case, by protecting the other main surface of the substrate with the substrate protector, it is possible to suppress the formation of a functional film on the other main surface of the substrate. For example, in
專利文獻1:日本特開2016-197623號公報Patent Document 1: Japanese Patent Laid-Open No. 2016-197623
如上述之先前技術,關於在僅於基板之一個主面將功能性膜進行成膜時, 抑制由成膜材料之迂繞造成的成膜材料對基板的另一主面周緣部之附著的技術,尚有改善的餘地。As in the above-mentioned prior art, when a functional film is formed on only one main surface of a substrate, the adhesion of the film-forming material to the peripheral edge portion of the other main surface of the substrate due to the winding of the film-forming material is suppressed. , there is still room for improvement.
本發明的目的在於提供一種可僅在基板的一個主面適當地將功能性膜進行成膜之基板用保護具以及附膜基板的製造方法。An object of the present invention is to provide a substrate protector and a method for producing a film-attached substrate that can appropriately form a functional film only on one main surface of a substrate.
解決上述課題的基板用保護具,對具有第一主面和位於與該第一主面相反的一側的第二主面之基板的該第一主面進行保護,其具備:基材片,構成為至少可覆蓋該基板之周緣部的尺寸;黏著層,可黏著於該基板的周緣部;與可撓性之間隔物,配置於該基材片與該黏著層之間,該基材片於由該黏著層及該間隔物包圍之位置具有貫通孔。A substrate protector for solving the above-mentioned problems, which protects the first main surface of a substrate having a first main surface and a second main surface located on the opposite side of the first main surface, comprising: a base material sheet, It is configured to at least cover the size of the peripheral portion of the substrate; the adhesive layer can be adhered to the peripheral portion of the substrate; and the flexible spacer is disposed between the substrate sheet and the adhesive layer, the substrate sheet A through hole is provided at the position surrounded by the adhesive layer and the spacer.
根據該構成,可於功能性膜之成膜前,經由基材片的貫通孔吸引基板,藉由黏著層將基板的周緣部與基材片的周緣部進行黏著,於功能性膜之成膜時可抑制成膜材料迂繞而附著於基板的第一主面之周緣部。According to this configuration, before the film formation of the functional film, the substrate can be sucked through the through holes of the base sheet, and the peripheral portion of the substrate and the peripheral portion of the base sheet can be adhered by the adhesive layer to form the functional film. In this case, the film-forming material can be prevented from winding around and adhering to the peripheral portion of the first main surface of the substrate.
又,基板於例如為0.05~1.5mm薄之情形時,在吸引時即使基板撓曲,由於可撓性之間隔物也撓曲,故不會有黏著層自基板之周緣部剝離的情形。又,將基板用保護具安裝於基板時,由於亦可不將基板之第二主面按壓於治具等,故易於保持基板的第二主面之清潔性。When the substrate is thin, for example, 0.05 to 1.5 mm, even if the substrate is deflected during suction, the flexible spacer is also deflected, so that the adhesive layer does not peel off from the peripheral edge of the substrate. Moreover, when attaching the board|substrate protector to a board|substrate, since it is not necessary to press the 2nd main surface of a board|substrate to a jig etc., it becomes easy to maintain the cleanliness of the 2nd main surface of a board|substrate.
解決上述課題之附膜基板的製造方法使用上述基板用保護具製造附膜基板,其具備:準備步驟,經由該基板用保護具之基材片的貫通孔吸引基板,準備將該基板用保護具與該基板黏著而成的成膜用基板;與成膜步驟,於該成膜用基板的該基板之該第二主面將功能性膜進行成膜。A method for producing a film-attached substrate that solves the above-mentioned problems is to produce a film-attached substrate using the above-mentioned substrate protector, comprising a preparation step of sucking a substrate through a through hole of a base sheet of the substrate protector to prepare the substrate protector A film-forming substrate adhered to the substrate; and a film-forming step of forming a functional film on the second main surface of the substrate of the film-forming substrate.
根據本發明,可僅於基板之一個主面適當地將功能性膜進行成膜。According to the present invention, the functional film can be appropriately formed only on one main surface of the substrate.
以下,針對本發明之基板用保護具及附膜基板的製造方法之實施形態,參照圖式進行說明。再者,圖式中,為了便於說明,有誇張地表示構成之一部分(例如厚度)的情形。又,針對各部分之尺寸比例,有與實際不同的情形。Hereinafter, the embodiment of the manufacturing method of the protective tool for substrates and the film-attached board|substrate of this invention is demonstrated with reference to drawings. In addition, in the drawings, for convenience of explanation, a part (for example, thickness) of the structure is shown exaggeratedly. In addition, the dimensional ratio of each part may be different from the actual one.
如圖1所示,使用基板用保護具11保護的基板S,具有第一主面S1與第一主面S1的相反側之第二主面S2。基板用保護具11保護基板S的第一主面S1。第一主面S1被基板用保護具11保護之基板S的第二主面S2,為將功能性膜進行成膜之主面,藉由於該第二主面S2將功能性膜進行成膜,可獲得附膜基板。本實施形態中,雖使用玻璃基板作為基板S,但例如亦可使用樹脂基板或陶瓷基板。As shown in FIG. 1, the board|substrate S protected by the board|
基板用保護具11具備:基材片12,構成為至少可覆蓋基板S之周緣部的尺寸;黏著層13,可黏著於基板S的周緣部;與可撓性之間隔物14,配置於基材片12與黏著層13之間。The
作為基材片12之材料,例如可列舉樹脂材料或橡膠材料等高分子材料、以及金屬材料。作為樹脂材料,例如可列舉聚烯烴樹脂、聚酯樹脂、聚醯胺樹脂、及聚醯亞胺樹脂。作為橡膠材料,例如可列舉矽氧橡膠、胺甲酸乙酯橡膠、氯平橡膠、苯乙烯-丁二烯橡膠、及乙烯-丙烯-二烯橡膠。作為金屬材料,例如可列舉鋁及不鏽鋼。例如,功能性膜之成膜伴隨加熱的情形時,使用可耐受成膜時之熱的耐熱性之基材片即可。基材片12的厚度例如為10μm以上500μm以下之範圍。Examples of the material of the
黏著層13沿著基板S的第一主面S1之周緣部形成連續的環狀。黏著層13可由周知之黏著材料構成。作為黏著層13,例如可列舉聚矽氧系黏著層、丙烯酸系黏著層及胺甲酸乙酯系黏著層。例如,功能性膜之成膜伴隨加熱的情形時,使用可耐受成膜時之熱的耐熱性之黏著層即可。黏著層13可由構成雙面黏著膠帶的一個面之黏著層或藉由塗布於間隔物14而形成之黏著層構成。本實施形態中,藉由將雙面黏著膠帶貼合於間隔物14,將黏著層13設於間隔物14。即,黏著層13黏著於間隔物14。The
再者,圖式中,省略雙面黏著膠帶的支承體及構成雙面黏著膠帶的另一面的黏著層(將支承體黏著於間隔物14之黏著層)。雙面黏著膠帶之支承體例如由聚醯亞胺膜或PET膜等樹脂膜構成。In addition, in the drawings, the support of the double-sided adhesive tape and the adhesive layer constituting the other side of the double-sided adhesive tape (the adhesive layer for adhering the support to the spacer 14 ) are omitted. The support of the double-sided adhesive tape is formed of a resin film such as a polyimide film or a PET film, for example.
黏著層13黏著於基板S的黏著力例如較佳為3.0(N/25mm寬)以下之弱黏著性,以便於功能性膜之成膜後可使黏著層13容易地自基板S剝離。再者,為了易於確保相對於基板S之密接性,黏著層13之相對於基板S的黏著力的下限較佳為0.05(N/25mm寬)以上。黏著層13之黏著力是以JIS Z0237(2009)所規定之180∘剝離試驗為基準而測量。再者,JIS Z0237(2009)對應於國際標準之ISO 29862:2007、ISO 29863:2007及ISO 29864:2007。The adhesive force of the
如圖1、圖2及圖4所示,基材片12於由黏著層13及間隔物14包圍之位置具有貫通孔12a。若詳細描述,基材片12中由黏著層13及間隔物14包圍之上表面為露出面,與基板S之第一主面S1對向。基材片12之貫通孔12a於將基板用保護具11安裝於基板S時,作為用於排出基板S與基材片12之間的空氣之空氣排出孔使用。貫通孔12a之數量可如本實施形態般為單個,也可變更為複數。貫通孔12a之形狀可如本實施形態般為四角形狀,例如也可變更為圓形狀。於將基板片12之面積設為100%時,貫通孔12a之面積例如較佳可為5%以上50%以下之範圍。貫通孔12a之面積越大,越更易於發揮作為空氣排出孔之功能。貫通孔12a之面積越小,越可藉由基材片12更寬廣地覆蓋基板S的第一主面S1,故易於保持第一主面S1的清潔性。貫通孔12a較佳形成於俯視基材片12時較黏著層13及間隔物14更靠近基材片12之中央的位置。此情形時,可將基板S與基材片12之間的空氣整體平衡良好地排出。As shown in FIGS. 1 , 2 and 4 , the
間隔物14沿著基板S的第一主面S1之周緣部形成為連續的環狀。作為構成間隔物14之可撓性的材料,例如可列舉織布或不織布、高分子材料、及橡膠材料。作為織布或不織布,例如可舉玻璃纖維布。作為橡膠材料,例如可列舉聚矽氧橡膠、胺甲酸乙酯橡膠、氯平橡膠、苯乙烯-丁二烯橡膠、及乙烯-丙烯-二烯橡膠。間隔物14可為單層結構,也可為由同種或不同種材料構成之多層結構。例如,功能性膜之成膜伴隨加熱的情形,使用可耐受成膜時之熱的間隔物即可。間隔物14可藉由周知之接著劑或黏著劑固定於基材片12。例如可使用將間隔物14作為支承體而構成之單面黏著膠帶(玻璃纖維膠帶等)將間隔物14固定於基材片12。間隔物14之厚度例如為150μm~5mm之範圍。間隔物14較佳於將基板用保護具11安裝於基板S前之狀態,即基板用保護具11未承受負重之狀態下,較黏著層13更厚地構成。The
接著,針對附膜基板的製造方法進行說明。Next, the manufacturing method of the film-attached board|substrate is demonstrated.
如圖2所示,附膜基板的製造方法具備:準備步驟,藉由將基板用保護具11安裝於基板S,準備具有基板S與基板用保護具11之成膜用基板SA;與成膜步驟,於成膜用基板SA之基板S的第二主面S2將功能性膜進行成膜。準備步驟中,經由基板用保護具11的基材片12之貫通孔12a吸引基板S,準備將基板用保護具11與基板S黏著而成的成膜用基板。As shown in FIG. 2 , the method for producing a film-attached substrate includes: a preparation step of preparing a film-forming substrate SA including the substrate S and the substrate-protecting
如圖3及圖5所示,本實施形態的準備步驟中,為了吸引基板S使用吸引裝置15。吸引裝置15具備減壓室16、將減壓室16內之空氣進行排氣的排氣部17、載置基板用保護具11之載置面18與於載置面18開口並且吸引減壓室16的外部之空氣的吸引部19。於排氣部17連接省略了圖示之周知的真空泵。As shown in FIGS. 3 and 5 , in the preparation steps of the present embodiment, the
對於在準備步驟中獲得成膜用基板SA,首先以基板用保護具11之黏著層13面向上方的方式,將基板用保護具11載置於吸引裝置15的載置面18後,於該基板用保護具11之黏著層13上載置基板S。For the film-forming substrate SA obtained in the preparation step, first, the
接著,如圖5所示,將吸引裝置15之減壓室16內的空氣自排氣部17進行排氣。藉此,吸引裝置15之吸引部19經由基板用保護具11之基材片12的貫通孔12a,吸引基板用保護具11之基材片12與基板S之間的空氣。藉此,藉由基板S被按壓於基板用保護具11之黏著層13,可將基板用保護具11安裝於基板S。Next, as shown in FIG. 5 , the air in the
此處,使用吸引裝置15吸引基板用保護具11之基材片12與基板S之間的空氣時,有平板狀之基板S在吸引裝置15側彎曲為凸形之情形。例如,作為平板狀之基板S,使用厚度為0.05~1.5mm之玻璃基板的情形時,有容易造成此種彎曲之傾向。然而,即使因利用吸引裝置15進行之吸引而基板S撓曲,由於可撓性之間隔物14亦撓曲,故黏著層13不會自基板S的周緣部剝離。Here, when the
藉由在安裝於基板用保護具11之基板S的第二主面S2將功能性膜進行成膜而製作附膜基板。附膜基板SF之製造方法的成膜步驟中,可使用濺鍍法等PVD(Physical Vapor Deposition,物理氣相沉積)法、CVD(Chemical Vapor Deposition,化學氣相沈積)法、噴霧、旋轉塗布等塗布法等周知之成膜法。作為功能性膜F(參照圖6),例如可列舉具有既定之光學特性的膜(介電質膜等)、具有既定之機械特性的膜、具有既定之化學特性的膜、以及具有既定之顏色的膜。用於形成功能性膜F之成膜材料,可為無機材料,也可為有機材料。A film-attached board|substrate is produced by film-forming a functional film on the 2nd main surface S2 of the board|substrate S mounted in the board|
成膜步驟能夠以成膜用基板SA的第二主面S2成為水平之姿勢、成為垂直之姿勢、或既非水平亦非垂直之傾斜的姿勢的任一姿勢進行。例如,將成膜用基板SA配置為成膜用基板SA的第二主面S2成為垂直之姿勢的情形時,能夠以基材片12較基板S更向外側突出之方式變更基板用保護具11之基材片12的形狀,利用該突出部分懸吊成膜用基板SA。The film-forming step can be performed in any of a posture in which the second main surface S2 of the film-forming substrate SA is horizontal, a vertical posture, or an inclined posture that is neither horizontal nor vertical. For example, when the film-forming substrate SA is arranged so that the second main surface S2 of the film-forming substrate SA is vertical, the
如圖6所示,於成膜步驟獲得之附膜基板SF具有設於基板S之第二主面S2的功能性膜F,自基板用保護具11之黏著層13被取下。As shown in FIG. 6 , the film-attached substrate SF obtained in the film forming step has the functional film F provided on the second main surface S2 of the substrate S, and is removed from the
成膜步驟後之基板用保護具11可重複使用於其他附膜基板SF之製造。又,即使於基板用保護具11為複數之情形,由於基板用保護具11之厚度比較薄,故藉由在厚度方向將複數個基板用保護具11重合,可緊密地匯總而進行保管。The
接著,針對本實施形態的作用及效果進行說明。Next, the action and effect of this embodiment will be described.
(1)基板用保護具11具有:基材片12,構成為至少可覆蓋基板S之周緣部的尺寸;黏著層13,可黏著於基板S的周緣部;與可撓性之間隔物14,配置於基材片12與黏著層13之間。基材片12於由黏著層13及間隔物14包圍之位置具有貫通孔12a。(1) The
根據該構成,可於功能性膜F之成膜前經由吸引基材片12的貫通孔12a吸引基板S,藉由黏著層13黏著基板S的周緣部與基材片12的周緣部,於功能性膜F之成膜時可抑制成膜材料迂繞而附著於基板S的第一主面S1之周緣部。According to this configuration, the substrate S can be sucked through the through
又,基板S於例如為0.05~1.5mm薄之情形時,在吸引時即使基板S撓曲,由於可撓性之間隔物14也撓曲,故不會有黏著層13自基板S之周緣部剝離的情形。又,將基板用保護具11安裝於基板S時,由於亦可不將基板S之第二主面S2按壓於治具等,故易於保持基板S的第二主面S2之清潔性。In addition, when the substrate S is thin, for example, 0.05 to 1.5 mm, even if the substrate S is deflected during suction, the
因此,可僅於基板S的第二主面S2適當地將功能性膜F進行成膜。Therefore, the functional film F can be appropriately formed only on the second main surface S2 of the substrate S.
(2)基板用保護具11之黏著層13形成為環狀。該情形時,可於功能性膜F成膜時進一步抑制成膜材料迂繞而附著於基板S的第一主面S1之周緣部。因此,可僅於基板S的第二主面S2更適當地將功能性膜F進行成膜。(2) The
又,由於基板用保護具11之黏著層13形成為僅可黏著於基板S的周緣部而非基板S的整面,故基板用保護具11不會過度地黏著於基板S,於功能性膜F之成膜後可容易地將基板用保護具11自基板S剝下。又,由於黏著層13形成為僅可黏著於基板S的周緣部而非基板S的整面,故可避免黏著劑轉印至基板S的第一主面S1中影響基板S的功能之範圍。In addition, since the
(3)附膜基板SF的製造方法具備:準備步驟,經由基板用保護具11之基材片12的貫通孔12a吸引基板S,準備將基板用保護具11與基板S黏著而成的成膜用基板SA;與成膜步驟,於成膜用基板SA的基板S之第二主面S2將功能性膜F進行成膜。(3) The method for producing the film-attached substrate SF includes a preparation step of sucking the substrate S through the through
根據該方法,可獲得與上述(1)欄所述之效果相同的效果。According to this method, the same effects as those described in the above-mentioned column (1) can be obtained.
(變更例) 本實施形態可如下述進行變更而實施。(change example) This embodiment can be implemented with the following modifications.
上述實施形態的基板用保護具11之間隔物14雖固定於基板用保護具11的基材片12,但也可配置成不固定於基材片12而重疊於基材片12,例如,可固定於吸引裝置15的載置面18。Although the
基板用保護具11的黏著層13也可形成為環狀以外之形狀。可將基板用保護具11的黏著層13例如變更為對應於基板S的對向之兩邊的複數黏著層。The
基板S的形狀不限於平板狀,也可為彎曲板狀。The shape of the substrate S is not limited to a flat plate shape, and may be a curved plate shape.
基板用保護具11的外形可依據基板S的外形適當變更。The external shape of the
如圖7所示,可將吸引裝置15變更為可載置複數個基板用保護具11與複數個基板S。即,吸引裝置15之吸引部19的數量可對應載置於吸引裝置15的載置面18之基板用保護具11(基板S)的數量而變更。該情形時,例如針對尺寸小於圖7所示的基板S之基板,也可使用相同的吸引裝置15。也就是說,即便變更基板S的尺寸也可使用相同的吸引裝置15。又,藉由吸引裝置15之一次吸引操作,可使複數個基板用保護具11與複數個基板S黏著。即,藉由吸引裝置15之一次吸引操作,可獲得複數個成膜用基板SA,故可提高準備成膜用基板SA之準備步驟的作業效率。As shown in FIG. 7 , the
‧如圖8所示,複數個基板用保護具11可作為該等複數個基板用保護具11連結而成之連結體20而構成。該連結體20中,雖使用基材片12連結複數個基板用保護具11,但也可使用間隔物14連結,亦可藉由另外設置膠帶材等連結材而連結。藉由如上述使用連結體20,可將複數個成膜用基板SA作為一體而處理,例如,可提高於成膜步驟所使用的對成膜裝置之複數個成膜用基板SA的運入作業、運出作業之效率。又,藉由使用連結體20,也易於懸吊複數個成膜用基板SA而進行配置。• As shown in FIG. 8 , a plurality of
11‧‧‧基板用保護具
12‧‧‧基材片
12a‧‧‧貫通孔
13‧‧‧黏著層
14‧‧‧間隔物
F‧‧‧功能性膜
S‧‧‧基板
S1‧‧‧第一主面
S2‧‧‧第二主面
SA‧‧‧成膜用基板
SF‧‧‧附膜基板11‧‧‧Protective tools for
圖1為表示實施形態的基板用保護具之分解立體圖。 圖2為表示成膜用基板的立體圖。 圖3為說明成膜用基板之準備步驟的立體圖。 圖4為說明成膜用基板之準備步驟的端視圖。 圖5為說明成膜用基板之準備步驟的端視圖。 圖6為表示基板用保護具及附膜基板之立體圖。 圖7為說明成膜用基板之準備步驟的變更例之立體圖。 圖8為說明成膜用基板之準備步驟的變更例之立體圖。FIG. 1 is an exploded perspective view showing the protector for substrates according to the embodiment. FIG. 2 is a perspective view showing a substrate for film formation. FIG. 3 is a perspective view illustrating a preparation step of the substrate for film formation. 4 is an end view illustrating a preparation step of the substrate for film formation. 5 is an end view illustrating a preparation step of the substrate for film formation. FIG. 6 is a perspective view showing a substrate protector and a film-attached substrate. FIG. 7 is a perspective view illustrating a modified example of the preparation process of the substrate for film formation. FIG. 8 is a perspective view illustrating a modified example of the preparation process of the substrate for film formation.
11‧‧‧基板用保護具 11‧‧‧Protective tools for substrates
12‧‧‧基材片 12‧‧‧Substrate sheet
12a‧‧‧貫通孔 12a‧‧‧Through hole
13‧‧‧黏著層 13‧‧‧Adhesive layer
14‧‧‧間隔物 14‧‧‧Spacers
S‧‧‧基板 S‧‧‧Substrate
S1‧‧‧第一主面 S1‧‧‧First main face
S2‧‧‧第二主面 S2‧‧‧Second main surface
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JP2010123598A (en) * | 2008-11-17 | 2010-06-03 | Lintec Corp | Device, method and tool for supporting plate-like member |
TW201430160A (en) * | 2012-12-21 | 2014-08-01 | Asahi Glass Co Ltd | Substrate holder and production method for substrate having film formed over entire surface thereof using same |
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