JPWO2019117186A1 - Protective equipment for substrates and manufacturing method for substrates with film - Google Patents

Protective equipment for substrates and manufacturing method for substrates with film Download PDF

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JPWO2019117186A1
JPWO2019117186A1 JP2019559685A JP2019559685A JPWO2019117186A1 JP WO2019117186 A1 JPWO2019117186 A1 JP WO2019117186A1 JP 2019559685 A JP2019559685 A JP 2019559685A JP 2019559685 A JP2019559685 A JP 2019559685A JP WO2019117186 A1 JPWO2019117186 A1 JP WO2019117186A1
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substrate
film
adhesive layer
main surface
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JP7222357B2 (en
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悦二 福井
悦二 福井
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Nippon Electric Glass Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

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  • Laminated Bodies (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
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Abstract

基板用保護具(11)は、少なくとも基板(S)の周縁部を覆うことが可能なサイズに構成された基材シート(12)と、基板(S)の周縁部に粘着可能な粘着層(13)と、基材シート(12)と粘着層(13)との間に配置される可撓性のスペーサー(14)とを備える。基材シート(12)は、粘着層(13)及びスペーサー(14)により囲まれる位置に貫通孔(12a)を有する。膜付き基板の製造方法は、基板用保護具(11)の基材シート(12)の貫通孔(12a)を通じて基板(S)を吸引し、基板用保護具(11)と基板(S)とが粘着した成膜用基板を準備する準備工程と、成膜用基板における基板(S)の第2主面(S2)に機能性膜を成膜する成膜工程とを備える。The substrate protective equipment (11) includes a substrate sheet (12) having a size capable of covering at least the peripheral edge of the substrate (S) and an adhesive layer (adhesive) that can adhere to the peripheral edge of the substrate (S). 13) and a flexible spacer (14) arranged between the base sheet (12) and the adhesive layer (13). The base sheet (12) has a through hole (12a) at a position surrounded by the adhesive layer (13) and the spacer (14). In the method of manufacturing a substrate with a film, the substrate (S) is sucked through the through hole (12a) of the substrate sheet (12) of the substrate protective tool (11), and the substrate protective tool (11) and the substrate (S) are combined. It is provided with a preparatory step of preparing a film-forming substrate to which is adhered, and a film-forming step of forming a functional film on the second main surface (S2) of the substrate (S) of the film-forming substrate.

Description

本発明は、基板用保護具、及び膜付き基板の製造方法に関する。 The present invention relates to a protective device for a substrate and a method for manufacturing a substrate with a film.

ガラス基板等の基板の両主面のうち、基板の一方の主面のみに機能性膜を成膜する場合がある。この場合、基板の他方の主面を基板用保護具により保護することで、基板の他方の主面における機能性膜の成膜を抑えることができる。例えば、特許文献1では、基板の成膜対象ではない側の主面における周縁部に付着する付着面を有する治具を用いることで、当該主面への成膜材料の回り込みを防いでいる。 Of both main surfaces of a substrate such as a glass substrate, a functional film may be formed only on one main surface of the substrate. In this case, by protecting the other main surface of the substrate with a protective tool for the substrate, it is possible to suppress the formation of a functional film on the other main surface of the substrate. For example, in Patent Document 1, by using a jig having an adhering surface that adheres to the peripheral edge portion of the main surface of the substrate that is not the object of film formation, the film-forming material is prevented from wrapping around the main surface.

特開2016−197623号公報Japanese Unexamined Patent Publication No. 2016-197623

上記従来技術のように、基板の一方の主面のみに機能性膜を成膜する際に、成膜材料の回り込みによる基板の他方の主面周縁部への成膜材料の付着を抑える技術について未だ改善の余地がある。 A technique for suppressing adhesion of a film-forming material to the peripheral edge of the other main surface of a substrate due to wraparound of the film-forming material when a functional film is formed on only one main surface of the substrate as in the above-mentioned conventional technique. There is still room for improvement.

本発明の目的は、基板の一方の主面のみに機能性膜を好適に成膜することのできる基板用保護具、及び膜付き基板の製造方法を提供することにある。 An object of the present invention is to provide a protective device for a substrate capable of suitably forming a functional film on only one main surface of the substrate, and a method for manufacturing a substrate with a film.

上記課題を解決する基板用保護具は、第1主面と、前記第1主面の反対側の第2主面とを有する基板の前記第1主面を保護する基板用保護具であって、少なくとも前記基板の周縁部を覆うことが可能なサイズに構成された基材シートと、前記基板の周縁部に粘着可能な粘着層と、前記基材シートと前記粘着層との間に配置される可撓性のスペーサーと、を備え、前記基材シートは、前記粘着層及び前記スペーサーにより囲まれる位置に貫通孔を有する。 The protective device for a substrate that solves the above problems is a protective device for a substrate that protects the first main surface of a substrate having a first main surface and a second main surface opposite to the first main surface. , A base sheet having a size capable of covering at least the peripheral edge of the substrate, an adhesive layer adhesive to the peripheral edge of the substrate, and arranged between the base sheet and the adhesive layer. The base material sheet is provided with a flexible spacer, and has a through hole at a position surrounded by the adhesive layer and the spacer.

この構成によれば、機能性膜の成膜前に基材シートの貫通孔を通じて基板を吸引し、粘着層により基板の周縁部と基材シートの周縁部とを粘着することができ、機能性膜の成膜時に成膜材料が回り込んで基板の第1主面の周縁部に付着することを抑制できる。 According to this configuration, the substrate can be sucked through the through hole of the base material sheet before the formation of the functional film, and the peripheral portion of the substrate and the peripheral edge portion of the base material sheet can be adhered by the adhesive layer, which is functional. It is possible to prevent the film-forming material from wrapping around and adhering to the peripheral edge of the first main surface of the substrate when the film is formed.

また、基板が、例えば0.05〜1.5mmと薄い場合には、吸引時に基板が撓んだとしても、可撓性のスペーサーも撓むため、基板の周縁部から粘着層が剥がれることがない。また、基板に基板用保護具を取り付ける際に、基板の第2主面を治具等で押圧しなくてもよいため、基板の第2主面の清浄性が保たれ易い。 Further, when the substrate is as thin as 0.05 to 1.5 mm, even if the substrate bends during suction, the flexible spacer also bends, so that the adhesive layer may peel off from the peripheral edge of the substrate. Absent. Further, when the protective device for the substrate is attached to the substrate, it is not necessary to press the second main surface of the substrate with a jig or the like, so that the cleanliness of the second main surface of the substrate can be easily maintained.

上記課題を解決する膜付き基板の製造方法は、上記基板用保護具を用いて膜付き基板を製造する膜付き基板の製造方法であって、前記基板用保護具の基材シートの貫通孔を通じて基板を吸引し、前記基板用保護具と前記基板とが粘着した成膜用基板を準備する準備工程と、前記成膜用基板における前記基板の前記第2主面に機能性膜を成膜する成膜工程とを備える。 The method for manufacturing a substrate with a film that solves the above problems is a method for manufacturing a substrate with a film using the protective tool for the substrate, and is through a through hole in the base material sheet of the protective tool for the substrate. A preparatory step of sucking the substrate to prepare a film-forming substrate on which the substrate protective tool and the substrate are adhered, and forming a functional film on the second main surface of the substrate in the film-forming substrate. It includes a film forming process.

本発明によれば、基板の一方の主面のみに機能性膜を好適に成膜することができる。 According to the present invention, a functional film can be suitably formed on only one main surface of a substrate.

実施形態における基板用保護具を示す分解斜視図である。It is an exploded perspective view which shows the protective equipment for a substrate in an embodiment. 成膜用基板を示す斜視図である。It is a perspective view which shows the substrate for film formation. 成膜用基板の準備工程を説明する斜視図である。It is a perspective view explaining the preparation process of the substrate for film formation. 成膜用基板の準備工程を説明する端面図である。It is an end view explaining the preparation process of the film-forming substrate. 成膜用基板の準備工程を説明する端面図である。It is an end view explaining the preparation process of the film-forming substrate. 基板用保護具及び膜付き基板を示す斜視図である。It is a perspective view which shows the protective equipment for a substrate and the substrate with a film. 成膜用基板の準備工程の変更例を説明する斜視図である。It is a perspective view explaining the change example of the preparation process of the film-forming substrate. 成膜用基板の準備工程の変更例を説明する斜視図である。It is a perspective view explaining the change example of the preparation process of the film-forming substrate.

以下、本発明の基板用保護具、及び膜付き基板の製造方法の実施形態について図面を参照して説明する。なお、図面では、説明の便宜上、構成の一部(例えば、厚さ)を誇張して示す場合がある。また、各部分の寸法比率についても、実際と異なる場合がある。 Hereinafter, embodiments of the substrate protective tool of the present invention and the method for manufacturing a substrate with a film will be described with reference to the drawings. In the drawings, for convenience of explanation, a part (for example, thickness) of the configuration may be exaggerated. In addition, the dimensional ratio of each part may differ from the actual one.

図1に示すように、基板用保護具11を用いて保護する基板Sは、第1主面S1と、第1主面S1の反対側の第2主面S2とを有している。基板用保護具11は、基板Sの第1主面S1を保護する。第1主面S1が基板用保護具11で保護された基板Sの第2主面S2は、機能性膜が成膜される主面であり、この第2主面S2に機能性膜を成膜することで、膜付き基板が得られる。本実施形態では、基板Sとしてガラス基板を用いているが、例えば、樹脂基板やセラミック基板を用いることもできる。 As shown in FIG. 1, the substrate S protected by the substrate protective tool 11 has a first main surface S1 and a second main surface S2 on the opposite side of the first main surface S1. The substrate protective tool 11 protects the first main surface S1 of the substrate S. The second main surface S2 of the substrate S in which the first main surface S1 is protected by the protective tool 11 for the substrate is the main surface on which the functional film is formed, and the functional film is formed on the second main surface S2. By forming a film, a substrate with a film can be obtained. In the present embodiment, a glass substrate is used as the substrate S, but for example, a resin substrate or a ceramic substrate can also be used.

基板用保護具11は、少なくとも基板Sの周縁部を覆うことが可能なサイズに構成された基材シート12と、基板Sの周縁部に粘着可能な粘着層13と、基材シート12と粘着層13との間に配置される可撓性のスペーサー14とを備えている。 The substrate protective tool 11 has a substrate sheet 12 having a size capable of covering at least the peripheral edge of the substrate S, an adhesive layer 13 that can be adhered to the peripheral edge of the substrate S, and adhesive to the substrate sheet 12. It includes a flexible spacer 14 arranged between the layer 13 and the layer 13.

基材シート12の材料としては、例えば、樹脂材料又はゴム材料等の高分子材料、及び金属材料が挙げられる。樹脂材料としては、例えば、ポリオレフィン樹脂、ポリエステル樹脂、ポリアミド樹脂、及びポリイミド樹脂が挙げられる。ゴム材料としては、例えば、シリコンゴム、ウレタンゴム、クロロプレンゴム、スチレン・ブタジエンゴム、及びエチレン・プロピレン・ジエンゴムが挙げられる。金属材料としては、例えば、アルミニウム、及びステンレス鋼が挙げられる。例えば、機能性膜の成膜が加熱を伴う場合、成膜時の熱に耐え得る耐熱性の基材シートを用いればよい。基材シート12の厚さは、例えば、10μm以上、500μm以下の範囲である。 Examples of the material of the base sheet 12 include a polymer material such as a resin material or a rubber material, and a metal material. Examples of the resin material include polyolefin resin, polyester resin, polyamide resin, and polyimide resin. Examples of the rubber material include silicon rubber, urethane rubber, chloroprene rubber, styrene / butadiene rubber, and ethylene / propylene / diene rubber. Examples of the metal material include aluminum and stainless steel. For example, when the film formation of the functional film involves heating, a heat-resistant base sheet that can withstand the heat during the film formation may be used. The thickness of the base sheet 12 is, for example, in the range of 10 μm or more and 500 μm or less.

粘着層13は、基板Sの第1主面S1における周縁部に沿って連続する環状に形成されている。粘着層13は、周知の粘着材料から構成することができる。粘着層13としては、例えば、シリコーン系粘着層、アクリル系粘着層、及びウレタン系粘着層が挙げられる。例えば、機能性膜の成膜が加熱を伴う場合、成膜時の熱に耐え得る耐熱性の粘着層を用いればよい。粘着層13は、両面粘着テープの一方の面を構成する粘着層や、スペーサー14に塗布することで形成した粘着層から構成することができる。本実施形態では、両面粘着テープをスペーサー14に貼り合わせることでスペーサー14に粘着層13を設けている。すなわち、粘着層13は、スペーサー14に粘着している。 The adhesive layer 13 is formed in a continuous annular shape along the peripheral edge portion of the first main surface S1 of the substrate S. The adhesive layer 13 can be made of a well-known adhesive material. Examples of the adhesive layer 13 include a silicone-based adhesive layer, an acrylic-based adhesive layer, and a urethane-based adhesive layer. For example, when the film formation of the functional film is accompanied by heating, a heat-resistant adhesive layer capable of withstanding the heat during the film formation may be used. The adhesive layer 13 can be composed of an adhesive layer forming one surface of the double-sided adhesive tape or an adhesive layer formed by applying the adhesive layer 14 to the spacer 14. In the present embodiment, the adhesive layer 13 is provided on the spacer 14 by attaching the double-sided adhesive tape to the spacer 14. That is, the adhesive layer 13 is adhered to the spacer 14.

なお、図面では、両面粘着テープの支持体、及び両面粘着テープの他方の面を構成する粘着層(支持体をスペーサー14に粘着する粘着層)については省略している。両面粘着テープの支持体は、例えば、ポリイミドフィルムやPETフィルム等の樹脂フィルムから構成されている。 In the drawings, the support of the double-sided adhesive tape and the adhesive layer forming the other surface of the double-sided adhesive tape (the adhesive layer that adheres the support to the spacer 14) are omitted. The support of the double-sided adhesive tape is made of, for example, a resin film such as a polyimide film or a PET film.

粘着層13の基板Sに対する粘着力は、機能性膜の成膜後において基板Sから粘着層13を容易に剥離させることができるように、例えば、3.0(N/25mm幅)以下の弱粘着性であることが好ましい。なお、粘着層13の基板Sに対する粘着力の下限は、基板Sに対する密着性を確保し易くするため、0.05(N/25mm幅)以上であることが好ましい。粘着層13の粘着力は、JIS Z0237(2009)に規定される180°剥離試験に準拠して測定される。なお、JIS Z0237(2009)は、国際規格のISO 29862:2007、ISO 29863:2007及びISO 29864:2007に対応している。 The adhesive strength of the adhesive layer 13 to the substrate S is weak, for example, 3.0 (N / 25 mm width) or less so that the adhesive layer 13 can be easily peeled from the substrate S after the functional film is formed. It is preferably sticky. The lower limit of the adhesive force of the adhesive layer 13 to the substrate S is preferably 0.05 (N / 25 mm width) or more in order to facilitate the adhesion to the substrate S. The adhesive strength of the adhesive layer 13 is measured according to the 180 ° peeling test specified in JIS Z0237 (2009). JIS Z0237 (2009) corresponds to the international standards ISO 29862: 2007, ISO 29863: 2007, and ISO 29864: 2007.

図1、図2及び図4に示すように、基材シート12は、粘着層13及びスペーサー14により囲まれる位置に貫通孔12aを有している。詳述すると、基材シート12において粘着層13及びスペーサー14により囲まれる上面は、露出面であり、基板Sの第1主面S1に対向している。基材シート12の貫通孔12aは、基板用保護具11を基板Sに取り付ける際に、基板Sと基材シート12との間の空気を排出するための空気排出孔として用いられる。貫通孔12aの数は、本実施形態のように単数であってもよいし、複数に変更してもよい。貫通孔12aの形状は、本実施形態のように四角形状であってもよいし、例えば、円形状に変更してもよい。貫通孔12aの面積は、基材シート12の面積を100%としたとき、例えば、5%以上、50%以下の範囲であることが好ましい。貫通孔12aの面積が大きいほど、空気排出孔としての機能がより発揮され易くなる。貫通孔12aの面積が小さいほど、基板Sの第1主面S1を基材シート12でより広く覆うことができるため、第1主面S1の清浄性が保たれ易くなる。貫通孔12aは、基材シート12の平面視で粘着層13及びスペーサー14よりも基材シート12の中央に近い位置に形成されていることが好ましい。この場合、基板Sと基材シート12との間の空気を全体にバランスよく排出することができる。 As shown in FIGS. 1, 2 and 4, the base sheet 12 has a through hole 12a at a position surrounded by the adhesive layer 13 and the spacer 14. More specifically, the upper surface of the base material sheet 12 surrounded by the adhesive layer 13 and the spacer 14 is an exposed surface and faces the first main surface S1 of the substrate S. The through hole 12a of the base sheet 12 is used as an air discharge hole for discharging air between the substrate S and the base sheet 12 when the substrate protective tool 11 is attached to the substrate S. The number of through holes 12a may be singular as in the present embodiment, or may be changed to a plurality. The shape of the through hole 12a may be a quadrangular shape as in the present embodiment, or may be changed to a circular shape, for example. The area of the through hole 12a is preferably in the range of, for example, 5% or more and 50% or less when the area of the base sheet 12 is 100%. The larger the area of the through hole 12a, the easier it is for the function as an air discharge hole to be exhibited. As the area of the through hole 12a is smaller, the first main surface S1 of the substrate S can be covered more widely with the base sheet 12, so that the cleanliness of the first main surface S1 can be easily maintained. The through hole 12a is preferably formed at a position closer to the center of the base sheet 12 than the adhesive layer 13 and the spacer 14 in the plan view of the base sheet 12. In this case, the air between the substrate S and the base sheet 12 can be discharged in a well-balanced manner as a whole.

スペーサー14は、基板Sの第1主面S1における周縁部に沿って連続する環状に形成されている。スペーサー14を構成する可撓性の材料としては、例えば、織布又は不織布、高分子材料、及びゴム材料が挙げられる。織布又は不織布としては、例えば、ガラスクロスが挙げられる。ゴム材料としては、例えば、シリコンゴム、ウレタンゴム、クロロプレンゴム、スチレン・ブタジエンゴム、及びエチレン・プロピレン・ジエンゴムが挙げられる。スペーサー14は、単層構造であってもよいし、同種又は異種の材料から構成した多層構造であってもよい。例えば、機能性膜の成膜が加熱を伴う場合、成膜時の熱に耐え得るスペーサーを用いればよい。スペーサー14は、基材シート12に周知の接着剤又は粘着剤で固定することができる。スペーサー14は、例えば、スペーサー14を支持体として構成された片面粘着テープ(ガラスクロステープ等)を用いて基材シート12に固定されてもよい。スペーサー14の厚さは、例えば、150μm〜5mmの範囲である。スペーサー14は、基板Sに基板用保護具11が取り付けられる前の状態、すなわち基板用保護具11が荷重を受けていない状態において、粘着層13よりも厚く構成されることが好ましい。 The spacer 14 is formed in a continuous annular shape along the peripheral edge portion of the first main surface S1 of the substrate S. Examples of the flexible material constituting the spacer 14 include a woven fabric or a non-woven fabric, a polymer material, and a rubber material. Examples of the woven fabric or non-woven fabric include glass cloth. Examples of the rubber material include silicon rubber, urethane rubber, chloroprene rubber, styrene / butadiene rubber, and ethylene / propylene / diene rubber. The spacer 14 may have a single-layer structure, or may have a multi-layer structure composed of the same or different materials. For example, when the film formation of the functional film involves heating, a spacer that can withstand the heat during the film formation may be used. The spacer 14 can be fixed to the base sheet 12 with a well-known adhesive or adhesive. The spacer 14 may be fixed to the base sheet 12 by using, for example, a single-sided adhesive tape (glass cloth tape or the like) configured with the spacer 14 as a support. The thickness of the spacer 14 is, for example, in the range of 150 μm to 5 mm. The spacer 14 is preferably formed thicker than the adhesive layer 13 in a state before the substrate protective tool 11 is attached to the substrate S, that is, in a state where the substrate protective tool 11 is not loaded.

次に、膜付き基板の製造方法について説明する。
図2に示すように、膜付き基板の製造方法は、基板Sに基板用保護具11を取り付けることで、基板Sと基板用保護具11とを有する成膜用基板SAを準備する準備工程と、成膜用基板SAにおける基板Sの第2主面S2に機能性膜を成膜する成膜工程とを備えている。準備工程では、基板用保護具11の基材シート12の貫通孔12aを通じて基板Sを吸引し、基板用保護具11と基板Sとが粘着した成膜用基板を準備する。
Next, a method for manufacturing a substrate with a film will be described.
As shown in FIG. 2, the method for manufacturing a substrate with a film includes a preparatory step of preparing a film-forming substrate SA having the substrate S and the substrate protective tool 11 by attaching the substrate protective tool 11 to the substrate S. A film forming step of forming a functional film on the second main surface S2 of the substrate S in the film forming substrate SA is provided. In the preparation step, the substrate S is sucked through the through hole 12a of the base material sheet 12 of the substrate protective tool 11, and the film-forming substrate on which the substrate protective tool 11 and the substrate S are adhered is prepared.

図3及び図5に示すように、本実施形態の準備工程では、基板Sを吸引するために吸引装置15が用いられる。吸引装置15は、減圧室16と、減圧室16内の空気を排気する排気部17と、基板用保護具11が載置される載置面18と、載置面18に開口するとともに減圧室16の外部の空気を吸引する吸引部19とを備えている。排気部17には、図示を省略した周知の真空ポンプが接続される。 As shown in FIGS. 3 and 5, in the preparation step of this embodiment, the suction device 15 is used to suck the substrate S. The suction device 15 opens into the decompression chamber 16, the exhaust unit 17 for exhausting the air in the decompression chamber 16, the mounting surface 18 on which the substrate protective tool 11 is mounted, and the mounting surface 18, and the decompression chamber. A suction unit 19 for sucking the outside air of the 16 is provided. A well-known vacuum pump (not shown) is connected to the exhaust unit 17.

準備工程において成膜用基板SAを得るには、まず基板用保護具11の粘着層13が上向きとなるように、基板用保護具11を吸引装置15の載置面18に載置した後、その基板用保護具11の粘着層13上に基板Sを載置する。 In order to obtain the film-forming substrate SA in the preparatory step, first, the substrate protective tool 11 is placed on the mounting surface 18 of the suction device 15 so that the adhesive layer 13 of the substrate protective tool 11 faces upward. The substrate S is placed on the adhesive layer 13 of the substrate protective tool 11.

次に、図5に示すように、吸引装置15の減圧室16内の空気を排気部17から排気する。これにより、吸引装置15の吸引部19は、基板用保護具11の基材シート12における貫通孔12aを通じて、基板用保護具11の基材シート12と基板Sとの間の空気を吸引する。これにより、基板Sが基板用保護具11の粘着層13に押し付けられることで、基板Sに基板用保護具11を取り付けることができる。 Next, as shown in FIG. 5, the air in the decompression chamber 16 of the suction device 15 is exhausted from the exhaust unit 17. As a result, the suction unit 19 of the suction device 15 sucks the air between the base sheet 12 of the substrate protective tool 11 and the substrate S through the through hole 12a in the base sheet 12 of the substrate protective tool 11. As a result, the substrate S is pressed against the adhesive layer 13 of the substrate protective tool 11, so that the substrate protective tool 11 can be attached to the substrate S.

ここで、吸引装置15を用いて基板用保護具11の基材シート12と基板Sとの間の空気を吸引した際に、平板状の基板Sが吸引装置15側に凸となるように湾曲する場合がある。例えば、平板状の基板Sとして、厚さが0.05〜1.5mmのガラス基板を用いる場合、このような湾曲が起きやすい傾向がある。しかし、吸引装置15による吸引により基板Sが撓んだとしても、可撓性のスペーサー14も撓むため、基板Sの周縁部から粘着層13が剥がれることがない。 Here, when the air between the substrate sheet 12 and the substrate S of the substrate protective tool 11 is sucked by using the suction device 15, the flat plate-shaped substrate S is curved so as to be convex toward the suction device 15. May be done. For example, when a glass substrate having a thickness of 0.05 to 1.5 mm is used as the flat plate-shaped substrate S, such bending tends to occur. However, even if the substrate S is bent by suction by the suction device 15, the flexible spacer 14 is also bent, so that the adhesive layer 13 does not peel off from the peripheral edge of the substrate S.

基板用保護具11に取り付けられた基板Sの第2主面S2に機能性膜を成膜することによって膜付き基板が作製される。膜付き基板SFの製造方法における成膜工程では、スパッタリング法等のPVD(Physical Vapor Deposition)法、CVD(Chemical Vapor Deposition)法、スプレー、スピンコート等のコーティング法等の周知の成膜法を用いることができる。機能性膜F(図6参照)としては、例えば、所定の光学的特性を有する膜(誘電体膜等)、所定の機械的特性を有する膜、所定の化学的特性を有する膜、及び所定の色を有する膜が挙げられる。機能性膜Fを形成するための成膜材料は、無機材料であってもよいし、有機材料であってもよい。 A substrate with a film is produced by forming a functional film on the second main surface S2 of the substrate S attached to the protective tool 11 for the substrate. In the film forming process in the manufacturing method of the substrate SF with a film, a well-known film forming method such as PVD (Physical Vapor Deposition) method such as sputtering method, CVD (Chemical Vapor Deposition) method, coating method such as spraying and spin coating is used. be able to. Examples of the functional film F (see FIG. 6) include a film having a predetermined optical property (dielectric film, etc.), a film having a predetermined mechanical property, a film having a predetermined chemical property, and a predetermined film. Examples include colored films. The film-forming material for forming the functional film F may be an inorganic material or an organic material.

成膜工程は、成膜用基板SAの第2主面S2が水平となる姿勢、垂直となる姿勢、又は水平でも垂直でもない傾斜した姿勢のいずれの姿勢で行ってもよい。例えば、成膜用基板SAの第2主面S2が垂直となる姿勢に成膜用基板SAを配置する場合であれば、基板用保護具11の基材シート12の形状を基材シート12が基板Sよりも外方に突出するように変更し、その突出部分を利用して成膜用基板SAを吊り下げてもよい。 The film forming step may be performed in any of a posture in which the second main surface S2 of the film forming substrate SA is horizontal, a vertical posture, and an inclined posture that is neither horizontal nor vertical. For example, when the film-forming substrate SA is arranged in a posture in which the second main surface S2 of the film-forming substrate SA is vertical, the substrate sheet 12 has the shape of the substrate sheet 12 of the substrate protective tool 11. It may be changed so that it protrudes outward from the substrate S, and the film-forming substrate SA may be suspended by using the protruding portion.

図6に示すように、成膜工程で得られた膜付き基板SFは、基板Sの第2主面S2に設けられた機能性膜Fを有しており、基板用保護具11の粘着層13から取り外される。
成膜工程後の基板用保護具11は、別の膜付き基板SFの製造に繰り返し使用することもできる。また、基板用保護具11が複数ある場合でも、基板用保護具11の厚さが比較的薄いため、複数の基板用保護具11を厚さ方向に重ね合わせることで、コンパクトにまとめて保管することができる。
As shown in FIG. 6, the substrate SF with a film obtained in the film forming step has a functional film F provided on the second main surface S2 of the substrate S, and has an adhesive layer of the protective tool 11 for the substrate. Removed from 13.
The substrate protective tool 11 after the film forming step can be repeatedly used in the production of another substrate SF with a film. Further, even when there are a plurality of protective tools 11 for substrates, since the protective tools 11 for substrates are relatively thin, the plurality of protective tools 11 for substrates can be stored compactly by stacking them in the thickness direction. be able to.

次に、本実施形態の作用及び効果について説明する。
(1)基板用保護具11は、少なくとも基板Sの周縁部を覆うことが可能なサイズに構成された基材シート12と、基板Sの周縁部に粘着可能な粘着層13と、基材シート12と粘着層13との間に配置される可撓性のスペーサー14とを備えている。基材シート12は、粘着層13及びスペーサー14により囲まれる位置に貫通孔12aを有している。
Next, the operation and effect of this embodiment will be described.
(1) The substrate protective tool 11 includes a substrate sheet 12 having a size capable of covering at least the peripheral edge of the substrate S, an adhesive layer 13 that can adhere to the peripheral edge of the substrate S, and a substrate sheet. It is provided with a flexible spacer 14 arranged between the 12 and the adhesive layer 13. The base sheet 12 has a through hole 12a at a position surrounded by the adhesive layer 13 and the spacer 14.

この構成によれば、機能性膜Fの成膜前に基材シート12の貫通孔12aを通じて基板Sを吸引し、粘着層13により基板Sの周縁部と基材シート12の周縁部とを粘着することができ、機能性膜Fの成膜時に成膜材料が回り込んで基板Sの第1主面S1の周縁部に付着することを抑制できる。 According to this configuration, the substrate S is sucked through the through hole 12a of the base sheet 12 before the functional film F is formed, and the peripheral portion of the substrate S and the peripheral edge of the base sheet 12 are adhered by the adhesive layer 13. This makes it possible to prevent the film-forming material from wrapping around and adhering to the peripheral edge of the first main surface S1 of the substrate S when the functional film F is formed.

また、基板Sが、例えば0.05〜1.5mmと薄い場合には、吸引時に基板Sが撓んだとしても、可撓性のスペーサー14も撓むため、基板Sの周縁部から粘着層13が剥がれることがない。また、基板Sに基板用保護具11を取り付ける際に、基板Sの第2主面S2を治具等で押圧しなくてもよいため、基板Sの第2主面S2の清浄性が保たれ易い。 Further, when the substrate S is as thin as 0.05 to 1.5 mm, even if the substrate S bends during suction, the flexible spacer 14 also bends, so that the adhesive layer is formed from the peripheral edge of the substrate S. 13 does not come off. Further, when the protective tool 11 for the substrate is attached to the substrate S, the second main surface S2 of the substrate S does not have to be pressed by a jig or the like, so that the cleanliness of the second main surface S2 of the substrate S is maintained. easy.

従って、基板Sの第2主面S2のみに機能性膜Fを好適に成膜することができる。
(2)基板用保護具11の粘着層13は、環状に形成されている。この場合、機能性膜Fの成膜時に成膜材料が回り込んで基板Sの第1主面S1の周縁部に付着することをさらに抑制できる。従って、基板Sの第2主面S2のみに機能性膜Fをより好適に成膜することができる。
Therefore, the functional film F can be suitably formed only on the second main surface S2 of the substrate S.
(2) The adhesive layer 13 of the protective tool 11 for a substrate is formed in an annular shape. In this case, it is possible to further prevent the film-forming material from wrapping around and adhering to the peripheral edge of the first main surface S1 of the substrate S when the functional film F is formed. Therefore, the functional film F can be more preferably formed only on the second main surface S2 of the substrate S.

また、基板用保護具11の粘着層13が基板Sの全面ではなく基板Sの周縁部のみに粘着可能に形成されているために、基板用保護具11が基板Sに対して過剰に粘着することがなく、機能性膜Fの成膜後に基板用保護具11を基板Sから容易に引き剥がすことができる。また、粘着層13が基板Sの全面ではなく基板Sの周縁部のみに粘着可能に形成されているために、基板Sの第1主面S1において基板Sの性能に影響する範囲に粘着剤が転写されるのを回避することができる。 Further, since the adhesive layer 13 of the substrate protective tool 11 is formed so as to be adhereable only to the peripheral edge portion of the substrate S instead of the entire surface of the substrate S, the substrate protective tool 11 excessively adheres to the substrate S. The protective tool 11 for the substrate can be easily peeled off from the substrate S after the functional film F is formed. Further, since the adhesive layer 13 is formed so as to be adhesively formed only on the peripheral edge portion of the substrate S, not on the entire surface of the substrate S, the adhesive is present in the range affecting the performance of the substrate S on the first main surface S1 of the substrate S. It can be avoided to be transcribed.

(3)膜付き基板SFの製造方法は、基板用保護具11の基材シート12の貫通孔12aを通じて基板Sを吸引し、基板用保護具11と基板Sとが粘着した成膜用基板SAを準備する準備工程と、成膜用基板SAにおける基板Sの第2主面S2に機能性膜Fを成膜する成膜工程とを備えている。 (3) In the method for manufacturing the substrate SF with a film, the substrate S is sucked through the through hole 12a of the substrate sheet 12 of the substrate protective tool 11, and the substrate protective tool 11 and the substrate S adhere to each other. A preparatory step for forming the functional film F on the second main surface S2 of the substrate S in the film forming substrate SA is provided.

この方法によれば、上記(1)欄で述べた効果と同様の効果が得られる。
(変更例)
本実施形態は、以下のように変更して実施することができる。
According to this method, the same effect as that described in the above column (1) can be obtained.
(Change example)
This embodiment can be modified and implemented as follows.

・上記実施形態の基板用保護具11のスペーサー14は、基板用保護具11の基材シート12に固定されているが、基材シート12に固定せずに基材シート12に重ねるように配置してもよいし、例えば、吸引装置15の載置面18に固定されていてもよい。 The spacer 14 of the substrate protective tool 11 of the above embodiment is fixed to the base sheet 12 of the substrate protective tool 11, but is arranged so as to be overlapped with the base sheet 12 without being fixed to the base sheet 12. It may be fixed to the mounting surface 18 of the suction device 15, for example.

・基板用保護具11の粘着層13は、環状以外の形状に形成されてもよい。基板用保護具11の粘着層13を、例えば、基板Sの対向する二辺に対応した複数の粘着層に変更することもできる。 The adhesive layer 13 of the protective tool 11 for a substrate may be formed in a shape other than an annular shape. The adhesive layer 13 of the substrate protective tool 11 can be changed to, for example, a plurality of adhesive layers corresponding to the two opposite sides of the substrate S.

・基板Sの形状は、平板状に限らず、曲板状であってもよい。
・基板用保護具11の外形は、基板Sの外形に応じて適宜変更することができる。
・図7に示すように、複数の基板用保護具11と複数の基板Sを載置できるように吸引装置15を変更してもよい。すなわち、吸引装置15の吸引部19の数は、吸引装置15の載置面18に載置される基板用保護具11(基板S)の数に対応して変更することができる。この場合、例えば、図7に示す基板Sよりもサイズの小さい基板についても、同じ吸引装置15を用いることができる。すなわち、基板Sのサイズを変更しても同じ吸引装置15を用いることができる。また、吸引装置15の1回の吸引操作によって、複数の基板用保護具11と複数の基板Sとを粘着させることができる。すなわち、吸引装置15の1回の吸引操作によって、複数の成膜用基板SAを得ることができるため、成膜用基板SAを準備する準備工程の作業効率を高めることができる。
The shape of the substrate S is not limited to a flat plate shape, but may be a curved plate shape.
The outer shape of the protective tool 11 for the board can be appropriately changed according to the outer shape of the board S.
-As shown in FIG. 7, the suction device 15 may be changed so that a plurality of substrate protective devices 11 and a plurality of substrates S can be placed. That is, the number of suction portions 19 of the suction device 15 can be changed according to the number of substrate protective devices 11 (board S) mounted on the mounting surface 18 of the suction device 15. In this case, for example, the same suction device 15 can be used for a substrate having a size smaller than that of the substrate S shown in FIG. That is, the same suction device 15 can be used even if the size of the substrate S is changed. Further, the plurality of substrate protective devices 11 and the plurality of substrates S can be adhered to each other by one suction operation of the suction device 15. That is, since a plurality of film-forming substrate SAs can be obtained by one suction operation of the suction device 15, the work efficiency of the preparation step for preparing the film-forming substrate SA can be improved.

・図8に示すように、複数の基板用保護具11は、これら複数の基板用保護具11が連結された連結体20として構成されていてもよい。この連結体20では、基材シート12を用いて複数の基板用保護具11を連結しているが、スペーサー14を用いて連結してもよいし、テープ材等の連結材を別途設けることで連結してもよい。このように連結体20を用いることで、複数の成膜用基板SAを一体として取り扱うことができるため、例えば、成膜工程で用いる成膜装置への複数の成膜用基板SAの搬入作業や搬出作業の効率を高めることができる。また、連結体20を用いることで、複数の成膜用基板SAを吊り下げて配置することも容易となる。 As shown in FIG. 8, the plurality of substrate protective equipment 11 may be configured as a connecting body 20 in which the plurality of substrate protective equipment 11 are connected. In this connecting body 20, a plurality of protective tools 11 for substrates are connected by using a base sheet 12, but they may be connected by using a spacer 14, or by separately providing a connecting material such as a tape material. It may be connected. By using the connector 20 in this way, it is possible to handle a plurality of film-forming substrate SAs as a unit. Therefore, for example, a work of carrying a plurality of film-forming substrate SAs into a film-forming apparatus used in a film-forming process The efficiency of unloading work can be improved. Further, by using the connecting body 20, it becomes easy to suspend and arrange a plurality of film forming substrates SA.

11…基板用保護具、12…基材シート、12a…貫通孔、13…粘着層、14…スペーサー、F…機能性膜、S…基板、S1…第1主面、S2…第2主面、SA…成膜用基板、SF…膜付き基板。 11 ... Substrate protective equipment, 12 ... Base sheet, 12a ... Through hole, 13 ... Adhesive layer, 14 ... Spacer, F ... Functional film, S ... Substrate, S1 ... First main surface, S2 ... Second main surface , SA ... Substrate for film formation, SF ... Substrate with film.

Claims (2)

第1主面と、前記第1主面の反対側の第2主面とを有する基板の前記第1主面を保護する基板用保護具であって、
少なくとも前記基板の周縁部を覆うことが可能なサイズに構成された基材シートと、
前記基板の周縁部に粘着可能な粘着層と、
前記基材シートと前記粘着層との間に配置される可撓性のスペーサーと、を備え、
前記基材シートは、前記粘着層及び前記スペーサーにより囲まれる位置に貫通孔を有することを特徴とする基板用保護具。
A protective tool for a substrate that protects the first main surface of a substrate having a first main surface and a second main surface opposite to the first main surface.
A base sheet having a size capable of covering at least the peripheral edge of the substrate, and
An adhesive layer that can be adhered to the peripheral edge of the substrate,
A flexible spacer disposed between the base sheet and the adhesive layer.
A protective device for a substrate, wherein the base material sheet has a through hole at a position surrounded by the adhesive layer and the spacer.
請求項1に記載の基板用保護具を用いて膜付き基板を製造する膜付き基板の製造方法であって、
前記基板用保護具の基材シートの貫通孔を通じて基板を吸引し、前記基板用保護具と前記基板とが粘着した成膜用基板を準備する準備工程と、
前記成膜用基板における前記基板の前記第2主面に機能性膜を成膜する成膜工程とを備えることを特徴とする膜付き基板の製造方法。
A method for manufacturing a film-coated substrate by using the substrate protective device according to claim 1.
A preparatory step of sucking the substrate through the through hole of the substrate sheet of the protective tool for the substrate to prepare a film-forming substrate to which the protective tool for the substrate and the substrate are adhered.
A method for manufacturing a substrate with a film, which comprises a film forming step of forming a functional film on the second main surface of the substrate in the film forming substrate.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010123598A (en) * 2008-11-17 2010-06-03 Lintec Corp Device, method and tool for supporting plate-like member
WO2016125841A1 (en) * 2015-02-07 2016-08-11 株式会社クリエイティブテクノロジー Workpiece holding device and laser cutting processing method

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JP6627243B2 (en) * 2015-04-02 2020-01-08 日本電気硝子株式会社 Substrate processing method and substrate film forming method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010123598A (en) * 2008-11-17 2010-06-03 Lintec Corp Device, method and tool for supporting plate-like member
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