JPH09246365A - Substrate holding jig - Google Patents

Substrate holding jig

Info

Publication number
JPH09246365A
JPH09246365A JP8048196A JP8048196A JPH09246365A JP H09246365 A JPH09246365 A JP H09246365A JP 8048196 A JP8048196 A JP 8048196A JP 8048196 A JP8048196 A JP 8048196A JP H09246365 A JPH09246365 A JP H09246365A
Authority
JP
Japan
Prior art keywords
substrate
holding jig
edge
packing
cavity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP8048196A
Other languages
Japanese (ja)
Inventor
Shigeo Takei
滋郎 竹居
Hisafumi Yokoyama
寿文 横山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP8048196A priority Critical patent/JPH09246365A/en
Publication of JPH09246365A publication Critical patent/JPH09246365A/en
Withdrawn legal-status Critical Current

Links

Landscapes

  • Jigs For Machine Tools (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a holding jig which is capable of surely fixing a photomask substrate in transit or processing without causing an adversary effect to the quality of a product. SOLUTION: A substrate holding jig is equipped with a base 110 which supports all the substrate holding jig itself, a side 120 provided continuously surrounding the base 110 around so as to protrude towards a substrate 200, and a close contact part 130 which comes into close contact with the substrate 200. The close contact part 130 is brought into contact with the substrate 200 to form a hermetically closed cavity 140 together with the substrate 200, and the cavity 140 is reduced in pressure through an exhaust pipe 160 through the intermediary of a connecting pipe 150 provided to the base of the cavity 140 to communicate with the cavity 140 to attract the one side of the substrate 200 and holds. The close contact part 130 is composed of an edge 131 which is formed like a continuous circle provided to the upper part of the side 120 protruding towards the substrate 200 to be flush with it and surrounding a region smaller than the substrate 200 and a plate-like, elastic, and flexible packing 135 which is provided and fixed along all the circumference of the edge 131 making its part protrude towards the substrate 200.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、LSI、超LSI、A
SIC等の高密度半導体集積回路の製造プロセスや、こ
れらの高密度半導体集積回路の製造に用いられるフオト
マスクの製造プロセスや、LCD、PDP等の平板ディ
スプレイの製造プロセスにおける、基板の保持、移動、
固定のために用いられる基板用保持治具に関する。特
に、処理中においても基板の処理面側でない面を処理液
ないし処理気体から隔離できる基板用保持具に関する。
BACKGROUND OF THE INVENTION The present invention relates to LSI, VLSI, A
In the manufacturing process of high-density semiconductor integrated circuits such as SIC, the photomask manufacturing process used for manufacturing these high-density semiconductor integrated circuits, and the manufacturing process of flat panel displays such as LCD and PDP, the substrate is held and moved,
The present invention relates to a substrate holding jig used for fixing. In particular, the present invention relates to a substrate holder that can isolate a surface of a substrate that is not the processing surface side from a processing liquid or a processing gas even during processing.

【0002】[0002]

【従来の技術】従来、LSI、超LSI、ASIC等の
高密度半導体集積回路の製造や、これに用いられるフオ
トマスクの製造においては、処理基板を保持治具にて保
持して搬送したり、プロセス処理を行う場合があり、保
持治具としては、種々の基板固定方式のものが用いられ
ていた。例えば、基板をラック等の溝部に挾み固定す
る方式のもの、基板の側面を挾みこむ方式のもの、
基板を上下から押さえつける方式のもの、基板を吸盤
などで吸着する方式のもの、等が挙げられる。これらの
方式を用いた保持治具は、それぞれ利点もあるが、不具
合もあった。の場合は、単に溝の上に基板を置くだけ
で、複雑な動きに対応できない。の場合は、基板の表
裏面には接触するものはなく、かつ、複雑な動きにも対
応できるが、側面から基板を挾み込むため、保持治具は
基板よりも大きくなり、小型とすることができない。
の場合は、と異なり、保持治具の大型化の問題はない
が、基板の表裏面からの押さえ付けなので、基板の表裏
面に接触をしなければならない。通常、基板の処理面で
ある表面への保持治具の接触は嫌われる。の場合は、
、の問題はなく、吸盤を裏面に吸着すれば、の問
題もなくなる。しかし、吸盤は円状またはそれに近い形
状をして有するため、基板の裏面に吸着した際、ある程
度の吸着面を必要としていた。
2. Description of the Related Art Conventionally, in the manufacture of high-density semiconductor integrated circuits such as LSI, VLSI, and ASIC, and in the manufacture of photomasks used for the same, the processed substrate is held and carried by a holding jig, or processed. In some cases, processing is performed, and as the holding jig, various types of substrate fixing methods have been used. For example, a method of sandwiching and fixing the board in a groove such as a rack, a method of sandwiching the side surface of the board,
A method of pressing the substrate from above and below, a method of sucking the substrate with a suction cup or the like can be mentioned. The holding jigs using these methods have their respective advantages, but they also have problems. In the case of, it is not possible to cope with complicated movements simply by placing the substrate on the groove. In the case of, there is no contact on the front and back of the board, and it is possible to handle complicated movements, but since the board is sandwiched from the side, the holding jig is larger than the board and must be small. I can't.
In the case of, there is no problem of increasing the size of the holding jig, but since it is pressed from the front and back surfaces of the substrate, it is necessary to contact the front and back surfaces of the substrate. Usually, contact of the holding jig with the surface of the substrate to be processed is disliked. In the case of,
There is no problem of, and if the suction cup is sucked on the back surface, the problem of will also disappear. However, since the suction cup has a circular shape or a shape close to it, a certain suction surface is required when the suction cup is sucked on the back surface of the substrate.

【0003】[0003]

【発明が解決しようとする課題】しかし、フオトマスク
用基板の保持は、処理する側でない裏面への吸盤による
吸着も、品質上好ましくないとされており、フオトマス
ク作製においては、フオトマスク用基板の、搬送等移動
の際の固定、特に、プロセス処理中での固定を、製品の
品質に悪影響を与えず、確実にできる保持治具が求めら
れていた。本発明は、このような状況のもと、フオトマ
スク用基板の、搬送等移動の際の固定、特に、プロセス
処理中での固定を、製品の品質に悪影響を与えず、確実
にできる保持治具を提供しようとするものである。
However, it is said that the holding of the photomask substrate is not preferable in terms of quality even if it is sucked by the suction cup on the back surface that is not the processing side, and in the photomask fabrication, the conveyance of the photomask substrate is carried out. There has been a demand for a holding jig that can be fixed during uniform movement, particularly during process processing, without adversely affecting product quality. Under the circumstances, the present invention provides a holding jig that can securely fix the photomask substrate during movement such as transportation, especially during process processing without adversely affecting product quality. Is to provide.

【0004】[0004]

【課題を解決するための手段】本発明の保持治具は、保
持治具全体を支持する底部と、底部の周囲に連続して基
板側に出っ張って設けられた側面部と、該側面部の基板
側に設けられ、基板と密着させるための密着部とを有
し、密着部にて基板と密着させた状態で、基板とで密閉
された空洞部を形成し、底部に設けられた空洞部と連結
する連結管を介して、排気部により、空洞部を減圧状態
にすることにより、基板の片面を吸着して基板を保持す
る基板用保持治具であって、密着部は、側面部の基板側
に、基板サイズより小さい領域を囲む連続した周を形成
し、且つ基板側に同じ高さで突出したエッジ部と、エッ
ジ部の基板側に、エッジ部全周に沿い、エッジ部のエッ
ジを形成する一面に固定され、且つその一部を基板側に
突出させた板状の、弾力性、可撓性を持つパッキンとか
らなり、パッキンに基板の片面を接する際には、パッキ
ンを折り曲げて基板をパッキンに密着させ、前記空洞部
を形成し、排気部により空洞部を排気して減圧状態にし
て基板を吸着して保持することを特徴とするものであ
る。そして、上記におけるエッジ部は、エッジを基板中
心側が底部に直交した面と、基板周辺部側が該直交した
面に対して20〜70度の角度を持つスロープ状の面に
より形成し、且つ、スロープ状の面にパッキンを固定し
ていることを特徴とするものである。そして、上記にお
けるエッジ部の全周は、処理する基板の全外周に対応さ
せたもので、ほぼ基板のサイズと同じ大きさで設けられ
ていることを特徴とするものである。そしてまた、上記
における基板用保持治具は、処理を施す基板の処理面で
はない裏面で基板を減圧吸着して保持するものであり、
処理液ないし処理気体に対して腐蝕されず、且つ、処理
の際に加わる機械的な力にも十分に耐えるもので、処理
の際には、空洞部側の基板の裏面は、処理液ないし処理
気体から隔離された状態とすることを特徴とするもので
ある。
A holding jig of the present invention comprises a bottom portion for supporting the entire holding jig, a side surface portion continuously provided around the bottom portion and protruding toward the substrate, and a side surface portion of the side surface portion. A cavity portion provided on the substrate side and having a close contact portion for making close contact with the substrate, and in the state of being closely attached to the substrate at the close contact portion, a cavity portion sealed with the substrate is formed, and a cavity portion provided at the bottom portion. A holding jig for a substrate, which holds a substrate by adsorbing one side of the substrate by depressurizing the cavity by a gas exhaust unit via a connecting pipe connected to On the substrate side, a continuous circumference that surrounds a region smaller than the substrate size is formed, and the edge part that protrudes at the same height on the substrate side and the edge side of the edge part along the entire circumference of the edge part Is fixed to one surface forming a plate-shaped part of which is projected to the substrate side, It consists of a packing that has strength and flexibility, and when one side of the board is in contact with the packing, bend the packing to bring the board into close contact with the packing, form the cavity part, and exhaust the cavity part with the exhaust part. It is characterized in that the substrate is sucked and held in a reduced pressure state. Further, the edge portion in the above is formed by an edge having a surface whose center side is orthogonal to the bottom and a slope-shaped surface whose peripheral side is at an angle of 20 to 70 degrees with respect to the orthogonal plane, and It is characterized in that the packing is fixed to the surface. The entire circumference of the edge portion in the above corresponds to the entire outer circumference of the substrate to be processed, and is characterized in that it is provided with substantially the same size as the size of the substrate. Further, the substrate holding jig in the above is for holding the substrate under reduced pressure by the back surface which is not the processing surface of the substrate to be processed,
It is not corroded by the processing liquid or processing gas, and it withstands the mechanical force applied during processing sufficiently. During processing, the back surface of the substrate on the cavity side is processed liquid or processing. It is characterized in that it is isolated from the gas.

【0005】保持治具の各部の材質は、その目的に合わ
せ選ぶ。例えば、単に基板を保持するだけの場合には、
各部には耐薬品性は要求されないが、処理をしながら基
板を保持する場合には、その処理にあった耐薬品性、機
械的強度等が要求される。また、基板自体が薄く、強度
が弱い場合には、パッキンとの密着の際に、基板がパッ
キンを折れ曲げることができず、破損してしまうことも
考えられるため、パッキンの弾力性、可撓性について
も、基板の強度に合わせ適宜選択する。尚、ここで言う
可撓性とは、板状のパッキンが、基板と密着する際に、
撓みエッジ部にて折れ曲がる性質を言う。
The material of each part of the holding jig is selected according to its purpose. For example, if you just want to hold the substrate,
Each part is not required to have chemical resistance, but when holding the substrate during processing, chemical resistance, mechanical strength, etc. suitable for the processing are required. Also, if the board itself is thin and the strength is weak, it is possible that the board will not be able to bend the packing when it comes into close contact with the packing, and it may be damaged. The property is also appropriately selected according to the strength of the substrate. The flexibility referred to here means that when the plate-like packing is in close contact with the substrate,
It is the property of bending at the bending edge.

【0006】[0006]

【作用】本発明の保持治具は、このような構成にするこ
とにより、フオトマスク用基板等の基板の、搬送等移動
の際の固定、特に、プロセス処理中での固定を、製品の
品質に悪影響を与えず、確実にできる保持治具の提供を
可能とするものである。具体的には、基板と密着させる
ための密着部は、側面部の基板側に、基板サイズより小
さい領域を囲む連続した周を形成し、且つ基板側に同じ
高さで突出したエッジ部と、エッジ部の基板側に、エッ
ジ部全周に沿い、エッジ部のエッジを形成する一面に固
定され、且つその一部を基板側に突出させた板状の、弾
力性、可撓性を持つパッキンとからなり、パッキンに基
板の片面を接する際には、パッキンを折り曲げて基板を
パッキンに密着させ、前記空洞部を形成し、排気部によ
り空洞部を排気して減圧状態にして基板を吸着して保持
することによりこれを実現している。詳しくは、排気部
により空洞部を排気して減圧していくと、基板は、大気
圧に押され保持治具のエッジ部にて、パッキンを介して
密着するが、この際、第2図に示すように、パッキン
は、弾力性、可撓性があるため、エッジ部131と基板
200につぶされ、且つ折れ曲がるようになり、空洞部
140を密閉するシールとなるのである。これにより、
基板の保持は確固たるものとなるのである。そして、エ
ッジ部におけるエッジを基板中心側が底部に直交した面
と、基板周辺部側が該直交した面に対して20〜70度
の角度を持つスロープ状の面により形成し、且つ、スロ
ープ状の面にパッキンを固定していることにより、シー
ルを確固たるものとし、且つエッジ部を強度的にも耐え
るものとしている。そして、エッジ部の全周は、処理す
る基板の全外周に対応させたもので、ほぼ基板のサイズ
と同じ大きさで設けられていることにより、基板の周辺
でのみパッキンを介して固定することができ、フオトマ
スクのような処理する側でない裏面も含め表裏面を吸盤
で吸着すると、品質上問題があるような基板に対して
も、保持を問題なくできるものとしている。更に、基板
用保持治具は、処理を施す基板の処理面ではない裏面で
基板を減圧吸着して保持するものであり、処理液ないし
処理気体に対して腐蝕されず、且つ、処理の際に加わる
機械的な力にも十分に耐えるもので、処理の際には、空
洞部側の基板の裏面は、処理液ないし処理気体から隔離
された状態とすることにより、基板の裏面への汚れ等、
品質的な問題をなくしている。
The holding jig of the present invention has such a structure that the fixing of the substrate such as the photomask substrate during the transportation or the like, especially the fixing during the process treatment, can be performed in the quality of the product. It is possible to provide a holding jig that can be reliably performed without adversely affecting it. Specifically, the contact portion for contact with the substrate has a side surface, on the substrate side, which forms a continuous circumference surrounding a region smaller than the substrate size, and an edge portion which protrudes at the same height on the substrate side. A plate-like, elastic, flexible packing that is fixed to one side of the edge part that forms the edge of the edge part along the entire circumference of the edge part and that protrudes partly toward the substrate side. When contacting one side of the board with the packing, the packing is bent to bring the board into close contact with the packing to form the cavity, and the exhaust section exhausts the cavity to reduce the pressure to adsorb the board. This is achieved by holding it. More specifically, when the cavity is evacuated by the evacuation unit to reduce the pressure, the substrate is pressed by the atmospheric pressure and adheres closely to the edge of the holding jig through the packing. As shown, since the packing has elasticity and flexibility, the packing comes to be crushed and bent by the edge portion 131 and the substrate 200, and serves as a seal for sealing the cavity 140. This allows
The holding of the substrate is solid. The edge of the edge portion is formed by a surface whose substrate center side is orthogonal to the bottom and a sloped surface whose substrate peripheral side is at an angle of 20 to 70 degrees with respect to the orthogonal surface, and which is a sloped surface. By fixing the packing to the, the seal is firmly fixed, and the edge portion can endure strength. The entire circumference of the edge part corresponds to the entire outer circumference of the substrate to be processed, and since it is provided with substantially the same size as the size of the substrate, it can be fixed only through the packing around the periphery of the substrate. If the front and back surfaces, including the back surface that is not the processing side such as a photomask, are sucked with a suction cup, it is possible to hold even a substrate having a quality problem without problems. Further, the substrate holding jig holds the substrate under reduced pressure by the back surface thereof, which is not the processing surface of the substrate to be processed, and is not corroded by the processing liquid or the processing gas, and at the time of processing. It sufficiently withstands the mechanical force applied. During processing, the back surface of the substrate on the cavity side is kept in a state of being isolated from the processing liquid or processing gas, so that the back surface of the substrate is not contaminated. ,
Eliminating quality problems.

【0007】[0007]

【実施例】本発明の基板用保持治具の実施例を図にもと
づいて説明する。図1(a)は、実施例の保持治具の概
略構成を示した断面図で、図1(b)は基板を保持した
状態を示した断面図で、図1(c)は、図1(a)の概
略斜視図で、図2は要部である密着部を拡大した断面図
で、図3は排気部を示した図である。図1、図2、図3
中、100は保持治具、110は底部、120は側面
部、130は密着部、131はエッジ部、132はエッ
ジ、133、134は面、135はパッキン、136は
ネジ、140は空洞部、150は連結管、160は排気
部、161はフレキシブルチューブ、162は真空計、
163はリークバルブ、164は真空ライン、200は
基板である。本実施例は、板厚0.25インチ、サイズ
6インチの石英基板をベースとするフオトマスク用基板
のガラス基板自体をウエットエッチングにして処理する
際の、フオトマスク用基板の保持治具に関するものであ
る。図1に示すように、保持治具100は、全体を支持
する底部110と、底部110の周囲に連続して基板2
00側に出っ張って設けられた側面部120と、側面部
120の基板200側に設けられ、基板200と密着さ
せるための密着部130とを有している。そして、密着
部130にて基板200と密着させた状態で、基板20
0と保持治具100とで密閉された空洞部140を形成
し、底部110に設けられた連結管150を介して、排
気部160により、空洞部140を減圧状態にすること
により、基板200の片面を減圧吸着して基板200を
保持するものである。
EXAMPLE An example of the substrate holding jig of the present invention will be described with reference to the drawings. 1A is a sectional view showing a schematic configuration of a holding jig of the embodiment, FIG. 1B is a sectional view showing a state in which a substrate is held, and FIG. 2A is a schematic perspective view of FIG. 2A, FIG. 2 is an enlarged cross-sectional view of a contact portion, which is a main portion, and FIG. 3 is a view showing an exhaust portion. 1, 2, and 3
Inside, 100 is a holding jig, 110 is a bottom portion, 120 is a side surface portion, 130 is a close contact portion, 131 is an edge portion, 132 is an edge, 133, 134 is a surface, 135 is a packing, 136 is a screw, 140 is a cavity portion, 150 is a connecting pipe, 160 is an exhaust part, 161 is a flexible tube, 162 is a vacuum gauge,
Reference numeral 163 is a leak valve, 164 is a vacuum line, and 200 is a substrate. This example relates to a jig for holding a photomask substrate when the glass substrate itself of the photomask substrate based on a quartz substrate having a plate thickness of 0.25 inches and a size of 6 inches is processed by wet etching. . As shown in FIG. 1, the holding jig 100 includes a bottom portion 110 that supports the whole and a substrate 2 that is continuous around the bottom portion 110.
It has a side surface portion 120 protruding to the 00 side and a contact portion 130 provided on the substrate 200 side of the side surface portion 120 for contacting with the substrate 200. Then, in the state where the substrate 20 is in close contact with the contact portion 130, the substrate 20
0 and the holding jig 100 form a closed cavity portion 140, and the exhaust portion 160 causes the cavity portion 140 to be depressurized through the connecting pipe 150 provided in the bottom portion 110. One side is held under reduced pressure to adsorb the substrate 200.

【0008】密着部130は、側面部120の基板20
0側に、基板サイズとほぼ同じ領域を囲む連続した周を
形成し、且つ基板200側に同じ高さで突出したエッジ
部131と、エッジ部131の基板200側に、エッジ
部131全周に沿い、エッジ部131のエッジ132を
形成する一面に固定され、且つその一部を基板200側
に突出させた板状の、弾力性、可撓性を持つパッキン1
35とからなる。対向するエッジ間の距離は、対応する
基板のサイズよりも略3mm長くしてある。図2に示す
ように、エッジ部131は、エッジ132を、基板中心
側が底部110に直交した面133と、基板周辺部側が
該直交した面133に対して60度の角度を持つスロー
プ状の面134により形成し、且つ、スロープ状の面1
34にパッキン135をネジ136で固定している。そ
して、パッキン135に基板200の片面を接するよう
にして、空洞部140を形成し、排気部160により空
洞部140を排気して減圧状態にして、図2に示すよう
に、基板200を吸着して保持する。尚、基板の最外周
の内側1〜2mmの位置でエッジ132があたるよう
に、基板200と保持治具100とを位置合わせしてお
き、パッキン135を介してこの位置で基板100は保
持される。
The contact portion 130 is formed on the side surface 120 of the substrate 20.
On the 0 side, a continuous circumference is formed that surrounds a region substantially the same as the substrate size, and the edge portion 131 protruding toward the substrate 200 side at the same height, the edge portion 131 on the substrate 200 side, and the entire circumference of the edge portion 131. Along the surface of the edge portion 131 forming the edge 132, a plate-like packing 1 having a part thereof protruding toward the substrate 200 and having elasticity and flexibility is provided.
35. The distance between the opposing edges is approximately 3 mm longer than the size of the corresponding substrate. As shown in FIG. 2, the edge portion 131 includes an edge 132, which is a slope-shaped surface having an angle of 60 degrees with respect to a surface 133 of the substrate center side orthogonal to the bottom 110 and a surface of the substrate peripheral side orthogonal to the orthogonal surface 133. Surface 1 formed by 134 and having a slope shape
The packing 135 is fixed to 34 by screws 136. Then, a cavity 140 is formed so that one side of the substrate 200 is in contact with the packing 135, and the cavity 140 is evacuated by the exhaust unit 160 to a depressurized state, and the substrate 200 is adsorbed as shown in FIG. Hold. It should be noted that the substrate 200 and the holding jig 100 are aligned so that the edge 132 hits at a position 1 to 2 mm inside the outermost periphery of the substrate, and the substrate 100 is held at this position via the packing 135. .

【0009】排気部160は、連結管150を介して排
気するものであるが、図3に示すように、連結管150
にフレキシブルチューブ161をつなげ、且つ、このフ
レキシブルチューブ161を真空ライン164へとつな
いで形成されている。真空ライン164と連結管150
との間には、リークバルブ163、真空計162とを設
けており、これにより減圧度を調整できるようにしてい
る。
The exhaust unit 160 exhausts air through the connecting pipe 150. As shown in FIG.
The flexible tube 161 is connected to the vacuum line 164, and the flexible tube 161 is connected to the vacuum line 164. Vacuum line 164 and connecting pipe 150
A leak valve 163 and a vacuum gauge 162 are provided between and, so that the degree of pressure reduction can be adjusted.

【0010】前述のように、本実施例は、フオトマスク
用基板のガラス基板自体をウエットエッチングにして処
理する際の、フオトマスク用基板の保持治具で、詳しく
は、所定部分をレジストないし金属膜により保護された
基板表面の露出した石英ガラス部のみをウエットエッチ
ングする際の保持治具である。石英ガラス自体のエッチ
ングには、フッ酸、緩衝フッ酸等の溶液、水酸化ナトリ
ウム、水酸化カリウム等のアルカリ溶液、リン酸等の酸
性溶液が用いられるが、本実施例の保持治具はこれらの
エッチング溶液の使用に耐えるように、各部の材質を決
めた。底部110、側面部120、エッジ部131、ネ
ジ136、連結管150には、テフロンを用いたが、チ
タン等の耐薬品性の高い金属や合金でも良い。パッキン
135は、ゴム性で、弾力があり、且つ、耐薬品性の高
く、可撓性があるデュポン製のカルレッツを用いたが、
特にこれに限定はされない。他に、特に好ましい材料と
しては、グリーンツィード社製のケムラッツが挙げられ
る。
As described above, this embodiment is a jig for holding the photomask substrate when the glass substrate itself of the photomask is processed by wet etching. More specifically, a predetermined portion is formed by a resist or a metal film. This is a holding jig for wet etching only the exposed quartz glass portion of the surface of the protected substrate. For etching the quartz glass itself, a solution of hydrofluoric acid, buffered hydrofluoric acid or the like, an alkaline solution of sodium hydroxide, potassium hydroxide or the like, and an acidic solution of phosphoric acid or the like are used. The material of each part was determined so as to withstand the use of the etching solution of. Although Teflon is used for the bottom portion 110, the side surface portion 120, the edge portion 131, the screw 136, and the connecting pipe 150, a metal or alloy having high chemical resistance such as titanium may be used. The packing 135 is made of DuPont Kalrez, which is rubber, has elasticity, has high chemical resistance, and is flexible.
It is not particularly limited to this. Another particularly preferable material is Chemraz, manufactured by Green Tweed.

【0011】次に、本実施例保持治具により、フオトマ
スク用基板を保持する動作を、図4を基づいて具体的に
説明する。先ず、基板200と保持治具100とを位置
合わせした後に、基板200を保持治具100の密着部
130へ置く。(図4(a)) 次いで、排気部160により、空洞部140の排気を行
うと、基板200は大気圧により押され、パッキン13
5が押しつぶされるようにして、シールとして働き、基
板200は保持治具に固定される。(図4(b)) 尚、排気部160により減圧する真空度はリークバルブ
163を調整し、基板200にかかる力をコントロール
する。基板200の厚さ、強度を考慮して決める。次い
で、保持固定された基板200を下側にして、保持治具
100とともにウエットエッエッチング液中に浸漬す
る。(図4(c)) エッチング処理を終え、保持治具100と基板をエッチ
ング液から引上げて、洗浄等の処理を施した後、図4
(b)に示すように基板200を上側にして、図3に示
すリークバルブ163を全開して空洞部を大気圧にして
基板200を保持治具100からはずす。このようにす
ることにより、フオトマスクの作製におけるウエットエ
ッチング処理に際して、基板の、処理しない側の裏面を
エッチング液にふれさせずに、且つ基板裏面の最外周の
みで密着保持することが簡単にでき、品質的にも、作業
的にも対応できるものとしている。
Next, the operation of holding the photomask substrate by the holding jig of this embodiment will be specifically described with reference to FIG. First, after aligning the substrate 200 and the holding jig 100, the substrate 200 is placed on the contact portion 130 of the holding jig 100. (FIG. 4A) Next, when the exhaust part 160 exhausts the cavity 140, the substrate 200 is pressed by the atmospheric pressure, and the packing 13
As 5 is crushed, it functions as a seal and the substrate 200 is fixed to the holding jig. (FIG. 4B) The degree of vacuum reduced by the exhaust unit 160 adjusts the leak valve 163 to control the force applied to the substrate 200. It is determined in consideration of the thickness and strength of the substrate 200. Next, the held and fixed substrate 200 is placed on the lower side and is immersed in a wet etchant together with the holding jig 100. (FIG. 4 (c)) After the etching process is completed, the holding jig 100 and the substrate are pulled up from the etching solution and subjected to a process such as cleaning.
As shown in (b), with the substrate 200 facing upward, the leak valve 163 shown in FIG. 3 is fully opened to bring the cavity to atmospheric pressure, and the substrate 200 is removed from the holding jig 100. By doing so, in the wet etching process in the production of the photomask, the substrate, the back side of the non-processed side can be easily held in close contact with only the outermost periphery of the back surface of the substrate without touching the etching solution. It is possible to deal with both quality and work.

【0012】[0012]

【発明の効果】本発明の基板用保持治具は、上記のよう
に、従来の保持治具にみられた欠点を補える保持治具で
あり、特に、基板裏面の最外周のみで、基板を密着保持
することが簡単にできるものとしている。その結果、品
質的にも、作業的にも、基板保持を問題なくできるばか
りでなく、保持治具全体のサイズを基板サイズ以下とで
きるため、小型化にも対応できるものとしている。
As described above, the substrate holding jig of the present invention is a holding jig that can supplement the drawbacks found in the conventional holding jigs. It is assumed that they can be easily held in close contact. As a result, not only can the substrate be held without problems in terms of quality and work, but also the overall size of the holding jig can be made equal to or smaller than the size of the substrate.

【図面の簡単な説明】[Brief description of drawings]

【図1】実施例の基板用保持治具の概略図FIG. 1 is a schematic view of a substrate holding jig according to an embodiment.

【図2】実施例の基板用保持治具の要部である密着部の
拡大断面図
FIG. 2 is an enlarged cross-sectional view of a contact portion, which is a main portion of the substrate holding jig of the embodiment.

【図3】実施例の基板用保持治具の排気部を説明するた
めの簡略図
FIG. 3 is a simplified diagram for explaining an exhaust portion of the substrate holding jig of the embodiment.

【図4】実施例の保持治具を用いたウエットエッチング
処理の工程図
FIG. 4 is a process drawing of a wet etching process using the holding jig of the embodiment.

【符号の説明】[Explanation of symbols]

100 保持治具 110 底部 120 側面部 130 密着部 131 エッジ部 132 エッジ 133、134 面 135 パッキン 136 ネジ 140 空洞部 150 連結管 160 排気部 161 フレキシブルチューブ 162 真空計 163 リークバルブ 200 基板 300 エッチング液 310 エッチング槽 100 Holding jig 110 Bottom part 120 Side part 130 Adhesive part 131 Edge part 132 Edge 133, 134 Surface 135 Packing 136 Screw 140 Cavity part 150 Connecting pipe 160 Exhaust part 161 Flexible tube 162 Vacuum gauge 163 Leak valve 200 Substrate 300 Etching liquid 310 Etching Tank

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 保持治具全体を支持する底部と、底部の
周囲に連続して基板側に出っ張って設けられた側面部
と、該側面部の基板側に設けられ、基板と密着させるた
めの密着部とを有し、密着部にて基板と密着させた状態
で、基板とで密閉された空洞部を形成し、底部に設けら
れた空洞部と連結する連結管を介して、排気部により、
空洞部を減圧状態にすることにより、基板の片面を吸着
して基板を保持する基板用保持治具であって、密着部
は、側面部の基板側に、基板サイズより小さい領域を囲
む連続した周を形成し、且つ基板側に同じ高さで突出し
たエッジ部と、エッジ部の基板側に、エッジ部全周に沿
い、エッジ部のエッジを形成する一面に固定され、且つ
その一部を基板側に突出させた板状の、弾力性、可撓性
を持つパッキンとからなり、パッキンに基板の片面を接
する際には、パッキンを折り曲げて基板をパッキンに密
着させ、前記空洞部を形成し、排気部により空洞部を排
気して減圧状態にして基板を吸着して保持することを特
徴とする基板用保持治具。
1. A bottom portion that supports the entire holding jig, a side surface portion that continuously extends around the bottom portion and protrudes toward the substrate side, and a side surface portion that is provided on the substrate side and that is in close contact with the substrate. With a close contact portion, and in a state of being in close contact with the substrate at the close contact portion, a hollow portion that is sealed with the substrate is formed, and through the connecting pipe that is connected to the hollow portion provided at the bottom portion, by the exhaust portion, ,
A holding jig for a substrate, which holds a substrate by adsorbing one side of the substrate by depressurizing the hollow portion, wherein the contact portion is a continuous side portion surrounding a region smaller than the substrate size on the substrate side. An edge part that forms a perimeter and protrudes at the same height on the substrate side, and is fixed to one side forming the edge of the edge part along the entire periphery of the edge part, on the substrate side of the edge part, and part of it It consists of a plate-shaped elastic and flexible packing that protrudes to the board side.When one side of the board is in contact with the packing, the packing is bent to adhere the board to the packing and form the cavity. Then, the holding jig for a substrate is characterized in that the cavity is evacuated by the evacuation unit to bring it into a decompressed state to adsorb and hold the substrate.
【請求項2】 請求項1におけるエッジ部は、エッジを
基板中心側が底部に直交した面と、基板周辺部側が該直
交した面に対して20〜70度の角度を持つスロープ状
の面により形成し、且つ、スロープ状の面にパッキンを
固定していることを特徴とする基板用保持治具。
2. The edge portion according to claim 1, wherein the edge is formed by a surface having a substrate center side orthogonal to a bottom portion and a slope-shaped surface having a substrate peripheral portion side with an angle of 20 to 70 degrees with respect to the orthogonal surface. In addition, the substrate holding jig is characterized in that the packing is fixed to the slope-shaped surface.
【請求項3】 請求項2におけるエッジ部の全周は、処
理する基板の全外周に対応させたものであることを特徴
とする基板用保持治具。
3. The holding jig for a substrate according to claim 2, wherein the entire circumference of the edge portion corresponds to the entire outer circumference of the substrate to be processed.
【請求項4】 請求項1ないし3における基板用保持治
具は、処理を施す基板の処理面ではない裏面で基板を減
圧吸着して保持するものであり、処理液ないし処理気体
に対して腐蝕されず、且つ、処理の際に加わる機械的な
力にも十分に耐えるもので、処理の際には、空洞部側の
基板の裏面は、処理液ないし処理気体から隔離された状
態とすることを特徴とする基板用保持治具。
4. The substrate holding jig according to any one of claims 1 to 3, which holds the substrate under reduced pressure by the back surface of the substrate to be processed, which is not the processing surface, and corrodes the processing liquid or the processing gas. In addition, the back surface of the substrate on the side of the cavity should be isolated from the processing liquid or the processing gas during processing, since it does not withstand the mechanical force applied during processing. A holding jig for substrates, characterized by:
JP8048196A 1996-03-11 1996-03-11 Substrate holding jig Withdrawn JPH09246365A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8048196A JPH09246365A (en) 1996-03-11 1996-03-11 Substrate holding jig

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8048196A JPH09246365A (en) 1996-03-11 1996-03-11 Substrate holding jig

Publications (1)

Publication Number Publication Date
JPH09246365A true JPH09246365A (en) 1997-09-19

Family

ID=13719477

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8048196A Withdrawn JPH09246365A (en) 1996-03-11 1996-03-11 Substrate holding jig

Country Status (1)

Country Link
JP (1) JPH09246365A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005059173A (en) * 2003-08-18 2005-03-10 Yoshioka Seiko:Kk Suction device and chuck table
JP2008300644A (en) * 2007-05-31 2008-12-11 Shibaura Mechatronics Corp Substrate holding device and substrate treatment method
JP2010123598A (en) * 2008-11-17 2010-06-03 Lintec Corp Device, method and tool for supporting plate-like member
JP2013089793A (en) * 2011-10-19 2013-05-13 Mitsubishi Electric Corp Vacuum suction holding apparatus and vacuum suction holding method
KR101578195B1 (en) * 2015-04-03 2015-12-16 장진희 Jig apparatus for locating work piece
JP2017522723A (en) * 2014-07-03 2017-08-10 エルピーイー ソシエタ ペル アチオニ Tool for operating a substrate, operating method and epitaxial reactor
WO2019117186A1 (en) * 2017-12-14 2019-06-20 日本電気硝子株式会社 Protective equipment for substrate, and method for producing substrate having film
CN110142558A (en) * 2019-06-24 2019-08-20 创领心律管理医疗器械(上海)有限公司 Welding tooling and welder
TWI691017B (en) * 2018-06-28 2020-04-11 南韓商吉佳藍科技股份有限公司 Lip seal with improved by-product vapor deposition problem and semiconductor engineering device including the same

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005059173A (en) * 2003-08-18 2005-03-10 Yoshioka Seiko:Kk Suction device and chuck table
JP2008300644A (en) * 2007-05-31 2008-12-11 Shibaura Mechatronics Corp Substrate holding device and substrate treatment method
JP2010123598A (en) * 2008-11-17 2010-06-03 Lintec Corp Device, method and tool for supporting plate-like member
JP2013089793A (en) * 2011-10-19 2013-05-13 Mitsubishi Electric Corp Vacuum suction holding apparatus and vacuum suction holding method
JP2017522723A (en) * 2014-07-03 2017-08-10 エルピーイー ソシエタ ペル アチオニ Tool for operating a substrate, operating method and epitaxial reactor
KR101578195B1 (en) * 2015-04-03 2015-12-16 장진희 Jig apparatus for locating work piece
WO2019117186A1 (en) * 2017-12-14 2019-06-20 日本電気硝子株式会社 Protective equipment for substrate, and method for producing substrate having film
TWI691017B (en) * 2018-06-28 2020-04-11 南韓商吉佳藍科技股份有限公司 Lip seal with improved by-product vapor deposition problem and semiconductor engineering device including the same
CN110142558A (en) * 2019-06-24 2019-08-20 创领心律管理医疗器械(上海)有限公司 Welding tooling and welder
CN110142558B (en) * 2019-06-24 2022-01-28 创领心律管理医疗器械(上海)有限公司 Welding tool and welding device

Similar Documents

Publication Publication Date Title
KR101019469B1 (en) Vacuum suction head
JPH0744135B2 (en) Bonding method and bonding device for semiconductor substrate
KR20150042734A (en) Peel-off apparatus, peel-off system, peel-off method and computer storage medium
KR101898355B1 (en) Suction stage, bonding device, and method for manufacturing bonded substrate
JPH09246365A (en) Substrate holding jig
JPH08195428A (en) Vacuum suction apparatus
TW486608B (en) Contact exposure method
JP2004055833A (en) Device for absorbing thin-plate like member
JP5100579B2 (en) Adsorption device for substrate and method for handling substrate
JPH07183261A (en) Method for sticking wafer
JP2005135931A (en) Device and method for sticking tape
JP3580227B2 (en) Composite substrate separation method and separation device
JP2016197623A (en) Sucking/holding jig, sucking/holding device equipped with this jig, sucking/holding method, processing method of substrate, and film formation method of substrate
JP4863350B2 (en) Adhesive sheet and holding jig
JP3252074B2 (en) Vacuum suction device, sealing tool for vacuum suction device, and vacuum suction method
JP2005340311A (en) Tape adhesion apparatus and tape adhesion method
JP2007036101A (en) Work stage of exposure machine and exposure method
JP2001044097A (en) Aligner
JP2001209192A (en) Method for exposing substrate and aligner
JP2003191191A (en) Vacuum suction device
JP2003283185A (en) Method and device for assembling board
JP2009141173A (en) Laminating device
JP5153531B2 (en) Substrate holding jig
JPH09225768A (en) Board holding device
JP2513261Y2 (en) Loading / unloading device

Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20030603