WO2019114234A1 - 一种真空镀膜用集成腔室 - Google Patents

一种真空镀膜用集成腔室 Download PDF

Info

Publication number
WO2019114234A1
WO2019114234A1 PCT/CN2018/092241 CN2018092241W WO2019114234A1 WO 2019114234 A1 WO2019114234 A1 WO 2019114234A1 CN 2018092241 W CN2018092241 W CN 2018092241W WO 2019114234 A1 WO2019114234 A1 WO 2019114234A1
Authority
WO
WIPO (PCT)
Prior art keywords
chamber
integrated
opening
vacuum coating
sealing door
Prior art date
Application number
PCT/CN2018/092241
Other languages
English (en)
French (fr)
Inventor
么曼实
闫风
Original Assignee
北京创昱科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 北京创昱科技有限公司 filed Critical 北京创昱科技有限公司
Publication of WO2019114234A1 publication Critical patent/WO2019114234A1/zh

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0209—Pretreatment of the material to be coated by heating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4411—Cooling of the reaction chamber walls
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00277—Apparatus
    • B01J2219/00279—Features relating to reactor vessels
    • B01J2219/00331—Details of the reactor vessels
    • B01J2219/00333—Closures attached to the reactor vessels
    • B01J2219/00335—Septa
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00761—Details of the reactor

Definitions

  • the invention relates to the field of vacuum coating equipment, and in particular to an integrated chamber for vacuum coating.
  • the preheating chamber and the process chamber of the existing coating equipment are generally manufactured independently, and are connected by an integral plug-in valve for workpiece transfer and vacuum sealing, and separate processes are performed.
  • the structure needs to be vacuum-sealed separately with the plug-in valve with the casing and the two chambers, and then the valve core of the plug-in valve is used for the partition between the two chambers and the vacuum sealing.
  • the disadvantage is that the preheating chamber, When the flapper valve and the process chamber are assembled, the flapper valve (generally heavy) is assembled with a chamber and subjected to relevant vacuum detection. After passing, it is assembled with another chamber and vacuum tested. The assembly work and the difficulty are very large.
  • the heat-insulating baffle behind the existing flapper valve adopts a structure that is linearly moved up and down. It requires a heat-insulating baffle inside the two support rods to be installed inside the chamber, a welded bellows seal, and two guide rods. Use pneumatic, electric, manual drive, or similar structure.
  • These insulating baffle structures are typically mounted at the bottom of the process chamber, behind the flapper valve.
  • the structure is sized, the entire assembly needs to occupy a length space of about 100mm, and then the bottom plate of the lower part of the process chamber can be installed.
  • the space including the bolt and the space of the seal ring also need a space of about 80 to 90 mm in length. A space of about 180 to 190 mm is required for the assembly.
  • the structure is relatively complicated and requires relatively high manufacturing precision to ensure that the upper and lower ends of the two bellows are vacuum sealed.
  • the object of the present invention is to provide an integrated chamber for vacuum coating, which solves the problem that assembly and maintenance of the existing coating equipment is difficult, and the structure of the heat insulating baffle is complicated and takes up a large space.
  • the present invention provides an integrated chamber for vacuum coating, comprising an integral chamber composed of a chamber top plate, four chamber side plates and a chamber bottom plate, wherein the integrated chamber is provided with a partition plate.
  • the partition divides the integral chamber into a preheating chamber and a process chamber, the partition is provided with an opening through which the workpiece passes, and the preheating chamber is provided with a sealing door for blocking the opening.
  • the sealing door is sealingly fitted with the partition plate, and the sealing door is coupled to the first driving member to drive opening and closing of the sealing door.
  • the process chamber is provided with at least one oscillating heat insulation panel, and the end side of the oscillating heat insulation panel is provided with a rotating shaft, one end of the rotating shaft is rotatably connected with the support, and the support is mounted on the partition Or the chamber wall of the integral chamber, the other end of the rotating shaft is connected to the second driving member, and the second driving member drives the opening and closing of the swinging heat insulating plate to cooperate with the action of the sealing door.
  • the first driving member is a lifting cylinder, and a driving shaft of the lifting cylinder is connected to the sealing door through the chamber top plate, and a driving shaft of the lifting cylinder is sealingly connected with the chamber top plate.
  • the second driving member is a swinging cylinder
  • the swinging cylinder is connected to a rotating shaft of the swinging heat insulating plate through a sealing bearing to drive opening and closing of the swinging heat insulating panel, the sealed bearing and the integral cavity
  • the chamber walls of the chamber are hermetically connected.
  • At least one fixed heat insulation board is disposed in the process chamber, and two ends of the fixed heat insulation board are respectively connected and fixed to the side panel of the chamber, and the fixed heat insulation board is provided with a transmission for the workpiece to pass through. Opening.
  • the circumferential side of the partition is welded and fixed to the inner wall of the integral chamber.
  • the chamber top plate is provided with upper openings respectively adapted to the preheating chamber and the process chamber, and the upper openings of the preheating chamber and the process chamber are respectively covered with a preheating chamber upper cover and
  • the process chamber upper cover is provided with a lower opening adapted to the process chamber, and the outer side of the lower opening is covered with a process chamber lower cover.
  • the top plate of the chamber is an integral flange
  • a sealing member is disposed between the upper cover plate of the preheating chamber and the upper cover plate of the process chamber and the top plate of the chamber, and the lower cover of the process chamber is A seal is disposed between the bottom plates of the chamber.
  • the partition plate and the chamber wall of the integral chamber are provided with water-cooling through holes.
  • a sealing member is disposed between the sealing door and the partition.
  • the integrated chamber is made of high temperature resistant stainless steel.
  • the integrated chamber for vacuum coating improves the manufacturing process by integrating the preheating chamber and the process chamber into the integrated chamber, and has convenient assembly and maintenance;
  • the sealed door has simple structure and small weight, is convenient for loading and unloading and maintenance, and reduces Purchasing cost;
  • the swinging heat insulation board has a simple structure, takes up less space, reduces the size space of the process chamber, reduces the amount of process gas, and is convenient for controlling the pressure.
  • the two ends are fixed by the rotating shaft, and the loading and unloading and maintenance are convenient and the operation is reliable.
  • Figure 1 is a schematic longitudinal cross-sectional view showing an embodiment of the present invention
  • Figure 2 is a cross-sectional view taken along line A-A of Figure 1.
  • 1 sealing door; 2: swinging heat insulation board; 3: fixing heat insulation board; 4: workpiece; 5: process room lower cover; 6: process room upper cover; 7: preheating room upper cover 8: first drive member; 9: sealed bearing; 10: second drive member; 11: spacer; 12: chamber top plate; 13: chamber side plate; 14: chamber floor; 15: first rotation axis ; 16: support; O: swinging the diaphragm open state; S: swinging the shutter closed state.
  • connection In the description of the present invention, it should be noted that the terms “installation”, “connected”, and “connected” are to be understood broadly, and may be fixed or detachable, for example, unless otherwise explicitly defined and defined. Connected, or integrally connected; can be mechanical or electrical; can be directly connected, or indirectly connected through an intermediate medium, can be the internal communication of the two components.
  • Connected, or integrally connected can be mechanical or electrical; can be directly connected, or indirectly connected through an intermediate medium, can be the internal communication of the two components.
  • the specific meaning of the above terms in the present invention can be understood in a specific case by those skilled in the art.
  • an embodiment of the present invention provides an integrated chamber for vacuum coating, comprising an integral chamber composed of a chamber top plate 12, four chamber side plates 13 and a chamber bottom plate 14, and an integral cavity.
  • a partition 11 is arranged in the chamber, and the partition 11 divides the integral chamber into a preheating chamber and a process chamber, and the partition 11 is provided with an opening through which the workpiece 4 passes, and the preheating chamber is provided with a seal for blocking the opening.
  • the door 1, the sealing door 1 is sealingly fitted with the partition 11, and the sealing door 1 is connected to the first driving member 8 to drive the opening and closing of the sealing door 1.
  • the integrated chamber is composed of the chamber top plate 12, the four chamber side plates 13 and the chamber bottom plate 14, and the joints of the plates on the inner chamber side are connected by continuous welding to form a sealed connection, and the outer chamber side plates are integrated.
  • the joints of the joints are fixed by spot welding to ensure the overall structural strength.
  • the integrated chamber is partitioned into a preheating chamber and a process chamber through the partition plate 11, and the peripheral side of the partition plate 11 is welded and fixed to the inner wall of the integrated chamber, and the partition plate 11 is continuously welded on the process chamber side and the inner wall of the integrated chamber.
  • the partition 11 Fixed, to ensure the sealing of the process chamber, the partition 11 is fixed by spot welding on the preheating chamber side and the inner wall of the integrated chamber, and the fixing strength of the partition 11 is strengthened, and the partition wall of the partition 11 and the integrated chamber are provided. Some water-cooled through holes are used to cool the integrated chamber.
  • the chamber top plate 12 is specifically an integral flange, and the chamber top plate 12 is provided with an upper opening adapted to the preheating chamber, and the upper opening is covered with a preheating chamber upper cover plate 7, and the chamber top plate 12 is further provided in the process.
  • the upper opening of the chamber is covered with the upper cover of the process chamber.
  • the bottom plate 14 of the chamber below the process chamber is provided with a lower opening, and the outer side of the lower opening is covered with a process chamber lower cover 5 for convenient disassembly and maintenance.
  • a sealing member is disposed between the upper cover plate 7 of the preheating chamber and the upper cover plate 6 of the process chamber and the top plate 12 of the chamber, and a sealing member is disposed between the lower cover plate 5 of the process chamber and the bottom plate 14 of the chamber, and the sealing member is preferably
  • the O-ring seal ensures the tightness of the preheating chamber and the process chamber, and improves the safety of the integrated chamber.
  • the partition 11 is provided with an opening whose size is larger than the size of the workpiece 4 for smoothly passing the workpiece 4.
  • the preheating chamber is provided with a sealing door 1 for sealing the opening, and the sealing door 1 and the partition 11
  • a sealing member preferably an O-ring, is provided between the sealing door 1 and the partition 11 to prevent gas exchange between the preheating chamber and the process chamber through the opening, thereby affecting the coating effect.
  • the chamber top plate 12 is provided with a mounting hole adapted to the drive shaft of the first driving member 8.
  • the first driving member 8 is preferably a lifting cylinder, and the driving shaft of the lifting cylinder passes through the mounting hole and is connected with the sealing door to drive the sealing door. 1 Ascending or descending, the driving shaft of the lifting cylinder is installed at the upper mounting hole of the ceiling plate 12 of the chamber through a flange seal to ensure the sealing of the preheating chamber.
  • At least one oscillating heat insulation panel 2 is disposed in the process chamber, and the number of the swaying heat insulation panels 2 is selected according to the temperature of the actual process room to protect the sealing door 1 and prevent the sealing door 1 and the partition 11 from being
  • the O-ring seal is exposed to heat from the process chamber, extending the life of the O-ring and ensuring the seal between the preheat chamber and the process chamber.
  • the end side of the oscillating heat insulation panel 2 is provided with a rotating shaft, one end of the rotating shaft is rotatably connected with the support 16, and the support 16 is mounted on the partition 11 or the chamber wall of the integrated chamber, and the other end of the rotating shaft
  • the two driving members 10 are connected; or, in another embodiment, one end of the oscillating heat insulating plate 2 is fixedly connected to the first rotating shaft 15 by screws, and the first rotating shaft 15 is rotatably mounted on the partition 11 through the support 16 .
  • the other end of the oscillating heat shield 2 is fixedly connected to the second rotating shaft by screws, and the second rotating shaft is connected to the driving end of the second driving member 10, and both of the second driving member 10 drive the opening and closing of the oscillating heat insulating plate 2 to match the sealing door.
  • the action of 1 is convenient for loading and unloading and maintenance, and takes up little space.
  • the second driving member 10 is preferably a swinging cylinder, and the driving end thereof is provided with a sealed bearing 9, and the sealed bearing 9 is preferably a magnetic fluid bearing, so that the swinging cylinder drives the swinging heat insulating panel 2 to be opened or closed, and the chamber side panel 13 is provided with
  • the assembly hole of the magnetic fluid bearing is convenient for disassembly and maintenance, and at the same time, the sealing installation of the swing cylinder and the chamber side plate 13 is realized, and the sealing assembly of the swinging cylinder is realized by the flange, the first rotating shaft 15 and the second rotation The shafts are on the same horizontal line, ensuring that the oscillating thermal insulation panel 2 completely obscures the opening.
  • the sealing form of the driving end of the swing cylinder and the chamber side plate 13 is not limited to the magnetic fluid bearing seal; the moving form of the swing heat insulating plate not only swings up and down along the moving direction of the workpiece 4, In some cases, it is also possible to oscillate vertically to the direction of movement of the workpiece 4, or to resemble the form of lifting movement of the sealing door 1.
  • At least one fixed heat insulation board 3 parallel to the partition plate 11 may be installed in the process chamber to assist the swinging heat insulation board 2, and the two ends of the fixed heat insulation board 3 and the chamber side board 13 respectively
  • the connection is fixed and can be fixed by screws or welding.
  • the fixed heat insulation board 3 is provided with a transmission opening adapted to the size of the workpiece 4.
  • the height of the fixed heat insulation board 3 depends on the process and the relative position of other parts.
  • the lifting cylinder 8 drives the sealing door 1 to rise, exposing the opening in the partition 11.
  • the swinging heat insulating panel is in the closed state S, and the swinging cylinder 10 drives the swing.
  • the heat shield 2 rotates and is in the swinging partition open state O, so that the workpiece is smoothly transferred to the process chamber, the swing cylinder 10 drives the swing partition 2 to return to the closed state, and the lift cylinder 8 drives the seal door 1 to descend, so that the seal door 1 and the partition are closed.
  • the plate 11 continues to remain sealed.
  • the chamber side plate 13, the first rotating shaft 15, the second rotating shaft and the support 16 are all made of high temperature resistant stainless steel.
  • the integrated chamber for vacuum coating improves the manufacturing process by integrating the preheating chamber and the process chamber into the integrated chamber, and has convenient assembly and maintenance;
  • the sealed door has simple structure and small weight, is convenient for loading and unloading and maintenance, and reduces Purchasing cost;
  • the swinging heat insulation board has a simple structure, takes up less space, reduces the size space of the process chamber, reduces the amount of process gas, and is convenient for controlling the pressure.
  • the two ends are fixed by the rotating shaft, and the loading and unloading and maintenance are convenient and the operation is reliable.
  • the opening manner of the sealing door may be set to be rotated and opened along the offset rotating shaft; the driving manner of the sealing door may be electric or manual;
  • the heat shield can be stacked with multiple layers separated by a gasket.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Furnace Housings, Linings, Walls, And Ceilings (AREA)
  • Tunnel Furnaces (AREA)
  • Coating Apparatus (AREA)

Abstract

一种真空镀膜用集成腔室，包括由腔室顶板（12）、四个腔室侧板（13）和腔室底板（14）组成的一体腔室，一体腔室内设有隔板（11），隔板（11）将一体腔室分割成预热室和工艺室，隔板上设有供工件（4）穿过的开口，预热室内设有用以封堵开口的密封门（1），密封门（1）与隔板（11）密封适配，密封门（1）与第一驱动件（8）连接，以驱动密封门（1）的开闭。

Description

一种真空镀膜用集成腔室
交叉引用
本申请引用于2017年12月13日提交的专利名称为“一种真空镀膜用集成腔室”的第2017113299890号中国专利申请，其通过引用被全部并入本申请。
技术领域
本发明涉及真空镀膜设备领域，特别是涉及一种真空镀膜用集成腔室。
背景技术
现有镀膜设备的预热室和工艺室一般都是独立制造的，通过整体的插板阀连接起来进行工件传输和真空密封，进行各自独立的工艺。这种结构的需要用带壳体的插板阀与两个腔体分别进行真空密封，然后用插板阀的阀芯进行两个腔室之间的隔断和真空密封，缺点是预热室、插板阀、工艺室进行装配时先要将插板阀(一般很重)与一个腔室装配并进行相关真空检测，合格后与另外一个腔室进行装配并进行真空检测。装配的工作量和难度都很大，进行后期维护插板阀与腔室之间的密封圈时更是需要将腔体移动才能进行，然后用吊车或其它吊具进行作业，非常繁重。一般情况下设备固定后尽量不要再进行移动，以便保证设备的结构参数的稳定。
现有的插板阀后面的隔热挡板采用的都是位于上下直线运动的结构，需要左右两个支撑杆安装腔室内部的隔热挡板，焊接波纹管密封，两个导向杆，可以使用气动、电动、手动均进行驱动，或者类似的结构。这些隔热挡板结构一般都安装于工艺室的底部，插板阀的后面。结构都是有尺寸的，整个组件需要占据100mm左右的长度方向空间，然后才能安装工艺室下部组件的底板，包括螺栓的空间和密封圈的空间也需要有80～90mm左右的长度方向空间，总体上就需要有大约180～190mm的空间为该组件所用。结构相对来说较为复杂，需要比较高的制造精度进行保证，两个波纹管的上下端均需要进行真空密封。
发明内容
(一)要解决的技术问题
本发明的目的是提供一种真空镀膜用集成腔室，以解决现有镀膜设备装配与维护困难，且隔热挡板结构复杂，占用空间大的问题。
(二)技术方案
为了解决上述技术问题，本发明提供一种真空镀膜用集成腔室，包括由腔室顶板、四个腔室侧板和腔室底板组成的一体腔室，所述一体腔室内设有隔板，所述隔板将所述一体腔室分割成预热室和工艺室，所述隔板上设有供工件穿过的开口，所述预热室内设有用以封堵所述开口的密封门，所述密封门与所述隔板密封适配，所述密封门与第一驱动件连接，以驱动所述密封门的开闭。
其中，所述工艺室内设有至少一个摆动隔热板，所述摆动隔热板的端侧设有转轴，所述转轴的一端与支座可旋转连接，所述支座安装在所述隔板或所述一体腔室的腔室壁上，所述转轴的另一端与第二驱动件连接，所述第二驱动件驱动所述摆动隔热板的开闭以配合所述密封门的动作。
其中，所述第一驱动件为升降气缸，所述升降气缸的驱动轴穿过所述腔室顶板与所述密封门连接，所述升降气缸的驱动轴与所述腔室顶板密封连接。
其中，所述第二驱动件为摆动气缸，所述摆动气缸通过密封轴承与所述摆动隔热板的转轴连接，驱动所述摆动隔热板的开闭，所述密封轴承与所述一体腔室的腔室壁密封连接。
其中，所述工艺室内设有至少一个固定隔热板，所述固定隔热板的两端分别与腔室侧板连接固定，所述固定隔热板上设有供所述工件穿过的传输开口。
其中，所述隔板的周侧与所述一体腔室的内壁焊接固定。
其中，所述腔室顶板设有分别与所述预热室和所述工艺室适配的上开口，所述预热室和所述工艺室的上开口分别覆盖有预热室上盖板和工艺室上盖板，所述腔室底板设有与所述工艺室适配的下开口，所述下开口的外侧覆盖有工艺室下盖板。
其中，所述腔室顶板为整体法兰，所述预热室上盖板和所述工艺室上 盖板与所述腔室顶板之间均设有密封件，所述工艺室下盖板与所述腔室底板之间设有密封件。
其中，所述隔板与所述一体腔室的腔室壁均设有水冷通孔。
其中，所述密封门与所述隔板之间设有密封件。
其中，所述集成腔室采用耐高温不锈钢材质。
(三)有益效果
本发明提供的一种真空镀膜用集成腔室，通过将预热室和工艺室集成一体腔室，提高了制造工艺性，装配与维修便捷；密封门结构简单重量小，便于装卸与维护，降低采购成本；摆动隔热板结构简单，占用空间小，减小工艺室的尺寸空间，降低了工艺气体的用量，方便控制压力，两端通过旋转轴连接固定，装卸与维护方便，运行可靠。
附图说明
图1为本发明实施例的纵截面示意图；
图2为图1沿A-A向的剖视图。
图中，1：密封门；2：摆动隔热板；3：固定隔热板；4：工件；5：工艺室下盖板；6：工艺室上盖板；7：预热室上盖板；8：第一驱动件；9：密封轴承；10：第二驱动件；11：隔板；12：腔室顶板；13：腔室侧板；14：腔室底板；15：第一旋转轴；16：支座；O：摆动隔板打开状态；S：摆动隔板关闭状态。
具体实施方式
下面结合附图和实施例，对本发明的具体实施方式作进一步详细描述。以下实例用于说明本发明，但不用来限制本发明的范围。
在本发明的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以具体情况理解上述术语在本发明中的具体含义。
如图1和图2所示，本发明实施例提供一种真空镀膜用集成腔室，包 括由腔室顶板12、四个腔室侧板13和腔室底板14组成的一体腔室，一体腔室内设有隔板11，隔板11将一体腔室分割成预热室和工艺室，隔板11上设有供工件4穿过的开口，预热室内设有用以封堵所述开口的密封门1，密封门1与隔板11密封适配，密封门1与第一驱动件8连接，以驱动密封门1的开闭。
进一步的，一体腔室由腔室顶板12、四个腔室侧板13和腔室底板14焊接组成，一体腔室内侧各板件连接处采用连续焊接方式实现密封连接，一体腔室外侧各板件连接处采用点焊方式实现连接固定，保证整体的结构强度。
其中，一体腔室内通过隔板11隔断成预热室和工艺室，隔板11的周侧与一体腔室的内壁焊接固定，隔板11在工艺室侧与一体腔室的内壁采用连续焊接方式固定，保证工艺室的密封性，隔板11在预热室侧与一体腔室的内壁采用点焊方式固定，加强隔板11的固定强度，隔板11与一体腔室的腔室壁均设有的水冷通孔，用以对集成腔室散热降温。
进一步的，腔室顶板12具体为整体法兰，腔室顶板12设有与预热室适配的上开口，上开口覆盖有预热室上盖板7，腔室顶板12还设有于工艺室适配的上开口，上开口覆盖有工艺室上盖板6，工艺室下方的腔室底板14设有下开口，下开口的外侧覆盖有工艺室下盖板5，方便拆装与维护。
其中，预热室上盖板7和工艺室上盖板6与腔室顶板12之间均设有密封件，工艺室下盖板5与腔室底板14之间设有密封件，密封件优选为O型密封圈保证预热室和工艺室的密封性，提高集成腔室的安全性。
进一步的，隔板11上设有开口，开口的尺寸大于工件4的尺寸，用以使工件4平稳穿过，预热室内设有用以封堵开口的密封门1，密封门1与隔板11之间设有密封件，优选O型密封圈，以实现密封门1与隔板11的密封，防止预热室和工艺室通过开口进行气体交换，影响镀膜效果。
其中，腔室顶板12设有与第一驱动件8的驱动轴适配的安装孔，第一驱动件8优选升降气缸，升降气缸的驱动轴穿过安装孔并与密封门连接，驱动密封门1上升或下降，升降气缸的驱动轴通过法兰密封安装在腔室顶板12的上安装孔处，保证预热室的密封性。
进一步的，工艺室内设有至少一个摆动隔热板2，根据实际工艺室内 温度的高低情况选取摆动隔热板2的个数，用以保护密封门1，防止密封门1与隔板11之间的O型密封圈圈受到来自工艺室的热辐射，从而延长O型密封圈的使用寿命，保证集预热室和工艺室的密封性。
其中，摆动隔热板2的端侧设有转轴，转轴的一端与支座16可旋转连接，支座16安装在隔板11上或一体腔室的腔室壁上，转轴的另一端与第二驱动件10连接；或者，另一种实施方式，摆动隔热板2的一端通过螺钉固定连接第一旋转轴15，第一旋转轴15通过支座16可旋转式安装在隔板11上，摆动隔热板2另一端通过螺钉固定连接第二旋转轴，第二转轴与第二驱动件10的驱动端连接，均实现第二驱动件10驱动摆动隔热板2的开闭以配合密封门1的动作，装卸和维护方便，且占用空间小。
进一步的，第二驱动件10优选摆动气缸，其驱动端设有密封轴承9，密封轴承9优选磁流体轴承，实现摆动气缸驱动摆动隔热板2开启或关闭，腔室侧板13设有与磁流体轴承适配的装配孔，便于拆装和维护，同时，实现摆动气缸与腔室侧板13的密封安装，并通过法兰实现摆动气缸的密封装配，第一旋转轴15与第二旋转轴位于同一水平线上，保证摆动隔热板2完全遮挡住开口。应当理解，在本发明的其他实施例中，摆动气缸的驱动端与腔室侧板13的密封形式不限于磁流体轴承密封；摆动隔热板的运动形式不只沿着工件4移动方向上下摆动，有些情况下，也可以垂直于工件4移动方向左右摆动，或者类似于密封门1的升降运动形式。
其中，根据实际需要，可在工艺室内安装有至少一个与隔板11平行的固定隔热板3，用以辅助摆动隔热板2，固定隔热板3的两端分别与腔室侧板13连接固定，可采用螺钉或焊接固定，固定隔热板3上设有与工件4尺寸适配的传输开口，固定隔热板3的高度取决于工艺和与其它零部件的相对位置需要。
进一步的，需要将工件4从预热室输送至工艺室时，升降气缸8驱动密封门1上升，露出隔板11上的开口，此时，摆动隔热板关闭状态S，摆动气缸10驱动摆动隔热板2旋转，并处于摆动隔板打开状态O，使工件平稳传输至工艺室，摆动气缸10驱动摆动隔板2恢复关闭状态，升降气缸8驱动密封门1下降，使密封门1与隔板11继续保持密封。
其中，密封门1、摆动隔热板2、固定隔热板3、工艺室下盖板5、工 艺室上盖板6、预热室上盖板7、隔板11、腔室顶板12、腔室侧板13、第一旋转轴15、第二旋转轴和支座16均采用耐高温不锈钢材质。
本发明提供的一种真空镀膜用集成腔室，通过将预热室和工艺室集成一体腔室，提高了制造工艺性，装配与维修便捷；密封门结构简单重量小，便于装卸与维护，降低采购成本；摆动隔热板结构简单，占用空间小，减小工艺室的尺寸空间，降低了工艺气体的用量，方便控制压力，两端通过旋转轴连接固定，装卸与维护方便，运行可靠。
以上所述仅为本发明的较佳实施例而已，并不用以限制本发明，例如密封门的开启方式可以设置为沿偏置的转轴旋转开启；密封门的驱动方式可以是电动或手动；摆动隔热板可以叠加设置多层，中间用垫片隔开。总之，凡在本发明的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本发明的保护范围之内。

Claims (11)

  1. 一种真空镀膜用集成腔室，其特征在于，包括由腔室顶板、四个腔室侧板和腔室底板组成的一体腔室，所述一体腔室内设有隔板，所述隔板将所述一体腔室分割成预热室和工艺室，所述隔板上设有供工件穿过的开口，所述预热室内设有用以封堵所述开口的密封门，所述密封门与所述隔板密封适配，所述密封门与第一驱动件连接，以驱动所述密封门的开闭。
  2. 如权利要求1所述的真空镀膜用集成腔室，其特征在于，所述工艺室内设有至少一个摆动隔热板，所述摆动隔热板的端侧设有转轴，所述转轴的一端与支座可旋转连接，所述支座安装在所述隔板或所述一体腔室的腔室壁上，所述转轴的另一端与第二驱动件连接，所述第二驱动件驱动所述摆动隔热板的开闭以配合所述密封门的动作。
  3. 如权利要求2所述的真空镀膜用集成腔室，其特征在于，所述第一驱动件为升降气缸，所述升降气缸的驱动轴穿过所述腔室顶板与所述密封门连接，所述升降气缸的驱动轴与所述腔室顶板密封连接。
  4. 如权利要求2所述的真空镀膜用集成腔室，其特征在于，所述第二驱动件为摆动气缸，所述摆动气缸通过密封轴承与所述摆动隔热板的转轴连接，驱动所述摆动隔热板的开闭，所述密封轴承与所述一体腔室的腔室壁密封连接。
  5. 如权利要求1所述的真空镀膜用集成腔室，其特征在于，所述工艺室内设有至少一个固定隔热板，所述固定隔热板的两端分别与腔室侧板连接固定，所述固定隔热板上设有供所述工件穿过的传输开口。
  6. 如权利要求1所述的真空镀膜用集成腔室，其特征在于，所述隔板的周侧与所述一体腔室的内壁焊接固定。
  7. 如权利要求1所述的真空镀膜用集成腔室，其特征在于，所述腔室顶板设有分别与所述预热室和所述工艺室适配的上开口，所述预热室和所述工艺室的上开口分别覆盖有预热室上盖板和工艺室上盖板，所述腔室底板设有与所述工艺室适配的下开口，所述下开口的外侧覆盖有工艺室下盖板。
  8. 如权利要求7所述的真空镀膜用集成腔室，其特征在于，所述腔室顶板为整体法兰，所述预热室上盖板和所述工艺室上盖板与所述腔室顶 板之间均设有密封件，所述工艺室下盖板与所述腔室底板之间设有密封件。
  9. 如权利要求1所述的真空镀膜用集成腔室，其特征在于，所述隔板与所述一体腔室的腔室壁均设有水冷通孔。
  10. 如权利要求1所述的真空镀膜用集成腔室，其特征在于，所述密封门与所述隔板之间设有密封件。
  11. 如权利要求1-10任一项所述的真空镀膜用集成腔室，其特征在于，所述集成腔室采用耐高温不锈钢材质。
PCT/CN2018/092241 2017-12-13 2018-06-21 一种真空镀膜用集成腔室 WO2019114234A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201711329989.0A CN107858666A (zh) 2017-12-13 2017-12-13 一种真空镀膜用集成腔室
CN201711329989.0 2017-12-13

Publications (1)

Publication Number Publication Date
WO2019114234A1 true WO2019114234A1 (zh) 2019-06-20

Family

ID=61705912

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2018/092241 WO2019114234A1 (zh) 2017-12-13 2018-06-21 一种真空镀膜用集成腔室

Country Status (6)

Country Link
US (1) US20190177832A1 (zh)
JP (1) JP2019104985A (zh)
KR (1) KR20190070840A (zh)
CN (1) CN107858666A (zh)
DE (1) DE102018215023A1 (zh)
WO (1) WO2019114234A1 (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107858666A (zh) * 2017-12-13 2018-03-30 北京创昱科技有限公司 一种真空镀膜用集成腔室
CN110643969A (zh) * 2018-06-27 2020-01-03 北京铂阳顶荣光伏科技有限公司 一种真空蒸镀设备
CN109737740A (zh) * 2018-12-26 2019-05-10 广东科达洁能股份有限公司 一种防进窑扬粉的过渡箱体
CN114592171B (zh) * 2022-01-21 2022-09-23 杭州启俄微纳科技有限公司 一种镀膜机
CN114657538B (zh) * 2022-03-25 2024-02-02 厦门韫茂科技有限公司 一种连续式ald镀膜设备的腔体结构
CN115155943A (zh) * 2022-06-27 2022-10-11 无锡帕尔弗工业设备科技有限公司 一种镀膜设备

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6112035A (ja) * 1984-06-27 1986-01-20 Nippon Telegr & Teleph Corp <Ntt> 半導体製造装置
CN102110744A (zh) * 2009-12-04 2011-06-29 显示器生产服务株式会社 制备太阳能电池的同轴系统
CN104233213A (zh) * 2013-06-20 2014-12-24 生阳新材料科技（宁波）有限公司 气体反应连续腔及气体反应方法
CN107858666A (zh) * 2017-12-13 2018-03-30 北京创昱科技有限公司 一种真空镀膜用集成腔室

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3568632A (en) * 1969-03-24 1971-03-09 Gary F Cawthon Lens coating apparatus
JPH0324274A (ja) * 1989-06-21 1991-02-01 Matsushita Electric Ind Co Ltd 気相成長装置
JPH04100255U (zh) * 1991-02-08 1992-08-31
DE4313284A1 (de) * 1993-04-23 1994-10-27 Leybold Ag Spaltschleuse für das Ein- oder Ausbringen von Substraten von der einen in eine benachbarte Behandlungskammer
JPH0878338A (ja) * 1994-09-05 1996-03-22 Fujitsu Ltd 半導体の製造装置
JPH11293458A (ja) * 1998-04-07 1999-10-26 Murata Mfg Co Ltd 成膜装置
KR20020073823A (ko) * 2001-03-16 2002-09-28 삼성전자 주식회사 반도체 장치 제조에 이용되는 챔버 장비
US6814813B2 (en) * 2002-04-24 2004-11-09 Micron Technology, Inc. Chemical vapor deposition apparatus
DE102004041846B4 (de) * 2004-04-27 2007-08-02 Von Ardenne Anlagentechnik Gmbh Verdampfungseinrichtung und Verfahren zum Verdampfen von Beschichtungsmaterial
US20060278164A1 (en) * 2005-06-10 2006-12-14 Petrach Philip M Dual gate isolating maintenance slit valve chamber with pumping option
JP4702801B2 (ja) * 2006-07-26 2011-06-15 株式会社神戸製鋼所 連続成膜装置
KR101411421B1 (ko) * 2007-09-21 2014-07-01 호재혁 반입/반출챔버, 이송챔버, 이를 포함하는 진공처리시스템
JP2009109006A (ja) * 2007-10-10 2009-05-21 Tokyo Electron Ltd ゲートバルブ及びそれを用いた基板処理装置
DE102009004493B3 (de) * 2009-01-09 2010-06-10 Sovello Ag Vakuumbeschichtungsanlage und Verfahren zum Betrieb einer Vakuumbeschichtungsanlage
CN101781754A (zh) * 2009-01-19 2010-07-21 深圳市鹏桑普太阳能股份有限公司 一种模块化太阳能选择性涂层连续镀膜设备
CN102080209A (zh) * 2009-12-01 2011-06-01 北京北方微电子基地设备工艺研究中心有限责任公司 真空镀膜设备
US20110180097A1 (en) * 2010-01-27 2011-07-28 Axcelis Technologies, Inc. Thermal isolation assemblies for wafer transport apparatus and methods of use thereof
CN102234762B (zh) * 2010-04-23 2014-10-15 鸿富锦精密工业（深圳）有限公司 镀膜系统
TW201209219A (en) * 2010-08-16 2012-03-01 Hon Hai Prec Ind Co Ltd Coating apparatus and coating method
CN202297761U (zh) * 2011-09-09 2012-07-04 东莞市汇成真空科技有限公司 一种离子镀膜机靶前活动遮挡板装置
US9076831B2 (en) * 2011-11-04 2015-07-07 Lam Research Corporation Substrate clamping system and method for operating the same
US9068657B2 (en) * 2012-10-19 2015-06-30 Varian Semiconductor Equipment Associates, Inc. Gate valve with improved seal arrangement
CN104109847A (zh) * 2013-04-16 2014-10-22 北京北方微电子基地设备工艺研究中心有限责任公司 一种反应腔室及等离子体加工设备
CN203668506U (zh) * 2013-11-26 2014-06-25 山东希格斯新能源有限责任公司 一种小角度真空门阀装置
CN104018134B (zh) * 2014-03-21 2017-03-15 艾瑞森表面技术（苏州）股份有限公司 一种连续自动真空镀膜设备
CN104498889B (zh) * 2014-12-18 2017-02-22 光驰科技(上海)有限公司 自动化连续式防污膜镀膜装置
CN204803227U (zh) * 2015-06-23 2015-11-25 中建材（内江）玻璃高新技术有限公司 一种三段式玻璃镀膜工艺隔断室
JP6550962B2 (ja) * 2015-06-24 2019-07-31 株式会社デンソー 炭化珪素半導体のエピタキシャル成長装置
US10954594B2 (en) * 2015-09-30 2021-03-23 Applied Materials, Inc. High temperature vapor delivery system and method
US20170178758A1 (en) * 2015-12-18 2017-06-22 Applied Materials, Inc. Uniform wafer temperature achievement in unsymmetric chamber environment
CN106835068B (zh) * 2017-03-27 2020-03-31 重庆墨希科技有限公司 卷式石墨烯连续生长设备
CN207828407U (zh) * 2017-12-13 2018-09-07 北京创昱科技有限公司 一种真空镀膜用集成腔室

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6112035A (ja) * 1984-06-27 1986-01-20 Nippon Telegr & Teleph Corp <Ntt> 半導体製造装置
CN102110744A (zh) * 2009-12-04 2011-06-29 显示器生产服务株式会社 制备太阳能电池的同轴系统
CN104233213A (zh) * 2013-06-20 2014-12-24 生阳新材料科技（宁波）有限公司 气体反应连续腔及气体反应方法
CN107858666A (zh) * 2017-12-13 2018-03-30 北京创昱科技有限公司 一种真空镀膜用集成腔室

Also Published As

Publication number Publication date
JP2019104985A (ja) 2019-06-27
KR20190070840A (ko) 2019-06-21
CN107858666A (zh) 2018-03-30
US20190177832A1 (en) 2019-06-13
DE102018215023A1 (de) 2019-06-13

Similar Documents

Publication Publication Date Title
WO2019114234A1 (zh) 一种真空镀膜用集成腔室
CN207828407U (zh) 一种真空镀膜用集成腔室
CN111521739A (zh) 一种结构分段式电子制冷片控温的voc释放舱
CN109261909A (zh) 一种侧拉门密封式工业微波烘干设备
KR20170076159A (ko) 게이트밸브 및 이를 이용한 기판처리장치
CN215295796U (zh) 一种轮轨式隧道窑
KR100755429B1 (ko) 가열로의 셔터
CN104637837B (zh) 反应腔室及等离子体加工设备
CN209702838U (zh) 一种真空蒸镀设备
KR101329711B1 (ko) Ｃｄｑ 집진기 집진후드 장치
CN108085472A (zh) 零件表面处理用密封装置
JP5749397B2 (ja) 高炉の装入装置用の扉及びバルブアッセンブリ
JP3202297U (ja) 搬送チャンバ蓋ドアアクチュエータ
CN210290916U (zh) 一种气密封挡板门
CN201687955U (zh) 一种转炉副枪氮封阀
CN204573984U (zh) 一种蒸汽锅炉上端的检修机构
CN102450961B (zh) 混合蒸汽烤箱的吸入管开闭装置
CN206739910U (zh) 一种应用于真空炉的带挡板观察窗
CN212780689U (zh) 一种结构分段式电子制冷片控温的voc释放舱
CN106002006B (zh) 一种房式清洁防护装置和清洁连接方法
SU1084905A1 (ru) Поворотный шлюз
CN218991061U (zh) 一种可快速建造的icu病房
CN218210771U (zh) 密封型防爆门
CN204593342U (zh) 一种蒸汽锅炉中的检修门与炉体的连接结构
CN214457589U (zh) 玻璃窑炉的出料口的炉门组件以及玻璃窑炉

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 18887450

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 18887450

Country of ref document: EP

Kind code of ref document: A1