CN107858666A - 一种真空镀膜用集成腔室 - Google Patents
一种真空镀膜用集成腔室 Download PDFInfo
- Publication number
- CN107858666A CN107858666A CN201711329989.0A CN201711329989A CN107858666A CN 107858666 A CN107858666 A CN 107858666A CN 201711329989 A CN201711329989 A CN 201711329989A CN 107858666 A CN107858666 A CN 107858666A
- Authority
- CN
- China
- Prior art keywords
- chamber
- vacuum coating
- integrated
- hermatic door
- dividing plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 22
- 238000000034 method Methods 0.000 claims abstract description 55
- 238000009413 insulation Methods 0.000 claims abstract description 37
- 239000012530 fluid Substances 0.000 claims abstract description 26
- 230000005540 biological transmission Effects 0.000 claims description 4
- 238000001816 cooling Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 3
- 229910001220 stainless steel Inorganic materials 0.000 claims description 3
- 239000010935 stainless steel Substances 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 230000006978 adaptation Effects 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 238000012423 maintenance Methods 0.000 abstract description 6
- 238000007789 sealing Methods 0.000 description 16
- 238000003466 welding Methods 0.000 description 5
- 239000011553 magnetic fluid Substances 0.000 description 3
- 238000009434 installation Methods 0.000 description 2
- 230000033001 locomotion Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 208000002925 dental caries Diseases 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0209—Pretreatment of the material to be coated by heating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4411—Cooling of the reaction chamber walls
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
- B01J2219/00277—Apparatus
- B01J2219/00279—Features relating to reactor vessels
- B01J2219/00331—Details of the reactor vessels
- B01J2219/00333—Closures attached to the reactor vessels
- B01J2219/00335—Septa
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00761—Details of the reactor
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Furnace Housings, Linings, Walls, And Ceilings (AREA)
- Coating Apparatus (AREA)
- Tunnel Furnaces (AREA)
Abstract
Description
Claims (11)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711329989.0A CN107858666A (zh) | 2017-12-13 | 2017-12-13 | 一种真空镀膜用集成腔室 |
PCT/CN2018/092241 WO2019114234A1 (zh) | 2017-12-13 | 2018-06-21 | 一种真空镀膜用集成腔室 |
DE102018215023.0A DE102018215023A1 (de) | 2017-12-13 | 2018-09-04 | Integrierte kammer zur vakuumbeschichtung |
US16/122,177 US20190177832A1 (en) | 2017-12-13 | 2018-09-05 | Integrated chamber for vacuum coating |
KR1020180105948A KR20190070840A (ko) | 2017-12-13 | 2018-09-05 | 진공 증착용 일체형 챔버 |
JP2018167322A JP2019104985A (ja) | 2017-12-13 | 2018-09-06 | 真空コーティング用集積チャンバ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711329989.0A CN107858666A (zh) | 2017-12-13 | 2017-12-13 | 一种真空镀膜用集成腔室 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN107858666A true CN107858666A (zh) | 2018-03-30 |
Family
ID=61705912
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201711329989.0A Pending CN107858666A (zh) | 2017-12-13 | 2017-12-13 | 一种真空镀膜用集成腔室 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20190177832A1 (zh) |
JP (1) | JP2019104985A (zh) |
KR (1) | KR20190070840A (zh) |
CN (1) | CN107858666A (zh) |
DE (1) | DE102018215023A1 (zh) |
WO (1) | WO2019114234A1 (zh) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109737740A (zh) * | 2018-12-26 | 2019-05-10 | 广东科达洁能股份有限公司 | 一种防进窑扬粉的过渡箱体 |
WO2019114234A1 (zh) * | 2017-12-13 | 2019-06-20 | 北京创昱科技有限公司 | 一种真空镀膜用集成腔室 |
CN110643969A (zh) * | 2018-06-27 | 2020-01-03 | 北京铂阳顶荣光伏科技有限公司 | 一种真空蒸镀设备 |
CN115155943A (zh) * | 2022-06-27 | 2022-10-11 | 无锡帕尔弗工业设备科技有限公司 | 一种镀膜设备 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114592171B (zh) * | 2022-01-21 | 2022-09-23 | 杭州启俄微纳科技有限公司 | 一种镀膜机 |
CN114657538B (zh) * | 2022-03-25 | 2024-02-02 | 厦门韫茂科技有限公司 | 一种连续式ald镀膜设备的腔体结构 |
Citations (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4313284A1 (de) * | 1993-04-23 | 1994-10-27 | Leybold Ag | Spaltschleuse für das Ein- oder Ausbringen von Substraten von der einen in eine benachbarte Behandlungskammer |
JPH11293458A (ja) * | 1998-04-07 | 1999-10-26 | Murata Mfg Co Ltd | 成膜装置 |
KR20020073823A (ko) * | 2001-03-16 | 2002-09-28 | 삼성전자 주식회사 | 반도체 장치 제조에 이용되는 챔버 장비 |
CN1946872A (zh) * | 2004-04-27 | 2007-04-11 | 冯·阿德纳设备有限公司 | 蒸发装置及蒸发涂料的方法 |
KR20090030784A (ko) * | 2007-09-21 | 2009-03-25 | 호진석 | 반입/반출챔버, 이송챔버, 이를 포함하는 진공처리시스템및 진공처리용 피처리물의 이송방법 |
CN101781754A (zh) * | 2009-01-19 | 2010-07-21 | 深圳市鹏桑普太阳能股份有限公司 | 一种模块化太阳能选择性涂层连续镀膜设备 |
CN102080209A (zh) * | 2009-12-01 | 2011-06-01 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 真空镀膜设备 |
US20110180097A1 (en) * | 2010-01-27 | 2011-07-28 | Axcelis Technologies, Inc. | Thermal isolation assemblies for wafer transport apparatus and methods of use thereof |
CN102234762A (zh) * | 2010-04-23 | 2011-11-09 | 鸿富锦精密工业(深圳)有限公司 | 镀膜系统 |
TW201209219A (en) * | 2010-08-16 | 2012-03-01 | Hon Hai Prec Ind Co Ltd | Coating apparatus and coating method |
CN202297761U (zh) * | 2011-09-09 | 2012-07-04 | 东莞市汇成真空科技有限公司 | 一种离子镀膜机靶前活动遮挡板装置 |
US20140110619A1 (en) * | 2012-10-19 | 2014-04-24 | Varian Semiconductor Equipment Associates, Inc. | Valve |
CN203668506U (zh) * | 2013-11-26 | 2014-06-25 | 山东希格斯新能源有限责任公司 | 一种小角度真空门阀装置 |
CN104018134A (zh) * | 2014-03-21 | 2014-09-03 | 艾瑞森表面技术(苏州)有限公司 | 一种连续自动真空镀膜设备 |
CN104109847A (zh) * | 2013-04-16 | 2014-10-22 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种反应腔室及等离子体加工设备 |
CN104498889A (zh) * | 2014-12-18 | 2015-04-08 | 光驰科技(上海)有限公司 | 自动化连续式防污膜镀膜装置 |
CN204803227U (zh) * | 2015-06-23 | 2015-11-25 | 中建材(内江)玻璃高新技术有限公司 | 一种三段式玻璃镀膜工艺隔断室 |
CN106835068A (zh) * | 2017-03-27 | 2017-06-13 | 重庆墨希科技有限公司 | 卷式石墨烯连续生长设备 |
CN207828407U (zh) * | 2017-12-13 | 2018-09-07 | 北京创昱科技有限公司 | 一种真空镀膜用集成腔室 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3568632A (en) * | 1969-03-24 | 1971-03-09 | Gary F Cawthon | Lens coating apparatus |
JPS6112035A (ja) * | 1984-06-27 | 1986-01-20 | Nippon Telegr & Teleph Corp <Ntt> | 半導体製造装置 |
JPH0324274A (ja) * | 1989-06-21 | 1991-02-01 | Matsushita Electric Ind Co Ltd | 気相成長装置 |
JPH04100255U (zh) * | 1991-02-08 | 1992-08-31 | ||
JPH0878338A (ja) * | 1994-09-05 | 1996-03-22 | Fujitsu Ltd | 半導体の製造装置 |
US6814813B2 (en) * | 2002-04-24 | 2004-11-09 | Micron Technology, Inc. | Chemical vapor deposition apparatus |
US20060278164A1 (en) * | 2005-06-10 | 2006-12-14 | Petrach Philip M | Dual gate isolating maintenance slit valve chamber with pumping option |
JP4702801B2 (ja) * | 2006-07-26 | 2011-06-15 | 株式会社神戸製鋼所 | 連続成膜装置 |
JP2009109006A (ja) * | 2007-10-10 | 2009-05-21 | Tokyo Electron Ltd | ゲートバルブ及びそれを用いた基板処理装置 |
DE102009004493B3 (de) * | 2009-01-09 | 2010-06-10 | Sovello Ag | Vakuumbeschichtungsanlage und Verfahren zum Betrieb einer Vakuumbeschichtungsanlage |
US20110132755A1 (en) * | 2009-12-04 | 2011-06-09 | Kim Woosam | In-line system for manufacturing solar cell |
US9076831B2 (en) * | 2011-11-04 | 2015-07-07 | Lam Research Corporation | Substrate clamping system and method for operating the same |
CN104233213A (zh) * | 2013-06-20 | 2014-12-24 | 生阳新材料科技(宁波)有限公司 | 气体反应连续腔及气体反应方法 |
JP6550962B2 (ja) * | 2015-06-24 | 2019-07-31 | 株式会社デンソー | 炭化珪素半導体のエピタキシャル成長装置 |
US10954594B2 (en) * | 2015-09-30 | 2021-03-23 | Applied Materials, Inc. | High temperature vapor delivery system and method |
US20170178758A1 (en) * | 2015-12-18 | 2017-06-22 | Applied Materials, Inc. | Uniform wafer temperature achievement in unsymmetric chamber environment |
CN107858666A (zh) * | 2017-12-13 | 2018-03-30 | 北京创昱科技有限公司 | 一种真空镀膜用集成腔室 |
-
2017
- 2017-12-13 CN CN201711329989.0A patent/CN107858666A/zh active Pending
-
2018
- 2018-06-21 WO PCT/CN2018/092241 patent/WO2019114234A1/zh active Application Filing
- 2018-09-04 DE DE102018215023.0A patent/DE102018215023A1/de not_active Withdrawn
- 2018-09-05 KR KR1020180105948A patent/KR20190070840A/ko not_active Application Discontinuation
- 2018-09-05 US US16/122,177 patent/US20190177832A1/en not_active Abandoned
- 2018-09-06 JP JP2018167322A patent/JP2019104985A/ja not_active Ceased
Patent Citations (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4313284A1 (de) * | 1993-04-23 | 1994-10-27 | Leybold Ag | Spaltschleuse für das Ein- oder Ausbringen von Substraten von der einen in eine benachbarte Behandlungskammer |
JPH11293458A (ja) * | 1998-04-07 | 1999-10-26 | Murata Mfg Co Ltd | 成膜装置 |
KR20020073823A (ko) * | 2001-03-16 | 2002-09-28 | 삼성전자 주식회사 | 반도체 장치 제조에 이용되는 챔버 장비 |
CN1946872A (zh) * | 2004-04-27 | 2007-04-11 | 冯·阿德纳设备有限公司 | 蒸发装置及蒸发涂料的方法 |
KR20090030784A (ko) * | 2007-09-21 | 2009-03-25 | 호진석 | 반입/반출챔버, 이송챔버, 이를 포함하는 진공처리시스템및 진공처리용 피처리물의 이송방법 |
CN101781754A (zh) * | 2009-01-19 | 2010-07-21 | 深圳市鹏桑普太阳能股份有限公司 | 一种模块化太阳能选择性涂层连续镀膜设备 |
CN102080209A (zh) * | 2009-12-01 | 2011-06-01 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 真空镀膜设备 |
US20110180097A1 (en) * | 2010-01-27 | 2011-07-28 | Axcelis Technologies, Inc. | Thermal isolation assemblies for wafer transport apparatus and methods of use thereof |
CN102234762A (zh) * | 2010-04-23 | 2011-11-09 | 鸿富锦精密工业(深圳)有限公司 | 镀膜系统 |
TW201209219A (en) * | 2010-08-16 | 2012-03-01 | Hon Hai Prec Ind Co Ltd | Coating apparatus and coating method |
CN202297761U (zh) * | 2011-09-09 | 2012-07-04 | 东莞市汇成真空科技有限公司 | 一种离子镀膜机靶前活动遮挡板装置 |
US20140110619A1 (en) * | 2012-10-19 | 2014-04-24 | Varian Semiconductor Equipment Associates, Inc. | Valve |
CN104109847A (zh) * | 2013-04-16 | 2014-10-22 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种反应腔室及等离子体加工设备 |
CN203668506U (zh) * | 2013-11-26 | 2014-06-25 | 山东希格斯新能源有限责任公司 | 一种小角度真空门阀装置 |
CN104018134A (zh) * | 2014-03-21 | 2014-09-03 | 艾瑞森表面技术(苏州)有限公司 | 一种连续自动真空镀膜设备 |
CN104498889A (zh) * | 2014-12-18 | 2015-04-08 | 光驰科技(上海)有限公司 | 自动化连续式防污膜镀膜装置 |
CN204803227U (zh) * | 2015-06-23 | 2015-11-25 | 中建材(内江)玻璃高新技术有限公司 | 一种三段式玻璃镀膜工艺隔断室 |
CN106835068A (zh) * | 2017-03-27 | 2017-06-13 | 重庆墨希科技有限公司 | 卷式石墨烯连续生长设备 |
CN207828407U (zh) * | 2017-12-13 | 2018-09-07 | 北京创昱科技有限公司 | 一种真空镀膜用集成腔室 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019114234A1 (zh) * | 2017-12-13 | 2019-06-20 | 北京创昱科技有限公司 | 一种真空镀膜用集成腔室 |
CN110643969A (zh) * | 2018-06-27 | 2020-01-03 | 北京铂阳顶荣光伏科技有限公司 | 一种真空蒸镀设备 |
CN109737740A (zh) * | 2018-12-26 | 2019-05-10 | 广东科达洁能股份有限公司 | 一种防进窑扬粉的过渡箱体 |
CN115155943A (zh) * | 2022-06-27 | 2022-10-11 | 无锡帕尔弗工业设备科技有限公司 | 一种镀膜设备 |
Also Published As
Publication number | Publication date |
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JP2019104985A (ja) | 2019-06-27 |
KR20190070840A (ko) | 2019-06-21 |
US20190177832A1 (en) | 2019-06-13 |
WO2019114234A1 (zh) | 2019-06-20 |
DE102018215023A1 (de) | 2019-06-13 |
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