WO2019109460A1 - 用于剥离工艺的剥离液机台及其工作方法 - Google Patents

用于剥离工艺的剥离液机台及其工作方法 Download PDF

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Publication number
WO2019109460A1
WO2019109460A1 PCT/CN2018/072139 CN2018072139W WO2019109460A1 WO 2019109460 A1 WO2019109460 A1 WO 2019109460A1 CN 2018072139 W CN2018072139 W CN 2018072139W WO 2019109460 A1 WO2019109460 A1 WO 2019109460A1
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Prior art keywords
stripping
filter
peeling
liquid
filtering
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PCT/CN2018/072139
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English (en)
French (fr)
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欧甜
苏长义
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深圳市华星光电半导体显示技术有限公司
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Priority to US15/743,956 priority Critical patent/US20200176276A1/en
Publication of WO2019109460A1 publication Critical patent/WO2019109460A1/zh

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D36/00—Filter circuits or combinations of filters with other separating devices
    • B01D36/02—Combinations of filters of different kinds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B04—CENTRIFUGAL APPARATUS OR MACHINES FOR CARRYING-OUT PHYSICAL OR CHEMICAL PROCESSES
    • B04B—CENTRIFUGES
    • B04B7/00—Elements of centrifuges
    • B04B7/08—Rotary bowls
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67173—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers in-line arrangement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor

Definitions

  • the invention relates to the technical field of semiconductor processes, in particular to a stripping machine table for a stripping process and a working method thereof.
  • photolithography is one of the indispensable steps in the fabrication process; as is well known in the art, the photolithography process includes the following steps: coating the photoresist over the substrate, using light The cover exposes the photoresist on the substrate to define a circuit pattern corresponding to the electronic product, so that the subsequent etching process can be performed on the substrate under the photoresist to form a desired circuit pattern; of course, an electron
  • the above steps must be repeated several times. Taking the TFT LCD array substrate as an example, it is necessary to perform photolithography through a plurality of masks to form a laminated structure.
  • the lift-off process is commonly used for reticle reduction in TFT (thin film transistor) processes.
  • the Lift-off process first forms photoresist and patterns, then forms a film on the photoresist, removes the photoresist, and deposits.
  • the film layer on the photoresist is also peeled off, thereby completing the patterning of the film layer, and the two processes of photolithography can be combined to achieve the purpose of reducing the mask.
  • the film material may be a metal, ITO (Indium Tin Oxide) or the like for preparing a film layer of the TFT
  • the film scrap is taken into the stripper while stripping the photoresist.
  • a large amount of film debris will cause the filter in the stripping machine to become clogged, rendering the machine unusable.
  • FIG. 1 it is a schematic diagram of a module of a conventional stripping machine, which mainly includes a chamber 1 arranged in n stages, that is, a chamber _1 ⁇ a chamber _ n, and each chamber 1 has a corresponding Tank 2, namely storage box_1 to storage box_n and filter 3, arrows in chamber 1, storage box 2 and filter 3 indicate the flow direction of the stripping liquid; each chamber 1 is designed to be suitable
  • the stripping process is performed to supply the stripping liquid to the glass substrate in the process, and the specific structure will not be described herein.
  • the glass substrate in the peeling process is supplied with a peeling liquid from each of the chambers 1 to the glass substrate stepwise from the chamber_1 in the glass substrate transport direction to perform a peeling process.
  • the stripping liquid enters the corresponding storage box_1 from the chamber_1, passes through the corresponding first filter 3, enters the chamber 2 of the second stage, and then enters the third stage after passing through the second filter 3.
  • Another object of the present invention is to provide a working method of a stripping machine for a stripping process that solves the problem of filter clogging in a stripping process.
  • the present invention provides a stripping machine for a stripping process, comprising: a plurality of chambers arranged in multiple stages, a plurality of storage boxes correspondingly connected to the plurality of chambers, and The plurality of storage boxes are correspondingly connected to the plurality of filters, and the filters are further connected to the next-stage chamber, wherein the storage box is provided with a centrifugal filtering device, wherein:
  • the plurality of chambers are configured to provide a stripping liquid to the glass substrate step by step according to a conveying direction of the glass substrate in the stripping process;
  • the storage tank is configured to collect and store a stripping liquid from the chamber that undergoes a stripping process
  • the filter is for filtering the stripping liquid from the storage tank and feeding it to the next stage chamber;
  • the centrifugal filter device is for separating and filtering the film debris in the stripping liquid in the storage tank from the stripping liquid.
  • the centrifugal filter device is disposed at the center of the inside of the storage box.
  • the centrifugal filter device is a filter type drum.
  • the filter drum has a hole in a circumferential wall thereof.
  • the inner wall of the circumferential wall of the filter drum is provided with a filter medium for filtering film debris.
  • the filter medium is a sieve or a filter cloth.
  • the film scrap is generated in a TFT process.
  • the invention also provides a working method of a stripping machine for a stripping process, comprising:
  • Step 100 sequentially arranging the multi-stage chambers, and providing the stripping liquid to the glass substrate step by step according to the conveying direction of the glass substrate in the stripping process;
  • Step 200 collecting and storing the stripping liquid from the current stage chamber to the stripping process in a corresponding storage box of the current stage chamber;
  • Step 300 separating and filtering the film debris in the stripping liquid in the storage tank of the current stage chamber by using a corresponding centrifugal filtering device;
  • Step 400 filtering the stripping liquid from the storage tank of the current stage chamber using the corresponding filter of the current stage chamber and delivering it to the next stage chamber.
  • the centrifugal filter device is a filter type drum.
  • the inner wall of the circumferential wall of the filter drum is provided with a filter medium for filtering film debris.
  • the present invention also provides a stripping machine for a stripping process, comprising: a plurality of chambers arranged in multiple stages, a plurality of storage boxes correspondingly connected to the plurality of chambers, and the plurality of storage boxes Corresponding to a plurality of filters connected, the filter is also connected to a lower-stage chamber, wherein the storage box is provided with a centrifugal filtering device, wherein:
  • the plurality of chambers are configured to provide a stripping liquid to the glass substrate step by step according to a conveying direction of the glass substrate in the stripping process;
  • the storage tank is configured to collect and store a stripping liquid from the chamber that undergoes a stripping process
  • the filter is for filtering the stripping liquid from the storage tank and feeding it to the next stage chamber;
  • the centrifugal filter device is used for separating and filtering the film debris in the stripping liquid in the storage box;
  • centrifugal filter device is disposed at the center of the interior of the storage box
  • centrifugal filter device is a filter type drum
  • the filter type drum has a hole in a circumferential wall thereof;
  • the inner wall of the circumferential wall of the filter drum is provided with a filter medium for filtering film debris.
  • the stripping machine and the working method thereof for the stripping process design an improved stripping machine and working method suitable for the stripping process, and solve the problem of plugging of the traditional peeling machine filter of the stripping process. .
  • Figure 1 is a schematic view of a module of a conventional stripping machine
  • FIG. 2 is a schematic view showing a module of a stripping liquid machine for a stripping process according to a preferred embodiment of the present invention
  • FIG. 3 is a flow chart of a preferred embodiment of a working method of a stripping machine for a stripping process of the present invention.
  • the stripping machine for the stripping process of the present invention mainly comprises: a plurality of sequentially arranged chambers 10, that is, chambers_1 to___ are sequentially arranged in order, and the chamber 10 is used for the glass substrate in the stripping process.
  • the conveying direction provides the stripping liquid to the glass substrate step by step; the plurality of storage boxes 20 respectively connected to the plurality of chambers 10, and the chambers 10 of the respective stages are respectively connected to the corresponding storage boxes 20 through the pipes, that is, the storage box _1 ⁇ storage box _n, storage box 20 is used for collecting and storing the stripping liquid from the current stage chamber 10 undergoing the stripping process; a plurality of filters 30 respectively connected to the plurality of storage boxes 20, the chambers 10 of the respective stages
  • the storage tank 20 may be connected to a corresponding filter 30 through a pipe, the filter 30 is used to filter the stripping liquid from the storage tank 20 of the current stage chamber 10, and the filter 30 may also pass through the duct and the lower stage chamber 10 Connecting, so that the filter 30 can transport the filtered stripping liquid to the lower stage chamber 10; the storage tanks 20 of the chambers 10 of the respective stages are respectively provided with corresponding centrifugal filtering devices 40, and the centrifugal filtering device 40 is used for the storage box Film
  • Each of the chambers 10 is designed to be subjected to a stripping process for supplying the stripping liquid to the glass substrate in the process.
  • the specific structure can be referred to the prior art and will not be described herein.
  • the chambers 10 of the respective stages are respectively connected by pipes in the corresponding storage tanks 20, and the stripping liquid after undergoing the stripping process in the chamber 10 can be piped to the storage tank 20, and collected and stored by the storage box 20.
  • the storage tanks 20 of the chambers 10 of the respective stages are respectively connected to the corresponding filters 30 through pipes, and the stripping liquid treated by the storage tank 20 is filtered by the corresponding filter 30 before being piped to the next-stage chamber 10.
  • the chamber 10 and the filter 30 can adopt the same design as the prior art; compared with the prior art, the present invention is provided with respective centrifugal filtering devices 40 through the storage boxes 20 of the chambers 10 of the respective stages.
  • the stripping liquid is filtered by the centrifugal pressure generated by the stripping liquid in the storage tank 20 by the centrifugal filter device 40 to solve the clogging problem of the stripping process conventional stripping machine table filter.
  • the glass substrate in the peeling process is supplied with a peeling liquid from each of the chambers 10 to the glass substrate stepwise from the chamber_1 in the glass substrate transport direction to perform a peeling process.
  • the stripping liquid enters the corresponding storage tank_1 from the chamber_1, is filtered by the corresponding centrifugal filtering device 40 in the storage box_1, and is filtered by the corresponding first filter 30 to enter the chamber of the second stage. 2. Filtered through the corresponding centrifugal filter device 40 in the storage box_2, and then passed through the second filter 30 to enter the chamber _3 of the third stage.
  • the installation position of the centrifugal filter device 40 can be selectively disposed in the center of the inside of the storage box 20, and is immersed in the stripping liquid.
  • the stripping liquid flowing out of the chamber 1 contains a large area of film debris 50 and enters the centrifugal filter device 40 of the storage tank_1.
  • the centrifugal filtration device 40 can be selected from various existing centrifugal filtration devices, or can be designed as needed.
  • the centrifugal filtration device 40 is a filtration type rotating drum.
  • the peripheral wall of the centrifugal filter device 40 is designed as a circumferential wall 41 having a hole in the circumferential wall 41, and the inner wall of the circumferential wall 41 is lined for filtering the film.
  • the filter medium 42 of the chip 50 when the centrifugal filter device 40 rotates, the centrifugal pressure generated in the centrifugal force field acts on the filter medium (filter or filter cloth) 42, and the stripper passes through the filter medium 42 to become a clean stripper filtrate. And the film crumb 50 is trapped in the rotating drum to form a filter residue, thereby achieving separation of the stripping liquid from the film scrap 50.
  • each storage tank 20 is loaded with a centrifugal filter device 40 to periodically clean the film debris 50 in the drum to ensure that the stripping liquid in each chamber 10 is clean and the filter 30 is not clogged.
  • the invention adopts a centrifugal filter device to separate the film debris in the stripping liquid from the stripping liquid and filter it off, so that the stripping liquid containing no film scraps is kept clean, and then re-enters the chamber for recycling, thereby solving the Lift-off process. Blockage problem with the stripper machine filter.
  • the present invention further provides a working method of a stripping machine for a stripping process, which can be applied to the stripping machine for stripping process of the present invention, which mainly comprises:
  • Step 100 sequentially arranging the multi-stage chambers, and providing the stripping liquid to the glass substrate step by step according to the conveying direction of the glass substrate in the stripping process;
  • Step 200 collecting and storing the stripping liquid from the current stage chamber to the stripping process in a corresponding storage box of the current stage chamber;
  • Step 300 separating and filtering the film debris in the stripping liquid in the storage tank of the current stage chamber by using a corresponding centrifugal filtering device;
  • Step 400 filtering the stripping liquid from the storage tank of the current stage chamber using the corresponding filter of the current stage chamber and delivering it to the next stage chamber.
  • the stripping machine and the working method thereof for the stripping process design an improved stripping machine and working method suitable for the stripping process, and solve the problem of plugging of the traditional peeling machine filter of the stripping process. .

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Abstract

本发明涉及一种用于剥离工艺的剥离液机台及其工作方法。该用于剥离工艺的剥离液机台包括：多级顺序排列的多个腔室、与所述多个腔室对应连接的多个存储箱、与所述多个存储箱对应连接的多个过滤器，所述过滤器还与下一级腔室连接，所述存储箱内设有离心过滤装置。本发明还提供了相应的工作方法。本发明用于剥离工艺的剥离液机台及其工作方法设计了一种适用于剥离工艺的改进的剥离液机台及工作方法，解决剥离制程传统剥离液机台过滤器的堵塞问题。

Description

用于剥离工艺的剥离液机台及其工作方法 技术领域
本发明涉及半导体工艺技术领域，尤其涉及一种用于剥离工艺的剥离液机台及其工作方法。
背景技术
在半导体工艺的领域之中，光刻工艺已经是制作过程中不可或缺的步骤之一；如业界所公知的，光刻过程包括下列的几个步骤：在基板上方涂布光阻，利用光罩对基板上的光阻进行曝光以定义电子产品对应的电路图案(circuit pattern)，如此才能够对光阻下的基板进行接下来的蚀刻过程，以形成所需的电路图案；当然，一个电子产品的完成，必须重复执行数次上述的步骤，以TFT LCD阵列基板作为例子来说，就需要通过多道光罩来进行光刻以形成层叠结构。当前常用的TFT LCD阵列设计中，就有五道光罩必须进行光刻，来分别完成栅极层(gate electrode，GE)，半导体层(semiconductor，SE)，源极/漏极层(source drain，SD)，接触孔(contact hole，CH)，像素电极层(pixel electrode，PE)五个不同层的电路图案。
剥离(Lift-off)工艺通常用于TFT(薄膜晶体管)制程中的光罩缩减，Lift-off制程先形成光阻并图案化，再在光阻上成膜，移除光阻的同时，沉积在光阻上的膜层也被剥离，从而完成膜层的图形化，通过该制程可以实现两次光刻合并为一次以达到光罩缩减的目的。
然而，由于光阻上沉积了薄膜(该薄膜材料可以为金属，ITO(氧化铟锡)等用于制备TFT的膜层)，在剥离光阻的同时薄膜碎屑被带入剥离液(Stripper)中，大量的薄膜碎屑将会导致剥离液机台中的过滤器(filter)堵塞，从而导致机台无法使用。
参见图1，其为现有剥离液机台的模块示意图，主要包括n级顺序排列的腔室(chamber)1，即腔室_1～腔室_n，各级腔室1分别设有相应的存储箱(tank)2，即存储箱_1～存储箱_n以及过滤器3，腔室1、存储箱2和过滤器3中的箭头表示剥离液流动方向；各腔室1设计为适合进行剥离制程，用于向制程中的玻璃基板供给剥离液，具体结构在此不再赘述。
处于剥离制程中的玻璃基板，按照玻璃基板传送方向从腔室_1开始逐级由各腔室1向玻璃基板供给剥离液以进行剥离制程。剥离液从腔室_1进入相应的存储箱_1，再经过相应的第一个过滤器3过滤后进入第二级的腔 室_2，再经过第二个过滤器3后进入第三级的腔室_3……。
现有的剥离液机台在进行剥离工艺时，因剥离液中含有大量大面积薄膜碎屑4而容易导致第一、二级腔室1的过滤器3堵塞严重，使得机台无法使用。
发明内容
因此，本发明的目的在于提供一种用于剥离工艺的剥离液机台，解决剥离制程中过滤器堵塞的问题。
本发明的另一目的在于提供一种用于剥离工艺的剥离液机台的工作方法，解决剥离制程中过滤器堵塞的问题。
为实现上述目的，本发明提供了一种用于剥离工艺的剥离液机台，包括：多级顺序排列的多个腔室、与所述多个腔室对应连接的多个存储箱、与所述多个存储箱对应连接的多个过滤器，所述过滤器还与下一级腔室连接，所述存储箱内设有离心过滤装置，其中：
所述多个腔室用于按照处于剥离制程的玻璃基板的传送方向逐级向玻璃基板提供剥离液；
所述存储箱用于收集和存储来自腔室的经历剥离制程的剥离液；
所述过滤器用于过滤来自存储箱的剥离液并且输送给下一级腔室；
所述离心过滤装置用于将存储箱内剥离液中的薄膜碎屑与剥离液分离并过滤掉。
其中，所述离心过滤装置设置于存储箱内部的中央。
其中，所述离心过滤装置为过滤型转鼓。
其中，所述过滤型转鼓的圆周壁上有孔。
其中，所述过滤型转鼓的圆周壁的内壁设有过滤介质，用于过滤薄膜碎屑。
其中，所述过滤介质为滤网或滤布。
其中，所述薄膜碎屑产生于TFT制程中。
本发明还提供了一种用于剥离工艺的剥离液机台的工作方法，包括：
步骤100、将多级腔室顺序排列，按照处于剥离制程的玻璃基板的传送方向逐级向玻璃基板提供剥离液；
步骤200、将来自于当前级腔室经历剥离制程的剥离液收集和存储于当前级腔室相应的存储箱中；
步骤300、使用相应的离心过滤装置将当前级腔室的存储箱内剥离液中的薄膜碎屑与剥离液分离并过滤掉；
步骤400、使用当前级腔室相应的过滤器过滤来自当前级腔室的存储箱的剥离液并且输送给下一级腔室。
其中，所述离心过滤装置为过滤型转鼓。
其中，所述过滤型转鼓的圆周壁的内壁设有过滤介质，用于过滤薄膜碎屑。
本发明还提供一种用于剥离工艺的剥离液机台，包括：多级顺序排列的多个腔室、与所述多个腔室对应连接的多个存储箱、与所述多个存储箱对应连接的多个过滤器，所述过滤器还与下一级腔室连接，所述存储箱内设有离心过滤装置，其中：
所述多个腔室用于按照处于剥离制程的玻璃基板的传送方向逐级向玻璃基板提供剥离液；
所述存储箱用于收集和存储来自腔室的经历剥离制程的剥离液；
所述过滤器用于过滤来自存储箱的剥离液并且输送给下一级腔室；
所述离心过滤装置用于将存储箱内剥离液中的薄膜碎屑与剥离液分离并过滤掉；
其中，所述离心过滤装置设置于存储箱内部的中央；
其中，所述离心过滤装置为过滤型转鼓；
其中，所述过滤型转鼓的圆周壁上有孔；
其中，所述过滤型转鼓的圆周壁的内壁设有过滤介质，用于过滤薄膜碎屑。
综上，本发明用于剥离工艺的剥离液机台及其工作方法设计了一种适用于剥离工艺的改进的剥离液机台及工作方法，解决剥离制程传统剥离液机台过滤器的堵塞问题。
附图说明
下面结合附图，通过对本发明的具体实施方式详细描述，将使本发明的技术方案及其他有益效果显而易见。
附图中，
图1为现有剥离液机台的模块示意图；
图2为本发明用于剥离工艺的剥离液机台一较佳实施例的模块示意图；
图3为本发明用于剥离工艺的剥离液机台的工作方法一较佳实施例的流程图。
具体实施方式
参见图2所示，其为本发明用于剥离工艺的剥离液机台一较佳实施例的模块示意图。本发明用于剥离工艺的剥离液机台主要包括：多级顺序排列的腔室10，即腔室_1～腔室_n逐级顺序排列，腔室10用于按照处于剥离制程的玻璃基板的传送方向逐级向玻璃基板分别提供剥离液；与多个腔室10分别对应连接的多个存储箱20，各级腔室10分别通过管道与相应的存储箱20连接，即存储箱_1～存储箱_n，存储箱20用于收集和存储来自当前级腔室10的经历剥离制程的剥离液；与多个存储箱20分别对应连接的多个过滤器30，各级腔室10的存储箱20可以分别通过管道与相应的过滤器30连接，过滤器30用于过滤来自当前级腔室10的存储箱20的剥离液，并且过滤器30还可以通过管道与下一级腔室10连接，从而过滤器30可以将过滤后的剥离液输送给下一级腔室10；各级腔室10的存储箱20分别设有相应的离心过滤装置40，离心过滤装置40用于将存储箱20内剥离液中的薄膜碎屑50与剥离液分离并过滤掉。薄膜碎屑50可以产生自金属，ITO(氧化铟锡)等用于制备TFT的膜层，也就是说薄膜碎屑50产生于TFT制程中。
各腔室10设计为适合进行剥离制程，用于向制程中的玻璃基板供给剥离液，具体结构可参考现有设计在此不再赘述。各级腔室10分别于相应的存储箱20通过管道连接，腔室10中经历剥离制程后的剥离液可以经管道输送至存储箱20中，由存储箱20来收集和存储。各级腔室10的存储箱20分别与相应的过滤器30通过管道连接，经存储箱20处理后的剥离液再经相应的过滤器30过滤后才经管道输送至下一级腔室10。本发明中，腔室10及过滤器30可以采用与现有技术相同的设计；相较于现有技术，本发明通过在各级腔室10的存储箱20分别设有相应的离心过滤装置40，利用离心过滤装置40在存储箱20中的剥离液产生的离心压力来过滤剥离液，以解决剥离制程传统剥离液机台过滤器的堵塞问题。
处于剥离制程中的玻璃基板，按照玻璃基板传送方向从腔室_1开始逐级由各腔室10向玻璃基板供给剥离液以进行剥离制程。剥离液从腔室_1进入相应的存储箱_1，经存储箱_1内的相应的离心过滤装置40过滤，再经过相应的第一个过滤器30过滤后进入第二级的腔室_2，经存储箱_2内的相应的离心过滤装置40过滤，再经过第二个过滤器30后进入第三级的腔室_3……。
离心过滤装置40的安装位置可以选择设置于存储箱20内部的中央，浸泡于剥离液中。以腔室_1为例，腔室_1流出的剥离液中含有大面积薄膜碎屑50，进入存储箱_1的离心过滤装置40。离心过滤装置40可以从现有 各种离心过滤装置中选取，也可以根据需要自行设计，在此较佳实施例中离心过滤装置40为过滤型转鼓。此较佳实施例在具体应用过滤型转鼓时，离心过滤装置40即过滤型转鼓的周壁设计为圆周壁41，圆周壁41上有孔，在圆周壁41的内壁衬以用来过滤薄膜碎屑50的过滤介质42，离心过滤装置40旋转时，在离心力场下产生的离心压力作用在过滤介质(滤网或滤布)42上，使剥离液通过过滤介质42成为干净的剥离液滤液；而薄膜碎屑50被截留在转鼓内，形成滤渣，从而实现剥离液与薄膜碎屑50的分离。因此，从存储箱_1中流出的剥离液不再含有薄膜碎屑50，也就避免了机台中过滤器30的堵塞。每个存储箱20均装载离心过滤装置40，定期清理转鼓中的薄膜碎屑50,以保证各腔室10中剥离液的洁净与过滤器30不发生堵塞。
本发明采用离心过滤装置将剥离液中的薄膜碎屑与剥离液分离并过滤掉，使不含有薄膜碎屑的剥离液保持干净，从而重新进入腔室中循环使用，解决了Lift-off工艺中剥离液机台过滤器的堵塞问题。
参见图3，本发明还相应提供了用于剥离工艺的剥离液机台的工作方法，可以应用于本发明的用于剥离工艺的剥离液机台，主要包括：
步骤100、将多级腔室顺序排列，按照处于剥离制程的玻璃基板的传送方向逐级向玻璃基板提供剥离液；
步骤200、将来自于当前级腔室经历剥离制程的剥离液收集和存储于当前级腔室相应的存储箱中；
步骤300、使用相应的离心过滤装置将当前级腔室的存储箱内剥离液中的薄膜碎屑与剥离液分离并过滤掉；
步骤400、使用当前级腔室相应的过滤器过滤来自当前级腔室的存储箱的剥离液并且输送给下一级腔室。
综上，本发明用于剥离工艺的剥离液机台及其工作方法设计了一种适用于剥离工艺的改进的剥离液机台及工作方法，解决剥离制程传统剥离液机台过滤器的堵塞问题。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明后附的权利要求的保护范围。

Claims (13)

  1. 一种用于剥离工艺的剥离液机台，包括：多级顺序排列的多个腔室、与所述多个腔室对应连接的多个存储箱、与所述多个存储箱对应连接的多个过滤器，所述过滤器还与下一级腔室连接，所述存储箱内设有离心过滤装置，其中：
    所述多个腔室用于按照处于剥离制程的玻璃基板的传送方向逐级向玻璃基板提供剥离液；
    所述存储箱用于收集和存储来自腔室的经历剥离制程的剥离液；
    所述过滤器用于过滤来自存储箱的剥离液并且输送给下一级腔室；
    所述离心过滤装置用于将存储箱内剥离液中的薄膜碎屑与剥离液分离并过滤掉。
  2. 如权利要求1所述的用于剥离工艺的剥离液机台，其中，所述离心过滤装置设置于存储箱内部的中央。
  3. 如权利要求1所述的用于剥离工艺的剥离液机台，其中，所述离心过滤装置为过滤型转鼓。
  4. 如权利要求3所述的用于剥离工艺的剥离液机台，其中，所述过滤型转鼓的圆周壁上有孔。
  5. 如权利要求3所述的用于剥离工艺的剥离液机台，其中，所述过滤型转鼓的圆周壁的内壁设有过滤介质，用于过滤薄膜碎屑。
  6. 如权利要求5所述的用于剥离工艺的剥离液机台，其中，所述过滤介质为滤网或滤布。
  7. 如权利要求1所述的用于剥离工艺的剥离液机台，其中，所述薄膜碎屑产生于TFT制程中。
  8. 一种用于剥离工艺的剥离液机台的工作方法，包括：
    步骤100、将多级腔室顺序排列，按照处于剥离制程的玻璃基板的传送方向逐级向玻璃基板提供剥离液；
    步骤200、将来自于当前级腔室经历剥离制程的剥离液收集和存储于当前级腔室相应的存储箱中；
    步骤300、使用相应的离心过滤装置将当前级腔室的存储箱内剥离液中的薄膜碎屑与剥离液分离并过滤掉；
    步骤400、使用当前级腔室相应的过滤器过滤来自当前级腔室的存储箱的剥离液并且输送给下一级腔室。
  9. 如权利要求8所述的用于剥离工艺的剥离液机台的工作方法，其中，所述离心过滤装置为过滤型转鼓。
  10. 如权利要求9所述的用于剥离工艺的剥离液机台的工作方法，其中，所述过滤型转鼓的圆周壁的内壁设有过滤介质，用于过滤薄膜碎屑。
  11. 一种用于剥离工艺的剥离液机台，包括：多级顺序排列的多个腔室、与所述多个腔室对应连接的多个存储箱、与所述多个存储箱对应连接的多个过滤器，所述过滤器还与下一级腔室连接，所述存储箱内设有离心过滤装置，其中：
    所述多个腔室用于按照处于剥离制程的玻璃基板的传送方向逐级向玻璃基板提供剥离液；
    所述存储箱用于收集和存储来自腔室的经历剥离制程的剥离液；
    所述过滤器用于过滤来自存储箱的剥离液并且输送给下一级腔室；
    所述离心过滤装置用于将存储箱内剥离液中的薄膜碎屑与剥离液分离并过滤掉；
    其中，所述离心过滤装置设置于存储箱内部的中央；
    其中，所述离心过滤装置为过滤型转鼓；
    其中，所述过滤型转鼓的圆周壁上有孔；
    其中，所述过滤型转鼓的圆周壁的内壁设有过滤介质，用于过滤薄膜碎屑。
  12. 如权利要求11所述的用于剥离工艺的剥离液机台，其中，所述过滤介质为滤网或滤布。
  13. 如权利要求11所述的用于剥离工艺的剥离液机台，其中，所述薄膜碎屑产生于TFT制程中。
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