WO2021098002A1 - 剥离液机台及其工作方法 - Google Patents

剥离液机台及其工作方法 Download PDF

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Publication number
WO2021098002A1
WO2021098002A1 PCT/CN2019/127774 CN2019127774W WO2021098002A1 WO 2021098002 A1 WO2021098002 A1 WO 2021098002A1 CN 2019127774 W CN2019127774 W CN 2019127774W WO 2021098002 A1 WO2021098002 A1 WO 2021098002A1
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Prior art keywords
sub
filter
pipe
pipes
stage chamber
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PCT/CN2019/127774
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English (en)
French (fr)
Inventor
欧甜
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Tcl华星光电技术有限公司
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Priority to US16/754,760 priority Critical patent/US11747734B2/en
Publication of WO2021098002A1 publication Critical patent/WO2021098002A1/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/50—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/60—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor integrally combined with devices for controlling the filtration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/88—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor having feed or discharge devices
    • B01D29/90—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor having feed or discharge devices for feeding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

Definitions

  • This application relates to the technical field of semiconductor technology, in particular to a stripping liquid machine and its working method.
  • Lift-off process is usually used for thin film transistors (Thin Film The photomask in the Transistor process is reduced. Lift-off first forms and pattern the photoresist, and then forms a film on the photoresist. When the photoresist is removed, the film deposited on the photoresist is also peeled off to complete the film.
  • the patterning of the layer can be achieved by combining two photolithography into one to achieve the purpose of reducing the photomask.
  • the film material can be metal, ITO (Indium Tin Oxide), etc. used to prepare the TFT film
  • the film debris is brought into the stripping liquid while the photoresist is peeled off.
  • a large amount of film debris will cause the filter in the stripper machine to be blocked, which will cause the machine to be unusable, and it is necessary to stop all the work of the stripper machine, and restart after the filter is cleaned. , Reduce production efficiency.
  • the embodiment of the present application provides a stripping liquid machine platform and a working method thereof, which can improve production efficiency.
  • an embodiment of the present application provides a stripping liquid machine, including:
  • the multi-level chambers arranged in sequence, and each level of the chamber is correspondingly connected to a storage box;
  • a filter one end of the filter is connected to the storage box corresponding to the current stage chamber through a first pipe, and the other end of the filter is connected to the next stage chamber through a second pipe;
  • At least a valve switch is provided on the first pipe or the second pipe.
  • the filter includes a plurality of sub-filters arranged side by side
  • the first pipe includes a plurality of first sub-pipes, each of the first sub-pipes is in communication with a sub-filter, and The plurality of first sub-pipes are in communication with the storage tank corresponding to the current stage chamber.
  • the second pipeline includes a common sub-pipe and a plurality of second sub-pipes, each of the second sub-pipes is in communication with a sub-filter, and each of the second sub-pipes is connected to the common sub-pipe.
  • the sub-pipe is in communication, and the common sub-pipe is in communication with the next-stage chamber.
  • valve switch is provided on each of the first sub-pipes.
  • valve switch is provided on each of the second sub-pipes.
  • valve switch is provided on each of the first sub-pipes and each of the second sub-pipes.
  • the second pipeline includes a plurality of third sub-pipes, each of the third sub-pipes is in communication with a sub-filter, and each of the third sub-pipes is connected to the next-stage cavity The chamber is connected.
  • valve switch is provided on each of the third sub-pipes.
  • an embodiment of the present application also provides a working method of a stripping liquid machine, including:
  • the stripping liquid is mixed with film debris
  • closing the valve switch on the pipe connecting the blocked filter includes:
  • the valve switch on the pipeline connecting the blocked sub-filter is closed.
  • an embodiment of the present application also provides a stripping liquid machine, including:
  • the multi-level chambers arranged in sequence, and each level of the chamber is correspondingly connected to a storage box;
  • a filter one end of the filter is connected to the storage box corresponding to the current stage chamber through a first pipe, and the other end of the filter is connected to the next stage chamber through a second pipe;
  • a valve switch is provided on at least the first pipeline or the second pipeline, wherein the filter includes a plurality of sub-filters arranged side by side, the first pipeline includes a plurality of first sub-pipes, each The first sub-pipe is in communication with a sub-filter, and the plurality of first sub-pipes are in communication with the storage tank corresponding to the current stage chamber, and the second pipe includes a common sub-pipe and a plurality of second sub-pipes, Each of the second sub-pipes is in communication with a sub-filter, each of the second sub-pipes is in communication with the common sub-pipe, and the common sub-pipe is in communication with the next-stage chamber, or a second pipe It includes a plurality of third sub-pipes, each of the third sub-pipes is in communication with a sub-filter, and each of the third sub-pipes is in communication with the next-stage chamber.
  • An embodiment of the present application also provides a stripping liquid machine station, which includes: multiple chambers arranged in sequence, each of the chambers is correspondingly connected to a storage box; a filter, one end of the filter is set to pass through the first The pipeline is connected to the storage tank corresponding to the current stage chamber, and the other end of the filter is connected to the next stage chamber through a second pipeline; wherein, at least a valve is provided on the first pipeline or the second pipeline Switch switch.
  • the filter connected to each stage of the chamber through the valve switch control is independent of each other, so that when the filter is blocked, the clogged filter is removed by the valve switch without affecting the overall peeling process and improving production efficiency.
  • FIG. 1 is a schematic diagram of the first structure of a peeling liquid machine platform provided by an embodiment of the application.
  • FIG. 2 is a schematic diagram of a second structure of a stripping liquid machine provided by an embodiment of the application.
  • FIG. 3 is a schematic diagram of a third structure of a stripping liquid machine platform provided by an embodiment of the application.
  • FIG. 4 is a schematic diagram of a fourth structure of a stripping liquid machine platform provided by an embodiment of the application.
  • FIG. 5 is a schematic flowchart of a working method of a stripping liquid machine provided by an embodiment of the application.
  • the filter that filters the film debris generated during stripping of the photoresist is blocked, all the working units in the stripper machine are required. After the blocked filter is cleaned, the filter can be renewed. During the stripping process, the machine needs to be stopped frequently to replace the filter, which greatly reduces the production efficiency.
  • FIG. 1 is a schematic diagram of a first structure of a filtrate machine 100 provided by an embodiment of the application.
  • the embodiment of the present application provides a stripping liquid machine 100, including:
  • the multi-level chambers 10 are arranged in sequence, and each level of the chamber 10 is correspondingly connected to a storage box 20;
  • a filter 30, one end of the filter 30 is connected to the storage box 20 corresponding to the current stage chamber 101 through a first pipe 40, and the other end of the filter 30 is connected to the next stage chamber 102 through a second pipe 50 Connection;
  • At least the first pipe 40 or the second pipe 50 is provided with a valve switch 60.
  • FIG. 1 shows an example diagram in which the valve switch 60 is arranged on the first pipe 40.
  • the valve switch 60 closes the liquid flow between the storage box 20 and the filter 30 corresponding to the current-level chamber 101, so that the valve switch 60 can be closed After removing the blocked filter 30 for cleaning, the subsequent peeling process of the next-stage chamber 102 cannot be continued.
  • the chamber 10 is used to provide peeling liquid to the glass substrate step by step according to the conveying direction of the glass substrate in the peeling process; a plurality of storage boxes 20 are respectively connected to the plurality of chambers 10, and the chambers 10 of each level pass through
  • the pipe is connected to the corresponding storage tank 20, the storage tank 20 is used to collect and store the peeling liquid from the current stage chamber 101 undergoing the peeling process; the filter 30 is used to filter the peeling liquid from the storage tank 20 of the current stage chamber 101 And the filter 30 can also be connected to the next-stage chamber 102 through a pipe, so that the filter 30 can deliver the filtered stripping liquid to the next-stage chamber 102.
  • Each chamber 10 is designed to be suitable for performing the peeling process, and is used to supply the peeling liquid to the glass substrate in the process.
  • the specific structure can refer to the existing design and will not be repeated here.
  • the chambers 10 at various levels are connected to the corresponding storage tanks 20 by pipes.
  • the stripping liquid in the chambers 10 after undergoing the peeling process can be transported to the storage tank 20 through the pipes, and the storage tank 20 is collected and stored.
  • the storage tanks 20 of the chambers 10 of each level are connected to the corresponding filters 30 through pipes, and the stripping liquid processed by the storage tank 20 is filtered by the corresponding filters 30 before being transported to the next-level chamber 102 through the pipes.
  • the chamber 10 and the filter 30 can adopt the same design as the prior art.
  • the glass substrate in the peeling process starts from the current chamber 101 and gradually supplies the peeling liquid from each chamber 10 to the glass substrate according to the glass substrate conveying direction to perform the peeling process.
  • the stripping liquid enters the corresponding storage tank 20 from the current chamber 101, flows into the filter 30 after the level of the stripping liquid exceeds the preset height, and then passes through the filter 30 to transfer the filtered stripping liquid to the next-stage chamber 102 Inside.
  • the thin film scraps 70 are generally metal scraps or ITO scraps.
  • FIG. 2 is a schematic diagram of the second structure of the peeling liquid machine table 100 provided by an embodiment of the application.
  • the valve switch 60 is provided on the first pipe 40 and the second pipe 50.
  • the valve switches 60 on the first pipe 40 and the second pipe 50 on both sides of the filter 30 are closed to ensure that the stripping liquid in the storage tank 20 corresponding to the current stage chamber 101 will not flow out.
  • the stripping liquid in the next-stage chamber 102 will not flow out.
  • FIG. 3 is a schematic diagram of a third structure of the peeling liquid machine table 100 provided by an embodiment of the present application.
  • the filter 30 includes a plurality of sub-filters 301 arranged side by side
  • the first pipe 40 includes a plurality of first sub-pipes 401
  • each of the first sub-pipes 401 is in communication with a sub-filter 301
  • the The plurality of first sub-pipes 401 are in communication with the storage tank 20 corresponding to the current stage chamber 101.
  • the second pipe 50 includes a common sub-pipe 501 and a plurality of second sub-pipes 502, each of the second sub-pipes 502 is connected to a sub-filter 301, and each of the second sub-pipes 502 It communicates with the common sub-pipe 501, and the common sub-pipe 501 communicates with the next-stage chamber 102.
  • valve switch 60 is arranged on each first sub-pipe 301.
  • valve switch 60 is provided on each of the first sub-pipes 401 and each of the second sub-pipes 502.
  • valve switch 60 is provided on each second sub-pipe 502.
  • the setting position of the valve switch 60 can be set on any pipe connected to the filter 30, which will not be repeated here.
  • FIG. 4 is a schematic diagram of a fourth structure of the peeling liquid machine table 100 provided by an embodiment of the present application.
  • the second pipe 50 includes a plurality of third sub-pipes 503, each of the third sub-pipes 503 is connected to a sub-filter 301, and each of the third sub-pipes 503 is connected to the next-stage chamber 102 .
  • valve switch 60 is arranged on each third sub-pipe 503.
  • the stripping liquid machine platform includes: a multi-stage chamber arranged in sequence, and each stage of the chamber is correspondingly connected to a storage box; a filter, one end of the filter is arranged to pass through a first pipe and The storage box corresponding to the current stage chamber is connected, and the other end of the filter is connected to the next stage chamber through a second pipe; wherein, at least a valve switch is provided on the first pipe or the second pipe.
  • the filter connected to each stage of the chamber through the valve switch control is independent of each other, so that when the filter is blocked, the clogged filter is removed by the valve switch without affecting the overall peeling process and improving production efficiency.
  • FIG. 5 is a schematic flowchart of the working method of the peeling liquid machine provided by the embodiment of the application. The method includes:
  • Step 110 Arranging the multi-stage chambers in sequence, and supplying the peeling substrate with the peeling liquid step by step according to the conveying direction of the peeling substrate in the peeling process;
  • Step 120 Collect and store the stripping liquid from the current-stage chamber undergoing the stripping process in the corresponding storage box of the current-stage chamber, and the stripping liquid is mixed with film debris;
  • Step 130 Filter the stripping liquid from the current-stage chamber using a filter corresponding to the current-stage chamber and transfer the filtered stripping liquid to the next-stage chamber;
  • Step 140 If the filter is blocked by the film debris, close the valve switch on the pipeline connecting the blocked filter;
  • Step 150 Take out the blocked filter.
  • step 140 may also include:
  • the valve switch on the pipeline connecting the blocked sub-filter is closed.
  • the embodiment of the present application also provides a stripping liquid machine platform, including:
  • the multi-level chambers arranged in sequence, and each level of the chamber is correspondingly connected to a storage box;
  • a filter one end of the filter is connected to the storage box corresponding to the current stage chamber through a first pipe, and the other end of the filter is connected to the next stage chamber through a second pipe;
  • a valve switch is provided on at least the first pipeline or the second pipeline, wherein the filter includes a plurality of sub-filters arranged side by side, the first pipeline includes a plurality of first sub-pipes, each The first sub-pipe is in communication with a sub-filter, and the plurality of first sub-pipes are in communication with the storage tank corresponding to the current stage chamber, and the second pipe includes a common sub-pipe and a plurality of second sub-pipes, Each of the second sub-pipes is in communication with a sub-filter, each of the second sub-pipes is in communication with the common sub-pipe, and the common sub-pipe is in communication with the next-stage chamber, or a second pipe It includes a plurality of third sub-pipes, each of the third sub-pipes is in communication with a sub-filter, and each of the third sub-pipes is in communication with the next-stage chamber.

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Abstract

一种剥离液机台(100)及其工作方法，剥离液机台(100)包括：依次顺序排列的多级腔室(10)、每一级腔室(10)对应连接一存储箱(20)；过滤器(30)，过滤器(30)的一端设置通过第一管道(40)与当前级腔室(101)对应的存储箱(20)连接，过滤器(30)的另一端通过第二管道(50)与下一级腔室(102)连接；其中，至少在第一管道(40)或第二管道(50)上设置有阀门开关(60)。

Description

剥离液机台及其工作方法 技术领域
本申请涉及半导体工艺技术领域，具体涉及一种剥离液机台及其工作方法。
 背景技术
剥离（Lift-off）工艺通常用于薄膜晶体管（Thin Film Transistor）制程中的光罩缩减，Lift-off先形成光阻并图案化，再在光阻上成膜，移除光阻的同时，沉积在光阻上的膜层也被剥离，从而完成膜层的图形化，通过该制程可以实现两次光刻合并为一次以达到光罩缩减的目的。
现有技术中，由于光阻上沉积了薄膜(该薄膜材料可以为金属，ITO(氧化铟锡)等用于制备TFT的膜层)，在剥离光阻的同时薄膜碎屑被带入剥离液(Stripper)中，大量的薄膜碎屑将会导致剥离液机台中的过滤器(filter)堵塞，从而导致机台无法使用，并且需要停止所有剥离液机台的工作，待将filter清理后再次启动，降低了生产效率。
 技术问题
本申请实施例提供一种剥离液机台及其工作方法，可以提高生产效率。
 技术解决方案
第一方面，本申请实施例提供一种剥离液机台，包括：
依次顺序排列的多级腔室、每一级所述腔室对应连接一存储箱；
过滤器，所述过滤器的一端设置通过第一管道与当前级腔室对应的存储箱连接，所述过滤器的另一端通过第二管道与下一级腔室连接；其中，
至少在所述第一管道或所述第二管道上设置有阀门开关。
在一些实施例中，所述过滤器包括多个并列排布的子过滤器，所述第一管道包括多个第一子管道，每一所述第一子管道与一子过滤器连通，且所述多个第一子管道与当前级腔室对应的存储箱连通。
在一些实施例中，所述第二管道包括公共子管道及多个第二子管道，每一所述第二子管道与一子过滤器连通，每一所述第二子管道与所述公共子管道连通，所述公共子管道与所述下一级腔室连通。
在一些实施例中，所述阀门开关设置在每一所述第一子管道上。
在一些实施例中，所述阀门开关设置在每一所述第二子管道上。
在一些实施例中，所述阀门开关设置在每一所述第一子管道及每一所述第二子管道上。
在一些实施例中，所述第二管道包括多个第三子管道，每一所述第三子管道与一子过滤器连通，且每一所述第三子管道与所述下一级腔室连通。
在一些实施例中，所述阀门开关设置在每一所述第三子管道上。
第二方面，本申请实施例还提供一种剥离液机台的工作方法，包括：
将多级腔室顺序排列，按照处于剥离制程的剥离基板的传送方向逐级向剥离基板提供剥离液；
将来自于当前级腔室经历剥离制程的剥离液收集和存储于当前级腔室相应的存储箱中，所述剥离液中夹杂有薄膜碎屑；
使用当前级腔室相应的过滤器过滤来自当前级腔室的剥离液并将过滤后的剥离液传输至下一级腔室；
若所述过滤器被所述薄膜碎屑阻塞，则关闭连接被阻塞的所述过滤器的管道上的阀门开关；
取出被阻塞的所述过滤器。
在一些实施例中，所述若所述过滤器被所述薄膜碎屑阻塞，则关闭连接被阻塞的所述过滤器的管道上的阀门开关包括：
若所述过滤器包括多个并列排布的子过滤器，则关闭连接被阻塞的所述子过滤器的管道上的阀门开关。
第三方面，本申请实施例还提供一种剥离液机台，包括：
依次顺序排列的多级腔室、每一级所述腔室对应连接一存储箱；
过滤器，所述过滤器的一端设置通过第一管道与当前级腔室对应的存储箱连接，所述过滤器的另一端通过第二管道与下一级腔室连接；其中，
至少在所述第一管道或所述第二管道上设置有阀门开关，其中所述过滤器包括多个并列排布的子过滤器，所述第一管道包括多个第一子管道，每一所述第一子管道与一子过滤器连通，且所述多个第一子管道与当前级腔室对应的存储箱连通，所述第二管道包括公共子管道及多个第二子管道，每一所述第二子管道与一子过滤器连通，每一所述第二子管道与所述公共子管道连通，所述公共子管道与所述下一级腔室连通，或第二管道包括多个第三子管道，每一所述第三子管道与一子过滤器连通，且每一所述第三子管道与所述下一级腔室连通。
 有益效果
本申请实施例还提供一种剥离液机台，包括：依次顺序排列的多级腔室、每一级所述腔室对应连接一存储箱；过滤器，所述过滤器的一端设置通过第一管道与当前级腔室对应的存储箱连接，所述过滤器的另一端通过第二管道与下一级腔室连接；其中，至少在所述第一管道或所述第二管道上设置有阀门开关开关。通过阀门开关控制连接每一级腔室的过滤器相互独立，从而在过滤器被阻塞时通过阀门开关将被堵塞的过滤器取下并不影响整体的剥离进程，提高生产效率。
 附图说明
为了更清楚地说明本申请实施例中的技术方案，下面将对实施例描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本申请的一些实施例，对于本领域技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本申请实施例提供的剥离液机台的第一种结构示意图。
图2为本申请实施例提供的剥离液机台的第二种结构示意图。
图3为本申请实施例提供的剥离液机台的第三种结构示意图。
图4为本申请实施例提供的剥离液机台的第四种结构示意图。
图5为本申请实施例提供的剥离液机台的工作方法的流程示意图。
 本发明的实施方式
目前剥离液机台在工作时，如果过滤剥离光阻时产生的薄膜碎屑的过滤器被阻塞，则需要剥离液机台内的所有工作单元，待被阻塞的过滤器被清理后，才能重新进行剥离制程，使得机台需频繁停线以更换过滤器，极大的降低了生产效率。
请参阅图1，图1为本申请实施例提供的过滤液机台100的第一种结构示意图。
本申请实施例提供一种剥离液机台100，包括：
依次顺序排列的多级腔室10、每一级所述腔室10对应连接一存储箱20；
过滤器30，所述过滤器30的一端设置通过第一管道40与当前级腔室101对应的存储箱20连接，所述过滤器30的另一端通过第二管道50与下一级腔室102连接；其中，
至少在第一管道40或所述第二管道50上设置有阀门开关60。
具体的，图1所示出的是阀门开关60设置在第一管道40上的示例图。当当前级别腔室101对应的过滤器30被薄膜碎屑阻塞后，通过阀门开关60关闭当前级别腔室101对应的存储箱20与过滤器30之间的液体流通，从而可以在阀门开关60关闭后取下被阻塞的过滤器30进行清理并不会导致之后的下一级腔室102的剥离进程无法继续。
其中，腔室10用于按照处于剥离制程的玻璃基板的传送方向逐级向玻璃基板分别提供剥离液；与多个腔室10分别对应连接的多个存储箱20，各级腔室10分别通过管道与相应的存储箱20连接，存储箱20用于收集和存储来自当前级腔室101的经历剥离制程的剥离液；过滤器30用于过滤来自当前级腔室101的存储箱20的剥离液，并且过滤器30还可以通过管道与下一级腔室102连接，从而过滤器30可以将过滤后的剥离液输送给下一级腔室102。
各腔室10设计为适合进行剥离制程，用于向制程中的玻璃基板供给剥离液，具体结构可参考现有设计在此不再赘述。各级腔室10分别于相应的存储箱20通过管道连接，腔室10中经历剥离制程后的剥离液可以经管道输送至存储箱20中，由存储箱20来收集和存储。各级腔室10的存储箱20分别与相应的过滤器30通过管道连接，经存储箱20处理后的剥离液再经相应的过滤器30过滤后才经管道输送至下一级腔室102。本申请中，腔室10及过滤器30可以采用与现有技术相同的设计。
处于剥离制程中的玻璃基板，按照玻璃基板传送方向从当前腔室101开始逐级由各腔室10向玻璃基板供给剥离液以进行剥离制程。剥离液从当前腔室101进入相应的存储箱20，在剥离液的水平面超过预设高度后流入过滤器30，再经过过滤器30的过滤将过滤后的剥离液传送至下一级腔室102内。其中，薄膜碎屑70一般为金属碎屑或ITO碎屑。
其中，如图2所示，图2为本申请实施例提供的剥离液机台100的第二种结构示意图。阀门开关60设置在第一管道40及第二管道50上。在过滤器30被阻塞时，关闭位于过滤器30两侧的第一管道40及第二管道50上的阀门开关60，可以保证当前级腔室101对应的存储箱20内剥离液不会流出，同时下一级腔室102内的剥离液也不会流出。
在一些实施例中，请参阅图3，图3为本申请实施例提供的剥离液机台100的第三种结构示意图。过滤器30包括多个并列排布的子过滤器301，所述第一管道40包括多个第一子管道401，每一所述第一子管道401与一子过滤器301连通，且所述多个第一子管道401与当前级腔室101对应的存储箱20连通。
在一些实施例中，第二管道50包括公共子管道501及多个第二子管道502，每一所述第二子管道502与一子过滤器301连通，每一所述第二子管道502与所述公共子管道501连通，所述公共子管道501与所述下一级腔室102连通。
其中，阀门开关60设置在每一第一子管道301上。
在一些实施例中，阀门开关60设置在每一第一子管道401及每一所述第二子管道502上。
在一些实施例中，阀门开关60设置在每一第二子管道502上。
具体的，阀门开关60的设置位置可以设置在连接过滤器30的任意管道上，在此不做赘述。
在一些实施例中，请参阅图4，图4为本申请实施例提供的剥离液机台100的第四种结构示意图。第二管道50包括多个第三子管道503，每一所述第三子管道503与一子过滤器连通301，且每一所述第三子管道503与所述下一级腔室连通102。
其中，阀门开关60设置在每一第三子管道503上。
本申请实施例提供的剥离液机台，包括：依次顺序排列的多级腔室、每一级所述腔室对应连接一存储箱；过滤器，所述过滤器的一端设置通过第一管道与当前级腔室对应的存储箱连接，所述过滤器的另一端通过第二管道与下一级腔室连接；其中，至少在第一管道或所述第二管道上设置有阀门开关。通过阀门开关控制连接每一级腔室的过滤器相互独立，从而在过滤器被阻塞时通过阀门开关将被堵塞的过滤器取下并不影响整体的剥离进程，提高生产效率。
本申请实施例还提供一种剥离液机台的工作方法，请参阅图5，图5为本申请实施例提供的剥离液机台的工作方法的流程示意图，该方法包括：
步骤110、将多级腔室顺序排列，按照处于剥离制程的剥离基板的传送方向逐级向剥离基板提供剥离液；
步骤120、将来自于当前级腔室经历剥离制程的剥离液收集和存储于当前级腔室相应的存储箱中，所述剥离液中夹杂有薄膜碎屑；
步骤130、使用当前级腔室相应的过滤器过滤来自当前级腔室的剥离液并将过滤后的剥离液传输至下一级腔室；
步骤140、若所述过滤器被所述薄膜碎屑阻塞，则关闭连接被阻塞的所述过滤器的管道上的阀门开关；
步骤150、取出被阻塞的所述过滤器。
若过滤器包括多个并列排布的子过滤器，则可以关闭被阻塞的子过滤器的阀门，因此，步骤140还可以包括：
若所述过滤器包括多个并列排布的子过滤器，则关闭连接被阻塞的所述子过滤器的管道上的阀门开关。
本申请实施例还提供一种剥离液机台，包括：
依次顺序排列的多级腔室、每一级所述腔室对应连接一存储箱；
过滤器，所述过滤器的一端设置通过第一管道与当前级腔室对应的存储箱连接，所述过滤器的另一端通过第二管道与下一级腔室连接；其中，
至少在所述第一管道或所述第二管道上设置有阀门开关，其中所述过滤器包括多个并列排布的子过滤器，所述第一管道包括多个第一子管道，每一所述第一子管道与一子过滤器连通，且所述多个第一子管道与当前级腔室对应的存储箱连通，所述第二管道包括公共子管道及多个第二子管道，每一所述第二子管道与一子过滤器连通，每一所述第二子管道与所述公共子管道连通，所述公共子管道与所述下一级腔室连通，或第二管道包括多个第三子管道，每一所述第三子管道与一子过滤器连通，且每一所述第三子管道与所述下一级腔室连通。
在上述实施例中，对各个实施例的描述都各有侧重，某个实施例中没有详述的部分，可以参见其他实施例的相关描述。
以上对本申请实施例进行了详细介绍，本文中应用了具体个例对本申请的原理及实施方式进行了阐述，以上实施例的说明只是用于帮助理解本申请的技术方案及其核心思想；本领域的普通技术人员应当理解：其依然可以对前述各实施例所记载的技术方案进行修改，或者对其中部分技术特征进行等同替换；而这些修改或者替换，并不使相应技术方案的本质脱离本申请各实施例的技术方案的范围。

Claims (11)

  1. 一种剥离液机台，其包括：
    依次顺序排列的多级腔室、每一级所述腔室对应连接一存储箱；
    过滤器，所述过滤器的一端设置通过第一管道与当前级腔室对应的存储箱连接，所述过滤器的另一端通过第二管道与下一级腔室连接；其中，
    至少在所述第一管道或所述第二管道上设置有阀门开关。
  2. 如权利要求1所述的剥离液机台，其中所述过滤器包括多个并列排布的子过滤器，所述第一管道包括多个第一子管道，每一所述第一子管道与一子过滤器连通，且所述多个第一子管道与当前级腔室对应的存储箱连通。
  3. 如权利要求2所述的剥离液机台，其中所述第二管道包括公共子管道及多个第二子管道，每一所述第二子管道与一子过滤器连通，每一所述第二子管道与所述公共子管道连通，所述公共子管道与所述下一级腔室连通。
  4. 如权利要求3所述的剥离液机台，其中所述阀门开关设置在每一所述第一子管道上。
  5. 如权利要求3所述的剥离液机台，其中所述阀门开关设置在每一所述第二子管道上。
  6. 如权利要求3所述的剥离液机台，其中所述阀门开关设置在每一所述第一子管道及每一所述第二子管道上。
  7. 如权利要求2所述的剥离液机台，其中所述第二管道包括多个第三子管道，每一所述第三子管道与一子过滤器连通，且每一所述第三子管道与所述下一级腔室连通。
  8. 如权利要求7所述的剥离液机台，其中所述阀门开关设置在每一所述第三子管道上。
  9. 一种剥离液机台的工作方法，其包括：
    将多级腔室顺序排列，按照处于剥离制程的剥离基板的传送方向逐级向剥离基板提供剥离液；
    将来自于当前级腔室经历剥离制程的剥离液收集和存储于当前级腔室相应的存储箱中，所述剥离液中夹杂有薄膜碎屑；
    使用当前级腔室相应的过滤器过滤来自当前级腔室的剥离液并将过滤后的剥离液传输至下一级腔室；
    若所述过滤器被所述薄膜碎屑阻塞，则关闭连接被阻塞的所述过滤器的管道上的阀门开关；
    取出被阻塞的所述过滤器。
  10. 如权利要求9所述的剥离液机台的工作方法，其中所述若所述过滤器被所述薄膜碎屑阻塞，则关闭连接被阻塞的所述过滤器的管道上的阀门开关包括：
    若所述过滤器包括多个并列排布的子过滤器，则关闭连接被阻塞的所述子过滤器的管道上的阀门开关。
  11. 一种剥离液机台，其包括：
    依次顺序排列的多级腔室、每一级所述腔室对应连接一存储箱；
    过滤器，所述过滤器的一端设置通过第一管道与当前级腔室对应的存储箱连接，所述过滤器的另一端通过第二管道与下一级腔室连接；其中，
    至少在所述第一管道或所述第二管道上设置有阀门开关，其中所述过滤器包括多个并列排布的子过滤器，所述第一管道包括多个第一子管道，每一所述第一子管道与一子过滤器连通，且所述多个第一子管道与当前级腔室对应的存储箱连通，所述第二管道包括公共子管道及多个第二子管道，每一所述第二子管道与一子过滤器连通，每一所述第二子管道与所述公共子管道连通，所述公共子管道与所述下一级腔室连通，或第二管道包括多个第三子管道，每一所述第三子管道与一子过滤器连通，且每一所述第三子管道与所述下一级腔室连通。
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