WO2019052248A1 - 一种基板传送装置 - Google Patents

一种基板传送装置 Download PDF

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Publication number
WO2019052248A1
WO2019052248A1 PCT/CN2018/092186 CN2018092186W WO2019052248A1 WO 2019052248 A1 WO2019052248 A1 WO 2019052248A1 CN 2018092186 W CN2018092186 W CN 2018092186W WO 2019052248 A1 WO2019052248 A1 WO 2019052248A1
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WO
WIPO (PCT)
Prior art keywords
magnetic field
generating unit
field generating
substrate transfer
transfer device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2018/092186
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English (en)
French (fr)
Inventor
谢学武
刘博文
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOE Technology Group Co Ltd, Hefei Xinsheng Optoelectronics Technology Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to US16/306,109 priority Critical patent/US11230436B2/en
Publication of WO2019052248A1 publication Critical patent/WO2019052248A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G13/00—Roller-ways
    • B65G13/02—Roller-ways having driven rollers
    • B65G13/06—Roller driving means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/32—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations
    • H10P72/3204—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations using magnetic elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G13/00—Roller-ways
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G13/00—Roller-ways
    • B65G13/11—Roller frames
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G21/00—Supporting or protective framework or housings for endless load-carriers or traction elements of belt or chain conveyors
    • B65G21/20—Means incorporated in, or attached to, framework or housings for guiding load-carriers, traction elements or loads supported on moving surfaces
    • B65G21/2009—Magnetic retaining means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G21/00—Supporting or protective framework or housings for endless load-carriers or traction elements of belt or chain conveyors
    • B65G21/20—Means incorporated in, or attached to, framework or housings for guiding load-carriers, traction elements or loads supported on moving surfaces
    • B65G21/2045—Mechanical means for guiding or retaining the load on the load-carrying surface
    • B65G21/2054—Mechanical means for guiding or retaining the load on the load-carrying surface comprising elements movable in the direction of load-transport
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G35/00—Mechanical conveyors not otherwise provided for
    • B65G35/06—Mechanical conveyors not otherwise provided for comprising a load-carrier moving along a path, e.g. a closed path, and adapted to be engaged by any one of a series of traction elements spaced along the path
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G39/00—Rollers, e.g. drive rollers, or arrangements thereof incorporated in roller-ways or other types of mechanical conveyors 
    • B65G39/02—Adaptations of individual rollers and supports therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment

Definitions

  • the present disclosure belongs to the field of display technologies, and in particular, to a substrate transfer device.
  • FIG. 1 is a schematic structural view of a conventional substrate transfer device
  • FIG. 2 is a schematic plan view of a conventional substrate transfer device.
  • a roller or a roller
  • the power transmission mechanism 1 to transport the substrate 10.
  • a plurality of guide rolls 2 are usually disposed on both sides in the advancing direction of the substrate 10.
  • the substrate 10 may come into contact with the conveying mechanism 1 or the guide roller 2 during conveyance, thereby generating friction.
  • the friction of the substrate 10 with the conveying mechanism 1 or the guide roller 2 may generate particles.
  • the weight of the stage is also larger due to its own weight.
  • the frictional force generated by the substrate 10 and the conveying mechanism 1 or the guide roller 2 is also relatively large, resulting in generation of more particles. These particles are more likely to fall into the region of the substrate 10 close to the guide roller 2 (as indicated by a broken line in Fig. 2), thereby affecting the quality of the display panel.
  • the present disclosure provides a substrate transfer apparatus including: a carrier, the carrier is configured to carry a substrate; and a transfer mechanism disposed under the carrier to be configured as a transfer station a guiding platform; and a guiding mechanism disposed oppositely, the guiding mechanisms are respectively disposed on two sides of the loading platform that are parallel along the conveying direction, wherein the first side of the loading platform along the conveying direction is provided with a first a magnetic field generating unit, and the guiding mechanism includes a second magnetic field generating unit located adjacent to the first magnetic field generating unit and disposed opposite to the first magnetic field generating unit such that the adjacent first magnetic field generating unit The second magnetic field generating units have the same polarity.
  • the guiding mechanism is formed to surround a guiding chamber of the carrying platform, and the second magnetic field generating unit is disposed on a sidewall of the guiding cavity.
  • the first magnetic field generating unit and the second magnetic field generating unit are located on the same horizontal plane.
  • the first magnetic field generating unit and the second magnetic field generating unit each include a plurality of magnets spaced apart along the conveying direction.
  • the transport mechanism includes: a rotatable transport roller whose axial direction is perpendicular to the transport direction; and a first motor configured to drive the transport roller to rotate; a connecting rod configured to connect the first motor of the conveying roller.
  • the conveying roller is in direct contact with the carrying platform and supports the carrying platform, and neither the first motor nor the connecting rod is in contact with the carrying platform; the cross section is in an inverted U shape
  • the guiding chamber is mounted on the connecting rod; and the first motor transmits power to the conveying roller through the connecting rod.
  • the bottom edge of the carrying platform is provided with a third magnetic field generating unit
  • the connecting rod is provided with a fourth magnetic field generated in the vicinity of the third magnetic field generating and disposed opposite to the third magnetic field generating unit.
  • the unit is such that the adjacent third magnetic field generating unit and the fourth magnetic field generating unit have the same polarity.
  • the guiding chamber having an inverted U-shaped cross section is mounted on the connecting rod; and the fourth magnetic field generating unit is disposed closer to the conveying roller with respect to a side wall of the guiding chamber .
  • the third magnetic field generating unit is embedded in a bottom of the stage, and the conveying roller includes a shaft having a magnetic force serving as a fourth magnetic field generating unit and a protective cover disposed around the surface of the roller shaft .
  • the protective cover is made of rubber; and the protective cover has a cylindrical shape concentric with the roller shaft.
  • the pitch of the plurality of magnets of the first magnetic field generating unit is smaller than the pitch of the plurality of magnets of the second magnetic field generating unit.
  • FIG. 1 is a schematic structural view of a conventional substrate transfer device
  • FIG. 2 is a schematic plan view of a conventional substrate transfer device
  • FIG. 3 is a schematic structural view of a substrate transfer device according to an embodiment of the present disclosure.
  • FIG. 4 is a schematic structural view of a substrate transfer device according to an embodiment of the present disclosure.
  • FIG. 5 is a schematic diagram of a magnetic field generated by a first magnetic field generating unit and a second magnetic field generating unit, according to an embodiment of the present disclosure
  • FIG. 6 is a schematic structural view of a substrate transfer device according to an embodiment of the present disclosure.
  • FIG. 7 is a schematic structural diagram of a substrate transfer apparatus according to an embodiment of the present disclosure.
  • FIG. 8 is a cross-sectional view of a transfer roller in accordance with an embodiment of the present disclosure.
  • reference numerals are: 10, a substrate; 1, a transport mechanism; 11, a transport roller; 12, a first motor; 13, a connecting rod; 14, a fourth magnetic field generating unit; 15, a roller; a protective cover; 2, a guiding roller; 3. a carrying platform; 31, a first magnetic field generating unit; 33, a third magnetic field generating unit; 4. a guiding mechanism; 41, a guiding chamber; 42, a second magnetic field generating unit.
  • FIG. 3 is a schematic structural view of a substrate transfer apparatus according to an embodiment of the present disclosure.
  • the substrate transfer device includes a carrying table 3, a conveying mechanism 1, and an oppositely disposed guiding mechanism 4.
  • the carrying platform 3 is configured to support the substrate;
  • the transport mechanism 1 is disposed below the carrying platform 3, configured to transport the carrying platform 3;
  • the guiding mechanisms 4 are respectively disposed on both sides of the carrying platform 3 along the conveying direction .
  • a first magnetic field generating unit 31 is disposed on each side of the carrying platform 3 along the conveying direction, and the guiding mechanism 4 is disposed adjacent to the first magnetic field generating unit 31 and opposite to the first magnetic field generating unit 31.
  • the second magnetic field generating unit 42 is disposed such that the adjacent first magnetic field generating unit 31 and the second magnetic field generating unit 42 have the same polarity.
  • the term "same polarity" means that the first magnetic field generating unit 31 and the second magnetic field generating unit 42 are both N poles or both S poles. In the exemplary embodiment shown in FIG. 3, the first magnetic field generating unit 31 and the second magnetic field generating unit 42 are both N poles.
  • the first magnetic field generating unit 31 is disposed on both sides of the carrying platform 3 along the conveying direction, and the guiding mechanism 4 is disposed adjacent to the first magnetic field generating unit 31 and the first The magnetic field generating unit 31 is disposed opposite to the second magnetic field generating unit 42 such that the adjacent first magnetic field generating unit 31 and the second magnetic field generating unit 42 have the same polarity. Since the mutually exclusive force can be generated between the adjacent first magnetic field generating unit 31 and the second magnetic field generating unit 42 of the same polarity, the carrier 3 can be restricted from approaching the guiding mechanism 4. In this way, it is possible to avoid the generation of particles due to the contact of the stage 3 with the guiding mechanism 4. Therefore, the substrate on the stage 3 is not contaminated.
  • the substrate transfer device includes a carrying table 3, a conveying mechanism 1, and an oppositely disposed guiding mechanism 4.
  • the carrier 3 is configured to support a substrate;
  • the transport mechanism 1 is disposed below the carrier 3 and configured to transport the carrier 3;
  • the guiding mechanisms 4 are respectively disposed on both sides of the carrier 3 in the conveying direction.
  • the first magnetic field generating unit 31 is disposed on both sides of the carrying platform 3 along the conveying direction.
  • the guide mechanism 4 is formed to surround the guide chamber 41 of the stage 3, and a second magnetic field generating unit 42 is disposed on the inner side wall of the guide chamber 41.
  • the second magnetic field generating unit 42 is respectively located in the vicinity of the first magnetic field generating unit 31 and disposed opposite to the first magnetic field generating unit 31 such that the adjacent first magnetic field generating unit 31 and the second magnetic field The generating units 42 have the same polarity.
  • the cross section of the guiding chamber 41 has an inverted U-shape such that the guiding chamber can surround both sides of the conveying direction of the stage 3. In this way, external contaminants can be prevented from approaching the substrate during the substrate transfer process, thereby further ensuring the quality of the display panel.
  • the first magnetic field generating unit 31 and the second magnetic field generating unit 42 are on the same horizontal plane.
  • the carrier 3 and the substrate on the carrier 3 are carried by a transport mechanism 1 located below the carrier 3.
  • the magnetic force ie, the repulsive force
  • the magnetic force may be calculated according to the size of the stage 3 and the substrate, or may be set empirically.
  • a continuous long magnet may be disposed on the inner side wall of the guiding chamber 41 as the second magnetic field generating unit 42.
  • This can generate a continuous magnetic force (i.e., repulsive force) between the first magnetic field generating unit 31 and the second magnetic field generating unit 42 to ensure smooth transfer of the substrate.
  • each of the first magnetic field generating unit 31 and the second magnetic field generating unit 42 may include a plurality of magnets spaced apart along the conveying direction.
  • the pitch of the plurality of magnets of the first magnetic field generating unit 31 is smaller than the pitch of the plurality of magnets of the second magnetic field generating unit 42.
  • the transport mechanism 1 includes a rotatable transport roller 11, a first motor 12, and a connecting rod 13, wherein the transport roller 11
  • the axial direction is perpendicular to the conveying direction; the first motor 12 is configured to drive the conveying roller 11 to rotate; the connecting rod 13 is configured to connect the conveying roller 11 with the first motor 12.
  • the conveying roller 11 is in direct contact with the carrier table 3 and supports the carrier table 3, and neither the first motor 12 nor the connecting rod 13 is in contact with the carrier table 3.
  • a guide chamber 41 having an inverted U-shaped cross section is mounted on the connecting rod 13. The first motor 12 transmits power to the conveying roller 11 through the connecting rod 13.
  • FIG. 6 is a schematic structural view of a substrate transfer apparatus according to an embodiment of the present disclosure.
  • the bottom edge of the loading platform 3 is provided with a third magnetic field generating unit 33, and the connecting rods 13 are disposed respectively adjacent to the third magnetic field generating unit 33 and The third magnetic field generating unit 33 is disposed opposite to the fourth magnetic field generating unit 14 such that the adjacent third magnetic field generating unit 33 and the fourth magnetic field generating unit 14 have the same polarity. In this way, the friction between the conveying roller 11 and the carrying table 3 can be reduced.
  • the guiding chamber 41 having an inverted U-shaped cross section is mounted on the connecting rod 13, and the fourth magnetic field generating unit 14 is closer to the side wall of the guiding chamber.
  • the conveying roller 11 is disposed.
  • the second magnetic field generating unit 42, the first magnetic field generating unit 31, the fourth magnetic field generating unit 14, and the conveying roller 11 are disposed in order from the outside to the inside in the guiding chamber 41.
  • the side wall of the guiding chamber 41, the second magnetic field generating unit 42, and the fourth magnetic field generating unit 14 are located on the connecting rod 13.
  • the first magnetic field generating unit 31 is located at both ends of the stage 3 opposite to the second magnetic field generating unit 42.
  • the third magnetic field generating unit 33 is located at a bottom edge of the stage 3 opposite to the fourth magnetic field generating unit 14.
  • the guiding chamber 41 may be a vacuum chamber in a substrate evaporation process.
  • the second magnetic field generating unit 42 is located on the inner wall of the vacuum evaporation chamber.
  • the connecting rod 13 is also located in the vapor deposition chamber.
  • a vapor deposition device, a vapor deposition source, a vapor deposition material, or the like may be provided in the guide chamber 41 serving as the vapor deposition chamber (not shown in Fig. 6).
  • FIG. 7 is a schematic structural view of a substrate transfer device according to an embodiment of the present disclosure
  • FIG. 8 is a cross-sectional view of a transfer roller according to an embodiment of the present disclosure.
  • a third magnetic field generating unit 33 is embedded in the bottom of the stage 3, and the transfer roller 11 is included to serve as the fourth magnetic field generation.
  • the magnetic roller shaft 15 of the unit 14 and the protective sleeve 16 disposed around the surface of the roller shaft 15.
  • the roller shaft 15 having magnetic properties is used as the fourth magnetic field generating unit 14 and disposed inside the conveying roller 11.
  • the roller shaft 15 which is usually magnetic can be made of a magnet. More specifically, the magnetic roller shaft 15 in the present embodiment may be a radially magnetized magnet such that the outer circumference of the roller shaft 15 has the same polarity as that of the third magnetic field generating unit 33.
  • the protective cover 16 is made of rubber; and the protective cover 16 has a cylindrical shape concentric with the roller shaft 15.
  • Fig. 8 shows a cross-sectional view of the conveying roller 11 according to the present embodiment.
  • the inner core of the conveying roller 11 is a hollow magnetic roller shaft 15, and the protective sleeve 16 surrounds the outer circumference of the shaft shaft 15, so that the roller shaft 15 and the protective sleeve 16 have the same axial center.
  • the conveying roller 11 it is possible to prevent the conveying roller 11 from causing damage to the stage 3.
  • the display device may include a liquid crystal display panel, an electronic paper, an OLED panel, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and any product or component having a display function.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Rollers For Roller Conveyors For Transfer (AREA)
  • Non-Mechanical Conveyors (AREA)

Abstract

一种基板传送装置，包括：承载台（3），承载台（3）被构造成承载基板；传送机构（1），传送机构（1）设置在承载台（3）的下方，被构造成传送承载台（3）；以及相对设置的导向机构（4），导向机构（4）分别设置在承载台（3）的沿着传送方向平行的两侧。承载台（3）的沿着传送方向的两侧设置有第一磁场产生单元（31），并且导向机构（4）包括位于第一磁场产生单元（31）附近并与第一磁场产生单元（31）相对设置的第二磁场产生单元（42），使得相邻的第一磁场产生单元（31）与第二磁场产生单元（42）具有相同的极性。

Description

一种基板传送装置 技术领域
本公开属于显示技术领域，具体涉及一种基板传送装置。
背景技术
图1为现有的基板传送装置的结构示意图，图2为现有的基板传送装置的示意性俯视图。如图1和图2所示，在显示面板的生产过程中，通常采用辊轮(或称辊筒)作为动力传送机构1来运送基板10。此外，为了使得基板10沿着特定方向传送，通常在基板10的前进方向的两侧设置多个导向辊2。
然而，基板10在传送过程中可能会与传送机构1或导向辊2相接触，从而产生摩擦。基板10与传送机构1或导向辊2的摩擦可能会产生颗粒。在大尺寸显示面板的情况下，由于自身重量较大，承载台的重量也更大。此时，基板10与传送机构1或导向辊2产生的摩擦力也相对较大，从而产生较多颗粒。这些颗粒比较容易落入基板10的靠近导向辊2的区域内(如图2中的虚线所示)，从而影响显示面板的品质。
发明内容
为了解决上述问题，本公开提供一种基板传送装置，包括：承载台，所述承载台被构造成承载基板；传送机构，所述传送机构设置在所述承载台的下方，被构造成传送所述承载台；以及相对设置的导向机构，所述导向机构分别设置在所述承载台的沿着传送方向平行的两侧，其中，所述承载台的沿着传送方向的两侧设置有第一磁场产生单元，并且所述导向机构包括位于所述第一磁场产生单元附近并与所述第一磁场产生单元相对设置的第二磁场产生单元，使得相邻的所述第一磁场产生单元与所述第二磁场产生单元具有相同的极性。
优选的是，所述导向机构形成为包围所述承载台的导向腔室，所述第二磁场产生单元设于所述导向腔室内侧壁上。
优选的是，所述第一磁场产生单元与所述第二磁场产生单元位于同一水平面上。
优选的是，所述第一磁场产生单元和所述第二磁场产生单元均包括沿着所述传送方向间隔设置的多个磁体。
优选的是，所述传送机构包括：可转动的传送辊，所述传送辊的轴向与所述传送方向垂直；第一电机，所述第一电机被构造成驱动所述传送辊转动；以及连接杆，所述连接杆被构造成连接所述传送辊所述第一电机。
优选的是，所述传送辊与所述承载台直接接触并所述支撑承载台，而所述第一电机和所述连接杆均不与所述承载台接触；横截面呈倒置U形形状的所述导向腔室安装在所述连接杆上；并且所述第一电机通过所述连接杆将动力传递至所述传送辊。
优选的是，所述承载台的底部边缘设置有第三磁场产生单元，并且所述连接杆设置有位于所述第三磁场产生附近并与所述第三磁场产生单元相对设置的第四磁场产生单元，使得相邻的所述第三磁场产生单元与所述第四磁场产生单元具有相同的极性。
优选的是，横截面呈倒置U形形状的所述导向腔室安装在所述连接杆上；并且所述第四磁场产生单元相对于所述导向腔室的侧壁更靠近所述传送辊设置。
优选的是，所述第三磁场产生单元内嵌在所述承载台的底部，所述传送辊包括用作所述第四磁场产生单元的辊具有磁性的轴和围绕辊轴表面设置的保护套。
优选的是，所述保护套由橡胶构成；并且所述保护套呈与所述辊轴同轴心的圆筒形状。
优选的是，所述第一磁场产生单元的多个磁体的间距小于所述第二磁场产生单元的多个磁体的间距。
附图说明
图1为现有的基板传送装置的结构示意图；
图2为现有的基板传送装置的示意性俯视图；
图3为根据本公开的一个实施例的基板传送装置的结构示意图；
图4为根据本公开的一个实施例的基板传送装置的结构示意图；
图5为根据本公开实施例的第一磁场产生单元和第二磁场产生单元产生的磁场的示意图；
图6为根据本公开的一个实施例的基板传送装置的结构示意图；
图7为根据本公开的一个实施例的基板传送装置的结构示意图；以及
图8为根据本公开实施例的传送辊的截面图。
在附图中，附图标记为：10、基板；1、传送机构；11、传送辊；12、第一电机；13、连接杆；14、第四磁场产生单元；15、滚轴；16、保护套；2、导向辊；3、承载台；31、第一磁场产生单元；33、第三磁场产生单元；4、导向机构；41、导向腔室；42、第二磁场产生单元。
具体实施方式
为使本领域技术人员更好地理解本公开的技术方案，下面结合附图和具体实施方式对本公开作进一步详细描述。
图3为根据本公开的一个实施例的基板传送装置的结构示意图。如图3所示，该基板传送装置包括：承载台3、传送机构1以及相对设置的导向机构4。承载台3被构造成支撑基板；传送机构1设置在所述承载台3下方，被构造成传送所述承载台3；所述导向机构4分别设置在承载台3的沿着传送方向的两侧。所述承载台3的沿着传送方向的两侧分别设置有第一磁场产生单元31，所述导向机构4包括位于所述第一磁场产生单元31附近并与所述第一磁场产生单元31相对设置的第二磁场产生单元42，使得相邻的所述第一磁场产生单元31与所述第二磁场产生单元42具有相同的极性。
在本文中，术语“相同的极性”是指所述第一磁场产生单元31与所述第二磁场产生单元42均为N极或者均为S极。在图3所示的示意性实施例中，第一磁场产生单元31与第二磁场产生单元42均为N极。
根据本实施例，所述承载台3的沿着传送方向的两侧设置有第一磁场产生单元31，并且所述导向机构4包括位于所述第一磁场产生单 元31附近并与所述第一磁场产生单元31相对设置的第二磁场产生单元42，使得相邻的所述第一磁场产生单元31与所述第二磁场产生单元42具有相同的极性。由于在极性相同的相邻的所述第一磁场产生单元31与所述第二磁场产生单元42之间可以产生相互排斥的力，所以会限制承载台3靠近导向机构4。这样，可以避免由于承载台3与导向机构4接触而产生颗粒。因此，不会污染承载台3上的基板。
图4为根据本公开的一个实施例的基板传送装置的结构示意图。如图4所示，该基板传送装置包括：承载台3、传送机构1以及相对设置的导向机构4。承载台3被构造成支撑基板；传送机构1设置在所述承载台3下方，被构造成传送所述承载台3；导向机构4分别设置在承载台3的沿着传送方向的两侧。所述承载台3的沿着传送方向的两侧设置有第一磁场产生单元31。在本实施例中，所述导向机构4形成为包围所述承载台3的导向腔室41，在所述导向腔室41内侧壁上设置有第二磁场产生单元42。所述第二磁场产生单元42分别位于所述第一磁场产生单元31附近并与所述第一磁场产生单元31相对设置，使得相邻的所述第一磁场产生单元31与所述第二磁场产生单元42具有相同的极性。
在本实施例中，如图4所示，导向腔室41的横截面呈倒置的U形形状，使得所述导向腔室可以包围承载台3的传送方向的两侧。这样，可以防止在基板传送的过程中外界污染物接近基板，从而进一步保证显示面板的品质。
作为本实施例中的一种可选实施方案，所述第一磁场产生单元31与所述第二磁场产生单元42位于同一水平面上。
在本公开的实施例中，承载台3以及承载台3上的基板由位于承载台3下方的传送机构1承载。需要说明的是，在所述第一磁场产生单元31与所述第二磁场产生单元42之间产生的磁力(即，斥力)设计为能保证承载台3不偏离传送机构1的传送方向。一般情况下，所述磁力(即，斥力)可以根据承载台3和基板的尺寸计算，也可以根据经验设定。
作为本实施例中的一种可选实施方案，可以在导向腔室41内侧壁 上设置一条连续的长磁体作为第二磁场产生单元42。这样可以在第一磁场产生单元31与第二磁场产生单元42之间产生连续的磁力(即，斥力)以保证基板平稳传送。可以理解的是，如图5所示，第一磁场产生单元31(或第二磁场产生单元42)产生的磁场的磁力线方向是曲线的。因此，作为本实施例中的一种优选实施方案，所述第一磁场产生单元31和所述第二磁场产生单元42均可以包括沿着传送方向间隔设置的多个磁体。优选的是，所述第一磁场产生单元31的多个磁体的间距小于所述第二磁场产生单元42的多个磁体的间距。
作为本实施例中的一种可选实施方案，如图4所示，所述传送机构1包括：可转动的传送辊11、第一电机12以及连接杆13，其中，所述传送辊11的轴向与所述传送方向垂直；第一电机12被构造成驱动所述传送辊11转动；连接杆13被构造成连接所述传送辊11与所述第一电机12。
进一步地说，如图4所示，传送辊11与承载台3直接接触并支撑承载台3，而第一电机12和连接杆13均不与承载台3接触。横截面呈倒置U形形状的导向腔室41安装在连接杆13上。第一电机12通过连接杆13将动力传递至传送辊11。
图6为根据本公开的一个实施例的基板传送装置的结构示意图。在本实施例中，如图6所示，所述承载台3的底部边缘设置有第三磁场产生单元33，并且所述连接杆13设置有分别位于所述第三磁场产生单元33附近并与所述第三磁场产生单元33相对设置的第四磁场产生单元14，使得相邻的所述第三磁场产生单元33与所述第四磁场产生单元14具有相同的极性。按照这种方式，可以减小传送辊11与承载台3之间的摩擦力。
优选的是，横截面呈倒置U形形状的所述导向腔室41安装在所述连接杆13上，并且所述第四磁场产生单元14相对于所述导向腔室的侧壁更靠近所述传送辊11设置。
在本实施例中，如附图6所示，在导向腔室41中由外至内依次设置第二磁场产生单元42、第一磁场产生单元31、第四磁场产生单元14和传送辊11。导向腔室41的侧壁、第二磁场产生单元42以及第四磁 场产生单元14位于连接杆13上。第一磁场产生单元31位于承载台3的与第二磁场产生单元42相对设置的两端。第三磁场产生单元33位于承载台3的与第四磁场产生单元14相对设置的底部边缘。
在一个示例性实施例中，导向腔室41可以是基板蒸镀工艺中的真空腔室。在这种情况下，第二磁场产生单元42位于真空蒸镀腔室的内壁上。当导向腔室41应用于蒸镀工艺中时，连接杆13同样位于蒸镀腔室内。此外，用作蒸镀腔室的导向腔室41内还可以设有蒸镀装置、蒸镀源、蒸镀材料等(图6中未示出)。
图7为根据本公开的一个实施例的基板传送装置的结构示意图；以及图8为根据本公开实施例的传送辊的截面图。在本公开的一个实施例中，如图7和图8所示，第三磁场产生单元33内嵌在所述承载台3的底部，并且所述传送辊11包括用作所述第四磁场产生单元14的具有磁性的辊轴15和围绕辊轴15表面设置的保护套16。
在本实施例中，如图7所示，具有磁性的辊轴15用作第四磁场产生单元14并设置在传送辊11内部。通常具有磁性的辊轴15可以由磁铁制成。更具体地说，在本实施例中的具有磁性的辊轴15可以是辐射状充磁的磁铁，使得辊轴15外周的极性与第三磁场产生单元33的极性相同。
作为本实施例中的一种优选实施方案，所述保护套16由橡胶构成；并且所述保护套16呈与所述辊轴15同轴心的圆筒形状。
图8示出了根据本实施例的传送辊11的截面图。如图8所示，传送辊11的内芯为中空的具有磁性的辊轴15，保护套16包围在轴轴15的外周，使得辊轴15与保护套16具有同一轴心。这样，可以防止传送辊11对承载台3造成损坏。
需要说明的是，附图所示各结构的大小、厚度等是示意性的。在具体实践中，各个结构的尺寸、比例可以根据实际需要进行改变。
本公开的一个实施例提供了一种显示装置，其制备过程中采用上述基板传送装置。所述显示装置可以包括液晶显示面板、电子纸、OLED面板、手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪以及具有显示功能的任何产品或部件。
可以理解的是，以上实施方式仅仅是为了说明本公开的原理而采用的示例性实施方式，然而本公开并不局限于此。对于本领域内的普通技术人员而言，在不脱离本公开的精神和实质的情况下，可以做出各种变型和改进，这些变型和改进也视为本公开的保护范围。

Claims (11)

  1. 一种基板传送装置，包括：
    承载台，所述承载台被构造成承载基板；
    传送机构，所述传送机构设置在所述承载台的下方，被构造成传送所述承载台；以及
    相对设置的导向机构，所述导向机构分别设置在所述承载台的沿着传送方向平行的两侧，
    其中，所述承载台的沿着传送方向的两侧设置有第一磁场产生单元，并且所述导向机构包括位于所述第一磁场产生单元附近并与所述第一磁场产生单元相对设置的第二磁场产生单元，使得相邻的所述第一磁场产生单元与所述第二磁场产生单元具有相同的极性。
  2. 根据权利要求1所述的基板传送装置，其中，所述导向机构形成为包围所述承载台的导向腔室，所述第二磁场产生单元设于所述导向腔室的内侧壁上。
  3. 根据权利要求1所述的基板传送装置，其中，所述第一磁场产生单元与所述第二磁场产生单元位于同一水平面上。
  4. 根据权利要求3所述的基板传送装置，其中，所述第一磁场产生单元和所述第二磁场产生单元均包括沿着所述传送方向间隔设置的多个磁体。
  5. 根据权利要求2所述的基板传送装置，其中，所述传送机构包括：
    可转动的传送辊，所述传送辊的轴向与所述传送方向垂直；
    第一电机，所述第一电机被构造成驱动所述传送辊转动；以及
    连接杆，所述连接杆被构造成连接所述传送辊所述第一电机。
  6. 根据权利要求5所述的基板传送装置，其中，
    所述传送辊与所述承载台直接接触并所述支撑承载台，而所述第一电机和所述连接杆均不与所述承载台接触；
    横截面呈倒置U形形状的所述导向腔室安装在所述连接杆上；并且
    所述第一电机通过所述连接杆将动力传递至所述传送辊。
  7. 根据权利要求5所述的基板传送装置，其中，所述承载台的底部边缘设置有第三磁场产生单元，并且所述连接杆设置有位于所述第三磁场产生附近并与所述第三磁场产生单元相对设置的第四磁场产生单元，使得相邻的所述第三磁场产生单元与所述第四磁场产生单元具有相同的极性。
  8. 根据权利要求7所述的基板传送装置，其中，
    横截面呈倒置U形形状的所述导向腔室安装在所述连接杆上；并且
    所述第四磁场产生单元相对于所述导向腔室的侧壁更靠近所述传送辊设置。
  9. 根据权利要求7所述的基板传送装置，其中，所述第三磁场产生单元内嵌在所述承载台的底部，所述传送辊包括用作所述第四磁场产生单元的辊具有磁性的轴和围绕辊轴表面设置的保护套。
  10. 根据权利要求9所述的基板传送装置，其中，所述保护套由橡胶构成；并且所述保护套呈与所述辊轴同轴心的圆筒形状。
  11. 根据权利要求4所述的基板传送装置，其中，所述第一磁场产生单元的多个磁体的间距小于所述第二磁场产生单元的多个磁体的间距。
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