WO2018205547A1 - 清洗装置及清洗设备 - Google Patents
清洗装置及清洗设备 Download PDFInfo
- Publication number
- WO2018205547A1 WO2018205547A1 PCT/CN2017/112112 CN2017112112W WO2018205547A1 WO 2018205547 A1 WO2018205547 A1 WO 2018205547A1 CN 2017112112 W CN2017112112 W CN 2017112112W WO 2018205547 A1 WO2018205547 A1 WO 2018205547A1
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- WO
- WIPO (PCT)
- Prior art keywords
- lifting rod
- nozzle
- disposed
- cleaning
- rail
- Prior art date
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/14—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with multiple outlet openings; with strainers in or outside the outlet opening
- B05B1/16—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with multiple outlet openings; with strainers in or outside the outlet opening having selectively- effective outlets
- B05B1/1627—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with multiple outlet openings; with strainers in or outside the outlet opening having selectively- effective outlets with a selecting mechanism comprising a gate valve, a sliding valve or a cock
- B05B1/1636—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with multiple outlet openings; with strainers in or outside the outlet opening having selectively- effective outlets with a selecting mechanism comprising a gate valve, a sliding valve or a cock by relative rotative movement of the valve elements
- B05B1/1645—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with multiple outlet openings; with strainers in or outside the outlet opening having selectively- effective outlets with a selecting mechanism comprising a gate valve, a sliding valve or a cock by relative rotative movement of the valve elements the outlets being rotated during selection
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
- B05B15/60—Arrangements for mounting, supporting or holding spraying apparatus
- B05B15/65—Mounting arrangements for fluid connection of the spraying apparatus or its outlets to flow conduits
- B05B15/656—Mounting arrangements for fluid connection of the spraying apparatus or its outlets to flow conduits whereby the flow conduit length is changeable
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
- B05B15/70—Arrangements for moving spray heads automatically to or from the working position
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/093—Cleaning containers, e.g. tanks by the force of jets or sprays
- B08B9/0936—Cleaning containers, e.g. tanks by the force of jets or sprays using rotating jets
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3092—Recovery of material; Waste processing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/024—Cleaning by means of spray elements moving over the surface to be cleaned
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/0804—Cleaning containers having tubular shape, e.g. casks, barrels, drums
- B08B9/0813—Cleaning containers having tubular shape, e.g. casks, barrels, drums by the force of jets or sprays
Definitions
- At least one embodiment of the present disclosure is directed to a cleaning apparatus and a cleaning apparatus.
- each photolithography process mainly includes the following processes: coating, exposure, development, and the like.
- the function of development is mainly to clean the unexposed portion of the photoresist on the substrate by using a chemical solution.
- the cleaned waste liquid contains a large amount of photoresist composition.
- the photoresist cleaned from the substrate remains and accumulates on the components of the developing chamber, causing pollution to the corresponding position. Will affect the quality of the production products.
- the above development chamber needs to be cleaned after each production period.
- the developing device is composed of a plurality of developing chambers, so that there are many developing chambers to be cleaned as described above.
- the structure in the developing chamber is complicated and the space is narrow, and it is difficult for the personnel to perform the cleaning operation, the working time is long, the manpower required is large, and the cleaning effect is not satisfactory.
- At least one embodiment of the present disclosure provides a cleaning device and a cleaning device.
- At least one embodiment of the present disclosure provides a cleaning apparatus including: a guide rail; a lifting rod, one end of the lifting rod is disposed on the rail and movable along the rail; a liquid supply pipeline, the liquid supply pipeline Provided inside the lifting rod; and a nozzle disposed at an end of the lifting rod away from an end of the rail and communicating with the liquid supply line; wherein the lifting rod is configured to be The nozzle is located away from or near the rail.
- the lifting rod includes a first lifting rod, a second lifting rod, and a connecting member connecting the first lifting rod and the second lifting rod;
- the end of the first lifting rod is provided with the nozzle, the second lifting rod is disposed on the rail, and the first lifting rod is movable up and down with respect to the second lifting rod.
- the connecting member is configured to be rotatable to drive the first lifting rod to perform a lifting movement relative to the second lifting rod.
- the cleaning device provided by an embodiment of the present disclosure further includes an inner nozzle and an outer nozzle.
- the inner nozzle is disposed inside the outer nozzle, the nozzle is disposed inside the inner nozzle; a plurality of first nozzles are disposed on the outer nozzle, and a plurality of first nozzles are disposed on the inner nozzle a second orifice; at least one of the inner nozzle and the outer nozzle configured to be rotatable about the lifting rod.
- the arrangement pitch of the second injection holes on the inner nozzle is different from the arrangement pitch of the first nozzle holes on the outer nozzle.
- the inner head has a slider that is disposed outwardly on an outer surface of the inner head and perpendicular to an axial direction of the lifting rod, and the outer The spray head has an inwardly concave guide groove disposed on an inner surface of the outer spray head and perpendicular to an axial direction of the lift rod, wherein the slider is embedded in the guide groove and configured to be opposite to the The guide groove moves.
- a cleaning apparatus further includes a multi-pass valve disposed at an end of the lifting rod adjacent to the rail, wherein the multi-pass valve is adjacent to one end of the lifting rod and the liquid supply tube The road is connected.
- a cleaning apparatus further includes a strut connected to an end of the lifting rod adjacent to the rail, wherein the multi-pass valve is connected to an end of the strut away from the lifting rod.
- a cleaning apparatus further includes a laser ranging unit disposed on the guide rail.
- a cleaning apparatus further includes a support frame disposed on the guide rail and movable along the guide rail, wherein the guide rail includes a plurality of sub-guide rails disposed in parallel, and the lift rod is supported by the On the support frame.
- the cleaning device provided by an embodiment of the present disclosure further includes a liquid guiding groove disposed between the sub-rails, wherein the liquid guiding groove is disposed to be inclined.
- At least one embodiment of the present disclosure also provides a cleaning apparatus comprising the cleaning apparatus of any of the embodiments of the present disclosure.
- the cleaning apparatus provided by an embodiment of the present disclosure further includes a working chamber, wherein the working An opening is provided in the wall of the chamber that allows the cleaning device to pass to at least partially enter the working chamber.
- a baffle is further included, wherein the baffle is disposed at the opening to open or close the opening.
- a cleaning apparatus further includes at least one external line, wherein the external line is connected to the cleaning device.
- FIG. 1a is a schematic cross-sectional view of a cleaning device according to an embodiment of the present disclosure
- Figure 1b is a schematic cross-sectional view of the cleaning device shown in Figure 1a as the first lifting rod is lowered;
- FIG. 2a is a schematic cross-sectional view of a cleaning device according to another embodiment of the present disclosure.
- Figure 2b is an enlarged schematic view of the inner nozzle and the outer nozzle
- Figure 3a is a schematic view showing the relative positions of the first nozzle hole and the second nozzle hole in the first position
- Figure 3b is a schematic view showing the relative positions of the first nozzle hole and the second nozzle hole in the second position
- Figure 3c is a schematic view showing the relative positions of the first nozzle hole and the second nozzle hole in the third position
- FIG. 4 is a schematic cross-sectional view of a cleaning device according to another embodiment of the present disclosure.
- FIG. 5 is a schematic cross-sectional view of a cleaning device according to another embodiment of the present disclosure.
- FIG. 6a is a schematic cross-sectional view of a cleaning device according to another embodiment of the present disclosure.
- Figure 6b is a side cross-sectional view of Figure 6a
- 6c is a schematic cross-sectional view of a cleaning device according to another embodiment of the present disclosure.
- FIG. 7a is a schematic diagram of a cleaning device in a non-operating state according to an embodiment of the present disclosure
- FIG. 7b is a schematic diagram of a cleaning device in an operating state according to an embodiment of the present disclosure.
- FIG. 8 is a schematic diagram of a cleaning device in a developing chamber according to an embodiment of the present disclosure.
- At least one embodiment of the present disclosure provides a cleaning apparatus and a cleaning apparatus including the same.
- the cleaning device comprises: a guide rail, a lifting rod disposed at one end on the rail and movable along the rail, a liquid supply pipeline disposed inside the lifting rod, and an end portion disposed at an end of the lifting rod away from the rail and communicating with the liquid supply pipeline Nozzle.
- the lifter is configured to move the nozzle away from or near the rail.
- the cleaning device can clean the device to be cleaned at different positions and at different heights, thereby reducing manpower and improving cleaning efficiency.
- the cleaning device includes: a guide rail 11; a lifting rod 12, one end of the lifting rod is disposed on the guide rail 11 and movable along the guide rail 11; 14.
- the liquid supply line 14 is disposed inside the lift rod 12; and the nozzle 13 is disposed at an end of the lift rod 12 away from the end of the guide rail 11 and communicates with the liquid supply line 14.
- the lifter 12 is configured to move the nozzle 13 away from or near the guide rail 11.
- a guide rail 11 is disposed at the lowermost portion of the cleaning device, and one end of the lifting rod 12 is disposed on the guide rail 11 and movable in the direction in which the rail 11 extends.
- the track extending direction of the guide rail 11 may be set according to the configuration of the device to be cleaned, and the guide rail 11 may include various applicable types.
- the embodiment of the present disclosure does not limit the type of the guide rail 11, and the following embodiments are the same as those described herein, and are not described again.
- At least one liquid supply line 14 may be disposed inside the lifting rod 12, and a nozzle 13 is provided at an end of the lifting rod 12 away from the end of the rail 11, the bottom of the nozzle 13 and the liquid supply tube Road 14 is connected. It should be noted that only one liquid supply line 14 is shown in FIG. 1a. The embodiment of the present disclosure does not limit the number of liquid supply lines 14 provided, for example, two, three or more may be set. A supply line.
- the nozzle 13 may be designed in a cylindrical shape.
- the present disclosure includes but is not limited thereto.
- the nozzle 13 may also be designed in other shapes such as a spherical shape.
- the nozzle 13 is provided with a plurality of openings, not shown in the drawings.
- a plurality of openings may be evenly distributed on the nozzle 13.
- the nozzle 13 may be made of a wear-resistant ceramic material or the like, but embodiments of the present disclosure are not limited thereto.
- the cleaning liquid in the nozzle 13 is supplied from the liquid supply line 14 in the lifting rod 12, and then ejected through a plurality of openings in the nozzle.
- the movement of the lifting rod 12 on the guide rail 11 can drive the nozzle 13 to move, and the lifting rod 12 can also be moved up and down in the axial direction thereof, thereby enabling cleaning of the device to be cleaned at different positions and at different heights.
- the lifting rod 12 may include a first lifting rod 121, a second lifting rod 122, and a connecting piece 123 connecting the first lifting rod 121 and the second lifting rod 122.
- the nozzle 13 is disposed at an end of the first lifting rod 121 away from the end of the guide rail 11, and the second lifting rod 122 is disposed on the guide rail 11.
- the first lifting rod 121 can be moved up and down relative to the second lifting rod 122, that is, the lifting rod 12 It is configured to move the nozzle 13 away from or near the guide rail 11.
- the first lifting rod 121 can be driven to move up and down relative to the second lifting rod 122 by the rotation of the connecting member 123.
- the connecting member 123 and the first lifting rod 121 constitute a spiral pair, such as a connecting piece.
- 123 can be driven by a machine or motor.
- the connecting member 123 rotates clockwise, the first lifting rod is driven to rise relative to the second lifting rod to move the nozzle 13 away from the guide rail 11.
- the connecting member 123 rotates counterclockwise, the first lifting rod is driven relative to the second lifting rod. The rod is lowered to bring the nozzle 13 close to the guide rail 11, and
- FIG. 1b is a schematic view of the first lift rod 121 as it descends relative to the second lift rod 122.
- the above-described description of the driving movement of the first lifting rod relative to the second lifting rod by the rotation of the connecting member is an example in the present disclosure in which the lifting rod is configured to move the nozzle away from or close to the guide rail, and the present disclosure includes but not Limited to this.
- the lifting rod can also be configured to be telescopic, with the nozzle being moved away from or near the rail by expansion and contraction of the lifting rod.
- the movement of the nozzle is moved by the movement of the lifting rod on the guide rail, thereby achieving cleaning of the device to be cleaned at different positions.
- the lifting movement of the first lifting rod relative to the second lifting rod causes the nozzle to move away from or close to the guide rail, thereby achieving cleaning of the nozzle to be cleaned at different heights.
- An embodiment of the present disclosure further provides a cleaning device, as shown in FIG. 2a, the cleaning device also includes: a guide rail 11; a lifting rod 12, one end of the lifting rod is disposed on the guide rail 11 and movable along the guide rail 11;
- the line 14, the liquid supply line 14 is disposed inside the lifting rod 12, and the nozzle 13 is disposed at an end of the lifting rod 12 away from the end of the rail 11 and communicates with the liquid supply line 14.
- the lifting rod 12 includes a first lifting rod 121, a second lifting rod 122, and a connecting piece 123 connecting the first lifting rod 121 and the second lifting rod 122.
- the nozzle 13 is disposed at an end of the first lifting rod 121 away from the end of the rail 11 , and the second lifting rod 122 is disposed on the rail 11 , and the first lifting rod 121 is driven relative to the second lifting rod 122 by the rotation of the connecting member 123 . Carry out the lifting movement.
- the lifting rods 12 and the nozzles 13 reference may be made to the corresponding descriptions in the above embodiments, and details are not described herein again.
- the cleaning apparatus in this embodiment further includes an inner head 21 and an outer head 22.
- the inner head 21 is disposed inside the outer head 22, and the nozzle 13 is disposed inside the inner head 21.
- a plurality of first injection holes are provided in the outer spray head 22, and a plurality of second injection holes are provided on the inner spray head 21, and the first spray holes and the second spray holes are not shown in the drawing.
- At least one of the inner spray head 21 and the outer spray head 22 is configured to be rotatable about an axis of the lift rod 12.
- Fig. 2b is an enlarged schematic view of the inner nozzle 21 and the outer nozzle 22 shown in Fig. 2a.
- the inner nozzle 21 and the outer nozzle 22 may be designed to be spherical.
- the disclosure includes, but is not limited to, for example, the inner nozzle 21 and the outer nozzle 22 may also be designed in other shapes such as an ellipsoidal shape.
- the inner nozzle 21 and the outer nozzle 22 are attached to the outside of the nozzle 13, the inner nozzle 21 is disposed outside the nozzle 13, and the outer nozzle 22 is disposed outside the inner nozzle 22, that is, the inner nozzle 21 is disposed inside the outer nozzle 22.
- the nozzle 13 is disposed inside the inner nozzle 21.
- the inner spray head 21 is coupled to the lift rod 12 by a first rotational joint 23 mounted on the top of the lift rod 12, and the outer spray head 22 is coupled to the second rotary joint 24 mounted on the top of the lift rod 12.
- the lifting rods 12 are connected.
- the first rotary joint 23 and the second rotary joint 24 may be in a snap-fit manner and may be driven by a motor, a compressed gas, or the like.
- first rotary joint 23 and the second rotary joint 24 are both rotatable about the lift rod 12 and independent of each other, such that the first rotary joint 23 and the second rotary joint 24
- the inner spray head 21 and the outer spray head 22 can be respectively rotated around the lift rod 12.
- the rotational speeds of the first rotating joint portion 23 and the second rotating joint portion 24 about the lifting rod 12 can be respectively controlled by independent driving, thereby respectively driving the inner spray head 21 and the outer spray head 22 to rotate around the lifting rod 12 at different rotation speeds.
- the relative movement between the inner nozzle 21 and the outer nozzle 22 is achieved.
- first rotation joint portion 23 may be fixed, and the second rotation joint portion 24 is rotated; for example, the second rotation joint portion 24 may be fixed, the first rotation joint portion 23 is rotated; for example, the first rotation joint portion Both the 23 and the second rotary joint 24 rotate and have different rotational speeds.
- the rotation of the first rotating joint and the second rotating joint respectively drives the inner nozzle and the outer nozzle to rotate around the lifting rod, which is configured to surround at least one of the inner nozzle and the outer nozzle in the present disclosure.
- rotation the disclosure includes but is not limited thereto.
- the inner nozzle and the outer nozzle are designed to be opened to expose the inner nozzle and the inner portion of the outer nozzle, for example, the upper and lower portions of the inner nozzle can be unscrewed to facilitate Check and clean the inside of the inner nozzle.
- the upper and lower parts of the outer nozzle can be unscrewed to check and clean the inside of the outer nozzle.
- the inner head 21 has an outwardly convex slider 211 that surrounds the outer surface of the inner nozzle 21 and is perpendicular to the axial direction of the lifting rod 12
- the outer nozzle 22 has an inwardly concave guide groove 221 that surrounds the inner surface of the outer showerhead 22 and is perpendicular to the axial direction of the lifter bar 12.
- the slider 211 is embedded in the guide groove 221 and is configured to be movable relative to the guide groove 221.
- the inner nozzle 21 and the outer nozzle 22 will Do relative movement.
- the slider 211 on the outer surface of the inner head 21 moves along the guide groove 221 of the inner surface of the outer head 22, that is, the slider 211 is embedded in the guide groove 221 and is configured to be movable relative to the guide groove 221.
- the inner and outer nozzles represent the inner nozzle 21 and the outer nozzle 22, and the following embodiments are the same as those in the following, and will not be described again.
- the arrangement pitch of the second injection holes 212 on the inner head 21 and the first injection holes 222 on the outer head 22 are shown.
- the arrangement pitch is different.
- the nozzle holes of the same height of the inner and outer nozzles are divided into two rows and developed on the paper surface, and the upper row is the second nozzle hole 212 of the inner nozzle 21. They are numbered 1, 2, 3...7, respectively, and the lower row is the first orifice 222 of the outer nozzle 22, numbered A, B, C...I, J, respectively.
- the upper and lower rows of nozzles are coincident (that is, when the upper and lower rows of nozzles are shown by hollow circles)
- the nozzles of the inner and outer nozzles are coincident, and the cleaning liquid in the inner nozzle 21 can be sprayed from the outer nozzle.
- the arrangement of the first nozzle hole and the second nozzle hole may satisfy the following principle: the arrangement pitch of the first nozzle hole and the second nozzle hole are different, and the inner and outer nozzles are partially offset during relative movement. That is, when the inner and outer nozzles are in the first position, a part of the first nozzle hole and the second nozzle hole are overlapped, and the other portion is staggered. At this time, the cleaning liquid in the inner nozzle can be ejected from the overlapping nozzle holes. .
- the spray holes which are partially overlapped in the first position are staggered to achieve non-communication, and the original spray holes which are staggered at the first position are coincident at this time, so that the cleaning liquid can be realized. Ejected from the coincident orifices.
- the nozzle holes 1 of the inner nozzle overlap with the nozzle holes A of the outer nozzle, at which time the cleaning liquid is ejected from the nozzle holes A of the outer nozzle, and so on, the nozzle holes 3 And D, 4 and E, 6 and H, 7 and I coincide.
- the cleaning liquid is ejected from the injection holes A, D, E, H, and I of the outer nozzle, respectively, so that the cleaning device can be cleaned.
- the above-mentioned spray holes for discharging the cleaning liquid are arranged at intervals, and it is ensured that the cleaning liquid is ejected in one week of the outer nozzle.
- the angle of the first nozzle hole on the outer nozzle can be designed to be perpendicular to the outer nozzle.
- the cleaning liquid phase ejected from the first nozzle hole can be formed at multiple angles to the device to be cleaned, so that the cleaning liquid can Cleaning is performed on different parts of the cleaning equipment in a larger range to improve the cleaning effect.
- the nozzle holes on the inner and outer nozzles continuously change the overlapping and staggered state, and when the nozzle holes of the inner and outer nozzles coincide, the inner nozzle
- the cleaning liquid will be ejected along the overlapping nozzles.
- the cleaning liquid in the inner nozzle will not be ejected.
- the nozzle holes on the inner and outer nozzles alternate between coincidence and misalignment, and the cleaning liquid in the nozzles is intermittently ejected to achieve intermittent impact on the surface of the device to be cleaned.
- the above method can achieve a certain impact force when the cleaning liquid is sprayed onto the surface of the device to be cleaned, thereby improving the cleaning effect on the surface of the device to be cleaned.
- An embodiment of the present disclosure further provides a cleaning device, as shown in FIG. 4, the cleaning device also includes: a guide rail 11; a lifting rod 12, one end of the lifting rod is disposed on the rail 11 and movable along the rail 11;
- the line 14, the liquid supply line 14 is disposed inside the lifting rod 12, and the nozzle 13 is disposed at an end of the lifting rod 12 away from the end of the rail 11 and communicates with the liquid supply line 14.
- the lifting rod 12 includes a first lifting rod 121, a second lifting rod 122, and a connecting piece 123 connecting the first lifting rod 121 and the second lifting rod 122.
- the nozzle 13 is disposed at an end of the first lifting rod 121 away from the end of the rail 11 , and the second lifting rod 122 is disposed on the rail 11 , and the first lifting rod 121 is driven relative to the second lifting rod 122 by the rotation of the connecting member 123 . Carry out the lifting movement.
- the lifting rods 12 and the nozzles 13 reference may be made to the corresponding descriptions in the above embodiments, and details are not described herein again.
- the cleaning device may further include a strut 32 connected to one end of the lifting rod 12 near the guide rail 11 and a multi-pass valve connected to one end of the strut 32 away from the lifting rod 12, such as a multi-pass solenoid valve. 31.
- the struts 32 extend, for example, laterally, but are not limited thereto.
- the supply line 14 extends from the lift rod 12 into the strut 32 and is in communication with the multi-pass solenoid valve 31.
- the multi-pass valve such as multi-way solenoid valve 31, can control the conduction and the cut-off of the plurality of passages, respectively.
- one end of the multi-way solenoid valve 31 is in communication with the liquid supply line 14 in the strut 32, and the other end is in communication with the external line 33, which includes, but is not limited to, a pure water line 331. , The cleaning liquid line 332, the compressed gas line 333, and the like.
- the number of external pipes 33 can be set as needed, and is not limited to the three shown in FIG.
- the other ends of the above three external conduits are respectively in communication with respective conduits of the power end, not shown.
- the multi-way solenoid valve is controlled to be connected to the cleaning liquid line, and the cleaning liquid reaches the nozzle through the liquid supply line in the strut and the lifting rod, and then is ejected through the nozzle hole on the inner and outer nozzles. , to clean the equipment to be cleaned.
- the multi-pass solenoid valve is controlled to be connected to the pure water pipeline, and the cleaning device is further washed.
- the compressed gas pipeline can be simultaneously connected with the cleaning liquid pipeline or the pure water pipeline to wash the cleaning equipment, and the gas-liquid mixed fluid formed by the method is formed. Can achieve better cleaning results.
- the above cleaning method is only an example, and embodiments of the present disclosure include but are not limited thereto, and the cleaning manner may be combined as needed.
- the cleaning solution cleaning and the pure water cleaning can be alternated several times to achieve a better cleaning effect.
- the external pipeline is supplied with a high pressure (0.3 MPa or more).
- a high pressure 0.3 MPa or more.
- an adjustable pressure valve may be provided between the external pipeline and the multi-pass solenoid valve to adjust the pressure of the liquid or gas supplied from the power end to achieve Better cleaning results.
- the cleaning device needs to move along the guide rail during the working process, and the three external pipelines connected with the multi-pass solenoid valve, that is, the pure water pipeline, the cleaning fluid pipeline, and the compressed gas pipeline also follow Move.
- a structure for moving it such as a tank chain, may be provided at three outer pipes, thereby facilitating the movement of the external pipe on the one hand and the bending damage when the external pipe is moved on the other hand.
- the cleaning device switches the one or the plurality of external pipes simultaneously by controlling the multi-pass solenoid valve at different time periods of the cleaning process to select different cleaning modes to clean the cleaning device.
- Different cleaning methods share a set of liquid supply lines and nozzles to clean the equipment to be cleaned.
- An embodiment of the present disclosure further provides a cleaning device, as shown in FIG. 5, the cleaning device also includes: a guide rail 11; a lifting rod 12, one end of the lifting rod is disposed on the guide rail 11 and movable along the guide rail 11;
- the line 14, the liquid supply line 14 is disposed inside the lifting rod 12, and the nozzle 13 is disposed at an end of the lifting rod 12 away from the end of the rail 11 and communicates with the liquid supply line 14.
- the lifting rod 12 includes a first lifting rod 121, a second lifting rod 122, and a connection first lifting A connecting member 123 of the rod 121 and the second lifting rod 122.
- the nozzle 13 is disposed at an end of the first lifting rod 121 away from the end of the rail 11 , and the second lifting rod 122 is disposed on the rail 11 , and the first lifting rod 121 is driven relative to the second lifting rod 122 by the rotation of the connecting member 123 . Carry out the lifting movement.
- the lifting rods 12 and the nozzles 13 reference may be made to the corresponding descriptions in the above embodiments, and details are not described herein again.
- the cleaning device provided in this embodiment differs from the cleaning device provided in the above embodiment in that the cleaning device includes a plurality of sub-guide rails disposed in parallel and a support frame disposed on the rail and movable along the rail.
- the cleaning device includes two sub-guide rails disposed in parallel, which are a first sub-guide rail 111 and a second sub-guide rail 112, respectively. Both ends of the support frame 15 are respectively connected to the two sub-rails, and the support frame 15 is movable along the guide rail 11.
- the lifting rod 12 is supported on the support frame 15, and the support frame 15 can drive the lifting rod 12 to move along the guide rail 11.
- the above-described two sub-guides are disposed in parallel, which is an example of the guide rail including a plurality of sub-guides arranged in parallel in the present disclosure, and the present disclosure includes but is not limited thereto.
- two sub-rails are arranged in parallel and a support frame is mounted on the two sub-rails, and the support frame can be moved along the guide rails.
- the lifting rod is supported on the support frame and can be moved along the guide rail by the support frame.
- the cleaning device may further include a liquid guiding groove 41 disposed between the first sub-guide rail 111 and the second sub-guide rail 112, for example, the liquid guiding groove 41 is disposed.
- the inclination angle is set to 5°, and for example, the inclination angle is set to 10°, and for example, the inclination angle is set to any angle between 5° and 10°.
- a drain line is provided at a lower end of the liquid guiding tank 41, which is not shown.
- an inclined liquid guiding groove is disposed between the sub-rails, and the liquid such as the cleaning liquid dropped into the liquid guiding tank can be drained from the liquid discharging line in time to avoid cleaning the liquid droplets. Falling below the cleaning device creates contamination.
- An embodiment of the present disclosure further provides a cleaning device, as shown in FIG. 6a, the cleaning device includes two sub-guide rails disposed in parallel, which are a first sub-guide rail 111 and a second sub-guide rail 112, respectively. Both ends of the support frame 15 are respectively connected to the two sub-rails, and the support frame 15 is movable along the guide rails. Rise The lowering rod 12 is supported on the support frame 15, and the support frame 15 can drive the lifting rod 12 to move along the guide rail.
- the cleaning device includes a liquid supply line 14 disposed inside the lifting rod 12, and a nozzle 13 disposed at an end of the lifting rod 12 away from the end of the guide rail 11 and communicating with the liquid supply line 14.
- the lifting rod 12 includes a first lifting rod 121, a second lifting rod 122, and a connecting piece 123 connecting the first lifting rod 121 and the second lifting rod 122.
- the nozzle 13 is disposed at an end of the first lifting rod 121 away from the end of the rail 11
- the second lifting rod 122 is disposed on the rail 11
- the first lifting rod 121 is driven relative to the second lifting rod 122 by the rotation of the connecting member 123 . Carry out the lifting movement.
- the cleaning apparatus further includes an inner spray head 21 and an outer spray head 22.
- the inner nozzle 21 is disposed inside the outer nozzle 22, and the nozzle 13 is disposed inside the inner nozzle 21.
- a plurality of first injection holes 222 are provided in the outer head 22, and a plurality of second injection holes 212 are provided in the inner head 21.
- At least one of the inner spray head 21 and the outer spray head 22 is configured to be rotatable about the lift rod 12.
- the arrangement pitch of the second injection holes 212 on the inner head 21 is different from the arrangement pitch of the first nozzle holes 222 on the outer head 22.
- the inner nozzle 21 has an outwardly convex slider 211 disposed on an outer surface of the inner nozzle 21 and perpendicular to the axial direction of the lifting rod 12, and the outer nozzle 22 has an inner surface surrounding the outer nozzle 22 and perpendicular to the lifting rod A 12-axis inwardly concave guide groove 221, wherein the slider 211 is configured to be embedded in the guide groove 221 to move relative to the guide groove 221.
- the cleaning device further includes a strut 32 connected to one end of the elevating rod 12 adjacent to the guide rail 11, and a multi-pass solenoid valve 31 connected to one end of the strut 32 away from the elevating rod 12.
- the supply line 14 extends from the lift rod 12 into the strut and is in communication with the multi-pass solenoid valve 31.
- the external line 33 includes, but is not limited to, a pure water line 331, a cleaning liquid line 332, and compression. Air line 333.
- Figure 6b is a side elevational view of Figure 6a.
- the cleaning device further includes a liquid guiding groove 41 disposed between the first sub-guide rail 111 and the second sub-guide rail 112, and the liquid guiding groove 41 is disposed to be inclined, for example, an inclination angle.
- a drain line 43 is provided at a lower end of the liquid guiding tank 41.
- An inclined liquid guiding groove is arranged between the sub-rails, and the cleaning liquid dripping into the liquid guiding tank can be drained away from the liquid discharging line in time, thereby preventing the cleaning droplets from falling below the cleaning device and causing pollution.
- the cleaning device may further include a distance measuring device disposed on the guide rail 11, such as a laser ranging unit 42, and the laser ranging unit 42 may be disposed in the first sub- Any end of the rail or the second sub-guide.
- the laser ranging unit 42 may be disposed in the first sub- Any end of the rail or the second sub-guide.
- it is disposed at one end of the first sub-rail, and is, for example, disposed at one end of the second sub-rail.
- the distance by which the cleaning device moves along the guide rail can be precisely controlled by the laser ranging unit 42 disposed on the guide rail, so that precise positioning of the cleaning device can be achieved.
- control support frame 15 drives the inner and outer nozzles on the lifting rod 12 to move along the guide rail 11 to a designated position, and controls the rotation of the connecting member 123 to raise or lower the inner and outer nozzles to a specified height.
- the multi-way solenoid valve 31 is controlled to be turned on one or the plurality of external lines 33 are simultaneously turned on, and the liquid, gas or gas-liquid mixed fluid in the connected external line 33 is passed through the liquid supply line 14 and the nozzle 13 to reach the inside. In the nozzle 21 .
- the relative movement of the inner nozzle 21 and the outer nozzle 22 and the arrangement of the nozzle holes on the inner and outer nozzles enable intermittent discharge of liquid, gas or gas-liquid mixed fluid in the inner nozzle 21, thereby cleaning the surface of the device. Perform intermittent cleaning.
- the position and height of the internal and external nozzles can be adjusted at any time to achieve cleaning at different locations of the equipment to be cleaned.
- the multi-way solenoid valve 31 can be controlled at any time to select an external pipe 33 that can be connected, that is, a different cleaning mode is selected to clean the cleaning device.
- the supply line 14 includes a section of hose 44 that is designed to be coiled and that is located in the second lifter 122.
- the connecting member 123 rotates to drive the first lifting rod 121 to rise or fall relative to the second lifting rod 122.
- the hose 44 located in the second lifting rod 122 follows The rotation of the connecting member 123 is elongated or contracted in a spiral shape. In this manner, when the first lifting rod 121 rises or falls, the liquid supply line 14 also rises or falls, and the spirally rising or falling can avoid the bending of the liquid supply line 14, and the liquid supply line 14 is extended. The service life.
- the position of the hose 44 in the liquid supply line 14 is not limited thereto.
- the hose 44 may also be disposed in the first lifting rod 121.
- the hose 44 may also be disposed on the first lifting rod at the same time. 121 and the second lifting rod 122.
- An embodiment of the present disclosure also provides a cleaning apparatus comprising the cleaning apparatus of any of the above embodiments.
- the cleaning apparatus further includes a working chamber, such as a developing chamber 5.
- a working chamber such as a developing chamber 5.
- An opening is provided in the developing chamber bottom plate 51, and the opening may allow the cleaning device 1 to pass through at least partially into the developing chamber 5, and a baffle 52 is provided at the opening to open or close the opening.
- developing chamber is an example of a working chamber in the present disclosure, and the present disclosure includes but is not limited thereto.
- a baffle 52 is designed on the developing chamber floor 51.
- the baffle 52 is opened, and the opening gap is sufficient for the outer nozzle to pass, and then, The baffles 52 are close to each other, and the opening gap of the developing chamber bottom plate 51 is reduced, and the elevating rod can be freely raised and lowered. In this manner, the amount of the cleaning liquid dropped to the lower side of the developing chamber floor 51 during the cleaning process can be reduced.
- a liquid guiding groove 41 is disposed between the sub-rails of the cleaning device 1, and the width of the liquid guiding groove 41 is larger than the opening width of the baffle 52 to ensure opening from the baffle 52.
- the cleaning liquid dripped by the gap can be dropped into the liquid guiding tank 41.
- the cleaning device further comprises at least one external line 33 connected to the washing device 1, for example by means of a multi-pass valve, in communication with the supply line in the washing device 1.
- the external line 33 includes, but is not limited to, a pure water line 331, a cleaning liquid line 332, a compressed gas line 333, and the like.
- the number of the external pipes 33 may be set as needed, but is not limited thereto; for example, the other ends of the above three external pipes are respectively connected to the respective pipes of the power end, not shown.
- the baffle 52 is opened, and the lifting rod of the cleaning device 1 is raised, and the inner and outer nozzles are raised to the upper side of the developing chamber bottom plate 51, that is, the inside of the developing chamber 5, to clean the equipment to be cleaned inside the developing chamber 5. .
- the lifting rod of the cleaning device 1 is lowered, and the inner and outer nozzles are lowered to the lower side of the developing chamber bottom plate 51.
- the shutter 52 is closed, and the cleaning device 1 is separated from the developing chamber 5, and is relatively independent, and does not affect the developing chamber. 5 of normal work. Cleaning device
- For a specific workflow refer to the corresponding description in the foregoing embodiment, and details are not described herein again.
- a roller 53 and a roller support lever 54 may be disposed in the developing chamber 5.
- the figure shows four rows of rollers, and the cleaning device 1 is disposed between every two rows of rollers of the developing chamber 5.
- the number of the cleaning devices 1 can be set in accordance with the space of the developing chamber 5 and the distance in which the cleaning device 1 is cleaned to ensure that the entire developing chamber 5 can be cleaned.
- the cleaning apparatus may further include a control system.
- the control system can control the actions of all units of the cleaning device, for example, controlling the movement of the cleaning device and the angle of rotation of the connector, for example, controlling the multi-way solenoid valve to effect communication of one or more external lines, for example, controlling the inner and outer nozzles Relative to the rotational speed of the lifting rod, for example, the opening or closing of the control flap is controlled. All of the above control actions can be realized by operating a button designed on the operation panel, thereby improving the handling convenience of the cleaning device.
- the height at which the lifting rod rises or falls is controlled by the above control system.
- the relationship between the angle of rotation of the connecting member and the height at which the lifting rod is raised or lowered can be pre-designed by the program.
- the control system automatically converts the specific angle value that the connector needs to rotate clockwise or counterclockwise, thereby controlling the rotation of the connecting member, and finally achieving the height of the lifting rod rising or falling.
- the control system may include, for example, a processor and a storage medium having stored thereon a computer executable program that, when executed by the processor, can control a corresponding input/output device for data acquisition, component operation , data output, etc.
- At least one embodiment of the present disclosure provides a cleaning apparatus and a cleaning apparatus including the same, the cleaning apparatus and the cleaning apparatus including the cleaning apparatus can achieve at least one of the following effects:
- the cleaning device provided by at least one embodiment of the present disclosure can perform cleaning at different positions and different heights of the device to be cleaned.
- the cleaning device provided by at least one embodiment of the present disclosure can realize intermittent cleaning of the device to be cleaned, so that the cleaning liquid sprayed onto the surface of the device to be cleaned has a certain impact force and improves the cleaning effect.
- the cleaning device provided by at least one embodiment of the present disclosure can realize different cleaning periods in different periods of the cleaning process, and share a set of liquid supply lines and nozzles to clean the cleaning equipment.
- the cleaning device provided by at least one embodiment of the present disclosure can achieve precise control of the cleaning position and the cleaning height.
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- Environmental & Geological Engineering (AREA)
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- Cleaning By Liquid Or Steam (AREA)
- Cleaning In General (AREA)
Abstract
一种清洗装置(1)及清洗设备。该清洗装置(1)包括:导轨(11)、一端设置在导轨(11)上且可沿导轨(11)移动的升降杆(12)、设置在升降杆(12)内部的供液管路(14)以及设置在升降杆(12)远离导轨(11)的一端的端部且与供液管路(14)连通的喷嘴(13)。升降杆(12)配置为可使喷嘴(13)远离或靠近导轨(11)。该清洗装置可以实现在不同位置和不同高度对待清洗设备进行清洗,从而可以减少人力、提高清洗效率。
Description
本申请要求于2017年5月12日递交的中国专利申请第201720536401.8号的优先权,在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。
本公开的至少一个实施例涉及一种清洗装置及清洗设备。
在液晶显示器的彩膜基板的制备过程中,要多次使用光刻工艺,每次光刻工艺主要包括以下工序:涂布、曝光、显影等。显影的作用主要是利用药液将基板上未被曝光部分的光刻胶清洗掉。清洗后的废液中含有大量的光刻胶成分,生产一段时间后,上述从基板上清洗掉的光刻胶会残留、累积在显影腔室的部件上,造成对相应位置的污染,严重时则会影响生产产品的品质。
上述显影腔室每生产一段时间后就需要对其进行清洗作业。为了满足对显影工艺的要求,显影设备由很多显影腔室组成,故上述需清洗的显影腔室较多。同时,显影腔室内的构造复杂,空间狭窄,人员进行清洗作业时较为困难,作业时间长,需要的人力较多,且清洗效果不理想。
发明内容
本公开至少一实施例提供一种清洗装置及清洗设备。
本公开至少一实施例提供一种清洗装置,包括:导轨;升降杆,所述升降杆的一端设置在所述导轨上且可沿所述导轨移动;供液管路,所述供液管路设置在所述升降杆内部;以及喷嘴,所述喷嘴设置在所述升降杆远离所述导轨的一端的端部且与所述供液管路连通;其中,所述升降杆配置为可使所述喷嘴远离或靠近所述导轨。
例如,在本公开一实施例提供的清洗装置中,所述升降杆包括第一升降杆、第二升降杆以及连接所述第一升降杆和所述第二升降杆的连接件;
所述第一升降杆的端部设置有所述喷嘴,所述第二升降杆设置在所述导轨上,且所述第一升降杆可相对于所述第二升降杆进行升降运动。
例如,在本公开一实施例提供的清洗装置中,所述连接件配置为可旋转从而驱动所述第一升降杆相对于所述第二升降杆进行升降运动。
例如,本公开一实施例提供的清洗装置还包括内喷头和外喷头。其中,所述内喷头设置在所述外喷头内部,所述喷嘴设置在所述内喷头内部;在所述外喷头上设置有多个第一喷孔,在所述内喷头上设置有多个第二喷孔;所述内喷头和外喷头中至少之一配置为可围绕所述升降杆旋转。
例如,在本公开一实施例提供的清洗装置中,所述内喷头上的第二喷孔的排布节距和所述外喷头上的第一喷孔的排布节距不同。
例如,在本公开一实施例提供的清洗装置中,所述内喷头具有环绕设置在所述内喷头外表面上且垂直于所述升降杆轴向的向外凸的滑块,以及所述外喷头具有环绕设置在所述外喷头内表面上且垂直于所述升降杆轴向的向内凹的导槽,其中,所述滑块嵌入在所述导槽内且配置为可相对于所述导槽移动。
例如,本公开一实施例提供的清洗装置还包括设置在所述升降杆靠近所述导轨的一端的多通阀门,其中,所述多通阀门靠近所述升降杆的一端和所述供液管路连通。
例如,本公开一实施例提供的清洗装置还包括与所述升降杆靠近所述导轨的一端连接的支杆,其中,所述多通阀门与所述支杆远离所述升降杆的一端连接。
例如,本公开一实施例提供的清洗装置还包括设置在所述导轨上的激光测距单元。
例如,本公开一实施例提供的清洗装置还包括设置在所述导轨上且可沿导轨移动的支撑架,其中,所述导轨包括多个平行设置的子导轨,所述升降杆支撑在所述支撑架上。
例如,本公开一实施例提供的清洗装置还包括设置在所述子导轨之间的导液槽,其中,所述导液槽设置为倾斜式的。
本公开至少一个实施例还提供一种清洗设备,包括本公开任一实施例所述的清洗装置。
例如,本公开一实施例提供的清洗设备还包括工作室,其中,所述工
作室的壁上设置有开口,所述开口可允许所述清洗装置通过以至少部分进入到所述工作室内。
例如,在本公开一实施例提供的清洗设备中,还包括挡板,其中,所述挡板设置在所述开口处以打开或关闭所述开口。
例如,本公开一实施例提供的清洗设备还包括至少一个外部管路,其中,所述外部管路连接到所述清洗装置。
为了更清楚地说明本公开实施例的技术方案,下面将对实施例的附图作简单地介绍,显而易见地,下面描述中的附图仅仅涉及本公开的一些实施例,而非对本公开的限制。
图1a为本公开一实施例提供的清洗装置的剖面示意图;
图1b为图1a中所示清洗装置在第一升降杆下降时的剖面示意图;
图2a为本公开另一实施例提供的清洗装置的剖面示意图;
图2b为内喷头和外喷头的放大示意图;
图3a为第一喷孔和第二喷孔在第一位置时的相对位置示意图;
图3b为第一喷孔和第二喷孔在第二位置时的相对位置示意图;
图3c为第一喷孔和第二喷孔在第三位置时的相对位置示意图;
图4为本公开另一实施例提供的清洗装置的剖面示意图;
图5为本公开另一实施例提供的清洗装置的剖面示意图;
图6a为本公开另一实施例提供的清洗装置的剖面示意图;
图6b为图6a的侧视剖面示意图;
图6c为本公开另一实施例提供的清洗装置的剖面示意图;
图7a为本公开一实施例提供的清洗设备在非工作状态时的示意图;
图7b为本公开一实施例提供的清洗设备在工作状态时的示意图;以及
图8为本公开一实施例提供的清洗装置在显影腔室中的示意图。
为使本公开实施例的目的、技术方案和优点更加清楚,下面将结合本公开实施例的附图,对本公开实施例的技术方案进行清楚、完整地描述。
显然,所描述的实施例是本公开的一部分实施例,而不是全部的实施例。基于所描述的本公开的实施例,本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例,都属于本公开保护的范围。
除非另外定义,本公开使用的技术术语或者科学术语应当为本公开所属领域内具有一般技能的人士所理解的通常意义。本公开中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性,而只是用来区分不同的组成部分。同样,“一个”、“一”或者“该”等类似词语也不表示数量限制,而是表示存在至少一个。“包括”或者“包含”等类似的词语意指出现该词前面的元件或者物件涵盖出现在该词后面列举的元件或者物件及其等同,而不排除其他元件或者物件。“连接”或者“相连”等类似的词语并非限定于物理的或者机械的连接,而是可以包括电性的连接,不管是直接的还是间接的。“上”、“下”、“左”、“右”等仅用于表示相对位置关系,当被描述对象的绝对位置改变后,则该相对位置关系也可能相应地改变。
本公开至少一实施例提供一种清洗装置以及包括该清洗装置的清洗设备。该清洗装置包括:导轨、一端设置在导轨上且可沿导轨移动的升降杆、设置在升降杆内部的供液管路以及设置在升降杆远离导轨的一端的端部且与供液管路连通的喷嘴。该升降杆配置为可使喷嘴远离或靠近导轨。
该清洗装置可以实现在不同位置和不同高度对待清洗设备进行清洗,从而可以减少人力、提高清洗效率。
下面结合附图对本公开的实施例及其示例进行详细说明。
本公开至少一个实施例提供一种清洗装置,如图1a所示,该清洗装置包括:导轨11;升降杆12,升降杆的一端设置在导轨11上且可沿导轨11移动;供液管路14,供液管路14设置在升降杆12内部;以及喷嘴13,喷嘴13设置在升降杆12远离导轨11的一端的端部且与供液管路14连通。升降杆12配置为可使喷嘴13远离或靠近导轨11。
例如,如图1a所示,清洗装置的最下方设置有导轨11,升降杆12的一端设置在导轨11上且可沿导轨11的轨道延伸方向移动。需要说明的是,导轨11的轨道延伸方向可以根据待清洗设备的构造进行设置,导轨11可以包括各种适用的类型。本公开的实施例对导轨11的类型不作限制,以下各实施例与此相同,不再赘述。
例如,如图1a所示,在升降杆12的内部可以设置有至少一个供液管路14,在升降杆12远离导轨11的一端的端部设置有喷嘴13,喷嘴13的底部与供液管路14连通。需要说明的是,图1a中仅示出了一个供液管路14,本公开的实施例对设置的供液管路14的个数不作限定,例如还可以设置两个、三个或更多个供液管路。
在本公开的实施例提供的清洗装置中,如图1a所示,喷嘴13可以设计为柱形,当然本公开包括但并不限于此,例如,喷嘴13还可以设计为球形等其他形状。喷嘴13上设置有多个开孔,图中未示出,例如,多个开孔可均匀分布在喷嘴13上。例如,喷嘴13可采用耐磨的陶瓷材料等,但本公开的实施例不限于此。
在本公开的实施例提供的清洗装置中,如图1a所示,喷嘴13中的清洗液由升降杆12中的供液管路14供给,然后经由喷嘴上的多个开孔喷出。通过升降杆12在导轨11上的移动可以带动喷嘴13移动,同时升降杆12还可以在其轴向方向上升降,由此可以实现在不同位置和不同高度对待清洗设备进行清洗。
在本实施例的一个示例中,如图1a所示,升降杆12可以包括第一升降杆121、第二升降杆122以及连接第一升降杆121和第二升降杆122的连接件123。喷嘴13设置在第一升降杆121远离导轨11的一端的端部,第二升降杆122设置在导轨11上,第一升降杆121可相对于第二升降杆122进行升降运动,即升降杆12配置为可使喷嘴13远离或靠近导轨11。
例如,如图1a所示,可以通过连接件123的旋转从而驱动第一升降杆121相对于第二升降杆122进行升降运动,例如连接件123和第一升降杆121构成螺旋副,例如连接件123可以被机械驱动或电机驱动。例如,连接件123顺时针旋转时,驱动第一升降杆相对于第二升降杆上升以使喷嘴13远离导轨11,例如,连接件123逆时针旋转时,驱动第一升降杆相对于第二升降杆下降以使喷嘴13靠近导轨11,图1b所示即为第一升降杆121相对于第二升降杆122下降时的示意图。
当然,上述描述的通过连接件的旋转驱动第一升降杆相对于第二升降杆进行升降运动,是本公开中升降杆配置为可使喷嘴远离或靠近导轨的一种示例,本公开包括但不限于此。例如,升降杆还可以设置为伸缩式的,通过升降杆的伸缩使喷嘴远离或靠近导轨。
在本公开的实施例中,通过升降杆在导轨上的移动带动喷嘴移动,从而实现在不同位置对待清洗设备的清洗。通过第一升降杆相对于第二升降杆进行升降运动使喷嘴远离或靠近导轨,从而实现喷嘴在不同高度对待清洗设备的清洗。
本公开的一个实施例还提供一种清洗装置,如图2a所示,该清洗装置同样包括:导轨11;升降杆12,升降杆的一端设置在导轨11上且可沿导轨11移动;供液管路14,供液管路14设置在升降杆12内部;以及喷嘴13,喷嘴13设置在升降杆12远离导轨11的一端的端部且与供液管路14连通。升降杆12包括第一升降杆121、第二升降杆122以及连接第一升降杆121和第二升降杆122的连接件123。喷嘴13设置在第一升降杆121远离导轨11的一端的端部,第二升降杆122设置在导轨11上,可通过连接件123的旋转从而驱动第一升降杆121相对于第二升降杆122进行升降运动。有关导轨11、升降杆12以及喷嘴13可参见上述实施例中的相应描述,在此不再赘述。
例如,如图2a所示,本实施例中的清洗装置还包括内喷头21和外喷头22。内喷头21设置在外喷头22内部,喷嘴13设置在内喷头21内部。在外喷头22上设置有多个第一喷孔,在内喷头21上设置有多个第二喷孔,第一喷孔和第二喷孔在图中未示出。内喷头21和外喷头22中至少之一配置为可围绕升降杆12的轴线旋转。
例如,如图2b所示,图2b为图2a中所示内喷头21和外喷头22的放大示意图。内喷头21和外喷头22可以设计为球形,本公开包括但并不限于此,例如,内喷头21和外喷头22还可以设计为椭球形等其他形状。
例如,如图2b所示,在喷嘴13外侧安装内喷头21和外喷头22,内喷头21罩在喷嘴13外侧,外喷头22罩在内喷头22外侧,即内喷头21设置在外喷头22内部,喷嘴13设置在内喷头21内部。
例如,如图2a和图2b所示,内喷头21通过升降杆12顶部安装的第一旋转结合部23与升降杆12连接,外喷头22通过升降杆12顶部安装的第二旋转结合部24与升降杆12连接。例如,第一旋转结合部23和第二旋转结合部24可以为卡接方式,并且可通过电机、压缩气体等方式驱动。
在一个示例中,第一旋转结合部23和第二旋转结合部24均可围绕升降杆12旋转且彼此独立,从而第一旋转结合部23和第二旋转结合部24
可分别带动内喷头21和外喷头22围绕升降杆12旋转。例如,可通过独立的驱动分别控制第一旋转结合部23和第二旋转结合部24围绕升降杆12旋转的转速,从而分别带动内喷头21和外喷头22以不同的转速围绕升降杆12旋转,进而实现内喷头21和外喷头22之间的相对运动。例如,第一旋转结合部23可以固定不动,第二旋转结合部24旋转;例如,第二旋转结合部24可以固定不动,第一旋转结合部23旋转;又例如,第一旋转结合部23和第二旋转结合部24均旋转,且转速不同。
当然,上述描述的通过第一旋转结合部和第二旋转结合部的旋转分别带动内喷头和外喷头围绕升降杆旋转,是本公开中内喷头和外喷头中至少之一配置为可围绕升降杆旋转的一种具体示例,本公开包括但不限于此。
在本公开的实施例提供的清洗装置中,为便于装置维护,内喷头和外喷头均设计成可打开以暴露内喷头和外喷头内部的方式,例如,内喷头的上下部分可拧下以便于检查和清洗内喷头内部,外喷头的上下部分可拧下以便于检查和清洗外喷头内部。
例如,在本实施例的一个示例中,如图2b所示,内喷头21具有环绕设置在内喷头21外表面上且垂直于升降杆12的轴向的向外凸的滑块211,外喷头22具有环绕设置外喷头22内表面上且垂直于所述升降杆12轴向的向内凹的导槽221,滑块211嵌入在导槽221内且配置为可相对于导槽221移动。
例如,如图2a和图2b所示,当升降杆12上的第一旋转结合部23和第二旋转结合部24以不同的转速围绕升降杆12转动时,内喷头21和外喷头22则会做相对运动。此时,内喷头21外表面上的滑块211即会沿着外喷头22内表面的导槽221移动,即滑块211嵌入在导槽221内且配置为可相对于导槽221移动。通过设置滑块211和导槽221,可以提高内喷头21和外喷头22在相对运动过程中的稳定性,从而避免内外喷头在相对高速运动时造成位置偏差。
需要说明的是,本公开的各实施例中,内外喷头表示内喷头21和外喷头22,以下各实施例与此相同,不再赘述。
例如,在本实施例的另一个示例中,如图3a、图3b和图3c所示,内喷头21上的第二喷孔212的排布节距和外喷头22上的第一喷孔222的排布节距不同。
例如,如图3a、图3b和图3c所示,为了便于说明,将内外喷头同一高度的喷孔分成两排且展开在纸面上进行描述,上排为内喷头21的第二喷孔212,分别编号为1,2,3…7,下排为外喷头22的第一喷孔222,分别编号为A,B,C…I,J。当上下两排喷孔重合时(即图中上下两排喷孔用空心圆示出时),表示内外喷头的喷孔是重合的,此时内喷头21中的清洗液可以由外喷头中喷出以实现对待清洗设备的清洗;当上下两排喷孔错开时(即图中上下两排喷孔用实心圆示出时),表示内外喷头的喷孔是不重合的,此时内喷头21中的清洗液不能由外喷头中喷出,无法对待清洗设备进行清洗。
例如,第一喷孔和第二喷孔的排布可以满足以下原则:第一喷孔和第二喷孔的排布节距不同,且当内外喷头在相对运动过程中实现部分错开。即当内外喷头在第一位置时第一喷孔和第二喷孔中一部分是重合的,而另一部分则是错开的,此时可实现内喷头里的清洗液从上述重合的喷孔喷出。当内外喷头相对运动到第二外置时,原来在第一位置时部分重合的喷孔错开,实现不连通,而原来在第一位置错开的喷孔此时是重合的,则可实现清洗液从重合的喷孔处喷出。具体说明如下。
当内外喷头在图3a所示的第一位置时,内喷头的喷孔1与外喷头的喷孔A重合,此时清洗液由外喷头的喷孔A喷出,以此类推,喷孔3和D、4和E、6和H、7和I重合。此时清洗液分别从外喷头的喷孔A、D、E、H、I中喷出,从而可以对待清洗设备进行清洗。
当内外喷头发生相对运动时,为便于说明,假设内喷头不动,外喷头相对内喷头向左运动。当内外喷头在图3b所示的第二位置时,喷孔1和B、2和C、4和F、5和G、7和J重合,此时清洗液分别从外喷头的喷孔B、C、F、G、J中喷出,从而可以对待清洗设备进行清洗。
当内外喷头在图3c所示的第三位置时,喷孔2和D、3和E、5和H、6和I重合,此时清洗液分别从外喷头的喷孔D、E、H、I中喷出,从而可以对待清洗设备进行清洗。
采用上述第一喷孔和第二喷孔的排布方式,可以在内外喷头相对运动的过程中,实现外喷头中部分的喷孔有清洗液喷出,从而对待清洗设备进行清洗。且上述可喷出清洗液的喷孔间隔排布,可以确保外喷头的一周都有清洗液喷出。
例如,外喷头上的第一喷孔的角度可以设计成与外喷头垂直,采用此方式可实现从第一喷孔喷出的清洗液相对于待清洗设备成多个角度,从而使清洗液能在较大范围对待清洗设备的不同部位进行清洗,从而提高清洗效果。
通过上述第一喷孔和第二喷孔位置的排布方式,当内外喷头相对运动时,内外喷头上的喷孔不断变换重合和错开的状态,当内外喷头的喷孔重合时,内喷头中的清洗液则会沿重合的喷孔喷出,当内外喷头的喷孔错开时,内喷头里的清洗液则不会喷出。当上述内外喷头快速相对运动时,内外喷头上的喷孔在重合与错开之间相互交替,此时内喷头中的清洗液即会间断性地喷出,以实现对待清洗设备表面间断性的冲击清洗。采用上述方式可实现清洗液喷到待清洗设备表面时有一定的冲击力,从而可提高对待清洗设备表面的清洗效果。
本实施例中其他部分的技术效果可以参见上述实施例中的相应描述,在此不再赘述。
本公开的一个实施例还提供一种清洗装置,如图4所示,该清洗装置同样包括:导轨11;升降杆12,升降杆的一端设置在导轨11上且可沿导轨11移动;供液管路14,供液管路14设置在升降杆12内部;以及喷嘴13,喷嘴13设置在升降杆12远离导轨11的一端的端部且与供液管路14连通。升降杆12包括第一升降杆121、第二升降杆122以及连接第一升降杆121和第二升降杆122的连接件123。喷嘴13设置在第一升降杆121远离导轨11的一端的端部,第二升降杆122设置在导轨11上,可以通过连接件123的旋转从而驱动第一升降杆121相对于第二升降杆122进行升降运动。有关导轨11、升降杆12以及喷嘴13可参见上述实施例中的相应描述,在此不再赘述。
例如,如图4所示,该清洗装置还可以包括与升降杆12靠近导轨11的一端连接的支杆32以及与支杆32远离升降杆12的一端连接的多通阀门,例如多通电磁阀31。该支杆32例如横向延伸,但不限于此。供液管路14从升降杆12中延伸至支杆32中并与多通电磁阀31连通。该例如多通电磁阀31的多通阀门可以对多个通路的导通和截止分别进行控制。
例如,如图4所示,多通电磁阀31的一端与支杆32中的供液管路14连通,另一端与外部管路33连通,外部管路33包括但不限于纯水管路331、
清洗液管路332、压缩气体管路333等。例如,外部管路33的个数可以根据需要进行设置,不限于图4中所示的三个。例如,上述三个外部管路的另一端分别与动力端的相应管路连通,图中未示出。
例如,当需要对待清洗设备清洗时,控制多通电磁阀接通清洗液管路,清洗液经由支杆和升降杆中的供液管路到达喷嘴,然后再经由内外喷头上的喷孔喷出,以对待清洗设备进行清洗。清洗结束后,控制多通电磁阀接通纯水管路,对待清洗设备进一步冲洗。上述接通清洗液管路和纯水管路进行清洗时,均可同时接通压缩气体管路与清洗液管路或纯水管路混合对待清洗设备进行清洗,此方式形成的气液混合流体可达到更好的清洗效果。
需要说明的是,上述清洗方式只是一种示例,本公开的实施例包括但并不限于此,清洗方式可以根据需要进行组合。例如,可以将清洗液清洗和纯水清洗多次交替进行,以达到更好的清洗效果。
例如,外部管路为高压(0.3MPa以上)供给,例如可以在外部管路与多通电磁阀之间设置一个可调节的压力阀门,以调节由动力端供给的液体或气体的压力,以达到更好的清洗效果。
在本公开的实施例中,清洗装置在工作过程中需沿导轨移动,则上述与多通电磁阀连接的三条外部管路即纯水管路、清洗液管路以及压缩气体管路也会随之移动。例如,可在三条外部管路处设置供其移动的结构,例如坦克链等结构,由此一方面可以便于外部管路移动,另一方面可以避免外部管路移动时发生弯折损坏。
在本公开的实施例中,清洗装置在清洗过程的不同时间段,通过控制多通电磁阀接通一个或同时接通多个外部管路,以选择不同的清洗方式对待清洗设备进行清洗。不同的清洗方式共用一组供液管路以及喷嘴以对待清洗设备进行清洗。
本实施例中其他部分的技术效果可以参见上述实施例中的相应描述,在此不再赘述。
本公开的一个实施例还提供一种清洗装置,如图5所示,该清洗装置同样包括:导轨11;升降杆12,升降杆的一端设置在导轨11上且可沿导轨11移动;供液管路14,供液管路14设置在升降杆12内部;以及喷嘴13,喷嘴13设置在升降杆12远离导轨11的一端的端部且与供液管路14连通。升降杆12包括第一升降杆121、第二升降杆122以及连接第一升降
杆121和第二升降杆122的连接件123。喷嘴13设置在第一升降杆121远离导轨11的一端的端部,第二升降杆122设置在导轨11上,可以通过连接件123的旋转从而驱动第一升降杆121相对于第二升降杆122进行升降运动。有关导轨11、升降杆12以及喷嘴13可参见上述实施例中的相应描述,在此不再赘述。
本实施例提供的清洗装置和上述实施例中提供的清洗装置的区别在于,该清洗装置包括多个平行设置的子导轨以及设置在导轨上且可沿导轨移动的支撑架。
例如,如图5所示,该清洗装置包括两个平行设置的子导轨,分别为第一子导轨111和第二子导轨112。支撑架15的两端分别与两个子导轨连接,且支撑架15可沿导轨11移动。升降杆12支撑在支撑架15上,支撑架15可带动升降杆12沿导轨11移动。
当然,上述描述的平行设置两个子导轨,是本公开中导轨包括多个平行设置的子导轨的一种示例,本公开包括但不限于此。
在本实施例中,平行设置两个子导轨且在两个子导轨之上架设一支撑架,支撑架可沿导轨移动。升降杆支撑在支撑架上,在支撑架的带动下可沿导轨移动。上述方式可提高清洗装置在移动过程中的稳定性,避免清洗装置在对待清洗设备清洗时出现位置偏差。
例如,在本实施例的一个示例中,如图5所示,该清洗装置还可以包括设置在第一子导轨111和第二子导轨112之间的导液槽41,例如导液槽41设置为倾斜式的,例如倾斜角度设置为5°,又例如倾斜角度设置为10°,再例如倾斜角度设置为5°~10°之间的任一角度。在导液槽41较低的一端设置有排液管路,图中未示出。
在本公开的实施例中,在子导轨之间设置一倾斜式的导液槽,滴落至导液槽中的清洗液等液体可及时的由排液管路排走,避免了清洗液滴落至清洗装置下方造成污染。
本实施例中其他部分的技术效果可以参见上述实施例中的相应描述,在此不再赘述。
本公开的一个实施例还提供一种清洗装置,如图6a所示,该清洗装置包括两个平行设置的子导轨,分别为第一子导轨111和第二子导轨112。支撑架15的两端分别与两个子导轨连接,且支撑架15可沿导轨移动。升
降杆12支撑在支撑架15上,支撑架15可带动升降杆12沿导轨移动。
如图6a所示,该清洗装置包括设置在升降杆12内部的供液管路14,以及设置在升降杆12远离导轨11的一端的端部且与供液管路14连通的喷嘴13。升降杆12包括第一升降杆121、第二升降杆122以及连接第一升降杆121和第二升降杆122的连接件123。喷嘴13设置在第一升降杆121远离导轨11的一端的端部,第二升降杆122设置在导轨11上,可以通过连接件123的旋转从而驱动第一升降杆121相对于第二升降杆122进行升降运动。
如图6a所示,该清洗装置还包括内喷头21和外喷头22。其中,内喷头21设置在外喷头22内部,喷嘴13设置在内喷头21内部。在外喷头22上设置有多个第一喷孔222,在内喷头21上设置有多个第二喷孔212。内喷头21和外喷头22中至少之一配置为可围绕升降杆12旋转。内喷头21上的第二喷孔212的排布节距和外喷头22上的第一喷孔222的排布节距不同。
内喷头21具有环绕设置在内喷头21外表面上且垂直于升降杆12轴向的向外凸的滑块211,以及外喷头22具有环绕设置外喷头22内表面上且垂直于所述升降杆12轴向的向内凹的导槽221,其中,滑块211配置为嵌入在导槽221内相对于导槽221移动。
如图6a所示,该清洗装置还包括与升降杆12靠近导轨11的一端连接的支杆32,以及与支杆32远离升降杆12的一端连接的多通电磁阀31。供液管路14从升降杆12中延伸至支杆中并与多通电磁阀31连通。
多通电磁阀31的一端与支杆32中的供液管路14连通,另一端与外部管路33连通,外部管路33包括但不限于纯水管路331、清洗液管路332和压缩空气管路333。
图6b是图6a的侧视示意图。例如,如图6a和6b所示,该清洗装置还包括设置在第一子导轨111和第二子导轨112之间的导液槽41,导液槽41设置为倾斜式的,例如,倾斜角度设置为5°,例如倾斜角度设置为10°,又例如倾斜角度设置为5°~10°之间的任一角度。在导液槽41较低的一端设置有排液管路43。
在子导轨之间设置一倾斜式的导液槽,滴落至导液槽中的清洗液可及时的由排液管路排走,避免了清洗液滴落至清洗装置下方造成污染。
例如,在本实施例一个示例中,如图6b所示,该清洗装置还可以包括设置在导轨11上的测距装置,例如激光测距单元42,激光测距单元42可设置在第一子导轨或第二子导轨的任意一端。例如,设置在第一子导轨的一端,又例如,设置在第二子导轨的一端。该清洗装置沿导轨移动的距离可以通过设置在导轨上的激光测距单元42精确控制,从而可以实现对清洗装置的精确定位。
下面结合图6a和图6b具体描述该清洗装置的工作流程:
首先,控制支撑架15带动升降杆12上的内外喷头沿导轨11移动到指定位置,控制连接件123的旋转使内外喷头上升或下降至指定高度。
然后,控制多通电磁阀31接通一个或同时接通多个外部管路33,接通的外部管路33中的液体、气体或气液混合流体通过供液管路14以及喷嘴13到达内喷头21中。
最后,通过内喷头21及外喷头22的相对运动以及内外喷头上的喷孔位置的排布,实现内喷头21中的液体、气体或气液混合流体间断性的喷出,从而对待清洗设备表面进行间断性清洗。
清洗过程中,可随时调整内外喷头所处的位置及高度以实现对待清洗设备不同位置处的清洗。清洗过程中,可随时控制多通电磁阀31以选择可连通的外部管路33,即选择不同的清洗方式对待清洗设备进行清洗。
例如,在本实施例的另一个示例中,如图6c所示,供液管路14包括一段设计为盘旋状的软管44,该软管44位于第二升降杆122中。当第一升降杆121需要上升或下降时,连接件123旋转以驱动第一升降杆121相对于第二升降杆122上升或下降,此时,位于第二升降杆122中的软管44随着连接件123的旋转,成盘旋状伸长或收缩。采用此方式可实现第一升降杆121上升或下降时,供液管路14也随之上升或下降,同时盘旋式上升或下降可避免供液管路14的弯折,延长供液管路14的使用寿命。
当然,上述供液管路14中软管44的设置位置不限于此,例如,软管44还可以设置在第一升降杆121中,又例如,软管44还可以同时设置在第一升降杆121和第二升降杆122中。
本实施例提供的清洗装置的其他技术效果可以参见上述实施例中描述的清洗装置的技术效果,在此不再赘述。
需要说明的是,在不冲突的情况下,本公开中关于清洗装置的实施例
及实施例中的特征可以相互组合以得到新的清洗装置的实施例,本公开对此不进行限定。
本公开的一个实施例还提供一种清洗设备,该清洗设备包括上述任一实施例所述的清洗装置。
例如,如图7a和7b所示,该清洗设备还包括工作室,例如显影腔室5。显影腔室底板51上设置有开口,开口可允许清洗装置1通过以至少部分进入到显影腔室5内,在开口处设置有挡板52以打开或关闭开口。
需要说明的是,上述显影腔室是本公开中工作室的一种示例,本公开包括但不限于此。
如图7a和7b所示,清洗装置1在清洗显影腔室5的过程中,会有部分清洗液沿升降杆滴落至显影腔室底板51的下方。为避免此情况的发生,在显影腔室底板51上设计档板52,当清洗装置1从显影腔室底板51下方上升时,档板52打开,打开的间隙足够外喷头通过即可,然后,档板52相互靠近,减小显影腔室底板51的开口间隙,维持升降杆能自由升降即可。采用此方式可以减少在清洗过程中滴落至显影腔室底板51的下方的清洗液量。同时为避免部分清洗液滴落至清洗设备下方,在清洗装置1的子导轨之间设置有导液槽41,导液槽41的宽度大于档板52的开口宽度,以确保从档板52开口间隙滴落的清洗液均能滴落至导液槽41中。关于导液槽41的其他描述可以参见上述实施例中的相应描述,在此不再赘述。
例如,该清洗设备还包括至少一个外部管路33,外部管路33连接到清洗装置1,例如通过多通阀门与清洗装置1之中的供液管路连通。如上所述,外部管路33包括但不限于纯水管路331、清洗液管路332、压缩气体管路333等。例如,外部管路33的个数可以根据需要进行设置,但不限于此;例如,上述三个外部管路的另一端分别与动力端的相应管路连通,图中未示出。
下面结合图7a和图7b具体描述该清洗设备的工作流程:
当需要清洗时,档板52打开,清洗装置1的升降杆上升,带动内外喷头升至显影腔室底板51上方即显影腔室5内部,以实现对显影腔室5内部的待清洗设备的清洗。当清洗完毕后,清洗装置1的升降杆下降,带动内外喷头降至显影腔室底板51的下方,之后档板52闭合,清洗装置1与显影腔室5分离,相对独立,不影响显影腔室5的正常工作。清洗装置
1具体的工作流程可以参见上述实施例中的相应描述,在此不再赘述。
例如,如图8所示,显影腔室5中还可以设置有滚轮53和滚轮支撑杆54。图中示出了4排滚轮,清洗装置1设置在显影腔室5的每两排滚轮之间。清洗装置1的数量可根据显影腔室5的空间以及清洗装置1清洗的距离进行设置,以确保整个显影腔室5均能被清洗到。
在本公开的实施例中,该清洗设备还可以包括一控制系统。控制系统可以控制清洗设备的所有单元的动作,例如,控制清洗装置的移动以及连接件的旋转角度,例如,控制多通电磁阀以实现一个或多个外部管路的连通,例如,控制内外喷头相对于升降杆旋转的转速,又例如,控制挡板的打开或关闭。上述所有的控制动作均可以通过操作设计在操作面板上的按钮来实现,从而可以提高清洗设备的操控便捷性。
例如,升降杆上升或下降的高度通过上述控制系统控制。连接件旋转的角度与升降杆上升或下降的高度之间的关系可以通过程序预先设计好,当需要升降杆上升或下降时,只需在操作面板中的指定位置输入需要上升或下降的具体高度数值,控制系统会自动转换成连接件需要顺时针或逆时针旋转的具体角度数值,进而控制连接件的旋转,最终实现升降杆上升或下降指定高度。
该控制系统例如可以包括处理器以及存储介质,该存储介质上存储有计算机可执行程序,该计算机可执行程序被所述处理器执行时可以控制相应的输入输出设备,以实现数据采集、部件操作、数据输出等。
需要说明的是,为表示清楚的目标,本公开并没有给出该清洗设备的全部结构。为实现清洗设备的必要功能,本领域技术人员可以根据具体应用场景设置其他未示出的结构,本公开对此不做限制。
本公开的至少一个实施例提供一种清洗装置以及包括该清洗装置的清洗设备,该清洗装置以及包括该清洗装置的清洗设备可以实现以下至少一项有益效果:
(1)本公开至少一实施例提供的清洗装置可以实现对待清洗设备的不同位置和不同高度进行清洗。
(2)本公开至少一实施例提供的清洗装置可以实现对待清洗设备的间断性清洗,使喷到待清洗设备表面的清洗液具有一定的冲击力,提高清洗效果。
(3)本公开至少一实施例提供的清洗装置可以实现在清洗过程中的不同时间段,采用不同的清洗方式,并共用一组供液管路以及喷嘴以对待清洗设备进行清洗。
(4)本公开至少一实施例提供的清洗装置可以实现对清洗位置及清洗高度的精确控制。
在本公开的实施例中,有以下几点需要说明:
(1)本公开实施例的附图只涉及到与本公开实施例涉及到的结构,其他结构可以参考通常设计。
(2)为了清晰起见,在用于描述本公开实施例的附图中,有些区域被放大或缩小,即这些附图并非按照实际的比例绘制。
(3)在不冲突的情况下,本公开实施例及实施例中的特征可以相互组合以得到新的实施例。
以上所述,仅为本公开的具体实施方式,但本公开的保护范围并不局限于此,本公开的保护范围应以所述权利要求的保护范围为准。
Claims (15)
- 一种清洗装置,包括:导轨,升降杆,所述升降杆的一端设置在所述导轨上且可沿所述导轨移动,供液管路,所述供液管路设置在所述升降杆内部,以及喷嘴,所述喷嘴设置在所述升降杆远离所述导轨的一端的端部且与所述供液管路连通,其中,所述升降杆配置为可使所述喷嘴远离或靠近所述导轨。
- 根据权利要求1所述的清洗装置,其中,所述升降杆包括第一升降杆、第二升降杆以及连接所述第一升降杆和所述第二升降杆的连接件,所述第一升降杆的端部设置有所述喷嘴,所述第二升降杆设置在所述导轨上,且所述第一升降杆可相对于所述第二升降杆进行升降运动。
- 根据权利要求2所述的清洗装置,其中,所述连接件配置为可旋转从而驱动所述第一升降杆相对于所述第二升降杆进行升降运动。
- 根据权利要求1-3任一所述的清洗装置,还包括:内喷头和外喷头;其中,所述内喷头设置在所述外喷头内部,所述喷嘴设置在所述内喷头内部;在所述外喷头上设置有多个第一喷孔,在所述内喷头上设置有多个第二喷孔;所述内喷头和外喷头中至少之一配置为可围绕所述升降杆旋转。
- 根据权利要求4所述的清洗装置,其中,所述内喷头上的第二喷孔的排布节距和所述外喷头上的第一喷孔的排布节距不同。
- 根据权利要求4所述的清洗装置,其中,所述内喷头具有环绕设置在所述内喷头外表面上且垂直于所述升降杆轴向的向外凸的滑块,以及所述外喷头具有环绕设置在所述外喷头内表面上且垂直于所述升降杆轴向的向内凹的导槽,其中,所述滑块嵌入在所述导槽内且配置为可相对于所述导槽移动。
- 根据权利要求1-6任一所述的清洗装置,还包括设置在所述升降杆靠近所述导轨的一端的多通阀门,其中,所述多通阀门靠近所述升降杆的一端和所述供液管路连通。
- 根据权利要求7所述的清洗装置,还包括与所述升降杆靠近所述导轨的一端连接的支杆,其中,所述多通阀门与所述支杆远离所述升降杆的一端连接。
- 根据权利要求1-8任一所述的清洗装置,还包括设置在所述导轨上的激光测距单元。
- 根据权利要求1-9任一所述的清洗装置,还包括设置在所述导轨上且可沿导轨移动的支撑架,其中,所述导轨包括多个平行设置的子导轨,所述升降杆支撑在所述支撑架上。
- 根据权利要求10所述的清洗装置,还包括设置在所述子导轨之间的导液槽,其中,所述导液槽设置为倾斜式的。
- 一种清洗设备,包括权利要求1-11任一所述的清洗装置。
- 根据权利要求12所述的清洗设备,还包括工作室,其中,所述工作室的壁上设置有开口,所述开口可允许所述清洗装置通过以至少部分进入到所述工作室内。
- 根据权利要求13所述的清洗设备,还包括挡板,其中,所述挡板设置在所述开口处以打开或关闭所述开口。
- 根据权利要求12-14任一所述的清洗设备,还包括至少一个外部管路,其中,所述外部管路连接到所述清洗装置。
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CN110813864B (zh) * | 2019-11-18 | 2021-11-23 | 长江存储科技有限责任公司 | 晶圆的清洗组件、清洗设备及清洗方法 |
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CN205762570U (zh) * | 2016-05-23 | 2016-12-07 | 南京城建环保水务股份有限公司 | 一种mbr膜离线清洗装置 |
CN205684389U (zh) * | 2016-05-30 | 2016-11-16 | 上海捷谛电力科技有限公司 | 一种光伏组件用清洁装置 |
Cited By (1)
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CN112516714A (zh) * | 2020-12-21 | 2021-03-19 | 天长市市政建筑有限责任公司 | 一种建筑工程用洒水降尘结构 |
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US20210268551A1 (en) | 2021-09-02 |
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EP3623062A4 (en) | 2021-12-15 |
US11298726B2 (en) | 2022-04-12 |
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