WO2018179932A1 - 積層フィルムの製造方法および積層フィルム製造装置 - Google Patents

積層フィルムの製造方法および積層フィルム製造装置 Download PDF

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Publication number
WO2018179932A1
WO2018179932A1 PCT/JP2018/004945 JP2018004945W WO2018179932A1 WO 2018179932 A1 WO2018179932 A1 WO 2018179932A1 JP 2018004945 W JP2018004945 W JP 2018004945W WO 2018179932 A1 WO2018179932 A1 WO 2018179932A1
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Prior art keywords
film
liquid
laminated film
buffer chamber
liquid reservoir
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Application number
PCT/JP2018/004945
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English (en)
French (fr)
Japanese (ja)
Inventor
将之 楠本
健一 柿下
内海　京久
諭司 國安
Original Assignee
富士フイルム株式会社
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Priority to KR1020197026440A priority Critical patent/KR102250634B1/ko
Publication of WO2018179932A1 publication Critical patent/WO2018179932A1/ja

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C3/00—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material
    • B05C3/18—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material only one side of the work coming into contact with the liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C3/00—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material
    • B05C3/02—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material the work being immersed in the liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0245—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to a moving work of indefinite length, e.g. to a moving web
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254—Coating heads with slot-shaped outlet
    • B05C5/0258—Coating heads with slot-shaped outlet flow controlled, e.g. by a valve
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/40—Distributing applied liquids or other fluent materials by members moving relatively to surface

Definitions

  • the present invention relates to a laminated film manufacturing method and a manufacturing apparatus for manufacturing a laminated film having a functional layer on a film by using a liquid reservoir of a functional liquid on a film continuously conveyed by a roller.
  • Patent Documents 1 and 2 disclose a roller coating apparatus in which a functional liquid reservoir is provided between a backing roller and a doctor roller, and the functional liquid in the liquid reservoir is applied onto a film passing through the backing roller.
  • Patent Document 2 proposes a dam member that includes a side plate that divides both sides of a liquid reservoir and regulates the application width and a back plate that partitions a rear end, and defines a liquid reservoir region.
  • JP 2011-98283 A Japanese Utility Model Publication No. 6-19871
  • controlling the coating width of the functional layer provided on or between the films is an important issue in order to improve production efficiency by making the product width constant. If the dam member having the side plate described in Patent Document 2 is used, it is considered that the coating width can be regulated.
  • the present invention has been made in view of the above circumstances, and is a laminated film capable of controlling the coating width of a functional liquid, maintaining a uniform film thickness of the coating film, and suppressing loss of the functional liquid.
  • An object of the present invention is to provide a production method and a laminated film production apparatus.
  • the method for producing a laminated film of the present invention is formed on one surface of a film by conveying the film in a state where a liquid reservoir of a functional fluid is in contact with one surface of the film and applying the functional fluid to one surface of the film.
  • a method for producing a laminated film comprising producing a laminated film comprising a functional layer comprising a coating film of a functional liquid,
  • the seal member that defines the position of both ends of the liquid pool in the film width direction is arranged according to the application width of the functional liquid, and fluid pressure is applied to the liquid pool from the outside of the seal member in the film width direction, thereby It is the manufacturing method of the laminated
  • the fluid pressure applied to the liquid reservoir may be dynamic pressure or static pressure.
  • the coating film may be formed by placing the liquid surface of the liquid reservoir in a nitrogen atmosphere.
  • the fluid pressure may be generated by nitrogen gas.
  • the laminated film manufacturing apparatus of the present invention includes a transport mechanism for transporting a film, A reservoir of functional liquid provided in contact with one surface of the film being conveyed; A seal member that defines both end positions of the liquid pool in the film width direction; It is a laminated film manufacturing apparatus provided with the pressure application mechanism which applies a fluid pressure to a liquid reservoir from the outer side of the film width direction of a sealing member.
  • the pressure applying mechanism includes a buffer chamber defining member that defines a buffer chamber adjacent to the outside of the seal member in the film width direction, and applies fluid pressure to the liquid reservoir through the buffer chamber.
  • the structure to add may be sufficient.
  • the laminated film manufacturing apparatus of the present invention includes a gas supply unit that blows gas from the outside in the film width direction of the buffer chamber defining member toward the buffer chamber. By blowing gas into the buffer chamber, A configuration in which fluid pressure is applied to the liquid reservoir may be used.
  • the laminated film manufacturing apparatus of the present invention includes a pressurizing chamber defining member that defines a pressurizing chamber adjacent to the outside in the film width direction of the buffer chamber, and a gas supply unit that supplies gas to the pressurizing chamber.
  • a configuration may be adopted in which fluid pressure is applied to the liquid reservoir through the buffer chamber by applying pressure from the gas supplied from the pressurizing chamber to the buffer chamber.
  • the pressure application mechanism includes a gas supply unit that blows gas toward the liquid pool from the outside in the film width direction of the seal member, and applies fluid pressure to the liquid pool by blowing the gas. It may be.
  • the gas supply unit preferably supplies nitrogen.
  • the laminated film manufacturing apparatus of the present invention may include a cover member that covers the upper space of the liquid reservoir and a nitrogen supply mechanism that supplies nitrogen to the upper space.
  • a roller in contact with the liquid pool is provided, and the roller may have an intaglio or letterpress on the surface.
  • the functional liquid is applied to the film from the liquid reservoir regulated to the desired coating width by the sealing member, and therefore the coating film having a uniform film thickness in the desired effective width. Can be formed. Further, by applying fluid pressure to the liquid pool from the outside in the film width direction of the seal member, it is possible to suppress the functional liquid leaking in the film width direction, and it is possible to suppress loss of the functional liquid.
  • FIG. 1 It is a figure which shows schematic structure of a laminated film manufacturing apparatus. It is an enlarged view of the application part of a laminated film manufacturing method. It is a figure which shows the partial structure of the application part of a laminated film manufacturing method. It is a perspective view of an application width control member. It is a figure which shows schematic structure of the example of a design change of a laminated film manufacturing apparatus. It is a figure which shows the structure of the design change example 1 of a pressure provision mechanism. It is a figure which shows the structure of the design modification example 2 of a pressure provision mechanism. It is a perspective view of the application width control member which has a partial structure of the design modification example 2 of a pressure provision mechanism.
  • FIG. 1 is a schematic configuration diagram of an example of a laminated film manufacturing apparatus according to the first embodiment of the present invention.
  • FIG. 2 is an enlarged view of the coating unit 103 of the laminated film manufacturing apparatus 100 of FIG. 1
  • FIG. 3 is a diagram illustrating a partial configuration of the coating unit 103.
  • the laminated film manufacturing apparatus 100 supports a film 10 such as a resin film used as a support in a roll state and feeds it out, a plurality of guide rollers (not shown) for conveying a film-like workpiece, A winder 104 that winds the laminated film formed through the processing step into a roll is provided, and a transport mechanism that transports the film is configured by the feeder 101, the guide roller, and the winder 104.
  • a film 10 such as a resin film used as a support in a roll state and feeds it out
  • a plurality of guide rollers (not shown) for conveying a film-like workpiece
  • a winder 104 that winds the laminated film formed through the processing step into a roll is provided
  • a transport mechanism that transports the film is configured by the feeder 101, the guide roller, and the winder 104.
  • the laminated film manufacturing apparatus 100 is formed on the one surface of the film 10 and the coating unit 103 that forms the coating film 20M by applying the functional liquid 21 to the one surface 10a of the film 10 between the delivery device 101 and the winder 104. And a curing processing unit 105 that cures the applied coating film 20M to form the functional layer 20.
  • the application unit 103 includes a liquid reservoir 22 of the functional liquid 21 provided in contact with one surface 10 a of the film 10 being conveyed, and both end positions of the liquid reservoir 22 in the film width direction. And a pressure applying mechanism 40 that applies fluid pressure to the liquid reservoir 22 from the outside of each seal member 32 in the film width direction.
  • the film 10 is configured to be conveyed between the mold roller 1 and the roller 2 having an uneven surface 1 a, and the film is formed by the mold roller 1 and the roller 2.
  • a liquid reservoir 22 is provided between the film 10 wrapped by the roller 2 on the sandwiched position and the mold roller 1.
  • the pair of seal members 32 are supported in parallel at intervals of the application width W on a support plate 34 longer than the application width of the functional liquid 21.
  • the coating width W is set to a desired effective width of the laminated film.
  • the support plate 34 arranges and supports the seal member 32 at a predetermined position, and the support plate 34 and the seal member 32 are integrated to form the coating width regulating member 30.
  • FIG. 4 shows a perspective view of the coating width regulating member 30.
  • the seal member 32 has a width L in the film width direction.
  • the surface 32 a disposed along the mold roller 1 of the seal member 32 has a curved surface along the curved surface of the roller 1
  • the surface 32 b disposed along the film 10 wrapped by the roller 2 is the surface of the roller 2. It has a curved surface along the curved surface.
  • the support plate 34 also serves as a cover member that covers the upper space 25 of the liquid reservoir 22.
  • a space surrounded by the support plate 34, the seal member 32, the mold roller 1, and the film 10 constitutes a liquid pool chamber.
  • the support plate 34 includes a functional liquid supply nozzle port 34 a for supplying the functional liquid 21 to the liquid reservoir 22, a liquid level sensor port 34 b for detecting the liquid level of the liquid reservoir 22, and nitrogen to the upper space 25 of the liquid reservoir 22.
  • a nitrogen supply nozzle port 34c for purging and an oxygen concentration sensor port 34d for measuring the oxygen concentration in the space 25 above the liquid reservoir 22 are provided. By purging the upper space 25 with nitrogen, the liquid level of the liquid reservoir 22 can be placed in a nitrogen atmosphere.
  • the number and position of the functional liquid supply nozzle port and the nitrogen supply nozzle port can be appropriately set according to the physical properties and amount of the functional liquid, the nitrogen supply amount, or the like.
  • various sensor ports for measuring the functional liquid temperature and the state of the atmosphere can be appropriately installed.
  • the support plate 34 is provided as a cover member.
  • the application width regulating member 30 may be configured to support the pair of seal members 32 with a support rod, for example.
  • the application width regulating member 30 is not limited to the configuration in which the seal members 32 at both ends are supported by a common support plate, but may be a form in which each is separately supported from both sides in the film width direction.
  • the sealing member 32 is arranged with a certain distance from the mold roller 1 and the film 10 so as not to hinder the rotation of the mold roller 1 and the roller 2 and the conveyance of the film 10. Therefore, the seal member 32 (surface 32a) of the gap c 1 between the mold roller 1, the sealing member 32 (surface 32b) of the lower end 32c and the film 10 of the gap c 2 and the sealing member 32 between the film 10 and the roller 2 clearance c 3 position to the contacting inevitably occur.
  • the functional liquid 21 may leak from the liquid reservoir 22, so that the gap is preferably small, and the surface of the roller 2 on which the film 10 is wrapped is provided.
  • the distance between the surface 32 b of the sealing member 32 is preferably about the film thickness of the film 10.
  • the gap c 3 becomes highest.
  • the gap c 3 is located at the lower end of the liquid reservoir 22, a hydraulic pressure is generated by the functional liquid 21. Therefore, of the periphery of the sealing member 32, leakage of the most functional fluid 21 from the gap c 3 is likely to occur.
  • the pressure applying mechanism 40 includes an air blowing device 41 as a gas supply unit that blows the gas 42 toward the liquid reservoir 22 from the outside of the sealing member 32 in the film width direction.
  • the air blow device 41 includes a tank of compressed gas such as air or nitrogen gas, and discharges the compressed gas from the nozzle.
  • the gas 42 may be compressed air, but nitrogen gas, argon gas, or the like is preferable when there is a restriction such that the functional liquid is easily oxidized. In that case, nitrogen gas is particularly preferable from the viewpoint of cost.
  • Air blow device 41 the film width direction outside of the sealing member 32, blowing air 42 toward the lower end 32c side of the gap c 3 of the sealing member 32.
  • gas 42 By blowing gas 42 into the gap c 3, the fluid pressure applied to the liquid reservoir 22 is fed into the gap c 3 of the lower end 32c of the seal member 32 gas 42 to the liquid reservoir 22, the functional liquid from the gap c 3 21 Can be prevented from leaking outward in the film width direction.
  • the air blow device 41 may be sprayed gas 42 for the entire clearance near the sealing member 32, but the configuration of blowing gas 42 into prone gap c 3 leaks most functional fluid 21 is preferred.
  • the application width regulating member 30 includes a functional liquid supply nozzle 52 that supplies the functional liquid 21 to the liquid reservoir 22, a liquid level sensor 54 that detects the liquid level of the liquid reservoir 22, A nitrogen supply nozzle 56 for purging nitrogen into the upper space 25 of the liquid reservoir 22 and an oxygen concentration sensor 58 for measuring the oxygen concentration in the upper space 25 are set.
  • the functional liquid supply nozzle 52 is connected to a pump P for supplying functional liquid.
  • the nitrogen supply nozzle 56 forming a part of the nitrogen supply mechanism is connected to a nitrogen supply device by a pipe (not shown).
  • the curing processing unit 105 only needs to have a configuration capable of imparting to the coating film active energy for curing the coating film of the functional liquid.
  • the curing processing section 105 It is a UV irradiation device that irradiates light, and when the functional liquid is a thermopolymerizable composition, it is a heating device such as a heater.
  • ⁇ Method for producing laminated film> A method for producing a laminated film using the laminated film production apparatus 100 having the above configuration will be described.
  • a resin film such as PET (polyethylene terephthalate), TAC (triacetyl cellulose), and PEN (polyethylene naphthalate) is used.
  • a resin composition such as an acrylic resin having a viscosity of 10 to 10,000 mPa ⁇ s can be applied.
  • the film 10 fed out from the delivery machine 101 is conveyed to the application unit 103, and is conveyed so that one surface 10 a of the film 10 is in contact with the liquid reservoir 22 of the functional liquid 21 in the application unit 103.
  • the functional liquid 21 is applied.
  • the seal member 32 is arranged in accordance with the application width of the functional liquid 21, and the gas 42 is blown from the outside in the film width direction of the seal member 32 to the liquid reservoir 22 by the air blowing device 41, thereby the liquid reservoir.
  • a fluid pressure is applied to 22, and the outflow of the functional liquid 21 from the periphery of the seal member 32 is suppressed, and the coating film 20 ⁇ / b> M is formed by the functional liquid 21.
  • the air blow device 41 sealed by the gas 42 is blown against the lower end 32c side of the gap c 3 members 32, the fluid in the liquid reservoir 22 by a gas 42 entering from the gaps c3 of the lower end 32c
  • the outflow of the functional liquid 21 from the liquid reservoir 22 to the outside of the film width can be suppressed.
  • the coating film 20M formed on the film 10 is irradiated with UV from the other surface side of the film 10, and the coating film 20M is cured to form the functional layer 20.
  • the laminated film formed by laminating the functional layer 20 on the one surface 10a of the film 10 is formed through the above steps, and is wound up in a roll shape by the winder 104.
  • the functional liquid 21 is applied to the film 10 from the liquid reservoir 22 regulated to a desired application width by the seal member 32, a uniform film thickness is obtained in a desired effective width.
  • a coating film can be formed. Further, by applying fluid pressure to the liquid reservoir 22 from the film width direction, it is possible to suppress the functional liquid leaking in the film width direction, and it is possible to suppress loss of the functional liquid.
  • the width L in the film width direction of the seal member 32 is L / t ⁇ 10, where t is the distance between the seal member 32 and the roller 1 or the film 10 in the gaps c 1 and c 2 . It is preferable that the relationship is By sufficiently increasing the width L of the seal member 32 with respect to the interval t, it is possible to suppress the functional liquid 21 from leaking beyond the seal member 32 to the outside in the film width direction.
  • the material of the seal member 32 is not particularly limited, but nylon, Newlite, Teflon (registered trademark), or the like is preferably used.
  • the material of the sealing member 32 preferably has a large contact angle with respect to the functional liquid 21, and particularly preferably has a contact angle of 80 ° or more.
  • the manufacturing apparatus 100 includes a mold roller 1 having a surface 1 a having a concavo-convex pattern.
  • the liquid pool 22 enters a concave portion of the surface 1 a, and the film roller 1 and the roller 2 have a film nip position.
  • the functional liquid 21 confined in the recess is transferred onto the film 10. Therefore, the coating film 20M formed on the one surface 10a of the film 10 is formed in a concavo-convex pattern shape along the surface concavo-convex shape of the mold roller 1, and the manufactured laminated film is cured by such a patterned film.
  • the patterned functional layer is provided on the film 10.
  • the mold roller having irregularities on the surface may be provided with an intaglio surface or may be provided with a relief surface.
  • a roller having no irregularities on the surface may be used instead of the mold roller.
  • the mold roller 1 a roller having a diameter of 350 mm and a surface length of 800 mm and having a surface with irregularities on the order of ⁇ m is used.
  • the roller 2 a diameter of 110 mm and a surface length of 800 mm are used.
  • the mold roller 1 and the roller 2 are installed at an interval of 0 to 100 ⁇ m at the closest position between them. At this time, the coating speed (conveyance speed) is about 0.5 to 5 m / min.
  • the functional liquid 21 for example, 99 parts by mass of TMPTA (trimethylolpropane triacrylate) (manufactured by Daicel Ornex) and 1 part by mass of Irgacure TPO (manufactured by BASF) as a polymerization initiator are obtained.
  • a resin composition of 100 mPa ⁇ s is used.
  • the curing processing unit 105 is a UV irradiation device, and includes, for example, an air-cooled metal halide lamp (manufactured by Eye Graphics) 500 mW / cm 2 .
  • the coating film is irradiated with ultraviolet rays at 300 mJ / cm 2 . According to the above specifications, a laminated film having a functional layer made of an acrylic layer formed in a pattern according to the unevenness of the mold roller on the resin film can be produced.
  • FIG. 1 The schematic block diagram of the structure of the laminated film manufacturing apparatus 110 of the example of a design change is shown in FIG.
  • the same elements as those of the laminated film manufacturing apparatus 100 of FIG. 1 are denoted by the same reference numerals, and detailed description thereof is omitted.
  • the laminated film manufacturing apparatus 110 of the design change example is a manufacturing apparatus that manufactures a sandwich-shaped laminated film in which the functional layer 20 is sandwiched between the first and second films 10 and 12, and the laminated film manufacturing apparatus 100 described above.
  • the second film 12 is supported in a roll state and is provided with a delivery device 102 that feeds it out.
  • the liquid reservoir 22 is provided between the 1st film 10 and the 2nd film 12, and it becomes the structure which clamps and conveys the coating film 20M with the 1st and 2nd film. ing.
  • a roller 3 having no irregularities on the surface is provided.
  • the laminated film manufactured by the manufacturing apparatus 110 includes the first film 10, the functional layer 20, and the second film 12.
  • the liquid reservoir 22 is not limited to be formed between the film and the roller, but can be formed between the film and the film.
  • the pressure application mechanism 32 and the pressure application mechanism 40 it is possible to obtain the same effect of suppressing the formation of a uniform coating film and the loss of the functional liquid.
  • the pressure applying mechanism 40 is configured by the air blowing device 41, but the pressure applying mechanism 40 is not limited to the above configuration. Below, the example of a design change of the pressure provision mechanism 40 is demonstrated.
  • FIG. 6 shows a configuration of a first design change example of the pressure applying mechanism 40.
  • the pressure applying mechanism 40 includes a buffer chamber defining member 45 that defines a buffer chamber 44 that is adjacent to the outer side in the film width direction of the seal member 32, and a buffer toward the buffer chamber 44.
  • An air blowing device 41 that is a gas supply unit that blows the gas 42 from the outside in the film width direction of the chamber defining member 45 is provided.
  • the buffer chamber defining member 45 is supported on the support plate 34 of the coating width regulating member 30 together with the seal member 32.
  • the buffer chamber defining member 45 has substantially the same shape as the seal member 32 and has a curved surface along the rollers 1 and 2.
  • the interval between the seal member 32 and the buffer chamber defining member 45 may be appropriately determined by a distance that makes the buffer chamber 44 a desired capacity.
  • FIG. 6 shows a mode in which the functional liquid 21 leaks and fills the buffer chamber 44 by a considerable amount, the present invention is not limited to this, and the functional liquid leaks from the liquid reservoir 22 through the gap between the seal member 32 and the film 10. What is necessary is just the structure to which the pressure of the gas 42 is added to.
  • fluid pressure can be applied to the liquid reservoir 22 via the buffer chamber 44.
  • the functional liquid 21 to which the gas 42 is blown in the buffer chamber 44 is pushed back into the gap c 3 at the lower end 32 c of the seal member 32 communicating with the buffer chamber and the liquid reservoir 22, and applies fluid pressure to the liquid reservoir 22.
  • the functional liquid 21 leaking into the buffer chamber 44 applies fluid pressure to the liquid reservoir 22, whereby the outflow of the functional liquid 21 from the liquid reservoir 22 can be suppressed.
  • a buffer chamber 44 is provided, and gas is blown from the outer side in the film width direction of the buffer chamber defining member 45 to the buffer chamber 44, and gas is supplied from the lower end of the buffer chamber defining member 45 to the buffer chamber 44. If the pressure by the gas is applied to the functional liquid leaking from the liquid reservoir side, the bubble 42a of the gas 42 floats up to the liquid surface in the buffer chamber 44, so the liquid inside the film width direction of the seal member It can suppress that the bubble 42a penetrate
  • the buffer chamber defining member 45 is provided with a part of an opening for releasing air. Even in the configuration shown in FIG.
  • FIG. 7 shows a configuration of a second modification example of the pressure application mechanism 40.
  • the pressure applying mechanism 40 includes a buffer chamber defining member 45 that defines a buffer chamber 44 on the outer side of the seal member 32 in the film width direction, and an outer side of the buffer chamber 44 in the film width direction. Gas from the outside of the buffer chamber defining member 45 in the film width direction is exposed to the pressurizing chamber defining member 49 that adjoins the pressurizing chamber 48 and the functional liquid 21 leaking from the liquid reservoir 22 to the buffer chamber 44.
  • An air blowing device 41 which is a gas supply unit for supplying 42 to the pressurizing chamber 48 is provided.
  • the air blowing device 41 does not blow gas from the outside, but the nozzle is inserted into the supply port 49 a provided in the pressurizing chamber defining member 49 and supplies the gas 42 to the pressurizing chamber 48.
  • the gas may be blown into the gap at the lower end of the pressurizing chamber defining member 49 from the outside in the film width direction. Since the buffer chamber 44 is provided in the same manner as in the design change example 1, fluid pressure can be applied to the liquid reservoir 22 via the buffer chamber 44.
  • FIG. 8 shows a perspective view of the coating width regulating member 30 having a partial configuration of the pressure application mechanism of this example.
  • the buffer chamber defining member 45 is supported on the support plate 34 of the coating width regulating member 30 together with the seal member 32.
  • the pressurizing chamber defining member 49 is also supported by the support plate 34.
  • the buffer chamber defining member 45 and the pressurizing chamber defining member 49 have substantially the same shape as the seal member 32 and have curved surfaces along the rollers 1 and 2.
  • the interval between the seal member 32 and the buffer chamber defining member 45 may be appropriately determined by a distance that makes the buffer chamber 44 a desired capacity, and the interval between the buffer chamber defining member 45 and the pressurizing chamber defining member 49 may be increased. What is necessary is just to determine suitably by the distance which makes the pressure chamber 48 a desired capacity
  • the gas 42 is supplied to the pressurizing chamber 48, the inside of the pressurizing chamber 48 is pressurized, and the gas pressurized in the adjacent buffer chamber 44 by the pressurizing chamber 48. 42 pressures are applied.
  • the pressure of the gas applied to the buffer chamber 44 is applied directly or indirectly to the functional liquid 21 leaking from the seal member 32 side.
  • the functional liquid 21 to which the pressure by the gas 42 is applied in the buffer chamber 44 is pushed back to the communication portion with the seal member 32 and applies fluid pressure to the liquid reservoir 22.
  • the outflow of the functional liquid 21 from the liquid reservoir 22 can be suppressed by the fluid pressure due to the functional liquid 21 leaking into the buffer chamber 44.

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PCT/JP2018/004945 2017-03-28 2018-02-13 積層フィルムの製造方法および積層フィルム製造装置 WO2018179932A1 (ja)

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JP2011173067A (ja) * 2010-02-24 2011-09-08 Ricoh Co Ltd 画像形成装置及び処理液塗布装置
JP2011178113A (ja) * 2010-03-03 2011-09-15 Ricoh Co Ltd 画像形成装置及び処理液塗布装置
JP2011183733A (ja) * 2010-03-10 2011-09-22 Ricoh Co Ltd 画像形成装置及び処理液塗布装置

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