WO2018179932A1 - Method for manufacturing laminated film and device for manufacturing laminated film - Google Patents

Method for manufacturing laminated film and device for manufacturing laminated film Download PDF

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WO2018179932A1
WO2018179932A1 PCT/JP2018/004945 JP2018004945W WO2018179932A1 WO 2018179932 A1 WO2018179932 A1 WO 2018179932A1 JP 2018004945 W JP2018004945 W JP 2018004945W WO 2018179932 A1 WO2018179932 A1 WO 2018179932A1
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film
liquid
laminated film
buffer chamber
liquid reservoir
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PCT/JP2018/004945
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French (fr)
Japanese (ja)
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将之 楠本
健一 柿下
内海 京久
諭司 國安
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富士フイルム株式会社
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Priority to KR1020197026440A priority Critical patent/KR102250634B1/en
Publication of WO2018179932A1 publication Critical patent/WO2018179932A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C3/00Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material
    • B05C3/18Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material only one side of the work coming into contact with the liquid or other fluent material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C3/00Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material
    • B05C3/02Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material the work being immersed in the liquid or other fluent material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0245Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to a moving work of indefinite length, e.g. to a moving web
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254Coating heads with slot-shaped outlet
    • B05C5/0258Coating heads with slot-shaped outlet flow controlled, e.g. by a valve
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/40Distributing applied liquids or other fluent materials by members moving relatively to surface

Abstract

Provided are a method for manufacturing and a device for manufacturing a laminated film that can control application width of a functional liquid, maintain uniform film thickness for an applied film, and suppress loss of the functional liquid. A film (10) is delivered in a state wherein a puddle (22) of a functional liquid (21) is in contact with one surface of the film (10) so as to apply the functional liquid (21) to the one surface of the film (10), thereby manufacturing a laminated film provided with the film (10) and a functional layer (20) comprising an applied film (20M) of the functional liquid (21) formed on one surface of the film (10). Here, a sealing material (32) prescribing both end positions of the puddle (22) in the direction of width of the film is disposed aligned to the application width for the functional liquid (21), and the applied film (20M) is formed by the functional liquid (21) by applying liquid pressure to the puddle (22) from outside of the film width of the sealing material (32) while suppressing outflow of the functional liquid (21) from the vicinity of the sealing material (32).

Description

積層フィルムの製造方法および積層フィルム製造装置LAMINATED FILM MANUFACTURING METHOD AND LAMINATED FILM MANUFACTURING DEVICE
 本発明は、ローラで連続搬送されるフィルムに機能液の液溜まりを用いて、フィルム上に機能層を備えた積層フィルムを製造する積層フィルムの製造方法および製造装置に関する。 The present invention relates to a laminated film manufacturing method and a manufacturing apparatus for manufacturing a laminated film having a functional layer on a film by using a liquid reservoir of a functional liquid on a film continuously conveyed by a roller.
 フィルム上への機能液の塗布幅を制御するには、ギーザーやダイなど高価で精密な液供給設備を用いる必要があった。また、粘度の低い塗布液の幅制御には、コーティング用のローラ両端部にテフロン(登録商標)などの樹脂を物理的に押し付け、ピン止め効果を用いる方法などが採用されていた。 In order to control the application width of the functional liquid on the film, it was necessary to use expensive and precise liquid supply equipment such as a Geezer or a die. For controlling the width of the coating liquid having a low viscosity, a method of physically pressing a resin such as Teflon (registered trademark) on both ends of the coating roller and using a pinning effect has been adopted.
 特許文献1、2には、バッキングローラとドクタローラ間に機能液の液溜めを設け、バッキングローラを通過するフィルム上に液溜め内の機能液を塗布するローラ塗布装置が開示されている。そして、特許文献2には、液溜めの両脇を仕切って塗布幅を規制するサイドプレートと後端を仕切るバックプレートから構成され、液溜め領域を規定するダム部材が提案されている。 Patent Documents 1 and 2 disclose a roller coating apparatus in which a functional liquid reservoir is provided between a backing roller and a doctor roller, and the functional liquid in the liquid reservoir is applied onto a film passing through the backing roller. Patent Document 2 proposes a dam member that includes a side plate that divides both sides of a liquid reservoir and regulates the application width and a back plate that partitions a rear end, and defines a liquid reservoir region.
特開2011-98283号公報JP 2011-98283 A 実開平6-19871号公報Japanese Utility Model Publication No. 6-19871
 積層フィルムの生産に際して、フィルム上もしくはフィルム間に設けられる機能層の塗布幅を制御することは、製品幅の一定化による生産効率の向上を図るためには、重要な課題である。特許文献2に記載のサイドプレートを有するダム部材を用いれば塗布幅を規制することが可能と考えられる。 In the production of laminated films, controlling the coating width of the functional layer provided on or between the films is an important issue in order to improve production efficiency by making the product width constant. If the dam member having the side plate described in Patent Document 2 is used, it is considered that the coating width can be regulated.
 しかし、固定配置されたダム部材に対し、ローラを回転させてフィルムを搬送するため、ダム部材とフィルムあるいはローラとの間には隙間を設ける必然性がある。したがって、このような隙間から機能液が漏れ出てしまい、機能液のロスが生じる恐れがある。粘度の低い機能液程この問題は顕著であり、機能液の流出が抑えられない場合には、塗布膜の有効幅内においてもその端部で膜厚が薄くなるなどの問題が生じる恐れもある。 However, since the film is conveyed by rotating the roller with respect to the fixedly arranged dam member, there is a necessity to provide a gap between the dam member and the film or the roller. Therefore, the functional liquid leaks out from such a gap, and there is a risk that the functional liquid may be lost. This problem is more conspicuous in functional fluids with lower viscosity. If the outflow of functional fluid cannot be suppressed, there is a risk of problems such as thin film thickness at the edges even within the effective width of the coating film. .
 本発明は、上記事情に鑑みてなされたものであって、機能液の塗布幅を制御し、塗布膜の膜厚を均一に維持でき、かつ機能液のロスを抑制することが可能な積層フィルムの製造方法および積層フィルム製造装置を提供することを目的とする。 The present invention has been made in view of the above circumstances, and is a laminated film capable of controlling the coating width of a functional liquid, maintaining a uniform film thickness of the coating film, and suppressing loss of the functional liquid. An object of the present invention is to provide a production method and a laminated film production apparatus.
 本発明の積層フィルムの製造方法は、フィルムの一面に機能液の液溜まりを接触させた状態でフィルムを搬送してフィルムの一面に機能液を塗布することにより、フィルムとフィルムの一面に形成された機能液の塗布膜からなる機能層とを備えた積層フィルムを製造する積層フィルムの製造方法であって、
 液溜まりのフィルム幅方向の両端位置を規定するシール部材を、機能液の塗布幅に合わせて配置し、シール部材のフィルム幅方向の外側から液溜まりに流体圧を加えることにより、シール部材の周辺からの機能液の流出を抑制しつつ、機能液による塗布膜を形成する積層フィルムの製造方法である。
The method for producing a laminated film of the present invention is formed on one surface of a film by conveying the film in a state where a liquid reservoir of a functional fluid is in contact with one surface of the film and applying the functional fluid to one surface of the film. A method for producing a laminated film comprising producing a laminated film comprising a functional layer comprising a coating film of a functional liquid,
The seal member that defines the position of both ends of the liquid pool in the film width direction is arranged according to the application width of the functional liquid, and fluid pressure is applied to the liquid pool from the outside of the seal member in the film width direction, thereby It is the manufacturing method of the laminated | multilayer film which forms the coating film by a functional liquid, suppressing the outflow of the functional liquid from.
 液溜まりに加えられる流体圧は、動圧であっても静圧であってもよい。 The fluid pressure applied to the liquid reservoir may be dynamic pressure or static pressure.
 本発明の積層フィルムの製造方法においては、液溜まりの液面を窒素雰囲気下に置いて塗布膜を形成してもよい。 In the method for producing a laminated film of the present invention, the coating film may be formed by placing the liquid surface of the liquid reservoir in a nitrogen atmosphere.
 本発明の積層フィルムの製造方法においては、上記流体圧を、窒素ガスにより生じさせてもよい。 In the method for producing a laminated film of the present invention, the fluid pressure may be generated by nitrogen gas.
 本発明の積層フィルム製造装置は、フィルムを搬送する搬送機構と、
 搬送されているフィルムの一面に接触させて設けられる機能液の液溜まりと、
 液溜まりのフィルム幅方向の両端位置を規定するシール部材と、
 シール部材のフィルム幅方向の外側から液溜まりに流体圧を加える圧力付与機構とを備えた積層フィルム製造装置である。
The laminated film manufacturing apparatus of the present invention includes a transport mechanism for transporting a film,
A reservoir of functional liquid provided in contact with one surface of the film being conveyed;
A seal member that defines both end positions of the liquid pool in the film width direction;
It is a laminated film manufacturing apparatus provided with the pressure application mechanism which applies a fluid pressure to a liquid reservoir from the outer side of the film width direction of a sealing member.
 本発明の積層フィルム製造装置は、圧力付与機構が、シール部材のフィルム幅方向の外側に隣接するバッファ室を画成するバッファ室画成部材を備え、バッファ室を介して液溜まりに流体圧を加える構成であってもよい。 In the laminated film manufacturing apparatus of the present invention, the pressure applying mechanism includes a buffer chamber defining member that defines a buffer chamber adjacent to the outside of the seal member in the film width direction, and applies fluid pressure to the liquid reservoir through the buffer chamber. The structure to add may be sufficient.
 本発明の積層フィルム製造装置は、バッファ室内に向けて、バッファ室画成部材のフィルム幅方向の外側から気体を吹き付ける気体供給部を備え、バッファ室内に気体を吹き付けることにより、バッファ室を介して液溜まりに流体圧を加える構成であってもよい。 The laminated film manufacturing apparatus of the present invention includes a gas supply unit that blows gas from the outside in the film width direction of the buffer chamber defining member toward the buffer chamber. By blowing gas into the buffer chamber, A configuration in which fluid pressure is applied to the liquid reservoir may be used.
 本発明の積層フィルム製造装置は、バッファ室のフィルム幅方向の外側に隣接する加圧室を画成する加圧室画成部材と、加圧室に気体を供給する気体供給部とを備え、バッファ室内に、加圧室から供給された気体による圧力が加えられることにより、バッファ室を介して液溜まりに流体圧を加える構成であってもよい。 The laminated film manufacturing apparatus of the present invention includes a pressurizing chamber defining member that defines a pressurizing chamber adjacent to the outside in the film width direction of the buffer chamber, and a gas supply unit that supplies gas to the pressurizing chamber. A configuration may be adopted in which fluid pressure is applied to the liquid reservoir through the buffer chamber by applying pressure from the gas supplied from the pressurizing chamber to the buffer chamber.
 本発明の積層フィルム製造装置は、圧力付与機構が、シール部材のフィルム幅方向の外側から液溜まりに向けて気体を吹き付ける気体供給部を備え、気体を吹き付けることにより液溜まりに流体圧を加える構成であってもよい。 In the laminated film manufacturing apparatus of the present invention, the pressure application mechanism includes a gas supply unit that blows gas toward the liquid pool from the outside in the film width direction of the seal member, and applies fluid pressure to the liquid pool by blowing the gas. It may be.
 本発明の積層フィルム製造装置において、気体供給部が窒素を供給するものであることが好ましい。 In the laminated film manufacturing apparatus of the present invention, the gas supply unit preferably supplies nitrogen.
 本発明の積層フィルム製造装置においては、液溜まりの上方空間を覆うカバー部材と、上方空間に窒素を供給する窒素供給機構を備えていてもよい。 The laminated film manufacturing apparatus of the present invention may include a cover member that covers the upper space of the liquid reservoir and a nitrogen supply mechanism that supplies nitrogen to the upper space.
 本発明の積層フィルム製造装置においては、液溜まりに接触するローラを備え、ローラは表面に凹版または凸版を有していてもよい。 In the laminated film manufacturing apparatus of the present invention, a roller in contact with the liquid pool is provided, and the roller may have an intaglio or letterpress on the surface.
 本発明の積層フィルムの製造方法および製造装置によれば、シール部材により所望の塗布幅に規制された液溜まりからフィルムに機能液を塗布するので、所望の有効幅において均一な膜厚の塗布膜を形成することができる。また、シール部材のフィルム幅方向の外側から液溜まりに対して流体圧を加えることにより、フィルム幅方向に漏れ出す機能液を抑制することができ、機能液のロスを抑えることができる。 According to the manufacturing method and the manufacturing apparatus of the laminated film of the present invention, the functional liquid is applied to the film from the liquid reservoir regulated to the desired coating width by the sealing member, and therefore the coating film having a uniform film thickness in the desired effective width. Can be formed. Further, by applying fluid pressure to the liquid pool from the outside in the film width direction of the seal member, it is possible to suppress the functional liquid leaking in the film width direction, and it is possible to suppress loss of the functional liquid.
積層フィルム製造装置の概略構成を示す図である。It is a figure which shows schematic structure of a laminated film manufacturing apparatus. 積層フィルム製造方法の塗布部の拡大図である。It is an enlarged view of the application part of a laminated film manufacturing method. 積層フィルム製造方法の塗布部の一部構成を示す図である。It is a figure which shows the partial structure of the application part of a laminated film manufacturing method. 塗布幅規制部材の斜視図である。It is a perspective view of an application width control member. 積層フィルム製造装置の設計変更例の概略構成を示す図である。It is a figure which shows schematic structure of the example of a design change of a laminated film manufacturing apparatus. 圧力付与機構の設計変更例1の構成を示す図である。It is a figure which shows the structure of the design change example 1 of a pressure provision mechanism. 圧力付与機構の設計変更例2の構成を示す図である。It is a figure which shows the structure of the design modification example 2 of a pressure provision mechanism. 圧力付与機構の設計変更例2の一部構成を有する塗布幅規制部材の斜視図である。It is a perspective view of the application width control member which has a partial structure of the design modification example 2 of a pressure provision mechanism.
 以下、本発明の実施形態について図面を用いて説明するが、本発明はこれに限られるものではない。なお、視認しやすくするため、図面中の各構成要素の縮尺等は実際のものとは適宜変えてある。 Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In addition, in order to make it easy to visually recognize, the scale of each component in the drawing is appropriately changed from the actual one.
<積層フィルム製造装置>
 図1は、本発明の第1の実施形態の積層フィルム製造装置の一例の概略構成図である。図2は図1の積層フィルム製造装置100の塗布部103の拡大図、図3は塗布部103の一部構成を示す図である。
<Laminated film production equipment>
FIG. 1 is a schematic configuration diagram of an example of a laminated film manufacturing apparatus according to the first embodiment of the present invention. FIG. 2 is an enlarged view of the coating unit 103 of the laminated film manufacturing apparatus 100 of FIG. 1, and FIG. 3 is a diagram illustrating a partial configuration of the coating unit 103.
 積層フィルム製造装置100は、支持体として用いられる樹脂フィルムなどのフィルム10をロール状態にて支持し、繰り出す送出機101と、フィルム状のワークを搬送するための複数の図示しないガイドローラと、各処理工程を経て形成された積層フィルムをロール状に巻き取る巻取機104を備えており、送出機101、ガイドローラおよび巻取機104によりフィルムを搬送する搬送機構が構成されている。 The laminated film manufacturing apparatus 100 supports a film 10 such as a resin film used as a support in a roll state and feeds it out, a plurality of guide rollers (not shown) for conveying a film-like workpiece, A winder 104 that winds the laminated film formed through the processing step into a roll is provided, and a transport mechanism that transports the film is configured by the feeder 101, the guide roller, and the winder 104.
 積層フィルム製造装置100は、送出機101と巻取機104との間に、フィルム10の一面10aに機能液21を塗布して塗布膜20Mを形成する塗布部103と、フィルム10の一面に形成された塗布膜20Mを硬化させて機能層20を形成する硬化処理部105とを備えている。 The laminated film manufacturing apparatus 100 is formed on the one surface of the film 10 and the coating unit 103 that forms the coating film 20M by applying the functional liquid 21 to the one surface 10a of the film 10 between the delivery device 101 and the winder 104. And a curing processing unit 105 that cures the applied coating film 20M to form the functional layer 20.
 図2および図3に示すように、塗布部103には、搬送されているフィルム10の一面10aに接触させて設けられる機能液21の液溜まり22と、液溜まり22のフィルム幅方向の両端位置を規定する1対のシール部材32と、各シール部材32のフィルム幅方向の外側から液溜まり22に流体圧を加える圧力付与機構40とを備えている。本積層フィルム製造装置100における塗布部103では、フィルム10は表面1aに凹凸を有する型ローラ1とローラ2との間を搬送されるように構成されており、型ローラ1とローラ2によってフィルムが挟持される位置上のローラ2にラップされたフィルム10と型ローラ1との間に、液溜まり22が設けられている。 As shown in FIGS. 2 and 3, the application unit 103 includes a liquid reservoir 22 of the functional liquid 21 provided in contact with one surface 10 a of the film 10 being conveyed, and both end positions of the liquid reservoir 22 in the film width direction. And a pressure applying mechanism 40 that applies fluid pressure to the liquid reservoir 22 from the outside of each seal member 32 in the film width direction. In the coating unit 103 in the laminated film manufacturing apparatus 100, the film 10 is configured to be conveyed between the mold roller 1 and the roller 2 having an uneven surface 1 a, and the film is formed by the mold roller 1 and the roller 2. A liquid reservoir 22 is provided between the film 10 wrapped by the roller 2 on the sandwiched position and the mold roller 1.
 1対のシール部材32は、機能液21の塗布幅よりも長い支持板34に、塗布幅Wの間
隔で平行に支持されている。塗布幅Wは積層フィルムの所望の有効幅に設定されている。
支持板34は、シール部材32を所定位置に配置支持するものであり、この支持板34とシール部材32とが一体化されて塗布幅規制部材30が構成されている。
The pair of seal members 32 are supported in parallel at intervals of the application width W on a support plate 34 longer than the application width of the functional liquid 21. The coating width W is set to a desired effective width of the laminated film.
The support plate 34 arranges and supports the seal member 32 at a predetermined position, and the support plate 34 and the seal member 32 are integrated to form the coating width regulating member 30.
 図4に、塗布幅規制部材30の斜視図を示す。
 図4に示すように、シール部材32はフィルム幅方向に幅Lを有する。また、シール部材32の型ローラ1に沿って配置される面32aはローラ1の曲面に沿った曲面を有し、ローラ2にラップされるフィルム10に沿って配置される面32bはローラ2の曲面に沿った曲面を有する。
FIG. 4 shows a perspective view of the coating width regulating member 30.
As shown in FIG. 4, the seal member 32 has a width L in the film width direction. Further, the surface 32 a disposed along the mold roller 1 of the seal member 32 has a curved surface along the curved surface of the roller 1, and the surface 32 b disposed along the film 10 wrapped by the roller 2 is the surface of the roller 2. It has a curved surface along the curved surface.
 図3に示すように、支持板34は、液溜まり22の上方空間25を覆うカバー部材を兼ねている。支持板34とシール部材32、型ローラ1およびフィルム10で囲まれた空間は液溜まり室を構成している。支持板34には、液溜まり22に機能液21を供給する機能液供給ノズル用口34a、液溜まり22の液面を検出する液面センサ用口34b、液溜まり22の上方空間25への窒素パージを行うための窒素供給ノズル用口34cおよび液溜まり22の上方空間25中の酸素濃度を測定する酸素濃度センサ用口34dが設けられている。上方空間25への窒素パージにより液溜まり22の液面を窒素雰囲気下に置くことができる。ここで、機能液供給ノズル用口、窒素供給ノズル用口の個数と位置は、機能液の物性や量、あるいは窒素供給量などに応じて適宜設定することができる。また、機能液温度や雰囲気の状態を計測するための各種センサ用の口を適宜設置することもできる。 As shown in FIG. 3, the support plate 34 also serves as a cover member that covers the upper space 25 of the liquid reservoir 22. A space surrounded by the support plate 34, the seal member 32, the mold roller 1, and the film 10 constitutes a liquid pool chamber. The support plate 34 includes a functional liquid supply nozzle port 34 a for supplying the functional liquid 21 to the liquid reservoir 22, a liquid level sensor port 34 b for detecting the liquid level of the liquid reservoir 22, and nitrogen to the upper space 25 of the liquid reservoir 22. A nitrogen supply nozzle port 34c for purging and an oxygen concentration sensor port 34d for measuring the oxygen concentration in the space 25 above the liquid reservoir 22 are provided. By purging the upper space 25 with nitrogen, the liquid level of the liquid reservoir 22 can be placed in a nitrogen atmosphere. Here, the number and position of the functional liquid supply nozzle port and the nitrogen supply nozzle port can be appropriately set according to the physical properties and amount of the functional liquid, the nitrogen supply amount, or the like. In addition, various sensor ports for measuring the functional liquid temperature and the state of the atmosphere can be appropriately installed.
 なお、ここでは、支持板34がカバー部材として設けられているが、液溜まり22の液面の雰囲気制御を行う必要がない場合には、カバー部材である必要はない。その場合には、塗布幅規制部材30は、支持板34に代えて、例えば、支持棒によって1対のシール部材32を支持する構成であってもよい。また、塗布幅規制部材30は、両端のシール部材32を共通の支持板により支持する構成に限らず、それぞれをフィルムの幅方向両側から別個に支持する形態であってもよい。 Here, the support plate 34 is provided as a cover member. However, when it is not necessary to control the atmosphere of the liquid surface of the liquid reservoir 22, it is not necessary to be a cover member. In that case, instead of the support plate 34, the application width regulating member 30 may be configured to support the pair of seal members 32 with a support rod, for example. Further, the application width regulating member 30 is not limited to the configuration in which the seal members 32 at both ends are supported by a common support plate, but may be a form in which each is separately supported from both sides in the film width direction.
 積層フィルム製造中は固定配置されるシール部材32に対して、型ローラ1、ローラ2は回転し、その回転に伴ってフィルム10は搬送される。したがって、図2に示すように、この型ローラ1、ローラ2の回転およびフィルム10の搬送を妨げないようにシール部材32は、型ローラ1およびフィルム10と一定の間隔を持って配置される。そのため、シール部材32(の面32a)と型ローラ1との隙間c、シール部材32(の面32b)とフィルム10との隙間cおよびシール部材32の下端32cとフィルム10がローラ2と接触する位置までの隙間cは必然的に生じる。これらのシール部材32の周辺の隙間c~cからは、液溜まり22からの機能液21の漏れが生じ得るため、その間隔は小さい方が好ましく、フィルム10がラップされるローラ2の表面とシール部材32の面32bの間隔はフィルム10の膜厚程度とすることが好ましい。一方で、シール部材32の下端32cは先細り形状となりフィルム10に接触するとフィルム10に傷をつけるため、フィルムに接触しないように配置する必要があり、隙間cは最も大きくなってしまう。さらに隙間cは液溜まり22の下端に位置するため、機能液21による液圧が生じる。したがって、シール部材32の周辺のうち、この隙間cから最も機能液21の液漏れが生じやすい。 During the production of the laminated film, the mold roller 1 and the roller 2 rotate with respect to the sealing member 32 fixedly arranged, and the film 10 is conveyed along with the rotation. Therefore, as shown in FIG. 2, the sealing member 32 is arranged with a certain distance from the mold roller 1 and the film 10 so as not to hinder the rotation of the mold roller 1 and the roller 2 and the conveyance of the film 10. Therefore, the seal member 32 (surface 32a) of the gap c 1 between the mold roller 1, the sealing member 32 (surface 32b) of the lower end 32c and the film 10 of the gap c 2 and the sealing member 32 between the film 10 and the roller 2 clearance c 3 position to the contacting inevitably occur. From the gaps c 1 to c 3 around these seal members 32, the functional liquid 21 may leak from the liquid reservoir 22, so that the gap is preferably small, and the surface of the roller 2 on which the film 10 is wrapped is provided. The distance between the surface 32 b of the sealing member 32 is preferably about the film thickness of the film 10. On the other hand, since the lower end 32c of the seal member 32 damaging the film 10 in contact with the film 10 becomes tapered, must be placed so as not to contact the film, the gap c 3 becomes highest. Further, since the gap c 3 is located at the lower end of the liquid reservoir 22, a hydraulic pressure is generated by the functional liquid 21. Therefore, of the periphery of the sealing member 32, leakage of the most functional fluid 21 from the gap c 3 is likely to occur.
 圧力付与機構40は、シール部材32のフィルム幅方向の外側から液溜まり22に向けて気体42を吹き付ける気体供給部としてのエアブロー装置41から構成されている。このエアブロー装置41は空気あるいは窒素ガスなどの圧縮気体のタンクを備え、ノズルから圧縮気体を放出するものである。気体42は、圧縮空気でもよいが、機能液が酸化しやすい等の制約がある場合は窒素ガス、アルゴンガスなどが好ましい。その場合はコストの観点から窒素ガスが特に好ましい。  The pressure applying mechanism 40 includes an air blowing device 41 as a gas supply unit that blows the gas 42 toward the liquid reservoir 22 from the outside of the sealing member 32 in the film width direction. The air blow device 41 includes a tank of compressed gas such as air or nitrogen gas, and discharges the compressed gas from the nozzle. The gas 42 may be compressed air, but nitrogen gas, argon gas, or the like is preferable when there is a restriction such that the functional liquid is easily oxidized. In that case, nitrogen gas is particularly preferable from the viewpoint of cost.
 エアブロー装置41は、シール部材32のフィルム幅方向外側から、シール部材32の下端32c側の隙間cに向けて気体42を吹き付ける。隙間cに気体42を吹き付けることにより、シール部材32の下端32cの隙間cから気体42を液溜まり22に送り込んで液溜まり22に対して流体圧を加え、この隙間cから機能液21がフィルム幅方向外側に漏れ出るのを防ぐことができる。 Air blow device 41, the film width direction outside of the sealing member 32, blowing air 42 toward the lower end 32c side of the gap c 3 of the sealing member 32. By blowing gas 42 into the gap c 3, the fluid pressure applied to the liquid reservoir 22 is fed into the gap c 3 of the lower end 32c of the seal member 32 gas 42 to the liquid reservoir 22, the functional liquid from the gap c 3 21 Can be prevented from leaking outward in the film width direction.
 既述の通り、シール部材32の下端32cの隙間cにおいて、液溜まり22からフィルム幅方向外側に機能液21が漏れ出やすい構造となっている。したがって、エアブロー装置41は、シール部材32の周辺の隙間全体に対して気体42を吹き付けてもよいが、最も機能液21が漏れ出やすい隙間cに気体42を吹き付ける構成が好ましい。 As described above, in the gap c 3 of the lower end 32c of the seal member 32, and has a prone structures leakage of the functional fluid 21 from the liquid reservoir 22 in the film width direction outside. Accordingly, the air blow device 41 may be sprayed gas 42 for the entire clearance near the sealing member 32, but the configuration of blowing gas 42 into prone gap c 3 leaks most functional fluid 21 is preferred.
 塗布部103において、塗布幅規制部材30には、図3に示すように、液溜まり22に機能液21を供給する機能液供給ノズル52、液溜まり22の液面を検出する液面センサ54、液溜まり22の上方空間25への窒素パージを行うための窒素供給ノズル56、および上方空間25の酸素濃度を測定するための酸素濃度センサ58がセットされる。機能液供給ノズル52は機能液を供給するためのポンプPに接続される。窒素供給機構の一部をなす窒素供給ノズル56は、図示しない配管により窒素供給装置に接続される。 As shown in FIG. 3, in the application unit 103, the application width regulating member 30 includes a functional liquid supply nozzle 52 that supplies the functional liquid 21 to the liquid reservoir 22, a liquid level sensor 54 that detects the liquid level of the liquid reservoir 22, A nitrogen supply nozzle 56 for purging nitrogen into the upper space 25 of the liquid reservoir 22 and an oxygen concentration sensor 58 for measuring the oxygen concentration in the upper space 25 are set. The functional liquid supply nozzle 52 is connected to a pump P for supplying functional liquid. The nitrogen supply nozzle 56 forming a part of the nitrogen supply mechanism is connected to a nitrogen supply device by a pipe (not shown).
 硬化処理部105は、機能液の塗布膜を硬化させる活性エネルギーを塗布膜に与えることができる構成を有していればよく、例えば、機能液が光重合性組成物である場合には、UV光を照射するUV照射装置であり、機能液が熱重合性組成物である場合には、ヒータなどの加熱装置である。 The curing processing unit 105 only needs to have a configuration capable of imparting to the coating film active energy for curing the coating film of the functional liquid. For example, when the functional liquid is a photopolymerizable composition, the curing processing section 105 It is a UV irradiation device that irradiates light, and when the functional liquid is a thermopolymerizable composition, it is a heating device such as a heater.
<積層フィルムの製造方法>
 上記構成の積層フィルム製造装置100を用いた積層フィルムの製造方法について説明する。
 支持体であるフィルム10として、PET(ポリエチレンテレフタレート)、TAC(トリアセチルセルロース)およびPEN(ポリエチレンナフタレート)などの樹脂フィルムを用いる。機能液21としては、粘度10~10,000mPa・sのアクリル樹脂などの樹脂組成物を適用することができる。
<Method for producing laminated film>
A method for producing a laminated film using the laminated film production apparatus 100 having the above configuration will be described.
As the film 10 as a support, a resin film such as PET (polyethylene terephthalate), TAC (triacetyl cellulose), and PEN (polyethylene naphthalate) is used. As the functional liquid 21, a resin composition such as an acrylic resin having a viscosity of 10 to 10,000 mPa · s can be applied.
 送出機101から繰り出されたフィルム10は塗布部103に搬送され、塗布部103において、フィルム10の一面10aが機能液21の液溜まり22に接触されるように搬送され、フィルム10の一面10aに機能液21が塗布される。このとき、シール部材32が、機能液21の塗布幅に合わせて配置されており、エアブロー装置41によりシール部材32のフィルム幅方向の外側から液溜まり22に気体42が吹き付けられることにより、液溜まり22に流体圧が加えられて、シール部材32の周辺からの機能液21の流出が抑制されつつ、機能液21による塗布膜20Mが形成される。 The film 10 fed out from the delivery machine 101 is conveyed to the application unit 103, and is conveyed so that one surface 10 a of the film 10 is in contact with the liquid reservoir 22 of the functional liquid 21 in the application unit 103. The functional liquid 21 is applied. At this time, the seal member 32 is arranged in accordance with the application width of the functional liquid 21, and the gas 42 is blown from the outside in the film width direction of the seal member 32 to the liquid reservoir 22 by the air blowing device 41, thereby the liquid reservoir. A fluid pressure is applied to 22, and the outflow of the functional liquid 21 from the periphery of the seal member 32 is suppressed, and the coating film 20 </ b> M is formed by the functional liquid 21.
 先に説明した通り、エアブロー装置41により、シール部材32の下端32c側の隙間cに対して気体42が吹き付けられることにより、下端32cの隙間c3から気体42が侵入して液溜まり22に流体圧を加え、液溜まり22からフィルム幅外側への機能液21の流出を抑制することができる。 As described above, the air blow device 41, sealed by the gas 42 is blown against the lower end 32c side of the gap c 3 members 32, the fluid in the liquid reservoir 22 by a gas 42 entering from the gaps c3 of the lower end 32c By applying pressure, the outflow of the functional liquid 21 from the liquid reservoir 22 to the outside of the film width can be suppressed.
 その後、硬化処理部105において、フィルム10上に形成された塗布膜20Mに、フィルム10の他面側からUV照射がなされて塗布膜20Mが硬化され機能層20が形成される。 Thereafter, in the curing processing unit 105, the coating film 20M formed on the film 10 is irradiated with UV from the other surface side of the film 10, and the coating film 20M is cured to form the functional layer 20.
 上記工程を経てフィルム10の一面10aに機能層20が積層されてなる積層フィルムが形成され、巻取機104によりロール状に巻き取られる。 The laminated film formed by laminating the functional layer 20 on the one surface 10a of the film 10 is formed through the above steps, and is wound up in a roll shape by the winder 104.
 本積層フィルム製造装置100および製造方法によれば、シール部材32により所望の塗布幅に規制された液溜まり22からフィルム10に機能液21を塗布するので、所望の有効幅において均一な膜厚の塗布膜を形成することができる。また、液溜まり22に対してフィルム幅方向から流体圧を加えることにより、フィルム幅方向に漏れ出す機能液を抑制することができ、機能液のロスを抑えることができる。 According to the laminated film manufacturing apparatus 100 and the manufacturing method, since the functional liquid 21 is applied to the film 10 from the liquid reservoir 22 regulated to a desired application width by the seal member 32, a uniform film thickness is obtained in a desired effective width. A coating film can be formed. Further, by applying fluid pressure to the liquid reservoir 22 from the film width direction, it is possible to suppress the functional liquid leaking in the film width direction, and it is possible to suppress loss of the functional liquid.
 本積層フィルム製造装置100において、シール部材32のフィルム幅方向の幅Lは、隙間c、cにおけるシール部材32とローラ1もしくはフィルム10との間隔をtとしたとき、L/t≧10の関係にあることが好ましい。間隔tに対してシール部材32の幅Lを十分大きくすることにより、機能液21がシール部材32を超えてフィルム幅方向外側に漏れ出るのを抑制することが可能となる。 In the laminated film manufacturing apparatus 100, the width L in the film width direction of the seal member 32 is L / t ≧ 10, where t is the distance between the seal member 32 and the roller 1 or the film 10 in the gaps c 1 and c 2 . It is preferable that the relationship is By sufficiently increasing the width L of the seal member 32 with respect to the interval t, it is possible to suppress the functional liquid 21 from leaking beyond the seal member 32 to the outside in the film width direction.
 シール部材32の材料は特に制限されるものではないが、ナイロン、ニューライト、テフロン(登録商標)等が好適に用いられる。シール部材32の材料は機能液21に対する接触角が大きい方が好ましく、接触角80°以上であることが特に好ましい。 The material of the seal member 32 is not particularly limited, but nylon, Newlite, Teflon (registered trademark), or the like is preferably used. The material of the sealing member 32 preferably has a large contact angle with respect to the functional liquid 21, and particularly preferably has a contact angle of 80 ° or more.
 本製造装置100においては、凹凸パターンを有する表面1aを備えた型ローラ1を備えており、液溜まり22において、この表面1aの凹部に入り込み、型ローラ1とローラ2とのフィルムニップ位置でその凹部に閉じ込められた機能液21がフィルム10上に転写される。そのため、フィルム10の一面10aに形成される塗布膜20Mは、型ローラ1の表面凹凸に沿った凹凸パターン状に形成され、製造される積層フィルムは、このようなパターン形成された塗布膜が硬化されてなるパターン状の機能層をフィルム10上に備えたものとなる。 The manufacturing apparatus 100 includes a mold roller 1 having a surface 1 a having a concavo-convex pattern. The liquid pool 22 enters a concave portion of the surface 1 a, and the film roller 1 and the roller 2 have a film nip position. The functional liquid 21 confined in the recess is transferred onto the film 10. Therefore, the coating film 20M formed on the one surface 10a of the film 10 is formed in a concavo-convex pattern shape along the surface concavo-convex shape of the mold roller 1, and the manufactured laminated film is cured by such a patterned film. Thus, the patterned functional layer is provided on the film 10.
 なお、表面に凹凸を有する型ローラは、凹版表面を備えたものであっても、凸版表面を備えたものであってもよい。他方、フィルム上に一様な機能層を形成する場合には、型ローラに代え表面に凹凸を有していないローラを用いてもよい。 In addition, the mold roller having irregularities on the surface may be provided with an intaglio surface or may be provided with a relief surface. On the other hand, when a uniform functional layer is formed on the film, a roller having no irregularities on the surface may be used instead of the mold roller.
 上記製造装置100における具体的な装置の寸法および機能液の一例をあげる。
 型ローラ1として、直径φ350mm、面長800mmであり、表面にμmオーダーの凹凸が刻まれているローラを用いる。ローラ2として、直径φ110mm、面長800mmを用いる。そして、型ローラ1とローラ2とは、両者の最近接位置において0~100μmの間隔で設置する。このとき、塗布速度(搬送速度)は0.5~5m/分程度とする。
 機能液21としては、例えば、TMPTA(トリメチロールプロパントリアクリレート)(ダイセル・オルネクス社製)を99質量部、重合開始剤であるイルガキュアTPO(BASF社製)1質量部を混合して得られる粘度100mPa・sの樹脂組成物を用いる。
 このとき、硬化処理部105はUV照射装置であり、例えば、空冷式メタルハライドランプ(アイグラフィックス社製)500mW/cmを備える。そして、300mJ/cmで紫外線を塗布膜に照射する。上記仕様により樹脂フィルム上に型ローラの凹凸に応じたパターン状に形成されたアクリル層からなる機能層を備えた積層フィルムを製造することができる。
An example of specific dimensions and functional fluid of the manufacturing apparatus 100 will be given.
As the mold roller 1, a roller having a diameter of 350 mm and a surface length of 800 mm and having a surface with irregularities on the order of μm is used. As the roller 2, a diameter of 110 mm and a surface length of 800 mm are used. The mold roller 1 and the roller 2 are installed at an interval of 0 to 100 μm at the closest position between them. At this time, the coating speed (conveyance speed) is about 0.5 to 5 m / min.
As the functional liquid 21, for example, 99 parts by mass of TMPTA (trimethylolpropane triacrylate) (manufactured by Daicel Ornex) and 1 part by mass of Irgacure TPO (manufactured by BASF) as a polymerization initiator are obtained. A resin composition of 100 mPa · s is used.
At this time, the curing processing unit 105 is a UV irradiation device, and includes, for example, an air-cooled metal halide lamp (manufactured by Eye Graphics) 500 mW / cm 2 . Then, the coating film is irradiated with ultraviolet rays at 300 mJ / cm 2 . According to the above specifications, a laminated film having a functional layer made of an acrylic layer formed in a pattern according to the unevenness of the mold roller on the resin film can be produced.
<積層フィルム製造装置の設計変更例>
 図5に設計変更例の積層フィルム製造装置110の構成の概略構成図を示す。図1の積層フィルム製造装置100と同一要素には同一の符号を付し、詳細な説明を省略する。
<Design change example of laminated film manufacturing equipment>
The schematic block diagram of the structure of the laminated film manufacturing apparatus 110 of the example of a design change is shown in FIG. The same elements as those of the laminated film manufacturing apparatus 100 of FIG. 1 are denoted by the same reference numerals, and detailed description thereof is omitted.
 設計変更例の積層フィルム製造装置110は、機能層20を第1および第2のフィルム10、12で挟んだサンドイッチ状の積層フィルムを製造する製造装置であり、既述の積層フィルム製造装置100の構成に加え、第2のフィルム12をロール状態にて支持し、繰り出す送出機102を備えている。そして、塗布部103において、第1のフィルム10と第2のフィルム12との間に液溜まり22が設けられて、塗布膜20Mを第1および第2のフィルムで挟持して搬送する構成となっている。本構成においては、型ローラ1に代えて、表面に凹凸を有していないローラ3が備えられている。本製造装置110によって製造される積層フィルムは、第1のフィルム10、機能層20および第2のフィルム12からなる。 The laminated film manufacturing apparatus 110 of the design change example is a manufacturing apparatus that manufactures a sandwich-shaped laminated film in which the functional layer 20 is sandwiched between the first and second films 10 and 12, and the laminated film manufacturing apparatus 100 described above. In addition to the configuration, the second film 12 is supported in a roll state and is provided with a delivery device 102 that feeds it out. And in the application part 103, the liquid reservoir 22 is provided between the 1st film 10 and the 2nd film 12, and it becomes the structure which clamps and conveys the coating film 20M with the 1st and 2nd film. ing. In this configuration, instead of the mold roller 1, a roller 3 having no irregularities on the surface is provided. The laminated film manufactured by the manufacturing apparatus 110 includes the first film 10, the functional layer 20, and the second film 12.
 このように、液溜まり22は、フィルムとローラとの間に限らず、フィルムとフィルムの間に形成することも可能であり、製造装置100、110いずれの構成であっても、同様のシール部材32と圧力付与機構40を備えることにより、均一な塗布膜の形成および機能液のロスを抑制する効果を同様に得ることができる。 As described above, the liquid reservoir 22 is not limited to be formed between the film and the roller, but can be formed between the film and the film. By providing the pressure application mechanism 32 and the pressure application mechanism 40, it is possible to obtain the same effect of suppressing the formation of a uniform coating film and the loss of the functional liquid.
 上記実施形態の製造装置100、110において、圧力付与機構40はエアブロー装置41から構成されているが、圧力付与機構40は上記構成に限るものではない。以下に、圧力付与機構40の設計変更例について説明する。 In the manufacturing apparatuses 100 and 110 of the above-described embodiment, the pressure applying mechanism 40 is configured by the air blowing device 41, but the pressure applying mechanism 40 is not limited to the above configuration. Below, the example of a design change of the pressure provision mechanism 40 is demonstrated.
<圧力付与機構の設計変更例1>
 図6に圧力付与機構40の設計変更例1の構成を示す。図6のように、本例においては圧力付与機構40が、シール部材32のフィルム幅方向外側に隣接するバッファ室44を画成するバッファ室画成部材45と、バッファ室44内に向かってバッファ室画成部材45のフィルム幅方向の外側から気体42を吹き付ける気体供給部であるエアブロー装置41を備えている。バッファ室画成部材45は塗布幅規制部材30の支持板34にシール部材32と共に支持される。バッファ室画成部材45はシール部材32とほぼ同一の形状を有し、ローラ1、2に沿った曲面を備えている。シール部材32とバッファ室画成部材45の間隔は、バッファ室44を所望の容量とする距離で適宜定めればよい。図6においては、機能液21がバッファ室44に相当量漏れ出して充満する態様を示したが、これに限られず、液溜まり22からシール部材32とフィルム10の隙間を漏れ出てくる機能液に気体42の圧力が加えられる構成であればよい。
<Design change example 1 of pressure application mechanism>
FIG. 6 shows a configuration of a first design change example of the pressure applying mechanism 40. As shown in FIG. 6, in this example, the pressure applying mechanism 40 includes a buffer chamber defining member 45 that defines a buffer chamber 44 that is adjacent to the outer side in the film width direction of the seal member 32, and a buffer toward the buffer chamber 44. An air blowing device 41 that is a gas supply unit that blows the gas 42 from the outside in the film width direction of the chamber defining member 45 is provided. The buffer chamber defining member 45 is supported on the support plate 34 of the coating width regulating member 30 together with the seal member 32. The buffer chamber defining member 45 has substantially the same shape as the seal member 32 and has a curved surface along the rollers 1 and 2. The interval between the seal member 32 and the buffer chamber defining member 45 may be appropriately determined by a distance that makes the buffer chamber 44 a desired capacity. Although FIG. 6 shows a mode in which the functional liquid 21 leaks and fills the buffer chamber 44 by a considerable amount, the present invention is not limited to this, and the functional liquid leaks from the liquid reservoir 22 through the gap between the seal member 32 and the film 10. What is necessary is just the structure to which the pressure of the gas 42 is added to.
 このようなバッファ室44を備えた場合、バッファ室44を介して液溜まり22に流体圧を加えることができる。バッファ室44内において気体42が吹き付けられた機能液21はバッファ室と液溜まり22に連通するシール部材32の下端32cの隙間cに押し戻され、液溜まり22に対して流体圧を加える。このようにバッファ室44内に漏れ出た機能液21が液溜まり22に流体圧を加えることにより機能液21の液溜まり22からの流出を抑制することができる。 When such a buffer chamber 44 is provided, fluid pressure can be applied to the liquid reservoir 22 via the buffer chamber 44. The functional liquid 21 to which the gas 42 is blown in the buffer chamber 44 is pushed back into the gap c 3 at the lower end 32 c of the seal member 32 communicating with the buffer chamber and the liquid reservoir 22, and applies fluid pressure to the liquid reservoir 22. As described above, the functional liquid 21 leaking into the buffer chamber 44 applies fluid pressure to the liquid reservoir 22, whereby the outflow of the functional liquid 21 from the liquid reservoir 22 can be suppressed.
 図3に示したように、バッファ室を備えず、シール部材32の外側からシール部材32の下端32c側の隙間cに気体を吹き付ける構成では、液溜まり22に気体42が侵入し、液溜まり22に気泡42aが発生することがある。気泡42aの多くは液溜まり上の空間へと浮き上がっていくが、それら気泡42aの一部が液溜まり22の機能液中に含まれた状態で塗布されると、塗布膜20M中に気泡が生じ、積層フィルムとしての品質の低下を引き起こす場合がある。 As shown in FIG. 3, does not include the buffer chamber, the arrangement for blowing a gas from the outside of the seal member 32 to the lower end 32c side of the gap c 3 of the sealing member 32, the gas 42 enters the liquid reservoir 22, liquid pool 22 may generate bubbles 42a. Most of the bubbles 42a float up to the space above the liquid reservoir, but if a part of the bubbles 42a is applied in the functional liquid of the liquid reservoir 22, bubbles are generated in the coating film 20M. The quality of the laminated film may be reduced.
 本構成のように、バッファ室44を設け、バッファ室44に対してバッファ室画成部材45のフィルム幅方向外側から気体を吹き付けて、バッファ室画成部材45の下端から気体をバッファ室44内の、液溜まり側から漏れ出た機能液に気体による圧力を加える構成であれば、気体42の気泡42aはバッファ室44内で液面に浮き上がっていくため、シール部材のフィルム幅方向内側の液溜まり22側に気泡42aが侵入するのを抑制することができ、積層フィルムの品質を担保することができる。なお、バッファ室画成部材45には、エア抜きとなる開口が一部に設けられていることが好ましい。
 なお、図3に示す構成であっても、機能液の粘度と気体による圧力とのバランスにより、機能液中にほとんど気泡が入り込まないように制御することは可能であり、粘度と圧力を調整することにより、十分に良好な品質の積層フィルムを製造することが可能である。
As in this configuration, a buffer chamber 44 is provided, and gas is blown from the outer side in the film width direction of the buffer chamber defining member 45 to the buffer chamber 44, and gas is supplied from the lower end of the buffer chamber defining member 45 to the buffer chamber 44. If the pressure by the gas is applied to the functional liquid leaking from the liquid reservoir side, the bubble 42a of the gas 42 floats up to the liquid surface in the buffer chamber 44, so the liquid inside the film width direction of the seal member It can suppress that the bubble 42a penetrate | invades into the pool 22 side, and can ensure the quality of a laminated | multilayer film. In addition, it is preferable that the buffer chamber defining member 45 is provided with a part of an opening for releasing air.
Even in the configuration shown in FIG. 3, it is possible to control so that almost no bubbles enter the functional liquid by adjusting the balance between the viscosity of the functional liquid and the pressure of the gas, and the viscosity and the pressure are adjusted. Thus, it is possible to produce a laminated film having a sufficiently good quality.
<圧力付与機構の設計変更例2>
 図7に圧力付与機構40の設計変更例2の構成を示す。図7のように、本例においては圧力付与機構40が、シール部材32のフィルム幅方向外側にバッファ室44を画成するバッファ室画成部材45と、バッファ室44のさらにフィルム幅方向外側に隣接して加圧室48を画成する加圧室画成部材49と、液溜まり22からバッファ室44に漏れ出た機能液21に、バッファ室画成部材45のフィルム幅方向の外側から気体42を加圧室48に供給する気体供給部であるエアブロー装置41を備えている。本例においては、エアブロー装置41は、外部から気体を吹き付けるのではなく、ノズルが加圧室画成部材49に設けられた供給口49aに差し込まれて、加圧室48に気体42に供給する。但し、加圧
室48への気体42の供給方法として、加圧室画成部材49の下端の隙間に、フィルム幅方向外側から気体を吹き付けるようにしても構わない。設計変更例1と同様にバッファ室44を備えているので、バッファ室44を介して液溜まり22に流体圧を加えることができる。
<Example 2 of design change of pressure application mechanism>
FIG. 7 shows a configuration of a second modification example of the pressure application mechanism 40. As shown in FIG. 7, in this example, the pressure applying mechanism 40 includes a buffer chamber defining member 45 that defines a buffer chamber 44 on the outer side of the seal member 32 in the film width direction, and an outer side of the buffer chamber 44 in the film width direction. Gas from the outside of the buffer chamber defining member 45 in the film width direction is exposed to the pressurizing chamber defining member 49 that adjoins the pressurizing chamber 48 and the functional liquid 21 leaking from the liquid reservoir 22 to the buffer chamber 44. An air blowing device 41 which is a gas supply unit for supplying 42 to the pressurizing chamber 48 is provided. In this example, the air blowing device 41 does not blow gas from the outside, but the nozzle is inserted into the supply port 49 a provided in the pressurizing chamber defining member 49 and supplies the gas 42 to the pressurizing chamber 48. . However, as a method for supplying the gas 42 to the pressurizing chamber 48, the gas may be blown into the gap at the lower end of the pressurizing chamber defining member 49 from the outside in the film width direction. Since the buffer chamber 44 is provided in the same manner as in the design change example 1, fluid pressure can be applied to the liquid reservoir 22 via the buffer chamber 44.
 図8に、本例の圧力付与機構の一部構成を備える塗布幅規制部材30の斜視図を示す。図8に示すように、バッファ室画成部材45は塗布幅規制部材30の支持板34にシール部材32と共に支持される。同様に、加圧室画成部材49も支持板34に支持される。バッファ室画成部材45および加圧室画成部材49は、シール部材32とほぼ同一の形状を有し、ローラ1、2に沿った曲面を備えている。シール部材32とバッファ室画成部材45の間隔は、バッファ室44を所望の容量とする距離で適宜定めればよく、バッファ室画成部材45と加圧室画成部材49の間隔は、加圧室48を所望の容量とする距離で適宜定めればよい。
 なお、シール部材32と加圧室48との間にはバッファ室44を1つのみならず、複数備えていてもよい。
FIG. 8 shows a perspective view of the coating width regulating member 30 having a partial configuration of the pressure application mechanism of this example. As shown in FIG. 8, the buffer chamber defining member 45 is supported on the support plate 34 of the coating width regulating member 30 together with the seal member 32. Similarly, the pressurizing chamber defining member 49 is also supported by the support plate 34. The buffer chamber defining member 45 and the pressurizing chamber defining member 49 have substantially the same shape as the seal member 32 and have curved surfaces along the rollers 1 and 2. The interval between the seal member 32 and the buffer chamber defining member 45 may be appropriately determined by a distance that makes the buffer chamber 44 a desired capacity, and the interval between the buffer chamber defining member 45 and the pressurizing chamber defining member 49 may be increased. What is necessary is just to determine suitably by the distance which makes the pressure chamber 48 a desired capacity | capacitance.
Note that not only one buffer chamber 44 but also a plurality of buffer chambers 44 may be provided between the seal member 32 and the pressurizing chamber 48.
 本例においては、図7に示すように、加圧室48に気体42が供給されて加圧室48内は加圧され、隣接するバッファ室44内に加圧室48で加圧された気体42の圧力が加えられる。バッファ室44に加えられた気体による圧力は直接もしくは間接的にシール部材32側から漏れ出た機能液21に加えられる。そして、バッファ室44内において気体42による圧力が加えられた機能液21はシール部材32との連通部に押し戻され、液溜まり22に対して流体圧を加える。このようにバッファ室44内に漏れ出た機能液21による流体圧により機能液21の液溜まり22からの流出を抑制することができる。 In this example, as shown in FIG. 7, the gas 42 is supplied to the pressurizing chamber 48, the inside of the pressurizing chamber 48 is pressurized, and the gas pressurized in the adjacent buffer chamber 44 by the pressurizing chamber 48. 42 pressures are applied. The pressure of the gas applied to the buffer chamber 44 is applied directly or indirectly to the functional liquid 21 leaking from the seal member 32 side. Then, the functional liquid 21 to which the pressure by the gas 42 is applied in the buffer chamber 44 is pushed back to the communication portion with the seal member 32 and applies fluid pressure to the liquid reservoir 22. Thus, the outflow of the functional liquid 21 from the liquid reservoir 22 can be suppressed by the fluid pressure due to the functional liquid 21 leaking into the buffer chamber 44.
 1  型ローラ
 1a 型ローラの表面
 2  ローラ
 10、12 フィルム
 10a フィルムの表面
 20  機能層
 20M  塗布膜
 21  機能液
 22  液溜まり
 25  液溜まりの上方空間
 30  塗布幅規制部材
 32  シール部材
 32a、32b  シール部材の面
 32c  シール部材の下端
 34  支持板
 34a  機能液供給ノズル用口
 34b  液面センサ用口
 34c  窒素供給ノズル用口
 34d  酸素濃度測定口
 40  圧力付与機構
 41  エアブロー装置
 42  気体
 42a  気泡
 44  バッファ室
 45  バッファ室画成部材
 48  加圧室
 49  加圧室画成部材
 49a  供給口
 52  機能液供給ノズル
 54  液面センサ
 56  窒素供給ノズル
 58  酸素濃度センサ
 100、110  積層フィルム製造装置
 101、102  送出機
 103  塗布部
 104  巻取機
 105  硬化処理部
 110  製造装置
1 type roller 1a surface of type roller 2 roller 10, 12 film 10a surface of film 20 functional layer 20M coating film 21 functional liquid 22 liquid pool 25 upper space of liquid pool 30 coating width regulating member 32 seal member 32a, 32b seal member Surface 32c Lower end of seal member 34 Support plate 34a Port for functional liquid supply nozzle 34b Port for liquid level sensor 34c Port for nitrogen supply nozzle 34d Oxygen concentration measurement port 40 Pressure applying mechanism 41 Air blow device 42 Gas 42a Bubble 44 Buffer chamber 45 Buffer chamber Defining member 48 Pressurizing chamber 49 Pressurizing chamber defining member 49a Supply port 52 Functional liquid supply nozzle 54 Liquid level sensor 56 Nitrogen supply nozzle 58 Oxygen concentration sensor 100, 110 Multilayer film manufacturing apparatus 101, 102 Delivery machine 103 Application unit 104 Winder 105 Curing Processing Unit 110 Manufacturing Equipment

Claims (11)

  1.  フィルムの一面に機能液の液溜まりを接触させた状態で前記フィルムを搬送して該フィルムの前記一面に前記機能液を塗布することにより、前記フィルムと該フィルムの前記一面に形成された前記機能液の塗布膜からなる機能層とを備えた積層フィルムを製造する積層フィルムの製造方法であって、
     前記液溜まりのフィルム幅方向の両端位置を規定するシール部材を、前記機能液の塗布幅に合わせて配置し、該シール部材の前記フィルム幅方向の外側から前記液溜まりに流体圧を加えることにより、前記シール部材の周辺からの前記機能液の流出を抑制しつつ、前記機能液による塗布膜を形成する積層フィルムの製造方法。
    The function formed on the one surface of the film and the film by transporting the film in a state where the liquid reservoir of the functional liquid is in contact with one surface of the film and applying the functional liquid on the one surface of the film A method for producing a laminated film for producing a laminated film comprising a functional layer comprising a coating film of a liquid,
    A seal member that defines both end positions of the liquid reservoir in the film width direction is arranged in accordance with the application width of the functional liquid, and fluid pressure is applied to the liquid reservoir from the outside of the seal member in the film width direction. The manufacturing method of the laminated film which forms the coating film by the said functional liquid, suppressing the outflow of the said functional liquid from the periphery of the said sealing member.
  2.  前記液溜まりの液面を窒素雰囲気下に置いて前記塗布膜を形成する請求項1記載の積層フィルムの製造方法。 The method for producing a laminated film according to claim 1, wherein the coating film is formed by placing the liquid surface of the liquid reservoir in a nitrogen atmosphere.
  3.  前記流体圧を、窒素ガスにより生じさせる請求項1または2記載の積層フィルムの製造方法。 The method for producing a laminated film according to claim 1 or 2, wherein the fluid pressure is generated by nitrogen gas.
  4.  フィルムを搬送する搬送機構と、
     搬送されているフィルムの一面に接触させて設けられる機能液の液溜まりと、
     前記液溜まりのフィルム幅方向の両端位置を規定するシール部材と、
     該シール部材の前記フィルム幅方向の外側から前記液溜まりに流体圧を加える圧力付与機構とを備えた積層フィルム製造装置。
    A transport mechanism for transporting the film;
    A reservoir of functional liquid provided in contact with one surface of the film being conveyed;
    A seal member that defines both end positions of the liquid pool in the film width direction;
    A laminated film manufacturing apparatus comprising: a pressure applying mechanism that applies fluid pressure to the liquid pool from the outside of the seal member in the film width direction.
  5.  前記圧力付与機構が、前記シール部材の前記フィルム幅方向の外側に隣接するバッファ室を画成するバッファ室画成部材を備え、前記バッファ室を介して前記液溜まりに前記流体圧を加える請求項4記載の積層フィルム製造装置。 The pressure applying mechanism includes a buffer chamber defining member that defines a buffer chamber adjacent to an outer side of the seal member in the film width direction, and applies the fluid pressure to the liquid reservoir through the buffer chamber. 4. The laminated film manufacturing apparatus according to 4.
  6.  前記バッファ室内に向けて、前記バッファ室画成部材の前記フィルム幅方向の外側から気体を吹き付ける気体供給部を備え、
     前記バッファ室内に前記気体を吹き付けることにより、前記バッファ室を介して前記液溜まりに前記流体圧を加える請求項5記載の積層フィルム製造装置。
    A gas supply unit that blows gas from outside the film width direction of the buffer chamber defining member toward the buffer chamber,
    The laminated film manufacturing apparatus according to claim 5, wherein the fluid pressure is applied to the liquid reservoir through the buffer chamber by blowing the gas into the buffer chamber.
  7.  前記バッファ室の前記フィルム幅方向の外側に隣接する加圧室を画成する加圧室画成部材と、該加圧室に気体を供給する気体供給部とを備え、
     前記バッファ室内に、前記加圧室から供給された前記気体による圧力が加えられることにより、前記バッファ室を介して前記液溜まりに前記流体圧を加える請求項5記載の積層フィルム製造装置。
    A pressurization chamber defining member that defines a pressurization chamber adjacent to the outside of the buffer chamber in the film width direction, and a gas supply unit that supplies gas to the pressurization chamber,
    The laminated film manufacturing apparatus according to claim 5, wherein the fluid pressure is applied to the liquid reservoir through the buffer chamber by applying a pressure by the gas supplied from the pressurizing chamber to the buffer chamber.
  8.  前記圧力付与機構が、前記シール部材の前記フィルム幅方向の外側から前記液溜まりに向けて気体を吹き付ける気体供給部を備え、前記気体を吹き付けることにより前記液溜まりに前記流体圧を加える請求項4記載の積層フィルム製造装置。 The said pressure provision mechanism is equipped with the gas supply part which blows gas toward the said liquid reservoir from the outer side of the said film width direction of the said sealing member, and applies the said fluid pressure to the said liquid reservoir by spraying the said gas. The laminated film manufacturing apparatus described.
  9.  前記気体供給部が窒素を供給するものである請求項6から8いずれか1項記載の積層フィルム製造装置。 The laminated film manufacturing apparatus according to any one of claims 6 to 8, wherein the gas supply unit supplies nitrogen.
  10.  前記液溜まりの上方空間を覆うカバー部材と、前記上方空間に窒素を供給する窒素供給機構を備えた請求項4から9いずれか1項記載の積層フィルム製造装置。 The laminated film manufacturing apparatus according to any one of claims 4 to 9, further comprising a cover member that covers an upper space of the liquid reservoir and a nitrogen supply mechanism that supplies nitrogen to the upper space.
  11.  前記液溜まりに接触するローラを備え、該ローラは表面に凹版または凸版を有する請求項4から10いずれか1項記載の積層フィルム製造装置。 The laminated film manufacturing apparatus according to any one of claims 4 to 10, further comprising a roller in contact with the liquid reservoir, the roller having an intaglio or a relief on the surface.
PCT/JP2018/004945 2017-03-28 2018-02-13 Method for manufacturing laminated film and device for manufacturing laminated film WO2018179932A1 (en)

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