KR102250634B1 - Laminated film manufacturing method and lamination film manufacturing apparatus - Google Patents

Abstract

A method and apparatus for producing a laminated film capable of controlling the application width of a functional liquid, maintaining a uniform film thickness of the coating film, and suppressing loss of the functional liquid are provided.
The film 10 is conveyed in a state in which the liquid reservoir 22 of the functional liquid 21 is brought into contact with one surface of the film 10, and the functional liquid 21 is applied to one surface of the film 10. ) And a functional layer 20 made of a coating film 20M of the functional liquid 21 formed on one side of the film 10 is prepared. Here, the sealing member 32 defining the position of both ends of the liquid reservoir 22 in the film width direction is arranged according to the application width of the functional liquid 21, and the outer side of the sealing member 32 in the film width direction By applying a fluid pressure to the liquid storage portion 22, a coating film 20M of the functional liquid 21 is formed while suppressing the leakage of the functional liquid 21 from the periphery of the sealing member 32.

Description

Laminated film manufacturing method and lamination film manufacturing apparatus

The present invention relates to a method for producing a laminated film and a production apparatus for producing a laminated film having a functional layer on the film by using a liquid storage portion of a functional liquid in a film continuously conveyed by a roller.

In order to control the coating width of the functional liquid onto the film, it was necessary to use expensive and precise liquid supply equipment such as a gauge and a die. In addition, for width control of a low viscosity coating liquid, a method of using a pin fixing effect by physically pressing a resin such as Teflon (registered trademark) on both ends of a coating roller has been adopted.

In Patent Documents 1 and 2, a roller coating apparatus is disclosed in which a liquid storage portion of a functional liquid is provided between a backing roller and a doctor roller, and a functional liquid in the liquid storage portion is applied onto a film passing through the backing roller. In addition, Patent Document 2 proposes a dam member comprising a side plate that regulates the application width by partitioning both sides of the liquid storage portion and a back plate that partitions the rear end, and defines a liquid storage region.

Patent Document 1: Japanese Laid-Open Patent Publication No. 2011-098283 Patent Document 2: Japanese Published Utility Model Publication No. Hei 6-019871

In the production of a laminated film, controlling the coating width of the functional layer provided on the film or between the films is an important subject in order to improve the production efficiency by constant product width. It is considered that it is possible to regulate the coating width by using the dam member having a side plate described in Patent Document 2.

However, since the film is conveyed by rotating the roller with respect to the fixedly arranged dam member, there is an inevitable gap between the dam member and the film or roller. Therefore, there is a fear that the functional liquid leaks from such a gap, and the loss of the functional liquid may occur. The lower the viscosity of the functional liquid is, the more remarkable this problem is, and when the outflow of the functional liquid is not suppressed, there is a concern that the film thickness decreases at the end of the coating film even within the effective width of the coating film.

The present invention has been made in view of the above circumstances, and it is possible to control the coating width of the functional liquid, to keep the film thickness of the coating film uniform, and to suppress the loss of the functional liquid. It is an object of the present invention to provide a manufacturing apparatus.

The manufacturing method of the laminated film of the present invention is a coating film of a film and a functional liquid formed on one surface of the film by conveying the film in a state in which the liquid reservoir of the functional liquid is in contact with one surface of the film and applying the functional liquid to one surface of the film As a method for producing a laminated film for producing a laminated film having a functional layer consisting of,

Seal members defining the positions of both ends of the liquid reservoir in the film width direction are arranged in accordance with the application width of the functional liquid, and a fluid pressure is applied to the liquid reservoir from the outside in the film width direction of the seal member from the periphery of the seal member. It is a manufacturing method of a laminated film in which a coating film is formed with a functional liquid while suppressing the outflow of the functional liquid.

The fluid pressure applied to the liquid reservoir may be dynamic or positive.

In the method for producing a laminated film of the present invention, a coating film may be formed by placing the liquid surface of the liquid storage portion under a nitrogen atmosphere.

In the method for producing a laminated film of the present invention, the fluid pressure may be generated by nitrogen gas.

The laminated film manufacturing apparatus of this invention is a conveyance mechanism which conveys a film, and,

A liquid storage part of the functional liquid provided by contacting one surface of the film being conveyed,

A sealing member defining the positions of both ends of the liquid storage portion in the width direction of the film,

It is a laminated film manufacturing apparatus provided with a pressure applying mechanism which applies a fluid pressure to a liquid storage part from the outside of the film width direction of a sealing member.

In the laminated film manufacturing apparatus of the present invention, the pressure applying mechanism includes a buffer chamber partition member for partitioning a buffer chamber adjacent to the outside in the film width direction of the sealing member, and applies a fluid pressure to the liquid reservoir through the buffer chamber. It may be a configuration.

The apparatus for producing a laminated film of the present invention includes a gas supply unit for injecting gas from the outside of the film width direction of the buffer chamber partition member toward the inside of the buffer chamber, and liquid storage through the buffer chamber by injecting the gas into the buffer chamber. It may be a configuration in which fluid pressure is applied to the part.

The apparatus for producing a laminated film of the present invention includes a pressurization chamber partition member for partitioning a pressurization chamber adjacent to the outside in the film width direction of the buffer chamber, and a gas supply unit for supplying gas to the pressurization chamber, and in the buffer chamber, to the pressurization chamber. It may be of a configuration in which a fluid pressure is applied to the liquid reservoir through the buffer chamber by applying pressure by the gas supplied therefrom.

In the laminated film manufacturing apparatus of the present invention, the pressure applying mechanism includes a gas supply unit for injecting gas toward the liquid storage unit from the outside in the film width direction of the sealing member, and applies fluid pressure to the liquid storage unit by injecting the gas. May be.

In the laminated film production apparatus of the present invention, it is preferable that the gas supply unit supplies nitrogen.

In the laminated film production apparatus of the present invention, a cover member covering an upper space of the liquid storage portion may be provided, and a nitrogen supply mechanism for supplying nitrogen to the upper space may be provided.

In the laminated film manufacturing apparatus of this invention, the roller which contacts a liquid storage part is provided, and the roller may have a concave plate or a convex plate on the surface.

According to the manufacturing method and manufacturing apparatus of the laminated film of the present invention, since the functional liquid is applied to the film from the liquid reservoir regulated by the desired coating width by the sealing member, a coating film having a uniform film thickness can be formed in a desired effective width. have. Further, by applying a fluid pressure to the liquid storage portion from the outside in the film width direction of the sealing member, the functional liquid leaking in the film width direction can be suppressed, and loss of the functional liquid can be suppressed.

1 is a diagram showing a schematic configuration of a laminated film manufacturing apparatus.
2 is an enlarged view of an application portion of a method for manufacturing a laminated film.
3 is a diagram showing a partial configuration of an application portion of a method for manufacturing a laminated film.
4 is a perspective view of a coating width regulating member.
5 is a diagram showing a schematic configuration of a design modification example of a laminated film manufacturing apparatus.
6 is a diagram showing the configuration of a design modification example 1 of a pressure applying mechanism.
7 is a diagram showing a configuration of a design modification example 2 of a pressure applying mechanism.
8 is a perspective view of a coating width regulating member having a partial configuration of a design modification example 2 of a pressure applying mechanism.

Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In addition, in order to facilitate visual recognition, the scale of each component in the drawings and the like were appropriately changed from the actual ones.

<Laminated film manufacturing apparatus>

1 is a schematic configuration diagram of an example of a laminated film manufacturing apparatus according to a first embodiment of the present invention. FIG. 2 is an enlarged view of the coating unit 103 of the laminated film manufacturing apparatus 100 of FIG. 1, and FIG. 3 is a view showing a partial configuration of the coating unit 103.

The laminated film manufacturing apparatus 100 includes a feeder 101 for supporting and unwinding a film 10 such as a resin film used as a support in a roll state, and a plurality of unillustrated guides for conveying a film-like work. It is equipped with a roller and a take-up machine 104 for winding the laminated film formed through each processing step in a roll shape, and a conveying mechanism for conveying the film by the feeder 101, the guide roller, and the take-up machine 104 is constituted. have.

The laminated film manufacturing apparatus 100 is a coating for forming a coating film 20M by applying a functional liquid 21 to one surface 10a of the film 10 between the feeder 101 and the take-up machine 104 A portion 103 and a curing treatment portion 105 for forming a functional layer 20 by curing the coated film 20M formed on one surface of the film 10 are provided.

2 and 3, in the application part 103, a liquid storage portion 22 of a functional liquid 21 provided by contacting one surface 10a of the conveyed film 10, and a liquid storage A pair of seal members 32 defining the positions of both ends of the part 22 in the film width direction, and pressure to apply fluid pressure to the liquid storage part 22 from the outside of each seal member 32 in the film width direction It is equipped with a mechanism (40). In the coating part 103 in this laminated film manufacturing apparatus 100, the film 10 is comprised so that it may convey between the mold roller 1 and the roller 2 which have irregularities on the surface 1a, A liquid reservoir 22 is provided between the mold roller 1 and the film 10 wrapped in the roller 2 on the position where the film is held between the mold roller 1 and the roller 2.

The pair of sealing members 32 are supported in parallel at intervals of the coating width W on the support plate 34 which is longer than the coating width of the functional liquid 21. The coating width W is set to the desired effective width of the laminated film.

The support plate 34 arranges and supports the sealing member 32 at a predetermined position, and the support plate 34 and the sealing member 32 are integrated to form a coating width regulating member 30.

4 shows a perspective view of the coating width regulating member 30.

As shown in FIG. 4, the sealing member 32 has a width L in the film width direction. In addition, the surface 32a of the sealing member 32 disposed along the mold roller 1 has a curved surface along the curved surface of the roller 1, and the surface disposed along the film 10 wrapped on the roller 2 32b has a curved surface along the curved surface of the roller 2.

As shown in FIG. 3, the support plate 34 also serves as a cover member covering the upper space 25 of the liquid reservoir 22. The space surrounded by the support plate 34, the sealing member 32, the mold roller 1, and the film 10 constitutes a liquid storage chamber. In the support plate 34, an inlet 34a for a functional liquid supply nozzle for supplying the functional liquid 21 to the liquid storage 22, an inlet 34b for a liquid level sensor for detecting the liquid level of the liquid storage 22, An oxygen concentration sensor that measures the oxygen concentration in the nitrogen supply nozzle inlet 34c for purging nitrogen into the upper space 25 of the liquid storage 22 and in the upper space 25 of the liquid storage 22 A dragon inlet 34d is provided. The liquid level of the liquid storage unit 22 can be placed under a nitrogen atmosphere by purging nitrogen to the upper space 25. Here, the number and position of the inlet for the functional liquid supply nozzle and the inlet for the nitrogen supply nozzle can be appropriately set according to the physical properties or quantity of the functional liquid, or the amount of nitrogen supplied. Further, it is also possible to appropriately provide inlets for various sensors for measuring the temperature of the functional liquid and the state of the atmosphere.

In addition, although the support plate 34 is provided here as a cover member, it is not necessary to be a cover member when it is not necessary to control the atmosphere of the liquid level of the liquid reservoir 22. In that case, the coating width regulating member 30 may be configured to support the pair of sealing members 32 by, for example, a support bar instead of the support plate 34. In addition, the coating width regulating member 30 is not limited to a configuration in which the sealing members 32 at both ends are supported by a common support plate, and may be supported separately from both sides in the width direction of the film.

During the production of the laminated film, the mold roller 1 and the roller 2 rotate with respect to the sealing member 32 fixedly disposed, and the film 10 is conveyed in accordance with the rotation. Therefore, as shown in FIG. 2, the sealing member 32 is the mold roller 1 and the film 10 so as not to interfere with the rotation of the mold release roller 1, the roller 2, and the conveyance of the film 10. And are arranged at regular intervals. For this reason, the gap between the sealing member 32 (the surface 32a) and the mold roller 1 (C ₁ ), the gap between the sealing member 32 (the surface 32b) and the film 10 (C _{2 ) And the gap (C 3} ) between the lower end (32c) of the sealing member (32) and the position where the film (10) contacts the roller (2) occurs inevitably. Since leakage of the functional liquid 21 from the liquid reservoir 22 may occur from _{the gaps (C 1} to C ₃ ) around the sealing member 32, the spacing is preferably small, and the film It is preferable that the distance between the surface of the roller 2 on which (10) is wrapped and the surface 32b of the sealing member 32 be about the thickness of the film 10. On the other hand, since the lower end 32c of the sealing member 32 becomes a shape with a narrow end, and when it comes into contact with the film 10, it damages the film 10, so it is necessary to arrange it so as not to contact the film. C ₃ ) becomes the largest. Further, since the gap C ₃ is located at the lower end of the liquid reservoir 22, hydraulic pressure due to the functional liquid 21 is generated. Therefore, liquid leakage of the functional liquid 21 is most likely to occur from _{this gap C 3 in} the periphery of the sealing member 32.

The pressure applying mechanism 40 is constituted by an air blower 41 as a gas supply unit that injects the gas 42 toward the liquid reservoir 22 from the outside in the film width direction of the sealing member 32. This air blowing device 41 is provided with a tank of compressed gas such as air or nitrogen gas, and discharges compressed gas from a nozzle. The gas 42 may be compressed air, but nitrogen gas, argon gas, or the like is preferable when there is a limitation such as that the functional liquid is easily oxidized. In that case, nitrogen gas is particularly preferable from the viewpoint of cost.

The air blowing device 41 injects the gas 42 from the outside of the sealing member 32 in the film width direction _{toward the gap C 3 on the lower end 32c side of the sealing member 32.} By jetting a gas (42) in the gap (C _3), having a base (42) from the gap (C ₃₎ at the bottom (32c) of the seal member 32 to the liquid reservoir portion 22 liquid reservoir 22 It is possible to prevent the functional liquid 21 from leaking outward from the _{gap C 3 in the width direction of the film.}

_{As described above, in the gap C 3} of the lower end 32c of the sealing member 32, the functional liquid 21 is easily leaked from the liquid reservoir 22 to the outside in the film width direction. Therefore, the air blowing device 41 may inject the gas 42 to the entire gap around the sealing member 32, but the gas 42 is placed in the gap C _{3 where the functional liquid 21 is most likely to leak.} ) Is preferably sprayed.

In the coating section 103, the coating width regulating member 30 has a functional liquid supply nozzle 52 for supplying the functional liquid 21 to the liquid storage section 22, and a liquid storage section as shown in FIG. 3. A liquid level sensor 54 for detecting the liquid level of 22, a nitrogen supply nozzle 56 for purging nitrogen to the upper space 25 of the liquid storage 22, and the oxygen concentration in the upper space 25 An oxygen concentration sensor 58 is set for measuring. The functional liquid supply nozzle 52 is connected to a pump P for supplying the functional liquid. The nitrogen supply nozzle 56 constituting a part of the nitrogen supply mechanism is connected to the nitrogen supply device through a pipe (not shown).

The curing treatment unit 105 may have a configuration capable of imparting active energy for curing the coating film of the functional liquid to the coating film. For example, when the functional liquid is a photopolymerizable composition, UV irradiation to irradiate UV light It is a device, and when the functional liquid is a thermally polymerizable composition, it is a heating device such as a heater.

<Production method of laminated film>

A method of manufacturing a laminated film using the laminated film manufacturing apparatus 100 having the above configuration will be described.

As the film 10 as a support, resin films such as PET (polyethylene terephthalate), TAC (triacetylcellulose), and PEN (polyethylene naphthalate) are used. As the functional liquid 21, a resin composition such as an acrylic resin having a viscosity of 10 to 10,000 mPa·s can be applied.

The film 10 unwound from the delivery machine 101 is conveyed to the application unit 103, and in the application unit 103, one surface 10a of the film 10 is a liquid storage unit 22 of the functional liquid 21 ) Is conveyed to be in contact, and the functional liquid 21 is applied to one surface 10a of the film 10. At this time, the sealing member 32 is arranged in accordance with the application width of the functional liquid 21, and the air blowing device 41 from the outside in the film width direction of the sealing member 32 to the liquid reservoir 22 When the gas 42 is injected, a fluid pressure is applied to the liquid reservoir 22, and leakage of the functional liquid 21 from the periphery of the sealing member 32 is suppressed, while the coating film by the functional liquid 21 (20M) is formed.

Thus, the gap at the bottom (32c) of the seal member 32 by the air blow device 41 side (C ₃₎ to the relative base (42) is injected as described above, whereby the gap at the bottom (32c) (C ₃ ), the gas 42 enters and applies a fluid pressure to the liquid reservoir 22, and the outflow of the functional liquid 21 from the liquid reservoir 22 to the outside of the film width can be suppressed.

Thereafter, in the curing treatment unit 105, UV irradiation is performed on the coating film 20M formed on the film 10 from the other side of the film 10, so that the coating film 20M is cured and the functional layer 20 Is formed.

Through the above process, a laminated film in which the functional layer 20 is laminated on one surface 10a of the film 10 is formed, and is wound in a roll shape by a winder 104.

According to the present laminated film manufacturing apparatus 100 and manufacturing method, since the functional liquid 21 is applied to the film 10 from the liquid reservoir 22 regulated by the desired coating width by the sealing member 32, the desired effective width In this case, a coating film having a uniform film thickness can be formed. Further, by applying a fluid pressure to the liquid reservoir 22 from the film width direction, the functional liquid leaking in the film width direction can be suppressed, and loss of the functional liquid can be suppressed.

In this laminated film manufacturing apparatus 100, the width L of the sealing member 32 in the film width direction is the sealing member 32 and the roller 1 or the film in the _{gaps C 1} and C _2. When the interval with (10) is t, it is preferable that there is a relationship of L/t≥10. By sufficiently increasing the width L of the sealing member 32 with respect to the interval t, it becomes possible to suppress leakage of the functional liquid 21 beyond the sealing member 32 to the outside in the film width direction.

The material of the sealing member 32 is not particularly limited, but nylon, Newlite, Teflon (registered trademark) and the like are suitably used. As for the material of the sealing member 32, it is preferable that the contact angle with respect to the functional liquid 21 is large, and it is especially preferable that the contact angle is 80 degrees or more.

In the present manufacturing apparatus 100, a mold roller 1 having a surface 1a having an uneven pattern is provided, and in the liquid reservoir 22, it enters the concave portion of the surface 1a, The functional liquid 21 trapped in the concave portion at the film nip position between the mold roller 1 and the roller 2 is transferred onto the film 10. For this reason, the coating film 20M formed on the one surface 10a of the film 10 is formed in an uneven pattern along the surface unevenness of the mold roller 1, and the laminated film to be produced is formed in such a pattern. A pattern-shaped functional layer formed by curing the formed coating film is provided on the film 10.

In addition, the mold roller having irregularities on the surface may have a concave plate surface or a convex plate surface. On the other hand, in the case of forming a uniform functional layer on the film, a roller having no irregularities on the surface may be used instead of the mold roller.

Examples of the specific dimensions of the device and functional liquid in the manufacturing device 100 are given below.

As the mold roller 1, a roller having a diameter of 350 mm, a surface length of 800 mm, and a surface with irregularities of the order of μm is used. As the roller 2, a diameter of 110 mm and a surface length of 800 mm are used. Then, the mold roller 1 and the roller 2 are provided at intervals of 0 to 100 μm at the closest positions of both. At this time, the application speed (transfer speed) is set to about 0.5 to 5 m/min.

As the functional liquid 21, for example, 99 parts by mass of TMPTA (trimethylolpropane triacrylate) (manufactured by Daicel Allnex) and 1 part by mass of Irgacure TPO (manufactured by BASF) as a polymerization initiator are mixed. A resin composition having a viscosity of 100 mPa·s obtained is used.

At this time, the curing treatment unit 105 is a UV irradiation device, and includes, for example, an air-cooled metal halide lamp (manufactured by Eye Graphics) 500 mW/cm ² . And ultraviolet rays are irradiated to the coating film at 300 mJ/cm ^2. According to the above specification, a laminated film having a functional layer made of an acrylic layer formed in a pattern according to the irregularities of the mold roller can be manufactured on the resin film.

<Design change example of laminated film manufacturing apparatus>

5 shows a schematic configuration diagram of a configuration of a laminated film manufacturing apparatus 110 of a design modification example. The same elements as those of the laminated film manufacturing apparatus 100 of FIG. 1 are denoted by the same reference numerals, and detailed descriptions thereof are omitted.

The laminated film manufacturing apparatus 110 of the design modification example is a manufacturing apparatus for manufacturing a sandwich-like laminated film in which the functional layer 20 is sandwiched between the first and second films 10 and 12, and the laminated film manufacturing apparatus described above ( In addition to the configuration of 100), the second film 12 is supported in a roll state and is provided with a delivery machine 102 for unwinding. And in the application part 103, the liquid storage part 22 is provided between the 1st film 10 and the 2nd film 12, and the coating film 20M is pinched by the 1st and 2nd films And conveyed. In this configuration, instead of the mold roller 1, a roller 3 having no irregularities on its surface is provided. The laminated film manufactured by this manufacturing apparatus 110 consists of the 1st film 10, the functional layer 20, and the 2nd film 12.

In this way, the liquid storage portion 22 is not limited to the film and the roller, and can also be formed between the film and the film, and regardless of the configuration of the manufacturing apparatuses 100 and 110, the same sealing member 32 ) And the pressure applying mechanism 40, it is possible to obtain the same effect of suppressing the formation of a uniform coating film and loss of the functional liquid.

In the manufacturing apparatuses 100 and 110 of the above embodiment, the pressure imparting mechanism 40 is constituted by the air blowing device 41, but the pressure imparting mechanism 40 is not limited to the above configuration. Hereinafter, an example of design change of the pressure applying mechanism 40 will be described.

<Design change example 1 of pressure applying mechanism>

6 shows the configuration of the design change example 1 of the pressure applying mechanism 40. As shown in FIG. 6, in this example, the pressure applying mechanism 40 divides the buffer chamber 44 adjacent to the outside of the sealing member 32 in the film width direction, and the buffer chamber partitioning member 45 and the buffer chamber ( 44) An air blower 41, which is a gas supply unit, that injects the gas 42 from the outside in the film width direction of the buffer chamber partition member 45 toward the inside is provided. The buffer chamber partition member 45 is supported by the support plate 34 of the coating width regulating member 30 together with the sealing member 32. The buffer chamber partition member 45 has substantially the same shape as the sealing member 32 and has a curved surface along the rollers 1 and 2. The interval between the sealing member 32 and the buffer chamber partition member 45 may be appropriately determined to be a distance that makes the buffer chamber 44 a desired capacity. In FIG. 6, the functional liquid 21 leaks into the buffer chamber 44 in a significant amount and is filled. However, the present invention is not limited thereto, and the sealing member 32 and the film 10 Any configuration in which the pressure of the gas 42 is applied to the functional liquid leaking from the gap may be sufficient.

When the buffer chamber 44 is provided, a fluid pressure may be applied to the liquid reservoir 22 through the buffer chamber 44. The functional liquid 21 into which the gas 42 is injected in the buffer chamber 44 is pushed into _{the gap C 3} of the lower end 32c of the sealing member 32 communicating with the buffer chamber and the liquid reservoir 22. , A fluid pressure is applied to the liquid reservoir 22. As described above, the functional liquid 21 leaking into the buffer chamber 44 applies a fluid pressure to the liquid reservoir 22, thereby suppressing the leakage of the functional liquid 21 from the liquid reservoir 22.

As shown in FIG. 3, in the configuration in which a gas is injected _{from the outside of the sealing member 32 to the gap C 3} on the lower end 32c side of the sealing member 32 without having a buffer chamber, the liquid storage portion The gas 42 enters into (22), and bubbles 42a may be generated in the liquid reservoir 22. Most of the air bubbles 42a float to the space above the liquid reservoir, but when some of the air bubbles 42a are applied while being contained in the functional liquid of the liquid reservoir 22, air bubbles are generated in the coating film 20M. Thus, there is a case where the quality of the laminated film is deteriorated.

As in this configuration, a buffer chamber 44 is provided, and gas is injected from the outside of the film width direction of the buffer chamber partition member 45 to the buffer chamber 44, and gas is supplied from the lower end of the buffer chamber partition member 45. In the buffer chamber 44, if the pressure by the gas is applied to the functional liquid leaking from the liquid reservoir side, the air bubbles 42a of the gas 42 float to the liquid level in the buffer chamber 44, Invasion of the air bubbles 42a into the liquid reservoir 22 side inside the film width direction of the sealing member can be suppressed, and the quality of the laminated film can be ensured. In addition, it is preferable that the buffer chamber partition member 45 is partially provided with an opening through which air is released.

In addition, even with the configuration shown in Fig. 3, it is possible to control so that almost no air bubbles enter the functional liquid by the balance of the viscosity of the functional liquid and the pressure due to the gas, and by adjusting the viscosity and pressure, the lamination of sufficiently good quality It is possible to produce a film.

<Design change example 2 of pressure applying mechanism>

7 shows the configuration of the design change example 2 of the pressure applying mechanism 40. As shown in FIG. 7, in this example, the pressure applying mechanism 40 divides the buffer chamber 44 to the outside of the sealing member 32 in the film width direction, and the buffer chamber partitioning member 45 and the buffer chamber 44 In the pressurization chamber partition member 49 which further divides the pressurization chamber 48 adjacent to the outer side in the width direction of the film, and the functional liquid 21 leaking from the liquid reservoir 22 to the buffer chamber 44, a buffer An air blowing device 41 is provided, which is a gas supply unit that supplies the gas 42 to the pressurization chamber 48 from the outside of the seal partition member 45 in the film width direction. In this example, the air blowing device 41 does not inject gas from the outside, but a nozzle is inserted into the supply port 49a provided in the pressurization chamber partition member 49, and the gas ( 42). However, as a method of supplying the gas 42 to the pressurization chamber 48, the gas may be injected into the gap at the lower end of the pressurization chamber partition member 49 from the outside in the film width direction. Since the buffer chamber 44 is provided in the same manner as in the design modification example 1, the fluid pressure can be applied to the liquid reservoir 22 through the buffer chamber 44.

In Fig. 8, a perspective view of the coating width regulating member 30 provided with a partial configuration of the pressure applying mechanism of this example is shown. As shown in FIG. 8, the buffer chamber partition member 45 is supported by the support plate 34 of the coating width regulating member 30 together with the sealing member 32. Similarly, the pressure chamber partition member 49 is also supported by the support plate 34. The buffer chamber partition member 45 and the pressure chamber partition member 49 have substantially the same shape as the sealing member 32 and have curved surfaces along the rollers 1 and 2. The distance between the sealing member 32 and the buffer chamber partition member 45 may be appropriately determined as a distance for the buffer chamber 44 to have a desired capacity, and the interval between the buffer chamber partition member 45 and the pressure chamber partition member 49 Silver may be appropriately determined by a distance that makes the pressurization chamber 48 a desired capacity.

In addition, not only one buffer chamber 44 may be provided between the sealing member 32 and the pressure chamber 48, but a plurality of buffer chambers may be provided.

In this example, as shown in FIG. 7, the gas 42 is supplied to the pressurization chamber 48, the pressurization chamber 48 is pressurized, and the pressure is pressurized by the pressurization chamber 48 in the adjacent buffer chamber 44. The pressure of the gas 42 is applied. The pressure due to the gas applied to the buffer chamber 44 is directly or indirectly applied to the functional liquid 21 leaking from the sealing member 32 side. In the buffer chamber 44, the functional liquid 21 to which pressure by the gas 42 is applied is pushed toward the communication portion with the sealing member 32, and applies a fluid pressure to the liquid storage portion 22. As described above, leakage of the functional liquid 21 from the liquid reservoir 22 can be suppressed by the fluid pressure caused by the functional liquid 21 leaking into the buffer chamber 44.

Type 1 roller
Surface of 1a type roller
2 roller
10, 12 films
Surface of 10a film
20 functional layer
20M coating film
21 functional fluid
22 liquid reservoir
25 Upper space of liquid reservoir
30 Application width regulation member
32 seal absence
32a, 32b face of seal member
The bottom of the 32c seal member
34 Support plate
34a Inlet for functional liquid supply nozzle
Inlet for 34b liquid level sensor
Inlet for 34c nitrogen supply nozzle
34d oxygen concentration meter
40 pressure imparting mechanism
41 Air blow device
42 gas
42a air bubble
44 buffer room
45 Buffer compartment partition member
48 pressurization chamber
49 Pressure chamber compartment member
49a supply port
52 Functional fluid supply nozzle
54 liquid level sensor
56 nitrogen supply nozzle
58 Oxygen concentration sensor
100, 110 laminated film manufacturing equipment
101, 102 transmitter
103 Applicator
104 winder
105 Curing processing unit
110 manufacturing device

Claims (12)

Consisting of the film and a coating film of the functional liquid formed on the one surface of the film by conveying the film in a state in which the liquid reservoir of the functional liquid is brought into contact with one surface of the film and applying the functional liquid to the one surface of the film. As a method for producing a laminated film for producing a laminated film with a functional layer,
Seal members defining the positions of both ends of the liquid storage portion in the film width direction are arranged in accordance with the application width of the functional liquid, and one surface of the sealing member is disposed so as to face the one surface of the film, and the sealing member By applying a fluid pressure to the liquid reservoir from the outer side in the width direction of the film, while suppressing outflow of the functional liquid from the periphery of the sealing member, a coating film of the functional liquid is formed,
The method of manufacturing a laminated film in which the width L of the sealing member in the width direction of the film satisfies L/t≥10 with respect to the distance t between the one surface and the one surface of the film. The method according to claim 1,
A method of manufacturing a laminated film in which the liquid surface of the liquid reservoir is placed in a nitrogen atmosphere to form the coating film. The method according to claim 1 or 2,
A method for producing a laminated film in which the fluid pressure is generated by nitrogen gas. A conveyance mechanism that conveys the film,
A liquid storage part of the functional liquid provided by contacting one surface of the film being conveyed,
A sealing member defining the positions of both ends of the liquid storage portion in the width direction of the film,
A pressure applying mechanism for applying a fluid pressure to the liquid reservoir from an outside of the seal member in the width direction of the film,
The sealing member is disposed with one surface of the sealing member facing the one surface of the film,
A laminated film manufacturing apparatus in which the width L of the sealing member in the width direction of the film satisfies L/t≥10 with respect to the distance t between the sealing member and the one surface of the film. The method of claim 4,
The pressure applying mechanism is provided with a gas supply unit for injecting a gas toward the liquid reservoir from the outside in the film width direction of the sealing member, and by injecting the gas, the liquid pressure is applied to the liquid reservoir. Device. A conveyance mechanism that conveys the film,
A liquid storage part of the functional liquid provided by contacting one surface of the film being conveyed,
A sealing member defining the positions of both ends of the liquid storage portion in the width direction of the film,
A pressure applying mechanism for applying a fluid pressure to the liquid reservoir from an outside of the seal member in the width direction of the film,
The pressure imparting mechanism includes a buffer chamber partition member for partitioning a buffer chamber adjacent to an outer side of the sealing member in the film width direction, and supplies a gas to the buffer chamber, whereby the sealing member and the one surface of the film A laminated film manufacturing apparatus for applying the pressure of the gas to the functional liquid flowing out of the buffer chamber from between, and applying the fluid pressure to the liquid reservoir through the flowed functional liquid. The method of claim 6,
A gas supply unit for injecting gas from the outside in the width direction of the film of the buffer chamber partition member toward the inside of the buffer chamber,
A laminated film manufacturing apparatus for applying the fluid pressure to the liquid reservoir through the buffer chamber by spraying the gas into the buffer chamber. The method of claim 6,
A pressurization chamber partition member for partitioning a pressurization chamber adjacent to the outside in the film width direction of the buffer chamber, and a gas supply unit for supplying gas to the pressurization chamber,
A laminated film manufacturing apparatus for applying the fluid pressure to the liquid reservoir through the buffer chamber by applying pressure by the gas supplied from the pressurization chamber into the buffer chamber. A conveyance mechanism that conveys the film,
A liquid storage part of the functional liquid provided by contacting one surface of the film being conveyed,
A sealing member defining the positions of both ends of the liquid storage portion in the width direction of the film,
A pressure applying mechanism for applying a fluid pressure to the liquid reservoir from an outside of the seal member in the width direction of the film,
The pressure applying mechanism comprises a buffer chamber partition member for partitioning a buffer chamber adjacent to an outer side of the sealing member in the film width direction, and toward the inside of the buffer chamber, from an outer side of the buffer chamber partition member in the film width direction. It has a gas supply part for injecting gas,
A laminated film manufacturing apparatus for applying the fluid pressure to the liquid reservoir through the buffer chamber by spraying the gas into the buffer chamber. The method according to any one of claims 5 and 7 to 9,
A laminated film manufacturing apparatus in which the gas supply unit supplies nitrogen. The method according to any one of claims 4 to 9,
A laminated film manufacturing apparatus comprising a cover member covering an upper space of the liquid storage unit and a nitrogen supply mechanism for supplying nitrogen to the upper space. The method according to any one of claims 4 to 9,
A laminated film manufacturing apparatus comprising a roller contacting the liquid reservoir, wherein the roller has a concave plate or a convex plate on its surface.

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