WO2018103322A1 - 掩膜板及其组装方法 - Google Patents

掩膜板及其组装方法 Download PDF

Info

Publication number
WO2018103322A1
WO2018103322A1 PCT/CN2017/091397 CN2017091397W WO2018103322A1 WO 2018103322 A1 WO2018103322 A1 WO 2018103322A1 CN 2017091397 W CN2017091397 W CN 2017091397W WO 2018103322 A1 WO2018103322 A1 WO 2018103322A1
Authority
WO
WIPO (PCT)
Prior art keywords
mask
region
frame
groove
width
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2017/091397
Other languages
English (en)
French (fr)
Inventor
林治明
王震
张健
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Ordos Yuansheng Optoelectronics Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Ordos Yuansheng Optoelectronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOE Technology Group Co Ltd, Ordos Yuansheng Optoelectronics Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to US15/744,958 priority Critical patent/US10774415B2/en
Publication of WO2018103322A1 publication Critical patent/WO2018103322A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C21/00—Accessories or implements for use in connection with applying liquids or other fluent materials to surfaces, not provided for in groups B05C1/00 - B05C19/00
    • B05C21/005—Masking devices
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/861—Repairing

Definitions

  • Embodiments of the present invention relate to a mask and a method of assembling the same.
  • the Fine Metal Mask (FMM) technology is to vapor-deposit the luminescent materials corresponding to the pixels in the OLED (Organic Light-Emitting Display) device according to the corresponding process.
  • LTPS Low Temperature Poly Silicon
  • a mask pattern for example, a plurality of square slits or a plurality of strip slits
  • FMM Sheet FMM Sheet
  • a longitudinal cover and a lateral support strip for supporting a mask sheet having a certain mask pattern are known in the FMM design.
  • FMM Sheet a longitudinal cover and a lateral support strip for supporting a mask sheet having a certain mask pattern
  • the shielding strip or the supporting strip needs to be stretched to a certain extent to make it in a tight state, the shielding strip or the supporting strip.
  • the two sides of the wider portion of the middle portion will curl downward, which affects the support stability of the above-mentioned skeleton structure on the mask sheet, thereby affecting the evaporation pattern of the finished OLED product.
  • embodiments of the present invention provide a mask and an assembly method thereof, which can avoid a wide area in the middle of a skeleton structure when a skeleton structure such as a support strip or a shielding strip is fixed on the frame.
  • the downward curling stabilizes the contact state of the skeleton structure with the mask.
  • an embodiment of the present invention provides a mask comprising a plurality of strip-shaped skeleton structures, each of the skeleton structures including an intermediate portion and an extension portion at both ends, the middle portion a width greater than a width of each of the extensions; a mask sheet supported by the skeleton structure and having a mask pattern; a frame having an open area, wherein the frame is provided with a space a groove in which the opening regions are connected; and wherein an extension of both ends of the skeleton structure and a transition region of the intermediate portion adjacent to the extension portion are located in the groove, and the skeleton structure and the groove A fixed point of attachment is provided at least in the transition region.
  • a plurality of the fixed points are disposed along a width direction of the skeletal structure in one of the transition regions.
  • the groove includes a first region and a second region that are connected; wherein, in a width direction of the skeleton structure, a width of the first region is greater than a width of the second region; A region is coupled to the open region; a transition region of the skeletal structure is located within the first region, and an extension of the skeletal structure is located at least within the second region.
  • the mask further includes a cutting groove disposed in the groove along a width direction of the skeleton structure, and the cutting groove is located at a side of the fixing point away from the opening area.
  • the length of the cutting groove is equal to the width of the first region along the width direction of the skeletal structure.
  • the first regions of adjacent at least two grooves are connected.
  • the mask further includes a cutting groove disposed in the first region along a width direction of the skeleton structure, and the cutting groove is located at a side of the fixing point away from the opening region Wherein the cutting grooves in the at least two connected grooves are connected together.
  • the lengths of the dicing grooves joined together are equal to the width of the first regions joined together.
  • the width of the cutting groove is 0.1 to 1.0 mm along the length of the skeleton structure.
  • both ends of the mask are fixed to a portion of the frame between the adjacent two second regions by a fixed point.
  • the fixed point is also disposed on the extension.
  • the frame includes an outer frame and an outer sleeve that is sleeved within the outer frame
  • an embodiment of the present invention also provides a method for assembling a mask.
  • the mask plate includes a plurality of strip-shaped skeleton structures, a mask sheet having a mask pattern, and a frame having an open area; wherein the skeleton structure is composed of an intermediate portion and an extension portion at both ends, the width of the intermediate portion Greater than the width of the extension; the frame is provided with a groove connected to the opening area.
  • the assembling method includes fixing the skeleton structure on the frame and bringing the skeleton structure into a tight state, wherein an extension portion at both ends of the skeleton structure and the intermediate portion are adjacent to the extension portion a transition region is located in the groove, and a fixing point fixing the skeleton structure and the groove is disposed in the transition region; and the mask is erected on two adjacent frames Structurally, the mask is fixed in a portion of the frame between the adjacent two of the grooves, and the mask is placed in a tight state.
  • the skeletal structure and the mask are secured to the frame by soldering.
  • the fixing point for example, the solder joint
  • the wide area in the middle after the welding of the skeleton structure is not easily generated downward.
  • 1 is a schematic plan view showing a known mask when a mask is not soldered
  • FIG. 2 is a schematic top plan view of a known mask after soldering a mask
  • FIG. 3 is a top plan view of a frame portion of a mask according to an embodiment of the present invention.
  • FIG. 4 is a second schematic structural view of a frame portion in a mask according to an embodiment of the present invention.
  • FIG. 5 is a cross-sectional structural view of a frame portion in a mask according to an AA' direction of FIG. 3 according to an embodiment of the present invention
  • Figure 6 is a top plan view showing the structure after fixing the skeleton structure to the frame in the mask shown in Figure 3;
  • Figure 7 is a top plan view showing the structure after fixing the skeleton structure to the frame in the mask shown in Figure 4;
  • Figure 8 is a top plan view showing the structure after fixing the mask to the frame in the mask shown in Figure 6;
  • Figure 9 is a top plan view showing the structure after fixing the mask to the frame in the mask shown in Figure 7;
  • FIG. 10 is a top plan view showing the skeleton structure in the mask shown in FIG. 6 after cutting;
  • Fig. 11 is a schematic plan view showing the structure of the skeleton in the mask shown in Fig. 7 after cutting.
  • an embodiment of the present invention provides a mask sheet 01 including a plurality of strip-shaped skeleton structures 10 and a mask sheet having a mask pattern 201 supported by a plurality of strip-shaped skeleton structures 10 .
  • each skeletal structure 10 includes an intermediate portion 101 and an extension portion 102 at both ends, the width of the intermediate portion 101 being greater than the width of the extension portion 102;
  • the masking plate 01 may further include a frame 30 having an opening region 30a; wherein the frame 30 A groove 31 connected to the opening region 30a is provided thereon; an extending portion 102 at both ends of the skeleton structure 10 and a transition portion 101a of the intermediate portion 101 near the extending portion 102 are located in the groove 31, and the skeleton structure 10 and the groove 31 are A fixed fixing point 40 is provided at least in the transition region 101a.
  • strip-shaped skeleton structure in the mask plate 01 provided by the embodiment of the present invention may be, for example, a longitudinally disposed cover strip or a laterally disposed support strip.
  • FIG. 4 and FIG. 6 to FIG. 9 only schematically show a mask sheet 20 supported by two side-by-side two shielding strips disposed in the longitudinal direction.
  • the embodiment of the present invention is not limited thereto, and the mask sheet 01 is omitted.
  • the number of the mask sheets 20 can be flexibly set according to the number of substrates to be evaporated and the area of the substrate to be patterned on the substrate. For example, a plurality of mask sheets arranged side by side by three or more shielding strips can be arranged.
  • the mask pattern 201 on the mask sheet 20 may be, for example, a plurality of square slits (ie, forming a mosaic pattern) as shown in FIG. 8 or a plurality of strip slits as shown in FIG.
  • the embodiments of the present invention are not limited by the known techniques, and are merely examples.
  • the strip skeleton structure 10 is generally made of a metal material, in order to facilitate the formation of the pattern of the skeleton structure 10, referring to FIG. 3, FIG. 4 and FIG. 6 to FIG. 9, the width of the transition portion 101a of the intermediate portion 101 may be directed. The direction of the extension 102 gradually decreases.
  • the depth of the groove 31 accommodating the skeleton structure 10 and the skeleton structure 10 The thickness should be as equal as possible.
  • a reserve of 10 ⁇ m can be reserved, that is, the depth of the groove 31 is equal to the thickness of the skeleton structure 10 + 10 ⁇ m, so that the mask sheet 20 can be brought into contact with the frame for welding.
  • the fixing point for example, the solder joint
  • the middle portion after the skeleton structure is welded is wide. It is not easy to produce a downward curling phenomenon, and it is not easy to affect the support stability of the skeleton structure to the mask sheet, thereby ensuring the yield of the vapor deposition pattern of the OLED finished product.
  • solder joints of the shielding strip or the support strip are only disposed at both ends thereof, that is, the solder joint is only located in the entire area of the recess, when the mask is required to be repaired.
  • the grinding stone is used to polish the solder joint, it is easy to damage the boundary of the groove, which affects the stability and operational repeatability of the repair device to the groove boundary identification when the FMM is repaired again. Therefore, according to an embodiment of the present invention, referring to FIG. 3, FIG. 4, and FIG. 6 to FIG.
  • a plurality of fixing points 40 disposed in one transition region 101a may be disposed along the width direction of the skeleton structure 10, that is, fixed A point 40 (e.g., a solder joint) is disposed laterally such that when the skeletal structure 10 is welded to the recess 31, the fixation between the wider intermediate portion and the frame 30 is more robust and does not cause downward curling;
  • the fixing point is disposed laterally close to the opening area of the frame, that is, is disposed at the inner edge of the frame, when the skeleton structure is repaired, the grinding stone is not easily damaged by the groove boundary on the frame, thereby improving the repairing device. Stability and operational repeatability when identifying groove boundaries again.
  • the fixed point 40 can be set to one line, or can be set to multiple lines; it can be flexibly set according to the specific size of the skeleton structure 10, which is not limited by the embodiment of the present invention.
  • the fixed points 40 that secure the skeletal structure 10 to the grooves 31 may also be disposed on the extensions 102 at both ends of the skeletal structure 10.
  • the frame 30 may include an outer frame 301 and an inner frame 302 having an open area 30a disposed inside the outer frame, which may be, for example, a unitary structure.
  • the outer frame 301 is formed to be easily fixed into the vapor deposition chamber; the groove 31 is formed on the inner frame 302, and the side of the inner frame 302 on which the groove 31 is opened is higher than the outer frame 301, that is, a step surface is formed. Subsequent cutting and repair operations of the skeletal structure 10 are facilitated.
  • the pattern of the groove 31 may include but is not limited to the following two types:
  • the groove 31 may include a first region 31a and a second region 31b connected together; wherein, in the width direction of the skeleton structure 10, the width of the first region 31a is larger than the width of the second region 31b.
  • the first region 31a is connected to the opening region 30a; the transition region of the skeleton structure 10
  • the field 101a is located within the first region 31a, and the extension 102 of the skeletal structure 10 is located at least within the second region 31b.
  • each of the grooves 31 is a shape similar to the letter "T".
  • both ends of the mask 20 can be fixed in the frame 30 by fixing points (for example, solder joints). Adjacent to the portion between the two second regions. Since the second region 31b of the groove 31 away from the opening region 30a is in a vertical strip shape, damage to the edge of the vertical portion of the groove (ie, the second region 31b) can be avoided when the skeleton structure 10 is repaired. At the same time, the welding area where the mask sheet 20 and the frame 30 are fixed is extended to the left and right sides, thereby improving the bonding state of the mask sheet 01 and the substrate to be vapor-deposited, and reducing the vapor deposition defect.
  • the groove 31 includes the first region 31a and the second region 31b which are connected; wherein, in the width direction of the skeleton structure 10, the width of the first region 31a is larger than the width of the second region 31b; The first region 31a of the adjacent at least two grooves 31 is connected; the first region 31a is connected to the opening region 30a; the transition region 101a of the skeleton structure 10 is located in the first region 31a, and the extension portion 102 of the skeleton structure 10 is at least in the second portion Within the area 31b.
  • both ends of the mask sheet 20 can be fixed in the frame 30 by fixing points (for example, solder joints).
  • fixing points for example, solder joints.
  • the second region 31b of the groove 31 away from the opening region 30a is in a vertical strip shape, damage to the edge of the vertical portion of the groove (ie, the second region 31b) can be avoided when the skeleton structure 10 is repaired.
  • the welding region where the mask sheet 20 and the frame 30 are fixed is extended to both sides, thereby improving the bonding state of the masking plate 01 and the substrate to be vapor-deposited, and reducing the vapor deposition defect.
  • the diaphragm 01 further includes a cutting groove 50 disposed in the groove 31 along the width direction of the skeleton structure 10. Since the cutting groove 50 is a further indented region opened in the groove 31, the skeleton may be The extensions at both ends of the structure provide a certain amount of undercut when cutting, which makes the cutting operation more convenient.
  • the cutting groove 50 is located on a side of the fixing point 40 away from the opening area 30a; along the length direction of the skeleton structure 10, the cutting groove 50 may have a width of 0.1 to 1.0 mm so that the cutting blade is cut at the connected extension.
  • the process can be extended into the cutting groove 50, which may be, for example, 0.5 mm.
  • the cutting groove is located in the frame opening compared to the known mask shown in FIGS. 1 and 2.
  • the arrangement of the outer edge of the region, in the embodiment of the present invention, the cutting groove 50 in the masking plate 01 is disposed at the inner edge of the opening region 30a of the frame 30, thereby reducing the occupation of the effective area on the frame, so that the masking sheet 20 and the frame
  • the 30-phase fixed welding zone extends away from the upper and lower sides of the opening area 30a, further improving the bonding state of the masking plate 01 and the substrate to be vapor-deposited, and reducing the vapor deposition defect.
  • the pattern of the groove 31 is in the shape of a plurality of independent and unconnected English letters "T" shown in FIG. 6, as shown in FIG. 10, along the width direction of the skeleton structure 10,
  • the length of the cutting groove 50 in the groove 31 is equal to the width of the first region 31a.
  • the cutting grooves 50 in the at least two grooves 31 connected are connected. Together, and along the width direction of the skeletal structure 10, the length of the cutting grooves 50 joined together is equal to the width at which the first regions 31a are joined together.
  • the embodiment of the present invention further provides a method for assembling the mask 01, the method comprising:
  • Step (1) referring to FIG. 6 or FIG. 7, the skeleton structure 10 is fixed (for example, can be fixed by welding) on the frame 30, and the skeleton structure 10 is stretched to be in a tight state; the skeleton structure 10
  • the extension portion 102 of the end and the transition region 101a of the intermediate portion 101 near the extension portion 102 are located in the groove, and the fixing point of the skeleton structure 10 fixed to the groove (for example, a solder joint in the case of soldering) 40 is set.
  • the fixing point of the skeleton structure 10 fixed to the groove for example, a solder joint in the case of soldering
  • Step (2) referring to FIG. 8 or FIG. 9, the mask sheet 20 is mounted on the adjacent two skeleton structures 10, and the mask sheet 20 is fixed (for example, can be fixed by welding) at the frame 30.
  • the portion between the adjacent two grooves is stretched and the mask 20 is stretched to bring it into a tight state.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

一种掩膜板(01)及其组装方法，可避免在将骨架结构(10)固定在框架(30)上时中间较宽的区域产生向下卷曲的状态，稳定了骨架结构(10)与掩膜片(20)的接触状态。掩膜板(01)包括多个条状骨架结构(10)、由骨架结构(10)支撑的具有掩膜图案(201)的掩膜片(20)以及具有开口区域(30a)的框架(30)；骨架结构(10)包括中间部(101)以及两端的延伸部(102)；中间部(101)的宽度大于延伸部(102)的宽度；框架(30)上设置有与开口区域(30a)相连的凹槽(31)；骨架结构(10)两端的延伸部(102)以及中间部(101)中靠近延伸部(102)的过渡区域(101a)位于凹槽(31)内，且骨架结构(10)与凹槽(31)相固定的固定点(40)至少设置在过渡区域(101a)内。

Description

掩膜板及其组装方法 技术领域
本发明的实施例涉及一种掩膜板及其组装方法。
背景技术
精细金属掩膜板(Fine Metal Mask，简称为FMM)技术是通过蒸镀方式将OLED(Organic Light-Emitting Display，有机电致发光显示)器件中对应于各像素的发光材料按照相应工艺蒸镀到LTPS(Low Temperature Poly Silicon，低温多晶硅)型的阵列基板上，利用FMM中掩膜片(FMM Sheet)上的掩膜图案(例如多个方形狭缝或多个条形狭缝)，蒸镀红、绿、蓝发光层到相应的像素区域内。
如图1和图2所示，已知FMM设计中，掩膜板中用于支撑具有一定掩膜图案的掩膜片(FMM Sheet)的纵向的遮挡条(Cover)和横向的支撑条(Howling，图中未示意出)被设计为中间宽、两端窄的结构，以减小掩膜板的框架上用于容纳上述骨架结构的凹槽(Cover Groove)宽度，从而增大了掩膜片与框架之间的焊接区域面积(如图1中标号a所示)，保证了掩膜片的焊接稳定性。
然而，在将遮挡条或支撑条的两端焊接在框架的凹槽内时，由于焊接工艺需要将遮挡条或支撑条进行一定程度的拉伸以使其处于紧绷状态，遮挡条或支撑条中间较宽的部分的两侧会向下卷曲，影响上述骨架结构对掩膜片的支撑稳定性，进而影响OLED成品的蒸镀图案。
发明内容
为解决已知技术中的上述问题，本发明的实施例提供一种掩膜板及其组装方法，可避免在将支撑条或遮挡条等骨架结构固定在框架上时骨架结构中间较宽的区域向下卷曲，稳定了骨架结构与掩膜片的接触状态。
为达到上述目的，本发明的实施例采用如下技术方案：
一方面、本发明实施例提供了一种掩膜板，包括多个条状骨架结构，每一所述骨架结构包括中间部以及位于两端的延伸部，所述中间 部的宽度大于每一所述延伸部的宽度；掩膜片，所述掩膜片由所述骨架结构支撑并且具有掩膜图案；框架，具有开口区域，其中，所述框架上设置有与所述开口区域相连的凹槽；并且其中，所述骨架结构两端的延伸部以及所述中间部中靠近所述延伸部的过渡区域位于所述凹槽内，且所述骨架结构与所述凹槽相固定的固定点至少设置在所述过渡区域内。
在一个实例中，在一个所述过渡区域内，多个所述固定点沿所述骨架结构的宽度方向设置。
在一个实例中，所述凹槽包括相连的第一区域和第二区域；其中，沿所述骨架结构的宽度方向，所述第一区域的宽度大于所述第二区域的宽度；所述第一区域与所述开口区域相连；所述骨架结构的过渡区域位于所述第一区域内，所述骨架结构的延伸部至少位于所述第二区域内。
在一个实例中，所述掩膜板还包括沿所述骨架结构的宽度方向设置在所述凹槽内的切割槽，且所述切割槽位于所述固定点远离所述开口区域的一侧。
在一个实例中，沿所述骨架结构的宽度方向，所述切割槽的长度等于所述第一区域的宽度。
在一个实例中，相邻的至少两个凹槽的第一区域相连。
在一个实例中，所述掩膜板还包括沿所述骨架结构的宽度方向设置在所述第一区域内的切割槽，且所述切割槽位于所述固定点远离所述开口区域的一侧；其中，相连的至少两个凹槽内的切割槽连接在一起。
在一个实例中，沿所述骨架结构的宽度方向，所述切割槽连接在一起构成的长度等于所述第一区域连接在一起构成的宽度。
在一个实例中，沿所述骨架结构的长度方向，所述切割槽的宽度为0.1～1.0mm。
在一个实例中，所述掩膜片的两端通过固定点固定在所述框架中位于相邻两个第二区域之间的部分上。
在一个实例中，所述固定点还设置在所述延伸部上。
在一个实例中，所述框架包括外框和套设在所述外框内的具有开 口区域的内框；所述凹槽开设在所述内框上，且所述内框开设有所述凹槽的一面高于所述外框。
另一方面、本发明实施例还提供了一种掩膜板的组装方法。所述掩膜板包括多个条状骨架结构、具有掩膜图案的掩膜片以及具有开口区域的框架；其中，所述骨架结构由中间部以及两端的延伸部构成，所述中间部的宽度大于所述延伸部的宽度；所述框架上设置有与所述开口区域相连的凹槽。所述组装方法包括，将所述骨架结构固定在所述边框上，并使所述骨架结构处于紧绷状态，其中，所述骨架结构两端的延伸部以及所述中间部中靠近所述延伸部的过渡区域位于所述凹槽内，且将所述骨架结构与所述凹槽相固定的固定点设置在所述过渡区域内；将所述掩膜片架设在相邻的两个所述骨架结构上，并将所述掩膜片固定在所述框架中位于相邻两个所述凹槽之间的部分上，且使所述掩膜片处于紧绷状态。
在一个实例中，所述骨架结构和所述掩膜片通过焊接方式固定在所述框架上。
基于此，通过本发明实施例提供的上述掩膜板，由于将固定点(例如为焊点)设置在骨架结构较宽的中间部分，焊接完骨架结构后、中间较宽的区域不易产生向下卷曲的情况，不易影响骨架结构对掩膜片的支撑稳定性，从而保证了OLED成品的蒸镀图案良品率。
附图说明
以下将结合附图对本发明的实施例进行更详细的说明，以使本领域普通技术人员更加清楚地理解本发明，其中：
图1为一种已知的掩膜板未焊接掩膜片时的俯视结构示意图；
图2为一种已知的掩膜板在焊接完掩膜片后的俯视结构示意图；
图3为本发明实施例提供的一种掩膜板中的框架部分的俯视结构示意图一；
图4为本发明实施例提供的一种掩膜板中的框架部分的俯视结构示意图二；
图5为本发明实施例提供的一种掩膜板中的框架部分沿图3中A-A'方向的剖面结构示意图；
图6为将骨架结构固定到图3所示的掩膜板中的框架后的俯视结构示意图；
图7为将骨架结构固定到图4所示的掩膜板中的框架后的俯视结构示意图；
图8为将掩膜片固定到图6所示的掩膜板中的框架后的俯视结构示意图；
图9为将掩膜片固定到图7所示的掩膜板中的框架后的俯视结构示意图；
图10为对图6所示的掩膜板中的骨架结构进行切割后的俯视结构示意图；
图11为对图7所示的掩膜板中的骨架结构进行切割后的俯视结构示意图。
附图说明：
01-掩膜板；10-骨架结构；101-中间部；101a-过渡区域；102-延伸部；20-掩膜片；201-掩膜图案；30-框架；301-外框；302-内框；30a-开口区域；31-凹槽；31a-第一区域；31b-第二区域；40-固定点；50-切割槽。
具体实施方式
下面将结合本公开实施例中的附图，对本公开实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本公开一部分实施例，而不是全部的实施例。基于本公开中的实施例，本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本公开保护的范围。
除非另作定义，此处使用的技术术语或者科学术语应当为本公开所属领域内具有一般技能的人士所理解的通常意义。本公开专利申请说明书以及权利要求书中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性，而只是用来区分不同的组成部分。“连接”或者“相连”等类似的词语并非限定于物理的或者机械的连接，而是可以包括电性的连接，不管是直接的还是间接的。“上”、“下”、“左”、“右”等仅用于表示相对位置关系，当被描述对象的绝对位置改变后，则该相对位置关系也相应地改变。
由于本发明实施例所涉及的掩膜板中掩膜片的掩膜图案实际尺寸非常 微小，为清楚起见，本发明实施例附图中的各结构尺寸均被放大，不代表实际尺寸比例。
如图3至图9所示，本发明实施例提供了一种掩膜板01，包括多个条状骨架结构10以及由多个条状骨架结构10支撑的具有掩膜图案201的掩膜片20；每个骨架结构10包括中间部101以及两端的延伸部102，中间部101的宽度大于延伸部102的宽度；上述掩膜板01还可包括具有开口区域30a的框架30；其中，框架30上设置有与开口区域30a相连的凹槽31；骨架结构10两端的延伸部102以及中间部101中靠近延伸部102的过渡区域101a位于凹槽31内，且将骨架结构10与凹槽31相固定的固定点40至少设置在过渡区域101a内。
需要说明的是，本发明实施例提供的上述掩膜板01中的条状骨架结构例如可以是纵向设置的遮挡条(Cover)，也可以是横向设置的支撑条(Howling)。
图3、图4以及图6至图9仅示意性示出了由纵向设置的并排的两个遮挡条支撑的一个掩膜片20，然而本发明实施例不限于此，上述掩膜板01中的掩膜片20的数量可根据待蒸镀的基板数量以及基板上需要图案化的区域面积灵活设置，例如可以为由3个以上的遮挡条依次架设的并排设置的多个掩膜片。
其中，掩膜片20上的掩膜图案201例如可以为参考图8所示的多个方形狭缝(即形成马赛克图形)或为参考图9所示的多个条形狭缝，具体结构可沿用已知技术，本发明实施例对此不作限定，仅为示例。
由于条状骨架结构10通常是由金属材质构成的，为了便于骨架结构10图案的成型，参考图3、图4以及图6至图9所示，中间部101的过渡区域101a的宽度可以沿指向延伸部102的方向逐渐减小。
此外，由于掩膜片20架设在骨架结构10上后是通过例如焊点的方式固定在框架上的，因此，本领域技术人员应当知晓，容纳骨架结构10的凹槽31的深度与骨架结构10的厚度应尽量相等。考虑到机械加工的精度，可以预留10μm的预留量，即：凹槽31的深度等于骨架结构10的厚度+10μm，以使得掩膜片20能够与框架相接触以便进行焊接。
基于此，通过本发明实施例提供的上述掩膜板，由于将固定点(例如为焊点)设置在骨架结构较宽的中间部分，焊接完骨架结构后中间较宽的区域 不易产生向下卷曲的情况，不易影响骨架结构对掩膜片的支撑稳定性，从而保证了OLED成品的蒸镀图案良品率。
进一步地，在已知掩膜板中，由于遮挡条或支撑条的焊点仅设置在其两端，即：焊点仅位于凹槽的整体区域内，当需要对掩膜板进行修复时，磨石打磨焊点时很容易损伤凹槽的边界，影响FMM再次修复时修复设备对凹槽边界识别的稳定性和操作重复性。因此，根据本发明的实施例，参考图3、图4以及图6至图9所示，设置在一个过渡区域101a内的多个固定点40可沿骨架结构10的宽度方向设置，即：固定点40(例如为焊点)横向设置，以使得在将骨架结构10焊接到凹槽31时，中间较宽的区域与框架30之间的固定更为牢固，不会产生向下卷曲的情况；同时，由于固定点横向设置靠近于框架的开口区域，即：设置在框架的内边缘，在对骨架结构进行修复的时候，磨石打磨焊点不易损框架上的凹槽边界，提高了修复设备再次对凹槽边界识别时的稳定性和操作重复性。
例如，固定点40可以设置为一行，也可以设置为多行；可根据骨架结构10的具体尺寸灵活设置，本发明实施例对此不作限定。
这里，当固定点40仅设置在过渡区域101a内时，由于骨架结构10两端的延伸部102上没有固定点，在操作过程中有可能发生延伸部102的翘曲，影响骨架结构10的稳定性。因此，根据本发明的实施例，将骨架结构10与凹槽31相固定的固定点40还可设置在骨架结构10两端的延伸部102上。
需要说明的是，由于已经在较宽的中间部101上设置了一定数量的固定点40，再在延伸部102上设置固定点40只会起到进一步稳定骨架结构10状态的效果，而不会产生使骨架结构中间较宽的区域向下卷曲的问题。
进一步地，参考图5所示，框架30可包括外框301和套设在外框内的具有开口区域30a的内框302，二者例如可以为一体结构。
例如，外框301形成为便于固定到蒸镀腔内；凹槽31开设在内框302上，且内框302的开设有凹槽31的一面高于外框301，即：形成一个阶梯面，以便于骨架结构10的后续切割与修复操作。
在上述基础上，凹槽31的图形可以包括但不限于以下两种：
其一、参考图6所示，凹槽31可包括沿相连的第一区域31a和第二区域31b；其中，沿骨架结构10的宽度方向，第一区域31a的宽度大于第二区域31b的宽度；第一区域31a与开口区域30a相连；骨架结构10的过渡区 域101a位于第一区域31a内，骨架结构10的延伸部102至少位于第二区域内31b。
即：每个凹槽31的俯视形状为类似英文字母“T”的形状，参考图8所示，掩膜片20的两端可通过固定点(例如为焊点)固定在框架30中位于相邻两个第二区域之间的部分上。由于凹槽31的远离开口区域30a的第二区域31b为竖条状，在对骨架结构10进行修复的时候，可避免磨石打磨对凹槽竖向部分(即第二区域31b)边缘的损伤，同时还使得掩膜片20与框架30相固定的焊接区域向左右两侧延伸了，提高了上述掩膜板01与待蒸镀基板的贴合状态，减少了蒸镀不良现象。
其二、参考图7所示，凹槽31包括相连的第一区域31a和第二区域31b；其中，沿骨架结构10的宽度方向，第一区域31a的宽度大于第二区域31b的宽度；相邻的至少两个凹槽31的第一区域31a相连；第一区域31a与开口区域30a相连；骨架结构10的过渡区域101a位于第一区域31a内，骨架结构10的延伸部102至少位于第二区域内31b。
即：开口区域30a两侧的凹槽31分别相互连接在一起的形成整体形，参考图9所示，掩膜片20的两端可通过固定点(例如为焊点)固定在框架30中位于相邻两个第二区域之间的部分上。由于凹槽31的远离开口区域30a的第二区域31b为竖条状，在对骨架结构10进行修复的时候，可避免磨石打磨对凹槽竖向部分(即第二区域31b)边缘的损伤，同时还使得掩膜片20与框架30相固定的焊接区域向两侧延伸了，提高了上述掩膜板01与待蒸镀基板的贴合状态，减少了蒸镀不良现象。
进一步地，由于成型后多个骨架结构两端的延伸部通常是连接在一起的，为了便于对骨架结构两端的延伸部进行切割，参考图10和图11所示，本发明实施例提供的上述掩膜板01还包括设置在凹槽31内的沿骨架结构10的宽度方向的切割槽(Cutting Groove)50，由于切割槽50是开设在凹槽31内的进一步内陷的区域，可以在对骨架结构两端的延伸部进行切割时提供一定的下刀余量，使切割操作更方便。例如，切割槽50位于固定点40的远离开口区域30a的一侧；沿骨架结构10的长度方向，切割槽50的宽度可为0.1～1.0mm，以使切割刀在切割开相连的延伸部的过程中可伸进切割槽50，该宽度例如可为0.5mm。
这样一来，相比于图1和图2所示的已知掩膜板中切割槽位于框架开口 区域外边缘的设置，本发明实施例将掩膜板01中的切割槽50设置在框架30的开口区域30a的内边缘，减小了对框架上有效面积的占用，使得掩膜片20与框架30相固定的焊接区域向远离开口区域30a的上下两侧延伸了，进一步提高了上述掩膜板01与待蒸镀基板的贴合状态，减少了蒸镀不良现象。
例如，当凹槽31的图形为参考图6所示的多个独立且相互不连接的英文字母“T”的形时，参考图10所示，沿骨架结构10的宽度方向，设置在每个凹槽31内的切割槽50的长度等于第一区域31a的宽度。
又例如，当开口区域30a两侧的凹槽31分别相互连接在一起形成参考图7所示的整体形时，参考图11所示，相连的至少两个凹槽31内的切割槽50连接在一起，并且沿骨架结构10的宽度方向，切割槽50连接在一起的长度等于第一区域31a连接在一起的宽度。
基于相同的发明概念，本发明实施例还提供了一种掩膜板01的组装方法，该方法包括：
步骤(1)、参考图6或图7所示，将骨架结构10固定(例如，可以通过焊接固定)在边框30上，并拉伸骨架结构10以使其处于紧绷状态；骨架结构10两端的延伸部102以及中间部101的靠近延伸部102的过渡区域101a位于凹槽内，且将骨架结构10与凹槽相固定的固定点(例如，在焊接固定的情况下为焊点)40设置在过渡区域内；
步骤(2)、参考图8或图9所示，将掩膜片20架设在相邻的两个骨架结构10上，并将掩膜片20固定(例如可以通过焊接固定)在框架30的位于相邻两个凹槽之间的部分上，且拉伸掩膜片20以使其处于紧绷状态。
显然，本领域的技术人员可以对本发明进行各种改动和变型而不脱离本发明的精神和范围。这样，倘若本发明的这些修改和变型属于本发明权利要求及其等同技术的范围之内，则本发明也意图包含这些改动和变型在内。
本申请要求于2016年12月5日提交的名称为“掩膜板及其组装方法”的中国专利申请No.201611104015.8的优先权，该申请全文以引用方式合并于本文。

Claims (14)

  1. 一种掩膜板，包括：
    多个条状骨架结构，每一所述骨架结构包括中间部以及位于两端的延伸部，所述中间部的宽度大于每一所述延伸部的宽度；
    掩膜片，所述掩膜片由所述骨架结构支撑并且具有掩膜图案；
    框架，具有开口区域；
    其中，所述框架上设置有与所述开口区域相连的凹槽；并且
    其中，所述骨架结构两端的延伸部以及所述中间部中靠近所述延伸部的过渡区域位于所述凹槽内，且所述骨架结构与所述凹槽相固定的固定点至少设置在所述过渡区域内。
  2. 根据权利要求1所述的掩膜板，其中，在一个所述过渡区域内，多个所述固定点沿所述骨架结构的宽度方向设置。
  3. 根据权利要求1所述的掩膜板，其中，所述凹槽包括相连的第一区域和第二区域，其中，
    沿所述骨架结构的宽度方向，所述第一区域的宽度大于所述第二区域的宽度；
    所述第一区域与所述开口区域相连；并且
    所述骨架结构的过渡区域位于所述第一区域内，所述骨架结构的延伸部至少位于所述第二区域内。
  4. 根据权利要求3所述的掩膜板，还包括：
    切割槽，沿所述骨架结构的宽度方向设置在所述凹槽内并且位于所述固定点远离所述开口区域的一侧。
  5. 根据权利要求4所述的掩膜板，其中，沿所述骨架结构的宽度方向，所述切割槽的长度等于所述第一区域的宽度。
  6. 根据权利要求3所述的掩膜板，其中，相邻的至少两个凹槽的第一区域相连。
  7. 根据权利要求6所述的掩膜板，还包括：
    切割槽，沿所述骨架结构的宽度方向设置在所述第一区域内并且位于所述固定点远离所述开口区域的一侧；
    其中，相邻的至少两个凹槽内的切割槽连接在一起。
  8. 根据权利要求7所述的掩膜板，其中，沿所述骨架结构的宽 度方向，所述切割槽连接在一起构成的长度等于所述第一区域连接在一起构成的宽度。
  9. 根据权利要求4或7所述的掩膜板，其中，沿所述骨架结构的长度方向，所述切割槽的宽度为0.1～1.0mm。
  10. 根据权利要求3所述的掩膜板，其中，所述掩膜片的两端通过固定点固定在所述框架中位于相邻两个第二区域之间的部分上。
  11. 根据权利要求1所述的掩膜板，其中，所述固定点还设置在所述延伸部上。
  12. 根据权利要求1所述的掩膜板，其中，所述框架包括外框和套设在所述外框内的具有开口区域的内框；
    所述凹槽开设在所述内框上，且所述内框开设有所述凹槽的一面高于所述外框。
  13. 一种掩膜板的组装方法，所述掩膜板包括多个条状骨架结构、具有掩膜图案的掩膜片以及具有开口区域的框架；其中，所述骨架结构由中间部以及两端的延伸部构成，所述中间部的宽度大于所述延伸部的宽度；并且所述框架上设置有与所述开口区域相连的凹槽；
    所述组装方法包括，
    将所述骨架结构固定在所述边框上，并使所述骨架结构处于紧绷状态；其中，每一所述骨架结构两端的延伸部以及所述中间部中靠近所述延伸部的过渡区域位于所述凹槽内，并且所述骨架结构与所述凹槽相固定的固定点至少设置在所述过渡区域内；
    将所述掩膜片架设在相邻的两个所述骨架结构上，并将所述掩膜片固定在所述框架中位于相邻两个所述凹槽之间的部分上，且使所述掩膜片处于紧绷状态。
  14. 根据权利要求13所述的组装方法，其中，所述骨架结构和所述掩膜片通过焊接方式固定在所述框架上。
PCT/CN2017/091397 2016-12-05 2017-07-03 掩膜板及其组装方法 Ceased WO2018103322A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US15/744,958 US10774415B2 (en) 2016-12-05 2017-07-03 Mask and assembling method thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201611104015.8 2016-12-05
CN201611104015.8A CN106367718B (zh) 2016-12-05 2016-12-05 一种掩膜板及其组装方法

Publications (1)

Publication Number Publication Date
WO2018103322A1 true WO2018103322A1 (zh) 2018-06-14

Family

ID=57891961

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2017/091397 Ceased WO2018103322A1 (zh) 2016-12-05 2017-07-03 掩膜板及其组装方法

Country Status (3)

Country Link
US (1) US10774415B2 (zh)
CN (1) CN106367718B (zh)
WO (1) WO2018103322A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220064780A1 (en) * 2019-08-12 2022-03-03 Chengdu Boe Optoelectronics Technology Co., Ltd. Mask assembly
US20230138125A1 (en) * 2020-01-03 2023-05-04 Chengdu Boe Optoelectronics Technology Co., Ltd. Mask assembly and manufacturing method thereof

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106367718B (zh) * 2016-12-05 2018-10-30 京东方科技集团股份有限公司 一种掩膜板及其组装方法
CN106480404B (zh) * 2016-12-28 2019-05-03 京东方科技集团股份有限公司 一种掩膜集成框架及蒸镀装置
CN107058946B (zh) 2017-05-12 2019-02-26 京东方科技集团股份有限公司 精细掩膜板支撑框架、精细掩膜板及其制备方法
CN107435130A (zh) * 2017-09-28 2017-12-05 上海天马微电子有限公司 掩膜装置、蒸镀设备及蒸镀方法
CN107604309B (zh) * 2017-11-06 2023-09-15 京东方科技集团股份有限公司 掩膜板贴合装置以及其贴合方法
CN107841710A (zh) * 2017-12-08 2018-03-27 唐军 高精密支撑掩膜版
JP7487481B2 (ja) 2019-02-06 2024-05-21 大日本印刷株式会社 蒸着マスク装置、マスク支持機構及び蒸着マスク装置の製造方法
CN109778116B (zh) * 2019-03-28 2021-03-02 京东方科技集团股份有限公司 一种掩膜版及其制作方法、掩膜版组件
CN110055492B (zh) * 2019-04-09 2021-03-23 Tcl华星光电技术有限公司 一种掩膜片成形结构
CN110257776B (zh) * 2019-06-21 2020-08-04 昆山国显光电有限公司 一种掩膜版框架
WO2021087732A1 (zh) * 2019-11-05 2021-05-14 京东方科技集团股份有限公司 掩模装置、掩模板及框架
WO2021092759A1 (zh) * 2019-11-12 2021-05-20 京东方科技集团股份有限公司 掩模板
CN112657788B (zh) * 2020-12-01 2023-02-28 山东中车风电有限公司 一种高强螺栓抗咬合剂涂覆装置及方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4439203B2 (ja) * 2003-05-09 2010-03-24 大日本印刷株式会社 多面付けマスク装置及びその組立方法
CN103938153A (zh) * 2013-01-22 2014-07-23 昆山允升吉光电科技有限公司 一种蒸镀用掩模组件及相应的掩模板安装方法
CN105039907A (zh) * 2015-09-22 2015-11-11 深圳市华星光电技术有限公司 一种掩膜板的固定组件
CN105586568A (zh) * 2016-03-18 2016-05-18 京东方科技集团股份有限公司 一种掩膜板框架模组、蒸镀方法、阵列基板
CN106367718A (zh) * 2016-12-05 2017-02-01 京东方科技集团股份有限公司 一种掩膜板及其组装方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3323490A (en) * 1966-02-21 1967-06-06 Trw Inc Adjustable mask
KR101182439B1 (ko) * 2010-01-11 2012-09-12 삼성디스플레이 주식회사 박막 증착용 마스크 프레임 조립체 및 이를 이용한 유기 발광 표시장치의 제조방법
KR101295354B1 (ko) * 2011-08-19 2013-08-12 (주)한 송 ｗｈｉｔｅ ＯＬＥＤ용 ＴＶ 제작 공정중의 ｗｈｉｔｅ ＯＬＥＤ 패널 제작을 위한 유기증착 및 봉지용 마스크프레임어셈블리, 그 제조방법 및 제조장치
KR101899093B1 (ko) * 2012-02-03 2018-09-17 삼성디스플레이 주식회사 증착 마스크의 제조 장치
KR102280269B1 (ko) * 2014-11-05 2021-07-22 삼성디스플레이 주식회사 마스크 프레임 조립체 및 그 제조 방법

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4439203B2 (ja) * 2003-05-09 2010-03-24 大日本印刷株式会社 多面付けマスク装置及びその組立方法
CN103938153A (zh) * 2013-01-22 2014-07-23 昆山允升吉光电科技有限公司 一种蒸镀用掩模组件及相应的掩模板安装方法
CN105039907A (zh) * 2015-09-22 2015-11-11 深圳市华星光电技术有限公司 一种掩膜板的固定组件
CN105586568A (zh) * 2016-03-18 2016-05-18 京东方科技集团股份有限公司 一种掩膜板框架模组、蒸镀方法、阵列基板
CN106367718A (zh) * 2016-12-05 2017-02-01 京东方科技集团股份有限公司 一种掩膜板及其组装方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220064780A1 (en) * 2019-08-12 2022-03-03 Chengdu Boe Optoelectronics Technology Co., Ltd. Mask assembly
US20230138125A1 (en) * 2020-01-03 2023-05-04 Chengdu Boe Optoelectronics Technology Co., Ltd. Mask assembly and manufacturing method thereof
US12215413B2 (en) * 2020-01-03 2025-02-04 Chengdu Boe Optoelectronics Technology Co., Ltd. Mask assembly and manufacturing method thereof

Also Published As

Publication number Publication date
CN106367718A (zh) 2017-02-01
CN106367718B (zh) 2018-10-30
US10774415B2 (en) 2020-09-15
US20190010599A1 (en) 2019-01-10

Similar Documents

Publication Publication Date Title
WO2018103322A1 (zh) 掩膜板及其组装方法
JP5356210B2 (ja) マスク組立体、その製造方法及びそれを用いた平板表示装置用蒸着装置
JP5544785B2 (ja) マスク組立体及びこれを利用した平板表示装置用蒸着装置
KR101659948B1 (ko) 살대형 서포트 시트, 이를 이용한 파인 메탈 마스크 조립체 제조 방법, 제조 장치 및 파인 메탈 마스크 조립체
TWI550108B (zh) 遮罩
WO2018107739A1 (zh) 掩膜框架、掩膜框架的制造方法以及掩膜板
WO2017215286A1 (zh) 掩膜板以及掩膜板的组装方法
WO2018000949A1 (zh) 掩膜板及其制造方法
WO2017117999A1 (zh) 金属掩模板及其制作方法
US10443119B2 (en) Mask plate frame and mask plate assembly
CN110911467B (zh) 有机发光显示面板及其制备方法、显示装置
CN108251796A (zh) 一种精细金属掩膜板及其制备方法、掩膜集成框架
WO2021258891A1 (zh) 掩膜板、掩膜板结构和掩膜板制作方法
WO2019179239A1 (zh) 掩膜装置及其制作方法、蒸镀系统
CN112662995A (zh) 一种掩膜板和掩膜板制作方法
WO2018146869A1 (ja) 蒸着マスク
CN105839051A (zh) 掩模板及其制作方法、oled显示基板和显示装置
WO2018218935A1 (zh) 掩模板及其制备方法和使用方法
CN110343999B (zh) 掩模装置及其制造方法、蒸镀方法
JP6329711B1 (ja) 有機ｅｌ表示装置および有機ｅｌ表示装置の製造方法
JP2005339858A (ja) マスク構造体及びその製造方法
TWI679716B (zh) 可撓性電子裝置之製造方法
WO2016155433A1 (zh) 一种掩膜板组件及其制作方法、蒸镀装置及显示基板的制作方法
WO2018196365A1 (zh) 掩模片、掩模板及其组装方法
WO2016192141A1 (zh) Oled材料真空热蒸镀用掩膜板

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 17878805

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 17878805

Country of ref document: EP

Kind code of ref document: A1

122 Ep: pct application non-entry in european phase

Ref document number: 17878805

Country of ref document: EP

Kind code of ref document: A1