WO2018096571A1 - 深紫外光を放射する半導体発光素子を備える発光モジュール - Google Patents
深紫外光を放射する半導体発光素子を備える発光モジュール Download PDFInfo
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- WO2018096571A1 WO2018096571A1 PCT/JP2016/084545 JP2016084545W WO2018096571A1 WO 2018096571 A1 WO2018096571 A1 WO 2018096571A1 JP 2016084545 W JP2016084545 W JP 2016084545W WO 2018096571 A1 WO2018096571 A1 WO 2018096571A1
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- WIPO (PCT)
- Prior art keywords
- light emitting
- emitting module
- emitting element
- deep ultraviolet
- semiconductor light
- Prior art date
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- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 229960002446 octanoic acid Drugs 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 235000021313 oleic acid Nutrition 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- BNIXVQGCZULYKV-UHFFFAOYSA-N pentachloroethane Chemical compound ClC(Cl)C(Cl)(Cl)Cl BNIXVQGCZULYKV-UHFFFAOYSA-N 0.000 description 1
- BYBPEZLZCGOWIS-UHFFFAOYSA-N perhydropyrene Chemical compound C1CC2CCCC(CC3)C2C2C3CCCC21 BYBPEZLZCGOWIS-UHFFFAOYSA-N 0.000 description 1
- PJNZPQUBCPKICU-UHFFFAOYSA-N phosphoric acid;potassium Chemical compound [K].OP(O)(O)=O PJNZPQUBCPKICU-UHFFFAOYSA-N 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920001289 polyvinyl ether Polymers 0.000 description 1
- 235000011056 potassium acetate Nutrition 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- UWCVATCOYVISNN-UHFFFAOYSA-M potassium;adamantane-1-sulfonate Chemical compound [K+].C1C(C2)CC3CC2CC1(S(=O)(=O)[O-])C3 UWCVATCOYVISNN-UHFFFAOYSA-M 0.000 description 1
- XWIJIXWOZCRYEL-UHFFFAOYSA-M potassium;methanesulfonate Chemical compound [K+].CS([O-])(=O)=O XWIJIXWOZCRYEL-UHFFFAOYSA-M 0.000 description 1
- 238000004382 potting Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940102127 rubidium chloride Drugs 0.000 description 1
- 229910000344 rubidium sulfate Inorganic materials 0.000 description 1
- FOGKDYADEBOSPL-UHFFFAOYSA-M rubidium(1+);acetate Chemical compound [Rb+].CC([O-])=O FOGKDYADEBOSPL-UHFFFAOYSA-M 0.000 description 1
- GANPIEKBSASAOC-UHFFFAOYSA-L rubidium(1+);sulfate Chemical compound [Rb+].[Rb+].[O-]S([O-])(=O)=O GANPIEKBSASAOC-UHFFFAOYSA-L 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 235000015424 sodium Nutrition 0.000 description 1
- PZTAONBEBBVREY-UHFFFAOYSA-M sodium 1,2,3,4,4a,5,6,7,8,8a-decahydronaphthalene-2-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1CCC2CCCCC2C1 PZTAONBEBBVREY-UHFFFAOYSA-M 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229910000342 sodium bisulfate Inorganic materials 0.000 description 1
- 229940075581 sodium bromide Drugs 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 1
- BAZAXWOYCMUHIX-UHFFFAOYSA-M sodium perchlorate Chemical compound [Na+].[O-]Cl(=O)(=O)=O BAZAXWOYCMUHIX-UHFFFAOYSA-M 0.000 description 1
- 229910001488 sodium perchlorate Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- VGTPCRGMBIAPIM-UHFFFAOYSA-M sodium thiocyanate Chemical compound [Na+].[S-]C#N VGTPCRGMBIAPIM-UHFFFAOYSA-M 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- DIIKAKPJAGLSOD-UHFFFAOYSA-M sodium;cyclohexanesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1CCCCC1 DIIKAKPJAGLSOD-UHFFFAOYSA-M 0.000 description 1
- WEXGSUVTGKSPGY-UHFFFAOYSA-M sodium;cyclohexylmethanesulfonate Chemical compound [Na+].[O-]S(=O)(=O)CC1CCCCC1 WEXGSUVTGKSPGY-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- RBTVSNLYYIMMKS-UHFFFAOYSA-N tert-butyl 3-aminoazetidine-1-carboxylate;hydrochloride Chemical compound Cl.CC(C)(C)OC(=O)N1CC(N)C1 RBTVSNLYYIMMKS-UHFFFAOYSA-N 0.000 description 1
- MCZDHTKJGDCTAE-UHFFFAOYSA-M tetrabutylazanium;acetate Chemical compound CC([O-])=O.CCCC[N+](CCCC)(CCCC)CCCC MCZDHTKJGDCTAE-UHFFFAOYSA-M 0.000 description 1
- GTCDARUMAMVCRO-UHFFFAOYSA-M tetraethylazanium;acetate Chemical compound CC([O-])=O.CC[N+](CC)(CC)CC GTCDARUMAMVCRO-UHFFFAOYSA-M 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- MRYQZMHVZZSQRT-UHFFFAOYSA-M tetramethylazanium;acetate Chemical compound CC([O-])=O.C[N+](C)(C)C MRYQZMHVZZSQRT-UHFFFAOYSA-M 0.000 description 1
- PXJUBOLFJDSAQQ-UHFFFAOYSA-M tetrapropylazanium;acetate Chemical compound CC([O-])=O.CCC[N+](CCC)(CCC)CCC PXJUBOLFJDSAQQ-UHFFFAOYSA-M 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- PVFOMCVHYWHZJE-UHFFFAOYSA-N trichloroacetyl chloride Chemical compound ClC(=O)C(Cl)(Cl)Cl PVFOMCVHYWHZJE-UHFFFAOYSA-N 0.000 description 1
- 125000006000 trichloroethyl group Chemical group 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- 125000004205 trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 125000000725 trifluoropropyl group Chemical group [H]C([H])(*)C([H])([H])C(F)(F)F 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 229940102001 zinc bromide Drugs 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/483—Containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/501—Wavelength conversion elements characterised by the materials, e.g. binder
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/52—Encapsulations
- H01L33/56—Materials, e.g. epoxy or silicone resin
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/483—Containers
- H01L33/486—Containers adapted for surface mounting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/52—Encapsulations
- H01L33/54—Encapsulations having a particular shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/58—Optical field-shaping elements
Definitions
- the present invention relates to a light emitting module including a semiconductor light emitting element that emits deep ultraviolet light.
- Patent Document 1 a light-emitting module in which a semiconductor light-emitting element that emits infrared light or blue light is sealed with a cured resin is known (see Patent Document 1).
- Patent Document 2 A semiconductor light emitting element that emits deep ultraviolet light is also known (see Patent Document 2).
- the present invention has been made in view of the above-described problems, and an object thereof is to provide a highly reliable light-emitting module including a semiconductor light-emitting element that emits deep ultraviolet light.
- the deep ultraviolet light emitting module of the present invention includes a semiconductor light emitting element that emits deep ultraviolet light, a liquid that seals the semiconductor light emitting element, and a package that contains the semiconductor light emitting element and the liquid.
- the liquid is transparent to deep ultraviolet light emitted from the semiconductor light emitting element.
- the package has a transparent member that is transparent to deep ultraviolet light emitted from the semiconductor light emitting device.
- a highly reliable light emitting module including a semiconductor light emitting element that emits deep ultraviolet light can be provided.
- FIG. 1 is a schematic cross-sectional view of a light emitting module according to Embodiment 1.
- FIG. (A) is a figure which shows the flowchart of the manufacturing method of the light emitting module which concerns on Embodiment 1.
- FIG. (B) is a figure which shows the flowchart of the process of preparing the semiconductor light-emitting device with which the light-emitting module which concerns on Embodiment 1 is provided.
- FIG. 3A is a schematic partial cross-sectional view showing a certain step in the method for manufacturing the light emitting module according to Embodiment 1.
- (B) is a schematic partial cross-sectional view showing the next step of (A) in the method for manufacturing the light emitting module according to Embodiment 1.
- FIG. (C) is a schematic fragmentary sectional view which shows the next process of (B) in the manufacturing method of the light emitting module which concerns on Embodiment 1.
- FIG. (A) is a figure which shows the change rate of the optical output with respect to operation time of the light emitting module which concerns on Embodiment 1, and the light emitting module of a comparative example.
- (B) is a figure which shows the change of the optical output with respect to the magnitude
- 6 is a schematic cross-sectional view of a light emitting module according to Embodiment 2.
- (A) is a figure which shows the flowchart of the manufacturing method of the semiconductor light-emitting device with which the light-emitting module which concerns on Embodiment 2 is provided.
- (B) is a figure which shows the flowchart of the process of forming an uneven
- (A) is a figure which shows the cross-sectional SEM image of the uneven structure with which the light emitting module which concerns on Embodiment 2 is provided.
- (B) is the elements on larger scale of the cross-sectional SEM image of the uneven structure with which the light emitting module which concerns on Embodiment 2 is provided.
- FIG. 10 is a schematic cross-sectional view of a light emitting module according to Embodiment 6.
- FIG. 10 is a schematic cross-sectional view of a light emitting module according to Embodiment 7.
- FIG. 10 is a schematic cross-sectional view of a light emitting module according to Embodiment 8.
- light emitting module 1 mainly includes semiconductor light emitting element 10 that emits deep ultraviolet light 18, liquid 50 that seals semiconductor light emitting element 10, and semiconductor light emitting element 10. And a package (30, 40) containing the liquid 50.
- Package (30, 40) contains the semiconductor light emitting element 10 and the liquid 50.
- the package mainly includes a base 30 and a transparent member 40.
- the base 30 mounts the semiconductor light emitting element 10.
- the semiconductor light emitting element 10 is placed on the base 30 via the submount 20.
- materials used for the base 30 include metals, resins, and ceramics.
- the package (30, 40) including the base 30 made of metal is called a metal package
- the package (30, 40) including the base 30 made of resin is called a resin package
- the base made of ceramic is called a ceramic package.
- the package (30, 40) of the present embodiment may be a metal package, a resin package, or a ceramic package.
- the base 30 is made of a material having high thermal conductivity, and may function as a heat sink.
- the package may further include a submount 20.
- the submount 20 mounts the semiconductor light emitting element 10.
- Examples of the material of the submount 20 include aluminum nitride (AlN), alumina (Al 2 O 3 ), silicon carbide (SiC), diamond, and silicon (Si).
- the submount 20 is preferably made of a material having high thermal conductivity. Therefore, the submount 20 may preferably be made of aluminum nitride (AlN) having a thermal conductivity of 160 to 250 W / (m ⁇ K).
- the surface of the submount on which the semiconductor light emitting element 10 is placed may be a flat surface or a curved surface.
- a reflective layer made of silver (Ag) or the like may be provided.
- the first conductive pad 21 and the second conductive pad 22 may be provided on the surface of the submount on which the semiconductor light emitting element 10 is placed.
- the n-type electrode 15 of the semiconductor light emitting element 10 and the first conductive pad 21 of the submount 20 are electrically and mechanically connected using the bonding member 25 having conductivity, and the p-type electrode of the semiconductor light emitting element 10 is connected.
- 16 and the second conductive pad 22 of the submount 20 are electrically and mechanically connected.
- the bonding member 25 include solder made of gold-tin (AuSn), silver-tin (AgSn), metal bumps made of gold (Au), copper (Cu), etc., and conductive paste such as silver paste. it can.
- the semiconductor light emitting element 10 may be flip-chip bonded on the submount 20. That is, the surface of the semiconductor light emitting element 10 on the substrate 11 side is directed to the opposite side of the submount 20 and the base 30, and the semiconductor layers of the semiconductor light emitting element 10 (n-type semiconductor layer 12, active layer 13, p-type semiconductor layer 14).
- the semiconductor light emitting element 10 may be mounted on the submount 20 with the surface on the side facing the submount 20 and the base 30.
- the ultraviolet light 18 emitted from the active layer 13 is suppressed from being absorbed by the p-type semiconductor layer 14, and is emitted from the active layer 13.
- the deep ultraviolet light 18 can be taken out of the semiconductor light emitting device 10.
- the submount 20 is fixed to the base 30 using eutectic solder made of gold-tin (AuSn), conductive paste such as silver paste, or an adhesive.
- AuSn gold-tin
- conductive paste such as silver paste
- an adhesive In order to efficiently extract the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10 to the outside of the package (30, 40), the semiconductor light emitting element 10 is placed near the center of the main surface 30a of the base 30. It is preferable.
- the package of the present embodiment may further include a lead pin 31 and a conductive wire 33.
- the lead pin 31 may be fixed to the base 30.
- the conductive wire 33 electrically connects the lead pin 31 to the first conductive pad 21 and the second conductive pad 22.
- a gold (Au) wire can be exemplified.
- a current is supplied to the semiconductor light emitting element 10 from an external power source (not shown) via the lead pin 31, the first conductive pad 21, the second conductive pad 22, and the bonding member 25. Radiate.
- the transparent member 40 may be provided on the base 30 so as to cover the semiconductor light emitting element 10.
- the base 30 and the transparent member 40 may be joined by an adhesive 42 or the like.
- the transparent member 40 is transparent to the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10.
- the transparent member 40 is transparent to the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10.
- the transparent member 40 is a wavelength of the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10. Means having a transmittance of 60% or more.
- the transparent member 40 may have a transmittance of preferably 75% or more, more preferably 90% or more, at the wavelength of the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10.
- the transmittance of the transparent member 40 increases as the transmittance of the transparent member 40 per unit length increases, and decreases as the transparent member 40 increases in thickness.
- the transparent member 40 may have a low light absorption rate and a high light transmittance with respect to the deep ultraviolet light 18 having a wavelength of 190 nm to 350 nm, preferably 200 nm to 320 nm, more preferably 220 nm to 300 nm. .
- the transparent member 40 is made of a material having a transmittance of 80% or more, preferably 90% or more, more preferably 95% or more per 100 ⁇ m path length at the wavelength of the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10. May be.
- the transparent member 40 may have a concave shape having an opening on one side and a space inside.
- the transparent member 40 may be a cap.
- the cap means a shell having an opening on one side and a space inside.
- the transparent member 40 that is a cap may have a hemispherical shell shape having an opening on one side and a space inside.
- the transparent member 40 may be made of any one of an inorganic compound such as synthetic quartz, quartz glass, non-alkali glass, sapphire, and fluorite (CaF), and a resin.
- Table 1 shows an example of the transmittance per path length (thickness) of 100 ⁇ m at a wavelength of 265 nm for some of the materials that can be used for the transparent member 40.
- a resin that can be used for the transparent member 40 a silicone resin having no aromatic ring, an amorphous fluorine-containing resin, a polyimide, an epoxy resin, a polyolefin, an acrylic resin such as polymethyl methacrylate, polycarbonate, polyester, polyurethane,
- the resin include a polysulfone resin, polysilane, polyvinyl ether, and an inorganic compound.
- polydimethylsiloxane JCR6122 Toray Dow Corning
- JCR6140 Toray Dow Corning
- HE59 Non Yamamura Glass
- HE60 Non Yamamura Glass
- HE61 Nihon Yamamura Glass Co., Ltd.
- KER2910 manufactured by Shin-Etsu Chemical Co., Ltd.
- fluorine-containing organopolysiloxane FER7061 manufactured by Shin-Etsu Chemical Co., Ltd.
- perfluoro (4-vinyloxy-1-butene) polymer (Cytop (registered trademark), manufactured by Asahi Glass), 2,2-bistrifluoromethyl-4,5-difluoro-1,3 -A dioxole polymer (Teflon AF, manufactured by DuPont) can be exemplified.
- polyimide a polyimide in which an aromatic compound is substituted with an alicyclic compound is preferable.
- alicyclic polyimide include a reaction product of an alicyclic acid dianhydride and an alicyclic diamine.
- bicyclo [2.2.2 ] Oct-2-endo, 3-endo, 5-exo, 6-exo-tetracarboxylic acid 2,3: 5,6-dianhydride
- an epoxy resin in which the aromatic ring is changed to an alicyclic compound is preferable.
- the epoxy resin in which the aromatic ring is changed to an alicyclic compound include 3 ′, 4′-epoxycyclohexylmethyl 3,4-epoxycyclohexanecarboxylate (Celoxide 2021P, manufactured by Daicel), ⁇ -caprolactone modified 3 ′, 4 ′.
- polymers of chain olefins such as polyethylene, polypropylene and methylpentene
- polymers of cyclic olefins such as norbornene
- TPX made by Mitsui Chemicals
- APEL made by Mitsui Chemicals
- ARTON made by JSR
- ZEONOR Zero-Elementary OR
- Zeon Zeon
- ZEONEX Nippon Zeon
- TOPAS Polyplastics
- Resins with inorganic compounds added include magnesium oxide, zirconium oxide, hofnium oxide, ⁇ -aluminum oxide, ⁇ -aluminum oxide, aluminum nitride, calcium fluoride, lutetium aluminum garnet, silicon dioxide, magnesium aluminate, sapphire, diamond, etc. The thing which added this inorganic compound to said resin can be illustrated.
- the liquid 50 fills the internal space of the package (30, 40) and seals the semiconductor light emitting device 10. Specifically, the liquid 50 is filled in a space between the base 30 and the transparent member 40 and seals the semiconductor light emitting element 10. The liquid 50 may seal at least the emission surface of the semiconductor light emitting element 10 (the second surface 11b of the substrate 11).
- the liquid 50 is transparent to the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10.
- the liquid 50 is transparent with respect to the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10.
- the liquid 50 is It means having a transmittance of 60% or more.
- the liquid 50 may have a transmittance of preferably 75% or more, more preferably 90% or more at the wavelength of the deep ultraviolet light 18 emitted from the semiconductor light emitting device 10.
- the transmittance of the liquid 50 increases as the transmittance of the liquid 50 per unit length increases, and decreases as the liquid 50 increases in thickness.
- the liquid 50 has a low light absorption and a high light transmittance with respect to the deep ultraviolet light 18 having a wavelength of 190 nm to 350 nm, preferably 200 nm to 320 nm, more preferably 220 nm to 300 nm.
- the liquid 50 has a transmittance of 80% or more, preferably 90% or more, more preferably 95% or more per 100 ⁇ m path length (thickness) at the wavelength of the deep ultraviolet light 18 emitted from the semiconductor light emitting device 10. You may be comprised from material.
- the liquid 50 may be composed of any one of pure water, a liquid organic compound, a salt solution, and a fine particle dispersion.
- Tables 2 to 10 show an example of transmittance per 100 ⁇ m path length (thickness) at a wavelength of 193 nm, 248 nm, 265 nm, or 300 nm, and 193 nm, 248 nm for some of the materials that can be used for the liquid 50.
- An example of a refractive index at a wavelength of 265 nm or 300 nm is shown.
- Table 2 shows the transmittance per 100 ⁇ m path length (thickness) and the refractive index at wavelengths of 193 nm, 248 nm, and 265 nm in pure water at wavelengths of 193 nm, 248 nm, and 265 nm.
- the liquid organic compound may be composed of any one of a saturated hydrocarbon compound, an organic solvent having no aromatic ring, an organic halide, a silicone resin, and a silicone oil.
- Tables 3 through 6 show an example of transmittance per 100 ⁇ m path length (thickness) at a wavelength of 193 nm, 248 nm, or 265 nm for some of the liquid organic compound materials that can be used for the liquid 50 and 193 nm.
- An example of a refractive index at a wavelength of 248 nm or 265 nm is shown.
- Table 3 shows the transmittance per 100 ⁇ m path length (thickness) at a wavelength of 193 nm or 265 nm and a refractive index at a wavelength of 193 nm or 265 nm for some of the saturated hydrocarbon compounds that can be used in the liquid 50. Indicates.
- saturated hydrocarbon compound examples include a chain saturated hydrocarbon compound and a cyclic saturated hydrocarbon compound.
- Chain saturated hydrocarbon compounds include n-pentane, n-hexane, n-heptane, n-octane, n-nonane, n-decane, n-undecane, n-dodecane, n-tridecane, n-tetradecane, n- Examples include pentadecane, n-hexadecane, n-heptadecane, n-octadecane, 2,2-dimethylbutane, and 2-methylpentane.
- IF131 DuPont
- IF132 DuPont
- IF138 DuPont
- IF169 DuPont
- HIL-001 JSR
- HIL-002 JSR
- HIL-203 Further examples include JSR), HIL-204 (JSR), Delphi (Mitsui Chemicals), and Arabic (Mitsui Chemicals).
- Table 4 shows the transmittance per path length (thickness) of 100 ⁇ m at a wavelength of 193 nm, 248 nm, or 265 nm, and 193 nm, 248 nm for a part of the organic solvent having no aromatic ring that can be used for the liquid 50. Or the refractive index at a wavelength of 265 nm.
- a compound having a hydroxyl group As an organic solvent having no aromatic ring, a compound having a hydroxyl group, a compound having a carbonyl group, a compound having a sulfinyl group, a compound having an ether bond, a compound having a nitrile group, a compound having an amino group, and A sulfur compound can be illustrated.
- the compound having a hydroxyl group include isopropanol, isobutanol, glycerol, methanol, ethanol, propanol and butanol.
- Examples of the compound having a carbonyl group include N-methylpyrrolidone, N, N-dimethylformamide, acetone, methyl ethyl ketone, diethyl ketone, cyclohexanone, cyclopentanone, methyl methacrylate, methyl acrylate, and n-butyl acrylate. it can.
- An example of a compound having a sulfinyl group is dimethyl sulfoxide.
- Examples of the compound having an ether bond include tetrahydrofuran and 1,8-cineol.
- Acetonitrile can be illustrated as a compound which has a nitrile group.
- Examples of the compound having an amino group include triethylamine and formamide.
- Examples of the sulfur-containing compound include carbon disulfide.
- Table 5 shows the transmittance per path length (thickness) of 100 ⁇ m at a wavelength of 265 nm and the refractive index at a wavelength of 265 nm for some of the organic halides that can be used for the liquid 50.
- organic halides examples include fluorine compounds, chlorine compounds, bromine compounds, and iodine compounds.
- Perfluoro (4-vinyloxy-1-butene) polymer (Cytop) (registered trademark), 2,2-bistrifluoromethyl-4,5-difluoro-1,3-dioxole polymer (Teflon (registered trademark)) (Trademark) AF, manufactured by DuPont).
- dichloromethane dichloroethane, trichloroethane, tetrachloroethane, pentachloroethane, chloropropane, dichloropropane, trichloropropane, tetrachloropropane, pentachloropropane, hexachloropropane, chlorohexanol, trichloroacetyl chloride, carbon tetrachloride, chloroacetone, 1-chlorobutane Chlorocyclohexane, chloroform, chloroethanol, chlorohexane, chlorohexanone, epichlorohydrin.
- bromine compound examples include bromoethane, bromoethanol, dibromomethane, dibromoethane, dibromopropane, bromoform, tribromoethane, tribromopropane, tetrabromoethane, and 1-bromopropane.
- iodine compounds include iodine compounds such as methyl iodide, ethyl iodide, propyl iodide, diiodomethane, and diiodopropane.
- Table 6 shows transmittance per 100 ⁇ m path length (thickness) at a wavelength of 265 nm and refractive index at a wavelength of 265 nm for a part of the silicone resin or silicone oil that can be used for the liquid 50.
- Silicone resin or silicone oil has organopolysiloxane as the main chain, and organic groups are bonded to Si atoms.
- organic groups are bonded to Si atoms.
- a functional group containing a carbon atom a functional group containing a fluorine atom, a functional group containing a chlorine atom, a functional group containing a bromine atom, a functional group containing an iodine atom, a functional group containing a nitrogen atom, or an oxygen atom
- the functional group include one or more of a functional group and a functional group containing a sulfur atom.
- the functional group containing a carbon atom include a methyl group, an ethyl group, and a propyl group.
- Examples of the functional group containing a fluorine atom include a trifluoromethyl group, a trifluoroethyl group, and a trifluoropropyl group.
- Examples of the functional group containing a chlorine atom include a trichloromethyl group, a trichloroethyl group, and a trichloropropyl group.
- Examples of the functional group containing a bromine atom include a tribromomethyl group, a tribromoethyl group, and a tribromopropyl group.
- Examples of the functional group containing an iodine atom include a triiodomethyl group, a triiodoethyl group, and a triiodopropyl group.
- Examples of functional groups containing nitrogen atoms include amino groups, nitrile groups, isocyanate groups, and ureido groups.
- Examples of the functional group containing an oxygen atom include an epoxy group, a methacryl group, and an ether group.
- Examples of the functional group containing a sulfur atom include a mercapto group and a sulfinyl group.
- JCR6122 Toray Dow Corning
- JCR6140 Toray Dow Corning
- HE59 Non Yamamura Glass
- HE60 Non Yamamura Glass
- HE61 Non Yamamura Glass
- Further examples include KER2910 (manufactured by Shin-Etsu Chemical Co., Ltd.) and FER7061 (manufactured by Shin-Etsu Chemical Co., Ltd.).
- KER2910 manufactured by Shin-Etsu Chemical Co., Ltd.
- FER7061 manufactured by Shin-Etsu Chemical Co., Ltd.
- These materials include materials that can be cured by irradiating or heating light other than deep ultraviolet light. In this embodiment, these materials are in a liquid state without being subjected to curing treatment. Is used as the liquid 50.
- the salt solution may be composed of any of an acid solution, an inorganic salt solution, and an organic salt solution.
- Table 7 to Table 9 show an example of transmittance per path length (thickness) of 100 ⁇ m at a wavelength of 193 nm or 248 nm for a part of the salt solution that can be used for the liquid 50 and 193 nm or 248 nm.
- An example of the refractive index in a wavelength is shown.
- Table 7 shows the transmittance per path length (thickness) of 100 ⁇ m at a wavelength of 193 nm or 248 nm and the refractive index at a wavelength of 193 nm or 248 nm for a part of the acid solution that can be used for the liquid 50. Indicates.
- acids As acids, phosphoric acid, sulfuric acid, hydrochloric acid, hydrobromic acid, nitric acid, citric acid, methanesulfonic acid, methacrylic acid, butyric acid, isobutyric acid, caproic acid, caprylic acid, lauric acid, palmitic acid, stearic acid, oleic acid It can be illustrated.
- Table 8 shows the transmittance per 100 ⁇ m path length (thickness) at a wavelength of 193 nm and the refractive index at a wavelength of 193 nm for a part of the inorganic salt solution that can be used for the liquid 50.
- Examples thereof include sodium, sodium hydrogen phosphate, sodium dihydrogen phosphate, potassium dihydrogen phosphate, sodium perchlorate, sodium thiocyanate, sodium thiosulfate, and sodium sulfite.
- Table 9 shows the transmittance per 100 ⁇ m path length (thickness) at a wavelength of 193 nm and the refractive index at a wavelength of 193 nm for a part of the organic salt solution that can be used for the liquid 50.
- organic salts lithium acetate, sodium acetate, potassium acetate, rubidium acetate, cesium acetate, tetramethylammonium acetate, tetraethylammonium acetate, tetrapropylammonium acetate, triethylammonium acetate, diethyldimethylammonium acetate, tetrabutylammonium acetate, tetramethyl chloride Ammonium, tetramethylammonium bromide, barium methanesulfonate, lanthanum methanesulfonate, cesium methanesulfonate, cyclohexyltrimethylammonium methanesulfonate, sodium cyclohexanesulfonate, sodium cyclohexylmethanesulfonate, sodium decahydronaphthalene-2-sulfonate 1-adamantane potassium methanesulfonate,
- Examples of the solvent used in the salt solution include, but are not limited to, water, organic solvents, and solutions dissolved in silicone resin or silicone oil.
- organic solvents include saturated hydrocarbon compound solutions such as cyclohexane, decane, decahydronaphthalene, n-butyl acrylate, n-methyl acrylate, tetrahydrofuran, chloroform, methyl ethyl ketone, methyl methacrylate, dichloromethane, dimethyl silicone oil. Can do.
- Table 10 shows the transmittance per 100 ⁇ m path length (thickness) at a wavelength of 248 nm or 300 nm and a wavelength of 193 nm, 248 nm, or 300 nm for a part of the fine particle dispersion that can be used for the liquid 50. Refractive index.
- the surface of the fine particles may be modified with other materials such as surface-modified zirconia.
- Examples of the solvent in which the fine particles are dispersed include, but are not limited to, water, an organic solvent, and a solution dissolved in a silicone resin or silicone oil.
- organic solvents include saturated hydrocarbon compound solutions such as cyclohexane, decane, decahydronaphthalene, n-butyl acrylate, n-methyl acrylate, tetrahydrofuran, chloroform, methyl ethyl ketone, methyl methacrylate, dichloromethane, dimethyl silicone oil. Can do.
- the liquid 50 may have a refractive index of 1.32 or more, preferably 1.40 or more, and more preferably 1.45 or more at the wavelength of the deep ultraviolet light 18 emitted from the semiconductor light emitting device 10.
- the liquid 50 may preferably further have a refractive index of 1.50 or more, more preferably 1.55 or more. Since the liquid 50 has a refractive index of 1.32 or more at the wavelength of the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10, the liquid 50 is refracted at the wavelength of the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10.
- the refractive index can be made closer to the refractive index (refractive index of the substrate 11) of the emission surface (second surface 11b) of the semiconductor light emitting element 10 at the wavelength of the deep ultraviolet light 18.
- the liquid 50 has a refractive index smaller than that of the emission surface (second surface 11b) of the semiconductor light emitting device 10 at the wavelength of the deep ultraviolet light 18 emitted from the semiconductor light emitting device 10, and is higher than that of the transparent member 40. It may have a large refractive index. Therefore, the reflectance at the interface between the emission surface (second surface 11b) of the semiconductor light emitting element 10 and the liquid 50 and the reflectance at the interface between the liquid 50 and the transparent member 40 can be reduced.
- the liquid 50 preferably has an insulating property.
- the liquid 50 includes the n-type electrode 15, the p-type electrode 16, the first conductive pad 21, the second conductive pad 22, the bonding member 25, the lead pin 31, and the conductive wire 33. In contact with.
- the liquid 50 has an insulating property, it is possible to prevent the n-type electrode 15 and the p-type electrode 16 from being short-circuited.
- the liquid 50 has conductivity, the surface of the semiconductor light emitting element 10, the surface of the first conductive pad 21, the surface of the second conductive pad 22, the surface of the bonding member 25, and the surface of the lead pin 31.
- a thin insulating film may be provided on the surface of the conductive wire 33.
- the semiconductor light emitting device 10 includes a substrate 11, an n-type semiconductor layer 12, an active layer 13, a p-type semiconductor layer 14, an n-type electrode 15, and a p-type electrode 16.
- the substrate 11 has a first surface 11a and a second surface 11b opposite to the first surface 11a.
- the second surface 11b may be an exit surface.
- the substrate 11 preferably has a high transmittance such as 50% or more with respect to the wavelength of the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10.
- Examples of the material of the substrate 11 include aluminum nitride (AlN), silicon carbide (SiC), sapphire, gallium nitride (GaN), gallium oxide (Ga 2 O 3 ), and silicon (Si).
- a template substrate in which a base layer made of aluminum nitride (AlN), aluminum gallium nitride (AlGaN), or the like is formed on a substrate made of sapphire, SiC, or the like may be used.
- AlN aluminum nitride
- AlGaN aluminum gallium nitride
- the n-type semiconductor layer 12 is provided on the first surface 11 a of the substrate 11.
- the n-type semiconductor layer 12 preferably contains an n-type impurity such as silicon (Si), germanium (Ge), tin (Sn), oxygen (O), or carbon (C).
- the concentration of the n-type impurity in the n-type semiconductor layer 12 is 1.0 ⁇ 10 17 cm ⁇ 3 or more and 1.0 ⁇ 10 20 cm ⁇ 3 or less, preferably 1.0 ⁇ 10 18 cm ⁇ 3 or more and 1.0. It may be ⁇ 10 19 cm ⁇ 3 or less.
- the n-type semiconductor layer 12 may have a thickness of 100 to 10,000 nm, preferably 500 to 3000 nm.
- the type semiconductor layer 12 preferably has a larger band gap energy than the energy of the deep ultraviolet light 18 emitted from the active layer 13.
- the n-type semiconductor layer 12 has a refractive index lower than that of the active layer 13 and may function as a cladding layer.
- the n-type semiconductor layer 12 may be composed of a single layer, or may be composed of a plurality of layers having different Al compositions, In compositions, or Ga compositions. A plurality of layers having different Al compositions, In compositions, or Ga compositions may have a superlattice structure or a graded composition structure in which the composition gradually changes.
- An active layer 13 is provided on the n-type semiconductor layer 12.
- the active layer 13 is configured such that the deep ultraviolet light 18 having a wavelength of 190 to 350 nm, preferably 200 to 320 nm, more preferably 220 to 300 nm is emitted from the active layer 13.
- the deep ultraviolet light 18 emitted from the semiconductor light emitting device 10 has a wavelength of 190 to 350 nm, preferably 200 to 320 nm, more preferably 220 to 300 nm.
- a multi-quantum well (MQW) structure including a barrier layer composed of In order to confine electrons and holes in the active layer 13 by the n-type semiconductor layer 12 and the p-type semiconductor
- a p-type semiconductor layer 14 is provided on the active layer 13.
- the p-type semiconductor layer may be composed of a first p-type semiconductor layer 14 a located on the active layer 13 side and a second p-type semiconductor layer 14 b located on the opposite side to the active layer 13.
- the first p-type semiconductor layer 14a preferably contains a p-type impurity such as magnesium (Mg), zinc (Zn), or beryllium (Be).
- the concentration of the p-type impurity in the first p-type semiconductor layer 14a may be 1.0 ⁇ 10 17 cm ⁇ 3 or more, preferably 1.0 ⁇ 10 18 cm ⁇ 3 or more.
- the first p-type semiconductor layer 14a may have a thickness of 5 to 1000 nm, preferably 10 to 500 nm or less.
- the first p-type semiconductor layer 14 a may have a band gap energy larger than the energy of the deep ultraviolet light 18 emitted from the active layer 13.
- the first p-type semiconductor layer 14a may have a small Al composition ratio.
- the first p-type semiconductor layer 14a may have a refractive index lower than that of the active layer 13, and may function as a cladding layer.
- the first p-type semiconductor layer 14a may be composed of a single layer, or may be composed of a plurality of layers having different Al compositions, In compositions, or Ga compositions.
- a plurality of layers having different Al compositions, In compositions, or Ga compositions may have a superlattice structure or a graded composition structure in which the composition gradually changes.
- the second p-type semiconductor layer 14b preferably contains a p-type impurity such as magnesium (Mg), zinc (Zn), or beryllium (Be).
- the second p-type semiconductor layer 14b has a higher p-type conductivity than the first p-type semiconductor layer 14a, and may function as a p-type contact layer.
- the concentration of the p-type impurity in the second p-type semiconductor layer 14b may be 1.0 ⁇ 10 17 cm ⁇ 3 or more, preferably 1.0 ⁇ 10 18 cm ⁇ 3 or more.
- the second p-type semiconductor layer 14b may have a thickness of 1 to 500 nm.
- the second p-type semiconductor layer 14b becomes smaller as the Al composition of the nitride semiconductor is smaller and the band gap is smaller. Holes can be uniformly injected from the layer 14b by the active layer 13, and good p-type contact characteristics can be obtained. Therefore, the second p-type semiconductor layer 14b may have a small Al composition ratio.
- the second p-type semiconductor layer 14b has a deep ultraviolet radiated from the active layer 13. It may have a band gap energy larger than that of the light 18.
- the n-type electrode 15 is provided on the exposed surface of the n-type semiconductor layer 12.
- the exposed surface of the n-type semiconductor layer 12 is formed by laminating the n-type semiconductor layer 12, the active layer 13, and the p-type semiconductor layer 14 on the substrate 11, and then a part of the n-type semiconductor layer 12 and the active layer 13. And the surface where the n-type semiconductor layer 12 is exposed by partially removing the p-type semiconductor layer 14.
- the p-type electrode 16 is provided on the surface of the p-type semiconductor layer 14, more specifically, on the surface of the second p-type semiconductor layer 14b that may function as a p-type contact layer.
- An example of the manufacturing method of the light emitting module 1 according to the present embodiment may include the following steps.
- Semiconductor light emitting element 10 is prepared (S10).
- the semiconductor light emitting device 10 is placed on the base 30 (S20).
- the liquid 50 is discharged from the nozzle 52 to fill the liquid 50 into the transparent member 40 (S30).
- the base 30 on which the semiconductor light emitting element 10 is placed is placed over the opening of the transparent member 40 filled with the liquid 50 (S40).
- the semiconductor light emitting element 10 is inserted into the transparent member 40 filled with the liquid 50, and the base 30 is brought into contact with the transparent member 40.
- the transparent member 40 and the base 30 are adhere
- the step of preparing the semiconductor light emitting element 10 may include the following steps.
- a semiconductor layer including an n-type semiconductor layer 12, an active layer 13, and a p-type semiconductor layer 14 is formed on the first surface of the wafer by metal organic chemical vapor deposition (MOCVD), metal organic chemical vapor deposition.
- Lamination is performed by a method such as (MOVPE method), molecular beam epitaxy method (MBE method), hydride vapor phase epitaxy method (HVPE method) (S12).
- MOVPE method molecular beam epitaxy method
- MBE method molecular beam epitaxy method
- HVPE method hydride vapor phase epitaxy method
- a part of the semiconductor layer including the n-type semiconductor layer 12, the active layer 13, and the p-type semiconductor layer 14 is partially removed by etching or the like to form a mesa structure (S13).
- An n-type electrode 15 is formed on the exposed surface of the n-type semiconductor layer 12 formed by this etching by a method such as vacuum deposition (S14).
- a method such as vacuum deposition (S14) In order to improve electrical contact between the n-type semiconductor layer 12 and the n-type electrode 15, it is preferable to anneal at a temperature of 300 ° C. to 1100 ° C. for a period of 30 seconds to 3 minutes.
- the p-type electrode 16 is formed on the p-type semiconductor layer 14 by a method such as vacuum deposition (S16).
- the wafer is diced (S18), and the separated semiconductor light emitting device 10 is obtained.
- the light emitting module 1 includes a semiconductor light emitting element 10 that emits deep ultraviolet light 18, a liquid 50 that seals the semiconductor light emitting element 10, and a package (30) that contains the semiconductor light emitting element 10 and the liquid 50. 40).
- the liquid 50 is transparent to the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10.
- the package (30, 40) includes a transparent member 40 that is transparent to the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10.
- the transparent member 40 and the liquid 50 are transparent to the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10, the transparent member 40 and the liquid 50 have a low light absorption rate at the wavelength of the deep ultraviolet light 18. . Therefore, the deep ultraviolet light 18 radiated from the semiconductor light emitting element 10 can be efficiently taken out of the package (30, 40). Further, since the transparent member 40 and the liquid 50 are transparent at the wavelength of the deep ultraviolet light 18 and have a low light absorption rate, even if the transparent member 40 and the liquid 50 are exposed to the deep ultraviolet light 18 for a long period of time, the It can prevent that the light transmittance of the transparent member 40 and the liquid 50 in the wavelength of the ultraviolet light 18 falls. As a result, according to the light emitting module 1 of the present embodiment, a highly reliable light emitting module including the semiconductor light emitting element 10 that emits the deep ultraviolet light 18 can be provided.
- the liquid 50 Since the liquid 50 has fluidity, the liquid 50 convects the internal space of the package (30, 40) by the heat generated in the semiconductor light emitting device 10. Since the liquid 50 convects the internal space of the package (30, 40), a specific part of the liquid 50 does not continue to exist in the vicinity of the semiconductor light emitting device 10 where the light density of the deep ultraviolet light 18 is high. Therefore, only a specific part of the liquid 50 continues to be irradiated to the deep ultraviolet light 18 having a high light density emitted from the semiconductor light emitting element 10, so that the liquid 50 deteriorates and the liquid 50 at the wavelength of the deep ultraviolet light 18 is deteriorated. It can prevent that the light transmittance falls.
- the liquid 50 is located between the transparent member 40 and the semiconductor light emitting element 10 that emits the deep ultraviolet light 18, the light density of the deep ultraviolet light 18 in the transparent member 40 is deep ultraviolet in the vicinity of the semiconductor light emitting element 10. It is sufficiently smaller than the light density of the light 18. Therefore, even if the transparent member 40 that is a solid has a higher light absorption rate with respect to the deep ultraviolet light 18 than the liquid 50, the transparent member 40 is deteriorated by being irradiated with the deep ultraviolet light 18. Can be sufficiently suppressed. As a result, according to the light emitting module 1 of the present embodiment, a highly reliable light emitting module including the semiconductor light emitting element 10 that emits the deep ultraviolet light 18 can be provided.
- the cured resin does not flow in the comparative example in which the semiconductor light emitting device 10 that emits the deep ultraviolet light 18 is sealed with the cured resin. Therefore, the cured resin located in the vicinity of the semiconductor light emitting element 10 continues to be irradiated with the deep ultraviolet light 18 having a high light density, and deteriorates rapidly. In the wavelength region of the deep ultraviolet light 18, the cured resin has a higher light absorption rate with respect to the deep ultraviolet light 18 than the liquid 50, or the cured resin located in the vicinity of the semiconductor light emitting element 10. Further promote deterioration. Therefore, in the comparative example in which the semiconductor light emitting element 10 that emits the deep ultraviolet light 18 is sealed with the cured resin, a highly reliable light emitting module cannot be provided. The above description is supported by the following experimental examples.
- the solid line shows the change rate of the light output with respect to the operation time of the light emitting module 1 of the experimental example of the present embodiment.
- the dotted line indicates the change rate of the light output with respect to the operation time of the light emitting module of the first comparative example that does not include the liquid 50.
- the semiconductor light emitting element is covered with air.
- An alternate long and short dash line indicates that the light emitting module of the second comparative example in which the semiconductor light emitting element 10 that emits the deep ultraviolet light 18 is sealed with a hardened fluoro silicone resin FER7061 (manufactured by Shin-Etsu Chemical Co., Ltd.) instead of the liquid 50.
- the rate of change of light output with respect to operating time is shown.
- the change rate of the light output with respect to the operation time of the light emitting module is defined as a value obtained by normalizing the light output from the light emitting module after a certain time has elapsed with the light output from the light emitting module immediately after the operation.
- the transparent member 40 is a cap made of synthetic quartz and having a hemispherical shell shape with a thickness of 1.5 mm.
- the liquid 50 is 1,1'-bicyclohexyl.
- the semiconductor light emitting element 10 is configured to have an emission wavelength of 265 nm.
- the light emitting module 1 of the present embodiment in which the semiconductor light emitting device 10 is sealed with the liquid 50 has the rate of change of the light output with respect to the operating time, similar to the first comparative example in which the semiconductor light emitting device is covered with air. . Therefore, even if the operation time of the light emitting module 1 is long, it can be seen that the liquid 50 is not deteriorated and the transmittance is not lowered similarly to the air. In addition, it is thought that the change of the optical output with respect to operation time of the light emitting module 1 of this Embodiment is due to the change of the optical output of the semiconductor light emitting element 10 itself.
- the light output of the light emitting module of the second comparative example in which the semiconductor light emitting element 10 is sealed with the cured resin is larger than the light output of the light emitting module 1 of the present embodiment as the operation time becomes longer. Has also declined significantly.
- the reason why the light output of the light emitting module of the second comparative example is greatly reduced in this way is that the cured resin that seals the semiconductor light emitting element 10 is deteriorated by the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10, This is presumably because the transmittance of the cured resin at the wavelength of the deep ultraviolet light 18 emitted from the semiconductor light emitting device 10 rapidly decreased.
- a highly reliable light emitting module including the semiconductor light emitting element 10 that emits deep ultraviolet light 18 can be provided, whereas the semiconductor light emitting element 10 is cured.
- the light emitting module of the second comparative example sealed with resin cannot provide a highly reliable light emitting module.
- a solid line indicates a change in light output of the light emitting module 1 of the present embodiment with respect to a current supplied to the light emitting module 1 of the experimental example of the present embodiment.
- the dotted line indicates the change in the light output of the light emitting module 1 of the first comparative example with respect to the current supplied to the light emitting module of the first comparative example that does not include the liquid 50.
- the light emitting module 1 of the present embodiment has a light output that is twice as large as that of the light emitting module 1 of the first comparative example.
- the semiconductor light emitting element 10 is sealed with the liquid 50.
- the refractive index of the liquid 50 is larger than the refractive index of air.
- the difference between the refractive index of the liquid 50 at the wavelength of the deep ultraviolet light 18 and the refractive index of the emission surface (second surface 11b) of the semiconductor light emitting element 10 (the refractive index of the substrate 11) is expressed as the wavelength of the deep ultraviolet light 18.
- the difference between the refractive index of air and the refractive index of the emitting surface (second surface 11b) of the semiconductor light emitting element 10 (the refractive index of the substrate 11) can be made smaller.
- the deep ultraviolet light 18 emitted from the active layer 13 of the semiconductor light emitting element 10 is totally reflected on the emission surface (second surface 11 b) of the semiconductor light emitting element 10.
- the deep ultraviolet light 18 radiated from the active layer 13 of the semiconductor light emitting element 10 can be efficiently extracted outside the emission surface (second surface 11b) of the semiconductor light emitting element 10.
- a light emitting module having a high light output can be provided.
- the difference from the refractive index of 11b) (the refractive index of the substrate 11) is large. Therefore, in the light emitting module of the first comparative example, most of the deep ultraviolet light 18 emitted from the active layer 13 of the semiconductor light emitting element 10 is totally reflected by the emission surface (second surface 11b) of the semiconductor light emitting element 10. Therefore, it is difficult to extract the deep ultraviolet light 18 emitted from the active layer 13 of the semiconductor light emitting device 10 to the outside of the semiconductor light emitting device 10.
- the liquid 50 has a higher refractive index than a cured resin having a relatively high transmittance with respect to the wavelength of the deep ultraviolet light 18. Therefore, the difference between the refractive index of the liquid 50 at the wavelength of the deep ultraviolet light 18 and the refractive index (refractive index of the substrate 11) of the emission surface (second surface 11b) of the semiconductor light emitting element 10 is expressed as the deep ultraviolet light 18.
- the difference between the refractive index of the cured resin and the refractive index (refractive index of the substrate 11) of the emission surface (second surface 11b) of the semiconductor light emitting element 10 can be made smaller.
- the light emitting module of the second comparative example in which the semiconductor light emitting element 10 is sealed with a cured resin is used.
- the deep ultraviolet light 18 emitted from the active layer 13 of the semiconductor light emitting device 10 is reduced from being totally reflected by the emission surface (second surface 11b) of the semiconductor light emitting device 10, and the active layer 13 of the semiconductor light emitting device 10 is reduced.
- the deep ultraviolet light 18 emitted from the semiconductor light emitting device 10 can be efficiently extracted to the outside of the emission surface (second surface 11b) of the semiconductor light emitting element 10.
- the transparent member 40 contains the liquid 50, and the transparent member 40 is in contact with the liquid 50.
- the refractive index of the liquid 50 is generally larger than the refractive index of air.
- the difference between the refractive index of the liquid 50 and the refractive index of the transparent member 40 at the wavelength of the deep ultraviolet light 18 is the difference between the refractive index of air and the refractive index of the transparent member 40 at the wavelength of the deep ultraviolet light 18 in the first comparative example.
- the difference from the rate can be made smaller.
- the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10 is reduced from being reflected by the transparent member 40, and the deep ultraviolet light emitted from the semiconductor light emitting element 10 is reduced. 18 can be efficiently taken out of the light emitting module 1.
- a light emitting module having a high light output can be provided.
- the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10 can be taken out of the light emitting module 1 with high efficiency. It is possible to reduce the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10 from being converted into heat in the light emitting module 1. Therefore, according to the light emitting module 1 of the present embodiment, the lifetime of the semiconductor light emitting device 10 that emits the deep ultraviolet light 18 can be extended, and the reliability includes the semiconductor light emitting device 10 that emits the deep ultraviolet light 18. A light emitting module having a high level can be provided.
- the semiconductor light emitting device 10 that emits the deep ultraviolet light 18 can be sealed simply by injecting the liquid 50 into the internal space of the package (30, 40). Therefore, according to the light emitting module 1 according to the present embodiment, a light emitting module having high reliability and high light output can be provided at low cost.
- the shape of the liquid 50 changes according to the shape of the internal space of the package (30, 40). Therefore, according to the light emitting module 1 according to the present embodiment, the semiconductor light emitting device 10 included in various types of light emitting modules including packages (30, 40) having various internal space shapes can be easily and inexpensively sealed. Can be stopped.
- the liquid 50 may be composed of any one of pure water, a liquid organic compound, a salt solution, and a fine particle dispersion. Therefore, according to the light emitting module 1 of the present embodiment, it is possible to provide a light emitting module that includes the semiconductor light emitting element 10 that emits the deep ultraviolet light 18 and has high reliability and high light output.
- the liquid organic compound may be composed of any one of a saturated hydrocarbon compound, an organic solvent having no aromatic ring, an organic halide, a silicone resin, and a silicone oil. Therefore, according to the light emitting module 1 of the present embodiment, it is possible to provide a light emitting module that includes the semiconductor light emitting element 10 that emits the deep ultraviolet light 18 and has high reliability and high light output.
- the salt solution may be composed of any of an acid solution, an inorganic salt solution, and an organic salt solution. Therefore, according to the light emitting module 1 of the present embodiment, it is possible to provide a light emitting module that includes the semiconductor light emitting element 10 that emits the deep ultraviolet light 18 and has high reliability and high light output.
- the liquid 50 is 1.32 or more, preferably 1.40 or more, more preferably 1.45 or more, at the wavelength of the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10.
- the refractive index may be as follows. Therefore, the refractive index of the liquid 50 at the wavelength of the deep ultraviolet light 18 radiated from the semiconductor light emitting element 10 is set as the refractive index of the emission surface (second surface 11b) of the semiconductor light emitting element 10 at the wavelength of the deep ultraviolet light 18 (substrate). 11 (refractive index of 11).
- the deep ultraviolet light 18 radiated from the active layer 13 of the semiconductor light emitting element 10 is further reduced from being totally reflected by the emission surface (second surface 11b) of the semiconductor light emitting element 10, and the activity of the semiconductor light emitting element 10 is reduced.
- the deep ultraviolet light 18 radiated from the layer 13 can be extracted more efficiently from the outside of the emission surface (second surface 11 b) of the semiconductor light emitting element 10.
- a light emitting module having a higher light output can be provided.
- the liquid 50 has a refractive index smaller than that of the emission surface (second surface 11 b) of the semiconductor light emitting element 10 at the wavelength of the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10. And may have a refractive index larger than that of the transparent member 40.
- the reflectance at the interface between the emission surface (second surface 11b) of the semiconductor light emitting element 10 and the liquid 50, and the reflectance at the interface between the liquid 50 and the transparent member 40 Can be reduced. Therefore, according to the light emitting module 1 of the present embodiment, the deep ultraviolet light 18 radiated from the semiconductor light emitting element 10 can be efficiently extracted outside the package (30, 40), and has a higher light output.
- a light emitting module can be provided.
- the liquid 50 may be made of a material having a transmittance of 80% or more per 100 ⁇ m path length at the wavelength of the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10. Good. Therefore, according to the light emitting module 1 of the present embodiment, it is possible to provide a light emitting module that includes the semiconductor light emitting element 10 that emits the deep ultraviolet light 18 and has high reliability and high light output.
- the liquid 50 has a transmittance of 60% or more, preferably 75%, more preferably 90% or more at the wavelength of the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10. You may have. Therefore, according to the light emitting module 1 of the present embodiment, it is possible to provide a light emitting module that includes the semiconductor light emitting element 10 that emits the deep ultraviolet light 18 and has high reliability and high light output.
- the transparent member 40 may be a cap.
- the cap has a shape of a shell having an opening on one side and a space inside, and has a sufficiently thin thickness compared to the plate.
- the thickness of the transparent member 40 that is a cap is sufficiently thinner than the thickness of the cured resin that seals the semiconductor light emitting element 10 in the light emitting module of the second comparative example.
- the absorption of the deep ultraviolet light 18 in the transparent member 40 that is a cap is made smaller than the absorption of the deep ultraviolet light 18 in the cured resin in the light emitting module of the second comparative example. Can do. Therefore, according to the light emitting module 1 of the present embodiment, the extraction efficiency of the deep ultraviolet light 18 from the package (30, 40) can be improved.
- the thickness of the cured resin that seals the semiconductor light emitting element 10 is greater than the thickness of the transparent member 40 that is a cap in the light emitting module 1 of the present embodiment. Also thick enough.
- the absorption of the deep ultraviolet light 18 in the cured resin of the light emitting module of the second comparative example is larger than the absorption of the deep ultraviolet light 18 in the transparent member 40 that is the cap of the light emitting module 1 of the present embodiment. Therefore, it is difficult to improve the extraction efficiency of the deep ultraviolet light 18 from the light emitting module of the second comparative example.
- the thickness of the transparent member 40 which is a cap is thin. Therefore, the shape of the transparent member 40 that is a cap can be easily changed at low cost. Furthermore, the shape of the liquid 50 is freely changed according to the shape of the internal space of the package (30, 40). Therefore, according to the light emitting module 1 which concerns on this Embodiment, by using the transparent member 40 which is a cap, and the liquid 50, various types provided with the package (30, 40) which has the shape of various internal spaces. A light emitting module can be manufactured easily and inexpensively.
- the cured resin that seals the semiconductor light emitting element 10 pots the resin on the semiconductor light emitting element 10. Then, it is manufactured by curing the resin. For this reason, it is difficult to form the shape of the outer surface of the cured resin into an arbitrary shape.
- the cured resin that seals the semiconductor light emitting element 10 is cured after pouring the resin into a mold. May be manufactured.
- the transparent member 40 may have a hemispherical shell.
- the incident angle of the deep ultraviolet light 18 radiated from the semiconductor light emitting element 10 to the transparent member 40 can be made close to vertical. Therefore, it can suppress that the deep ultraviolet light 18 radiated
- the resin is cured after potting the resin on the semiconductor light emitting element 10. It is difficult to form the outer surface into a hemispherical shape. Therefore, in the light emitting module of the second comparative example in which the semiconductor light emitting element 10 is sealed with the cured resin, the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10 is reflected on the outer surface of the cured resin. It is difficult to effectively suppress this.
- the transparent member 40 may be made of any of synthetic quartz, quartz glass, non-alkali glass, sapphire, fluorite, and resin. Synthetic quartz, quartz glass, alkali-free glass, sapphire, fluorite, and resin are all in the deep ultraviolet light 18 having a wavelength of 190 nm to 350 nm, preferably 200 nm to 320 nm, and more preferably 220 nm to 300 nm. On the other hand, it has low light absorption and high light transmittance. Therefore, according to the light emitting module 1 of the present embodiment, it is possible to provide a light emitting module that includes the semiconductor light emitting element 10 that emits the deep ultraviolet light 18 and has high reliability and high light output.
- the transparent member 40 is made of a material having a transmittance of 80% or more per 100 ⁇ m path length at the wavelength of the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10. Also good. Therefore, according to the light emitting module 1 of the present embodiment, it is possible to provide a light emitting module that includes the semiconductor light emitting element 10 that emits the deep ultraviolet light 18 and has high reliability and high light output.
- the transparent member 40 has a transmittance of 60% or more, preferably 75%, and more preferably 90% or more at the wavelength of the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10. You may have. Therefore, according to the light emitting module 1 of the present embodiment, it is possible to provide a light emitting module that includes the semiconductor light emitting element 10 that emits the deep ultraviolet light 18 and has high reliability and high light output.
- the light emitting module 1a which concerns on Embodiment 2 is demonstrated.
- the light emitting module 1a of the present embodiment basically has the same configuration as the light emitting module 1 of the first embodiment shown in FIG. 1 and can obtain the same effects, but mainly in the following points. Different.
- the semiconductor light emitting element 10a includes a concavo-convex structure 17 that improves the efficiency of extracting the deep ultraviolet light 18 emitted from the active layer 13 of the semiconductor light emitting element 10a to the outside of the semiconductor light emitting element 10a.
- the concavo-convex structure 17 that improves the efficiency of extracting the deep ultraviolet light 18 to the outside of the semiconductor light emitting element 10a may be included in the emission surface (second surface 11b) of the semiconductor light emitting element 10a.
- the concavo-convex structure 17 can reduce the total reflection of the deep ultraviolet light 18 emitted from the active layer 13 of the semiconductor light emitting device 10a on the emission surface (second surface 11b) of the semiconductor light emitting device 10a. Therefore, the provision of the uneven structure 17 in the semiconductor light emitting device 10a can improve the efficiency of extracting the deep ultraviolet light 18 outside the semiconductor light emitting device 10a. According to the light emitting module 1a of the present embodiment, it is possible to provide a light emitting module that includes the semiconductor light emitting element 10a that emits the deep ultraviolet light 18 and has high reliability and high light output.
- concave portions and convex portions may be arranged at random. In the concavo-convex structure 17, concave portions and convex portions may be periodically arranged.
- the uneven structure 17 may be arranged in a triangular lattice, a square lattice, or a hexagonal lattice.
- the concavo-convex structure 17 is preferably arranged in a triangular lattice with a maximum filling factor.
- the shape of the concave portion or the convex portion of the concavo-convex structure 17 may have a shape of a prism, a cylinder, a cone, a pyramid, a sphere, or a semi-elliptical sphere.
- FIG. 6A a method for manufacturing the semiconductor light emitting element 10a of the light emitting module 1a according to the present embodiment will be described.
- An example of the manufacturing method of the semiconductor light emitting element 10a of the light emitting module 1a according to the present embodiment is basically the same as the manufacturing method shown in FIG. 2B, but the p-type electrode 16 is formed (S16). The difference is that it includes a step (S17) of forming the concavo-convex structure 17 on the second surface opposite to the first surface of the wafer later. The second surface of the wafer becomes the second surface 11b of the substrate 11 after the subsequent dicing process.
- the step (S17) of forming the uneven structure 17 on the second surface of the wafer may include the following steps.
- a patterned etching mask is formed on the second surface of the wafer opposite to the first surface on which the semiconductor layer including the n-type semiconductor layer 12, the active layer 13, and the p-type semiconductor layer 14 is formed. (S171).
- the second surface of the wafer is etched using the patterned etching mask (S172). Finally, the etching mask is removed (S173).
- Forming a patterned etching mask may be performed by electron beam drawing, photolithography, nanoimprinting, or the like.
- Etching the second surface 11b of the substrate 11 using the patterned etching mask (S172) is performed by dry etching such as inductively coupled plasma (ICP) etching or reactive ion etching (RIE), or an acidic solution. Alternatively, it may be performed by wet etching using an alkaline solution as an etching solution.
- ICP inductively coupled plasma
- RIE reactive ion etching
- the light emitting module 1a of the present embodiment will explain the following operations and effects in addition to the operations and effects of the light emitting module 1 of the first embodiment.
- the semiconductor light emitting element 10a has the concavo-convex structure 17 that improves the efficiency of extracting the deep ultraviolet light 18 emitted from the active layer 13 of the semiconductor light emitting element 10a to the outside of the semiconductor light emitting element 10a. May be included.
- the concavo-convex structure 17 can reduce the total reflection of the deep ultraviolet light 18 emitted from the active layer 13 of the semiconductor light emitting device 10a on the emission surface (second surface 11b) of the semiconductor light emitting device 10a. Therefore, the provision of the uneven structure 17 in the semiconductor light emitting device 10a can improve the efficiency of extracting the deep ultraviolet light 18 outside the semiconductor light emitting device 10a.
- the light emitting module 1a includes a semiconductor light emitting element 10a and a liquid 50 that seals the semiconductor light emitting element 10a, and the semiconductor light emitting element 10a has a depth emitted from the active layer 13 of the semiconductor light emitting element 10a.
- a concavo-convex structure 17 that improves the efficiency of extracting the ultraviolet light 18 to the outside of the semiconductor light emitting element 10a may be included. Since the liquid 50 has a higher fluidity than the cured resin, the liquid 50 can be filled in the recesses of the concavo-convex structure 17 without gaps. In general, the refractive index of the liquid 50 is larger than the refractive index of air.
- the difference between the refractive index of the liquid 50 at the wavelength of the deep ultraviolet light 18 and the refractive index of the surface on which the uneven structure 17 of the semiconductor light emitting element 10a is formed at the wavelength of the deep ultraviolet light 18 can be reduced.
- the deep ultraviolet light 18 emitted from the active layer 13 of the semiconductor light emitting element 10a is totally reflected by the emission surface (second surface 11b) of the semiconductor light emitting element 10.
- Can be reduced by the concavo-convex structure 17 and the liquid 50, and the deep ultraviolet light 18 emitted from the active layer 13 of the semiconductor light emitting element 10 a can be efficiently extracted to the outside of the semiconductor light emitting element 10.
- the light emitting module 1a of the present embodiment it is possible to provide a light emitting module having high reliability and high light output.
- the semiconductor light emitting element 10a on which the concavo-convex structure 17 is formed is sealed with a cured resin, even if the concavo-convex structure 17 is introduced into the semiconductor light emitting element 10a due to this gap, the deep ultraviolet light 18 is transmitted to the semiconductor.
- the efficiency of taking it out of the light emitting element 10a can be improved only to a limited extent.
- the light emitting module 1b which concerns on Embodiment 3 is demonstrated.
- the light emitting module 1b of the present embodiment basically has the same configuration as the light emitting module 1a of the second embodiment shown in FIG. 5 and can obtain the same effects, but mainly in the following points. Different.
- the light emitting module 1b of the present embodiment includes a package (40, 60) including a base 60 and a transparent member 40.
- the package (40, 60) of the present embodiment includes a base 60 in place of the base 30 of the first embodiment.
- Examples of materials used for the base 60 include metals, resins, and ceramics.
- the package (40, 60) including the base 60 made of metal is called a metal package
- the package (40, 60) including the base 60 made of resin is called a resin package
- a package (40, 60) including 60 is called a ceramic package.
- the package (40, 60) of the present embodiment may be a metal package, a resin package, or a ceramic package.
- the base 60 is made of a material having high thermal conductivity and may function as a heat sink. In the present embodiment, aluminum nitride (AlN) may be used as the material of the base 60.
- the base 60 is provided with a side wall 61 around it.
- a recess 62 that accommodates the semiconductor light emitting element 10 a is formed inside the side wall 61.
- the side wall 61 has a side surface 63 that faces the recess 62.
- a first conductive pad 65 and a second conductive pad 66 are provided on the bottom surface of the recess 62 of the base 60.
- the base 60 has a surface 67 opposite to the recess 62.
- a third conductive pad 68 and a fourth conductive pad 69 are provided on the surface 67 of the base 60.
- a reflective film may be provided on the bottom surface and the side surface 63 of the recess 62 of the base 60.
- the base 60 is provided with a first through hole 71 and a second through hole 72.
- the first through hole 71 and the second through hole 72 connect the recess 62 and the surface 67.
- Conductive members 74 are provided in the first through hole 71 and the second through hole 72. The conductive member 74 connects the recess 62 and the surface 67.
- the semiconductor light emitting element 10a may be placed on the base 60.
- the conductive bonding member 25 the n-type electrode 15 of the semiconductor light emitting element 10a and the first conductive pad 65 of the base 60 are electrically and mechanically connected, and the p-type electrode of the semiconductor light emitting element 10a is connected. 16 and the second conductive pad 66 of the base 60 are electrically and mechanically connected.
- external members (not shown) are connected via the bonding member 25, the first conductive pad 65, the second conductive pad 66, the conductive member 74, the third conductive pad 68, and the fourth conductive pad 69.
- a current is supplied from the power source to the semiconductor light emitting element 10 a, and the semiconductor light emitting element 10 a emits deep ultraviolet light 18.
- the light emitting module 1b of the present embodiment will explain the following operations and effects in addition to the operations and effects of the light emitting module 1a of the second embodiment.
- the wire bonding step can be omitted. Therefore, according to the light emitting module 1b of the present embodiment, the productivity of the light emitting module can be improved and the production cost can be reduced.
- the shape of the liquid 50 changes according to the shape of the internal space of the package (40, 60). Therefore, even in the package (40, 60) of the present embodiment having a shape of the internal space different from the package (30, 40) of the first embodiment, the semiconductor light emitting element 10a can be easily and inexpensively made by the liquid 50. Can be sealed.
- the light emitting module 1c which concerns on Embodiment 4 is demonstrated.
- the light emitting module 1c of the present embodiment basically has the same configuration as the light emitting module 1b of the third embodiment shown in FIG. 8 and can obtain the same effects, but mainly in the following points. Different.
- the light emitting module 1c of the present embodiment includes packages (40c, 60) including a base 60 and a transparent member 40c.
- the transparent member 40c may be a cap having any shape of a semi-elliptical spherical shell and a shell having a shell shape.
- the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10a can be refracted by the transparent member 40c which is a cap. Therefore, the transparent member 40c, which is a cap, has a shape of any one of a semi-elliptical spherical shell and a shell having a shell shape, so that the light distribution characteristics of the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10a can be varied. Can be changed.
- the shape of the liquid 50 changes according to the shape of the internal space of the package (40c, 60). Therefore, even in the package (40c, 60) of the present embodiment having an internal space shape different from that of the package (40, 60) of the third embodiment, the semiconductor light emitting element 10a can be easily and inexpensively made by the liquid 50. Can be sealed.
- the light emitting module 1d which concerns on Embodiment 5 is demonstrated.
- the light emitting module 1d of the present embodiment basically has the same configuration as the light emitting module 1a of the second embodiment shown in FIG. 5 and can obtain the same effects, but mainly in the following points. Different.
- the light emitting module 1d of the present embodiment includes a package (40d, 44, 60) including a base 30, a transparent member 40d, and a cap 44.
- the transparent member 40d is a flat plate.
- the cap 44 mechanically supports the transparent member 40d. Examples of the material used for the cap 44 include metals and resins.
- the cap 44 may be fixed to the base 30 by an adhesive 42 or welding.
- the transparent member 40d may be made of any of synthetic quartz, quartz glass, non-alkali glass, sapphire, fluorite, and resin, like the transparent member 40 of the first embodiment.
- the shape of the liquid 50 changes according to the shape of the space inside the package (40d, 44, 30). Therefore, even in the package (40d, 44, 30) of the present embodiment having an internal space shape different from that of the package (30, 40) of the first embodiment, the semiconductor light emitting element 10a can be easily formed by the liquid 50. And it can seal cheaply.
- the light emitting module 1e which concerns on Embodiment 6 is demonstrated.
- the light emitting module 1e of the present embodiment basically has the same configuration as the light emitting module 1d of the fifth embodiment shown in FIG. 10 and can obtain the same effects, but mainly in the following points. Different.
- the light emitting module 1e of the present embodiment includes a package (40e, 44, 60) including a base 30, a transparent member 40e, and a cap 44.
- the package (40e, 44, 30) includes a transparent member 40e instead of the transparent member 40d of the fifth embodiment.
- the transparent member 40e is a lens.
- the transparent member 40e is a lens.
- the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10a can be refracted by the transparent member 40d which is a lens. Therefore, the light distribution characteristic of the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10a can be changed by the transparent member 40e which is a lens.
- the light emitting module 1f according to Embodiment 7 basically has the same configuration as the light emitting module 1d of the fifth embodiment shown in FIG. 10 and can obtain the same effects, but mainly in the following points. Different.
- the light emitting module 1f of the present embodiment includes a package (40d, 60) including a base 60 and a transparent member 40d.
- the package (40d, 60) includes the base 60 of the third embodiment instead of the base 30 of the fifth embodiment.
- the peripheral edge of the transparent member 40 d is placed on the top of the side wall 61 of the base 60, and the transparent member 40 d is mechanically supported by the side wall 61 of the base 60.
- the peripheral portion of the transparent member 40d is fixed on the side wall 61 of the base 60 using an adhesive 42 or the like.
- An example of a method for manufacturing the light emitting module 1f according to the present embodiment may include the following manufacturing method.
- the semiconductor light emitting element 10a is prepared.
- the semiconductor light emitting element 10 a is placed on the bottom surface of the recess 62 of the base 60.
- the liquid 50 is filled into the recess 62 of the base 60.
- a transparent member 40d which is a flat plate, is placed over the opening of the recess 62 of the base 60 filled with the liquid 50.
- the peripheral portion of the transparent member 40d is fixed on the side wall 61 of the base 60 using an adhesive 42 or the like.
- the light emitting module 1f of the present embodiment has the operation and effect of the base 60 of the third embodiment in addition to the operation and effect of the light emitting module 1f of the fifth embodiment.
- the light emitting module 1g which concerns on Embodiment 8 is demonstrated.
- the light emitting module 1g of the present embodiment basically has the same configuration as the light emitting module 1f of the seventh embodiment shown in FIG. 12, and can obtain the same effects, but mainly in the following points. Different.
- the light emitting module 1g of the present embodiment includes a package (40g, 60) including a base 60 and a transparent member 40g.
- the package (40g, 60) includes a transparent member 40g instead of the transparent member 40d of the eighth embodiment.
- the transparent member 40g is a transparent plate having a lens formed on the surface. The peripheral edge of the transparent member 40 g is placed on the top of the side wall 61 of the base 60, and the transparent member 40 g is mechanically supported by the side wall 61 of the base 60.
- the transparent member 40g is fixed on the side wall 61 of the base 60 using an adhesive 42 or the like.
- the transparent member 40g is a transparent plate having a lens formed on the surface.
- the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10a can be refracted by the lens of the transparent member 40g. Therefore, the light distribution characteristics of the deep ultraviolet light 18 emitted from the semiconductor light emitting element 10a can be changed by the transparent member 40g.
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Abstract
Description
図1を参照して、実施の形態1に係る発光モジュール1は、主に、深紫外光18を放射する半導体発光素子10と、半導体発光素子10を封止する液体50と、半導体発光素子10と液体50とを収容するパッケージ(30、40)とを備える。
ウエハの第1の面の上に、n型半導体層12、活性層13、及びp型半導体層14を含む半導体層を、有機金属化学気相成長法(MOCVD法)、有機金属気相成長法(MOVPE法)、分子線エピタキシー法(MBE法)、ハイドライド気相成長法(HVPE法)等の方法で、積層する(S12)。ウエハは、後のダイシング工程の後に、基板11となり、ウエハの第1の面は、後のダイシング工程の後に、基板11の第1の面11aとなる。n型半導体層12、活性層13、及びp型半導体層14を含む半導体層の一部を、エッチング等により部分的に除去し、メサ構造を形成する(S13)。このエッチングにより形成されたn型半導体層12の露出面に、真空蒸着法などの方法によって、n型電極15を形成する(S14)。n型半導体層12とn型電極15との間の電気的コンタクトを向上させるため、300℃以上1100℃以下の温度で、30秒以上3分間以下の時間、アニールすることが好ましい。それから、p型半導体層14の上に、真空蒸着法などの方法によって、p型電極16を形成する(S16)。p型半導体層14とp型電極16との間の電気的コンタクトを向上させるため、200℃以上800℃以下の温度で、30秒以上3分間以下の時間、アニールすることが好ましい。それから、ウエハをダイシングして(S18)、個片化された半導体発光素子10が得られる。
本実施の形態に係る発光モジュール1は、深紫外光18を放射する半導体発光素子10と、半導体発光素子10を封止する液体50と、半導体発光素子10と液体50とを収容するパッケージ(30、40)とを備える。液体50は、半導体発光素子10から放射される深紫外光18に対して透明である。パッケージ(30、40)は、半導体発光素子10から放射される深紫外光18に対して透明な透明部材40を有する。
図5を参照して、実施の形態2に係る発光モジュール1aを説明する。本実施の形態の発光モジュール1aは、基本的には、図1に示す実施の形態1の発光モジュール1と同様の構成を備え、同様の効果を得ることができるが、主に以下の点で異なる。
図8を参照して、実施の形態3に係る発光モジュール1bを説明する。本実施の形態の発光モジュール1bは、基本的には、図5に示す実施の形態2の発光モジュール1aと同様の構成を備え、同様の効果を得ることができるが、主に以下の点で異なる。
図9を参照して、実施の形態4に係る発光モジュール1cを説明する。本実施の形態の発光モジュール1cは、基本的には、図8に示す実施の形態3の発光モジュール1bと同様の構成を備え、同様の効果を得ることができるが、主に以下の点で異なる。
図10を参照して、実施の形態5に係る発光モジュール1dを説明する。本実施の形態の発光モジュール1dは、基本的には、図5に示す実施の形態2の発光モジュール1aと同様の構成を備え、同様の効果を得ることができるが、主に以下の点で異なる。
図11を参照して、実施の形態6に係る発光モジュール1eを説明する。本実施の形態の発光モジュール1eは、基本的には、図10に示す実施の形態5の発光モジュール1dと同様の構成を備え、同様の効果を得ることができるが、主に以下の点で異なる。
図12を参照して、実施の形態7に係る発光モジュール1fを説明する。本実施の形態の発光モジュール1fは、基本的には、図10に示す実施の形態5の発光モジュール1dと同様の構成を備え、同様の効果を得ることができるが、主に以下の点で異なる。
図13を参照して、実施の形態8に係る発光モジュール1gを説明する。本実施の形態の発光モジュール1gは、基本的には、図12に示す実施の形態7の発光モジュール1fと同様の構成を備え、同様の効果を得ることができるが、主に以下の点で異なる。
Claims (20)
- 深紫外光を放射する半導体発光素子と、
前記半導体発光素子を封止する液体とを備え、前記液体は、前記半導体発光素子から放射される前記深紫外光に対して透明であり、さらに、
前記半導体発光素子と前記液体とを収容するパッケージとを備え、前記パッケージは前記半導体発光素子から放射される前記深紫外光に対して透明な透明部材を有する、発光モジュール。 - 前記液体は、純水、液体有機化合物、塩溶液、及び微粒子分散液のいずれかから構成される、請求項1に記載の発光モジュール。
- 前記液体有機化合物は、飽和炭化水素化合物、芳香環を有しない有機溶媒、有機ハロゲン化物、シリコーン樹脂、シリコーンオイルのいずれかから構成される、請求項2に記載の発光モジュール。
- 前記塩溶液は、酸溶液、無機塩溶液、有機塩溶液のいずれかから構成される、請求項2に記載の発光モジュール。
- 前記液体は、前記半導体発光素子から放射される前記深紫外光の波長において、1.32以上の屈折率を有する、請求項1から請求項4のいずれか一項に記載の発光モジュール。
- 前記液体は、前記半導体発光素子から放射される前記深紫外光の波長において、1.40以上の屈折率を有する、請求項1から請求項4のいずれか一項に記載の発光モジュール。
- 前記液体は、前記半導体発光素子から放射される前記深紫外光の波長において、前記半導体発光素子の出射面よりも小さな屈折率を有し、かつ、前記透明部材よりも大きな屈折率を有する、請求項1から請求項6のいずれか一項に記載の発光モジュール。
- 前記液体は、前記半導体発光素子から放射される前記深紫外光の波長において、100μmの経路長当たり80%以上の透過率を有する材料から構成される、請求項1から請求項7のいずれか一項に記載の発光モジュール。
- 前記液体は、前記半導体発光素子から放射される前記深紫外光の波長において、60%以上の透過率を有する、請求項1から請求項8のいずれか一項に記載の発光モジュール。
- 前記液体は、前記半導体発光素子から放射される前記深紫外光の波長において、75%以上の透過率を有する、請求項1から請求項8のいずれか一項に記載の発光モジュール。
- 前記半導体発光素子は、前記半導体発光素子の活性層から放射される前記深紫外光を前記半導体発光素子の外部に取り出す効率を向上させる凹凸構造を含む、請求項1から請求項10のいずれか一項に記載の発光モジュール。
- 前記透明部材は、キャップである、請求項1から請求項11のいずれか一項に記載の発光モジュール。
- 前記透明部材は、半球殻、半楕円球殻、及び砲弾の形状を有する殻のいずれかの形状を有する、請求項1から請求項12のいずれか一項に記載の発光モジュール。
- 前記透明部材は、平板、レンズまたは表面にレンズが形成された透明板である、請求項1から請求項11のいずれか一項に記載の発光モジュール。
- 前記透明部材は、合成石英、石英ガラス、無アルカリガラス、サファイア、蛍石、及び樹脂のいずれかからなる、請求項1から請求項14のいずれか一項に記載の発光モジュール。
- 前記透明部材は、前記半導体発光素子から放射される前記深紫外光の波長において、100μmの経路長当たり80%以上の透過率を有する材料から構成される、請求項1から請求項15のいずれか一項に記載の発光モジュール。
- 前記透明部材は、前記半導体発光素子から放射される前記深紫外光の波長において、60%以上の透過率を有する、請求項1から請求項16のいずれか一項に記載の発光モジュール。
- 前記パッケージは、メタルパッケージ、樹脂パッケージ、セラミックパッケージのいずれかである、請求項1から請求項17のいずれか一項に記載の発光モジュール。
- 前記半導体発光素子から放射される前記深紫外光は、190~350nmの間の波長を有する、請求項1から請求項18のいずれか一項に記載の発光モジュール。
- 前記半導体発光素子から放射される前記深紫外光は、200~320nmの間の波長を有する、請求項1から請求項18のいずれか一項に記載の発光モジュール。
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CN201680091035.8A CN110036493A (zh) | 2016-11-22 | 2016-11-22 | 具备放射深紫外光的半导体发光元件的发光组件 |
US15/733,009 US11282992B2 (en) | 2016-11-22 | 2016-11-22 | Light-emitting module provided with semiconductor light-emitting element that emits deep ultraviolet light |
EP16922357.5A EP3528297B1 (en) | 2016-11-22 | 2016-11-22 | Light-emitting module provided with semiconductor light-emitting element that emits deep ultraviolet light |
PCT/JP2016/084545 WO2018096571A1 (ja) | 2016-11-22 | 2016-11-22 | 深紫外光を放射する半導体発光素子を備える発光モジュール |
KR1020197016299A KR20190085950A (ko) | 2016-11-22 | 2016-11-22 | 심자외광을 방사하는 반도체 발광 소자를 구비하는 발광 모듈 |
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EP (1) | EP3528297B1 (ja) |
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Also Published As
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CN110036493A (zh) | 2019-07-19 |
US11282992B2 (en) | 2022-03-22 |
US20190288167A1 (en) | 2019-09-19 |
EP3528297A4 (en) | 2020-06-03 |
EP3528297A1 (en) | 2019-08-21 |
KR20190085950A (ko) | 2019-07-19 |
EP3528297B1 (en) | 2021-05-19 |
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