JP6352551B2 - 窒化物半導体紫外線発光装置及びその製造方法 - Google Patents
窒化物半導体紫外線発光装置及びその製造方法 Download PDFInfo
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Description
前記窒化物半導体紫外線発光素子が、サファイア基板と、前記サファイア基板の表面上に積層された複数のAlGaN系半導体層と、1または複数の金属層からなるn電極と、1または複数の金属層からなるp電極と、前記サファイア基板の裏面上に形成された紫外線を透過する無機化合物からなる裏面被覆層を備えてなり、
前記裏面被覆層が、前記サファイア基板の裏面の一部を露出する開口部を有し、前記開口部が、前記サファイア基板の裏面上に一様に分散或いは分布して配置されており、前記サファイア基板の裏面に垂直な前記開口部の断面形状が、前記裏面に近い箇所の開口幅が前記裏面から遠い箇所の開口幅より広くなっている部分を有し、
前記窒化物半導体紫外線発光素子が、末端官能基がパーフルオロアルキル基である非晶質フッ素樹脂によって樹脂封止されており、前記非晶質フッ素樹脂により、前記裏面被覆層の表面が被覆され、且つ、前記開口部の内部が充填されていることを特徴とする窒化物半導体紫外線発光装置を提供する。
サファイア基板の表面上に、複数のAlGaN系半導体層と、1または複数の金属層からなるn電極と、1または複数の金属層からなるp電極を形成した後、
前記サファイア基板の裏面上にレジスト層を形成した後、前記レジスト層を、所定の平面視形状に、且つ、前記サファイア基板の裏面に垂直な断面形状が前記裏面に近い箇所の幅が前記裏面から遠い箇所の幅より広くなっている部分を有するように、パターニングする工程と、
パターニング後の前記レジスト層上及び前記レジスト層に被覆されていない前記サファイア基板の裏面上に、紫外線を透過する裏面被覆層を堆積する工程と、
前記パターニング後の前記レジスト層及び前記レジスト層の上面に堆積した前記裏面被覆層を除去して、前記裏面被覆層をパターニングする工程を、備えることを第1の特徴とする窒化物半導体紫外線発光装置の製造方法を提供する。
前記窒化物半導体紫外線発光素子の前記p電極と前記n電極を、前記基台上に形成された前記p電極と前記n電極に対応する電極パッドと、ボンディング材料を介して夫々電気的及び物理的に接続させて、前記窒化物半導体紫外線発光素子を前記基台上にフリップチップ実装する工程と、
前記基台の前記窒化物半導体紫外線発光素子を載置する載置面と、前記窒化物半導体紫外線発光素子の側面と、前記裏面被覆層の表面と、前記開口部の開口面を被覆するとともに、前記基台の前記載置面と前記窒化物半導体紫外線発光素子との間の間隙部と、前記裏面被覆層の前記開口部の内部を充填する前記非晶質フッ素樹脂からなる樹脂層を形成する工程を有することを第2の特徴とする窒化物半導体紫外線発光装置の製造方法を提供する。
先ず、本発光素子10の素子構造について説明する。図1に示すように、本発光素子10の基本的な素子構造は、サファイア基板11の表面上に、複数のAlGaN系半導体層からなる半導体積層部12、n電極13、及び、p電極14を備え、サファイア基板11の裏面上に、裏面被覆層15を備えて構成される。
次に、フリップチップ実装用の基台であるサブマウント30に、本発光素子10をフリップチップ実装方法により載置してなる本発光装置1について、図5及び図6を参照して説明する。図5に、本発光装置1の一構成例の概略の断面構造を模式的に示す。図5では、図2と同様に、本発光素子10は、サファイア基板11の裏面側を上向きにして図示されている。図2及び図5を参照した以下の説明では、上方向は、サブマウント30の載置面を基準として本発光素子10の方向である。
次に、本発光装置1の光取出し効率について検討する。以下の説明では、封止樹脂40の屈折率がサファイア基板11の屈折率より低いことを前提とする。
次に、本発光素子の製造方法について説明する。上述のように、本発光素子10は、サファイア基板11の裏面上に裏面被覆層15を備える点、特に、裏面被覆層15に設けられた開口部16の断面形状に特徴がある。よって、サファイア基板11の表面上に形成される半導体積層部12、n電極13、及び、p電極14については、本発明の本旨ではなく、また、具体的な素子構造として種々の変形例が考えられ、周知の製造方法により製造可能であるので、詳細な説明は割愛する。よって、サファイア基板11の裏面上に形成される裏面被覆層15及び開口部16の製造方法について、図9を参照して説明する。
次に、本発光装置の製造方法について説明する。
以下に、上記実施形態の変形例につき説明する。
10: 窒化物半導体紫外線発光素子
11: サファイア基板
12: 半導体積層部
13: n電極
14: p電極
15: 裏面被覆層
16: 開口部
17: 突出部
18: 欠落部
20: AlN層
21: AlGaN層
22: n型クラッド層(n型AlGaN)
23: 活性層
24: 電子ブロック層(p型AlGaN)
25: p型クラッド層(p型AlGaN)
26: pコンタクト層(p型GaN)
30: サブマウント
31: 基材
32: 第1金属電極配線
320: 第1電極パッド
321: 第1配線部
33: 第2金属電極配線
330: 第2電極パッド
331: 第2配線部
34,35:リード端子
40: 封止樹脂
41: レンズ
Claims (11)
- フリップチップ実装用の基台上に、窒化物半導体紫外線発光素子をフリップチップ実装してなる窒化物半導体紫外線発光装置であって、
前記窒化物半導体紫外線発光素子が、サファイア基板と、前記サファイア基板の表面上に積層された複数のAlGaN系半導体層と、1または複数の金属層からなるn電極と、1または複数の金属層からなるp電極と、前記サファイア基板の裏面上に形成された紫外線を透過する無機化合物からなる裏面被覆層を備えてなり、
前記裏面被覆層が、前記サファイア基板の裏面の一部を露出する開口部を有し、
前記開口部が、前記サファイア基板の裏面上に一様に分散或いは分布して配置されており、
前記サファイア基板の裏面に垂直な前記開口部の断面形状が、前記裏面に近い箇所の開口幅が前記裏面から遠い箇所の開口幅より広くなっている部分を有し、
前記窒化物半導体紫外線発光素子が、末端官能基がパーフルオロアルキル基である非晶質フッ素樹脂によって樹脂封止されており、
前記非晶質フッ素樹脂により、前記裏面被覆層の表面が被覆され、且つ、前記開口部の内部が充填されていることを特徴とする窒化物半導体紫外線発光装置。 - 前記裏面被覆層が、HfO2、ZrO2、SiO2の何れか1層、または、これらの内の少なくとも2層の積層体であることを特徴とする請求項1に記載の窒化物半導体紫外線発光装置。
- 前記裏面被覆層の屈折率が、前記サファイア基板の屈折率より大きいことを特徴とする請求項1に記載の窒化物半導体紫外線発光装置。
- 前記開口部の平面視形状が、ドット状、ストライプ状、格子状、同心円状、同心環状、渦巻き状の何れか1つの形状であることを特徴とする請求項1〜3の何れか1項に記載の窒化物半導体紫外線発光装置。
- 前記非晶質フッ素樹脂を構成する重合体または共重合体の構造単位が、含フッ素脂肪族環構造を有することを特徴とする請求項1〜4の何れか1項に記載の窒化物半導体紫外線発光装置。
- 請求項1〜5の何れか1項に記載の窒化物半導体紫外線発光装置の製造方法であって、
前記窒化物半導体紫外線発光素子の製造工程が、
サファイア基板の表面上に、複数のAlGaN系半導体層と、1または複数の金属層からなるn電極と、1または複数の金属層からなるp電極を形成した後、
前記サファイア基板の裏面上にレジスト層を形成した後、前記レジスト層を、所定の平面視形状に、且つ、前記サファイア基板の裏面に垂直な断面形状が前記裏面に近い箇所の幅が前記裏面から遠い箇所の幅より広くなっている部分を有するように、パターニングする工程と、
パターニング後の前記レジスト層上及び前記レジスト層に被覆されていない前記サファイア基板の裏面上に、紫外線を透過する裏面被覆層を堆積する工程と、
前記パターニング後の前記レジスト層及び前記レジスト層の上面に堆積した前記裏面被覆層を除去して、前記裏面被覆層をパターニングする工程を、備えることを特徴とする窒化物半導体紫外線発光装置の製造方法。 - 前記レジスト層がフォトレジストであって、
前記レジスト層をパターニングする工程が、前記サファイア基板の裏面上に前記フォトレジストを形成した後、前記フォトレジストに対して露光及び現像処理を行って、前記フォトレジストを、前記所定の平面視形状に、且つ、前記サファイア基板の裏面に垂直な断面形状が前記裏面に近い箇所の幅が前記裏面から遠い箇所の幅より広くなっている部分を有するように、パターニングする工程であることを特徴とする請求項6に記載の窒化物半導体紫外線発光装置の製造方法。 - 前記窒化物半導体紫外線発光素子の前記p電極と前記n電極を、前記基台上に形成された前記p電極と前記n電極に対応する電極パッドと、ボンディング材料を介して夫々電気的及び物理的に接続させて、前記窒化物半導体紫外線発光素子を前記基台上にフリップチップ実装する工程と、
前記基台の前記窒化物半導体紫外線発光素子を載置する載置面と、前記窒化物半導体紫外線発光素子の側面と前記裏面被覆層の表面を、前記非晶質フッ素樹脂で被覆するとともに、前記基台の前記載置面と前記窒化物半導体紫外線発光素子との間の間隙部と、前記裏面被覆層の前記開口部の内部を充填する前記非晶質フッ素樹脂からなる樹脂層を形成する工程を有することを特徴とする請求項6または7に記載の窒化物半導体紫外線発光装置の製造方法。
- 請求項1〜5の何れか1項に記載の窒化物半導体紫外線発光装置の製造方法であって、
前記窒化物半導体紫外線発光素子の前記p電極と前記n電極を、前記基台上に形成された前記p電極と前記n電極に対応する電極パッドと、ボンディング材料を介して夫々電気的及び物理的に接続させて、前記窒化物半導体紫外線発光素子を前記基台上にフリップチップ実装する工程と、
前記基台の前記窒化物半導体紫外線発光素子を載置する載置面と、前記窒化物半導体紫外線発光素子の側面と、前記裏面被覆層の表面と、前記開口部の開口面を被覆するとともに、前記基台の前記載置面と前記窒化物半導体紫外線発光素子との間の間隙部と、前記裏面被覆層の前記開口部の内部を充填する前記非晶質フッ素樹脂からなる樹脂層を形成する工程を有することを特徴とする窒化物半導体紫外線発光装置の製造方法。 - 前記樹脂層を形成する工程の後、150℃以上300℃以下の範囲内の温度で前記樹脂層を加熱して軟化させる工程を有することを特徴とする請求項8または9に記載の窒化物半導体紫外線発光装置の製造方法。
- 前記樹脂層を形成する工程の後、前記裏面被覆層の表面と前記開口部の開口面を被覆し、前記開口部の内部を充填する前記樹脂層を、前記窒化物半導体紫外線発光素子側に向けて押圧する工程を有することを特徴とする請求項8〜10の何れか1項に記載の窒化物半導体紫外線発光装置の製造方法。
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