WO2018001298A1 - 一种光配向控制方法及光配向设备 - Google Patents

一种光配向控制方法及光配向设备 Download PDF

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Publication number
WO2018001298A1
WO2018001298A1 PCT/CN2017/090747 CN2017090747W WO2018001298A1 WO 2018001298 A1 WO2018001298 A1 WO 2018001298A1 CN 2017090747 W CN2017090747 W CN 2017090747W WO 2018001298 A1 WO2018001298 A1 WO 2018001298A1
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Prior art keywords
yaw
light
alignment
substrate
measuring
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PCT/CN2017/090747
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English (en)
French (fr)
Inventor
周畅
罗闻
朱树存
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上海微电子装备（集团）股份有限公司
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Priority to SG11201811751VA priority Critical patent/SG11201811751VA/en
Priority to JP2018568826A priority patent/JP6742453B2/ja
Priority to US16/314,137 priority patent/US10788716B2/en
Priority to KR1020197002591A priority patent/KR102192203B1/ko
Publication of WO2018001298A1 publication Critical patent/WO2018001298A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers

Definitions

  • the present invention relates to the field of semiconductor manufacturing technology, and in particular, to a light alignment control method and a light alignment device.
  • a liquid crystal display panel generally includes two substrates (array substrate TFT, color film substrate CF), a liquid crystal layer between the two substrates, and a polarizing plate outside the two substrates.
  • an electric field is generated in a liquid crystal layer by applying a voltage, thereby changing a twist angle of liquid crystal molecules, and matching two polarizing plates on the outer side of the upper and lower substrates, thereby generating an image display.
  • an alignment film layer is disposed on the substrate, which can orient the liquid crystal in a certain direction. That is, by orienting the surface of the alignment film layer to control the arrangement direction of the liquid crystal molecules and aligning the arrangement directions thereof, a uniform display effect is obtained, thereby avoiding the problem of image display unevenness (Mura).
  • the alignment treatment of the alignment film may employ a photo-alignment process in which polarized light of a predetermined wavelength is irradiated onto the alignment film such that an alignment film that is aligned or perpendicular to the polarization axis direction of the polarized light undergoes photoreaction, such as photocrosslinking.
  • Photodegradation or photoisomerization which in turn makes the alignment film anisotropic, and uses the orientation anchoring it produces to induce liquid crystal molecules to be uniformly oriented at a certain angle.
  • the optical alignment precision of the light alignment device is provided, thereby improving the uniformity of the polarization angle of the substrate during the optical alignment process.
  • the factors affecting the polarization angle are mainly: polarizing device and moving platform.
  • the polarizing illumination device is configured to provide a polarized light, and when the polarization axis direction of the polarized light is shifted, the polarization angle is further caused to be deviated; the motion stage can be moved along the guide rail for exposure. Scanning, the scanning direction thereof is, for example, the Y direction, and the moving stage can also rotate (Rz rotation) perpendicular to the scanning direction, and the function thereof is to ensure that the substrate on the motion table is along the Y at a certain speed according to a preset rotation angle. Performing an exposure scan in the direction to complete the photo-alignment process. Therefore, in order to ensure the accuracy of the alignment angle formed during the photo-alignment process and the alignment angle formed on the entire substrate, the optical alignment accuracy of the optical alignment device is ensured to be critical. .
  • An object of the present invention is to provide a light alignment control method and a light alignment device.
  • the optical alignment control method provided by the present invention can effectively improve the optical alignment precision of the optical alignment device and ensure the polarized light acting on the substrate during the optical alignment process.
  • the uniformity of the polarization axis direction and the uniformity of the angular deviation of the polarization axis on the entire substrate surface can be monitored.
  • the invention provides a light alignment control method for controlling the uniformity of the angular deviation of the polarization axis of the polarized light during the alignment of the substrate by using the polarized light emitted by the polarizing illumination device, including:
  • the dynamic weighted polarization axis angular deviation WD dyn (X m , Y m ) after the detection point (X m , Y m ) is scanned by the forward and reverse alignment is calculated by the following formula:
  • Controlling rotation between the substrate and the motion stage and for driving the rotation of the substrate according to a yaw value of the motion stage relative to the polarizing illumination device and a dynamic weighted polarization axis angle deviation uniformity Mura dyn of the substrate The angle of rotation of the table.
  • the polarization axis angle deviation is a difference between an actual polarization axis angle of the polarized light received by the detection point in the optical alignment process and a nominal polarization axis angle.
  • the (x(X m , Y m ), y(X m , Y m , sy k )) is:
  • Rt is the amount of rotation of the rotating table that drives the rotation of the substrate
  • Mp is an expansion ratio of the substrate relative to a motion table located below the rotating table
  • Rp is the amount of rotation of the substrate relative to the moving stage
  • the rotation amount Rt of the rotating table, the magnification Mp of the substrate relative to the motion table below the rotating table, and the translation Rp of the substrate relative to the moving table are obtained by the following method:
  • the method for measuring the yaw value Yaw(sy k ) of the motion stage relative to the polarizing illumination device at each of the discrete sampling points comprises:
  • Yaw(sy k ) Yaw 1 (sy k )/Yaw 2 (sy k ).
  • the method for measuring the yaw value Yaw 1 (sy k ) of the motion table at each of the discrete sampling points comprises:
  • the measuring surface is a side of the moving table that is perpendicular to the scanning direction of the light alignment.
  • the method for measuring the yaw value Yaw 1 (sy k ) of the motion table at each of the discrete sampling points comprises:
  • the method for measuring the yaw value Yaw 2 (sy k ) of the polarized illumination device at each of the discrete sampling points comprises:
  • the measuring surface of the polarizing device is a side of the wire grid frame perpendicular to the scanning direction of the light alignment.
  • the present invention further provides a light alignment device, comprising: a polarizing illumination device, a rotating table carrying and rotating the substrate, and being disposed under the rotating table for driving the substrate to perform light An exercise platform that is aligned with the scanning motion, wherein the optical alignment device further includes:
  • a motion table yaw measuring device for acquiring a yaw value of the motion table during a light alignment process
  • a polarizing device yaw measuring device for acquiring a yaw value of the polarizing device during a light alignment process
  • a polarization axis angle error control unit configured to calculate a dynamic weighted polarization axis angular deviation of the substrate according to a yaw value of the motion stage and a yaw value of the polarizing illumination device, and according to the motion stage
  • the yaw value of the polarizing illumination device and the dynamic weighted polarization axis angular deviation of the substrate control the rotation of the rotary table.
  • the motion stage yaw measuring device comprises a first interferometer measuring device and a first mirror, the first mirror is mounted on one side of the motion table, the first interferometer measuring device Transmitting two first interferometers to measure light incident on the first mirror and collecting reflected light from the first mirror to obtain two sides of the first interferometer measuring light reaching the side of the motion stage
  • the first mirror is mounted on a side of the motion table that is perpendicular to a direction of light alignment.
  • the first interferometer measuring device comprises two single-axis interferometers.
  • the first interferometer measuring device comprises a two-axis interferometer.
  • the motion stage yaw measuring device comprises two grating scales arranged in parallel along the optical alignment scanning direction and a reading head corresponding to the grating scales, the reading head being mounted on the motion platform
  • the corresponding grating scale measurement value is obtained by the read head, and according to the difference ⁇ y 1 between the measured values of the two grating scales and the two gratings
  • the polarizing device yaw measuring device comprises a second interferometer measuring device and a second mirror, wherein the second mirror is mounted on a side of the wire grid frame of the polarizing device,
  • the second interferometer measuring device emits two second interferometers to measure light incident on the second mirror, and collects the reflected light from the second mirror to obtain two paths of the second interferometer to measure light arrival.
  • the second mirror is mounted on a side of the wire grid frame that is perpendicular to the direction in which the light is aligned.
  • the second interferometer measuring device comprises two single-axis interferometers.
  • the second interferometer measuring device comprises a two-axis interferometer.
  • the polarizing device comprises an illumination frame, and the illumination frame comprises a trough type reflection a cover and a light tube, the light emitted by the light tube being reflected by the flow channel type reflector to form light having a specific angle.
  • the flow channel type reflector is a parabolic reflector.
  • the length of the lamp tube is greater than a length of the substrate in a direction perpendicular to the optical alignment scanning direction.
  • the polarizing device comprises a wire grid frame
  • the wire grid frame comprises a filter, a erector wire grid and a wire grid protective glass stacked in sequence, wherein the filter and the polarizing Compressed air is introduced between the wire grids, and an inert gas is introduced between the polarizing wire grid and the wire grid protective layer.
  • the inert gas is nitrogen.
  • the polarizing grid comprises a transparent substrate and a plurality of strip-shaped gratings formed on the transparent substrate.
  • the grating is made of a metal or a metal compound.
  • the metal is aluminum.
  • the metal oxide is titanium oxide.
  • the optical alignment control method when detecting and monitoring the yaw value of the motion stage relative to the polarizing illumination device, not only the influence of the polarizing illumination device on the angle of the polarization axis but also the motion table is combined.
  • the yaw condition can more fully reflect the condition of the polarization angle on the substrate during the photo-alignment process, so that the error of the alignment angle in the alignment film can be more realistically reflected.
  • the dynamic weighted polarization axis angle error of the substrate can also be obtained by the detection result of the yaw value, so that the rotation angle of the rotary table can be adjusted according to the dynamic weighted polarization axis angle error, thereby effectively improving the optical alignment process.
  • the accuracy of the control of the polarization axis angle improves the accuracy of the alignment angle formed in the alignment film.
  • the optical alignment control method provided by the present invention the uniformity of the angular error of the dynamic weighted polarization axis of the substrate can be confirmed, and the uniformity of the alignment angle formed on the entire substrate surface during the photoalignment process can be directly characterized.
  • the pair of polarization axis angle error control units is adopted.
  • the yaw condition of the motion table and the polarizing device is monitored and adjusted in real time, which improves the positioning accuracy of the motion table on the one hand, and increases the control precision of the optical alignment device to ensure the effect on the other hand.
  • the angle of the polarization axis on the substrate is within a set range.
  • FIG. 1 is a schematic flow chart of a light alignment control method according to Embodiment 1 of the present invention.
  • FIG. 2a is a schematic flow chart of a method for measuring a yaw value of a motion stage according to a method for controlling optical alignment in the first embodiment of the present invention
  • 2b is a schematic flow chart of another method for measuring a yaw value of a moving platform according to the optical alignment control method according to the first embodiment of the present invention
  • FIG. 3 is a schematic diagram of measuring a yaw value of a light alignment control method according to Embodiment 1 of the present invention.
  • Embodiment 4 is a side view of a light alignment device in Embodiment 2 of the present invention.
  • FIG. 5 is a top plan view of a light alignment device according to Embodiment 2 of the present invention.
  • Figure 6 is a side view of a light alignment device in a third embodiment of the present invention.
  • Figure 7 is a plan view of a light alignment device in a third embodiment of the present invention.
  • the inventors of the present application have introduced a "weighted static polarization axis angle deviation uniformity mura sta " calculation model for the performance of the polarizing illumination device.
  • the polarizing illumination device provides a polarized light to illuminate an alignment film layer on the substrate such that an alignment film that is aligned or perpendicular to the polarization direction of the polarized light undergoes photoreaction.
  • the exposure process of the light alignment is a scanning accumulation process, that is, the illuminance of the polarized light acting on the alignment film layer and the direction of the polarization axis affect the alignment process, and the "weighted static polarization axis angle deviation uniformity"
  • the mura sta ” calculation model can be used to characterize the illuminance of polarized light and the combined performance of the polarization axis direction of polarized light.
  • the method for confirming the polarizing device by using the “weighted static polarization axis angle deviation uniformity mura sta ” calculation model includes:
  • K discrete sampling points are selected in the static exposure field of light alignment, and K is a positive integer;
  • the measurement of the illuminance I(x i , y j ) and the polarization axis angle P A (x i , y j ) can be measured according to the existing measurement method, and will not be described here; then, according to the distribution of each sampling point
  • the position records the illuminance and the polarization axis angle error D(x i , y j ).
  • the polarization axis angle error D (x i, y j) P A (x i, y j) -P T (x i, y j)
  • Table 1 shows the distribution of the illuminance I(x i , y j ) at each position in the static exposure field of view
  • Table 2 shows the distribution of the polarization axis angle error D(x i , y j ) at each position in the static exposure field of view.
  • the X direction can be assumed to be the longitudinal direction of the UV high pressure lamp for emitting polarized light
  • M and N may take other values, and the present invention does not impose any limitation.
  • the weighted static polarization axis angle deviation WD sta after the scanning in the X direction in the static exposure field of view for:
  • max(WD sta (x i )) is a value of a weighted static polarization axis angular deviation corresponding to a group of weighted static polarization axis angular deviations WD sta (x i , y j ) in the X direction;
  • Min(WD sta (x i )) is a value of a set of weighted static polarization axis angular deviations corresponding to a group of weighted static polarization axis angular deviations WD sta (x i , y j ) in the X direction.
  • the weighted static polarization axis angular deviation uniformity mura sta calculation model is only for the static performance of the polarized illumination system, and in the actual optical alignment process, the substrate is carried by the motion table of the optical alignment device And transport in the scanning direction to complete the exposure process of the light alignment. That is, in the process of optical alignment, the influence of the deviation caused by the mechanical movement of the motion table on the optical alignment process cannot be ignored.
  • the yaw value Yaw of the motion stage is too large, which may cause the direction of the polarization axis to shift.
  • the optical alignment control method includes:
  • the dynamic weighted polarization axis angular deviation WD dyn (X m , Y m ) after the detection point (X m , Y m ) is scanned by the forward and reverse alignment is calculated by the following formula:
  • x(X m , Y m ), y(X m , Y m , sy k ) refers to a coordinate of a detection point having coordinates (X m , Y m ) in a substrate coordinate system in a motion stage coordinate system;
  • the polarization axis angle deviation controls the rotation of the rotary table that drives the rotation of the substrate.
  • the overall performance of the optical alignment device can be detected and monitored, so that the stability of the optical alignment device can be more realistically reflected, and the data can be directly reflected according to the data acquired by the online monitoring.
  • the alignment angle of the film can be adjusted according to the detection result, thereby ensuring the control precision of the light alignment.
  • FIG. 1 is a schematic flow chart of a method for controlling light alignment according to Embodiment 1 of the present invention. As shown in FIG. 1, the optical alignment control method includes:
  • the polarization axis angle error D(x(X m , Y m ), y(X m , Y m , sy k ) of each detection point in the photo-alignment process is the detection point
  • step S100 (x(X m , Y m ), y(X m , Y m , sy k )) means that the detection point having coordinates (X m , Y m ) in the substrate coordinate system is The coordinates in the coordinate system coordinate system.
  • the substrate is located on a carrying platform for carrying the substrate, and the substrate is rotated by a rotating table to a certain angular position according to the set polarization angle, and at the same time, the moving platform The substrate is moved along a scanning direction of the light alignment to complete the photo-alignment process.
  • the motion stage moves along a single axis.
  • the motion stage has a yaw angle at this time, it will affect the polarization axis angle of the light alignment. For this reason, it is necessary to confirm the yaw of the motion stage.
  • the rotating table rotates the substrate by a certain angle according to the setting of the polarization angle during the optical alignment process, the coordinate system based on the substrate may be different from the coordinate system based on the motion table, and the detection point is obtained.
  • the exact dynamic weighted polarization axis angular deviation at each discrete sampling point requires the conversion of the coordinates of the two. Specifically, the following formula can be adopted when the detection point in the substrate coordinate system is converted to the coordinate system of the motion stage:
  • Rt is the amount of rotation of the rotating table that drives the rotation of the substrate
  • Mp is the expansion ratio of the substrate relative to the motion table below the rotating table, that is, the relative position change caused by the expansion of the substrate itself, and the motion stage has at least two degrees of freedom of Y and Rz directions;
  • Rp is the amount of rotation of the substrate relative to the moving stage
  • the rotation amount Rt of the rotating table, the magnification Mp of the substrate with respect to the work platform, and the rotation amount Rp of the substrate with respect to the moving table can be obtained by the following method:
  • the method for measuring the yaw value of each of the discrete sampling points of the motion stage may refer to the flow diagram shown in FIG. 2a and the measurement principle diagram shown in FIG. 3:
  • Step S121a selecting one side of the motion stage 10 as the measurement surface 11, and injecting two first interferometer measurement lights 20 into the measurement surface 11 of the motion stage, wherein the measurement surface 11 may be the motion a side of the stage 10 perpendicular to the direction in which the light is aligned;
  • Step S122a obtaining an optical path difference ⁇ y 1 (ie, an absolute difference of y 1 and y 1 ' in FIG. 3 ) of the measuring surface of the first interferometer measuring light reaching the moving table, and two paths of the first
  • the first interferometer comprises a transmitter and a receiver, and a corner mirror (none of which is shown) fixed on the measuring surface.
  • the emitter emits light that illuminates a corner mirror fixed to the measuring surface
  • the corner mirror reflects the light back
  • the reflected light is received by the receiver and data is processed. deal with.
  • the two interferometers can be used to measure the difference in the path of the two interference optical paths corresponding thereto. Since the interferometer can transmit and receive light in real time, it can measure the yaw value of the motion table in real time, which is convenient for online monitoring of the yaw state of the motion platform, and further real-time realization of the yaw angle of the motion platform. Compensation adjustment to ensure the positioning accuracy of the sports platform.
  • the measurement of the yaw value of the motion stage can be realized by a grating scale measuring instrument. Specifically, the yaw value of the moving stage at each of the discrete sampling points is measured.
  • the method can also take the following steps, as shown in detail in FIG. 2b:
  • Step S121b two parallel grating scales are arranged along the light alignment scanning direction, and a read head corresponding to the grating scales is mounted on a side of the moving table perpendicular to the scanning direction of the light alignment;
  • Step S122b obtaining corresponding grating scale measurement values by the read head, and according to the difference ⁇ y 1 between the two grating scale measurement values and the center distance s 1 between the two grating scales, according to
  • the measuring method of the yaw value Yaw 1 (sy k ) of the motion stage Similar to the measuring method of the yaw value Yaw 1 (sy k ) of the motion stage, the measuring method of the yaw value Yaw 2 (sy k ) of the polarizing illumination device at each of the discrete sampling points Please refer to the following steps:
  • one side of the wire grid frame in the polarizing device is selected as a measuring surface, and two second interferometer measuring lights are incident on a measuring surface of the polarizing device, wherein the polarizing device
  • the measurement surface of the wire grid frame may be a side perpendicular to the scanning direction of the light alignment.
  • the second interferometer may refer to the first interferometer as described above, and details are not described herein;
  • the optical alignment control method provided by the embodiment can detect and monitor not only the yaw value of the motion table relative to the polarized illumination device, but also the dynamic weighted polarization axis of the substrate according to the detection result.
  • the uniformity of the angle deviation, the uniformity of the angular deviation of the dynamic weighted polarization axis can directly characterize the uniformity of the alignment angle formed on the entire substrate surface during the photo-alignment process, and the optical alignment control method provided in this embodiment further
  • the rotation angle of the rotary table that drives the rotation of the substrate can be adjusted by the dynamic weighted polarization axis angular deviation to ensure that the polarization axis angle acting on the substrate surface is within a set range.
  • the present invention also provides a light alignment device based on the optical alignment control method as described above.
  • 4 is a side view of a light alignment device according to a second embodiment of the present invention
  • FIG. 5 is a top view of the light alignment device according to Embodiment 2 of the present invention.
  • the light alignment device includes polarized illumination.
  • a motion table yaw measuring device 140 configured to acquire a yaw value of the motion stage 130 during a light alignment process
  • a polarizing device yaw measuring device 150 for acquiring a yaw value of the polarizing device 110 during a photo-alignment process
  • a polarization axis angle error control unit wherein the polarization axis angle error control unit calculates the substrate 200 based on the yaw value of the motion stage 130 and the yaw value of the polarizing illumination device 110. Dynamically weighting the polarization axis angle deviation, and controlling the rotation of the rotary table 120 according to the yaw value of the motion table relative to the polarizing illumination device and the dynamic weighted polarization axis angular deviation of the substrate.
  • the optical alignment device can adjust the rotation angle of the rotary table 120 by using the polarization axis angle error control unit after acquiring the yaw value of the motion table 130 and the polarizing illumination device 110, thereby
  • the substrate 200 can be prevented from deviating from the original angular position, and the setting accuracy of the polarization axis of the optical alignment device can be improved.
  • the optical alignment device provided in this embodiment can form a closed-loop feedback system, and the closed-loop feedback can not only detect and monitor the overall performance of the optical alignment device, but also automatically adjust according to the inspection result. Improve the control accuracy of light alignment.
  • the motion stage yaw measuring device 140 includes a first interferometer measuring device 141 and a first mirror 142.
  • the first mirror 142 is mounted on one side of the motion table 130, for example,
  • the first mirror 142 is mounted on a side of the motion stage 130 that is perpendicular to the direction in which the light is aligned.
  • the first interferometer measuring device 141 emits two first interferometer measurement lights incident on the first mirror 142, and collects the reflected light of the first mirror 142 to obtain two paths of the first interference.
  • the first interferometer measuring device may be two single-axis interferometers or a two-axis interferometer.
  • the polarizing device yaw measuring device 150 includes a second interferometer measuring device 151 and a second mirror 152 (eg, a corner mirror).
  • the second mirror 152 is mounted on a side of the wire grid frame 112 of the polarizing illumination device 150. Specifically, the second mirror 152 can be mounted in the wire grid frame 112 and the The light is aligned to the side perpendicular to the scanning direction.
  • the second interferometer measuring device 151 emits two channels of second interferometer measuring light incident on the second mirror 152, and collects the reflected light of the second mirror to obtain two channels of the second interferometer measurement Light reaches an optical path difference ⁇ y 2 of a side surface of the wire grid frame 112, and calculates the polarization according to the optical path difference ⁇ y 2 and a center distance s 2 between the two interferometers measuring light
  • the second interferometer measuring device 150 can also employ two single axis interferometers or a dual axis interferometer.
  • the polarizing illumination device 110 is a key component for forming polarized light, if the angular position of the polarizing illumination device 110 is deviated, the polarization axis direction of the polarized light formed is further affected, thereby affecting the alignment. The alignment process of the film. Therefore, the measurement of the yaw value of the polarizing device 110 is also crucial, and the illuminating device 150 can realize the real-time monitoring of the polarizing device 110. .
  • the polarizing illumination device 110 includes an illumination frame 111 including a first-class trough-shaped reflector 111a and a bulb 111b, and the light emitted by the bulb 111b
  • the flow channel type reflector 111a reflects light to form a light having a specific angle.
  • the flow channel type reflector 111a is preferably a parabolic reflector.
  • the lamp tube 111b is an elongated UV lamp, and the ultraviolet light emitted from the lamp tube is irradiated onto the substrate, thereby causing photo-reaction of the alignment film on the substrate.
  • the length of the bulb 111b is greater than the length of the substrate 200 in a direction perpendicular to its optical alignment scanning direction (ie, the Y direction in FIG. 4), thereby ensuring that the portion of the substrate 200 perpendicular to the scanning direction can be located.
  • the substrate 200 is further transported in the scanning direction by the motion stage 130 to complete the process of optical alignment of the entire substrate.
  • a lamp of a corresponding size is specifically selected. For example, when applied to a liquid crystal display of 4.5 generation, the size of the substrate is 730 mm*920 mm, and the The length of the bulb 111b is greater than 730 mm.
  • the substrate 200 and the bulb 111b are not absolutely parallel, and the substrate may have a certain rotation angle with respect to the tube, for example, in the 4.5 generation liquid crystal display, when When the rotation angle of the substrate 200 relative to the lamp tube 111b is in the range of 0° ⁇ 15°, 90° ⁇ 15° or 180° ⁇ 15°, the optical alignment process can be completed to ensure the alignment film on the entire substrate. Then need to make the lamp 111b The exposure field of view is greater than or equal to 1109 mm.
  • the polarizing illumination device 110 includes a wire grid frame 112, that is, light emitted by the illumination frame 111 passes through the wire grid frame 112 to form polarized light, and the polarized light is irradiated.
  • the wire grid frame 112 includes a filter 112a, a polarization grid 112b, and a wire grid protection cover 112c stacked in sequence, and is connected between the filter 112a and the polarization grid 112b.
  • the filter 112a faces the illumination frame 111 for filtering light emitted from the light source 111b to select light of a specific wavelength band. Since the different alignment films require different wavelength bands of the corresponding alignment light, the light of the specified wavelength band can be obtained by the filter 112a of the specific wavelength band. For example, the 254 nm alignment film requires a corresponding wavelength band of 240 nm to 300 nm, and the corresponding filter 112a can be used to select the light in the band.
  • the emitted light having a specific wavelength band after passing through the filter 112a is irradiated on the polarizing wire grid 112b located on the side of the filter 112a away from the illumination frame 111, and passes through the polarizing Wire grid 112b forms polarized light.
  • the polarizing grid 112b includes a transparent substrate and a plurality of strip-shaped gratings formed on the substrate, and a side of the polarizing grid 112b on which the grating is distributed faces the wire grid protective glass 112c.
  • the material of the grating may be a metal or a metal compound, for example, the material may be aluminum (Al) or titanium oxide (Ti).
  • the grating currently used is usually made of titanium oxide, which not only obtains polarized light having a good extinction ratio, but also is incident on the polarized light.
  • the angle of the light on the wire grid 112b is not the same, and the transmittance of the light is not affected, and there is almost no problem that the direction of the polarization axis changes in the polarized light formed by the polarization grid 112b. Therefore, the grating formed by titanium oxide can be relaxed to about 45°, and its corresponding extinction ratio is greater than 50:1, and the corresponding polarization axis is rotated by less than 0.1°.
  • a compressed space is also introduced between the filter 112a and the polarized wire grid 112b.
  • the illumination frame 111 continuously emits light and illuminates the wire grid frame 112, so that a large amount of heat is generated in the process, which in turn directly causes the temperature of the wire grid frame 112 to rise, if the wire grid If the temperature of the frame 112 is too high, it will affect the polarization of the light. For example, when the temperature is greater than 180 ° C, the grating is prone to expansion and the like, thereby changing the spacing between the gratings and finally affecting the polarization of the light.
  • compressed air for cooling is passed between the filter 112a and the polarizing grid 112b to ensure that the temperature of the polarizing illumination device 110 is not excessively high.
  • nitrogen gas is also introduced between the polarizing wire grid 112b and the wire grid protective glass 152c because the side of the polarizing wire grid 112b on which the grating is distributed faces the wire grid protection glass 152c.
  • the grating is easily oxidized by air, which in turn affects its polarizing performance. Therefore, nitrogen gas is introduced between the polarizing grid 112b and the wire grid protective glass 152c, thereby preventing the grating, especially the metal grating from being oxidized. problem.
  • the optical alignment device further includes a guide rail 160 extending along a scanning direction of the optical alignment, and the motion platform 130 is mounted in the guide rail 160. And driving the substrate to move along the extending direction of the guide rail 160 to complete the photo-alignment process.
  • the optical alignment device further includes a carrying platform 170 for carrying the substrate 200, and the loading platform 170 is located above the moving table 130 and the rotating table 120.
  • the rotating table 120 is connected to the carrying platform 170 and can drive the loading platform 170 to rotate at a certain angle.
  • the carrying platform 170 includes a supporting plate 171 and a plurality of supporting pins 172 distributed on the supporting plate 171. The supporting legs 172 are in contact with the substrate 200 and support the substrate.
  • the substrate 200 is placed on the support leg 172; then, the motion stage 130 drives the substrate 200 to the alignment position; then, after the substrate 200 is aligned, the The rotating table 120 adjusts the rotation angle of the substrate 200 to reach the polarization angle corresponding to the set polarization axis. Finally, the motion table 130 drives the substrate 200 to reciprocate in the scanning direction to complete the process of optical alignment.
  • Figure 6 is a side view of a light alignment device according to a third embodiment of the present invention
  • Figure 7 is a plan view of the light alignment device of the third embodiment of the present invention.
  • the difference between this embodiment and the second embodiment is that the motion table yaw measuring device 140' includes two grating scales 141' and a parallel arrangement arranged along the optical alignment scanning direction. a reading head 142' corresponding to the grating ruler 141', the reading head 142' is mounted on a side of the moving table 130 perpendicular to the scanning direction of the light alignment, and the corresponding reading head 142' is obtained.
  • the grating ruler 141' is parallel to the guide rail 160. Further, the scale 141' is provided with a scale for indicating a distance; the read head 142' is disposed opposite to the scale 141' for reading the value on the scale 141'. During the optical alignment process, the read head 142' moves synchronously with the motion stage 130, and senses the scale on the scale 141', and simultaneously feeds back data, thereby obtaining two measurements of the scale. The difference ⁇ y 1 between the two and the center distance s 1 between the two grating scales.
  • the yaw state of the motion stage and the polarizing device is monitored and adjusted in real time by using a polarization axis angle error control unit, which improves the motion platform on the one hand.
  • the positioning accuracy on the other hand, correspondingly increases the control precision of the optical alignment device to the optical alignment, and ensures that the angle of the polarization axis acting on the substrate is within a set range.
  • the detection result obtained according to the polarization axis angle error control unit can directly characterize the uniformity of the angle of the polarization axis of the entire substrate during the photo-alignment process, thereby more accurately reflecting the error of the alignment angle in the alignment film.

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Abstract

提供了一种光配向控制方法及光配向设备，其中光配向控制方法为通过检测运动台（130）相对起偏照明装置（110）的偏摆值，以获取基板（200）的动态加权偏光轴角度误差，进而来控制带动基板（200）旋转的旋转台（120）的旋转角度，从而可有效提高光配向过程中偏光轴角度的控制精度，确保配向膜中所形成的配向角的精度。

Description

一种光配向控制方法及光配向设备 技术领域
本发明涉及半导体制造技术领域，特别涉及一种光配向控制方法及光配向设备。
背景技术
液晶显示面板(LCD)通常包括两个基板(阵列基板TFT，彩膜基板CF)、两个基板之间的液晶层以及两个基板外侧的偏光板。在液晶显示技术中，通过施加电压使液晶层中产生电场，进而改变液晶分子的扭转角度，并配合上下基板外侧的两个偏光板，从而产生图像显示。
然而，为保证图像的显示效果，均需使液晶分子有一个初始取向方向，因此在基板上需设置有配向膜层，其可以使液晶按照一定的方向定向。即，通过对所述配向膜层的表面进行定向以控制液晶分子的排布方向并使其排布方向一致，进而获取均一的显示效果，而避免产生图像显示不均匀(Mura)的问题。
目前，对配向膜的取向处理可采用光配向工艺，即将规定波长的偏振光照射在配向膜上，使得与偏振光的偏振轴方向一致或垂直的配向膜发生光致反应，例如光致交联、光致分解或光致异构，进而使配向膜产生各向异性，并利用其所产生的定向锚定能诱导液晶分子按照一定角度统一取向。但是，随着对显示对比度以及像素密度的要求越来越高，对于液晶分子的取向方向的一致性要求也越来越高，相应的，就需要进一步确保光配向设备中偏光轴方向的一致性，即提供光配向设备的光配向精度，进而改善基板在光配向过程中的偏光角的均匀性。
其中，在光配向过程中，影响偏光角的因素主要为：起偏照明装置以及运动台。所述起偏照明装置用于提供一偏振光，当该偏振光的偏振轴方向发生偏移时，则将进一步导致偏光角发生偏差；所述运动台可沿导轨移动以进行曝光 扫描，其扫描方向例如为Y方向，同时所述运动台还可以沿垂直于扫描方向进行旋转(Rz旋转)，其作用在于确保位于运动台上的基板按照预设的旋转角度以一定速度沿Y方向进行曝光扫描以完成光配向工艺，因此，为保证光配向过程中所形成的配向角的精度以及整个基板上所形成的配向角的一致性，则确保光配向设备的光配向精度至关重用。
发明内容
本发明的目的在于提供一种光配向控制方法及光配向设备，根据本发明提供的光配向控制方法可有效提高光配向设备的光配向精度，确保在光配向过程中作用于基板上的偏振光的偏振轴方向的一致性，并可监控整个基板面上的偏光轴角度偏差的均匀性。
本发明提供的一种光配向控制方法，用于在采用起偏照明装置所发出的偏振光对基板进行配向的过程中，控制所述偏振光的偏光轴角度偏差的均匀性，包括：
在光配向扫描方向上选取K个离散采样点s.yk,k＝1,2,...,K，于基板的曝光视场上选取M个检测点(Xm,Ym),m＝1,2,...,M，配向时获取每个所述检测点在每个所述离散采样点处的偏光轴角度误差D(x(Xm,Ym),y(Xm,Ym,s.yk)和对应的偏振光光照强度I(x(Xm,Ym),y(Xm,Ym,s.yk)，并测量承载所述基板的运动台相对起偏照明装置在每个所述离散采样点的偏摆值Yaw(s.yk)；
利用如下公式计算检测点(Xm,Ym)经过正反向配向扫描后的动态加权偏光轴角度偏差WDdyn(Xm,Ym)：
Figure PCTCN2017090747-appb-000001
其中，(x(Xm,Ym),y(Xm,Ym,s.yk))指基板坐标系下具有坐标(Xm,Ym)的所述检测点在运动台坐标系下的坐标；
利用如下公式获取所述基板的动态加权偏光轴角度偏差均匀性Muradyn：
Figure PCTCN2017090747-appb-000002
根据所述运动台相对所述起偏照明装置的偏摆值以及所述基板的动态加权偏光轴角度偏差均匀性Muradyn来控制位于基板和运动台之间且用于带动所述基板旋转的旋转台的旋转角度。
可选的，所述偏光轴角度偏差为所述检测点在光配向过程中接收到的偏振光的实际偏光轴角度与名义偏光轴角度之差。
可选的，所述(x(Xm,Ym),y(Xm,Ym,s.yk))为：
Figure PCTCN2017090747-appb-000003
其中，Rt为带动所述基板旋转的旋转台的旋转量；
Mp为所述基板相对位于所述旋转台下方的运动台的膨胀倍率；
Rp为所述基板相对所述运动台的旋转量；
Figure PCTCN2017090747-appb-000004
为所述基板相对所述运动台的平移。
可选的，所述旋转台的旋转量Rt、基板相对位于所述旋转台下方的运动台的倍率Mp以及基板相对所述运动台的平移Rp通过以下方法获得：
在所述基板上设置I个对准标记，所述对准标记的名义位置表示为(Xi,Yi),i＝1,2,...,I；
通过对准系统分别对准I个所述对准标记，得到I个所述对准标记的测试位置(Caxi,Cayi),i＝1,2,...,I；
根据所述对准标记的名义位置(Xi,Yi),i＝1,2,...,I、测试位置(Caxi,Cayi),i＝1,2,...,I以及对准时所述运动台相应的位置(s.yi),i＝1,2,...,I，利用以下基板对准模型计算获得所述Rt、Mp、Rp：
Figure PCTCN2017090747-appb-000005
可选的，测量运动台相对起偏照明装置在每个所述离散采样点的偏摆值Yaw(s.yk)的方法包括：
分别测量所述运动台在每个所述离散采样点的偏摆值Yaw1(s.yk)和测量所述起偏照明装置在每个所述离散采样点的偏摆值Yaw2(s.yk)，
Yaw(s.yk)＝Yaw1(s.yk)/Yaw2(s.yk)。
可选的，测量所述运动台在每个所述离散采样点的偏摆值Yaw1(s.yk)的方法包括：
选取所述运动台的一侧面作为测量面，将两路第一干涉仪测量光入射到所述运动台的测量面；
获得两路所述第一干涉仪测量光到达所述运动台的测量面的光程差Δy1和两路所述第一干涉仪测量光之间的中心距离s1，根据如下公式计算所述运动台的偏摆值Yaw1(s.yk)：Yaw1(s.yk)＝Δy1/s1。
可选的，所述测量面为所述运动台上与所述光配向扫描方向垂直的侧面。
可选的，测量所述运动台在每个所述离散采样点的偏摆值Yaw1(s.yk)的方法包括：
沿所述光配向扫描方向布置两条平行的光栅尺，将与所述光栅尺一一对应的读头安装在所述运动台上与所述光配向扫描方向垂直的侧面；
通过所述读头获得相对应的光栅尺测量值，并根据两个所述光栅尺测量值之间的差值Δy1和两条所述光栅尺之间的中心距离s1，根据如下公式计算所述运 动台的偏摆值Yaw1(s.yk)：Yaw1(s.yk)＝Δy1/s1。
可选的，测量所述起偏照明装置在每个所述离散采样点的偏摆值Yaw2(s.yk)的方法包括：
选取所述起偏照明装置中的线栅框架的一侧面作为测量面，将两路第二干涉仪测量光入射到所述起偏照明装置的测量面；
获得两路所述第二干涉仪测量光到达所述起偏照明装置的测量面的光程差Δy2和两路所述第二干涉仪测量光之间的中心距离s2，计算所述起偏照明装置的偏摆值Yaw2(s.yk)：Yaw2(s.yk)＝Δy2/s2。
可选的，所述起偏照明装置的测量面为所述线栅框架上与所述光配向扫描方向垂直的侧面。
可选的，根据如下公式计算Yaw(s.yk)：
Figure PCTCN2017090747-appb-000006
此外，基于以上所述的光配向控制方法，本发明还提供一种光配向设备，包括起偏照明装置、承载并带动基板旋转的旋转台以及设置在所述旋转台下方用于带动基板进行光配向扫描运动的运动台，其中，所述光配向设备还包括：
运动台偏摆测量装置，用于获取光配向过程中所述运动台的偏摆值；
起偏照明装置偏摆测量装置，用于获取光配向过程中所述起偏照明装置的偏摆值；以及
以及偏光轴角度误差控制单元，其用于根据所述运动台的偏摆值和所述起偏照明装置的偏摆值计算所述基板的动态加权偏光轴角度偏差，并根据所述运动台相对所述起偏照明装置的偏摆值以及所述基板的动态加权偏光轴角度偏差来控制所述旋转台旋转。
可选的，所述运动台偏摆测量装置包括第一干涉仪测量装置和第一反射镜，所述第一反射镜安装在所述运动台的一个侧面上，所述第一干涉仪测量装置发 射两路第一干涉仪测量光入射到所述第一反射镜上，并收集来自所述第一反射镜的反射光，得到两路所述第一干涉仪测量光到达所述运动台的侧面的光程差Δy1，并根据所述光程差Δy1和两路所述第一干涉仪测量光之间的中心距离s1，计算所述运动台的偏摆值Yaw1(s.yk)：Yaw1(s.yk)＝Δy1/s1。
可选的，所述第一反射镜安装在所述运动台上与光配向扫描方向垂直的侧面。
可选的，所述第一干涉仪测量装置包括两个单轴干涉仪。
可选的，所述第一干涉仪测量装置包括一个双轴干涉仪。
可选的，所述运动台偏摆测量装置包括两条沿所述光配向扫描方向平行布置的光栅尺和与所述光栅尺一一对应的读头，所述读头安装在所述运动台上与所述光配向扫描方向垂直的侧面上，通过所述读头获得相对应的光栅尺测量值，并根据两个所述光栅尺测量值之间的差值Δy1和两条所述光栅尺之间的中心距离s1，计算所述运动台的偏摆值Yaw1(s.yk)：Yaw1(s.yk)＝Δy1/s1。
可选的，所述起偏照明装置偏摆测量装置包括第二干涉仪测量装置和第二反射镜，所述第二反射镜安装在所述起偏照明装置中线栅框架的一侧面，所述第二干涉仪测量装置发射两路第二干涉仪测量光入射到所述第二反射镜，并收集来自所述第二反射镜的反射光，得到两路所述第二干涉仪测量光到达所述线栅框架的侧面的光程差Δy2，并根据所述光程差Δy2和两路所述第二干涉仪测量光之间的中心距离s2，计算所述起偏照明装置的偏摆值Yaw2(s.yk)：Yaw2(s.yk)＝Δy2/s2。
可选的，所述第二反射镜安装在所述线栅框架中一与所述光配向扫描方向垂直的侧面。
可选的，所述第二干涉仪测量装置包括两个单轴干涉仪。
可选的，所述第二干涉仪测量装置包括一个双轴干涉仪。
可选的，所述起偏照明装置包括照明框架，所述照明框架包括流槽型反射 罩和灯管，所述灯管发出的光经所述流槽型反射罩反射后形成具有特定角度的光。
可选的，所述流槽型反射罩为抛物线型反射罩。
可选的，所述灯管的长度大于所述基板在垂直于所述光配向扫描方向上的长度。
可选的，所述起偏照明装置包括线栅框架，所述线栅框架包括依次叠放的滤光片、起偏线栅及线栅保护玻璃，在所述滤光片和所述起偏线栅之间通入有压缩空气，在所述起偏线栅和所述线栅保护层之间通入有惰性气体。
可选的，所述惰性气体为氮气。
可选的，所述起偏线栅包括一透明基底以及于所述透明基底上形成的若干条状的光栅。
可选的，所述光栅的材质为金属或金属化合物。
可选的，所述金属为铝。
可选的，所述金属氧化物为氧化钛。
在本发明提供的光配向控制方法中，在对运动台相对起偏照明装置的偏摆值进行检测及监控时，不仅考虑到起偏照明装置对偏光轴角度的影响，还结合了运动台的偏摆状况，从而可更全面的反应了在光配向过程中，基板上的偏光角的状况，从而可更真实的反应出配向膜中配向角的误差。并且，通过偏摆值的检测结果还可获得所述基板的动态加权偏光轴角度误差，从而可根据所述动态加权偏光轴角度误差，调整旋转台的旋转角度，从而可有效提高光配向过程中偏光轴角度的控制精度，提高配向膜中所形成的配向角的精度。此外，通过本发明提供的光配向控制方法，还可确认所述基板的动态加权偏光轴角度误差的均匀性，进而可直接表征在光配向过程中整个基板表面所形成的配向角的均匀性。
相应的，在本发明提供的光配向设备中，采用偏光轴角度误差控制单元对 所述运动台及起偏照明装置的偏摆状况进行实时监控并调整，其一方面提高了运动台的定位精度，另一方面也相应的增加了光配向设备对光配向的控制精度，确保作用于基板上的偏光轴的角度于设定的范围内。
附图说明
图1为本发明实施例一中光配向控制方法的流程示意图；
图2a为本发明实施例一中光配向控制方法的一种运动台偏摆值的测量方法的流程示意图；
图2b为本发明实施例一中光配向控制方法的另一种运动台偏摆值的测量方法的流程示意图；
图3为本发明实施例一中光配向控制方法的偏摆值的测量原理图；
图4为本发明实施例二中光配向设备的侧视图；
图5为本发明实施例二中光配向设备的俯视图；
图6为本发明实施例三中光配向设备的侧视图；
图7为本发明实施例三中光配向设备的俯视图。
具体实施方式
如背景技术所述，在对配向膜进行光配向的工艺过程中，由于起偏照明装置以及运动台的定位精度的限制，将导致偏光角发生一定的偏差，进而影响配向膜中配向角的方向的一致性。
其中，针对起偏照明装置的性能，本申请的发明人引入了一种“加权静态偏光轴角度偏差均匀性murasta”计算模型。在光配向的工艺过程中，所述起偏照明装置提供一偏振光照射位于基板上的配向膜层，使得与偏振光偏振方向一致或垂直的配向膜发生光致反应。而这个光配向的曝光过程是一个扫描累积的过程，即作用于配向膜层上的偏振光的照度以及偏振轴的方向均会对配向工艺产生影响，所述“加权静态偏光轴角度偏差均匀性murasta”计算模型即可用于表征偏振光的照度以及偏振光的偏振轴方向的综合性能。
具体的，利用所述“加权静态偏光轴角度偏差均匀性murasta”计算模型确认所述起偏照明装置的方法包括：
首先，在光配向的静态曝光视场中选取K个离散采样点，K为正整数；
然后，分别确认各个采样点对应的光照度I(xi，yj)以及偏光轴角度PA(xi，yj)，其中，(xi，yj)表示采样点在基板坐标系下的位置，1≤i≤M，1≤j≤N，i、j、M、N均为自然数，且根据较佳实施例可以满足M*N＝K。所述光照度I(xi，yj)以及偏光轴角度PA(xi，yj)的测量可根据现有的测量方法进行测量，此处不做赘述；接着，根据各个采样点的分布位置记录光照度以及偏光轴角度误差D(xi，yj)。
所述偏光轴角度误差D(xi，yj)＝PA(xi，yj)-PT(xi，yj)
其中，PA(xi，yj)：实际偏光轴角度；
PT(xi，yj)：名义偏光轴角度。
表1为静态曝光视场中各个位置的光照度I(xi，yj)的分布，表2为静态曝光视场中各个位置的偏光轴角度误差D(xi，yj)的分布。其中，可假设X方向为用于发出偏振光的UV高压灯管的长度方向；Y方向为光配向过程中的扫描方向，即，在表1和表2所示的实施例中，沿X方向选取7组离散点(即M＝7)，沿Y方向选取5组离散点(即N＝5)。然而，在其他实施例中，M、N也可取其他值，本发明对此不作任何限制。
表1
I(x1,y1) I(x2,y1) I(x3,y1) I(x4,y1) I(x5,y1) I(x6,y1) I(x7,y1)
I(x1,y2) I(x2,y2) I(x3,y2) I(x4,y2) I(x5,y2) I(x6,y2) I(x7,y2)
I(x1,y3) I(x2,y3) I(x3,y3) I(x4,y3) I(x5,y3) I(x6,y3) I(x7,y3)
I(x1,y4) I(x2,y4) I(x3,y4) I(x4,y4) I(x5,y4) I(x6,y4) I(x7,y4)
I(x1,y5) I(x2,y5) I(x3,y5) I(x4,y5) I(x5,y5) I(x6,y5) I(x7,y5)
表2
D(x1,y1) D(x2,y1) D(x3,y1) D(x4,y1) D(x5,y1) D(x6,y1) D(x7,y1)
D(x1,y2) D(x2,y2) D(x3,y2) D(x4,y2) D(x5,y2) D(x6,y2) D(x7,y2)
D(x1,y3) D(x2,y3) D(x3,y3) D(x4,y3) D(x5,y3) D(x6,y3) D(x7,y3)
D(x1,y4) D(x2,y4) D(x3,y4) D(x4,y4) D(x5,y4) D(x6,y4) D(x7,y4)
D(x1,y5) D(x2,y5) D(x3,y5) D(x4,y5) D(x5,y5) D(x6,y5) D(x7,y5)
根据表1及表2所示的静态曝光视场中的光照度分布及偏光轴角度误差分布，则在该静态曝光视场中，于X方向上的扫描累积后的加权静态偏光轴角度偏差WDsta为：
Figure PCTCN2017090747-appb-000007
其中，N为扫描向(Y向)离散点数目。本实施例中，N＝5。
如此，在整个静态曝光视场中的加权静态偏光轴角度偏差均匀性Murasta的定义如下：
Figure PCTCN2017090747-appb-000008
其中，max(WDsta(xi))为X方向上加权静态偏光轴角度偏差WDsta(xi，yj)最大的一组所对应的加权静态偏光轴角度偏差的值；
min(WDsta(xi))为X方向上加权静态偏光轴角度偏差WDsta(xi，yj)最小的一组所对应的加权静态偏光轴角度偏差的值。
根据如上所述的加权静态偏光轴角度偏差均匀性murasta的计算模型，即可确认光配向设备的起偏照明系统所提供的偏振光是否符合要求，以提高配向膜层中所形成的配向角的精度。
然而，所述加权静态偏光轴角度偏差均匀性murasta的计算模型仅仅针对起 偏照明系统的静态性能而言，而在实际的光配向过程中，所述基板是由光配向设备的运动台承载并沿扫描方向运输，进而完成光配向的曝光过程。即，在光配向过程中，由于运动台的机械运动而产生的偏差对于光配向工艺的影响也不容忽视。当所述运动台的定位产生偏差时，相应的，体现在所述运动台的偏摆值Yaw过大，进而会导致偏光轴的方向发生偏移。
基于此，本申请的发明人引入了一种“加权动态偏光轴角度偏差均匀性muradyn”的计算模型，其反应了起偏照明装置以及运动台在光配向过程中共同对配向结果的影响。具体的，所述光配向控制方法包括：
在光配向扫描方向上选取K个离散采样点s.yk,k＝1,2,...,K，于待配向基板的曝光视场上选取M个检测点(Xm,Ym),m＝1,2,...,M，配向时获取每个所述检测点在每个所述离散采样点处的偏光轴角度误差D(x(Xm,Ym),y(Xm,Ym,s.yk)和对应的偏振光光照强度I(x(Xm,Ym),y(Xm,Ym,s.yk)，并测量运动台相对起偏照明装置在每个所述离散采样点的偏摆值Yaw(s.yk)；
利用如下公式计算检测点(Xm,Ym)经过正反向配向扫描后的动态加权偏光轴角度偏差WDdyn(Xm,Ym)：
Figure PCTCN2017090747-appb-000009
其中，(x(Xm,Ym),y(Xm,Ym,s.yk))指基板坐标系下具有坐标(Xm,Ym)的检测点在运动台坐标系下的坐标；
利用如下公式获取所述基板的动态加权偏光轴角度偏差均匀性Muradyn：
Figure PCTCN2017090747-appb-000010
根据所述运动台相对所述起偏照明装置的偏摆值以及所述基板的动态加权 偏光轴角度偏差来控制带动所述基板旋转的旋转台旋转。
通过以上所述的光配向控制方法，一方面可对光配向设备的整体性能进行检测及监控，从而可更加真实地反应光配向设备的稳定性，并且根据在线监控获取的数据即可直接反应配向膜中所形成的配向角的状况，另一方面还可根据检测结果对光配向设备进行调整，进而确保光配向的控制精度。
以下结合附图和具体实施例对本发明提出的光配向控制方法及光配向设备作进一步详细说明。根据下面说明和权利要求书，本发明的优点和特征将更清楚。需说明的是，附图均采用非常简化的形式且均使用非精准的比例，仅用以方便、明晰地辅助说明本发明实施例的目的。
<实施例一>
图1为本发明实施例一中的光配向控制方法的流程示意图。如图1所示，所述光配向控制方法，包括：
S100，在光配向扫描方向上选取K个离散采样点s.yk,k＝1,2,...,K，于待配向基板的曝光视场上选取M个检测点(Xm,Ym),m＝1,2,...,M，配向时获取每个所述检测点在每个所述离散采样点处的偏光轴角度误差D(x(Xm,Ym),y(Xm,Ym,s.yk)和对应的偏振光光照强度I(x(Xm,Ym),y(Xm,Ym,s.yk)，并测量运动台相对起偏照明装置在每个所述离散采样点的偏摆值Yaw(s.yk)；
S200，利用如下公式计算检测点(Xm,Ym)经过正反向配向扫描后的动态加权偏光轴角度偏差WDdyn(Xm,Ym)：
Figure PCTCN2017090747-appb-000011
其中，(x(Xm,Ym),y(Xm,Ym,s.yk))指基板坐标系下具有坐标(Xm,Ym)的所述检测点在运动台坐标系下的坐标；
利用如下公式获取所述基板的动态加权偏光轴角度偏差均匀性Muradyn：
Figure PCTCN2017090747-appb-000012
S300，根据所述运动台相对所述起偏照明装置的偏摆值以及所述基板的动态加权偏光轴角度偏差来控制带动所述基板旋转的旋转台旋转。
具体的，在步骤S100中，每个检测点在光配向过程中的偏光轴角度误差D(x(Xm,Ym),y(Xm,Ym,s.yk)为所述检测点在光配向过程中接收到的偏振光的实际偏光轴角度与名义偏光轴角度之差。即，其可通过如下方式获取：检测每个检测点在光配向过程中接收到的偏振光的实际偏光轴角度误差PA(x(Xm,Ym),y(Xm,Ym,s.yk)，并根据如下公式获取偏光轴角度误差：D(x(Xm,Ym),y(Xm,Ym,s.yk)＝PA(x(Xm,Ym),y(Xm,Ym,s.yk)-PT(x(Xm,Ym),y(Xm,Ym,s.yk)，其中，PT(x(Xm,Ym),y(Xm,Ym,s.yk)为名义偏光轴角度。
此外，在步骤S100中，(x(Xm,Ym),y(Xm,Ym,s.yk))是指基板坐标系下具有坐标(Xm,Ym)的所述检测点在运动台坐标系下的坐标。具体的，在光配向过程中，所述基板位于一用于承载基板的承载台上，并根据设定的偏光角由一旋转台带动基板旋转至一定的角度位置，同时，由所述运动台带动所述基板沿着光配向的扫描方向移动以完成光配向过程。其中，所述运动台是沿单轴运动，因此若此时所述运动台存在偏摆角度时，其随即会影响光配向时的偏光轴角度，为此，需确认所述运动台的偏摆值Yaw(s.yk)。然而，由于在光配向过程中，所述旋转台会根据偏光角的设定而带动基板旋转一定的角度，因此基于基板的坐标系与基于运动台的坐标系可能存在差异，而为获得检测点在每个离散采样点处的精确的动态加权偏光轴角度偏差，则需对两者的坐标进行转换统一。具体的，基板坐标系下的所述检测点转换到运动台的坐标系下可采用如下公式：
Figure PCTCN2017090747-appb-000013
其中，Rt为带动所述基板旋转的旋转台的旋转量；
Mp为基板相对位于所述旋转台下方的运动台的膨胀倍率，即由基板自身的膨胀引起的相对位置变化，运动台至少具有Y及Rz向两自由度；
Rp为所述基板相对所述运动台的旋转量；
Figure PCTCN2017090747-appb-000014
为所述基板相对所述运动台的平移。
具体的，所述旋转台的旋转量Rt、基板相对于所述运功台的倍率Mp以及基板相对所述运动台的旋转量Rp可通过如下方法获得：
步骤一，在所述基板上设置I个对准标记，所述对准标记在基板坐标系下的名义位置表示为(Xi,Yi),i＝1,2,...,I；
步骤二，通过对准系统分别对准I个所述对准标记，得到I个所述对准标记在运动台坐标系下的测试位置(Caxi,Cayi),i＝1,2,...；
步骤三，根据所述对准标记的名义位置(Xi,Yi),i＝1,2,...,I、测试位置(Caxi,Cayi),i＝1,2,...,I以及对准时所述运动台相应的位置(s.yi),i＝1,2,...,I，利用以下公式获得所述Rt、Mp、Rp：
Figure PCTCN2017090747-appb-000015
进一步的，本实施例的步骤S100中，所述运动台相对起偏照明装置在每个离散采样点的偏摆值Yaw(s.yk)的测量可参考如下方法：分别测量所述运动台在每个所述离散采样点的偏摆值Yaw1(s.yk)和测量所述起偏照明装置在每个所述离散采样点的偏摆值Yaw2(s.yk)；当Yaw2(s.yk)＜Yaw1(s.yk)/10时，Yaw(s.yk)＝Yaw1(s.yk)。
再进一步的，所述运动台在每个所述离散采样点的偏摆值的测量方法可参考如图2a所示的流程示意图以及图3所示的测量原理图：
步骤S121a，选取所述运动台10的一侧面作为测量面11，将两路第一干涉仪测量光20入射到所述运动台的测量面11，其中，所述测量面11可以为所述运动台10上与所述光配向扫描方向垂直的侧面；
步骤S122a，获得两路所述第一干涉仪测量光到达所述运动台的测量面的光程差Δy1(即图3中y1与y1’的绝对差)和两路所述第一干涉仪测量光之间的中心距离s1，根据如下公式计算所述运动台的偏摆值Yaw1(s.yk)，Yaw1(s.yk)＝Δy1/s1。
其中，所述第一干涉测量仪包括一发射器和一接收器，以及固定于所述测量面上的角反射镜(均未图示)。在进行测量时，所述发射器发出光线，所述光线照射到固定于测量面上的角反射镜上，所述角反射镜将光线反射回，被反射回的光线由接收器接收并进行数据处理。从而，可利用两个所述第一干涉测量仪测量确认其对应的两条干涉光路的路程差。由于干涉测量仪可实时发射并接受光线，因此其可实时对运动台的偏摆值进行测量，便于对运动台的偏摆状况进行在线监控，并进一步实现对运动台的偏摆角度进行实时的补偿调整，确保运动台的定位精度。
当然，除了通过第一干涉测量仪之外，还可通过光栅尺测量仪实现运动台的偏摆值的测量，具体的，所述运动台在每个所述离散采样点的偏摆值的测量方法还可以采用如下步骤，具体参考图2b所示：
步骤S121b，沿所述光配向扫描方向布置两条平行的光栅尺，将与所述光栅尺一一对应的读头安装在所述运动台上与所述光配向扫描方向垂直的侧面；
步骤S122b，通过所述读头获得相对应的光栅尺测量值，并根据两个所述光栅尺测量值之间的差值Δy1和两条所述光栅尺之间的中心距离s1，根据如下公式计算所述运动台的偏摆值Yaw1(s.yk)，Yaw1(s.yk)＝Δy1/s1。
相应的，与所述运动台的偏摆值Yaw1(s.yk)的测量方法类似，所述起偏照明装置在每个所述离散采样点的偏摆值Yaw2(s.yk)的测量方法可参考以下步骤：
首先，选取所述起偏照明装置中的线栅框架的一侧面作为测量面，将两路第二干涉仪测量光入射到所述起偏照明装置的测量面，其中，所述起偏照明装置的测量面可以为所述线栅框架上与所述光配向扫描方向垂直的侧面，所述第二干涉仪可参考如上所述的第一干涉仪，此处不做赘述；
然后，获得两路所述第二干涉仪测量光到达所述起偏照明装置的测量面的光程差Δy2和两路所述第二干涉仪测量光之间的中心距离s2，计算所述起偏照明装置的偏摆值Yaw2(s.yk)，Yaw2(s.yk)＝Δy2/s2。
综上，通过本实施例提供的光配向控制方法，不但可对运动台相对所述起偏照明装置的偏摆值进行检测及监控，同时还可根据检测结果确认所述基板的动态加权偏光轴角度偏差均匀性，通过所述动态加权偏光轴角度偏差均匀性可直接表征在光配向过程中整个基板表面所形成的配向角的均匀性，并且，本实施例提供的光配向控制方法中，还可通过所述动态加权偏光轴角度偏差，调整带动所述基板旋转的旋转台的旋转角度，以确保作用于基板表面的偏光轴角度在设定的范围内。
<实施例二>
基于如上所述的光配向控制方法，本发明还提供一种光配向设备。图4为本发明实施例二中光配向设备的侧视图，图5为本发明实施例二中光配向设备的俯视图，结合图4及图5所示，所述光配向设备，包括起偏照明装置110、承载基板旋转的旋转台120以及设置在所述旋转台120下方进行光配向扫描运动的运动台130，其中，所述光配向设备还包括：
运动台偏摆测量装置140，用于获取光配向过程中所述运动台130的偏摆值；
起偏照明装置偏摆测量装置150，用于获取光配向过程中所述起偏照明装置110的偏摆值；
以及偏光轴角度误差控制单元，所述偏光轴角度误差控制单元在结合所述运动台130的偏摆值和所述起偏照明装置110的偏摆值的基础上，可计算出所述基板200的动态加权偏光轴角度偏差，并根据所述运动台相对所述起偏照明装置的偏摆值以及所述基板的动态加权偏光轴角度偏差来控制所述旋转台120旋转。
即，本实施例中，所述光配向设备可在获取运动台130以及起偏照明装置110的偏摆值之后，利用所述偏光轴角度误差控制单元调整所述旋转台120的旋转角度，从而可避免基板200偏离原来的角度位置，进而可提高光配向设备的偏光轴的设定精度。也就是说，本实施例提供的所述光配向设备可形成一闭环反馈系统，通过所述闭环反馈不仅可对光配向设备的整体性能进行检测及监控，并且还可根据检查结果自动调整，以提高光配向的控制精度。
具体的，所述运动台偏摆测量装置140包括第一干涉仪测量装置141和第一反射镜142，所述第一反射镜142安装在所述运动台130的一个侧面上，例如可将所述第一反射镜142安装在所述运动台130上与光配向扫描方向垂直的侧面。所述第一干涉仪测量装置141发射两路第一干涉仪测量光入射到所述第一反射镜142上，并收集所述第一反射镜142的反射光，得到两路所述第一干涉仪测量光到达所述运动台的侧面的光程差Δy1，并根据所述光程差Δy1和两路所述第一干涉仪测量光之间的中心距离s1，计算所述运动台的偏摆值Yaw1(s.yk)，Yaw1(s.yk)＝Δy1/s1。其中，所述第一干涉仪测量装置可以是采用两个单轴干涉仪，亦或是采用一个双轴干涉仪。
继续参考图4及图5所示，所述起偏照明装置偏摆测量装置150包括第二干涉仪测量装置151以及第二反射镜152(例如角反射镜)。其中，所述第二反射镜152安装在所述起偏照明装置150中线栅框架112的一侧面，具体的，所述第二反射镜152可安装在所述线栅框架112中一与所述光配向扫描方向垂直的侧面。所述第二干涉仪测量装置151发射两路第二干涉仪测量光入射到所述 第二反射镜152，并收集所述第二反射镜的反射光，得到两路所述第二干涉仪测量光到达所述线栅框架112的侧面的光程差Δy2，并根据所述光程差Δy2和两路所述第二干涉仪测量光之间的中心距离s2，计算所述起偏照明装置的偏摆值Yaw2(s.yk)，Yaw2(s.yk)＝Δy2/s2。与第一干涉仪测量装置140类似，所述第二干涉仪测量装置150也可采用两个单轴干涉仪，或者采用一个双轴干涉仪。
如上所述，由于起偏照明装置110是形成偏振光的关键部件，因此若所述起偏照明装置110的角度位置存在偏差时，将进一步影响所形成的偏振光的偏振轴方向，从而影响配向膜的配向工艺。因此，对于所述起偏照明装置110的偏摆值的测量也至关重要，而通过所述起偏照明装置偏摆测量装置150即可实现对所述起偏照明装置110进行实时监控的目的。
继续参考图4和图5所示，所述起偏照明装置110包括照明框架111，所述照明框架111包括一流槽型反射罩111a和一灯管111b，所述灯管111b发出的光经所述流槽型反射罩111a反射后形成具有特定角度的光。其中，所述流槽型反射罩111a优选为抛物线型反射罩。进一步的，所述灯管111b为长条形的UV灯管，其发出的紫外光照射于基板上，进而使基板上的配向膜发生光致反应。较佳的，所述灯管111b的长度大于基板200在垂直于其光配向扫描方向(即图4中的Y方向)上的长度，从而可确保基板200在垂直于扫描方向上的部分能位于灯管111b的曝光视场中，进而再通过运动台130于扫描方向传输基板200以完成对整个基板的光配向的过程。在实际应用过程中，根据待配向的基板的尺寸，具体选择相应尺寸的灯管，例如在应用于生产4.5代的液晶显示屏中时，所述基板的尺寸为730mm*920mm，则所采用的灯管111b的长度为大于730mm。此外，在光配向的过程中，基板200与灯管111b并不是绝对平行的，所述基板相对于灯管而言可能会具有一定的旋转角度，例如，在4.5代的液晶显示屏中，当所述基板200相对于灯管111b的旋转角度为0°±15°、90°±15°或180°±15°范围内时，则为保证整个基板上的配向膜均能够完成光配向过程，则需使灯管111b 的曝光视场范围大于或等于1109mm。
接着参考图4并结合图5所示，所述起偏照明装置110包括线栅框架112，即所述照明框架111发出的光经所述线栅框架112后形成偏振光，所述偏振光照射于基板200的表面以进行光配向的曝光工艺。具体的，所述线栅框架112包括依次叠放的滤光片112a、起偏线栅112b及线栅保护玻璃112c，在所述滤光片112a和所述起偏线栅112b之间通入有压缩空气，在所述起偏线栅112b和所述线栅保护层112c之间通入有惰性气体，所述惰性气体优选为氮气。
其中，所述滤光片112a面向所述照明框架111，用于过滤光源111b中发出的光，以选取特定波段的光。由于不同的配向膜要求对应的配向光的波段不同，因此可通过特定波段的滤光片112a获取指定波段的光。例如，254nm的配向膜要求对应的配向光的波段为240nm～300nm，即可采用相应的滤光片112a选取该波段的光。
进一步的，通过所述滤光片112a后的具有特定波段的出射光，照射在位于所述滤光片112a远离所述照明框架111一侧的起偏线栅112b上，并通过所述起偏线栅112b形成偏振光。具体的，所述起偏线栅112b包括一透明基底以及于所述基底上形成的若干条状的光栅，在所述起偏线栅112b分布有光栅的一面朝向线栅保护玻璃112c。其中，所述光栅的材质可以为金属或者金属化合物，例如其材质可以为铝(Al)或氧化钛(Ti)。优选的，为了可获取高消光比(大于50:1)的偏振光，目前采用的光栅的材质通常为氧化钛，其不但可以得到具有良好的消光比的偏振光，并且，即使入射在起偏线栅112b上的光的角度不相同，也不会影响光的透射率以及在透过所述起偏线栅112b所形成的偏振光中也几乎不存在偏光轴方向发生变化的问题。因此，目前采用氧化钛形成的光栅，其入射角可放宽至45°左右，而其对应的消光比大于50:1，对应的偏光轴发生旋转的角度小于0.1°。
本实施例中，于所述滤光片112a和所述起偏线栅112b之间还通入有压缩空 气，以对所述线栅框架112进行降温。在光配向过程中，照明框架111中持续发出光线并照射在所述线栅框架112上，因此在这个过程中会产生大量的热量，继而直接导致线栅框架112的温度升高，若线栅框架112的温度过高，则会对光的偏振产生影响，例如当温度大于180℃时，光栅易发生膨胀等问题，从而改变光栅之间的间距，最终影响光的偏振。因此，本实施例中通过在滤光片112a和起偏线栅112b之间通入用于冷却的压缩空气，以确保所述起偏照明装置110的温度不会过高。此外，在所述起偏线栅112b和线栅保护玻璃152c之间还通入有氮气，其原因在于，所述起偏线栅112b上分布有光栅的一面朝向线栅保护玻璃152c，并且所述光栅易被空气氧化，进而会影响其起偏性能，因此于所述起偏线栅112b和线栅保护玻璃152c之间通入氮气，从而可避免所述光栅，尤其是金属光栅被氧化的问题。
继续参考图5所示，本实施例中，所述光配向设备中还包括一导轨160，所述导轨160沿着光配向的扫描方向延伸，所述运动台130安装于所述导轨160中，并带动基板沿着所述导轨160的延伸方向移动以完成光配向过程。进一步的，所述光配向设备还包括一用于承载基板200的承载台170，所述承载台170位于所述运动台130和旋转台120的上方。其中，所述旋转台120连接所述承载台170并可带动所述承载台170以一定的角度旋转。优选的，所述承载台170包括一支撑盘171以及分布于所述支撑盘171上的多个支撑脚(pin)172，所述支撑脚172与基板200接触并支撑基板。在进行光配向过程中，首先，将基板200放置于所述支撑脚172上；接着，所述运动台130带动基板200到达对准位置；然后，在所述基板200完成对准后，所述旋转台120调整基板200旋转角度，以到达设定的偏光轴对应的偏光角；最后，由所述运动台130带动基板200于扫描方向往返移动以完成光配向的过程。
<实施例三>
图6为本发明实施例三中光配向设备的侧视图，图7为本发明实施例三中 光配向设备的俯视图。结合图6和图7所示，本实施例与实施例二的区别在于，所述运动台偏摆测量装置140’包括两条沿所述光配向扫描方向平行布置的光栅尺141’和与所述光栅尺141’一一对应的读头142’，所述读头142’安装在所述运动台130上与所述光配向扫描方向垂直的侧面上，通过所述读头142’获得相对应的光栅尺测量值，并根据两个所述光栅尺测量值之间的差值Δy1和两条所述光栅尺之间的中心距离s1，计算所述运动台的偏摆值Yaw1(s.yk)，Yaw1(s.yk)＝Δy1/s1。
具体的，所述光栅尺141’平行于所述导轨160。进一步的，所述光栅尺141’上设置有用于指示距离的刻度；所述读头142’与所述光栅尺141’相对设置，用于读取光栅尺141’上的数值。在光配向过程中，所述读头142’随运动台130做同步移动时，并对光栅尺141’上的刻度进行感应，同时实时反馈数据，进而可获得两个所述光栅尺测量值之间的差值Δy1和两条所述光栅尺之间的中心距离s1。
综上所述，在本实施例提供的光配向设备中，采用偏光轴角度误差控制单元对所述运动台及起偏照明装置的偏摆状况进行实时监控并调整，其一方面提高了运动台的定位精度，另一方面也相应的增加了光配向设备对光配向的控制精度，确保作用于基板上的偏光轴的角度于设定的范围内。并且，根据所述偏光轴角度误差控制单元而获得的检测结果，可直接表征整个基板在光配向过程中偏光轴的角度的均匀性，从而可更真实的反应出配向膜中配向角的误差。
本说明书中各个实施例采用递进的方式描述，每个实施例重点说明的都是与其他实施例的不同之处，各个实施例之间相同相似部分互相参见即可。
上述描述仅是对本发明较佳实施例的描述，并非对本发明范围的任何限定，本发明领域的普通技术人员根据上述揭示内容做的任何变更、修饰，均属于权利要求书的保护范围。

Claims (30)

  1. 一种光配向控制方法，用于在采用起偏照明装置所发出的偏振光对基板进行配向的过程中，控制所述偏振光的偏光轴角度偏差的均匀性，其特征在于，包括：
    在光配向扫描方向上选取K个离散采样点s.yk,k＝1,2,…,K，于基板的曝光视场上选取M个检测点(Xm,Ym),m＝1,2,…,M，配向时获取每个所述检测点在每个所述离散采样点处的偏光轴角度误差D(x(Xm,Ym),y(Xm,Ym,s.yk)和对应的偏振光光照强度I(x(Xm,Ym),y(Xm,Ym,s.yk)，并测量承载所述基板的运动台相对起偏照明装置在每个所述离散采样点的偏摆值Yaw(s.yk)；
    利用如下公式计算检测点(Xm,Ym)经过正反向配向扫描后的动态加权偏光轴角度偏差WDdyn(Xm,Ym)：
    Figure PCTCN2017090747-appb-100001
    其中，(x(Xm,Ym),y(Xm,Ym,s.yk))指基板坐标系下具有坐标(Xm,Ym)的所述检测点在运动台坐标系下的坐标；
    利用如下公式获取所述基板的动态加权偏光轴角度偏差均匀性Muradyn：
    Figure PCTCN2017090747-appb-100002
    根据所述运动台相对所述起偏照明装置的偏摆值以及所述基板的动态加权偏光轴角度偏差均匀性Muradyn来控制位于基板和运动台之间且用于带动所述基板旋转的旋转台的旋转角度。
  2. 如权利要求1所述的光配向控制方法，其特征在于，所述偏光轴角度偏 差为所述检测点在光配向过程中接收到的偏振光的实际偏光轴角度与名义偏光轴角度之差。
  3. 如权利要求1所述的光配向控制方法，其特征在于，所述(x(Xm,Ym),y(Xm,Ym,s.yk))为：
    Figure PCTCN2017090747-appb-100003
    其中，Rt为带动所述基板旋转的旋转台的旋转量；
    Mp为所述基板相对位于所述旋转台下方的运动台的膨胀倍率；
    Rp为所述基板相对所述运动台的旋转量；
    Figure PCTCN2017090747-appb-100004
    为所述基板相对所述运动台的平移。
  4. 如权利要求3所述的光配向控制方法，其特征在于，所述旋转台的旋转量Rt、基板相对位于所述旋转台下方的运动台的倍率Mp以及基板相对所述运动台的平移Rp通过以下方法获得：
    在所述基板上设置I个对准标记，所述对准标记的名义位置表示为(Xi,Yi),i＝1,2,…,I；
    通过对准系统分别对准I个所述对准标记，得到I个所述对准标记的测试位置(Caxi,Cayi),i＝1,2,…,I；
    根据所述对准标记的名义位置(Xi,Yi),i＝1,2,…,I、测试位置(Caxi,Cayi),i＝1,2,…,I以及对准时所述运动台相应的位置(s.yi),i＝1,2,…,I，利用以下基板对准模型计算获得所述Rt、Mp、Rp：
    Figure PCTCN2017090747-appb-100005
  5. 如权利要求1所述的光配向控制方法，其特征在于，测量运动台相对起偏照明装置在每个所述离散采样点的偏摆值Yaw(s.yk)的方法包括：
    分别测量所述运动台在每个所述离散采样点的偏摆值Yaw1(s.yk)和测量所述起偏照明装置在每个所述离散采样点的偏摆值Yaw2(s.yk)，
    Yaw(s.yk)＝Yaw1(s.yk)/Yaw2(s.yk)。
  6. 如权利要求5所述的光配向控制方法，其特征在于，测量所述运动台在每个所述离散采样点的偏摆值Yaw1(s.yk)的方法包括：
    选取所述运动台的一侧面作为测量面，将两路第一干涉仪测量光入射到所述运动台的测量面；
    获得两路所述第一干涉仪测量光到达所述运动台的测量面的光程差Δy1和两路所述第一干涉仪测量光之间的中心距离s1，根据如下公式计算所述运动台的偏摆值Yaw1(s.yk)：Yaw1(s.yk)＝Δy1/s1。
  7. 如权利要求6所述的光配向控制方法，其特征在于，所述测量面为所述运动台上与所述光配向扫描方向垂直的侧面。
  8. 如权利要求5所述的光配向控制方法，其特征在于，测量所述运动台在每个所述离散采样点的偏摆值Yaw1(s.yk)的方法包括：
    沿所述光配向扫描方向布置两条平行的光栅尺，将与所述光栅尺一一对应的读头安装在所述运动台上与所述光配向扫描方向垂直的侧面；
    通过所述读头获得相对应的光栅尺测量值，并根据两个所述光栅尺测量值之间的差值Δy1和两条所述光栅尺之间的中心距离s1，根据如下公式计算所述运动台的偏摆值Yaw1(s.yk)：Yaw1(s.yk)＝Δy1/s1。
  9. 如权利要求6或8所述的光配向控制方法，其特征在于，测量所述起偏照明装置在每个所述离散采样点的偏摆值Yaw2(s.yk)的方法包括：
    选取所述起偏照明装置中的线栅框架的一侧面作为测量面，将两路第二干涉仪测量光入射到所述起偏照明装置的测量面；
    获得两路所述第二干涉仪测量光到达所述起偏照明装置的测量面的光程差Δy2和两路所述第二干涉仪测量光之间的中心距离s2，计算所述起偏照明装置的偏摆值Yaw2(s.yk)：Yaw2(s.yk)＝Δy2/s2。
  10. 如权利要求9所述的光配向控制方法，其特征在于，所述起偏照明装置的测量面为所述线栅框架上与所述光配向扫描方向垂直的侧面。
  11. 如权利要求5所述的光配向控制方法，其特征在于，根据如下公式计算Yaw(s.yk)：
    Figure PCTCN2017090747-appb-100006
  12. 一种光配向设备，包括起偏照明装置、承载并带动基板旋转的旋转台以及设置在所述旋转台下方用于带动基板进行光配向扫描运动的运动台，其特征在于，所述光配向设备还包括：
    运动台偏摆测量装置，用于获取光配向过程中所述运动台的偏摆值；
    起偏照明装置偏摆测量装置，用于获取光配向过程中所述起偏照明装置的偏摆值；以及
    偏光轴角度误差控制单元，其用于根据所述运动台的偏摆值和所述起偏照明装置的偏摆值计算所述基板的动态加权偏光轴角度偏差，并根据所述运动台相对所述起偏照明装置的偏摆值以及所述基板的动态加权偏光轴角度偏差来控制所述旋转台旋转。
  13. 如权利要求12所述的光配向设备，其特征在于，所述运动台偏摆测量装置包括第一干涉仪测量装置和第一反射镜，所述第一反射镜安装在所述运动台的一个侧面上，所述第一干涉仪测量装置发射两路第一干涉仪测量光入射到所述第一反射镜上，并收集来自所述第一反射镜的反射光，得到两路所述第一干涉仪测量光到达所述运动台的侧面的光程差Δy1，并根据所述光程差Δy1和两路所述第一干涉仪测量光之间的中心距离s1，计算所述运动台的偏摆值 Yaw1(s.yk)：Yaw1(s.yk)＝Δy1/s1。
  14. 如权利要求13所述的光配向设备，其特征在于，所述第一反射镜安装在所述运动台上与光配向扫描方向垂直的侧面。
  15. 如权利要求13所述的光配向设备，其特征在于，所述第一干涉仪测量装置包括两个单轴干涉仪。
  16. 如权利要求13所述的光配向设备，其特征在于，所述第一干涉仪测量装置包括一个双轴干涉仪。
  17. 如权利要求12所述的光配向设备，其特征在于，所述运动台偏摆测量装置包括两条沿所述光配向扫描方向平行布置的光栅尺和与所述光栅尺一一对应的读头，所述读头安装在所述运动台上与所述光配向扫描方向垂直的侧面上，通过所述读头获得相对应的光栅尺测量值，并根据两个所述光栅尺测量值之间的差值Δy1和两条所述光栅尺之间的中心距离s1，计算所述运动台的偏摆值Yaw1(s.yk)：Yaw1(s.yk)＝Δy1/s1。
  18. 如权利要求13或17所述的光配向设备，其特征在于，所述起偏照明装置偏摆测量装置包括第二干涉仪测量装置和第二反射镜，所述第二反射镜安装在所述起偏照明装置中线栅框架的一侧面，所述第二干涉仪测量装置发射两路第二干涉仪测量光入射到所述第二反射镜，并收集来自所述第二反射镜的反射光，得到两路所述第二干涉仪测量光到达所述线栅框架的侧面的光程差Δy2，并根据所述光程差Δy2和两路所述第二干涉仪测量光之间的中心距离s2，计算所述起偏照明装置的偏摆值Yaw2(s.yk)：Yaw2(s.yk)＝Δy2/s2。
  19. 如权利要求18所述的光配向设备，其特征在于，所述第二反射镜安装在所述线栅框架中一与所述光配向扫描方向垂直的侧面。
  20. 如权利要求18所述的光配向设备，其特征在于，所述第二干涉仪测量装置包括两个单轴干涉仪。
  21. 如权利要求18所述的光配向设备，其特征在于，所述第二干涉仪测 量装置包括一个双轴干涉仪。
  22. 如权利要求12所述的光配向设备，其特征在于，所述起偏照明装置包括照明框架，所述照明框架包括流槽型反射罩和灯管，所述灯管发出的光经所述流槽型反射罩反射后形成具有特定角度的光。
  23. 如权利要求22所述的光配向设备，其特征在于，所述流槽型反射罩为抛物线型反射罩。
  24. 如权利要求22所述的光配向设备，其特征在于，所述灯管的长度大于所述基板在垂直于所述光配向扫描方向上的长度。
  25. 如权利要求12所述的光配向设备，其特征在于，所述起偏照明装置包括线栅框架，所述线栅框架包括依次叠放的滤光片、起偏线栅及线栅保护玻璃，在所述滤光片和所述起偏线栅之间通入有压缩空气，在所述起偏线栅和所述线栅保护层之间通入有惰性气体。
  26. 如权利要求25所述的光配向设备，其特征在于，所述惰性气体为氮气。
  27. 如权利要求25所述的光配向设备，其特征在于，所述起偏线栅包括一透明基底以及于所述透明基底上形成的若干条状的光栅。
  28. 如权利要求27所述的光配向设备，其特征在于，所述光栅的材质为金属或金属化合物。
  29. 如权利要求28所述的光配向设备，其特征在于，所述金属为铝。
  30. 如权利要求28所述的光配向设备，其特征在于，所述金属氧化物为氧化钛。
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