TW584713B - Positioning system with multiple bar mirrors - Google Patents
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- TW584713B TW584713B TW92105405A TW92105405A TW584713B TW 584713 B TW584713 B TW 584713B TW 92105405 A TW92105405 A TW 92105405A TW 92105405 A TW92105405 A TW 92105405A TW 584713 B TW584713 B TW 584713B
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584713 _________ 案號92105405_年__g 曰. 修正一 五、發明說明(1) 發明之領域 本發明係關於一種定位系統,特別是一種設有多重 條形反射鏡之定位系統,用以測量一曝光機台内之平台 及光罩之移動方向。 背景說明 在液晶顯不面板的製程中’黃光製程 (photolithographic process)與钱刻製程是用來定義液 晶顯不面板中的各種電子早元以及其他光學元件(如彩色 濾光鏡)等結構。而目前的黃光製程係多採用掃描式曝光 系統來進行曝光製程,此係.因為目前市場需求以大面積 的液晶顯示面板居多,而掃描式曝光系統正好適用於對 大面積的基板進行曝光。 請參考圖五’圖五為一掃描式曝光系統的示意圖。 如圖五所示,曝光系統100包含有一光源102、一光罩104 設於光源1 0 2之下方、以及一光學系統1 0 6位於光罩1 〇 4下 方,其中光罩1 0 4上具有一預定圖案之開口( s 1 i t ),而光 學系統 106 包含有一梯形鏡(trapezoidal mirroi〇l〇6a、 一凹面鏡(concave mirror)10.6b以及一凸面鏡(convex m i r r 〇 r ) 1 0 6 c位於梯形鏡1 0 6 a與凹面鏡1 0 6 b之間。曝光系 統1 0 0還包含有一基座108、一平台11 0以可移動的方式安 置於基座1 0 8上、以及一基板11 2位於基座1 1 〇之上,而平 .5 584713 --------—_t^_92105405 _年 月 日 修正 五、發明說明(2) 台11 0乃是用來承載以及移動基板11 2,並且平台11 〇係以 一驅動裝置(如線性馬達)來控制平台110以一氣浮或磁浮 方式於基座1 0 8上移動,並控制平台11 0於基座1 〇 8上之移 動方向。以下的說b月都是以測量平台11 〇的位置為例。584713 _________ Case No. 92105405_Year __g. Amendment 15 、 Explanation of the Invention (1) Field of the Invention The present invention relates to a positioning system, especially a positioning system provided with multiple strip mirrors for measuring an exposure. The direction of movement of the platform and photomask in the machine. Background Description In the LCD panel manufacturing process, the 'photolithographic process' and the engraving process are used to define various electronic early elements and other optical components (such as color filters) in the LCD panel. The current yellow light process system mostly uses a scanning exposure system to perform the exposure process. Because of the current market demand for large-area liquid crystal display panels, the scanning exposure system is suitable for exposing large-area substrates. Please refer to FIG. 5 ′ FIG. 5 is a schematic diagram of a scanning exposure system. As shown in FIG. 5, the exposure system 100 includes a light source 102, a photomask 104 disposed below the light source 102, and an optical system 106 disposed below the photomask 104, wherein the photomask 104 has A predetermined patterned opening (s 1 it), and the optical system 106 includes a trapezoidal mirroi〇6a, a concave mirror 10.6b, and a convex mirror (convex mirr 〇r) 1 0 6 c is located in a trapezoid Between the mirror 106a and the concave mirror 106b. The exposure system 100 also includes a base 108, a platform 110, which is movably disposed on the base 108, and a substrate 112, which is located at Pedestal 1 1 〇, and flat. 5 584713 --------—_ t ^ _92105405 _ year, month, day, amendment 5. Description of the invention (2) The platform 11 0 is used to carry and move the substrate 11 2 The platform 110 uses a driving device (such as a linear motor) to control the platform 110 to move on the base 108 in an air-floating or magnetic levitation manner, and controls the moving direction of the platform 110 on the base 108. In the following, the month b is based on the position of the measurement platform 110.
其中,為了使平台11 0依照一預定的移動方向移動, 因此需要一定位系統可隨時地測量平台11 〇的移動方向, 並且該定位系統會將測量結果傳給一控制裝置,該控制 裝置則會適時地調整平台1 1 〇的移動方向,而使平台1 1 〇 按照預定的移動方向移動。請參考圖六,圖六係為一習 知定位系統之示意圖。如圖六所示,一習知定位系統包 含有一平台11 0、反射鏡11 4與11 6設於平台11 〇上、雷射 干涉計(laser interferometer) 118a與 11 8b安裝於反射 鏡1 1 4之一側、雷射干涉計1 2 0 a、1 2 0 b安裝於反射鏡11 6 之一側、以及一控制裝置1 2 2。其中雷射干涉計1 1 8 a與 1 1 8 b是用來測量平台1 1 0在Y軸上的位置,而雷射干涉計 1 2 0 a與1 2 0 b則是用來測量平台11 〇在X軸上的位置。Among them, in order to make the platform 110 move according to a predetermined moving direction, a positioning system is required to measure the moving direction of the platform 110 at any time, and the positioning system will transmit the measurement result to a control device, and the control device will The moving direction of the platform 1 10 is adjusted in a timely manner so that the platform 1 10 moves in a predetermined moving direction. Please refer to FIG six, six FIG schematic view showing the positioning of a conventional system. As shown in Fig. 6, a conventional positioning system includes a platform 110, mirrors 11 4 and 11 6 on the platform 110, and laser interferometers 118a and 11 8b installed on the mirror 1 1 4 One side, the laser interferometers 1 2 0 a, 1 2 0 b are mounted on one side of the reflector 11 6, and a control device 1 2 2. The laser interferometers 1 1 8 a and 1 1 8 b are used to measure the position of the platform 1 1 0 on the Y axis, and the laser interferometers 1 2 0 a and 1 2 0 b are used to measure the platform 11 〇Position on the X axis.
由於大尺寸液晶面板的需求與日遽增,因此製作大 尺寸的基板11 2是必須的。同時,曝光機台内的平台1 1 〇 也因應大尺寸的基板Π 2而加大,為了精碟地控制大尺寸 的平台11 0的移動方向,定位系統内的反射鏡Η 4、1 1 6的 長度亦必須隨之加長。然而,對於目前的加工磨床技術 而言’很難得到高品質的長反射鏡。因此,尋求一種可 以使用短反射鏡之定位系統是必須的。As the demand for large-size LCD panel and the dramatic increase in Japan, and therefore the production of large-sized substrate 112 is necessary. At the same time, the platform 1 1 0 in the exposure machine is also enlarged in response to the large-sized substrate Π 2. In order to precisely control the movement direction of the large-sized platform 110, the mirror Η in the positioning system Η 4, 1 1 6 Must also increase in length. However, it is difficult for a current processing grinder technology to obtain a high-quality long mirror. Therefore, it is necessary to find a positioning system that can use short mirrors.
第8頁 584713 案號921处 年 月 曰 五、發明說明(3) 修正 發明概述 本發明的目的是提供一種設有多重條形反射 > 位系統,以解決前述問題。^ ^ ^ ^ ^ ^ 兄t疋 依 種定位 一基座 且該兩 測距儀 制該定 該控制 第二光 光學測 光學測 第一光 裝置會 學測距 據本發 系統, 上,至 條形反 分別設 位系統 裝置則 學測距 距儀通 距儀所 學測距 再分別 儀來測 明之目的 其包含有 少二相鄰 射鏡具有 置於該基 之操作。 會分別利 議來測量 過該接合 蜊得之移 儀所測得 利用該等 量該平台 ,本發明之較佳 一平台,以可移 之條形反射鏡安 實施例 動的方 裝於該 接合處’一第—與_ 以及一控制裝置 台沿一第一方向 座上, 當該平 用該等 該平台 處時, 動方向 之移動 、條形反 之移動 條形反射 之移動方 該控制裝 來校正通 方向,在校正過 射鏡及該 方向。 鏡及該 向,且 置會利 過該結 第一 係提 式安 平台 第二 ,用 移動 第一 當該 用該 合處 後該 該第 供一 置於 上, 光學 來控 時, 、該 第一 第二 之該 控制 —光 从,本^明係利用複數個條形反射鏡及光學測距儀 叮ί i ^測里〜平台的移動方向。而條形反射鏡的數目 m平”尺寸而增減,並藉由光學測距儀相互校正 、測里、台位置之目的。因此,本發明可適用於各 考尺寸的基板’且條形反射鏡的長度無須隨基板的尺寸Page 8 584713 Case No. 921 Year 5. Description of the invention (3) Amendment Summary of the invention The object of the present invention is to provide a system with multiple strip reflection > position to solve the aforementioned problem. ^ ^ ^ ^ ^ ^ Brother t 疋 locates a base according to the type and the two rangefinder systems should control the second optical optical measurement optical measurement first optical device will learn distance measurement according to the present system, up to the The shape-respective positioning system device learns the rangefinder and the distance meter and then the distance meter separately to determine the purpose, which includes the operation of placing two adjacent mirrors on the base. It will be negotiated separately to measure the amount of the platform that has been used to measure the joint clam. The preferred platform of the present invention is mounted on the joint with a removable strip mirror to move the embodiment. Place 'a first — and _ and a control device stand along a first direction seat, when the flat is used on the platform, the moving direction of the movement, the movement of the bar and vice versa To correct the pass direction, correct the mirror and that direction. The mirror and the direction, and the set will benefit from the knot, the first tie-type safety platform, the second, the mobile first, when the joint should be used, the first supply one is placed on top, when the optical control, The second one is the control of the light, which is based on the use of a plurality of bar mirrors and optical rangefinders. The measurement is the direction of movement of the platform. The number of strip mirrors m is flat and the size is increased and decreased, and the purpose of mutual correction, distance measurement, and stage position is measured by an optical rangefinder. Therefore, the present invention can be applied to substrates of various test sizes and strip reflections. The length of the mirror need not depend on the size of the substrate
1^· 第9頁 584713 _________________號 92105405 年 月 日. 修^_ 五、發明說明(4) ~^~~一 增加而加長,進而可避免製作長的反射鏡所造成的加工 磨床困擾。 發明之詳細說明 請參考圖一,圖一係為本發明第一實施例之定位系 統示意圖。如圖一所示,一定位系統包含一平台〇、條 形反射鏡14a與14b設於平台110之一側邊、光學測距儀 18a與18b安裝於條形反射鏡14a與14b之一側的基座上、1 ^ · Page 9 584713 _________________ No. 92105405. Rev. ^ _ V. Description of the invention (4) ~ ^ ~~ One is increased and lengthened, so as to avoid the trouble of processing and grinder caused by making long reflectors. Detailed description of the invention Please refer to FIG. 1. FIG. 1 is a schematic diagram of a positioning system according to a first embodiment of the present invention. As shown in FIG. 1, a positioning system includes a platform 0, bar reflectors 14a and 14b provided on one side of the platform 110, and optical rangefinders 18a and 18b installed on one side of the bar reflectors 14a and 14b. On the base,
以及一控制裝置2 2,且該定位系統還包含一驅動裝置(如 線性馬達)(未顯示),用來使平台11 0沿一第一方^移 動。其中,光學測距儀18a與18b係沿同一水平線24移 動,而條形反射鏡1 4 a與1 4 b係設於同一水平線上。並 且,條形反射鏡1 4 a與1 4 b之間的接合處2 6的間距為d i,而 光學測距儀18a與18b之間的間距為d2,且d小於d2。^ 外,條形反射鏡1 4 a與1 4 b的長度L必須大於光學測距儀 18a與18b的間距d2。And a control device 22, and the positioning system further includes a driving device (such as a linear motor) (not shown) for moving the platform 110 along a first party ^. Among them, the optical rangefinders 18a and 18b are moved along the same horizontal line 24, and the strip mirrors 14a and 14b are located on the same horizontal line. In addition, the distance between the joints 26 between the strip mirrors 1 4 a and 1 4 b is di, and the distance between the optical rangefinders 18a and 18b is d2, and d is less than d2. ^ In addition, the length L of the strip mirrors 1 4 a and 1 4 b must be greater than the distance d2 between the optical rangefinders 18 a and 18 b.
請參考圖二(A)至圖二(D ),圖二(A )至圖二(d )係為 當平台11 0沿X軸方向移動時’平台11 0的位置量測方法示 意圖。如圖二(A)所示,當平台11 0沿X軸方向移動時,首 先光學測距儀1 8 a與1 8 b投射雷射光至條形反射鏡1 4 b,而 雷射光會經由條形反射鏡1 4 b反射並由光學測距儀1 8 a與 1 8 b接收,藉由一訊號處理系統(未顯示)根據計算該投射 雷射光及反射雷射光計算出條形反射鏡1 4b與光學測距儀Please refer to Fig. 2 (A) to Fig. 2 (D). Fig. 2 (A) to Fig. 2 (d) are schematic diagrams of the method of measuring the position of the platform 110 when the platform 110 moves in the X-axis direction. As shown in Figure 2 (A), when the platform 110 moves in the X-axis direction, the optical rangefinders 1 8 a and 1 8 b first project laser light onto the bar mirror 1 4 b, and the laser light passes through the bar The reflecting mirror 1 4 b reflects and is received by the optical rangefinders 1 8 a and 1 8 b. A signal processing system (not shown) calculates a strip reflecting mirror 1 4b by calculating the projected laser light and the reflected laser light. With optical rangefinder
第10頁 584713 ______ 案號 92105405 _年 月 日 倐丨下 五、發明說明(5) 一 ^ 18a、18b之間的距離,進而換算而得知平台11〇在γ軸上 的位置。然後控制裝置22會根據該訊號處理系統所計算 出的位置,來利用驅動裝置控制平台1 1 〇之移動方向。Page 10 584713 ______ Case No. 92105405 _Year Month Day 倐 丨 Next V. Description of the Invention (5) A ^ The distance between 18a and 18b, and then converted to know the position of the platform 11 on the γ axis. The control device 22 then uses the driving device to control the movement direction of the platform 110 according to the position calculated by the signal processing system.
接著,如圖二(B )所示,當平台1 1 〇沿X軸方向移動而 使光學測距儀1 8 a即將通過接合處2 6時,控制裝置2 2會停 止利用光學測距儀1 8 a來測量平台1 1 〇之移動方向。如圖 二(C )所示,當平台1 1 0沿X軸方向移動而使光學測距儀 1 8 a完全通過結合處2 6後,光學測距儀1 8 a便會開始測量 條形反射鏡1 4 a與光學測距儀1 8 a之間的距離,並且控制 裝置22會利用光學測距儀18a與18b所測得的數據,來計 算出條形反射鏡14a的位置以及其與光學測距儀18a之距 離的關係式,並將光學測距儀1 8 a所測得的數據與該關係 式比較,以判斷平台1 1 0的移動方向是否正確。也就是 說,控制裝置22會利用光學測距儀18b所測得之移動方向 來校正光學測距儀1 8 a所測得之移動方向,在校正過後控 制裝置22會再分別利用條形反射鏡14a與14b及光學測距 儀1 8a與1 8b來測量平台11 0之移動方向。需注意的是,由 於本發明之定位系統具有兩個可相互校正的光學測距儀 1 8a與1 8b,因此,即使條形反射鏡1 4b沒有與條形反射鏡 1 4a對齊,本發明仍可準確地監測與控制平台1 1 0的移動 方向。 相同地,當光學測距儀1 8 b即將通過接合處2 6時,控 制裝置2 2則停止利用光學測距儀1 8 b來測量平台11 0之移Next, as shown in FIG. 2 (B), when the platform 1 10 moves in the X-axis direction and the optical rangefinder 1 8 a is about to pass through the joint 26, the control device 2 2 stops using the optical rangefinder 1 8 a to measure the moving direction of the platform 110. As shown in FIG. 2 (C), when the platform 1 10 moves along the X-axis direction and the optical rangefinder 18a completely passes through the joint 26, the optical rangefinder 18a will start to measure the bar reflection. The distance between the mirror 14a and the optical rangefinder 18a, and the control device 22 uses the data measured by the optical rangefinders 18a and 18b to calculate the position of the strip mirror 14a and its position with the optical The relational expression of the distance of the rangefinder 18a, and the data measured by the optical rangefinder 18a is compared with the relational expression to determine whether the moving direction of the platform 110 is correct. That is, the control device 22 will use the movement direction measured by the optical rangefinder 18b to correct the movement direction measured by the optical rangefinder 18a. After the correction, the control device 22 will use the bar mirrors separately. 14a and 14b and optical rangefinders 18a and 18b measure the moving direction of the platform 110. It should be noted that, since the positioning system of the present invention has two mutually correctable optical rangefinders 18a and 18b, even if the strip mirror 14b is not aligned with the strip mirror 14a, the present invention still It can accurately monitor and control the moving direction of the platform 110. Similarly, when the optical rangefinder 1 8 b is about to pass through the joint 26, the control device 2 2 stops using the optical rangefinder 1 8 b to measure the movement of the platform 110.
第11頁 584713 年 .η 曰 修正 案號 92105405 五、發明說明(6) ' t Ϊ 2 2^ ^ ^ 18b- ^ ^ ^ ^ ^ 4 26ii > ^ f-j 裝置22會利用光學測距儀18a所測得之方竹炎妒 18b^ ^ ^ ^ 〇 ^ /8b都通過接合處26後,控制裝置繼 f ^利用條形反射鏡14a及光學測距儀18a與」8b來測量 平台1 1 0之移動方向。 一請參考圖三,圖三係為本發明第二實施例之定位系 統不意圖。如圖三所示,一定位系統包含一平台110、 形反射鏡64a、64b與66設於平台110之一側邊、口光學測距 儀68與70安裝於條形反射鏡64a、641)與66之一側的基座 上以及一控制裝置7 2。其中條形反射鏡6 4 a與6 4 b係位 一水平線上,而條形反射鏡66則位於條形反射鏡6“ ” 64b之一側,且條形反射鏡66的高度低於條形反射鏡 64a與64b的高度。並且,該定位系統還包含一驅動裝置 (如線性馬達)(未顯示)。此外,光學測距儀6 8係沿一第 一水平線74移動,而第一水平線74係通過條形反射鏡 64a、64b與66,光學測距儀7〇係沿一第二水平線76移 動’而第二水平線76係通過條形反射鏡64旗64b。 ,請參考圖四(A)至圖四(D),圖四(A)至圖四(D)係為 當平台11 0沿X軸方向移動時,平台i丨〇的位置量 意圖、。如圖四(A)所示當平台11〇沿1轴方向移動日ft 光學測距儀68投射雷射光至條形反射鏡64a,而雷射光會 經由條形反射鏡64a反射並由光學測距儀68接收,藉由1 五—, 曰 修正 訊號處理备一 射光計算ί ί 顯示)根據計算該投射雷射光及反射雷 根據該' 1 1 〇在¥軸七的位置。然後控制裝置7 2會 控制平台Γι 7理系統所計算出的位置,來利用驅動裝i i 0之移動方向。 接著, 使光學剩距H所不’當平台11 〇沿X軸方向移動而 開始進行量 、=匕條形反射鏡64a時,先學測距儀70則 72會利用ί 10在γ軸上的位置。同時,控制裝置 70所量測的^測距儀68所量測的位置來校正光學測距儀 利用光學、、目,丨立置’經過校正之後,控制裝置72則會同時 圖四(c)所^巨,儀/8與^70來測量平台11〇的位置。然後,如 6 8經過條不’當平台11 0沿χ軸方向移動而使光學測距儀 70所量測』反射鏡66時,控制裝置72會利用光學測距儀 校正完成%位置來校正光學測距儀68所量測的位置,在 平台11 0的彳’控制裝置72會再利用光學測距儀68來測量 方向移動位置。如圖四(D)所示,當平台11 0繼續沿X軸 測距儀7ί^ι使光學測距儀70經過條形反射鏡64b時,光學 二心=量測平台110在γ轴上的位置。同 正光學測距ί ϋ用光學測距儀68所量測的位置來校 奘罟7 ?合篇儀7 〇所置測的位置’在經過校正之後’控制 、 0 利用光學測距儀7 0來測量平台11 〇的位置。 此外’在本發明之第二實施例中,條形反射鏡與光 學測距儀的位置皆可對調,亦即,光學測距儀安裝於平 台11 0之側邊上,而條形反射鏡則安裝於基座上。Page 11 584713. η Amendment No. 92105405 V. Description of the Invention (6) 't Ϊ 2 2 ^ ^ ^ 18b- ^ ^ ^ ^ ^ 4 26ii > ^ fj Device 22 will use the optical rangefinder 18a After the measured Fang Zhuyan jealousy 18b ^ ^ ^ ^ ^ ^ b all passed through the joint 26, the control device followed f ^ using the strip mirror 14a and the optical rangefinder 18a and 8b to measure the moving direction of the platform 1 1 0 . First, please refer to FIG. 3, which is not intended for the positioning system of the second embodiment of the present invention. As shown in FIG. 3, a positioning system includes a platform 110, shaped mirrors 64a, 64b, and 66 provided on one side of the platform 110, and optical distance meters 68 and 70 mounted on the strip mirrors 64a, 641) and 66 on one side of the base and a control device 72. The strip mirrors 6 4 a and 6 4 b are positioned on a horizontal line, and the strip mirror 66 is located on one side of the strip mirror 6 “” 64b, and the height of the strip mirror 66 is lower than the strip The height of the mirrors 64a and 64b. Also, the positioning system includes a driving device (such as a linear motor) (not shown). In addition, the optical rangefinder 68 moves along a first horizontal line 74, and the first horizontal line 74 passes through the strip mirrors 64a, 64b, and 66, and the optical rangefinder 70 moves along a second horizontal line 76. The second horizontal line 76 passes through the bar mirror 64 flag 64b. Please refer to Fig. 4 (A) to Fig. 4 (D). Fig. 4 (A) to Fig. 4 (D) are the positions of the platform i 丨 〇 when the platform 110 moves in the X-axis direction. As shown in Figure 4 (A), when the platform 11 moves along the 1-axis direction, the optical distance meter 68 projects laser light onto the bar mirror 64a, and the laser light is reflected by the bar mirror 64a and is optically measured. The instrument 68 receives, and calculates, based on the calculation of the correction signal processing, a calculation of the emitted light (shown). According to the calculation, the projected laser light and the reflected light are calculated according to the position of the axis 1 in the axis VII. Then the control device 72 will control the position calculated by the platform Γι7 system to use the moving direction of the driving device i i 0. Next, when the optical distance H is not set, when the platform 11 〇 moves in the X-axis direction to start the measurement, = dagger-shaped mirror 64a, the distance measuring device 70 and 72 will use the 10 on the γ axis. position. At the same time, the position measured by the control device 70 and the distance measured by the rangefinder 68 are used to correct the optical rangefinder. Using the optical, optical, and vertical settings, the control device 72 will simultaneously display Figure 4 (c). Therefore, the position of the platform 11 is measured by the meter / 8 and the meter 70. Then, as shown in FIG. 6, when the platform 110 moves in the χ-axis direction to make the optical rangefinder 70 measure the reflecting mirror 66, the control device 72 uses the optical rangefinder to correct the optical position. For the position measured by the rangefinder 68, the control device 72 on the platform 110 will use the optical rangefinder 68 to measure the direction movement position. As shown in FIG. 4 (D), when the platform 110 continues to pass the optical rangefinder 70 along the bar-shaped reflector 64b along the X-axis rangefinder 7, the optical two-center = the measurement platform 110 on the γ axis position. Tongzheng Optical Ranging ϋ 奘 罟 Use the position measured by the optical rangefinder 68 to calibrate 7? Combiner 7 〇 The position set after correction is controlled, 0 Use the optical rangefinder 7 0 To measure the position of the platform 110. In addition, in the second embodiment of the present invention, the positions of the bar mirror and the optical rangefinder can be reversed, that is, the optical rangefinder is installed on the side of the platform 110, and the bar mirror is Installed on the base.
第13頁 584713 修正Page 13 584713 Correction
案號92105405 年 月 _____—-----" — —〜—— -****"^~' ~ 五、發明說明(8) 另一方面,在本發明之第一與第二貫施例中,條形 反射鏡之數目可依據平台11 0的尺寸而增減。此外,; 明之第一至第二實施例係以測量平台1 ίο沿X軸方向移^ 時的Y軸位置為例,相同地’本發明之疋位系統亦可用於 測量平台11 〇沿γ軸方向移動時的X軸位置,這點應為習4 此項技藝者所熟知。並且,本發明之定位系統亦可用於° 測量曝光系統中的光軍沿X軸方向移.動時的Y軸位置,以 及測量光罩沿Y軸方向移動時的X軸位置。 相較於習知技術,本發明係利用複數個條形反射鏡 及光學測距儀的組合來測量一平台的移動方向。而條形 反射鏡的數目可依據平台的尺寸而增減,並藉由光學測 距儀相互枚正而達到測量平台位置之目的。因此,本發 1可適用於各種尺寸的基板,且條形反射鏡的長度無須 隨基板的尺寸增加而加長,進而可避免製作長的反射鏡 所造成的加工磨床困擾。 以上所述僅為本發明之較佳實施例,凡依本發明申 請專利範圍所做之均等變化與修飾,皆應屬本發明專利 之涵蓋範圍。Case No. 92105405 Month _____—----- " — — ~ ——-**** " ^ ~ '~ V. Description of the Invention (8) On the other hand, in the first and In the second embodiment, the number of the strip mirrors can be increased or decreased according to the size of the platform 110. In addition, the first to second embodiments of the present invention take the Y-axis position when the measurement platform 1 is moved along the X-axis direction as an example. Similarly, the positioning system of the present invention can also be used for the measurement platform 11 〇 along the γ-axis. The position of the X axis when moving in the direction. This should be well known to those skilled in the art. In addition, the positioning system of the present invention can also be used to measure the position of the Y-axis when the light army in the exposure system moves along the X-axis direction, and the position of the X-axis when the photomask moves in the Y-axis direction. Compared with the conventional technology, the present invention uses a combination of a plurality of bar mirrors and an optical rangefinder to measure the moving direction of a platform. The number of strip mirrors can be increased or decreased according to the size of the platform, and the position of the platform can be measured by aligning the optical rangefinders with each other. Therefore, the present invention 1 can be applied to substrates of various sizes, and the length of the strip-shaped mirror does not need to be increased as the size of the substrate is increased, thereby avoiding the trouble of processing grinders caused by making long mirrors. The above description is only a preferred embodiment of the present invention, and any equivalent changes and modifications made in accordance with the scope of the patent application of the present invention shall fall within the scope of the patent of the present invention.
第14頁 584713 案號 92105405 年 月 曰 修正 圖式簡單說明 圖示之簡單說明 圖一係為本發明第一實施例之定位系統示意圖。 圖二(A)至圖二(D)係為當平台1 10沿X軸方向移動 時,平台1 1 0的位置量測方法示意圖。 圖三為本發明第二實施例之定位系統示意圖。 圖四(A )至圖四(D )係為當平台1 1 0沿X軸方向移動 時,平台1 1 0的位置量測方法示意圖。 圖五為一掃描式曝光系統的示意圖。 圖六係為一習知定位系統之示意圖。 圖示之符號說明 14a 條 形 反 射 鏡 14b ,條 形 反 射 鏡 18a 光 學 測 距 儀 18b 光 學 測 距 儀 22 控 制 裝 置 24 水 平 線 26 接 合 處 64a 條 形 反 射 鏡 64b 條 形 反 射 鏡 66 條 形 反 射 鏡 68 光 學 測 距 儀 70 光 學 測 距 儀 7 2 控 制 裝 置 74 第 一 水 平 線 76 第 二 水 平 線 100 曝 光 系 統 102 光 源 104 光 罩 106 光 學 系 統 106a 梯 形 鏡 106b 凹 面 鏡 10 6c r 凸 面 鏡Page 14 584713 Case No. 92105405 Amendment Brief description of the drawings Brief description of the drawings Fig. 1 is a schematic diagram of a positioning system according to the first embodiment of the present invention. Figures 2 (A) to 2 (D) are schematic diagrams of the position measurement method of the platform 1 10 when the platform 1 10 moves in the X-axis direction. Figure III a schematic view of a second embodiment of the positioning system according to the present invention. Figures 4 (A) to 4 (D) are schematic diagrams of the position measurement method of the platform 110 when the platform 110 moves in the X-axis direction. FIG. 5 is a schematic diagram of a scanning exposure system. Figure VI is a line schematic of a conventional positioning system. Explanation of symbols in the figure 14a bar mirror 14b, bar mirror 18a optical rangefinder 18b optical rangefinder 22 control device 24 horizontal line 26 joint 64a bar reflector 64b bar reflector 66 bar reflector 68 Optical rangefinder 70 Optical rangefinder 7 2 Control device 74 First horizontal line 76 Second horizontal line 100 Exposure system 102 Light source 104 Photomask 106 Optical system 106a Trapezoidal mirror 106b Concave mirror 10 6c r Convex mirror
IBBI 第15頁 584713 ______________案號92105405_年月日 修正 圖式簡單說明 108 基 座 110 平 台 112 基 板 114 反 射 鏡 116 反 射 鏡 118a 雷 射 干 涉 計 118b 雷 射 干 涉 計 120a 雷 射 干 涉 計 120b 雷 射 干 涉 計 122 控 制 裝 置IBBI Page 15 584713 ______________ Case No. 92105405_ Simple Modification Illustration 108 Base 110 Platform 112 Substrate 114 Reflector 116 Reflector 118a Laser Interferometer 118b Laser Interferometer 120a Laser Interferometer 120b Laser Interferometer 122 control device
第16頁Page 16
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