CN104280851B - A kind of focusing and leveling itself zero plane adjusting apparatus and method - Google Patents
A kind of focusing and leveling itself zero plane adjusting apparatus and method Download PDFInfo
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- CN104280851B CN104280851B CN201310268139.XA CN201310268139A CN104280851B CN 104280851 B CN104280851 B CN 104280851B CN 201310268139 A CN201310268139 A CN 201310268139A CN 104280851 B CN104280851 B CN 104280851B
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- focusing
- speculum
- diaphragm
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- projection
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7026—Focusing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automatic Focus Adjustment (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention discloses a kind of focusing and leveling itself zero plane adjusting apparatus, including：First speculum and the second speculum, the reflecting surface of first speculum and the second speculum is parallel and relative to each other, and driver element, drive first speculum and the second speculum to rotate equal angular along same direction of rotation simultaneously, deviateed with the hot spot for realizing the focusing and leveling system.Present invention simultaneously discloses a kind of focusing and leveling system and itself zero plane method of adjustment using itself zero plane adjusting apparatus.
Description
Technical field
The present invention relates to integrated circuit equipment manufacturing field, more particularly to a kind of focusing and leveling itself zero plane adjusting apparatus
And method.
Background technology
Lithographic equipment is a kind of equipment for being applied to IC manufacturing, is included but is not limited to using the equipment：Integrated electricity
Road manufacture lithographic equipment, liquid crystal panel lithographic equipment, photomask marking press equipment, MEMS (microelectromechanical systems)/MOMS (low-lights
Machine system) lithographic equipment, Advanced Packaging lithographic equipment, printed circuit board (PCB) lithographic equipment and printed circuit board (PCB) processing unit (plant) etc..
With the development of IC manufacturing, integrated level just gradually increases, the also more and more higher of the requirement to lithographic equipment.With
The numerical aperture of projection objective（NA）Increasing, depth of focus is less and less, it is desirable to which silicon chip surface positional accuracy measurement is also more next
It is higher.NA is increasing, and depth of focus is less and less, causes the incident angle of focusing and leveling also increasing.In this case, such as
Structure described in patent US5633721, is satisfied by tilting scene image-forming condition on perspective plane, silicon chip face, receiving plane
(sc, scheimpflug’s condition）, when incident angle continue increase when, due to image planes incline, then on perspective plane, connect
Receipts face major part light is reflected away, and causes the light intensity of detection very weak, impact position repeatable accuracy.
Simultaneously because the influence of the environment such as temperature, causes the optimal focal plane of object lens to there occurs drift, if focusing and leveling is not
Itself zero plane is corrected, focusing and leveling measurement dot center can be made misaligned with object lens exposure field, cause measurement error (to be worked as
Prior exposure actual Z, Rx, Ry survey Z, the difference of Rx, Ry with focusing and leveling).
The content of the invention
In order to overcome defect present in prior art, the present invention to provide a kind of focusing and leveling itself zero plane adjusting apparatus
And method, even if the optimal focal plane of object lens there occurs drift, focusing and leveling can be made to measure dot center and to be overlapped with object lens exposure field,
Do not cause measurement error.
In order to realize foregoing invention purpose, the present invention discloses a kind of focusing and leveling itself zero plane adjusting apparatus, including：The
One is anti-
Mirror and the second speculum are penetrated, the reflecting surface of first speculum and the second speculum is parallel and relative to each other, and
Driver element, drives first speculum and the second speculum to rotate equal angular along same direction of rotation simultaneously, to realize being somebody's turn to do
The hot spot of focusing and leveling system deviates.
Invention additionally discloses a kind of focusing and leveling system, the light beam that light source sends sequentially passes through the first prism and projected light
Door screen, projection
Optical module, scanning reflection mirror, detection optical module, itself zero plane adjusting apparatus, detection diaphragm and the second rib
Detected by a detector after mirror, relay lens, itself zero plane adjusting apparatus include：First speculum and the second reflection
The reflecting surface of mirror, first speculum and the second speculum is parallel and relative to each other, and driver element, drives first reflection
Mirror and the second speculum rotate equal angular along same direction of rotation simultaneously, are deviateed with the hot spot for realizing the focusing and leveling system.
Further, first prism and projection diaphragm gluing are formed, and the detection diaphragm is directly formed and second rib
The surface of mirror.The projection diaphragm is by multiple with a determining deviation slot set into the slot number of, the detection diaphragm, position and the projection
Diaphragm is corresponding；First, second prism is made up of the low dispersing prism of on-right angle and high index of refraction, or double glued by achromatism
Prism is constituted.The Projection optics and detection optical module are double telecentric structure, and Projection optics and detection optics
Modular construction is identical, and is symmetric on objective lens optical axis.The Projection optics and detection optical module are comprising anti-remote
Structure object lens are taken the photograph, and front group and rear group are symmetrical.The multiplying power of the Projection optics and detection optical module is -1.
Invention additionally discloses a kind of itself zero plane method of adjustment for focusing leveling device, in the focusing leveling device
End of probe parallel and relative to each other two speculums of one group of reflecting surface are set, after object lens defocus, according to hot spot described in
The translational movement of object lens image planes and the relation of silicon chip defocusing amount obtain the anglec of rotation of described two speculums, and drive described two
Speculum rotates along same direction of rotation simultaneously so that the measurement field of view center of the focusing leveling device and the exposure of the object lens
Light field of view center overlaps.
Compared with prior art, energy is improved present invention uses reflective detection diaphragm, and slit is directly engraved in
In prism facets；Itself zero plane adjustment mechanism is made using speculum group, solves the problems, such as that itself causes focal plane to float because of environment etc.；3.
Prior art relaying group uses SC structures, and the present invention improves energy utilization with non-SC structures.
Brief description of the drawings
Can be obtained further by following detailed description of the invention and institute's accompanying drawings on the advantages and spirit of the present invention
Solution.
Fig. 1 is the structural representation of the focusing leveling device shown by the present invention；
Fig. 2 is the structural representation that projection-type projects diaphragm；
Fig. 3 is the structural representation of projecting subassembly and probe assembly；
Fig. 4 is the structural representation of reflection type projection diaphragm；
Fig. 5 is that object lens focal plane shift causes focusing and leveling to measure spot center skew schematic diagram；
Fig. 6 is itself zero plane adjustment mechanism and principle schematic of focusing leveling device.
Specific embodiment
The specific embodiment that the invention will now be described in detail with reference to the accompanying drawings.
Fig. 1 is the structural representation of the focusing leveling device shown by the present invention.The invention provides a kind of leveling and focusing
Device as shown in fig. 1, including lighting source 1, illumination group 2, cemented prism 3, projection diaphragm 4, projecting subassembly 5, silicon chip
6th, probe assembly 7, itself zero plane aligning gear 8, detection diaphragm and deviation prism 9, relay lens group 10, detector group 11,
Object lens 12, workbench 13 and signal processing system.Wherein projecting subassembly 5 and probe assembly 7 are anti-symmetrical structure of dolly-out,ing dolly-back.In
After lens group 10 for lenticule group, i.e. each hot spot are an independent visual field, to that should have independent lenticule group, by respective
Lenticule constitute a laser image spot on the detector.Detector group 11 each hot spot has independent detector.Detection diaphragm
It is directly to be engraved on prism, plates reflectance coating.
Focusing and leveling itself zero plane means for correcting shown by the present invention is illustrated below with reference to accompanying drawing 2 to 6
Detailed construction.
As shown in Figure 2, projection diaphragm 4 included in the present invention is made up of the slit of multiple determining deviations, as thing,
It is imaged on silicon chip 6 by projecting subassembly 5 and forms the multiple hot spots of measurement.Projection diaphragm 3 and prism 3 are glued together, make luminous energy
Improve.
As shown in Figure 3, projecting subassembly used in the present invention 5 and probe assembly 7, their structure all sames and for anti-
Dolly-out, dolly-back symmetrical structure（Short focus and long reach）.Projecting subassembly 5 and probe assembly 7 include that preceding group of lens and rear group are saturating
Mirror, and front group and rear group structure is full symmetric, and multiplying power is -1x, while meeting doubly telecentric and sc conditions.And relaying group is non-
Sc conditions, multiplying power is -1x.
As shown in Figure 4, detection diaphragm provided by the present invention is formed directly on deviation prism 9, the quantity of its slit
It is corresponding with projection diaphragm 4 with position.Deviation prism 9 is the wedge mirror at small angle, and preferably on-right angle, high-refractivity and low-dispersion
Prism, it is therefore an objective to reduce dispersion, it is also possible to be made up of the double cemented prisms of achromatism.
As shown in Figure 6, present invention additionally comprises itself zero plane aligning gear 8.Due to the influence of the environment such as temperature,
Cause the optimal focal plane of object lens to there occurs drift, if focusing and leveling is not corrected to itself zero plane, can measure focusing and leveling
Dot center（O ' and o ' '）It is misaligned with object lens exposure field center (o) such as Fig. 5, cause measurement error (the actual Z of current exposure,
Rx, Ry survey Z, the difference of Rx, Ry with focusing and leveling), so the present invention mainly further comprises focusing and leveling itself zero plane
Adjustment mechanism 8.The focusing and leveling itself zero plane adjustment mechanism 8 includes speculum 601 and speculum 602 and driver element,
Focusing and leveling itself zero plane is corrected, its measuring center and exposure center superposition is allowed, error is eliminated.The structure by
One group of speculum 601,602 for separating at regular intervals is constituted, and by the driver element drive two speculums simultaneously clockwise/
Or one angle of rotate counterclockwise realizes that hot spot deviates（As shown in Figure 6）, realize that zero plane adjusts adjustment function.Speculum
601 and 602 are parallel to each other into 45 degree of placements, and near the image planes of the focusing and leveling system.
Under itself zero plane correcting process of itself zero plane aligning gear 8 is：
Assuming that speculum turns clockwise a angles simultaneously, two speculums are d along the spacing of the optical axis direction of object lens 12, can be with
Try to achieve expression formula of the hot spot along the translational movement △ Y of image planes：
Cos(45+a)=[dsin(2a)]/y
Y=[dsin2a]/cos(45+a)
Sin(45-a)=T/y
△Y=T/cosB=[dsin(45-a)sin2a]/cos(45+a) cosB
When the vertical defocus of silicon chip, hot spot is along the translational movement of the image planes of object lens 12 and the relation of defocusing amount：
△ Y= 2△z tanB=[dsin(45-a)sin2a]/cos(45+a) cosB
A is rotated according to adjustment speculum simultaneously, translational movement of the different hot spots along image planes is obtained, so as to obtain what is accordingly compensated
Defocusing amount △ z.The optimal focal plane position after FM obtains object lens defocus, feeds back to silicon chip workbench, drives silicon chip to object lens
Optimal focal plane position, now records Electric signal processing silicon chip highly（It is not 0）, calculate defocusing amount and corresponding image planes bias
The △ z tanB of △ Y=2, finally calculate rotation a, rotate speculum, make z=0, focusing and leveling is measured field of view center and thing
The exposure field center superposition of mirror 12.
Present invention simultaneously provides a kind of focusing and leveling method, by measuring the height and tilt quantity of silicon chip, the amount feeds back to
The driver of workbench, drives workbench to make silicon chip in optimum position.Specifically include, there is provided a lighting source,：Lighting source is
Wideband light source, wavelength should avoid object lens light source, and broadband light is irradiated to projection diaphragm slit after light fixture is collimated
On, projection slit is imaged onto on silicon chip face by projecting subassembly and forms measurement hot spot, and laser image spot is imaged through probe assembly on silicon chip
Onto detection slit, eventually pass relay lens and be imaged onto on detector.By detecting measurement hot spot light distribution and signal
Treatment calculates the height and tilt quantity of measurement silicon chip, and the amount is fed back to table driver, drive silicon chip to object lens most
Jia Jiaomianchu.The modulation of the vibration realizing to light intensity of speculum is wherein scanned through, the amplitude of scanning is equal to the one of spot length
Half.
The present invention also provides a kind of itself zero plane method of adjustment for focusing leveling device, and the method is specifically included to be worked as
After object lens defocus, the optimal focal plane position of object lens is obtained, feed back to silicon chip workbench, drive silicon chip to the optimal focal plane position of object lens
Put, it not is 0 that now Electric signal processing is obtained silicon chip height, inclined, and calculates defocusing amount and corresponding image planes bias, is finally counted
Calculate speculum group anglec of rotation a, it is 0 to drive speculum group rotation to make height, incline, that is, focusing and leveling zero plane and
The focal plane of object lens overlaps.
Compared with prior art, it is provided by the present invention for itself zero plane adjusting apparatus of focusing leveling device and side
Method improves light spot energy, so as to measure repeatable accuracy raising.
First, according to formula：Transmitance：T=t2*n2*cos(a2)/ n1*cos(a1)；
Reflectivity:R=r2,rs2=sin2(a2- a1)/ sin2(a2+ a1), rp2=tan2(a2- a1)/ tan2(a2
+ a1)；
rs+ Tp=1, rp+ Tp=1；
When incidence angle is 85 degree, the technical scheme that prior art is used finally is calculated by projecting diaphragm face and spy
The transmitance of light-metering door screen receiving plane is：36%；And invention now is reflective due to detection diaphragm face, so being 100%.
And invention now is reflective due to detection diaphragm face, so being 100%.
Then, there is technology relaying group using SC structures, detector receiving surface angle is 15 degree, and the present invention is tied with non-SC
Structure, makes detector receiving surface angle be 0, so as to improve energy.
Simply preferred embodiment of the invention described in this specification, above example is only used to illustrate the present invention
Technical scheme rather than limitation of the present invention.All those skilled in the art pass through logic analysis, reasoning under this invention's idea
Or the limited available technical scheme of experiment, all should be within the scope of the present invention.
Claims (5)
1. a kind of focusing and leveling system, the light beam that light source sends sequentially passes through the first prism and projection diaphragm, Projection optics,
By one after scanning reflection mirror, detection optical module, itself zero plane adjusting apparatus, detection diaphragm and the second prism, relay lens
Detector is detected, it is characterised in that first prism and projection diaphragm gluing are formed, and the detection diaphragm is formed directly into
The surface of second prism, the detection diaphragm is reflective gratings, and itself zero plane adjusting apparatus include：First is anti-
Penetrate mirror and the second speculum, the reflecting surface of first speculum and the second speculum is parallel and relative to each other, and drive single
Unit, drives first speculum and the second speculum to rotate equal angular along same direction of rotation simultaneously, to realize the tune
The hot spot of burnt leveling system deviates, and tries to achieve translational movement of the hot spot along image planes, and then try to achieve defocusing amount.
2. focusing and leveling system as claimed in claim 1, it is characterised in that the projection diaphragm is narrow with a determining deviation by multiple
Seam composition, the slot number of the detection diaphragm, position are corresponding with the projection diaphragm；First, second prism is by non-
The low dispersing prism composition of right angle and high index of refraction, or be made up of the double cemented prisms of achromatism.
3. focusing and leveling system as claimed in claim 1, it is characterised in that the Projection optics and detection optical module
Double telecentric structure is, and Projection optics are identical with detection optical assembly structure, and be symmetric on objective lens optical axis.
4. focusing and leveling system as claimed in claim 3, it is characterised in that the Projection optics and detection optical module
Anti- structure object lens of dolly-out,ing dolly-back are included, and front group and rear group are symmetrical.
5. focusing and leveling system as claimed in claim 3, it is characterised in that the Projection optics and detection optical module
Multiplying power be -1.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201310268139.XA CN104280851B (en) | 2013-07-01 | 2013-07-01 | A kind of focusing and leveling itself zero plane adjusting apparatus and method |
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| CN201310268139.XA CN104280851B (en) | 2013-07-01 | 2013-07-01 | A kind of focusing and leveling itself zero plane adjusting apparatus and method |
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| CN104280851B true CN104280851B (en) | 2017-06-27 |
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| CN106814547B (en) * | 2015-11-30 | 2019-01-29 | 上海微电子装备（集团）股份有限公司 | A kind of detecting and correcting device and survey calibration method |
| CN109211117B (en) * | 2017-06-30 | 2021-04-09 | 上海微电子装备（集团）股份有限公司 | Line width measuring system and line width measuring device |
| CN114114860B (en) * | 2020-08-31 | 2023-02-28 | 上海微电子装备（集团）股份有限公司 | Focus detection device and method |
| CN112666674A (en) * | 2020-12-28 | 2021-04-16 | 中国科学院长春光学精密机械与物理研究所 | Optical image motion compensation method and device |
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| US5118957A (en) * | 1988-10-11 | 1992-06-02 | Canon Kabushiki Kaisha | Method and apparatus for precisely detecting surface position of a patterned wafer |
| US5633721A (en) * | 1991-10-30 | 1997-05-27 | Nikon Corporation | Surface position detection apparatus |
| JP2004241744A (en) * | 2003-02-10 | 2004-08-26 | Nikon Corp | Surface position detector, aligner and aligning method |
| JP2008177308A (en) * | 2007-01-18 | 2008-07-31 | Nikon Corp | Position detection apparatus, exposure apparatus, and device manufacturing method |
| CN102252606A (en) * | 2010-05-21 | 2011-11-23 | 上海微电子装备有限公司 | Zero adjusting device for focusing and leveling measurement system |
| CN102768469A (en) * | 2011-05-03 | 2012-11-07 | 上海微电子装备有限公司 | Focusing and bisecting system and adjustment method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7371596B2 (en) * | 2004-12-30 | 2008-05-13 | Semicube, Inc. | Parallel-beam scanning for surface patterning of materials |
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2013
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Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5118957A (en) * | 1988-10-11 | 1992-06-02 | Canon Kabushiki Kaisha | Method and apparatus for precisely detecting surface position of a patterned wafer |
| US5633721A (en) * | 1991-10-30 | 1997-05-27 | Nikon Corporation | Surface position detection apparatus |
| JP2004241744A (en) * | 2003-02-10 | 2004-08-26 | Nikon Corp | Surface position detector, aligner and aligning method |
| JP2008177308A (en) * | 2007-01-18 | 2008-07-31 | Nikon Corp | Position detection apparatus, exposure apparatus, and device manufacturing method |
| CN102252606A (en) * | 2010-05-21 | 2011-11-23 | 上海微电子装备有限公司 | Zero adjusting device for focusing and leveling measurement system |
| CN102768469A (en) * | 2011-05-03 | 2012-11-07 | 上海微电子装备有限公司 | Focusing and bisecting system and adjustment method thereof |
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| CN104280851A (en) | 2015-01-14 |
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Address after: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |