CN104280851A - Adjusting device for focusing and leveling self zero plane and method thereof - Google Patents
Adjusting device for focusing and leveling self zero plane and method thereof Download PDFInfo
- Publication number
- CN104280851A CN104280851A CN201310268139.XA CN201310268139A CN104280851A CN 104280851 A CN104280851 A CN 104280851A CN 201310268139 A CN201310268139 A CN 201310268139A CN 104280851 A CN104280851 A CN 104280851A
- Authority
- CN
- China
- Prior art keywords
- focusing
- catoptron
- leveling
- prism
- diaphragm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7026—Focusing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Automatic Focus Adjustment (AREA)
Abstract
The invention discloses an adjusting device for focusing and leveling a self zero plane, which comprises the components of: a first reflector and a second reflector, wherein the reflecting surfaces of the first reflector and the second reflector are parallel with and opposes each other; and a driving unit which drives the first reflector and the second reflector to simultaneously rotate for a same angle in a same rotating direction, thereby realizing light spot deviation of a focusing and leveling system. The invention simultaneously discloses the focusing and leveling system with the adjusting device for focusing and leveling the self zero plane, and a self zero plane adjusting method.
Description
Technical field
The present invention relates to integrated circuit equipment manufacturing field, particularly relate to a kind of focusing and leveling self zero plane adjusting gear and method.
Background technology
Lithographic equipment is a kind of equipment being applied to IC manufacturing, utilizes this equipment to include but not limited to: IC manufacturing lithographic equipment, liquid crystal panel lithographic equipment, photomask marking press equipment, MEMS (microelectromechanical systems)/MOMS (micro-optical-mechanical system) lithographic equipment, Advanced Packaging lithographic equipment, printed circuit board (PCB) lithographic equipment and printed circuit board (PCB) processing unit (plant) etc.
Along with the development of IC manufacturing, integrated level increases just gradually, also more and more higher to the requirement of lithographic equipment.Along with the numerical aperture (NA) of projection objective is increasing, depth of focus is more and more less, requires that silicon chip surface positional accuracy measurement is also more and more higher.NA is increasing, and depth of focus is more and more less, causes the incident angle of focusing and leveling also increasing.In this case, as in patent US5633721 the structure introduced, projecting plane, silicon chip face, receiving plane all meet tilting scene image-forming condition (sc, scheimpflug ' s condition), when incident angle continue increase time, due to image planes tilt, then on projecting plane, receiving plane major part light reflect away, cause the light intensity of detection very weak, impact position repeatable accuracy.
Simultaneously due to the impact of the environment such as temperature, the optimal focal plane of object lens is caused to there occurs drift, if focusing and leveling does not correct self zero plane, focusing and leveling measurement point center can be made not overlap with object lens exposure field, cause measuring error (i.e. current exposure field actual Z, Rx, Ry and Z that focusing and leveling is surveyed, the difference of Rx, Ry).
Summary of the invention
In order to overcome the defect existed in prior art, the invention provides a kind of focusing and leveling self zero plane adjusting gear and method, even if the optimal focal plane of object lens there occurs drift, focusing and leveling measurement point center can be made to overlap with object lens exposure field, do not cause measuring error.
In order to realize foregoing invention object, the present invention discloses a kind of focusing and leveling self zero plane adjusting gear, comprising: first is anti-
Penetrate mirror and the second catoptron, this first catoptron is parallel with the reflecting surface of the second catoptron and toward each other, and driver element, drive this first catoptron and the second catoptron to rotate equal angular along same sense of rotation simultaneously, depart from the hot spot realizing this focusing and leveling system.
The present invention also discloses a kind of focusing and leveling system, and the light beam that light source sends through the first prism and projection diaphragm, projects successively
Optical module, scanning reflection mirror, detection optical module, self zero plane adjusting gear, detection diaphragm and the second prism, after relay lens detect by the detector, this self zero plane adjusting gear comprises: the first catoptron and the second catoptron, this first catoptron is parallel with the reflecting surface of the second catoptron and toward each other, and driver element, drive this first catoptron and the second catoptron to rotate equal angular along same sense of rotation simultaneously, depart from the hot spot realizing this focusing and leveling system.
Further, this first prism and projection diaphragm gummed form, and this detection diaphragm directly forms the surface with this second prism.This projection diaphragm is become with a determining deviation slot set by multiple, and slot number, the position of this detection diaphragm are corresponding with this projection diaphragm; This first, second prism by on-right angle and the low dispersing prism of high index of refraction form, or to be made up of the two cemented prism of achromatism.This Projection optics and detection optical module are double telecentric structure, and Projection optics is identical with detection optical assembly structure, and are symmetric about objective lens optical axis.This Projection optics and detection optical module all comprise anti-structure object lens of dolly-out,ing dolly-back, and front group and rear group of symmetry.The multiplying power of this Projection optics and detection optical module is-1.
The present invention also discloses a kind of self zero plane method of adjustment for focusing leveling device, in the end of probe of this focusing leveling device, parallel and two catoptrons respect to one another of one group of reflecting surface are set, when after object lens out of focus, obtain the anglec of rotation of described two catoptrons along the translational movement of described object lens image planes and the relation of silicon chip defocusing amount according to hot spot, and drive described two catoptrons to rotate along same sense of rotation simultaneously, make the measurement field of view center of described focusing leveling device and the exposure field center superposition of described object lens.
Compared with prior art, present invention uses reflective detection diaphragm and improve energy, and slit is directly engraved in prism facets; Use catoptron group to make self zero plane adjusting mechanism, solve the problem self causing focal plane to float because of environment etc.; 3. prior art relaying group adopts SC structure, and the non-SC structure of the present invention, improve Energy harvesting.
Accompanying drawing explanation
Can be further understood by following detailed Description Of The Invention and institute's accompanying drawings about the advantages and spirit of the present invention.
Fig. 1 is the structural representation of illustrated focusing leveling device;
Fig. 2 is the structural representation of projection-type projection diaphragm;
Fig. 3 is the structural representation of projecting subassembly and probe assembly;
Fig. 4 is the structural representation of reflection type projection diaphragm;
Fig. 5 is that object lens focal plane shift causes focusing and leveling to measure spot center skew schematic diagram;
Fig. 6 is self zero plane adjusting mechanism and principle schematic of focusing leveling device.
Embodiment
Specific embodiments of the invention are described in detail below in conjunction with accompanying drawing.
Fig. 1 is the structural representation of illustrated focusing leveling device.The invention provides a kind of leveling and focusing device as shown in fig. 1, comprising lighting source 1, illumination group 2, cemented prism 3, projection diaphragm 4, projecting subassembly 5, silicon chip 6, probe assembly 7, self zero plane aligning gear 8, detection diaphragm and deviation prism 9, relay lens group 10, detector set 11, object lens 12, worktable 13 and signal processing system.Wherein projecting subassembly 5 and probe assembly 7 are anti-symmetrical structure of dolly-out,ing dolly-back.Relay lens group 10 is lenticule group, and namely each hot spot is an independently visual field, to there being independently lenticule group, forms a laser image spot on the detector through respective lenticule.The each hot spot of detector set 11 has independently detector.Detection diaphragm is directly engraved on prism, plates reflectance coating.
The detailed construction of illustrated focusing and leveling self zero plane means for correcting is illustrated below with reference to accompanying drawing 2 to 6.
As shown in Figure 2, projection diaphragm 4 included in the present invention is made up of the slit of a multiple determining deviation, as thing, is imaged on silicon chip 6 forms the multiple hot spot of measurement through projecting subassembly 5.Projection diaphragm 3 and prism 3 glued together, luminous energy is improved.
As shown in Figure 3, projecting subassembly 5 used in the present invention and probe assembly 7, their structures are all identical and for anti-symmetrical structure of dolly-out,ing dolly-back (short focus and long reach).Projecting subassembly 5 and probe assembly 7 include front group of lens and rear group of lens, and front group and rear group of structure full symmetric, multiplying power is-1x, meets two heart far away and sc condition simultaneously.And relaying group is non-sc condition, multiplying power is-1x.
As shown in Figure 4, detection diaphragm provided by the present invention is directly formed on deviation prism 9, the quantity of its slit and position corresponding with projection diaphragm 4.Deviation prism 9 is the wedge mirrors at little angle, and is preferably on-right angle, high-refractivity and low-dispersion prism, and object reduces dispersion, also can be made up of the two cemented prism of achromatism.
As shown in Figure 6, the present invention also comprises self zero plane aligning gear 8.Due to the impact of the environment such as temperature, the optimal focal plane of object lens is caused to there occurs drift, if focusing and leveling does not correct self zero plane, focusing and leveling measurement point center (o ' and o ' ') can be made not overlap as Fig. 5 with object lens exposure field center (o), cause measuring error (current exposure field actual Z, Rx, Ry and Z that focusing and leveling is surveyed, the difference of Rx, Ry), so the present invention mainly further comprises focusing and leveling self a zero plane adjusting mechanism 8.This focusing and leveling self zero plane adjusting mechanism 8 comprises catoptron 601 and catoptron 602 and driver element, and focusing and leveling self zero plane can be corrected, and allows its measuring center and exposure field center superposition, eliminates error.This structure is made up of the one group of catoptron 601,602 separated at regular intervals, and by described drive unit drives two catoptron clockwise simultaneously/or be rotated counterclockwise an angle and realize hot spot and depart from (as shown in Figure 6), realize zero plane adjustment adjustment function.Catoptron 601 and 602 is parallel to each other into 45 degree of placements, and near the image planes being positioned at this focusing and leveling system.
Under self zero plane correcting process of this self zero plane aligning gear 8 is:
Suppose that catoptron turns clockwise a angle simultaneously, two catoptrons are d along the spacing of object lens 12 optical axis direction, can in the hope of the expression formula of hot spot along the translational movement △ Y of image planes:
Cos(45+a)=[dsin(2a)]/y
Y=[dsin2a]/cos(45+a)
Sin(45-a)=T/y
△Y=T/cosB=[dsin(45-a)sin2a]/cos(45+a) cosB
When the vertical out of focus of silicon chip, the translational movement of hot spot along object lens 12 image planes and the relation of defocusing amount:
△ Y= 2△z tanB=[dsin(45-a)sin2a]/cos(45+a) cosB
Rotate a according to adjustment catoptron simultaneously, obtain the translational movement of different hot spots along image planes, thus obtain the defocusing amount △ z of corresponding compensation.By optimal focal plane position after FM acquisition object lens out of focus, feed back to silicon chip worktable, drive silicon chip to the optimal focal plane position of object lens, now record Electric signal processing silicon chip height (not being 0), calculate defocusing amount and corresponding image planes bias △ Y=2 △ z tanB, finally calculate and rotate a, catoptron is rotated, make z=0, make focusing and leveling measure field of view center and object lens 12 exposure field center superposition.
The present invention provides a kind of focusing and leveling method simultaneously, and by measuring height and the tilt quantity of silicon chip, this amount feeds back to the driver of worktable, drives worktable to make silicon chip in optimum position.Specifically comprise, one lighting source is provided,: lighting source is wideband light source, wavelength should avoid object lens light source, broadband light is irradiated in projection diaphragm slit after light fixture collimates, projection slit is imaged onto on silicon chip face through projecting subassembly and forms measurement hot spot, and on silicon chip, laser image spot is imaged onto on detection slit through probe assembly, eventually passes relay lens and is imaged onto on detector.Measure hot spot light distribution and signal transacting and calculate by detecting the height and tilt quantity of measuring silicon chip, this amount is fed back to table driver, drives silicon chip to the optimal focal plane place of object lens.Wherein through the vibration realizing of scanning reflection mirror to the modulation of light intensity, the amplitude of scanning equals the half of spot length.
The present invention also provides a kind of self zero plane method of adjustment for focusing leveling device, the method specifically comprises when after object lens out of focus, obtain the optimal focal plane position of object lens, feed back to silicon chip worktable, drive silicon chip to the optimal focal plane position of object lens, now Electric signal processing is obtained silicon chip height, tilted is not 0, calculate defocusing amount and corresponding image planes bias, finally calculate catoptron group anglec of rotation a, drive catoptron group to rotate making height, tilt is 0, and namely the zero plane of focusing and leveling and the focal plane of object lens overlap.
Compared with prior art, self the zero plane adjusting gear for focusing leveling device provided by the present invention and method make light spot energy improve, thus measure repeatable accuracy raising.
First, according to formula: transmitance: T=t2*n2*cos (a2)/n1*cos (a1);
Reflectivity: R=r2, rs2=sin2 (a2-a1)/sin2 (a2+ a1), rp2=tan2 (a2-a1)/tan2 (a2+ a1);
rs+ Tp=1, rp+ Tp=1；
When incident angle is 85 degree, the technical scheme that prior art uses finally is calculated and is by the transmitance of projection diaphragm face and detection diaphragm receiving plane: 36%; And invent now because detection diaphragm face is reflective, institute thinks 100%.
And invent now because detection diaphragm face is reflective, institute thinks 100%.
Then, have technology relaying group to adopt SC structure, detector receiving surface angle is 15 degree, and the non-SC structure of the present invention, make detector receiving surface angle be 0, thus improve energy.
Just preferred embodiment of the present invention described in this instructions, above embodiment is only in order to illustrate technical scheme of the present invention but not limitation of the present invention.All those skilled in the art, all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (8)
1. focusing and leveling self a zero plane adjusting gear, it is characterized in that, comprise: the first catoptron and the second catoptron, described first catoptron is parallel with the reflecting surface of the second catoptron and toward each other, and driver element, drive described first catoptron and the second catoptron to rotate equal angular along same sense of rotation simultaneously, depart from the hot spot realizing described focusing and leveling system.
2. a focusing and leveling system, the light beam that light source sends is successively through the first prism and projection diaphragm, Projection optics, scanning reflection mirror, detection optical module, self zero plane adjusting gear, detection diaphragm and the second prism, after relay lens detect by the detector, it is characterized in that, self zero plane adjusting gear described comprises: the first catoptron and the second catoptron, described first catoptron is parallel with the reflecting surface of the second catoptron and toward each other, and driver element, drive described first catoptron and the second catoptron to rotate equal angular along same sense of rotation simultaneously, depart from the hot spot realizing described focusing and leveling system.
3. focusing and leveling system as claimed in claim 2, is characterized in that, described first prism and projection diaphragm gummed form, and described detection diaphragm directly forms the surface with described second prism.
4. focusing and leveling system as claimed in claim 3, is characterized in that, described projection diaphragm is become with a determining deviation slot set by multiple, and slot number, the position of described detection diaphragm are corresponding with described projection diaphragm; First, second prism described by on-right angle and the low dispersing prism of high index of refraction form, or to be made up of the two cemented prism of achromatism.
5. focusing and leveling system as claimed in claim 2, is characterized in that, described Projection optics and detection optical module are double telecentric structure, and Projection optics is identical with detection optical assembly structure, and are symmetric about objective lens optical axis.
6. focusing and leveling system as claimed in claim 5, is characterized in that, described Projection optics and detection optical module all comprise anti-structure object lens of dolly-out,ing dolly-back, and front group and rear group of symmetry.
7. focusing and leveling system as claimed in claim 5, is characterized in that, the multiplying power of described Projection optics and detection optical module is-1.
8. self the zero plane method of adjustment for focusing leveling device, it is characterized in that, in the end of probe of described focusing leveling device, parallel and two catoptrons respect to one another of one group of reflecting surface are set, when after object lens out of focus, obtain the anglec of rotation of described two catoptrons along the translational movement of described object lens image planes and the relation of silicon chip defocusing amount according to hot spot, and drive described two catoptrons to rotate along same sense of rotation simultaneously, make the measurement field of view center of described focusing leveling device and the exposure field center superposition of described object lens.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310268139.XA CN104280851B (en) | 2013-07-01 | 2013-07-01 | A kind of focusing and leveling itself zero plane adjusting apparatus and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310268139.XA CN104280851B (en) | 2013-07-01 | 2013-07-01 | A kind of focusing and leveling itself zero plane adjusting apparatus and method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104280851A true CN104280851A (en) | 2015-01-14 |
| CN104280851B CN104280851B (en) | 2017-06-27 |
Family
ID=52255895
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310268139.XA Active CN104280851B (en) | 2013-07-01 | 2013-07-01 | A kind of focusing and leveling itself zero plane adjusting apparatus and method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104280851B (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106814547A (en) * | 2015-11-30 | 2017-06-09 | 上海微电子装备有限公司 | A kind of detecting and correcting device and survey calibration method |
| CN109211117A (en) * | 2017-06-30 | 2019-01-15 | 上海微电子装备（集团）股份有限公司 | Wire width measuring system and wire width measuring device |
| CN112666674A (en) * | 2020-12-28 | 2021-04-16 | 中国科学院长春光学精密机械与物理研究所 | Optical image motion compensation method and device |
| CN114114860A (en) * | 2020-08-31 | 2022-03-01 | 上海微电子装备（集团）股份有限公司 | Focus detection device and method |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5118957A (en) * | 1988-10-11 | 1992-06-02 | Canon Kabushiki Kaisha | Method and apparatus for precisely detecting surface position of a patterned wafer |
| US5633721A (en) * | 1991-10-30 | 1997-05-27 | Nikon Corporation | Surface position detection apparatus |
| JP2004241744A (en) * | 2003-02-10 | 2004-08-26 | Nikon Corp | Surface position detector, aligner and aligning method |
| JP2008177308A (en) * | 2007-01-18 | 2008-07-31 | Nikon Corp | Position detection apparatus, exposure apparatus, and device manufacturing method |
| US20080192316A1 (en) * | 2004-12-30 | 2008-08-14 | Warner Raymond M | Parallel-Beam Scanning for Surface Patterning of Materials |
| CN102252606A (en) * | 2010-05-21 | 2011-11-23 | 上海微电子装备有限公司 | Zero adjusting device for focusing and leveling measurement system |
| CN102768469A (en) * | 2011-05-03 | 2012-11-07 | 上海微电子装备有限公司 | Focusing and bisecting system and adjustment method thereof |
-
2013
- 2013-07-01 CN CN201310268139.XA patent/CN104280851B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5118957A (en) * | 1988-10-11 | 1992-06-02 | Canon Kabushiki Kaisha | Method and apparatus for precisely detecting surface position of a patterned wafer |
| US5633721A (en) * | 1991-10-30 | 1997-05-27 | Nikon Corporation | Surface position detection apparatus |
| JP2004241744A (en) * | 2003-02-10 | 2004-08-26 | Nikon Corp | Surface position detector, aligner and aligning method |
| US20080192316A1 (en) * | 2004-12-30 | 2008-08-14 | Warner Raymond M | Parallel-Beam Scanning for Surface Patterning of Materials |
| JP2008177308A (en) * | 2007-01-18 | 2008-07-31 | Nikon Corp | Position detection apparatus, exposure apparatus, and device manufacturing method |
| CN102252606A (en) * | 2010-05-21 | 2011-11-23 | 上海微电子装备有限公司 | Zero adjusting device for focusing and leveling measurement system |
| CN102768469A (en) * | 2011-05-03 | 2012-11-07 | 上海微电子装备有限公司 | Focusing and bisecting system and adjustment method thereof |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106814547A (en) * | 2015-11-30 | 2017-06-09 | 上海微电子装备有限公司 | A kind of detecting and correcting device and survey calibration method |
| CN106814547B (en) * | 2015-11-30 | 2019-01-29 | 上海微电子装备（集团）股份有限公司 | A kind of detecting and correcting device and survey calibration method |
| CN109211117A (en) * | 2017-06-30 | 2019-01-15 | 上海微电子装备（集团）股份有限公司 | Wire width measuring system and wire width measuring device |
| CN109211117B (en) * | 2017-06-30 | 2021-04-09 | 上海微电子装备（集团）股份有限公司 | Line width measuring system and line width measuring device |
| CN114114860A (en) * | 2020-08-31 | 2022-03-01 | 上海微电子装备（集团）股份有限公司 | Focus detection device and method |
| CN114114860B (en) * | 2020-08-31 | 2023-02-28 | 上海微电子装备（集团）股份有限公司 | Focus detection device and method |
| CN112666674A (en) * | 2020-12-28 | 2021-04-16 | 中国科学院长春光学精密机械与物理研究所 | Optical image motion compensation method and device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104280851B (en) | 2017-06-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN100535767C (en) | Focusing leveling measuring method and device | |
| EP1134548A2 (en) | Laser alignment system with plural lasers for impingement on a single target | |
| CN108598032A (en) | A kind of engagement of wafer is to Barebone and alignment methods | |
| CN108955537B (en) | System and method capable of realizing accurate measurement of high and low point positions of off-axis reflector | |
| CN110207588A (en) | A kind of prism of corner cube optical apex sighting device and its Method of Adjustment | |
| CN101614523B (en) | Multi-beam long-rail interferometer for detecting grazing tubular off-axis aspheric mirror | |
| CN104280851A (en) | Adjusting device for focusing and leveling self zero plane and method thereof | |
| CN114265205B (en) | Processing method of glued prism | |
| CN106094234A (en) | A kind of autocollimatic light path system with polarization beam splitting element | |
| CN109358435B (en) | Device and method for adjusting perpendicularity of double telecentric lenses | |
| CN110793756A (en) | Optical correction device for monitoring optical axis of reflecting telescope based on polarization beam splitting | |
| CN205942120U (en) | Autocollimatic optic system with polarization beam splitting element | |
| JP2019124649A (en) | Light radiation device, object information detector, method for adjusting optical path, method for detecting object information, and optical modulation unit | |
| CN102566295A (en) | Lithography device and method for measuring multi-light spot zero offset | |
| CN211668748U (en) | Optical correction device for monitoring optical axis of reflecting telescope based on polarization beam splitting | |
| CN103365103B (en) | A kind of focusing leveling device and focusing and leveling method | |
| KR100763974B1 (en) | Method and apparatus for aligning optical axis for wavefront sensor for mid-infrared band | |
| CN107450287B (en) | Focusing and leveling measurement apparatus and method | |
| CN100462773C (en) | Method for accurate determination of laser transmitting-receiving path coaxial reference using Zernike coefficient | |
| CN103838088A (en) | Focusing and levelling device and method | |
| CN102207694A (en) | Imaging adjustment unit and focusing and leveling control system using the unit | |
| CN115079429B (en) | Adjustment system and adjustment method for periscope type schlieren collimation light source optical system | |
| CN205898079U (en) | Polarization closes restraints auto -collimation optic system based on two refracting element | |
| CN105807571B (en) | A kind of litho machine focusing and leveling system and its focusing and leveling method | |
| CN205580406U (en) | Autocollimator |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |