CN109211117A - Wire width measuring system and wire width measuring device - Google Patents
Wire width measuring system and wire width measuring device Download PDFInfo
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- CN109211117A CN109211117A CN201710527292.8A CN201710527292A CN109211117A CN 109211117 A CN109211117 A CN 109211117A CN 201710527292 A CN201710527292 A CN 201710527292A CN 109211117 A CN109211117 A CN 109211117A
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- 238000005259 measurement Methods 0.000 claims abstract description 93
- 238000000034 method Methods 0.000 claims abstract description 16
- 239000000758 substrate Substances 0.000 claims description 119
- 238000001514 detection method Methods 0.000 claims description 29
- 238000005286 illumination Methods 0.000 claims description 18
- 230000003287 optical effect Effects 0.000 claims description 11
- 230000011514 reflex Effects 0.000 claims description 5
- 238000001914 filtration Methods 0.000 claims description 3
- 238000012360 testing method Methods 0.000 claims description 3
- 230000005540 biological transmission Effects 0.000 claims description 2
- 238000009738 saturating Methods 0.000 claims description 2
- 239000000571 coke Substances 0.000 claims 2
- 238000003384 imaging method Methods 0.000 description 25
- 101700004678 SLIT3 Proteins 0.000 description 22
- 102100027339 Slit homolog 3 protein Human genes 0.000 description 22
- 238000010586 diagram Methods 0.000 description 6
- 238000000399 optical microscopy Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 238000012545 processing Methods 0.000 description 4
- 230000000007 visual effect Effects 0.000 description 4
- 238000013461 design Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 239000002131 composite material Substances 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- 101100117236 Drosophila melanogaster speck gene Proteins 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
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- 238000004519 manufacturing process Methods 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 238000000879 optical micrograph Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000011897 real-time detection Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/021—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using plane or convex mirrors, parallel phase plates, or particular reflectors
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J2003/1208—Prism and grating
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
The invention discloses a kind of measuring systems, including wire width measuring unit, focal plane and profile measurement unit, defocus bigness scale unit and label search positioning unit.CD measurement, label search positioning, section profile measurement and focal plane may be implemented in the measuring system.The invention also discloses at least one in a kind of wire width measuring system, including wire width measuring unit and focal plane and profile measurement unit, defocus bigness scale unit and label search positioning unit.The invention also discloses a kind of wire width measuring devices.The invention also discloses a kind of line width measuring methods.
Description
Technical field
The present invention relates to a kind of wire width measuring system and a kind of wire width measuring devices.
Background technique
It is the graphics process precision for assessing and controlling technique, ad hoc meter in the manufacture of integrated circuit photomask and photoetching process
A kind of dedicated bargraphs reflecting integrated circuit feature line thickness, the critical size (Critical of the figure
Dimension, abbreviation CD) or the measurement of referred to as line width it is particularly significant, the control of size will directly affect entire aobvious
The performance of showing device, in the prior art, the general work principle of micron order CD measuring device is: being obtained using optical microphotograph camera lens
The image for taking tested label, calculates the indexs such as its CD by algorithm.
Chinese patent CN1220032C filed on January 30th, 2003 discloses a kind of CD measuring device, as shown in Figure 1,
The device is that glass substrate is imaged by optical microscopy, carries out Image Acquisition by CCD, is carried out using image procossing
The wire width measuring of wiring pattern.The back side of glass substrate is imaged in the device, according to brightness-pixel characteristic (brightness waveform)
Size is acquired, although the device can measure the section shape of part line width, just for the line close to glass substrate side
Width is less than the figure of upper layer line width, and in the apparatus, has used the powerful optical microscopy 7 of big NA, the measurement depth of field compared with
It is small, and the fluctuation of measurand real estate type is larger, defocus can have a huge impact CD measurement result, particularly with bright
Degree-pixel characteristic curve has larger impact, although in the CD measuring device, the microlens of optical microscopy 7 can be carried out
It moves integrally, but does not provide the device and method for finding optimal focal plane, in addition, the true field of optical microscopy 7 is minimum, for
The position of wiring pattern to be tested on the glass substrate is needed, which not publicly searches for the device of positioning.
To solve the problems, such as above, current usual way is first carried out whole audience label search using low range camera lens, finds quilt
Wiring pattern is surveyed, recycles optical microscopy shooting image to carry out image algorithm processing and calculates line width, utilize vertical adjustment device
Carry out height adjustment.CD measuring device, such as Fig. 2 disclosed in Chinese patent CN103364935A filed on March 25th, 2013
It is shown, using a variety of multiplying power camera lenses, search, wire width measuring are marked respectively.It is adjusted most using laser auto-focusing away from device
Good focal plane, but this method can not measure the section profile of wiring pattern.
Summary of the invention
The present invention provides a kind of wire width measuring systems, can not measure wiring diagram to solve existing wire width measuring system
The problem of section profile of shape.
In order to solve the above-mentioned technical problem, the technical scheme is that
A kind of wire width measuring system, which is characterized in that including wire width measuring unit and focal plane and profile measurement unit,
The wire width measuring unit includes the second measuring beam, the second detecting module, the second measuring beam vertical incidence to substrate
Surface is received after substrate surface reflection by second detecting module.
Preferably, measuring beam used by the wire width measuring unit and the focal plane and profile measurement unit
With different wavelength.
Preferably, the focal plane and profile measurement unit using light in the form of be projection hot spot.
Preferably, the focal plane and profile measurement unit include the first measuring beam, the second detecting module, it is described
First measuring beam is slanted to the substrate surface, is received after substrate surface reflection by second detecting module.
Preferably, further including first light source, projection slit, the first light source issues illuminating bundle and passes through the projection
First measuring beam is formed after slit.
Preferably, further including a projection diaphragm, the projection diaphragm is equipped with the projection slit.
Preferably, further including a defocus bigness scale unit.
Preferably, the defocus bigness scale unit includes the first measuring beam, the first detecting module, the first measurement light
Beam is slanted to the substrate surface, and is received after substrate surface reflection by first detecting module.
Preferably, further including first light source, projection slit, the first light source issues illuminating bundle and passes through the projection
First measuring beam is formed after slit.
Preferably, further including a projection diaphragm, the projection diaphragm is equipped with the projection slit.
Preferably, the defocus bigness scale unit and the focal plane and profile measurement unit can share same incident survey
Measure light beam.
Preferably, further include the first Amici prism, the incidence measuring beam by after substrate surface reflection by
It is received respectively by the defocus bigness scale unit and the focal plane and profile measurement unit after first Amici prism.
Preferably, further including label search positioning unit.
Preferably, the label search positioning unit further includes third measuring beam, the third measuring beam oblique fire
The extremely substrate surface, and received after substrate surface reflection by first detecting module.
Preferably, two or more focal planes and profile measurement list can be set in the wire width measuring system
Member, multiple focal planes and profile measurement unit acquire the mark information in the substrate from different perspectives.
A kind of wire width measuring system, which is characterized in that including wire width measuring unit and defocus bigness scale unit, the line width is surveyed
Measuring unit includes the second measuring beam, the second detecting module, and the second measuring beam vertical incidence is described to substrate surface
It is received after substrate surface reflection by second detecting module.
Preferably, the defocus bigness scale unit includes the first measuring beam, the first detecting module, the first measurement light
Beam is slanted to the substrate surface and is received after substrate surface reflection by first detecting module.
Preferably, further including first light source, projection slit, the first light source issues illuminating bundle and passes through the projection
First measuring beam is formed after slit.
Preferably, further including a projection diaphragm, the projection diaphragm is equipped with the projection slit.
Preferably, the wire width measuring unit is from measuring beam used by the defocus bigness scale unit with different
Wavelength.
Preferably, the defocus bigness scale unit using light in the form of be projection hot spot.
Preferably, further including a focal plane and profile measurement unit.
Preferably, the focal plane and profile measurement unit include the first measuring beam, the second detecting module, it is described
First measuring beam is slanted to the substrate surface, is received after substrate surface reflection by second detecting module.
Preferably, the focal plane and profile measurement unit using light in the form of be projection hot spot.
Preferably, further including first light source, projection slit, the first light source issues illuminating bundle and passes through the projection
First measuring beam is formed after slit.
Preferably, further including a projection diaphragm, the projection diaphragm is equipped with the projection slit.
Preferably, the defocus bigness scale unit and the focal plane and profile measurement unit can share same incident survey
Measure light beam.
Preferably, further include the first Amici prism, the incidence measuring beam by after substrate surface reflection by
It is received respectively by the defocus bigness scale unit and the focal plane and profile measurement unit after first Amici prism.
Preferably, further including label search positioning unit.
Preferably, the label search positioning unit further includes third measuring beam, the third measuring beam oblique fire
After to the substrate surface, received by substrate surface reflection by first detecting module.
Preferably, two or more focal planes and profile measurement list can be set in the wire width measuring system
Member, multiple focal planes and profile measurement unit acquire the mark information in the substrate from different perspectives.
A kind of measuring system, including the first measuring unit and the second measuring unit,
First measuring unit include first light source, projection slit, projection microscope group, the first Amici prism, the first filter plate and
First detecting module, the light beam that the first light source generates form the first measuring beam, the first measurement after the projection slit
Light beam exposes to substrate surface through the projection microscope group, and first Amici prism is entered after substrate surface reflection, the
One measuring beam enters the first Amici prism rear portion and is incident to second measuring unit, and another part is incident to institute
Enter first detecting module after stating the first filter plate；
Second measuring unit includes second light source, microcobjective and the second detecting module, and the second light source generates
Light beam through the microcobjective formed the second measuring beam, the second measuring beam enter second detecting module；
The second filter plate and the second Amici prism, the first measurement are additionally provided between second measuring unit and the first measuring unit
Light beam enters second Amici prism by second filter plate after first Amici prism reflection, through described the
Two Amici prisms are reflected into second detecting module；
First filter plate can only penetrate the monochromatic light of two kinds of different wave lengths, and second filter plate is according to described first
The monochromatic wavelength that filter plate penetrates selects a transmission.
Preferably, the test surface of first detecting module is obliquely installed with the first measuring beam, big visual field is realized
Range imaging.
Preferably, the projection slit includes slit area and plane area, the plane area is arranged around the slit area,
The monochromatic wavelength that the slit area penetrates is identical as the monochromatic wavelength that first filter plate penetrates, and the plane area penetrates
Monochromatic wavelength be different from first filter plate penetrate monochromatic wavelength, and the plane area penetrate monochromatic luminous energy it is saturating
Cross second filter plate.
Preferably, first measuring unit further includes the illumination being arranged between the first light source and projection slit
Microscope group, the illumination microscope group are used for collimated light beam.
Preferably, first measuring unit further includes the first lens group, first lens group includes group before lens
With group after lens, first Amici prism and first filter plate are arranged at group and group after the lens before the lens
Between, first lens group is for converging the first measuring beam.
Preferably, first measuring unit further includes reflection microscope group, the reflection microscope group includes front mirror with after
Reflecting mirror, first measuring beam expose to the front mirror through the projection microscope group, reflex to through the front mirror
The substrate surface, reflexes to the back mirror through the substrate surface, is reflected into described first through the back mirror
Amici prism.
Preferably, the front mirror and back mirror are obliquely installed with the first measuring beam.
Preferably, second measuring unit further includes the second lens group, second lens group is used to survey second
It measures before light beam enters second detecting module and converges the second measuring beam.
Compared with prior art, the present invention having the advantage that
Feature one, CD measurement may be implemented in the measuring system, label search positions, section profile measurement is examined with focal plane
It surveys；Label search positioning, focal plane are illuminated using different single band oblique incidences, and part single band is shone for providing big visual field
It is bright, using inclination SC detection imaging, big field range imaging is realized, can be used for measurand search.It is filtered using with optics
The projection slit of wave and special pattern feature forms single-range projection, by tilting SC detection imaging, is used for focal plane bigness scale.
Feature two, wiring pattern CD precision measurement unit, using high magnification machine vision imaging system realize that CD precision is surveyed
Amount.
Feature three, wiring pattern section profile measuring unit are projected using single band oblique incidence formula, using inclination SC detection
Preceding group, imaging is organized after measuring using CD, realizes focal plane accurate measurement and wiring pattern profile measurement.
Feature four, the diaphragm slit of projection section, separated regions filter, and realize the incident illumination of broadband composite inclined.
Feature five, CD measurement, label search positioning, section profile measurement are shone with focal plane using light sources with different wavelengths
It is bright, prevent mutual crosstalk.
Feature six, CD measuring device have filter plate, so that CD measuring unit introduces focal plane accurate measurement light beam, visual field is isolated
Imaging beam guarantees measurement functional independence.
A kind of line width measuring method, comprising:
Step 1, focal plane and profile measurement make a projection hot spot be slanted to substrate, and connect one second detecting module
Receive the facula information after being reflected by substrate surface.
Step 2, wire width measuring make a detection light vertically be incident upon the substrate, and second detecting module is made to receive quilt
Facula information after the substrate surface reflection, obtains line width information.
Preferably, further include: step 0, label search make a parallel detection light be slanted to the substrate, and make first
Detecting module receives the optical information reflected by the substrate surface, determines label position.
Preferably, step 0 is executed prior to step 1.
Preferably, further include: step 12, defocus measurement make a projection hot spot be slanted to the substrate, and make the first spy
It surveys module and receives the optical information reflected by the substrate surface, determine the defocusing amount of the substrate.
Preferably, step 12 can be prior to or subsequent to or execute simultaneously with step 1.
Compared with prior art, the invention has the following advantages that the line width measuring method realizes CD measurement, label search
Positioning, section profile measurement and focal plane；Label search positioning, focal plane are illuminated using different single band oblique incidences,
Part single band using inclination SC detection imaging, realizes big field range imaging for providing big field illumination, can be used for by
Survey object search.Using the projection slit for having optically filtering and special pattern feature, single-range projection is formed, inclination is passed through
SC detection imaging is used for focal plane bigness scale.
Detailed description of the invention
Fig. 1 and Fig. 2 is the structural schematic diagram of wire width measuring device in the prior art；
Fig. 3 is the structural schematic diagram of the wire width measuring system of the embodiment of the present invention one；
Fig. 4 is the structural schematic diagram of the projection slit of the embodiment of the present invention one；
Fig. 5 be the embodiment of the present invention one defocusing amount with projection hot spot in the upper of the first detecting module or the second detecting module
The relationship of position；
Fig. 6 is the relationship between the incident beam and substrate of the embodiment of the present invention one；
Fig. 7 is the detection hot spot of the embodiment of the present invention one by the characteristics of image before and after wiring pattern in substrate；
Fig. 8 is the section profile for measuring wiring pattern of the embodiment of the present invention one and the line width of different height；
Fig. 9 is the wider array of SC detection optical path in search range of the use of the embodiment of the present invention one；
Figure 10 be the wiring pattern that in the image of acquisition or the display of the embodiment of the present invention one while can observe and its
Section profile；
Figure 11 is the structural schematic diagram of the wire width measuring system of the embodiment of the present invention two.
Shown in Fig. 1: 10- optical microscopy；
Shown in Fig. 3~11: 1- first light source, 2- illumination microscope group, 3- projection slit, the slit area 301-, 302- plane area,
4- project front assembly, 5- front mirror, 6- back mirror, 7- lens front assembly, the first Amici prism of 8-, component after 9- lens,
The first detecting module of 10-, 11- second light source, 12- microcobjective, the second Amici prism of 13-, the second lens group of 14-, 15- second
Component, 17- third Amici prism, 31-X are to moving guide rail, 32-Y to moving guide rail, 33-Z to tune after detecting module, 16- projection
Whole, 34- substrate, 35- operation processing unit, the first filter plate of 41-, the second filter plate of 42-.
Specific embodiment
In order to make the foregoing objectives, features and advantages of the present invention clearer and more comprehensible, with reference to the accompanying drawing to the present invention
Specific embodiment be described in detail.It should be noted that attached drawing of the present invention is all made of simplified form and uses non-essence
Quasi- ratio, only for the purpose of facilitating and clarifying the purpose of the embodiments of the invention.
Embodiment one
A kind of wire width measuring system, including wire width measuring unit and focal plane and profile measurement unit, the line width are surveyed
Measuring unit includes the second measuring beam, the second detecting module 15, the second measuring beam vertical incidence to 34 surface of substrate, quilt
It is received after 34 surface reflection of substrate by second detecting module 15.
The wire width measuring unit has different from measuring beam used by the focal plane and profile measurement unit
Wavelength.
The focal plane and profile measurement unit using light in the form of be projection hot spot.The focal plane and profile
Measuring unit includes the first measuring beam, the second detecting module 15, and first measuring beam is slanted to 34 surface of substrate,
It is received after 34 surface reflection of substrate by second detecting module 15.It further include first light source 1, projection slit 3, it is described
First light source 1 issues illuminating bundle and forms first measuring beam after the projection slit 3.It further include a projection diaphragm
(not shown), the projection diaphragm are equipped with the projection slit 3.
The wire width measuring system further includes a defocus bigness scale unit.The defocus bigness scale unit includes the first measurement light
Beam, the first detecting module 10, first measuring beam are slanted to 34 surface of substrate, and by 34 surface reflection of substrate
It is received afterwards by first detecting module 10.It further include first light source 1, projection slit 3, the first light source 1 issues illumination light
Beam forms first measuring beam after the projection slit 3.It further include a projection diaphragm (not shown), the projected light
Door screen is equipped with the projection slit 3.
The defocus bigness scale unit and the focal plane and profile measurement unit can share same incident measuring beam.
The wire width measuring system further includes the first Amici prism 8, and the incidence measuring beam is by 34 surface of substrate
Respectively by the defocus bigness scale unit and the focal plane and profile measurement list after first Amici prism 8 after reflection
Member receives.
The wire width measuring system further includes label search positioning unit.The label search positioning unit further includes third
Measuring beam, the third measuring beam are slanted to 34 surface of substrate, and by after 34 surface reflection of substrate by described
First detecting module receives 10.
Two or more focal planes and profile measurement unit, Duo Gesuo can be set in the wire width measuring system
It states focal plane and profile measurement unit acquires mark information in the substrate from different perspectives.In addition, further including necessary
The components such as optical shaping, transmitting with measuring beam and reflected detection light beam adjusting, optimization, and to detection result into
Control, computing module of row technology etc., this is to repeat no more well known to those skilled in the art.
Embodiment two
A kind of wire width measuring system, including wire width measuring unit and defocus bigness scale unit, the wire width measuring unit include
Second measuring beam, the second detecting module 15, the second measuring beam vertical incidence to 34 surface of substrate, by the substrate 34
It is received after surface reflection by second detecting module 15.
The defocus bigness scale unit includes the first measuring beam, the first detecting module 10, the first measuring beam oblique fire
It is received to 34 surface of substrate and after 34 surface reflection of substrate by first detecting module 10.It further include the first light
Source 1, projection slit 3, the first light source issue illuminating bundle and form the first measurement light after the projection slit 3
Beam.It further include a projection diaphragm (not shown), the projection diaphragm is equipped with the projection slit 3.
The wire width measuring unit has different wavelength from measuring beam used by the defocus bigness scale unit.It is described
Defocus bigness scale unit using light in the form of be projection hot spot.
The wire width measuring system further includes a focal plane and profile measurement unit.The focal plane and profile measurement
Unit includes the first measuring beam, the second detecting module 15, and first measuring beam is slanted to 34 surface of substrate, by institute
It is received after stating 34 surface reflection of substrate by second detecting module 15.The light that the focal plane and profile measurement unit use
Form be projection hot spot.It further include first light source 1, projection slit 3, the first light source 1 issues described in illuminating bundle process
First measuring beam is formed after projection slit 3.It further include a projection diaphragm (not shown), the projection diaphragm is equipped with described
Projection slit 3.
The defocus bigness scale unit and the focal plane and profile measurement unit can share same incident measuring beam.
Preferably, further including the first Amici prism 8, the incidence measuring beam is passed through after 34 surface reflection of substrate
It crosses after first Amici prism 8 and is received respectively by the defocus bigness scale unit and the focal plane and profile measurement unit.
The wire width measuring system further includes label search positioning unit.The label search positioning unit further includes third
Measuring beam, after the third measuring beam is slanted to 34 surface of substrate, by 34 surface reflection of substrate by described
One detecting module 10 receives.
Two or more focal planes and profile measurement unit, Duo Gesuo can be set in the wire width measuring system
It states focal plane and profile measurement unit acquires mark information in the substrate from different perspectives.In addition, further including necessary
The components such as optical shaping, transmitting with measuring beam and reflected detection light beam adjusting, optimization, and to detection result into
Control, computing module of row technology etc., this is to repeat no more well known to those skilled in the art.
Embodiment three
As shown in figure 3, a kind of measuring system, including one group of first measuring unit and the second measuring unit, described first surveys
Amount unit includes first light source 1, projection slit 3, projection microscope group, the first Amici prism 8, the first filter plate 41 and the first detection mould
Block 10, the light beam that the first light source 1 generates form the first measuring beam, the first measuring beam warp after the projection slit 3
The projection microscope group exposes to 34 surface of substrate, after 34 surface reflection of substrate enter first Amici prism 8, first
Measuring beam is incident to second measuring unit through 8 rear portion of the first Amici prism, and another part is incident to described
Enter first detecting module 10 after first filter plate 41；
Second measuring unit includes second light source 11, microcobjective 12 and the second detecting module 15, second light
The light beam that source 11 generates forms the second measuring beam through the microcobjective 12, and the second measuring beam enters the second detection mould
Block 15；
It is additionally provided with the second filter plate 42 and the second Amici prism 13 between second measuring unit and the first measuring unit, first
Measuring beam is filtered after first Amici prism 8 reflection by second filter plate 42, through the second light splitting rib
Mirror 13 is reflected into second detecting module 15；
First filter plate 41 can only be λ 1 through wavelength and wavelength is the monochromatic light of λ 2, second filter plate 42
The monochromatic light that can be λ 1 through wavelength.
First detecting module 10 and second detecting module 15 can use CCD camera or CMOS camera.
The test surface of first detecting module 10 is obliquely installed with the first measuring beam, realize big field range at
Picture.
The projection slit 3 includes slit area 301 and plane area 302, and the plane area 302 is around the slit area 301
Setting, the monochromatic light that the slit area 301 can only be λ 1 through wavelength, the list that the plane area 302 can only be λ 2 through wavelength
Coloured light, subregion are filtered, and realize the incident illumination of broadband composite inclined.
First measuring unit further includes the illumination microscope group 2 being arranged between the first light source 1 and projection slit 3,
The illumination microscope group 2 is used for collimated light beam.
First measuring unit further includes the first lens group, and first lens group includes lens front assembly 7 and lens
Component 9 afterwards, first Amici prism 8 and first filter plate 41 are arranged at the lens front assembly 7 and the lens
Afterwards between component 9, first lens group is for converging the first measuring beam.
First measuring unit further includes reflection microscope group, and the reflection microscope group includes front mirror 5 and back mirror 6,
First measuring beam exposes to the front mirror 5 through the projection microscope group, reflexes to the base through the front mirror 5
34 surface of bottom is reflected into described first through the back mirror 6 through 34 surface reflection of substrate to the back mirror 6
Amici prism 8.The front mirror 5 and back mirror 6 are obliquely installed with the first measuring beam, using inclination SC detection at
Picture realizes big field range imaging.
Second measuring unit further includes the second lens group 14, and second lens group 14 is used in the second measuring beam
The second measuring beam is converged before into second detecting module 15.
The first light source 1 uses white light source, the illuminating bundle issued, by the illumination microscope group 2, reaches projection
Slit 3, the projection slit 3 are designed according to Fig. 4, including slit area 301 and plane area 302, and the slit area 301 can only
The monochromatic light (such as green light) for being λ 1 through wavelength, the monochromatic light (such as feux rouges) that the plane area 302 is λ 2 through wavelength, therefore first
The light beam that light source 1 issues can be divided into two parts after projection slit 3, and a part is the projection hot spot that wavelength is λ 1, another portion
Divide the illuminating bundle for being wavelength for λ 2, to form the first measuring beam.
The projection hot spot that wavelength is λ 1 carries out on front mirror 5 anti-after the component 9 after projection front assembly 7, projection
It penetrates, forms hot spot corresponding with 301 size of slit area on 34 surface of substrate, hot spot passes through 34 surface reflection of substrate, then successively
After back mirror 6 and lens front assembly 7, the first Amici prism 8 is reached, this part projection hot spot will become two beams, a branch of
The second Amici prism 13 is reached after the second filter plate 42, is reflected by the second Amici prism 13, and projection hot spot is imaged onto the
Two lens groups 14, finally projecting hot spot can be imaged on the second detecting module 15, and the effect of the second filter plate 42 is can only
By wavelength be λ 1 light, and in addition a branch of wavelength be λ 1 projection hot spot then can after lens component 9, be imaged on the first spy
It surveys in module 10.The imaging of this part is the bigness scale for carrying out defocus.
Wavelength is the illuminating bundle of λ 2, after 34 surface reflection of substrate, successively passes through group before back mirror 6 and lens
After part 7, the first Amici prism 8 is reached, also will become two beams at this time, due to the effect of the second filter plate 42, therefore wavelength is λ's 2
Light beam will not enter the second detecting module 15, can only after lens component 9, be tiltedly imaged on the first detecting module 10.This portion
Be divided into seems for search and positioning is marked.
In addition, second light source 11 issues the second measuring beam that wavelength is λ 3 (such as blue light), vertical incidence is carried out, by base
After 34 surface reflection of bottom, successively after microcobjective 12, the second Amici prism 13 and the second lens group 14, it is imaged on the second spy
It surveys in module 15.
Finally on the second detecting module 15, there can be two parts imaging simultaneously, a part is for carrying out wiring pattern
The measuring wavelength of CD is the second measuring beam of λ 3, and a part is surveyed for carrying out focal plane and wiring pattern section profile
The wavelength of amount is the first measuring beam of λ 1, as shown in Figure 10.
Second filter plate 42 can also filter out the light beam that wavelength is λ 3, prevent the second measuring beam since diffusing reflection is to first
Imaging on detecting module 10 has an impact.
Slit area 31 among projection slit 3 is for carrying out focal plane and section profile measurement, as shown in figure 5, pressing
According to defocusing amount and project the hot spot positional relationship on the first detecting module 10 and the second detecting module 15 respectivelyWherein L is detector length, and α 1 is angle or the second measurement of the first measuring beam and symmetry axis
The angle of light beam and optical axis, M1 are lens ratio, and H is defocusing amount, the defocusing amount of current tested region can be measured, thus to base
Bottom 34 carries out Z-direction and is adjusted to optimal focal plane position, and the section profile measurement of wiring pattern, projected light can be carried out by then projecting hot spot
Spot is according to carrying out oblique incidence shown in Fig. 6, due to being tested the inconsistent of the height of wiring pattern and 34 apparent height of substrate, second
Profile as shown in Figure 7 can be showed on detecting module 15, that is, detects the sectional view of lines.If 34 surface wiring figure of substrate
Section profile is rectangle, then can accurately measure its line width values using the imaging of microcobjective 12.If 34 surface wiring figure of substrate
The section profile of shape is trapezoidal, as shown in figure 8, what is measured using the imaging of microcobjective 12 is its line close to 34 surface of substrate
Wide CD3, Usage profile profile measurement can measure the CD value of section different height, such as the line width CD1 at top and centre
The line width CD2 at position.
The illumination of label search is illuminated jointly using two kinds of wavelength, in the probe portion of label search, using SC optical path knot
The picture on 34 surface of substrate is tiltedly imaged on the first detecting module 10 by structure, and increase larger range of in this way marks region of search, such as
Shown in Fig. 9,12 lens ratio of microcobjective is M2, uses the true field being vertically imaged for W1, is regarded using the object space of SC imaging
Field is W2, thenWherein, β 2 indicates the angle of the second measuring beam and symmetry axis,
α 2 indicates the complementary angle of the angle of the second measuring beam and symmetry axis, and the range of search is marked to become wider.
The technical program carries out the measurement of different function using three kinds of different wave lengths respectively, in which:
Wavelength is the illumination of λ 1 (such as green light), for carrying out position from defocus and the measurement of wiring pattern section profile；
Wavelength is the illumination of λ 3 (such as blue light), for carrying out wiring pattern CD measurement；
Wavelength is λ 2 (such as feux rouges) and wavelength is the illumination of λ 1 (such as green light), thick for search positioning and defocus is marked
It surveys.
Canonical parameter and technical effect budget:
Using TFT glass substrate, having a size of 730mm × 920mm, the fluctuation of substrate overall situation face type is less than 25um, and part exists
10um or so.
In label search positioning and observation part, first detecting module 10 uses 1 inch of CMOS camera, image space view
Field is 12.8mm × 9.6mm, and imaging lens multiplying power uses 0.5 multiplying power, incident angle 82, and wavelength uses feux rouges and green light, presses
According to above-mentioned calculation formula, the search range of object plane is 50mm × 37.6mm, is the true field of Normal incidence reflectance imaging
More than 2 times of 25.6mm × 19.2mm.
Part is measured in wiring pattern CD, is tested the line width of wiring pattern in 1~10um.If the second detecting module 15 uses
1 inch of CMOS camera, pixel dimension 5um, 12 lens ratio of microcobjective use 50X, and NA 0.55, field depth is positive
Negative 1um.Filter plate wavelength all uses wavelength for 465nm blue light at 12 slit of second measuring beam and microcobjective, by joining above
The available true field of number is 0.256mm × 0.192mm, and the resolution ratio of CD measurement can meet CD wire width measuring need up to 0.5um
It asks.
Part is measured in focal plane real-time detection and wiring pattern section profile, wiring pattern height is in 1um or so.First visits
It surveys module 10 and above-mentioned CD measures partial common, the first measuring beam uses green light 520nm, and incidence angle is designed as 82 degree, and M1 is put
Big multiplying power is designed as 5 times, according to α=10 times proportionate relationship 2M1sin between vertical height and the first detecting module 10, pixel
Size 5um, sub-pix design value are 1/20, then design resolution isSlit area 31 is designed and sized to 1mm
× 0.1mm becomes the picture of 5 × 0.5mm after 5 times of amplifications in probe portion, and focal plane range is designed as positive and negative 100um,
According to size relationship L-W=2 × R × M × sin α of defocusing amount and the first detecting module 10, it can be deduced that 1 inch of CMOS camera
Design requirement can be met.Focal plane range changes greater than 34 face type of substrate, and focal plane part true field is greater than and covers aobvious
12 true field of speck mirror.
Wire width measuring system of the present invention has the feature that
CD measurement, label search positioning, section profile measurement and focal plane may be implemented in feature one, the wire width measuring system
Detection；Label search positioning, focal plane are illuminated using different single band oblique incidences, and part single band is for providing big visual field
Illumination is realized big field range imaging, can be used for measurand search using inclination SC detection imaging.Using with optics
The projection slit 3 of filtering and special pattern feature, forms single-range projection, thick for focal plane by tilting SC detection imaging
It surveys.
Feature two, wiring pattern CD precision measurement unit, using high magnification machine vision imaging system realize that CD precision is surveyed
Amount.
Feature three, wiring pattern section profile measuring unit are projected using single band oblique incidence formula, using inclination SC detection
Preceding group, imaging is organized after measuring using CD, realizes focal plane accurate measurement and wiring pattern profile measurement.
Feature four, the projection slit 3 of the first measuring unit, separated regions filters, and realizes the compound oblique incidence of broadband
Illumination.
Feature five, CD measurement, label search positioning, section profile measurement are shone with focal plane using light sources with different wavelengths
It is bright, prevent mutual crosstalk.
Feature six, the wire width measuring device have filter plate, so that CD measurement introduces focal plane accurate measurement light beam, isolation view
Field imaging beam guarantees measurement functional independence.
Example IV
As shown in figure 11, the difference of example IV and embodiment three is, example IV is equipped with two group of first measuring unit,
Third Amici prism 17 is equipped in second measuring unit, such wire width measuring system can measure different directions wiring diagram
The section profile of shape.
Embodiment five
As shown in Fig. 3 or Figure 11, a kind of wire width measuring device, including Z-direction adjustment platform 33, setting adjust platform in the Z-direction
Moving guide rail on 33, wire width measuring system described in the embodiment one or embodiment two being arranged on the moving guide rail and
The operation processing unit 35 being connected with the wire width measuring system, the setting of substrate 34 is on Z-direction adjustment platform 33, the movement
Guide rail includes X to moving guide rail 31 and Y-direction moving guide rail 32, and the wire width measuring system adjusts by adjusting the moving guide rail
Position appropriate carries out wire width measuring to substrate 34, and further, the operation processing unit 35 is according to the first detection mould
Information on block 10 and second detecting module 15 calculates position of the substrate 34 apart from optimal focal plane, by adjusting the Z
The substrate 34 is adjusted at optimal focal plane position to adjustment platform 33.
Embodiment six
A kind of line width measuring method, comprising:
Step 1, focal plane and profile measurement make a projection hot spot be slanted to substrate 34, and make one second detecting module
15 receive by the facula information after 34 surface reflection of substrate.
Step 2, wire width measuring make a detection light vertically be incident upon the substrate 34, and connect second detecting module 15
It receives by the facula information after 34 surface reflection of substrate, obtains line width information.
Further include: step 0, label search make a parallel detection light be slanted to the substrate 34, and make the first detecting module
It receives by the optical information of 34 surface reflection of substrate, determines label position.
Step 0 is executed prior to step 1.
Further include: step 12, defocus measurement make a projection hot spot be slanted to the substrate 34, and make the first detecting module
10 receive by the optical information of 34 surface reflection of substrate, determine the defocusing amount of the substrate 34.
Step 12 can be prior to or subsequent to or execute simultaneously with step 1.
Those skilled in the art can carry out various modification and variations without departing from spirit and model of the invention to invention
It encloses.In this way, if these modifications and changes of the present invention is within the scope of the claims of the present invention and its equivalent technology, then
The invention is also intended to include including these modification and variations.
Claims (44)
1. a kind of wire width measuring system, which is characterized in that including wire width measuring unit and focal plane and profile measurement unit, institute
Stating wire width measuring unit includes the second measuring beam, the second detecting module, the second measuring beam vertical incidence to substrate table
Face is received after substrate surface reflection by second detecting module.
2. wire width measuring system according to claim 1, which is characterized in that the wire width measuring unit and the focal plane are examined
Measuring beam used by survey and profile measurement unit has different wavelength.
3. wire width measuring system according to claim 1, which is characterized in that the focal plane and profile measurement unit are adopted
The form of light is projection hot spot.
4. wire width measuring system according to claim 1, which is characterized in that the focal plane and profile measurement unit packet
The first measuring beam, the second detecting module are included, first measuring beam is slanted to the substrate surface, by the substrate surface
It is received after reflection by second detecting module.
5. wire width measuring system according to claim 4, which is characterized in that it further include first light source, projection slit, it is described
First light source issues illuminating bundle and forms first measuring beam after the projection slit.
6. wire width measuring system according to claim 5, which is characterized in that further include a projection diaphragm, the projected light
Door screen is equipped with the projection slit.
7. wire width measuring system according to claim 1, which is characterized in that further include a defocus bigness scale unit.
8. wire width measuring system according to claim 7, which is characterized in that the defocus bigness scale unit includes the first measurement
Light beam, the first detecting module, first measuring beam are slanted to the substrate surface, and by after substrate surface reflection by
First detecting module receives.
9. the wire width measuring system stated according to claim 8, which is characterized in that it further include first light source, projection slit, described
One light source issues illuminating bundle and forms first measuring beam after the projection slit.
10. wire width measuring system according to claim 9, which is characterized in that further include a projection diaphragm, the projected light
Door screen is equipped with the projection slit.
11. wire width measuring system according to claim 7, which is characterized in that the defocus bigness scale unit and the focal plane
Detection and profile measurement unit can share same incident measuring beam.
12. wire width measuring system according to claim 7, which is characterized in that further include the first Amici prism, the incidence
Measuring beam by the substrate surface reflect after after first Amici prism respectively by the defocus bigness scale unit and institute
It states focal plane and profile measurement unit receives.
13. wire width measuring system according to claim 1, which is characterized in that further include label search positioning unit.
14. wire width measuring system according to claim 13, which is characterized in that the label searches for positioning unit and further includes
Third measuring beam, the third measuring beam are slanted to the substrate surface, and by after substrate surface reflection by described
First detecting module receives.
15. wire width measuring system according to claim 1, which is characterized in that two or more cokes can be set
Face detection and profile measurement unit, multiple focal planes and profile measurement unit are acquired from different perspectives in the substrate
Mark information.
16. a kind of wire width measuring system, which is characterized in that including wire width measuring unit and defocus bigness scale unit, the line width is surveyed
Measuring unit includes the second measuring beam, the second detecting module, and the second measuring beam vertical incidence is described to substrate surface
It is received after substrate surface reflection by second detecting module.
17. wire width measuring system according to claim 16, which is characterized in that the defocus bigness scale unit includes the first survey
Light beam, the first detecting module are measured, first measuring beam is slanted to the substrate surface and by after substrate surface reflection
It is received by first detecting module.
18. wire width measuring system according to claim 17, which is characterized in that further include first light source, projection slit, institute
It states first light source sending illuminating bundle and forms first measuring beam after the projection slit.
19. wire width measuring system according to claim 17, which is characterized in that further include a projection diaphragm, the projection
Diaphragm is equipped with the projection slit.
20. wire width measuring system according to claim 16, which is characterized in that the wire width measuring unit and the defocus
Measuring beam used by bigness scale unit has different wavelength.
21. wire width measuring system according to claim 16, which is characterized in that the light that the defocus bigness scale unit uses
Form is projection hot spot.
22. wire width measuring system according to claim 16, which is characterized in that further include a focal plane and profile measurement
Unit.
23. wire width measuring system according to claim 22, which is characterized in that the focal plane and profile measurement unit
Including the first measuring beam, the second detecting module, first measuring beam is slanted to the substrate surface, by the substrate table
It is received after the reflection of face by second detecting module.
24. wire width measuring system according to claim 23, which is characterized in that the focal plane and profile measurement unit
Using light in the form of be projection hot spot.
25. wire width measuring system according to claim 23, which is characterized in that further include first light source, projection slit, institute
It states first light source sending illuminating bundle and forms first measuring beam after the projection slit.
26. wire width measuring system according to claim 25, which is characterized in that further include a projection diaphragm, the projection
Diaphragm is equipped with the projection slit.
27. wire width measuring system according to claim 22, which is characterized in that the defocus bigness scale unit and the focal plane
Detection and profile measurement unit can share same incident measuring beam.
28. wire width measuring system according to claim 22, which is characterized in that further include the first Amici prism, it is described enter
Penetrate measuring beam by after substrate surface reflection after first Amici prism respectively by the defocus bigness scale unit and
The focal plane and profile measurement unit receive.
29. wire width measuring system according to claim 22, which is characterized in that two or more cokes can be set
Face detection and profile measurement unit, multiple focal planes and profile measurement unit are acquired from different perspectives in the substrate
Mark information.
30. wire width measuring system according to claim 16, which is characterized in that further include label search positioning unit.
31. wire width measuring system according to claim 30, which is characterized in that the label searches for positioning unit and further includes
Third measuring beam, after the third measuring beam is slanted to the substrate surface, by substrate surface reflection by described the
One detecting module receives.
32. a kind of measuring system, which is characterized in that including the first measuring unit and the second measuring unit,
First measuring unit includes first light source, projection slit, projection microscope group, the first Amici prism, the first filter plate and first
Detecting module, the light beam that the first light source generates form the first measuring beam, the first measuring beam after the projection slit
Substrate surface is exposed to through the projection microscope group, first Amici prism is entered after substrate surface reflection, first surveys
Amount light beam enters the first Amici prism rear portion and is incident to second measuring unit, and another part is incident to described the
Enter first detecting module after one filter plate；
Second measuring unit includes second light source, microcobjective and the second detecting module, the light that the second light source generates
Microcobjective described in Shu Jing forms the second measuring beam, and the second measuring beam enters second detecting module；
The second filter plate and the second Amici prism, the first measuring beam are additionally provided between second measuring unit and the first measuring unit
Second Amici prism is entered by second filter plate after first Amici prism reflection, through described second point
Light prismatic reflection enters second detecting module；
First filter plate can only penetrate the monochromatic light of two kinds of different wave lengths, and second filter plate is according to first filtering
The monochromatic wavelength that piece penetrates selects a transmission.
33. measuring system according to claim 32, which is characterized in that the test surface and first of first detecting module
Measuring beam is obliquely installed.
34. measuring system according to claim 32, which is characterized in that the projection slit includes slit area and plane
Area, the plane area are arranged around the slit area, and the monochromatic wavelength and first filter plate that the slit area penetrates are saturating
The monochromatic wavelength crossed is identical, and the monochromatic wavelength that the plane area penetrates is different from the monochromatic light that first filter plate penetrates
Wavelength, and the second filter plate described in the monochromatic light-transmissive that the plane area penetrates.
35. measuring system according to claim 32, which is characterized in that first measuring unit further includes being arranged in institute
The illumination microscope group between first light source and projection slit is stated, the illumination microscope group is used for collimated light beam.
36. measuring system according to claim 32, which is characterized in that first measuring unit further includes the first lens
Group, first lens group include group and group after lens before lens, and first Amici prism and first filter plate are all provided with
It sets after group before the lens and the lens between group, first lens group is for converging the first measuring beam.
37. measuring system according to claim 32, which is characterized in that first measuring unit further includes reflecting mirror
Group, the reflection microscope group include front mirror and back mirror, and first measuring beam exposes to institute through the projection microscope group
Front mirror is stated, reflexes to the substrate surface through the front mirror, reflexes to the back mirror through the substrate surface,
First Amici prism is reflected into through the back mirror.
38. the measuring system according to claim 37, which is characterized in that the front mirror and back mirror are with first
Measuring beam is obliquely installed.
39. measuring system according to claim 32, which is characterized in that second measuring unit further includes the second lens
Group, second lens group are used to converge the second measuring beam before the second measuring beam enters second detecting module.
40. a kind of line width measuring method, comprising:
Step 1, focal plane and profile measurement make a projection hot spot be slanted to substrate, and one second detecting module is made to receive quilt
Facula information after substrate surface reflection；
Step 2, wire width measuring make a detection light vertically be incident upon the substrate, and it is described to receive second detecting module
Facula information after substrate surface reflection, obtains line width information.
41. line width measuring method according to claim 40, further includes
Step 0, label search make a parallel detection light be slanted to the substrate, and receive the first detecting module by the base
The optical information of bottom surface reflection determines label position.
42. line width measuring method according to claim 41, step zero is executed prior to step 1.
43. line width measuring method according to claim 40, further includes
Step 12, defocus measurement, make a projection hot spot be slanted to the substrate, and receive the first detecting module by the substrate
The optical information of surface reflection determines the defocusing amount of the substrate.
44. line width measuring method according to claim 40, step 12 can be prior to or subsequent to or hold simultaneously with step 1
Row.
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| TW107122355A TWI681165B (en) | 2017-06-30 | 2018-06-28 | Line width measuring system and line width measuring device |
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| CN109211117B (en) | 2021-04-09 |
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