TW201035697A - Proximity exposure device, substrate positioning method therefor, and produciton method of substrate for display - Google Patents

Abstract

A substrate positioning method for a proximity exposure device is provided, wherein the method utilizes several laser displacement meters to precisely detect the inclination of a chuck in a θ direction, so as to precisely position a substrate in the θ direction. A movement system moving and carrying chucks thereon includes: a first stage moving towards an X direction; a second stage carried on the first stage and moving towards the Y direction; and a third stage carried on the second stage and rotating towards the θ direction. Several laser displacement meters are installed on the second stage and moved towards an XY direction together with the chucks and the displacements of the chucks are measured at several positions by the several laser displacement meters. The inclination of the chucks in the θ direction is detected according to the measurement result, and based on the detection result, the chucks are rotated towards the θ direction by means of the third stage, so as to precisely position a substrate in the θ direction.

Description

[Technical Field] The present invention relates to an exposure apparatus, an exposure method, and an exposure method for performing exposure of a substrate when manufacturing a panel substrate for a liquid crystal display device or the like The present invention relates to a method of manufacturing a panel substrate for display of an apparatus and an exposure method, and more particularly to an exposure of a chuck of a support substrate by moving the platform in the XY direction and rotating in the Θ direction to perform positioning of the substrate during exposure. A device, an exposure method, and a method of manufacturing a panel substrate for display using the exposure apparatus and the exposure method. [Prior Art] A Thin Film Transistor 'TFT substrate or a color filter (plasma display panel) or a plasma display panel used as a liquid crystal display device for a display panel The production of a substrate, an organic electroluminescence (EL) display panel substrate, or the like is performed by using an exposure apparatus and forming a pattern on a substrate by a lithography technique. . As an exposure device, there is a projection method in which a lens Uens or a mirror is used to project a pattern of a mask onto a substrate; and a small gap (close to the gap) is provided between the mask and the substrate ( Proximity gap)), an approach to transfer the pattern of the mask onto the substrate. The approaching method is inferior to the projection method. The patterning performance of the illumination optical system is simple, and the processing capability is high, which is suitable for mass production. In the optical device, the positioning of the substrate during exposure is performed in order to accurately perform the burnt of the pattern with high precision. The moving platform that performs the clamping of the substrate 201035697 includes an X stage that moves in the x direction, a γ stage that moves to the γ side, and a 0 platform that rotates in the θ direction, and the slits of the three plates are mounted to move in the χγ direction and to the θ direction. Direction rotation. The technique of detecting the position of the mobile platform in the direction of the lamp using a f-length measuring system is disclosed in the Japanese Patent Publication No. 29 公报, and the inclination of the central disk in the θ direction is detected using a plurality of laser displacement meters. . As described in Japanese Patent Laid-Open No. 2 GG8_29 No., the use of a laser displacement gauge to detect the chuck is set to be more spaced in the θ direction, and the more precise == straight slope. (9), the loss of the laser displacement meter (four) lack of profit, the name of the "read big" closed, _ Ding County will become larger. In the technique described in Japanese Patent Application No. 2__29 Art No., a plurality of laser displacement meters are provided on the chamber to detect the inclination of the chuck in the θ direction: the chuck is moved by the two IT ¥ flat chambers. When moving in the direction of the Υ, the displacement of the chuck measured by the laser will be due to the movement of the chuck toward the γ direction. If the multiple laser displacement meters are set more spaced, the measurement range of the displacement meter When the measurement is increased, the measurement error is increased. [Explanation] The problem is that the accuracy of the chuck is in the θ direction using a plurality of laser displacement meters accurately. The substrate is in θ. The object of the present invention is to accurately burn a pattern to produce a high-quality display panel substrate. The proximity exposure apparatus of the present invention includes a chuck for supporting a substrate and 201035697 to maintain a mask. a mask frame, and a micro slit is provided between the mask and the substrate to transfer the pattern of the mask onto the substrate, the proximity exposure device comprising: a moving platform having a movement in the X direction (or the γ direction) The i-th platform, equipped with a second platform that moves in the γ direction (or the X direction) on the platform, and a third platform that is mounted on the second platform and rotates in the θ direction, and the moving platform is equipped with a chuck for support by the chuck The position of the substrate is set on the second platform, and is moved on the second platform, and moves in the direction of the central disk - _ χ γ in the 纽 _ _ displacement; the ^, the detection mechanism, according to the measurement results of the plurality of laser displacement meters, Detecting a slope in the direction of the chuck θ; a platform driving circuit that drives the moving platform; and a control device that controls the platform driving circuit according to the detection result of the first detecting mechanism, and drives the chuck to the θ direction through the third platform Rotating to perform positioning of the substrate in the x-direction. Moreover, the substrate positioning method of the proximity exposure apparatus of the present invention is a substrate positioning method of a proximity exposure apparatus including a chuck supporting a substrate And a mask holder that maintains the mask, and a small gap is formed between the mask and the substrate to transfer the pattern of the mask onto the substrate. In the substrate positioning method of the proximity exposure apparatus, A chuck is mounted on the mobile platform, and the mobile platform has a platform 1 that moves in the X direction (or the γ direction), a second platform that is mounted on the first platform and moves in the x direction (or the χ direction), and is mounted on the mobile platform. A third platform that rotates in the θ direction on the second platform is provided with a plurality of laser displacement meters on the second platform, and the plurality of laser displacement meters are moved in the ΧΥ direction together with the chuck, and the plurality of laser displacement meters are passed. The displacement of the chuck is measured at a plurality of locations. 'The slope of the chuck in the direction of 201035697 θ is detected according to the measurement result'. According to the test ride, the plate is rotated in the θ direction by the third platform to perform the substrate in the θ direction. Positioning on the second platform. On the 2nd platform, the noodle surplus material will be set up. It will move more: „the direction of the same direction light, and the displacement of the chuck will be measured at the eve by multiple laser displacement meters. Therefore, each laser displacement meter The measured displacement of the plate does not change due to the tendency to move. Even if the chuck is turned toward the side of the arm = the laser gauge of the laser displacement meter will not expand, so it can be set more spaced. Therefore, it is possible to accurately detect the inclination on the clip and accurately perform the clamping of the substrate in the θ direction. Further, the proximity exposure apparatus of the present invention includes the laser length measuring system t having a light source before generation, a second reflection mechanism mounted on the i-th reflection second stage on the first stage, and a light source And a plurality of second laser interference tombs and a second detecting mechanism that measure the interference between the laser beam from the light source and the laser reflected by the first structure at a plurality of locations, according to the plurality of laser length measuring systems 2 The measurement result of the laser interferometer, and the position 'i' control device for detecting the transfer inspection is based on the second '',> of the second detection mechanism. The platform drive circuit is controlled to move the chuck in the χγ direction by the first stage and the second plate 2 to apply the substrate in the χγ direction! 2 'The substrate positioning method of the proximity exposure apparatus of the present invention is that the first reflection mechanism is attached to the W stage. The second reverse 201035697 is attached to the second stage, and the laser beam from the light source is reflected by the first reflector. The interference of the laser is measured, and the laser from the domain and the second reflection interference are measured by a plurality of second machines at a plurality of locations and are detected according to the measurement result; and the position in the s direction is based on As a result of the detection, the recording is performed in the direction of χγ by the first chamber and the P platform to perform positioning of the substrate. Accurate inspection using a laser length measurement system

The position of the mobile platform in the ΧΥ direction is well positioned in the direction of the substrate. Further, the sway C yawing when the moving platform moves in the χ γ direction can be detected based on the measurement results of the plurality of second laser interferometers. Further, the proximity exposure apparatus of the present invention includes an f 3 reflection mechanism mounted on a sizzle, and the laser length measurement system passes the plurality of second laser interferences and at a plurality of locations, the laser from the light source and the 3 reflection by the reflection mechanism = interference of the radiation, and the second inspection of the root length of the radiation measurement system, the result of the second f-ray interferometer, to produce the displacement of the chuck, 1 detection mechanism according to the second detection The displacement of the chuck detected by the mechanism and the measurement result of the plurality of laser materials are used to make a laser displacement gauge of the shirt, and the correction formula of the result of the riding correction is made by the correction formula produced by the multi-laser The measurement result of the bit material is corrected, and the slope of the disk in the x direction is checked according to the result of the correction of the plurality of laser displacement meters after the correction. The substrate positioning method of the proximity exposure apparatus of the present invention is that a third reflection mechanism is mounted on the disk, and the plurality of second laser interferometers are used to irradiate the laser light from the light source at a plurality of locations. The laser reflected by the reflection mechanism 201035697 is used to detect the displacement of the chuck, and the plurality of laser displacement correction formulas are corrected according to the formula by the corrected plurality of laser displacement meters, according to the corrected measurement.疋,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, The measurement result of the displacement meter. The manufacturing method of the panel substrate for display of this invention is the exposure of the board|substrate by using the above-mentioned one type of proximity-type wire, or the board|substrate positioning method of the above-mentioned type of proximity exposure apparatus. The substrate is positioned to perform exposure of the substrate. Since the positioning of the substrate during exposure can be performed with high precision, the pattern can be accurately fired to manufacture a high-quality product. [Effect of the Invention] According to the proximity exposure apparatus and the substrate positioning method of the proximity exposure apparatus of the present invention, a chuck is mounted on a moving platform, and the moving platform has a movement in the X direction (or the γ direction). The second platform, the second platform mounted on the i-th platform and moving in the Y direction (or the X direction), and the third platform mounted on the second platform and rotating in the θ direction, and installed on the second platform A plurality of laser displacement meters move a plurality of laser displacement meters together with the chuck in the XY direction, and measure the displacement of the plate in a plurality of places by a plurality of laser displacement meters, and detect the chuck in the x direction according to the measurement result. The slope is upward, and according to the detection result, the chuck is rotated in the Θ direction through the third platform to advance the positioning of the substrate in the θ direction by 201035697, thereby setting the plurality of laser displacement meters more separately. Therefore, the inclination of the chuck in the θ direction can be accurately detected and the positioning of the substrate in the θ direction can be accurately performed. Further, the proximity exposure apparatus and the proximity exposure apparatus according to the present invention In the substrate positioning method, the first reflection mechanism is attached to the first stage, the second reflection mechanism is placed on the second flat surface, and the laser beam from the light source and the first reflection mechanism are used by the first laser interferometer. The interference of the reflected laser beam is measured, and the interference between the laser beam from the light source and the laser beam reflected by the second reflection mechanism is measured at a plurality of locations by a plurality of second laser interferometers, and based on the measurement result Detecting the position of the mobile platform in the ΧΥ direction, and moving the chuck in the χ γ direction through the second platform and the second platform to perform positioning of the substrate in the ΧΥ direction, thereby accurately detecting the mobile platform Since the position of the substrate in the χγ direction can be accurately performed, the position of the substrate in the χγ direction can be accurately performed. Further, the sway of the moving platform when moving in the direction can be detected based on the measurement results of the plurality of second laser interferometers. Further, according to the base exposure method of the proximity exposure apparatus and the proximity exposure apparatus of the present invention, the laser beam S3 reflection mechanism passes the laser beam from the light source at a plurality of locations through the plurality of second f-interference devices' The interference of the reflection (four) of the reflection mechanism is measured, and the displacement of the chuck is detected according to the measurement result, and the correction result of the failure result of the material is prepared according to the detection result and the plurality of laser displacement measurement results. The three-way complements the secret wire to determine the determination of the plurality of laser materials. According to the measured results of the modified multiple laser displacement meters, σ 11 201035697 = the slope of the lost disk in the θ direction, Therefore, when the correction formula for correcting the laser displacement result is produced, the displacement of the disk can be accurately performed using the laser length measuring system, and the measurement results of the laser and the shift can be accurately corrected. Therefore, it is possible to accurately detect the slope in the direction of the swash plate, and to advance the substrate in the upward direction. According to the method for producing a panel substrate for a display of the present invention, the substrate mosquitoes during exposure can be accurately performed. Therefore, the pattern can be fired with high precision, and a high-quality display panel substrate can be manufactured. The above and other objects, features, and advantages of the present invention will become more apparent from the understanding of the appended claims appended claims [Embodiment] FIG. 1 is a view showing a schematic configuration of a proximity exposure apparatus according to an embodiment of the present invention. 2 is a front view of a proximity exposure apparatus according to an embodiment of the present invention, and FIG. 3 is a side view of a proximity exposure apparatus according to an embodiment of the present invention. This embodiment shows an example of a proximity exposure apparatus using two moving platforms. The proximity exposure apparatus includes a chuck l〇a, l〇b; a base 11; a stage 12; an X guide (gUider) 13; a moving platform; a mask holder 20; Length measuring system control device 30; laser length measuring system; laser displacement meter control device; laser displacement meter 42, 43, 44; bar mirror 45, 46, 47; main control device 70; input and output interface The circuits 71 and 72 and the platform drive circuits 80a and 80b are formed. In addition, in FIG. 2 and FIG. 3 12 201035697, the laser length measuring system control device 30, the laser source 31 of the laser length measuring system, the laser displacement meter control device 40, the main control device 70, the input/output interface circuit are omitted. 71, 72 and platform drive circuits 80a, 80b. The proximity exposure device includes, in addition to these portions, an illuminating optical system that illuminates the exposure light, a substrate transfer robot, and a temperature control unit that performs temperature management in the device. Further, the χγ direction in the embodiment described below is merely an example, and the X direction and the γ direction may be reversed. In Figs. 1 and 2, the chuck 10a is located at an exposure position at which exposure of the substrate 1 is performed, and the chuck 10b is located at a loading/unloading position at which loading/unloading of the substrate 1 is performed. The loading/unloading position for the chuck 10a is located on the left side of the drawing of the exposure position. The chucks l〇a, lb are alternately moved from the respective loading/unloading positions to the exposure positions by the respective moving platforms described below. At each of the loading/unloading positions, the substrates are transported to the chucks 10a and 10b by the substrate transfer robots (not shown), and the substrates i are carried out from the chucks i〇a and 10b. The chucks 10a, 10b support the substrate i in a vacuum-adsorbing manner. Above the exposure position, a mask frame 2 that holds the mask 2 is provided. The mask frame 20 holds the peripheral portion of the mask 2 in a vacuum-adsorbing manner. An illumination optical system (not shown) is disposed above the mask 2 held on the mask frame 2''. At the time of exposure, the exposure light from the illumination optical system passes through the mask 2 and is irradiated onto the substrate 1, whereby the pattern of the mask 2 is transferred onto the surface of the substrate raft to form a pattern on the substrate 1. In Fig. 2, the chucks 10a, 10b are respectively mounted on a mobile platform. Each mobile platform includes an X platform 14, a Y-guide ΐ5, a γ-platform 16, a 0-level 13 201035697 π, and a chuck support table 19. On the X-guide 13 provided on π, move along ==. γ platform guards ° 13 to the X direction, along; to the θ side _. The chuck_stage 19 supports the clamping/rotating' at a plurality of positions to carry the substrate mounted on the chuck one b:

ί face green, (4) X of each axis platform: movement of the table 14 in the X direction and ¥ platform = stepwise movement of the substrate 支持 in the χ γ direction supported by the plate. Further, the positioning of the substrate 曝光 during exposure is performed by the movement of the X stage 14 of each moving platform in the f direction, the movement of the Y stage 16 in the γ direction, and the rotation of the θ stage Θ in the Θ direction. Further, the mask frame 2 is moved in the ζ direction by the Ζ-tilt mechanism (not shown), and the lining is aligned with the slit of the substrate 以此. In Fig. 1, the platform driving circuit 80a is driven by the main control unit 7A to drive the crucible platform 14, the gamma stage 16, and the crucible platform 17 of the mobile platform on which the chuck 10a is mounted. Further, the platform drive circuit is driven by the main control unit i 70 to drive the X platform 14, the Y platform 16, and the θ platform 17 of the mobile platform on which the chuck is mounted. In addition, in the present embodiment, by moving the mask frame 2 in the z direction and riding, it is aligned with the gap between the substrate 2 and the substrate, but it can also be on the chuck branch of each mobile platform. The z-tilt mechanism is provided to move and tilt the chucks 10a and 10b in the Z direction, thereby aligning the gap between the mask 2 and the substrate 1.

❹ The following is a description of the positioning operation of the substrate of the proximity exposure apparatus of the present embodiment. In Fig. 1, the mine side is purely including a laser source 31; the interferometers 32a, 32b, 33; the rod mirrors 34a, 34b, 35 and the mirror unit 50 are formed. The cymbal platform 14 of each mobile platform is mounted on the X guide 13, so that a space corresponding to the height of the X guide 13 is generated between the susceptor η and the cymbal platform 14. The rod extending in the gamma direction is mounted under the X platform 14 by means of the mirror. The two laser interferometers 32a, 32b are respectively disposed at positions of the base U away from the crucible guide 13. In Fig. 2 and Fig. 3, the rod mirror % extending in the X direction is attached to the gamma stage 16 of each moving platform by the arm 36 at a height of substantially the chucks 10a, i〇b. Two laser interferometers 33 are disposed on the stage 12 provided on the base u. 4 and 5 are views for explaining the operation of the laser length measuring system. Further, Fig. 4 shows a state in which the chuck i〇a is in the exposure position, the chuck 1% is in the loading/unloading position, and Fig. 5 shows the state in which the chuck l〇b is in the exposure position and the chuck i〇a is in the loading/unloading position. . In Figures 4 and 5, two laser & interferometers 32a illuminate the laser from the laser source 31 to the rod mirror 34& and receive the laser reflected by the rod mirror 34a to be in two places. The laser from the laser source is measured by the interference of the laser reflected by the rod mirror 34a. And 15 201035697 and 'two laser interferometers 32b illuminate the laser from the laser source 31 to the rod mirror 34b and receive the laser reflected by the rod mirror 3牝 to contact the laser source 31 at two places. The laser is measured by interference with the laser reflected by the rod mirror 34b. In FIG. 1, the laser length measuring system control device 30 detects the position of the moving platform of the chuck 10a in the X direction based on the measurement results of the two laser interferometers 32a by the control of the main control unit 70. And detecting the yawing when the X platform 14 moves in the X direction. Further, the laser length measuring system control device 30 detects the position of the moving platform on which the chuck is mounted in the X direction based on the measurement results of the two laser interferometers 32b by the control of the main control device 7A, and detects The platform 14 is moved in the direction of the other direction. The position of each mobile platform in the X direction is accurately detected using a laser length measuring system. Further, the sway of each of the moving platforms 14 when moving in the X direction can be detected based on the respective measurement results of the two laser interferometers 32a, 32b. In Figures 4 and 5, two laser interferometers 33 illuminate the laser from the laser source 31 to the rod mirror 35' and receive the laser reflected by the rod mirror % to contact the laser at two locations. The # shot of the source 31 is measured by the interference of the laser reflected by the rod mirror 35. In the figure wiper, the laser length measuring system control device %, the control of the main control device 70, according to the results of the two Ray Xuan instrument% detection to carry the chuck shirt in the exposure position, the movement of the survey = in The position in the Y direction is detected by the mounting of the disk at the exposure position, and the movement of the moving platform in the direction of the lamp. The position of the moving platform on which the disk 16a, 10b of the central 16 201035697 at the exposure position is mounted in the γ direction is detected with the laser length measuring system. Moreover, according to the measurement results of the two laser interferometers 33, the chuck for detecting the position is detected. The flat exposure of the moving platform when moving to the redundant direction is first; the top view of the mobile platform; the side view of the mobile platform of FIG. . ° and FIG. 7 shows that the moving platform of the mobile platform technology on which the chuck 10a is mounted is the same as the mobile platform on which the chuck 10a is mounted, except that the laser displacement meter 42 is used for the movement platform. 42 is below 4 t opposite the rod mirror 45. The laser displacement meter 42 illuminates the laser light to receive the laser reflected by the rod mirror 45 to determine the upward displacement of the Y stage 16. In Figure i, the laser displacement meter is placed on the back of the = chuck I〇a. Two: Ray:: Shift gauge installed on ==; - Platform 16 on the rod = ground combined with the W displacement § 10 43 installed in the γ Zhuo Xi μ μ m heart and μ platform y and the chuck 1 〇 When the a-direction γ-direction plateau displacement meter 43 moves in the χγ direction together with the chuck 10a, each of the lightning meters 43 irradiates the laser to the rod mirror milk, and the two laser positions are shot to measure at two places. The rod mirror 46 is reflected by the upper rod in the gamma direction, and the laser displacement gauge control device 4 passes through the position of the main control unit. In the picture! According to the results of the failure of the two thunder greens 43, the slope in the direction of n, 17 201035697 is measured. Two laser displacement meters are arranged on the Y platform 16, two laser displacement meters 43 are moved in the same direction as the chuck 10a, and the chucks i are measured in multiple places by two laser displacement meters 43. Since the displacement of 〇a is such that the displacement of the chuck 10a measured by each of the laser displacement meters 43 does not change due to the movement of the chuck 1A. Even if the chuck 10a is moved in the XY direction, the measurement range of the laser displacement meter 43 is not enlarged. Therefore, the two Rayleigh displacement meters 43 can be set to be more spaced. In Fig. 6, a rod mirror 47 extending in the Y direction is attached to the back surface of the chuck i〇a 〇. The laser displacement meter 44 is mounted on the Y stage 16 opposite the rod mirror 47 by the arm 48. The laser displacement meter 44 irradiates the laser to the rod mirror 47 and receives the laser reflected by the rod mirror 47 to measure the displacement of the rod mirror 47 in the other direction. In FIG. 1, the laser displacement gauge control device 4 detects the rotation in the direction of θ based on the measurement results of the two laser displacement meters 43 and the measurement result of the laser displacement meter 44 by the control of the main control device 70. The resulting position of the chuck 1 〇a in the ΧΥ direction changes. In FIG. 1, the main control device 70 inputs the detection result of the laser length measuring system control device 30 via the input/output interface circuit η. Further, the main control unit 70 inputs the detection result of the laser displacement meter control unit 40 via the input/output interface circuit 72. Further, the main control unit 70 controls the stage drive circuits 8a and 80b based on the detection result of the tilt of the chuck i〇a and the tilt in the x direction, and the θ platform 17 is used. The chucks l〇a, lb are rotated in the x direction to position the substrate 1 in the θ direction. Moreover, the main control device 70 controls the platform driving circuits 8a, 80b according to the detection results of the position of the mobile platform in the XY direction according to the laser length measuring system control unit 18, and passes through the X platform 14 and the gamma platform. 16 The chucks l〇a, l〇b are moved in the XY direction to perform positioning of the one plate 1 in the XY direction at the time of exposure. Next, the correction of the measurement result of the laser displacement meter 43 will be described. Fig. 8 is a view showing an output characteristic of a laser displacement meter. The horizontal axis of Fig. 8 represents the actual displacement measured by the laser displacement meter, and the vertical axis represents the output of the laser displacement meter. As shown in Fig. 8, 'when the measurement result of the laser displacement meter is approximated as a straight line', when the approximate straight line is deviated from the ideal straight line indicated by the broken line*, it is necessary to correct the gorge result of the laser material. The output characteristics of the laser displacement vane lack straight line. If the measurement system is expanded, the result will be largely biased. Therefore, the difference between the result of the production and the approximate straight line is within a predetermined allowable value in the range of _ as the measurement range. The mirror unit 50 of the laser length measurement includes a motor (m〇t〇r) guide 52 and a mirror surface q, a ^ α _ FIG. 9 is a diagram for explaining a method of correcting the measurement result of the laser displacement meter.

Up to 51 and up and down along the lift guide 52. Each mirror surface 53, 54 is normally lowered by the motor 51 and down 201035697. As shown in Fig. 9, when the mirror faces 53 and % are raised by the motor 51, the laser beams irradiated from the respective laser interferometers 33 are reflected by the respective mirror faces 53, 54 and respectively illuminate the bar mirror 46. Further, the laser reflected by the rod mirror 46 is reflected by the mirror surfaces 54, 53 and is irradiated to each of the laser interferometers 33, respectively. The two == interferometers 33 receive the reflections from the rod mirror 46 to measure the laser from the laser source and the laser reflected by the rod mirror at two locations. In Fig. 1, the laser length measuring system control unit 30 is displaced by the main control unit 33 in the direction of the second direction. The laser level control device 40 detects the result of the failure of the chuck i〇a and the Yuda laser displacement meter 43 to create a correction formula, and the result of the ί if two (four) shot material 43 is corrected to ==The measurement result of the dynamometer 43 and the laser system

The detected displacement of the chuck and the cymbal are consistent. Z = The control device 40 makes a correction for each time the displacement of each of the laser displacement meters 2 is measured; 4 == the measurement result of the displacement meter 43. The figure U) for correcting each mine is a map showing the measurement position of the laser displacement meter before correction, and (b) of Fig. 10 is for repairing the heart. The figure of the fruit. Before the correction, the measurement of the laser displacement meter 43 determines the knot == straight line, so in the measurement range, the second line 1〇(1) is generated, and the straight line coincides with the line: the middle error = 20 201035697 upward tilt degree. If you want to detect the chuck 10a, squat on the square M, 〇a 1〇b, install the rod mirror 46, and pass the two lasers to dry, and the corpse 'in multiple places from the laser source field = ❹ Ο 1!= The measurement is performed by interference, and according to the measurement result, the result of the two scales = 43 is corrected according to the detection result and the positive correction formula of the two laser displacement meters 43 according to the detection result. As a result, the two scales of the silky money shoot a

St detects the slope in the direction of the chuck and the money θ. Therefore, when making a correction formula for the laser position 43 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The measurement result of the laser displacement meter 43 is corrected with high precision. According to the present embodiment described above, the moving platform has a χ platform that moves in the χ direction, a γ stage i6 that is mounted on the X stage 14 and moves in the γ direction, and is mounted on the Υ platform 16 in the moving platform. θ platform 17 rotating upward and in the Θ direction, and two laser displacement meters 43 are arranged on the stage 16 to move the two laser positions in the same direction as the chucks 10a, 10b, through two lasers The displacement meter 43 measures the displacement of the chuck 10a at a plurality of places, and detects the inclination of the shovel 10a'IGb in the Θ direction according to the measurement, and according to the detection, the sizzling plates 10a, 10b are turned by the Θ platform Π Rotation in the θ direction σ is used to position the substrate 1 in the θ direction. This allows the two laser displacement meters 43 21 201035697 to be more spaced apart. Therefore, the chuck l〇a can be accurately detected in the 0 direction. The inclination 'the positioning of the substrate 1 in the x-direction is performed with high precision. Further, the rod mirrors 34a, 34b are mounted on the X stage 14, and the rod mirror 35 is mounted on the gamma stage 16, and the laser beam from the laser source 31 and the rod mirrors 34a, 34b are used by the laser interferometers 32a, 32b. The interference of the reflected laser is measured, and the interference of the laser from the laser source 31 and the laser reflected by the rod mirror 35 is measured at two places by the two laser interferometers 33, according to the measurement result. Detecting the position of the mobile platform in the χγ direction, and moving the chucks 1〇a, 10b in the XY direction through the X platform 14 and the γ platform 16 according to the detection result, so as to position the substrate 1 in the 丫 direction, This makes it possible to accurately detect the position of the moving platform in the χγ direction, so that the positioning of the substrate 1 in the χγ direction can be performed with high precision. Moreover, according to the results of the two lasers, the moving platform of the chucks 10a and 10b located at the exposure position moves toward the χγ direction, and the flat swing is not a dish 1V" The frog mirror 46 measures the lightning from the laser source 31 through two drag-and-drop instruments, and according to the measurement of the displacement of the junction, and according to the detection result and the results of the two lightning measurements, two pairs are produced. The laser displacement meter 43: the smuggling of the Shi Shi fruit ten ^, the red silk correction effect of the rhyme system and the _ laser displacement meter 43 U, and the detection of the central disc 10a, surveyed in the θ direction The slope of the upper surface is corrected by the use of the laser length measuring system to accurately detect the chuck 10a, the second shift and the mine can be accurately corrected by using the laser length measuring system at 22 201035697. The displacement meter 43 _定=麻可进-steps accurately detect the slope of the chuck, the slope in the θ direction, the H step is fine, and the substrate is in the θ direction.

❹ Exposing the substrate by using the proximity exposure apparatus of the present invention, or positioning the substrate by using the present invention, and using the front-end of the county to locate the substrate, and exposing the substrate (4), and (10) accurately performing the substrate at the time of exposure. Since the positioning is performed, the pattern can be fired with high precision to manufacture a high-quality display panel substrate. For example, Fig. 11 is a flowchart showing an example of a manufacturing procedure of a TFT substrate showing a liquid crystal display device. In the film formation step (step 1〇1), conductivity as a transparent electrode for liquid crystal driving is formed on a substrate by a sputtering method or a chemical vapor deposition (CVD) method. Body film or job _ etc. In the wire coating step (step 102), the photosensitive resin material (photoresist) is applied by a roll coating method or the like, and a photoresist film is formed on the film formed in the film forming step (step 1〇1). In the exposure step (step 1〇3), the pattern of the mask is transferred onto the photoresist film using a proximity exposure device or a projection exposure device or the like. In the developing step (step 1〇4), the developer is supplied onto the photoresist film by a shower 4 method, and the excess portion of the photoresist film is removed. In the etching step (step 105), the portion of the film formed in the film forming step (step 1〇1), which is masked by the resist film, is removed by wet etching. In the stripping step (step 'Using the stripping solution', the masking step is completed in the surname step (step 105). Before or after these steps, the substrate is cleaned/dried as needed. Steps: These steps are repeated several times to form a TFT array on a substrate. One and FIG. 12 is a flow diagram showing an example of a process of forming a color filter substrate of a liquid crystal display device. In the forming step (step 201), a black matrix is formed on the substrate by a process of photoresist coating, exposure, development, etching, lift-off, etc. In the coloring pattern forming step (step 2G2), the dyeing method is employed. a pigment dispersion method, a printing method, an electrolytic deposition method, or the like, and a colored pattern is formed on the substrate. This step is repeated for the coloring patterns of R, G, and B. In the protective film forming step (step 203), the colored pattern is formed. A protective film is formed thereon, and a transparent electrode film is formed on the protective film in the transparent electrode film forming step (step 2G4). Before, during or after these steps, the substrate is implemented as needed. In the manufacturing step of the TFT substrate shown in FIG. 11, in the exposure step ◎ (step 103), in the manufacturing step of the color filter substrate shown in FIG. 12, the step in the black matrix formation step. In the exposure processing of (step 201) and the coloring pattern forming step (step 202), the proximity exposure apparatus of the present invention or the substrate positioning method of the proximity exposure apparatus of the present invention can be applied. Although the present invention has been disclosed in the preferred embodiment As described above, it is not intended to limit the invention, and any person skilled in the art can make some modifications and retouchings without departing from the spirit and scope of the invention, so that the scope of protection 24 201035697 of the present invention is attached. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing a schematic configuration of a proximity exposure apparatus according to an embodiment of the present invention. Fig. 2 is a front view of a proximity exposure apparatus according to an embodiment of the present invention. Fig. 3 is a side view of a proximity exposure apparatus according to an embodiment of the present invention. Fig. 4 is a view for explaining the operation of the laser length measuring system. Fig. 5 is a view for explaining the operation of the laser length measuring system. Figure 6 is a plan view of the mobile platform. Figure 7 is a side view of the mobile platform.

A diagram of the correction method of the °丨π flashing forceps.

[Main component symbol description] Substrate mask chuck base 2 l〇a > l〇b 11 25 201035697 12 stations 13 X guides 14 X platform 15 Y guides 16 γ platform 17 θ platform 19 chuck support table 20 Mask frame 30 laser length measuring system control device 31 laser source 32a, 32b, 33 laser interferometer 34a, 34b, 35, 45, 46, 47 bar mirror 36, 48 arm 40 laser displacement meter control device 42, 43, 44 Laser Displacement Meter 50 Mirror Unit 51 Motor 52 Elevator Guide 53, 54 Mirror 70 Main Control Unit 71, 72 Input/Output Interface Circuits 80a, 80b Platform Drive Circuit 26

Claims (1)

201035697 VII. Patent application scope: L kinds of proximity exposure devices, including a chuck supporting the substrate and a mask holder for holding the mask, and a small gap is formed between the mask and the substrate to turn the pattern of the mask Printed on a substrate, the proximity exposure apparatus includes: a moving platform having a movement to the X direction (or the γ direction): a table mounted on the first platform and oriented in the γ direction (or the Χ direction) a moving ❹^ platform and a third flat® mounted on the second platform and rotating in the Θ direction, and the moving platform is equipped with the chuck, and α performs positioning of the substrate supported by the chuck; a laser displacement meter disposed on the second platform, moving in the direction of the χ γ, and measuring the displacement of the chuck at a plurality of locations; the first detecting mechanism according to the plurality of laser displacements Measuring the result of the measurement and detecting the inclination of the chuck in the θ direction; , " the platform drive circuit' drives the mobile platform; and the control device, controlling the speech according to the detection result of the first detection mechanism Taiwan purchase The road is rotated by the ship's third platform in the direction of the chuck to position the substrate in the θ direction. 2. The proximity exposure apparatus of claim 1, wherein the apparatus comprises: an eight-laser length measuring system having a light source for generating a laser, and a first reflecting mechanism on the first stage. a second mechanism mounted on the second platform, a first laser interferometer that defeats the laser beam from the light source and the interference reflected by the first reflection mechanism, and is in multiple places 27 201035697 a plurality of second laser interferometers measured by interference of a laser beam from a light source and a laser reflected by a second reflection mechanism; and a second laser beam interference by the second detecting mechanism according to the laser length measuring system Measuring the position of the moving platform in the XY direction by the measurement result of the plurality of second laser interferometers, and the control device controls the platform driving circuit according to the detection result of the second detecting mechanism, The chuck is moved in the χγ direction by the second platform and the second flat chamber to position the substrate in the χγ direction. 3. The proximity exposure apparatus of claim 2, wherein: the third reflecting mechanism mounted on the chuck, and the laser length measuring system passes through the plurality of second lasers Interferometer, wherein the interference from the laser beam from the light source and the laser reflected by the third reflection mechanism is measured at a plurality of locations, and the second detecting mechanism is based on the plurality of second lasers of the laser length measuring system The displacement of the chuck is detected by the measurement result of the interferometer, and the first detecting means detects the displacement of the chuck detected by the second detecting means and the measurement result of the plurality of laser displacement meters a correction formula for correcting the measurement results of the plurality of laser displacement meters, and correcting the measurement results of the plurality of laser displacement meters by the prepared correction formula, and according to the corrected The measurement result of the plurality of laser materials is used to detect the inclination of the chuck in the Θ direction. 4. A substrate positioning method for a proximity exposure device, the proximity exposure 28 201035697 The optical device includes a chuck supporting the substrate and a mask holder for holding the mask, and a small gap is formed between the mask and the substrate to cover On the picture substrate of the cover, the receiving and exposing (four)-based missing branch is to build a disk on the mobile platform, the mobile platform has a first platform that moves in the Y direction, and is mounted on the i-th platform and to the seven-party platform. = (or X direction) the second platform to move, and the second platform to be mounted in the second; Counting the second two: the dynamic laser displacement meter 'measured the displacement of the chuck at multiple locations by passing multiple laser displacements through multiple laser displacement meters, and detecting the inclination of the chuck in the Θ direction according to the measurement result, According to the detection result, the chuck is positioned by the third stage to perform the positioning of the substrate in the x-direction. The method of positioning a proximity exposure device according to claim 4, wherein the first reflective mechanism is mounted on the first platform, The second reflection mechanism is mounted on the second stage, and the interference between the laser beam from the light source and the laser reflected by the worker reflection mechanism is measured by the first laser interferometer, and the plurality of second laser interferences are detected. The instrument measures the interference between the laser beam from the light source and the laser reflected by the second reflection mechanism at a plurality of locations, and detects the position of the mobile platform in the χγ direction based on the measurement result, and passes the first platform according to the detection result. And the second platform moves the lost disk in the ΧΥ direction to position the substrate in the χγ direction. . The method of positioning the apparatus according to claim 5, wherein the third reflecting mechanism is mounted on the chuck, and the plurality of second laser interferometers are used in a plurality of places. The interference between the laser beam from the light source and the laser reflected by the third reflection mechanism is measured. "The displacement of the inflammation disk is detected based on the measurement result. Based on the detection result and the measurement results of the plurality of laser displacement meters, a modified version of the measurement result of the laser displacement §·] The measurement results of the plurality of laser displacement meters are corrected by the prepared correction formula, and the inclination of the chuck in the x direction is detected based on the measurement results of the plurality of corrected laser displacement meters. 7. A method of manufacturing a panel substrate for display, characterized in that exposure of a substrate is performed using a proximity exposure apparatus as claimed in claims No. 3 to 3, respectively. 8. A method of manufacturing a panel substrate for display, characterized in that a substrate positioning method is used to position a substrate by using a substrate positioning method of a proximity exposure apparatus as claimed in the patent application No. 4 to 6 Exposure 0 30