WO2017170218A1 - 多層膜、光学部材および光学部材の製造方法 - Google Patents
多層膜、光学部材および光学部材の製造方法 Download PDFInfo
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- WO2017170218A1 WO2017170218A1 PCT/JP2017/011987 JP2017011987W WO2017170218A1 WO 2017170218 A1 WO2017170218 A1 WO 2017170218A1 JP 2017011987 W JP2017011987 W JP 2017011987W WO 2017170218 A1 WO2017170218 A1 WO 2017170218A1
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- metal compound
- multilayer film
- electronegativity
- optical member
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
Definitions
- the present invention relates to a multilayer film, an optical member, and a method for manufacturing the optical member.
- Patent Document 1 includes a base layer comprising an alumina layer or a mixed layer of alumina and silica, and a hydrophilic layer containing phosphorus, silicon, and oxygen on the surface of the base layer. There is a description about the material.
- the coating of the hydrophilic film in the form in which the base layer of the layer containing alumina as described above is provided does not have sufficient sustainability of the hydrophilic performance against repeated wiping.
- the present invention has been made in view of the above prior art, and an object thereof is to provide a multilayer film and an optical member that are excellent in the sustainability of the hydrophilic performance of the surface.
- the present invention is a multilayer film that is used for coating the surface of a base material and has a base layer disposed on the surface of the base material and a hydrophilic layer laminated on the base layer, the base layer Includes a metal compound that can be trivalent or hexavalent and a metal compound that has an electronegativity difference of 2.1 or more with oxygen, and the hydrophilic layer includes phosphoric acid. It is a multilayer film. Moreover, the present invention is an optical member having a base material and a multilayer film covering the surface of the base material, wherein the multilayer film is the multilayer film described above. .
- the present invention provides a material that includes a metal compound that can be trivalent or hexavalent and a metal compound that has an electronegativity difference of 2.1 or more with oxygen.
- An optical member manufacturing method comprising: forming a base layer; and forming a hydrophilic layer on the surface of the base layer using a material containing phosphoric acid.
- the present invention can provide a multilayer film and an optical member excellent in the sustainability of the hydrophilic performance of the surface.
- FIG. 1 shows a cross-sectional view of an embodiment of the multilayer film of the present invention.
- a multilayer film 4 shown in FIG. 1 is used for coating the surface of a base material, and has a base layer 1 disposed on the surface of the base material and a hydrophilic layer 2 laminated on the base layer 1.
- the underlayer 1 includes a metal compound that can be trivalent or hexavalent, and a metal compound that has an electronegativity difference of 2.1 or more with oxygen
- the hydrophilic layer 2 includes phosphoric acid. .
- FIG. 2 A cross-sectional view of one embodiment of the optical member of the present invention is shown in FIG.
- the optical member 5 shown in FIG. 2 includes a base material 3 and the multilayer film 4 shown in FIG. 1 that covers the surface of the base material 3.
- the substrate 3 glass, plastic, and those having a functional film such as an optical thin film or a conductive film formed on the surface thereof are applied.
- the multilayer film 4 shown in FIG. 1 is laminated on the base material 3 so that the hydrophilic layer 2 becomes a surface layer. It can be imparted and its hydrophilic performance has excellent persistence.
- a hydrophilic layer containing phosphoric acid is formed on a base layer containing a metal compound that can be trivalent or hexavalent in the present invention and a metal compound that has an electronegativity difference of 2.1 or more with oxygen.
- a metal compound that can be trivalent or hexavalent in the present invention and a metal compound that has an electronegativity difference of 2.1 or more with oxygen.
- the hydrophilic layer When a hydrophilic layer containing phosphoric acid is laminated directly on a substrate without using an underlayer, the hydrophilic layer is considered to be bonded to the substrate by physical adsorption between phosphoric acid and the substrate. In this case, since the bond between the base material and the hydrophilic layer is insufficient, the hydrophilic layer is easily peeled off from the base material by wiping. In addition, the unbound phosphoric acid reacts with moisture in the atmosphere, so that the surface state of the hydrophilic film changes and adhesion to the surface of nitrogen, dust, etc. in the atmosphere easily occurs. In addition, when a substance such as calcium phosphate is used as the hydrophilic layer, agglomerates of calcium oxide are generated on the surface of the hydrophilic layer. As a result, on the surface of the hydrophilic layer, water droplets and the like are not easily spread and the hydrophilic performance is deteriorated.
- phosphoric acid tends to take the form of trivalent ions, it easily reacts with a metal that can be trivalent or hexavalent. Therefore, when a base layer containing a metal compound that can be trivalent or hexavalent exists between the hydrophilic layer containing phosphoric acid and the base material, the metal in the base layer reacts with phosphoric acid in the hydrophilic layer. A slightly soluble phosphate compound can be produced. As a result, the reaction between phosphoric acid and moisture in the atmosphere is unlikely to occur, and it is considered that the decrease in hydrophilic performance when exposed to a high temperature and high humidity environment is suppressed.
- examples of the metal compound that can be trivalent or hexavalent contained in the underlayer include aluminum oxide and iron (III) oxide.
- aluminum oxide and iron (III) oxide By containing these metal compounds, the durability of the hydrophilic performance of the multilayer film can be enhanced.
- aluminum oxide and iron oxide (III) should just contain 1 type of them, both types may contain.
- transparency is important for the use of the hydrophilic multilayer film, it is preferable that aluminum oxide is contained. When a large amount of aluminum oxide is contained in the thin film, a tolerable aluminum phosphate is generated in the hydrophilic layer, and a transparent film is easily obtained as the underlayer.
- the present inventors further enhance the sustainability of the hydrophilic performance of the multilayer film by allowing the base layer to contain a metal having a large difference in electronegativity with oxygen constituting the phosphoric acid of the hydrophilic layer. I found out that I can do it.
- the presence of a metal having a large difference in electronegativity with oxygen constituting the phosphoric acid of the hydrophilic layer in the underlayer is influenced by the high ionicity of the metal element, and the phosphoric acids of the hydrophilic layer It is considered that the ionic bond of the base layer and the base material is also increased.
- the metal compound having a large difference in electronegativity from oxygen contained in the underlayer is preferably a metal compound having a difference in electronegativity from oxygen of 2.1 or more.
- a metal having a difference in electronegativity with oxygen of 2.1 or more is zirconium (electronegativity 1.4), hafnium (electronegativity 1.3), or magnesium (electronegativity 1.2). ) Is preferable.
- the value of the electronegativity in the present invention is the value of the electronegativity of Pauli.
- the metal compound contained in the underlayer and having a difference in electronegativity with oxygen of 2.1 or more is at least one selected from zirconium oxide, hafnium oxide, and magnesium oxide.
- a metal is preferred.
- a plurality of these metal compounds may be contained.
- a more preferable embodiment for enhancing the sustainability of the hydrophilic performance of the multilayer film is an embodiment in which the underlying layer contains zirconium oxide or hafnium oxide, and particularly preferably, the underlying layer contains zirconium oxide. It is the aspect contained.
- the underlayer contains a metal compound that can be a trivalent or hexavalent ion
- the metal compound in the underlayer reacts with phosphoric acid in the hydrophilic layer so that the underlayer and the hydrophilic layer A poorly soluble substance can be generated at the interface, and reaction with moisture in the atmosphere can be suppressed.
- the underlayer contains a metal compound that can be a trivalent or hexavalent ion
- the metal compound in the underlayer reacts with phosphoric acid in the hydrophilic layer so that the underlayer and the hydrophilic layer A poorly soluble substance can be generated at the interface, and reaction with moisture in the atmosphere can be suppressed.
- it can suppress that substances other than the water
- the bonding force between phosphoric acids can be increased electrically, and further, the hydrophilic layer and the substrate Therefore, the durability of the hydrophilic performance of the multilayer film can be increased.
- a multilayer film containing aluminum oxide and zirconium oxide and the hydrophilic layer containing phosphoric acid is a particularly preferable embodiment for the present invention.
- the electronegativity of oxygen with respect to the total weight of a metal compound having a difference in electronegativity with oxygen of 2.1 or more and a metal compound capable of being trivalent or hexavalent is preferably in the range of 50% or less in order to improve the sustainability of the hydrophilic performance, and in particular in the range of 5% to 50%. preferable.
- the base layer preferably has a thickness in the range of 1 nm to 100 nm, while the hydrophilic layer preferably has a thickness in the range of 10 nm to 250 nm.
- the multilayer film according to the present invention can be formed on various substrates. Specific examples include substrates such as float glass, quartz, sapphire, and polycarbonate. In addition, since the multilayer film according to the present invention is transparent, an optical member having a hydrophilic function can be obtained by forming a film on the transparent substrate as described above.
- the optical member having a hydrophilic function examples include glasses, goggles, a display, a touch panel, and a camera.
- the multilayer film of the present invention uses a material containing a metal compound that can be trivalent or hexavalent and a metal compound that has an electronegativity difference of 2.1 or more with oxygen, It can be formed by a film forming step and a step of forming a hydrophilic layer on the surface of the base layer using a material containing phosphoric acid.
- the method for producing an optical member of the present invention uses a material containing a metal compound that can be trivalent or hexavalent and a metal compound that has a difference in electronegativity of 2.1 or more from oxygen, A step of forming a base layer on the surface of the base material; and a step of forming a hydrophilic layer on the surface of the base layer using a material containing phosphoric acid.
- a metal compound that can be trivalent or hexavalent and a metal compound that has a difference in electronegativity with oxygen of 2.1 or more are the above-described metal compounds.
- the underlayer and the hydrophilic layer are formed by vapor deposition.
- the vapor deposition method is a technique in which a vapor deposition material is heated in a vacuum chamber, components of the vaporized vapor deposition material are deposited on the base material, and a thin film is formed on the base material.
- the heating method for the vapor deposition material include an electron gun, resistance heating, and plasma. Further, it is possible to modify the film by controlling the atmosphere with a gas flow of oxygen, hydrogen, or the like into the vacuum chamber.
- the shape of the vapor deposition material includes a pellet shape and a granule shape, but is not limited to these shapes.
- the vapor deposition method is easy to control the film thickness on the nano order, so even when combining an optical multilayer film such as an antireflection film and the multilayer film of the present invention, without hindering the design as an optical multilayer film, It is possible to have a highly durable surface hydrophilic performance.
- the material for forming the underlayer is used to increase the sustainability of the hydrophilic performance, with respect to the total weight with the metal compound that can be trivalent or hexavalent.
- the weight ratio of the metal compound having a difference in electronegativity with oxygen of 2.1 or more is preferably in the range of 9% to 90%, and in particular, in the range of 17% to 33%. More preferred.
- the underlayer is preferably formed in a thickness range of 1 nm to 100 nm, and the hydrophilic layer is preferably formed in a thickness range of 10 nm to 250 nm.
- Example 1 Preparation of vapor deposition material used for film formation of underlayer>
- fatty acid emulsion, polyoxyethylene rubitan monooleate, glycerin, polyacrylic acid triethanolamine salt, (Mixed solution of pure water) was added and mixed to obtain a blended powder.
- the obtained blended powder After putting 15 g of the obtained blended powder into a 30 mm diameter mold, it was molded with a uniaxial pressure molding machine to obtain a cylindrical pellet. Thereafter, the pellets were heated at 1500 ° C. for 10 hours using a box-type muffle firing apparatus to obtain a metal oxide vapor deposition material for forming a base layer.
- ⁇ Preparation of vapor deposition material used to form hydrophilic layer An appropriate amount of pure water was added to calcium phosphate (white powder, average particle size of 10 ⁇ m, purity of 98% or more), kneaded, and then sieved to form a granule having a size of 1 to 2 mm. The obtained granules were put into a box-type muffle baking apparatus and heated at 1200 ° C. for 2 hours to obtain a phosphoric acid vapor deposition material for forming a hydrophilic layer.
- ⁇ Film formation> Using a vacuum vapor deposition apparatus (dome diameter ⁇ 900 mm, vapor deposition distance 890 mm), float glass (diameter 74.5 mm, thickness 1.1 mm) was placed on the dome as a base material, and for the underlayer produced by the method described above. The metal oxide vapor deposition material and the phosphoric acid vapor deposition material for the hydrophilic layer were placed in the vapor deposition apparatus. The inside of the chamber was depressurized, and the phosphoric acid deposition material was irradiated with an electron beam for 5 minutes while the shutter was closed to dissolve it.
- an electron beam was applied to the metal oxide vapor deposition material for the underlayer, and the vaporized component was deposited on the substrate to form an underlayer with a thickness of 10 nm.
- the starting degree of vacuum was 2.0 ⁇ 10 ⁇ 3 Pa or less
- the film formation rate was 2 kg / sec, and under an oxygen stream.
- an electron beam was applied to the dissolved phosphoric acid vapor deposition material, and the vaporized component was deposited on the base layer to form a hydrophilic layer having a thickness of 100 nm.
- the film formation rate was 2 liters / sec and was in an oxygen stream.
- the vacuum apparatus was returned to atmospheric pressure, and a substrate on which a multilayer film composed of an underlayer and a hydrophilic layer was formed on a float glass substrate was taken out, and used as a deposition substrate.
- ⁇ Deposition substrate wiping test> The film formation substrate was stored in a refrigerator at about 4 ° C. for 8 hours or more and cooled. Using a steam humidifier KS1-A083 manufactured by YAMAZEN, steam was sprayed onto the cooled film formation substrate for 20 seconds from a position approximately 2 cm away from the opening of the steam humidifier. The film formation substrate on which moisture was adhered by spraying steam was wiped off with an industrial wiper. The steam spraying operation on the cooled substrate was repeated 5 times to obtain a measurement substrate. Using a contact angle meter CA-X150 manufactured by Kyowa Interface Chemical Co., Ltd., 2.5 ⁇ L of pure water was dropped onto the film surface of the measurement substrate, and an image processing contact angle measurement was performed. The contact angle was 9.7 °, and excellent hydrophilic performance was maintained.
- the film formation substrate was put into a constant temperature bath PL1-KP manufactured by Espec, and stored in an environment of 60 ° C. and 90% RH for 150 hours or more to obtain an observation substrate.
- the film surface of the observation substrate was observed using a manipulator APS-001 manufactured by Micro Support to confirm the presence of white turbidity and foreign matter.
- the percentage of foreign matter in the observed screen was less than 20%.
- XRF fluorescent X-ray analysis
- a mixed powder used for preparing a metal oxide vapor deposition material for forming a base layer was prepared.
- the film formation substrate was prepared and measured / evaluated in the same manner as in Example 1. As a result, the hydrophilic layer was not peeled off.
- the contact angle after the wiping test was 9.4 °, and the proportion of foreign matter in the observed screen was 20% or less.
- a mixed powder used for preparing a metal oxide vapor deposition material for forming a base layer was prepared.
- the film formation substrate was prepared and measured / evaluated in the same manner as in Example 1. As a result, the hydrophilic layer was not peeled off.
- the contact angle after the wiping test was 8.6 °, and the proportion of foreign matter in the observed screen was 20% or less.
- the mixture powder was used in the same manner as in Example 1 to prepare a metal oxide vapor deposition material for forming a base layer.
- the film formation substrate was prepared and measured / evaluated in the same manner as in Example 1. As a result, the hydrophilic layer was not peeled off.
- the contact angle after the wiping test was 11.3 °, and the proportion of foreign matter in the observed screen was less than 40%.
- the mixture was mixed in the same manner as in Example 1 to prepare a mixed powder used for preparing a metal oxide vapor deposition material for forming a base layer.
- the film formation substrate was prepared and measured / evaluated in the same manner as in Example 1. As a result, the hydrophilic layer was not peeled off.
- the contact angle after the wiping test was 18.6 °, and the proportion of foreign matter in the observed screen was 40% or more.
- a mixed powder used for preparing a metal oxide vapor deposition material for forming a base layer was prepared.
- the film formation substrate was prepared and measured / evaluated in the same manner as in Example 1. As a result, the hydrophilic layer was not peeled off.
- the contact angle after the wiping test was 6.6 °, and the proportion of foreign matter in the observed screen was 40% or more.
- a mixed powder used for preparing a metal oxide vapor deposition material for forming a base layer was prepared.
- the film formation substrate was prepared and measured / evaluated in the same manner as in Example 1. As a result, the hydrophilic layer was not peeled off.
- the contact angle after the wiping test was 18.1 °, and the proportion of foreign matter in the observed screen was less than 40%.
- the mixture was prepared in the same manner as in Example 1 to prepare a metal oxide vapor deposition material for forming an underlayer film.
- the film formation substrate was prepared and measured / evaluated in the same manner as in Example 1. As a result, the hydrophilic layer was not peeled off.
- the contact angle after the wiping test was 18.0 °, and the proportion of foreign matter in the observed screen was 40% or more.
- Example 9 ⁇ Preparation of antireflection film> BK-7 glass substrate ( ⁇ 74.5mm ⁇ 1.1t), SiO 2 vapor deposition material (particle size 1 to 3mm), vapor deposition material used to form the underlayer produced in Example 1, and hydrophilic layer
- the vapor deposition material to be used was placed in a vacuum vapor deposition apparatus, and the pressure was reduced by a vacuum pump while heating the BK-7 glass substrate to a heating temperature of 200 ° C. After reducing the pressure to 2.0 ⁇ 10 ⁇ 3 Pa, a 182 nm SiO 2 layer was formed on the BK-7 substrate at a deposition rate of 10 ⁇ / sec.
- a base layer was formed to a thickness of 50 nm on the substrate on which the SiO 2 layer was formed by the same condition method as in Example 1, and a hydrophilic layer was further stacked to a thickness of 98 nm.
- the refractive index was 1.46 for the SiO 2 layer, 1.71 for the underlayer, and 1.55 for the hydrophilic layer.
- the measurement result of the reflectance at this time is shown in FIG.
- the reflectance at a wavelength of 500 nm was about 1.4%, and a good antireflection film could be obtained.
- a laminated film in which the above base layer and hydrophilic layer are incorporated in the optical design of the antireflection film can be produced on a substrate other than BK-7 glass.
- a polycarbonate substrate is used as an example of a plastic substrate.
- the respective film thicknesses are designed such that the SiO 2 layer is 179 nm, the underlayer is 56 nm, and the hydrophilic layer is 95 nm.
- the SiO 2 layer is 167 nm, the underlayer is 88 nm, and the hydrophilic layer is 75 nm.
- the antireflection film can be designed other than the above, and a SiO 2 layer is formed to 162 nm on a BK-7 glass substrate, and then an Al 2 O 3 layer (refractive index: 1.67) is formed to 49 nm. After that, a good antireflection function can be obtained even in a multilayer film in which the base layer is 49 nm and the hydrophilic layer is 75 nm.
- Example 10 ⁇ Production of network camera cover>
- the polycarbonate network camera cover, the vapor deposition material used for forming the underlayer produced in Example 1, and the vapor deposition material used for forming the hydrophilic layer were placed in a vacuum vapor deposition apparatus, and the camera cover was heated to a temperature of 50 ° C. While being heated, the pressure was reduced with a vacuum pump. After reducing the pressure to 2.0 ⁇ 10 ⁇ 3 Pa, a base layer was formed by the same method as in Example 1, and then a hydrophilic layer was formed on the base layer.
- the vacuum deposition apparatus was returned to atmospheric pressure, the network camera cover was taken out, attached to the network camera body, and the camera body 6 was laminated with the base material 3, the underlayer 1 and the hydrophilic layer 2 as shown in FIG. Covered with a camera cover.
- this was used in an outdoor environment for 40 days and the camera image was confirmed in rainy weather, no water droplets were observed on the network camera image even in the rainy weather, maintaining good visibility.
- Example 1 An aluminum oxide powder was used to prepare a compounded powder used for producing a metal oxide vapor deposition material in the same manner as in Example 1. Using the phosphoric acid deposition material prepared by the method of Example 1, the film formation substrate was prepared, measured, and evaluated in the same manner as in Example 1. As a result, the contact angle after the wiping test of the film formation substrate was 20. The angle was 3 °, and the proportion of foreign matter in the observed screen was 10% or less.
- Example 2 Zirconium oxide was used, and it was set as the compound powder used for metal oxide vapor deposition material preparation by the method similar to Example 1.
- FIG. Using the metal oxide vapor deposition material produced using the above-mentioned blended powder and the phosphoric acid vapor deposition material produced by the method of Example 1, the production of the deposition substrate and the measurement / evaluation were carried out in the same manner as in Example 1. As a result, the contact angle after the wiping test of the film formation substrate was 11.2 °, and the proportion of foreign matters in the observed screen exceeded 90%.
- Example 3 Using silicon oxide having an electronegativity difference of 1.7 with respect to oxygen, a mixed powder used for producing a metal oxide vapor deposition material was produced in the same manner as in Example 1. Using the metal oxide vapor deposition material produced using the above-mentioned blended powder and the phosphoric acid vapor deposition material produced by the method of Example 1, the production of the deposition substrate and the measurement / evaluation were carried out in the same manner as in Example 1. As a result, the contact angle after the wiping test of the film formation substrate was 24.8 °.
- Example 4 Niobium pentoxide having an electronegativity difference with oxygen of 1.6 was used, and a mixed powder used for producing a metal oxide vapor deposition material was produced in the same manner as in Example 1. Using the metal oxide vapor deposition material produced using the above-mentioned blended powder and the phosphoric acid vapor deposition material produced by the method of Example 1, the production of the deposition substrate and the measurement / evaluation were carried out in the same manner as in Example 1. As a result, the contact angle after the wiping test of the film formation substrate was 39.4 °.
- Electronegativity of metal compound (trivalent or hexavalent compound) that can be trivalent or hexavalent of metal oxide vapor deposition material and underlayer vapor deposition film in Examples 1-8 and Comparative Examples 1-4 above and oxygen The weight ratio of the metal compound (low electronegativity compound) having a degree difference of 2.1 or more and the results of measurement / evaluation are shown in Table 1 below.
- Table 1 For the wiping test of the film formation substrate in Table 1, the case where the contact angle was 10 ° or less was marked as ⁇ , the case where it exceeded 10 ° and 20 ° or less, and the case where it exceeded 20 ° was marked as x.
- the case where the proportion of foreign matters in the screen of the film formation substrate observed with a manipulator was 40% or less was marked as ⁇
- the case where it was 90% or less was marked as ⁇
- the case where it exceeded 90% was marked as ⁇ .
- the contact angle exceeds 20 ° is set as x because it is set as a standard representing high hydrophilic performance that can be used in a wide range of industrial fields, and as a general definition of hydrophilic performance, 90 °. The following are shown. Therefore, depending on the usage, it can be practically used with a hydrophilic performance with a contact angle of about 60 °.
- the multilayer film having the base layer and the hydrophilic layer of the present embodiment it is possible to improve the durability of the antifogging performance as compared with the conventional hydrophilic film.
- the substrate shown as an example shows a contact angle value of 20 ° or less even after the wiping test is performed. When it is seen, the characters are easy to read, which means excellent hydrophilic performance.
- the example of the production of the multilayer film by the vacuum deposition method has been described.
- the production method is not limited to this, and the multilayer film produced by the sol-gel method, for example, is the same as the present invention. It is possible to have the following characteristics.
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Abstract
Description
この中で、防曇膜は、部材の表面で水滴が濡れ広がる親水の機能を利用して、ガラス、樹脂、金属又はそれらの複合材に発生する曇りを除去するものである。
特許文献1には、アルミナ層若しくはアルミナとシリカの混合層からなる下地層と、その上部にリン、珪素及び酸素を含む親水性を持った親水層を表面に設けてなることを特徴とする基材について、記述がある。
本発明は上記従来の技術に鑑みてなされたものであり、その表面の親水性能の持続性に優れた、多層膜及び光学部材を提供することを目的とする。
また、本発明は、基材と、前記基材の表面を被覆している多層膜とを有する光学部材であって、多層膜が、上記の多層膜であることを特徴とする光学部材である。
また、本発明は、3価または6価となり得る金属の化合物と、酸素との電気陰性度の差が2.1以上である金属の化合物とを含む材料を用いて、基材の表面に下地層を成膜する工程と、リン酸を含む材料を用いて、前記下地層の表面に親水層を成膜する工程とを有することを特徴とする光学部材の製造方法である。
ここで、基材3としては、ガラス、プラスチック、さらにこれらの表面に光学薄膜や導電膜などの機能膜が成膜されているものが適用される。
また、本発明の多層膜は、3価または6価となり得る金属の化合物と、酸素との電気陰性度の差が2.1以上である金属の化合物とを含む材料を用いて、下地層を成膜する工程と、リン酸を含む材料を用いて、前記下地層の表面に親水層を成膜する工程とで、形成することができる。
また、本発明に係る光学部材の製造方法において、下地層の成膜と親水層の成膜は、とりわけ、蒸着法により行われることが好ましい。
<下地層の成膜に用いる蒸着材料作製>
酸化アルミニウム(白色微粉末、平均粒径0.6μm、純度99.9%以上)と、酸化ジルコニウム(白色粉末、平均粒径20μm、純度99.9%以上)を、重量比Al2O3:ZrO2=83:17の割合でアルミナ乳鉢に投入し、さらに投入した粉末の7%の重量の有機バインダー(脂肪酸エマルジョン、ポリオキシエチレンルビタンモノオレエート、グリセリン、ポリアクリル酸トリエタノールアミン塩、純水の混合溶液)を加え、混合を行い調合粉とした。
得られた調合粉を、直径30mmの金型へ15gを投入した後、一軸加圧成型機で成型し円柱形状のペレットとした。その後、ペレットを箱型マッフル焼成装置を用いて1500℃で10時間加熱を行い、下地層の成膜用金属酸化物蒸着材料とした。
リン酸カルシウム(白色粉末、平均粒径10μm、純度98%以上)に適量の純水を加え、混練した後に篩がけを行い、1~2mmのサイズの顆粒形状とした。得られた顆粒を箱型マッフル焼成装置に投入し、1200℃で2時間加熱を行い親水層の成膜用リン酸蒸着材料とした。
真空蒸着装置(ドーム径Φ900mm、蒸着距離890mm)を用いて、基材としてフロートガラス(直径74.5mm、厚さ1.1mm)をドームへ設置し、さらに前記した方法で作製した下地層用の金属酸化物蒸着材料および親水層用のリン酸蒸着材料を、蒸着装置内へ設置した。チャンバー内を減圧し、シャッターを閉じたまま5分間リン酸蒸着材料に電子ビームを照射して、溶かし込みを行った。
次に、下地層用の金属酸化物蒸着材料に電子ビームを当て、気化させた成分を基材に堆積させ、膜厚10nmの下地膜を成膜した。この時、開始真空度は2.0×10-3Pa以下で成膜レートは2Å/secであり、酸素気流下だった。さらに、溶かし込んだリン酸蒸着材料に電子ビームを当て、気化させた成分を下地層の上に堆積させ、膜厚100nmの親水層を形成した。この時、成膜レートは2Å/secであり、酸素気流下だった。
真空装置を大気圧に戻し、フロートガラス基材に下地層と親水層からなる多層膜を成膜した基板を取り出し、成膜基板とした。
協和界面化学社製接触角計CA-X150を用いて、成膜基板の膜面に純水2.5μLを滴下し、画像処理式の接触角測定を実施した。接触角は6.3°で優れた親水性能を示した。
成膜基板を約4℃の冷蔵庫で8時間以上保管し冷却した。冷却された成膜基板に、YAMAZEN社製スチーム加湿器KS1-A083を用いて、スチーム加湿器の開口口より約2cm離した位置から20秒間スチームを噴きつけた。スチームを噴きつけて水分の付着した成膜基板を、産業用ワイパーで拭き取った。
上記の冷却した基板へのスチーム噴きつけ操作を5回繰り返し、測定用基板とした。協和界面化学社製接触角計CA-X150を用いて、測定用基板の膜面に純水2.5μLを滴下し、画像処理式の接触角測定を実施した。接触角は9.7°であり、優れた親水性能を維持していた。
成膜基板をエスペック社製恒温槽PL1-KPに投入し60℃、90%RHの環境で150時間以上保管し観察用基板とした。観察用基板の膜面を、Micro Support社製マニュピレーターAPS-001を用いて観察し、白濁や異物の有無を確認した。観察した画面の中で異物の占める割合は2割以下だった。
リガク社製蛍光X線分析(XRF)装置ZSX Primus2を用いて、フロートガラス基材上に金属酸化物蒸着材料だけを成膜した半成膜基板の成分分析を行ったところ、下地層の成分としてジルコニウムおよびアルミニウムが検出された。このときの重量比はAl2O3:ZrO2=92.4:7.6の割合であった。
また、フロートガラス基材上に下地層を成膜し、さらにその上にリン酸カルシウム蒸着材料料を成膜した成膜基板の成分分析を行ったところ、多層膜の成分としてジルコニウム、アルミニウム、リン、カルシウムが検出された。
酸化アルミニウム(白色微粉末、平均粒径0.6μm、純度99.9%以上)と、酸化ジルコニウム(白色粉末、平均粒径20μm、純度99.9%以上)を重量比Al2O3:ZrO2=77:23の割合で混合し、実施例1と同様の方法で下地層の成膜用金属酸化物蒸着材料作製に用いる調合粉とした。
実施例1の方法で作製した親水層成膜用のリン酸蒸着材料を用いて、実施例1と同様にして成膜基板の作製ならび測定・評価を実施した結果、親水層のはがれは起こらず、拭き取り試験後の接触角は9.4°であり、観察した画面の中で異物の占める割合は2割以下だった。また、成膜した下地層における、ジルコニウムおよびアルミニウムの重量比は、Al2O3:ZrO2=93.2:6.8の割合であった。
酸化アルミニウム(白色微粉末、平均粒径0.6μm、純度99.9%以上)と、酸化ジルコニウム(白色粉末、平均粒径20μm、純度99.9%以上)を重量比Al2O3:ZrO2=67:33の割合で混合し、実施例1と同様の方法で下地層の成膜用金属酸化物蒸着材料作製に用いる調合粉とした。
実施例1の方法で作製した親水層成膜用のリン酸蒸着材料を用いて、実施例1と同様にして成膜基板の作製ならび測定・評価を実施した結果、親水層のはがれは起こらず、拭き取り試験後の接触角は8.6°であり、観察した画面の中で異物の占める割合は2割以下だった。また、成膜した下地層における、酸化アルミニウムおよび酸化ジルコニウムの重量比は、Al2O3:ZrO2=93.1:6.9の割合であった。
酸化アルミニウム(白色微粉末、平均粒径0.6μm、純度99.9%以上)と、酸化ジルコニウム(白色粉末、平均粒径20μm、純度99.9%以上)を重量比Al2O3:ZrO2=50:50の割合で混合し、実施例1と同様の方法で下地層の成膜用金属酸化物蒸着材料作製に用いる調合粉とした。
実施例1の方法で作製した親水層成膜用のリン酸蒸着材料を用いて、実施例1と同様にして成膜基板の作製ならびに測定・評価を実施した結果、親水層のはがれは起こらず、拭き取り試験後の接触角は11.3°であり、観察した画面の中で異物の占める割合は4割未満だった。また、成膜した下地層における、酸化アルミニウムおよび酸化ジルコニウムの重量比は、Al2O3:ZrO2=92.4:7.6の割合であった。
酸化アルミニウム(白色微粉末、平均粒径0.6μm、純度99.9%以上)と、酸化ジルコニウム(白色粉末、平均粒径20μm、純度99.9%以上)を重量比Al2O3:ZrO2=23:77の割合で混合し、実施例1と同様の方法で下地層の成膜用金属酸化物蒸着材料作製に用いる調合粉とした。
実施例1の方法で作製した親水層成膜用のリン酸蒸着材料を用いて、実施例1と同様にして成膜基板の作製ならびに測定・評価を実施した結果、親水層のはがれは起こらず、拭き取り試験後の接触角は18.6°であり、観察した画面の中で異物の占める割合は4割以上だった。また、成膜した下地層における、酸化アルミニウムおよび酸化ジルコニウムの重量比は、Al2O3:ZrO2=90.5:9.5の割合であった。
酸化アルミニウム(白色微粉末、平均粒径0.6μm、純度99.9%以上)と、酸化ジルコニウム(白色粉末、平均粒径20μm、純度99.9%以上)を重量比Al2O3:ZrO2=10:90の割合で混合し、実施例1と同様の方法で下地層の成膜用金属酸化物蒸着材料作製に用いる調合粉とした。
実施例1の方法で作製した親水層成膜用のリン酸蒸着材料を用いて、実施例1と同様にして成膜基板の作製ならびに測定・評価を実施した結果、親水層のはがれは起こらず、拭き取り試験後の接触角は6.6°であり、観察した画面の中で異物の占める割合は4割以上だった。また、成膜した下地層における、酸化アルミニウムおよび酸化ジルコニウムの重量比は、Al2O3:ZrO2=52.9:47.1の割合であった。
酸化アルミニウム(白色微粉末、平均粒径0.6μm、純度99.9%以上)と、酸化ジルコニウム(白色粉末、平均粒径20μm、純度99.9%以上)を重量比Al2O3:ZrO2=91:9の割合で混合し、実施例1と同様の方法で下地層の成膜用金属酸化物蒸着材料作製に用いる調合粉とした。
実施例1の方法で作製した親水層成膜用のリン酸蒸着材料を用いて、実施例1と同様にして成膜基板の作製ならびに測定・評価を実施した結果、親水層のはがれは起こらず、拭き取り試験後の接触角は18.1°であり、観察した画面の中で異物の占める割合は4割未満だった。また、成膜した下地層における、酸化アルミニウムおよび酸化ジルコニウムの重量比は、Al2O3:ZrO2=93.8:6.2の割合であった。
酸化アルミニウム(白色微粉末、平均粒径0.6μm、純度99.9%以上)と、酸化ハフニウム(白色粉末、平均粒径0.6μm、純度99.9%以上)を重量比Al2O3:HfO2=80:20の割合で混合し、実施例1と同様の方法で下地層の成膜用金属酸化物蒸着材料作製に用いる調合粉とした。
実施例1の方法で作製した親水層成膜用のリン酸蒸着材料を用いて、実施例1と同様にして成膜基板の作製ならびに測定・評価を実施した結果、親水層のはがれは起こらず、拭き取り試験後の接触角は18.0°であり、観察した画面の中で異物の占める割合は4割以上だった。また、成膜した下地層における、酸化アルミニウムおよび酸化ハフニウムの重量比は、Al2O3:HfO2=94.8:5.2の割合であった。
<反射防止膜の作製>
BK-7ガラス基板(Φ74.5mm×1.1t)とSiO2蒸着材料(粒径1~3mm)と実施例1で作製した下地層の成膜に用いる蒸着材料、ならびに親水層の成膜に用いる蒸着材料を、真空蒸着装置内に設置し、BK-7ガラス基板を加熱温度200℃に加熱しながら真空ポンプにて減圧した。2.0×10-3Paまで減圧後、BK-7基板にSiO2層を成膜レート10Å/secにて182nm成膜した。次にこのSiO2層が成膜されている基板に、実施例1と同様の条件方法にて下地層を50nm成膜し、さらに親水層を98nm積層した。このとき屈折率はSiO2層が1.46、下地層が1.71、親水層が1.55であった。
このときの反射率の測定結果を図3に示す。波長500nmでの反射率は約1.4%であり、良好な反射防止膜を得ることが出来た。
また、上記の下地層と親水層を反射防止膜の光学設計に組み込んだ積層膜は、BK-7ガラス以外の基板にも作製することが可能で、プラスチック基板の例としては、ポリカーボネート基板の場合、それぞれの膜厚はSiO2層が179nm、下地層が56nm、親水層が95nmという設計となる。またアクリル基板の場合は、SiO2層が167nm、下地層が88nm、親水層が75nmである。反射防止膜は、上記以外の設計も可能であり、BK-7ガラス基板に対して、SiO2層を162nm成膜し、次にAl2O3層(屈折率1.67)を49nm成膜した後に、下地層を49nm、親水層を75nm積層した多層膜においても良好な反射防止機能が得られる。
<ネットワークカメラカバーの作製>
ポリカーボネート製ネットワークカメラカバーと、実施例1で作製した下地層の成膜に用いる蒸着材料、ならびに親水層の成膜に用いる蒸着材料を、真空蒸着装置内に設置し、カメラカバーを加熱温度50℃に加熱しながら真空ポンプにて減圧した。2.0×10-3Paまで減圧後、実施例1と同様の条件方法にて下地層を成膜し、続いて下地層の上に親水層を成膜した。
真空蒸着装置を大気圧に戻して、ネットワークカメラカバーを取り出し、ネットワークカメラ本体に取り付け、図3に示すように、カメラ本体6を、基材3と下地層1と親水層2とが積層されたカメラカバーで覆うようにした。これを屋外環境下において40日間使用したのちの雨天時にカメラの映像を確認したところ、雨天屋外においてもネットワークカメラの画像には水滴の付着は見られず、良好な視認性を維持していた。
酸化アルミニウム粉末を用い、実施例1と同様の方法で金属酸化物蒸着材料作製に用いる調合粉とした。
実施例1の方法で作製したリン酸蒸着材料を用いて、実施例1と同様にして成膜基板の作製ならびに測定・評価を実施した結果、成膜基板の拭き取り試験後の接触角は20.3°であり、観察した画面の中で異物の占める割合は1割以下だった。
酸化ジルコニウムを用い、実施例1と同様の方法で金属酸化物蒸着材料作製に用いる調合粉とした。
上記調合粉を用いて作製した金属酸化物蒸着材料と、実施例1の方法で作製したリン酸蒸着材料を用いて、実施例1と同様にして成膜基板の作製ならびに測定・評価を実施した結果、成膜基板の拭き取り試験後の接触角は11.2°であり、観察した画面の中で異物の占める割合は9割を超えていた。
酸素との電気陰性度差が1.7となる酸化ケイ素を用い、実施例1と同様の方法で金属酸化物蒸着材料作製に用いる調合粉とした。
上記調合粉を用いて作製した金属酸化物蒸着材料と、実施例1の方法で作製したリン酸蒸着材料を用いて、実施例1と同様にして成膜基板の作製ならびに測定・評価を実施した結果、成膜基板の拭き取り試験後の接触角は24.8°であった。
酸素との電気陰性度差が1.6となる五酸化ニオブを用い、実施例1と同様の方法で金属酸化物蒸着材料作製に用いる調合粉とした。
上記調合粉を用いて作製した金属酸化物蒸着材料と、実施例1の方法で作製したリン酸蒸着材料を用いて、実施例1と同様にして成膜基板の作製並びに測定・評価を実施した結果、成膜基板の拭き取り試験後の接触角は39.4°であった。
2 親水層
3 基材
4 多層膜
5 光学部材
6 カメラ本体
Claims (22)
- 基材の表面の被覆に用いられ、前記基材の表面に配置される下地層と、前記下地層の上に積層された親水層とを有する多層膜であって、
前記下地層は、3価または6価となり得る金属の化合物と、酸素との電気陰性度の差が2.1以上である金属の化合物とを含み、前記親水層は、リン酸を含むことを特徴とする多層膜。 - 前記3価または6価となり得る金属の化合物は、酸化アルミニウム及び酸化鉄(III)から選択される少なくとも一種の金属であることを特徴とする請求項1に記載の多層膜。
- 前記3価または6価となり得る金属の化合物は、酸化アルミニウムであることを特徴とする請求項1に記載の多層膜。
- 前記酸素との電気陰性度の差が2.1以上である金属の化合物は、酸化ジルコニウム、酸化ハフニウム、及び、酸化マグネシウムから選択される少なくとも一種の金属であることを特徴とする請求項1~3のいずれか一項に記載の多層膜。
- 前記酸素との電気陰性度の差が2.1以上である金属の化合物は、酸化ジルコニウムまたは酸化ハフニウムであることを特徴とする請求項1~3のいずれか一項に記載の多層膜。
- 前記酸素との電気陰性度の差が2.1以上である金属の化合物は、酸化ジルコニウムであることを特徴とする請求項1~3のいずれか一項に記載の多層膜。
- 前記酸素との電気陰性度の差が2.1以上である金属の化合物と前記3価または6価となり得る金属の化合物との合計重量に対する前記酸素との電気陰性度の差が2.1以上である金属の化合物の重量割合は、50%以下であることを特徴とする請求項1~6のいずれか一項に記載の多層膜。
- 前記酸素との電気陰性度の差が2.1以上である金属の化合物と前記3価または6価となり得る金属の化合物との合計重量に対する前記酸素との電気陰性度の差が2.1以上である金属の化合物の重量割合は、5%~50%であることを特徴とする請求項1~6のいずれか一項に記載の多層膜。
- 前記下地層は、厚さが1nm~100nmの範囲であることを特徴とする請求項1~8のいずれか一項に記載の多層膜。
- 前記親水層は、厚さが10nm~250nmの範囲であることを特徴とする請求項1~9のいずれか一項に記載の多層膜。
- 基材と、前記基材の表面を被覆している多層膜とを有する光学部材であって、前記多層膜は、請求項1~10のいずれか一項に記載の多層膜であることを特徴とする光学部材。
- 3価または6価となり得る金属の化合物と、酸素との電気陰性度の差が2.1以上である金属の化合物とを含む材料を用いて、基材の表面に下地層を成膜する工程と、リン酸を含む材料を用いて、前記下地層の表面に親水層を成膜する工程とを有することを特徴とする光学部材の製造方法。
- 前記下地層の成膜と前記親水層の成膜とが、蒸着法により行われることを特徴とする請求項12に記載の光学部材の製造方法。
- 前記3価または6価となり得る金属の化合物は、酸化アルミニウム及び酸化鉄(III)から選択される少なくとも一種の金属であることを特徴とする請求項12または13に記載の光学部材の製造方法。
- 前記3価または6価となり得る金属の化合物は、酸化アルミニウムであることを特徴とする請求項12または13に記載の光学部材の製造方法。
- 前記酸素との電気陰性度の差が2.1以上である金属の化合物は、酸化ジルコニウム、酸化ハフニウム、及び、酸化マグネシウムから選択される少なくとも一種の金属であることを特徴とする請求項12~15のいずれか一項に記載の光学部材の製造方法。
- 前記酸素との電気陰性度の差が2.1以上である金属の化合物は、酸化ジルコニウムまたは酸化ハフニウムであることを特徴とする請求項12~15のいずれか一項に記載の光学部材の製造方法。
- 前記酸素との電気陰性度の差が2.1以上である金属の化合物は、酸化ジルコニウムであることを特徴とする請求項12~15のいずれか一項に記載の光学部材の製造方法。
- 前記3価または6価となり得る金属の化合物との合計重量に対する前記酸素との電気陰性度の差が2.1以上である金属の化合物の重量割合は、9%~90%であることを特徴とする請求項12~18のいずれか一項に記載の光学部材の製造方法。
- 前記3価または6価となり得る金属の化合物との合計重量に対する前記酸素との電気陰性度の差が2.1以上である金属の化合物の重量割合は、17%~33%であることを特徴とする請求項12~18のいずれか一項に記載の光学部材の製造方法。
- 前記下地層は、厚さが1nm~100nmの範囲で成膜されることを特徴とする請求項12~20のいずれか一項に記載の光学部材の製造方法。
- 前記親水層は、厚さが10nm~250nmの範囲で成膜されることを特徴とする請求項12~21のいずれか一項に記載の光学部材の製造方法。
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JP2003231827A (ja) * | 2002-02-12 | 2003-08-19 | Canon Inc | 防曇性コーティング材料、防曇性コーティング膜および防曇性光学部材 |
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JPH09174750A (ja) * | 1995-10-27 | 1997-07-08 | Sumitomo Chem Co Ltd | 防曇性フィルム |
JP2001356201A (ja) * | 2000-06-16 | 2001-12-26 | Canon Inc | 防曇性被覆およびこれを用いた光学部品ならびに防曇性被覆形成方法 |
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CN109070538B (zh) | 2021-04-02 |
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JP6812414B2 (ja) | 2021-01-13 |
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