WO2017167259A1 - 一种用于光刻机曝光的快门装置及其使用方法 - Google Patents

一种用于光刻机曝光的快门装置及其使用方法 Download PDF

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Publication number
WO2017167259A1
WO2017167259A1 PCT/CN2017/078936 CN2017078936W WO2017167259A1 WO 2017167259 A1 WO2017167259 A1 WO 2017167259A1 CN 2017078936 W CN2017078936 W CN 2017078936W WO 2017167259 A1 WO2017167259 A1 WO 2017167259A1
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WIPO (PCT)
Prior art keywords
shutter
exposure
rotation
shutter blade
area
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PCT/CN2017/078936
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English (en)
French (fr)
Inventor
陈梦来
章富平
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上海微电子装备（集团）股份有限公司
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Priority to SG11201808160PA priority Critical patent/SG11201808160PA/en
Priority to JP2018550513A priority patent/JP6649505B2/ja
Priority to KR1020187030522A priority patent/KR102173216B1/ko
Priority to US16/090,055 priority patent/US10712668B2/en
Publication of WO2017167259A1 publication Critical patent/WO2017167259A1/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G03F7/70366—Rotary scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Definitions

  • the present invention relates to the field of manufacturing lithography apparatus, and in particular to a shutter apparatus for exposure of a lithography machine and a method of using the same.
  • Photolithography is used to print patterned features on the surface of a substrate.
  • a substrate that is often used is a semiconductor wafer or a glass substrate whose surface is coated with a light-sensitive medium such as a photoresist.
  • the wafer is placed on a wafer stage and the pattern is projected onto the wafer surface by an exposure device located within the lithographic apparatus.
  • An important indicator of the lithography machine is the exposure dose. If the exposure dose is too large or insufficient, the photoresist development effect will be affected. Therefore, the precise control of the exposure dose will directly affect the etch precision of the lithography machine.
  • the exposure system of the existing low-end lithography machine uses a high-pressure mercury lamp as a light source, and the start and end of exposure are controlled by a mechanical shutter in the optical path, and the exposure dose size is determined by the exposure time.
  • the specific process is as follows:
  • the prior art provides a shutter device for a lithography machine exposure subsystem, which drives a shutter to open and close at a high speed under the driving of a high-power voice coil motor, but to achieve a shorter shutter opening and closing time,
  • the voice coil motor is usually in a high-power operation state.
  • the reliability and stability of the voice coil motor itself fail to meet the actual requirements, causing the shutter to have many problems during the work, which ultimately affects the lithography machine. Stability and lithography effects.
  • the present invention provides a shutter device for exposure of a lithography machine and a method of using the same to solve the problems of low reliability and stability existing in the prior art.
  • the technical solution of the present invention is: a shutter device for exposure of a lithography machine, comprising a shutter blade, a rotating electrical machine that drives the rotation of the shutter blade, a controller electrically coupled to the rotating electrical machine, and a base for supporting the rotary electric machine, the shutter blade including a rotation center, and at least one opening area and a shielding area corresponding to the rotation center, the rotation center being connected to the rotary electric machine, the rotary electric machine The shutter blade is rotated to complete the opening and closing operation of the shutter to form an exposed area and a non-exposed area.
  • connection block is further disposed between the rotation center of the shutter blade and the rotating electrical machine.
  • a speed reducer is further disposed between the rotating electrical machine and the connecting block.
  • the base is fixedly connected to the speed reducer.
  • the opening area and the shielding area of the shutter blade are respectively one, and the central angle corresponding to the opening area and the shielding area are both 180 degrees.
  • the opening area and the shielding area of the shutter blade are respectively two, symmetrically disposed along the rotation center, and the central angle corresponding to the opening area and the shielding area are both 90 degrees.
  • the opening area and the shielding area of the shutter blade are respectively three, and are spaced apart along the rotation center, and the central angle corresponding to the opening area and the shielding area are both 60 degrees.
  • the shielding area includes a hollow portion and a shielding portion concentrically disposed from the inside to the outside along the rotation center.
  • the hollow portion has a fan shape
  • the shielding portion has a ring shape
  • the rotating motor drives the shutter blade to rotate the speed of the motor and/or the shutter blade during the forming of the exposed area and the non-exposed area.
  • the present invention also provides a method of using a shutter device for exposure of a lithography machine, comprising the steps of:
  • S1 installing a shutter blade, a rotating motor, a controller and a base, the shutter blade having a center of rotation, and at least one opening area and a shielding area corresponding to the center of rotation;
  • S2 controlling the rotation of the rotating electrical machine by the controller to drive the shutter blade to rotate, and completing the opening and closing action of the shutter during the rotation to form the exposed area and the non-exposed area.
  • the shielding area includes a hollow portion and a shielding portion concentrically disposed from the inside to the outside along the rotation center.
  • the hollow portion has a fan shape
  • the shielding portion has a ring shape
  • the controller controls the shutter blade to perform an acceleration-constant-deceleration-stationary-acceleration cyclic motion after the rotating motor is started. .
  • the shutter blade completes the acceleration process and the deceleration process
  • the shutter blade is in a constant rotation state.
  • the controller controls the shutter blade to perform acceleration-constant-deceleration-uniform-acceleration after the rotating motor is started. Cycling movement.
  • the shutter blade completes the acceleration process and the deceleration process
  • the shutter blade is in a constant rotation state.
  • the constant speed after the rotation of the rotating electrical machine is ⁇ 10 times the constant speed after the deceleration.
  • the present invention provides a shutter device for exposure of a lithography machine and a method of using the same, by providing a center of rotation in a shutter blade and at least one opening region and a shielding region corresponding to the center of rotation, connecting a center of rotation to the a rotating electric machine, the rotating motor drives the shutter blade to rotate, completes a shutter opening and closing action to form an exposed area and a non-exposed area, and by providing a hollow portion in the shielding area, the quality of the shutter blade is effectively reduced, and the shutter is improved Control effect during blade rotation, The control accuracy of the exposure dose is improved.
  • the opening and closing process of the shutter is set at the stage of uniform movement of the shutter blade, and the acceleration and deceleration process of the shutter blade is set in the shutter closing stage in which the time and the stroke are relatively wide, thereby greatly reducing the rotating motor.
  • the torque requirement and the high rotation speed of the rotating motor effectively shorten the opening and closing time of the shutter, further improve the control accuracy of the exposure dose, and improve the lithography effect of the lithography machine.
  • FIG. 1 is a schematic structural view of a shutter device for exposure of a lithography machine according to Embodiment 1 of the present invention
  • FIG. 2 is a schematic structural view of a shutter blade according to Embodiment 1 of the present invention.
  • 3a-3b are schematic views of a shutter closed state according to Embodiment 1 of the present invention.
  • FIGS. 4a-4b are schematic views of a shutter full open state according to Embodiment 1 of the present invention.
  • 5a-5b are schematic views respectively showing a shutter half open and a half closed state according to Embodiment 1 of the present invention.
  • FIG. 6 is a schematic view showing a rotation speed of a shutter blade according to Embodiment 1 of the present invention in different exposure states;
  • Figure 7 is a theoretical utilization rate of exposure dose of a shutter in an exposure period in Embodiment 1 of the present invention.
  • Figure 8 is a schematic structural view of a shutter blade according to Embodiment 2 of the present invention.
  • Fig. 9 is a view showing the rotational speed of the shutter blade of the embodiment 4 of the present invention in different exposure states.
  • the figure shows: 1, shutter blade; 11, rotating center; 12, open area; 13, shielding area; 131, hollow part; 132, spot scanning area shielding part; 2, rotating electric machine; 3, base; Block; 5, reducer; 6, spot.
  • the present invention provides a shutter device for exposure of a lithography machine, comprising a shutter blade 1, a rotary electric machine 2 for driving the rotation of the shutter blade 1, and an electric coupling with the rotary electric machine 2 Control And a base 3 for supporting the rotary electric machine 2, the shutter blade 1 includes a rotation center 11, and at least one opening area 12 and a shielding area 13 corresponding to the rotation center 11.
  • the rotating center 11 is connected to the rotating electrical machine 2, and the rotating electric machine 2 drives the shutter blade 1 to rotate to complete opening and closing operations of the shutter to form an exposed area and a non-exposed area, and in forming the exposed area and During the non-exposed area, the rotational speed of the rotary electric machine 2 and/or the shutter blade 1 is not zero.
  • a connection block 4 is further disposed between the rotation center 11 of the shutter blade 1 and the rotary electric machine 2 for effectively fixing the rotation center 11 of the shutter blade 1 and the output shaft of the rotary electric machine 2 .
  • the control effect on the rotation of the shutter blade 1 is improved.
  • a speed reducer 5 is further disposed between the rotating electrical machine 2 and the connecting block 4 .
  • the speed ratio of the speed reducer 5 is 4:1, and the speed reducer 5 Connected to the output shaft of the rotary electric machine 2, the speed reducer 5 is used to coordinate the contradiction between the limit speed of the rotary electric machine 2 and the limit torque.
  • the base 3 is fixedly connected to the speed reducer 5. Specifically, the base 3 is disposed under the speed reducer 5 to support the entire shutter device.
  • the opening area 12 and the shielding area 13 in the shutter blade 1 are respectively two, symmetrically disposed along the rotation center 11, and the central angle of the opening area 12 and the shielding area 13 are both 90. degree.
  • the shielding area 13 includes a hollow portion 131 and a spot scanning area shielding portion 132 which are concentrically arranged from the inside to the outside along the rotation center 11.
  • the hollow portion 131 is fan-shaped, effectively reducing The quality of the shutter blade improves the control effect on the rotation of the shutter blade and improves the control accuracy of the exposure dose.
  • the spot scanning area shielding portion 132 has a ring shape, and the light spot 6 is blocked during the rotation of the shutter blade 1 to form a non-exposure area.
  • the present invention also provides a method of using a shutter device for exposure of a lithography machine, comprising the steps of:
  • S1 mounting a shutter blade 1, a rotary motor 2, a controller and a base 3, the shutter blade 1 having a rotation center 11, and at least one opening region 12 and a shielding region 13 corresponding to the rotation center 11, the shielding
  • the area 13 includes a hollow portion 131 and a spot scanning area shielding portion 132 which are concentrically arranged from the inside to the outside along the rotation center 11.
  • the hollow portion 131 is fan-shaped, which effectively reduces the quality of the shutter blade and improves the rotation process of the shutter blade.
  • the control effect in the middle improves the control accuracy of the exposure dose.
  • the rotating electric machine 2 is driven to rotate by a controller, thereby driving the shutter blade 1 to rotate to form an exposed area and a non-exposed area.
  • the controller controls the shutter blade 1 to perform an acceleration-constant-deceleration-stationary-acceleration cyclic motion after the rotary electric machine 2 is started.
  • the shutter blade 1 completes the acceleration process and the deceleration process, in the shutter opening phase, that is, the exposure in the corresponding figure. In the region, the shutter blade 1 is in a state of constant rotation.
  • the shutter opening phase includes a shutter half open, a half closed phase, and a fully open state, as shown in FIGS. 3a-5b.
  • the opening and closing process of the shutter is set at the stage of the uniform movement of the shutter blade 1, and the acceleration and deceleration process of the shutter blade 1 is set in the shutter closing stage in which the time and the stroke are relatively wide, which greatly reduces the pair.
  • the shutter blade 1 is in a half-open state - fully open state - In the semi-closed state, the theoretical utilization rate of the exposure dose is 58.75% in the uniform rotation period, as shown in FIG.
  • the exposure time t is:
  • the selection speed ratio is 4:1, and the non-exposure area is 1/4 circumference, the rotation speed P of the rotary electric machine 2 is:
  • the minimum exposure measurement K is 80 mJ:
  • the rotational speed P of the rotary electric machine 2 is:
  • the non-exposed area occupies a quarter of the circumference, and the rotary electric machine 2 must complete the process of decelerating to 0 and then accelerating to 7661 rpm in the area, so the angular acceleration is:
  • V is the linear speed of the rotating electrical machine 2.
  • the movement time of the rotary electric machine 2 in the non-exposed state is 31.3 ms.
  • the dwell time is selected at the stage where the shutter blade 1 stops rotating according to the demand of the non-exposure time.
  • the opening area 12 and the shielding area 13 in the shutter blade 1 are respectively one, and the central angle of the opening area 12 and the shielding area 13 are both 180 degrees.
  • the speed reducer 5 is structurally removed, and the shutter blade 1 is directly rotated by the rotary electric machine 2.
  • the shielding area 13 includes a hollow portion 131 and a spot scanning area shielding portion 132 which are concentrically disposed from the inside and the outside along the rotation center 11.
  • the hollow portion 131 has a fan-shaped shape, which effectively reduces the quality of the shutter blade. Improve the control effect on the shutter blade rotation process, and improve the control accuracy of the exposure dose.
  • the spot scanning area shielding portion 132 has a ring shape, and the spot is blocked during the rotation of the shutter blade 1 to form a non-exposure area.
  • the opening area 11 and the shielding area 12 of the shutter blade 1 are respectively one to shorten the time in which the shutter blade 1 is half-open or semi-closed to occupy the entire exposure period, thereby improving the utilization of the exposure dose.
  • the theoretical utilization rate of the exposure dose is 86.11% in the uniform rotation period of the shutter blade 1 from the half-open state to the fully open state to the semi-closed state.
  • the exposure time t is:
  • the non-exposed area is 1/2 circumference, and the rotational speed P of the rotary electric machine 2 is:
  • the non-exposed area occupies 1/2 of the circumference, and the rotating electric machine 2 must complete the process of decelerating to 0 and then accelerating to 4491 rpm in this area, so the angular acceleration is:
  • V is the linear speed of the rotating electrical machine 2.
  • the movement time of the rotary electric machine 2 in the non-exposed state is 26.7 ms.
  • the dwell time is selected at the stage where the exposure shutter blade 1 stops rotating according to the demand for the non-exposure time.
  • the opening area 12 and the shielding area 13 in the shutter blade 1 are respectively three, and are spaced apart along the rotation center 11, and the central angle corresponding to the opening area 12 and the shielding area 13 are It is 60 degrees.
  • the shielding area 13 includes a hollow portion 131 and a spot scanning area shielding portion 132 which are concentrically disposed from the inside and the outside along the rotation center 11.
  • the hollow portion 131 has a fan-shaped shape, which effectively reduces the quality of the shutter blade. Improve the control effect on the shutter blade rotation process, and improve the control accuracy of the exposure dose.
  • the spot scanning area shielding portion 132 has a ring shape, and the spot is blocked during the rotation of the shutter blade 1 to form a non-exposure area.
  • the theoretical utilization rate of the exposure dose is 50% in the uniform rotation period of the shutter blade 1 from the half-open state - the fully open state - the semi-closed state.
  • the exposure time t is:
  • the selection speed ratio is 4:1, and the non-exposure area is 1/6 circumference, the rotation speed P of the rotary electric machine 2 is:
  • the non-exposed area occupies 1/6 of the circumference, and the motor must complete the process of decelerating to 0 and then accelerating to 5217 rpm in this area, so the angular acceleration is:
  • the movement time of the rotary electric machine 2 in the non-exposed state is 30 ms.
  • the dwell time is selected at the stage where the exposure shutter blade 1 stops rotating according to the demand for the non-exposure time.
  • a method for using a shutter device for exposure of a lithography machine comprising the following steps:
  • S1 mounting a shutter blade 1, a rotary motor 2, a controller and a base 3, the shutter blade 1 having a rotation center 11, and at least one opening region 12 and a shielding region 13 corresponding to the rotation center 11, the shielding
  • the area 13 includes a hollow portion 131 and a spot scanning area shielding portion 132 which are concentrically disposed from the inside to the outside along the rotation center 11, and the hollow portion 131 is fan-shaped, effectively reducing the quality of the shutter blade 1, and improving the shutter blade 1
  • the control effect during the rotation process improves the control accuracy of the exposure dose.
  • the rotating electric machine 2 is driven to rotate by a controller, thereby driving the shutter blade 1 to rotate to form an exposed area and a non-exposed area.
  • the controller controls the rotation of the rotating electric machine 2 to drive the shutter blade 1 to perform an acceleration-constant-deceleration-constant-acceleration cycle motion, as shown in FIG. .
  • the constant speed after the acceleration of the rotating electrical machine 2 is ⁇ 10 times the constant speed after the deceleration.
  • the period in which the rotational speed of the shutter blade 1 changes is suitable for a case where the exposure time is long and the shutter closing time is short.
  • the scheme Due to the short shutter closing time, the scheme has a higher illuminance utilization rate for the light source.
  • an excessive current may cause more heat to be accumulated inside the rotary electric machine 2, which may cause the internal structure of the rotary electric machine 2 to expand, causing the problem that the rotary electric machine 2 is stuck or even short-circuited.
  • the rotary electric machine 2 that drives the shutter blade 1 is always in a moving state, problems caused by frequent starting are avoided, thereby improving the reliability of the shutter and prolonging its service life.
  • the present invention provides a shutter device for exposure of a lithography machine and a method of using the same, by providing a center of rotation 11 in the shutter blade 1 and at least one opening region 12 corresponding to the center of rotation 11 and shielding
  • the region 13 connects the rotation center 11 to the rotary electric machine 2, and the rotary electric machine 2 drives the shutter blade 1 to rotate, and completes opening and closing operations of the shutter to form an exposed area and a non-exposed area, in the shielding area 13.
  • the provision of the hollow portion 131 effectively reduces the quality of the shutter blade 1, improves the control effect during the rotation of the shutter blade 1, and improves the control accuracy of the exposure dose.
  • the opening and closing process of the shutter is set at the stage of the uniform movement of the shutter blade 1, and the acceleration and deceleration process of the shutter blade 1 is set in the shutter closing stage in which the time and the stroke are relatively wide, which greatly reduces the pair.

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shutters For Cameras (AREA)

Abstract

一种用于光刻机曝光的快门装置及其方法，该装置包括快门叶片（1）、驱动快门叶片（1）旋转的旋转电机（2）、与旋转电机（2）电联接的控制器和用于支撑旋转电机（2）的底座（3），快门叶片（1）包括一旋转中心（11），以及对应旋转中心（11）设置的至少一开口区域（12）和遮蔽区域（13），旋转中心（11）连接至旋转电机（2），旋转电机（2）带动快门叶片（1）旋转完成快门的开闭动作，以形成曝光区域和非曝光区域。通过在遮蔽区域（13）中设置镂空部分（131），减轻了快门叶片（1）的质量，提高对快门叶片（1）旋转过程中的控制效果，通过控制器的控制作用，将快门的开闭过程设于快门叶片（1）的匀速运动的阶段，将快门叶片（1）的加速和减速过程设于时间和行程都较为宽裕的快门关闭阶段，降低了对旋转电机（2）的转矩的要求，有效缩短了快门的开闭时间。

Description

一种用于光刻机曝光的快门装置及其使用方法 技术领域
本发明涉及光刻机设备的制造领域，具体涉及一种用于光刻机曝光的快门装置及其使用方法。
背景技术
光刻技术是用于在衬底表面上印刷具有特征的构图。经常使用的基片为表面涂有光敏感介质(如光刻胶)的半导体晶片或玻璃基片。在光刻过程中，晶片放在晶片台上，通过处在光刻设备内的曝光装置，将特征构图投射到晶片表面。
光刻机的一个重要指标是曝光剂量，曝光剂量过大或不足都将影响光刻胶显影效果，因此对于曝光剂量的精确控制将直接影响光刻机的刻蚀精度。
现有中低端光刻机的曝光系统采用高压汞灯作为光源，曝光开始、结束由光路中的机械快门控制，曝光剂量大小由曝光时间确定。具体过程如下：
1)首先通过预热和环境控制使高压汞灯输出光功率达到稳定；
2)接着计算曝光时间，打开快门开始曝光，同步开始计时；
3)最后时间到，关闭快门，曝光结束。
近年来，随着汞灯输出功率不断增加，这就意味着在相同的曝光剂量下，曝光快门的开闭时间必须更短。然而，传统的机械式快门由于结构的限制，快门开闭时间已然接近极限，若一味地提高曝光快门的功率只会增加控制系统的负担。同时，长时间超功率的运作也增加了系统的不稳定性。
针对上述问题，现有技术中提供了一种用于光刻机曝光分系统的快门装置，在高功率音圈电机的带动下使快门高速开闭，然而为达到更短的快门开闭时间，音圈电机通常处于大功率运行状态，然而音圈电机本身的可靠性和稳定性未能达到实际需求，致使该快门在工作过程中频发诸多问题，最终影响了光刻机的 稳定性和光刻效果。
发明内容
本发明提供了一种用于光刻机曝光的快门装置及其使用方法，以解决现有技术中存在的可靠性和稳定性不高的问题。
为了解决上述技术问题，本发明的技术方案是：一种用于光刻机曝光的快门装置，包括快门叶片、驱动所述快门叶片旋转的旋转电机、与所述旋转电机电联接的控制器和用于支撑所述旋转电机的底座，所述快门叶片包括一旋转中心，以及对应所述旋转中心设置的至少一开口区域和遮蔽区域，所述旋转中心连接至所述旋转电机，所述旋转电机带动所述快门叶片旋转完成快门的开闭动作，以形成曝光区域和非曝光区域。
进一步的，所述快门叶片的旋转中心和旋转电机之间还设有连接块。
进一步的，所述旋转电机与所述连接块之间还设有减速器。
进一步的，所述底座与所述减速器固定连接。
进一步的，所述快门叶片中的开口区域和遮蔽区域分别为1个，所述开口区域和遮蔽区域对应的圆心角均为180度。
进一步的，所述快门叶片中的开口区域和遮蔽区域分别为2个，沿所述旋转中心对称设置，所述开口区域和遮蔽区域对应的圆心角均为90度。
进一步的，所述快门叶片中的开口区域和遮蔽区域分别为3个，沿所述旋转中心间隔设置，所述开口区域和遮蔽区域对应的圆心角均为60度。
进一步的，所述遮蔽区域包括沿所述旋转中心由内而外同心设置的镂空部分和遮蔽部分。
进一步的，所述镂空部分呈扇环形，所述遮蔽部分呈环形。
进一步的，所述旋转电机带动所述快门叶片在形成所述曝光区域和所述非曝光区域过程中，所述电机和/或快门叶片的旋转速度不为零。
本发明还提供了一种用于光刻机曝光的快门装置的使用方法，包括以下步骤：
S1：安装快门叶片、旋转电机、控制器和底座，所述快门叶片具有一旋转中心，以及对应所述旋转中心设置的至少一开口区域和遮蔽区域；
S2：通过控制器控制所述旋转电机旋转，从而带动所述快门叶片旋转，在旋转过程中完成快门的开闭动作，以形成曝光区域和非曝光区域。
进一步的，所述遮蔽区域包括沿所述旋转中心由内而外同心设置的镂空部分和遮蔽部分。
进一步的，所述镂空部分呈扇环形，所述遮蔽部分呈环形。
进一步的，所述步骤S2中，在形成所述曝光区域和非曝光区域过程中，所述控制器控制旋转电机启动后，带动所述快门叶片进行加速-匀速-减速-静止-加速的循环运动。
进一步的，在所述快门关闭阶段中，所述快门叶片完成所述加速过程和减速过程，在所述快门打开阶段，所述快门叶片处于匀速旋转状态。
进一步的，所述步骤S2中，在形成所述曝光区域和非曝光区域过程中，所述控制器控制所述旋转电机启动后，带动所述快门叶片进行加速-匀速-减速-匀速-加速的循环运动。
进一步的，在所述快门关闭阶段中，所述快门叶片完成所述加速过程和减速过程，在所述快门打开阶段，所述快门叶片处于匀速旋转状态。
进一步的，所述旋转电机加速后的恒定速度≥10倍减速后的恒定速度。
本发明提供的用于光刻机曝光的快门装置及其使用方法，通过在快门叶片中设置一旋转中心以及对应所述旋转中心设置的至少一开口区域和遮蔽区域，将旋转中心连接至所述旋转电机，所述旋转电机带动所述快门叶片旋转，完成快门的开闭动作，以形成曝光区域和非曝光区域，通过在遮蔽区域中设置镂空部分，有效减轻了快门叶片的质量，提高对快门叶片旋转过程中的控制效果， 提高了对曝光剂量的控制准确度。通过控制器的控制作用，将快门的开闭过程设于快门叶片的匀速运动的阶段，将快门叶片的加速和减速过程设于时间和行程都较为宽裕的快门关闭阶段，大大降低了对旋转电机的转矩的要求，同时由于旋转电机的转速较高，有效缩短了快门的开闭时间，进一步提高了对曝光剂量的控制准确度，提高了光刻机的光刻效果。
附图说明
图1是本发明实施例1中用于光刻机曝光的快门装置的结构示意图；
图2是本发明实施例1快门叶片的结构示意图；
图3a-3b是本发明实施例1快门关闭状态的示意图；
图4a-4b是本发明实施例1快门全开状态的示意图；
图5a-5b分别是本发明实施例1快门半开和半闭状态的示意图；
图6是本发明实施例1快门叶片在不同曝光状态下的旋转速度示意图；
图7是本发明实施例1中快门在一个曝光周期内的曝光剂量理论利用率；
图8是本发明实施例2快门叶片的结构示意图；
图9是本发明实施例4快门叶片在不同曝光状态下的旋转速度示意图。
图中所示：1、快门叶片；11、旋转中心；12、开口区域；13、遮蔽区域；131、镂空部分；132、光斑扫描区域遮蔽部分；2、旋转电机；3、底座；4、连接块；5、减速器；6、光斑。
具体实施方式
下面结合附图对本发明作详细描述。
实施例1
如图1-7所示，本发明提供了一种用于光刻机曝光的快门装置，包括快门叶片1、驱动所述快门叶片1旋转的旋转电机2、与所述旋转电机2电联接的控制 器(图中未标出)和用于支撑所述旋转电机2的底座3，所述快门叶片1包括一旋转中心11，以及对应所述旋转中心11设置的至少一开口区域12和遮蔽区域13，所述旋转中心11连接至所述旋转电机2，所述旋转电机2带动所述快门叶片1旋转完成快门的开闭动作，以形成曝光区域和非曝光区域，且在形成所述曝光区域和所述非曝光区域过程中，所述旋转电机2和/或快门叶片1的旋转速度不为零。
请继续参照图1，所述快门叶片1的旋转中心11和旋转电机2之间还设有连接块4，用于将所述快门叶片1的旋转中心11与旋转电机2的输出轴进行有效固定，避免两者发生相对运动，提高对快门叶片1旋转过程中的控制效果。
请继续参照图1，所述旋转电机2与所述连接块4之间还设有减速器5，具体的，本实施例中，减速器5的选型速度比为4:1，减速器5与旋转电机2的输出轴连接，减速器5用于协调旋转电机2极限转速和极限扭矩之间的矛盾，由于扭矩越高旋转电机2的功率越大，这里通过设置减速器5在不增大旋转电机2功率的同时增加输出的扭矩。
优选的，所述底座3与所述减速器5固定连接，具体的，所述底座3设于减速器5下方，对整个快门装置进行支撑。
如图2所示，所述快门叶片1中的开口区域12和遮蔽区域13分别为2个，沿所述旋转中心11对称设置，所述开口区域12和遮蔽区域13对应的圆心角均为90度。
优选的，所述遮蔽区域13包括沿所述旋转中心11由内而外同心设置的镂空部分131和光斑扫描区域遮蔽部分132，如图2所示，所述镂空部分131呈扇环形，有效减轻了快门叶片的质量，提高对快门叶片旋转过程中的控制效果，提高了对曝光剂量的控制准确度。所述光斑扫描区域遮蔽部分132呈环形，实现快门叶片1旋转过程中对光斑6进行遮挡，形成非曝光区域。
如图3a和3b所示，当遮蔽部分132遮挡住光斑6时，形成非曝光区域， 相当于快门处于关闭状态。如图4a和4b所示，当遮蔽部分132未遮挡光斑6，即光斑6位于开口区域12内时，形成曝光区域，相当于快门处于全开状态。如图5a和5b所示，当光斑6部分位于开口区域12内、部分被遮蔽部分132遮挡时，对应于快门的半开和半闭状态。
本发明还提供了一种用于光刻机曝光的快门装置的使用方法，包括以下步骤：
S1：安装快门叶片1、旋转电机2、控制器和底座3，所述快门叶片1具有一旋转中心11，以及对应所述旋转中心11设置的至少一开口区域12和遮蔽区域13，所述遮蔽区域13包括沿所述旋转中心11由内而外同心设置的镂空部分131和光斑扫描区域遮蔽部分132，所述镂空部分131呈扇环形，有效减轻了快门叶片的质量，提高对快门叶片旋转过程中的控制效果，提高了对曝光剂量的控制准确度。
S2：通过控制器驱动所述旋转电机2旋转，从而带动所述快门叶片1旋转，形成曝光区域和非曝光区域。优选的，在形成所述曝光区域和非曝光区域过程中，所述控制器控制旋转电机2启动后，带动快门叶片1进行加速-匀速-减速-静止-加速的循环运动。如图6所示，在所述快门关闭阶段中，即对应图中的非曝光区域，所述快门叶片1完成所述加速过程和减速过程，在所述快门打开阶段，即对应图中的曝光区域，所述快门叶片1处于匀速旋转状态。具体的，快门打开阶段包括快门半开、半闭阶段和全开状态，如图3a-5b所示。通过控制器的控制作用，将快门的开闭过程设于快门叶片1的匀速运动的阶段，将快门叶片1的加速和减速过程设于时间和行程都较为宽裕的快门关闭阶段，大大降低了对旋转电机2的转矩的要求，同时由于旋转电机2的转速较高，有效缩短了快门的开闭时间，进一步提高了对曝光剂量的控制准确度，提高了光刻机的光刻效果。
针对本实施例中的快门叶片1结构，在快门叶片1从半开状态-全开状态- 半闭状态这一匀速转动周期内，曝光剂量的理论利用率为58.75％，如图7所示。
设入射光的照度是G，曝光的需求剂量为K，则曝光时间t为：
Figure PCTCN2017078936-appb-000001
由于设有减速器5，选型速度比4:1，非曝光区域为1/4圆周，则旋转电机2的转速P为：
Figure PCTCN2017078936-appb-000002
设本实施例中入射光的照度G＝3000mW/cm2，以最小曝光计量K为80mJ计算得到：
Figure PCTCN2017078936-appb-000003
旋转电机2的转速P为：
Figure PCTCN2017078936-appb-000004
本实施例中，非曝光区域占圆周1/4，旋转电机2必须在该区域内完成减速到0，再加速到7661rpm的过程，故角加速度为：
Figure PCTCN2017078936-appb-000005
其中V为旋转电机2的线性转速。
根据本实施例中的快门叶片1的结构计算得到转动惯量J＝1.2×10-5kg/m2，代入到扭矩公式可得：
Figure PCTCN2017078936-appb-000006
在该条件下，非曝光状态下旋转电机2的运动时间为31.3ms。根据非曝光时长的需求，在快门叶片1停止旋转的阶段选择停留时间。
实施例2
如图8所示，与实施例1不同的是，所述快门叶片1中的开口区域12和遮蔽区域13分别为1个，所述开口区域12和遮蔽区域13对应的圆心角均为180度。同时在结构上去除了减速器5，直接由旋转电机2带动快门叶片1旋转。优选的，所述遮蔽区域13包括沿所述旋转中心11由内而外同心设置的镂空部分131和光斑扫描区域遮蔽部分132，所述镂空部分131呈扇环形，有效减轻了快门叶片的质量，提高对快门叶片旋转过程中的控制效果，提高了对曝光剂量的控制准确度。所述光斑扫描区域遮蔽部分132呈环形，实现快门叶片1旋转过程中对光斑进行遮挡，形成非曝光区域。本实施例中，快门叶片1中开口区域11和遮蔽区域12分别为1个，以缩短快门叶片1半开或半闭状态占整个曝光周期的时间，从而提高了曝光剂量的利用率。
针对本实施例中的快门叶片1结构，在快门叶片1从半开状态-全开状态-半闭状态这一匀速转动周期内，曝光剂量的理论利用率为86.11％。
设入射光的照度是G，曝光的需求剂量为K，则曝光时间t为：
Figure PCTCN2017078936-appb-000007
非曝光区域为1/2圆周，旋转电机2的转速P为：
Figure PCTCN2017078936-appb-000008
非曝光区域占圆周1/2，旋转电机2必须在该区域内完成减速到0，再加速到4491rpm的过程，故角加速度为：
Figure PCTCN2017078936-appb-000009
其中V为旋转电机2的线性转速。
根据本实施例中的快门叶片1的结构计算得到转动惯量J＝1×10-5kg/m2，代入到扭矩公式得：
T＝J×ε×1000＝256mNm       (10)
在该条件下，非曝光状态下旋转电机2的运动时间为26.7ms。根据非曝光时长的需求，在曝光快门叶片1停止旋转的阶段选择停留时间。
实施例3
与实施例1不同的是，所述快门叶片1中的开口区域12和遮蔽区域13分别为3个，沿所述旋转中心11间隔设置，所述开口区域12和遮蔽区域13对应的圆心角均为60度。优选的，所述遮蔽区域13包括沿所述旋转中心11由内而外同心设置的镂空部分131和光斑扫描区域遮蔽部分132，所述镂空部分131呈扇环形，有效减轻了快门叶片的质量，提高对快门叶片旋转过程中的控制效果，提高了对曝光剂量的控制准确度。所述光斑扫描区域遮蔽部分132呈环形，实现快门叶片1旋转过程中对光斑进行遮挡，形成非曝光区域。
针对本实施例中的快门叶片1结构，在快门叶片1从半开状态-全开状态-半闭状态这一匀速转动周期内，曝光剂量的理论利用率为50％。
设入射光的照度是G，曝光的需求剂量为K，则曝光时间t为：
Figure PCTCN2017078936-appb-000010
由于设有减速器5，选型速度比4:1，非曝光区域为1/6圆周，则旋转电机2的转速P为：
Figure PCTCN2017078936-appb-000011
非曝光区域占圆周1/6，电机必须在该区域内完成减速到0，再加速到5217rpm的过程，故角加速度为：
Figure PCTCN2017078936-appb-000012
根据本实施例中的快门叶片1的结构计算得到转动惯量J＝1×10-5kg/m2， 代入到扭矩公式得：
Figure PCTCN2017078936-appb-000013
在该条件下，非曝光状态下旋转电机2的运动时间为30ms。根据非曝光时长的需求，在曝光快门叶片1停止旋转的阶段选择停留时间。
实施例4
本实施例中提供一种用于光刻机曝光的快门装置的使用方法，包括以下步骤：
S1：安装快门叶片1、旋转电机2、控制器和底座3，所述快门叶片1具有一旋转中心11，以及对应所述旋转中心11设置的至少一开口区域12和遮蔽区域13，所述遮蔽区域13包括沿所述旋转中心11由内而外同心设置的镂空部分131和光斑扫描区域遮蔽部分132，所述镂空部分131呈扇环形，有效减轻了快门叶片1的质量，提高对快门叶片1旋转过程中的控制效果，提高了对曝光剂量的控制准确度。
S2：通过控制器驱动所述旋转电机2旋转，从而带动所述快门叶片1旋转，形成曝光区域和非曝光区域。优选的，在形成所述曝光区域和非曝光区域过程中，所述控制器控制旋转电机2启动后，带动快门叶片1进行加速-匀速-减速-匀速-加速的循环运动，如图9所示。优选的，所述旋转电机2加速后的恒定速度≥10倍减速后的恒定速度。该种快门叶片1旋转速度变化的周期适合曝光时间长，且快门关闭时间短的情况。由于快门关闭时间短，该方案对于光源的照度利用率较高。此外，由于旋转电机2在启动时电流极大，过大的电流会导致旋转电机2内部积聚更多的热量，进而导致旋转电机2内部结构膨胀，导致旋转电机2卡死甚至导线短路的问题。而本实施例中，由于带动快门叶片1的旋转电机2一直处于运动状态，避免需要经常启动而引起的问题，从而提高快门的可靠性，延长其使用寿命。
综上所述，本发明提供的用于光刻机曝光的快门装置及其使用方法，通过在快门叶片1中设置一旋转中心11以及对应所述旋转中心11设置的至少一开口区域12和遮蔽区域13，将旋转中心11连接至所述旋转电机2，所述旋转电机2带动所述快门叶片1旋转，完成快门的开闭动作，以形成曝光区域和非曝光区域，通过在遮蔽区域13中设置镂空部分131，有效减轻了快门叶片1的质量，提高对快门叶片1旋转过程中的控制效果，提高了对曝光剂量的控制准确度。通过控制器的控制作用，将快门的开闭过程设于快门叶片1的匀速运动的阶段，将快门叶片1的加速和减速过程设于时间和行程都较为宽裕的快门关闭阶段，大大降低了对旋转电机2的转矩的要求，同时由于旋转电机2的转速较高，有效缩短了快门的开闭时间，进一步提高了对曝光剂量的控制准确度，提高了光刻机的光刻效果。
虽然说明书中对本发明的实施方式进行了说明，但这些实施方式只是作为提示，不应限定本发明的保护范围。在不脱离本发明宗旨的范围内进行各种省略、置换和变更均应包含在本发明的保护范围内。

Claims (18)

  1. 一种用于光刻机曝光的快门装置，其特征在于，包括快门叶片、驱动所述快门叶片旋转的旋转电机、与所述旋转电机电联接的控制器和用于支撑所述旋转电机的底座，所述快门叶片包括一旋转中心，以及对应所述旋转中心设置的至少一开口区域和遮蔽区域，所述旋转中心连接至所述旋转电机，所述旋转电机带动所述快门叶片旋转完成快门的开闭动作，以形成曝光区域和非曝光区域。
  2. 根据权利要求1所述的用于光刻机曝光的快门装置，其特征在于，所述快门叶片的旋转中心和旋转电机之间还设有连接块。
  3. 根据权利要求2所述的用于光刻机曝光的快门装置，其特征在于，所述旋转电机与所述连接块之间还设有减速器。
  4. 根据权利要求3所述的用于光刻机曝光的快门装置，其特征在于，所述底座与所述减速器固定连接。
  5. 根据权利要求1所述的用于光刻机曝光的快门装置，其特征在于，所述快门叶片中的开口区域和遮蔽区域分别为1个，所述开口区域和遮蔽区域对应的圆心角均为180度。
  6. 根据权利要求1所述的用于光刻机曝光的快门装置，其特征在于，所述快门叶片中的开口区域和遮蔽区域分别为2个，沿所述旋转中心对称设置，所述开口区域和遮蔽区域对应的圆心角均为90度。
  7. 根据权利要求1所述的用于光刻机曝光的快门装置，其特征在于，所述快门叶片中的开口区域和遮蔽区域分别为3个，沿所述旋转中心间隔设置，所述开口区域和遮蔽区域对应的圆心角均为60度。
  8. 根据权利要求1所述的用于光刻机曝光的快门装置，其特征在于，所述 遮蔽区域包括沿所述旋转中心由内而外同心设置的镂空部分和遮蔽部分。
  9. 根据权利要求8所述的用于光刻机曝光的快门装置，其特征在于，所述镂空部分呈扇环形，所述遮蔽部分呈环形。
  10. 根据权利要求1所述的用于光刻机曝光的快门装置，其特征在于，所述旋转电机带动所述快门叶片在形成所述曝光区域和所述非曝光区域过程中，所述电机和/或快门叶片的旋转速度不为零。
  11. 一种用于光刻机曝光的快门装置的使用方法，其特征在于，包括以下步骤：
    S1：安装快门叶片、旋转电机、控制器和底座，所述快门叶片具有一旋转中心，以及对应所述旋转中心设置的至少一开口区域和遮蔽区域；
    S2：通过控制器控制所述旋转电机旋转，从而带动所述快门叶片旋转，在旋转过程中完成快门的开闭动作，以形成曝光区域和非曝光区域。
  12. 根据权利要求11所述的用于光刻机曝光的快门装置的使用方法，其特征在于，所述遮蔽区域包括沿所述旋转中心由内而外同心设置的镂空部分和遮蔽部分。
  13. 根据权利要求12所述的用于光刻机曝光的快门装置的使用方法，其特征在于，所述镂空部分呈扇环形，所述遮蔽部分呈环形。
  14. 根据权利要求11所述的用于光刻机曝光的快门装置的使用方法，其特征在于，所述步骤S2中，在形成所述曝光区域和非曝光区域过程中，所述控制器控制旋转电机启动后，带动所述快门叶片进行加速-匀速-减速-静止-加速的循环运动。
  15. 根据权利要求14所述的用于光刻机曝光的快门装置的使用方法，其特征在于，在所述快门关闭阶段中，所述快门叶片完成所述加速过程和减速过程，在所述快门打开阶段，所述快门叶片处于匀速旋转状态。
  16. 根据权利要求11所述的用于光刻机曝光的快门装置的使用方法，其特征在于，所述步骤S2中，在形成所述曝光区域和非曝光区域过程中，所述控制器控制所述旋转电机启动后，带动所述快门叶片进行加速-匀速-减速-匀速-加速的循环运动。
  17. 根据权利要求16所述的用于光刻机曝光的快门装置的使用方法，其特征在于，在所述快门关闭阶段中，所述快门叶片完成所述加速过程和减速过程，在所述快门打开阶段，所述快门叶片处于匀速旋转状态。
  18. 根据权利要求16所述的用于光刻机曝光的快门装置的使用方法，其特征在于，所述旋转电机加速后的恒定速度≥10倍减速后的恒定速度。
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019200235A (ja) * 2018-05-14 2019-11-21 キヤノン株式会社 露光装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110196532B (zh) * 2018-02-27 2021-03-16 上海微电子装备（集团）股份有限公司 光刻机安全快门装置
JP2021139980A (ja) * 2020-03-03 2021-09-16 キオクシア株式会社 半導体製造装置および半導体装置の製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1673868A (zh) * 2004-03-26 2005-09-28 力晶半导体股份有限公司 具有可变快门的曝光机台及其曝光方法
CN102096325A (zh) * 2009-12-10 2011-06-15 上海微电子装备有限公司 光强衰减装置及其衰减方法
US20120229966A1 (en) * 2011-03-08 2012-09-13 Samsung Electronics Co., Ltd. Display apparatus and method of fabricating the same
CN103293864A (zh) * 2012-02-27 2013-09-11 上海微电子装备有限公司 一种光刻曝光剂量的控制装置及控制方法
CN103631066A (zh) * 2012-08-21 2014-03-12 上海微电子装备有限公司 一种用于光刻曝光的快门装置及其使用方法
CN203535380U (zh) * 2013-10-29 2014-04-09 中芯国际集成电路制造(北京)有限公司 快门装置以及光刻设备

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS607870B2 (ja) * 1978-05-16 1985-02-27 富士電機株式会社 撮像方式
JPS60241055A (ja) * 1984-05-15 1985-11-29 Oak Seisakusho:Kk シヤツタ−開閉装置
JPS6136719A (ja) * 1984-07-30 1986-02-21 Nec Corp 同期式光路開閉装置及びその操作法
JP2745413B2 (ja) * 1988-09-02 1998-04-28 キヤノン株式会社 露光装置
JPH03114824U (zh) * 1990-05-31 1991-11-26
JPH04317315A (ja) * 1991-04-16 1992-11-09 Canon Inc シャッター装置
US6476905B1 (en) * 2000-01-20 2002-11-05 Taiwan Semiconductor Manufacturing Co., Ltd. Step and scan exposure system equipped with a plurality of attenuator blades for exposure control
JP4346320B2 (ja) * 2003-02-05 2009-10-21 大日本印刷株式会社 露光方法及び露光装置
KR100598095B1 (ko) * 2003-07-10 2006-07-07 삼성전자주식회사 노광 장치
JP2008141016A (ja) 2006-12-01 2008-06-19 Canon Inc シャッタ羽根装置、シャッタユニット、撮像装置、露光装置およびデバイス製造方法
CN102707577B (zh) * 2012-05-23 2013-11-27 哈尔滨工业大学 宏微双机构伺服控制系统及其控制方法
JP6415057B2 (ja) * 2014-02-07 2018-10-31 キヤノン株式会社 露光装置、および物品の製造方法
JP6313795B2 (ja) * 2016-03-03 2018-04-18 キヤノン株式会社 シャッタユニット、リソグラフィ装置、インプリント装置、及び物品の製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1673868A (zh) * 2004-03-26 2005-09-28 力晶半导体股份有限公司 具有可变快门的曝光机台及其曝光方法
CN102096325A (zh) * 2009-12-10 2011-06-15 上海微电子装备有限公司 光强衰减装置及其衰减方法
US20120229966A1 (en) * 2011-03-08 2012-09-13 Samsung Electronics Co., Ltd. Display apparatus and method of fabricating the same
CN103293864A (zh) * 2012-02-27 2013-09-11 上海微电子装备有限公司 一种光刻曝光剂量的控制装置及控制方法
CN103631066A (zh) * 2012-08-21 2014-03-12 上海微电子装备有限公司 一种用于光刻曝光的快门装置及其使用方法
CN203535380U (zh) * 2013-10-29 2014-04-09 中芯国际集成电路制造(北京)有限公司 快门装置以及光刻设备

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019200235A (ja) * 2018-05-14 2019-11-21 キヤノン株式会社 露光装置
KR20190130500A (ko) * 2018-05-14 2019-11-22 캐논 가부시끼가이샤 노광 장치
KR102497946B1 (ko) 2018-05-14 2023-02-10 캐논 가부시끼가이샤 노광 장치
JP7352332B2 (ja) 2018-05-14 2023-09-28 キヤノン株式会社 露光装置

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