WO2017146180A1 - 反射防止フィルム、及び反射防止フィルムの製造方法 - Google Patents
反射防止フィルム、及び反射防止フィルムの製造方法 Download PDFInfo
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- WO2017146180A1 WO2017146180A1 PCT/JP2017/006953 JP2017006953W WO2017146180A1 WO 2017146180 A1 WO2017146180 A1 WO 2017146180A1 JP 2017006953 W JP2017006953 W JP 2017006953W WO 2017146180 A1 WO2017146180 A1 WO 2017146180A1
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- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
- G02B5/0226—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures having particles on the surface
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0273—Diffusing elements; Afocal elements characterized by the use
- G02B5/0294—Diffusing elements; Afocal elements characterized by the use adapted to provide an additional optical effect, e.g. anti-reflection or filter
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
Definitions
- the present invention relates to an antireflection film and a method for producing the antireflection film.
- An antireflection film may be provided in order to prevent a decrease in contrast and reflection of an image due to reflection of external light on the display surface. Further, there are cases where an antireflection function is imparted by an antireflection film other than an image display device such as a glass surface of a showroom.
- Patent Document 1 As an antireflection film used by being disposed on the front surface of a display, Patent Document 1 includes at least three reactive groups that can be polymerized by irradiation with active energy rays in one molecule, and polydimethylsiloxane, An antireflection film containing a polyorganosiloxane in which diisocyanate or triisocyanate and a polymerizable reactive group-containing polyester are urethane-bonded is described.
- Patent Document 2 discloses that a polysiloxane moiety and 5 or more molecules are contained in one molecule.
- a curable resin composition comprising a (meth) acrylate compound having a specific structure having a (meth) acryloyloxy group, a urethane (meth) acrylate, and a photopolymerization initiator is described.
- an antireflection film an antireflection film having a fine uneven shape whose period is not more than the wavelength of visible light on the surface of the substrate, that is, an antireflection film having a so-called moth eye structure is known. Due to the moth-eye structure, for the visible light, a refractive index gradient layer in which the refractive index continuously changes from the air toward the bulk material inside the base material can be created to prevent light reflection.
- Patent Document 3 discloses that a coating liquid containing a transparent resin monomer and fine particles is applied on a transparent substrate and cured to form a transparent resin in which the fine particles are dispersed.
- An anti-reflection film having a moth-eye structure manufactured by etching a resin is described.
- An object of the present invention is to provide an antireflection film having good antireflection performance, having a small change in reflectance before and after the scratch resistance test, and excellent in practical scratch resistance, and the above antireflection film. It is in providing the method of manufacturing easily.
- the present inventors have studied diligently that it is important to satisfy both the crosslink density of the material itself and the slipperiness of the antireflection layer, particularly the extremely shallow region of the surface. I came to a conclusion. In particular, the case where the antireflection layer has a moth-eye structure having an uneven shape on the surface is remarkable. In conventional slip agents, only slippery is emphasized, and since the density of the cross-linking group of the material itself is not high, even if it exists on the outermost surface of the convex part of the moth-eye structure, it works effectively at the beginning of the scratch resistance test.
- a cured product of a curable composition comprising a photopolymerization initiator (c), In the material distribution in the cross-sectional direction of the region (S), the antireflection film has a region in which the content of the slip agent (a) is 51% or more.
- the reflectance of the antireflection film is R A before the steel wool is rubbed.
- the reflectivity changes represented by R a -R 0 is not more than 0.25%, the anti-reflection film according to ⁇ 1>.
- ⁇ 3> The antireflection film according to ⁇ 1> or ⁇ 2>, wherein the cross-linking group of the slip agent (a) is a (meth) acryloyl group.
- ⁇ 4> The antireflection film according to any one of ⁇ 1> to ⁇ 3>, wherein the site containing at least one of the fluorine atom and the siloxane bond in the slip agent (a) is a fluoroalkyl group.
- the site containing at least one of the fluorine atom and the siloxane bond in the slip agent (a) is a polydimethylsiloxane group or a polyether-modified dimethylsiloxane group, according to any one of ⁇ 1> to ⁇ 3>.
- Antireflection film is a polydimethylsiloxane group or a polyether-modified dimethylsiloxane group.
- the slip agent (a) is a compound (a1) having a site containing at least one of the fluorine atom and siloxane bond in the side chain and the crosslinking group, and having a weight average molecular weight of 6,000 or more. Or the antireflection film as described in ⁇ 5>. ⁇ 7> The antireflective film according to ⁇ 6>, wherein the compound (a1) has the crosslinking group linked to the main chain by a C—C bond or a C—O bond.
- the slip agent (a) is a compound (a2) having a weight average molecular weight of less than 6,000, wherein the crosslinking group is bonded directly or via a linking group to a site containing at least one of the fluorine atom and siloxane bond.
- the compound (a2) is A compound having one group represented by the following general formula (M-2); A compound having one group represented by the following general formula (M-3); A compound having two groups represented by the following general formula (M-1): A compound having two groups represented by the following general formula (M-2), or
- the antireflection film according to ⁇ 8> which is a compound having two groups represented by the following general formula (M-3).
- R 1 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkyloxy group, an alkenyloxy group, an alkyloxyalkyl group, or an alkenyloxyalkyl group.
- R 11 and R 12 each independently represents a hydrogen atom or a methyl group. * Represents a bonding position.
- R 21 to R 23 each independently represents a hydrogen atom or a methyl group. * Represents a bonding position.
- R 31 to R 35 each independently represents a hydrogen atom or a methyl group. * Represents a bonding position.
- the compound (a2) is a reflection according to ⁇ 8>, wherein the site containing at least one of the fluorine atom and the siloxane bond and the crosslinking group are bonded via a C—C bond or a C—O bond.
- Prevention film ⁇ 11> The antireflection film according to any one of ⁇ 1> to ⁇ 10>, wherein the antireflection layer has particles (d) having an average primary particle size of 250 nm or less.
- the antireflection film according to ⁇ 11> which has an uneven shape formed by the particles (d) on the surface of the antireflection layer opposite to the substrate.
- ⁇ 13> The antireflection film according to any one of ⁇ 1> to ⁇ 12>, wherein the substrate has a visible light transmittance of 80% or more.
- ⁇ 14> The antireflection film according to ⁇ 12>, wherein the antireflection layer does not include a plurality of the particles (d) in a direction perpendicular to the surface of the base material.
- a method for producing an antireflection film according to ⁇ 12> On the substrate, A composition containing the slip agent (a), the curable compound (b), the photopolymerization initiator (c), the particles (d), and a solvent is applied, the solvent is volatilized, and the particles (d And (1) providing a layer (A) in which the thickness of the portion where no) is present is 0.8 times or more the average primary particle size of the particles (d); A step (2) of curing a part of the curable compound (b) in the layer (A) to obtain a cured compound (bc); A part of the compound selected from the group consisting of the curable compound (b) and the compound (bc) in the layer (A) is allowed to permeate or volatilize the substrate by heating, and the layer (A And (3) forming an uneven shape composed of the particles (d) on the outermost surface opposite to the substrate side of A compound selected from the group consisting of the slip agent (a), the curable compound (b), and
- Step (4) The manufacturing method of the antireflection film which has these in this order.
- a method for producing an antireflection film is
- an antireflection film having good antireflection performance, small change in reflectance before and after the scratch resistance test, and excellent in practical scratch resistance.
- a method by which a film can be easily produced can be proposed.
- (meth) acrylate represents at least one of acrylate and methacrylate
- (meth) acryl represents at least one of acrylic and methacryl
- (meth) acryloyl represents at least one of acryloyl and methacryloyl.
- the antireflection film of the present invention is Having at least one antireflection layer on the substrate; In the region (S) having a thickness of 20 nm or less in the direction from the outermost surface on the side opposite to the surface on the base material side to the base material, the antireflection layer, A slipping agent (a) having three or more crosslinking groups in one molecule, having a crosslinking group equivalent of 450 or less, and having a portion containing at least one of a fluorine atom and a siloxane bond; A curable compound (b) having at least three crosslinking groups in at least one molecule, having a crosslinking group equivalent of 450 or less, and having neither a fluorine atom nor a siloxane bond; A cured product of a curable composition comprising a photopolymerization initiator (c), In the material distribution in the cross-sectional direction of the region (S), the antireflection film has a region in which the content of the slip
- the slip agent (a) has 3 or more cross-linking groups in one molecule, has a cross-linking group equivalent of 450 or less, and contains at least one type of fluorine atom and siloxane bond (hereinafter, this site is referred to as “low friction site”). Also called).
- the crosslinking group include a radical reactive group or a reactive group other than a radical reactive group, and a radical reactive group is preferable.
- radical reactive groups include groups having unsaturated bonds capable of addition polymerization (for example, (meth) acryloyl group, (meth) acrylamide group, (meth) acrylonitrile group, allyl group, vinyl group, styrene structure, vinyl ether structure, acetylene). Structure), -SH, -PH, SiH, -GeH, disulfide structure, etc., and polymerizable functional groups such as (meth) acryloyl group, vinyl group, styryl group, allyl group (polymerizable carbon-carbon non-carbon).
- Groups having a saturated double bond are preferred, among which (meth) acryloyl group and —C (O) OCH ⁇ CH 2 are preferred, and (meth) acryloyl group is most preferred.
- reactive groups other than radical reactive groups include epoxy groups, amino groups, boronic acid groups, boronic ester groups, oxiranyl groups, oxetanyl groups, hydroxyl groups, carboxyl groups, and isocyanate groups.
- the cross-linking group equivalent of the slip agent (a) is a value obtained by dividing the molecular weight of the slip agent (a) by the number of cross-linking groups contained in the slip agent (a), and is 450 or less from the viewpoint of film strength after curing. It is more preferable that it is 350 or less, and it is still more preferable that it is 300 or less.
- the crosslinking group equivalent when the crosslinking group is an acryloyl group or a methacryloyl group may be referred to as an acrylic equivalent.
- the slip agent (a) is a compound (a1) having a low friction site and a crosslinking group in the side chain and having a weight average molecular weight of 6,000 or more, from the viewpoint of uneven distribution in the antireflection layer, or From the viewpoint of the strength of the outermost surface, the compound (a2) having a weight average molecular weight of less than 6,000 and having a crosslinking group bonded directly or via a linking group to a low friction site is preferable.
- the compound (a1) is preferably a polymer, and the weight average molecular weight of the compound (a1) is preferably 6000 to 100,000, and more preferably 8,000 to 80,000.
- the compound (a2) is preferably a monomer or oligomer, and the weight average molecular weight of the compound (a2) is preferably 900 to 6,000, more preferably 1300 to 5000.
- the weight average molecular weight of a sliding agent (a) is calculated
- the crosslinking group is preferably connected to the main chain by a C—C bond or a C—O bond.
- the compound (a2) preferably has a low friction site and a crosslinking group bonded via a C—C bond or a C—O bond.
- the compound (a1) preferably has a repeating unit having a low friction site in the side chain and a repeating unit having a crosslinking group in the side chain.
- the repeating unit having a crosslinking group in the side chain those described in [0028] to [0044] of JP-A-2009-79126 can be referred to.
- the compound (a2) is A compound having one group represented by the following general formula (M-2); A compound having one group represented by the following general formula (M-3); A compound having two groups represented by the following general formula (M-1): A compound having two groups represented by the following general formula (M-2), or A compound having two groups represented by the following general formula (M-3) is preferable.
- R 1 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkyloxy group, an alkenyloxy group, an alkyloxyalkyl group, or an alkenyloxyalkyl group.
- R 11 and R 12 each independently represents a hydrogen atom or a methyl group. * Represents a bonding position.
- R 21 to R 23 each independently represents a hydrogen atom or a methyl group. * Represents a bonding position.
- R 31 to R 35 each independently represents a hydrogen atom or a methyl group. * Represents a bonding position.
- the compound (a2) is a compound having one group represented by the general formula (M-2)
- the group represented by the general formula (M-2) is preferably bonded directly or via a linking group.
- the group represented by the general formula (M-3) is preferably bonded directly or via a linking group.
- the group represented by the general formula (M-1) is bonded directly or via a linking group.
- the groups represented by the two general formulas (M-1) may be the same or different.
- the compound (a2) is a compound having two groups represented by the general formula (M-2)
- the group represented by the general formula (M-2) is preferably bonded directly or via a linking group.
- the groups represented by the two general formulas (M-2) may be the same or different.
- the compound (a2) is a compound having two groups represented by the general formula (M-3)
- the group represented by the general formula (M-3) is preferably bonded directly or via a linking group.
- the groups represented by the two general formulas (M-3) may be the same or different.
- the site containing the fluorine atom is preferably a fluoroalkyl group.
- the slipping agent (a) having a site containing a fluorine atom can be represented, for example, by a structure as shown in the following general formula (1), but the present invention is not limited thereto.
- the hydrocarbon chain may be described by a simplified structural formula in which symbols of carbon (C) and hydrogen (H) are omitted.
- R represents a hydrogen atom or a fluorine atom.
- Rp 1 and Rp 2 each independently represent a hydrogen atom, a monovalent hydrocarbon group, an alkoxy group, or an aryloxy group.
- n represents an integer of 2 or more.
- the monovalent hydrocarbon group include an alkyl group, an aryl group, an alkenyl group, an alkynyl group, and an aralkyl group.
- Rp 1 and Rp 2 are a hydrogen atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, or an aryloxy group having 6 to 20 carbon atoms.
- N is preferably an integer of 6 to 100, more preferably n is an integer of 8 to 65, and most preferably n is an integer of 10 to 35.
- a polydimethylsiloxane group or a polyether-modified dimethylsiloxane group is useful as the site containing the siloxane bond of the slip agent (a).
- a polydimethylsiloxane group or a polyether-modified dimethylsiloxane group having a repeating number n of 6 to 100 is more preferable, n is more preferably 8 to 65, and n is most preferably 10 to 35.
- the repeating number n of the polydimethylsiloxane group or the polyether-modified dimethylsiloxane group is 6 or more, hydrophobicity is exhibited, the ability to be unevenly distributed to the air interface is increased, and the low friction portion can be exposed on the surface.
- n is 100 or less, uneven distribution is sufficient, the density of the crosslinking group is not reduced, the strength of the film obtained by crosslinking is increased, and it works effectively in the scratch resistance test.
- a silicone polymer compound (A1)
- a silicone monomer or oligomer compound (A2)
- the compound (A1) and the compound (A2) will be described in detail below.
- a compound (A1) is a case where a low friction site
- a specific example of the compound (A1) is shown in the following general formula (2).
- R 1 represents a hydrogen atom or a methyl group
- R 2 represents a divalent linking chain
- R 3 represents a hydrogen atom or a monovalent organic group
- n is an integer of 5 to 100 Represents.
- R 1 , R 2 and R 3 in each repeating unit may be the same or different.
- R 2 represents a divalent linking chain, specifically, a substituted or unsubstituted alkylene group, a substituted or unsubstituted arylene group, a linking group (for example, an ether bond, an ester) A substituted or unsubstituted alkylene group having a bond, an amide bond, etc.), a substituted or unsubstituted arylene group having a linking group therein, a substituted or unsubstituted alkylene group, a substituted or unsubstituted arylene group, an internal
- An alkylene group having a linking group is preferred, an unsubstituted alkylene group, an unsubstituted arylene group, an alkylene group having an ether bond or an ester bond inside is more preferred, an unsubstituted alkylene group, an ether bond or an ester bond inside
- An alkylene group having Examples of the substituent include a halogen, a hydroxyl group,
- Examples of commercially available silicone polymers having a structure represented by the above general formula (2) include ACRYT 8SS-723 (manufactured by Taisei Fine Chemical Co., Ltd.), ACRITT 8SS-1024 (manufactured by Taisei Fine Chemical Co., Ltd.), and the like.
- a compound (A2) is a case where a low friction site
- Examples of the silicone monomer or oligomer having a crosslinking group that can be suitably used as the compound (A2) include compounds represented by the following general formula (4) and compounds represented by the following general formula (5).
- the present invention is not limited to these.
- the group represented by the following general formula (4) which is a group having a crosslinking group, is a linking group at one end of the main chain including a low friction site. It is the compound which has couple
- the group represented by the above general formula (M-2), which is a group having a crosslinking group is a linking group at one end of the main chain including a low friction site. It is the compound which has couple
- R 41 represents a divalent linking chain
- R 42 represents a hydrogen atom or a monovalent organic group
- n represents an integer of 4 to 100.
- R 41 represents a divalent linking chain, specifically, a substituted or unsubstituted alkylene group, a substituted or unsubstituted arylene group, a linking group (for example, an ether bond, an ester) A substituted or unsubstituted alkylene group having a bond, an amide bond, etc.), a substituted or unsubstituted arylene group having a linking group therein, a substituted or unsubstituted alkylene group, a substituted or unsubstituted arylene group, an internal
- An alkylene group having a linking group is preferred, an unsubstituted alkylene group, an unsubstituted arylene group, an alkylene group having an ether bond or an ester bond inside is more preferred, an unsubstituted alkylene group, an ether bond or an ester bond inside
- An alkylene group having Examples of the substituent include a halogen, a hydroxyl group
- R 41 in the general formula (4) is preferably an unsubstituted alkylene group having an ether bond or the like, and more preferably * (CH 2 ) 3 *.
- R 42 in the general formula (4) represents a hydrogen atom or a monovalent organic group, and is preferably a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms.
- n represents an integer of 4 to 100, preferably an integer of 6 to 65, and more preferably an integer of 8 to 35.
- Specific examples of the compound represented by the general formula (4) include the following compounds (S-1) and (S-2). However, the present invention is not limited to these.
- Compound (S-1) A compound in which in the above general formula (4), n is 10, R 41 is — (CH 2 ) 3 —, and R 42 is CH 3 .
- Compound (S-2) A compound in which in the above general formula (4), n is 21, R 41 is — (CH 2 ) 3 —, and R 42 is CH 3 .
- R 51 represents a divalent linking chain
- R 52 represents a hydrogen atom or a monovalent organic group
- n represents an integer of 2 to 100.
- R 51 and R 52 are the same as R 41 and R 42 in General Formula (4), respectively.
- a preferable range of n in the general formula (5) is the same as n in the general formula (4).
- Specific examples of the compound represented by the general formula (5) include the following compound (S-3). However, the present invention is not limited to these.
- Examples of the silicone monomer or oligomer having a crosslinking group that can be suitably used as the compound (A2) include the compound represented by the general formula (4) and the compound represented by the general formula (5). Furthermore, although the compound represented by the following general formula (6) and the compound represented by the following general formula (7) are also mentioned, this invention is not restrict
- a group represented by the above general formula (M-3) which is a group having a crosslinking group at both ends of the main chain including a low friction site is a linking group. It is the compound which has couple
- the group represented by the general formula (M-2), which is a group having a crosslinking group is a linking group at one end of the main chain including a low friction site.
- a group represented by the above general formula (M-2), which is a group having a crosslinking group, is bonded to the other end of the main chain comprising a low friction site via a linking group. It is a compound.
- R 61 and R 62 each independently represent a divalent linking chain, and n represents an integer of 4 to 100. Specific examples and preferred ranges of R 61 and R 62 in the general formula (6) are the same as those of R 41 in the general formula (4). A preferable range of n in the general formula (6) is the same as n in the general formula (4).
- Specific examples of the compound represented by the general formula (6) include the following compounds (S-4) to (S-6). However, the present invention is not limited to these.
- Compound (S-4) A compound in which in the above general formula (6), n is 9, and R 61 and R 62 are — (CH 2 ) 3 —.
- Compound (S-5) A compound in which in the above general formula (6), n is 20, and R 61 and R 62 are — (CH 2 ) 3 —.
- R 71 and R 72 each independently represent a divalent linking chain, and n represents an integer of 2 to 100.
- R 71 and R 72 in the general formula (7) are the same as R 41 in the general formula (4).
- a preferred range of n in the general formula (7) is the same as n in the general formula (4).
- Specific examples of the compound represented by the general formula (7) include the following compounds (S-7) and (S-8). However, the present invention is not limited to these.
- Compound (S-7) A compound in which in the above general formula (7), n is 20, and R 71 and R 72 are — (CH 2 ) 3 —.
- the curable compound (b) is a compound having at least three crosslinking groups in at least one molecule, having a crosslinking group equivalent of 450 or less, and having neither a fluorine atom nor a siloxane bond. Specific examples and preferred ranges of the crosslinking group of the curable compound (b) are the same as those of the above-mentioned slipping agent (a).
- the crosslinkable group equivalent of the curable compound (b) is a value obtained by dividing the molecular weight of the curable compound (b) by the number of crosslinkable groups contained in the curable compound (b), and is 450 or less from the viewpoint of film strength.
- the curable compound (b) it is preferable to use at least one compound having a radical reactive group.
- the radical reactive group includes a group having an unsaturated bond capable of addition polymerization (for example, (meth) acryloyl group, (meth) acrylamide group, (meth) acrylonitrile group, allyl group, vinyl group, styrene structure, vinyl ether structure, acetylene). Structure), -SH, -PH, SiH, -GeH, disulfide structure and the like.
- At least one compound having a polymerizable functional group such as a (meth) acryloyl group, a vinyl group, a styryl group, or an allyl group is used.
- a polymerizable functional group polymerizable carbon-carbon unsaturated double bond
- at least one compound having two or more (meth) acryloyl groups in one molecule is used.
- one compound may be used alone, or two or more compounds may be used in combination.
- the antireflection film of the present invention uses a substrate with a hard coat layer as the substrate, at least two curable compounds are used as the curable compound (b), and at least one of them is radically reactive.
- a compound having a group, and at least one other kind is a compound that penetrates into the substrate in step (3) in the method for producing an antireflection film, has no radical reactive group, and is other than a radical reactive group It is preferable that it is a compound which has these reactive groups.
- curable compound (b) examples include the following curable compounds (b-1) to (b-3). Of these, it is preferable to use two or more of these together, and it is more preferable to use all three of them together. preferable.
- Curable compound (b-1) Compound having a molecular weight of 400 or more and having a radical reactive group
- Curable compound (b-3) A compound having a molecular weight of less than 400, having no radical reactive group and having a reactive group other than a radical reactive group, or a compound having a molecular weight of less than 300 and volatilizing when heated
- the molecular weight of the curable compound (b) is determined from the structural formula when it is uniquely determined from the structural formula of the curable compound, and is uniquely determined from the structural formula such as having a distribution like a polymer compound. If not, the weight average molecular weight is measured using gel permeation chromatography.
- the weight average molecular weight in the present invention is a value measured by gel permeation chromatography (GPC) under the following conditions.
- Sample concentration 0.1% by mass
- Flow rate 0.35 ml / min
- TSK standard polystyrene manufactured by TOSOH Weight average molecular weight (Mw) A calibration curve with 7 samples from 2800000 to 1050 was used.
- the curable compound (b-1) is a compound having a molecular weight of 400 or more and having a radical reactive group.
- the curable compound (b-1) is preferably a compound that hardly penetrates into the substrate.
- the molecular weight of the curable compound (b-1) is preferably from 400 to 100,000, more preferably from 1,000 to 50,000.
- the curable compound (b-1) has a functional group equivalent represented by (molecular weight / radical reactive group amount) of preferably 450 or less, more preferably 400 or less, and 350 or less. Is more preferable.
- the curable compound (b-1) preferably does not have a hydrolyzable silane coupling group represented by an alkoxysilyl group (that is, is not a silane coupling agent).
- curable compound (b-1) examples include (meth) acrylic acid diesters of alkylene glycol, (meth) acrylic acid diesters of polyoxyalkylene glycol, (meth) acrylic acid diesters of polyhydric alcohols, ethylene oxide or propylene. (Meth) acrylic acid diesters of oxide adducts, epoxy (meth) acrylates, urethane (meth) acrylates, polyester (meth) acrylates, and the like.
- curable compound (b-1) examples include KAYARAD DPHA, DPHA-2C, PET-30, TMPTA, TPA-320, TPA-330, RP-1040, T-1420, D-310, DPCA-20, DPCA-30, DPCA-60, GPO-303 (manufactured by Nippon Kayaku Co., Ltd.), NK ester A-TMPT, A-TMMT, A-TMM3, A- TMM3L, A-9550 (manufactured by Shin-Nakamura Chemical Co., Ltd.), V # 3PA, V # 400, V # 36095D, V # 1000, V # 1080, Biscote # 802 (manufactured by Osaka Organic Chemical Industries, Ltd.), etc.
- Dendrimer type polyfunctional acrylates such as esterified product of polyol and (meth) acrylic acid, Sirius-501, SUBARU-501 (Osaka Organic Chemical Co., Ltd.) Can be mentioned.
- the curable compound (b-2) is a silane coupling agent having a radical reactive group.
- the molecular weight of the curable compound (b-2) is preferably 100 to 5000, and more preferably 200 to 2000.
- the curable compound (b-2) is preferably a compound that hardly penetrates into the substrate.
- the functional group equivalent represented by (molecular weight / radical reactive group amount) is more preferably 450 or less, more preferably 400 or less, and 350 or less. More preferably.
- curable compound (b-2) examples include 3- (meth) acryloxypropyltrimethoxysilane, 3- (meth) acryloxypropylmethyldimethoxysilane, 3- (meth) acryloxypropyldimethylmethoxysilane, 3- (meth) acryloxypropylmethyldiethoxysilane, 3- (meth) acryloxypropyltriethoxysilane, 2- (meth) acryloxyethyltrimethoxysilane, 2- (meth) acryloxyethyltriethoxysilane, 4 -(Meth) acryloxybutyltrimethoxysilane, 4- (meth) acryloxybutyltriethoxysilane, etc.
- the curable compound (b-3) is a compound having a molecular weight of less than 400, having no radical reactive group, and having a reactive group other than the radical reactive group.
- the curable compound (b-3) is preferably a compound that hardly penetrates into the substrate at 25 ° C. and easily penetrates into the substrate during heating.
- Examples of the reactive group other than the radical reactive group possessed by the curable compound (b-3) include a group that reacts with a compound constituting the base material (in the case where the base material has a functional layer such as a hard coat layer).
- the molecular weight of the curable compound (b-3) is preferably 100 or more and less than 400, more preferably 200 or more and 300 or less.
- the curable compound (b-3) preferably has two or more reactive groups other than radical reactive groups.
- Specific examples of the curable compound (b-3) include Celoxide 2021P, Celoxide 2081, Epolide GT-301, Epolide GT-401, EHPE3150CE (manufactured by Daicel Chemical Industries, Ltd.), OXT-121, OXT-221.
- the content of the curable compound (b) with respect to the total solid content in the curable composition is preferably 50 to 98% by mass, more preferably 55 to 95% by mass, and still more preferably 60 to 90% by mass.
- the region (S) of the antireflection layer in the present invention contains a cured product of a curable composition containing the aforementioned slip agent (a), the aforementioned curable compound (b) and the photopolymerization initiator (c).
- Photopolymerization initiators (c) include acetophenones, benzoins, benzophenones, phosphine oxides, ketals, anthraquinones, thioxanthones, azo compounds, peroxides, 2,3-dialkyldione compounds, disulfides Examples thereof include compounds, fluoroamine compounds, aromatic sulfoniums, lophine dimers, onium salts, borate salts, active esters, active halogens, inorganic complexes, and coumarins.
- photopolymerization initiator (c) preferred embodiments, commercially available products and the like are described in paragraphs [0133] to [0151] of JP-A-2009-098658, and are also suitably used in the present invention. Can be used.
- the content of the photopolymerization initiator (c) is sufficiently large to polymerize the polymerizable compound contained in the curable composition (antireflection layer forming composition) and is small enough not to increase the starting point too much.
- the content is preferably 0.5 to 8% by mass, more preferably 1 to 5% by mass, based on the total solid content in the composition for forming an antireflection layer.
- the said curable composition may contain the other component.
- the antireflection film of the present invention has a region where the content of the slip agent (a) is 51% or more in the material distribution in the cross-sectional direction of the region (S).
- the content of the slip agent (a) is the fluorine atom and silicone (siloxane bond) existing in an arbitrary region (S) between 20 nm and the outermost surface opposite to the substrate side surface of the antireflection layer.
- the material distribution in the cross-sectional direction of the antireflection layer includes the slip agent (a) when the film was cut with a microtome and the cross section was analyzed with a time-of-flight secondary ion mass spectrometer (TOF-SIMS). It is detected as a material distribution, and the film thickness in this region can be similarly measured from the cross-sectional information of TOF-SIMS.
- the antireflection film of the present invention preferably has a region in which the content of the slip agent (a) is 51% or more in the region (S), and has a region of more than 55% and less than 100%. It is more preferable to have a region that is at least 70%, and it is even more preferable to have a region that is at least 70%.
- the slip agent (a) is not distributed to the inside of the antireflection layer (that is, the antireflection layer It is unevenly distributed in the vicinity of the outermost surface), and can improve slipperiness and film hardness.
- the total amount of fluorine atoms and silicone (siloxane bond), F was measured by time-of-flight secondary ion mass spectrometry (TOF-SIMS) - measured by the ratio of the fragment or Si 2 C 5 H 15 O + fragment or, It can be measured by the ratio of F / C or Si / C measured by XPS (X-ray Photoelectron Spectroscopy) analysis with the incident angle adjusted appropriately.
- TOF-SIMS time-of-flight secondary ion mass spectrometry
- XPS X-ray Photoelectron Spectroscopy
- the film thickness of the antireflection layer of the antireflection film of the present invention is preferably from 50 to 200 nm, more preferably from 60 to 190 nm.
- the substrate is not particularly limited as long as it is a light-transmitting substrate generally used as a substrate for an antireflection film, but a plastic substrate or a glass substrate is preferable.
- plastic substrates can be used, such as cellulose resin; cellulose acylate (triacetate cellulose, diacetyl cellulose, acetate butyrate cellulose), polyester resin; polyethylene terephthalate, (meth) acrylic resin, polyurethane, etc.
- Base materials containing polycarbonate resins, polycarbonates, polystyrenes, olefin resins, etc. preferably cellulose acylates, polyethylene terephthalates, or substrates containing (meth) acrylic resins, and substrates containing cellulose acylates Is more preferable, and a cellulose acylate film is particularly preferable.
- the cellulose acylate the base material described in JP 2012-093723 A can be preferably used.
- the thickness of the substrate is usually about 10 ⁇ m to 1000 ⁇ m, but is preferably 20 ⁇ m to 200 ⁇ m, more preferably 25 ⁇ m to 100 ⁇ m from the viewpoints of good handleability, high translucency, and sufficient strength. preferable.
- the visible light transmittance preferably an average transmittance of a wavelength of 400 nm or more and 750 nm or less
- the antireflection film of the present invention has the reflectance of the antireflection film after rubbing the outermost surface opposite to the substrate side surface of the antireflection layer 10 times with steel wool under a load of 200 g, R A , when the reflectance of the antireflection film before rubbing with steel wool and the R 0, it is preferable that change in reflectance represented by R a -R 0 is not more than 0.25%, it is 0.20% or less And more preferably 0.15% or less.
- the reflectivity RA is determined when the rubbing speed is 13 cm / sec, the load is 200 g / cm 2 , the contact area between the steel wool and the antireflection film surface is 1 cm ⁇ 1 cm, and the film surface is rubbed 10 times with steel wool. The reflectance is shown.
- the antireflection layer of the antireflection film of the present invention preferably has particles (d) having an average primary particle size of 250 nm or less.
- the particles (d) include metal oxide particles, resin particles, organic-inorganic hybrid particles having a metal oxide particle core and a resin shell, and metal oxide particles are preferable from the viewpoint of excellent film strength.
- the metal oxide particles include silica particles, titania particles, zirconia particles, and antimony pentoxide particles.
- Silica particles are preferred from the viewpoint.
- the resin particles include polymethyl methacrylate particles, polystyrene particles, and melamine particles.
- the average primary particle diameter of the particles (d) is more preferably 150 nm or more and 250 nm or less, and further preferably 170 nm or more and 220 nm or less, from the viewpoint that the particles can be aligned to form a moth-eye structure.
- the particles (d) only one type may be used, or two or more types of particles having different average primary particle diameters may be used.
- the average primary particle diameter of the particles (d) refers to a cumulative 50% particle diameter of the volume average particle diameter. More specifically, particles are added to ethanol so that the content becomes 35% by mass, and dispersed by ultrasonic waves for 10 minutes or more to prepare a particle dispersion, and this dispersion is measured by an electron micrograph. I can do it. Drop the dispersion to shoot a SEM (Scanning Electron Microscope) image, measure the diameter of each of the 100 primary particles, calculate the volume, and use the cumulative 50% particle size as the average primary particle size. Can do. When the particle is not a spherical diameter, the average value of the major axis and the minor axis is regarded as the diameter of the primary particle.
- the shape of the particle (d) is most preferably spherical, but there is no problem even if it is other than a spherical shape such as an indefinite shape.
- the particles may be either crystalline or amorphous.
- the particles (d) it is preferable to use inorganic fine particles which have been surface-treated for improving dispersibility in a coating solution, improving film strength, and preventing aggregation.
- Specific examples of the surface treatment method and preferred examples thereof are the same as those described in [0119] to [0147] of JP-A-2007-298974.
- the particle surface is modified with a compound having an unsaturated double bond and a functional group having reactivity with the particle surface so that the particle surface is not damaged. It is preferable to provide a saturated double bond.
- particles having an average primary particle size of 150 nm or more and 250 nm or less include Seahoster KE-P20 (average primary particle size 200 nm, amorphous silica manufactured by Nippon Shokubai Co., Ltd.), Eposter S (average primary particle size 200 nm, Japan Catalyst (Melamine / formaldehyde condensate), Epstar MA-MX100W (average primary particle size 175 nm, Nippon Shokubai Co., Ltd. polymethyl methacrylate (PMMA) cross-linked product) can be preferably used.
- Seahoster KE-P20 average primary particle size 200 nm, amorphous silica manufactured by Nippon Shokubai Co., Ltd.
- Eposter S average primary particle size 200 nm, Japan Catalyst (Melamine / formaldehyde condensate)
- Epstar MA-MX100W average primary particle size 175 nm, Nippon Shokubai Co.
- the particle (d) is particularly preferably a calcined silica particle because the surface has a moderately large amount of hydroxyl groups and is a hard particle.
- the calcined silica particles are manufactured by a known technique in which silica particles are obtained by hydrolyzing and condensing a hydrolyzable silicon compound in an organic solvent containing water and a catalyst, and then the silica particles are calcined.
- Japanese Patent Application Laid-Open Nos. 2003-176121 and 2008-137854 can be referred to.
- Chlorosilanes such as tetrachlorosilane, methyltrichlorosilane, phenyltrichlorosilane, dimethyldichlorosilane, diphenyldichlorosilane, methylvinyldichlorosilane, trimethylchlorosilane, methyldiphenylchlorosilane Compound: Tetramethoxysilane, tetraethoxysilane, tetraisopropoxysilane, tetrabutoxysilane, methyltrimethoxysilane, methyltriethoxysilane, trimethoxyvinylsilane, triethoxyvinylsilane, 3-glycidoxypropyltrimethoxysilane, 3-chloro Propyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane
- the alkoxysilane compound is particularly preferred because it is more easily available and the resulting fired silica particles do not contain halogen atoms as impurities.
- the halogen atom content is substantially 0% and no halogen atoms are detected.
- the firing temperature is not particularly limited, but is preferably 800 to 1300 ° C, and more preferably 1000 to 1200 ° C.
- the content of particles (d) in the antireflection layer is preferably 0.10 ⁇ 0.30g / m 2, more preferably 0.14 ⁇ 0.24g / m 2, 0.16 ⁇ 0.20g / m 2 More preferably.
- FIG. 4 is a schematic cross-sectional view showing an example of the antireflection film of the present invention of this embodiment.
- the irregular shape formed by the particles (d) preferably has a moth-eye structure.
- the particles (d) protrude and become convex portions, and the spaces between the particles (d) become concave portions to form an uneven shape on the surface of the antireflection layer.
- cured material which the above-mentioned slip agent (a), the curable compound (b), etc. hardened
- the antireflection layer of the antireflection film of the present invention is in a region (S) having a thickness of 20 nm or less in the direction from the outermost surface on the side opposite to the surface on the substrate side to the substrate, In the material distribution in the cross-sectional direction of the region (S), including a hardened product of a curable composition containing a slip agent (a), a curable compound (b), and a photopolymerization initiator (c), a slip agent ( It has a region where the content of a) is 51% or more.
- the coating covering the surface of the protruding portion of the particle (d) is a region (S) having a thickness of 20 nm or less, and the content of the slip agent (a) in this region (S) is 51% or more. It is preferable to have a region.
- the moth-eye structure refers to a processed surface of a substance (material) for suppressing light reflection, and a structure having a periodic fine structure pattern.
- a structure having a fine structure pattern with a period of less than 780 nm.
- the period of the fine structure pattern is less than 380 nm, the color of the reflected light is preferably reduced.
- the period of the concavo-convex shape of the moth-eye structure is 100 nm or more because light having a wavelength of 380 nm can recognize a fine structure pattern and has excellent antireflection properties.
- the presence or absence of the moth-eye structure can be confirmed by observing the surface shape with a scanning electron microscope (SEM), an atomic force microscope (AFM), or the like, and examining whether the fine structure pattern is formed.
- SEM scanning electron microscope
- AFM atomic force microscope
- the antireflection film 10 in FIG. 2 has a base material 1 and an antireflection layer 2.
- the antireflection layer 2 has a moth-eye structure having a concavo-convex shape formed of particles 3 having an average primary particle size of, for example, 150 nm to 250 nm on the surface opposite to the substrate 1.
- the antireflection layer 2 includes particles 3 having an average primary particle size of 150 nm to 250 nm and a resin 4.
- it may have another layer between a base material and an antireflection layer, and it is preferable to have a hard-coat layer.
- the materials for the base material, the antireflection layer, and the hard coat layer in the antireflection film are the same as those described in the production method of the antireflection film of the present invention.
- the concave / convex shape of the antireflection layer of the antireflection film is such that B / A, which is the ratio of the distance A between the apexes of adjacent convex portions and the distance B between the centers of the adjacent convex portions and the concave portions, is 0. It is preferably 5 or more, more preferably 0.6 or more, and even more preferably 0.7 or more.
- B / A is 0.5 or more, the depth of the concave portion increases with respect to the distance between the convex portions, and a refractive index gradient layer in which the refractive index changes more gradually from the air to the inside of the antireflection layer is formed. Therefore, the reflectance can be further reduced.
- the volume ratio of the resin to the particles in the antireflection layer after curing can be controlled by the volume ratio of the resin to the particles in the antireflection layer after curing. Therefore, it is important to appropriately design the compounding ratio of the resin and particles.
- the volume ratio of the resin and the particles in the antireflection layer is different from the blending ratio in the composition for forming the antireflection layer because the resin penetrates into the base material or volatilizes in the process of producing the moth-eye structure. In some cases, it is also important to set the matching with the base material appropriately.
- the particles forming the convex portions are uniformly spread with an appropriate filling rate. From the above viewpoint, it is preferable that the content of the particles forming the convex portion is adjusted so as to be uniform throughout the antireflection layer.
- the filling factor can be measured as the area occupancy (particle occupancy) of the particles located on the most surface side when observing particles that form convex portions from the surface by SEM or the like, and is 25% to 84%. 25 to 70% is preferable, and 30 to 65% is more preferable.
- the antireflection layer of the present invention it is reflected that a plurality of particles (d) do not exist in a direction perpendicular to the surface of the substrate (that is, particles (d) that overlap each other in a direction orthogonal to the surface of the substrate do not exist).
- the rate and haze are low and preferable.
- the manufacturing method of the antireflection film of the present invention is not particularly limited, the manufacturing method of the antireflection film of the embodiment in which the antireflection layer contains the above-described particles (d), On the substrate A composition containing a slip agent (a), a curable compound (b), a photopolymerization initiator (c), particles (d), and a solvent is applied, the solvent is volatilized, and the portion where particles (d) are not present
- step (1) As shown in FIG. 1 (1), a slip agent (a), a curable compound (b), a photopolymerization initiator (c), A fine particle (d) having an average primary particle size of 250 nm or less (reference numeral 3 in FIG. 1) and a composition containing a solvent are applied, the solvent is volatilized, and the thickness of the portion where the particle (d) does not exist is the particle.
- This is a step of providing a layer (A) (reference numeral 4 in FIG. 1) having a thickness of 0.8 times or more the average primary particle size of (d).
- slip agent (a), curable compound (b), photopolymerization initiator (c), and particles (d) used in the above step (1) are as described above.
- a solvent having a polarity close to that of the particles (d) is preferably selected from the viewpoint of improving dispersibility.
- an alcohol solvent is preferable, and examples thereof include methanol, ethanol, 2-propanol, 1-propanol, and butanol.
- solvents such as ketones, esters, carbonates, alkanes, and aromatics are preferable, and methyl ethyl ketone (MEK), carbonic acid Examples include dimethyl, methyl acetate, acetone, methylene chloride, and cyclohexanone. These solvents may be used in a mixture of a plurality of types as long as the dispersibility is not significantly deteriorated.
- the composition (antireflection layer forming composition) used in the step (1) is composed of components other than the slip agent (a), the curable compound (b), the photopolymerization initiator (c), the particles (d), and the solvent.
- it may contain a dispersing agent, leveling agent, antifouling agent and the like of the particles (d).
- the coating method of the composition on the substrate is not particularly limited, and a known method can be used. Examples include dip coating, air knife coating, curtain coating, roller coating, wire bar coating, gravure coating, and die coating.
- the content of particles (d) in the layer (A) in step (1) is preferably 0.10 ⁇ 0.30g / m 2, more preferably 0.14 ⁇ 0.24g / m 2, 0.16 More preferably, it is ⁇ 0.20 g / m 2 . 0.10 g / m 2 or more in the more easily improved antireflection properties since it protrusions numerous forms of moth-eye structure as long, if it is 0.30 g / m 2 or less, hardly occurs agglomeration in the liquid, moth Easy to form structure.
- the dispersant for the particles (d) can facilitate the uniform arrangement of the particles (d) by reducing the cohesive force between the particles.
- the dispersant is not particularly limited, but anionic compounds such as sulfates and phosphates, cationic compounds such as aliphatic amine salts and quaternary ammonium salts, nonionic compounds, and polymer compounds are preferred, and adsorbing groups And a steric repulsion group are more preferred because they have a high degree of freedom in selection.
- a commercial item can also be used as a dispersing agent.
- BYK Japan made of (stock) DISPERBYK160, DISPERBYK161, DISPERBYK162, DISPERBYK163, DISPERBYK164, DISPERBYK166, DISPERBYK167, DISPERBYK171, DISPERBYK180, DISPERBYK182, DISPERBYK2000, DISPERBYK2001, DISPERBYK2164, Bykumen, BYK-2009, BYK-P104, BYK-P104S, BYK-220S, Anti-Terra 203, Anti-Terra 204, Anti-Terra 205 (trade name) and the like.
- a functional layer may be provided on the substrate before the step (1).
- the functional layer is provided on the base material, the laminate of the functional layer and the base material is referred to as “base material”.
- base material the laminate of the functional layer and the base material.
- the functional layer is provided on the surface on which the base layer (A) is to be provided, in the step (1), the layer (A) is provided on the functional layer, and the subsequent steps are performed.
- the functional layer is preferably a hard coat layer.
- the substrate is preferably a substrate having a hard coat layer (also referred to as “substrate with a hard coat layer”), and the composition in the step (1) is applied onto the hard coat layer. It is preferable.
- the solvent is volatilized from the composition for forming an antireflective layer applied on the base material, and the thickness of the portion where the particles (d) are not present is set to 0. 0 of the average primary particle size of the particles (d).
- It is a layer having a thickness of 8 times or more, and contains a slipping agent (a), a curable compound (b), a photopolymerization initiator (c), and particles (d).
- the layer (A) is a layer that later becomes an antireflection layer by the production method of the present invention.
- the curable compound (b) contained in the layer (A) becomes a resin by being cured. This resin forms concave and convex portions of the antireflection layer.
- the particles (d) contained in the layer (A) protrude from the surface of the film made of a resin to form a concavo-convex convex portion.
- the slip agent (a) since the slip agent (a) also has a cross-linking group, the slip agent (a) is cured with each other or with the curable compound (b) to become a cured product, which is present in the recess. As described above, this cured product is preferably present in the film covering the surfaces of the particles (d) forming the convex portions.
- the layer (A) Since part of the layer (A) is cured in the step (2), the components contained before and after curing are different, but in the present invention, the layer (A) is referred to as the layer (A) for convenience. To do.
- the layer (A) is also referred to before and after the steps (3) and (4).
- step (1) it is preferable that a plurality of particles (d) do not exist in a direction perpendicular to the surface of the substrate in the applied layer (A).
- the fact that a plurality of particles (d) do not exist in the direction orthogonal to the surface of the base material means that when the 10 ⁇ m ⁇ 10 ⁇ m in the surface of the base material is observed with three fields of view with a scanning electron microscope (SEM),
- SEM scanning electron microscope
- the ratio of the number of particles (d) that do not exist in multiple layers in the direction perpendicular to each other (exists alone) represents 80% or more, and preferably 95% or more.
- the film thickness of the part where the particles (d) are not present in the layer (A) is 0.8 times or more, preferably 0.8 times or more of the average primary particle diameter of the particles (d). 2.0 times or less, more preferably 0.9 times or more and 1.5 times or less, and particularly preferably 1.0 times or more and 1.2 times or less.
- Step (2) In the step (2), as shown in FIG. 1 (2), a part of the curable compound (b) in the layer (A) 4 of the step (1) is cured, and the cured compound (bc) It is a process to obtain.
- the slip agent (a) may be cured or may not be cured.
- the compound (bc) may include a material obtained by curing the slip agent (a) and the curable compound (b).
- the particles (d) 3 can be made difficult to move and aggregation of the particles (d) can be suppressed.
- Curing a part of the curable compound (b) represents curing only a part of the curable compound (b), not all.
- the uncured curable compound (b) can be infiltrated into the substrate by heating in the step (3) described later,
- the thickness of the portion of the layer (A) where the particles (d) are not present can be reduced, and the particles (d) can be protruded to form a favorable concavo-convex shape (moth eye structure).
- the curable compound (b) is a photocurable compound, and it is preferable to cure a part of the curable compound (b) by irradiating light (preferably ultraviolet rays) in the step (2).
- a composition obtained by removing the particles (d) from the composition for forming an antireflection layer is applied on the substrate in a thickness of 2 ⁇ m.
- the curing rate is preferably 2 to 20%, more preferably the curing rate is 3 to 15%, and the curing rate is 5 to 10%. More preferably, the conditions are satisfied.
- the curing rate is ⁇ (1 ⁇ number of remaining polymerizable functional groups after curing) / number of polymerizable functional groups before curing ⁇ ⁇ 100% And is measured by the following method.
- the polymerizable functional group is a group having a polymerizable carbon-carbon unsaturated double bond.
- the curable compound itself before curing was subjected to KBr-IR measurement using NICOLET6700 FT-IR of Thermo electron corporation, and the peak (1660-1800 cm ⁇ 1 ) area of the carbonyl group and polymerizable carbon— Obtain the peak height (808 cm ⁇ 1 ) of the carbon unsaturated double bond, and similarly obtain the peak of the polymerizable carbon-carbon unsaturated double bond relative to the carbonyl group peak area from the IR measurement of the single reflection after curing.
- the curing rate was calculated by comparing before and after UV irradiation. When calculating hardening rate here is normalized measurement depth at 808cm -1 821nm, a depth of 1660-1800Cm -1 as 384 nm.
- step (2) it is preferable to irradiate ultraviolet rays at a dose of 1 to 90 mJ / cm 2 , more preferably at a dose of 1.2 to 40 mJ / cm 2 , and more preferably 1.5 to 10 mJ / cm 2. It is more preferable to irradiate with a dose of 2 .
- step (2) it is preferable to cure a part of the curable compound (b) by irradiating ultraviolet rays from the side opposite to the side having the base layer (A).
- a part of the curable compound (b) by irradiating ultraviolet rays from the side opposite to the side having the base layer (A).
- Step (2) is preferably performed in an environment in which the oxygen concentration is 0.1 to 5.0% by volume, and more preferably in an environment in which the oxygen concentration is 0.5 to 1.0% by volume. .
- region by the side of the base material of a layer (A) can be hardened especially.
- the compound (bc) is a cured product of the curable compound (b).
- the molecular weight of the compound (bc) is not particularly limited.
- the compound (bc) may have an unreacted polymerizable functional group.
- Step (3) In the step (3), as shown in FIG. 1 (3), a part of the compound selected from the group consisting of the curable compound (b) and the compound (bc) in the layer (A) 4 is heated. This is a step of forming a concavo-convex shape made of particles (d) 3 on the surface of the layer (A) opposite to the base material by allowing the base material to penetrate or volatilize.
- the curable compound (b) which permeates or volatilizes the substrate by heating is the curable compound (b) which has not been cured in the step (2).
- the slip agent (a) does not penetrate into the base material and does not volatilize.
- the temperature in the heating is preferably lower than the glass transition temperature of the substrate, specifically 60 to 150 ° C., more preferably 80 to 120 ° C.
- the curable compound (b) has a boiling point at 1 atm.
- the thing of 150 degrees C or less is preferable, and a molecular weight is 300 or less.
- Bremer GMR is preferred. 1 atm is 101325 Pa.
- step (3) a part of the compound selected from the group consisting of the curable compound (b) and the compound (bc) in the layer (A) is allowed to penetrate into the substrate by heating or volatilized. An uneven shape is formed on the surface of the layer (A).
- the concave / convex convex portions are particles (d), and the concave portions are compounds selected from the group consisting of the slip agent (a), the curable compound (b), and the compound (bc) remaining in the layer (A). is there.
- Step (4) is selected from the group consisting of the slip agent (a), the curable compound (b) and the compound (bc) remaining in the layer (A) as shown in FIG. 1 (4).
- This is a step of curing the compound.
- the curing in the step (4) is preferably photocuring, and more preferably by ultraviolet irradiation.
- the amount of ultraviolet irradiation is preferably 300 mJ / cm 2 or more, and it is preferably cured in an environment having an oxygen concentration of 0.01% by volume or less.
- a resin selected from the group consisting of the slip agent (a), the curable compound (b) and the compound (bc) remaining in the layer (A) is cured to form a resin.
- a reflection preventing layer having a moth-eye structure having a concave-convex shape and a particle (d) 3 protruding from the resin as a convex portion is formed.
- the average surface roughness Ra is preferably 15 nm or more, more preferably 30 nm or more, and most preferably 40 nm or more.
- Step (E1) and Step (E2) In the present invention, between step (1) and step (2), between step (2) and step (3), or between step (3) and step (4), A step (E1) of providing a layer (E) containing a compound (e) that is incompatible with the curable compound (b) on a surface opposite to the substrate side of the layer (A), It is preferable to have a step (E2) of removing the layer (E) after the step (2), the step (3) or the step (4) performed subsequent to the step (E1). It is preferable to have a process (E1) between a process (1) to a process (3), and it is more preferable to have between a process (2) and a process (3). It is preferable to have a process (E2) after a process (4).
- the layer (E) contains a compound (e) that is incompatible with the curable compound (b) (hereinafter also simply referred to as “compound (e)”).
- the layer (E) is preferably provided in order to prevent the particles (d) in the layer (A) from aggregating, and is preferably removed finally.
- the incompatibility of the compound (e) with the curable compound (b) means that an insoluble matter remains when the compound (e) is mixed with 5% by mass with respect to the curable compound (b) at 25 ° C. and stirred. It is.
- the compound (e) is preferably a compound that is not cured by heat.
- the compound (e) is a compound that is not cured by heat, because a moth-eye structure is easily formed by the particles (d) even if a heating process is included before the removal of the compound (e) in the production method of the present invention. .
- the boiling point of the compound (e) contained in a layer (E) is more than the heating temperature in a process (3).
- the layer (E) is preferably a liquid oily component at 50 ° C., and it is a silicone oily component, hydrocarbon oily component, ester oily component, natural animal and vegetable oils and fats More preferably, they are semi-synthetic fats and oils, higher fatty acids, higher alcohols, or fluorine-based oil components.
- the silicone-based oil component may be solid, semi-solid, or liquid.
- silicone-based oil component for example, silicone oil, silicone-based surfactant, silicone resin, silicone wax, and silicone-based gelling agent can be used.
- silicone oil examples include dimethylpolysiloxane (for example, KF96 series manufactured by Shin-Etsu Chemical Co., Ltd.), tristrimethylsiloxymethylsilane, caprylylmethicone, phenyltrimethicone, tetrakistrimethylsiloxysilane, methylphenylpolysiloxane, methylhexylpolysiloxane, Low or high viscosity linear or branched organopolysiloxanes such as methylhydrogenpolysiloxane, dimethylsiloxane / methylphenylsiloxane copolymer, etc .; octamethylcyclotetrasiloxane, decamethylcyclopentasiloxane, dodecamethylcyclohexasiloxane , Cyclic organopolysiloxanes such as tetramethyltetrahydrogencyclotetrasiloxane and t
- silicone surfactants include linear or branched polyoxyethylene-modified organopolysiloxanes, linear or branched polyoxyethylene polyoxypropylene-modified organopolysiloxanes, linear or branched polyoxyethylene / alkyl copolymers.
- Modified organopolysiloxane linear or branched polyoxyethylene polyoxypropylene / alkyl co-modified organopolysiloxane, linear or branched polyglycerin-modified organopolysiloxane, linear or branched polyglycerin / alkyl co-modified organopolysiloxane (Specific examples include Shin-Etsu Chemical silicone emulsifiers: KF-6011, 6043, 6028, 6038, 6100, 6104, 6105, etc.).
- polyoxyethylene-modified partially cross-linked organopolysiloxane, polyglycerin-modified partially cross-linked porganopolysiloxane and the like coexist with other oil components (for example, Shin-Etsu Chemical Co., Ltd .: KSG series; 310, 320, 330, 340, 320Z, 350Z, 810, 820, 830, 840, 820Z, 850Z, etc.).
- silicone resin examples include acrylic silicone resins composed of acrylic / silicone graft copolymers, acrylic / silicone block copolymers, and the like (specific examples include: Shin-Etsu Chemical Co., Ltd .: acrylic / silicone graft copolymers). Cyclic organopolysiloxane solution: KP-545 and the like).
- An acrylic silicone resin containing in the molecule at least one selected from a pyrrolidone moiety, a long-chain alkyl moiety, a polyoxyalkylene moiety and a fluoroalkyl moiety, and an anion moiety such as carboxylic acid can also be used.
- this silicone resin includes a resin composed of R 8 3 SiO 0.5 unit and SiO 2 unit, a resin composed of R 8 3 SiO 0.5 unit, R 8 2 SiO unit and SiO 2 unit, R 8 3 SiO Resin composed of 0.5 unit and R 8 SiO 1.5 unit, Resin composed of R 8 3 SiO 0.5 unit, R 8 2 SiO unit and R 8 SiO 1.5 unit, and R 8 3 SiO 0.5 unit, R A silicone network compound composed of at least one resin composed of 8 2 SiO units, R 8 SiO 1.5 units and SiO 2 units is preferred.
- R 8 in the formula is a substituted or unsubstituted monovalent hydrocarbon group having 1 to 30 carbon atoms.
- the silicone network compound which contains in a molecule
- silicone wax examples include an acrylic silicone wax made of an acrylic / silicone graft copolymer, an acrylic / silicone block copolymer, and the like (specific examples include: Shin-Etsu Chemical Co., Ltd .: acrylic / silicone graft copolymer). Cyclic organopolysiloxane solutions: KP-561P, 562P, etc.).
- an acrylic silicone wax containing in the molecule at least one selected from a pyrrolidone moiety, a long-chain alkyl moiety, a polyoxyalkylene moiety and a fluoroalkyl moiety, and an anionic moiety such as a carboxylic acid can also be used.
- the silicone wax is preferably a polylactone-modified polysiloxane bonded with a polylactone that is a ring-opening polymer of a lactone compound having a 5-membered ring or more. Further, this silicone wax is obtained by addition-reacting an olefin wax having an unsaturated group consisting of an ⁇ -olefin and a diene and an organohydrogenpolysiloxane having one or more SiH bonds in one molecule. Olefin wax.
- the ⁇ -olefin is preferably an ⁇ -olefin having 2 to 12 carbon atoms such as ethylene, propylene, 1-butene, 1-hexene, 4-methyl 1-pentene, and the diene is butadiene, isoprene, 1, 4 -Hexadiene, vinyl norbornene, ethylidene norbornene, dicyclopentadiene and the like are preferred.
- the organohydrogenpolysiloxane having a SiH bond a linear structure, a siloxane branched structure, or the like can be used.
- silicone-based gelling agent examples include non-modified or modified parts such as non-modified partially cross-linked organopolysiloxane, alkyl-modified partially cross-linked origano polysiloxane, and silicone branched alkyl-modified partially cross-linked origano polysiloxane.
- examples thereof include gel mixtures containing gelling components such as crosslinked origanopolysiloxane and various oil components such as cyclopentasiloxane, dimethicone, mineral oil, isododecane, trioctanoin, and squalane.
- the gel mixture contains the gelling component and the oil component in a coexisting state.
- examples of the gel mixture include KSG series (trade name) manufactured by Shin-Etsu Chemical Co., Ltd., and in particular, KSG-15, 16, 41, 42, 43, 44, 042Z, and 045Z (all trade names).
- Hydrocarbon oil components include liquid paraffin, light liquid isoparaffin, heavy liquid isoparaffin, petrolatum, n-paraffin, isoparaffin, isododecane, isohexadecane, polyisobutylene, hydrogenated polyisobutylene, polybutene, ozokerite, ceresin, microcrystalline wax , Paraffin wax, polyethylene wax, polyethylene / polypropylene wax, squalane, squalene, pristane, polyisoprene, wax and the like.
- Ester oil components include hexyldecyl octoate, cetyl octanoate, isopropyl myristate, isopropyl palmitate, butyl stearate, hexyl laurate, myristyl myristate, oleyl oleate, decyl oleate, octyldodecyl myristate, dimethyl Hexyldecyl octoate, cetyl lactate, myristyl lactate, diethyl phthalate, dibutyl phthalate, lanolin acetate, ethylene glycol monostearate, propylene glycol monostearate, propylene glycol dioleate, glyceryl monostearate, glyceryl monooleate, tri Glyceryl 2-ethylhexanoate, trimethylolpropane tri-2-ethylhexan
- Natural animal and vegetable oils and semi-synthetic oils include avocado oil, linseed oil, almond oil, ibotarou, eno oil, olive oil, cacao oil, kapok wax, kayak oil, carnauba wax, liver oil, candelilla wax, beef fat, cow leg fat, cow Bone fat, hydrogenated beef tallow, kyounin oil, whale wax, hydrogenated oil, wheat germ oil, sesame oil, rice germ oil, rice bran oil, sugarcane wax, sasanqua oil, safflower oil, shea butter, cinnamon oil, cinnamon oil, jojoballow, Olive squalane, shellac wax, turtle oil, soybean oil, tea seed oil, camellia oil, evening primrose oil, corn oil, pork fat, rapeseed oil, Japanese kiri oil, nukarou, germ oil, horse fat, persic oil, palm oil, palm kernel Oil, castor oil, hydrogenated castor oil
- Higher fatty acid examples include lauric acid, myristic acid, palmitic acid, stearic acid, behenic acid, undecylenic acid, oleic acid, linoleic acid, linolenic acid, arachidonic acid, eicosapentaenoic acid (EPA), docosahexaenoic acid (DHA), Examples include isostearic acid and 12-hydroxystearic acid.
- ⁇ Higher alcohol examples include lauryl alcohol, myristyl alcohol, palmityl alcohol, stearyl alcohol, behenyl alcohol, hexadecyl alcohol, oleyl alcohol, isostearyl alcohol, hexyl decanol, octyldodecanol, cetostearyl alcohol, 2-decyltetradecyl Nord, cholesterol, sitosterol, phytosterol, lanosterol, POE cholesterol ether, monostearyl glycerin ether (batyl alcohol), monooleyl glyceryl ether (ceralkyl alcohol) and the like.
- fluorinated oily component examples include perfluoropolyether, perfluorodecalin, perfluorooctane and the like.
- the compound (e) is preferably liquid at 50 ° C., and more preferably liquid at 25 ° C. Moreover, it is preferable that at least 1 type of a compound (e) has a boiling point of 110 degreeC or more. If the boiling point is 110 ° C. or higher, it is difficult to volatilize at room temperature, and it can be allowed to exist as a layer (E) until the curing of the layer (A) is completed.
- kinematic viscosity at 25 ° C. of compounds having a boiling point of 110 ° C. or higher from the viewpoint (e) is 0.1mm 2 / s ⁇ 100000mm 2 / s, 0.1mm 2 / s ⁇ 10000mm 2 / s is more preferable, and most preferably 0.1 mm 2 / s to 100 mm 2 / s.
- Compound (e) may be used alone or in combination of two or more.
- the content of the compound (e) in the layer (E) is preferably 50 to 100% by mass, more preferably 70 to 100% by mass, and further preferably 90 to 100% by mass with respect to the total mass of the layer (E).
- the method for removing the layer (E) is not particularly limited.
- the method of volatilizing the compound (e) by heating at a temperature higher than the boiling point of (), the method of dissolving the compound (e) with an alkaline solution, and the like are preferable.
- the solvent for dissolving the compound (e) without dissolving the substrate and the cured layer (A) is not particularly limited, but when the substrate is triacetylcellulose, methanol, ethanol, 2-propanol, 1 -Alcohol solvents such as propanol, n-butanol, isobutanol, diacetone alcohol, methoxypropanol, ketone solvents such as methyl isobutyl ketone and methyl butyl ketone, aromatic solvents such as toluene and xylene, cyclohexane, propylene glycol monomethyl Ether acetate and the like are preferable. A plurality of these solvents may be mixed and used.
- the heating temperature for volatilizing the compound (e) is preferably a temperature lower than the glass transition temperature of the base material and higher than the boiling point of the compound (e), specifically 60 to 180 ° C. It is preferably 80 to 130 ° C.
- an aqueous solution of sodium hydroxide or potassium hydroxide As the solution in the case of dissolving with an alkaline solution, it is preferable to use an aqueous solution of sodium hydroxide or potassium hydroxide.
- the laminated body which consists of a base material and another layer is called a base material.
- Examples of other layers include various functional layers, and a hard coat layer is particularly preferable.
- the hard coat layer is preferably formed by a crosslinking reaction or a polymerization reaction of a curable compound.
- the hard coat layer is formed by applying a composition for forming a hard coat layer containing a polyfunctional monomer and / or a polyfunctional oligomer on a substrate, and causing the polyfunctional monomer or polyfunctional oligomer to undergo a crosslinking reaction or a polymerization reaction. It is preferable to form by.
- the functional group (polymerizable group) of the polyfunctional monomer or polyfunctional oligomer is preferably a light, electron beam, or radiation polymerizable group, and among them, a light (preferably ultraviolet) polymerizable functional group is preferable.
- Examples of the photopolymerizable functional group include unsaturated polymerizable functional groups such as a (meth) acryloyl group, a vinyl group, a styryl group, and an allyl group. Among them, a (meth) acryloyl group is preferable.
- JP-A No. 2014-240956 the description in [0021] to [0027] of JP-A No. 2014-240956 can also be referred to in the present invention.
- the film thickness of the hard coat layer is usually about 0.6 ⁇ m to 50 ⁇ m, preferably 5 ⁇ m to 20 ⁇ m, from the viewpoint of imparting sufficient durability and impact resistance to the film.
- the strength of the hard coat layer is preferably H or higher, more preferably 2H or higher, in a pencil hardness test.
- the plastic substrate such as a cellulose acylate substrate or an acrylic substrate
- the plastic substrate can be further prevented from being damaged.
- the curable compound of the hard coat layer is not cured.
- a part of the compound selected from the group consisting of the curable compound (b) and the compound (bc) in the layer (A) can easily penetrate into the hard coat layer.
- the curable compound contained in the hard coat layer forming composition and the antireflection layer forming composition is a photocurable compound.
- hardenable compound (b) of a layer (A) shall osmose
- the hard coat layer is formed by curing a composition for a hard coat layer containing a curable compound, and the amount of increase in the curing rate due to curing in the step (2) is preferably less than 5%, more preferably less than 3%. And less than 1.5% is most preferred.
- the antireflection layer is provided on the substrate with the hard coat layer, the following modes 1 to 4 are preferable.
- a hard coat layer is formed on the substrate.
- a forming composition is applied, ultraviolet rays are irradiated with a relatively weak exposure amount, a part of the radical photopolymerization initiator A is cleaved to generate radicals, and a part is not cleaved. At this time, a part of the curable compound of the hard coat layer is cured.
- the antireflection layer-forming composition is applied onto the hard coat layer, and a part of the curable compound (b) is cured in the step (2). Thereafter, a part of the uncured curable compound (b) is penetrated into the hard coat layer in the step (3), and the ultraviolet ray is irradiated in the step (4), whereby the curable compound and the uncured curable property of the hard coat layer are irradiated. Compound (b) is cured.
- the composition for forming a hard coat layer contains a photo radical polymerization initiator A and a heat radical polymerization initiator for generating radicals by heat, and the composition for forming an antireflection layer contains a photo radical polymerization initiator A
- the hard coat layer-forming composition is applied onto a substrate, irradiated with ultraviolet rays at a relatively strong exposure amount, and radicals are generated by cleaving almost all of the radical photopolymerization initiator A.
- a part of the curable compound of the hard coat layer is cured.
- the antireflection layer-forming composition is applied onto the hard coat layer, and a part of the curable compound (b) is cured in the step (2).
- the thermal polymerization initiator in a hard-coat layer is cleaved, a radical is generated, and a curable compound is hardened.
- the temperature for generating radicals from the thermal radical polymerization initiator is preferably higher than the penetration temperature in step (3), for example, preferably 100 to 180 ° C.
- the thermal radical polymerization initiator VF-096, VAm-11 (above, manufactured by Wako Pure Chemical Industries, Ltd.) or the like can be preferably used.
- the composition for forming a hard coat layer contains a radical photopolymerization initiator A that generates radicals by irradiating ultraviolet rays using a lamp A, and the composition for forming an antireflection layer contains a radical photopolymerization initiator A
- a composition for forming a hard coat layer is applied on a substrate, and the lamp A is used. Ultraviolet rays are irradiated with a relatively weak exposure amount, and a part of the photo radical polymerization initiator A is consumed and a part is left. At this time, a part of the curable compound of the hard coat layer is cured.
- a composition for forming an antireflection layer is applied on the hard coat layer, and a part of the curable compound (b) is cured by irradiating with ultraviolet rays using the lamp B in the step (2). Thereafter, a part of the uncured curable compound (b) is penetrated into the hard coat layer in the step (3), and the ultraviolet ray is irradiated using the lamp A in the step (4).
- the uncured curable compound (b) is cured.
- Examples of the combination of the lamp A and the radical photopolymerization initiator A include a high-pressure mercury lamp having a specific wavelength spectrum, Irgacure 907, and Irgacure 369.
- Examples of the combination of the lamp B and the radical photopolymerization initiator B include a metal halide lamp having a relatively broad wavelength spectrum, Irgacure 127, Irgacure 184, and the like. It is also preferable to shift the cleavage wavelength of the initiator using UV-LED light having a relatively long wavelength.
- the composition for forming a hard coat layer is applied on the top, and a little heat is applied to consume a part of the thermal radical polymerization initiator and leave a part.
- a part of the curable compound of the hard coat layer is cured.
- a composition for forming an antireflection layer is applied onto the hard coat layer, and ultraviolet rays are irradiated in step (2) to cure a part of the curable compound (b).
- a part of the uncured curable compound (b) is penetrated into the hard coat layer in the step (3), and ultraviolet rays are irradiated in the step (4) to cure the uncured curable compound (b). And after that, it heats, a radical is generated with the thermal radical polymerization initiator in a hard-coat layer, and a curable compound is hardened.
- the temperature for generating radicals from the thermal radical polymerization initiator is preferably higher than the penetration temperature in step (3), for example, preferably 100 to 180 ° C.
- the antireflection film produced by the production method of the present invention can be suitably used as a polarizing plate protective film.
- a polarizing plate protective film using the antireflection film produced by the production method of the present invention can be bonded to a polarizer to form a polarizing plate, and can be suitably used for a liquid crystal display device or the like.
- the acetyl substitution degree of cellulose acylate was measured by the following method. The degree of acetyl substitution was measured according to ASTM D-817-91.
- Cellulose acylate (acetyl substitution degree 2.86) 100 parts by mass • Sugar ester compound of formula (I) 3 parts by mass • Sugar ester compound of formula (II) 1 part by mass • Silica Particle dispersion (average particle size 16 nm) “AEROSIL R972”, manufactured by Nippon Aerosil Co., Ltd. 0.026 parts by mass • Methylene chloride 377 parts by mass • Methanol 61 parts by mass • Butanol 2.6 parts by mass
- Composition of cellulose acylate solution for drum layer • Cellulose acylate (acetyl substitution degree 2.86) 100 parts by mass • Sugar ester compound of formula (I) 3 parts by mass • Sugar ester compound of formula (II) 1 part by mass • Silica Particle dispersion (average particle size 16 nm) “AEROSIL R972” manufactured by Nippon Aerosil Co., Ltd. 0.091 parts by mass • Methylene chloride 339 parts by mass • Methanol 74 parts by mass • Butanol 3 parts by mass
- Composition of cellulose acylate solution for core layer • Cellulose acylate (acetyl substitution degree 2.86) 100 parts by mass • Sugar ester compound of formula (I) 8.3 parts by mass • Sugar ester compound of formula (II) 2.8 Part by mass-266 parts by mass of methylene chloride-58 parts by mass of methanol-2.6 parts by mass of butanol
- the cellulose acylate web held by the pin tenter was conveyed to the drying zone.
- a drying air of 45 ° C. was blown and then dried at 110 ° C. for 5 minutes.
- the cellulose acylate web was conveyed while stretching in the width direction at a magnification of 10%.
- the portion held by the pin tenter was continuously cut out, and irregularities with a width of 15 mm and a height of 10 ⁇ m were formed at both ends in the width direction of the web.
- the width of the web at this time was 1610 mm.
- the film was dried at 140 ° C. for 10 minutes while applying a tension of 130 N in the conveying direction.
- the width direction edge part was continuously cut out so that a web might become desired width
- FUJITAC TG60UL is a cellulose acylate film manufactured by FUJIFILM Corporation.
- the base material with a hard coat layer used for the sample 102 was prepared by applying a hard coat layer C forming coating solution having the following composition on the base material 1 and adjusting the oxygen concentration to 1.0 volume% by nitrogen purge.
- the hard coat layer C having a film thickness of 8 ⁇ m was formed by curing by irradiating with an ultraviolet ray having an irradiation amount of 1000 mJ / cm 2 with an air-cooled metal halide lamp.
- composition of coating liquid for forming hard coat layer A UNIDIC 17-806 55.8 parts by weight Irgacure 127 1.9 parts by weight Methyl ethyl ketone 24.5 parts by weight Methyl isobutyl ketone 8.9 parts by weight Methyl acetate 8.9 parts by weight
- composition of coating liquid for forming hard coat layer B UNIDIC 17-806 55.8 parts by mass Irgacure 127 1.9 parts by mass Methyl ethyl ketone 24.5 parts by mass Methyl acetate 17.8 parts by mass
- composition of coating liquid for forming hard coat layer C PET-30 33.4 parts by weight VF-096 1.4 parts by weight Irgacure 127 0.2 parts by weight Methyl ethyl ketone 35.8 parts by weight Methyl acetate 29.3 parts by weight
- UNIDIC 17-806 Urethane acrylate (manufactured by DIC Corporation, solid content 80% solution) PET-30: A mixture of 60% pentaerythritol triacrylate and 40% pentaerythritol tetraacrylate (KAYARAD PET-30 (manufactured by Nippon Kayaku Co., Ltd.)) Irgacure 127: Photopolymerization initiator (manufactured by BASF Japan) VF-096: 2,2′-azobis [N- (2-propenyl) -2-methylpropionamide]: thermal polymerization initiator
- composition of coating solution for forming antireflection layer Aa1 Sirius-501 2.5 parts by weight Compound B 3.9 parts by weight KBM-4803 4.5 parts by weight Ethanol 15.3 parts by weight Methyl ethyl ketone 32.2 parts by weight Acetone 15.3 parts by weight Irgacure 127 0.4 parts by weight Silica particles Dispersion ⁇ 25.9 parts by mass Compound D 0.08 parts by mass
- Compound D in the coating solution for forming the antireflection layer Ab1 is a fluorine-containing polymer and is a slip agent (a), Sirius-501, Compound B, and KBM-4803 are curable compounds (b), and Irgacure 127 is a photopolymerization initiator (c), the silica particles in the silica particle dispersion ⁇ are particles (d), and ethanol, methyl ethyl ketone, and acetone are solvents.
- the fluorinated polymer compound D as the slipping agent (a) and the slipping agent (a) and curing described in Table 1 instead of the curable compound (b)
- a coating solution for forming the antireflection layers Aa2, Aa4, Aa5 was prepared using the organic compound (b).
- the coating solution for forming the antireflection layer Aa3 was prepared in the same manner as Aa4, except that U-15HA was used as the curable compound (b) instead of Sirus-501 and KBM-4803.
- composition of coating solution for forming antireflection layer Ab1 Sirius-501 2.5 parts by weight Compound B 3.9 parts by weight KBM-4803 4.5 parts by weight Ethanol 15.3 parts by weight Methyl ethyl ketone 32.2 parts by weight Acetone 15.3 parts by weight Irgacure 127 0.4 parts by weight Silica particles Dispersion ⁇ 25.9 parts by mass P-10 0.08 parts by mass
- composition of coating solution for forming antireflection layer Ac1 Sirius-501 2.5 parts by weight Compound B 3.9 parts by weight KBM-4803 4.5 parts by weight Ethanol 15.3 parts by weight Methyl ethyl ketone 32.2 parts by weight Acetone 15.3 parts by weight Irgacure 127 0.4 parts by weight Silica particles Dispersion ⁇ 25.9 parts by mass Compound S-1 0.12 parts by mass
- Compound B Acrylic group-containing trimethoxysilane represented by the following formula (10) (manufactured by Shin-Etsu Chemical Co., Ltd.) Formula (10)
- Compound C A methyl ethyl ketone (MEK) solution of a fluorine-containing polymer SP-13 (weight average molecular weight 19000) having the following structure and having a solid content concentration of 40% by mass
- Compound D MEK solution having a solid content concentration of 40% by mass of a fluorine-containing polymer having a structure represented by the following formula (12) (weight average molecular weight 11000) Formula (12)
- Compound E MEK solution having a solid content concentration of 40% by mass of a fluorine-containing polymer having a structure represented by the following formula (13) (weight average molecular weight: 17000) Formula (13)
- Compound F MEK solution having a solid content concentration of 40% by mass of a fluorine-containing polymer having a structure represented by the following formula (14) (weight average molecular weight 11000) Formula (14)
- a silicone polymer (P-11) having the following structure was synthesized by the same method as described above.
- Silicone polymers (P-13) and (P-14) were synthesized by the same method as above.
- Compounds (S-1) to (S-8) are compounds described as specific examples of the general formulas (4) to (7).
- n is 10
- R 51 is —CONH (CH 2 ) 3 —
- R 52 is —CH 3 .
- n 10
- R 61 and R 62 are —CONH (CH 2 ) 3 —.
- n 10
- R 71 and R 72 are —CONH (CH 2 ) 3 —.
- Silica particle dispersions ⁇ , ⁇ , and ⁇ were prepared by the following methods.
- KE-P20 was fired at 1050 ° C. for 1 hour using an electric furnace, cooled, and then pulverized using a pulverizer. 5 kg of the calcined KE-P20 was charged into a 20 L Henschel mixer (FM20J type, manufactured by Mitsui Mining Co., Ltd.) equipped with a heating jacket. While the calcined KE-P20 was being stirred, a solution prepared by dissolving 45 g of 3-acryloxypropyltrimethoxysilane (KBM5103 manufactured by Shin-Etsu Chemical Co., Ltd.) in 90 g of methyl alcohol was added dropwise and mixed.
- KBM5103 3-acryloxypropyltrimethoxysilane manufactured by Shin-Etsu Chemical Co., Ltd.
- the temperature is raised to 150 ° C. over about 1 hour with mixing and stirring, and the heat treatment is performed by holding at 150 ° C. for 12 hours while constantly rotating the scraping device in the direction opposite to the stirring blade.
- the wall surface was scraped off.
- the wall deposits were also scraped off using a spatula as appropriate.
- the mixture was cooled, and pulverized and classified using a jet pulverizer to obtain particles surface-treated with a silane coupling agent. An acryloyl group is added to the surface of the particle.
- silica particle dispersion ⁇ 80 parts by mass of MEK and 20 parts by mass of the above silica particles are put into a mixing tank, and after stirring for 10 minutes, ultrasonic dispersion is performed for 30 minutes while continuing stirring to prepare a silica particle dispersion ⁇ having a solid content concentration of 20% by mass. did.
- the average primary particle diameter of the silica particles contained in the silica particle dispersion ⁇ is 180 nm.
- KE-P30 was fired at 1050 ° C. for 1 hour using an electric furnace, cooled, and then pulverized using a pulverizer. 5 kg of the calcined KE-P30 was charged into a 20 L Henschel mixer (FM20J type, manufactured by Mitsui Mining Co., Ltd.) equipped with a heating jacket. While the calcined KE-P30 was being stirred, a solution prepared by dissolving 30 g of 3-acryloxypropyltrimethoxysilane (KBM5103 manufactured by Shin-Etsu Chemical Co., Ltd.) in 90 g of methyl alcohol was added dropwise and mixed.
- KBM5103 3-acryloxypropyltrimethoxysilane manufactured by Shin-Etsu Chemical Co., Ltd.
- the temperature is raised to 150 ° C. over about 1 hour with mixing and stirring, and the heat treatment is performed by holding at 150 ° C. for 12 hours while constantly rotating the scraping device in the direction opposite to the stirring blade.
- the wall surface was scraped off.
- the wall deposits were also scraped off using a spatula as appropriate.
- the mixture was cooled, and pulverized and classified using a jet pulverizer to obtain particles surface-treated with a silane coupling agent. An acryloyl group is added to the surface of the particle.
- the average primary particle diameter of the silica particles contained in the silica particle dispersion ⁇ is 270 nm.
- PL-7 (manufactured by Fuso Chemical) was baked at 1050 ° C. for 1 hour using an electric furnace, cooled, and then pulverized using a pulverizer.
- the calcined PL-7 (5 kg) was charged into a 20 L Henschel mixer (FM20J model manufactured by Mitsui Mining Co., Ltd.) equipped with a heating jacket. While the calcined PL-7 was being stirred, a solution prepared by dissolving 65 g of 3-acryloxypropyltrimethoxysilane (KBM5103 manufactured by Shin-Etsu Chemical Co., Ltd.) in 90 g of methyl alcohol was added dropwise and mixed.
- KBM5103 3-acryloxypropyltrimethoxysilane manufactured by Shin-Etsu Chemical Co., Ltd.
- the temperature is raised to 150 ° C. over about 1 hour with mixing and stirring, and the heat treatment is performed by holding at 150 ° C. for 12 hours while constantly rotating the scraping device in the direction opposite to the stirring blade.
- the wall surface was scraped off.
- the wall deposits were also scraped off using a spatula as appropriate.
- the mixture was cooled, and pulverized and classified using a jet pulverizer to obtain particles surface-treated with a silane coupling agent. An acryloyl group is added to the surface of the particle.
- silica particle dispersion ⁇ 80 parts by mass of MEK and 20 parts by mass of the above silica particles are put into a mixing tank, and after stirring for 10 minutes, ultrasonic dispersion is performed for 30 minutes while continuing stirring to prepare a silica particle dispersion ⁇ having a solid content concentration of 20% by mass. did.
- the average primary particle size of the silica particles contained in the silica particle dispersion ⁇ is 90 nm.
- U-15HA Urethane acrylate (acrylic equivalent 139, manufactured by Shin-Nakamura Chemical Co., Ltd.)
- X-12-1048 Acrylic group-containing trimethoxysilane (acrylic equivalent 370, manufactured by Shin-Etsu Chemical Co., Ltd.) Sirius-501: dendrimer type polyfunctional acrylate (acrylic equivalent 110, manufactured by Osaka Organic Chemical Industry Co., Ltd.)
- KBM-4803 Glycidoxyoctyltrimethoxysilane (epoxy equivalent 306, manufactured by Shin-Etsu Chemical Co., Ltd.)
- KE-P20 Seahoster KE-P20 (average primary particle size 200 nm, Nippon Silica Co., Ltd.
- KE-P30 Seahoster KE-P30 (average primary particle size 300 nm, amorphous silica manufactured by Nippon Shokubai Co., Ltd.)
- PL-7 Quattron PL-7 ultra-high purity colloidal silica (average primary particle size 100 nm, manufactured by Fuso Chemical Industry Co., Ltd.)
- 8SS-723 ACRYT 8SS-723 (crosslinking group equivalent 338, manufactured by Taisei Fine Chemical Co., Ltd.)
- 8SS-1024 ACRYT 8SS-1024 (crosslinking group equivalent 263, manufactured by Taisei Fine Chemical Co., Ltd.)
- UMS-182 Polymerizable group-containing polydimethylsiloxane (molecular weight 6,500, acrylic equivalent 545, manufactured by Gelest Co., Ltd.)
- X-22-164C Polydimethylsiloxane monomer containing a methacryloyl group at both ends (molecular weight 4800, acrylic equivalent 2400, manufactured by Shin-
- the antireflection film samples 1 to 23 and 101 to 111 were prepared by the following steps (1) to (4).
- Step (1) Application of coating solution for forming antireflection layer
- an antireflection layer-forming coating solution was applied at 2.8 ml / m 2 using a die coater and dried at room temperature for 90 seconds.
- a part of the sample was cut out, cured by irradiation with 600 mJ / cm 2 with an air-cooled metal halide lamp, then cut with a microtome to obtain a cross section, and SEM observation was performed at a magnification of 5000 times to measure the thickness of the resin relative to the particles.
- the thickness of the resin in the portion where no particles were present was 0.8 times or more the average primary particle size of the particles.
- step (2) a sample having a cure rate of 6% was prepared by irradiating 2.0 mJ / cm 2 in an environment with an oxygen concentration of 1.0% from the antireflection layer side using an air-cooled metal halide lamp.
- an air-cooled metal halide lamp M04-L41 manufactured by Eye Graphics Co., Ltd. was used.
- the amount of irradiation was measured by attaching a HEAD SENSER PD-365 to an eye ultraviolet integrated illuminometer UV METER UVPF-A1 manufactured by Eye Graphic Co., Ltd. and measuring range 0.0.
- Sample 102 was irradiated with light from the side opposite to the interface on the antireflection layer side of the substrate.
- oil liquid having the following composition (both silicone oils manufactured by Shin-Etsu Chemical Co., Ltd.) was applied on the antireflection layer to a thickness of 600 nm using a die coater.
- Composition of oil liquid KF96-10cs 30.0 parts by mass KF96-0.65cs 70.0 parts by mass
- Step (3) The laminated body which has a base material after a process (2), a hard-coat layer, and an antireflection layer was processed at 120 degreeC for 5 minutes, and a part of sclerosing
- Step (4) While purging with nitrogen so that the atmosphere has an oxygen concentration of 0.01% by volume or less, the above air-cooled metal halide lamp was irradiated with ultraviolet rays of 600 mJ / cm 2 to cure the curable compound of the antireflection layer, did. A part of the sample was cut out, cut with a microtome, a cross section was taken out, SEM observation was performed at a magnification of 5000 times, and the thickness of the resin (part where no particle was present) with respect to the particle was measured. Compared with the SEM observation image after step (1), a part of the curable compound permeates in step (3) when the resin thickness is reduced by 0.4 times or more of the average primary particle size of the particles. Judged that.
- Sample 102 containing a thermal polymerization initiator in the hard coat layer forming composition was heat-treated at 150 ° C. for 5 minutes after step (4) to cure the hard coat layer.
- Step wool resistance (abrasion resistance test) A rubbing test was performed on the surface of the antireflection layer of the antireflection film using a rubbing tester to obtain an index of scratch resistance. Evaluation environmental conditions: 25 ° C., relative humidity 60% Rubbing material: Steel wool (Nippon Steel Wool Co., Ltd., gelled No. 0000) Wrap around the tip (1 cm x 1 cm) of the tester that comes into contact with the sample.
- the back surface (base material side) of the antireflection film was roughened with sandpaper and then treated with oil-based black ink to prepare a film sample in which the back surface reflection was eliminated.
- a spectrophotometer V-550 (manufactured by JASCO Corporation) is equipped with the unit ARM-500 ⁇ , and the reflectivity at an incident angle of 5 ° is measured in the wavelength region of 450 to 650 nm, and the averaged specular reflectivity is measured. It was.
- the sample containing a large amount of the slip agent (a) having a low acrylic equivalent and a high crosslinking density in the vicinity of the surface of the antireflection layer on the side opposite to the base material has a low reflectance and steel resistance. It was confirmed that the wool rubbing was good, the reflectance increase after rubbing the steel wool was small, and the practical scratch resistance was excellent.
- Sample No. 13 and 22 were subjected to the following saponification treatment.
- a 1.5 mol / l aqueous sodium hydroxide solution was prepared and kept at 55 ° C.
- a 0.01 mol / l dilute sulfuric acid aqueous solution was prepared and kept at 35 ° C.
- the produced optical film was immersed in the aqueous sodium hydroxide solution for 2 minutes, and then immersed in water to sufficiently wash away the aqueous sodium hydroxide solution.
- the sample was thoroughly dried at 120 ° C.
- Sample No. No. 13 maintained the steel wool resistance A + even after the saponification treatment and was good.
- No. 22 confirmed that the steel wool resistance deteriorated to A.
- an antireflection film having good antireflection performance, small change in reflectance before and after the scratch resistance test, and excellent in practical scratch resistance.
- a method by which a film can be easily produced can be proposed.
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Abstract
Description
基材上に、少なくとも1層の反射防止層を有し、
上記反射防止層は、上記基材側の面とは反対側の最表面から上記基材に向かう方向に20nm以下の厚みの領域(S)内に、
1分子中に架橋基を3つ以上持ち、架橋基当量が450以下であり、フッ素原子及びシロキサン結合の少なくとも一種を含む部位を有する滑り剤(a)と、
少なくとも1分子中に架橋基を3つ以上持ち、架橋基当量が450以下であり、フッ素原子及びシロキサン結合のいずれも有さない硬化性化合物(b)と、
光重合開始剤(c)と、を含む硬化性組成物の硬化物を含み、
上記領域(S)の断面方向の素材分布において、上記滑り剤(a)の含有率が51%以上となる領域を有する、反射防止フィルム。
<2>
上記反射防止層の上記基材側の面とは反対側の最表面を、荷重200gの条件でスチールウールで10往復擦った後の上記反射防止フィルムの反射率をRA、スチールウールで擦る前の上記反射防止フィルムの反射率をR0としたとき、RA-R0で表される反射率変化が0.25%以下である、<1>に記載の反射防止フィルム。
<3>
上記滑り剤(a)の上記架橋基が(メタ)アクリロイル基である、<1>又は<2>に記載の反射防止フィルム。
<4>
上記滑り剤(a)の上記フッ素原子及びシロキサン結合の少なくとも一種を含む部位は、フルオロアルキル基である、<1>~<3>のいずれか1項に記載の反射防止フィルム。
<5>
上記滑り剤(a)の上記フッ素原子及びシロキサン結合の少なくとも一種を含む部位は、ポリジメチルシロキサン基又はポリエーテル変性ジメチルシロキサン基である、<1>~<3>のいずれか1項に記載の反射防止フィルム。
<6>
上記滑り剤(a)は、側鎖に上記フッ素原子及びシロキサン結合の少なくとも一種を含む部位と上記架橋基を持ち、重量平均分子量が6,000以上である化合物(a1)である、<4>又は<5>に記載の反射防止フィルム。
<7>
上記化合物(a1)は、上記架橋基がC-C結合又はC-O結合で主鎖に連結している、<6>に記載の反射防止フィルム。
<8>
上記滑り剤(a)は、上記フッ素原子及びシロキサン結合の少なくとも一種を含む部位に、上記架橋基が直接又は連結基を介して結合した、重量平均分子量が6,000未満である化合物(a2)である、<4>又は<5>に記載の反射防止フィルム。
<9>
上記化合物(a2)は、
下記一般式(M-2)で表される基を1つ有する化合物、
下記一般式(M-3)で表される基を1つ有する化合物、
下記一般式(M-1)で表される基を2つ有する化合物、
下記一般式(M-2)で表される基を2つ有する化合物、又は、
下記一般式(M-3)で表される基を2つ有する化合物である、<8>に記載の反射防止フィルム。
一般式(M-2)中、R21~R23は各々独立に水素原子又はメチル基を表す。*は結合位置を表す。
一般式(M-3)中、R31~R35は各々独立に水素原子又はメチル基を表す。*は結合位置を表す。
<10>
上記化合物(a2)は、上記フッ素原子及びシロキサン結合の少なくとも一種を含む部位と、上記架橋基とがC-C結合又はC-O結合を介して結合している、<8>に記載の反射防止フィルム。
<11>
上記反射防止層は、平均一次粒径が250nm以下の粒子(d)を有する、<1>~<10>のいずれか1項に記載の反射防止フィルム。
<12>
上記反射防止層の上記基材側とは反対側の表面に上記粒子(d)によって形成された凹凸形状を有する、<11>に記載の反射防止フィルム。
<13>
上記基材の可視光の透過率が80%以上である、<1>~<12>のいずれか1項に記載の反射防止フィルム。
<14>
上記反射防止層には、上記基材の表面に直交する方向に上記粒子(d)が複数存在しない、<12>に記載の反射防止フィルム。
<15>
<12>に記載の反射防止フィルムの製造方法であって、
上記基材上に、
上記滑り剤(a)、上記硬化性化合物(b)、上記光重合開始剤(c)、上記粒子(d)、及び溶剤を含む組成物を塗布し、上記溶剤を揮発させ、上記粒子(d)が存在しない部分の厚みが上記粒子(d)の平均一次粒径の0.8倍以上の厚さとなる層(A)を設ける工程(1)と、
上記層(A)中の上記硬化性化合物(b)の一部を硬化させ、硬化された化合物(bc)を得る工程(2)と、
上記層(A)中の上記硬化性化合物(b)及び上記化合物(bc)からなる群より選択される化合物の一部を、加熱により上記基材に浸透させるか又は揮発させ、上記層(A)の上記基材側とは反対の最表面に上記粒子(d)からなる凹凸形状を形成する工程(3)と、
上記層(A)中に残存する、上記滑り剤(a)、上記硬化性化合物(b)及び上記化合物(bc)からなる群より選択される化合物を硬化させて、上記反射防止層を形成する工程(4)と、
をこの順に有する、反射防止フィルムの製造方法。
<16>
上記工程(1)と上記工程(2)の間、上記工程(2)と上記工程(3)の間、又は上記工程(3)と上記工程(4)の間に、
上記硬化性化合物(b)とは相溶しない化合物(e)を含む層(E)を、上記層(A)の上記基材側の面とは反対側の面上に設ける工程(E1)を有し、
上記工程(E1)に引き続いて行う上記工程(2)、上記工程(3)又は上記工程(4)の後に、上記層(E)を除去する工程(E2)を有する、<15>に記載の反射防止フィルムの製造方法。
また、「(メタ)アクリレート」はアクリレート及びメタクリレートの少なくとも一種を表し、「(メタ)アクリル」はアクリル及びメタクリルの少なくとも一種を表し、「(メタ)アクリロイル」は、アクリロイル及びメタクリロイルの少なくとも一種を表す。
本発明の反射防止フィルムは、
基材上に、少なくとも1層の反射防止層を有し、
上記反射防止層は、上記基材側の面とは反対側の最表面から上記基材に向かう方向に20nm以下の厚みの領域(S)内に、
1分子中に架橋基を3つ以上持ち、架橋基当量が450以下であり、フッ素原子及びシロキサン結合の少なくとも一種を含む部位を有する滑り剤(a)と、
少なくとも1分子中に架橋基を3つ以上持ち、架橋基当量が450以下であり、フッ素原子及びシロキサン結合のいずれも有さない硬化性化合物(b)と、
光重合開始剤(c)と、を含む硬化性組成物の硬化物を含み、
上記領域(S)の断面方向の素材分布において、上記滑り剤(a)の含有率が51%以上となる領域を有する、反射防止フィルムである。
図3及び図4は、それぞれ本発明の反射防止フィルムの一例を示す断面模式図である。
滑り剤(a)について説明する。
滑り剤(a)は、1分子中に架橋基を3つ以上持ち、架橋基当量が450以下であり、フッ素原子及びシロキサン結合の少なくとも一種を含む部位(以下、この部位を「低摩擦部位」ともいう)を有する。
架橋基としては、ラジカル反応性基又はラジカル反応性基以外の反応性基が挙げられ、ラジカル反応性基であることが好ましい。
ラジカル反応性基としては、付加重合可能な不飽和結合を有する基(例えば(メタ)アクリロイル基、(メタ)アクリルアミド基、(メタ)アクリロニトリル基、アリル基、ビニル基、スチレン構造、ビニルエーテル構造、アセチレン構造等)、-SH、-PH、SiH、-GeH、ジスルフィド構造等が挙げられ、(メタ)アクリロイル基、ビニル基、スチリル基、アリル基等の重合性官能基(重合性の炭素-炭素不飽和二重結合を有する基)が好ましく、中でも、(メタ)アクリロイル基及び-C(O)OCH=CH2が好ましく、(メタ)アクリロイル基が最も好ましい。
ラジカル反応性基以外の反応性基としては、エポキシ基、アミノ基、ボロン酸基、ボロン酸エステル基、オキシラニル基、オキセタニル基、水酸基、カルボキシル基、イソシアネート基等が挙げられる。
なお、たとえば架橋基がアクリロイル基又はメタクリロイル基の場合の架橋基当量をアクリル当量と呼ぶこともある。
上記化合物(a1)はポリマーであることが好ましく、上記化合物(a1)の重量平均分子量は、6000~100,000であることが好ましく、8,000~80,000であることがより好ましい。
上記化合物(a2)はモノマー又はオリゴマーであることが好ましく、上記化合物(a2)の重量平均分子量は、900~6,000であることが好ましく、1300~5000であることがより好ましい。
なお、滑り剤(a)の重量平均分子量は、後述する硬化性化合物(b)の重量平均分子量と同様の方法で求められる。
上記化合物(a2)も同様に、耐薬品および耐久性の観点から、低摩擦部位と、架橋基とがC-C結合又はC-O結合を介して結合していることが好ましい。
側鎖に架橋基を有する繰り返し単位としては、特開2009-79126号公報の[0028]~[0044]に記載されたものを参照することができる。
下記一般式(M-2)で表される基を1つ有する化合物、
下記一般式(M-3)で表される基を1つ有する化合物、
下記一般式(M-1)で表される基を2つ有する化合物、
下記一般式(M-2)で表される基を2つ有する化合物、又は、
下記一般式(M-3)で表される基を2つ有する化合物であることが好ましい。
一般式(M-2)中、R21~R23は各々独立に水素原子又はメチル基を表す。*は結合位置を表す。
一般式(M-3)中、R31~R35は各々独立に水素原子又はメチル基を表す。*は結合位置を表す。
上記化合物(a2)が上記一般式(M-3)で表される基を1つ有する化合物である場合、低摩擦部位を含んでなる主鎖の片末端に、架橋基を有する基である上記一般式(M-3)で表される基が直接又は連結基を介して結合していることが好ましい。
上記化合物(a2)が上記一般式(M-1)で表される基を2つ有する化合物である場合、低摩擦部位を含んでなる主鎖の両末端に、架橋基を有する基である上記一般式(M-1)で表される基が直接又は連結基を介して結合していることが好ましい。ここで、2つの一般式(M-1)で表される基は同じでもよいし、異なってもよい。
上記化合物(a2)が上記一般式(M-2)で表される基を2つ有する化合物である場合、低摩擦部位を含んでなる主鎖の両末端に、架橋基を有する基である上記一般式(M-2)で表される基が直接又は連結基を介して結合していることが好ましい。ここで、2つの一般式(M-2)で表される基は同じでもよいし、異なってもよい。
上記化合物(a2)が上記一般式(M-3)で表される基を2つ有する化合物である場合、低摩擦部位を含んでなる主鎖の両末端に、架橋基を有する基である上記一般式(M-3)で表される基が直接又は連結基を介して結合していることが好ましい。ここで、2つの一般式(M-3)で表される基は同じでもよいし、異なってもよい。
上記一価の炭化水素基としては、アルキル基、アリール基、アルケニル基、アルキニル基、アラルキル基等が例示できる。
Rp1及びRp2としては、水素原子、炭素数が1~20である一価の炭化水素基、炭素数が1~20であるアルコキシ基、又は、炭素数が6~20であるアリーロキシ基であることが好ましく、炭素数が1~20であるアルキル基又は炭素数が6~20であるアリール基であることがより好ましく、炭素数が1~20であるアルキル基であることがさらに好ましく、メチル基であることが最も好ましい。
また、nは6~100の整数であることが好ましく、nが8~65の整数であることが更に好ましく、nが10~35の整数であることが最も好ましい。
ポリジメチルシロキサン基またはポリエーテル変性ジメチルシロキサン基の繰り返し数nが6以上であると、疎水性が発揮され、空気界面への偏在能が強くなり、低摩擦部位が表面に露出することができ、かつ低摩擦部位としても短すぎず、滑り性を向上させることができる。繰り返し数nが100以下であると、偏在性は十分であり、架橋基密度も小さくならず、架橋して得られる膜の強度が高くなり、耐擦傷性試験に有効に働く。
化合物(A1)は、上記化合物(a1)のうち、低摩擦部位がシロキサン結合を有する部位である場合である。すなわち、化合物(A1)は、側鎖にシロキサン結合を含む部位と架橋基を持ち、重量平均分子量が6,000以上である化合物(シリコーン系ポリマー)である。化合物(A1)の具体例を下記一般式(2)に示す。
一般式(2)におけるnは5~100の整数を表し、7~65の整数であることが好ましく、9~35の整数であることがより好ましい。
化合物(A2)は、上記化合物(a2)のうち、低摩擦部位がシロキサン結合を有する部位である場合である。すなわち、化合物(A2)は、シロキサン結合を有する部位に、架橋基が直接又は連結基を介して結合した、重量平均分子量が6,000未満である化合物(シリコーン系モノマー又はオリゴマー)である。
下記一般式(4)で表される化合物は、低摩擦部位を含んでなる主鎖の片末端に、架橋基を有する基である上記一般式(M-3)で表される基が連結基を介して結合している化合物である。
下記一般式(5)で表される化合物は、低摩擦部位を含んでなる主鎖の片末端に、架橋基を有する基である上記一般式(M-2)で表される基が連結基を介して結合している化合物である。
一般式(4)におけるR41は、内部にエーテル結合などを有する無置換のアルキレン基であることが好ましく、*(CH2)3*であることがより好ましい。
一般式(4)におけるR42は水素原子又は一価の有機基を表し、水素原子、炭素数1~20の一価炭化水素基でることが好ましい。
一般式(4)におけるnは4~100の整数を表し、6~65の整数であることが好ましく、8~35の整数であることがより好ましい。
化合物(S-1):上記一般式(4)において、nが10であり、R41が-(CH2)3-であり、R42がCH3である化合物。
化合物(S-2):上記一般式(4)において、nが21であり、R41が-(CH2)3-であり、R42がCH3である化合物。
一般式(5)中のnの好ましい範囲は、上記一般式(4)におけるnと同様である。
上記一般式(5)で表される化合物の具体的な例としては、下記化合物(S-3)が挙げられる。ただし、本発明はこれらに限定されない。
化合物(S-3):上記一般式(5)において、nが10であり、R51が-(CH2)3-であり、R52がCH3である化合物。
(S-9)
下記一般式(6)で表される化合物は、低摩擦部位を含んでなる主鎖の両末端に、架橋基を有する基である上記一般式(M-3)で表される基が連結基を介して結合している化合物である。
下記一般式(6)で表される化合物は、低摩擦部位を含んでなる主鎖の片末端に、架橋基を有する基である上記一般式(M-2)で表される基が連結基を介して結合し、低摩擦部位を含んでなる主鎖の他方の片末端に、架橋基を有する基である上記一般式(M-2)で表される基が連結基を介して結合している化合物である。
一般式(6)中のR61及びR62の具体例及び好ましい範囲は、上記一般式(4)におけるR41と同様である。
一般式(6)中のnの好ましい範囲は、上記一般式(4)におけるnと同様である。
化合物(S-4):上記一般式(6)において、nが9であり、R61及びR62が-(CH2)3-である化合物。
化合物(S-5):上記一般式(6)において、nが20であり、R61及びR62が-(CH2)3-である化合物。
化合物(S-6):上記一般式(6)において、nが40であり、R61及びR62が-(CH2)3-である化合物。
一般式(7)中のR71及びR72の具体例及び好ましい範囲は、上記一般式(4)におけるR41と同様である。
一般式(7)中のnの好ましい範囲は、上記一般式(4)におけるnと同様である。
上記一般式(7)で表される化合物の具体的な例としては、下記化合物(S-7)および(S-8)が挙げられる。ただし、本発明はこれらに限定されない。
化合物(S-7):上記一般式(7)において、nが20であり、R71及びR72が-(CH2)3-である化合物。
化合物(S-8):上記一般式(7)において、nが40であり、R71及びR72が-(CH2)3-である化合物。
(S-11)
硬化性化合物(b)は、少なくとも1分子中に架橋基を3つ以上持ち、架橋基当量が450以下であり、フッ素原子及びシロキサン結合のいずれも有さない化合物である。
硬化性化合物(b)の架橋基の具体例及び好ましい範囲は、前述の滑り剤(a)の架橋基と同様である。
硬化性化合物(b)の架橋基当量とは、硬化性化合物(b)の分子量を、硬化性化合物(b)に含まれる架橋基の数で除した値であり、膜強度の観点から450以下であり、350以下であることがより好ましく、250以下であることが更に好ましい。
硬化性化合物(b)として、ラジカル反応性基を有する化合物を少なくとも1種用いることが好ましい。
ラジカル反応性基としては、付加重合可能な不飽和結合を有する基(例えば(メタ)アクリロイル基、(メタ)アクリルアミド基、(メタ)アクリロニトリル基、アリル基、ビニル基、スチレン構造、ビニルエーテル構造、アセチレン構造等)、-SH、-PH、SiH、-GeH、ジスルフィド構造等が挙げられる。
硬化性化合物(b)として、(メタ)アクリロイル基、ビニル基、スチリル基、アリル基等の重合性官能基(重合性の炭素-炭素不飽和二重結合)を有する化合物がを少なくとも1種用いることが好ましく、中でも、(メタ)アクリロイル基及び-C(O)OCH=CH2を有する化合物を少なくとも1種用いることが好ましく、(メタ)アクリロイル基を有する化合物を少なくとも1種用いることがより好ましく、1分子中に(メタ)アクリロイル基を2個以上有する化合物を少なくとも1種用いることがさらに好ましい。
硬化性化合物(b)としては1種の化合物を単独で用いてもよいし、2種以上の化合物を併用してもよい。
特に、本発明の反射防止フィルムが、基材としてハードコート層付き基材を用いる場合は、硬化性化合物(b)として、少なくとも2種の硬化性化合物を用い、そのうち少なくとも1種がラジカル反応性基を有する化合物であり、別の少なくとも1種が、反射防止フィルムの製造方法における工程(3)で基材に浸透する化合物であり、ラジカル反応性基を有さず、かつラジカル反応性基以外の反応性基を有する化合物であることが好ましい。
硬化性化合物(b-1):分子量が400以上であり、ラジカル反応性基を有する化合物
硬化性化合物(b-2):ラジカル反応性基を有するシランカップリング剤
硬化性化合物(b-3):分子量が400未満であり、ラジカル反応性基を有さず、かつラジカル反応性基以外の反応性基を有する化合物又は、分子量が300未満であり、加熱時に揮発する化合物
[溶媒] テトラヒドロフラン
[装置名] TOSOH HLC-8220GPC
[カラム] TOSOH TSKgel Super HZM-H
(4.6mm×15cm)を3本接続して使用。
[カラム温度] 25℃
[試料濃度] 0.1質量%
[流速] 0.35ml/min
[校正曲線] TOSOH製TSK標準ポリスチレン 重量平均分子量(Mw)=2800000~1050までの7サンプルによる校正曲線を使用。
硬化性化合物(b-1)は、分子量が400以上であり、ラジカル反応性基を有する化合物である。
硬化性化合物(b-1)は基材に浸透しにくい化合物であることが好ましい。
硬化性化合物(b-1)の分子量は400~100000が好ましく、1000~50000がより好ましい。
硬化性化合物(b-1)は、(分子量/ラジカル反応性基量)で表される官能基当量が、450以下であることが好ましく、400以下であることがより好ましく、350以下であることが更に好ましい。
硬化性化合物(b-1)は、アルコキシシリル基に代表される加水分解性シランカップリング基を有さない(すなわちシランカップリング剤ではない)ことが好ましい。
硬化性化合物(b-1)の具体例としては、KAYARAD DPHA、同DPHA-2C、同PET-30、同TMPTA、同TPA-320、同TPA-330、同RP-1040、同T-1420、同D-310、同DPCA-20、同DPCA-30、同DPCA-60、同GPO-303(日本化薬(株)製)、NKエステルA-TMPT、A-TMMT、A-TMM3、A-TMM3L、A-9550(新中村化学工業(株)製)、V#3PA、V#400、V#36095D、V#1000、V#1080、ビスコート#802(大阪有機化学工業(株)製)等のポリオールと(メタ)アクリル酸のエステル化物、Sirius-501、SUBARU-501(大阪有機化学工業(株)製)等のデンドリマー型多官能アクリレートを挙げることができる。また紫光UV-1400B、同UV-1700B、同UV-6300B、同UV-7550B、同UV-7600B、同UV-7605B、同UV-7610B、同UV-7620EA、同UV-7630B、同UV-7640B、同UV-6630B、同UV-7000B、同UV-7510B、同UV-7461TE、同UV-3000B、同UV-3200B、同UV-3210EA、同UV-3310EA、同UV-3310B、同UV-3500BA、同UV-3520TL、同UV-3700B、同UV-6100B、同UV-6640B、同UV-2000B、同UV-2010B、同UV-2250EA、同UV-2750B(日本合成化学(株)製)、UL-503LN(共栄社化学(株)製)、ユニディック17-806、同17-813、同V-4030、同V-4000BA(大日本インキ化学工業(株)製)、EB-1290K、EB-220、EB-5129、EB-1830,EB-4858(ダイセルUCB(株)製)、ハイコープAU-2010、同AU-2020((株)トクシキ製)、アロニックスM-1960(東亜合成(株)製)、アートレジンUN-3320HA,UN-3320HC,UN-3320HS、UN-904(根上工業(株)製)、NKオリゴU-4HA、U-15HA(新中村化学工業(株)製)などの3官能以上のウレタンアクリレート化合物、アロニックスM-8100,M-8030,M-9050(東亞合成(株)製、KRM-8307(ダイセルサイテック(株)製)などの3官能以上のポリエステル化合物なども好適に使用することができる。
硬化性化合物(b-2)は、ラジカル反応性基を有するシランカップリング剤である。
硬化性化合物(b-2)の分子量は100~5000が好ましく、200~2000がより好ましい。
硬化性化合物(b-2)は、基材に浸透しにくい化合物であることが好ましい。
硬化性化合物(b-2)は、(分子量/ラジカル反応性基量)で表される官能基当量が、450以下であることがより好ましく、400以下であることがより好ましく、350以下であることが更に好ましい。
硬化性化合物(b-2)の具体例としては、3-(メタ)アクリロキシプロピルトリメトキシシラン、3-(メタ)アクリロキシプロピルメチルジメトキシシラン、3-(メタ)アクリロキシプロピルジメチルメトキシシラン、3-(メタ)アクリロキシプロピルメチルジエトキシシラン、3-(メタ)アクリロキシプロピルトリエトキシシラン、2-(メタ)アクリロキシエチルトリメトキシシラン、2-(メタ)アクリロキシエチルトリエトキシシラン、4-(メタ)アクリロキシブチルトリメトキシシラン、4-(メタ)アクリロキシブチルトリエトキシシラン等を上げることが出来る。具体的には、KBM-503、KBM-5103(信越化学工業(株)製)や、特開2014-123091記載のシランカップリング剤X-12-1048、X-12-1049、X-12-1050(信越化学工業(株)製)等を用いることが出来る。
また、下記式(10)で示されるアクリロイル基含有トリメトキシシランも好ましく用いることができる。
式(10)
硬化性化合物(b-3)は、分子量が400未満であり、ラジカル反応性基を有さず、かつラジカル反応性基以外の反応性基を有する化合物である。
硬化性化合物(b-3)は、25℃では基材に浸透しにくく、加熱時に基材に浸透しやすい化合物であることが好ましい。
硬化性化合物(b-3)が有するラジカル反応性基以外の反応性基としては、基材(基材がハードコート層等の機能層を有する場合は機能層)を構成する化合物と反応する基であることが好ましく、エポキシ基、アミノ基、ボロン酸基、ボロン酸エステル基、オキシラニル基、オキセタニル基、水酸基、カルボキシル基、イソシアネート基等が挙げられる。
硬化性化合物(b-3)の分子量は100以上400未満が好ましく、200以上300以下がより好ましい。
硬化性化合物(b-3)はラジカル反応性基以外の反応性基を2個以上有することが好ましい。
硬化性化合物(b-3)の具体例としては、セロキサイド2021P、セロキサイド2081、エポリードGT-301、エポリードGT-401、EHPE3150CE(以上、ダイセル化学工業(株)製)、OXT-121、OXT-221、OX-SQ、PNOX-1009(以上、東亞合成(株)製)、KBM-303、KBM-402、KBM-403、KBE-402、KBE-403、KBM-4803(以上、信越化学工業(株)製)が挙げられる。
本発明における反射防止層の領域(S)は、前述の滑り剤(a)、前述の硬化性化合物(b)及び光重合開始剤(c)を含む硬化性組成物の硬化物を含む。
光重合開始剤(c)としては、アセトフェノン類、ベンゾイン類、ベンゾフェノン類、ホスフィンオキシド類、ケタール類、アントラキノン類、チオキサントン類、アゾ化合物、過酸化物類、2,3-ジアルキルジオン化合物類、ジスルフィド化合物類、フルオロアミン化合物類、芳香族スルホニウム類、ロフィンダイマー類、オニウム塩類、ボレート塩類、活性エステル類、活性ハロゲン類、無機錯体、クマリン類などが挙げられる。光重合開始剤(c)の具体例、及び好ましい態様、市販品などは、特開2009-098658号公報の段落[0133]~[0151]に記載されており、本発明においても同様に好適に用いることができる。
滑り剤(a)の含有率は、反射防止層の基材側の面とは反対側の最表面から20nmまでの間の任意の領域(S)内に存在するフッ素原子及びシリコーン(シロキサン結合)の最大含有量をXとし、滑り剤(a)を単独で硬化させて膜にした場合の膜中のフッ素原子及びシリコーン(シロキサン結合)の合計量をYとしたとき、100*(X/Y)で表される値(単位:%)とする。ここで、反射防止層の断面方向の素材分布は、フィルムをミクロトームで切削し、断面を飛行時間型二次イオン質量分析装置(TOF-SIMS)で分析した時に、滑り剤(a)を含めた素材分布として検出され、この領域の膜厚も同様にTOF-SIMSの断面情報から測定することができる。
本発明の反射防止フィルムは、領域(S)内に上記滑り剤(a)の含有率が51%以上である領域を有し、55%超100%未満である領域を有することが好ましく、60%以上である領域を有することがより好ましく、70%以上である領域を有することが更に好ましい。
領域(S)内に滑り剤(a)の含有率が51%以上である領域を有する場合、滑り剤(a)が反射防止層の膜内部まで分布しておらず(すなわち、反射防止層の最表面付近に偏在しており)、滑り性、及び膜硬度を向上させることができる。
なお、フッ素原子及びシリコーン(シロキサン結合)の合計量は、飛行時間二次イオン質量分析(TOF-SIMS)で測定したF-フラグメントあるいはSi2C5H15O+フラグメントの比率で測定するか、入射角度を適宜調整したXPS(X-ray Photoelectron Spectroscopy)分析で測定したF/CあるいはSi/Cの比率で測定することができる。滑り剤(a)のみを硬化した単膜を、TOF-SIMSもしくはXPSで測定することにより、含有率100%として定義でき、本発明の反射防止フィルムを単膜と同じ測定方法で測定することで、反射防止フィルム中の含有率が判明する。
基材は、反射防止フィルムの基材として一般的に使用される透光性を有する基材であれは特に制限はないが、プラスチック基材又はガラス基材が好ましい。
プラスチック基材としては、種々用いることができ、例えば、セルロース系樹脂;セルロースアシレート(トリアセテートセルロース、ジアセチルセルロース、アセテートブチレートセルロース)等、ポリエステル樹脂;ポリエチレンテレフタレート等、(メタ)アクリル系樹脂、ポリウレタン系樹脂、ポリカーボネート、ポリスチレン、オレフィン系樹脂等を含有する基材が挙げられ、セルロースアシレート、ポリエチレンテレフタレート、又は(メタ)アクリル系樹脂を含有する基材が好ましく、セルロースアシレートを含有する基材がより好ましく、セルロースアシレートフィルムであることが特に好ましい。セルロースアシレートとしては、特開2012-093723号公報に記載の基材等を好ましく用いることが出来る。
基材の厚さは、通常、10μm~1000μm程度であるが、取り扱い性が良好で、透光性が高く、かつ十分な強度が得られるという観点から20μm~200μmが好ましく、25μm~100μmがより好ましい。
基材の透光性としては、可視光の透過率(好ましくは波長400nm以上750nm以下の平均透過率)が80%以上であることが好ましく、90%以上であることがより好ましい。
但し、反射率RAは、擦り速度を13cm/秒、荷重を200g/cm2、スチールウールと反射防止フィルム表面との接触面積を1cm×1cmとして、フィルム表面をスチールウールで10往復擦った際の反射率を示す。
本発明の反射防止フィルムの反射防止層は、平均一次粒径が250nm以下の粒子(d)を有することが好ましい。
粒子(d)としては、金属酸化物粒子、樹脂粒子、金属酸化物粒子のコアと樹脂のシェルを有する有機無機ハイブリッド粒子などが挙げられるが、膜強度に優れる観点から金属酸化物粒子が好ましい。
金属酸化物粒子としては、シリカ粒子、チタニア粒子、ジルコニア粒子、五酸化アンチモン粒子などが挙げられるが、多くの樹脂と屈折率が近いためヘイズを発生しにくく、かつ後述するモスアイ構造が形成し易い観点からシリカ粒子が好ましい。
樹脂粒子としては、ポリメタクリル酸メチル粒子、ポリスチレン粒子、メラミン粒子などが挙げられる。
粒子(d)として、1種のみ使用してもよいし、平均一次粒子径の異なる2種以上の粒子を用いてもよい。
より具体的には、エタノール中に含有量が35質量%となるように粒子を添加し、超音波で10分以上分散して粒子の分散液を調製し、この分散液について電子顕微鏡写真により測定することが出来る。分散液を滴下してSEM(Scanning Electron Microscope)像を撮影し、一次粒子100個のそれぞれの直径を測長してその体積を算出し、累積の50%粒子径を平均一次粒子径とすることができる。粒子が球径でない場合には、長径と短径の平均値をその一次粒子の直径とみなす。
特に、樹脂との結着性を付与し、膜強度を向上させる観点から、粒子表面を不飽和二重結合および粒子表面と反応性を有する官能基を有する化合物で表面修飾し、粒子表面に不飽和二重結合を付与することが好ましい。
焼成シリカ粒子は、加水分解が可能なシリコン化合物を水と触媒とを含む有機溶媒中で加水分解、縮合させることによってシリカ粒子を得た後、シリカ粒子を焼成するという公知の技術により製造することができ、たとえば特開2003-176121号公報、特開2008-137854号公報などを参照することができる。
焼成シリカ粒子を製造する原料のシリコン化合物としては特に限定されないが、テトラクロロシラン、メチルトリクロロシラン、フェニルトリクロロシラン、ジメチルジクロロシラン、ジフェニルジクロロシラン、メチルビニルジクロロシラン、トリメチルクロロシラン、メチルジフェニルクロロシラン等のクロロシラン化合物;テトラメトキシシラン、テトラエトキシシラン、テトライソプロポキシシラン、テトラブトキシシラン、メチルトリメトキシシラン、メチルトリエトキシシラン、トリメトキシビニルシラン、トリエトキシビニルシラン、3-グリシドキシプロピルトリメトキシシラン、3-クロロプロピルトリメトキシシラン、3-メルカプトプロピルトリメトキシシラン、3-(2-アミノエチルアミノ)プロピルトリメトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン、ジメチルジメトキシシラン、ジメチルジエトキシシラン、3-グリシドキシプロピルメチルジメトキシシラン、3-グリシドキシプロピルメチルジエトキシシラン、3-クロロプロピルメチルジメトキシシラン、ジフェニルジメトキシシラン、ジフェニルジエトキシシラン、ジメトキシジエトキシシラン、トリメチルメトキシシラン、トリメチルエトキシシラン等のアルコキシシラン化合物;テトラアセトキシシラン、メチルトリアセトキシシラン、フェニルトリアセトキシシラン、ジメチルジアセトキシシラン、ジフェニルジアセトキシシラン、トリメチルアセトキシシラン等のアシロキシシラン化合物;ジメチルシランジオール、ジフェニルシランジオール、トリメチルシラノール等のシラノール化合物;等が挙げられる。上記例示のシラン化合物のうち、アルコキシシラン化合物が、より入手し易く、かつ、得られる焼成シリカ粒子に不純物としてハロゲン原子が含まれることが無いので特に好ましい。本発明にかかる焼成シリカ粒子の好ましい形態としては、ハロゲン原子の含有量が実質的に0%であり、ハロゲン原子が検出されないことが好ましい。
焼成温度は特に限定されないが、800~1300℃が好ましく、1000℃~1200℃がより好ましい。
本発明の反射防止フィルムの好ましい態様の1つとして、反射防止層の最表面に粒子(d)によって形成された凹凸形状を有する反射防止フィルムが挙げられる。図4は、この態様の本発明の反射防止フィルムの一例を示す断面模式図である。
粒子(d)によって形成された凹凸形状はモスアイ構造であることが好ましい。
反射防止層が粒子(d)を含む場合、前述の滑り剤(a)及び硬化性化合物(b)等が硬化して形成された樹脂からなる平坦な部分(膜)の基材側の面とは反対の表面から、粒子(d)が突出して凸部となり、粒子(d)同士の間が凹部となって、反射防止層の表面に凹凸形状を形成していることが好ましい。このとき、前述の滑り剤(a)及び硬化性化合物(b)等が硬化して形成された樹脂からなる平坦な部分(膜)から突出した粒子(d)の突出した部分の表面には、前述の滑り剤(a)及び硬化性化合物(b)等が硬化した硬化物が被膜となって覆っていることが好ましい。
そして、この態様においても、本発明の反射防止フィルムの反射防止層は、基材側の面とは反対側の最表面から基材に向かう方向に20nm以下の厚みの領域(S)内に、滑り剤(a)と、硬化性化合物(b)と、光重合開始剤(c)とを含む硬化性組成物の硬化物を含み、領域(S)の断面方向の素材分布において、滑り剤(a)の含有率が51%以上となる領域を有する。好ましくは前述の粒子(d)の突出した部分の表面を覆う被膜が20nm以下の厚みの領域(S)であり、この領域(S)内に滑り剤(a)の含有率が51%以上となる領域を有することが好ましい。
モスアイ構造とは、光の反射を抑制するための物質(材料)の加工された表面であって、周期的な微細構造パターンをもった構造のことを指す。特に、可視光の反射を抑制する目的の場合には、780nm未満の周期の微細構造パターンをもった構造のことを指す。微細構造パターンの周期が380nm未満であると、反射光の色味が小さくなり好ましい。また、モスアイ構造の凹凸形状の周期が100nm以上であると波長380nmの光が微細構造パターンを認識でき、反射防止性に優れるため好ましい。モスアイ構造の有無は、走査型電子顕微鏡(SEM)、原子間力顕微鏡(AFM)等により表面形状を観察し、上記微細構造パターンが出来ているかどうか調べることによって確認することができる。
図2の反射防止フィルム10は、基材1と反射防止層2とを有する。反射防止層2は、基材1と反対側の表面に平均一次粒径が例えば150nm以上250nm以下の粒子3により形成された凹凸形状からなるモスアイ構造を有する。
反射防止層2は、平均一次粒径が150nm以上250nm以下の粒子3と、樹脂4とを含んでなる。
また、図2には記載されていないが、基材と反射防止層の間にその他の層を有していてもよく、ハードコート層を有することが好ましい。
反射防止フィルムにおける基材、反射防止層、ハードコート層の材料については本発明の反射防止フィルムの製造方法において説明したものと同じである。
B/Aは、硬化後の反射防止層における樹脂と粒子の体積比により制御することができる。そのため、樹脂と粒子の配合比を適切に設計することが重要である。また、樹脂がモスアイ構造を作製する工程の中で基材に浸透したり、揮発したりすることにより反射防止層における樹脂と粒子の体積比が反射防止層形成用組成物中の配合比と異なる場合もあるため、基材とのマッチングを適切に設定することも重要である。
本発明の反射防止フィルムの製造方法は、特に限定されないが、反射防止層が前述の粒子(d)を含有する態様の反射防止フィルムの製造方法としては、
基材上に、
滑り剤(a)、硬化性化合物(b)、光重合開始剤(c)、粒子(d)、及び溶剤を含む組成物を塗布し、溶剤を揮発させ、粒子(d)が存在しない部分の厚みが粒子(d)の平均一次粒径の0.8倍以上の厚さとなる層(A)を設ける工程(1)と、
層(A)中の硬化性化合物(b)の一部を硬化させ、硬化された化合物(bc)を得る工程(2)と、
層(A)中の硬化性化合物(b)及び化合物(bc)からなる群より選択される化合物の一部を、加熱により基材に浸透させるか又は揮発させ、層(A)の基材側の面とは反対の表面に粒子(d)からなる凹凸形状を形成する工程(3)と、
層(A)中に残存する、硬化性化合物(b)及び化合物(bc)からなる群より選択される化合物を硬化させて、反射防止層を形成する工程(4)と、
をこの順に有する、反射防止フィルムの製造方法であることが好ましい。
本発明の反射防止フィルムの製造方法の一例を示す模式図を図1に示す。
工程(1)は、図1の(1)に示すように、基材(図1の符号1)上に、滑り剤(a)、硬化性化合物(b)、光重合開始剤(c)、平均一次粒径が250nm以下の微粒子(d)(図1の符号3)、及び溶剤を含む組成物を塗布し、上記溶剤を揮発させ、上記粒子(d)が存在しない部分の厚みが上記粒子(d)の平均一次粒径の0.8倍以上の厚さとなる層(A)(図1の符号4)を設ける工程である。
溶剤としては、粒子(d)と極性が近いものを選ぶのが分散性を向上させる観点で好ましい。具体的には、例えば粒子(d)が金属酸化物粒子の場合にはアルコール系の溶剤が好ましく、メタノール、エタノール、2-プロパノール、1-プロパノール、ブタノールなどが挙げられる。また、例えば粒子(d)に疎水化表面修飾が施された金属樹脂粒子の場合には、ケトン系、エステル系、カーボネート系、アルカン、芳香族系等の溶剤が好ましく、メチルエチルケトン(MEK)、炭酸ジメチル、酢酸メチル、アセトン、メチレンクロライド、シクロヘキサノンなどが挙げられる。これらの溶剤は、分散性を著しく悪化させない範囲で複数種混ぜて用いてもかまわない。
粒子(d)の分散剤は、粒子同士の凝集力を低下させることにより、粒子(d)を均一に配置させ易くすることができる。分散剤としては、特に限定されないが、硫酸塩、リン酸塩などのアニオン性化合物、脂肪族アミン塩、四級アンモニウム塩などのカチオン性化合物、非イオン性化合物、高分子化合物が好ましく、吸着基と立体反発基それぞれの選択の自由度が高いため高分子化合物がより好ましい。分散剤としては市販品を用いることもできる。例えば、ビックケミー・ジャパン(株)製のDISPERBYK160、DISPERBYK161、DISPERBYK162、DISPERBYK163、DISPERBYK164、DISPERBYK166、DISPERBYK167、DISPERBYK171、DISPERBYK180、DISPERBYK182、DISPERBYK2000、DISPERBYK2001、DISPERBYK2164、Bykumen、BYK-2009、BYK-P104、BYK-P104S、BYK-220S、Anti-Terra203、Anti-Terra204、Anti-Terra205(以上商品名)などが挙げられる。
層(A)は、基材上に塗布された反射防止層形成用組成物から溶剤を揮発させ、粒子(d)が存在しない部分の厚みを、粒子(d)の平均一次粒径の0.8倍以上の厚さとした層であり、滑り剤(a)、硬化性化合物(b)、光重合開始剤(c)、粒子(d)を含む。
層(A)は本発明の製造方法によって、後に反射防止層となる層である。
層(A)に含まれる硬化性化合物(b)は、硬化されることで、樹脂となるものである。この樹脂は反射防止層の凹凸形状の凹部を形成するものである。
層(A)に含まれる粒子(d)は、得られた反射防止フィルムにおいて、樹脂からなる膜の表面から突出し、凹凸形状の凸部を形成する。
なお、本発明においては、滑り剤(a)も架橋基を有しているので、滑り剤(a)同士で又は硬化性化合物(b)とともに硬化されて硬化物となり、凹部に存在するが、前述のように、この硬化物は凸部を形成する粒子(d)の表面を覆う被膜中に存在することが好ましい。
層(A)は工程(2)で一部が硬化されるため、硬化前と硬化後で含有する成分が異なるが、本発明では便宜的にいずれの段階においても層(A)と呼ぶこととする。工程(3)及び(4)の前後においても同様に層(A)と呼ぶ。
工程(2)は、図1の(2)に示すように、工程(1)の層(A)4中の硬化性化合物(b)の一部を硬化させ、硬化された化合物(bc)を得る工程である。
なお工程(2)では、滑り剤(a)が硬化されてもよいし、硬化されなくてもよい。
化合物(bc)は、滑り剤(a)と硬化性化合物(b)とが硬化されたものを含んでいてもよい。
工程(2)で硬化性化合物(b)の一部を硬化させることにより、粒子(d)3を動きにくくして、粒子(d)が凝集することを抑制することができる。
硬化性化合物(b)の一部を硬化させるとは、硬化性化合物(b)のすべてではなく、一部のみを硬化させることを表す。工程(2)で硬化性化合物(b)の一部のみを硬化させることで、未硬化の硬化性化合物(b)を、後述する工程(3)で加熱により基材へ浸透させることができ、層(A)の粒子(d)が存在しない部分の厚みを小さくし、粒子(d)を突出させて、良好な凹凸形状(モスアイ構造)を形成することができる。
工程(2)において、硬化性化合物(b)の一部を硬化させる条件としては、反射防止層形成用組成物から粒子(d)を除いた組成物を基材上に2μmの厚さで塗布し、硬化させた場合に、硬化率が2~20%となる条件とすることが好ましく、硬化率が3~15%となる条件であることがより好ましく、硬化率が5~10%となる条件であることが更に好ましい。
{(1-硬化後の残存重合性官能基数)/硬化前の重合性官能基数}×100%
であり、以下の方法で測定される。
なお、重合性官能基とは、重合性の炭素-炭素不飽和二重結合を有する基である。
より具体的には、Thermo electron corporationのNICOLET6700 FT-IRを使用して硬化前の硬化性化合物そのものをKBr-IR測定し、カルボニル基のピーク(1660-1800cm-1)面積と重合性の炭素-炭素不飽和二重結合のピーク高さ(808cm-1)を求め、硬化後の一回反射のIR測定から同様にカルボニル基ピーク面積に対する重合性の炭素-炭素不飽和二重結合のピークを求め、紫外線照射前後で比較することにより硬化率を算出した。ここで硬化率の計算に際し、808cm-1における測定深度を821nm、1660-1800cm-1における深度を384nmとして規格化している。
化合物(bc)の分子量は特に限定されない。また、化合物(bc)は、未反応の重合性官能基を有していてもよい。
工程(3)は、図1の(3)に示すように、層(A)4中の硬化性化合物(b)及び化合物(bc)からなる群より選択される化合物の一部を、加熱により基材に浸透させるか、又は揮発させることにより層(A)の基材と反対側の表面に粒子(d)3からなる凹凸形状を形成する工程である。ここで、加熱により基材に浸透させるか、又は揮発させる硬化性化合物(b)は、工程(2)で硬化されなかった硬化性化合物(b)であることが好ましい。
なお工程(3)では、滑り剤(a)は基材に浸透しないことが好ましく、また揮発しないことが好ましい。
1atmは101325Paである。
工程(4)は、図1の(4)に示すように、層(A)中に残存する、滑り剤(a)、硬化性化合物(b)及び化合物(bc)からなる群より選択される化合物を硬化させる工程である。
工程(4)における硬化は光硬化であることが好ましく、紫外線照射による硬化であることがより好ましい。紫外線の照射量は300mJ/cm2以上が好ましく、酸素濃度0.01体積%以下の環境下で硬化させることが好ましい。
工程(4)では、層(A)中に残存する、滑り剤(a)、硬化性化合物(b)及び化合物(bc)からなる群より選択される化合物を硬化させることで樹脂とし、この樹脂を凹部、樹脂から突出した粒子(d)3を凸部とする凹凸形状からなるモスアイ構造を有する反射防止層が形成される。
工程(4)の後において、平均面粗さRaは、15nm以上が好ましく、30nm以上が更に好ましく、40nm以上が最も好ましい。
本発明においては、工程(1)と工程(2)の間、工程(2)と工程(3)の間、又は工程(3)と工程(4)の間に、
硬化性化合物(b)と相溶しない化合物(e)を含む層(E)を、層(A)の基材側の面とは反対の面に設ける工程(E1)を有し、
工程(E1)に引き続いて行う上記工程(2)、上記工程(3)又は上記工程(4)の後に、層(E)を除去する工程(E2)を有することが好ましい。
工程(E1)は、工程(1)から工程(3)の間に有することが好ましく、工程(2)と工程(3)の間に有することがより好ましい。
工程(E2)は、工程(4)の後に有することが好ましい。
層(E)は、硬化性化合物(b)と相溶しない化合物(e)(以下、単に「化合物(e)」ともいう)を含む。
層(E)は、層(A)中の粒子(d)が凝集しないようにするために設けられることが好ましく、最終的には除去されることが好ましい。
化合物(e)が硬化性化合物(b)と相溶しないとは、25℃において化合物(e)を硬化性化合物(b)に対して5質量%混合、撹拌した際に不溶解物が残る事である。
また、化合物(e)は熱により硬化しない化合物であることが好ましい。化合物(e)を熱により硬化しない化合物とすることで、本発明の製造方法において化合物(e)の除去前に加熱プロセスを含んでいても、粒子(d)によるモスアイ構造を形成しやすいため好ましい。
特に工程(3)の前に層(E)を設ける場合は、層(E)に含まれる化合物(e)の沸点は、工程(3)における加熱温度以上であることが好ましい。
シリコーン系油性成分は、固体状、半固体状および液状のいずれであってもよい。シリコーン系油性成分としては、例えば、シリコーン油、シリコーン系界面活性剤、シリコーン樹脂、シリコーンワックス、および、シリコーン系ゲル化剤を使用することができる。
炭化水素系油性成分としては、流動パラフィン,軽質流動イソパラフィン、重質流動イソパラフィン,ワセリン,n-パラフィン,イソパラフィン,イソドデカン、イソヘキサデカン、ポリイソブチレン、水素化ポリイソブチレン、ポリブテン,オゾケライト,セレシン,マイクロクリスタリンワックス,パラフィンワックス、ポリエチレンワックス、ポリエチレン・ポリピロピレンワックス、スクワラン,スクワレン、プリスタン,ポリイソプレン、ロウ等が例示される。
エステル系油性成分としては、オクタン酸ヘキシルデシル、オクタン酸セチル,ミリスチン酸イソプロピル,パルミチン酸イソプロピル,ステアリン酸ブチル,ラウリン酸ヘキシル,ミリスチン酸ミリスチル,オレイン酸オレイル,オレイン酸デシル,ミリスチン酸オクチルドデシル,ジメチルオクタン酸ヘキシルデシル,乳酸セチル,乳酸ミリスチル,フタル酸ジエチル,フタル酸ジブチル,酢酸ラノリン,モノステアリン酸エチレングリコール,モノステアリン酸プロピレングリコール,ジオイレイン酸プロピレングリコール,モノステアリン酸グリセリル,モノオレイン酸グリセリル,トリ2-エチルヘキサン酸グリセリル,トリ2-エチルヘキサン酸トリメチロールプロパン、トリエチルヘキサン酸ジトリメチロールプロパン、(イソステアリン酸/セバシン酸)ジトリメチロールプロパン、トリオクタン酸トリメチロールプロパン、トリイソステアリン酸トリメチロールプロパン、アジピン酸ジイソプロピル、アジピン酸ジイソブチル、アジピン酸2-ヘキシルデシル、アジピン酸ジ-2-ヘプチルウンデシル、リンゴ酸ジイソステアリル、モノイソステアリン酸水添ヒマシ油、モノイソステアリン酸N-アルキルグリコール、イソステアリン酸オクチルドデシル、イソステアリン酸イソプロピル、イソステアリン酸イソセチル、ジ-2-エチルヘキサン酸エチレングリコール、2-エチルヘキサン酸セチル、テトラ-2-エチルヘキサン酸ペンタエリスリトール、オクチルドデシルガムエステル、オレイン酸エチル、オレイン酸オクチルドデシル、ジカプリン酸ネオペンチルグリコール、クエン酸トリエチル、コハク酸2-エチルヘキシル、コハク酸ジオクチル、ステアリン酸イソセチル、セバシン酸ジイソプロピル、セバシン酸ジ-2-エチルヘキシル、セバシン酸ジエチル、セバシン酸ジオクチル、セバシン酸ジブチルオクチル、パリミチン酸セチル、パルミチン酸オクチルドデシル、パルミチン酸オクチル、パルミチン酸2-エチルヘキシル、パルミチン酸2-ヘキシルデシル、パルミチン酸2-ヘプチルウンデシル、12-ヒドロキシステアリル酸コレステリル、ジペンタエリスリトール脂肪酸エステル、ミリスチン酸2-ヘキシルデシル、ラウリン酸エチル、N-ラウロイル-L-グルタミン酸-2-オクチルドデシルエステル、N-ラウロイル-L-グルタミン酸ジ(コレステリル/ベヘニル/オクチルドデシル)、N-ラウロイル-L-グルタミン酸ジ(コレステリル/オクチルドデシル)、N-ラウロイル-L-グルタミン酸ジ(フィトステリル/ベヘニル/オクチルドデシル)、N-ラウロイル-L-グルタミン酸ジ(フィトステリル/オクチルドデシル)、N-ラウロイルサルコシンイソプロピル、リンゴ酸ジイソステアリル、ジオクタン酸ネオペンチルグリコール、ネオペンタン酸イソデシル、ネオペンタン酸イソトリデシル、ネオペンタン酸イソステアリル、イソノナン酸イソノニル、イソノナン酸イソトリデシル、イソノナン酸オクチル、イソノナン酸イソトリデシル、ジネオペンタン酸ジエチルペンタンジオール、ジネオペンタン酸メチルペンタンジオール、ネオデカン酸オクチルドデシル、ジオクタン酸2-ブチル-2-エチル-1,3-プロパンジオール、テトラオクタン酸ペンタエリスリチル、水素添加ロジンペンタエリスリチル、トリエチルヘキサン酸ペンタエリスリチル、(ヒドロキシステアリン酸/ステアリン酸/ロジン酸)ジペンタエリスリチル、テトライソステアリン酸ポリグリセリル、ノナイソステアリン酸ポリグリセリル-10、デカ(エルカ酸/イソステアリン酸/リシノレイン酸)ポリグリセリル-8、(ヘキシルデカン酸/セバシン酸)ジグリセリルオリゴエステル、ジステアリン酸グリコール(ジステアリン酸エチレングリコール)、ダイマージリノール酸ジイソプロピル、ダイマージリノール酸ジイソステアリル、ダイマージリール酸ジ(イソステアリル/フィトステリル)、ダイマージリノール酸(フィトステリル/ベヘニル)、ダイマージリノール酸(フィトステリル/イソステアリル/セチル/ステアリル/ベヘニル)、ダイマージリノール酸ダイマージリノレイル、ジイソステアリン酸ダイマージリノレイル、ダイマージリノレイル水添ロジン縮合物、ダイマージリノール酸硬化ヒマシ油、ヒドロキシアルキルダイマージリノレイルエーテル、トリイソオクタン酸グリセリル、トリイソステアリン酸グリセリル、トリミリスチン酸グリセリル、トリイソパルミチン酸グリセリル、トリオクタン酸グリセリル、トリオレイン酸グリセリル、ジイソステアリン酸グリセリル、トリ(カプリル酸/カプリン酸)グリセリル、トリ(カプリル酸/カプリン酸/ミリスチン酸/ステアリン酸)グリセリル、水添ロジントリグリセリド(水素添加エステルガム)、ロジントリグリセリド(エステルガム)、ベヘン酸エイコサン二酸グリセリル、ジ-2-ヘプチルウンデカン酸グリセリル、ミリスチン酸イソステアリン酸ジグリセリル、酢酸コレステリル、ノナン酸コレステリル、ステアリン酸コレステリル、イソステアリン酸コレステリル、オレイン酸コレステリル、12-ヒドロキシステアリン酸コレステリル、マカデミアナッツ油脂肪酸コレステリル、マカデミアナッツ油脂肪酸フィトステリル、イソステアリン酸フィトステリル、軟質ラノリン脂肪酸コレステリル、硬質ラノリン脂肪酸コレステリル、長鎖分岐脂肪酸コレステリル、長鎖α-ヒドロキシ脂肪酸コレステリル、リシノレイン酸オクチルドデシル、ラノリン脂肪酸オクチルドデシル、エルカ酸オクチルドデシル、イソステアリン酸硬化ヒマシ油、アボカド油脂肪酸エチル、ラノリン脂肪酸イソプロピル等が例示される。
天然動植物油脂類及び半合成油脂類として、アボガド油、アマニ油、アーモンド油、イボタロウ、エノ油、オリーブ油、カカオ脂、カポックロウ、カヤ油、カルナウバロウ、肝油、キャンデリラロウ、牛脂、牛脚脂、牛骨脂、硬化牛脂、キョウニン油、鯨ロウ、硬化油、小麦胚芽油、ゴマ油、コメ胚芽油、コメヌカ油、サトウキビロウ、サザンカ油、サフラワー油、シアバター、シナギリ油、シナモン油、ジョジョバロウ、オリーブスクワラン、セラックロウ、タートル油、大豆油、茶実油、ツバキ油、月見草油、トウモロコシ油、豚脂、ナタネ油、日本キリ油、ヌカロウ、胚芽油、馬脂、パーシック油、パーム油、パーム核油、ヒマシ油、硬化ヒマシ油、ヒマシ油脂肪酸メチルエステル、ヒマワリ油、ブドウ油、ベイベリーロウ、ホホバ油、水添ホホバエステル、マカデミアナッツ油、ミツロウ、ミンク油、綿実油、綿ロウ、モクロウ、モクロウ核油、モンタンロウ、ヤシ油、硬化ヤシ油、トリヤシ油脂肪酸グリセライド、羊脂、落花生油、ラノリン、液状ラノリン、還元ラノリン、ラノリンアルコール、硬質ラノリン、酢酸ラノリン、ラノリン脂肪酸イソプロピル、POE(ポリオキシエチレン)ラノリンアルコールエーテル、POEラノリンアルコールアセテート、ラノリン脂肪酸ポリエチレングリコール、POE水素添加ラノリンアルコールエーテル、卵黄油等が挙げられる。
高級脂肪酸としては、例えば、ラウリン酸、ミリスチン酸、パルミチン酸、ステアリン酸、ベヘン酸、ウンデシレン酸、オレイン酸、リノール酸、リノレン酸、アラキドン酸、エイコサペンタエン酸(EPA)、ドコサヘキサエン酸(DHA)、イソステアリン酸、12-ヒドロキシステアリン酸等が挙げられる。
高級アルコールとしては、例えば、ラウリルアルコール、ミリスチルアルコール、パルミチルアルコール、ステアリルアルコール、ベヘニルアルコール、ヘキサデシルアルコール、オレイルアルコール、イソステアリルアルコール、ヘキシルドデカノール、オクチルドデカノール、セトステアリルアルコール、2-デシルテトラデシノール、コレステロール、シトステロール、フィトステロール、ラノステロール、POEコレステロールエーテル、モノステアリルグリセリンエーテル(バチルアルコール)、モノオレイルグリセリルエーテル(セラキルアルコール)等が挙げられる。
フッ素系油性成分としては、パーフルオロポリエーテル、パーフルオロデカリン、パーフルオロオクタン等が挙げられる。
基材および硬化後の層(A)を溶解させずに、化合物(e)を溶解させる溶剤としては特に限定されないが、基材がトリアセチルセルロースである場合、メタノール、エタノール、2-プロパノール、1-プロパノール、n-ブタノール、イソブタノール、ジアセトンアルコール、メトキシプロパノールなどのアルコール系溶剤やメチルイソブチルケトン、メチルブチルケトン等のケトン系溶剤、トルエン、キシレン等の芳香族系溶剤、シクロヘキサン、プロピレングリコールモノメチルエーテルアセテート等が好ましい。これらの溶剤は複数種混ぜて用いてもよい。
前述のように、基材と層(A)の間にはその他の層を形成してもよい。この場合、基材とその他の層からなる積層体を基材と呼ぶ。その他の層としては、種々の機能層が挙げられるが、特にハードコート層が好ましい。
ハードコート層は、硬化性化合物の架橋反応、又は、重合反応により形成することが好ましい。例えば、ハードコート層は、多官能モノマー及び/又は多官能オリゴマーを含むハードコート層形成用組成物を基材上に塗布し、多官能モノマーや多官能オリゴマーを架橋反応、又は、重合反応させることにより形成することが好ましい。
多官能モノマーや多官能オリゴマーの官能基(重合性基)としては、光、電子線、放射線重合性のものが好ましく、中でも光(好ましくは紫外線)重合性官能基が好ましい。
光重合性官能基としては、(メタ)アクリロイル基、ビニル基、スチリル基、アリル基等の不飽和の重合性官能基等が挙げられ、中でも、(メタ)アクリロイル基が好ましい。
また、ハードコート層の強度は、鉛筆硬度試験で、H以上であることが好ましく、2H以上であることがさらに好ましい。さらに、JIS K 5600-5-4(1999)に従うテーバー試験で、試験前後の試験片の摩耗量が少ないほど好ましい。
ハードコート層を設けることにより、例えば鉛筆硬度試験を実施した際に、プラスチック基材(セルロースアシレート基材又はアクリル基材など)の傷つきをより防止することができる。
ハードコート層の硬化性化合物が、工程(2)において硬化されないようにするためには、以下の態様が挙げられる。なお、以下の態様においてはハードコート層形成用組成物と反射防止層形成用組成物に含まれる硬化性化合物は光硬化性化合物である。また、工程(3)においては、層(A)の硬化性化合物(b)の一部を加熱によりハードコート層に浸透させるものとする。
この態様では、基材上にハードコート層形成用組成物を塗布し、紫外線を比較的弱い露光量で照射し、光ラジカル重合開始剤Aの一部を開裂させてラジカルを発生させ、一部は開裂させない。このとき、ハードコート層の硬化性化合物の一部が硬化される。その後、ハードコート層上に反射防止層形成用組成物を塗布し、工程(2)で硬化性化合物(b)の一部を硬化させる。その後、工程(3)で未硬化の硬化性化合物(b)の一部をハードコート層に浸透させ、工程(4)で紫外線を照射し、ハードコート層の硬化性化合物と未硬化の硬化性化合物(b)を硬化させる。
この態様では、基材上にハードコート層形成用組成物を塗布し、比較的強い露光量で紫外線を照射し、光ラジカル重合開始剤Aをほぼすべて開裂させてラジカルを発生させる。このとき、ハードコート層の硬化性化合物の一部が硬化される。その後、ハードコート層上に反射防止層形成用組成物を塗布し、工程(2)で硬化性化合物(b)の一部を硬化させる。その後、工程(3)で未硬化の硬化性化合物(b)の一部をハードコート層に浸透させ、工程(4)で紫外線を照射し、未硬化の硬化性化合物(b)を硬化させる。そして、その後、加熱して、ハードコート層中の熱重合開始剤を開裂させてラジカルを発生させて硬化性化合物を硬化させる。なお、熱ラジカル重合開始剤からラジカルを発生させるための温度は、工程(3)の浸透の温度よりも高いことが好ましく、たとえば100~180℃であることが好ましい。熱ラジカル重合開始剤は、VF-096、VAm-11(以上、和光純薬工業(株)製)などを好適に用いることができる。
この態様では、基材上にハードコート層形成用組成物を塗布し、ランプAを用いて紫外線を比較的弱い露光量で照射し、光ラジカル重合開始剤Aの一部を消費し、一部を残す。このとき、ハードコート層の硬化性化合物の一部が硬化される。その後、ハードコート層上に反射防止層形成用組成物を塗布し、工程(2)でランプBを用いて紫外線を照射して硬化性化合物(b)の一部を硬化させる。その後、工程(3)で未硬化の硬化性化合物(b)の一部をハードコート層に浸透させ、工程(4)でランプAを用いて紫外線を照射し、ハードコート層の硬化性化合物と未硬化の硬化性化合物(b)を硬化させる。ランプAと光ラジカル重合開始剤Aの組み合わせとしては、例えば、特定の波長スペクトルが強い高圧水銀灯とイルガキュア907、イルガキュア369が挙げられる。また、ランプBと光ラジカル重合開始剤Bの組み合わせとしては、例えば、比較的ブロードな波長スペクトルを持つメタルハライドランプとイルガキュア127、イルガキュア184等が挙げられる。また、比較的波長の長いUV-LED光を用いて、開始剤の開裂波長をずらすことも好ましい。
この態様では、基材上にハードコート層形成用組成物を塗布し、少し熱をかけて熱ラジカル重合開始剤の一部を消費し、一部を残す。このとき、ハードコート層の硬化性化合物の一部が硬化される。その後、ハードコート層上に反射防止層形成用組成物を塗布し、工程(2)で紫外線を照射して硬化性化合物(b)の一部を硬化させる。その後、工程(3)で未硬化の硬化性化合物(b)の一部をハードコート層に浸透させ、工程(4)で紫外線を照射し、未硬化の硬化性化合物(b)を硬化させる。そして、その後、加熱して、ハードコート層中の熱ラジカル重合開始剤によりラジカルを発生させて硬化性化合物を硬化させる。なお、熱ラジカル重合開始剤からラジカルを発生させるための温度は、工程(3)の浸透の温度よりも高いことが好ましく、たとえば100~180℃であることが好ましい。
本発明の製造方法で製造された反射防止フィルムを用いた偏光板保護フィルムは、偏光子と貼り合せて偏光板とすることができ、液晶表示装置などに好適に用いることができる。
セルロースアシレートのアセチル置換度については以下の方法で測定した。
アセチル置換度は、ASTM D-817-91に準じて測定した。
下記の組成物をミキシングタンクに投入し、加熱しながら攪拌して、各成分を溶解し、エア層用セルロースアシレート溶液を調製した。
・セルロースアシレート(アセチル置換度2.86) 100質量部
・式(I)の糖エステル化合物 3質量部
・式(II)の糖エステル化合物 1質量部
・シリカ粒子分散液(平均粒径16nm) “AEROSIL R972”、日本アエロジル(株)製 0.026質量部
・メチレンクロライド 377質量部
・メタノール 61質量部
・ブタノール 2.6質量部
下記の組成物をミキシングタンクに投入し、加熱しながら攪拌して、各成分を溶解し、ドラム層用セルロースアシレート溶液を調製した。
・セルロースアシレート(アセチル置換度2.86) 100質量部
・式(I)の糖エステル化合物 3質量部
・式(II)の糖エステル化合物 1質量部
・シリカ粒子分散液(平均粒径16nm) “AEROSIL R972”、日本アエロジル(株)製 0.091質量部
・メチレンクロライド 339質量部
・メタノール 74質量部
・ブタノール 3質量部
下記の組成物をミキシングタンクに投入し、加熱しながら攪拌して、各成分を溶解し、コア層用セルロースアシレート溶液を調製した。
・セルロースアシレート(アセチル置換度2.86) 100質量部
・式(I)の糖エステル化合物 8.3質量部
・式(II)の糖エステル化合物 2.8質量部
・メチレンクロライド 266質量部
・メタノール 58質量部
・ブタノール 2.6質量部
流延ダイとして、共流延用に調整したフィードブロックを装備して、3層構造のフィルムを成形できるようにした装置を用いた。上記エア層用セルロースアシレート溶液、コア層用セルロースアシレート溶液、及びドラム層用セルロースアシレート溶液を流延口から-7℃に冷却したドラム上に共流延した。このとき、厚みの比がエア層/コア層/ドラム層=7/90/3となるように各ドープの流量を調整した。
直径3mのドラムである鏡面ステンレス支持体上に流延した。ドラム上で34℃の乾燥風を300m3/分で当てた。
そして、流延部の終点部から50cm手前で、流延して回転してきたセルロースアシレートフィルムをドラムから剥ぎ取った後、両端をピンテンターで把持した。剥離の際、搬送方向(長手方向)に8%の延伸を行った。
ピンテンターからウェブを離脱させたあと、ピンテンターで保持されていた部分を連続的に切り取り、ウェブの幅方向両端部に15mmの幅で10μmの高さの凹凸をつけた。このときのウェブの幅は1610mmであった。搬送方向に130Nのテンションをかけながら140℃で10分乾燥した。さらに、ウェブが所望の幅になるように幅方向端部を連続的に切り取り、膜厚60μmの基材1を作製した。このとき、140℃乾燥後に切り取られる幅方向端部とウェブ中央部の膜厚は同じであった。
<ハードコート層A、ハードコート層B、ハードコート層Cの形成>
フジタックTG60UL上に、下記組成のハードコート層A形成用塗布液又はハードコート層B形成用塗布液を塗布し、窒素パージにより酸素濃度1.0体積%となるよう調整しながら、空冷メタルハライドランプで照射量20mJ/cm2の紫外線を照射して硬化し、膜厚8μmのハードコート層A又はハードコート層Bを形成した。
UNIDIC17-806 55.8質量部
イルガキュア127 1.9質量部
メチルエチルケトン 24.5質量部
メチルイソブチルケトン 8.9質量部
酢酸メチル 8.9質量部
UNIDIC17-806 55.8質量部
イルガキュア127 1.9質量部
メチルエチルケトン 24.5質量部
酢酸メチル 17.8質量部
PET-30 33.4質量部
VF-096 1.4質量部
イルガキュア127 0.2質量部
メチルエチルケトン 35.8質量部
酢酸メチル 29.3質量部
PET-30:ペンタエリストールトリアクリレート60%とペンタエリストールテトラアクリレート40%の混合物(KAYARAD PET-30(日本化薬(株)社製))
イルガキュア127:光重合開始剤(BASFジャパン製)
VF-096:2,2’-アゾビス[N-(2-プロペニル)-2-メチルプロピオンアミド]:熱重合開始剤
下記反射防止層Aa1の組成となるように各成分をミキシングタンクに投入し、60分間攪拌し、30分間超音波分散機により分散し、孔径5μmのポリプロピレン製フィルターで濾過して反射防止層形成用塗布液とした。
Sirius-501 2.5質量部
化合物B 3.9質量部
KBM-4803 4.5質量部
エタノール 15.3質量部
メチルエチルケトン 32.2質量部
アセトン 15.3質量部
イルガキュア127 0.4質量部
シリカ粒子分散液α 25.9質量部
化合物D 0.08質量部
下記反射防止層Ab1の組成となるように各成分をミキシングタンクに投入し、60分間攪拌し、30分間超音波分散機により分散し、孔径5μmのポリプロピレン製フィルターで濾過して反射防止層形成用塗布液とした。
Sirius-501 2.5質量部
化合物B 3.9質量部
KBM-4803 4.5質量部
エタノール 15.3質量部
メチルエチルケトン 32.2質量部
アセトン 15.3質量部
イルガキュア127 0.4質量部
シリカ粒子分散液α 25.9質量部
P-10 0.08質量部
下記反射防止層Ac1の組成となるように各成分をミキシングタンクに投入し、60分間攪拌し、30分間超音波分散機により分散し、孔径5μmのポリプロピレン製フィルターで濾過して反射防止層形成用塗布液とした。
Sirius-501 2.5質量部
化合物B 3.9質量部
KBM-4803 4.5質量部
エタノール 15.3質量部
メチルエチルケトン 32.2質量部
アセトン 15.3質量部
イルガキュア127 0.4質量部
シリカ粒子分散液α 25.9質量部
化合物S-1 0.12質量部
式(10)
式(12)
式(13)
式(14)
ポリジメチルシロキサン末端がメタクリルオキシプロピル基で修飾されたモノマー(MCR-M11、Gelest社製)(0.2モル)、メタクリル酸アリル(0.8モル)、及び、2,2’-アゾビス(2-メチルブチロニトリル)(和光純薬工業(株)製)(0.05モル)の、1-メトキシ-2-プロパノール(300g)溶液を、窒素気流下、80℃の1-メトキシ-2-プロパノール(300g)中に4時間かけて滴下した。滴下終了後、さらに85℃で3時間撹拌し、ポリマー(P-10)を得た。このポリマー(P-10)を、ゲルパーミエーションクロマトグラフィー法により測定したところ、重量平均分子量は1.9万であった。さらに得られたポリマー(P-10)は、核磁気共鳴(NMR)により構造を同定した。
ポリジメチルシロキサン末端がメタクリルオキシプロピル基で修飾されたモノマー(MCR-M11、Gelest社製)(0.1モル)、以下の構造の化合物(M-1)(0.9モル)及び2,2’-アゾビス(2-メチルブチロニトリル)(和光純薬工業(株)製)(0.05モル)の、1-メトキシ-2-プロパノール(300g)溶液を、窒素気流下、80℃の1-メトキシ-2-プロパノール(300g)中に4時間かけて滴下した。滴下終了後、さらに85℃で3時間撹拌し、ポリマー(P-12)の前駆体(Q-12)の1-メトキシ-2-プロパノール溶液を得た。
化合物(S-1)~(S-8)は、前述の一般式(4)~(7)の具体例として記載した化合物である。
前述の一般式(4)において、nが10であり、R41が-CONH(CH2)3-であり、R42が-CH3である化合物である。
(S-9)
前述の一般式(5)において、nが10であり、R51が-CONH(CH2)3-であり、R52が-CH3である化合物である。
前述の一般式(6)において、nが10であり、R61及びR62が-CONH(CH2)3-である化合物である。
前述の一般式(7)において、nが10であり、R71及びR72が-CONH(CH2)3-である化合物である。
化合物(S-13):一般式(4)において、nが4であり、R41が-(CH2)3-であり、R42が-CH3である化合物である。
化合物(S-14):一般式(4)において、nが160であり、R41が-(CH2)3-であり、R42が-CH3である化合物である。
化合物(S-15):一般式(6)において、nが2であり、R61及びR62が-(CH2)3-である化合物である。
化合物(S-16):一般式(6)において、nが102であり、R61及びR62が-(CH2)3-である化合物である。
KE-P20を電気炉を用いて1050℃で1時間焼成した後、冷却して、次いで粉砕機を用いて粉砕した。焼成したKE-P20 5kgを、加熱ジャケットを備えた容量20Lのヘンシェルミキサ(三井鉱山株式会社製FM20J型)に仕込んだ。焼成したKE-P20を撹拌しているところに、3-アクリロキシプロピルトリメトキシシラン(信越化学工業株式会社製KBM5103)45gを、メチルアルコール90gに溶解させた溶液を滴下して混合した。その後、混合撹拌しながら150℃まで約1時間かけて昇温し、150℃で12時間保持して加熱処理を行った加熱処理では、掻き落とし装置を撹拌羽根とは逆方向に常時回転させながら、壁面付着物の掻き落としを行った。また、適宜、へらを用いて壁面付着物を掻き落とすことも行った。加熱後、冷却し、ジェット粉砕分級機を用いて解砕および分級を行い、シランカップリング剤で表面処理された粒子を得た。この粒子の表面にはアクリロイル基が付与されている。
MEK80質量部、上記シリカ粒子20質量部をミキシングタンクに投入し、10分間攪拌後、攪拌を継続しながら30分間超音波分散することにより、固形分濃度20質量%のシリカ粒子分散液αを調製した。
シリカ粒子分散液αに含まれるシリカ粒子の平均一次粒径は180nmである。
KE-P30を電気炉を用いて1050℃で1時間焼成した後、冷却して、次いで粉砕機を用いて粉砕した。焼成したKE-P30 5kgを、加熱ジャケットを備えた容量20Lのヘンシェルミキサ(三井鉱山株式会社製FM20J型)に仕込んだ。焼成したKE-P30を撹拌しているところに、3-アクリロキシプロピルトリメトキシシラン(信越化学工業株式会社製KBM5103)30gを、メチルアルコール90gに溶解させた溶液を滴下して混合した。その後、混合撹拌しながら150℃まで約1時間かけて昇温し、150℃で12時間保持して加熱処理を行った加熱処理では、掻き落とし装置を撹拌羽根とは逆方向に常時回転させながら、壁面付着物の掻き落としを行った。また、適宜、へらを用いて壁面付着物を掻き落とすことも行った。加熱後、冷却し、ジェット粉砕分級機を用いて解砕および分級を行い、シランカップリング剤で表面処理された粒子を得た。この粒子の表面にはアクリロイル基が付与されている。
MEK80質量部、上記シリカ粒子 20質量部をミキシングタンクに投入し、10分間攪拌後、攪拌を継続しながら30分間超音波分散することにより、固形分濃度20質量%のシリカ粒子分散液βを調製した。
シリカ粒子分散液βに含まれるシリカ粒子の平均一次粒径は270nmである。
PL-7(扶桑化学製)を電気炉を用いて1050℃で1時間焼成した後、冷却して、次いで粉砕機を用いて粉砕した。焼成したPL-7 5kgを、加熱ジャケットを備えた容量20Lのヘンシェルミキサ(三井鉱山株式会社製FM20J型)に仕込んだ。焼成したPL-7を撹拌しているところに、3-アクリロキシプロピルトリメトキシシラン(信越化学工業株式会社製KBM5103)65gを、メチルアルコール90gに溶解させた溶液を滴下して混合した。その後、混合撹拌しながら150℃まで約1時間かけて昇温し、150℃で12時間保持して加熱処理を行った加熱処理では、掻き落とし装置を撹拌羽根とは逆方向に常時回転させながら、壁面付着物の掻き落としを行った。また、適宜、へらを用いて壁面付着物を掻き落とすことも行った。加熱後、冷却し、ジェット粉砕分級機を用いて解砕および分級を行い、シランカップリング剤で表面処理された粒子を得た。この粒子の表面にはアクリロイル基が付与されている。
MEK80質量部、上記シリカ粒子 20質量部をミキシングタンクに投入し、10分間攪拌後、攪拌を継続しながら30分間超音波分散することにより、固形分濃度20質量%のシリカ粒子分散液γを調製した。
シリカ粒子分散液γに含まれるシリカ粒子の平均一次粒径は90nmである。
X-12-1048:アクリル基含有トリメトキシシラン(アクリル当量370、信越化学工業(株)製)
Sirius-501:デンドリマー型多官能アクリレート(アクリル当量110、大阪有機化学工業(株)製)
KBM-4803:グリシドキシオクチルトリメトキシシラン(エポキシ当量306、信越化学工業(株)製)
KE-P20:シーホスターKE-P20(平均一次粒径200nm、日本触媒(株)製アモルファスシリカ)
KE-P30:シーホスターKE-P30(平均一次粒径300nm、日本触媒(株)製アモルファスシリカ)
PL-7:クォートロンPL-7超高純度コロイダルシリカ(平均一次粒径100nm、扶桑化学工業(株)製)
8SS-723:アクリット8SS-723(架橋基当量338、大成ファインケミカル株式会社製)
8SS-1024:アクリット8SS-1024(架橋基当量263、大成ファインケミカル株式会社製)
UMS-182:重合性基含有ポリジメチルシロキサン(分子量6,500、アクリル当量545、Gelest(株)製)
X-22-164C:両末端型メタクリロイル基含有ポリジメチルシロキサンモノマー(分子量4800、アクリル当量2400、信越化学工業(株)製)
X-22-164:両末端型メタクリロイル基含有ポリジメチルシロキサンモノマー(分子量380、アクリル当量190、信越化学工業(株)製)
ハードコート層付き基材のハードコート層上に、反射防止層形成塗布液をダイコーターを用いて2.8ml/m2塗布し、室温で90秒乾燥させた。
サンプルの一部を切り出し、空冷メタルハライドランプで600mJ/cm2照射して硬化させた後、ミクロトームで切削して断面を出し、5000倍でSEM観察を行い、粒子に対する樹脂の厚みを測定した。すべての実施例及び比較例において、粒子が存在しない部分の樹脂の厚みは粒子の平均一次粒径の0.8倍以上の厚さであった。
工程(2)に反射防止層側から、空冷メタルハライドランプを用いて、酸素濃度1.0%環境において、2.0mJ/cm2照射して、硬化率6%のサンプルを作成した。空冷メタルハライドランプとしては、アイグラフィックス(株)製のM04-L41を用いた。
照射量の測定は、アイグラフィック社製 アイ紫外線積算照度計 UV METER UVPF-A1にHEAD SENSER PD-365を取り付け、測定レンジ0.0にて測定した。
試料102については、基材の反射防止層側の界面とは反対側から光照射を実施した。
下記組成のオイル液(いずれも信越化学工業製のシリコーンオイル)を、反射防止層の上に、ダイコーターを用いて600nmの厚さになるように塗布した。
オイル液の組成
KF96-10cs 30.0質量部
KF96-0.65cs 70.0質量部
工程(2)の後の基材、ハードコート層、及び反射防止層を有する積層体を120℃で5分処理し、硬化性化合物の一部を基材へ浸透させた。
酸素濃度が0.01体積%以下の雰囲気になるように窒素パージしながら、前述の空冷メタルハライドランプで600mJ/cm2の紫外線を照射して、反射防止層の硬化性化合物を硬化させて樹脂とした。
サンプルの一部を切り出し、ミクロトームで切削して断面を出し、5000倍でSEM観察を行い、粒子に対する樹脂(粒子が存在しない部分)の厚みを測定した。工程(1)後のSEM観察像と比較して、樹脂の厚みが粒子の平均一次粒径の0.4倍以上減膜しているものを工程(3)で硬化性化合物の一部が浸透したと判断した。
オイル塗布を行った例については、メチルイソブチルケトンに浸漬後、更にメチルイソブチルケトンを掛け流して、オイルを除去した。
ハードコート層形成用組成物に熱重合開始剤を含有する試料102については、工程(4)の後、150℃で5分間熱処理し、ハードコート層を硬化させた。
反射防止フィルムの反射防止層表面をラビングテスターを用いて、以下の条件でこすりテストを行うことで、耐擦傷性の指標とした。
評価環境条件:25℃、相対湿度60%
こすり材:スチールウール(日本スチールウール(株)製、ゲレードNo.0000)
試料と接触するテスターのこすり先端部(1cm×1cm)に巻いて、バンド固定
移動距離(片道):13cm、
こすり速度:13cm/秒、
荷重:200g/cm2、
先端部接触面積:1cm×1cm、
こすり回数:10往復
こすり終えた試料の裏側に油性黒インキ(寺西化学工業(株)製、マジック補充用インキ黒)を塗り、反射光で目視観察して、こすり部分の傷を評価した。
A+:傷の本数が0本である
A :傷の本数が1本以上2本以内である
B :傷の本数が3本以上5本以内である
C :傷の本数が6本以上である
反射防止フィルムの裏面(基材側)をサンドペーパーで粗面化した後に油性黒インキで処理し、裏面反射をなくしたフィルム試料を作製した。
(鏡面反射率)
分光光度計V-550(日本分光(株)製)にユニットARM-500∨を装着して、450~650nmの波長領域において入射角5°における反射率を測定し、平均したものを鏡面反射率とした。
(スチールウール耐擦傷性試験前後の鏡面反射率差)
上記スチールウール耐擦傷性試験後の鏡面反射率をRAとし、スチールウールで擦る前の鏡面反射率をR0として、(RA-R0)で表される反射率変化を算出した。
フィルムをミクロトームで切削し、断面を飛行時間型二次イオン質量分析装置(TOF-SIMS)で分析し、最表面から20nm深さまでの領域(表面近傍)の状態を観察した。Xを反射防止層の表面近傍におけるフッ素量あるいはシリコーン(シロキサン結合)量、Yを滑り剤(a)単膜でのフッ素量、あるいはシリコーン(シロキサン結合)量としたときの100*(X/Y)を算出した。滑り剤(a)の低摩擦部位を表す二次イオンとしてはF-フラグメントあるいはSi2C5H15O+フラグメントを検出した。
試料No.13はけん化処理後もスチールウール耐性A+を維持し良好であったのに対し、試料No.22はスチールウール耐性がAに劣化したことを確認した。
本出願は、2016年2月25日出願の日本特許出願(特願2016-033786)に基づくものであり、その内容はここに参照として取り込まれる。
2 反射防止層
3 粒子
4 層(A)、樹脂
10 反射防止フィルム
A 隣り合う凸部の頂点間の距離
B 隣り合う凸部の頂点間の中心と凹部との距離
S 領域(S)
t 領域(S)の膜厚
Claims (16)
- 基材上に、少なくとも1層の反射防止層を有し、
前記反射防止層は、前記基材側の面とは反対側の最表面から前記基材に向かう方向に20nm以下の厚みの領域(S)内に、
1分子中に架橋基を3つ以上持ち、架橋基当量が450以下であり、フッ素原子及びシロキサン結合の少なくとも一種を含む部位を有する滑り剤(a)と、
少なくとも1分子中に架橋基を3つ以上持ち、架橋基当量が450以下であり、フッ素原子及びシロキサン結合のいずれも有さない硬化性化合物(b)と、
光重合開始剤(c)と、を含む硬化性組成物の硬化物を含み、
前記領域(S)の断面方向の素材分布において、前記滑り剤(a)の含有率が51%以上となる領域を有する、反射防止フィルム。 - 前記反射防止層の前記基材側の面とは反対側の最表面を、荷重200gの条件でスチールウールで10往復擦った後の前記反射防止フィルムの反射率をRA、スチールウールで擦る前の前記反射防止フィルムの反射率をR0としたとき、RA-R0で表される反射率変化が0.25%以下である、請求項1に記載の反射防止フィルム。
- 前記滑り剤(a)の前記架橋基が(メタ)アクリロイル基である、請求項1又は2に記載の反射防止フィルム。
- 前記滑り剤(a)の前記フッ素原子及びシロキサン結合の少なくとも一種を含む部位は、フルオロアルキル基である、請求項1~3のいずれか1項に記載の反射防止フィルム。
- 前記滑り剤(a)の前記フッ素原子及びシロキサン結合の少なくとも一種を含む部位は、ポリジメチルシロキサン基又はポリエーテル変性ジメチルシロキサン基である、請求項1~3のいずれか1項に記載の反射防止フィルム。
- 前記滑り剤(a)は、側鎖に前記フッ素原子及びシロキサン結合の少なくとも一種を含む部位と前記架橋基を持ち、重量平均分子量が6,000以上である化合物(a1)である、請求項4又は5に記載の反射防止フィルム。
- 前記化合物(a1)は、前記架橋基がC-C結合又はC-O結合で主鎖に連結している、請求項6に記載の反射防止フィルム。
- 前記滑り剤(a)は、前記フッ素原子及びシロキサン結合の少なくとも一種を含む部位に、前記架橋基が直接又は連結基を介して結合した、重量平均分子量が6,000未満である化合物(a2)である、請求項4又は5に記載の反射防止フィルム。
- 前記化合物(a2)は、
下記一般式(M-2)で表される基を1つ有する化合物、
下記一般式(M-3)で表される基を1つ有する化合物、
下記一般式(M-1)で表される基を2つ有する化合物、
下記一般式(M-2)で表される基を2つ有する化合物、又は、
下記一般式(M-3)で表される基を2つ有する化合物である、請求項8に記載の反射防止フィルム。
一般式(M-1)中、R1は水素原子、アルキル基、アルケニル基、アルキルオキシ基、アルケニルオキシ基、アルキルオキシアルキル基、又はアルケニルオキシアルキル基表す。R11及びR12は各々独立に水素原子又はメチル基を表す。*は結合位置を表す。
一般式(M-2)中、R21~R23は各々独立に水素原子又はメチル基を表す。*は結合位置を表す。
一般式(M-3)中、R31~R35は各々独立に水素原子又はメチル基を表す。*は結合位置を表す。 - 前記化合物(a2)は、前記フッ素原子及びシロキサン結合の少なくとも一種を含む部位と、前記架橋基とがC-C結合又はC-O結合を介して結合している、請求項8に記載の反射防止フィルム。
- 前記反射防止層は、平均一次粒径が250nm以下の粒子(d)を有する、請求項1~10のいずれか1項に記載の反射防止フィルム。
- 前記反射防止層の前記基材側とは反対側の表面に前記粒子(d)によって形成された凹凸形状を有する、請求項11に記載の反射防止フィルム。
- 前記基材の可視光の透過率が80%以上である、請求項1~12のいずれか1項に記載の反射防止フィルム。
- 前記反射防止層には、前記基材の表面に直交する方向に前記粒子(d)が複数存在しない、請求項12に記載の反射防止フィルム。
- 請求項12に記載の反射防止フィルムの製造方法であって、
前記基材上に、
前記滑り剤(a)、前記硬化性化合物(b)、前記光重合開始剤(c)、前記粒子(d)、及び溶剤を含む組成物を塗布し、前記溶剤を揮発させ、前記粒子(d)が存在しない部分の厚みが前記粒子(d)の平均一次粒径の0.8倍以上の厚さとなる層(A)を設ける工程(1)と、
前記層(A)中の前記硬化性化合物(b)の一部を硬化させ、硬化された化合物(bc)を得る工程(2)と、
前記層(A)中の前記硬化性化合物(b)及び前記化合物(bc)からなる群より選択される化合物の一部を、加熱により前記基材に浸透させるか又は揮発させ、前記層(A)の前記基材側とは反対の最表面に前記粒子(d)からなる凹凸形状を形成する工程(3)と、
前記層(A)中に残存する、前記滑り剤(a)、前記硬化性化合物(b)及び前記化合物(bc)からなる群より選択される化合物を硬化させて、前記反射防止層を形成する工程(4)と、
をこの順に有する、反射防止フィルムの製造方法。 - 前記工程(1)と前記工程(2)の間、前記工程(2)と前記工程(3)の間、又は前記工程(3)と前記工程(4)の間に、
前記硬化性化合物(b)とは相溶しない化合物(e)を含む層(E)を、前記層(A)の前記基材側の面とは反対側の面上に設ける工程(E1)を有し、
前記工程(E1)に引き続いて行う前記工程(2)、前記工程(3)又は前記工程(4)の後に、前記層(E)を除去する工程(E2)を有する、請求項15に記載の反射防止フィルムの製造方法。
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