JPWO2022130990A1 - - Google Patents

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Publication number
JPWO2022130990A1
JPWO2022130990A1 JP2022569846A JP2022569846A JPWO2022130990A1 JP WO2022130990 A1 JPWO2022130990 A1 JP WO2022130990A1 JP 2022569846 A JP2022569846 A JP 2022569846A JP 2022569846 A JP2022569846 A JP 2022569846A JP WO2022130990 A1 JPWO2022130990 A1 JP WO2022130990A1
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JP
Japan
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JP2022569846A
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JP7288234B2 (ja
JPWO2022130990A5 (ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0012—Processes making use of the tackiness of the photolithographic materials, e.g. for mounting; Packaging for photolithographic material; Packages obtained by processing photolithographic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/068—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32—Polymers modified by chemical after-treatment
    • C08G65/329—Polymers modified by chemical after-treatment with organic compounds
    • C08G65/336—Polymers modified by chemical after-treatment with organic compounds containing silicon
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/42—Block-or graft-polymers containing polysiloxane sequences
    • C08G77/46—Block-or graft-polymers containing polysiloxane sequences containing polyether sequences
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D201/00—Coating compositions based on unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/47—Levelling agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Chemical & Material Sciences (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2022569846A 2020-12-17 2021-12-02 化合物、レベリング剤、コーティング組成物、レジスト組成物及び物品 Active JP7288234B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020209102 2020-12-17
JP2020209102 2020-12-17
PCT/JP2021/044182 WO2022130990A1 (ja) 2020-12-17 2021-12-02 化合物、レベリング剤、コーティング組成物、レジスト組成物及び物品

Publications (3)

Publication Number Publication Date
JPWO2022130990A1 true JPWO2022130990A1 (ja) 2022-06-23
JPWO2022130990A5 JPWO2022130990A5 (ja) 2023-04-17
JP7288234B2 JP7288234B2 (ja) 2023-06-07

Family

ID=82057579

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022569846A Active JP7288234B2 (ja) 2020-12-17 2021-12-02 化合物、レベリング剤、コーティング組成物、レジスト組成物及び物品

Country Status (7)

Country Link
US (1) US20240061329A1 (ja)
EP (1) EP4265661A1 (ja)
JP (1) JP7288234B2 (ja)
KR (1) KR20230066097A (ja)
CN (1) CN116615484A (ja)
TW (1) TW202231692A (ja)
WO (1) WO2022130990A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023140036A1 (ja) * 2022-01-18 2023-07-27 Dic株式会社 シリコーン鎖含有重合体、シリコーン鎖含有重合体の製造方法、コーティング組成物、レジスト組成物及び物品
WO2024063068A1 (ja) * 2022-09-22 2024-03-28 ダウ・東レ株式会社 紫外線硬化性組成物およびその用途
WO2024101164A1 (ja) * 2022-11-10 2024-05-16 Dic株式会社 レジスト組成物およびその硬化物

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0423819A (ja) * 1990-05-18 1992-01-28 Japan Synthetic Rubber Co Ltd 酸素透過性高分子材料の製造方法
JPH04126712A (ja) * 1990-09-17 1992-04-27 Nippon Kayaku Co Ltd シリコン含有（メタ）アクリレート、これを含有する樹脂組成物及びその硬化物
JPH08242903A (ja) * 1995-03-14 1996-09-24 Achilles Corp 靴底の芯材及び同芯材を用いたインジェクション製靴方法
JPH11133652A (ja) * 1997-10-31 1999-05-21 Konica Corp 静電荷像現像用キャリアとそれを用いた現像剤及び現像方法
US20150252125A1 (en) * 2014-03-10 2015-09-10 Cheil Industries Inc. Curable resin compositions and barrier stacks including the same
WO2017146180A1 (ja) * 2016-02-25 2017-08-31 富士フイルム株式会社 反射防止フィルム、及び反射防止フィルムの製造方法
US20180215850A1 (en) * 2015-10-21 2018-08-02 Chem Optics Inc. Photocurable resin composition and method of forming patterns using the same
JP2018150512A (ja) * 2017-01-18 2018-09-27 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 光硬化性組成物及びそれから形成された光硬化膜
CN109369880A (zh) * 2018-10-08 2019-02-22 武汉大学 一种可光固化的甲基苯基有机硅改性聚氨酯(甲基)丙烯酸酯树脂及其制备方法和应用

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL128965C (ja) 1963-09-06
JPH0542201A (ja) * 1990-09-27 1993-02-23 Japan Synthetic Rubber Co Ltd 酸素透過性眼科用材料
JPH08292403A (ja) * 1995-04-25 1996-11-05 Asahi Chem Ind Co Ltd 眼用レンズ材料
DE10048258B4 (de) 2000-09-29 2004-08-19 Byk-Chemie Gmbh Verlaufmittel für Oberflächenbeschichtungen
JP6979791B2 (ja) 2017-05-26 2021-12-15 楠本化成株式会社 両親媒性ブロック共重合体を利用した塗料用レベリング剤
JP7074641B2 (ja) * 2018-10-29 2022-05-24 信越化学工業株式会社 （メタ）アクリロイル基含有オルガノシロキサン
JP7026602B2 (ja) * 2018-10-31 2022-02-28 信越化学工業株式会社 放射線硬化性有機ケイ素樹脂組成物

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0423819A (ja) * 1990-05-18 1992-01-28 Japan Synthetic Rubber Co Ltd 酸素透過性高分子材料の製造方法
JPH04126712A (ja) * 1990-09-17 1992-04-27 Nippon Kayaku Co Ltd シリコン含有（メタ）アクリレート、これを含有する樹脂組成物及びその硬化物
JPH08242903A (ja) * 1995-03-14 1996-09-24 Achilles Corp 靴底の芯材及び同芯材を用いたインジェクション製靴方法
JPH11133652A (ja) * 1997-10-31 1999-05-21 Konica Corp 静電荷像現像用キャリアとそれを用いた現像剤及び現像方法
US20150252125A1 (en) * 2014-03-10 2015-09-10 Cheil Industries Inc. Curable resin compositions and barrier stacks including the same
US20180215850A1 (en) * 2015-10-21 2018-08-02 Chem Optics Inc. Photocurable resin composition and method of forming patterns using the same
WO2017146180A1 (ja) * 2016-02-25 2017-08-31 富士フイルム株式会社 反射防止フィルム、及び反射防止フィルムの製造方法
JP2018150512A (ja) * 2017-01-18 2018-09-27 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 光硬化性組成物及びそれから形成された光硬化膜
CN109369880A (zh) * 2018-10-08 2019-02-22 武汉大学 一种可光固化的甲基苯基有机硅改性聚氨酯(甲基)丙烯酸酯树脂及其制备方法和应用

Also Published As

Publication number Publication date
US20240061329A1 (en) 2024-02-22
EP4265661A1 (en) 2023-10-25
TW202231692A (zh) 2022-08-16
JP7288234B2 (ja) 2023-06-07
WO2022130990A1 (ja) 2022-06-23
KR20230066097A (ko) 2023-05-12
CN116615484A (zh) 2023-08-18

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