WO2017124711A1 - 液晶涂覆装置及方法 - Google Patents

液晶涂覆装置及方法 Download PDF

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Publication number
WO2017124711A1
WO2017124711A1 PCT/CN2016/090093 CN2016090093W WO2017124711A1 WO 2017124711 A1 WO2017124711 A1 WO 2017124711A1 CN 2016090093 W CN2016090093 W CN 2016090093W WO 2017124711 A1 WO2017124711 A1 WO 2017124711A1
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Prior art keywords
liquid crystal
gas
coating apparatus
head
gas cooling
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PCT/CN2016/090093
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English (en)
French (fr)
Inventor
马健
任文明
刘玉东
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京东方科技集团股份有限公司
合肥鑫晟光电科技有限公司
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Priority to US15/513,182 priority Critical patent/US10268085B2/en
Publication of WO2017124711A1 publication Critical patent/WO2017124711A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/001—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work incorporating means for heating or cooling the liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0208—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles
    • B05C5/0212—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles only at particular parts of the articles
    • B05C5/0216—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles only at particular parts of the articles by relative movement of article and outlet according to a predetermined path
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0225—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work characterised by flow controlling means, e.g. valves, located proximate the outlet
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • G02F1/13415—Drop filling process
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/3501—Constructional details or arrangements of non-linear optical devices, e.g. shape of non-linear crystals
    • G02F1/3505—Coatings; Housings; Supports

Definitions

  • Embodiments of the present invention relate to a liquid crystal coating apparatus and a method of performing liquid crystal coating using the same.
  • TFT-LCDs thin-film transistor liquid crystal displays
  • the liquid crystal panel includes an array substrate and an opposite substrate disposed opposite to each other and a liquid crystal layer disposed between the array substrate and the opposite substrate.
  • the filling of the liquid crystal is a very important process, which includes the following steps: first filling the liquid crystal between the array substrate and the opposite substrate through a filling device such as an inkjet printing device, and then A sealant is applied between the array substrate and the opposite substrate under vacuum to sandwich the array substrate and the opposite substrate and seal the liquid crystal layer between the array substrate and the opposite substrate.
  • the liquid crystal and the sealant are coated separately on different substrates.
  • the sealant is a translucent gel at room temperature.
  • the liquid crystal coated on the substrate diffuses toward the periphery, especially in the direction of the alignment rubbing, and is in contact with the sealant before it is completely cured; in this case, the dissolution of the small molecular components of the sealant can contaminate the liquid crystal, thereby causing There are problems such as uneven brightness of the display and residual images around the liquid crystal panel, which reduces the quality and yield of the liquid crystal panel.
  • a liquid crystal coating apparatus includes a liquid crystal head and a gas cooling device, the gas cooling device is located behind the liquid crystal head along a movement track of the liquid crystal head, and the gas cooling device moves along a movement track of the liquid crystal head .
  • the gas cooling device includes a pneumatic system and a jet chamber, and the jet chamber passes The pneumatic system is in communication with a gas storage device.
  • the pneumatic system is provided with a flow valve that controls the flow of gas.
  • the bottom of the jet chamber is provided with a slit-shaped air outlet.
  • the jet chamber is used to spray a low temperature drying gas.
  • the low temperature drying gas is nitrogen or carbon dioxide.
  • the liquid crystal coating apparatus further includes a mouth-shaped frame, the frame drives the liquid crystal head and the gas cooling device to move synchronously, and the liquid crystal head and the gas cooling device are fixed to the frame along a moving direction thereof. Both ends.
  • the liquid crystal coating apparatus further includes a heat insulating baffle disposed between the liquid crystal head and the gas cooling, the heat insulating baffle being disposed in a direction perpendicular to a movement trajectory of the liquid crystal head and the gas cooling device.
  • the cooling device is disposed closer to the heat insulating baffle than the liquid crystal shower head.
  • the bottom of the liquid crystal head is provided with a nozzle, and a bottom edge of the heat insulating baffle is higher than a nozzle of the liquid crystal head.
  • a liquid crystal coating method includes: S1: spraying a liquid crystal of a set pattern on a substrate through a liquid crystal head; and S2, while spraying the liquid crystal, the gas cooling device cools the liquid crystal along a trajectory of the liquid crystal head, and reduces the liquid crystal. fluidity.
  • a sealant is disposed in a peripheral region of the substrate, and the method includes: thermally curing the sealant while simultaneously heating the liquid crystal to restore fluidity.
  • the gas cooling device ejects a low-temperature drying gas to the substrate through a slit-type gas outlet.
  • the low temperature drying gas is nitrogen or carbon dioxide.
  • FIG. 1 is a schematic structural view of a liquid crystal coating apparatus according to an embodiment of the present invention.
  • FIG. 2 is a schematic view showing the application of a liquid crystal coating apparatus according to an embodiment of the present invention.
  • an embodiment of the present invention provides a liquid crystal coating apparatus including a liquid crystal head 3 for performing liquid crystal 2 coating and a gas cooling device 6 for cooling the coated liquid crystal 2.
  • the gas cooling device 6 is located behind the liquid crystal head 3, the gas cooling device 6 moves along the movement path of the liquid crystal head 3, and the liquid crystal head 3 ejects liquid crystal, for example, through its nozzle 4, while the gas cooling device 6 The liquid crystal 2 is rapidly cooled.
  • the gas cooling device 6 includes a gas path system 63 and a gas injection chamber 61.
  • the gas injection chamber 61 communicates with the gas storage device 9 via a gas path system 63.
  • the gas path system 63 is provided with a flow valve for controlling the flow of the gas through the gas path system 63.
  • the flow valve can adjust the magnitude of the gas flow rate and the temperature of the low temperature gas to achieve a good cooling effect by gently applying a low temperature gas to the liquid crystal 2 on the surface of the substrate 1.
  • the bottom of the jet chamber 61 is provided with a slit-type air outlet 62.
  • the slit-type air outlet 62 is used for spraying a low-temperature drying gas, and when the slit-type air outlet 62 is used for jetting, the gas discharge direction can be concentrated, which is advantageous for The liquid crystal 2 is rapidly cooled.
  • the low temperature drying gas 7 is stored in the gas storage device 9.
  • the low-temperature drying gas 7 is, for example, nitrogen or carbon dioxide. The cost of nitrogen and carbon dioxide is lower, the cooling effect is better, and the temperature of the low-temperature drying gas 7 can be selected to be selected in a wide range.
  • the liquid crystal head 3 and the gas cooling device 6 are fixed together on the mouth-shaped frame 5, the frame 5 drives the liquid crystal head 3 and the gas cooling device 6 to move synchronously, and the liquid crystal head 3 and the gas cooling device 6 are along the liquid crystal.
  • the moving direction of the head and the gas cooling device itself is fixed to both ends of the frame 5, ensuring that the gas cooling device 6 cools the liquid crystal 2 in a timely manner.
  • a heat insulating baffle 8 is disposed between the liquid crystal head 3 and the gas cooling device 6.
  • the heat insulating baffle 8 is disposed in a direction perpendicular to the movement track of the liquid crystal head 3 and the gas cooling device 6, and can block low temperature drying.
  • the action of the gas 7 avoids the influence of the low-temperature drying gas 7 on the temperature of the liquid crystal 2 in the liquid crystal head 3, and ensures the coating property of the liquid crystal 2.
  • the heat shield baffle 8 is fixed to the frame 5 in a direction perpendicular to the movement of the frame 5.
  • the cooling device 6 is disposed closer to the heat insulating baffle than the liquid crystal head 3 8;
  • the heat insulating baffle 8 is disposed adjacent to the gas cooling device 6.
  • the function of blocking the low-temperature drying gas 7 can be better.
  • the bottom edge of the heat insulating baffle 8 is higher than the nozzle 4 of the liquid crystal head 3, preventing the heat insulating baffle 8 from contacting the liquid crystal 2 on the surface of the substrate 1.
  • the working principle of the liquid crystal coating apparatus of the embodiment of the present invention is that the liquid crystal head 3 ejects liquid crystal to apply the liquid crystal 2 on the substrate 1, and the gas cooling device 6 moves along the movement track of the liquid crystal head 3 and passes through the slit type.
  • the gas port 62 ejects a high-purity low-temperature drying gas 7 (such as nitrogen or carbon dioxide) onto the liquid crystal 2 coated on the substrate 1, causing the temperature of the liquid crystal 2 to rapidly decrease, and the fluidity of the liquid crystal 2 is rapidly lowered and viscous at a low temperature.
  • the coefficient is significantly increased to effectively prevent its diffusion from contact with the sealant.
  • the embodiment of the present invention further provides a liquid crystal coating method using the liquid crystal coating device as described above, and the schematic diagram of the liquid crystal coating device in use is as shown in FIG. 2 .
  • the liquid crystal coating method provided by the embodiment of the present invention includes:
  • the liquid crystal head 3 is uniformly sprayed onto the substrate 1 to set a pattern and a quantity of liquid crystal 2;
  • the gas cooling device 6 cools the liquid crystal 2 on the substrate 1 with a high-purity low-temperature drying gas 7 to cool the liquid crystal 2, thereby reducing the fluidity of the liquid crystal 2 and improving the viscosity.
  • the lag coefficient reduces the diffusion speed of the liquid crystal 2;
  • a frame sealant is disposed in a peripheral region of the substrate 1, and the sealant is thermally cured to gradually increase the liquidity of the liquid crystal 2 to restore fluidity, fill the entire substrate 1, improve the quality of the liquid crystal 2 coating, and achieve a uniform cell thickness.
  • step S2 the gas cooling device 6 discharges the low-temperature drying gas 7 to the substrate 1 through the slit type gas outlet 62, and cools the liquid crystal 2 by the low-temperature drying gas 7, thereby avoiding contamination of the liquid crystal 2.
  • the low-temperature drying gas 7 is nitrogen or carbon dioxide, and the cost of nitrogen and carbon dioxide is low, and the cooling effect is good.
  • the liquid crystal coating method provided by the embodiment of the invention can effectively solve the pollution problem caused by the excessive diffusion of the liquid crystal without changing the design of the product, is easy to realize and does not affect the process progress, can improve the productivity, and has the coating method. It is not limited by the size of the product and can be widely applied.

Abstract

一种液晶涂覆装置及方法。液晶涂覆装置包括液晶喷头（3）和气体冷却装置（6），沿着液晶喷头（3）的运动轨迹，气体冷却装置（6）位于液晶喷头（3）的后方，并且气体冷却装置（6）沿液晶喷头（3）的运动轨迹运动。有效解决液晶扩散速度太快而与封框胶接触后导致的液晶污染问题。

Description

液晶涂覆装置及方法 技术领域
本发明的实施例涉及一种液晶涂覆装置及采用此装置进行液晶涂覆的方法。
背景技术
目前，高品质、低功耗、无辐射的薄膜晶体管液晶显示器(TFT-LCD)已成为显示器市场的主流。
液晶显示器的最主要部件是液晶面板。液晶面板包括彼此相对设置的阵列基板和对向基板以及设置在阵列基板和对向基板之间的液晶层。在液晶面板的成盒工艺中，液晶的填充是一道很至关重要的工序，其包括以下步骤：先通过填充设备如喷墨打印设备将液晶填充于阵列基板和对向基板之间，再在真空条件下在阵列基板和对向基板之间涂覆封框胶以将阵列基板和对向基板对盒在一起并将液晶层密封在阵列基板和对向基板之间。通常，液晶和封框胶分别涂覆在不同的基板上。封框胶在常温下为半透明的胶状物，在阵列基板和对向基板对盒之后需要通过紫外固化和热固化使其内部分子发生交联反应并完全固化。
目前，涂覆在基板上的液晶会向周边尤其沿配向摩擦方向扩散并且在封框胶完全固化前与之接触；在此情况下，封框胶的小分子成分等溶出会污染液晶，从而导致液晶面板周边出现显示器亮度不均匀的现象及残像等问题，降低了液晶面板的品质和良率。
发明内容
根据本发明的实施例，提供一种液晶涂覆装置。该液晶涂覆装置包括液晶喷头和气体冷却装置，沿着所述液晶喷头的运动轨迹所述气体冷却装置位于所述液晶喷头的后方，并且所述气体冷却装置沿所述液晶喷头的运动轨迹运动。
例如，所述气体冷却装置包括气路系统和喷气腔体，所述喷气腔体通过 所述气路系统与储气装置连通。
例如，所述气路系统上设有控制气体流量的流量阀。
例如，所述喷气腔体的底部设有狭缝式出气口。
例如，所述喷气腔体用于喷射低温干燥气体。
例如，所述低温干燥气体为氮气或者二氧化碳。
例如，所述液晶涂覆装置还包括口字型机架，所述机架带动所述液晶喷头和气体冷却装置同步运动，所述液晶喷头和气体冷却装置沿其运动方向固定于所述机架的两端。
例如，所述液晶涂覆装置还包括设置在所述液晶喷头和气体冷却之间的隔热挡板，所述隔热挡板沿垂直于液晶喷头和气体冷却装置运动轨迹的方向设置。
例如，与所述液晶喷头相比，所述冷却装置设置为更靠近所述隔热挡板。
例如，所述液晶喷头的底部设置有喷嘴，所述隔热挡板的底边高于所述液晶喷头的喷嘴。
根据本发明的实施例，提供一种液晶涂覆方法。该方法包括：S1、通过液晶喷头向基板上喷涂设定图案的液晶；以及S2、喷涂所述液晶的同时，气体冷却装置沿着所述液晶喷头的轨迹对液晶进行降温，降低所述液晶的流动性。
例如，在所述基板的周边区域设置有封框胶，并且所述方法包括：对封框胶进行热固化处理，同时使液晶逐渐升温恢复流动性。
例如，在所述步骤S2中，所述气体冷却装置通过狭缝式出气口向所述基板喷出低温干燥气体。
例如，所述低温干燥气体为氮气或者二氧化碳。
附图说明
为了更清楚地说明本发明实施例的技术方案，下面将对实施例的附图作简单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例，而非对本发明的限制。
图1为根据本发明实施例的液晶涂覆装置的结构示意图；并且
图2为根据本发明实施例的液晶涂覆装置的应用示意图。
具体实施方式
为使本发明实施例的目的、技术方案和优点更加清楚，下面将结合附图，对本发明实施例的技术方案进行清楚、完整地描述。显然，所描述的实施例是本发明的一部分实施例，而不是全部的实施例。基于所描述的本发明的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本发明保护的范围。
如图1和2所示，本发明实施例提供一种液晶涂覆装置，包括用于进行液晶2涂覆的液晶喷头3和用于对已涂覆的液晶2进行冷却的气体冷却装置6，沿着液晶喷头3的运动轨迹气体冷却装置6位于液晶喷头3的后方，气体冷却装置6沿液晶喷头3的运动轨迹运动，液晶喷头3例如通过其喷嘴4喷出液晶，同时气体冷却装置6对液晶2进行迅速冷却。
气体冷却装置6包括气路系统63和喷气腔体61，喷气腔体61通过气路系统63与储气装置9连通，气路系统63上设有控制气体流量的流量阀，通过气路系统63的流量阀可以调整气体流量的大小以及低温气体的温度等，以实现将低温气体温和地作用于基板1表面的液晶2上，实现良好的冷却效果。喷气腔体61的底部设有狭缝式出气口62，狭缝式出气口62用于喷射低温干燥气体，采用狭缝式出气口62进行喷气时可以使气体的喷出方向集中，有利于对液晶2进行迅速降温。储气装置9内存储低温干燥气体7。本发明实施例中，低温干燥气体7例如为氮气或者二氧化碳。氮气和二氧化碳的成本较低、冷却效果较好，且可以保证低温干燥气体7的温度可在很大范围内选择。
本发明实施例中，液晶喷头3和气体冷却装置6共同固定于口字型机架5上，机架5带动液晶喷头3和气体冷却装置6同步运动，液晶喷头3和气体冷却装置6沿液晶喷头和气体冷却装置自身的运动方向固定于机架5的两端，保证气体冷却装置6更及时地对液晶2进行冷却。
此外，液晶喷头3和气体冷却装置6之间设有隔热挡板8，例如，隔热挡板8沿垂直于液晶喷头3和气体冷却装置6运动轨迹的方向设置，可以起到阻隔低温干燥气体7的作用，避免低温干燥气体7对液晶喷头3中液晶2温度的影响，保证液晶2的涂覆性。例如，隔热挡板8沿垂直于机架5运动的方向固定于机架5上。
本发明实施例中，与液晶喷头3相比冷却装置6设置为更靠近隔热挡板 8；换言之，隔热挡板8靠近气体冷却装置6设置。这样一来，能更好的起到阻隔低温干燥气体7的作用。例如，隔热挡板8的底边高于液晶喷头3的喷嘴4，防止隔热挡板8接触到基板1表面上的液晶2。
本发明实施例的液晶涂覆装置的工作原理为：液晶喷头3喷出液晶以将液晶2涂覆在基板1上，气体冷却装置6沿着液晶喷头3的运动轨迹运动并通过狭缝式出气口62往已涂覆在基板1上的液晶2喷出高纯的低温干燥气体7(如氮气或者二氧化碳等)，促使液晶2温度迅速降低，低温下液晶2的流动性迅速降低，且黏滞系数显著增加，有效避免其扩散与封框胶的接触。
本发明实施例还提供一种液晶涂覆方法，采用如上所述的液晶涂覆装置，该液晶涂覆装置在使用时的示意图如图2所示。
例如，本发明实施例提供的液晶涂覆方法包括：
S1、通过液晶喷头3向基板1上均匀地喷涂设定图案、数量的液晶2；
S2、喷涂液晶2的同时，气体冷却装置6沿着液晶喷头3的运动轨迹对基板1上的液晶2温和地喷出高纯的低温干燥气体7进行降温，降低液晶2的流动性，提高黏滞系数，降低液晶2扩散速度；
S3、在基板1的周边区域设置封框胶，对封框胶进行热固化处理，使液晶2逐渐升温恢复流动性，填充整个基板1，提高液晶2涂覆的质量并实现均一的盒厚。
步骤S2中，气体冷却装置6通过狭缝式出气口62向基板1喷出低温干燥气体7，通过低温干燥气体7对液晶2进行冷却，避免对液晶2产生污染。例如，低温干燥气体7为氮气或者二氧化碳，氮气和二氧化碳的成本较低，且其冷却效果较好。
本发明实施例所提供的液晶涂覆方法，可以在不改变产品设计的前提下有效解决液晶扩散过快带来的污染问题，易实现且不影工艺进程，能够提升产能，同时具有涂覆方法不受产品尺寸的限制、可以广泛适用的优点。
以上所述仅是本发明的示范性实施方式，而非用于限制本发明的保护范围，本发明的保护范围由所附的权利要求确定。
本申请要求于2016年1月19日递交的第201610034957.7号中国专利申请的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。

Claims (14)

  1. 一种液晶涂覆装置，包括液晶喷头和气体冷却装置，沿着所述液晶喷头的运动轨迹所述气体冷却装置位于所述液晶喷头的后方，并且所述气体冷却装置沿所述液晶喷头的运动轨迹运动。
  2. 如权利要求1所述的液晶涂覆装置，其中，所述气体冷却装置包括气路系统和喷气腔体，所述喷气腔体通过所述气路系统与储气装置连通。
  3. 如权利要求2所述的液晶涂覆装置，其中，所述气路系统上设有控制气体流量的流量阀。
  4. 如权利要求2所述的液晶涂覆装置，其中，所述喷气腔体的底部设有狭缝式出气口。
  5. 如权利要求2所述的液晶涂覆装置，其中，所述喷气腔体用于喷射低温干燥气体。
  6. 如权利要求5所述的液晶涂覆装置，其中，所述低温干燥气体为氮气或者二氧化碳。
  7. 如权利要求1所述的液晶涂覆装置，还包括口字型机架，所述机架带动所述液晶喷头和气体冷却装置同步运动，所述液晶喷头和气体冷却装置沿其运动方向固定于所述机架的两端。
  8. 如权利要求1所述的液晶涂覆装置，还包括设置在所述液晶喷头和气体冷却之间的隔热挡板，所述隔热挡板沿垂直于液晶喷头和气体冷却装置运动轨迹的方向设置。
  9. 如权利要求8所述的液晶涂覆装置，其中，与所述液晶喷头相比，所述冷却装置设置为更靠近所述隔热挡板。
  10. 如权利要求8所述的液晶涂覆装置，其中，所述液晶喷头的底部设置有喷嘴，所述隔热挡板的底边高于所述液晶喷头的喷嘴。
  11. 一种液晶涂覆方法，包括：
    S1、通过液晶喷头向基板上喷涂设定图案的液晶；以及
    S2、喷涂所述液晶的同时，气体冷却装置沿着所述液晶喷头的轨迹对液晶进行降温，降低所述液晶的流动性。
  12. 根据权利要求11所述的液晶涂覆方法，其中，
    在所述基板的周边区域设置有封框胶，并且
    所述方法包括：对封框胶进行热固化处理，同时使液晶逐渐升温恢复流动性。
  13. 如权利要求11所述的液晶涂覆方法，其中，在所述步骤S2中，所述气体冷却装置通过狭缝式出气口向所述基板喷出低温干燥气体。
  14. 如权利要求13所述的液晶涂覆方法，其中，所述低温干燥气体为氮气或者二氧化碳。
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