WO2017107439A1 - 彩膜基板及其制作方法、显示装置 - Google Patents

彩膜基板及其制作方法、显示装置 Download PDF

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WO2017107439A1
WO2017107439A1 PCT/CN2016/088581 CN2016088581W WO2017107439A1 WO 2017107439 A1 WO2017107439 A1 WO 2017107439A1 CN 2016088581 W CN2016088581 W CN 2016088581W WO 2017107439 A1 WO2017107439 A1 WO 2017107439A1
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Prior art keywords
color
filter
black matrix
substrate
color filter
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PCT/CN2016/088581
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English (en)
French (fr)
Inventor
张治超
郭总杰
刘正
刘明悬
王守坤
姜晶晶
Original Assignee
京东方科技集团股份有限公司
北京京东方显示技术有限公司
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Priority to EP16831886.3A priority Critical patent/EP3396443B1/en
Priority to US15/503,046 priority patent/US10241361B2/en
Publication of WO2017107439A1 publication Critical patent/WO2017107439A1/zh

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • G02F1/133516Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136231Active matrix addressed cells for reducing the number of lithographic steps
    • G02F1/136236Active matrix addressed cells for reducing the number of lithographic steps using a grey or half tone lithographic process

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a color film substrate, a manufacturing method thereof, and a display device.
  • a black matrix is used as a black border for filters of various colors (for example, a red filter R, a green filter G, and a blue filter B).
  • filters of various colors for example, a red filter R, a green filter G, and a blue filter B.
  • the graphic boundaries are occluded to prevent light leakage.
  • the masks of the filters of various colors are generally shared, because the patterns of the red filter R, the green filter G, and the blue filter B are similar;
  • the pattern of the filter and the blue filter can be obtained by translating a red filter mask to obtain a green filter and a blue filter on the glass substrate, so green filtering is no longer required.
  • a mask of the light sheet and a mask of the blue filter can be obtained by translating a red filter mask to obtain a green filter and a blue filter on the glass substrate, so green filtering is no longer required.
  • the black matrix pattern corresponding to the red filter pattern is substantially complementary to the red filter pattern. This makes it possible to share the black matrix mask with the mask of the red filter, the mask of the green filter, and the mask of the blue filter.
  • embodiments of the present invention provide a color film substrate, a manufacturing method thereof, and a display device; which can be formed by using a filter mask by using a halftone mask technology and a positive and negative photoresist technology.
  • a pattern of a plurality of color filters of at least one color and a black matrix pattern saving a black matrix mask for the color film process, thereby greatly saving production costs.
  • Embodiments of the present invention provide a color filter substrate including: a base substrate, a plurality of color filters of at least one color formed on the base substrate, and formed on the base substrate a black matrix having a plurality of openings, the plurality of openings being in one-to-one correspondence with the plurality of color filters of the at least one color;
  • an edge of the color filter has an overlapping area with an opening edge of the black matrix.
  • a color filter mask can be used to form a plurality of color filters of at least one color by using a halftone mask technology and a positive and negative photoresist technology.
  • Graphics and black matrix graphics saves a black matrix mask for the color film process, which greatly reduces production costs.
  • the shape of the color filter and the black matrix have complementary shapes.
  • an edge of the color filter is located between the substrate substrate and an open edge of the black matrix.
  • the edge of the color filter has a smaller thickness than a central region of the color filter; the open edge of the black matrix has an edge compared to a central region of the black matrix Smaller thickness.
  • the photoresist forming the color filter is a negative photoresist; and the photoresist forming the black matrix is a positive photoresist.
  • the plurality of color filters of the at least one color comprise a red filter, a green filter, and a blue filter.
  • the plurality of color filters of the at least one color comprise a red filter, a green filter, a blue filter, and a white filter.
  • Embodiments of the present invention also provide a method of fabricating a color filter substrate, the color film substrate including a base substrate, a plurality of color filters of at least one color formed on the base substrate, and a lining formed thereon a black matrix on the base substrate; the black matrix has a plurality of openings, the plurality of openings being in one-to-one correspondence with the plurality of color filters of the at least one color; the method comprising:
  • the black matrix is formed using the same halftone mask.
  • a plurality of color filters of at least one color can be formed by using a filter mask plate by using a halftone mask technology and a positive and negative photoresist technique.
  • the pattern of the light sheet and the black matrix pattern saving a black matrix mask for the color film process, thereby greatly saving production costs.
  • forming the plurality of color filters of the at least one color on the base substrate by using a halftone mask comprises:
  • For each of the at least one color respectively: masking the halftone
  • the template is aligned with the position of the color filter of one of the at least one color and performs an exposure process and a development process to form a color filter of one of the at least one color.
  • forming the black matrix by using the same halftone mask comprises:
  • a development process is performed to form the black matrix having a plurality of openings.
  • the photoresist forming the color filter is a negative photoresist; and the photoresist forming the black matrix is a positive photoresist.
  • the plurality of color filters of the at least one color comprise a red filter, a green filter, and a blue filter.
  • the plurality of color filters of the at least one color comprise a red filter, a green filter, a blue filter, and a white filter.
  • Embodiments of the present invention further provide a display device including the color filter substrate as described above.
  • FIG. 1 is a schematic structural view of a color filter substrate according to an embodiment of the present invention.
  • FIG. 2 shows a partial schematic view of a halftone mask in accordance with an embodiment of the present invention
  • 3a is a schematic view showing a method of fabricating a color filter substrate to produce a red color filter R according to an embodiment of the present invention
  • 3b is a schematic view showing a method of fabricating a color filter substrate to produce a green color filter G according to an embodiment of the invention
  • 3c is a schematic view showing a method of fabricating a color filter substrate to fabricate a blue color filter B according to an embodiment of the invention
  • 3d-3f are schematic views showing a method of fabricating a color matrix substrate to fabricate a black matrix in accordance with an embodiment of the present invention.
  • FIG. 1 is a schematic view showing the structure of a color filter substrate according to an embodiment of the present invention.
  • a color filter substrate 100 including: a substrate substrate 101 and at least one formed on the substrate substrate 101. a plurality of color filters (R, G, B) of color, and a black matrix 102 formed on the base substrate 101; the black matrix 102 has a plurality of openings 103, the plurality of openings 103 and a plurality of color filters (R, G, B) of at least one color are in one-to-one correspondence;
  • an edge of the color filter (R, G, B) and an edge of the opening 103 of the black matrix 102 have an overlap region P.
  • an edge of the color filter is a portion where a lower portion of the color filter is smaller and protrudes toward a black matrix
  • an opening edge of the black matrix is a black matrix having a small thickness and a The portion where the color filter is convex, that is, as shown in FIG. 1, the edge of the color filter has an overlapping area with the opening edge of the black matrix.
  • a color filter mask can be used to form a plurality of color filters of at least one color by using a halftone mask technology and a positive and negative photoresist technology.
  • Graphics and black matrix graphics saves a black matrix mask for the color film process, which greatly reduces production costs.
  • the color filters used in the embodiments of the present invention include R, G, and B color filters, the color filters may be various such as RGBW when implementing the present invention.
  • the color filter substrate of the embodiment of the present invention includes not only a color filter substrate formed on the display panel with the array substrate but also a display substrate in which the color filter is integrated on the array substrate, which is not limited in the embodiment of the present invention.
  • the color filter substrate according to the embodiment of the present invention is included in the scope of protection of the embodiment of the present invention as long as the color filter and the black matrix structure are included in the display substrate.
  • the shape of the color filter and the black matrix have complementary shapes, that is, as shown in FIG. 1, the edge and the black moment of the color filter The edges of the array openings are embedded in contact so the shapes are complementary.
  • edges of the color filters are located between the base substrate 101 and the open edges of the black matrix 102.
  • the black matrix opening is located at the top region of the color filter, and light leakage can be prevented more effectively.
  • the edges of the color filters (R, G, B) have a smaller thickness than the central region of the color filters (R, G, B); In the central region of the black matrix 102, the open edges of the black matrix 102 have a small thickness.
  • the step of the surface of the color filter substrate can be effectively reduced.
  • the edges of the color filters (R, G, B) and the opening edges of the black matrix 102 have a rectangular shape, those skilled in the art will understand that The edges of the color filters (R, G, B) and the open edges of the black matrix 102 may have a certain slope or curved surface depending on different process characteristics (eg, exposure time, photoresist type, etc.).
  • the photoresist forming the color filter (R, G, B) is a negative photoresist; and the photoresist forming the black matrix 102 is a positive photoresist.
  • the plurality of color filters of the at least one color comprise a red filter, a green filter, and a blue filter.
  • a conventional color filter substrate can be realized by using a red filter, a green filter, and a blue filter.
  • the plurality of color filters of the at least one color comprise a red filter, a green filter, a blue filter, and a white filter.
  • the color filter substrate can achieve higher display brightness.
  • an embodiment of the present invention further provides a method of fabricating a color filter substrate, the color filter substrate including a base substrate, and a plurality of colors of at least one color formed on the base substrate a filter, and a black matrix formed on the base substrate; the black matrix having a plurality of openings, the plurality of openings and the plurality of colors of the at least one color Filters are in one-to-one correspondence; the method includes:
  • the black matrix is formed using the same halftone mask.
  • a plurality of color filters of at least one color can be formed by using a filter mask plate by using a halftone mask technology and a positive and negative photoresist technique.
  • the pattern of the light sheet and the black matrix pattern saving a black matrix mask for the color film process, thereby greatly saving production costs.
  • the halftone mask 200 is provided with a fully transparent region 201, a semi-transmissive region 202, and an opaque region 203.
  • the sum of the fully transparent region 201 and the semi-transmissive region 202 corresponds to a pattern of the filter; the sum of the semi-transmissive region 202 and the opaque region 203 corresponds to a pattern of a black matrix. Due to the presence of the semi-transmissive region 202, the filter and the black matrix have overlapping portions, which not only ensures the aperture ratio of the color filter substrate, but also prevents the occurrence of light leakage.
  • forming the plurality of color filters of the at least one color on the substrate substrate in sequence by using a halftone mask comprises:
  • For each of the at least one color respectively: aligning the halftone mask with the position of the color filter of one of the at least one color and performing an exposure process and a development process to form a color filter of one of the at least one color.
  • the halftone mask 200 includes the all-transmissive region 201, the semi-transmissive region 202, and the opaque region 203 as shown in FIG.
  • 3a is a schematic view showing a method of fabricating a color filter substrate according to an embodiment of the present invention for fabricating a red color filter R; wherein the positions of the halftone mask 200 and the red color filter are aligned and an exposure process and development are performed. The process is to form a red filter R.
  • 3b is a schematic view showing a method of fabricating a color filter substrate for fabricating a green color filter G according to an embodiment of the present invention; wherein the position of the halftone mask 200 and the green filter is aligned and an exposure process and development are performed. The process is to form a green filter G.
  • 3c is a schematic view showing a method of fabricating a color filter substrate to produce a blue color filter B according to an embodiment of the present invention; wherein the positions of the halftone mask 200 and the blue color filter are aligned and an exposure process is performed And a developing process to form a blue filter B.
  • forming the black matrix by using the same halftone mask comprises:
  • a development process is performed to form the plurality of openings.
  • 3d-3f are schematic views showing a method of fabricating a color matrix substrate to fabricate a black matrix in accordance with an embodiment of the present invention.
  • the halftone mask 200 is aligned with the red filter R and the exposure process is performed on the black matrix photoresist 301; as shown in FIG. 3e, after translating the halftone mask 200, half The tone mask 200 is aligned with the green filter G and performs an exposure process on the black matrix photoresist 301; as shown in FIG. 3f, after translating the halftone mask 200, the halftone mask 200 and the blue filter are The light sheet B is aligned and an exposure process is performed on the black matrix photoresist 301. After the exposure process as shown in FIGS. 3d-3f is performed, a development process is performed to form a plurality of openings of the black matrix as shown in FIG. 1.
  • a filter having an inverted "T" shape is first formed by using a halftone mask, and then a "T" shape is formed by using a halftone mask.
  • the opening of the black matrix As shown in FIG. 1, this allows the filter and the black matrix to have overlapping portions, which not only ensures the aperture ratio of the color filter substrate, but also prevents the occurrence of light leakage; and the above process steps can also form the formed black matrix. It has sufficient thickness to block light.
  • the filter is first formed using a halftone mask, and then the black matrix is formed using the halftone mask, those skilled in the art will understand that it is also feasible to fabricate the color filter substrate in the reverse order.
  • the photoresist forming the color filter is a negative photoresist; and the photoresist forming the black matrix is a positive photoresist.
  • the plurality of color filters of the at least one color comprise a red filter, a green filter, and a blue filter.
  • a conventional color filter substrate can be realized by using a red filter, a green filter, and a blue filter.
  • the plurality of color filters of the at least one color comprise a red filter, a green filter, a blue filter, and a white filter.
  • the color filter substrate can achieve higher display brightness.
  • an embodiment of the present invention further provides a display device including the color filter substrate as described in the above embodiments.
  • a display device can form a pattern of a plurality of color filters of at least one color by using a halftone mask technology and positive and negative photoresist technology. And black matrix graphics; save a black matrix mask for the color film process, which greatly saves production costs.

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Abstract

一种彩膜基板(100)及其制作方法、显示装置。所述彩膜基板(100)包括:衬底基板(101)、形成在衬底基板(101)上的至少一种颜色的多个彩色滤光片(R、G、B)、以及形成在衬底基板(101)上的黑矩阵(102);所述黑矩阵(102)具有多个开口(103),所述多个开口(103)与所述至少一种颜色的多个彩色滤光片(R、G、B)一一对应;其中,在垂直于所述衬底基板(101)的横截面中:所述彩色滤光片(R、G、B)的边缘与所述黑矩阵(102)的开口(103)边缘具有交叠区域(P)。该彩膜基板(100)及其制作方法、显示装置,可以通过使用半色调掩模板(200)技术以及正负性光刻胶技术,利用一个滤光片掩模板来形成至少一种颜色的多个彩色滤光片(R、G、B)的图形以及黑矩阵(102)图形;为彩膜工艺节省了一张黑矩阵掩模板,从而大大节省了生产成本。

Description

彩膜基板及其制作方法、显示装置 技术领域
本发明涉及显示技术领域,尤其涉及一种彩膜基板及其制作方法、显示装置。
背景技术
在诸如TFT-LCD彩膜的彩膜工艺技术中,黑矩阵作为黑色边框用来对各种颜色的滤光片(例如红色滤光片R、绿色滤光片G和蓝色滤光片B)的图形边界进行遮挡,用来防止漏光。实际生产中,各种颜色的滤光片的掩模板通常是可以共用的,这是由于红色滤光片R、绿色滤光片G和蓝色滤光片B的图形是类似的;在制作绿色滤光片和蓝色滤光片的图形时,可以通过平移一张红色滤光片掩模板,从而在玻璃基板上获得绿色滤光片和蓝色滤光片的图形,因此不再需要绿色滤光片的掩模板和蓝色滤光片的掩模板。
发明内容
然而,发明人意识到,对于例如红色滤光片图形来说,对应于该红色滤光片图形的黑矩阵图形与该红色滤光片图形是基本上互补的。这使得黑矩阵掩模板与红色滤光片的掩模板、绿色滤光片的掩模板和蓝色滤光片的掩模板存在共用的可能性。
有鉴于此,本发明的实施例提供了一种彩膜基板及其制作方法、显示装置;可以通过使用半色调掩模板技术以及正负性光刻胶技术,利用一个滤光片掩模板来形成至少一种颜色的多个彩色滤光片的图形以及黑矩阵图形;为彩膜工艺节省了一张黑矩阵掩模板,从而大大节省了生产成本。
本发明的实施例提供了一种彩膜基板;所述彩膜基板包括:衬底基板、形成在衬底基板上的至少一种颜色的多个彩色滤光片、以及形成在衬底基板上的黑矩阵;所述黑矩阵具有多个开口,所述多个开口与所述至少一种颜色的多个彩色滤光片一一对应;
其中,在垂直于所述衬底基板的横截面中:所述彩色滤光片的边缘与所述黑矩阵的开口边缘具有交叠区域。
根据本发明的实施例提供的彩膜基板,可以通过使用半色调掩模板技术以及正负性光刻胶技术,利用一个滤光片掩模板来形成至少一种颜色的多个彩色滤光片的图形以及黑矩阵图形;为彩膜工艺节省了一张黑矩阵掩模板,从而大大节省了生产成本。
可选地,在所述交叠区域中,所述彩色滤光片的形状和所述黑矩阵具有互补的形状。
可选地,所述彩色滤光片的边缘位于所述衬底基板和所述黑矩阵的开口边缘之间。
可选地,相比于所述彩色滤光片的中心区域,所述彩色滤光片的边缘具有较小的厚度;相比于所述黑矩阵的中心区域,所述黑矩阵的开口边缘具有较小的厚度。
可选地,形成所述彩色滤光片的光刻胶为负性光刻胶;形成所述黑矩阵的光刻胶为正性光刻胶。
可选地,所述至少一种颜色的多个彩色滤光片包括红色滤光片、绿色滤光片和蓝色滤光片。
可选地,所述至少一种颜色的多个彩色滤光片包括红色滤光片、绿色滤光片、蓝色滤光片和白色滤光片。
本发明的实施例还提供了一种制作彩膜基板的方法,所述彩膜基板包括衬底基板、形成在衬底基板上的至少一种颜色的多个彩色滤光片、以及形成在衬底基板上的黑矩阵;所述黑矩阵具有多个开口,所述多个开口与所述至少一种颜色的多个彩色滤光片一一对应;所述方法包括:
利用一个半色调掩模板在所述衬底基板上形成所述至少一种颜色的多个彩色滤光片;以及
利用同一个半色调掩模板形成所述黑矩阵。
根据本发明的实施例提供的制作彩膜基板的方法,可以通过使用半色调掩模板技术以及正负性光刻胶技术,利用一个滤光片掩模板来形成至少一种颜色的多个彩色滤光片的图形以及黑矩阵图形;为彩膜工艺节省了一张黑矩阵掩模板,从而大大节省了生产成本。
可选地,利用一个半色调掩模板在所述衬底基板上形成所述至少一种颜色的多个彩色滤光片包括:
对于所述至少一种颜色中的各个颜色,分别地:将所述半色调掩 模板与所述至少一种颜色之一的彩色滤光片的位置进行对准并执行曝光工艺和显影工艺以形成所述至少一种颜色之一的彩色滤光片。
可选地,利用同一个半色调掩模板形成所述黑矩阵包括:
对于所述至少一种颜色中的各个颜色,分别地将所述半色调掩模板与所述至少一种颜色之一的多个彩色滤光片对准并执行曝光工艺;以及
执行显影工艺以形成所述具有多个开口的黑矩阵。
可选地,形成所述彩色滤光片的光刻胶为负性光刻胶;形成所述黑矩阵的光刻胶为正性光刻胶。
可选地,所述至少一种颜色的多个彩色滤光片包括红色滤光片、绿色滤光片和蓝色滤光片。
可选地,所述至少一种颜色的多个彩色滤光片包括红色滤光片、绿色滤光片、蓝色滤光片和白色滤光片。
本发明的实施例进一步提供了一种显示装置,所述显示装置包括如上所述的彩膜基板。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。
图1示出了根据本发明实施例的彩膜基板的结构示意图;
图2示出了根据本发明实施例的半色调掩模板的局部示意图;
图3a示出了根据本发明实施例的制作彩膜基板的方法制作红色滤光片R的示意图;
图3b示出了根据本发明实施例的制作彩膜基板的方法制作绿色滤光片G的示意图;
图3c示出了根据本发明实施例的制作彩膜基板的方法制作蓝色滤光片B的示意图;
图3d-3f示出了根据本发明实施例的制作彩膜基板的方法制作黑矩阵的示意图。
具体实施方式
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明专利保护的范围。
图1示出了根据本发明实施例的彩膜基板的结构示意图。如图1所示,根据本发明的一方面,本发明的实施例提供了一种彩膜基板100,所述彩膜基板100包括:衬底基板101、形成在衬底基板101上的至少一种颜色的多个彩色滤光片(R、G、B)、以及形成在衬底基板101上的黑矩阵102;所述黑矩阵102具有多个开口103,所述多个开口103与所述至少一种颜色的多个彩色滤光片(R、G、B)一一对应;
其中,在垂直于所述衬底基板101的横截面中:所述彩色滤光片(R、G、B)的边缘与所述黑矩阵102的开口103的边缘具有交叠区域P。如图1所示,所述彩色滤光片的边缘为所述彩色滤光片下部厚度较小且向黑矩阵凸出的部分,所述黑矩阵的开口边缘为黑矩阵中部厚度较小且向彩色滤光片凸出的部分,即如图1所示,所述彩色滤光片的边缘与所述黑矩阵的开口边缘具有交叠区域。
根据本发明的实施例提供的彩膜基板,可以通过使用半色调掩模板技术以及正负性光刻胶技术,利用一个滤光片掩模板来形成至少一种颜色的多个彩色滤光片的图形以及黑矩阵图形;为彩膜工艺节省了一张黑矩阵掩模板,从而大大节省了生产成本。
本领域技术人员能够理解,尽管在本发明的实施例中使用的彩色滤光片包括R、G、B彩色滤光片,在实施本发明时,彩色滤光片还可以是诸如RGBW等各种彩色滤光片的组合。本发明实施例中所述的彩膜基板,不仅包括与阵列基板对盒形成显示面板的彩膜基板,也包括彩色滤光片集成于阵列基板的显示基板,本发明实施例对此不做限定,只要显示基板中包括彩色滤光片和黑矩阵结构,都是本发明实施例所述的彩膜基板,属于本发明实施例保护的范畴。
可选地,在所述交叠区域P中,所述彩色滤光片的形状和所述黑矩阵具有互补的形状,即如图1所示,所述彩色滤光片的边缘与黑矩 阵开口边缘嵌入接触,因此形状是互补的。
利用以上配置,确保了黑矩阵的开口与彩色滤光片一一对应,改善了彩膜基板的开口率。
可选地,所述彩色滤光片(R、G、B)的边缘位于所述衬底基板101和所述黑矩阵102的开口边缘之间。
利用上述配置,所述黑矩阵开口位于所述彩色滤光片的顶部区域,能够更有效地防止漏光。
可选地,相比于所述彩色滤光片(R、G、B)的中心区域,所述彩色滤光片(R、G、B)的边缘具有较小的厚度;相比于所述黑矩阵102的中心区域,所述黑矩阵102的开口边缘具有较小的厚度。
利用上述配置,可以有效地减小所述彩膜基板表面的段差。尽管在本申请的图1和图3a-3f中,所述彩色滤光片(R、G、B)的边缘和所述黑矩阵102的开口边缘具有矩形的形状,本领域技术人员能够理解,根据不同的工艺特点(例如,曝光时间、光刻胶类型等),所述彩色滤光片(R、G、B)的边缘和所述黑矩阵102的开口边缘可以具有一定的坡度或曲面。
可选地,形成所述彩色滤光片(R、G、B)的光刻胶为负性光刻胶;形成所述黑矩阵102的光刻胶为正性光刻胶。
使用正性光刻胶制作黑矩阵,能够确保制作过程中无需曝光的黑矩阵部分始终被半色调掩模板遮挡。
可选地,所述至少一种颜色的多个彩色滤光片包括红色滤光片、绿色滤光片和蓝色滤光片。
利用红色滤光片、绿色滤光片和蓝色滤光片,能够实现较为常规的彩膜基板。
可选地,所述至少一种颜色的多个彩色滤光片包括红色滤光片、绿色滤光片、蓝色滤光片和白色滤光片。
利用红色滤光片、绿色滤光片、蓝色滤光片和白色滤光片,彩膜基板能够实现更高的显示亮度。
根据本发明的另一方面,本发明的实施例还提供了一种制作彩膜基板的方法,所述彩膜基板包括衬底基板、形成在衬底基板上的至少一种颜色的多个彩色滤光片、以及形成在衬底基板上的黑矩阵;所述黑矩阵具有多个开口,所述多个开口与所述至少一种颜色的多个彩色 滤光片一一对应;所述方法包括:
利用一个半色调掩模板依次在所述衬底基板上形成所述至少一种颜色的多个彩色滤光片;以及
利用同一个半色调掩模板形成所述黑矩阵。
根据本发明的实施例提供的制作彩膜基板的方法,可以通过使用半色调掩模板技术以及正负性光刻胶技术,利用一个滤光片掩模板来形成至少一种颜色的多个彩色滤光片的图形以及黑矩阵图形;为彩膜工艺节省了一张黑矩阵掩模板,从而大大节省了生产成本。
如图2所示,在本发明的实施例中,半色调掩模板200设置有全透光区域201、半透光区域202和不透光区域203。所述全透光区域201和半透光区域202之和对应滤光片的图形;所述半透光区域202和不透光区域203之和对应黑矩阵的图形。由于半透光区域202的存在,使得滤光片和黑矩阵具有相互交叠的部分,不仅确保了彩膜基板的开口率,还防止了漏光的发生。
可选地,利用一个半色调掩模板依次在所述衬底基板上形成所述至少一种颜色的多个彩色滤光片包括:
对于所述至少一种颜色中的各个颜色,分别地:将所述半色调掩模板与所述至少一种颜色之一的彩色滤光片的位置进行对准并执行曝光工艺和显影工艺以形成所述至少一种颜色之一的彩色滤光片。
图3a-3f示出了根据本发明实施例的制作彩膜基板的方法的各个步骤的示意图。其中,半色调掩模板200包括如图2中所示的全透光区域201、半透光区域202和不透光区域203。
图3a示出了根据本发明实施例的制作彩膜基板的方法制作红色滤光片R的示意图;其中,将半色调掩模板200与红色滤光片的位置进行对准并执行曝光工艺和显影工艺以形成红色滤光片R。
图3b示出了根据本发明实施例的制作彩膜基板的方法制作绿色滤光片G的示意图;其中,将半色调掩模板200与绿色滤光片的位置进行对准并执行曝光工艺和显影工艺以形成绿色滤光片G。
图3c示出了根据本发明实施例的制作彩膜基板的方法制作蓝色滤光片B的示意图;其中,将半色调掩模板200与蓝色滤光片的位置进行对准并执行曝光工艺和显影工艺以形成蓝色滤光片B。
可选地,利用同一个半色调掩模板形成所述黑矩阵包括:
对于所述至少一种颜色中的各个颜色,分别地将所述半色调掩模板与所述至少一种颜色之一的多个彩色滤光片对准并执行曝光工艺;以及
执行显影工艺以形成所述多个开口。
图3d-3f示出了根据本发明实施例的制作彩膜基板的方法制作黑矩阵的示意图。
如图3d所示,将半色调掩模板200与红色滤光片R对准并对黑矩阵的光刻胶301执行曝光工艺;如图3e所示,在平移半色调掩模板200之后,将半色调掩模板200与绿色滤光片G对准并对黑矩阵的光刻胶301执行曝光工艺;如图3f所示,在平移半色调掩模板200之后,将半色调掩模板200与蓝色滤光片B对准并对黑矩阵的光刻胶301执行曝光工艺。在执行了如图3d-3f所示的曝光工艺后,执行显影工艺以形成如图1所示的黑矩阵的多个开口。
在本发明的实施例所提供的制作彩膜基板的方法中,首先利用半色调掩模板形成了具有倒“T”字形的滤光片,然后利用半色调掩模板形成了具有“T”字形的黑矩阵的开口。如图1所示,这使得滤光片和黑矩阵具有相互交叠的部分,不仅确保了彩膜基板的开口率,还防止了漏光的发生;并且,上述工艺步骤还能使形成的黑矩阵具有足够的厚度,用以遮挡光线。
尽管在上述实施例中,首先利用半色调掩模板形成了滤光片,然后利用半色调掩模板形成了黑矩阵,本领域技术人员能够理解,以相反的顺序来制作彩膜基板也是可行的。
可选地,形成所述彩色滤光片的光刻胶为负性光刻胶;形成所述黑矩阵的光刻胶为正性光刻胶。
可选地,所述至少一种颜色的多个彩色滤光片包括红色滤光片、绿色滤光片和蓝色滤光片。
利用红色滤光片、绿色滤光片和蓝色滤光片,能够实现较为常规的彩膜基板。
可选地,所述至少一种颜色的多个彩色滤光片包括红色滤光片、绿色滤光片、蓝色滤光片和白色滤光片。
利用红色滤光片、绿色滤光片、蓝色滤光片和白色滤光片,彩膜基板能够实现更高的显示亮度。
根据本发明的又一方面,本发明的实施例还提供了一种显示装置,所述显示装置包括如以上实施例所述的彩膜基板。
根据本发明的实施例提供的显示装置,可以通过使用半色调掩模板技术以及正负性光刻胶技术,利用一个滤光片掩模板来形成至少一种颜色的多个彩色滤光片的图形以及黑矩阵图形;为彩膜工艺节省了一张黑矩阵掩模板,从而大大节省了生产成本。
显然,本领域的技术人员可以对本发明进行各种改动和变型而不脱离本发明的精神和范围。这样,倘若本发明的这些修改和变型属于本发明权利要求及其等同技术的范围之内,则本发明也意图包含这些改动和变型在内。

Claims (14)

  1. 一种彩膜基板,包括:衬底基板、形成在衬底基板上的至少一种颜色的多个彩色滤光片、以及形成在衬底基板上的黑矩阵;所述黑矩阵具有多个开口,所述多个开口与所述至少一种颜色的多个彩色滤光片一一对应;
    其中,在垂直于所述衬底基板的横截面中:所述彩色滤光片的边缘与所述黑矩阵的开口边缘具有交叠区域。
  2. 如权利要求1所述的彩膜基板,其中,在所述交叠区域中,所述彩色滤光片的形状和所述黑矩阵具有互补的形状。
  3. 如权利要求1所述的彩膜基板,其中,所述彩色滤光片的边缘位于所述衬底基板和所述黑矩阵的开口边缘之间。
  4. 如权利要求1所述的彩膜基板,其中,相比于所述彩色滤光片的中心区域,所述彩色滤光片的边缘具有较小的厚度;相比于所述黑矩阵的中心区域,所述黑矩阵的开口边缘具有较小的厚度。
  5. 如权利要求1所述的彩膜基板,其中,形成所述彩色滤光片的光刻胶为负性光刻胶;形成所述黑矩阵的光刻胶为正性光刻胶。
  6. 如权利要求1所述的彩膜基板,其中,所述至少一种颜色的多个彩色滤光片包括红色滤光片、绿色滤光片和蓝色滤光片。
  7. 如权利要求1所述的彩膜基板,其中,所述至少一种颜色的多个彩色滤光片包括红色滤光片、绿色滤光片、蓝色滤光片和白色滤光片。
  8. 一种制作彩膜基板的方法,所述彩膜基板包括衬底基板、形成在衬底基板上的至少一种颜色的多个彩色滤光片、以及形成在衬底基板上的黑矩阵;所述黑矩阵具有多个开口,所述多个开口与所述至少一种颜色的多个彩色滤光片一一对应;所述方法包括:
    利用一个半色调掩模板在所述衬底基板上形成所述至少一种颜色的多个彩色滤光片;以及
    利用同一个半色调掩模板形成所述黑矩阵。
  9. 如权利要求8所述的方法,其中,利用一个半色调掩模板在所述衬底基板上形成所述至少一种颜色的多个彩色滤光片包括:
    对于所述至少一种颜色中的各个颜色,分别地:将所述半色调掩 模板与所述至少一种颜色之一的彩色滤光片的位置进行对准并执行曝光工艺和显影工艺以形成所述至少一种颜色之一的彩色滤光片。
  10. 如权利要求8所述的方法,其中,利用同一个半色调掩模板形成所述黑矩阵包括:
    对于所述至少一种颜色中的各个颜色,分别地将所述半色调掩模板与所述至少一种颜色之一的多个彩色滤光片对准并执行曝光工艺;以及
    执行显影工艺以形成所述具有多个开口的黑矩阵。
  11. 如权利要求8所述的方法,其中,形成所述彩色滤光片的光刻胶为负性光刻胶;形成所述黑矩阵的光刻胶为正性光刻胶。
  12. 如权利要求8所述的方法,其中,所述至少一种颜色的多个彩色滤光片包括红色滤光片、绿色滤光片和蓝色滤光片。
  13. 如权利要求8所述的方法,其中,所述至少一种颜色的彩色滤光片包括红色滤光片、绿色滤光片、蓝色滤光片和白色滤光片。
  14. 一种显示装置,包括如权利要求1-7所述的彩膜基板。
PCT/CN2016/088581 2015-12-21 2016-07-05 彩膜基板及其制作方法、显示装置 WO2017107439A1 (zh)

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