WO2016095278A1 - 用于显示器的彩膜基板及其制造方法和彩膜基板的光罩 - Google Patents

用于显示器的彩膜基板及其制造方法和彩膜基板的光罩 Download PDF

Info

Publication number
WO2016095278A1
WO2016095278A1 PCT/CN2014/095577 CN2014095577W WO2016095278A1 WO 2016095278 A1 WO2016095278 A1 WO 2016095278A1 CN 2014095577 W CN2014095577 W CN 2014095577W WO 2016095278 A1 WO2016095278 A1 WO 2016095278A1
Authority
WO
WIPO (PCT)
Prior art keywords
region
light
color
color resist
shielding
Prior art date
Application number
PCT/CN2014/095577
Other languages
English (en)
French (fr)
Inventor
赵锋
Original Assignee
深圳市华星光电技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 深圳市华星光电技术有限公司 filed Critical 深圳市华星光电技术有限公司
Priority to US14/426,340 priority Critical patent/US9671641B2/en
Publication of WO2016095278A1 publication Critical patent/WO2016095278A1/zh

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133519—Overcoatings

Definitions

  • the present invention relates to the field of liquid crystal display technology, and in particular to a color film substrate for a display, a method of manufacturing the same, and a photomask of a color filter substrate.
  • the TFT-LCD liquid crystal panel comprises an array substrate, a color filter substrate and a liquid crystal layer sandwiched between the array substrate and the color filter substrate, wherein the electric field is driven by the electric field to generate liquid crystal molecules, and the optical properties of the liquid crystals produce different optical effects, and then the corresponding color
  • the change of RGB three primary colors on the film substrate realizes full color display image.
  • the color filter substrate is a necessary material for colorization of the TFT-LCD panel, and generally includes a pixel filter film and a black matrix layer, wherein the pixel filter film includes red, green, and blue color pixel filters arranged in a predetermined structure on the transparent glass substrate.
  • the light film because the traditional RGB pixel mask edge has no special pattern processing, is a full light transmission area, so after the R ⁇ G ⁇ B yellow light process, there is overlap between different color resistances of the RGB three-color pixel filter film.
  • the present invention provides a color filter substrate for a display, a manufacturing method thereof, and a photomask of a color filter substrate, which improves liquid crystal efficiency, realizes a color film substrate without additional OC flat layer, reduces a production process, and improves effective conditions. effectiveness.
  • the present invention provides a color filter substrate for a display, comprising a substrate body and a plurality of color resist patterns disposed on the substrate body, wherein adjacent color resist patterns partially overlap, wherein in the overlapping region, below The thickness of the color resist pattern is gradually thinned in the direction toward the edge thereof.
  • the thickness of the color resist pattern located below is curved in an arc direction toward the edge thereof.
  • the invention also provides a method for manufacturing a color filter substrate for a display, comprising: providing a substrate body; coating a color resist layer on the substrate body; exposing the color resist layer with a photomask, wherein the photomask includes a light shielding region And a light-transmitting area surrounded by the light-shielding area, and the side of the light-shielding area close to the light-transmitting area
  • the edge is provided with a light-shielding pattern arranged at intervals, thereby forming a semi-transmissive gray-scale mask region; and developing the exposed color resist layer to obtain a color resist pattern, wherein the color resist pattern corresponds to the gray-scale mask region
  • the thickness of the region is gradually thinned in the direction toward its edge.
  • the gray-scale reticle regions are disposed on opposite sides of the light-shielding region such that the thicknesses of the opposite sides of the color-resist pattern and the corresponding regions of the gray-scale reticle region are gradually thinned toward the edges thereof.
  • the gray-scale reticle region is disposed around the light-shielding region such that the thickness of the corresponding region around the color-resist pattern and the gray-scale reticle region is gradually thinned toward the edge thereof.
  • the light shielding pattern is rectangular, triangular, trapezoidal or semi-circular.
  • the invention provides a mask for a color filter substrate, comprising a light-shielding region and a light-transmitting region surrounded by the light-shielding region, wherein the edge of the light-shielding region near the light-transmitting region is provided with a light-shielding pattern arranged at intervals, thereby forming a semi-transparent light.
  • Grayscale reticle area
  • the gray scale mask regions are disposed on opposite sides of the light shielding region.
  • the gray scale mask area is disposed around the light shielding area.
  • the light shielding pattern is rectangular, triangular, trapezoidal or semi-circular.
  • the beneficial effects of the present invention are: different from the prior art, the color film substrate for a display of the present invention, the manufacturing method thereof, and the photomask of the color film substrate, the color film substrate including the substrate body and the substrate body a plurality of color resist patterns on the upper side, the adjacent color resist patterns partially overlap, and by making the thickness of the color resist pattern located below in the overlapping region gradually thinner toward the edge thereof, the adjacent color resist pattern is The horn angle difference of the overlap region is reduced, and it is not necessary to lay an additional OC flat layer on the color resist pattern layer, and the surface of the color filter substrate is also kept flat; and the reticle of the color filter substrate includes a light shielding region and is surrounded by the light shielding region.
  • the light-transmitting region is provided with a light-shielding pattern arranged at intervals adjacent to the light-transmitting region to form a semi-transparent gray-scale mask region, and the color resist layer on the substrate is exposed by the mask, and exposed
  • the subsequent color resist layer is developed to obtain a color resist pattern which is gradually thinned in the direction of the edge of the corresponding region of the gray scale mask region, thereby eliminating the preparation process of the OC flat layer.
  • the patterning process of the color film substrate is completed in one process, and the surface film substrate with smooth surface is obtained, the liquid crystal efficiency is improved, the production cost of the liquid crystal display panel is reduced, and the production efficiency is improved.
  • FIG. 1 is a schematic structural view of a color filter substrate for a display of the present invention
  • FIG. 2 is a schematic view showing a manufacturing process of a color filter substrate in the present invention
  • FIG. 3 is a schematic flow chart of a method for manufacturing a color filter substrate according to the present invention.
  • FIG. 4 is a schematic structural view of a first embodiment of a photomask of a color filter substrate of the present invention
  • Fig. 5 is a schematic view showing the structure of a second embodiment of a photomask of the color filter substrate of the present invention.
  • FIG. 1 is a schematic structural view of a color filter substrate for a display according to the present invention.
  • the color filter substrate 1 for a display disclosed in the embodiment includes a substrate body 11 and a plurality of color resist patterns 12 disposed on the substrate body 11 , wherein the plurality of color resist patterns 12 are used herein. Filtered and corresponding to a pixel of the pixel filter film.
  • the plurality of color resist patterns 12 generally include a red color resist pattern R, a green color resist pattern G, and a blue color resist pattern B. Further, the plurality of color resist patterns 12 may further include a color resist pattern or other color colors of the above three color combinations. Resistance pattern.
  • the adjacent color resist patterns 12 are partially overlapped, wherein in the overlap region 13, the thickness of the underlying color resist pattern 12 is gradually thinned in the direction toward the edges thereof.
  • the thickness of the underlying color resist pattern 12 is gradually thinned in the direction toward the edges thereof.
  • the overlap region 13 between the adjacent color resist patterns 12 of the color filter substrate 1 for a display disclosed in the present embodiment has a small horn angle difference, and even there is no horn angle difference, thereby improving liquid crystal efficiency; Further, the color filter substrate 1 does not need to additionally add an OC flat layer to the color resist pattern 12 in order to reduce the horn angle difference of the overlap region 13, which reduces the production process of the color filter substrate 1, and reduces the production cost of the liquid crystal panel.
  • FIG. 2 is a schematic diagram showing the manufacturing process of the color film substrate in the present invention. It should be emphasized here that the placement state of the color filter substrate 1 and the photomask 2 and the light source device 3 shown in FIG. 2 and the structure and state of each component of the color filter substrate 1 do not occur in the same process stage in the same time in actual production. FIG. 2 only shows the structure and state of the color filter substrate 1 at different process stages for convenience of explanation.
  • the color filter substrate 1 includes a substrate body 11 and a color resist layer 14.
  • the substrate body 11 is provided with a black matrix layer (not shown), and the color resist layer 14 is disposed on the substrate with the black matrix layer.
  • the mask 2 and the light source device 3 are also included in the manufacturing process diagram.
  • FIG. 3 is a schematic flow chart of a method for manufacturing a color filter substrate according to the present invention. As shown in FIG. 3, the manufacturing method of the color filter substrate 1 disclosed in this embodiment includes:
  • a substrate body 11 is provided.
  • the substrate body 11 is a transparent glass substrate, and the glass substrate is initially cleaned.
  • the initial cleaning here is to put the glass substrate into the cleaning tank, and remove the dust or impurities on the surface of the glass substrate by chemical or physical means to prevent the impurities from affecting the subsequent manufacturing.
  • the cleaned glass substrate is subjected to chrome sputtering to improve the performance of the glass substrate.
  • the method further includes forming a black matrix layer on the substrate body 11, that is, the glass substrate, by using photoresist coating, exposure, development, etching, and photoresist removal, and then passing on the glass substrate having the black matrix layer.
  • the RGB color resist layer 14 is formed by photoresist coating, exposure, and development, and a red color resist layer R1, a green color resist layer G1, and a blue color resist layer B1 are formed by photoresist coating, exposure, and development, respectively.
  • any adjacent color resist layers 14 partially overlap to form an overlap region 15.
  • FIG. 4 is a schematic structural view of the first embodiment of the photomask of the color filter substrate of the present invention.
  • the reticle 2 includes a light-shielding region 21 and a light-transmitting region 22 surrounded by the light-shielding region 21.
  • the edge of the light-shielding region 21 near the light-transmitting region 22 is provided with a light-shielding pattern arranged at intervals, thereby forming a semi-transparent pattern.
  • Grayscale reticle area 23 of light is provided.
  • the gray-scale reticle region 23 is disposed on opposite sides of the light-shielding region 21, and the light-shielding pattern is rectangular, triangular, trapezoidal or semi-circular.
  • the light-shielding pattern may be other rules such as zigzag, arc or trapezoidal or In the irregular shape, as long as the semi-transparation is realized by the patterning process at the edge of the reticle, FIG. 4 is only an example of a rectangle.
  • the structure of the reticle 2 of the color filter substrate 1 can also be as shown in FIG. 5, which is a schematic structural view of a second embodiment of the reticle of the color filter substrate of the present invention, wherein the reticle disclosed in FIG.
  • the reticle 4 also includes a light-shielding region 41 and a light-transmitting region 42 surrounded by the light-shielding region 41.
  • the edge of the light-shielding region 41 near the light-transmitting region 42 is provided with a semi-transparent light-receiving pattern formed by spaced-apart light-shielding patterns.
  • the light shielding pattern is rectangular, triangular, trapezoidal or semi-circular, and FIG.
  • the gray scale reticle region 43 of the reticle 4 is placed around the light shielding region 41. It should be emphasized here that whether the gray scale mask area 43 of the mask 4 is placed around the light shielding area 41 or the gray scale mask area 23 is disposed on the opposite sides of the light shielding area 21, it is left or right or
  • the upper and lower adjacent color resists 14 have different color resists, and the pixel masks corresponding to the edges of the adjacent color resists 14 are patterned.
  • the light emitted by the light source device 3 exposes the color resist layer 14 through the mask 2, wherein the gray scale mask region 23 corresponds to the overlapping region 15 of any adjacent color resist layer 14. .
  • the developed color resist layer 14 is developed. Since the gray scale mask region 23 corresponds to the overlapping region 15 of any adjacent color resist layer 14 in the previous manufacturing process, the overlap region 15 is half-exposed, and thus, development is performed.
  • the thickness of the corresponding color resist pattern 12 and the corresponding region of the gray scale mask region 23 is gradually thinned in the direction toward the edge thereof, and here, the thickness of the overlap region 13 between any two color resist patterns 12 is referred to. It is gradually thinner in the direction to its edge.
  • the semi-transmissive pattern at the edge of the color resist layer 14 is realized by the semi-transmissive pattern of the fine gray scale mask region 23, so that the color resist layer in the edge region is effective. Thinning, so that the adjacent color resisting overlap area color resistance stacking horn angle difference is significantly reduced, through further optimization design, achieving an ideal flattening effect on the RGB color resist layer 14, improving liquid crystal efficiency, omitting the traditional OC flat layer, saving Materials to increase production efficiency.
  • the reticle of the color film substrate for a display of the present invention includes a light-shielding region and a light-transmitting region surrounded by the light-shielding region, and the light-shielding region is close to the edge of the light-transmitting region.
  • the thickness of the color resist pattern located below in the overlapping region of the color resist pattern is gradually thinned in the direction toward the edge thereof, the horn angle difference of the overlapping region of the adjacent color resist pattern is reduced, and the liquid crystal efficiency is improved;
  • An additional OC flat layer is laid on the color resist pattern to reduce the production cost of the liquid crystal display panel and improve production efficiency.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)

Abstract

一种用于显示器的彩膜基板（1）及其制造方法和彩膜基板（1）的光罩（2），其中，彩膜基板（1）包括基板本体（11）以及设置于基板本体（11）上的多个色阻图案（12），相邻的色阻图案（12）部分重叠，其中在重叠区域（13），位于下方的色阻图案（12）的厚度在向其边缘的方向上逐渐变薄。通过上述方式，可减少彩膜基板（1）RGB相邻色阻层（14）交叠区域的牛角段差，提高液晶效率；并且，不需要在彩膜基板（1）RGB色阻层（14）上增加额外的OC平坦层，降低液晶显示面板的生产成本，提高生产效率。

Description

用于显示器的彩膜基板及其制造方法和彩膜基板的光罩 技术领域
本发明涉及液晶显示技术领域，特别是涉及一种用于显示器的彩膜基板及其制造方法和彩膜基板的光罩。
背景技术
TFT-LCD液晶面板包括阵列基板、彩膜基板及夹在阵列基板和彩膜基板中间的液晶层，其是利用电路产生电场驱动液晶分子，藉由液晶物理特性产生不同的光学效应，再对应彩膜基板上RGB三原色的变化，实现全彩显示影像。
彩膜基板是TFT-LCD面板彩色化的必要材料，通常包括像素滤光膜和黑色矩阵层，其中像素滤光膜包括在透明玻璃基板上以预定结构排列的红、绿、蓝三色像素滤光膜，由于传统的RGB像素光罩边缘无特殊的图案处理，为全透光区，因此经过R→G→B黄光制程后，RGB三色像素滤光膜的不同色阻之间存在重叠区域，这些重叠区域之间将引起严重的色阻堆叠牛角段差，严重的色阻堆叠牛角段差会使彩膜基板侧靠近液晶侧的地形起伏大，影响周围的液晶倒向，使液晶效率下降，因此需要在这些RGB三色像素滤光膜层镀上加强表面平坦的OC(over-coat)平坦层，增加了材料成本，而且使制程周期延长，生产效率降低。
发明内容
有鉴于此，本发明提供一种用于显示器的彩膜基板及其制造方法和彩膜基板的光罩，提高液晶效率，实现无需额外增加OC平坦层制造彩膜基板，减少生产工艺，提高生效效率。
为解决上述问题，本发明提供一种用于显示器的彩膜基板，包括基板本体以及设置于基板本体上的多个色阻图案，相邻的色阻图案部分重叠，其中在重叠区域，位于下方的色阻图案的厚度在向其边缘的方向上逐渐变薄。
其中，位于下方的色阻图案的厚度在向其边缘的方向上呈弧形过渡。
本发明还提供一种用于显示器的彩膜基板的制造方法，包括：提供一基板本体；在基板本体上涂覆色阻层；利用光罩对色阻层进行曝光，其中光罩包括遮光区域以及由遮光区域围设而成的透光区域，遮光区域的靠近透光区域的边 缘设置有间隔排列的遮光图案，进而形成半透光的灰阶光罩区域；对曝光后的色阻层进行显影，以获得色阻图案，其中色阻图案在与灰阶光罩区域的对应区域的厚度在向其边缘的方向上逐渐变薄。
其中，灰阶光罩区域设置于遮光区域的相对两侧，以使得色阻图案的相对两侧的与灰阶光罩区域的对应区域的厚度在向其边缘的方向上逐渐变薄。
其中，灰阶光罩区域设置于遮光区域的四周，以使得色阻图案四周的与灰阶光罩区域的对应区域的厚度在向其边缘的方向上逐渐变薄。
其中，遮光图案为矩形、三角、梯形或半圆形。
本发明提供一种彩膜基板的光罩，包括遮光区域以及由遮光区域围设而成的透光区域，遮光区域的靠近透光区域的边缘设置有间隔排列的遮光图案，进而形成半透光的灰阶光罩区域。
其中，灰阶光罩区域设置于所述遮光区域的相对两侧。
其中，灰阶光罩区域设置于所述遮光区域的四周。
其中，遮光图案为矩形、三角、梯形或半圆形。
通过上述方案，本发明的有益效果是：区别于现有技术，本发明的用于显示器的彩膜基板及其制造方法和彩膜基板的光罩，彩膜基板包括基板本体和设置于基板本体上的多个色阻图案，相邻的色阻图案部分重叠，通过使在重叠区域，位于下方的色阻图案的厚度在向其边缘的方向上逐渐变薄，使相邻的色阻图案的重叠区域的牛角段差减少，不需要在色阻图案层上铺设额外的OC平坦层，彩膜基板的表面也保持平整；并且，彩膜基板的光罩包括遮光区域及由遮光区域围设而成的透光区域，遮光区域的靠近透光区域的边缘设置有间隔排列的遮光图案，形成半透光的灰阶光罩区域，利用该光罩对基板上的色阻层进行曝光，并对曝光后的色阻层进行显影，获得与灰阶光罩区域的对应区域的厚度在向其边缘的方向上逐渐变薄的色阻图案，省去了OC平坦层的制备工序，以一次工艺制程完成彩膜基板的图案化处理，获得表面平整的彩膜基板，提高液晶效率，降低了液晶显示面板的生产成本，提高生产效率。
附图说明
图1是本发明用于显示器的彩膜基板的结构示意图；
图2是本发明中彩膜基板的制作工艺示意图；
图3是本发明中彩膜基板的制造方法流程示意图；
图4是本发明彩膜基板的光罩的第一实施方式的结构示意图；
图5是本发明彩膜基板的光罩的第二实施方式的结构示意图。
具体实施方式
下面结合附图和实施方式对本发明进行详细说明。
请参看图1，图1是本发明用于显示器的彩膜基板的结构示意图。如图1所示，本实施方式揭示的用于显示器的彩膜基板1包括基板本体11及设置基板本体11上的多个色阻图案12，该多个色阻图案12在这里指的是用于滤光并分别对应一像素的像素滤光膜。多个色阻图案12通常包括红色色阻图案R、绿色色阻图案G及蓝色色阻图案B，此外，多个色阻图案12还可以包括以上三种颜色组合的色阻图案或其他颜色色阻图案。
在本实施方式中，相邻的色阻图案12部分重叠，其中在重叠区域13，位于下方的色阻图案12的厚度在向其边缘的方向上逐渐变薄。例如，红色色阻图案R及绿色色阻图案G之间存在重叠区域13，并且，红色色阻图案R位于重叠区域13的下方，则重叠区域13中的红色色阻图案R的厚度在向其边缘的方向上逐渐变薄，并且红色色阻图案R的厚度是向其边缘的方向上呈弧形过渡。
区域别于现有技术，本实施方式揭示的用于显示器的彩膜基板1的相邻的色阻图案12之间的重叠区域13的牛角段差较小，甚至不存在牛角段差，提高液晶效率；并且，该彩膜基板1并不需要为了减少重叠区域13的牛角段差而在色阻图案12上额外增设OC平坦层，减少了彩膜基板1的生产工序，降低液晶面板的生产成本。
请参看图2，图2是本发明中彩膜基板的制作工艺示意图。这里需要强调的是，图2中所显示的彩膜基板1和光罩2、光源装置3的放置状态、彩膜基板1各元件的结构及状态并非实际生产中同一时间内的同一工艺阶段出现，图2只是为了方便说明而同时显示不同工艺阶段下的彩膜基板1的结构及状态。如图2所示，彩膜基板1包括基板本体11、色阻层14，其中，基板本体11上设置有黑色矩阵层(图未示)，色阻层14设置在带有黑色矩阵层的基板本体11上。此制作工艺示意图中还包括光罩2和光源装置3。
结合图2，请参看图3，图3是本发明中彩膜基板的制造方法流程示意图。如图3所示，本实施方式揭示的彩膜基板1的制造方法包括：
S11：提供一基板本体11。
其中，基板本体11为透明玻璃基板，对玻璃基板进行初始清洗。这里的初始清洗是将玻璃基板放入清洗槽中，利用化学或物理的方法将在玻璃基板表面上的灰尘或杂质去除，防止这些杂质尘粒对后续的制造造成影响。并对清洗后的玻璃基板进行铬溅镀，以提高玻璃基板性能。
S12：在基板本体11上涂覆色阻层14。
在本实施方式中，还包括先在基板本体11即玻璃基板上使用光阻涂布、曝光、显影、蚀刻及去光阻的方式形成黑色矩阵层，再在具有黑色矩阵层的玻璃基板上通过光阻涂布、曝光、显影的方式形成RGB色阻层14，其中，分别通过光阻涂布、曝光、显影的方式形成红色色阻层R1、绿色色阻层G1及蓝色色阻层B1。
其中，任意相邻的色阻层14部分重叠，形成重叠区域15。
S13：利用光罩2对色阻层14进行曝光。
其中，彩膜基板1的光罩2的结构如图4所示，图4是本发明彩膜基板的光罩的第一实施方式的结构示意图。请参看图4，光罩2包括遮光区域21以及由遮光区域21围设而成的透光区域22，遮光区域21的靠近透光区域22的边缘设置有间隔排列的遮光图案，进而形成半透光的灰阶光罩区域23。其中，灰阶光罩区域23设置于遮光区域21的相对两侧，遮光图案为矩形、三角、梯形或半圆形，此外，遮光图案还可以为锯齿状、圆弧状或梯形等其他规则或不规则形态，只要在光罩边缘图案化处理实现半透光即可，图4只是以矩形为例图示。
此外，彩膜基板1的光罩2的结构还可以如图5所示，图5是本发明彩膜基板的光罩的第二实施方式的结构示意图，其中，与图4所揭示的光罩2类似，光罩4也包括遮光区域41以及由遮光区域41围设而成的透光区域42，遮光区域41的靠近透光区域42的边缘设置有间隔排列的遮光图案形成的半透光的灰阶光罩区域43，遮光图案为矩形、三角、梯形或半圆形，图5只是以矩形为例图示。与图4的光罩2的区别在于，光罩4的灰阶光罩区域43置于遮光区域41的四周。这里需要强调的是，无论是光罩4的灰阶光罩区域43置于遮光区域41的四周，或是将灰阶光罩区域23设置于遮光区域21的相对两侧，均是由左右或上下相邻色阻14为不同的色阻，对应该相邻色阻14的边缘采用图案化处理的像素光罩。
这里以图4的光罩2为例说明，光源装置3发出的光通过光罩2对色阻层14进行曝光，其中灰阶光罩区域23对应任意相邻的色阻层14的重叠区域15。
S14：对曝光后的色阻层14进行显影，以获得色阻图案12。
对曝光后的色阻层14进行显影，由于在上一步制作工艺中，灰阶光罩区域23对应任意相邻的色阻层14的重叠区域15，使重叠区域15形成半曝光，因此，显影后的色阻图案12与灰阶光罩区域23的对应区域的厚度在向其边缘的方向上逐渐变薄，这里所指的是，任意两个色阻图案12之间的重叠区域13的厚度在向其边缘的方向上逐渐变薄。
因此，在一次R→G→B黄光制程中，利用精细的灰阶光罩区域23的半透光图案，实现在色阻层14边缘的半透光曝光，使边缘区域的色阻层有效减薄，从而使相邻色阻重叠区域色阻堆叠牛角段差显著减轻，通过进一步的优化设计，实现RGB色阻层14上理想的平坦化效果，提高液晶效率，省略传统的OC平坦层，节省材料，提高生产效率。
综上所述，区域别于现有技术，本发明的用于显示器的彩膜基板的光罩包括遮光区域以及由遮光区域围设而成的透光区域，遮光区域的靠近透光区域的边缘设置有间隔排列的遮光图案，进而形成半透光的灰阶光罩区域，利用该光罩对彩膜基板的基板本体上的色阻层进行曝光，从而使获得的彩膜基板的相邻的色阻图案的重叠区域中位于下方的色阻图案的厚度在向其边缘的方向上逐渐变薄，减少了相邻的色阻图案的重叠区域的牛角段差，提高液晶效率；并且，不需要在色阻图案上铺设额外的OC平坦层，降低液晶显示面板的生产成本，提高生产效率。
以上所述仅为本发明的实施方式，并非因此限制本发明的专利范围，凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换，或直接或间接运用在其他相关的技术领域，均同理包括在本发明的专利保护范围内。

Claims (10)

  1. 一种用于显示器的彩膜基板，其中，所述彩膜基板包括基板本体以及设置于所述基板本体上的多个色阻图案，相邻的色阻图案部分重叠，其中在重叠区域，位于下方的色阻图案的厚度在向其边缘的方向上逐渐变薄。
  2. 根据权利要求1所述的彩膜基板，其中，所述位于下方的色阻图案的厚度在向其边缘的方向上呈弧形过渡。
  3. 一种用于显示器的彩膜基板的制造方法，其中，所述方法包括：
    提供一基板本体；
    在所述基板本体上涂覆色阻层；
    利用光罩对所述色阻层进行曝光，其中所述光罩包括遮光区域以及由所述遮光区域围设而成的透光区域，所述遮光区域的靠近所述透光区域的边缘设置有间隔排列的遮光图案，进而形成半透光的灰阶光罩区域；
    对曝光后的所述色阻层进行显影，以获得色阻图案，其中所述色阻图案在与所述灰阶光罩区域的对应区域的厚度在向其边缘的方向上逐渐变薄。
  4. 根据权利要求3所述的方法，其中，所述灰阶光罩区域设置于所述遮光区域的相对两侧，以使得所述色阻图案的相对两侧的与所述灰阶光罩区域的对应区域的厚度在向其边缘的方向上逐渐变薄。
  5. 根据权利要求3所述的方法，其中，所述灰阶光罩区域设置于所述遮光区域的四周，以使得所述色阻图案四周的与所述灰阶光罩区域的对应区域的厚度在向其边缘的方向上逐渐变薄。
  6. 根据权利要求3所述的方法，其中，所述遮光图案为矩形、三角、梯形或半圆形。
  7. 一种彩膜基板的光罩，其中，所述光罩包括遮光区域以及由所述遮光区域围设而成的透光区域，所述遮光区域的靠近所述透光区域的边缘设置有间隔排列的遮光图案，进而形成半透光的灰阶光罩区域。
  8. 根据权利要求7所述的光罩，其中，所述灰阶光罩区域设置于所述遮光区域的相对两侧。
  9. 根据权利要求7所述的光罩，其中，所述灰阶光罩区域设置于所述遮光 区域的四周。
  10. 根据权利要求7所述的光罩，其中，所述遮光图案为矩形、三角、梯形或半圆形。
PCT/CN2014/095577 2014-12-19 2014-12-30 用于显示器的彩膜基板及其制造方法和彩膜基板的光罩 WO2016095278A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US14/426,340 US9671641B2 (en) 2014-12-19 2014-12-30 Color filter substrate used in a display and its manufacturing method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201410798615.3 2014-12-19
CN201410798615.3A CN104503128B (zh) 2014-12-19 2014-12-19 用于显示器的彩膜基板的制造方法

Publications (1)

Publication Number Publication Date
WO2016095278A1 true WO2016095278A1 (zh) 2016-06-23

Family

ID=52944533

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2014/095577 WO2016095278A1 (zh) 2014-12-19 2014-12-30 用于显示器的彩膜基板及其制造方法和彩膜基板的光罩

Country Status (3)

Country Link
US (1) US9671641B2 (zh)
CN (1) CN104503128B (zh)
WO (1) WO2016095278A1 (zh)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105093647A (zh) * 2015-08-12 2015-11-25 武汉华星光电技术有限公司 光罩及彩色滤光片基板的制作方法
CN105118383B (zh) * 2015-09-23 2019-01-25 京东方科技集团股份有限公司 一种显示基板和显示装置
US10437146B2 (en) * 2015-12-30 2019-10-08 Ming-An Hsu Method for forming a 3D pattern structure on a 3D substrate and device having color resists pattern
CN105700258B (zh) * 2016-04-08 2019-03-12 深圳市华星光电技术有限公司 液晶显示面板及其制作方法
CN106054473B (zh) * 2016-05-27 2019-05-03 深圳市华星光电技术有限公司 Coa基板、彩色滤光膜及彩色滤光膜的形成方法
CN106324932B (zh) * 2016-10-09 2019-11-22 上海中航光电子有限公司 显示面板及包含其的显示装置
CN107728374B (zh) * 2017-11-29 2021-01-29 深圳市华星光电半导体显示技术有限公司 一种彩色滤光膜基板及其制备方法
CN109960073B (zh) * 2017-12-26 2022-04-29 上海仪电显示材料有限公司 彩色滤光层的制作方法
CN108089368B (zh) 2018-01-15 2022-04-19 京东方科技集团股份有限公司 彩膜基板及制备方法、显示装置
CN108594512B (zh) * 2018-04-12 2020-11-24 深圳市华星光电技术有限公司 彩膜基板的制作方法
CN109613741A (zh) * 2019-01-11 2019-04-12 惠科股份有限公司 显示面板及其制造方法
CN109541885A (zh) * 2019-01-14 2019-03-29 京东方科技集团股份有限公司 纳米图案的拼接方法、纳米压印板、光栅及制作方法
CN109887931A (zh) * 2019-02-21 2019-06-14 深圳市华星光电半导体显示技术有限公司 阵列基板及其制备方法
CN111487794B (zh) * 2020-05-12 2023-04-07 Tcl华星光电技术有限公司 显示面板的制作方法
CN112216210B (zh) * 2020-10-14 2022-10-14 厦门天马微电子有限公司 一种彩膜基板、显示面板及显示装置
CN112684660B (zh) * 2021-01-11 2023-01-24 Tcl华星光电技术有限公司 一种掩膜板
CN113703281A (zh) * 2021-07-30 2021-11-26 惠科股份有限公司 掩膜版、阵列基板的制作方法、阵列基板

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001033617A (ja) * 1999-07-19 2001-02-09 Toppan Printing Co Ltd カラーフィルタの製造方法およびそれに用いる露光方法
US20060274231A1 (en) * 2005-06-01 2006-12-07 Kwon Oh N Color filter substrate for liquid crystal display device and method for manufacturing the same
CN102650757A (zh) * 2011-09-06 2012-08-29 北京京东方光电科技有限公司 彩膜基板、其制备方法及液晶显示面板
CN102707357A (zh) * 2012-02-29 2012-10-03 京东方科技集团股份有限公司 彩色滤光片及其制造方法
CN102830456A (zh) * 2011-06-15 2012-12-19 上海天马微电子有限公司 彩色滤光片及其形成方法
CN102866532A (zh) * 2012-09-29 2013-01-09 深圳市华星光电技术有限公司 彩色滤光基板以及其相关制作方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100502794B1 (ko) * 1997-12-06 2005-10-14 삼성전자주식회사 액정 표시 장치의 패널 제조 방법
TWI226461B (en) * 2003-03-28 2005-01-11 Quanta Display Inc Color filter and method for fabricating the same
TWI223723B (en) * 2003-09-09 2004-11-11 Toppoly Optoelectronics Corp Method of fabricating a substrate with color filter
CN1301412C (zh) * 2003-10-23 2007-02-21 统宝光电股份有限公司 滤光片结构及其制作方法
CN100492066C (zh) * 2004-04-22 2009-05-27 统宝光电股份有限公司 彩色滤光片以及液晶显示装置
CN100492067C (zh) * 2005-12-22 2009-05-27 群康科技(深圳)有限公司 彩色滤光片制造方法
JP6216540B2 (ja) * 2012-05-30 2017-10-18 ローム株式会社 有機ｅｌ発光装置およびその製造方法、および積層カラーフィルタ
JP5741879B2 (ja) * 2013-01-25 2015-07-01 凸版印刷株式会社 カラーフィルタ基板、及び液晶表示装置
CN203981913U (zh) * 2014-07-08 2014-12-03 群创光电股份有限公司 彩色滤光基板与显示面板

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001033617A (ja) * 1999-07-19 2001-02-09 Toppan Printing Co Ltd カラーフィルタの製造方法およびそれに用いる露光方法
US20060274231A1 (en) * 2005-06-01 2006-12-07 Kwon Oh N Color filter substrate for liquid crystal display device and method for manufacturing the same
CN102830456A (zh) * 2011-06-15 2012-12-19 上海天马微电子有限公司 彩色滤光片及其形成方法
CN102650757A (zh) * 2011-09-06 2012-08-29 北京京东方光电科技有限公司 彩膜基板、其制备方法及液晶显示面板
CN102707357A (zh) * 2012-02-29 2012-10-03 京东方科技集团股份有限公司 彩色滤光片及其制造方法
CN102866532A (zh) * 2012-09-29 2013-01-09 深圳市华星光电技术有限公司 彩色滤光基板以及其相关制作方法

Also Published As

Publication number Publication date
US9671641B2 (en) 2017-06-06
US20160342019A1 (en) 2016-11-24
CN104503128A (zh) 2015-04-08
CN104503128B (zh) 2018-01-09

Similar Documents

Publication Publication Date Title
WO2016095278A1 (zh) 用于显示器的彩膜基板及其制造方法和彩膜基板的光罩
KR101578692B1 (ko) 액정표시장치의 칼라필터 어레이 및 그 제조방법
TW594343B (en) Color filter structure and method of fabrication
KR101453418B1 (ko) 컬러필터 기판 및 그 제조방법
WO2017107439A1 (zh) 彩膜基板及其制作方法、显示装置
WO2014166155A1 (zh) 一种用于封框胶固化遮挡的掩模板的制造方法
TWI487955B (zh) 彩色濾光片、顯示裝置、曝光方法及光罩組
WO2014134886A1 (zh) 彩膜基板及其制作方法、液晶显示屏
CN105182679B (zh) 掩膜板及其制作方法、利用掩膜板构图的方法、滤光片
TWI499861B (zh) Close exposure mask
WO2016045141A1 (zh) 液晶显示面板及其制造方法
TW200302393A (en) Mask for photolithography, method of forming thin film, liquid crystal display device, and method of producing the liquid crystal display device
JP5292383B2 (ja) 液晶ディスプレー下基板の製造方法
WO2017185447A1 (zh) 彩膜基板的制作方法和液晶面板的制作方法
JP4033196B2 (ja) フォトリソグラフィ用マスク、薄膜形成方法及び液晶表示装置の製造方法
TWI237708B (en) Color filter of a liquid crystal display
TWI506307B (zh) 彩色濾光基板的製造方法
TWI402918B (zh) 光罩及薄膜電晶體基板之製造方法
US20200174311A1 (en) Liquid crystal display panel and manufacturing method thereof
WO2020107537A1 (zh) 显示面板及其制造方法和显示装置
JP5125481B2 (ja) フォトマスクの製造方法
TWI753032B (zh) 光罩、近接曝光用光罩之製造方法及顯示裝置之製造方法
US9977324B2 (en) Phase shift mask and method of forming patterns using the same
KR102290753B1 (ko) 패턴 형성 방법 및 이를 이용한 표시 패널의 제조 방법
WO2016084232A1 (ja) 液晶表示パネル、液晶表示装置、液晶表示パネルの製造方法

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 14426340

Country of ref document: US

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 14908313

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 14908313

Country of ref document: EP

Kind code of ref document: A1