WO2017024655A1 - 彩色滤光片基板及其制作方法、液晶面板 - Google Patents

彩色滤光片基板及其制作方法、液晶面板 Download PDF

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WO2017024655A1
WO2017024655A1 PCT/CN2015/089414 CN2015089414W WO2017024655A1 WO 2017024655 A1 WO2017024655 A1 WO 2017024655A1 CN 2015089414 W CN2015089414 W CN 2015089414W WO 2017024655 A1 WO2017024655 A1 WO 2017024655A1
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color
substrate
black matrix
photoresist
color photoresist
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PCT/CN2015/089414
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English (en)
French (fr)
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雨文驹
王威
虞晓江
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武汉华星光电技术有限公司
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Publication of WO2017024655A1 publication Critical patent/WO2017024655A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters

Definitions

  • the invention belongs to the field of liquid crystal display technology, and in particular to a color filter substrate, a manufacturing method thereof and a liquid crystal panel.
  • a color filter is an optical filter that expresses color.
  • the color filter precisely selects the small range of light rays that you want to pass, while filtering out other bands that you don't want to pass.
  • the main function of the color filter in the liquid crystal panel is to allow the light to pass through the R/G/B color photoresist therein to provide color to form a color display.
  • the color filter in the liquid crystal panel is usually composed of a black matrix (BlackMatrix), an R/G/B color photoresist and a conductive film ITO, and a spacer (Photo Spacer) on the conductive film ITO.
  • the black matrix blocks the gap between the different color photoresists to prevent light leakage, and the R/G/B color photoresist is given to the liquid crystal panel to display color.
  • the black matrix is set too wide, which affects the aperture ratio of the liquid crystal panel; the black matrix is set too narrow, and light leakage or color mixture of large viewing angles may appear.
  • the R/G/B color photoresist coating is thick, although the color gamut is appropriately increased, the black matrix is more difficult to block the light leakage and the color mixing phenomenon of the adjacent color photoresist is generated.
  • an object of the present invention is to provide a color filter substrate including: a substrate; a black matrix disposed on the substrate; and a color photoresist disposed on the substrate and Arranged from the black matrix; wherein an edge of the top surface of the color photoresist is concave.
  • the color filter substrate further includes: a conductive film layer covering the color photoresist and the black matrix.
  • the color filter substrate further includes: a spacer body disposed on the conductive film The layer is located above the black matrix.
  • Another object of the present invention is to provide a method for fabricating a color filter, comprising: providing a substrate; forming a black matrix on the substrate; and forming a color spaced apart from the black matrix on the substrate a photoresist; wherein an edge of the top surface of the color resist is concave.
  • the color photoresist is formed on the substrate using a gray scale mask.
  • the gray scale mask includes: a first exposure area opposite to an edge of a top surface of the color photoresist; and a second exposure area opposite to a non-edge of the top surface of the color photoresist;
  • the exposure amount of the first exposure region is smaller than the exposure amount of the second exposure region.
  • the gray scale mask includes: a first exposure area opposite to an edge of a top surface of the color photoresist; and a second exposure area opposite to a non-edge of the top surface of the color photoresist;
  • the exposure amount of the first exposure region is greater than the exposure amount of the second exposure region.
  • the manufacturing method further includes: forming a conductive film layer covering the color photoresist and the black matrix.
  • the manufacturing method further includes forming a spacer on the conductive film layer above the black matrix.
  • Still another object of the present invention is to provide a liquid crystal panel comprising the above-described color filter substrate.
  • the invention can avoid the phenomenon of light leakage and color mixing which are observed by a large viewing angle while increasing the display color gamut by increasing the thickness of the color photoresist.
  • FIG. 1 is a schematic structural view of a color filter substrate according to an embodiment of the present invention.
  • FIGS. 2A to 2E are flowcharts showing the fabrication of a color filter substrate according to the present invention.
  • FIG. 3 is a schematic structural view of a gray scale reticle according to an embodiment of the present invention.
  • FIG. 4 is a schematic structural view of a liquid crystal panel according to an embodiment of the present invention.
  • FIG. 1 is a schematic structural view of a color filter substrate according to an embodiment of the present invention.
  • a color filter substrate 1 includes: a substrate 11; a black matrix 12 disposed on the substrate 11; and a color photoresist 13 disposed on the substrate 11 and spaced apart from the black matrix 12; Wherein, the edge of the top surface 131 of the color resist 13 is concave. Further, in the present embodiment, both side edges of the top surface 131 of the color resist 13 are respectively recessed, so that the top surface 131 of the color resist 13 has a shape in which the intermediate portion is convex and the both sides are concave.
  • the substrate 11 may be a transparent glass substrate, but the present invention is not limited thereto.
  • the substrate 11 may be a transparent resin substrate.
  • the black matrix 12 may be formed of a ferrous metal such as chrome, but the present invention is not limited thereto, and for example, the black matrix 12 may be formed of a black resin.
  • the color photoresist 13 may be a red color photoresist (represented by R in FIG. 1) or a green color photoresist (indicated by G in FIG. 1) or a blue color photoresist (indicated by B in FIG. 1), but the present invention does not Limited to this.
  • red color photoresist, green color photoresist, blue color photoresist and black matrix 12 interval settings. Further, in the present embodiment, the color photoresist 13 covers a portion of the top surface 121 of the black matrix 12.
  • the color filter substrate 1 further includes a conductive film layer 14 covering the color photoresist 13 and the black matrix 12.
  • the conductive film layer 14 covers the top surface 131 of the color photoresist 13 and the top surface 121 of the black matrix 12 that is not covered by the color photoresist 13.
  • the conductive film layer 14 is formed of indium tin oxide ITO, but the present invention is not limited thereto.
  • the color filter substrate 1 further includes: a photo spacer 15 disposed on the conductive film layer 14 and located on the top of the black matrix 12 not covered by the color photoresist 13 Above the surface 121.
  • the number of the black matrix 12, the color photoresist 13, and the spacers 15 is not limited to that shown in Fig. 1, and the number thereof may be any number.
  • FIGS. 2A through 2E are flow charts showing the fabrication of a color filter substrate in accordance with the present invention.
  • 3 is a schematic structural view of a gray scale reticle in accordance with an embodiment of the present invention.
  • the substrate 11 may be a transparent glass substrate.
  • the present invention is not limited thereto.
  • the substrate 11 may be a transparent resin substrate.
  • a black matrix 12 is formed on the substrate 11.
  • the black matrix 12 may be formed of a ferrous metal such as chrome, but the present invention is not limited thereto, and for example, the black matrix 12 may be formed of a black resin.
  • a color photoresist 13 spaced apart from the black matrix 12 is formed on the substrate 11; wherein the edge of the top surface 131 of the color photoresist 13 is concave.
  • the two side edges of the top surface 131 of the color resist 13 are respectively recessed, so that the top surface 131 of the color photoresist 13 has a shape in which the intermediate portion is convex and the both sides are concave.
  • the color resist 13 when the color resist 13 is fabricated using a negative photoresist, the color resist 13 is further formed on the substrate 11 by using the gray scale mask 4 shown in FIG.
  • the gray scale mask 4 shown in FIG. 3 includes a first exposure region 41 opposite to the edge of the top surface 131 of the color photoresist 13, and a non-edge (ie, color) with the top surface 131 of the color photoresist 13. a second exposure region 42 opposite to the edge of the top surface 131 of the photoresist 13; wherein the exposure of the first exposure region 41 is less than the second exposure The exposure amount of the area 42.
  • the gray scale mask 4 uses a grating structure, that is, a hole or a slit in the first exposure region 41, so that the first exposure region 41 can pass part of the UV light to achieve that the exposure amount of the first exposure region 41 is smaller than The exposure amount of the second exposure region 42. It is to be understood that the manner of changing the exposure amount is not limited thereto, and the light transmittance may be adjusted by using a semi-permeable membrane, which is not specifically limited herein.
  • the exposure amount of the first exposure region 41 is larger than the exposure amount of the second exposure region 42.
  • the color photoresist 13 may be a red color photoresist (represented by R in FIG. 2C) or a green color photoresist (represented by G in FIG. 2C) or a blue color photoresist (represented by B in FIG. 2C), but the present invention Not limited to this.
  • the red color photoresist, the green color photoresist, and the blue color photoresist are spaced apart from the black matrix 12. Further, in the present embodiment, the color photoresist 13 covers a portion of the top surface 121 of the black matrix 12.
  • a conductive film layer 14 covering the color photoresist 13 and the black matrix 12 is formed; in the present embodiment, the conductive film layer 14 is formed of indium tin oxide ITO, but the present invention is not limited thereto. Further, the conductive film layer 14 covers the top surface 131 of the color photoresist 13 and the top surface 121 of the black matrix 12 not covered by the color photoresist 13.
  • a spacer (photo spacer) 15 located above the black matrix 12 is formed on the conductive film layer 14. Further, the spacer holder 15 is located above the top surface 121 that is not covered by the color photoresist 13.
  • FIG. 4 is a schematic structural view of a liquid crystal panel according to an embodiment of the present invention.
  • a liquid crystal panel according to an embodiment of the present invention includes a color filter substrate 1 and an array substrate 2 shown in Fig. 1 provided to a cartridge, and a liquid crystal layer 3 interposed therebetween.
  • the array substrate 2 will not be described in detail. Those skilled in the art can refer to the existing technology of the array substrate to know the specific structure of the array substrate 2.

Abstract

一种彩色滤光片基板（1），其包括：基板（11）；黑色矩阵（12），设置在所述基板（11）上；彩色光阻（13），设置在所述基板（11）上且与所述黑色矩阵（12）间隔设置；其中，所述彩色光阻（13）的顶表面（131）的边缘下凹。一种彩色滤光片基板（1）的制作方法以及具有该彩色滤光片基板（1）的液晶面板。能够在通过增加彩色光阻（13）厚度提高显示色域的同时，避免大视角观看出现的漏光和混色的现象。

Description

彩色滤光片基板及其制作方法、液晶面板 技术领域
本发明属于液晶显示技术领域，具体地讲，涉及一种彩色滤光片基板及其制作方法、液晶面板。
背景技术
彩色滤光片(ColorFilter，简称CF)是一种表现颜色的光学滤光片。彩色滤光片可以精确选择欲通过的小范围波段光线，而过滤掉其他不希望通过的波段光线。彩色滤光片在液晶面板中的主要作用是让光线透过其中的R/G/B彩色光阻之后提供色彩，形成彩色显示画面。液晶面板中的彩色滤光片通常由黑色矩阵(BlackMatrix)、R/G/B彩色光阻和导电膜ITO及在导电膜ITO之上的间隔保持体(Photo Spacer)等组成。黑色矩阵遮挡不同彩色光阻之间的缝隙，以防止漏光，R/G/B彩色光阻赋予液晶面板以显示色彩。
在现有的彩色滤光片的制程中，黑色矩阵设置过宽，会影响液晶面板的开口率；黑色矩阵设置过窄，又会出现大视角观看的漏光或者混色。此外，如果R/G/B彩色光阻涂布较厚，虽然会适当提高色域，但增加黑色矩阵对漏光的遮挡难度而产生相邻彩色光阻的混色现象。
发明内容
为了解决上述现有技术中存在的问题，本发明目的在于提供一种彩色滤光片基板，其包括：基板；黑色矩阵，设置在所述基板上；彩色光阻，设置在所述基板上且与所述黑色矩阵间隔设置；其中，所述彩色光阻的顶表面的边缘下凹。
进一步地，所述彩色滤光片基板还包括：导电膜层，覆盖所述彩色光阻和所述黑色矩阵。
进一步地，所述彩色滤光片基板还包括：间隔保持体，设置在所述导电膜 层上并位于所述黑色矩阵的上方。
本发明的另一目的还在于提供一种彩色滤光片的制作方法，其包括：提供一基板；在所述基板上形成黑色矩阵；在所述基板上形成与所述黑色矩阵间隔设置的彩色光阻；其中，所述彩色光阻的顶表面的边缘下凹。
进一步地，利用灰阶光罩在所述基板上形成所述彩色光阻。
进一步地，所述灰阶光罩包括：与所述彩色光阻的顶表面的边缘相对的第一曝光区以及与所述彩色光阻的顶表面的非边缘相对的第二曝光区；其中，当所述彩色光阻采用负性光阻制作时，所述第一曝光区的曝光量小于所述第二曝光区的曝光量。
进一步地，所述灰阶光罩包括：与所述彩色光阻的顶表面的边缘相对的第一曝光区以及与所述彩色光阻的顶表面的非边缘相对的第二曝光区；其中，当所述彩色光阻采用正性光阻制作时，所述第一曝光区的曝光量大于所述第二曝光区的曝光量。
进一步地，所述制作方法还包括：形成覆盖所述彩色光阻和所述黑色矩阵的导电膜层。
进一步地，所述制作方法还包括：在所述导电膜层上形成位于所述黑色矩阵上方的间隔保持体。
本发明的又一目的又在于提供一种液晶面板，其包括上述的彩色滤光片基板。
本发明能够在通过增加彩色光阻厚度提高显示色域的同时，避免大视角观看出现的漏光和混色的现象。
附图说明
通过结合附图进行的以下描述，本发明的实施例的上述和其它方面、特点和优点将变得更加清楚，附图中：
图1是根据本发明的实施例的彩色滤光片基板的结构示意图；
图2A至图2E是根据本发明的彩色滤光片基板的制作流程图；
图3是根据本发明的实施例的灰阶光罩的结构示意图；
图4是根据本发明的实施例的液晶面板的结构示意图。
具体实施方式
以下，将参照附图来详细描述本发明的实施例。然而，可以以许多不同的形式来实施本发明，并且本发明不应该被解释为限制于这里阐述的具体实施例。相反，提供这些实施例是为了解释本发明的原理及其实际应用，从而使本领域的其他技术人员能够理解本发明的各种实施例和适合于特定预期应用的各种修改。
在附图中，为了清楚器件，夸大了层和区域的厚度，相同的标号在整个说明书和附图中可用来表示相同的元件。
也将理解的是，在一层或元件被称为在或形成在另一层或基板“之上”时，它可以直接在或形成在该另一层或基板上，或者也可以存在中间层。
图1是根据本发明的实施例的彩色滤光片基板的结构示意图。
参照图1，根据本发明的实施例的彩色滤光片基板1包括：基板11；黑色矩阵12，设置在基板11上；彩色光阻13，设置在基板11上且与黑色矩阵12间隔设置；其中，彩色光阻13的顶表面131的边缘下凹。进一步地，在本实施例中，彩色光阻13的顶表面131的两侧边缘分别下凹，从而使彩色光阻13的顶表面131呈现中间部分凸出，而两侧边缘下凹的形态。
在本实施例中，基板11可为透明的玻璃基板，但本发明并不限制于此，例如基板11也可为透明的树脂基板。
在本实施例中，黑色矩阵12可由铬等黑色金属形成，但本发明并不限制于此，例如，黑色矩阵12也可由黑色树脂形成。
彩色光阻13可为红色彩色光阻(图1中以R表示)或者绿色彩色光阻(图1中以G表示)或者蓝色彩色光阻(图1中以B表示)，但本发明并不限制于此。在本实施例中，红色彩色光阻、绿色彩色光阻、蓝色彩色光阻与黑色矩阵 12间隔设置。进一步地，在本实施例中，彩色光阻13覆盖黑色矩阵12的顶表面121的部分。
此外，根据本发明的实施例的彩色滤光片基板1还包括：导电膜层14，覆盖彩色光阻13及黑色矩阵12。具体地，导电膜层14覆盖彩色光阻13的顶表面131及黑色矩阵12的未被彩色光阻13覆盖的顶表面121。在本实施例中，导电膜层14由氧化铟锡ITO形成，但本发明并不限制于此。
进一步地，根据本发明的实施例的彩色滤光片基板1还包括：间隔保持体(Photo Spacer)15，设置在导电膜层14上并位于黑色矩阵12的未被彩色光阻13覆盖的顶表面121的上方。
在本发明中，黑色矩阵12、彩色光阻13、间隔保持体15的数量并不以图1中所示为限，它们的数量可以为任意数量。
图2A至图2E是根据本发明的彩色滤光片基板的制作流程图。图3是根据本发明的实施例的灰阶光罩的结构示意图。
参照图2A，提供一基板11；在本实施例中，基板11可为透明的玻璃基板，但本发明并不限制于此，例如基板11也可为透明的树脂基板。
参照图2B，在基板11上形成黑色矩阵12；在本实施例中，黑色矩阵12可由铬等黑色金属形成，但本发明并不限制于此，例如，黑色矩阵12也可由黑色树脂形成。
参照图2C，在基板11上形成与黑色矩阵12间隔设置的彩色光阻13；其中，彩色光阻13的顶表面131的边缘下凹。在本实施例中，进一步地，彩色光阻13的顶表面131的两侧边缘分别下凹，从而使彩色光阻13的顶表面131呈现中间部分凸出，而两侧边缘下凹的形态。
在本实施例中，当彩色光阻13采用负性光阻制作时，进一步地利用图3所示的灰阶光罩4在基板11上形成彩色光阻13。这里，图3所示的灰阶光罩4包括：与彩色光阻13的顶表面131的边缘相对的第一曝光区41，以及与彩色光阻13的顶表面131的非边缘(即，彩色光阻13的顶表面131的除边缘的位置处)相对的第二曝光区42；其中，第一曝光区41的曝光量小于第二曝光 区42的曝光量。在本实施例中，灰阶光罩4在第一曝光区41使用光栅结构，即孔或狭缝，使得第一曝光区41能通过部分UV光，以实现第一曝光区41的曝光量小于第二曝光区42的曝光量。可以理解的是，上述改变曝光量的方式并不限于此，还可以采用半透膜调整光透过率来实现，在此不作具体限定。
作为本发明的另一实施方式，当彩色光阻13采用正性光阻制作时，第一曝光区41的曝光量大于第二曝光区42的曝光量。
此外，彩色光阻13可为红色彩色光阻(图2C中以R表示)或者绿色彩色光阻(图2C中以G表示)或者蓝色彩色光阻(图2C中以B表示)，但本发明并不限制于此。在本实施例中，红色彩色光阻、绿色彩色光阻、蓝色彩色光阻与黑色矩阵12间隔设置。进一步地，在本实施例中，彩色光阻13覆盖黑色矩阵12的顶表面121的部分。
参照图2D，形成覆盖彩色光阻13和黑色矩阵12的导电膜层14；在本实施例中，导电膜层14由氧化铟锡ITO形成，但本发明并不限制于此。进一步地，导电膜层14覆盖彩色光阻13的顶表面131及黑色矩阵12的未被彩色光阻13覆盖的顶表面121。
参照图2E，在导电膜层14上形成位于黑色矩阵12上方的间隔保持体(Photo Spacer)15。进一步地，间隔保持体15位于未被彩色光阻13覆盖的顶表面121的上方。
图4是根据本发明的实施例的液晶面板的结构示意图。
参照图4，根据本发明的实施例的液晶面板包括：对盒设置的图1所示的彩色滤光片基板1和阵列基板2，以及夹设于二者之间的液晶层3。在本实施例中，为了避免赘述，不再详细对阵列基板2进行详细描述，本领域的技术人员可参照现有的关于阵列基板的技术来获知阵列基板2的具体结构。
综上所述，根据本发明的实施例，能够在通过增加彩色光阻厚度提高显示色域的同时，避免大视角观看出现的漏光和混色的现象。
虽然已经参照特定实施例示出并描述了本发明，但是本领域的技术人员将理解：在不脱离由权利要求及其等同物限定的本发明的精神和范围的情况下， 可在此进行形式和细节上的各种变化。

Claims (12)

  1. 一种彩色滤光片基板，其中，包括：
    基板；
    黑色矩阵，设置在所述基板上；
    彩色光阻，设置在所述基板上且与所述黑色矩阵间隔设置；
    其中，所述彩色光阻的顶表面的边缘下凹。
  2. 根据权利要求1所述的彩色滤光片基板，其中，所述彩色滤光片基板还包括：导电膜层，覆盖所述彩色光阻和所述黑色矩阵。
  3. 根据权利要求2所述的彩色滤光片基板，其中，所述彩色滤光片基板还包括：间隔保持体，设置在所述导电膜层上并位于所述黑色矩阵的上方。
  4. 一种彩色滤光片的制作方法，其中，包括：
    提供一基板；
    在所述基板上形成黑色矩阵；
    在所述基板上形成与所述黑色矩阵间隔设置的彩色光阻；
    其中，所述彩色光阻的顶表面的边缘下凹。
  5. 根据权利要求4所述的制作方法，其中，利用灰阶光罩在所述基板上形成所述彩色光阻。
  6. 根据权利要求5所述的制作方法，其中，所述灰阶光罩包括：与所述彩色光阻的顶表面的边缘相对的第一曝光区以及与所述彩色光阻的顶表面的非边缘相对的第二曝光区；其中，当所述彩色光阻采用负性光阻制作时，所述第一曝光区的曝光量小于所述第二曝光区的曝光量。
  7. 根据权利要求5所述的制作方法，其中，所述灰阶光罩包括：与所述 彩色光阻的顶表面的边缘相对的第一曝光区以及与所述彩色光阻的顶表面的非边缘相对的第二曝光区；其中，当所述彩色光阻采用正性光阻制作时，所述第一曝光区的曝光量大于所述第二曝光区的曝光量。
  8. 根据权利要求4所述的制作方法，其中，还包括：形成覆盖所述彩色光阻和所述黑色矩阵的导电膜层。
  9. 根据权利要求5所述的制作方法，其中，还包括：形成覆盖所述彩色光阻和所述黑色矩阵的导电膜层。
  10. 根据权利要求6所述的制作方法，其中，还包括：形成覆盖所述彩色光阻和所述黑色矩阵的导电膜层。
  11. 根据权利要求7所述的制作方法，其中，还包括：形成覆盖所述彩色光阻和所述黑色矩阵的导电膜层。12、根据权利要求8所述的制作方法，其中，还包括：在所述导电膜层上形成位于所述黑色矩阵上方的间隔保持体。
  12. 一种液晶面板，其中，包括彩色滤光片基板，所述彩色滤光片基板包括：
    基板；
    黑色矩阵，设置在所述基板上；
    彩色光阻，设置在所述基板上且与所述黑色矩阵间隔设置；
    其中，所述彩色光阻的顶表面的边缘下凹。
PCT/CN2015/089414 2015-08-11 2015-09-11 彩色滤光片基板及其制作方法、液晶面板 WO2017024655A1 (zh)

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