WO2014047982A1 - 彩色滤光基板以及其相关制作方法 - Google Patents

彩色滤光基板以及其相关制作方法 Download PDF

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Publication number
WO2014047982A1
WO2014047982A1 PCT/CN2012/082829 CN2012082829W WO2014047982A1 WO 2014047982 A1 WO2014047982 A1 WO 2014047982A1 CN 2012082829 W CN2012082829 W CN 2012082829W WO 2014047982 A1 WO2014047982 A1 WO 2014047982A1
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film layer
color
black matrix
layer
filter substrate
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PCT/CN2012/082829
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English (en)
French (fr)
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袁继旺
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深圳市华星光电技术有限公司
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Priority to US13/696,066 priority Critical patent/US20140092497A1/en
Application filed by 深圳市华星光电技术有限公司 filed Critical 深圳市华星光电技术有限公司
Publication of WO2014047982A1 publication Critical patent/WO2014047982A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays

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  • the invention relates to a display technology, in particular to a color filter substrate and a related manufacturing method thereof.
  • Liquid crystal display (Liquid Crystal Display, LCD) is widely used in modern information equipment such as computers, mobile phones and personal digital assistants due to its advantages of lightness, thinness and low power consumption.
  • a liquid crystal display includes a liquid crystal display panel and a backlight module (backlight) Module), since the liquid crystal display panel itself does not emit light, the liquid crystal display must rely on the light source in the backlight module to emit light.
  • the light emitted by the light source in the backlight module passes through the liquid crystal of the liquid crystal display panel, and the light intensity transmitted to the user is adjusted by the steering of the liquid crystal to output an image.
  • the color filter substrate is an indispensable component in the liquid crystal display.
  • the color filter substrate is placed in front of the light source, and the light of the light source is separated into three primary colors of red, green and blue by filtering the color filter substrate.
  • the LCD monitor can display color images.
  • FIG. 1 illustrates the structure of a conventional color filter substrate 100 .
  • the color filter substrate 100 includes a glass substrate 110, a black matrix layer 120, a red film layer 131, a green film layer 132, and a blue film layer 133.
  • the red film layer 131, the green film layer 132, and the blue film layer 133 are collectively referred to as a color film layer, and the liquid crystal display separates the light of the three primary colors of red, green, and blue by the color film layer to display a color image.
  • a region in which the red film layer 131, the green film layer 132, and the blue film layer 133 overlap the black matrix layer 120 can be seen in FIG.
  • the color film layer and the black matrix layer 120 have a certain overlapping region.
  • the manner in which the color film layer partially overlaps the black matrix layer 120 is such that the overlap region of the color film layer and the black matrix layer 120 is higher than that of the black matrix layer 120 because the overlapping regions are not completely removed by etching. Unoverlapping areas. That is to say, the overlapping area of the color film layer and the black matrix layer 120 forms a protrusion, thereby causing the angular difference d of these color film layers. This angular difference d may affect the alignment of the liquid crystal at the sub-pixel edge.
  • the invention provides a color filter substrate and a related manufacturing method thereof, wherein a color film layer is formed by masks having different light transmittances, and therefore, the color film layer undergoes different degrees of exposure and development during the manufacturing process.
  • a color film layer is formed by masks having different light transmittances, and therefore, the color film layer undergoes different degrees of exposure and development during the manufacturing process.
  • different regions of the color film layer are etched differently, and the height of the overlapping region of the color film layer and the black matrix layer is substantially equal to the non-overlapping region.
  • the problem of the angular difference of the prior art color film layer can be eliminated, so that the liquid crystal alignment effect at the edge of the sub-pixel is better.
  • the present invention provides a method of fabricating a color filter substrate for fabricating a color filter substrate, the method comprising: providing a glass substrate; forming a black matrix layer on the glass substrate; Depositing a color film layer on the glass substrate and the black matrix layer; using a mask having a plurality of light transmittances to perform different degrees of exposure and development on the color film layer; and according to the result of exposure development Etching the color film layer such that a first region of the color film layer overlapping the black matrix layer is partially etched, and a second region of the color film layer overlapping the black matrix layer is completely Etching.
  • the mask is a halftone mask.
  • the color film layer comprises a red film layer, a blue film layer and a green film layer.
  • the step of generating the color film layer comprises: generating the red film layer on the glass substrate and the black matrix layer, and using the mask to perform different exposure and development on the red film layer; And etching the red film layer according to the result of exposure development.
  • the present invention further provides a color filter substrate comprising a glass substrate; a black matrix layer on the glass substrate; and a color film layer on the glass substrate and the black matrix layer;
  • the height of the overlap of the color film layer and the black matrix layer is substantially equal to the height of the non-overlapping portion.
  • the height of the overlap between the color film layer and the black matrix layer is substantially equal to that of the non-overlapping portion, and the color film layer is subjected to different degrees by using a mask having a plurality of light transmittances. The exposure is developed and the color film layer is etched.
  • the mask is a halftone mask.
  • the color film layer comprises a red film layer, a blue film layer, and a green film layer.
  • the invention provides a color filter substrate and a related manufacturing method for fabricating a color film layer by using masks having different light transmittances. Therefore, the color film layer is subjected to different degrees of exposure and development during the manufacturing process, so that in the subsequent etching process, different etching degrees are formed on different regions of the color film layer, thereby making the color film layer and black color.
  • the height of the overlapping area of the matrix layer is approximately equal to the area that is not overlapped. In this way, the problem of the angular difference of the prior art color film layer can be eliminated, so that the liquid crystal alignment effect at the edge of the sub-pixel is better.
  • FIG. 1 illustrates the structure of a conventional color filter substrate.
  • FIG 2 is a schematic view of a color filter substrate of the present invention.
  • 3 to 9 are schematic views showing the process of the color filter substrate of FIG. 2.
  • FIG. 2 is a schematic diagram of a color filter substrate 400 of the present invention.
  • the color filter substrate 400 includes a glass substrate 410, a black matrix layer 420, a red film layer 431, a green film layer 432, and a blue film layer 433.
  • the red film layer 431, the green film layer 432, and the blue film layer 433 are collectively referred to as a color film layer.
  • the liquid crystal display separates the light of the three primary colors of red, green and blue by the color film layer to display a color image.
  • the color film layer itself does not have an angular step difference.
  • the height of the first region D1 in which the red film layer 431 overlaps the black matrix layer 420 is substantially equal to the non-overlapping portion.
  • FIG. 3 to FIG. 7 are schematic diagrams showing the process of the color filter substrate 400 of FIG. 2 .
  • a color resist layer (the subsequent black matrix layer) is formed on the glass substrate 410.
  • the color resist layer is subjected to exposure development and etching to produce a black matrix layer 420.
  • a red film layer 431 is deposited over the glass substrate 410 and the black matrix layer 420.
  • use a halftone mask (half-tone) Mask) 510 exposes and develops the red film layer 431.
  • the halftone mask 510 has different light transmittances in different regions.
  • the halftone mask 510 has three regions A1, A2, and A3, the region A1 indicates a region through which part of the light is permeable, and the region A2 indicates that the light cannot be transmitted. In the transmitted area, the area A3 indicates an area through which all light can pass. Therefore, the present invention can suitably utilize a halftone mask to perform different exposure development on various regions of the red film layer 431.
  • the area A1 of the halftone mask 510 is aligned with the area to be partially removed by the red film layer 431 (ie, the first area D1 of FIG. 2), and the area A2 of the halftone mask 510 is aligned with the red layer. 431.
  • the area to be completely removed i.e., the second area D2 of Fig. 2
  • the area A3 of the halftone mask 510 is aligned with the area where the red film layer 431 does not need to be removed (i.e., the third area D3 of Fig. 2). Since the light transmittances of the respective regions A1 - A3 of the halftone mask 510 are different, the photoresist 330 forms photoresists of different strengths depending on the light transmittance.
  • red film layer 431 of the first region D1 and all the red film layers 431 of the second region D2 are removed by a chemical solvent.
  • red film layer 431 of the third region D3 it is completely retained due to the protection of the photoresist. Finally, the photoresist is removed with another chemical solvent.
  • the red film layer 431 has a red film layer 431 which originally has a protrusion at the time of etching. Partial etching is performed (corresponding to the first region D1), and the red film layer 431 corresponding to the second region D2 is completely retained, and the red film layer 431 corresponding to the third region D3 is completely etched and removed, thus, With a proper design, the red film layer 431 can have no angular difference.
  • a blue film layer 432 is deposited over the glass substrate 410 and the black matrix layer 420, and a photoresist 330 is applied over the blue film layer 432.
  • the blue film layer 432 is exposed using the halftone mask 610.
  • the halftone mask 610 has different light transmittances in different regions.
  • the halftone mask 610 has three regions B1, B2, and B3, the region B1 indicates a region through which part of the light can pass, and the region B2 indicates that the light cannot be transmitted. In the transmitted area, the area B3 indicates an area through which all light can pass. Therefore, the present invention can suitably utilize the halftone mask 610 to perform different exposure development on the respective regions of the blue film layer 432.
  • the area B1 of the halftone mask 610 is aligned with the area to be partially removed by the blue film layer 432, and the area B2 of the halftone mask 610 is aligned with the area where the blue film layer 432 is to be completely removed.
  • the area B3 of the tone mask 610 is aligned with the area where the blue film layer 432 is completely unnecessary to be removed. Since the light transmittances of the respective regions B1 - B3 of the halftone mask 610 are different, the photoresist 330 forms photoresists of different intensities depending on the light transmittance. Thereafter, a portion of the blue film layer 432 of the region B1 and all of the blue film layers 432 of the region B2 are removed by chemical solvent. As for the blue film layer 432 of the region B3, it is completely retained due to the protection of the photoresist. Finally, the photoresist is removed with another chemical solvent.
  • the blue film layer 432 having the protrusions corresponding to the original region B1 is partially etched at the time of etching, and the blue film layer 432 of the corresponding region B2 is etched. It is completely retained, and the blue film layer 432 of the corresponding region B3 is completely etched and removed, so that the blue film layer 432 can have no angular difference by a proper design.
  • a green film layer 433 is deposited over the glass substrate 410 and the black matrix layer 420, and a photoresist 330 is applied over the green film layer 433.
  • the green film layer 433 is exposed using the halftone mask 710.
  • the halftone mask 710 has different light transmittances in different regions.
  • the halftone mask 710 has three regions C1, C2, and C3, the region C1 indicates a region through which part of the light can pass, and the region C2 indicates that the light cannot be transmitted. In the transmitted area, the area C3 indicates an area through which all light can pass. Therefore, the present invention can suitably utilize the halftone mask 710 to perform different exposure development on the respective regions of the green film layer 433.
  • the area C1 of the halftone mask 710 is aligned with the area to be partially removed by the green film layer 433, and the area C2 of the halftone mask 710 is aligned with the area where the green film layer 433 is to be completely removed, and the halftone is masked.
  • the area C3 of the film 710 is aligned with the area where the green film layer 433 is completely unnecessary to be removed. Since the light transmittances of the respective regions C1 - C3 of the halftone mask 710 are different, the photoresist 330 forms photoresists of different intensities depending on the light transmittance.
  • the green film layer 433 having the protrusion corresponding to the region C1 is partially etched at the time of etching, and the green film layer 433 of the corresponding region C2 is completely etched.
  • the green film layer 433 of the corresponding region C3 is completely removed by etching, so that the green film layer 433 can have no angular difference by a suitable design.
  • the present invention does not limit the manner in which the color film layer is produced, whether by printing, deposition or other means of production, is within the scope of the present invention.
  • the present invention provides a color filter substrate and a related manufacturing method for fabricating a color film layer by using masks having different light transmittances. Therefore, the color film layer is subjected to different degrees of exposure and development during the manufacturing process, so that in the subsequent etching process, different etching degrees are formed on different regions of the color film layer, thereby making the color film layer and black color.
  • the height of the overlapping area of the matrix layer is approximately equal to the area that is not overlapped. In this way, the problem of the angular difference of the prior art color film layer can be eliminated, so that the liquid crystal alignment effect at the edge of the sub-pixel is better.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

一种彩色滤光基板的制作方法，包含：提供一玻璃基板（410）；于玻璃基板（410）上形成一黑色矩阵层（420）；于玻璃基板（410）与黑色矩阵层（420）上沉积一彩色膜层（431，432，433）；利用具有多种透光率的一掩膜（510），对彩色膜层（431，432，433）进行不同程度的曝光显影；以及根据曝光显影的结果，来蚀刻彩色膜层（431，432，433），以使彩色膜层（431，432，433）与黑色矩阵层（420）重叠的一第一区域（D1）被部分蚀刻，以及彩色膜层（431，432，433）与黑色矩阵层（420）重叠的一第二区域（D3）被完全蚀刻。

Description

彩色滤光基板以及其相关制作方法 技术领域
本发明涉及一种显示器技术，尤其涉及一种彩色滤光基板以及其相关制作方法。
 背景技术
液晶显示器(Liquid Crystal Display，LCD)轻、薄、低耗电等优点，被广泛应用于计算机、移动电话及个人数字助理等现代化信息设备。一般来说，液晶显示器包含液晶显示面板及背光模块(backlight module)，由于液晶显示面板自身不会发光，因此液晶显示器必须仰赖背光模块内的光源来发出光线。由背光模块内的光源所发出的光线，经过液晶显示面板的液晶，藉由液晶的转向，来调整传递至使用者的光线强度，进而输出影像。
彩色滤光基板是液晶显示器中不可或缺的零件，一般彩色滤光基板会放置在光源之前，藉由彩色滤光基板的滤光，可使光源的光线分离成为红绿蓝三原色，藉此，液晶显示器方能显示彩色影像。
请参阅图1，图1绘示了现有彩色滤光基板100的结构。彩色滤光基板100包含了玻璃基板110、黑色矩阵层120、红色膜层131、绿色膜层132、以及蓝色膜层133。红色膜层131、绿色膜层132以及蓝色膜层133合称为彩色膜层，液晶显示器便是藉由这彩色膜层，来分离出红绿蓝三原色的光，以显示彩色影像。
在图1中可以见到红色膜层131、绿色膜层132以及蓝色膜层133与黑色矩阵层120具有重叠的区域。在制作彩色滤光基板100时，为了避免彩色膜层边缘漏光，因此会使彩色膜层与黑色矩阵层120有一定的重叠区域。然而，让彩色膜层与黑色矩阵层120部分重叠的制作方式，由于没有完全将这些重叠区域藉由蚀刻的方式去除之，因此会导致彩色膜层与黑色矩阵层120的重叠区域的高度高于未重叠的区域。也就是说，彩色膜层与黑色矩阵层120的重叠区域会形成一个突起，进而造成这些彩色膜层的角段差d。此角段差d可能会影响子像素(sub-pixel)边缘处液晶的排列效果。
因此，业界必须提出其他的方式，来解决这样的问题。
 技术问题
本发明提供一种彩色滤光基板以及其相关制作方式，其藉由具有不同透光率的掩膜，来制作彩色膜层，因此，彩色膜层在制作过程中会经过不同程度的曝光显影，如此一来，在其后的蚀刻过程中，就会对彩色膜层不同区域有不同的蚀刻程度，进而使彩色膜层与黑色矩阵层的重叠区域的高度大致等于未重叠的区域。如此一来，便可消除现有技术彩色膜层的角段差问题，使得子像素边缘处的液晶排列效果更佳。
 技术解决方案
本发明提供了一种彩色滤光基板的制作方法，用来制作一彩色滤光基板，所述制作方法包含：提供一玻璃基板；于所述玻璃基板上，形成一黑色矩阵层；于所述玻璃基板与所述黑色矩阵层上，沉积一彩色膜层；利用具有多种透光率的一掩膜，以对所述彩色膜层进行不同程度的曝光显影；以及根据曝光显影的结果，来蚀刻所述彩色膜层，以使所述彩色膜层与所述黑色矩阵层重叠的一第一区域被部分蚀刻，以及所述彩色膜层与所述黑色矩阵层重叠的一第二区域被完全蚀刻。
其中，所述掩膜为一半色调掩膜。
其中，所述彩色膜层包含一红色膜层、一蓝色膜层以及一绿色膜层。
此外，产生所述彩色膜层的步骤包含：于所述玻璃基板与所述黑色矩阵层上产生所述红色膜层，利用所述掩膜，对所述红色膜层进行不同程度的曝光显影；以及根据曝光显影的结果，来蚀刻所述红色膜层。
本发明又提供了一种彩色滤光基板，包含一玻璃基板；一黑色矩阵层，位于所述玻璃基板上；以及一彩色膜层，位于所述玻璃基板以及所述黑色矩阵层上；其中，所述彩色膜层与所述黑色矩阵层的重叠处与未重叠处的高度大致相等。
其中，所述彩色膜层与所述黑色矩阵层的重叠处与未重叠处的高度大致相等，是藉由利用具有多种透光率的一掩膜，以对所述彩色膜层进行不同程度的曝光显影，并蚀刻所述彩色膜层制作而成。
并且，所述掩膜为一半色调掩膜。
其中，所述彩色膜层包含一红色膜层、一蓝色膜层、以及一绿色膜层。
 有益效果
本发明提供一种彩色滤光基板与相关制作方式，其藉由具有不同透光率的掩膜，来制作彩色膜层。因此，彩色膜层在制作过程中会经过不同程度的曝光显影，如此一来，在其后的蚀刻过程中，就会对彩色膜层不同区域有不同的蚀刻程度，进而使彩色膜层与黑色矩阵层的重叠区域的高度大致等于未重叠的区域。如此一来，便可消除现有技术彩色膜层的角段差问题，使得子像素边缘处的液晶排列效果更佳。
 附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动性的前提下，还可以根据这些附图获得其他的附图。
图1绘示现有彩色滤光基板的结构。
图2绘示本发明彩色滤光基板的示意图。
图3-图9为图2彩色滤光基板的制程示意图。
 本发明的最佳实施方式
以下各实施例的说明是参考附加的图式，用以例示本发明可用以实施之特定实施例。本发明所提到的方向用语，例如「上」、「下」、「前」、「后」、「左」、「右」、「顶」、「底」、「水平」、「垂直」等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。
请参阅图2，图2为本发明彩色滤光基板400的示意图。彩色滤光基板400包含有玻璃基板410、黑色矩阵层420、红色膜层431、绿色膜层432、以及蓝色膜层433。红色膜层431、绿色膜层432以及蓝色膜层433合称为彩色膜层。液晶显示器便是藉由这彩色膜层，来分离出红绿蓝三原色的光，以显示彩色影像。
然而，于本实施例中，彩色膜层本身不具有角段差，以红色膜层431为例，红色膜层431与黑色矩阵层420重叠的第一区域D1中，其高度大致等于未重叠的第二区域D2，而不具有角段差。这是由于本发明在制作彩色膜层时采用了特殊的制程方式，此制程方式将于下面的揭露中陈述。
请参阅图3-图7，图3-图7为图2彩色滤光基板400的制程示意图。首先请参阅图3，在玻璃基板410上产生一层色阻层(之后的黑色矩阵层)，接着，对所述色阻层进行曝光显影与蚀刻，以产生黑色矩阵层420。
请参阅图4。沉积红色膜层431于玻璃基板410和黑色矩阵层420之上。接下来，利用半色调掩膜(half-tone mask)510对红色膜层431进行曝光显影。半色调掩膜510在不同区域具有不同的透光率，举例来说，半色调掩膜510具有三个区域A1、A2和A3，区域A1表示部分光线可以透过的区域，区域A2表示光线无法透过的区域，区域A3表示全部光线可以透过的区域。因此，本发明可适当的利用半色调掩膜，以对红色膜层431各个区域进行不同的曝光显影。举例来说，将半色调掩膜510的区域A1对准红色膜层431欲部分去除的区域(亦即图2的第一区域D1)，将半色调掩膜510的区域A2对准红色膜层431欲全部去除的区域(亦即图2的第二区域D2)，将半色调掩膜510的区域A3对准红色膜层431完全无须去除的区域(亦即图2的第三区域D3)。因为半色调掩膜510各个区域A1-A3的透光率不同，因此光致抗蚀剂330会依据透光率的不同形成不同强度的光阻。之后，以化学溶剂冲刷以去除第一区域D1的部分红色膜层431以及第二区域D2的全部红色膜层431。至于第三区域D3的红色膜层431因为有光阻的保护而得以全部保留。最后，再以另一化学溶剂将光阻移除。
在图5可以清楚见到，在进行之后的蚀刻时，由于之前进行了不同程度的曝光显影，因此在蚀刻时，红色膜层431对于原本具有突起的红色膜层431 (对应第一区域D1)进行部分蚀刻，而对应第二区域D2的红色膜层431则完全被保留，而对应第三区域D3的红色膜层431便会完全被蚀刻而去除，如此一来，藉由适当的设计，红色膜层431便可不具有任何角段差。
请参阅图6。沉积蓝色膜层432于玻璃基板410和黑色矩阵层420之上，再将光致抗蚀剂330涂布在蓝色膜层432之上。接下来，利用半色调掩膜610对蓝色膜层432进行曝光。半色调掩膜610在不同区域具有不同的透光率，举例来说，半色调掩膜610具有三个区域B1、B2和B3，区域B1表示部分光线可以透过的区域，区域B2表示光线无法透过的区域，区域B3表示全部光线可以透过的区域。因此，本发明可适当的利用半色调掩膜610，以对蓝色膜层432各个区域进行不同的曝光显影。举例来说，将半色调掩膜610的区域B1对准蓝色膜层432欲部分去除的区域，将半色调掩膜610的区域B2对准蓝色膜层432欲全部去除的区域，将半色调掩膜610的区域B3对准蓝色膜层432完全无须去除的区域。因为半色调掩膜610各个区域B1-B3的透光率不同，因此光致抗蚀剂330会依据透光率的不同形成不同强度的光阻。之后，以化学溶剂冲刷以去除区域B1的部分蓝色膜层432以及区域B2的全部蓝色膜层432。至于区域B3的蓝色膜层432因为有光阻的保护而得以全部保留。最后，再以另一化学溶剂将光阻移除。
在图7可以清楚见到，由于之前进行了不同程度的曝光显影，因此在蚀刻时，原本对应区域B1具有突起的蓝色膜层432被部分蚀刻，而对应区域B2的蓝色膜层432则完全被保留，而对应区域B3的蓝色膜层432会完全被蚀刻而去除，如此一来，藉由适当的设计，蓝色膜层432便可不具有任何角段差。
请参阅图8。沉积绿色膜层433于玻璃基板410和黑色矩阵层420之上，再将光致抗蚀剂330涂布在绿色膜层433之上。接下来，利用半色调掩膜710对绿色膜层433进行曝光。半色调掩膜710在不同区域具有不同的透光率，举例来说，半色调掩膜710具有三个区域C1、C2和C3，区域C1表示部分光线可以透过的区域，区域C2表示光线无法透过的区域，区域C3表示全部光线可以透过的区域。因此，本发明可适当的利用半色调掩膜710，以对绿色膜层433各个区域进行不同的曝光显影。举例来说，将半色调掩膜710的区域C1对准绿色膜层433欲部分去除的区域，将半色调掩膜710的区域C2对准绿色膜层433欲全部去除的区域，将半色调掩膜710的区域C3对准绿色膜层433完全无须去除的区域。因为半色调掩膜710各个区域C1-C3的透光率不同，因此光致抗蚀剂330会依据透光率的不同形成不同强度的光阻。之后，以化学溶剂冲刷以去除区域C1的部分绿色膜层433以及区域C2的全部绿色膜层433。至于区域C3的绿色膜层433因为有光阻的保护而得以全部保留。最后，再以另一化学溶剂将光阻移除。
在图9可以清楚见到，由于之前进行了不同程度的曝光显影，因此在蚀刻时，原本对应区域C1具有突起的绿色膜层433被部分蚀刻，而对应区域C2的绿色膜层433则完全被保留，而对应区域C3的绿色膜层433会完全被蚀刻而去除，如此一来，藉由适当的设计，绿色膜层433便可不具有任何角段差。
至此，图2所示的彩色滤光基板400即全部完成。
请注意，本发明并未限制彩色膜层的产生方式，无论是利用印刷方式，沉积方式或是其他的产生方式，皆属本发明的范畴。
相较于现有技术，本发明提供一种彩色滤光基板与相关制作方式，其藉由具有不同透光率的掩膜，来制作彩色膜层。因此，彩色膜层在制作过程中会经过不同程度的曝光显影，如此一来，在其后的蚀刻过程中，就会对彩色膜层不同区域有不同的蚀刻程度，进而使彩色膜层与黑色矩阵层的重叠区域的高度大致等于未重叠的区域。如此一来，便可消除现有技术彩色膜层的角段差问题，使得子像素边缘处的液晶排列效果更佳。
综上所述，虽然本发明已以较佳实施例揭露如上，但该较佳实施例并非用以限制本发明，该领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。
 本发明的实施方式
工业实用性
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Claims (8)

  1. 一种彩色滤光基板的制作方法，用来制作一彩色滤光基板，所述制作方法包含：
    提供一玻璃基板；
    于所述玻璃基板上，形成一黑色矩阵层；
    于所述玻璃基板与所述黑色矩阵层上，沉积一彩色膜层；
    利用具有多种透光率的一掩膜，以对所述彩色膜层进行不同程度的曝光显影；以及
    根据曝光显影的结果，来蚀刻所述彩色膜层，以使所述彩色膜层与所述黑色矩阵层重叠的一第一区域被部分蚀刻，以及所述彩色膜层与所述黑色矩阵层重叠的一第二区域被完全蚀刻。
  2. 如权利要求1所述的制作方法，其中所述掩膜为一半色调掩膜。
  3. 如权利要求1所述的制作方法，其中所述彩色膜层包含一红色膜层、一蓝色膜层、以及一绿色膜层。
  4. 如权利要求3所述的制作方法，其中产生所述彩色膜层的步骤包含：于所述玻璃基板与所述黑色矩阵层上产生所述红色膜层，利用所述掩膜，对所述红色膜层进行不同程度的曝光显影；以及根据曝光显影的结果，来蚀刻所述红色膜层。
  5. 一种彩色滤光基板，包含：
    一玻璃基板；
    一黑色矩阵层，位于所述玻璃基板上；以及
    一彩色膜层，位于所述玻璃基板以及所述黑色矩阵层上；
    其中，所述彩色膜层与所述黑色矩阵层的重叠处与未重叠处的高度大致相等。
  6. 如权利要求5所述的彩色滤光基板，其中所述彩色膜层与所述黑色矩阵层的重叠处与未重叠处的高度大致相等，是藉由利用具有多种透光率的一掩膜，以对所述彩色膜层进行不同程度的曝光显影，并蚀刻所述彩色膜层制作而成。
  7. 如权利要求6所述的彩色滤光基板，其中所述掩膜为一半色调掩膜4。
  8. 如权利要求5所述的彩色滤光基板，其中所述彩色膜层包含一红色膜层、一蓝色膜层以及一绿色膜层。
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CN104749674A (zh) * 2013-12-30 2015-07-01 上海仪电显示材料有限公司 滤光片的制作方法及曝光掩膜板
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CN107463023A (zh) * 2017-09-18 2017-12-12 惠科股份有限公司 液晶显示面板以及液晶显示设备
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